Metrology system using optical beams for position and orientation tracking

Abstract

A metrology system for use with a movement system of a mobile end tool (e.g., a probe) is provided. The metrology system includes a sensor structure, a beam source structure, and a processing portion. The sensor structure includes a plurality of beam sensors. The beam source structure directs a beam to the beam sensors of the sensor structure. One of the beam source structure or the sensor structure is coupled to an end tool mounting structure of the end tool and / or the movement system that moves the end tool. The beam directed to the beam sensors causes the beam sensors to produce corresponding measurement signals. The processing portion processes the measurement signals from the beam sensors, which are indicative of a position and orientation of the end tool.

Description

Background Technology Technical Field

[0001] This disclosure relates to measurement and mobility systems, and more specifically to measurement systems that can be used with mobility systems such as robots to track position and orientation.

[0002] Related technical descriptions

[0003] Manufacturing, workpiece inspection, and other processes frequently utilize mechanical movement systems to perform certain functions. For example, robotic systems or other movement systems can be used to move end-effectors to perform certain operations (e.g., related to workpiece inspection, manufacturing, etc.). For certain applications, various types of robots can be used, including articulated robots, selective compliant articulated robotic arms (SCARA) robots, Cartesian robots, cylindrical robots, spherical robots, etc. As an example of a component that may be included in a robot, a SCARA robot system (e.g., which may be an articulated robot system) typically has a base, a first arm rotatably coupled to the base, and a second arm rotatably coupled to the end of the first arm. In various configurations, an end-effector may be coupled to the end of the second arm (e.g., for performing certain work and / or inspection operations). Such a system may include position sensors (e.g., rotary encoders) for determining / controlling the positioning of the arms and, consequently, the positioning of the end-effector. In various embodiments, limited by certain factors (e.g., the combination of rotary encoder performance and the mechanical stability of the robot system), such systems may have a positioning accuracy of approximately 100 micrometers.

[0004] U.S. Patent No. 4,725,965 (referred to herein as the '965 Patent) discloses certain calibration techniques for improving the accuracy of SCARA systems, the entire contents of which are incorporated herein by reference. As described in the '965 Patent, a technique is provided for calibrating a SCARA-type robot comprising a first rotatable arm and a second rotatable arm carrying an end-effector tool. The calibration technique relates to the fact that the SCARA robot can be controlled using a kinematic model that, when accurate, allows the arm to be positioned in first and second angular configurations in which the end-effector tool carried by the second arm remains in the same position. To calibrate the kinematic model, the arm is placed in the first configuration to position the end-effector tool above a fixed reference point. The arm is then placed in the second angular configuration to nominally reposition the end-effector tool to align it with the reference point. An error in the kinematic model is calculated based on the offset of the end-effector position from the reference point when the arm switches from the first angular configuration to the second angular configuration. The kinematic model is then compensated for based on the calculated error. These steps are repeated until the error is zero, at which point the kinematic model of the SCARA robot is considered calibrated.

[0005] As further described in the '965 patent, the calibration technique may include the use of certain cameras. For example, in one embodiment, the reference point may be the center of the viewing area of ​​a fixed television camera (i.e., on the ground below the end tool), and the camera's output signal may be processed to determine the offset of the end tool's position from the center of the camera's viewing area when the linkage is switched from a first configuration to a second configuration. In another embodiment, the second arm may carry the camera, and the technique may begin by placing the arm in a first angular configuration in which a second predetermined interior angle between the arms is measured to center the camera carried by the second arm directly above the fixed reference point. The arm is then placed in a second angular configuration in which an interior angle equal to the second predetermined interior angle is measured between the arms to again nominally center the camera above the reference point. The camera's output signal is then processed to determine the offset of the reference point position as seen by the camera when the arm is switched from the first angular configuration to the second angular configuration. The error of the camera's known position is then determined based on the offset of the reference point position as seen by the camera. These steps are then repeated as part of the calibration process until the error approaches zero.

[0006] While techniques such as those described in the '965 patent can be used to calibrate robot systems, their use may be less desirable in certain applications (e.g., it may require significant time and / or may not provide the required level of accuracy for all possible orientations of the robot during certain operations). A system is needed that provides improvements on such problems (e.g., for enhancing the reliability, repeatability, speed, etc., of position and orientation determination in processes such as workpiece measurement and manufacturing). Summary of the Invention

[0007] The summary is provided to introduce, in a simplified form, the selection of concepts further described in the detailed embodiments below. This summary is not intended to identify key features of the claimed subject matter, nor is it intended to help determine the scope of the claimed subject matter.

[0008] A metering system is provided for use with a mobility system for a mobile end-tool. The mobility system includes a movable structure and a motion control system. The movable structure includes an end-tool mounting structure to which the end-tool is configured to be mounted. The motion control system is configured to control the position and orientation of the end-tool, at least in part, based on controlling the movable structure, so as to move at least a portion of the end-tool mounted to the end-tool mounting structure within a mobility volume.

[0009] The metrology system includes a sensor structure, a beam source structure, and a processing unit. The sensor structure includes multiple beam sensors. The beam source structure is configured to guide the beam to the beam sensors of the sensor structure.

[0010] One of the beam source structure or sensor structure is configured to be coupled to at least one of the end-effector or end-effector mounting structure. In a specific embodiment where the beam source structure is coupled to at least one of the end-effector or end-effector mounting structure, the position and orientation of the beam source structure can indicate the position and orientation of the end-effector, and a plurality of beam sensors can be located at fixed positions that at least partially define a metrology frame volume surrounding at least a portion of the movable volume. In a specific embodiment where the sensor structure is coupled to at least one of the end-effector or end-effector mounting structure, the position and orientation of the sensor structure can indicate the position and orientation of the end-effector, and a plurality of beam source portions of the beam source structure can be located at fixed positions that at least partially define a metrology frame volume surrounding at least a portion of the movable volume.

[0011] The beam guided to the beam sensor is configured (e.g., by generating a measurement point at a position on the beam sensor) to cause the beam sensor to generate a corresponding measurement signal. The processing unit is configured to process the measurement signal from the beam sensor of the sensor structure, wherein the measurement signal from the beam sensor indicates the position and orientation of the end tool.

[0012] According to another approach, a method is provided that typically includes two steps. The first step includes manipulating a beam source structure to guide a beam to a beam sensor of a sensor structure, thereby indicating the position and orientation of an end-effector. The second step includes processing measurement signals from the beam sensor of the sensor structure to determine the position and orientation of the end-effector.

[0013] According to another aspect, a measurement system is provided, comprising a sensor structure, a beam source structure, and a processing unit. One of the beam source structure or the sensor structure is configured to be coupled to at least one of the end-tool mounting structures of a moving system for the end-tool. The sensor structure includes a plurality of beam sensors. The beam source structure is configured to guide a beam to the beam sensors of the sensor structure. The processing unit is configured to process measurement signals from the beam sensors of the sensor structure, wherein the measurement signals from the beam sensors indicate the position and orientation of the end-tool. Attached Figure Description

[0014] Figure 1 This is a block diagram of a first exemplary embodiment of a mobile and metering system;

[0015] Figure 2 yes Figure 1 A block diagram of the system's control and processing unit;

[0016] Figure 3 Such as can be Figure 1A first exemplary embodiment of the beam source portion of the beam source structure used in the system is illustrated;

[0017] Figure 4 It is an illustration of a movable volume surrounded by a metering frame volume, which is at least partially defined by a sensor structure including four sensors.

[0018] Figure 5 It is an illustration of a movable volume surrounded by a metering frame volume, which is at least partially defined by a sensor structure including six sensors.

[0019] Figure 6 It is an illustration of a movable volume surrounded by a metering frame volume, which is at least partially defined by a sensor structure comprising fourteen sensors.

[0020] Figure 7 It is an illustration of a movable volume surrounded by a metering frame volume, which is at least partially defined by a sensor structure including twelve sensors.

[0021] Figures 8A to 8H This is a diagram illustrating four exemplary beams of a beam source structure and corresponding measurement points on four sensors of a sensor structure for different positions and orientations of the beam source structure.

[0022] Figures 9A to 9C It is a diagram showing twelve exemplary beams of a beam source structure and corresponding measurement points on four sensors for different positions and orientations of the beam source structure;

[0023] Figure 10 This is a diagram illustrating eighteen exemplary beams of a beam source structure and corresponding measurement points on four sensors of a sensor structure;

[0024] Figure 11 This is a block diagram of a second exemplary embodiment of a mobile and metering system;

[0025] Figures 12A to 12D This is a diagram illustrating four exemplary beams of the beam source structure and corresponding measurement points on four sensors of the sensor structure at different positions and orientations; and

[0026] Figure 13 This is a flowchart illustrating an exemplary implementation of a routine for operating a metering system. Detailed Implementation

[0027] Figure 1This is a block diagram of a first exemplary embodiment of a mobile and measurement system 100, including a mobile system 110 and a measurement system 150. The mobile system 110 (e.g., an articulated robot) includes a movable structure MAC (e.g., a movable arm structure) and a motion control and processing system 140. The measurement system 150 includes a sensor structure 160, a beam source structure LC, and a measurement system position and orientation processing unit 190. Figure 1 In this configuration, the beam source structure LC (e.g., shown as guiding a beam with arrows in different directions, including towards beam sensors S1 and S2) is coupled to the end tool ETL. As will be described in more detail below, the metering system 150 can be used to track position and orientation (e.g., the position and orientation of the end tool ETL as moved by the movement system 110).

[0028] exist Figure 1 In the example, the active structure MAC includes a lower base portion BSE, arms 121-125, motion mechanisms 131-135, position sensors SEN1-SEN5, and an end-tool mounting structure ETMC. In various specific embodiments, some or all of the arms 121-125 may be mounted to the respective motion mechanism 131-135 at the respective proximal end of the respective arms 121-125. Figure 1 In the example, some or all of the motion mechanisms 131-135 (e.g., rotary joints with corresponding motors) can realize the movement (e.g., rotation) of the corresponding arms 121-125 (e.g., about the corresponding axes of rotation RA1-RA5). In various specific embodiments, position sensors SEN1-SEN5 (e.g., rotary encoders) can be used to determine the position (e.g., angular orientation) of the corresponding arms 121-125.

[0029] In various specific implementations, the active structure MAC may have a portion designated as an end portion (e.g., fifth arm 125). Figure 1 In an exemplary configuration, the end tool mounting structure ETMC is located near the distal end of the fifth arm portion 125 (e.g., designated as the end portion), which corresponds to the distal end of the active structure MAC. In various alternative embodiments, the end portion of the active structure may be an element that is not an arm portion (e.g., a rotatable element, etc.), but for this purpose, at least a portion of the end portion corresponds to the distal end of the active structure where the end tool mounting structure ETMC is located.

[0030] In various embodiments, the end tool mounting structure ETMC may include various elements for coupling and holding the end tool ETL near the distal end of the active structure MAC. For example, in various embodiments, the end tool mounting structure ETMC may include an auto-engaging connector, a magnetic coupling, and / or other coupling elements known in the art for mounting the end tool ETL to corresponding elements. The end tool mounting structure ETMC may also include electrical connections (e.g., power connections, one or more signal lines, etc.) for providing power to at least a portion of the end tool ETL and / or sending and receiving signals thereto and from it (e.g., sending and receiving signals to and from the end tool sensing unit ETSN).

[0031] In various embodiments, the end-tool ETL may include an end-tool sensing unit ETSN and an end-tool stylus ETST having a contact point CP (e.g., a surface for contacting the workpiece WP). A fifth motion mechanism 135 is located near the distal end of the fourth arm 124. In various embodiments, the fifth motion mechanism 135 (e.g., a rotary joint with a corresponding motor) may be configured to rotate the fifth arm 125 about a rotation axis RA5. In some embodiments, the fifth motion mechanism 135 may also, or alternatively, include different types of motion mechanisms (e.g., linear actuators) configured to move the fifth arm 125 linearly (e.g., up and down). In any case, the end-tool ETL is mounted to (e.g., coupled to) an end-tool mounting structure ETMC and has a corresponding end-tool position ETP with corresponding coordinates (e.g., x, y, and z coordinates). In various embodiments, the end-tool position ETP may correspond to or be near a position on or near the end-tool mounting structure ETMC (e.g., located at or near the distal end DE5 of the fifth arm 125, which may correspond to the distal end of the active structure MAC).

[0032] Figure 2 yes Figure 1A block diagram of the control and processing unit 200 of the system includes a motion control system 140 (which may also be a processing system), and includes at least a portion of an external control system ECS. The motion control and processing system 140 is configured to control the end-tool position ETP of the end-tool ETL with a level of accuracy defined as the motion system accuracy. More specifically, the motion control and processing system 140 is generally configured to control the coordinates (e.g., x, y, and z coordinates) of the end-tool position ETP with motion system accuracy, at least in part, based on sensing and controlling the position of the arms 121-125 using motion mechanisms 131-135 and position sensors SEN1-SEN5. In various specific implementations, the motion control and processing system 140 may include motion mechanism control and sensing units 141-145, which may receive signals from corresponding position sensors SEN1-SEN5 to sense the position (e.g., angular position, linear position) of the corresponding arms 121-125, and / or may provide control signals to the corresponding motion mechanisms 131-135 (e.g., including motors, linear actuators, etc.) to move the corresponding arms 121-125.

