Optical proximity correction method, apparatus, device and computer-readable storage medium

Abstract

This invention relates to the field of chip design, and particularly to an optical proximity correction method, apparatus, device, and computer-readable storage medium. The method involves receiving original layout information; determining redundant graphic information in the library based on the original layout information and a preset redundant correction graphic library; replacing the redundant graphic information in the library with corresponding redundant correction graphic information using the library to obtain intermediate layout information; performing optical proximity correction on the areas to be processed in the intermediate layout information to obtain target mask graphic information; the areas to be processed in the intermediate layout information are the areas that have not been replaced; and obtaining OPC mask layout information based on the target mask graphic information and the intermediate layout information. This invention significantly reduces the time required for optical proximity correction of chip layouts, improves tape-out efficiency, and shortens the chip design verification cycle.

Description

Technical Field

[0001] This invention relates to the field of chip design, and in particular to an optical proximity correction method, apparatus, device, and computer-readable storage medium. Background Technology

[0002] As technology advances, the nodes in chips are becoming smaller and smaller, leading to higher integration of chip layouts and an increase in the requirements for redundant patterns in chip design.

[0003] During the design and verification of chips, optical proximity correction needs to be continuously performed on the chip design layout. As the number of redundant patterns in the chip layout increases, the time consumed by optical proximity correction also increases. This leads to an increase in the time required for optical proximity correction calculation of the entire chip due to excessive redundant patterns, resulting in low tape-out efficiency and a long design and verification cycle.

[0004] Therefore, finding a method to shorten the optical proximity correction time of chips, improve tape-out efficiency, and shorten the chip design verification cycle is a problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0005] The purpose of this invention is to provide an optical proximity correction method, apparatus, device, and computer-readable storage medium to solve the problems of long optical proximity correction time, low tape-out efficiency, and long chip design verification cycle in the prior art.

[0006] To solve the above-mentioned technical problems, the present invention provides an optical proximity correction method, comprising:

[0007] Receive the original map information;

[0008] Based on the original map information and the preset redundant correction graphic library, determine the redundant graphic information in the library;

[0009] Using the aforementioned redundancy correction graphic library, the redundant graphic information in the library is replaced with the corresponding redundant correction graphic information to obtain intermediate layout information;

[0010] Optical proximity correction is performed on the region to be processed in the intermediate layout information to obtain target mask graphic information; the region to be processed in the intermediate layout information is the region in the intermediate layout information that has not been replaced;

[0011] Based on the target mask pattern information and the intermediate layout information, the OPC mask layout information is obtained.

[0012] Optionally, in the optical proximity correction method, after determining the redundant graphic information in the library based on the original layout information and a preset redundant correction graphic library, the method further includes:

[0013] Redundant combined graphic information is determined based on the existing redundant graphic information and the redundant correction graphic library; the combined graphic corresponding to the redundant combined graphic information is a graphic composed of multiple redundant graphics corresponding to the existing redundant graphic information according to a preset positional relationship;

[0014] Accordingly, the step of using the redundancy correction graphics library to replace the redundant graphics information in the library with the corresponding redundancy correction graphics information to obtain intermediate layout information includes:

[0015] Using the aforementioned redundancy correction graphic library, the redundant combined graphic information is replaced with the corresponding combined correction graphic information to obtain intermediate layout information.

[0016] Optionally, in the optical proximity correction method, after determining the redundant combination graphic information based on the in-stock redundant graphic information and the redundant correction graphic library, the method further includes:

[0017] Based on the redundant combined graphic information and the in-stock redundant graphic information, determine whether there is any remaining redundant graphic information that has not been combined;

[0018] Accordingly, the step of using the redundant correction graphic library to replace the redundant combined graphic information with the corresponding combined correction graphic information to obtain intermediate layout information includes:

[0019] When the remaining redundant graphic information exists, the redundant combined graphic information is replaced with the corresponding combined corrected graphic information using the redundant correction graphic library, and the remaining redundant graphic information is replaced with the corresponding redundant corrected graphic information to obtain intermediate layout information.

