A process for making nano-flocked microstructures with anti-reflective effect
By fabricating nanofiber microstructures on the surface of the optical lens motherboard and replicating the optical lens wafer, the problem of coating brittleness caused by the difference in thermal expansion coefficient and Young's modulus of the lens material was solved, and the stability and anti-reflection effect of the lens were maintained during the reflow process.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-03-29
- Publication Date
- 2026-03-27
AI Technical Summary
Existing technologies use coating materials on optical lens surfaces with different coefficients of thermal expansion and Young's modulus than the lens materials, which makes AR coatings brittle and unsuitable for reflow processes, affecting reliability.
Nanoscale microstructures are fabricated on the surface of an optical lens motherboard, and optical lens wafers are replicated by embossing. The nanoscale microstructures are made of the same material as the lens, making them suitable for reflow processes.
It improves the stability and reliability of optical lenses, enabling them to withstand high and low temperature shock and high temperature and humidity reliability tests while maintaining their anti-reflective properties, making them suitable for reflow processes.
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Figure CN116299789B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to a manufacturing process of nano-fleece microstructure with anti-reflection effect, which can be widely applied to the key optical lens manufacturing technology of terminal devices such as smart phones, wearable devices, tablet computers, notebook computers and the like. BACKGROUND
[0002] When light passes through the interface of smooth optical material medium, reflection phenomenon occurs due to the discontinuity of refractive index. In order to avoid or reduce the occurrence of such reflection phenomenon, the existing anti-reflection (AR) technology is to form anti-reflection effect by PVD coating AR film on the surface of the lens. However, due to the difference in thermal expansion coefficient and Young's modulus between the coating material and the material of the optical lens, the AR coating material is prone to brittle fracture in reliability test, and cannot be applied to subsequent processes with reflow. SUMMARY
[0003] To solve the above technical problems, the present application designs a manufacturing process of nano-fleece microstructure with anti-reflection effect. By manufacturing nano-fleece microstructure on the lens surface of the master plate, and then copying the optical lens wafer with anti-reflection nano-fleece microstructure by embossing, the optical lens wafer with ARS nano-fleece microstructure can withstand various severe possibility tests and can be applied to reflow process without causing loss of AR effect.
[0004] The present application adopts the following technical scheme:
[0005] A manufacturing process of nano-fleece microstructure with anti-reflection effect, characterized in that the manufacturing process steps are as follows:
[0006] S1, manufacturing of optical lens master plate: taking the glass substrate of the master plate, manufacturing the optical lens of the master plate on the glass substrate of the master plate by means of photoetching or embossing;
[0007] S2, manufacturing of nano-fleece microstructure on the optical lens: manufacturing nano-fleece microstructure on the surface of the optical lens of the master plate by dry etching process;
[0008] S3, manufacturing of working mold: placing the working mold frame outside the glass substrate of the master plate, pouring the mold material of mixed and defoamed organic high polymer into the working mold frame on the master plate, attaching the glass substrate of the working mold to the master plate filled with the mold material, and then putting it into the oven for baking and heat curing;
[0009] S4, demolding of working mold: taking the mold group of the cured working mold and the master plate out of the oven and cooling, and then demolding the working mold from the master plate using a separating device, at this time the mold plate of the cured working mold forms a cavity accommodating the shape of the optical lens and the nano-fleece microstructure;
[0010] S5, imprinting nano-fuzzy microstructure on optical lens wafer: taking out the glass substrate, making optical lens wafer on the glass substrate by means of photolithography or imprinting, using automatic dispensing equipment to dispense transparent glue liquid of the same material as the optical lens wafer into the cavity on the template of the working mold, using wafer automatic alignment equipment to align the working mold with the transparent glue liquid injected with the optical lens wafer and the glass substrate, and then performing imprinting, and using UV lamp irradiation to cure the transparent glue liquid;
[0011] S6, demolding of optical lens wafer: using automatic demolding equipment to separate the optical lens wafer with nano-fuzzy microstructure from the working mold.
[0012] As a preferred, in step S2, the dry etching process step for generating nano-fuzzy microstructure on the optical lens surface of the mother plate is:
[0013] A1, first load the mother plate into the dry etching equipment and use the ESC electrostatic chuck to adsorb and fix the mother plate;
[0014] A2, after adjusting the distance between the mother plate and the radio frequency wave, setting the radio frequency wave power, O2 and N2 flow, etching time and cavity pressure and other parameters, starting the etching program; O2 forms plasma under the action of electromagnetic field, plasma diffuses to the surface of the mother plate under the action of electromagnetic field, reacts with the optical lens surface of the mother plate, and forms nano-fuzzy microstructure on the optical lens surface of the mother plate.