[0033] The motion control and processing system 140 may also receive signals from the end-tool sensing unit ETSN. In various embodiments, the end-tool sensing unit ETSN may include circuitry and / or configurations related to the operation of the end-tool ETL (e.g., for sensing the workpiece WP, etc.). As will be described in more detail below, in various embodiments, the end-tool ETL (e.g., a contact probe, scanning probe, camera, etc.) may be used to contact or otherwise sense surface positions / locations / points on the workpiece WP, and various corresponding signals may be received, determined, and / or processed by the end-tool sensing unit ETSN, which may provide corresponding signals to the motion control and processing system 140. In various embodiments, the motion control and processing system 140 may include an end-tool control and sensing unit 146, which may provide control signals to the end-tool sensing unit ETSN and / or receive sensing signals from it. In various embodiments, the end-tool control and sensing unit 146 and the end-tool sensing unit ETSN may be combined and / or indistinguishable. In various embodiments, both the motion mechanism control and sensing units 141-145 and the end-tool control and sensing unit 146 can provide outputs to and / or receive control signals from the motion system position and orientation processing unit 147, which, as part of the motion control and processing system 140, controls and / or determines the overall positioning and orientation of the active structure MAC of the motion system 110 and the corresponding position and orientation of the end-tool ETL. In various embodiments, the position of the end-tool ETL can be referred to as the end-tool position ETP. Generally, the motion control system 140 is configured to control the end-tool position and orientation at least in part based on controlling the active structure MAC, so as to move at least a portion of the end-tool ETL mounted on the end-tool mounting structure ETMC within the movement volume MV.

[0034] In various specific implementations, the metrology system 150 may be included in or otherwise added to the mobile system 110 (e.g., as part of an improved configuration added to an existing mobile system 110). Generally, the metrology system 150 can be used to provide determination of the position and orientation of the end-tool ETL (e.g., with an improved level of accuracy relative to the accuracy of the mobile system 110). More specifically, as will be described in more detail below, the metrology system 150 can be used to determine the relative position of metrological position coordinates indicating the end-tool position ETP and the orientation of the end-tool ETL with an accuracy level superior to that of the mobile system.

[0035] In various specific implementations, the sensor structure 160 of the metering system 150 includes beam sensors S1-S4 (e.g., as will be described below in conjunction with...). Figures 4 to 10 (A more detailed description follows). In Figure 1In the cross-sectional view shown, beam sensors S1 and S2 are shown at the far left and far right, respectively, and the general positions of beam sensors S3 and S4 (e.g., they would be located outside and inside the page, respectively) are indicated by dashed lines. As will be described in more detail below, Figure 4 A three-dimensional view of sensor structure 160-4 with four beam sensors is shown, its structure being similar to... Figure 1 The sensor structure is similar to that of the 160.

[0036] Beam sensors S1-S4 are located at fixed positions that at least partially define the metering frame volume MFV (e.g., each may be located on a frame, wall, or other structure). The metering frame volume MFV is configured to surround at least a portion of the movable volume MV (e.g., where at least a portion of the end tool ETL is moved by the moving system 110). The beam source structure LC is configured (e.g., by the beam source structure control unit 192) to operate to guide the beam to the beam sensors S1-S4 of the sensor structure 160 (e.g., to indicate the position and orientation of the beam source structure LC).

[0037] The beam source structure LC is configured to be coupled to at least one of the end-tool ETL or the end-tool mounting structure ETMC. It should be understood that when the end-tool ETL is coupled to the end-tool mounting structure ETMC, the beam source structure LC is then coupled to both the end-tool ETL and the end-tool mounting structure ETMC. The position and orientation of the beam source structure LC indicate the position and orientation of the end-tool ETL. This will be discussed in conjunction with the following... Figures 8A to 10 In more detail, the beams guided to beam sensors S1-S4 are configured to generate a measurement point SP at a position on the beam sensors, which causes the beam sensors to generate a corresponding measurement signal. The metrology system position and orientation processing unit 190 is configured to process the measurement signals from the beam sensors S1-S4 of the sensor structure 160, wherein the measurement signals from the beam sensors S1-S4 indicate the position and orientation of the beam source structure LC, and correspondingly indicate the position and orientation of the end tool ETL.

[0038] In various specific implementations, the movable volume MV consists of a volume in which at least a portion of at least one of the end tool ETL and / or the beam source structure LC is movable. Figure 1In the example, the moving volume MV is shown as a volume in which the contact point CP of the end tool ETL can move during workpiece inspection. As an alternative example, the moving volume may optionally include a volume in which the beam source structure LC can move during the movement of the end tool ETL to inspect the workpiece. In various specific embodiments, the moving system 110 is configured to move the active structure MAC so that at least a portion of the end tool ETL (e.g., including the contact point CP) mounted to the end tool mounting structure ETMC moves within the moving volume MV along at least two dimensions (e.g., x and y dimensions). Figure 1 In the example, this part of the end tool ETL (e.g., the contact point CP) can be moved by the moving system 110 along three dimensions (e.g., x, y, and z dimensions).

[0039] In various specific embodiments, latch unit 181 and / or metrology system position and orientation processing unit 190 and / or beam source structure control unit 192 may be included as part of an external control system ECS (e.g., as part of an external computer, etc.). Beam source structure control unit 192 may provide power and / or control signals to beam source structure LC and / or portions thereof (e.g., to one or more beam sources of beam source structure LC, etc.). Latch unit 181 may be included as part of sensor structure control and processing unit 180 (e.g., it may provide power and / or receive measurement signals from beam sensors S1-S4 of sensor structure 160 and / or provide control signals to them, and it may provide such signals and / or other signals to and from metrology system position and orientation processing unit 190).

[0040] In various embodiments, latch unit 181 is configured to input at least one input signal related to the end-tool position (ETP), determine the timing of a trigger signal based on the at least one input signal, and output the trigger signal to at least one of the beam sensors S1-S4 of the metrology system position and orientation processing unit 190 or the sensor structure 160. In various embodiments, metrology system position and orientation processing unit 190 and / or sensor structure 160 are configured to determine the current measurement signal from beam sensors S1-S4 (e.g., corresponding to the current position and orientation of the beam source structure LC and / or the end-tool ETL) in response to receiving the trigger signal. In various embodiments, metrology system position and orientation processing unit 190 is configured to process the measurement signal, such as the timing corresponding to the trigger signal, to determine the position and orientation of the beam source structure LC and / or the end-tool ETL at the time of the trigger signal.

[0041] In various implementations, once the position and orientation of the beam source structure LC are determined, the position and orientation of the end-effector ETL can be determined accordingly (e.g., based on the known geometric relationship, relative positioning, offset, etc., between the beam source structure LC and the end-effector ETL). In various implementations, the beam source structure LC can be directly attached to the end-effector ETL, or attached to or very close to the end-effector mounting structure (e.g., such that there is minimal or no gap between the end-effector ETL and the beam source structure LC). Figure 1 In a specific implementation, the beam source structure LC is shown at or at least close to the end-tool position ETP (e.g., a designated reference position for the end-tool ETL). Such a configuration can reduce complexity and / or otherwise improve the accuracy of determining the position and orientation of the end-tool ETL, as calculated relative to the determined position and orientation of the beam source structure LC.

[0042] In various implementations, determining the position and orientation of the end-effector ETL can be further used to determine certain additional positional information (e.g., to determine the position of the contact point CP). As noted above, in various implementations, the measurement of the workpiece surface can be determined by bringing the contact point CP of the end-effector ETL into contact with the workpiece surface. For such measurements, both the position and orientation of the end-effector ETL can be determined, which can accordingly indicate the position of the contact point CP.

[0043] In various embodiments, different types of end-tool ETLs can provide different types of outputs that can be used relative to latch section 181. For example, in an embodiment where the end-tool ETL is a contact probe for measuring a workpiece and outputting a contact signal when it contacts the workpiece (e.g., when contact point CP contacts the workpiece), latch section 181 can be configured to input the contact signal or a signal derived from the contact signal as at least one input signal on which the timing of the trigger signal is based. In various embodiments where the end-tool ETL is a contact probe, the central axis of the contact probe may correspond to the end-tool axis EA. As another example, in an embodiment where the end-tool ETL is a scanning probe for measuring a workpiece and providing corresponding workpiece measurement sampling data corresponding to a corresponding sampling timing signal, latch section 181 can be configured to input the corresponding sampling timing signal or a signal derived from the sampling timing signal as at least one input signal. As another example, in a specific implementation of the end-effector ETL for providing a corresponding workpiece measurement image corresponding to the corresponding workpiece image acquisition signal, the latch unit 181 can be configured to input the workpiece image acquisition signal or a signal derived from the workpiece image acquisition signal as at least one input signal.

[0044] In various embodiments, the metrology system 150 may be configured to determine the position and orientation of the beam source structure and / or end-effector ETL based on measurement signals from the beam sensors S1-S4 of the sensor structure 160. It should be understood that such a system may have certain advantages over various alternative systems. For example, in various embodiments, a system such as that disclosed herein may be smaller and / or cheaper and / or more accurate than certain alternative systems using alternative techniques (e.g., including certain photogrammetric systems, etc.), such as that which may be alternatively used to track the position and orientation of a moving system. The disclosed system also does not occupy or obscure any part of the moving volume MV, such as alternative systems that may include rulers or references on the ground or platform, or rulers or references in the same area (e.g., within the moving volume MV) where the workpiece can be otherwise processed and / or inspected.

[0045] In various specific implementations, such as the comparison between the photogrammetric system and metrology system 150 disclosed herein, the following can be described. A photogrammetric system can use an incoherent light source to determine position, for which a camera images the light source. In some cases, position and angle can be calculated based on the source position. The effective "lever" for determining the angle is the distance between the sources. This is difficult to increase because it necessarily also increases the reaction lever between the source and the lower part of the end tool (e.g., the distance corresponding to the contact point CP between the source and the end tool, such as in the direction along the end tool axis EA). In other words, a photogrammetric configuration that attempts to make measuring the probe angle easier also makes the end tool position more sensitive to that angle. In such systems, the camera's field of view can be the entire working volume corresponding to a low magnification.

[0046] In contrast, in the metrology system 150 disclosed herein, a coherent light source can typically be used. For example, the light source for the beam source structure LC can be a coherent light source (e.g., a laser source), for which the beam can be a coherent beam (e.g., a laser beam). Diffractive optical elements (e.g., as will be combined below) Figure 3(Described in more detail) can be used to generate numerous diffracted beams (e.g., dispersed in many directions around the light source structure LC). In various embodiments, relatively small portions of the numerous diffracted or otherwise provided beams can be directed to or otherwise received by a distributed beam sensor of the metrology system 150 (e.g., to generate a corresponding measurement point SP on the beam sensor). In various embodiments, the beam sensor can be a two-dimensional position-sensitive sensor (e.g., a lensless camera, a position-sensitive detector, an optical position sensor that can measure the position of the light spot in a two-dimensional manner on the sensor surface, etc.). In operation, a large lever arm (e.g., partially corresponding to the distance between the beam source structure LC and the beam sensor S) enables highly accurate orientation (e.g., corresponding to the angle of the end tool, etc.) measurement / determination. Furthermore, the effective magnification of such operation can be relatively high.

[0047] In various embodiments, measurement signals from the beam sensor (e.g., indicating the two-dimensional position of measurement points SP formed by the beam, for which the centroid of each measurement point can be calculated / determined based on XYZ coordinates) can be combined with known characteristics of the beam source structure LC (e.g., including laser projection based on known geometric relationships of the beams, including the relative three-dimensional angles of each beam and taking into account any offset of each beam at its source, etc.) to calculate / determine position and orientation (e.g., as based on nonlinear least squares and / or other processing / computation techniques). In other words, known vectors of the beams can be fitted to known positions where they intersect on the beam sensor (e.g., in XYZ coordinates) (e.g., based on the position of measurement points SP) to determine the position and orientation of the beam source structure LC. In various embodiments, measurement points SP on the beam sensor can each be uniquely identified (e.g., in part by using coarse position information determined according to the movement system 110, and / or based on unique or otherwise identifiable characteristics of the beam, such as unique pattern information of the beam, such as a pseudo-random pattern having unique or otherwise identifiable portions, etc.).

[0048] It should be understood that the combination of such features and characteristics of metrology system 150 results in higher accuracy in position and orientation determination compared to those provided by photogrammetric systems such as those described above. As some particular advantages, it should be noted that the beam used in metrology system 150 has corresponding orientation information that is lacking in photogrammetry and is more sensitive to orientation (e.g., the orientation of the beam source structure LC and the end tool ETL). This can significantly improve accuracy. Furthermore, the measurement point SP can be detected directly on the beam sensor rather than imaged, thus avoiding certain potential aberration errors, etc.

[0049] Figure 3 It is a beam source structure LC (e.g., such as that which can be similar to Figure 1 The illustration shows a first exemplary embodiment of the beam source section LP1' of the beam source structure (LC) used in the system. Figure 3 As shown, the beam source portion LP1' includes a light source LS1; a reflecting element RE1; beam splitters BS1A, BS1B, and BS1C; diffractive optical elements DOE1B and DOE1C; and lenses LNS1B1, LNS1B2, LNS1C1, and LNS1C2. In various specific embodiments, the light source LS1 may be a laser source, for which at least some or all of the beams described below may be laser beams. The light source LS1 generates a beam LB1A, which is reflected by the reflecting element RE1 to be directed to the beam splitter BS1A, which splits the beam into beams LB1B and LB1C, which are then directed to the diffractive optical elements DOE1B and DOE1C, respectively.

[0050] Beam LB1B is diffracted into diffracted beam DLB1B by diffractive optical element DOE1B. This diffracted beam is then split into diffracted beams DLB1B1 and DLB1B2 by beam splitter BS1B. DLB1B1 further diverges after passing through lens LNS1B1 with optical axis OA1B1, and DLB1B2 further diverges after passing through lens LNS1B2 with optical axis OA1B2. Similarly, beam LB1C is diffracted into diffracted beam DLB1C by diffractive optical element DOE1C. This diffracted beam is then split into diffracted beams DLB1C1 and DLB1C2 by beam splitter BS1C. DLB1C1 further diverges after passing through lens LNS1C1 with optical axis OA1C1, and DLB1C2 further diverges after passing through lens LNS1C2 with optical axis OA1C2.

