Liquid source vaporization system

Abstract

The application provides a liquid source vaporization system applied to a semiconductor process equipment, comprising: a liquid source pipeline, a vaporization device and an output pipeline which are sequentially communicated; the liquid source vaporization system further comprises: a purge pipeline in communication with the vaporization device; a first control unit for controlling the communication between the purge pipeline and the vaporization device or the communication between the liquid source pipeline and the vaporization device; a tail gas treatment unit in communication with the vaporization device; and a second control unit for controlling the communication between the tail gas treatment unit and the vaporization device or the communication between the output pipeline and the vaporization device. The liquid source vaporization system of the application can not only vaporize the liquid process medium, but also clean the inside of the vaporization device through the purge gas by arranging the purge pipeline, the first control unit, the tail gas treatment unit and the second control unit.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing, and more specifically, to a liquid vaporization system. Background Technology

[0002] In the integrated circuit manufacturing process, to enable silicon wafers to meet certain process characteristics, such as forming different insulating layers and dielectric layers on the wafer surface, the silicon wafers need to be placed in a process chamber with a specific temperature, pressure, and process gas atmosphere. In some advanced processes, special process media need to be introduced. These process media are usually stored in liquid form, and during the process, they need to be converted into gaseous form and introduced into the process chamber.

[0003] In existing technologies, during fluid transport processes requiring high precision and stability in flow control, there are generally two different methods for converting the liquid source of the aforementioned process medium into a gaseous state—

[0004] Vapor pressure differential control method and direct liquid phase control method.

[0005] Vapor pressure differential control, also known as the baking method, utilizes the pressure difference between the vapor pressure of the liquid material and the pressure in the process chamber, along with the control of the gas using a mass flow meter. However, because this method involves heating the liquid in the container to its saturated vapor pressure for vaporization, the resulting pressure is low. This requires a vacuum environment in the process chamber to meet transmission requirements, and the amount of vaporized gas is relatively small, making it unsuitable for high-flow-rate processes. Furthermore, since the gas mass flow meter is located on the outlet pipe, it measures a relatively high gas temperature. Due to the limited temperature resistance of the mass flow meter, it cannot meet measurement requirements when the baking temperature is too high, thus limiting its applicability to a wide range of liquids. Additionally, the baking apparatus used for baking liquid media is large in volume and mass, typically placed at the bottom of the equipment. The distance from the baking apparatus to the process chamber is long, requiring temperature management of the pipelines and components during transmission. If the apparatus encounters cold temperatures, the vaporized gas will re-liquefy.

[0006] The direct liquid-phase control method, also known as the direct vaporization method, uses a liquid mass flow meter and a vaporizer for vaporization. It primarily employs a vaporizer, into which a carrier gas is introduced, atomizing the liquid process medium before it is sprayed into the vaporization chamber. The vaporization chamber is externally heated, and the heat radiation emitted by the chamber vaporizes the atomized process medium. Any partially vaporized liquid spray undergoes complete vaporization through heat conduction from contact with the inner wall of the vaporization chamber before being output.

[0007] While the above methods can solve many problems of the vapor pressure differential control method, new problems still exist. Since a carrier gas is required to atomize the liquid process medium, there will be liquid process medium residue in the pipeline after each use, which will affect the next use. Therefore, how to clean the process medium residue in the pipeline is an urgent problem to be solved in this field. Summary of the Invention

[0008] The present invention aims to solve at least one of the technical problems existing in the prior art, and proposes a liquid source vaporization system.

[0009] To achieve the objectives of this invention, a liquid source vaporization system is provided, applied to semiconductor process equipment, comprising: a liquid source pipeline, a vaporization device, and an output pipeline connected in sequence. The liquid source pipeline provides a liquid process medium to the vaporization device, the vaporization device vaporizes the liquid process medium into a gaseous process medium, and the output pipeline transports the vaporized gaseous process medium to the process chamber of the semiconductor process equipment. The liquid source vaporization system further comprises: a purge pipeline connected to the vaporization device, which provides purge gas to the vaporization device; a first control unit, which controls the connection between the purge pipeline and the vaporization device or the connection between the liquid source pipeline and the vaporization device; an exhaust gas treatment unit connected to the vaporization device, which treats contaminants blown out of the vaporization device by the purge gas; and a second control unit, which controls the connection between the exhaust gas treatment unit and the vaporization device or the connection between the output pipeline and the vaporization device.

[0010] Further, the vaporization device includes: a vaporizer having a vaporization chamber for vaporizing the liquid process medium; a liquid inlet pipe having an outlet end connected to the vaporization chamber and an inlet end connected to the outlet end of the liquid source pipe and the outlet end of the purging pipe; and a gas outlet pipe having an inlet end connected to the vaporization chamber and an outlet end connected to the inlet end of the output pipe and the exhaust gas treatment unit.

[0011] Furthermore, the first control unit includes: a first control valve disposed on the liquid source pipeline for controlling the on / off state of the liquid source pipeline; and a second control valve disposed on the purge pipeline for controlling the on / off state of the purge pipeline.

[0012] Furthermore, the exhaust gas treatment unit includes an exhaust gas treatment device and an exhaust gas treatment pipeline. The inlet end of the exhaust gas treatment pipeline is connected to the outlet end of the exhaust gas pipeline, and the outlet end of the exhaust gas treatment pipeline is connected to the exhaust gas treatment device. The second control unit includes: a third control valve, which is disposed on the output pipeline and is used to control the on / off state of the output pipeline; and a fourth control valve, which is disposed on the exhaust gas treatment pipeline and is used to control the on / off state of the exhaust gas treatment pipeline.

[0013] Furthermore, the vaporization device further includes: a carrier gas pipeline, the inlet end of which is connected to a carrier gas source, and the outlet end of which is connected to the vaporization chamber; and a carrier gas control valve, which is disposed on the carrier gas pipeline and is used to control the on / off state of the carrier gas pipeline.

[0014] Furthermore, the liquid vaporization system further includes: a first flow meter, which is installed on the liquid inlet pipe and is used to calculate the flow rate of the liquid process medium; a first bypass pipe, the inlet end of which is connected to the liquid inlet pipe and is located between the first flow meter and the vaporizer, and the outlet end of which is connected to the exhaust gas treatment unit; and a bypass control unit, which is used to control the connection between the first flow meter and the vaporization chamber or the connection between the first flow meter and the first bypass pipe.

[0015] Furthermore, the liquid vaporization system further includes: a first flow meter, which is installed on the liquid inlet pipe and is used to calculate the flow rate of the liquid process medium; a second bypass pipe, the inlet end of which is connected to a purge gas source, the outlet end of which is connected to the liquid inlet pipe, and the outlet end of which is located between the first flow meter and the vaporization chamber; and a fifth control valve, which is used to control the opening and closing of the second bypass pipe.

[0016] Furthermore, the first control unit includes: a first control valve disposed on the liquid source pipeline for controlling the on / off state of the liquid source pipeline; and a second control valve disposed on the purge pipeline for controlling the on / off state of the purge pipeline.

[0017] Furthermore, the liquid source vaporization system also includes a residual liquid recovery device, which is connected to the liquid inlet pipeline and is used to recover residual process media.

[0018] Furthermore, the residual liquid recovery device includes: a residual liquid collector for recovering residual liquid process media; a residual liquid recovery pipeline, the outlet end of which is connected to the residual liquid collector, and the inlet end of which is connected to the liquid inlet pipeline; and a sixth control valve disposed on the residual liquid recovery pipeline for controlling the on / off state of the residual liquid recovery pipeline. The vaporization device further includes: a seventh control valve disposed on the liquid inlet pipeline, located between the inlet end of the residual liquid recovery pipeline and the vaporizer, for controlling the on / off state of the vaporizer and the liquid inlet pipeline.

[0019] Furthermore, the residual liquid recovery device further includes: an exhaust pipe, wherein the residual liquid collector has an exhaust port, and the exhaust port is connected to the exhaust gas treatment unit through the exhaust pipe; and an eighth control valve, wherein the eighth control valve is located on the exhaust pipe and is used to control the opening and closing of the exhaust pipe.

[0020] Furthermore, the residual liquid recovery device further includes a ninth control valve, which is disposed on the residual liquid recovery pipeline and is located between the sixth control valve and the outlet end of the residual liquid recovery pipeline.

