A combined high-precision six-dimensional force sensor structure capable of realizing a sputtering process

Abstract

The application discloses a combined high-precision six-dimensional force sensor structure capable of realizing a sputtering process, which comprises a cross beam, a double U-shaped beam, a base, a top cover, a bottom cover and strain gauges, 24 strain gauges are sputtered on the main beam to form six groups of Wheatstone bridges, three groups of which are arranged on the cross beam and the other three groups of which are arranged on the double U-shaped beam; the measurement principle of the six-dimensional force sensor is that an input force / torque in a certain dimension acts on the center of the cross beam and the center of the double U-shaped beam through a force applying hole, so that the sensor is deformed, the resistance of the strain gauges at the corresponding positions is changed, and then the output voltage of the corresponding bridge is changed.

Description

Technical Field

[0001] This invention belongs to the field of sensor technology, specifically relating to a combined high-precision six-dimensional force sensor structure that can realize sputtering process. Background Technology

[0002] Multidimensional force sensors can simultaneously sense force and torque components in multiple dimensions of space, thereby acquiring complete force information in complex systems. They are widely used in fields such as intelligent robots, aerospace, automotive, and medical applications. Resistance strain gauge multidimensional force sensors based on a crossbeam structure are currently the most widely used. They convert the deformation caused by the force applied to the sensor into voltage changes through strain gauges, thus achieving the measurement of force and torque components.

[0003] Since most of the multidimensional force sensors currently being developed use the traditional strain gauge bonding method, which has problems such as low temperature range and performance degradation due to adhesive evaporation and condensation, it is of great practical significance to use sputtering technology to sputter strain gauges. Summary of the Invention

[0004] To address the aforementioned issues, this invention discloses a combined high-precision six-dimensional force sensor structure capable of sputtering processes, which features high sensitivity and low inter-dimensional coupling, making it suitable for multi-dimensional force measurement in the aerospace field.

[0005] To achieve the above objectives, the technical solution of the present invention is as follows:

[0006] A combined high-precision six-dimensional force sensor structure capable of sputtering processes includes a cross beam, a double U-shaped beam, a base, a top cover, a bottom cover, and strain gauges.

[0007] The cross beam consists of a central platform, a first main beam, a first floating beam, and square corners. The central platform is a cuboid column with a square cross-section. It has four force-applying holes and four connecting holes. Forces and moments are applied to the central platform through the force-applying holes. The upper surface of the central platform is connected to the double U-shaped beam through the four connecting holes. The four sides of the central platform are connected to the first main beam. The first main beam consists of four rectangular crossbeams with square cross-sections. One end of the first main beam is connected to the central platform, and the other end is connected to the first floating beam. The first floating beam consists of four rectangular thin-walled beams with rectangular cross-sections. The center of the inner side of the first floating beam is connected to the first main beam, and both ends are connected to the square corners. The square corners are four cuboid columns with square cross-sections. Each square corner has four connecting holes for connecting to the central boss of the base. The central platform is located in the middle of the cross beam, and the first floating beams are located on the outer perimeter of the cross beam.

[0008] The double U-shaped beam consists of an upper U-shaped beam and a lower U-shaped beam. The upper U-shaped beam consists of a second main beam, a second floating beam, and a first support. The second main beam is a rectangular crossbeam with a groove at the bottom center. Near the center of the second main beam are two threaded holes. The lower bottom boss of the second main beam is threaded to the cross beam, the upper surface is connected to the top cover, the groove is connected to the lower U-shaped beam, and both ends of the second main beam are connected to the second floating beam. The second floating beam consists of two rectangular thin-walled beams with rectangular cross-sections. The upper end is connected to the main beam, and the lower end is connected to the first support. The first support has two connecting holes for connecting to… The base has a central boss; the lower U-shaped beam consists of a third main beam, a third floating beam, and a second support; the third main beam is a rectangular crossbeam with a groove at the top center; the third main beam has two threaded holes near its center; the lower bottom boss of the third main beam is threaded to the cross beam; the upper surface is connected to the top cover; the groove is connected to the upper U-shaped beam; and both ends of the third main beam are connected to the third floating beam; the third floating beam consists of two rectangular thin-walled beams with rectangular cross-sections, connected at the top to the main beam and at the bottom to the second support; the second support has two connecting holes for connecting to the central boss of the base.