[0051] The orthogonal X, Y, and Z axes are indicated (e.g., as in a coordinate system corresponding to the beam source portion LP1' and / or the beam source structure). Optical axes OA1B1 and OA1C1 are indicated as parallel to the X-axis, and optical axes OA1B2 and OA1C2 are indicated as parallel to the Y-axis.

[0052] In various specific embodiments, the beam source portion LP1' can be a first beam source portion, for which the corresponding beam source structure may include additional beam source portions. For example, the beam source structure may include a second beam source portion and a third beam source portion (e.g., in some cases, each having the same components as the first beam source portion LP1'). In this configuration, for the second beam source portion, the corresponding optical axis may be parallel to the X-axis and Z-axis, and for the third beam source portion, the corresponding optical axis may be parallel to the Y-axis and Z-axis. Therefore, in this configuration, there may be approximately equal numbers of diffracted beams guided by lenses along the X-axis, Y-axis, and Z-axis directions. This configuration can result in a relatively uniform distribution of the beams in the directions originating from the beam source structure. In one specific embodiment, if such a beam source structure is placed at the center of a sphere, there may be approximately uniform dispersion around the surface of the sphere at the intersection point where the beams intersect with the surface of the sphere. In various embodiments, it may be desirable for the beam source structure LC to provide at least a minimum number of beams dispersed in a direction around the beam source structure LC (e.g., at least 10,000 beams, or at least 100,000 beams, etc.). In various embodiments, the desired minimum number of beams may depend on the beam source structure LC / beam sensor distance, the number and size of the beam sensors, and the range of possible beam source structure LC orientations. In various embodiments, it may be desirable for some or all of the beams to have similar or approximately equal angular spacing relative to each other.

[0053] In various specific implementations, each beam of the beam source structure (e.g., Figure 3Each diffracted beam (DLB) in the example may have certain known and / or determined properties (e.g., relative angular orientation, origin of the source, etc.) that spatially relate each beam to the beam source structure. Such properties make it possible to determine the position and orientation of the beam source structure, at least in part, based on the beams guided to and sensed by the beam sensor of the sensor structure. For the beam source portion LP1', it should be noted that the diffracted beams may have a certain offset relative to each other. For example, the diffracted beam DLB1B1 may be modeled / considered / specified as the origin of a source having an offset along the Y-axis direction from the origin of the modeled / considered / specified source of the diffracted beam DLB1C1 (e.g., related to the offset along the Y-axis direction between lenses LNS1B1 and LNS1C1). It should be understood that such offsets may be included and / or otherwise considered in position calculations (e.g., including processing / calculations performed by the position and orientation processing unit 190 of the metrology system for processing measurement signals from the beam sensor to determine the position and orientation of the beam source structure LC and / or the end tool ETL, etc.). Once the position and orientation of the beam source structure LC are determined, the position and orientation of the end-effector ETL can also be determined using any known geometric relationship and / or relative positioning / offset between the beam source structure LC and the end-effector ETL. This will be described in more detail below. Figures 8A to 10 A simplified example of beam B with respect to beam source structure LC is shown, which is guided to sensor of sensor structure 160 and corresponds to certain positions and orientations of beam source structure LC.

[0054] Figure 4 , Figure 5 , Figure 6 and Figure 7 The diagram shows corresponding moving volumes MV-4, MV-5, MV-6, and MV-7 surrounded by corresponding metrology frame volumes MFV-4, MFV-5, MFV-6, and MFV-7, which are at least partially defined by corresponding sensor structures 160-4, 160-5, 160-6, and 160-7, each sensor structure comprising a corresponding number of beam sensors. In each case, both the moving volume MV and the metrology frame volume MFV are represented as cubic volumes having edges and sides parallel to the orthogonal X, Y, and Z axes.

[0055] Figure 4 A specific embodiment of a sensor structure 160-4 is shown, comprising four beam sensors S1-S4 (e.g., similar to...). Figure 1 The exemplary specific implementation shown, and also related to Figures 8A to 10(For example related, as will be described in more detail below). Four beam sensors S1-S4 are positioned at a common intermediate Z-height along the Z-axis (i.e., all have the same Z-axis coordinate value). Beam sensors S1 and S2 are positioned on opposite sides of the metrology frame volume and parallel to the YZ plane. Beam sensors S3 and S4 are positioned on opposite sides of the metrology frame volume and parallel to the XZ plane.

[0056] Figure 5 A specific embodiment of a sensor structure 160-5 is shown, comprising six beam sensors S1, S2, S3A, S3B, S4A, and S4B. Two beam sensors S3A and S3B, and groups of S4A and S4B, are positioned along the X-axis at different locations on each corresponding side of the metrology frame volume MFV-5. Figure 4 Compared to the specific implementation (i.e., in which a single beam sensor S3 and S4 are used on each corresponding side), it should be understood that Figure 5 Specific implementations may correspond to higher measurement resolution and / or higher measurement accuracy along the X-axis (e.g., for determining the position of a beam source structure). Such implementations may be advantageous for certain applications. For example, such implementations may be used in applications where movement and / or corresponding changes in position along the X-axis may be more common and / or considered relatively more important for accurate position determination compared to movement and / or corresponding changes in position along the Y-axis or Z-axis.

[0057] Figure 6 A specific embodiment of sensor structure 160-6 is shown, comprising fourteen beam sensors S1A-S1D, S2A-S2D, S3A-S3C, and S4A-S4C. For Figure 5 The advantages of the 160-5 sensor structure, Figure 6 The sensor structure 160-6 can have even higher measurement resolution and / or higher measurement accuracy along the X-axis direction (e.g., according to a group of three beam sensors S3A-S3C and S4A-S4C, such as being arranged at different positions on each corresponding side of the metrology frame volume MFV-6 along the X-axis direction). Furthermore, with... Figure 4 and Figure 5 Compared to the sensor structure, Figure 6 The sensor structure 160-6 can have higher measurement resolution and / or higher measurement accuracy along the Y-axis direction (e.g., according to a group of two beam sensors S1B and S1D and S2B and S2D, such as being arranged at different positions on each corresponding side of the metrology frame volume MFV-6 along the Y-axis direction, and as with...). Figure 4 and Figure 5 Compared to the previous configuration, a single beam sensor S1 and S2 is used on each corresponding side. Furthermore, it is also related to... Figure 4 and Figure 5 Compared to the sensor structure, Figure 6 The sensor structure 160-6 can also have higher measurement resolution and / or higher measurement accuracy along the Z-axis direction (e.g., according to a group of two beam sensors S1A and S1C and S2A and S2C, such as being arranged at different positions on each corresponding side of the metrology frame volume MFV-6 along the Z-axis direction, and as with...). Figure 4 and Figure 5 Compared to the previous configuration, a single beam sensor S1 and S2 is used on each corresponding side.

[0058] Figure 7 A specific embodiment of a sensor structure 160-7 is shown, comprising twelve beam sensors S1A, S1B, S2A, S2B, S3A-S3D, and S4A-S4D. In some cases, sensor structure 160-7 can be considered as... Figure 5 The sensor structure 160-5 is a double type (e.g., having two essentially identical structures separated along the Z-axis). Note that, compared to... Figures 4 to 6 Compared to the standard moving volume, the moving volume MV-7 is expressed as larger (i.e., with an increased dimension along the Z-axis). In some applications, it can be used... Figure 7 The specific implementation to provide with Figure 5 Similar measurement resolution and advantages in specific implementations (e.g., with) Figure 4 Compared to specific implementations, this includes higher measurement resolution and / or higher measurement accuracy along the X-axis direction, as configured relative to the increased moving volume MV-7 (e.g., with...). Figure 5 Compared to the MV-5, it has a larger dimension along the Z-axis.

[0059] Figures 8A to 8H This is an illustration of a beam source structure LC' that guides four exemplary beams B1-B4 to four beam sensors S1-S4 of a sensor structure 160', and generates four corresponding measurement points SP1-SP4 for different positions and orientations of the beam source structure LC'. In various specific embodiments, sensor structure 160' (e.g., and...) Figures 9A to 9C and Figure 10 The sensor structures 160” and 160”') can be similar to Figure 1 and Figure 4 The sensor structure (e.g., in which four beam sensors S1-S4 at least partially define the corresponding cubic metrology frame volume MFV). Figures 8A to 8HThe corresponding top views 810A-810H, front cross-sectional views 820A-820H, side cross-sectional views 830A-830H, and measurement point position views 840A-840H are shown (i.e., front views of the sensor surface of each beam sensor in the corresponding beam sensors S1-S4).

[0060] In various specific implementations, Figures 8A to 8H Examples (e.g., and) Figures 9A to 9C and Figure 10 The example can also illustrate the operation of sensor structures with a greater number of beam sensors (e.g., such as...). Figures 5 to 7 The exemplary configuration shown below illustrates the operation of four of the total number of beam sensors in a given configuration (e.g., four central beam sensors, etc.). Figures 8A to 8H Examples can also illustrate the operation of beam source structures with a greater number of beams (e.g., 10, 100, or 1000 beams, which in some cases can be guided in a relatively uniformly distributed three-dimensional direction, as described above). Figure 3 (As described). For such specific implementations, the examples described below may indicate the operation of four of the total number of beams in a given configuration (e.g., four most central beams and / or four beams specifically oriented along the X and Y axes, etc.). It should also be understood that for Figures 8A to 8H Examples (e.g., and for) Figures 9A to 9C and Figure 10 (For the purpose of simplifying the example shown), the relative sizes of beam sensors S1-S4 appear to be larger, the relative distance between beam sensors appears to be smaller, and there is no indication of offset between the source points of the different beams B1-B4.

[0061] exist Figure 8A In the example, the beam source structure LC' and the corresponding beams B1-B4 are shown at a specified "zero" position (e.g., including the corresponding "zero" orientation). More specifically, beams B1 and B2 are each parallel to the X-axis direction and are each guided to the center of beam sensors S1 and S2, respectively. Similarly, beams B3 and B4 are each parallel to the Y-axis direction and are each guided to the center of beam sensors S3 and S4, respectively. Beams B1-B4 respectively generate corresponding measurement points SP1-SP4 at the center of each beam sensor S1-S4. In various specific embodiments, beam sensors S1-S4 can be two-dimensional position-sensitive sensors (e.g., optical position sensors that can measure the position of measurement points such as those formed by the beams in a two-dimensional manner on the sensor surface).

[0062] Beam sensors S1-S4 output measurement signals indicating that measurement points SP1-SP4 are centered within beam sensors S1-S4. Given the known geometric relationship between beams B1-B4 and the beam source structure LC', the measurement signals from beam sensors S1-S4 indicate the position and orientation of the beam source structure LC' (e.g., as corresponding to...). Figure 8A (Example of position and orientation). The measurement signal can be processed (e.g., via processing unit 190), for which the processing can determine the position and orientation of the beam source structure LC' and / or the end tool ETL to which the beam source structure LC' is coupled (e.g., see...). Figure 1 )wait.

[0063] exist Figure 8B In the example (for example, with) Figure 8A Compared to the example, the beam source structure LC' is shown as having been rotated clockwise in the XY plane. View 810B (i.e., the view in the XY plane) shows the clockwise rotation and indicates the different positions of beams B1-B4 on beam sensors S1-S4. View 840B shows the positions of measurement points SP1-SP4, respectively generated by beams B1-B4, on beam sensors S1-S4. More specifically, it shows that measurement points SP1-SP4 have each moved to the middle right side of each beam sensor S1-S4.

[0064] exist Figure 8C In the example (for example, with) Figure 8A Compared to the example, the beam source structure LC' is shown as having been rotated clockwise in the XZ plane. View 820C (i.e., the view in the XZ plane) shows the clockwise rotation and indicates the different positions of beams B1 and B2 on beam sensors S1 and S2. In view 840C, measurement points SP1 and SP2 are shown as having moved to the middle top and middle bottom of beam sensors S1 and S2, respectively, while measurement points SP3 and SP4 have been kept at the center of beam sensors S3 and S4, respectively.

[0065] exist Figure 8D In the example (for example, with) Figure 8A Compared to the example, the beam source structure LC' is shown as having been rotated clockwise in the YZ plane. View 830D (i.e., a view of the YZ plane) shows the clockwise rotation and indicates the different positions of beams B3 and B4 on beam sensors S3 and S4. In view 840D, measurement points SP1 and SP2 are held at the centers of beam sensors S1 and S2, respectively, while measurement points SP3 and SP4 are shown as having moved to the middle top and middle bottom of beam sensors S3 and S4, respectively.

[0066] Note Figures 8B to 8DEach of the examples corresponds at least to a change in the orientation of the beam source structure LC'. In some specific implementations, the change shown may not additionally correspond to a change in position (e.g., depending on the location of the reference point assigned to the beam source structure LC', the change in position is determined relative to that location). Figures 8A to 10 In the examples, in various specific implementations, the reference point of the beam source structure can be specified at the geometric center or other center of the beam source structure.

[0067] exist Figure 8E In the example (for example, with) Figure 8A Compared to the example, the beam source structure LC' is shown as having moved toward the beam sensor S4 in the XY plane. View 810E (i.e., the view in the XY plane) shows the different positions of beams B1 and B2 on beam sensors S1 and S2. In view 840E, measurement points SP1 and SP2 are shown as having moved to the middle right and middle left of beam sensors S1 and S2, respectively, while measurement points SP3 and SP4 have remained at the center of beam sensors S3 and S4, respectively.