[0015] As a preferred, in step S1, the process step for making the optical lens of the mother plate by means of photolithography is:
[0016] B1, after polishing the upper and lower surfaces of the glass substrate of the mother plate, coating or attaching the photosensitive glue;
[0017] B2, convert the mother plate shape design drawing into a file recognizable by the laser gray scale direct writing equipment and program it to import; after focusing, the laser gray scale direct writing equipment performs 3D pattern laser direct writing on the position of the photosensitive glue film according to the program;
[0018] B3, after exposure, the mother plate is soaked in a pool containing developing solution for a certain period of time, and then placed in a pool containing chemical rinse solution for rinsing; after rinsing, the mother plate is placed in an oven for drying; the optical lens of the mother plate is completed.
[0019] As a preferred, in step S1, the process step for making the optical lens of the mother plate by means of imprinting is:
[0020] C1, after polishing the upper and lower surfaces of the glass substrate of the mother plate, placing the single optical lens mold on the glass substrate of the mother plate;
[0021] C2, after dispensing on the monomer optical lens mold in turn, the mold is pressed to the glass substrate of the mother plate, and the UV curing machine is used for curing;
[0022] C3, the optical lens imprinting process of the whole mother plate is completed; the mother plate is placed in the oven for drying, and the optical lens of the mother plate is completed.
[0023] As preferred, in step S3, the temperature of the oven for baking and heat curing is 80°C-120°, and the duration is 1-2 hours.
[0024] As preferred, in step S4, the cooling is natural cooling at room temperature, and the duration is not less than 1 hour.
[0025] As preferred, in step B3, the mother plate is immersed in the pool containing the developing solution for 20 minutes-1 hour.
[0026] As preferred, in step B3, the chemical rinsing solution is DPMA, TMAH or TBAH rinsing solution.
[0027] The beneficial effects of the present application are: (1) the product is produced at wafer level using semiconductor equipment, the yield is high, and the product cost is relatively low; (2) through the mother plate manufacturing, working mold turning and nano-imprinting process, the production line trial production expansion feasibility is high; (3) the nano-fuzzy microstructure obtained by the present application is the same material as the optical lens, and the thermal expansion coefficient and Young's modulus are the same. Therefore, when the product passes through the reliability test of high and low temperature impact, high temperature and high humidity, etc., the whole product is more stable and more likely to pass the reliability test. In addition, the whole optical module can pass through the thermal reflow process without losing the AR function. BRIEF DESCRIPTION OF DRAWINGS
[0028] Figure 1 is a structure schematic diagram of manufacturing the optical lens on the glass substrate of the mother plate in the present application;
[0029] Figure 2 is a structure schematic diagram of manufacturing the nano-fuzzy microstructure on the surface of the optical lens in Figure 1 ;
[0030] Figure 3 is a structure schematic diagram of manufacturing the working mold in the present application;
[0031] Figure 4 is a structure schematic diagram of demolding the working mold in the present application;
[0032] Figure 5 is a structure schematic diagram of imprinting the nano-fuzzy microstructure on the working mold in the present application;
[0033] Figure 6is a structure schematic diagram of the optical lens wafer after demolding in the present application;
[0034] Figure 7 is a contrast reflection curve diagram of the optical lens wafer with or without ARS nano velvet microstructure in the present application;
[0035] In the figure: 1, glass substrate of the mother plate, 2, optical lens of the mother plate, 3, nano velvet microstructure, 4, working mold frame, 5, organic polymer, 6, glass substrate of the working mold, 7, glass substrate. Embodiment
[0036] The technical solutions of the present application will be further specifically described below by specific embodiments and in combination with the drawings:
[0037] Embodiment: A manufacturing process of nano velvet microstructure with anti-reflection effect, the manufacturing process steps are:
[0038] S1, manufacturing of the optical lens mother plate: taking out the glass substrate 1 of the mother plate, manufacturing the optical lens 2 of the mother plate on the glass substrate of the mother plate by means of photoetching or stamping, as shown in Figure 1 ;
[0039] S2, manufacturing of nano velvet microstructure on the optical lens: manufacturing nano velvet microstructure 3 on the surface of the optical lens of the mother plate by dry etching process, as shown in Figure 2 ;
[0040] S3, manufacturing of the working mold: placing the working mold frame 4 outside the glass substrate of the mother plate, pouring the mold material of the mixed and defoamed organic polymer 5 into the working mold frame on the mother plate in the form of casting, attaching the glass substrate 6 of the working mold to the mother plate filled with the mold material, and then putting it into the oven for baking and heat curing, as shown in Figure 3 ;