[0009] The upper and lower U-shaped beams of the double U-shaped beam are interference-fitted with grooves; the double U-shaped beams are connected to the cross beams via threaded connections; the square corner connection holes of the cross beams are threaded to the central boss of the base; the connection holes of the first and second legs of the double U-shaped beams are threaded to the central boss of the base; the top cover is connected to the force application holes of the cross beams via threaded connections; the bottom cover is connected to the base via mounting holes.

[0010] The measurement principle of the combined six-dimensional force sensor is as follows: 24 strain gauges are sputtered onto the main beam to form 6 sets of Wheatstone bridges, 3 sets on the cross beam and 3 sets on the double U-shaped beam. Specifically, 4 strain gauges on the sidewall near the center of the second main beam form a bridge circuit for measuring the force Fx in the X direction; 4 strain gauges on the sidewall near the center of the third main beam form a bridge circuit for measuring the force Fy in the Y direction; 4 strain gauges on the upper and lower surfaces of the two crossbeams in the X direction of the first main beam near the center form a bridge circuit for measuring the force Fz in the Z direction; 4 strain gauges on the upper and lower surfaces of the two crossbeams in the Y direction of the first main beam away from the center form a bridge circuit for measuring the torque Mx in the X direction; 4 strain gauges on the upper and lower surfaces of the two crossbeams in the X direction of the first main beam away from the center form a bridge circuit for measuring the torque My in the Y direction; and 4 strain gauges on the sidewall away from the center of the second main beam form a bridge circuit for measuring the torque Mz in the Z direction. When a force / torque in a certain dimension is applied to the center of the crossbeam, the sensor deforms, and the resistance of the strain gauge at the corresponding position changes, causing the output voltage of the corresponding bridge to change. The value of the force / torque in that dimension can be obtained by measuring the change in voltage.

[0011] The beneficial effects of this invention are:

[0012] (1) The combined six-dimensional force sensor designed in this invention, which can realize sputtering process, avoids the problems of low stability and poor temperature and humidity resistance of multi-dimensional force sensors when using the patch method, and improves the stability of the sensor.

[0013] (2) The combined six-dimensional force sensor designed in this invention, which can realize sputtering process, is based on the principle of resistance strain, and the sensitive part adopts a rectangular beam structure, which has high measurement sensitivity.

[0014] (3) The combined six-dimensional force sensor designed in this invention for sputtering process adopts a combination structure of cross beam and double U-shaped beam, and at the same time adopts the combination of main beam and floating beam, which effectively reduces inter-dimensional coupling error and has good measurement accuracy.

[0015] (4) The combined six-dimensional force sensor designed in this invention, which can realize sputtering process, has a simple structure and is easy to process. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the cross beam structure of the present invention.

[0017] Figure 2 This is a schematic diagram of the upper U-shaped beam of the present invention.

[0018] Figure 3 This is a schematic diagram of the lower U-shaped beam of the present invention.

[0019] Figure 4 This is a schematic diagram of the base structure of the present invention.

[0020] Figure 5 This is an assembly diagram of the present invention. Figure 1 .

[0021] Figure 6 This is an assembly diagram of the present invention. Figure 2 .

[0022] Figure 7 This is a schematic diagram showing the location of the strain gauge patch in this invention.

[0023] Figure 8 This is a schematic diagram of the six bridge circuits in this invention.

