Wiring structure and wiring method of lithography machine bearing table positioning component

Abstract

The application discloses a wiring structure and a wiring method of a positioning component of a lithography machine bearing table, and belongs to the technical field of lithography machines. The wiring structure of the positioning component of the lithography machine bearing table is arranged in a working chamber enclosed by a shell of the lithography machine. The positioning component comprises a processing device and a probe assembly. The processing device is arranged on an inner wall of the working chamber. The probe assembly is installed on a base at the bottom of the bearing table. The probe assembly is connected with a first connecting wire harness to be connected with a connecting interface on the processing device. By adjusting the installation position of the processing device and the wiring position between the processing device and the probe assembly, when the probe assembly is disassembled, only the probe assembly needs to be disassembled. The new connecting wire harness is driven to the connecting interface of the processing device by the connecting wire harness to be removed to realize connection. Therefore, the purpose of shortening the replacement time and improving the work efficiency is achieved.

Description

Technical Field

[0001] This invention relates to the field of lithography machine technology, and in particular to a wiring structure and wiring method for a positioning component of a lithography machine stage. Background Technology

[0002] The coarse positioning light-emitting component of the lithography machine stage is a slow consumable. After a service life of 5 years, it will continue to degrade with the use of time. When the degradation reaches a certain level, it will cause the stage to become inaccurate in positioning, thus requiring the replacement of the coarse positioning light-emitting component.

[0003] For reference Figure 1 The diagram shows a perspective view of the base with the coarse positioning light-emitting component installed, and... Figure 2 The schematic diagram shows that the coarse positioning luminous component includes a probe assembly 02 and a processing device 03. The probe assembly 02 is located on top of the fixed plate 01. Due to the design structure of the base in the prior art, during the replacement process, it is necessary not only to remove the exposed probe assembly 02, but also to remove the fixed plate 01 and the air compressor box (not shown) at the bottom, the maintenance plate 04, and even the caster frame 05, so that the interface between the processing device 03 and the probe assembly 02 can be exposed. Only then can the lead wire of the probe assembly 02 and the corresponding processing device 03 be disconnected or connected. After removing the numerous surrounding accessories, the time required for reinstallation and adjustment of the equipment accuracy is at least 3 days. Other problems such as component damage may also occur during the disassembly and assembly process. Summary of the Invention

[0004] The purpose of this invention is to provide a wiring structure and wiring method for a positioning component of a lithography machine stage, so as to solve the problem of long replacement time for probe components.

[0005] To solve the above-mentioned technical problems, the present invention provides a wiring structure for a positioning component of a lithography machine stage, which is disposed in the working chamber enclosed by the outer shell of the lithography machine. The positioning component includes a processing device and a probe assembly. The processing device is disposed on the inner wall of the working chamber, and the probe assembly is mounted on a base at the bottom of the stage. The probe assembly has a first connecting wire harness connected to it to connect to the connection interface on the processing device.

[0006] Preferably, the processing device includes an amplifier and an encoder.

[0007] Preferably, the base further includes a fixed plate and a maintenance plate. The top of the fixed plate has several grooves, the probe assembly is disposed in the grooves, and the bottom of the fixed plate is connected to the maintenance plate.

[0008] Preferably, both the groove and the maintenance plate have through holes to accommodate the first connecting wire harness, allowing the first connecting wire harness to pass through.

[0009] Preferably, it further includes a wire sleeve, which is sleeved outside the first connecting wire harness, and the inner wall of the wire sleeve is clearance-fitted with the first connecting wire harness. The two ends of the wire sleeve are respectively connected to the through holes in the groove and the maintenance plate.

[0010] The present invention also provides a lithography machine, including the wiring structure of the lithography machine stage positioning component described above.

[0011] The present invention also provides a wiring method for a positioning component of a lithography machine stage. The positioning component is disposed in a working chamber enclosed by the outer shell of the lithography machine. The positioning component includes a processing device and a probe assembly. The processing device is disposed on the inner wall of the working chamber. The probe assembly is mounted on a base at the bottom of the stage. The probe assembly has a first connecting wire harness extending from it. The end of the first connecting wire harness away from the probe assembly passes through the bottom of the base to mate with a connection interface on the processing device. The method further includes the following steps:

[0012] Raise the support platform to expose the probe assembly to be removed from its bottom;

[0013] Disconnect the probe assembly to be removed from the first connecting harness, remove the probe assembly to be removed and expose the connector of the first connecting harness;

[0014] Connect the end of the second connecting wire harness that comes out of the new probe assembly to the connector of the first connecting wire harness.

[0015] Drag the first connecting harness close to one end of the processing device until the second connecting harness is pulled out to the processing device, disconnect the connection between the first connecting harness and the processing device, connect the second connecting harness and the processing device, and install the new probe assembly on the base.

