A method for high speed cladding of lithium-rich aluminate ceramic coating

Abstract

The present application relates to a kind of lithium-rich aluminates ceramic coating high-speed coating method, it is related to new energy materials field, by step 1, preparation liquid precursor;Step 2, the heating and delivery of liquid precursor;Step 3, laser-assisted chemical vapor deposition generates lithium-rich aluminates ceramic coating;Preparation obtains lithium-rich aluminates ceramic coating.The present application is prepared by the pretreatment of raw material precursor, increases laser and vacuum-assisted deposition, and prepares lithium-rich aluminates ceramic coating (single-phase Li5AlO4 film), and deposition rate reaches 6mm / h, is conducive to scale production.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of new energy materials, in particular to a method for high-speed coating of lithium-rich aluminate ceramic coating. BACKGROUND

[0002] Lithium ion battery has high output voltage, high energy density, long cycle life, good safety performance, no memory effect and other characteristics, and is successfully applied in the field of mobile power supply as a main energy storage device. In order to further meet the demand of power grid energy storage, electric vehicles and consumer electronics for energy storage devices, longer cycle life, better safety and higher energy density of the electrolyte material have become a research hotspot.

[0003] At present, lithium aluminate ceramic is applied in devices and has potential as an excellent solid electrolyte in lithium ion battery. However, lithium aluminate products on the market are mostly in the form of powder particles or blocks, and lithium aluminate thin film products can significantly reduce the resistance of solid electrolyte, so lithium aluminate thin film products are particularly important. Sol-gel method and traditional chemical vapor deposition method can be used to obtain lithium aluminate thin film products, but they often contain a large amount of impurities, affecting the performance of the material, and the thin film forming is slow, which is not conducive to large-scale production. In view of this, the present application provides a method for high-speed coating of lithium-rich aluminate ceramic coating. SUMMARY

[0004] The present application provides a method for high-speed coating of lithium-rich aluminate ceramic coating, which aims to increase the deposition rate of lithium-rich aluminate ceramic coating (single-phase Li5AlO4 thin film) by pretreating the raw material precursor, laser and vacuum-assisted deposition, and the deposition rate reaches 6 mm / h, which is conducive to large-scale production.

[0005] The technical scheme of the present application to solve the above technical problems is as follows: a method for high-speed coating of lithium-rich aluminate ceramic coating, comprising the following steps:

[0006] Step 1, preparation of liquid precursor: according to the molar ratio of (3:1) to (10:1), Li precursor raw material and Al precursor raw material are weighed respectively, mixed and ground at room temperature for 2-4 min, then 15-20 times the amount of water corresponding to the amount of Li precursor raw material is added, and the mixture is uniformly mixed to obtain a liquid precursor;

[0007] Step 2, heating and delivery of liquid precursor: the liquid precursor is heated and volatilized at 673-873K to obtain eutectic Li and gasified Al precursor raw material, and the obtained eutectic Li and gasified Al precursor raw material are delivered into the reaction area in the CVD cavity by using inert gas as carrier gas;

[0008] Step 3, laser-assisted chemical vapor deposition to generate lithium-rich aluminosilicate ceramic coating: O2 is introduced into the reaction area of the CVD cavity, and the pressure of the CVD cavity is adjusted to be stable at 200-550 Pa. After the pressure of the CVD cavity is stabilized for 20-40 s, the substrate in the reaction area of the CVD cavity is irradiated by a laser beam, and the eutectic Li, the vaporized Al precursor material and O2 are activated to occur chemical vapor deposition reaction, and a lithium-rich aluminosilicate ceramic coating is obtained on the substrate.

[0009] The beneficial effects of the present application are: (1) The present application activates the eutectic Li, the vaporized Al precursor material and O2 to occur chemical vapor deposition reaction by using laser, which makes it easier to react and form a film, and the deposition rate reaches 6 mm / h, which is beneficial to large-scale production.

[0010] (2) The process of the present application is stable and easy to operate, and by pretreating the raw materials to prepare a liquid precursor, only one raw material heating tank is needed during the heating and volatilization process, which simplifies the equipment and saves the manufacturing cost.

[0011] On the basis of the above technical solution, the present application can also be improved as follows.

[0012] Further, in step 1, the Li precursor material is Li(dpm), and the Al precursor material is Al(acac)3.