[0024] List of identifiers in attached diagrams:

[0025] 10. Cross beam, 11. Center platform, 12. First main beam, 13. First floating beam, 14. Square corner, 15. Strain gauge, 16-1, 16-2, 16-3, 16-4. Force application hole, 20. Double U-shaped beam, 30. Upper U-shaped beam, 31. Second main beam, 32. Second floating beam, 33. First support, 40. Lower U-shaped beam, 41. Third main beam, 42. Third floating beam, 43. Second support, 51. Base, 50. Top cover, 52. Bottom cover, 53. Central boss. Detailed Implementation

[0026] The present invention will be further illustrated below with reference to the accompanying drawings and specific embodiments. It should be understood that the following specific embodiments are for illustrative purposes only and are not intended to limit the scope of the present invention.

[0027] like Figure 1 and Figure 5 As shown, to facilitate the description of direction, a structure is established as follows: Figure 1 The spatial Cartesian coordinate system is shown. This invention proposes a combined six-dimensional force sensor capable of sputtering processes, comprising a cross beam 10, a double U-shaped beam 20, a base 51, a top cover 50, a bottom cover 52, and strain gauges 15;

[0028] like Figure 1 As shown, the cross beam 10 consists of a central platform 11, a first main beam 12, a first floating beam 13, and a square corner 14. The central platform 11 is a cuboid column with a square cross-section. The central platform 11 has four force application holes 16-1 / 2 / 3 / 4 and four connecting holes. Forces and moments are applied to the central platform 11 through the force application holes 16-1 / 2 / 3 / 4. The upper surface of the central platform 11 is connected to the double U-shaped beam 20 through the four connecting holes. The four sides of the central platform 11 are connected to the first main beam 12. The first main beam 12 consists of four rectangular crossbeams. The cross section is square; one end of the first main beam 12 is connected to the central platform 11, and the other end is connected to the first floating beam 13; the first floating beam 13 consists of four rectangular thin-walled beams with rectangular cross sections; the center of the inner side of the first floating beam 13 is connected to the first main beam 12, and both ends are connected to the square corner 14; the square corner 14 consists of four cuboid columns with square cross sections; the square corner 14 has four connecting holes for connecting to the central boss 53 of the base 51; the central platform 11 is located in the middle of the cross beam 10, and the first floating beam 13 is located on the periphery of the cross beam 10;

[0029] like Figure 2 and Figure 3As shown, the double U-shaped beam 20 consists of an upper U-shaped beam 30 and a lower U-shaped beam 40; the upper U-shaped beam 30 consists of a second main beam 31, a second floating beam 32, and a first support 33; the second main beam 31 is a rectangular crossbeam with a groove at the bottom center; the second main beam 31 has two threaded holes near its center; the lower bottom boss of the second main beam 31 is threaded to the cross beam 10, the upper surface is connected to the top cover 50, the groove is connected to the lower U-shaped beam 40, and both ends of the second main beam 31 are connected to the second floating beam 32; the second floating beam 32 consists of two rectangular thin-walled beams with rectangular cross-sections, the upper end of which is connected to the second main beam 31, and the lower end of which is connected to the first support 33; the first support 33 has two connecting holes for connecting to... The base 51 is connected to the central boss 53; the lower U-shaped beam 40 is composed of a third main beam 41, a third floating beam 42, and a second support 43; the third main beam 41 is a rectangular crossbeam with a groove at the top center; the third main beam 41 has two threaded holes near the center; the lower bottom boss of the third main beam 41 is threaded to the cross beam 10; the upper surface is connected to the top cover 50; the groove is connected to the upper U-shaped beam 30; both ends of the third main beam 41 are connected to the third floating beam 42; the third floating beam 42 is two rectangular thin-walled beams with rectangular cross-sections; the upper end is connected to the third main beam 41, and the lower end is connected to the second support 43; the second support 43 has two connecting holes for connecting to the central boss 53 of the base 51.