[0021] Furthermore, the liquid source vaporization system further includes: a purging branch, the inlet end of which is connected to a purging gas source, the outlet end of which is connected to the residual liquid recovery pipeline, and the outlet end of which is located between the ninth control valve and the sixth control valve; and a tenth control valve, which is disposed on the purging branch and used to control the on / off state of the purging branch.

[0022] Furthermore, the residual liquid recovery device further includes: a residual gas discharge pipeline, the inlet end of which is connected to the residual liquid recovery pipeline, the inlet end of which is located between the sixth control valve and the ninth control valve, and the outlet end of which is connected to the tail gas treatment unit; and a residual gas control valve, which is installed on the residual gas discharge pipeline and used to control the on / off state of the residual gas discharge pipeline.

[0023] Furthermore, the vaporization device further includes: a carrier gas pipeline, the inlet end of which is connected to the carrier gas source, and the outlet end of which is connected to the vaporization chamber; a carrier gas control valve, which is disposed on the carrier gas pipeline and is used to control the on / off state of the carrier gas pipeline; a first flow meter, which is disposed on the liquid inlet pipeline and is used to calculate the flow rate of the liquid process medium; a second bypass pipeline, the inlet end of which is connected to the purge gas source, and the outlet end of which is connected to the liquid inlet pipeline, and the outlet end of which is located between the first flow meter and the vaporization chamber; and a fifth control valve, which is used to control the on / off state of the second bypass pipeline.

[0024] The present invention has the following beneficial effects:

[0025] The liquid-source vaporization system of this invention, by incorporating a purge pipeline, a first control unit, an exhaust gas treatment unit, and a second control unit, can not only vaporize liquid process media but also, by controlling the first and second control units, connect the purge pipeline and the exhaust gas treatment unit to the vaporization device. This allows purge gas to be introduced into the vaporization device, cleaning its interior and removing any residual process media from the pipeline, thus reducing its impact on future use. Furthermore, the exhaust gas treatment unit treats any contaminants blown out of the vaporization device, preventing environmental pollution. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the liquid source vaporization system according to Embodiment 1 of the present invention;

[0027] Figure 2 This is a schematic diagram of the working state of the liquid source vaporization system according to Embodiment 1 of the present invention;

[0028] Figure 3 This is a schematic diagram of the first clean state of the liquid source vaporization system according to Embodiment 1 of the present invention;

[0029] Figure 4 This is a schematic diagram of the second clean state of the liquid source vaporization system according to Embodiment 1 of the present invention;

[0030] Figure 5 This is a schematic diagram of the third clean state of the liquid source vaporization system in Embodiment 2 of the present invention;

[0031] Figure 6 This is a schematic diagram of the fourth clean state of the liquid source vaporization system in Embodiment 3 of the present invention;

[0032] Figure 7This is a schematic diagram of the first residual liquid recovery state of the liquid source vaporization system in Embodiment 4 of the present invention;

[0033] Figure 8 This is a schematic diagram of the second residual liquid recovery state of the liquid source vaporization system in Embodiment 5 of the present invention;

[0034] Figure 9 This is a schematic diagram of the residual gas discharge state of the liquid source vaporization system in Embodiment Six of the present invention;

[0035] Figure 10 This is a schematic diagram of the working state of the liquid source vaporization system in Embodiment 7 of the present invention;

[0036] Figure 11 This is a schematic diagram of the first closed state of the liquid source vaporization system in Embodiment 7 of the present invention;

[0037] Figure 12 This is a schematic diagram of the second closed state of the liquid source vaporization system in Embodiment 7 of the present invention;

[0038] Figure 13 This is a schematic diagram of the third clean state of the liquid source vaporization system in Embodiment 7 of the present invention;

[0039] Figure 14 This is a schematic diagram of the first residual liquid recovery state of the liquid source vaporization system in Embodiment 7 of the present invention;

[0040] Figure 15 This is a schematic diagram of the second residual liquid recovery state of the liquid source vaporization system in Embodiment 7 of the present invention;

[0041] Figure 16 This is a schematic diagram of the residual gas discharge state of the liquid source vaporization system in Embodiment 7 of the present invention;

[0042] Figure 17 This is a schematic diagram of the residual gas discharge state of the liquid source vaporization system in Embodiment 8 of the present invention;

[0043] List of reference numerals in the attached diagram:

[0044] 10. Liquid source pipeline; 20. Vaporization device; 21. Vaporizer; 22. Liquid inlet pipeline; 23. Gas outlet pipeline; 24. Carrier gas pipeline; 25. Carrier gas control valve; 26. Seventh control valve; 30. Output pipeline; 40. Purge pipeline; 50. First control unit; 51. First control valve; 52. Second control valve; 60. Exhaust gas treatment unit; 61. Exhaust gas treatment device; 62. Exhaust gas treatment pipeline; 70. Second control unit; 71. Third control valve; 72. Fourth control valve; 80. First flow rate 90. First bypass line; 100. Bypass control unit; 101. First bypass valve; 102. Second bypass valve; 110. Second bypass line; 120. Fifth control valve; 130. Residual liquid recovery device; 131. Residual liquid collector; 132. Residual liquid recovery line; 133. Sixth control valve; 134. Exhaust line; 135. Eighth control valve; 136. Ninth control valve; 137. Residual gas discharge line; 138. Residual gas control valve; 140. Purge branch; 150. Tenth control valve. Detailed Implementation

[0045] To enable those skilled in the art to better understand the technical solution of the present invention, the temperature control device and the reaction chamber using it provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0046] like Figure 1 The illustrated embodiment 1 discloses a liquid source vaporization system applied to semiconductor process equipment. The liquid source vaporization system includes: a liquid source pipeline 10, a vaporization device 20, an output pipeline 30, a purge pipeline 40, a first control unit 50, an exhaust gas treatment unit 60, and a second control unit 70.

[0047] The liquid source pipeline 10, the vaporization device 20, and the output pipeline 30 are connected in sequence. That is, the inlet end of the liquid source pipeline 10 is connected to a liquid source, and the outlet end of the liquid source pipeline 10 is connected to the vaporization device 20, thus allowing the liquid source pipeline 10 to supply liquid process media to the vaporization device 20. After the liquid process media enters the vaporization device 20, the vaporization device 20 vaporizes the liquid process media into a gaseous process media. Then, the output pipeline 30 transports the vaporized gaseous process media to the process chamber of the semiconductor process equipment, thereby performing the corresponding semiconductor process.

[0048] In this embodiment, the purge line 40 is connected to the vaporization device 20, and the inlet end of the purge line 40 is connected to the purge gas source. The purge line 40 is used to provide purge gas to the vaporization device 20. The first control unit 50 is used to control the connection between the purge line 40 and the vaporization device 20 or the connection between the liquid source line 10 and the vaporization device 20. The exhaust gas treatment unit 60 is connected to the vaporization device 20 and is used to treat the pollutants blown out of the vaporization device 20 by the purge gas. The second control unit 70 is used to control the connection between the exhaust gas treatment unit 60 and the vaporization device 20 or the connection between the output line 30 and the vaporization device 20.

[0049] like Figures 2 to 3 As shown, during operation, the liquid source vaporization system has a working state and a first clean state. The liquid source vaporization system switches between the working state and the first clean state by controlling the first control unit 50.

[0050] like Figure 2 As shown, in operation, the first control unit 50 controls the liquid source pipeline 10 to connect with the vaporization device 20, and the second control unit 70 controls the output pipeline 30 to connect with the vaporization device 20. The liquid process medium enters the vaporization device 20 through the liquid source pipeline 10, the vaporization device 20 vaporizes the liquid process medium, and then the vaporized gaseous process medium is transported to the process chamber of the semiconductor process equipment through the output pipeline 30, thereby performing the corresponding semiconductor process.

[0051] like Figure 3 As shown, in the first clean state, the first control unit 50 controls the purge pipeline 40 to connect with the vaporization device 20, and the second control unit 70 controls the exhaust gas treatment unit 60 to connect with the vaporization device 20. The purge gas passes through the purge pipeline 40, the vaporization device 20, and the exhaust gas treatment unit 60 in sequence. The purge gas cleans the air, moisture, particles, etc. in the pipeline. At the same time, the pollutants blown out of the vaporization device 20 by the purge gas can be treated by the exhaust gas treatment unit 60 to prevent the pollutants from polluting the environment.