[0020] Optionally, in the optical proximity correction method, after determining whether there is any uncombined remaining redundant graphic information based on the redundant combined graphic information and the in-stock redundant graphic information, the method further includes:

[0021] When the remaining redundant graphic information exists, the number of uncombined redundant graphics corresponding to the remaining redundant graphic information is divided by the number of combined graphics in the redundant combined graphic information to determine the combination degree ratio.

[0022] Determine whether the combination ratio is greater than a preset standard threshold;

[0023] When the combination ratio is greater than the standard threshold, the original map information is marked as map information to be searched.

[0024] An optical proximity correction device, comprising:

[0025] The receiving module is used to receive the original map information;

[0026] The redundancy module is used to determine the redundant graphic information in the library based on the original map information and the preset redundancy correction graphic library.

[0027] The replacement module is used to replace the redundant graphic information in the library with the corresponding redundant corrected graphic information using the redundant correction graphic library to obtain intermediate layout information.

[0028] The OPC module is used to perform optical proximity correction on the area to be processed in the intermediate layout information to obtain target mask pattern information; the area to be processed in the intermediate layout information is the area in the intermediate layout information that has not been replaced.

[0029] The result module is used to obtain OPC mask layout information based on the target mask pattern information and the intermediate layout information.

[0030] Optionally, in the optical proximity correction device, the in-stock redundancy module further includes:

[0031] A combined redundancy unit is used to determine redundant combined graphic information based on the in-stock redundant graphic information and the redundant correction graphic library; the combined graphic corresponding to the redundant combined graphic information is a graphic composed of multiple redundant graphics corresponding to the in-stock redundant graphic information according to a preset positional relationship.

[0032] Accordingly, the replacement module includes:

[0033] The combination replacement unit is used to replace the redundant combination graphic information with the corresponding combination correction graphic information using the redundant correction graphic library to obtain intermediate layout information.

[0034] Optionally, in the optical proximity correction device, the in-stock redundancy module further includes:

[0035] The remaining determination unit is used to determine whether there is any remaining redundant graphic information that has not been combined, based on the redundant combined graphic information and the redundant graphic information in the database.

[0036] Accordingly, the replacement module includes:

[0037] The integrated replacement unit is used to replace the redundant combined graphic information with the corresponding combined corrected graphic information using the redundant correction graphic library when the remaining redundant graphic information exists, and to replace the remaining redundant graphic information with the corresponding redundant corrected graphic information to obtain intermediate layout information.

[0038] Optionally, in the optical proximity correction device, the in-stock redundancy module further includes:

[0039] The combination degree unit is used to determine the combination degree ratio by dividing the number of uncombined redundant graphics corresponding to the remaining redundant graphic information by the number of combined graphics in the redundant combined graphic information when the remaining redundant graphic information exists.

[0040] A threshold determination unit is used to determine whether the combination degree ratio is greater than a preset standard threshold.

[0041] A marking unit is used to mark the original map information as map information to be searched when the combination ratio is greater than the standard threshold.

[0042] An optical proximity correction device, comprising:

[0043] Memory, used to store computer programs;

[0044] A processor, configured to implement the steps of the optical proximity correction method as described above when executing the computer program.

[0045] A computer-readable storage medium storing a computer program that, when executed by a processor, implements the steps of the optical proximity correction method as described above.

[0046] The optical proximity correction method provided by this invention involves receiving original layout information; determining redundant graphic information in the library based on the original layout information and a preset redundant correction graphic library; replacing the redundant graphic information in the library with corresponding redundant correction graphic information using the redundant correction graphic library to obtain intermediate layout information; performing optical proximity correction on the areas to be processed in the intermediate layout information to obtain target mask graphic information; the areas to be processed in the intermediate layout information are the areas in the intermediate layout information that have not been replaced; and obtaining OPC mask layout information based on the target mask graphic information and the intermediate layout information.