[0030] like Figure 5 As shown, the upper U-shaped beam 30 and lower U-shaped beam 40 of the double U-shaped beam 20 are interference-fitted by grooves; the double U-shaped beam 20 is connected to the connecting hole of the cross beam 10 by a threaded connection; the connecting hole of the square corner 14 of the cross beam 10 is threaded to the central boss 53 of the base 51; the connecting holes of the first support leg 33 and the second support leg 43 of the double U-shaped beam 20 are threaded to the central boss 53 of the base 51; the top cover 50 is connected to the force application holes 16-1 / 2 / 3 / 4 of the cross beam 10 by a threaded connection; the bottom cover 52 is connected to the base 51 through the mounting hole;

[0031] Figure 7The diagram shows the placement positions and corresponding numbers R1 to R24 of the 24 strain gauges described in this invention. All strain gauges are identical except for their numbers; they have the same initial resistance, decrease during contraction, and increase during extension. The strain gauges are sputtered onto the locations of maximum strain on each main beam under stress. Strain gauges R1 and R7 are sputtered on the upper and lower surfaces of the first main beam located on the rectangular crossbeam in the negative X direction near the center platform; strain gauges R3 and R9 are sputtered on the upper and lower surfaces of the first main beam located on the rectangular crossbeam in the positive X direction near the center platform; strain gauges R2 and R8 are sputtered on the upper and lower surfaces of the first main beam located on the rectangular crossbeam in the positive Y direction away from the center platform; strain gauges R4 and R10 are sputtered on the upper and lower surfaces of the first main beam located on the rectangular crossbeam in the negative Y direction away from the center platform; strain gauges R5 and R11 are sputtered on the upper and lower surfaces of the first main beam located on the rectangular crossbeam in the positive X direction away from the center platform; strain gauges R6 and R12 are sputtered on the upper and lower surfaces of the first main beam located on the rectangular crossbeam in the negative X direction away from the center platform; strain gauges R13 and R14 are sputtered on... The second main beam is located on the left and right sidewalls of the rectangular crossbeam in the positive Y direction, near the center. Strain gauges R15 and R16 are sputtered on the left and right sidewalls of the second main beam in the negative Y direction, near the center. Strain gauges R17 and R19 are sputtered on the left and right sidewalls of the third main beam in the positive X direction, near the center. Strain gauges R21 and R23 are sputtered on the left and right sidewalls of the third main beam in the negative X direction, near the center. Strain gauges R18 and R20 are sputtered on the left and right sidewalls of the second main beam in the positive Y direction, away from the center. Strain gauges R22 and R24 are sputtered on the left and right sidewalls of the second main beam in the negative Y direction, away from the center. All strain gauges are sputtered at the locations of maximum strain on each beam under stress.

[0032] Figure 8 The diagram shows six Wheatstone bridges composed of strain gauges with six channels. Strain gauges R13, R14, R15, and R16 form a Wheatstone bridge for measuring the force Fx in the X direction; strain gauges R17, R19, R21, and R23 form a Wheatstone bridge for measuring the force Fy in the Y direction; strain gauges R1, R3, R7, and R9 form a Wheatstone bridge for measuring the force Fz in the Z direction; strain gauges R2, R4, R8, and R10 form a Wheatstone bridge for measuring the torque Mx in the X direction; strain gauges R5, R6, R11, and R12 form a Wheatstone bridge for measuring the torque My in the Y direction; and strain gauges R18, R20, R22, and R24 form a Wheatstone bridge for measuring the torque Mz in the Z direction.