[0052] The liquid vaporization system of this invention, by setting up a purge pipeline 40, a first control unit 50, an exhaust gas treatment unit 60, and a second control unit 70, can not only vaporize liquid process media, but also, by controlling the first control unit 50 and the second control unit 70, connect the purge pipeline 40 and the exhaust gas treatment unit 60 to the vaporization device 20, allowing purge gas to be introduced into the vaporization device 20. The purge gas cleans the interior of the vaporization device 20, thereby blowing out residual process media in the pipeline, reducing residual process media and preventing impact on subsequent use. Furthermore, because of the exhaust gas treatment unit 60, pollutants blown out of the vaporization device 20 by the purge gas can be treated by the exhaust gas treatment unit 60, preventing environmental pollution.

[0053] It should be noted that the first cleaning state can be used to clean the vaporization device 20 after the liquid process medium is vaporized in the liquid source vaporization system, and it can also be used to clean the process medium before the liquid source vaporization system vaporizes it, to blow away air, moisture, particles and other contaminants from the pipeline or vaporization device 20, and to prepare for the process.

[0054] Furthermore, in this example, the vaporization device 20 includes a vaporizer 21, a liquid inlet pipe 22, an outlet pipe 23, a carrier gas pipe 24, and a carrier gas control valve 25. The vaporizer 21 has a vaporization chamber for vaporizing the liquid process medium; the outlet end of the liquid inlet pipe 22 is connected to the vaporization chamber, and the inlet end of the liquid inlet pipe 22 is connected to the outlet end of the liquid source pipe 10 and the outlet end of the purge pipe 40, respectively; the inlet end of the outlet pipe 23 is connected to the vaporization chamber, and the outlet end of the outlet pipe 23 is connected to the inlet end of the output pipe 30 and the tail gas treatment unit 60, respectively. The inlet end of the carrier gas pipe 24 is connected to the carrier gas source, and the outlet end of the carrier gas pipe 24 is connected to the vaporization chamber; the carrier gas control valve 25 is installed on the carrier gas pipe 24 and is used to control the on / off state of the carrier gas pipe 24.

[0055] The exhaust gas treatment unit 60 includes an exhaust gas treatment device 61, a vacuum pump, and an exhaust gas treatment pipeline 62. The inlet end of the exhaust gas treatment pipeline 62 is connected to the outlet end of the exhaust gas pipeline 23, and the outlet end of the exhaust gas treatment pipeline 62 is connected to the exhaust gas treatment device 61. The vacuum pump is installed on the exhaust gas treatment pipeline 62.

[0056] The first control unit 50 includes a first control valve 51 and a second control valve 52. The first control valve 51 is disposed on the liquid source pipeline 10 and is used to control the opening and closing of the liquid source pipeline 10. The second control valve 52 is disposed on the purge pipeline 40 and is used to control the opening and closing of the purge pipeline 40.

[0057] The second control unit 70 includes a third control valve 71 and a fourth control valve 72. The third control valve 71 is installed on the output pipeline 30 and is used to control the opening and closing of the output pipeline 30. The fourth control valve 72 is installed on the exhaust gas treatment pipeline 62 and is used to control the opening and closing of the exhaust gas treatment pipeline 62. The vacuum pump is located between the fourth control valve 72 and the exhaust gas treatment device 61.

[0058] The liquid source vaporization system has a working state, a first clean state, and a second clean state.

[0059] like Figure 2As shown, in the working state, the first control valve 51 is open, the second control valve 52 is closed, the third control valve 71 is open, the fourth control valve 72 is closed, and the carrier gas control valve 25 is open. The liquid source line 10, the liquid inlet line 22, the vaporizer 21, the gas outlet line 23, and the output line 30 are connected in sequence. The liquid process medium sequentially enters the vaporizer 21 through the liquid source line 10 and the liquid inlet line 22. The vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium then sequentially enters the process chamber of the semiconductor process equipment through the gas outlet line 23 and the output line 30, thereby performing the corresponding semiconductor process.

[0060] like Figure 3 As shown, in the first clean state, the second control valve 52 is open, the first control valve 51 is closed, the fourth control valve 72 is open, the third control valve 71 is closed, and the carrier gas control valve 25 is closed. The purge gas passes sequentially through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21, and the gas outlet pipeline 23, thereby cleaning the residual liquid, air, moisture, particles, etc. in the pipeline and the vaporizer 21. At the same time, the pollutants blown out by the purge gas from the vaporizer 20 enter the exhaust gas treatment device 61 through the exhaust gas treatment pipeline 62, thereby treating the pollutants through the exhaust gas treatment unit 60 and preventing the pollutants from polluting the environment.

[0061] like Figure 4 As shown, in the second cleaning state, the second control valve 52 is open, the first control valve 51 is closed, the fourth control valve 72 is open, the third control valve 71 is closed, and the carrier gas control valve 25 is open. The second cleaning state is mainly to remove residual liquid and gas from the pipeline and vaporizer 21 after the process is completed. The purge gas passes sequentially through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21, and the gas outlet pipeline 23. At the same time, due to the opening of the carrier gas control valve 25, the vaporizer 21 vaporizes the liquid inside into gas under the action of the carrier gas, and then is blown out together with the purge gas, thereby cleaning the residual liquid and gas in the pipeline and the vaporizer 21. Meanwhile, the pollutants blown out of the vaporizer 20 by the purge gas enter the tail gas treatment device 61 through the tail gas treatment pipeline 62, thereby treating the pollutants through the tail gas treatment unit 60 and avoiding pollution of the environment.

[0062] It should be noted that in the above embodiment one, the liquid source vaporization system also includes a first flow meter 80, which is installed on the liquid inlet pipe 22 and is used to calculate the flow rate of the liquid process medium.

[0063] It should also be noted that in the above embodiments, the first control unit 50 includes a first control valve 51 and a second control valve 52. However, this is not limiting. For example, in some other embodiments not shown in the figure, the first control unit 50 can also be a three-way valve. The first end of the three-way valve is connected to the liquid inlet line 22, the second end of the three-way valve is connected to the liquid source line 10, and the third end of the three-way valve is connected to the purge line 40. Thus, the three-way valve enables the purge line 40 to be connected to the liquid inlet line 22 or the liquid source line 10 to be connected to the liquid inlet line 22. That is to say, without being contrary to the working principle of the present invention, any structure that can achieve switching between the purge line 40 and the liquid inlet line 22 is within the protection scope of the present invention. Similarly, in the above embodiments, the second control unit 70 can also be a three-way valve, which will not be described in detail here.

[0064] like Figure 5 The second embodiment of the present invention also discloses a liquid source vaporization system, which is basically the same as the first embodiment, except that in this example, the liquid source vaporization system further includes: a first bypass pipeline 90 and a bypass control unit 100. The inlet end of the first bypass pipeline 90 is connected to the liquid inlet pipeline 22. The inlet end of the first bypass pipeline 90 is located between the first flow meter 80 and the vaporizer 21. The outlet end of the first bypass pipeline 90 is connected to the exhaust gas treatment unit 60. Specifically, the outlet end of the first bypass pipeline 90 is connected to the exhaust gas treatment pipeline 62 between the fourth control valve 72 and the vacuum pump. The bypass control unit 100 is used to control the first flow meter 80 to connect to the vaporization chamber or the first flow meter 80 to the first bypass pipeline 90.

[0065] The bypass control unit 100 includes a first bypass valve 101 and a second bypass valve 102. The first bypass valve 101 is disposed on the first bypass pipeline 90, and the second bypass valve 102 is disposed on the liquid inlet pipeline 22. The second bypass valve 102 is disposed between the inlet end of the first bypass pipeline 90 and the vaporizer 21.

[0066] The liquid source vaporization system has a working state and a third clean state.

[0067] In operation, the first control valve 51 is open and the second control valve 52 is closed; the third control valve 71 is open and the fourth control valve 72 is closed; the second bypass valve 102 is open and the first bypass valve 101 is closed; and the carrier gas control valve 25 is open. In operation, the liquid source pipeline 10, the first flow meter 80, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are connected in sequence. The liquid process medium sequentially enters the vaporizer 21 through the liquid source pipeline 10, the first flow meter 80, and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium then sequentially enters the process chamber of the semiconductor process equipment through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0068] like Figure 5 As shown, in the third clean state, the second control valve 52 is open and the first control valve 51 is closed; the first bypass valve 101 is open and the second bypass valve 102 is closed, and the carrier gas control valve 25 is closed. This connects the liquid source pipeline 10, the first flow meter 80, the liquid inlet pipeline 22, the first bypass pipeline 90, the tail gas treatment pipeline 62, the vacuum pump, and the tail gas treatment device 61 in sequence. Since the commonly used liquid process media may have hazardous characteristics such as spontaneous combustion, corrosiveness, and toxicity, when the first flow meter 80 needs maintenance or replacement, thorough purging must be performed to ensure personnel safety and prevent residue from remaining in the components and pipelines. When the liquid source vaporization system is in the third state, the purging gas passes sequentially through the liquid source pipeline 10, the first flow meter 80, the liquid inlet pipeline 22, the first bypass pipeline 90, the tail gas treatment pipeline 62, and the vacuum pump, blowing contaminants and residual liquid to the tail gas treatment system for treatment, thereby ensuring the safety of operators during the maintenance and replacement of the first flow meter 80.