[0013] Further, in step 1, Li(dpm) and Al(acac)3 are weighed according to a molar ratio of (4:1) to (6:1), mixed and ground at room temperature for 3 min, then water equivalent to 20 times the amount of substance of the Li precursor material is added and mixed uniformly to obtain a liquid precursor.

[0014] The beneficial effects of using the above further scheme are: Li(dpm) and Al(acac)3 are weighed according to a molar ratio of (4:1) to (6:1), which further optimizes the amount of Li(dpm) and Al(acac)3.

[0015] Further, in step 2, the liquid precursor is heated and volatilized at 773 K to obtain eutectic Li and vaporized Al precursor material.

[0016] The beneficial effects of using the above further scheme are: by using liquid precursor to heat and volatilize at 773 K, the volatilization efficiency is optimized.

[0017] Further, in step 2, the inert gas is He, Ne, Ar or N2.

[0018] Further, in step 3, a substrate in a reaction region in the CVD cavity is radiated by a light beam of a laser, the duration of the light beam of the laser is 0.2-1.2 min, the power of the light beam of the laser is 40-75 W, and a chemical vapor deposition reaction is activated by the eutectic Li, the vaporized Al precursor material and O2 to obtain a lithium-rich aluminophosphate ceramic coating on the substrate.

[0019] The beneficial effect of the above further scheme is that it is easier to react and form a film, and the deposition rate reaches 6 mm / h, which is beneficial to large-scale production.

[0020] Further, the light beam of the laser is generated by a carbon dioxide laser, the duration is 0.2-1.2 min, and the power is 40-75 W.

[0021] Further, in step 3, O2 is introduced into the reaction region in the CVD cavity, and the CVD cavity pressure is adjusted to be stable at 300-450 Pa. After the CVD cavity pressure is stable for 25-35 s, a substrate in a reaction region in the CVD cavity is radiated by a light beam of a laser, the light beam of the laser is generated by a carbon dioxide laser, the duration of the light beam of the laser is 1 min, the power of the light beam of the laser is 50-65 W, and a chemical vapor deposition reaction is activated by the eutectic Li, the vaporized Al precursor material and O2 to obtain a lithium-rich aluminophosphate ceramic coating on the substrate.

[0022] Further, in step 3, the CVD cavity pressure is adjusted by a vacuum pump.

[0023] Further, in step 3, the molar mass ratio of the amount of O2 introduced into the reaction region in the CVD cavity to the Al precursor material is (20:1)-(100:1). BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 A schematic diagram of a synthesis device used in the present application;

[0025] Figure 2 A schematic diagram of the laser-assisted film formation principle of the present application;

[0026] Figure 3 XRD patterns of embodiments 1-5 of the present application;

[0027] Figure 4 SEM patterns of embodiments 1-5 of the present application;

[0028] Figure 5 A curve graph of the deposition rate of a lithium aluminophosphate Li5AlO4 thin film of the present application with respect to the heating temperature of a liquid precursor material tank;

[0029] Figure 6 The AC impedance spectrum of the Li5AlO4 lithium aluminate film in Example 4 of this invention at temperatures of 523K-723K;

[0030] Figure 7 This is a graph showing the change in lithium-ion conductivity of the Li5AlO4 lithium aluminate film as a function of temperature in Example 4 of the present invention.

[0031] The attached diagram lists the components represented by each number as follows:

[0032] 1-Heating tank, 2-CVD cavity, 3-Substrate, 4-Carbon dioxide laser. Detailed Implementation

[0033] The principles and features of the present invention are described below. The examples given are for illustrative purposes only and are not intended to limit the scope of the invention. The following examples use Li(dpm), chemical formula: Li(C7H). 16 O3), dipropylene glycol monomethyl ether (mixture of isomers), CAS: 34590-94-8, purchased from Hitachi; Al(acac)3 is aluminum triacetylacetonate, CAS: 13963-57-0, purchased from Beijing Wokai Biotechnology Co., Ltd.

[0034] The deposition rate is calculated as follows: Deposition rate = Film thickness / Deposition time.

[0035] Example 1

[0036] This embodiment relates to a synthesis device for high-speed coating of lithium-rich aluminate ceramic coatings. Figure 1 The device includes a heating tank 1, a CVD cavity 2, and a carbon dioxide laser 4. The heating tank 1 is connected to the CVD cavity 2. A substrate 3 is disposed inside the CVD cavity 2. The carbon dioxide laser 4 is mounted outside the CVD cavity 2. The laser beam generated by the carbon dioxide laser 4 is focused onto the substrate 3 through quartz glass.