[0068] exist Figure 8F In the example (for example, with) Figure 8A Compared to the example, the beam source structure LC' is shown as having moved toward the beam sensor S1 in the XY plane. View 810F (i.e., the view in the XY plane) shows the different positions of beams B3 and B4 on beam sensors S3 and S4. In view 840F, measurement points SP1 and SP2 have been held at the center of beam sensors S1 and S2, respectively, while measurement points SP3 and SP4 are shown as having moved to the middle right and middle left of beam sensors S3 and S4, respectively.

[0069] exist Figure 8G In the example (for example, with) Figure 8A Compared to the example, the beam source structure LC' is shown as having moved upwards in the Z direction (i.e., parallel to the Z-axis). Views 820G and 830G (i.e., views in the XZ plane and YZ plane, respectively) show the different positions of beams B1 and B2 on beam sensors S1 and S2, and the different positions of beams B3 and B4 on beam sensors S3 and S4, respectively. In view 840G, measurement points SP1-SP4 are shown as having each moved to the top center of beam sensors S1-S4.

[0070] exist Figure 8H In the example (for example, with) Figure 8ACompared to the example, the beam source structure LC' is shown as having rotated clockwise in the XY plane and moved upward in the Z direction (i.e., parallel to the Z-axis). View 810H (i.e., the view in the XY plane) shows the clockwise rotation and the different positions of beams B1-B4 on beam sensors S1-S4. Views 820H and 830H (i.e., the views in the XZ plane and YZ plane, respectively) show the different positions of beams B1 and B2 on beam sensors S1 and S2, respectively, and the different positions of beams B3 and B4 on beam sensors S3 and S4, respectively. In view 840H, measurement points SP1-SP4 are shown as having each moved to the upper right corner of beam sensors S1-S4.

[0071] As described above, beam sensors S1-S4 can output measurement signals indicating the position of each measurement point SP1-SP4 on the respective beam sensors S1-S4. Given the known geometric relationship between beams B1-B4 and the beam source structure LC' (e.g., including the known angular orientations of beams B1-B4 as guided and associated with the beam source structure LC', and their mutual association), the positions of the measurement points SP1-SP4 on the beam sensors S1-S4 indicate the position and orientation of the beam source structure LC' (e.g., as corresponding to...). Figures 8A to 8H (Orientation in the example). Measurement signals from beam sensors S1-S4 can be processed (e.g., via processing unit 190). For this purpose, the processing can determine (e.g., at least in part using known geometric relationships, etc.) the position and orientation of the beam source structure LC' and / or the end tool ETL to which the beam source structure LC' is coupled (e.g., see...). Figure 1 )wait.

[0072] The measurement signals from beam sensors S1-S4 indicating the position and orientation of the beam source structure LC' should be understood as follows: Figures 8A to 8H The simplified examples all relate to beams B1-B4, each guided to a corresponding beam sensor S1-S4. More specifically, in each example, beam B1 is guided to beam sensor S1, beam B2 to beam sensor S2, beam B3 to beam sensor S3, and beam B4 to beam sensor S4. In these examples, it should be understood that if the beam source structure LC' is rotated 90 degrees, 180 degrees, or 270 degrees in the XY plane, similar measurement points can be produced at similar locations on beam sensors S1-S4, and for this purpose, it may be desirable to be able to distinguish such possibilities.

[0073] For example, for Figure 8AGiven the orientation shown, and assuming that beams B1-B4 are each guided to their respective beam sensors S1-S4, it should be understood that the measurement signals indicating that each measurement point SP1-SP4 is at the center of its respective beam sensor S1-S4 uniquely indicate that the beam source structure LC' is in the correct orientation. Figure 8A The positions and orientations shown in views 810A-830A (e.g., corresponding to the "zero position" in a given example). However, for top view 810A, if the configuration is rotated 90 degrees clockwise in the XY plane (e.g., for which will be combined below), Figure 9C (A further example of a 90-degree rotation will be described in more detail), similarly generating measurement points SP at the centers of beam sensors S1-S4. More specifically, beam B1 will generate measurement point SP1 at the center of beam sensor S4, beam B2 will generate measurement point SP2 at the center of beam sensor S3, beam B3 will generate measurement point SP3 at the center of beam sensor S1, and beam B4 will generate measurement point SP4 at the center of beam sensor S2. It should be understood that similar measurement points generated at the centers of beam sensors S1-S4 by different corresponding measurement beams can cause the structure to undergo similar clockwise rotations of 180 degrees and 270 degrees in the XY plane relative to the initial orientation shown in top view 810A.

[0074] To distinguish groups of measurement signals caused by such orientations (e.g., those that may otherwise appear relatively identical), it may be desirable for the system to be configured to determine (e.g., at least approximately) which beams are typically directed to which beam sensors. As one method for addressing this problem, position information from the mobile system 110 can be used for this distinction. For example, for the combination of the above... Figure 1 and Figure 2 The measurement system 110, based on position information determined by position sensors SEN1-SEN5 (e.g., received by the movement system position and orientation processing unit 147), can be used to determine the coarse position and orientation of the end-effector ETL and / or beam source structure LC (e.g., with movement system accuracy). While movement system accuracy may be lower than the accuracy desired in some applications, it can be useful for resolving (e.g., as described in conjunction with the examples above). More specifically, movement system accuracy may be able to provide coarse position information (e.g., indicating the coarse position and orientation of the end-effector ETL and / or beam source structure LC) that can be used to determine which beams are typically directed to which beam sensors.

[0075] Returning to the example above, in having Figure 8AIn a configuration where the measurement signals from beam sensors S1-S4 indicate that the measurement points are all centered on the beam sensors, the position and orientation information from the moving system can be used to determine the likelihood of the orientation of the beam source structure LC' (e.g., in a configuration where the measurement points are all centered on the beam sensors). Figure 8A (The rotation can be between 0 degrees, 90 degrees, 180 degrees, or 270 degrees). For example, position and orientation information from the moving system 110 can be used to determine whether a measurement point at the center of the beam sensor S1 is generated by beams B1, B2, B3, or B4. As noted above, although the accuracy of the measurement system may be relatively low, it can be effectively used by the metrology system to distinguish possibilities such as those described above (based on the coarse position information provided by the moving system), and for this purpose, the metrology system can then effectively provide higher-precision measurements according to processes such as those described herein.

[0076] In various specific embodiments, the general characterization of the relationship between the measurement signals of the mobile system 110 and the measurement signals of the metrology system 150 can be described as follows. Position and orientation information (e.g., including measurement results) determined by one or more position sensors SEN1-SEN5 of the mobile system 110 (i.e., having mobile system accuracy) can be characterized as providing relatively coarse scale information (e.g., coarse scale measurement results including position and orientation, etc.). Position and orientation information (e.g., including measurement results) determined by the metrology system 150 (e.g., based on measurement signals from a beam sensor) can be characterized as providing relatively fine scale information (e.g., fine scale measurement results including position and orientation, etc.). In various specific embodiments, measurements from the two systems can be combined to provide high-precision measurements over a relatively large unambiguous range (e.g., micrometer-level accuracy, such as over cubic meter moving volumes).

[0077] As some specific exemplary values, in one exemplary embodiment, the mobile system may have a positioning accuracy / potential position error of approximately 100 micrometers (e.g., an unambiguous range provided over a 1-meter cubic movement / measuring volume as a coarse scale range). In this example, the metrology system may be configured to address potential distance errors in coarse scale measurements, such as unambiguous ranges with distance errors greater than the potential distance error (e.g., an unambiguous range greater than 100 micrometers in this example, and micrometer-level accuracy as a fine scale range). Based on such exemplary values, measurements from both systems (e.g., position and orientation information) can be combined to provide high-precision measurements (e.g., micrometer-level accuracy over a 1-meter cubic movement volume).

[0078] For metrology systems such as those disclosed herein, this principle can also be generally described by identifying / distinguishing which beams of the beam source structure are directed to which beam sensors (e.g., for a given measurement point on the beam sensor). For the exemplary values ​​described above, a positioning accuracy / potential position error of approximately 100 micrometers for the moving system (e.g., having a non-ambiguous range provided over a 1-meter cubic moving / measuring volume as a coarse scale range) is sufficient to identify / determine / distinguish which beams are directed to which beam sensors. The non-ambiguous range of the metrology system (e.g., greater than 100 micrometers in the example above, and having micrometer-level accuracy as a fine scale range) can correspond to a range in which different positions and orientations of the beam source structure can be definitively determined (e.g., depending on whether the measurement point moves to different corresponding positions on the beam sensor or otherwise is in different corresponding positions, such as partially determined by…). Figures 8A to 8H (A simplified example is shown).

[0079] As an alternative and / or supplement to the above specific implementation (e.g., where position information from the mobile system is used for resolution), the light beam may also, or alternatively, have certain characteristics that can be used for resolution (e.g., enabling the determination of which beams are directed to which beam sensors). For example, the light beams may be arranged in a pattern (e.g., having unique portions). The following is combined with... Figures 9A to 9C and Figure 10 Simplified examples of specific implementations with beams arranged in a pattern are described in more detail. In various implementations, the beams may also, or alternatively, have different wavelengths (e.g., colors), timing, modulation, structure, and / or other characteristics that can be sensed / identified and used to determine which beams are directed to which beam sensors (e.g., for this purpose, the beam sensors may also have certain corresponding discriminative capabilities, such as including different color detectors, etc.). In various implementations, one or more characteristics of the beams (e.g., timing, modulation, etc.) may be controlled by the beam source structure control unit 192 (e.g., see...). Figure 2 The beam source structure control unit can provide associated signals (e.g., timing signals, etc.) to the sensor structure control and processing unit 180 and / or the metering system position and orientation processing unit 190 (e.g., to be used as part of the processing to receive measurement signals from the beam sensors and use the measurement signals to determine which beams are directed to which beam sensors).

[0080] Figures 9A to 9CThis is a diagram illustrating twelve exemplary beams B of a beam source structure LC and corresponding measurement points SP on four sensors S1-S4 of a sensor structure 160” for different positions and orientations of the beam source structure LC. More specifically, in various embodiments, the beam source structure LC provides and guides beams B1, B2A-B2C, B3A-B3C, and B4A-B4E to form corresponding measurement points SP1, SP2A-SP2C, SP3A-SP3C, and SP4A-SP4E on the beam sensors S1-S4. It should be understood that in Figures 9A to 9C In the example, the beams are arranged in a pattern (e.g., in...). Figure 9A The orientation of the beams results in a single beam B1 being guided to beam sensor S1, three beams B2A-B2C being guided to beam sensor S2, three beams B3A-B3C being guided to beam sensor S3, and five beams B4A-B4E being guided to beam sensor S4. It should be noted that such patterns may include different spacing and orientations between the beams (e.g., angular spacing and orientation) and / or other characteristics that allow a portion of the pattern guided to a beam sensor or group of beam sensors to be uniquely identified (e.g., for determining / distinguishing the orientation and / or location of the beam sensor structure).

[0081] exist Figure 9A In the example (with) Figure 8A (Due to certain similarities in orientation shown), the beam source structure "LC" and the corresponding beams B1, B2A-B2C, B3A-B3C, and B4A-B4E are shown as being at a designated "zero" position (e.g., including the corresponding "zero" orientation). More specifically, beam B1 and the central beam B2B are each parallel to the X-axis direction and are each guided to the center of beam sensors S1 and S2, respectively. Similarly, the central beams B3B and B4C are each parallel to the Y-axis direction and are each guided to the center of beam sensors S3 and S4, respectively.

[0082] exist Figure 9A In the orientation shown, beams B1, B2A-B2C, B3A-B3C, and B4A-B4E generate corresponding measurement points SP1, SP2A-SP2C, SP3A-SP3C, and SP4A-SP4E on beam sensors S1-S4, respectively. As shown in view 940A, measurement points SP1, SP2B, SP3B, and SP4C are all located at the centers of beam sensors S1, S2, S3, and S4, respectively. Note that the positions of these measurement points are related to... Figure 8A The locations of the measurement points shown are similar. However, this differs from generating only a single measurement point on each beam sensor. Figure 8A The difference lies in Figure 9AIn this process, based on the pattern of the beam provided and guided by the beam source structure "LC", measurement points of different numbers and / or arrangements are formed on different beam sensors.

[0083] For example, when beam B1 generates a single measurement point SP1 at the center of beam sensor S1, beams B2A-B2C and B3A-B3C each generate a row of three measurement points SP2A-SP2C and SP3A-SP3C in the middle of beam sensors S2 and S3, respectively. Furthermore, beam B4A-B4E generates a row of five measurement points SP4A-SP4E in the middle of beam sensor S4. It should be understood that such characteristics enable the determination of which beams are directed to which beam sensors (e.g., to enable differentiation relative to issues such as those described above), and for this purpose, which additional positional information (e.g., from the moving system) may be unnecessary (although in some specific implementations, this may be used in addition to such patterns or other information).

[0084] Beam sensors S1-S4 can output measurement signals indicating the positions of measurement points SP1, SP2A-SP2C, SP3A-SP3C, and SP4A-SP4E on beam sensors S1-S4. Given the known geometric relationships between beams B1, B2A-B2C, B3A-B3C, and B4A-B4E and the beam source structure LC', the measurement signals from beam sensors S1-S4 indicate the position and orientation of the beam source structure LC'. The measurement signals can be processed (e.g., via processing unit 190), for which the processing can determine the position and orientation of the beam source structure LC' and / or the end tool ETL to which the beam source structure LC' is coupled (e.g., see...). Figure 1 )wait.