[0069] It should be noted that in the above embodiments, the bypass control unit 100 includes a first bypass valve 101 and a second bypass valve 102. However, this is not limiting. For example, in some other embodiments not shown in the figures, the first control unit 50 can also be a three-way valve. The first end of the three-way valve is connected to the liquid inlet pipe 22, the second end of the three-way valve is connected to the first bypass pipe 90, and the third end of the three-way valve is connected to the vaporizer 21. Thus, the connection between the liquid inlet pipe 22 and the first bypass pipe 90 or the connection between the liquid inlet pipe 22 and the vaporizer 21 can be achieved through the three-way valve. In other words, without being contrary to the working principle of this invention, any structure that can achieve switching between the vaporizer 21 and the first bypass pipe 90 is within the protection scope of this invention.

[0070] like Figure 6The third embodiment of the present invention also discloses a liquid source vaporization system, which is basically the same as the first embodiment, except that in this example, the liquid source vaporization system further includes: a second bypass pipeline 110 and a fifth control valve 120. The inlet end of the second bypass pipeline 110 is connected to the purge gas source, and the outlet end of the second bypass pipeline 110 is connected to the liquid inlet pipeline 22. The outlet end of the second bypass pipeline 110 is located between the first flow meter 80 and the vaporization chamber. The fifth control valve 120 is used to control the opening and closing of the second bypass pipeline 110.

[0071] The liquid vaporization system has a working state and a fourth clean state.

[0072] In operation, the first control valve 51 is open, the second control valve 52 is closed, the fifth control valve 120 is closed, the third control valve 71 is open, the fourth control valve 72 is closed, and the carrier gas control valve 25 is open. The liquid source line 10, the liquid inlet line 22, the vaporizer 21, the gas outlet line 23, and the output line 30 are connected sequentially. The liquid process medium sequentially enters the vaporizer 21 through the liquid source line 10 and the liquid inlet line 22. The vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium then sequentially enters the process chamber of the semiconductor process equipment through the gas outlet line 23 and the output line 30, thereby performing the corresponding semiconductor process.

[0073] like Figure 6 As shown, in the fourth clean state, the fifth control valve 120 is open, the first control valve 51 is closed, the second control valve 52 is closed, the carrier gas control valve 25 is open, the fourth control valve 72 is open, and the third control valve 71 is closed.

[0074] The fourth clean state is primarily used when the first flow meter 80 malfunctions and cannot pass liquid. When the liquid source vaporization system is in the fourth state, the purge gas source, the second bypass pipe 110, the liquid inlet pipe 22, the vaporizer 21, the gas outlet pipe 23, the tail gas treatment pipe 62, the vacuum pump, and the tail gas treatment device 61 are connected in sequence. The purge gas bypasses the first flow meter 80 through the second bypass pipe 110, and then enters the vaporizer 21 through the liquid inlet pipe 22. Simultaneously, with the assistance of the carrier gas, the vaporizer 21 vaporizes the residual liquid inside. Under the action of the purge gas, the residual liquid, air, moisture, particles, etc. in the pipe and vaporizer 21 are purged clean. The vaporized gas and pollutants are discharged into the tail gas treatment device 61 through the gas outlet pipe 23 and the tail gas treatment pipe 62. Finally, the tail gas treatment device 61 treats the pollutants, preventing them from polluting the environment. By setting up a second bypass pipe 110, when the first flow meter 80 malfunctions and cannot pass liquid, the residual liquid in the pipe behind the first flow meter 80 can be drained first, thereby ensuring overall safety.

[0075] In the prior art, if the vaporizer 21 experiences a heating failure and cannot continue vaporizing the liquid process medium, then discharging the residual liquid process medium in the pipeline becomes difficult. To solve this problem, such as... Figure 7 The fourth embodiment of the present invention also discloses a liquid source vaporization system, which is basically the same as the first embodiment. The difference is that in this example, the liquid source vaporization system further includes a residual liquid recovery device 130, which is connected to the liquid inlet pipeline 22 and is used to recover residual process media.

[0076] The liquid source vaporization system of Embodiment 4 of the present invention adds a residual liquid recovery device 130 to the system of Embodiment 1, which can recover the residual liquid in the pipeline, thereby reducing the loss of liquid process media and reducing material costs.

[0077] Specifically, in this fourth embodiment, as Figure 7 As shown, the residual liquid recovery device 130 includes: a residual liquid collector 131, a residual liquid recovery pipeline 132, and a sixth control valve 133. The residual liquid collector 131 is used to recover residual liquid process media. The outlet end of the residual liquid recovery pipeline 132 is connected to the residual liquid collector 131, and the inlet end of the residual liquid recovery pipeline 132 is connected to the liquid inlet pipeline 22. The sixth control valve 133 is installed on the residual liquid recovery pipeline 132 and is used to control the on / off state of the residual liquid recovery pipeline 132.

[0078] In order to cooperate with the residual liquid recovery device 130 to recover residual liquid, the vaporization device 20 also includes a seventh control valve 26. The seventh control valve 26 is installed on the liquid inlet pipe 22. The seventh control valve 26 is located between the inlet end of the residual liquid recovery pipe 132 and the vaporizer 21, and is used to control the opening and closing of the vaporization chamber of the vaporizer 21 and the liquid inlet pipe 22.

[0079] Furthermore, the residual liquid recovery device 130 also includes an exhaust pipe 134 and an eighth control valve 135. The residual liquid collector 131 has an exhaust port, which is connected to the exhaust gas treatment unit 60 through the exhaust pipe 134. The eighth control valve 135 is located on the exhaust pipe 134 and is used to control the opening and closing of the exhaust pipe 134. By setting up the exhaust pipe 134, excess gas and pressure in the container can be reduced, making it easier to collect the residual liquid.

[0080] In this embodiment, the liquid source vaporization system has a working state and a first residual liquid recovery state.

[0081] In operation, the first control valve 51 is open, the second control valve 52 is closed, the third control valve 71 is open, the fourth control valve 72 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, and the carrier gas control valve 25 is open. In operation, the liquid source pipeline 10, the first flow meter 80, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are connected in sequence. The liquid process medium sequentially enters the vaporizer 21 through the liquid source pipeline 10, the first flow meter 80, and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium then sequentially enters the process chamber of the semiconductor process equipment through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0082] like Figure 7 As shown, in the first residual liquid recovery state, the second control valve 52 is open, the first control valve 51 is closed, the sixth control valve 133 is open, the seventh control valve 26 is closed, the eighth control valve 135 is open, and the carrier gas control valve 25 is closed.

[0083] The first residual liquid recovery state is mainly used when the vaporizer 21 malfunctions and cannot perform vaporization. When the liquid source vaporization system is in the first residual liquid recovery state, the purge gas source, purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, and residual liquid collector 131 are connected in sequence. The exhaust port of residual liquid collector 131, exhaust pipeline 134, tail gas treatment pipeline 62, and tail gas treatment device 61 are connected in sequence. The purge gas enters the residual liquid collector 131 through purge pipeline 40, liquid inlet pipeline 22, and residual liquid recovery pipeline 132 in sequence, and then enters the tail gas treatment device 61 through the exhaust port of residual liquid collector 131, exhaust pipeline 134, and tail gas treatment pipeline 62. During this process, the residual liquid in the pipeline is recovered in the residual liquid collector 131 along with the purge gas, while the gaseous process medium or other waste gas in the pipeline can enter the tail gas treatment device 61 for treatment along with the purge gas, thus ensuring residual liquid collection while avoiding environmental pollution.