[0047] To improve the efficiency of optical proximity correction in chip layout, this invention pre-establishes a database of various common redundant patterns and their corresponding optically corrected patterns, i.e., a redundancy correction pattern library. Upon receiving the original layout information, the invention first searches for redundant patterns existing in the original layout information and recorded in the library, thus identifying the redundant pattern information in the library. Then, the redundant pattern information in the library is directly replaced with the redundant pattern information recorded in the library. This is equivalent to pre-completing the optical proximity correction of common redundant patterns. When actually performing optical proximity correction on the original layout information, only patterns outside the redundant pattern information in the library need to be simulated and corrected, thereby significantly reducing the time required for optical proximity correction of the chip layout, improving tape-out efficiency, and shortening the chip design verification cycle. This invention also provides an optical proximity correction device, apparatus, and computer-readable storage medium with the above-mentioned beneficial effects. Attached Figure Description

[0048] To more clearly illustrate the technical solutions of the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0049] Figure 1 A flowchart illustrating a specific implementation of the optical proximity correction method provided by the present invention;

[0050] Figure 2 A flowchart illustrating another specific embodiment of the optical proximity correction method provided by the present invention;

[0051] Figures 3-1 to 3-2 A process flow diagram of a specific embodiment of the optical proximity correction method provided by the present invention;

[0052] Figure 4 This is a schematic diagram of a specific embodiment of the optical proximity correction device provided by the present invention. Detailed Implementation

[0053] To enable those skilled in the art to better understand the present invention, the invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Obviously, the described embodiments are merely some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0054] The core of this invention is to provide an optical proximity correction method, the flowchart of one specific implementation of which is shown below. Figure 1 As shown, this is referred to as Specific Implementation Method One, which includes:

[0055] S101: Receive the original map information.

[0056] S102: Determine the redundant graphic information in the library based on the original map information and the preset redundant correction graphic library.

[0057] The redundancy correction pattern library includes pre-input redundant patterns commonly found in chip layouts, and their corresponding mask patterns after optical proximity correction (i.e., the redundancy correction pattern information). In this step, it is determined which regions in the original layout information correspond to the patterns in the redundancy correction pattern library, and these regions are recorded to confirm that they are redundant pattern information in the library.

[0058] S103: Using the aforementioned redundant correction graphic library, the redundant graphic information in the library is replaced with the corresponding redundant correction graphic information to obtain intermediate layout information.

[0059] As mentioned above, the redundant graphic information in the library refers to the distribution information of the shapes of redundant graphics recorded in the redundant correction graphic library in the original layout information. In this step, there is no need to perform actual OPC (Optical Proximity Correction) simulation calculations, but simply replace the graphics in the original layout information that conform to the records in the redundant correction graphic library.

[0060] S104: Perform optical proximity correction on the area to be processed in the intermediate layout information to obtain target mask graphic information; the area to be processed in the intermediate layout information is the area in the intermediate layout information that has not been replaced.

[0061] In this step, the actual OPC simulation calculation is performed on the regions that were not replaced in step S103 to obtain the mask pattern of the corresponding regions.

[0062] S105: Obtain OPC mask layout information based on the target mask pattern information and the intermediate layout information.

[0063] This step merges the mask pattern obtained in step S103 by replacing it according to the redundancy correction graphic library with the mask pattern obtained in step S104 by the actual OPC simulation, to obtain the final OPC mask layout information corresponding to the original layout information. It is easy to see that the area that actually requires time for OPC simulation is greatly reduced.

[0064] The optical proximity correction method provided by this invention involves receiving original layout information; determining redundant graphic information in the library based on the original layout information and a preset redundant correction graphic library; replacing the redundant graphic information in the library with corresponding redundant correction graphic information using the redundant correction graphic library to obtain intermediate layout information; performing optical proximity correction on the areas to be processed in the intermediate layout information to obtain target mask graphic information; the areas to be processed in the intermediate layout information are the areas in the intermediate layout information that have not been replaced; and obtaining OPC mask layout information based on the target mask graphic information and the intermediate layout information. To improve the efficiency of optical proximity correction in chip layout, this invention pre-establishes a database of various common redundant patterns and their corresponding optically corrected patterns, i.e., the redundant correction pattern library. Upon receiving the original layout information, the invention first searches for redundant patterns existing in the original layout information and recorded in the library, i.e., determines the redundant pattern information in the library. Then, it directly replaces the redundant pattern information in the library with the redundant correction pattern information recorded in the library. This is equivalent to performing optical proximity correction for common redundant patterns in advance. When actually performing optical proximity correction on the original layout information, only the patterns outside the redundant pattern information in the library need to be simulated and corrected, thereby greatly shortening the time required for optical proximity correction of chip layout, improving tape-out efficiency, and shortening the chip design verification cycle.