[0037] This embodiment relates to a method for high-speed coating of lithium-rich aluminate ceramic coatings, comprising the following steps (see details). Figure 2 ):

[0038] Step 1, prepare liquid precursor: Weigh Li precursor raw material and Al precursor raw material according to a molar ratio of 5:1, mix them and grind them at room temperature for 3 minutes. After grinding, add water equivalent to 20 times the amount of Li precursor raw material and mix evenly to obtain liquid precursor.

[0039] Step 2, heating and delivery of the liquid precursor: the liquid precursor is added into the heating tank 1 to be heated and evaporated at 573 K, preheated for 5 minutes to obtain eutectic Li and gaseous Al precursor raw materials, and the obtained eutectic Li and gaseous Al precursor raw materials are delivered into the reaction area in the CVD cavity 2 by using inert gas Ar as the carrier gas;

[0040] Step 3, laser-assisted chemical vapor deposition to generate lithium-rich aluminate ceramic coating: after the obtained eutectic Li and gaseous Al precursor raw materials are delivered into the reaction area in the CVD cavity 2, O2 is introduced into the reaction area in the CVD cavity 2, the molar mass ratio of the amount of O2 introduced into the reaction area in the CVD cavity 2 to the Al precursor raw material is 50:1, the gas pressure of the CVD cavity 2 is adjusted and stabilized to 400 Pa, after the CVD cavity 2 is stabilized for 30 s, the substrate 3 in the reaction area of the CVD cavity 2 is irradiated by the laser beam generated by the carbon dioxide laser 4, the power is adjusted to 60 W, and the film is formed for 15 s. The eutectic Li, the gaseous Al precursor raw material and O2 are activated to occur chemical vapor deposition reaction, and a lithium aluminate film of Li5AlO4 is obtained on the substrate 3. The thickness of the film is 11 microns.

[0041] The deposition rate of this embodiment is 2.64 mm / h.

[0042] Example 2

[0043] This embodiment relates to a synthesis device for high-speed coating of lithium-rich aluminate ceramic coating, which is the same as that in Example 1.

[0044] This embodiment relates to a method for high-speed coating of lithium-rich aluminate ceramic coating, which comprises the following steps (see Figure 2 ):

[0045] Step 1, preparation of liquid precursor: Li precursor raw material and Al precursor raw material are weighed according to a molar ratio of 4:1, mixed and ground at room temperature for 3 min, and then water equivalent to 20 times the amount of substance of the Li precursor raw material is added and mixed uniformly to obtain a liquid precursor;

[0046] Step 2, heating and delivery of the liquid precursor: the liquid precursor is added into the heating tank 1 to be heated and evaporated at 573 K, preheated for 5 minutes to obtain eutectic Li and gaseous Al precursor raw materials, and the obtained eutectic Li and gaseous Al precursor raw materials are delivered into the reaction area in the CVD cavity 2 by using inert gas Ar as the carrier gas;

[0047] Step 3, laser-assisted chemical vapor deposition to generate lithium-rich aluminate ceramic coating: after the eutectoid Li and the vaporized Al precursor material are transported to the reaction area in the CVD cavity 2, O2 is introduced into the reaction area in the CVD cavity 2, the molar mass ratio of the amount of O2 introduced into the reaction area in the CVD cavity 2 to the Al precursor material is 50:1, the pressure of the CVD cavity 2 is adjusted to 450 Pa and stabilized, after the pressure of the CVD cavity 2 is stabilized for 30 s, the substrate 3 in the reaction area of the CVD cavity 2 is irradiated with a laser beam generated by a carbon dioxide laser 4, the power is adjusted to 50 W, and the film is formed for 15 s. The eutectoid Li, the vaporized Al precursor material and O2 are activated to generate a chemical vapor deposition reaction, and a Li5AlO4 lithium aluminate film is obtained on the substrate 3. The thickness of the film is 13 microns.

[0048] The deposition rate of this embodiment is 3.12 mm / h.

[0049] Example 3

[0050] This embodiment relates to a synthesis device for high-speed coating of lithium-rich aluminate ceramic coating, which is the same as that in Example 1.