[0016] Preferably, the processing device includes an amplifier and an encoder.

[0017] Preferably, the base further includes a fixed plate and a maintenance plate. The top of the fixed plate has several grooves for mounting the probe assembly, and the bottom of the fixed plate is connected to the maintenance plate.

[0018] Preferably, both the groove and the maintenance plate have through holes to accommodate the first connecting wire harness, allowing the first connecting wire harness to pass through.

[0019] In the wiring structure and wiring method of the lithography machine carrier stage positioning component provided by the present invention, by modifying the existing wiring method and adjusting the position of the processing device and the wiring with the probe assembly, it is possible to achieve the goal of not having to remove many accessories such as the air compressor box during the replacement of the probe assembly, which greatly shortens the working time and avoids other faults caused during disassembly and assembly, such as accuracy jump after the work, which leads to abnormal product quality. Attached Figure Description

[0020] Figure 1 This is a three-dimensional model of the base used to mount the coarse positioning light-emitting components of a current lithography machine;

[0021] Figure 2 This is a schematic diagram of the base of the coarse positioning light-emitting component in a current lithography machine;

[0022] Figure 3 This is a schematic diagram of one embodiment provided by the present invention.

[0023] In the picture,

[0024] 01. Fixed plate; 02. Probe assembly; 03. Processing device; 04. Maintenance plate; 05. Caster frame.

[0025] 1. Fixed plate; 2. Probe assembly; 3. First connecting harness; 4. Processing device; 5. Caster frame; 6. Maintenance plate; 7. Inner wall. Detailed Implementation

[0026] The wiring structure and wiring method of the lithography machine stage positioning component proposed in this invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of this invention will become clearer from the following description and claims. It should be noted that the drawings are all in a very simplified form and use non-precise proportions, and are only used to facilitate and clarify the illustration of the embodiments of this invention.

[0027] The inventors discovered that the NIKONNSR (S210D / S310F) lithography machine has eight sensorheads mounted on its base to work with a grating ruler for coarse positioning of the stage. The sensorheads are at least partially exposed on the base's mounting plate (located at the bottom of the stage).

[0028] Further research by the inventors revealed that prolonged use could lead to inaccurate positioning of the sensor probe, necessitating its replacement. However, due to the structure of the NIKON machine, the connection interface between the sensor probe and the central processing unit, such as the amplifier, is located on the amplifier, which is deeply embedded within the base. Connecting the new sensor probe's leads to the amplifier and other central processing units requires removing auxiliary devices such as the mounting plate, air compressor box, and caster frame before wiring can be performed. This involves disconnecting the amplifier and sensor probe within a confined space, replacing the sensor probe, and then reconnecting them. After wiring, the entire structure needs to be reassembled. This process is not only time-consuming but also requires a certain level of precision in the wiring operation. Furthermore, after reassembling the structure, the machine needs to be readjusted to maintain the original operational accuracy.

[0029] Based on this, the core idea of ​​this invention is to modify the original wiring method of the positioning component of the lithography machine carrier stage, and set the encoder and other central processing devices in the inner wall of the lithography machine chamber. Based on the existing structure of the bottom base of the wafer carrier stage, the wiring method of the positioning component is changed accordingly, thereby facilitating the replacement of individual probe components, shortening the time spent, and saving component costs.

[0030] For details, please refer to Figure 3 This is a schematic diagram of an embodiment of the present invention. Figure 3 As shown, a wiring structure for a positioning component of a lithography machine carrier stage is provided in the working chamber enclosed by the outer shell of the lithography machine. The positioning component includes a processing device 4 and a probe assembly 2. The processing device 4 is provided on the inner wall 7 of the working chamber, and the probe assembly 2 is installed on the base at the bottom of the carrier stage. The probe assembly 2 has a first connecting wire harness 3 connected to it to connect with the connection interface on the processing device 4.

[0031] In one embodiment, a processing device 4 for receiving and processing data from the probe assembly 2 is mounted on the inner wall 7 of the working chamber, exposing the connection interface of the processing device 4. A first connecting harness 3 extends from the probe assembly 2, passing through the fixed plate 1 and connecting to the processing device 4. Therefore, during the replacement of the probe assembly 2, the probe assembly 2 can be directly removed, exposing the end of the first connecting harness 3. A new connecting harness is then connected to the first connecting harness 3. The first connecting harness 3 and the new connecting harness on it are slowly pulled from one end of the processing device 4 until the new connecting harness reaches the connection interface of the processing device 4. The first connecting harness 3 is then removed, and the new connecting harness is installed and fixed. In this way, it is not necessary to remove other obstructing components such as the fixed plate 1 and the maintenance plate 6. Moreover, the current space conditions of the lithography machine support this replacement method, which can significantly reduce the work and recovery time, shortening the original replacement time from three days to at least eight hours. Furthermore, problematic light-emitting components can be replaced during machine PM (maintenance) periods, reducing unplanned downtime and increasing machine uptime.

