A gas processing apparatus and method
By integrating gas pretreatment, heating, and cooling mechanisms, the gas processing device solves the problems of easy clogging and high cost of gas purification devices, and achieves efficient multiple purification and gas pressure regulation to meet different production needs.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- GUANGXI CHUNMAO ELECTRIC AUTOMATION ENG CO LTD
- Filing Date
- 2023-04-03
- Publication Date
- 2026-06-30
AI Technical Summary
Existing gas purification methods are prone to impurity accumulation and blockage, have low separation efficiency, and have complex and expensive pressure regulating devices, making it difficult to meet the production needs of high-purity gases and gases at different pressures.
An integrated gas processing device is adopted, including gas pretreatment, heating and cooling mechanisms. It uses components such as impact plates, adsorption plates and acceleration cylinders to perform multiple purification and acceleration, thereby achieving multiple separations of the gas and regulation of temperature and pressure.
It achieves efficient and multiple purification of gases, meets different production needs, reduces processing costs, improves gas purity and pressure, and protects electrical equipment from high temperatures.
Smart Images

Figure CN116371087B_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of gas treatment technology, and specifically relates to a gas treatment device and method. Background Technology
[0002] Gases are ubiquitous in modern industrial and technological research and development. Certain equipment or systems have high requirements for gas cleanliness and pressure. How to ensure that the gas input into these equipment or systems is free of impurities such as oil, gas, and particles, and how to ensure that the gas is input into certain systems at a specific pressure value are the two issues that need to be considered and solved.
[0003] Existing gas purification methods include using filter cartridges or centrifugation. Filter cartridges are prone to impurity accumulation and blockage, while centrifugation devices are complex and the separation efficiency cannot be very high. Existing gas pressure regulation methods use gas pressure regulating valves or electric air pumps, which are expensive and complex. Moreover, many production lines require high gas purity and different temperatures and pressures to achieve production objectives.
[0004] The above background information is provided only to aid in understanding the inventive concept and technical solution of this invention. It does not necessarily belong to the prior art of this patent application. In the absence of clear evidence that the above information was disclosed on the filing date of this patent application, the above background information should not be used to evaluate the novelty and inventiveness of this application. Summary of the Invention
[0005] The purpose of this invention is to provide a gas processing apparatus and method that overcomes the defects present in the above description.
[0006] To achieve the above objectives, the present invention adopts the following technical solution:
[0007] A gas processing apparatus, comprising:
[0008] A gas pretreatment mechanism for pretreating gas includes a first housing, inside which are arranged a separation chamber, a gas guiding chamber, and a gas storage chamber connected in sequence; the separation chamber is provided with several partitions at intervals, and a curved gas channel is opened between the partitions.
[0009] A gas heating mechanism, connected to the gas storage chamber, includes a second housing. The second housing is divided into a heating chamber and a gas acceleration chamber by a partition plate. The heating chamber is connected to the gas acceleration chamber. The heating chamber is equipped with a heating wire, and the gas acceleration chamber is equipped with several acceleration cylinders. A fan is provided at the air outlet of the acceleration cylinder to transmit the heated gas to a second external output pipe for external production use.
[0010] A gas cooling mechanism, connected to the gas storage chamber, includes a third housing, which is internally divided into a cooling chamber and an extraction chamber. The inner wall of the cooling chamber is fitted with a coiled cooling pipe, which is connected to an external cooling system. A vortex exhaust fan is installed in the extraction chamber to deliver the cooled gas to an external first output pipe for external production use.
[0011] Preferably, the partitions include a plurality of left impact plates and a plurality of right impact plates. The left impact plates extend from the left to the right of the impact chamber and are spaced apart from the right side of the separation chamber. The right impact plates extend from the right wall of the separation chamber to the left and are spaced apart from the left wall of the impact chamber. The left impact plates and the right impact plates are alternately arranged along the gas channel.
[0012] Preferably, the air guide cavity is fixed with a conical air guide pipe, a first adsorption plate and a second adsorption plate from bottom to top.
[0013] Preferably, the air duct has several air guide holes on its wall.
[0014] Preferably, the accelerator cylinder has a structure that is narrow at the top and wide at the bottom.
[0015] Preferably, the acceleration cylinder is provided with a spiral channel.
[0016] Preferably, a tapered guide pipe is also provided between the second output pipe and the fan.
[0017] Preferably, the third enclosure is further provided with an electrical box, which is used to install the switching power supply for the vortex exhaust fan, the fan, and the heating wire.
