Wavefront shaping method, apparatus, computer device and storage medium
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHENZHEN UNIV
- Filing Date
- 2023-05-29
- Publication Date
- 2026-06-26
Smart Images
Figure CN116661135B_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of wavefront shaping technology, and in particular to a wavefront shaping method, apparatus, computer equipment, and storage medium. Background Technology
[0002] When a light beam passes through a scattering medium, due to the random distribution within the medium, different regions of the beam's wavefront will travel different distances during propagation. This is equivalent to each part of the wavefront having a random phase added, resulting in a speckle pattern in the output pattern. To eliminate this effect, a spatial light modulator can be placed in the optical path and a specific wavefront modulation distribution can be applied to perform wavefront shaping, thereby canceling or compensating for the random phase.
[0003] However, in existing technologies, the wavefront modulation distribution loaded onto a spatial light modulator is matched to a system with specific optical parameters. If the optical parameters change, the original wavefront modulation distribution loaded onto the spatial light modulator will no longer be applicable, causing the original shaping state to fail. Therefore, traditional wavefront shaping methods have low degrees of freedom and poor shaping effects. Summary of the Invention
[0004] Therefore, it is necessary to provide a wavefront shaping method, apparatus, computer equipment, storage medium, and computer program product to address the above problems.
[0005] Firstly, this application provides a wavefront shaping method. The method includes:
[0006] Obtain the optical parameters of the scattering system;
[0007] The corresponding scattering transfer function is determined from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures;
[0008] Output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information;
[0009] The output pattern information is processed based on the determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0010] In one embodiment, output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information, including:
[0011] The reference output pattern is obtained based on the reference wavefront modulation distribution and the determined scattering transfer function;
[0012] The reference output pattern is constrained according to the preset strength constraint conditions to obtain the output pattern information.
[0013] In one embodiment, the output pattern information is processed based on a determined scattering transfer function to obtain a wavefront modulation distribution, including:
[0014] Perform a Fourier transform on the given scattering transfer function to obtain the frequency domain scattering transfer function;
[0015] The intermediate wavefront modulation distribution is obtained based on the output pattern information and the frequency domain scattering transfer function.
[0016] By applying input surface constraints to the intermediate wavefront modulation distribution, the wavefront modulation distribution is obtained.
[0017] In one embodiment, the intermediate wavefront modulation distribution is constrained by the input surface to obtain the wavefront modulation distribution, including:
[0018] The intermediate wavefront modulation distribution is obtained by applying input surface constraints to the preset phase constraint conditions.
[0019] In one embodiment, after processing the output pattern information based on a determined scattering transfer function to obtain the wavefront modulation distribution, the method further includes:
[0020] The reference wavefront modulation distribution is updated using the wavefront modulation distribution, and the output surface constraint is returned on the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function.
[0021] Record the number of times it is updated;
[0022] If the number of updates reaches the preset number of iterations, the wavefront modulation distribution obtained in the last iteration will be used for wavefront shaping.
[0023] In one embodiment, the scattering transfer function includes at least one of a point spread function, an optical transfer function, and a transfer matrix of the scattering medium.
[0024] Secondly, this application also provides a wavefront shaping device. The device includes:
[0025] Optical parameter acquisition module, used to acquire the optical parameters of the scattering system;
[0026] The scattering transfer function selection module is used to determine the corresponding scattering transfer function from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures;
[0027] The output pattern calculation module is used to constrain the output surface of the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function, and obtain the output pattern information.