[0051] This embodiment relates to a method for high-speed coating of lithium-rich aluminate ceramic coating, which comprises the following steps (see Figure 2 ):

[0052] Step 1, preparation of liquid precursor: according to the molar ratio of 6:1, Li precursor material and Al precursor material are weighed respectively, mixed and ground at room temperature for 3 min, then water equivalent to 20 times the amount of substance of the Li precursor material is added and mixed uniformly to obtain a liquid precursor;

[0053] Step 2, heating and transportation of liquid precursor: the liquid precursor is added to the heating tank 1 and heated and evaporated at 673 K, preheated for 5 minutes to obtain eutectoid Li and vaporized Al precursor material, and the obtained eutectoid Li and vaporized Al precursor material are transported to the reaction area in the CVD cavity 2 by using inert gas Ar as the carrier gas;

[0054] Step 3, laser-assisted chemical vapor deposition to generate lithium-rich aluminate ceramic coating: after the eutectoid Li and the vaporized Al precursor material are transported to the reaction area in the CVD cavity 2, O2 is introduced into the reaction area in the CVD cavity 2, the molar mass ratio of the amount of O2 introduced into the reaction area in the CVD cavity 2 to the Al precursor material is 50:1, the pressure of the CVD cavity 2 is adjusted to 300 Pa and stabilized, the substrate 3 in the reaction area of the CVD cavity 2 is irradiated with a laser beam generated by a carbon dioxide laser 4 after the pressure of the CVD cavity 2 is stabilized for 30 s, the power is adjusted to 65 W, the film is formed for 15 s, and a chemical vapor deposition reaction of the eutectoid Li, the vaporized Al precursor material and O2 is activated to obtain a lithium aluminate film Li5AlO4 on the substrate 3. The thickness of the film is 16 microns.

[0055] The deposition rate of this embodiment is 3.84 mm / h.

[0056] Example 4

[0057] This embodiment relates to a synthesis device for high-speed coating of lithium-rich aluminate ceramic coating, which is the same as that in Example 1.

[0058] This embodiment relates to a method for high-speed coating of lithium-rich aluminate ceramic coating, which comprises the following steps (see Figure 2 ) :

[0059] Step 1, preparation of liquid precursor: according to the molar ratio of 6:1, Li precursor material and Al precursor material are weighed respectively, mixed and ground at room temperature for 3 min, then water equivalent to 20 times the amount of substance of the Li precursor material is added and mixed uniformly to obtain a liquid precursor;

[0060] Step 2, heating and transportation of liquid precursor: the liquid precursor is added to the heating tank 1 and heated and evaporated at 723 K, preheated for 5 minutes to obtain eutectoid Li and vaporized Al precursor material, and the obtained eutectoid Li and vaporized Al precursor material are transported to the reaction area in the CVD cavity 2 by using inert gas Ar as the carrier gas;

[0061] Step 3, laser-assisted chemical vapor deposition to generate lithium-rich aluminate ceramic coating: after the eutectoid Li and the vaporized Al precursor material are transported to the reaction area in the CVD cavity 2, O2 is introduced into the reaction area in the CVD cavity 2, the molar mass ratio of the amount of O2 introduced into the reaction area in the CVD cavity 2 to the Al precursor material is 50:1, the pressure of the CVD cavity 2 is adjusted to 300 Pa and stabilized, the substrate 3 in the reaction area of the CVD cavity 2 is irradiated with a laser beam generated by a carbon dioxide laser 4 after the pressure of the CVD cavity 2 is stabilized for 30 s, the power is adjusted to 65 W, the film is formed for 15 s, and a chemical vapor deposition reaction of the eutectoid Li, the vaporized Al precursor material and O2 is activated to obtain a lithium aluminate film Li5AlO4 on the substrate 3. The thickness of the film is 18 microns.

[0062] The deposition rate of this embodiment is 4.32 mm / h.

[0063] Example 5

[0064] This embodiment relates to a synthesis device for high-speed coating of lithium-rich aluminate ceramic coating, which is the same as that in Example 1.

[0065] This embodiment relates to a method for high-speed coating of lithium-rich aluminate ceramic coating, which comprises the following steps (see Figure 2 ) :

[0066] Step 1, preparation of liquid precursor: according to the molar ratio of 6:1, the Li precursor material and the Al precursor material are weighed and mixed, then grinded at room temperature for 3 min, and then 20 times the amount of water corresponding to the Li precursor material is added and mixed uniformly to obtain the liquid precursor;

[0067] Step 2, heating and transportation of liquid precursor: the liquid precursor is added to the heating tank 1 and heated and evaporated at 823 K, preheated for 5 minutes to obtain the eutectoid Li and the vaporized Al precursor material, and the obtained eutectoid Li and the vaporized Al precursor material are transported to the reaction area in the CVD cavity 2 by using inert gas Ar as the carrier gas;