[0085] exist Figure 9B In the example (for example, with) Figure 9A Compared to the example, the beam source structure "LC" is shown as having been rotated clockwise in the XY plane and in the Z direction (i.e., parallel to the Z-axis, having the same orientation as the example). Figure 8H(Some similarities to the examples) move upwards. View 910B (i.e., the view in the XY plane) shows a top view of the different positions of beams B1, B2A-B2B, B3A-B3B, and B4A-B4C on beam sensors S1-S4, rotated clockwise. Note that beams B2C, B3C, and B4D-B4E are no longer guided to their respective beam sensors, but rather to the spacing between the beam sensors of the sensor structure (e.g., as may typically occur for some or many beams in a relatively uniformly distributed beam pattern guided to a relatively finite number of beam sensors, which may have a finite size and be relatively far from the beam source structure, etc.). Cross-sectional views 920B and 930B (i.e., at the cross-sectional XZ and YZ planes, respectively) show the different positions of beams B1 and B2A on beam sensors S1 and S2, and the different positions of beams B3A and B4A on beam sensors S3 and S4, respectively.

[0086] In view 940B, measurement points SP1, SP2A-SP2B, SP3A-SP3B, and SP4A-SP4C are shown as having each moved to the top of the beam sensors S1-S4 and shifted to the right. It should also be noted that in view 940B, measurement points SP2C, SP3C, and SP4D-SP4E formed on the beam sensors S2-S4 are no longer present (i.e., because the corresponding beams B2C, B3C, and B4D-B4E are directed into the space between the beam sensors). This example partially illustrates why it might be desirable to have a sufficient number and / or relatively uniform distribution of beams emitted in the direction from the beam source structure. More specifically, for a given implementation, given the size of the beam sensor and its possible distance from the beam source structure (e.g., during measurement operations), it is generally desirable for the beam source structure to provide a sufficient number and density of beams in the direction surrounding the beam source structure. Such factors for the beam source structure help ensure that at least some or all of the beam sensors in the sensor structure have at least some beams guided to them (e.g., for all possible orientations of the beam source structure during measurement operation) to generate corresponding measurement points and corresponding measurement signals.

[0087] exist Figure 9C In the example (for example, with) Figure 9A Compared to the example, the beam source structure "LC" is shown as having been rotated a full 90 degrees clockwise in the XY plane. View 910C (i.e., the view in the XY plane) shows a top view of the beams B1, B2A-B2C, B3A-B3C, and B4A-B4E at different positions after a 90-degree clockwise rotation. Due to the 90-degree rotation, beam B1 is shown as being guided to beam sensor S4 (e.g., instead of as shown in the example). Figure 8AThe beams B2A-B2C are shown as being guided to the beam sensor S3 (e.g., instead of as shown in the diagram). Figure 8A The beams B3A-B3C are shown as being guided to the beam sensor S1 (e.g., instead of as shown in the diagram). Figure 8A The beams B4A-B4E are shown as being guided to the beam sensor S2 (e.g., instead of as shown in the diagram). Figure 8A The beams B1 and B2B are each parallel to the Y-axis and are guided to the centers of beam sensors S4 and S3, respectively. Similarly, the center beams B3B and B4C are each parallel to the X-axis and are guided to the centers of beam sensors S1 and S2, respectively.

[0088] exist Figure 9C In the orientation shown, beams B1, B2A-B2C, B3A-B3C, and B4A-B4E generate corresponding measurement points SP1, SP2A-SP2C, SP3A-SP3C, and SP4A-SP4E on beam sensors S4, S3, S1, and S2, respectively. As shown in view 940C, measurement points SP1, SP2B, SP3B, and SP4C are all located at the centers of beam sensors S4, S3, S1, and S2, respectively. As noted above, this differs from generating only a single measurement point on each beam sensor. Figures 8A to 8H The difference lies in Figure 9C In this process, based on the pattern of the beam provided and guided by the beam source structure "LC", different numbers of measurement points are formed on different beam sensors.

[0089] For example, when beam B1 generates a single measurement point SP1 at the center of beam sensor S4, beams B2A-B2C and B3A-B3C each generate a row of three measurement points SP2A-SP2C and SP3A-SP3C respectively in the middle of beam sensors S3 and S1. Furthermore, beam B4A-B4E generates a row of five measurement points SP4A-SP4E in the middle of beam sensor S2. It should be understood that such characteristics enable the determination of which beams are directed to which beam sensors (e.g., to enable differentiation relative to problems such as those described above).

[0090] For example, the measurement signal from the beam sensor S4 indicates the position of a single measurement point SP1 at the center of the beam sensor S4, as uniquely corresponding to beam B1 (e.g., with). Figure 9ACompared to the orientation, the measurement signal from beam sensor S1 uniquely indicates the beam B1 as guided to beam sensor S1. The measurement signal from beam sensor S4 indicates the position of measurement points SP4A-SP4E in the row at the middle of beam sensor S4, as uniquely corresponding to beams B4A-B4E (e.g., with). Figure 9A Compared to the orientation, the measurement signal from beam sensor S4 uniquely indicates the beams B4A-B4E that are guided to beam sensor S4. Based on the pattern of the beam from the beam source structure LC”, which has a uniquely or otherwise distinguishable patterned portion, a corresponding unique patterned portion measurement point can be formed on the respective beam sensor to which the patterned portion is guided. This configuration allows the measurement signals from the beam sensors to be used to determine which beams are guided to which beam sensors (e.g., to distinguish and / or otherwise determine the position and orientation of the beam source structure LC” relative to beam sensors S1-S4).

[0091] Figure 10 This is an illustration showing eighteen exemplary beams B of the beam source structure LC”' and corresponding measurement points SP on the four sensors S1-S4 of the sensor structure 160”'. More specifically, in various specific embodiments, the beam source structure LC”' provides and guides beams B1, B2A-B2E, B3A-B3E, and B4A-B4G to form (in certain positions and orientations) corresponding measurement points SP1, SP2A-SP2E, SP3A-SP3E, and SP4A-SP4G on the beam sensors S1-S4. It should be understood that, in Figure 10 In the example, the beams are arranged in a pattern (e.g., in...). Figure 10 The orientation of the beams results in a single beam B1 being guided to beam sensor S1, five beams B2A-B2E being guided to beam sensor S2, five beams B3A-B3E being guided to beam sensor S3, and seven beams B4A-B4G being guided to beam sensor S4. It should be noted that such a pattern may include different spacing and orientations (e.g., angular spacing and orientation) between beams and relative to the beam source structure LC”' and / or other characteristics that allow a portion of the pattern guided to a beam sensor or group of beam sensors to be uniquely identified (e.g., for determining / distinguishing the orientation and / or location of the beam sensor structure, etc.).

[0092] exist Figure 10 In the example (with) Figure 8A and Figure 9A(Due to certain similarities in orientation shown), the beam source structure LC”' and the corresponding beams B1, B2A-B2E, B3A-B3E, and B4A-B4G are shown as being at a designated “zero” position (e.g., including the corresponding “zero” orientation). More specifically, beam B1 and the central beam B2B are each parallel to the X-axis direction and are each guided to the center of beam sensors S1 and S2, respectively. Similarly, the central beams B3C and B4C are each parallel to the Y-axis direction and are each guided to the center of beam sensors S3 and S4, respectively.

[0093] exist Figure 10 In the orientation shown, beams B1, B2A-B2E, B3A-B3E, and B4A-B4G generate corresponding measurement points SP1, SP2A-SP2E, SP3A-SP3E, and SP4A-SP4G on beam sensors S1-S4, respectively. As shown in view 1040, measurement points SP1, SP2B, SP3C, and SP4C are all located at the centers of beam sensors S1, S2, S3, and S4, respectively. Note that the positions of these center measurement points are... Figure 9A The location of the central measurement point shown is similar. However, unlike any of the surrounding measurement points, it is generated solely by a beam of light in the same XY plane. Figure 9A The difference lies in Figure 10 In addition, different numbers and / or arrangements of surrounding measurement points are also generated by other beams, some of which are not in the same XY plane.

[0094] For example, as further shown in view 1040, when beam B1 generates a single measurement point SP1 at the center of beam sensor S1, beam B2A-B2E generates a pattern of five measurement points SP2A-SP2E (corresponding to a portion of the entire pattern of the beam source structure LC”'). More specifically, the pattern of five measurement points SP2A-SP2E includes measurement points SP2A-SP2C in the row in the middle of beam sensor S2, and measurement points SP2D, SP2B, and SP2E in the column in the middle of beam sensor S2.

[0095] For beam sensor S3, beams B3A-B3E produce a pattern of five measurement points SP3A-SP3E (corresponding to a portion of the entire pattern of beam source structure LC"'). More specifically, the pattern of five measurement points SP2A-SP2E includes measurement points SP2A-SP2E in the middle column of beam sensor S3. For beam sensor S4, beams B4A-B4G produce a pattern of seven measurement points SP4A-SP4G (corresponding to a portion of the entire pattern of beam source structure LC"'). More specifically, the pattern of seven measurement points SP4A-SP4G includes measurement points SP2A-SP2E in the middle row of beam sensor S4, and measurement points SP4F, SP4C, and SP4G in the middle column of beam sensor S4.

[0096] and Figures 9A to 9C Compared to the configuration, it should be understood that Figure 10 The configuration provides beams arranged in different planes and having further different angular orientations relative to each other and relative to the beam source structure LC'. It should be understood that such characteristics can further enable the determination of which beams are directed to which beam sensors (e.g., to enable resolution relative to issues such as those described above), including rotation and / or movement in planes other than the XY plane (e.g., rotation and / or movement in planes such as the XZ and / or YZ planes), and for this purpose which additional positional information (e.g., from the movement system) may be unnecessary (e.g., although such patterns or other information may be used in some specific implementations).

[0097] Beam sensors S1-S4 can output measurement signals indicating the positions of measurement points SP1, SP2A-SP2E, SP3A-SP3E, and SP4A-SP4G on beam sensors S1-S4. Given the known geometric relationships between beams B1, B2A-B2E, B3A-B3E, and B4A-B4G and the beam source structure LC”', the measurement signals from beam sensors S1-S4 indicate the position and orientation of the beam source structure LC”' (e.g., as corresponding to...). Figure 10 (Example of position and orientation). The measurement signal can be processed (e.g., via processing unit 190), for which the processing can determine the position and orientation of the beam source structure LC”' and / or the end tool ETL to which the beam source structure LC”' is coupled (e.g., see...). Figure 1 )wait.

[0098] Further for Figures 9A to 10Any beam pattern shown should be understood to include, in some configurations, a beam pattern of the beam source structure that may include repeating beam pattern portions, such as those directed to a beam sensor (or a portion of a beam sensor), as well as unique or otherwise distinguishable portions for resolving. In such specific implementations, the unique or otherwise distinguishable pattern portions may be essentially used as a type of coarse or absolute pattern “marker” or “code” that can be used for resolving.

[0099] Figure 11 This is a block diagram of a second exemplary embodiment of a mobility and metering system 100', including a mobility system 110 and a metering system 150'. The mobility system 110 is typically associated with... Figure 1 The same mobile system, and will be combined Figure 1 This can be understood from the above description. As noted above, the mobile system 110 (e.g., an articulated robot) includes a movable structure MAC (e.g., a movable arm structure) and a motion control and processing system 140 (e.g., see [link to documentation]). Figure 2 The metrology system 150' includes a sensor structure 160", a beam source structure LC", and a metrology system position and orientation processing unit 190 (see, for example, see...). Figure 2 As noted above, Figure 2 This is a block diagram showing a control and processing unit 200, which can be used as... Figure 11 It is part of the system, and will be described in more detail below. Figure 11 Some related functions. In Figure 11 In this configuration, the beam source structure LC”” is shown as beam source portions LP1 and LP2 located on the sides of the metrology frame volume MFV’, and is shown as guiding the arrowed beams in different directions, including toward the sensor structure 160”” (e.g., which includes a beam sensor, as will be described in more detail below). The sensor structure 160”” is shown as coupled to the end tool ETL. As will be described in more detail below, the metrology system 150’ can be used to track position and orientation (e.g., the position and orientation of the end tool ETL as moved by the movement system 110).

[0100] It should be understood that Figure 11 A component with a specific number represented by a certain number of prime numbers (e.g., 1XX' or 1XX"") or other similar or identical reference numerals may correspond to and / or have the same... Figure 1 The corresponding parts with specific or identical numbers 1XX and other figures herein operate in a similar manner and can be understood in a similar way, unless otherwise described below. This numbering scheme for indicating elements with similar design and / or function (i.e., unless otherwise stated and / or described) also applies elsewhere herein (e.g., relative to...). Figures 12A to 12D(and other figures relative to the description above).

[0101] In various specific implementations, the metrology system 150' may be included in or otherwise added to the mobile system 110 (e.g., as part of an improved configuration added to an existing mobile system 110). Generally, the metrology system 150' can be used to provide determination of the position and orientation of the end-tool ETL (e.g., with an improved level of accuracy relative to the accuracy of the mobile system 110). More specifically, as will be described in more detail below, the metrology system 150' can be used to determine the relative position of the metrological position coordinates indicating the end-tool position ETP and the orientation of the end-tool ETL with an accuracy level superior to that of the mobile system.

[0102] In various specific implementations, the beam source structure "LC" includes multiple beam source sections LP (e.g., beam source sections LP1-LP4), as will be discussed below. Figures 12A to 12D A more detailed description. In Figure 11 In the cross-sectional view shown, beam source portions LP1 and LP2 are shown at the far left and far right, respectively, and the general positions of beam source portions LP3 and LP4 (e.g., they would be located outside and inside the page, respectively) are indicated by dashed lines. Generally speaking, some possible positions of beam source portions LP1-LP4 will resemble... Figure 1 , Figure 4 and Figures 8A to 10 This can be understood by examining the positions of the beam sensors S1-S4 in the configuration.