[0028] The wavefront modulation distribution calculation module is used to process the output pattern information based on a determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0029] Thirdly, this application also provides a computer device. The computer device includes a memory and a processor, the memory storing a computer program, and the processor executing the computer program to perform the following steps:
[0030] Obtain the optical parameters of the scattering system;
[0031] The corresponding scattering transfer function is determined from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures;
[0032] Output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information;
[0033] The output pattern information is processed based on the determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0034] Fourthly, this application also provides a computer-readable storage medium. The computer-readable storage medium stores a computer program thereon, which, when executed by a processor, performs the following steps:
[0035] Obtain the optical parameters of the scattering system;
[0036] The corresponding scattering transfer function is determined from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures;
[0037] Output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information;
[0038] The output pattern information is processed based on the determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0039] Fifthly, this application also provides a computer program product. The computer program product includes a computer program that, when executed by a processor, performs the following steps:
[0040] Obtain the optical parameters of the scattering system;
[0041] The corresponding scattering transfer function is determined from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures;
[0042] Output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information;
[0043] The output pattern information is processed based on the determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0044] The aforementioned wavefront shaping method, apparatus, computer equipment, storage medium, and computer program product acquire the optical parameters of the scattering system and determine the corresponding scattering transfer function from the propagation model based on these parameters. The propagation model includes scattering transfer functions corresponding to scattering systems of different structures, enabling the wavefront shaping method to match scattering systems with different structures and increasing the degrees of freedom in wavefront shaping. Furthermore, by constraining the output surface of the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function, output pattern information is obtained. Based on the determined scattering transfer function, the output pattern information is processed to obtain the wavefront modulation distribution, which is used for wavefront shaping. This improves the accuracy of the obtained wavefront modulation distribution and further ensures the wavefront shaping effect. In summary, this wavefront shaping method can not only match scattering systems with different structures but also guarantee the wavefront shaping effect. Attached Figure Description
[0045] Figure 1 This is a flowchart illustrating a wavefront shaping method in one embodiment;
[0046] Figure 2 This is a schematic diagram of the scattering principle before wavefront shaping in one embodiment;
[0047] Figure 3 This is a schematic diagram of the scattering principle after wavefront shaping in one embodiment;
[0048] Figure 4 This is a flowchart illustrating the wavefront shaping method in another embodiment;
[0049] Figure 5 This is a flowchart illustrating the wavefront shaping method in yet another embodiment;
[0050] Figure 6 This is a flowchart illustrating the wavefront shaping method in another embodiment;
[0051] Figure 7 This is a flowchart illustrating the wavefront shaping method in another embodiment;
[0052] Figure 8 This is a schematic diagram of the algorithm structure of the wavefront shaping method in one embodiment;
[0053] Figure 9This is a flowchart illustrating the iterative calculation of wavefront modulation distribution in one embodiment;
[0054] Figure 10 This is a schematic diagram of the structure for outputting pattern information in one embodiment;
[0055] Figure 11 This is a structural block diagram of a wavefront shaping device in one embodiment;
[0056] Figure 12 This is an internal structural diagram of a computer device in one embodiment. Detailed Implementation
[0057] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.
[0058] In one embodiment, such as Figure 1 As shown, a wavefront shaping method is provided, which can be executed by a controller connected to a spatial light modulator. The controller can send a wavefront modulation distribution to the spatial light modulator and control the spatial light modulator to perform wavefront shaping according to the wavefront modulation distribution. This embodiment illustrates the application of this method to a terminal. It is understood that this method can also be applied to a server, and can also be applied to a system including a terminal and a server, and implemented through the interaction between the terminal and the server.
[0059] In this embodiment, the method includes the following steps:
[0060] Step 102: Obtain the optical parameters of the scattering system.
[0061] The scattering system includes a spatial light modulator, a scattering medium, and an output surface. The spatial light modulator can also serve as the input surface. For example... Figure 2 As shown, when light waves propagate directly to a scattering medium, due to the random distribution within the medium, different regions of the wavefront travel different distances during propagation. This is equivalent to each part of the wavefront having a random phase, resulting in the light waves exhibiting a speckle pattern on the output surface after scattering by the scattering medium. However, as... Figure 3 As shown, when a light wave is transmitted to a scattering medium via a spatial light modulator, the modulator applies a specific wavefront modulation distribution to cancel or compensate for random phase. This wavefront modulation distribution causes the light wave to form a focused point or a specific pattern on the output surface. The process by which the spatial light modulator cancels or compensates for random phase by applying a specific wavefront modulation distribution, thus causing the light wave to form a focused point or a specific pattern on the output surface, can also be called wavefront shaping.
[0062] The optical parameters of a scattering system may include, but are not limited to, propagation distance, light wavelength, polarization, and incident angle. The propagation distance can include a first propagation distance and a second propagation distance. The first propagation distance can be the distance between the spatial light modulator and the scattering medium in the scattering system. The second propagation distance can be the distance between the scattering medium and the output surface.
[0063] Specifically, acquiring the optical parameters of a scattering system can include acquiring manually entered optical parameters or acquiring optical parameters sent from other detection devices. For example, when the detection device includes a diffraction distance detection device, the diffraction distance detection device can be used to measure the diffraction distance. In this case, the diffraction distance can be acquired as an optical parameter through the diffraction distance detection device.
[0064] Step 104: Determine the corresponding scattering transfer function from the propagation model based on the optical parameters.