[0041] S4, demolding of the working mold: taking out the working mold and the module of the mother plate after solidification from the oven and cooling, and using the separation equipment to demold the working mold from the mother plate, at this time the mold plate of the solidified working mold forms a cavity accommodating the shape of the optical lens and the nano velvet microstructure, as shown in Figure 4 ;
[0042] S5, stamping nano velvet microstructure on the optical lens wafer: taking out the glass substrate 7, manufacturing the optical lens wafer on the glass substrate by means of photoetching or stamping, using the automatic dispensing equipment to dispense the transparent glue liquid of the same material as the optical lens wafer into the cavity on the mold plate of the working mold, using the wafer automatic alignment equipment to align the working mold with the transparent glue liquid injected with the optical lens wafer and the glass substrate, and then stamping, using the UV lamp to irradiate to solidify the transparent glue liquid, as shown in Figure 5as shown;
[0043] S6, optical lens wafer demolding: using automatic demolding equipment to separate the optical lens wafer with nano velvet microstructure from the working mold, as shown. Figure 6
[0044] In step S2, the dry etching process step for generating nano velvet microstructure on the optical lens surface of the mother plate is:
[0045] A1, first load the mother plate into the dry etching equipment and use the ESC electrostatic chuck to adsorb and fix the mother plate;
[0046] A2, after adjusting the distance between the mother plate and the radio frequency wave, setting the radio frequency wave power, O2 and N2 flow, etching time and cavity pressure and other parameters, starting the etching program; O2 forms plasma under the action of electromagnetic field, and plasma diffuses to the surface of the mother plate under the action of electromagnetic field, reacts with the optical lens surface of the mother plate, and forms nano velvet microstructure on the optical lens surface of the mother plate.
[0047] In step S1, the process step for making the optical lens of the mother plate by photolithography is:
[0048] B1, after polishing the upper and lower surfaces of the glass substrate of the mother plate, coating or attaching the photosensitive glue;
[0049] B2, convert the mother plate shape design drawing into a file recognizable by the laser gray scale direct writing equipment and program it to import; after focusing, the laser gray scale direct writing equipment performs 3D pattern laser direct writing on the photosensitive glue film position according to the program;
[0050] B3, after exposure, the mother plate is immersed in a pool containing developing solution for a certain period of time, and then placed in a pool containing chemical rinse solution for rinsing; after rinsing, the mother plate is placed in an oven for drying; the optical lens of the mother plate is completed.
[0051] In step S1, the process step for making the optical lens of the mother plate by embossing is:
[0052] C1, after polishing the upper and lower surfaces of the glass substrate of the mother plate, placing the single optical lens mold on the glass substrate of the mother plate;
[0053] C2, sequentially dispensing glue on the single optical lens mold, then pressing the mold onto the glass substrate of the mother plate, and using the UV curing machine to cure;
[0054] C3, complete the optical lens embossing process of the whole mother plate; place the mother plate in an oven for drying, and the optical lens of the mother plate is completed.
[0055] In step S3, the temperature of the oven for baking and curing is 80°C-120°, and the duration is 1-2 hours.
[0056] In step S4, the cooling is performed by natural cooling at room temperature for a duration of not less than 1 hour.
[0057] In step B3, the mother plate is immersed in a pool containing developing solution for 20 minutes to 1 hour.
[0058] In step B3, the chemical rinsing solution is DPMA, TMAH, or TBAH rinsing solution.
[0059] like Figure 7 The figure shows a comparison of the reflection curves of optical lenses without and with ARS nanofiber microstructures. As can be seen, the surface reflectivity of the optical lens without ARS nanofiber microstructures is significantly higher than that of the optical lens with ARS nanofiber microstructures. Optical lenses with ARS nanofiber microstructures avoid or reduce this reflection phenomenon, exhibiting excellent performance. Furthermore, compared to the traditional method of applying an AR film to the lens surface using PVD, the nanofiber microstructure obtained in this invention is made of the same material as the optical lens, with the same coefficient of thermal expansion and Young's modulus. Therefore, the entire product is more stable and more likely to pass reliability tests such as high and low temperature shock and high temperature and humidity tests. In addition, the entire optical module can undergo a thermal reflow process without losing its AR performance.
[0060] The embodiments described above are merely preferred embodiments of the present invention and are not intended to limit the present invention in any way. Other variations and modifications are possible without departing from the technical solutions described in the claims.