[0018] Preferably, the second and third housings are connected to the bottom of the gas storage chamber via flexible hoses.
[0019] A gas treatment method, implemented using the aforementioned gas treatment apparatus, includes the following steps:
[0020] S1. The gas to be processed is connected to the first chamber. The gas is subjected to coarse separation and purification by continuous impact of the left impact plate and multiple right impact plates in the separation chamber of the first chamber, including the purification of liquids and particulate matter.
[0021] S2. After being processed in the separation chamber in step S1, the gas is impacted again by the conical air guide tube in the air guide chamber, and the liquid and particulate matter are purified again. Under the action of the first adsorption plate and the second adsorption plate, the gas is double adsorbed and enters the gas storage chamber.
[0022] S3. After the gas enters the third chamber from the gas storage chamber, the cooling pipe inside the third chamber cools the gas and the gas is extracted by the vortex exhaust fan for use by production lines that need to use gas at a lower temperature.
[0023] S4. After the gas enters the second chamber from the gas storage chamber, the heating wire inside the heating chamber of the second chamber heats the gas. At the same time, the gas speed is increased by the action of the fan and the spiral channel inside the acceleration cylinder, so that it can be used for production when the external gas needs to be at a high temperature and a certain pressure.
[0024] Preferably, in the above technical solution,
[0025] Compared with existing technologies, the present invention has the following advantages:
[0026] 1. In this invention, the first box, the second box, and the third box are integrated into a gas processing system, which can process gas within one system to meet different production needs and reduce processing costs.
[0027] 2. In this invention, the gas is pretreated by the first chamber, and the moisture and particulate matter in the gas are separated multiple times, thereby improving the purity of the gas.
[0028] 3. In this invention, the gas in the second chamber can increase the speed of the airflow through heating and acceleration, thereby increasing the output gas pressure and gas temperature to meet the production requirements of high temperature and high pressure.
[0029] 4. In this invention, the electrical box is installed on the wall of the third enclosure. Since the interior of the third enclosure is mainly used for cooling gas, the cooling pipes provide cooling protection for the switching power supply inside the electrical box. Attached Figure Description
[0030] Figure 1 This is a schematic diagram of the structure of the present invention.
[0031] Figure 2 This is a schematic diagram of the internal structure of the first box in this invention.
[0032] Figure 3 This is a schematic diagram of the internal structure of the second box in this invention.
[0033] Figure 4 This is a schematic diagram of the internal structure of the third box in this invention.
[0034] Explanation of key figure labels:
[0035] 1-First housing, 11-Separation chamber, 12-Air guiding chamber, 13-Air storage chamber, 14-Left impact plate, 15-Right impact plate, 16-Conical air guide pipe, 17-First adsorption plate, 18-Second adsorption plate, 2-Second housing, 21-Heating chamber, 22-Accelerating cylinder, 23-Isolation plate, 24-Fan, 25-Conical guide pipe, 26-Gas acceleration chamber, 27-Through hole, 28-Heating wire, 3-Third housing, 31-Cooling system, 32-Cooling pipe, 33-Vortex exhaust fan, 34-Cooling chamber, 35-Exhaust chamber, 4-Inlet pipe, 5-Second output pipe, 6-First output pipe, 7-Hose. Detailed Implementation
[0036] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0037] In the description of this invention, it should be noted that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "top surface," "bottom surface," "inner," "outer," "inner side," and "outer side," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.
[0038] In the description of this invention, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. Where the terms "first," "second," and "third" are used for descriptive purposes and to distinguish technical features, they should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the sequential relationship of the indicated technical features.
[0039] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "setting" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances. The embodiments of this invention will now be described according to its overall structure.
[0040] Please see Figure 1-4 A gas processing apparatus, comprising:
[0041] A gas pretreatment mechanism for pretreating gas includes a first housing 1, which has a separation chamber 11, a gas guiding chamber 12 and a gas storage chamber 13 connected in sequence inside the first housing 1; the separation chamber 11 has several partitions spaced apart, and a curved gas channel is opened between the partitions.
[0042] The gas heating mechanism, which is connected to the gas storage chamber 13, includes a second housing 2. The second housing 2 is divided into a heating chamber 21 and a gas acceleration chamber 26 by a partition plate 23. The heating chamber 21 is connected to the gas acceleration chamber 26. The heating chamber 21 is equipped with an electric heating wire 28. The gas acceleration chamber 26 is equipped with several acceleration cylinders 22. A fan 24 is provided at the air outlet of the acceleration cylinder 22 to transmit the heated gas to the external second output pipe 5 for external production use.