[0065] The propagation model includes scattering transfer functions corresponding to scattering systems with different structures. Scattering systems with different structures can be understood as scattering systems with different optical parameters. The scattering transfer function can be used to describe the scattering characteristics of the scattering system. If the wavefront modulation distribution is known, the output pattern can be calculated based on the scattering transfer function and the known wavefront modulation distribution. Similarly, if the output pattern is known, the wavefront modulation distribution can also be calculated based on the scattering transfer function and the known output pattern. Specifically, after obtaining the optical parameters of the scattering system, a scattering transfer function matching the optical parameters is searched in the propagation model to obtain the scattering transfer function matching the current scattering system.
[0066] Step 106: Perform output surface constraints on the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information.
[0067] The reference wavefront modulation distribution can be a randomly generated function or a numerical value. A reference output pattern can be obtained based on the reference wavefront modulation distribution and the determined scattering transfer function. Output surface constraints are used to constrain the reference output pattern. Output surface constraints can include amplitude constraints, phase constraints, etc. The output pattern information can represent the pattern that the wavefront-shaped light wave may form on the output surface after scattering by the scattering medium, and can be specifically represented by a function.
[0068] Specifically, firstly, a function or numerical value is randomly generated and used as a reference wavefront modulation distribution. Then, a reference output pattern is obtained based on the reference wavefront modulation distribution and the determined scattering transfer function. Finally, output surface constraints are applied to the reference output pattern to obtain the output pattern information.
[0069] Step 108: Process the output pattern information based on the determined scattering transfer function to obtain the wavefront modulation distribution.
[0070] Among them, the wavefront modulation distribution can be used for wavefront shaping. The specific steps of wavefront shaping using the wavefront modulation distribution may include sending the wavefront modulation distribution to a spatial light modulator, and the spatial light modulator performing wavefront shaping according to the wavefront modulation distribution.
[0071] Processing the output pattern information based on a defined scattering transfer function can specifically include converting both the defined scattering transfer function and the output pattern information into data of the same type for calculation and analysis, thereby improving computational efficiency. For example, the defined scattering transfer function or the output pattern information can be converted into function or matrix form for analysis and calculation. Furthermore, when both the defined scattering transfer function and the output pattern information are functions, they can be converted to the same domain, such as the time domain or frequency domain, before analysis and calculation. Then, based on the defined scattering transfer function and the output pattern information, the final wavefront modulation distribution used for wavefront shaping can be obtained.
[0072] The wavefront shaping method in this embodiment acquires the optical parameters of the scattering system and determines the corresponding scattering transfer function from the propagation model based on these parameters. The propagation model includes scattering transfer functions corresponding to scattering systems with different structures, enabling the wavefront shaping method to match scattering systems of different structures and increasing the degrees of freedom in wavefront shaping. Furthermore, by constraining the output surface of the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function, output pattern information is obtained. This output pattern information is then processed based on the determined scattering transfer function to obtain the wavefront modulation distribution, which is used for wavefront shaping. This improves the accuracy of the obtained wavefront modulation distribution and further ensures the wavefront shaping effect. In summary, the wavefront shaping method in this embodiment can not only match scattering systems with different structures but also guarantee the wavefront shaping effect.
[0073] In one embodiment, such as Figure 4 As shown, step 106 includes steps 202 and 204.
[0074] Step 202: Obtain the reference output pattern based on the reference wavefront modulation distribution and the determined scattering transfer function.
[0075] Specifically, the reference wavefront modulation distribution can be a randomly generated function or a numerical value. A reference output pattern is obtained based on this reference wavefront modulation distribution and a determined scattering transfer function.
[0076] Step 204: Apply output surface constraints to the reference output pattern according to the preset strength constraint conditions to obtain the output pattern information.
[0077] Preset strength constraints can be used to constrain the strength of a reference output pattern, specifically by constraining the amplitude of the reference output pattern. These preset strength constraints can be set according to the desired output pattern, thereby making the output pattern information closer to, or identical to, the desired output pattern. The desired output pattern can be set by someone skilled in the art.
[0078] Specifically, the output pattern information can be calculated based on the reference output pattern and preset intensity constraints. This output pattern information can be used to adjust the wavefront modulation distribution.
[0079] In this embodiment, a reference output pattern is obtained by using the reference wavefront modulation distribution and the determined scattering transfer function. The output surface of the reference output pattern is then constrained according to the preset intensity constraint conditions to obtain the output pattern information. This ensures that the pattern formed on the output surface of the wavefront-shaped light wave after scattering by the scattering medium is close to or equal to the desired output pattern, thereby guaranteeing the shaping effect.
[0080] In one embodiment, such as Figure 5 As shown, step 108 includes steps 302, 304 and 306.
[0081] Step 302: Perform a Fourier transform on the determined scattering transfer function to obtain the frequency domain scattering transfer function.