[0103] The beam source portions LP1-LP4 are located at fixed positions that at least partially define the metrology frame volume MFV' (e.g., each may be located on a frame, wall, or other structure). The metrology frame volume MFV' is configured to be located around at least a portion of the movable volume MV (e.g., where at least a portion of the end tool ETL is moved by the moving system 110). The beam source structure LC”” is configured (e.g., by the beam source structure control unit 192) to operate to guide the beam to the beam sensor of the sensor structure 160””, thereby indicating and enabling the determination of the position and orientation of the sensor structure 160””. In various specific embodiments, the sensor structure 160”” of the metrology system 150' includes multiple beam sensors (e.g., beam sensors S1-S4, which may be arranged in a square configuration, as will be described below). Figures 12A to 12D (Described in more detail). In some specific embodiments, the beam sensor of sensor structure 160” may be a structure surrounding at least a portion of the end tool ETL and / or end tool mounting structure ETMC.

[0104] Sensor structure 160" is configured to be coupled to at least one of an end-tool ETL or an end-tool mounting structure ETMC. It should be understood that when the end-tool ETL is coupled to the end-tool mounting structure ETMC, sensor structure 160" is then coupled to both the end-tool ETL and the end-tool mounting structure ETMC. The position and orientation of sensor structure 160" indicates the position and orientation of the end-tool ETL. This will be discussed in conjunction with the following... Figures 12A to 12D Described in more detail, the beam guided to the beam sensor (e.g., beam sensors S1-S4) of the sensor structure 160”” is configured to generate a measurement point SP at a position on the beam sensor, which causes the beam sensor to generate a corresponding measurement signal. The metrology system position and orientation processing unit 190 is configured to process the measurement signal from the beam sensor of the sensor structure 160””, wherein the measurement signal from the beam sensor indicates the position and orientation of the sensor structure 160””, and correspondingly indicates the position and orientation of the end tool ETL.

[0105] In various specific implementations, the movable volume MV comprises a volume in which at least a portion of at least one of the end tool ETL and / or sensor structure 160”” is movable. Figure 11 In the example, the moving volume MV is shown as a volume in which the contact point CP of the end tool ETL can move when inspecting the workpiece. As an alternative example, the moving volume may optionally include a volume in which the sensor structure 160"" can move when the end tool ETL is moved to inspect the workpiece. In various specific embodiments, the moving system 110 is configured to move the active structure MAC so that at least a portion of the end tool ETL (e.g., including the contact point CP) mounted to the end tool mounting structure ETMC moves along at least two dimensions (e.g., x and y dimensions) within the moving volume MV. Figure 11 In the example, this part of the end tool ETL (e.g., the contact point CP) can be moved by the moving system 110 along three dimensions (e.g., x, y, and z dimensions).

[0106] In various specific implementations, for Figure 2The control and processing unit, latch unit 181, and / or metering system position and orientation processing unit 190 and / or beam source structure control unit 192 may be included as part of an external control system ECS (e.g., as part of an external computer, etc.). The beam source structure control unit 192 may provide power and / or control signals to the beam source structure LC”” and / or portions thereof, including beam source portions LP1-LP4 (e.g., to one or more beam sources, etc., of the beam source portions LP1-LP4 of the beam source structure LC””). The latch unit 181 may be included as part of the sensor structure control and processing unit 180 (e.g., it may provide power and / or receive measurement signals from and / or provide control signals to the beam sensor of the sensor structure 160””, and it may provide such signals and / or other signals to and from the metering system position and orientation processing unit 190).

[0107] In various embodiments, latch unit 181 is configured to input at least one input signal related to the end-tool position (ETP), determine the timing of a trigger signal based on the at least one input signal, and output the trigger signal to at least one of the metrology system position and orientation processing unit 190 or the beam sensor of sensor structure 160””. In various embodiments, metrology system position and orientation processing unit 190 and / or sensor structure 160”” are configured to determine a current measurement signal from the beam sensor (e.g., corresponding to the current position and orientation of sensor structure 160”” and / or end-tool ETL) in response to receiving the trigger signal. In various embodiments, metrology system position and orientation processing unit 190 is configured to process the measurement signal, such as the timing corresponding to the trigger signal, to determine the position and orientation of sensor structure 160”” and / or end-tool ETL at the time of the trigger signal.

[0108] In various embodiments, once the position and orientation of the sensor structure 160"" are determined, the position and orientation of the end-effector can be determined accordingly (e.g., based on the known geometric relationship, relative positioning, offset, etc., between the sensor structure 160"" and the end-effector ETL). In various embodiments, the sensor structure 160"" may be directly attached to the end-effector ETL (e.g., partially surrounding a portion of the end-effector ETL), or attached to or very close to the end-effector mounting structure (e.g., such that there is minimal or no gap between the end-effector ETL and the sensor structure 160""). Figure 11In a specific implementation, the sensor structure 160”” is shown at or at least near the end-tool position ETP (e.g., a designated reference position for the end-tool ETL). This configuration can reduce complexity and / or otherwise improve the accuracy of determining the position and orientation of the end-tool ETL, as calculated relative to the determined position and orientation of the sensor structure 160””.

[0109] In various specific implementations, determining the position and orientation of the end-tool ETL can be further used to determine certain additional positional information (e.g., for determining the position of the contact point CP). As noted above, in various specific implementations, the measurement results of the workpiece surface can be determined by bringing the contact point CP of the end-tool ETL into contact with the workpiece surface. For such measurements, both the position and orientation of the end-tool ETL can be determined, which can accordingly indicate the position of the contact point CP. As mentioned above... Figure 1 and Figure 2 In various specific implementations, different types of end-tool ETLs can provide different types of outputs (e.g., such as those that can be used relative to latch section 181).

[0110] In various specific implementations, the metrology system 150' can be configured to determine the position and orientation of the sensor structure 160"" and / or the end-effector ETL based on measurement signals from the beam sensor of the sensor structure 160"". It should be understood that such a system may have certain advantages over various alternative systems (e.g., photogrammetry systems), such as those described above. Figure 1 and Figure 2 As described above. For example, in various specific embodiments, systems such as those disclosed herein may be smaller and / or cheaper and / or more accurate than certain alternative systems using alternative techniques (e.g., including certain photogrammetric systems, etc.), such as those that can be alternatively used to track the position and orientation of a moving system. The disclosed system also does not occupy or obscure any part of the moving volume MV, such as alternative systems that may include rulers or references on the ground or platform, or rulers or references in the same area (e.g., within the moving volume MV) where the workpiece can be otherwise processed and / or inspected.

[0111] In the metrology system 150' disclosed herein, a coherent light source can typically be used. For example, the light source for the beam source portion LP of the beam source structure LC”” can be a coherent light source (e.g., a laser source), for which the beam can be a coherent beam (e.g., a laser beam). Diffractive optical elements (e.g., as described above) Figure 3 The aforementioned can be used to generate a number of diffracted beams (e.g., which can be dispersed in many directions emanating from the beam source portion LP and entering the moving volume MV). In various specific embodiments, the beam source portion LP may include... Figure 3The beam source section LP may contain certain components similar to those in the beam source section LP. For example, each beam source section LP may include at least one light source (e.g., similar to light source LS1) and may further include components such as reflecting elements, beam splitters, diffractive optical elements, and / or lenses. Using such components, it should be understood that the beam source section may be configured to project a beam into a moving volume MV (e.g., as shown in the image). Figure 11 (The beam source sections LP1 and LP2 are shown).

[0112] In various embodiments, relatively small portions of a plurality of diffracted or otherwise provided beams may be directed to or otherwise received by a beam sensor of sensor structure 160”” (e.g., to generate a corresponding measurement point SP on the beam sensor). In various embodiments, the beam sensor may be a two-dimensional position-sensitive sensor (e.g., a lensless camera, a position-sensitive detector, an optical position sensor that can measure the position of a light spot in a two-dimensional manner on a sensor surface, etc.).

[0113] In various specific implementations, measurement signals from the beam sensor (e.g., indicating the two-dimensional position of the measurement point SP formed by the beam, for which the centroid of each measurement point can be calculated / determined based on XYZ coordinates) can be combined with known characteristics of the sensor structure 160"" and the beam source structure LC"" (e.g., laser projection based on known geometric relationships of the beams, including the relative three-dimensional angles of each beam and taking into account any offset of each beam at its source, etc.) to calculate / determine the position and orientation of the sensor structure 160"" (e.g., as based on nonlinear least squares and / or other processing / computation techniques). In other words, known vectors of the beams can be fitted to known positions where they intersect on the beam sensor (e.g., in XYZ coordinates) (e.g., based on the position of the measurement point SP) to determine the position and orientation of the sensor structure 160""). In various specific implementations, the measurement point SP on the beam sensor can be uniquely identified (e.g., in part by using coarse position information determined according to the moving system 110, and / or based on unique pattern information of the beam and / or other characteristics, such as a pseudo-random pattern having a unique or otherwise identifiable portion).

[0114] It should be understood that the combination of such features and characteristics of metrology system 150' results in higher accuracy in position and orientation determination compared to those provided by other systems (e.g., photogrammetric systems, such as those described above). As some particular advantages, it should be noted that the beam used in metrology system 150' has corresponding orientation information that is lacking in photogrammetry and may be more sensitive to orientation (e.g., the orientation of sensor structure 160" and end-effector ETL). This can significantly improve accuracy. Furthermore, the measurement point SP can be detected directly on the beam sensor rather than imaged, thus avoiding certain potential aberration errors, etc.

[0115] Figures 12A to 12D This diagram illustrates four exemplary beams B1-B4 of the beam source portions LP1-LP4 of the beam source structure LC””’ and corresponding measurement points SP1-SP4 on the four sensors S1-S4 of the sensor structure 160””’ at different positions and orientations. In various specific embodiments, the beam source structure LC””’ may be similar to Figure 11 The beam source structure (e.g., where four beam source portions LP1-LP4 at least partially define the corresponding cubic metrology frame volume MFV). Figures 12A to 12D The corresponding top views 1210A-1210D, front cross-sectional views 1220A-1220D, side cross-sectional views 1230A-1230D, and measurement point position views 1240A-1240D are shown (i.e., front views of the sensor surface of each beam sensor in the corresponding beam sensors S1-S4).

[0116] In various specific implementations, Figures 12A to 12D The examples can also illustrate the operation of sensor structures with a greater number of beam sensors; for this purpose, the examples described below illustrate the operation of four out of the total number of beam sensors in a given configuration. Figures 12A to 12D Examples may also illustrate the operation of beam source structures with a greater number of beam source portions and / or beams (e.g., 10, 100, or 1000 beams, which in some cases can be guided in a relatively uniformly distributed three-dimensional direction, such as from the beam source portions into the moving volume MV). For such specific implementations, the examples described below may indicate the operation of four of the total number of beams in a given configuration (e.g., four most central beams and / or four beams specifically oriented along the X and Y axes toward the center of the moving volume MV, etc.). It should also be understood that for Figures 12A to 12D For the purpose of simplifying the example shown, the relative sizes of the beam sensors S1-S4 appear to be larger, and the relative distances between and to the beam source portions appear to be smaller.

[0117] exist Figure 12A In the example, sensor structure 160""' and the corresponding sensors S1-S4 are shown at a designated "zero" position (e.g., including the corresponding "zero" orientation). More specifically, beam sensors S1 and S2 (i.e., the sensor surfaces of beam sensors S1 and S2) are each orthogonal to the X-axis direction, and for this purpose, beams B1 and B2 are each guided to the center of beam sensors S1 and S2, respectively. Similarly, beam sensors S3 and S4 are each orthogonal to the Y-axis direction, and for this purpose, beams B3 and B4 are each guided to the center of beam sensors S3 and S4, respectively. Beams B1-B4 respectively generate corresponding measurement points SP1-SP4 at the center of each beam sensor S1-S4. In various specific embodiments, beam sensors S1-S4 can be two-dimensional position-sensitive sensors (e.g., optical position sensors that can measure the position of a measurement point formed by a beam in a two-dimensional manner on the sensor surface).

[0118] Beam sensors S1-S4 can output measurement signals indicating that measurement points SP1-SP4 are at the center of beam sensors S1-S4. Given the known geometric relationships between beam sensors S1-S4, beams B1-B4, and beam source structure LC””’ of sensor structure 160””’, the measurement signals from beam sensors S1-S4 indicate the position and orientation of sensor structure 160””’ (e.g., as corresponding to…). Figure 12A (Example of position and orientation). The measurement signal can be processed (e.g., via processing unit 190), for which processing can determine the position and orientation of sensor structure 160””’ and / or the end tool ETL to which sensor structure 160””’ is coupled (e.g., see Figure 11 )wait.

[0119] exist Figure 12B In the example (for example, with) Figure 12A Compared to the example, sensor structure 160" is shown as having been rotated counterclockwise in the XY plane. View 810B (i.e., the view in the XY plane) shows the counterclockwise rotation and indicates the different positions of beam sensors S1-S4 relative to beams B1-B4. View 840B shows the positions of measurement points SP1-SP4, as generated by beams B1-B4 respectively, on beam sensors S1-S4. More specifically, it shows that measurement points SP1-SP4 have each moved toward the middle left of each beam sensor S1-S4.

[0120] Note Figure 12B The example at least corresponds to a change in the orientation of sensor structure 160"". In some specific implementations, the change shown may not additionally correspond to a change in position (e.g., depending on the location of the reference point specified for sensor structure 160"", the change in position is determined relative to that location). Figures 12A to 12D In the examples, in various specific implementations, the reference point of the sensor structure may be specified at the geometric center or other center of the sensor structure.

[0121] exist Figure 12C In the example (for example, with) Figure 12A Compared to the example shown, sensor structure 160" is shown as having moved toward the beam source portion LP4 in the XY plane. View 1210C (i.e., the XY plane view) shows the different positions of beam sensors S1 and S2 relative to beams B1 and B2. In view 1240C, measurement points SP1 and SP2 are shown as having moved toward the middle right and middle left of beam sensors S1 and S2, respectively, while measurement points SP3 and SP4 have remained at the center of beam sensors S3 and S4, respectively.