[0065] Based on Implementation Method 1, the specific process for obtaining the intermediate layout information is further defined, resulting in Implementation Method 2, the flowchart of which is shown below. Figure 2 As shown, it includes:

[0066] S201: Receive the original map information.

[0067] S202: Based on the original map information and the preset redundant correction map library, determine the redundant map information in the library.

[0068] S203: Based on the existing redundant graphic information and the redundant correction graphic library, determine the redundant combination graphic information; the combined graphic corresponding to the redundant combination graphic information is a graphic composed of multiple redundant graphics corresponding to the existing redundant graphic information according to a preset positional relationship.

[0069] It should be noted that the redundant graphics stored in the redundancy correction graphics library are usually simple geometric shapes, such as rectangles or triangles. In this step, after determining the redundant images of simple geometric shapes such as rectangles and triangles in the original layout information, each simple geometric shape is not directly replaced with the mask graphic after OPC simulation. Instead, the spatial position of each simple geometric shape is further considered. In other words, the redundancy correction graphics library pre-stores the combination configurations of multiple redundant graphics in the library, that is, the combination graphics composed of the aforementioned simple geometric shapes according to a certain positional relationship.

[0070] In other words, this step further considers the positional relationships of the simple geometric figures in the redundant graphic information in the library, and merges the simple geometric figures that conform to the preset positional relationships in the redundant correction graphic library into a combined graphic, thereby obtaining the redundant combined graphic information.

[0071] S204: Using the redundant correction graphic library, replace the redundant combined graphic information with the corresponding combined correction graphic information to obtain intermediate layout information.

[0072] S205: Perform optical proximity correction on the area to be processed in the intermediate layout information to obtain target mask graphic information; the area to be processed in the intermediate layout information is the area in the intermediate layout information that has not been replaced.

[0073] S206: Obtain OPC mask layout information based on the target mask pattern information and the intermediate layout information.

[0074] The difference between this specific implementation and the above specific implementation is that, in this specific implementation, after determining the redundant graphic information in the database, the redundant graphic corresponding to the redundant graphic information in the database is not directly replaced, but a combination process is further performed. The remaining steps are the same as those in the above specific implementation and will not be described in detail here.

[0075] In this preferred embodiment, the potential impact of the positional relationships of different simple geometric shapes on OPC simulation is further considered. Not only are mask patterns corresponding to multiple redundant shapes pre-stored in the redundant correction graphic library, but mask patterns corresponding to the combined shapes formed by multiple redundant shapes under specific positional relationships are also pre-stored. This further improves the simulation accuracy of optical proximity correction and makes the simulation results more instructive for production.

[0076] Furthermore, after determining the redundant combined graphic information based on the existing redundant graphic information and the redundant correction graphic library, the method further includes:

[0077] A1: Based on the redundant combined graphic information and the redundant graphic information in the database, determine whether there is any remaining redundant graphic information that has not been combined.

[0078] As mentioned earlier, the redundant combined graphic information refers to the information corresponding to the combined graphics formed by the redundant graphics corresponding to the redundant graphic information in the library according to the pre-stored positional relationships in the redundant correction graphic library. Therefore, in actual production, the original layout information may contain redundant graphics that are not arranged according to the pre-stored positional relationships in the redundant correction graphic library, but are still recorded in the redundant correction graphic library. The information corresponding to these redundant graphics that fail to form combined graphics according to the pre-stored positional relationships is the remaining redundant information. (See reference...) Figure 3-1 and Figure 3-2 , Figure 3-1 The redundant graphics corresponding to the redundant graphics information in the database are identified in the middle, while Figure 3-2 The redundant graphics in the middle are combined into composite graphics (outlined by dashed lines) according to the pre-stored positional relationships in the redundant correction graphics library. Other redundant graphics that do not form composite graphics according to the pre-stored positional relationships are classified into the remaining redundant graphics information.