[0068] Step 3, laser-assisted chemical vapor deposition to generate lithium aluminate ceramic coating: after the eutectic Li and the vaporized Al precursor raw material are delivered to the reaction area in the CVD cavity 2, O2 is introduced into the reaction area in the CVD cavity 2, the molar mass ratio of the amount of O2 introduced into the reaction area in the CVD cavity 2 to the Al precursor raw material is 50:1, the pressure of the CVD cavity 2 is adjusted to 300 Pa, and after the pressure of the CVD cavity 2 is stabilized for 30 s, the substrate 3 in the reaction area of the CVD cavity 2 is irradiated with a laser beam generated by a carbon dioxide laser 4, the power is adjusted to 50 W, film formation is performed for 15 s, and chemical vapor deposition reaction of the eutectic Li, the vaporized Al precursor raw material and O2 is activated to obtain a lithium aluminate Li5AlO4 film on the substrate 3. The thickness of the film is 26 microns.

[0069] The deposition rate of the embodiment is 6.24 mm / h.

[0070] Figure 3 The XRD patterns of Examples 1-5 of the present application are shown in the figure (1)-(5) corresponding to Examples 1-5, respectively. Figure 3 The X-ray diffraction characteristic peaks of the deposited film are consistent with the Li5AlO4 material phase standard card, and a single-phase Li5AlO4 lithium aluminate film can be prepared under the corresponding conditions by the synthesis process of the present application.

[0071] Figure 4 The SEM images of Examples 1-5 of the present application are shown in the figure (1)-(5) corresponding to Examples 1-5, respectively. Figures 1-5 The SEM images of Examples 1-5 of the present application are shown in the figure (1)-(5) corresponding to Examples 1-5, respectively. Figure 4 The Li5AlO4 lithium aluminate films prepared in Examples 1, 3 and 4 have a more dense and uniform structure, and the synthesis process of the Li5AlO4 lithium aluminate film is optimized.

[0072] Figure 5 The curve of the deposition rate of the Li5AlO4 lithium aluminate film with the heating temperature of the liquid precursor raw material tank is shown in the figure. Figure 5 As the heating temperature of the liquid precursor raw material increases, more vaporized lithium and aluminum organic active molecules participate in film formation in unit time, the reaction is accelerated, and the film formation efficiency is improved.

[0073] Test Example

[0074] The electrochemical performance of the Li5AlO4 lithium aluminate film obtained in Example 4 was tested.

[0075] Test method: AC impedance test.

[0076] Impedance measurements were performed in air in the temperature range 323 to 723 K using a Solartron 1296 frequency analyser coupled to a 1286 dielectric interface, in the frequency range 10 -2 to 10 7 Hz. Platinum and gold electrodes were used as bottom and top electrodes, respectively. Prior to each impedance measurement, the cell was kept at the test temperature for at least 30 minutes to allow thermal equilibration.

[0077] Figure 6 Impedance spectra of Li5Al04 lithium aluminate thin film in Example 4 at temperatures ranging from 523 K to 723 K; Figure 6 It is shown that by zooming in on the high frequency region, the impedance spectra at each temperature contain an arc-shaped point distribution (high frequency region), a semi-circular point distribution (mid frequency region) and a sloped line point distribution (low frequency region). These correspond to the mobility characteristics of lithium ions in the Li5Al04 lithium aluminate crystal lattice, in the polycrystalline grain boundaries and at the electrode interface, respectively.

[0078] Figure 7 Temperature dependence of lithium ion conductivity of Li5Al04 lithium aluminate thin film in Example 4; Figure 7 It is shown that the prepared Li5Al04 lithium aluminate thin film has high lithium ion conductivity, with an ionic conductivity of 0.93 S / cm at 723 K, which is higher than the highest peak value of 0.3 S / cm of Li5Al04 lithium aluminate material reported previously. (Ref. Mat. Res. Bull. Vol. II, pp. 953-958, 1976.)

[0079] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" and the like means that the specific feature, structure, material or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. Illustrative expressions of the above terms in the present specification do not necessarily refer to the same embodiment or example. Also, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in one or more embodiments or examples. In addition, different embodiments or examples described in the present specification and features of different embodiments or examples can be combined and combined by those skilled in the art without contradiction.