[0032] After adopting the method provided in this application, the circuit can be modified in conjunction with the construction work. The processing device 4 and the connecting wire harness can be installed into the lithography machine accordingly. Once the test signal connection is normal, it can be put into use. This facilitates regular inspection of the attenuation of the probe assembly 2 and allows for quick replacement of damaged components.

[0033] Specifically, the processing device 4 includes an amplifier and an encoder. Here, the amplifier and encoder are connected to the probe assembly 2, and the encoder is generally embedded in the amplifier.

[0034] Specifically, the base also includes a fixed plate 1 and a maintenance plate 6. The top of the fixed plate 1 has several grooves, and the probe assembly 2 is placed in the grooves. The bottom of the fixed plate 1 is connected to the maintenance plate 6. Caster frames 5 are also installed at the four corners of the base.

[0035] As Figure 3 The structure shown has a recess on the fixed plate 1 to accommodate the probe assembly 2. During replacement, the wafer support stage and other structures need to be raised to expose the probe assembly 2. A counterweight space is formed between the maintenance plate 6 and the fixed plate 1, and an air compressor box is installed in the counterweight space. The air compressor box has several vacuum tubes.

[0036] Both the groove and the maintenance plate 6 have through holes to accommodate the first connecting wire harness 3, allowing the first connecting wire harness 3 to pass through. In the mounting plate 1 and the maintenance plate 6, the first connecting wire harness 3 can be designed to pass through the internal structure according to the original wiring method, without the need to adjust other structures and components, thus avoiding significant changes to the wiring that could affect the assembly of other components on the base.

[0037] In actual operation, the original wiring of the probe assembly 2 and the processing device 4 is not entangled with other wire harnesses, allowing direct pulling of the first connecting wire harness 3 out of the base for replacement. Therefore, optionally, the wiring structure of the lithography machine carrier stage positioning component also includes a wire sleeve. The wire sleeve is fitted over the first connecting wire harness 3, with a clearance fit between the inner wall of the wire sleeve and the first connecting wire harness 3. Both ends of the wire sleeve are connected to the through holes on the groove and the maintenance plate 6, respectively. As an extension, the inner diameter of the wire sleeve is larger than the outer diameter of the first connecting wire harness 3. During replacement, the first connecting wire harness 3 is pulled out of the wire sleeve, thereby avoiding interference from the external wire harness entanglement and preventing damage to devices such as the air compressor box caused by pulling the wire harness due to wire harness entanglement.

[0038] This application also provides a lithography machine, including the wiring structure of the lithography machine stage positioning component described above.

[0039] This application also provides a wiring method for a positioning component of a lithography machine stage. The positioning component is disposed in a working chamber enclosed by the outer shell of the lithography machine. The positioning component includes a processing device 4 and a probe assembly 2. The processing device 4 is disposed on the inner wall 7 of the working chamber. The probe assembly 2 is mounted on a base at the bottom of the stage. A first connecting wire harness 3 is connected to the probe assembly 2. The end of the first connecting wire harness 3 away from the probe assembly 2 passes through the bottom of the base to mate with the connection interface on the processing device 4. The method further includes the following steps:

[0040] Raise the support platform to expose the probe assembly 2 to be removed from its bottom;

[0041] Disconnect the probe assembly 2 to be removed from the first connecting harness 3, remove the probe assembly 2 to be removed and expose the connector of the first connecting harness 3;

[0042] Connect the end of the second connecting harness (not shown) that comes out of the new probe assembly 2 to the connector of the first connecting harness 3.

[0043] Drag the first connecting harness 3 close to one end of the processing device 4 until the second connecting harness is pulled out to the processing device 4. Disconnect the connection between the first connecting harness 3 and the processing device 4, connect the second connecting harness and the processing device 4, and install the new probe assembly 2 on the base. The second connecting harness can be a harness that extends from the new probe assembly 2.