[0079] Accordingly, the step of using the redundant correction graphic library to replace the redundant combined graphic information with the corresponding combined correction graphic information to obtain intermediate layout information includes:

[0080] A2: When the remaining redundant graphic information exists, the redundant combined graphic information is replaced with the corresponding combined corrected graphic information using the redundant correction graphic library, and the remaining redundant graphic information is replaced with the corresponding redundant correction graphic information to obtain intermediate layout information.

[0081] In this preferred embodiment, the possibility that the redundant graphics corresponding to the redundant graphic information in the library may not be arranged according to the pre-stored positional relationship exists in actual production is taken into consideration. The combined graphics arranged according to the pre-stored positional relationship and the redundant graphics that cannot form a combined graphic but whose arrangement is not in the redundant correction graphic library are replaced according to the mask shape corresponding to the redundant correction graphic library, which greatly improves the versatility of this specific embodiment.

[0082] Furthermore, after determining whether there is any remaining redundant graphic information that has not been combined based on the redundant combined graphic information and the redundant graphic information in the database, the method further includes:

[0083] B1: When the remaining redundant graphic information exists, divide the number of uncombined redundant graphics corresponding to the remaining redundant graphic information by the number of combined graphics in the redundant combined graphic information to determine the combination degree ratio.

[0084] B2: Determine whether the combination ratio is greater than a preset standard threshold.

[0085] B3: When the combination ratio is greater than the standard threshold, the original map information is marked as map information to be searched.

[0086] The smaller the combination ratio, the more the redundant graphics recorded in the redundant correction graphics library in the original map information are arranged according to the positional relationship recorded in the redundant correction graphics library. The more redundant graphics can be identified as combined graphics according to the positional relationship recorded in the redundant correction graphics library, the higher the accuracy of the optical proximity correction method provided in this embodiment. Therefore, in order to improve the accuracy of the optical proximity correction method provided in this embodiment, the number of types of combined graphics included in the redundant correction graphics library should be expanded as much as possible.

[0087] Therefore, if the combination ratio is greater than the preset standard threshold, it indicates that there are a large number of redundant graphic combinations in the corresponding original layout information that are not recorded by the redundancy correction graphic library. In this preferred embodiment, these original layout information are marked to facilitate subsequent research by staff. The new combined graphics formed by the redundant graphics appearing therein are updated to the redundancy correction graphic library, thereby improving the accuracy of optical proximity correction methods using the updated redundancy correction graphic library in subsequent processes.

[0088] The optical proximity correction device provided in the embodiments of the present invention will be described below. The optical proximity correction device described below can be referred to in correspondence with the optical proximity correction method described above.

[0089] Figure 4 The structural block diagram of the optical proximity correction device provided in this embodiment of the invention is referred to as Specific Embodiment Three, and is referred to as follows. Figure 4 Optical proximity correction devices may include:

[0090] Receiver module 100 is used to receive original map information;

[0091] The redundancy module 200 is used to determine the redundant graphic information in the library based on the original map information and the preset redundancy correction graphic library.

[0092] The replacement module 300 is used to replace the redundant graphic information in the library with the corresponding redundant corrected graphic information using the redundant correction graphic library to obtain intermediate layout information.

[0093] OPC module 400 is used to perform optical proximity correction on the area to be processed in the intermediate layout information to obtain target mask pattern information; the area to be processed in the intermediate layout information is the area in the intermediate layout information that has not been replaced.

[0094] The result module 500 is used to obtain OPC mask layout information based on the target mask pattern information and the intermediate layout information.

[0095] In a preferred embodiment, the in-stock redundancy module 200 further includes:

[0096] A combined redundancy unit is used to determine redundant combined graphic information based on the in-stock redundant graphic information and the redundant correction graphic library; the combined graphic corresponding to the redundant combined graphic information is a graphic composed of multiple redundant graphics corresponding to the in-stock redundant graphic information according to a preset positional relationship.

[0097] Accordingly, the replacement module 300 includes:

[0098] The combination replacement unit is used to replace the redundant combination graphic information with the corresponding combination correction graphic information using the redundant correction graphic library to obtain intermediate layout information.