[0080] Although the embodiments of the present application have been shown and described above, it is understood that the above-described embodiments are exemplary, and are not to be construed as limiting the present application, and those skilled in the art can make changes, modifications, replacements and variations to the above-described embodiments within the scope of the present application.

Claims

1. A method for high-speed coating of lithium-rich aluminate ceramics, characterized in that, Includes the following steps: Step 1, prepare liquid precursor: Weigh Li precursor raw material and Al precursor raw material according to the molar ratio of (3:1) to (10:1), mix them and grind them at room temperature for 2 to 4 minutes. After grinding, add water equivalent to 15 to 25 times the amount of Li precursor raw material and mix evenly to obtain liquid precursor. Step 2, heating and transporting the liquid precursor: The liquid precursor is heated and volatilized at 673-873K to obtain co-depositional Li and vaporized Al precursor raw materials. The obtained co-depositional Li and vaporized Al precursor raw materials are transported to the reaction area in the CVD chamber using an inert gas as the carrier gas. Step 3, laser-assisted chemical vapor deposition to generate a lithium-rich aluminate ceramic coating: O2 is introduced into the reaction area of ​​the CVD chamber, and the gas pressure of the CVD chamber is adjusted to stabilize at 200-550 Pa. After the gas pressure of the CVD chamber is stabilized for 20-40 seconds, the substrate of the reaction area in the CVD chamber is irradiated with a laser beam to activate the co-deposition of Li, the vaporized Al precursor raw material and O2 to undergo a chemical vapor deposition reaction, and a lithium-rich aluminate ceramic coating is obtained on the substrate.

2. The method for high-speed coating of lithium-rich aluminate ceramics according to claim 1, characterized in that, In step 1, the Li precursor raw material is Li(dpm), and the Al precursor raw material is Al(acac)3.

3. The method for high-speed coating of lithium-rich aluminate ceramic coating according to claim 2, characterized in that, In step 1, Li(dpm) and Al(acac)3 are weighed out in a molar ratio of (4:1) to (6:1), mixed and ground at room temperature for 3 minutes. After grinding, water equivalent to 20 times the amount of Li precursor raw material is added and mixed evenly to obtain a liquid precursor.

4. The method for high-speed coating of lithium-rich aluminate ceramics according to claim 1, characterized in that, In step 2, the liquid precursor is heated and volatilized at 773K to obtain co-depositional Li and vaporized Al precursor raw materials.

5. The method for high-speed coating of lithium-rich aluminate ceramics according to claim 1, characterized in that, In step 2, the inert gas used as the carrier gas is He, Ne, Ar or N2.

6. The method for high-speed coating of lithium-rich aluminate ceramics according to claim 1, characterized in that, In step 3, a laser beam is used to irradiate the substrate in the reaction region of the CVD cavity. The duration of the laser beam is 0.2 to 1.2 min, and the power of the laser beam is 40 to 75 W. This activates the co-deposition of Li, the vaporized Al precursor material, and O2 to undergo a chemical vapor deposition reaction, resulting in a lithium-rich aluminate ceramic coating on the substrate.

7. The method for high-speed coating of lithium-rich aluminate ceramics according to claim 6, characterized in that, The laser beam is generated by a carbon dioxide laser, with a duration of 0.2 to 1.2 minutes and a power of 40 to 75 W.

8. The method for high-speed coating of lithium-rich aluminate ceramics according to claim 7, characterized in that, In step 3, O2 is introduced into the reaction region within the CVD chamber, and the gas pressure of the CVD chamber is then adjusted to stabilize at 300–450 Pa. After the gas pressure of the CVD chamber stabilizes for 25–35 seconds, a laser beam is used to irradiate the substrate in the reaction region within the CVD chamber. The laser beam is generated by a carbon dioxide laser, the duration of the laser beam is 1 minute, and the power of the laser beam is 50–65 W. This activates the co-deposition of Li, the vaporized Al precursor material, and O2 to undergo a chemical vapor deposition reaction, resulting in a lithium-rich aluminate ceramic coating on the substrate.

9. The method for high-speed coating of lithium-rich aluminate ceramics according to claim 1, characterized in that, In step 3, the gas pressure in the CVD chamber is regulated by at least four vacuum pumps.

10. The method for high-speed coating of lithium-rich aluminate ceramics according to claim 1, characterized in that, In step 3, the molar mass ratio of O2 introduced into the reaction zone of the CVD chamber to the Al precursor raw material is (20:1) to (100:1).

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