[0084] The liquid vaporization system of Embodiment 4 of the present invention, by setting up a residual liquid collector 131, a residual liquid recovery pipeline 132, and a sixth control valve 133, and by setting a seventh control valve 26 on the liquid inlet pipeline 22 between the inlet end of the residual liquid recovery pipeline 132 and the vaporizer 21, can control the connection between the liquid inlet pipeline 22 and the residual liquid recovery pipeline 132 or the liquid inlet pipeline 22 and the vaporizer 21 through the sixth control valve 133 and the seventh control valve 26, thereby recovering the residual liquid in the pipeline, reducing the loss of liquid process media, and reducing material costs. In addition, by setting up an exhaust pipeline 134, excess gas and pressure in the container, and the gaseous process media or other waste gas in the pipeline can be sent to the tail gas treatment device 61 for treatment along with the purge gas, thereby facilitating residual liquid collection and avoiding environmental pollution, which is a typical example of multi-purpose equipment.

[0085] like Figure 8 The fifth embodiment of the present invention also discloses a liquid source vaporization system, which is basically the same as the fourth embodiment. The difference is that, in this example, the liquid source vaporization system further includes a ninth control valve 136, which is installed on the residual liquid recovery pipeline 132 and is located between the sixth control valve 133 and the outlet end of the residual liquid recovery pipeline 132.

[0086] The liquid source vaporization system also includes: a purge branch 140 and a tenth control valve 150. The inlet end of the purge branch 140 is connected to the purge gas source, and the outlet end of the purge branch 140 is connected to the residual liquid recovery pipeline 132. The outlet end of the purge branch 140 is located between the ninth control valve 136 and the sixth control valve 133. The tenth control valve 150 is installed on the purge branch 140 and is used to control the on / off state of the purge branch 140.

[0087] In this embodiment, the liquid source vaporization system has a working state and a second residual liquid recovery state.

[0088] In operation, the first control valve 51 is open, the second control valve 52 is closed, and the tenth control valve 150 is closed; the third control valve 71 is open, the fourth control valve 72 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, and the carrier gas control valve 25 is open. In operation, the liquid source pipeline 10, the first flow meter 80, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are connected in sequence. The liquid process medium sequentially enters the vaporizer 21 through the liquid source pipeline 10, the first flow meter 80, and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium then sequentially enters the process chamber of the semiconductor process equipment through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0089] like Figure 8As shown, in the second residual liquid recovery state, the tenth control valve 150 is open, the first control valve 51 is closed, the second control valve 52 is closed, the ninth control valve 136 is open, the sixth control valve 133 is closed, the seventh control valve 26 is closed, the eighth control valve 135 is open, and the carrier gas control valve 25 is closed.

[0090] The second residual liquid recovery state is mainly used to purge the pipeline after residual liquid collection is completed, in order to remove air, moisture, and other impurities from the pipeline and the residual liquid collector 131. When the liquid source vaporization system is in the second residual liquid recovery state, the purge gas source, purge branch 140, residual liquid recovery pipeline 132, and residual liquid collector 131 are connected in sequence. The exhaust port of residual liquid collector 131, exhaust pipeline 134, tail gas treatment pipeline 62, and tail gas treatment device 61 are connected in sequence. The purge gas enters the residual liquid collector 131 through purge branch 140 and residual liquid recovery pipeline 132, and then enters the tail gas treatment device 61 through the exhaust port of residual liquid collector 131, exhaust pipeline 134, and tail gas treatment pipeline 62. During this process, impurities such as air and water vapor in the pipeline and in the residual liquid collector 131 are discharged from the residual liquid collector 131 along with the purging gas, and enter the exhaust gas treatment device 61 for treatment together with the purging gas, thereby ensuring that the collected residual liquid will not react with gaseous impurities and remains in a relatively stable state; at the same time, it can also avoid environmental pollution from the exhaust gas.

[0091] like Figure 9 The sixth embodiment of the present invention also discloses a liquid source vaporization system, which is basically the same as the fifth embodiment, except that, in this example, the residual liquid recovery device 130 further includes: a residual gas discharge pipeline 137 and a residual gas control valve 138. The inlet end of the residual gas discharge pipeline 137 is connected to the residual liquid recovery pipeline 132, the inlet end of the residual gas discharge pipeline 137 is located between the sixth control valve 133 and the ninth control valve 136, the outlet end of the residual gas discharge pipeline 137 is connected to the tail gas treatment pipeline 62, and the outlet end of the residual gas discharge pipeline 137 is located between the fourth control valve 72 and the vacuum pump; the residual gas control valve 138 is installed on the residual gas discharge pipeline 137 and is used to control the opening and closing of the residual gas discharge pipeline 137.

[0092] In this embodiment, the liquid source vaporization system has a working state and a residual gas discharge state.

[0093] In operation, the first control valve 51 is open, the second control valve 52 is closed, and the tenth control valve 150 is closed; the third control valve 71 is open, the fourth control valve 72 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, and the carrier gas control valve 25 is open. In operation, the liquid source pipeline 10, the first flow meter 80, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are connected in sequence. The liquid process medium sequentially enters the vaporizer 21 through the liquid source pipeline 10, the first flow meter 80, and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium then sequentially enters the process chamber of the semiconductor process equipment through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0094] like Figure 9 As shown, in the residual gas discharge state, the second control valve 52 is open, the first control valve 51 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is open, the residual gas control valve 138 is open, the seventh control valve 26 is closed, the ninth control valve 136 is closed, and the carrier gas control valve 25 is closed.

[0095] The residual gas discharge state is mainly used when the residual liquid collector 131 needs to be removed after the residual liquid collection is completed. The pipeline is purged with purging gas to remove the residual gaseous process medium, air, moisture and other impurities inside the pipeline.

[0096] When the liquid source vaporization system is in the residual gas discharge state, the purge gas source, purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, residual gas discharge pipeline 137, tail gas treatment pipeline 62, and tail gas treatment device 61 are connected in sequence. The purge gas sequentially passes through purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, residual gas discharge pipeline 137, and tail gas treatment pipeline 62 into the tail gas treatment device 61. During this process, the purge gas carries the gaseous process medium, air, moisture, and other impurities from the pipeline into the tail gas treatment device 61 for processing, thereby removing the gaseous process medium, air, moisture, and other impurities from the pipeline, ensuring the safety of the residual liquid collector 131 removal process. Simultaneously, it also avoids environmental pollution from the discharged waste gas.

[0097] like Figures 10 to 16 Embodiment 7 of the present invention also discloses a liquid source vaporization system, which is basically the same as that of Embodiment 6, except that, in this example, the liquid source vaporization system further includes: a second bypass pipeline 110 and a fifth control valve 120. The inlet end of the second bypass pipeline 110 is connected to the purge gas source, and the outlet end of the second bypass pipeline 110 is connected to the liquid inlet pipeline 22. The outlet end of the second bypass pipeline 110 is located between the first flow meter 80 and the vaporization chamber. The fifth control valve 120 is used to control the opening and closing of the second bypass pipeline 110.

[0098] In this example, the liquid source vaporization system has a working state, a first clean state, a second clean state, a fourth clean state, a first residual liquid collection state, a first residual liquid collection state, and a residual gas discharge state.

[0099] like Figure 10 As shown, in the working state, the first control valve 51 is open, the second control valve 52 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is open, the third control valve 71 is open, and the fourth control valve 72 is closed.

[0100] In operation, the liquid source pipeline 10, the first flow meter 80, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are connected in sequence. The liquid process medium enters the vaporizer 21 sequentially through the liquid source pipeline 10, the first flow meter 80, and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium then enters the process chamber of the semiconductor process equipment sequentially through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0101] like Figure 11 As shown, in the first clean state, the second control valve 52 is open, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is closed, the fourth control valve 72 is open, and the third control valve 71 is closed.

[0102] The purge gas passes sequentially through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21, and the gas outlet pipeline 23, thereby cleaning the residual liquid, air, moisture, particles, etc. in the pipeline and the vaporizer 21. At the same time, the pollutants blown out by the purge gas from the vaporizer 20 enter the exhaust gas treatment device 61 through the exhaust gas treatment pipeline 62, thereby treating the pollutants through the exhaust gas treatment unit 60 and preventing the pollutants from polluting the environment.

[0103] like Figure 12 As shown, in the second clean state, the second control valve 52 is open, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is open, the fourth control valve 72 is open, and the third control valve 71 is closed.

[0104] The second cleaning state is mainly to discharge residual liquid and gas in the pipeline and vaporizer 21 after the process is completed. The purge gas passes through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21, and the gas outlet pipeline 23 in sequence. At the same time, due to the opening of the carrier gas control valve 25, the vaporizer 21 vaporizes the liquid inside into gas under the action of the carrier gas, and then is blown out together with the purge gas, thereby cleaning the residual liquid and gas in the pipeline and the vaporizer 21. Meanwhile, the pollutants blown out of the vaporizer 20 by the purge gas enter the tail gas treatment device 61 through the tail gas treatment pipeline 62, thereby treating the pollutants through the tail gas treatment unit 60 and avoiding pollution of the environment.