[0099] In a preferred embodiment, the in-stock redundancy module 200 further includes:

[0100] The remaining determination unit is used to determine whether there is any remaining redundant graphic information that has not been combined, based on the redundant combined graphic information and the redundant graphic information in the database.

[0101] Accordingly, the replacement module 300 includes:

[0102] The integrated replacement unit is used to replace the redundant combined graphic information with the corresponding combined corrected graphic information using the redundant correction graphic library when the remaining redundant graphic information exists, and to replace the remaining redundant graphic information with the corresponding redundant corrected graphic information to obtain intermediate layout information.

[0103] In a preferred embodiment, the in-stock redundancy module 200 further includes:

[0104] The combination degree unit is used to determine the combination degree ratio by dividing the number of uncombined redundant graphics corresponding to the remaining redundant graphic information by the number of combined graphics in the redundant combined graphic information when the remaining redundant graphic information exists.

[0105] A threshold determination unit is used to determine whether the combination degree ratio is greater than a preset standard threshold.

[0106] A marking unit is used to mark the original map information as map information to be searched when the combination ratio is greater than the standard threshold.

[0107] The optical proximity correction device provided by this invention includes a receiving module 100 for receiving original layout information; a redundant library module 200 for determining redundant graphic information in the library based on the original layout information and a preset redundant correction graphic library; a replacement module 300 for replacing the redundant graphic information in the library with corresponding redundant correction graphic information using the redundant correction graphic library to obtain intermediate layout information; an OPC module 400 for performing optical proximity correction on the unprocessed area in the intermediate layout information to obtain target mask graphic information; the unprocessed area in the intermediate layout information is the area in the intermediate layout information that has not been replaced; and a result module 500 for obtaining OPC mask layout information based on the target mask graphic information and the intermediate layout information. To improve the efficiency of optical proximity correction in chip layout, this invention pre-establishes a database of various common redundant patterns and their corresponding optically corrected patterns, i.e., the redundant correction pattern library. Upon receiving the original layout information, the invention first searches for redundant patterns existing in the original layout information and recorded in the library, i.e., determines the redundant pattern information in the library. Then, it directly replaces the redundant pattern information in the library with the redundant correction pattern information recorded in the library. This is equivalent to performing optical proximity correction for common redundant patterns in advance. When actually performing optical proximity correction on the original layout information, only the patterns outside the redundant pattern information in the library need to be simulated and corrected, thereby greatly shortening the time required for optical proximity correction of chip layout, improving tape-out efficiency, and shortening the chip design verification cycle.

[0108] The optical proximity correction device in this embodiment is used to implement the aforementioned optical proximity correction method. Therefore, the specific implementation of the optical proximity correction device can be found in the embodiment section of the optical proximity correction method above. For example, the receiving module 100, the in-stock redundancy module 200, the replacement module 300, the OPC module 400, and the result module 500 are respectively used to implement steps S101, S102, S103, S104, and S105 in the aforementioned optical proximity correction method. Therefore, its specific implementation can be referred to the description of the corresponding embodiments, which will not be repeated here.

[0109] The present invention also provides an optical proximity correction device, comprising:

[0110] Memory, used to store computer programs;

[0111] A processor is configured to execute the computer program to implement the steps of the optical proximity correction method as described above. The optical proximity correction method provided by this invention involves: receiving original layout information; determining redundant graphic information in the library based on the original layout information and a preset redundant correction graphic library; replacing the redundant graphic information in the library with corresponding redundant correction graphic information using the redundant correction graphic library to obtain intermediate layout information; performing optical proximity correction on the region to be processed in the intermediate layout information to obtain target mask graphic information; the region to be processed in the intermediate layout information being the region in the intermediate layout information that has not been replaced; and obtaining OPC mask layout information based on the target mask graphic information and the intermediate layout information. To improve the efficiency of optical proximity correction in chip layout, this invention pre-establishes a database of various common redundant patterns and their corresponding optically corrected patterns, i.e., the redundant correction pattern library. Upon receiving the original layout information, the invention first searches for redundant patterns existing in the original layout information and recorded in the library, i.e., determines the redundant pattern information in the library. Then, it directly replaces the redundant pattern information in the library with the redundant correction pattern information recorded in the library. This is equivalent to performing optical proximity correction for common redundant patterns in advance. When actually performing optical proximity correction on the original layout information, only the patterns outside the redundant pattern information in the library need to be simulated and corrected, thereby greatly shortening the time required for optical proximity correction of chip layout, improving tape-out efficiency, and shortening the chip design verification cycle.