[0033] The measurement principle of the six-dimensional force sensor is as follows: an input force / torque in one dimension acts on the center of the cross beam and the center of the double U-shaped beam through a force application hole, causing deformation of the sensor. This results in a change in the resistance of the strain gauge at the corresponding position, which in turn changes the output voltage of the corresponding bridge circuit. Simultaneously, due to the structural design, the output voltages in other dimensions do not change significantly, effectively reducing inter-dimensional coupling interference and thus improving the sensor's measurement accuracy. Therefore, in use, only the voltage changes of all six channels need to be measured to obtain the force / torque values ​​for each dimension. Let R0 represent the zero-position resistance value of the strain gauge, and ΔR... Fx ΔR Fy ΔR Fz ΔR Mx ΔR My ΔR Mz Let Fx, Fy, Fz, Mx, My, and Mz represent the changes in resistance of the strain gauges under the influence of Fx, Fy, Fz, Mx, My, and Mz, respectively. The changes in the output voltage of each channel are then expressed by the following formula:

[0034]

[0035] It should be noted that the above content merely illustrates the technical concept of the present invention and should not be construed as limiting the scope of protection of the present invention. For those skilled in the art, various improvements and modifications can be made without departing from the principle of the present invention, and all such improvements and modifications fall within the scope of protection of the claims of the present invention.

Claims

1. A combined high-precision six-dimensional force sensor structure capable of sputtering processes, characterized in that: It includes a cross beam (10), a double U-shaped beam (20), a base (51), a top cover (50), a bottom cover (52), and strain gauges (15); The cross beam (10) consists of a central platform (11), a first main beam (12), a first floating beam (13), and a square corner (14). The central platform (11) is a cuboid column with a square cross section. The central platform (11) has four force application holes (16-1 / 2 / 3 / 4) and four connection holes. Force and torque are applied to the central platform (11) through the force application holes (16-1 / 2 / 3 / 4). The upper surface of the central platform (11) is connected to the double U-shaped beam (20) through the four connection holes. The four sides of the central platform (11) are connected to the first main beam (12). The first main beam (12) consists of four rectangular cross beams with a cross section of 16-1 / 2 / 3 / 4. The surface is square; one end of the first main beam (12) is connected to the central platform (11), and the other end is connected to the first floating beam (13); the first floating beam (13) is 4 rectangular thin-walled beams with rectangular cross sections; the center of the inner side of the first floating beam (13) is connected to the first main beam (12), and both ends are connected to the square corner (14); the square corner (14) is 4 cuboid columns with square cross sections; there are 4 connecting holes on the square corner (14) for connecting to the central boss (53) of the base (51); the central platform (11) is in the middle of the cross beam (10), and the first floating beam (13) is on the periphery of the cross beam (10); The double U-shaped beam (20) is composed of an upper U-shaped beam (30) and a lower U-shaped beam (40); the upper U-shaped beam (30) is composed of a second main beam (31), a second floating beam (32), and a first support (33); the second main beam (31) is a rectangular crossbeam with a groove at the bottom center; the second main beam (31) has two threaded holes near the center; the bottom boss of the second main beam (31) is threaded to the cross beam (10); the upper surface is connected to the top cover (50); the groove is connected to the lower U-shaped beam (40); the two ends of the second main beam (31) are connected to the second floating beam (32); the second floating beam (32) is two rectangular thin-walled beams with rectangular cross sections; the upper end is connected to the second main beam (31); the lower end is connected to the first support (33); the first support (33) has two connecting holes for connecting to the base. (51) is connected to the central boss (53); the lower U-shaped beam (40) is composed of the third main beam (41), the third floating beam (42) and the second support (43); the third main beam (41) is a rectangular crossbeam with a groove at the top; the third main beam (41) has two threaded holes near the center; the lower bottom boss of the third main beam (41) is threaded to the cross beam (10); the upper surface is connected to the top cover (50); the groove is connected to the upper U-shaped beam (30); the two ends of the third main beam (41) are connected to the third floating beam (42); the third floating beam (42) is two rectangular thin-walled beams with a rectangular cross section; the upper end is connected to the third main beam (41) and the lower end is connected to the second support (43); the second support (43) has two connecting holes for connecting to the central boss (53) of the base (51); The upper U-shaped beam (30) and lower U-shaped beam (40) of the double U-shaped beam (20) are fitted with a groove interference fit; the double U-shaped beam (20) is connected to the connecting hole of the cross beam (10) by a threaded connection; the square corner (14) connecting hole of the cross beam (10) is threaded to the central boss (53) of the base (51); the first leg (33) and the second leg (43) connecting hole of the double U-shaped beam (20) are threaded to the central boss (53) of the base (51); the top cover (50) is connected to the force application hole (16-1 / 2 / 3 / 4) of the cross beam (10) by a threaded connection; the bottom cover (52) is connected to the base (51) by a mounting hole; A total of 24 identical strain gauges, numbered R1 to R24, were sputtered onto the locations of maximum strain on each main beam under stress. Strain gauges R1 and R7 were sputtered onto the upper and lower surfaces of the rectangular crossbeam near the center platform in the negative X direction of the first main beam (12). Strain gauges R3 and R9 were sputtered onto the upper and lower surfaces of the rectangular crossbeam near the center platform in the positive X direction of the first main beam (12). Strain gauges R2 and R8 were sputtered onto the upper and lower surfaces of the rectangular crossbeam away from the center platform in the positive Y direction of the first main beam (12). Strain gauges R4 and R10 were sputtered onto the upper and lower surfaces of the rectangular crossbeam away from the center platform in the negative Y direction of the first main beam (12). Strain gauges R5 and R11 were sputtered onto the upper and lower surfaces of the rectangular crossbeam away from the center platform in the positive X direction of the first main beam (12). Strain gauges R6 and R12 were sputtered onto the upper and lower surfaces of the rectangular crossbeam away from the center platform in the positive X direction of the first main beam (12). Strain gauges R13 and R14 are sputtered on the upper and lower surfaces of the rectangular beam in the negative X direction away from the center platform. Strain gauges R15 and R16 are sputtered on the left and right sidewalls of the rectangular beam in the positive Y direction near the center of the second main beam (31). Strain gauges R17 and R19 are sputtered on the left and right sidewalls of the rectangular beam in the negative Y direction near the center of the third main beam (41). Strain gauges R21 and R23 are sputtered on the left and right sidewalls of the rectangular beam in the negative X direction near the center of the third main beam (41). Strain gauges R18 and R20 are sputtered on the left and right sidewalls of the rectangular beam in the positive Y direction away from the center of the second main beam (31). Strain gauges R22 and R24 are sputtered on the left and right sidewalls of the rectangular beam in the negative Y direction away from the center of the second main beam (31).