[0082] When the determined scattering transfer function is a time-domain function, a Fourier transform can be performed on it to obtain the frequency-domain scattering transfer function, which can then be used for frequency-domain analysis. Similarly, if the output pattern information is also a time-domain function, a Fourier transform can be performed on it to obtain the frequency-domain output pattern information. Then, the intermediate wavefront modulation distribution is calculated based on the frequency-domain output pattern information and the frequency-domain scattering transfer function.
[0083] Step 304: Obtain the intermediate wavefront modulation distribution based on the output pattern information and the frequency domain scattering transfer function.
[0084] Specifically, when the output pattern information is in the frequency domain, multiplying the frequency domain output pattern information with the frequency domain scattering transfer function yields the frequency domain wavefront modulation distribution. This frequency domain wavefront modulation distribution can be used as an intermediate wavefront modulation distribution. Then, the wavefront modulation distribution can be obtained from the intermediate wavefront modulation distribution. For example, an inverse Fourier transform can be performed on the intermediate wavefront modulation distribution to obtain the time-domain wavefront modulation distribution, which can then be used as the wavefront modulation distribution.
[0085] Step 306: Apply input surface constraints to the intermediate wavefront modulation distribution to obtain the wavefront modulation distribution.
[0086] Input surface constraints can include amplitude constraints, phase constraints, etc. For example, when the input surface constraint is an amplitude constraint, applying an amplitude constraint to the intermediate wavefront modulation distribution can remove the amplitude of the intermediate wavefront modulation distribution.
[0087] Specifically, the intermediate wavefront modulation distribution is constrained by the input surface to obtain the wavefront modulation distribution. This wavefront modulation distribution is then sent to the spatial light modulator, which performs wavefront shaping based on the wavefront modulation distribution.
[0088] In this embodiment, by constraining the intermediate wavefront modulation distribution with an input surface, the accuracy of the wavefront modulation distribution can be improved, further ensuring the effect of wavefront shaping.
[0089] In one embodiment, such as Figure 6 As shown, step 306 includes step 402.
[0090] Step 402: Apply input surface constraints to the intermediate wavefront modulation distribution according to the preset phase constraint conditions to obtain the wavefront modulation distribution.
[0091] The preset phase constraint condition can be used to constrain the phase of the intermediate wavefront modulation distribution. Specifically, the preset phase constraint condition can include preserving the phase of the intermediate wavefront modulation distribution. Specifically, the intermediate wavefront modulation can be divided by the modulus of the intermediate wavefront modulation, thereby preserving the phase of the intermediate wavefront modulation while removing the amplitude.
[0092] In this embodiment, by constraining the intermediate wavefront modulation distribution with the input surface according to the preset phase constraint conditions, the wavefront modulation distribution is obtained. This allows the final wavefront modulation distribution to effectively cancel or compensate for the random phase of the wavefront, thereby ensuring the shaping effect.
[0093] In one embodiment, such as Figure 7 As shown, after step 108, the wavefront shaping method also includes steps 502, 504 and 506.
[0094] Step 502: Update the reference wavefront modulation distribution using the wavefront modulation distribution, and return to step 106.
[0095] Specifically, the step of updating the reference wavefront modulation distribution using the wavefront modulation distribution may include replacing the reference wavefront modulation distribution with the currently calculated wavefront modulation distribution to update the reference wavefront modulation distribution. After updating the reference wavefront modulation distribution, a reference output pattern can be obtained based on the updated reference wavefront modulation distribution and the determined scattering transfer function. An output surface constraint is then applied to the reference output pattern to obtain output pattern information. This output pattern information is then processed based on the determined scattering transfer function to obtain the wavefront modulation distribution. This process of updating and calculating the wavefront modulation distribution is then repeated until the iteration ends.
[0096] Step 504: Record the number of updates.
[0097] Specifically, each update of the reference wavefront modulation distribution increments the update count by one, completing one iteration. It is then determined whether the preset number of iterations has been reached. This preset number of iterations can be set by those skilled in the art according to actual needs. For example, the preset number of iterations can be set to 200.
[0098] Step 506: If the number of updates reaches the preset number of iterations, the wavefront modulation distribution obtained in the last iteration is used for wavefront shaping.
[0099] Specifically, when the number of updates reaches the preset number of iterations, the wavefront modulation distribution obtained last is used as the wavefront modulation distribution sent to the spatial light modulator for wavefront shaping. At this point, the iteration ends.
[0100] This embodiment continuously updates the wavefront modulation distribution through iterative calculation, which ensures that the final wavefront modulation distribution has high reliability and thus guarantees the effect of wavefront shaping.