[0112] A computer-readable storage medium stores a computer program that, when executed by a processor, implements the steps of the optical proximity correction method as described above. The optical proximity correction method provided by this invention involves: receiving original layout information; determining redundant graphic information in the library based on the original layout information and a preset redundant correction graphic library; replacing the redundant graphic information in the library with corresponding redundant correction graphic information using the redundant correction graphic library to obtain intermediate layout information; performing optical proximity correction on the region to be processed in the intermediate layout information to obtain target mask graphic information; the region to be processed in the intermediate layout information being the region in the intermediate layout information that has not been replaced; and obtaining OPC mask layout information based on the target mask graphic information and the intermediate layout information. To improve the efficiency of optical proximity correction in chip layout, this invention pre-establishes a database of various common redundant patterns and their corresponding optically corrected patterns, i.e., the redundant correction pattern library. Upon receiving the original layout information, the invention first searches for redundant patterns existing in the original layout information and recorded in the library, i.e., determines the redundant pattern information in the library. Then, it directly replaces the redundant pattern information in the library with the redundant correction pattern information recorded in the library. This is equivalent to performing optical proximity correction for common redundant patterns in advance. When actually performing optical proximity correction on the original layout information, only the patterns outside the redundant pattern information in the library need to be simulated and corrected, thereby greatly shortening the time required for optical proximity correction of chip layout, improving tape-out efficiency, and shortening the chip design verification cycle.

[0113] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on its differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. For the apparatus disclosed in the embodiments, since it corresponds to the method disclosed in the embodiments, the description is relatively simple; relevant parts can be referred to in the method section.

[0114] It should be noted that, in this specification, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0115] Those skilled in the art will further recognize that the units and algorithm steps of the various examples described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, computer software, or a combination of both. To clearly illustrate the interchangeability of hardware and software, the components and steps of the various examples have been generally described in terms of functionality in the foregoing description. Whether these functions are implemented in hardware or software depends on the specific application and design constraints of the technical solution. Those skilled in the art can use different methods to implement the described functions for each specific application, but such implementations should not be considered beyond the scope of this invention.

[0116] The steps of the methods or algorithms described in conjunction with the embodiments disclosed herein can be implemented directly by hardware, a software module executed by a processor, or a combination of both. The software module can be located in random access memory (RAM), main memory, read-only memory (ROM), electrically programmable ROM, electrically erasable programmable ROM, registers, hard disk, removable disk, CD-ROM, or any other form of storage medium known in the art.

[0117] The optical proximity correction method, apparatus, device, and computer-readable storage medium provided by this invention have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this invention. The descriptions of the embodiments above are merely for the purpose of helping to understand the method and core ideas of this invention. It should be noted that those skilled in the art can make various improvements and modifications to this invention without departing from its principles, and these improvements and modifications also fall within the protection scope of the claims of this invention.