[0044] The processing device 4 includes an amplifier and an encoder. The base also includes a fixed plate 1 and a maintenance plate 6. The top of the fixed plate 1 has several grooves for mounting the probe assembly 2, and the bottom of the fixed plate 1 is connected to the maintenance plate 6. Both the grooves and the maintenance plate 6 have through holes to accommodate the first connecting wire harness 3, allowing the first connecting wire harness 3 to pass through. For example, Table 1 below shows the time taken by the original method and this method:

[0045] Machine number Number of downtimes Replacement quantity The original method took (h) This method takes (h) A 1 1 72 8 B 2 2 144 16 C 1 1 72 8 D 1 2 72 8 E 5 5 360 40 Summary 10 11 720 80

[0046] Table 1. Time taken by the original method and this method

[0047] Regarding lithography machine uptime (working time), downtime is reduced from 3 days to 8 hours per machine, a cumulative difference of 64 hours per machine. If 10 downtimes are used to replace probe components, the saved machine time is 64 hours per machine * 10 = 640 hours per year. In terms of lithography machine capacity, the original method impacts 720 hours * 100 = 72,000 pieces, while the method of this application impacts 80 hours * 100 = 8,000 pieces, a cumulative difference of 64,000 pieces. Using the method of this application, replacement time is shorter, therefore probe component replacement can be combined with machine maintenance, reducing unplanned downtime.

[0048] In summary, in the wiring structure and wiring method of the lithography machine carrier stage positioning component provided in the embodiments of the present invention, by adjusting the position of the processing device, the wire harness of the probe assembly passes through the base and connects with the processing device. Thus, when replacing the probe assembly, it is only necessary to connect the exposed end of the first connecting wire harness and the end of the second connecting wire harness after removing the old probe assembly, and pull the second connecting wire harness to the processing device through the first connecting wire harness to connect the processing device and the new probe assembly. There is no need to remove the base, avoiding the impact of disassembling the internal components of the base on the equipment accuracy, and greatly reducing the work and return time.

[0049] The above description is merely a description of preferred embodiments of the present invention and is not intended to limit the scope of the present invention in any way. Any changes or modifications made by those skilled in the art based on the above disclosure shall fall within the protection scope of the claims.

Claims

1. A wiring structure for a positioning component of a lithography machine stage, disposed within the working chamber enclosed by the outer shell of the lithography machine, characterized in that, The positioning component includes a processing device and a probe assembly. The processing device is disposed on the inner wall of the working chamber, and the probe assembly is mounted on a base at the bottom of the support platform. The probe assembly has a first connecting wire harness extending out to mate with the connecting interface on the processing device. The base also includes a fixed plate and a maintenance plate. The top of the fixed plate has several grooves, and the probe assembly is disposed in the grooves. The bottom of the fixed plate is connected to the maintenance plate. Both the grooves and the maintenance plate have through holes to accommodate the first connecting wire harness, allowing the first connecting wire harness to pass through.

2. The wiring structure of the lithography machine stage positioning component as described in claim 1, characterized in that, The processing device includes an amplifier and an encoder.

3. The wiring structure of the lithography machine stage positioning component as described in claim 1, characterized in that, It also includes a wire sleeve, which is fitted over the first connecting wire harness, and the inner wall of the wire sleeve is in clearance fit with the first connecting wire harness. The two ends of the wire sleeve are respectively connected to the groove and the through hole on the maintenance plate.

4. A lithography machine, characterized in that, Includes the wiring structure of the lithography machine stage positioning component as described in any one of claims 1-3 above.

5. A wiring method for a positioning component of a lithography machine stage, characterized in that, The positioning component is disposed within the working chamber enclosed by the outer shell of the lithography machine. The positioning component includes a processing device and a probe assembly. The processing device is disposed on the inner wall of the working chamber, and the probe assembly is mounted on a base at the bottom of the support stage. The probe assembly has a first connecting wire harness extending from it. The end of the first connecting wire harness away from the probe assembly passes through the bottom of the base to mate with a connection interface on the processing device. The method further includes the following steps: Raise the support platform to expose the probe assembly to be removed from its bottom; Disconnect the probe assembly to be removed from the first connecting harness, remove the probe assembly to be removed and expose the connector of the first connecting harness; Connect the end of the second connecting wire harness that comes out of the new probe assembly to the connector of the first connecting wire harness. Drag the first connecting harness close to one end of the processing device until the second connecting harness is pulled out to the processing device, disconnect the connection between the first connecting harness and the processing device, connect the second connecting harness and the processing device, and install the new probe assembly on the base.

6. The wiring method for the positioning component of the lithography machine stage as described in claim 5, characterized in that, The processing device includes an amplifier and an encoder.

7. The wiring method for the positioning component of the lithography machine stage as described in claim 5, characterized in that, The base also includes a fixed plate and a maintenance plate. The top of the fixed plate has several grooves for mounting the probe assembly, and the bottom of the fixed plate is connected to the maintenance plate.

8. The wiring method for the positioning component of the lithography machine stage as described in claim 7, characterized in that, Both the groove and the maintenance plate have through holes to accommodate the first connecting wire harness, allowing the first connecting wire harness to pass through.

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