2. The measurement principle of the combined high-precision six-dimensional force sensor structure for sputtering processes as described in claim 1, characterized in that: Twenty-four strain gauges were sputtered onto the main beam, forming six Wheatstone bridges: three on the crossbeam and three on the double U-shaped beam. Specifically, four strain gauges were placed on the second main beam near the center sidewall, forming a bridge circuit to measure the force Fx in the X direction; four strain gauges were placed on the third main beam near the center sidewall, forming a bridge circuit to measure the force Fy in the Y direction; four strain gauges were placed on the upper and lower surfaces of the two crossbeams in the X direction of the first main beam near the center platform, forming a bridge circuit to measure the force Fz in the Z direction; and four strain gauges were placed on the upper and lower surfaces of the two crossbeams in the Y direction of the first main beam away from the center platform. A bridge circuit is formed to measure the torque Mx in the X direction; four strain gauges on the upper and lower surfaces of the two crossbeams in the X direction of the first main beam, away from the center platform, form a bridge circuit to measure the torque My in the Y direction; four strain gauges on the side wall of the second main beam away from the center form a bridge circuit to measure the torque Mz in the Z direction; when a force / torque in a certain dimension is applied to the center of the crossbeam, the sensor deforms, the resistance of the strain gauge at the corresponding position changes, causing the output voltage of the corresponding bridge to change, and the value of the force / torque in that dimension can be obtained by measuring the change in voltage.

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