[0105] like Figure 13 As shown, in the fourth clean state, the fifth control valve 120 is open, the first control valve 51 is closed, the second control valve 52 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is open, the fourth control valve 72 is open, and the third control valve 71 is closed.

[0106] The fourth clean state is primarily used when the first flow meter 80 malfunctions and cannot pass liquid. When the liquid source vaporization system is in the fourth state, the purge gas source, the second bypass pipe 110, the liquid inlet pipe 22, the vaporizer 21, the gas outlet pipe 23, the tail gas treatment pipe 62, the vacuum pump, and the tail gas treatment device 61 are connected in sequence. The purge gas bypasses the first flow meter 80 through the second bypass pipe 110, and then enters the vaporizer 21 through the liquid inlet pipe 22. Simultaneously, with the assistance of the carrier gas, the vaporizer 21 vaporizes the residual liquid inside. Under the action of the purge gas, the residual liquid, air, moisture, particles, etc. in the pipe and vaporizer 21 are purged clean. The vaporized gas and pollutants are discharged into the tail gas treatment device 61 through the gas outlet pipe 23 and the tail gas treatment pipe 62. Finally, the tail gas treatment device 61 treats the pollutants, preventing them from polluting the environment. By setting up a second bypass pipe 110, when the first flow meter 80 malfunctions and cannot pass liquid, the residual liquid in the pipe behind the first flow meter 80 can be drained first, thereby ensuring overall safety.

[0107] like Figure 14 As shown, in the first residual liquid recovery state, the second control valve 52 is open, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is open, the ninth control valve 136 is open, the seventh control valve 26 is closed, the residual gas control valve 138 is closed, the eighth control valve 135 is open, the carrier gas control valve 25 is closed, the third control valve 71 is closed, and the fourth control valve 72 is closed.

[0108] The first residual liquid recovery state is mainly used when the vaporizer 21 malfunctions and cannot perform vaporization. When the liquid source vaporization system is in the first residual liquid recovery state, the purge gas source, purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, and residual liquid collector 131 are connected in sequence. The exhaust port of residual liquid collector 131, exhaust pipeline 134, tail gas treatment pipeline 62, and tail gas treatment device 61 are connected in sequence. The purge gas enters the residual liquid collector 131 through purge pipeline 40, liquid inlet pipeline 22, and residual liquid recovery pipeline 132 in sequence, and then enters the tail gas treatment device 61 through the exhaust port of residual liquid collector 131, exhaust pipeline 134, and tail gas treatment pipeline 62. During this process, the residual liquid in the pipeline is recovered in the residual liquid collector 131 along with the purge gas, while the gaseous process medium or other waste gas in the pipeline can enter the tail gas treatment device 61 for treatment along with the purge gas, thus ensuring residual liquid collection while avoiding environmental pollution.

[0109] The liquid vaporization system of Embodiment 7 of the present invention, by setting up a residual liquid collector 131, a residual liquid recovery pipeline 132, and a sixth control valve 133, and by setting a seventh control valve 26 on the liquid inlet pipeline 22 between the inlet end of the residual liquid recovery pipeline 132 and the vaporizer 21, can control the connection between the liquid inlet pipeline 22 and the residual liquid recovery pipeline 132 or the liquid inlet pipeline 22 and the vaporizer 21 through the sixth control valve 133 and the seventh control valve 26, thereby recovering the residual liquid in the pipeline, reducing the loss of liquid process media, and reducing material costs. In addition, by setting up an exhaust pipeline 134, excess gas and pressure in the container, and the gaseous process media or other waste gas in the pipeline can be sent to the tail gas treatment device 61 for treatment along with the purge gas, thereby facilitating residual liquid collection and avoiding environmental pollution, which is a typical example of multi-purpose use.

[0110] like Figure 15 As shown, in the second residual liquid recovery state, the tenth control valve 150 is open, the first control valve 51 is closed, the second control valve 52 is closed, the fifth control valve 120 is closed, the ninth control valve 136 is open, the sixth control valve 133 is closed, the seventh control valve 26 is closed, the residual gas control valve 138 is closed, the eighth control valve 135 is open, the carrier gas control valve 25 is closed, the third control valve 71 is closed, and the fourth control valve 72 is closed.

[0111] The second residual liquid recovery state is mainly used to purge the pipeline after residual liquid collection is completed, in order to remove air, moisture, and other impurities from the pipeline and the residual liquid collector 131. When the liquid source vaporization system is in the second residual liquid recovery state, the purge gas source, purge branch 140, residual liquid recovery pipeline 132, and residual liquid collector 131 are connected in sequence. The exhaust port of residual liquid collector 131, exhaust pipeline 134, tail gas treatment pipeline 62, and tail gas treatment device 61 are connected in sequence. The purge gas enters the residual liquid collector 131 through purge branch 140 and residual liquid recovery pipeline 132, and then enters the tail gas treatment device 61 through the exhaust port of residual liquid collector 131, exhaust pipeline 134, and tail gas treatment pipeline 62. During this process, impurities such as air and water vapor in the pipeline and in the residual liquid collector 131 are discharged from the residual liquid collector 131 along with the purging gas, and enter the exhaust gas treatment device 61 for treatment together with the purging gas, thereby ensuring that the collected residual liquid will not react with gaseous impurities and remains in a relatively stable state; at the same time, it can also avoid environmental pollution from the exhaust gas.

[0112] like Figure 16 As shown, in the residual gas discharge state, the second control valve 52 is open, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is open, the residual gas control valve 138 is open, the seventh control valve 26 is closed, the ninth control valve 136 is closed, the eighth control valve 135, the carrier gas control valve 25 is closed, the third control valve 71 is closed, and the fourth control valve 72 is closed.

[0113] The residual gas discharge state is mainly used when the residual liquid collector 131 needs to be removed after the residual liquid collection is completed. The pipeline is purged with purging gas to remove the residual gaseous process medium, air, moisture and other impurities inside the pipeline.

[0114] When the liquid source vaporization system is in the residual gas discharge state, the purge gas source, purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, residual gas discharge pipeline 137, tail gas treatment pipeline 62, and tail gas treatment device 61 are connected in sequence. The purge gas sequentially passes through purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, residual gas discharge pipeline 137, and tail gas treatment pipeline 62 into the tail gas treatment device 61. During this process, the purge gas carries the gaseous process medium, air, moisture, and other impurities from the pipeline into the tail gas treatment device 61 for processing, thereby removing the gaseous process medium, air, moisture, and other impurities from the pipeline, ensuring the safety of the residual liquid collector 131 removal process. Simultaneously, it also avoids environmental pollution from the discharged waste gas.

[0115] It should be noted that in this embodiment, the residual gas discharge state can also achieve the function of the third cleaning state in embodiment two. That is, when the first flow meter 80 needs maintenance and replacement, in order to ensure personnel safety, the liquid source vaporization system of this embodiment can be adjusted to the residual gas discharge state to blow the pollutants and residual liquid to the tail gas treatment system for treatment, thereby ensuring the safety of the operators during the maintenance and replacement of the first flow meter 80. This is a typical example of one item serving multiple purposes.

[0116] In the prior art, the atomizer and flow meter in the vaporizer 21 both have small aperture structures, which can easily cause blockage when the liquid source is viscous. Therefore, it is necessary to replace and maintain the vaporizer 21 and the flow meter.

[0117] To address the aforementioned issues, the liquid source vaporization system in this embodiment also includes a first flushing mode. The first flushing state is essentially the same as the first collection state, except that in the first flushing state, the first control valve 51 is open and the second control valve 52 is closed. Furthermore, the liquid introduced into the liquid source is no longer a process medium, but rather an organic solvent, such as n-octane. The organic solvent is used to flush the pipelines and components. The residual liquid and organic solvent after flushing sequentially pass through the purge pipeline 40, the liquid inlet pipeline 22, and the residual liquid recovery pipeline 132 into the residual liquid collector 131, where the waste liquid after flushing is collected, thus completing the flushing of the pipelines. Afterwards, the system can enter the first residual liquid recovery state, where the residual liquid in the pipelines is recovered using purge gas, completing the pipeline cleaning process.