[0043] The gas cooling mechanism, connected to the gas storage chamber 13, includes a third housing 3, which is divided into a cooling chamber 34 and an extraction chamber 35. The inner wall of the cooling chamber 34 is fitted with a coiled cooling pipe 32, which is connected to the external cooling system 31. The extraction chamber 35 is equipped with a vortex exhaust fan 33 to transport the cooled gas to the external first output pipe 6 for external production use. The cooling system adopts a commonly used water cooling system, which consists of a radiator, water pump, water tank, fan, cooling pipe, etc., which will not be described in detail here.
[0044] Specifically, the partitions include multiple left impact plates 14 and multiple right impact plates 15. The left impact plates 14 extend from left to right in the impact chamber and are spaced apart from the right side of the separation chamber 11. The right impact plates 15 extend from the right wall of the separation chamber 11 to the left and are spaced apart from the left wall of the impact chamber. The left impact plates 14 and right impact plates 15 are alternately arranged along the gas channel. The gas is coarsely separated and purified by continuous impact from the left impact plates 14 and multiple right impact plates 15 in the separation chamber 11 within the first housing 1, including the purification of liquids and particulate matter.
[0045] Specifically, inside the air guiding chamber 12, a conical air guiding pipe, a first adsorption plate 17, and a second adsorption plate 18 are fixed sequentially from bottom to top. The gas is impacted again by the conical air guiding pipe 16, further purifying the liquid and particulate matter. In this embodiment, the first adsorption plate 17 is made of HEPA filter material, which can effectively filter tiny particles in the air with a filtration efficiency of up to 99.97%, capable of filtering particles as small as 0.3 micrometers, such as bacteria, pathogens, and pollen. The second adsorption plate 18 is made of activated carbon filter material, capable of adsorbing harmful chemicals and odors in the gas.
[0046] Specifically, the duct wall has several air guide holes. These holes ensure the normal flow of gas.
[0047] Specifically, the accelerator cylinder 22 has a narrow top and wide bottom structure. This structure helps to increase the airflow velocity and output air pressure.
[0048] Specifically, the accelerator cylinder 22 is equipped with a spiral channel. The spiral channel inside the accelerator cylinder 22 helps to increase the airflow velocity and increase the output air pressure.
[0049] Specifically, a tapered guide pipe 25 is also provided between the second output pipe 5 and the fan. The tapered guide pipe 25 helps to increase the airflow velocity and increase the output air pressure.
[0050] Specifically, an electrical box is also installed on the wall of the third enclosure 3. The electrical box is used to install the power switches for the vortex exhaust fan 33, the fan 24, and the heating wire 28. The electrical box is located on the wall of the third enclosure 3. Since the interior of the third enclosure 3 is mainly used for cooling gas, the cooling pipe 32 provides cooling protection for the switching power supply inside the electrical box.
[0051] Specifically, the second chamber 2 and the third chamber 3 are connected to the bottom of the air storage chamber 13 via hoses 7.
[0052] A gas treatment method, implemented using the aforementioned treatment apparatus, includes the following steps:
[0053] S1. The gas to be treated is connected to the first chamber 1 through the air inlet pipe 4. The gas is continuously impacted by the left impact plate 14 and multiple right impact plates 15 in the separation chamber 11 in the first chamber 1 to complete the coarse separation and purification of the gas, including the purification of liquid and particulate matter.
[0054] S2. After being processed by the separation chamber 11 in step S1, the gas is impacted again by the conical air guide tube 16 in the air guide chamber, and the liquid and particulate matter are purified again. Under the action of the first adsorption plate 17 and the second adsorption plate 18, the gas is double adsorbed and enters the gas storage chamber 13.
[0055] S3. After the gas enters the third chamber 3 from the gas storage chamber 13, the cooling pipe 32 in the third chamber 3 cools the gas and the vortex exhaust fan 33 extracts it for use by the production line that needs to use gas at a lower temperature.
[0056] S4. After the gas enters the second chamber 2 from the gas storage chamber 13, the heating wire 28 inside the heating chamber 21 of the second chamber 2 heats the gas. At the same time, the gas speed is increased by the action of the fan and the spiral channel inside the acceleration cylinder 22, so that it can be used for production when the external gas needs to be at a high temperature and a certain pressure.