[0122] exist Figure 12D In the example (for example, with) Figure 12A Compared to the example shown, sensor structure 160" is shown as having moved toward beam sensor S1 in the XY plane. View 1210D (i.e., the XY plane view) shows different positions of beam sensors S3 and S4 relative to beams B3 and B4. In view 1240D, measurement points SP1 and SP2 have been held at the centers of beam sensors S1 and S2, respectively, while measurement points SP3 and SP4 are shown as having moved toward the middle right and middle left of beam sensors S3 and S4, respectively.

[0123] As described above, beam sensors S1-S4 can output measurement signals indicating the position of each measurement point SP1-SP4 on the corresponding beam sensors S1-S4. Given the known geometric relationships between the beam sensors S1-S4 of the sensor structure 160””’, the beams B1-B4, and the beam source structure LC””’ (e.g., the known angular and spatial relationships of the beam sensors S1-S4 of the sensor structure 160””’, and the known angular orientations and spatial relationships of the beams B1-B4 as guided and associated with the beam source portions LP1-LP4 of the beam source structure LC””’, and their relationships with each other), the positions of the measurement points SP1-SP4 on the beam sensors S1-S4 indicate the position and orientation of the sensor structure 160””’ (e.g., as corresponding to…). Figures 12A to 12D (The position and orientation in the example). Measurement signals from beam sensors S1-S4 can be processed (e.g., by processing unit 190). For this purpose, processing can determine (e.g., at least in part using known geometric relationships, etc.) the position and orientation of sensor structure 160””’ and / or the end tool ETL to which sensor structure 160””’ is coupled (e.g., see Figure 11 )wait.

[0124] As mentioned above Figures 8A to 10 As described in the examples, in various specific implementations (e.g., for the purpose of discrimination, etc.), it may be desirable for the system to be configured to determine (e.g., at least approximately) which beams are typically directed to which beam sensors. As noted above, as a method for addressing such problems, position information from the mobile system 110 can be used for discrimination. For example, for the purposes described above... Figure 1 , Figure 2 and Figure 11 The measurement system 110, based on position information determined by position sensors SEN1-SEN5 (e.g., received by the movement system position and orientation processing unit 147), can be used to determine the coarse position and orientation of the end-effector ETL and / or sensor structure 160""' (e.g., with movement system accuracy). While movement system accuracy may be lower than the accuracy desired in some applications, it can be useful for making resolutions (e.g., as described in conjunction with the examples above). More specifically, movement system accuracy may be able to provide coarse position information (e.g., indicating the coarse position and orientation of the end-effector ETL and / or sensor structure 160""'), which can be used to determine which beams are directed to which beam sensors, and for this purpose, the metrology system 150' can then effectively provide higher-precision measurements according to processes such as those described herein.

[0125] In various specific embodiments, the general characterization of the relationship between the measurement signals of the mobile system 110 and the measurement signals of the metrology system 150' can be described as follows. Position and orientation information (e.g., including measurement results) determined by one or more position sensors SEN1-SEN5 of the mobile system 110 (i.e., having mobile system accuracy) can be characterized as providing relatively coarse scale information (e.g., coarse scale measurement results including position and orientation, etc.). Position and orientation information (e.g., including measurement results) determined by the metrology system 150' (e.g., based on measurement signals from a beam sensor) can be characterized as providing relatively fine scale information (e.g., fine scale measurement results including position and orientation, etc.). In various specific embodiments, the measurements of the two systems can be combined to provide high-precision measurements over a relatively large unambiguous range (e.g., accuracy such as in cubic meter moving volumes).

[0126] As an alternative and / or supplement to the above-described embodiments (e.g., where position information from the mobile system is used for discrimination), the light beam may also or alternatively possess certain characteristics that can be used for discrimination (e.g., enabling the determination of which beams are directed to which beam sensors). For example, the light beam may be arranged in a pattern (e.g., having unique portions). In various embodiments, the light beam may also or alternatively have different wavelengths (e.g., colors), timing, modulation, structure, and / or other characteristics that can be sensed / identified and used to determine which beams are directed to which beam sensors (e.g., for this purpose, the beam sensors may also have certain corresponding discriminative capabilities, such as including different color detectors, etc.). In various embodiments, one or more characteristics of the light beam (e.g., timing, modulation, etc.) may be controlled by the beam source structure control unit 192 (e.g., see...). Figure 2 The beam source structure control unit can provide associated signals (e.g., timing signals, etc.) to the sensor structure control and processing unit 180 and / or the metering system position and orientation processing unit 190 (e.g., to be used as part of the processing to receive measurement signals from the beam sensors and use the measurement signals to determine which beams are directed to which beam sensors).

[0127] Figure 13 This is a flowchart illustrating an exemplary embodiment of routine 1300 for operating the measurement system. At block 1310, the beam source structure is operated to guide the beam to a beam sensor of the sensor structure, thereby indicating the position and orientation of the end tool. In various embodiments, one of the beam source structure or the sensor structure is coupled to at least one of the end tool mounting structure of the end tool or the moving system of the moving end tool. The beam guided to the beam sensor causes the beam sensor to generate a corresponding measurement signal. At block 1320, the measurement signal from the beam sensor of the sensor structure is processed to determine the position and orientation of the end tool.

[0128] Various exemplary embodiments of this disclosure are described below, wherein various features and elements are used... Figures 1 to 13 Reference numerals are used to indicate exemplary embodiments, and the features and elements are not limited to those specified herein. Figures 1 to 13 The specific implementation scheme shown.

[0129] According to one aspect, a metering system is provided for use with a mobile system 110 of a mobile end-effector tool ETL (e.g., Figure 1 Metering system 150 or Figure 11The metering system 150'. The movement system 110 includes an active structure MAC and a motion control system 140. The active structure MAC includes an end tool ETL configured to be mounted on an end tool mounting structure ETMC. The motion control system 140 is configured to control the position and orientation of the end tool based at least in part on controlling the active structure MAC, so as to move at least a portion of the end tool ETL mounted on the end tool mounting structure ETMC within a movement volume MV.

[0130] In the first specific implementation (e.g., as Figure 1 As shown, the metrology system 150 includes a sensor structure 160, a beam source structure LC, and a processing unit 190. The sensor structure 160 includes a plurality of beam sensors S1-S4 (e.g., located at fixed positions that at least partially define a metrology frame volume MFV, wherein the metrology frame volume MFV is configured to surround at least a portion of a movable volume MV). The beam source structure LC is configured to guide a beam to the beam sensors S1-S4 of the sensor structure 160 (e.g., to indicate the position and orientation of the beam source structure LC, which correspondingly indicates the position and orientation of the end tool ETL). The beam source structure LC is configured to be coupled to at least one of the end tool ETL or the end tool mounting structure ETMC. The position and orientation of the beam source structure LC indicate the position and orientation of the end tool ETL. The beam guided to the beam sensors S1-S4 is configured (e.g., by generating a measurement point SP at a position on the beam sensors S1-S4) to cause the beam sensors S1-S4 to generate a corresponding measurement signal. The processing unit 190 is configured to process measurement signals from the beam sensors S1-S4 of the sensor structure 160, wherein the measurement signals from the beam sensors S1-S4 indicate the position and orientation of the beam source structure LC, which in turn indicate the position and orientation of the end tool ETL.

[0131] In the second specific implementation (e.g., as Figure 11As shown, the metrology system 150' includes a sensor structure 160"", a beam source structure LC"", and a processing unit 190. The beam source structure LC"" includes multiple beam source portions LP1-LP4 (e.g., located at fixed positions that at least partially define the metrology frame volume MFV', wherein the metrology frame volume MFV' is configured to surround at least a portion of the movable volume MV). The beam source structure LC"" is configured to guide a beam to a beam sensor of the sensor structure 160"" (e.g., to indicate the position and orientation of the sensor structure 160"" which correspondingly indicates the position and orientation of the end tool ETL). The sensor structure 160"" is configured to be coupled to at least one of the end tool ETL or the end tool mounting structure ETMC. The position and orientation of the sensor structure 160"" indicates the position and orientation of the end tool ETL. The beam guided to the beam sensor is configured (e.g., by generating a measurement point SP at a position on the beam sensor) to cause the beam sensors S1-S4 to generate corresponding measurement signals. The processing unit 190 is configured to process measurement signals from the beam sensor of the sensor structure 160””, wherein the measurement signals from the beam sensor indicate the position and orientation of the sensor structure 160””, which in turn indicate the position and orientation of the end tool ETL.

[0132] Each beam sensor S1-S4 of sensor structures 160, 160”” may include a two-dimensional position-sensitive sensor, for which a measurement signal from beam sensor S1-S4 indicates the two-dimensional position of measurement point SP generated by the beam on beam sensor S1-S4. Beam source structures LC, LC”” may include one or more diffractive optical elements DOE (e.g., as part of one or more beam source portions LP), and the beam B from beam source structures LC, LC”” may be a diffractive beam DLB. The active structure MAC may be an active arm structure.

[0133] The motion control system 140 can be configured to sense and control the position and orientation of the end-tool ETL at an accuracy level defined as the motion system accuracy, based at least in part on sensing and controlling the position and orientation of the end-tool ETL using multiple position sensors SEN1-SEN5 included in the active structure MAC. The processing unit 190 can be operated to determine the position and orientation of the end-tool ETL at an accuracy level superior to the motion system accuracy, based at least in part on processing measurement signals from beam sensors S1-S4 of sensor structures 160, 160"". The beam B guided by beam source structures LC, LC"" to sensor structures 160, 160"" may include a first beam, and the determination of which beam sensor the first beam is guided to may be based at least in part on the sensed position and orientation of the end-tool ETL as determined by using multiple position sensors SEN1-SEN5 included in the active structure MAC. The beam sensor to which the first beam is guided may be a first beam sensor S1, and the processing unit 190 may be able to operate to determine the position and orientation of the end tool ETL with a level of accuracy superior to that of the moving system, based at least in part on processing a first measurement signal from the first beam sensor S1. For this purpose, the first measurement signal indicates the position of a first measurement point SP formed on the first beam sensor S1 by the first beam B.

[0134] The beam B guided by the beam source structures LC, LC”” to the sensor structures 160, 160”” may include a first beam, and the determination of which beam sensor the first beam is guided to may be based at least in part on an identification of a first characteristic of the first beam. The beam B guided by the beam source structures LC, LC”” may form a pattern (e.g., see...). Figures 9A to 10 ), and the first characteristic of the identified first beam may correspond to the identifiable portion of the pattern in which the first beam is included.

[0135] When the end-effector ETL is in the first position and first orientation (e.g., see...) Figure 8A , Figure 9A and Figure 12A The beam B from the beam source structures LC, LC””, guided to the beam sensors S1-S4 of the sensor structures 160, 160””, can be configured (e.g., by generating a measurement point SP at a position on the beam sensors S1-S4) to cause the beam sensors S1-S4 to generate a corresponding first set of measurement signals, which indicate that the end tool ETL is in a first position and a first orientation. Furthermore, when the end tool ETL is in a second position and a second orientation different from the first position and the first orientation (e.g., see...), Figures 8B to 8H , Figures 9B to 9C and Figures 12B to 12CThe beam B from the beam source structure LC, LC””, which is guided to the beam sensors S1-S4 of the sensor structure 160, 160””, can be configured (e.g., by generating a measurement point SP at a position on the beam sensors S1-S4) to cause the beam sensors S1-S4 to generate a corresponding second set of measurement signals, which are different from the first set of measurement signals and indicate that the end tool ETL is in a second position and a second orientation.

[0136] When the end-effector ETL is in the first position and first orientation, the position of measurement point SP on beam sensors S1-S4 can correspond to the position of the first set of measurement points (e.g., see...). Figure 8A View 840A Figure 9A View 940A and Figure 12A (See view 1240A), and when the end tool ETL is in the second position and the second orientation, the position of the measurement point SP on the beam sensors S1-S4 can correspond to a second set of measurement point positions that are different from the first set of measurement point positions (e.g., see...). Figures 8B to 8H Views 840B-840H, Figures 9B to 9C Views 940B-940C and Figures 12B to 12C (Views 1240B-1240C).

[0137] When the end-effector ETL is in the first position and first orientation, the beam B from the beam source structures LC, LC””, which is guided to the beam sensors S1-S4, can correspond to the first set of beams B (e.g., see...). Figure 9A Furthermore, when the end tool ETL is in the second position and the second orientation, the beam B from the beam source structures LC, LC””, which is guided to the beam sensors S1-S4, can correspond to a second set of beams B that is different from the first set of beams B (e.g., see...). Figure 9B (where beams B2C, B3C, B4D, and B4E are no longer part of a set of beams guided to the beam sensor).

[0138] When the end tool ETL is in the first position and first orientation, the beam B from the beam source structures LC, LC””, which is guided to the beam sensors S1-S4 of the sensor structures 160, 160””, may include a first plurality of beams B. These first plurality of beams are guided to the first beam sensor of the sensor structures 160, 160”” and form corresponding first plurality of measurement points SP at corresponding positions on the first beam sensor (e.g., see...). Figure 9AIn this process, beams B2A-B2C are guided to beam sensor S2 and generate measurement points SP2A-SP2C. When the end tool ETL is in the second position and second orientation, beams B from beam source structures LC, LC”” guided to beam sensors S1-S4 of sensor structures 160, 160”” may include a second plurality of beams B guided to the first beam sensor of sensor structures 160, 160””, for which the second plurality of beams B are different from the first plurality of beams B (e.g., see...). Figure 9C The beam B4A-B4E is guided to the beam sensor S2 and the measurement points SP4A-SP4E are generated.