Claims

1. An optical proximity correction method, characterized by, The method comprises the following steps: receiving original layout information; determining in-library redundancy pattern information according to the original layout information and a preset redundancy correction pattern library; replacing the in-library redundancy pattern information with corresponding redundancy correction pattern information in the redundancy correction pattern library to obtain intermediate layout information; performing optical proximity correction on a to-be-processed region in the intermediate layout information to obtain target mask pattern information; the to-be-processed region in the intermediate layout information is a region in the intermediate layout information that has not been replaced; obtaining OPC mask layout information according to the target mask pattern information and the intermediate layout information; after determining the in-library redundancy pattern information according to the original layout information and the preset redundancy correction pattern library, the method further comprises the following steps: determining redundancy combination pattern information according to the in-library redundancy pattern information and the redundancy correction pattern library; the combination pattern corresponding to the redundancy combination pattern information is a pattern formed by a plurality of redundancy patterns corresponding to the in-library redundancy pattern information according to a preset positional relationship; correspondingly, the step of replacing the in-library redundancy pattern information with corresponding redundancy correction pattern information in the redundancy correction pattern library to obtain intermediate layout information comprises the following step: replacing the redundancy combination pattern information with corresponding combination correction pattern information in the redundancy correction pattern library to obtain intermediate layout information; after determining the redundancy combination pattern information according to the in-library redundancy pattern information and the redundancy correction pattern library, the method further comprises the following steps: judging whether there is remaining redundancy pattern information that has not been combined according to the redundancy combination pattern information and the in-library redundancy pattern information; correspondingly, the step of replacing the redundancy combination pattern information with corresponding combination correction pattern information in the redundancy correction pattern library to obtain intermediate layout information comprises the following step: when the remaining redundancy pattern information exists, replacing the redundancy combination pattern information with corresponding combination correction pattern information in the redundancy correction pattern library, and replacing the remaining redundancy pattern information with corresponding redundancy correction pattern information to obtain intermediate layout information; after judging whether there is remaining redundancy pattern information that has not been combined according to the redundancy combination pattern information and the in-library redundancy pattern information, the method further comprises the following steps: when the remaining redundancy pattern information exists, dividing the number of redundancy patterns that have not been combined corresponding to the remaining redundancy pattern information by the number of combination patterns in the redundancy combination pattern information to determine a combination degree ratio; judging whether the combination degree ratio is greater than a preset standard threshold; when the combination degree ratio is greater than the standard threshold, marking the original layout information as to-be-checked layout information.

2. An optical proximity correction device, characterized by, The method comprises the following steps: a receiving module is configured to receive original layout information; an in-library redundancy module is configured to determine in-library redundancy pattern information according to the original layout information and a preset redundancy correction pattern library; a replacing module is configured to replace the in-library redundancy pattern information with corresponding redundancy correction pattern information in the redundancy correction pattern library to obtain intermediate layout information; an OPC module is configured to perform optical proximity correction on a to-be-processed region in the intermediate layout information to obtain target mask pattern information; The to-be-processed region in the intermediate mask layout information is a region in the intermediate mask layout information that has not been replaced; The result module is configured to obtain OPC mask layout information according to the target mask pattern information and the intermediate mask layout information. The in-library redundancy module further includes: The combination redundancy unit is configured to determine redundancy combination pattern information according to the in-library redundancy pattern information and the redundancy correction pattern library; the combination pattern corresponding to the redundancy combination pattern information is a pattern formed by a plurality of redundancy patterns corresponding to the in-library redundancy pattern information according to a preset positional relationship; Correspondingly, the replacement module includes: The combination replacement unit is configured to replace the redundancy combination pattern information with corresponding combination correction pattern information by using the redundancy correction pattern library to obtain intermediate mask layout information. The in-library redundancy module further includes: The residual judgment unit is configured to determine whether there is residual redundancy pattern information that has not been combined according to the redundancy combination pattern information and the in-library redundancy pattern information. Correspondingly, the replacement module includes: The comprehensive replacement unit is configured to replace the redundancy combination pattern information with corresponding combination correction pattern information and replace the residual redundancy pattern information with corresponding redundancy correction pattern information by using the redundancy correction pattern library when the residual redundancy pattern information exists to obtain intermediate mask layout information. The in-library redundancy module further includes: The combination degree unit is configured to divide the number of redundancy patterns that have not been combined corresponding to the residual redundancy pattern information by the number of combination patterns in the redundancy combination pattern information to determine a combination degree ratio when the residual redundancy pattern information exists. The threshold judgment unit is configured to determine whether the combination degree ratio is greater than a preset standard threshold. The marking unit is configured to mark the original mask layout information as to-be-checked mask layout information when the combination degree ratio is greater than the standard threshold.

3. An optical proximity correction apparatus, characterized by, The computer program is stored on the computer readable storage medium and is executed by the processor to implement the steps of the optical proximity correction method. The computer program is stored on the computer readable storage medium and is executed by the processor to implement the steps of the optical proximity correction method. The computer program is stored on the computer readable storage medium and is executed by the processor to implement the steps of the optical proximity correction method.

4. A computer-readable storage medium, characterized in that, ​

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