[0057] The foregoing description of specific exemplary embodiments of the present invention is for illustrative and explanatory purposes. These descriptions are not intended to limit the invention to the precise forms disclosed, and it is obvious that many changes and variations can be made based on the above teachings. Although embodiments of the invention have been shown and described, these specific embodiments are merely explanations of the invention and are not intended to limit it. The specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. The purpose of selecting and describing exemplary embodiments is to explain the specific principles of the invention and its practical application, so that those skilled in the art, after reading this specification, can make modifications, substitutions, variations, and various choices and changes to the embodiments as needed without departing from the principles and spirit of the invention, provided that such modifications, substitutions, variations, and choices and changes are within the scope of the claims of the invention and are protected by patent law.
Claims
1. A gas treatment device, characterized by include: A gas pretreatment mechanism for pretreating gas includes a first housing (1), wherein the first housing (1) is provided with a separation chamber (11), a gas guiding chamber (12) and a gas storage chamber (13) connected in sequence; the separation chamber (11) is provided with a number of partitions at intervals, and a curved gas channel is provided between the partitions; The gas heating mechanism, which is connected to the gas storage chamber (13), includes a second housing (2). The second housing (2) is divided into a heating chamber (21) and a gas acceleration chamber (26) by a partition plate (23). The heating chamber (21) is connected to the gas acceleration chamber (26). The heating chamber (21) is provided with an electric heating wire (28). The gas acceleration chamber (26) is provided with several acceleration cylinders (22). The air outlet of the acceleration cylinder (22) is provided with a fan (24) to transmit the heated gas to the external second output pipe (5) for external production use. The gas cooling mechanism is connected to the gas storage chamber (13) and includes a third housing (3). The interior of the third housing (3) is divided into a cooling chamber (34) and an exhaust chamber (35). The inner wall of the cooling chamber (34) is fitted with a coiled cooling pipe (32), which is connected to an external cooling system (31). A vortex exhaust fan (33) is installed in the exhaust chamber (35) to transport the cooled gas to the external first output pipe (6) for external production use. The acceleration cylinder (22) is a type of acceleration cylinder (22) with a narrow upper part and a wide lower part; the acceleration cylinder (22) is provided with a spiral channel inside; The partitions include multiple left impact plates (14) and multiple right impact plates (15). The left impact plates (14) extend to the right from the left wall of the separation chamber (11) and are spaced apart from the right wall of the separation chamber (11). The right impact plates (15) extend to the left from the right wall of the separation chamber (11) and are spaced apart from the left wall of the separation chamber (11). The left impact plates (14) and the right impact plates (15) are alternately arranged along the gas channel. The air guide cavity (12) is fixed with a conical air guide pipe (16), a first adsorption plate (17) and a second adsorption plate (18) from bottom to top inside; a number of air guide holes are opened on the pipe wall of the conical air guide pipe (16); a conical guide pipe (25) is also provided between the second output pipe (5) and the fan.
2. A gas treatment device according to claim 1, characterised in that An electrical box is also provided on the wall of the third box (3), which is used to install the power switches of the vortex exhaust fan (33), the fan (24) and the heating wire (28).
3. A gas treatment device according to claim 2, characterised in that The second box (2) and the third box (3) are connected to the bottom of the gas storage chamber (13) through hoses (7).
4. A gas treatment method, implemented using the gas treatment apparatus according to claim 3, characterized in that, Includes the following steps: S1. The gas to be processed is connected to the first chamber (1) through the inlet pipe (4). The gas is continuously impacted by the left impact plate (14) and multiple right impact plates (15) in the separation chamber (11) in the first chamber (1) to complete the coarse separation and purification of the gas, including the purification of liquid and particulate matter. S2. After being processed by the separation chamber (11) in step S1, the gas is impacted again by the conical air guide pipe (16) in the air guide chamber. The liquid and particulate matter are purified again, and the gas is double-adsorbed by the first adsorption plate (17) and the second adsorption plate (18) and enters the gas storage chamber (13). S3. After the gas enters the third box (3) from the gas storage chamber (13), the cooling pipe (32) in the third box (3) cools the gas and the gas is extracted by the vortex exhaust fan (33) for use by production lines that need to use gas at a lower temperature. S4. After the gas enters the second chamber (2) from the gas storage chamber (13), the heating wire (28) inside the heating chamber (21) of the second chamber (2) heats the gas. At the same time, the gas speed is increased by the action of the fan and the spiral channel inside the acceleration cylinder (22), so that it can be used for production when the external gas needs to be at a high temperature and a certain pressure.