[0118] In addition, the liquid source vaporization system of this embodiment also has a second flushing mode. The second flushing state is basically the same as the second collection state, except that in the second flushing state, the first control valve 51 is open and the second control valve 52 is closed. Moreover, the liquid introduced into the liquid source is no longer the process medium, but an organic solvent, such as n-octane. The organic solvent passes through the purge pipe 40, the liquid inlet pipe 22, the vaporizer 21, and the gas outlet pipe 23 in sequence. At the same time, due to the opening of the carrier gas control valve 25, the vaporizer 21 vaporizes the liquid organic solvent inside into gas under the action of the carrier gas, and dissolves the residual process medium in the vaporizer 21. Then, it is blown out together, thereby cleaning the residual process medium in the pipe and the vaporizer 21. The gas then enters the tail gas treatment device 61 through the tail gas treatment pipe 62, thereby treating the pollutants through the tail gas treatment unit 60 and avoiding environmental pollution. Afterwards, it can enter the second cleaning state, where the residual liquid in the pipe is recovered by the purge gas, completing the cleaning of the pipe.

[0119] The difference between the first flushing state and the second flushing state is that the first flushing state flushes the pipeline before the vaporizer 21, while the second flushing state can flush the inside of the vaporizer 21.

[0120] like Figure 17 Embodiment 8 of the present invention also discloses a liquid source vaporization system, which is basically the same as that of Embodiment 7, except that in this example, the exhaust pipe 134 does not pass through a vacuum pump, but is directly connected to the exhaust gas treatment device 61. This structure is mainly used so that after installation, the liquid source vaporization system can be directly adjusted to the second residual liquid recovery state. Since it is the first purging of the residual liquid collector 131, there is no special gas or liquid in the pipe; therefore, it can be directly purged into the exhaust gas treatment system without passing through a vacuum pump.

[0121] It should be noted that, in the above embodiments, in order to prevent the carrier gas from causing fluctuations in the original temperature after entering the vaporizer 21, the vaporization device 20 also includes a heat exchanger. The heat exchanger is installed on the carrier gas pipeline 24 and is used to heat the carrier gas so as to raise the temperature of the carrier gas to the required temperature in a short time, thereby improving the vaporization effect.

[0122] In the above embodiments, the first flow meter 80 is a mass flow meter, which can accurately control the flow rate of the liquid. Additionally, to accurately control the flow rate of the carrier gas, a gas flow meter, also a mass flow meter, is installed on the carrier gas pipeline 24 to accurately control the gas flow rate. However, this is not limiting. Any device capable of accurately measuring the flow rate of liquid or gas is within the scope of protection of this invention, provided it does not violate the inventive concept.

[0123] It should also be noted that, in order to monitor the state of liquids or gases in the pipeline, pressure detection devices can be installed on the pipeline to confirm the overall transmission performance and safety. Take Example 7 as an example:

[0124] A first pressure detection device can be installed on the liquid inlet line 22, located between the inlet end of the residual liquid recovery line 132 and the first flow meter 80. This device is used to detect the fluid pressure entering the vaporizer 21 and to confirm the stability of the liquid supply pressure.

[0125] A second pressure detection device can also be installed on the gas outlet pipe 23 to detect the gas outlet pressure at the rear end of the vaporizer 21. If the gas outlet pressure is too low, the carrier gas pressure and carrier gas volume can be appropriately increased to increase the gas outlet pressure, ensure the positive transmission of fluid, and at the same time confirm the sealing of the pipe.

[0126] A third pressure detection device can also be installed on the residual gas discharge pipeline 137. The third pressure detection device is located between the inlet end of the third pressure detection device and the residual gas control valve 138, which can confirm the sealing of the pipeline.

[0127] A fourth pressure detection device can also be installed at the inlet of the vacuum pump to confirm whether the vacuum pump is operating normally and whether the pipeline is in a vacuum state.

[0128] It should also be noted that in the above embodiments, a vacuum pump is used to draw the gas in the pipeline away from the negative pressure and discharge it to the exhaust gas treatment device. However, this is not a limitation. Other devices such as air pumps and fans can also be used. Any device that can generate airflow and discharge the airflow to the exhaust gas treatment device is within the protection scope of this invention.

[0129] It is understood that the above embodiments are merely exemplary implementations used to illustrate the principles of the present invention, and the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.

Claims

1. A liquid-source vaporization system, applied to semiconductor process equipment, characterized in that, include: Vaporization device (20) is used to vaporize liquid process medium into gaseous process medium; Liquid source pipeline (10) is used to supply liquid process medium to the vaporization device (20); A purge line (40) is connected to the vaporization device (20) and is used to provide purge gas to the vaporization device (20); The first control unit (50) is used to control the connection between the purge pipeline (40) or the liquid source pipeline (10) and the vaporization device (20); The output pipeline (30) is used to transport the vaporized gaseous process medium to the process chamber of the semiconductor process equipment; The exhaust gas treatment pipeline (62) is connected to the vaporization device (20) and is used to transport the pollutants blown out of the vaporization device (20) by the purge gas to the exhaust gas treatment device (61). The second control unit (70) is used to control the connection between the exhaust gas treatment pipeline (62) or the output pipeline (30) and the vaporization device (20). The liquid source vaporization system has a working state, a first clean state, and a second clean state. In the operating state, the first control unit (50) controls the liquid source pipeline (10) to connect with the vaporization device (20), the second control unit (70) controls the output pipeline (30) to connect with the vaporization device (20), and the vaporization device (20) is connected with the carrier gas source; In the first cleaning state, the first control unit (50) controls the purge pipeline (40) to connect with the vaporization device (20), the second control unit (70) controls the exhaust gas treatment pipeline (62) to connect with the vaporization device (20), and the vaporization device (20) is disconnected from the carrier gas source; In the second clean state, the first control unit (50) controls the purge pipeline (40) to connect with the vaporization device (20), the second control unit (70) controls the exhaust gas treatment pipeline (62) to connect with the vaporization device (20), and the vaporization device (20) is connected with the carrier gas source.

2. The liquid source vaporization system according to claim 1, characterized in that, The vaporization device (20) includes: Vaporizer (21), the vaporizer (21) having a vaporization chamber for vaporizing the liquid process medium; The liquid inlet pipe (22) has an outlet end connected to the vaporization chamber and an inlet end connected to the outlet end of the liquid source pipe (10) and the outlet end of the purging pipe (40). The outlet pipe (23) is connected to the vaporization chamber at its inlet end and to the outlet end of the outlet pipe (23) at its outlet end, which is connected to the inlet end of the output pipe (30) and the exhaust gas treatment pipe (62) respectively.

3. The liquid source vaporization system according to claim 2, characterized in that, In the working state, the first control unit (50) controls the liquid source pipeline (10) to connect with the liquid inlet pipeline (22), and the second control unit (70) controls the output pipeline (30) to connect with the gas outlet pipeline (23); in the first cleaning state, the first control unit (50) controls the purging pipeline (40) to connect with the liquid inlet pipeline (22), and the second control unit (70) controls the exhaust gas treatment pipeline (62) to connect with the gas outlet pipeline (23).

4. The liquid source vaporization system according to claim 3, characterized in that, The first control unit (50) includes: The first control valve (51) is installed on the liquid source pipeline (10) and is used to control the opening and closing of the liquid source pipeline (10); A second control valve (52) is disposed on the purge line (40) and is used to control the opening and closing of the purge line (40); and The second control unit (70) includes: The third control valve (71) is installed on the output pipeline (30) and is used to control the opening and closing of the output pipeline (30); The fourth control valve (72) is installed on the exhaust gas treatment pipeline (62) and is used to control the opening and closing of the exhaust gas treatment pipeline (62); wherein In the operating state, the first control valve (51) is open, the second control valve (52) is closed, the third control valve (71) is open, and the fourth control valve (72) is closed; In the first cleaning state, the second control valve (52) is open, the first control valve (51) is closed, the fourth control valve (72) is open, and the third control valve (71) is closed.

5. The liquid source vaporization system according to claim 3, characterized in that, The vaporization device (20) further includes: The inlet end of the carrier gas pipeline (24) is used to connect with the carrier gas source, and the outlet end of the carrier gas pipeline (24) is connected with the vaporization chamber; Carrier gas control valve (25) is provided on the carrier gas pipeline (24) and is used to control the opening and closing of the carrier gas pipeline (24).

6. The liquid source vaporization system according to claim 5, characterized in that, In the operating state, the carrier gas control valve (25) is open; In the first clean state, the carrier gas control valve (25) is closed.