[0139] In various specific implementations, sensor structures 160, 160"" may include a first beam sensor configured to generate a first measurement signal when the end tool ETL is in a first position and a first orientation. For this purpose, the first measurement signal is generated by the first beam sensor at least partially based on beam source structures LC, LC"" which guide the first beam to form a measurement point at a corresponding first position on the first beam sensor (e.g., see...). Figure 8A and Figure 12A The first beam sensor has a measurement point SP1 generated on sensor S1 by beam B1; and when the end tool ETL is in at least one of a second position different from the first position or a second orientation different from the first orientation, a second measurement signal different from the first measurement signal is generated. For this purpose, the second measurement signal is generated by the first beam sensor at least partially based on the beam source structure LC, LC””, which guides the first beam to form a measurement point at a corresponding second position different from the first position on the first beam sensor (e.g., see...). Figure 8B , Figure 8C , Figure 8D , Figure 8G , Figure 8H , Figure 12B or Figure 12C In each case, there is a measurement point SP1 generated by the beam B1 on the sensor S1.

[0140] Processing unit 190 may be configured to: determine, at least in part, that the end tool ETL is in a first position and a first orientation (e.g., see [reference]) by processing a first measurement signal from the first beam sensor along with other measurement signals from the beam sensors S1-S4 of the sensor structures 160, 160"". Figure 8A and Figure 12A ); and at least in part based on processing a second measurement signal from the first beam sensor along with other measurement signals from beam sensors S1-S4 of the sensor structure 160, to determine that the end tool ETL is in at least one of a second position or a second orientation (e.g., see Figure 8B , Figure 8C , Figure 8D , Figure 8G , Figure 8H , Figure 12B or Figure 12C ).

[0141] The metering frame volumes MFV and MFV' may be at least partially defined by the sensor structure 160 or the beam source structure LC"" (e.g., the positions of sensors S1-S4 of the sensor structure 160 or the positions of beam source portions LP1-LP4 of the beam source structure LC"" may be determined or otherwise correspond to the positions of the boundaries of the metering frame volumes MFV and MFV'). The metering frame volumes MFV and MFV' may be configured to surround at least a portion of the moving volume MV.

[0142] According to another aspect, a method is provided that typically includes two steps. A first step 1110 includes operating beam source structures LC, LC”” to guide beam B to beam sensors S1-S4 of sensor structures 160, 160””, thereby indicating the position and orientation of the end-effector ETL. A second step 1120 includes processing measurement signals from the beam sensors S1-S4 of sensor structures 160, 160”” to determine the position and orientation of the end-effector ETL.

[0143] Position information can be received from the moving system of the moving end tool ETL, wherein the position information indicates the position of the end tool ETL with the accuracy of the moving system. For this purpose, the determination of the position and orientation of the end tool ETL is based at least in part on the processing of the position information from the moving system and the measurement signals from the beam sensors S1-S4 of the sensor structures 160, 160””.

[0144] The beam B, guided by the beam source structures LC, LC”” to the sensor structures 160, 160””, can form a pattern and include the first beam in a first portion of the pattern. The determination of which beam sensor the first beam is guided to can be based at least in part on the identification of the first portion of the pattern in which the first beam is included (e.g., see...). Figures 9A to 10 ).

[0145] According to another aspect, a measurement system 150, 150' is provided, the measurement system including sensor structures 160, 160"", the sensor structures including a plurality of beam sensors (e.g., beam sensors S1-S4). Beam source structures LC, LC"" are configured to guide beam B to the beam sensors S1-S4 of the sensor structures 160, 160"". One of the beam source structure LC or the sensor structure 160"" is configured to be coupled to at least one of the end-tool mounting structure ETMC of the moving system 110 for moving the end-tool ETL. A processing unit 190 is configured to process measurement signals from the beam sensors S1-S4 of the sensor structures 160, 160"", wherein the measurement signals from the beam sensors S1-S4 indicate the position and orientation of the end-tool ETL.

[0146] Although preferred embodiments of the present disclosure have been illustrated and described, many variations of the feature arrangements and sequences of operation shown and described based on this disclosure will be apparent to those skilled in the art. Various alternative forms can be used to implement the principles disclosed herein. Furthermore, the various embodiments described above can be combined to provide other embodiments. All U.S. patents and U.S. patent applications mentioned in this specification are incorporated herein by reference in their entirety. If it is necessary to employ the concepts of various patents and applications to provide other embodiments, aspects of the embodiments may be modified.

[0147] These and other changes can be made to the specific implementation based on the detailed description above. Generally, the terminology used in the following claims should not be construed as limiting the claims to the embodiments disclosed in this specification and claims, but should be interpreted to include all possible embodiments and the full scope of the equivalents conferred by these claims.

Claims

1. A metering system for use with a mobility system of a mobile end-effector tool. The mobile system includes: An active structure, the active structure including an end tool mounting structure, wherein an end tool is configured to be mounted onto the end tool mounting structure; and A motion control system configured to control the position and orientation of the end tool, at least in part, based on controlling the movable structure, so as to move at least a portion of the end tool mounted to the end tool mounting structure within a movement volume. The metering system includes: A sensor structure comprising multiple beam sensors; A beam source structure configured to guide a beam to the beam sensor of the sensor structure, wherein: One of the beam source structure or the sensor structure is configured to be coupled to at least one of the end tool or the end tool mounting structure; and The beam guided to the beam sensor is configured to cause the beam sensor to generate a corresponding measurement signal; and A processing unit configured to process the measurement signal from the beam sensor of the sensor structure, wherein the measurement signal from the beam sensor indicates the position and orientation of the end tool; in: When the end tool is in a first position and a first orientation, the beam from the beam source structure, guided to the beam sensor of the sensor structure, is configured to cause the beam sensor to generate a corresponding first set of measurement signals, the corresponding first set of measurement signals indicating that the end tool is in the first position and the first orientation; and When the end tool is in a second position and second orientation different from the first position and the first orientation, the beam from the beam source structure and guided to the beam sensor of the sensor structure is configured to cause the beam sensor to generate a corresponding second set of measurement signals, which are different from the first set of measurement signals and indicate that the end tool is in the second position and the second orientation.

2. The measurement system of claim 1, wherein each of the beam sensors comprises a two-dimensional position-sensitive sensor, and for the two-dimensional position-sensitive sensor, the measurement signal from the beam sensor indicates the two-dimensional position of the measurement point generated by the beam on the beam sensor.

3. The metrology system according to claim 1, wherein the beam source structure includes one or more diffractive optical elements, and the beam from the beam source structure is a diffractive beam.

4. The metering system according to claim 1, wherein the movable structure is a movable arm structure.

5. The metering system of claim 1, wherein the motion control system is configured to sense and control the position and orientation of the end tool at an accuracy level defined as the accuracy of the motion system, based at least in part on sensing and controlling the position and orientation of the end tool using a plurality of position sensors included in the moving structure.

6. The measurement system of claim 5, wherein the processing unit is operable to determine the position and orientation of the end tool with an accuracy level superior to that of the movement system, based at least in part on the processing of the measurement signal from the beam sensor.

7. The metering system of claim 5, wherein the beam guided to the sensor structure by the beam source structure comprises a first beam, and the determination of which beam sensor the first beam is guided to is based at least in part on the sensing position and orientation of the end tool, as determined by using the plurality of position sensors included in the active structure.

8. The measurement system of claim 7, wherein the beam sensor to which the first beam is guided is a first beam sensor, and the processing unit is operable to determine the position and orientation of the end tool with an accuracy level superior to that of the movement system, based at least in part on processing a first measurement signal from the first beam sensor, for which the first measurement signal indicates the position of a first measurement point as formed by the first beam on the first beam sensor.

9. The metering system of claim 1, wherein the beam guided to the sensor structure by the beam source structure comprises a first beam, and the determination of which beam sensor the first beam is guided to is based at least in part on an identification of a first characteristic of the first beam.

10. The metering system of claim 9, wherein the beam guided by the beam source structure forms a pattern, and the first characteristic of the identified first beam corresponds to an identifiable portion of the pattern in which the first beam is included.

11. The metrology system of claim 1, wherein the beam from the beam source structure guided to the beam sensor of the sensor structure is configured to generate a measurement point at a position on the beam sensor, the measurement point causing the beam sensor to generate a corresponding measurement signal, and when the end tool is in the first position and the first orientation, the position of the measurement point on the beam sensor corresponds to a first set of measurement point positions, and when the end tool is in the second position and the second orientation, the position of the measurement point on the beam sensor corresponds to a second set of measurement point positions different from the first set of measurement point positions.

12. The measurement system of claim 1, wherein when the end tool is in the first position and the first orientation, the beam from the beam source structure guided to the beam sensor corresponds to a first set of beams, and when the end tool is in the second position and the second orientation, the beam from the beam source structure guided to the beam sensor corresponds to a second set of beams different from the first set of beams.

13. The metering system according to claim 1, wherein: When the end tool is in the first position and the first orientation, the beam from the beam source structure guided to the beam sensor of the sensor structure includes a first plurality of beams guided to the first beam sensor of the sensor structure; and When the end tool is in the second position and the second orientation, the beam from the beam source structure that is guided to the beam sensor of the sensor structure includes a second plurality of beams that are guided to the first beam sensor of the sensor structure, for which the second plurality of beams are different from the first plurality of beams.

14. The metering system according to claim 1, wherein the sensor structure includes a first beam sensor, the first beam sensor being configured to: A first measurement signal is generated when the end tool is in a first position and a first orientation. For this purpose, the first measurement signal is generated by the first beam sensor, at least partially based on the beam source structure, which guides the first beam to form a measurement point at a corresponding first position on the first beam sensor; and When the end tool is in at least one of a second position different from the first position or a second orientation different from the first orientation, a second measurement signal different from the first measurement signal is generated. For this purpose, the second measurement signal is generated by the first beam sensor at least in part based on the beam source structure, which guides the first beam to form a measurement point at a second position corresponding to the first position on the first beam sensor.

15. The metering system according to claim 14, wherein the processing unit is configured to: The end tool is determined to be in the first position and first orientation based at least in part on processing the first measurement signal from the first beam sensor along with other measurement signals from the beam sensor of the sensor structure; and The determination of whether the end tool is in the second position or the second orientation is based at least in part on processing the second measurement signal from the first beam sensor together with other measurement signals from the beam sensor of the sensor structure.

16. The metering system of claim 1, wherein the metering frame volume is at least partially defined by the sensor structure or the beam source structure, and for this purpose, the metering frame volume is configured to surround at least a portion of the movable volume.

17. The metering system according to claim 1, wherein: The beam source structure is coupled to at least one of the end tool or the end tool mounting structure; The position and orientation of the beam source structure indicate the position and orientation of the end tool; and The measurement signal from the beam sensor indicates the position and orientation of the beam source structure.

18. The metering system according to claim 1, wherein: The sensor structure is coupled to at least one of the end tool or the end tool mounting structure; The position and orientation of the sensor structure indicate the position and orientation of the end tool; and The measurement signal from the beam sensor indicates the position and orientation of the sensor structure.

19. A method for operating a metering system, the metering system comprising: A sensor structure comprising multiple beam sensors; And a beam source structure configured to guide a beam to the beam sensor of the sensor structure, wherein: one of the beam source structure or the sensor structure is configured to be coupled to at least one of an end-tool mounting structure of an end-tool or a moving system for moving the end-tool, the method comprising: Operate the beam source structure to guide the beam to the beam sensor of the sensor structure, thereby indicating the position and orientation of the end tool, wherein: The beam of light guided to the beam sensor causes the beam sensor to generate a corresponding measurement signal; Processing the measurement signal from the beam sensor of the sensor structure to determine the position and orientation of the end tool; and Position information is received from the moving system that moves the end tool, wherein the position information indicates the position of the end tool with the accuracy of the moving system, and for this purpose, the determination of the position and orientation of the end tool is based at least in part on the processing of the position information from the moving system and the measurement signal from the beam sensor of the sensor structure.

20. The method of claim 19, wherein the beam formed by the beam source structure to the sensor structure forms a pattern and includes a first beam in a first portion of the pattern, and the determination of which beam sensor the first beam is guided to is based at least in part on the identification of the first portion of the pattern in which the first beam is included.

21. A metering system, the metering system comprising: A sensor structure comprising multiple beam sensors; A beam source structure configured to guide a beam to the beam sensor of the sensor structure, wherein: One of the beam source structure or the sensor structure is configured to be coupled to at least one of the end tool mounting structures of the end tool or the moving system for moving the end tool. The beam guided to the beam sensor is configured to cause the beam sensor to generate a corresponding measurement signal; and A processing unit configured to process the measurement signal from the beam sensor of the sensor structure, wherein the measurement signal from the beam sensor indicates the position and orientation of the end tool; The sensor structure mentioned above includes a first beam sensor, which is configured to: A first measurement signal is generated when the end tool is in a first position and a first orientation. For this purpose, the first measurement signal is generated by the first beam sensor, at least partially based on the beam source structure, which guides the first beam to form a measurement point at a corresponding first position on the first beam sensor; and When the end tool is in at least one of a second position different from the first position or a second orientation different from the first orientation, a second measurement signal different from the first measurement signal is generated. For this purpose, the second measurement signal is generated by the first beam sensor at least in part based on the beam source structure, which guides the first beam to form a measurement point at a second position corresponding to the first position on the first beam sensor.

22. The metering system according to claim 21, wherein the processing unit is configured to: The end tool is determined to be in the first position and first orientation based at least in part on processing the first measurement signal from the first beam sensor along with other measurement signals from the beam sensor of the sensor structure; and The determination of whether the end tool is in the second position or the second orientation is based at least in part on processing the second measurement signal from the first beam sensor together with other measurement signals from the beam sensor of the sensor structure.

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