Claims
1. A process for producing a nano-flocked microstructure having an anti-reflective effect, characterized by, The manufacturing process steps are as follows: S1, manufacturing of the optical lens mother plate: taking the glass substrate of the mother plate, manufacturing the optical lens of the mother plate on the glass substrate of the mother plate by means of photoetching or stamping; S2, manufacturing of the nano-fleece microstructure on the optical lens: manufacturing the nano-fleece microstructure on the surface of the optical lens of the mother plate by means of dry etching process; S3, manufacturing of the working mold: arranging the working mold frame outside the glass substrate of the mother plate, pouring the mold material of the mixed and defoamed organic high polymer into the working mold frame on the mother plate in a casting manner, pasting the glass substrate of the working mold on the mother plate filled with the mold material, and then putting into the oven for baking and heat curing; S4, demolding of the working mold: taking out the mold group of the cured working mold and the mother plate from the oven and cooling, and then demolding the working mold from the mother plate by using the separating equipment, at this time, the mold plate of the cured working mold forms a cavity accommodating the shape of the optical lens and the nano-fleece microstructure; S5, stamping of the nano-fleece microstructure on the optical lens wafer: taking out the glass substrate, manufacturing the optical lens wafer on the glass substrate by means of photoetching or stamping, using the automatic dispensing equipment to dispense the transparent glue liquid of the same material as the optical lens wafer into the cavity on the mold plate of the working mold, and then using the wafer automatic alignment equipment to align the working mold with the transparent glue liquid injected into the cavity with the optical lens wafer and the glass substrate, and then stamping, and using the UV lamp to irradiate so as to cure the transparent glue liquid; S6, demolding of the optical lens wafer: using the automatic demolding equipment to separate the optical lens wafer with the nano-fleece microstructure from the working mold.
2. The fabrication process of the anti-reflective nanofiber microstructure according to claim 1, characterized in that, In step S2, the dry etching process step for manufacturing the nano-fleece microstructure on the surface of the optical lens of the mother plate is as follows: A1, first, the mother plate is loaded into the dry etching equipment and is adsorbed and fixed by using the ESC electrostatic chuck; A2, after adjusting the distance between the mother plate and the radio frequency wave, setting the radio frequency wave power, O2 and N2 flow, etching time and cavity pressure and other parameters, starting the etching program; O2 forms plasma under the action of electromagnetic field, and the plasma diffuses to the surface of the mother plate under the action of electromagnetic field, reacts with the surface of the optical lens of the mother plate, and forms the nano-fleece microstructure on the surface of the optical lens of the mother plate; A3, the generated gas byproducts are pumped away, and the etching process is ended, and the mother plate is unloaded.
3. The fabrication process of the anti-reflective nanofiber microstructure according to claim 1, characterized in that, In step S1, the process step for manufacturing the optical lens of the mother plate by means of photoetching is as follows: B1, after polishing the upper and lower surfaces of the glass substrate of the mother plate, coating or attaching the photosensitive glue; B2, converting the mother plate shape design drawing into a file recognizable by the laser gray scale direct writing equipment and programming and importing; after focusing, the laser gray scale direct writing equipment performs 3D pattern laser direct writing on the position of the photosensitive glue film according to the program; B3, after exposing the mother plate, soaking it in the pool containing the developing solution for a certain time, and then putting it into the pool added with the chemical washing liquid for washing; after washing, the mother plate is put into the baking oven for drying; the manufacturing of the optical lens of the mother plate is completed.
4. The process for making nano-porous microstructure with anti-reflective effect according to claim 1, wherein the process is characterized by, In step S1, the process step for manufacturing the optical lens of the mother plate by means of stamping is as follows: C1, after polishing the upper and lower surfaces of the glass substrate of the mother plate, arranging the single optical lens mold on the glass substrate of the mother plate; C2, glue the monomer optical lens mold in turn, and press the mold to the glass substrate of the mother plate, and use the UV curing machine to cure; C3, complete the optical lens stamping process of the whole mother plate; put the mother plate into the oven for drying, and the optical lens of the mother plate is completed.
5. The fabrication process of the anti-reflective nanofiber microstructure according to claim 1, characterized in that, In step S3, the temperature of the oven for baking and heat curing is 80°C-120°C, and the duration is 1-2 hours.
6. The process for making nano-porous microstructure with anti-reflective effect according to claim 1, wherein the process is characterized by, In step S4, the cooling is natural cooling at room temperature, and the duration is not less than 1 hour.
7. The process for making nano-flocked microstructures with anti-reflective effect according to claim 3, wherein the process is characterized by, In step B3, the mother plate is immersed in the pool containing the developing solution for 20 minutes-1 hour.
8. The process for making nano-porous microstructure with anti-reflective effect according to claim 3, wherein the process is characterized by, In step B3, the chemical rinsing solution is DPMA, TMAH or TBAH rinsing solution.
Citation Information
Patent Citations
Process for manufacturing sub-template by using mother board made of photosensitive material and then manufacturing working mold
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Method for manufacturing Anti-reflection layer
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