7. The liquid source vaporization system according to claim 5, characterized in that, In the second cleaning state, the first control unit (50) controls the purge pipeline (40) to connect with the liquid inlet pipeline (22), the second control unit (70) controls the outlet pipeline (23) to connect with the exhaust gas treatment pipeline (62), and the carrier gas control valve (25) is opened.

8. The liquid source vaporization system according to claim 2, characterized in that, The liquid source vaporization system also includes: The first flow meter (80) is installed on the liquid inlet pipe (22) and is used to control the flow rate of the liquid process medium. The first bypass pipe (90) has its inlet end connected to the liquid inlet pipe (22), and its inlet end is located between the first flow meter (80) and the vaporizer (21). The outlet end of the first bypass pipe (90) is connected to the exhaust gas treatment pipe (62). A bypass control unit (100) is used to control the first flow meter (80) to connect to the vaporization chamber or the first flow meter (80) to the first bypass pipeline (90).

9. The liquid source vaporization system according to claim 8, characterized in that, The liquid source vaporization system also has a third clean state; In the operating state, the first control unit (50) controls the liquid source pipeline (10) to connect with the liquid inlet pipeline (22), the bypass control unit (100) controls the first flow meter (80) to connect with the vaporization chamber, and the second control unit (70) controls the output pipeline (30) to connect with the gas outlet pipeline (23). In the third cleaning state, the first control unit (50) controls the purge line (40) to connect with the liquid inlet line (22), and the bypass control unit (100) controls the first flow meter (80) to connect with the first bypass line (90).

10. The liquid source vaporization system according to claim 5, characterized in that, The liquid source vaporization system also includes: The first flow meter (80) is installed on the liquid inlet pipe (22) and is used to calculate the flow rate of the liquid process medium. The second bypass pipeline (110) has its inlet end connected to the purge gas source and its outlet end connected to the liquid inlet pipeline (22). The outlet end of the second bypass pipeline (110) is located between the first flow meter (80) and the vaporization chamber. The fifth control valve (120) is used to control the opening and closing of the second bypass line (110).

11. The liquid source vaporization system according to claim 10, characterized in that, In the operating state, the first control unit (50) controls the liquid source pipeline (10) to connect with the vaporization device (20), the carrier gas control valve (25) is opened, and the fifth control valve (120) is closed; The liquid source vaporization system also has a fourth clean state; In the fourth cleaning state, the first control unit (50) controls the liquid source pipeline (10) and the purge pipeline (40) to disconnect from the vaporization device (20), the carrier gas control valve (25) and the fifth control valve (120) are opened, and the second control unit (70) controls the exhaust gas treatment pipeline (62) to connect with the vaporization device (20).

12. The liquid source vaporization system according to claim 4, characterized in that, The liquid source vaporization system also includes: A residual liquid collector (131) is used to recover residual liquid process media; The residual liquid recovery pipeline (132) has its outlet end connected to the residual liquid collector (131) and its inlet end connected to the liquid inlet pipeline (22). The sixth control valve (133) is installed on the residual liquid recovery pipeline (132) and is used to control the opening and closing of the residual liquid recovery pipeline (132); The vaporization device (20) further includes: The seventh control valve (26) is installed on the liquid inlet pipe (22). The seventh control valve (26) is located between the inlet end of the residual liquid recovery pipe (132) and the vaporizer (21) and is used to control the on / off connection between the vaporizer (21) and the liquid inlet pipe (22).

13. The liquid source vaporization system according to claim 12, characterized in that, The liquid source vaporization system also includes: The exhaust pipe (134) has an exhaust port, and the residual liquid collector (131) is connected to the exhaust gas treatment pipe (62) through the exhaust pipe (134). The eighth control valve (135) is disposed on the exhaust pipe (134) and is used to control the opening and closing of the exhaust pipe (134).

14. The liquid source vaporization system according to claim 13, characterized in that, In the operating mode of the liquid source vaporization system, the seventh control valve (26) is open and the sixth control valve (133) is closed; The liquid source vaporization system also includes a first residual liquid recovery state. In the first residual liquid recovery state, the first control unit (50) controls the purge pipeline (40) to connect with the vaporization device (20), the seventh control valve (26) is closed, and the sixth control valve (133) and the eighth control valve (135) are opened.

15. The liquid source vaporization system according to claim 13, characterized in that, The liquid source vaporization system also includes: The ninth control valve (136) is installed on the residual liquid recovery pipeline (132) and is located between the sixth control valve (133) and the outlet end of the residual liquid recovery pipeline (132). The purge branch (140) has its inlet end connected to the purge gas source and its outlet end connected to the residual liquid recovery pipeline (132). The outlet end of the purge branch (140) is located between the ninth control valve (136) and the sixth control valve (133). The tenth control valve (150) is disposed on the purge branch (140) and is used to control the on / off state of the purge branch (140).

16. The liquid source vaporization system according to claim 15, characterized in that, In the operating mode of the liquid source vaporization system, the sixth control valve (133) and the tenth control valve (150) are closed, and the seventh control valve (26) is open; The liquid source vaporization system also includes a second residual liquid recovery state. In the second residual liquid recovery state, the first control unit (50) controls the liquid source pipeline (10) and the purge pipeline (40) to disconnect from the vaporization device (20), the sixth control valve (133) is closed, and the tenth control valve (150), the ninth control valve (136), and the eighth control valve (135) are opened.

17. The liquid source vaporization system according to claim 16, characterized in that, The liquid source vaporization system also includes: The residual gas discharge pipeline (137) is connected to the residual liquid recovery pipeline (132) at its inlet end. The inlet end of the residual gas discharge pipeline (137) is located between the sixth control valve (133) and the ninth control valve (136). The outlet end of the residual gas discharge pipeline (137) is connected to the tail gas treatment pipeline (62). A residual gas control valve (138) is provided on the residual gas discharge pipeline (137) for controlling the opening and closing of the residual gas discharge pipeline (137).

18. The liquid source vaporization system according to claim 17, characterized in that, The liquid source vaporization system has a pipeline residual gas discharge state; When the pipeline is in the residual gas discharge state, the first control unit (50) controls the purge pipeline (40) to connect with the vaporization device (20), and the tenth control valve (150), the ninth control valve (136), and the seventh control valve (26) are closed; the sixth control valve (133) and the residual gas control valve (138) are opened.

19. The liquid source vaporization system according to claim 17, characterized in that, The vaporization device (20) further includes: Carrier gas pipeline (24), the inlet end of the carrier gas pipeline (24) is used to connect with the carrier gas source, and the outlet end of the carrier gas pipeline (24) is connected with the vaporization chamber; Carrier gas control valve (25), the carrier gas control valve (25) is disposed on the carrier gas pipeline (24), the carrier gas control valve (25) is used to control the opening and closing of the carrier gas pipeline (24); The first flow meter (80) is installed on the liquid inlet pipe (22) and is used to calculate the flow rate of the liquid process medium. The second bypass pipeline (110) has its inlet end connected to the purge gas source and its outlet end connected to the liquid inlet pipeline (22). The outlet end of the second bypass pipeline (110) is located between the first flow meter (80) and the vaporization chamber. The fifth control valve (120) is used to control the opening and closing of the second bypass line (110).

20. The liquid source vaporization system according to claim 19, characterized in that, In the stated operating state, the carrier gas control valve (25) is open, and the second control valve (52) and the fifth control valve (120) are closed; or In the first clean state, the seventh control valve (26) is open, and the carrier gas control valve (25), the fifth control valve (120), the sixth control valve (133), and the tenth control valve (150) are closed; or In the second cleaning state, the first control unit (50) controls the purge line (40) to connect with the liquid inlet line (22), the fifth control valve (120), the sixth control valve (133), and the tenth control valve (150) are closed, and the seventh control valve (26) is open; or The liquid source vaporization system also has a fourth clean state; In the fourth cleaning state, the first control unit (50) controls the liquid source pipeline (10) and the purge pipeline (40) to disconnect from the vaporization device (20), the tenth control valve (150) and the sixth control valve (133) are closed, the carrier gas control valve (25) and the fifth control valve (120) are opened, and the second control unit (70) controls the exhaust gas treatment pipeline (62) to connect to the vaporization device (20); or In the first residual liquid recovery state, the fifth control valve (120) and the tenth control valve (150) are closed; or In the second residual liquid recovery state, the fifth control valve (120) and the residual gas control valve (138) are closed; or When residual gas is discharged, the fifth control valve (120) is closed.

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