[0101] In one embodiment, the scattering transfer function includes at least one of the point spread function, the optical transfer function, and the transfer matrix of the scattering medium.
[0102] The point spread function describes the response of the scattering system to the input light wave, specifically including point spread functions corresponding to scattering systems with different structures. The optical transfer function (OPF) is a function that characterizes the relative changes in modulation and lateral phase shift during the imaging process of the scattering system, with spatial frequency as the variable; specifically, it includes OPF corresponding to scattering systems with different structures. The transfer matrix of the scattering medium can be constructed based on various parameters of the scattering medium and is used to represent the scattering properties of the scattering medium; specifically, it includes the transfer matrix of the scattering medium corresponding to scattering systems with different structures.
[0103] Specifically, when the scattering transfer function includes at least one of a point spread function, an optical transfer function, and the transfer matrix of the scattering medium, determining the corresponding scattering transfer function from the propagation model based on optical parameters may involve first selecting the type of scattering transfer function, and then determining the specific scattering transfer function based on the optical parameters. For example, the type of scattering transfer function may be first selected as a point spread function, and then the specific point spread function may be determined based on the optical parameters.
[0104] In this embodiment, the scattering transfer function includes at least one of the point spread function, optical transfer function, and transfer matrix of the scattering medium. This expands the selection range of the scattering transfer function, thereby allowing for the selection of a more suitable scattering transfer function to calculate the wavefront modulation distribution. This achieves both increased freedom in wavefront shaping and ensures the shaping effect.
[0105] To facilitate a better understanding of the wavefront shaping method described above, a more detailed specific embodiment is provided below for explanation.
[0106] In one embodiment, a wavefront shaping method is provided, which constructs a propagation model by pre-calibrating the point spread function of the scattering system under different optical parameters (e.g., illumination source or diffraction distance). After the propagation model is constructed, the corresponding point spread function in the propagation model is determined by acquiring the optical parameters of the scattering system. Through repeated forward and backward propagation, and by introducing specific constraints on the input and output surfaces, the wavefront modulation distribution required by the spatial light modulator is finally calculated iteratively. A schematic diagram of the process is shown below. Figure 8 As shown. From Figure 8 As can be seen, the output surface constraint can include multiple desired output patterns 1-N, the propagation model can include multiple point spread functions 1-N corresponding to scattering systems with different structures, and the input surface constraint is a phase constraint. The calculated wavefront modulation distribution is sent to the spatial light modulator for wavefront shaping. The wavefront-shaped light wave is then transmitted to the scattering system to form a specific pattern.
[0107] In this embodiment, a wavefront design based on computational iteration is adopted to calculate the wavefront modulation distribution. The specific process is as follows: Figure 9 As shown, this includes obtaining the point spread function h(z) in advance under different wavelengths of illumination and different diffraction distances (image distances). j ,λ j), where z is the diffraction distance parameter and λ is the wavelength parameter. Simultaneously, preset output pattern information is included. This preset output pattern information can be multi-dimensional, meaning it includes multiple desired output patterns. With the participation of two known quantities—the point spread function and the preset output pattern information—the desired wavefront modulation distribution is finally obtained through iterative "forward-backward" propagation and spatial constraints. The output surface constraint is an intensity constraint, i.e., the amplitude is adjusted according to the preset output pattern information. The input surface (wavefront modulation plane) constraint is a phase constraint, i.e., the phase is retained while the amplitude is removed. Figure 9 FT and FT in -1 These represent the Fourier transform and the inverse Fourier transform, respectively.
[0108] In the first iteration, the wavefront modulation distribution m needs to be initialized. Initialization can specifically involve generating a random number to represent the wavefront modulation distribution m. Furthermore, in each iteration, the forward propagation process includes: (1) performing a Fourier transform on the wavefront modulation distribution m to obtain the frequency domain wavefront modulation distribution M; (2) performing a Fourier transform on the scattering transfer function h(z)... j ,λ j The frequency domain scattering transfer function H is obtained by performing a Fourier transform. j Then, multiplying it with the frequency domain wavefront modulation distribution M, we obtain the frequency domain reference output pattern P. j '。(3) For the frequency domain reference output pattern P j Perform an inverse Fourier transform to obtain the reference output pattern p. j '。(4) For the reference output pattern p j After applying output surface constraints, the output pattern information p is obtained. j Output pattern information p j The amplitude is the same as the amplitude of the preset output pattern information.
[0109] The backpropagation process includes: (1) processing the output pattern information p j Perform a Fourier transform to obtain the frequency domain output pattern information P j (2) Output pattern information P based on the frequency domain. j and frequency domain scattering transfer function H j (3) Obtain the frequency domain wavefront modulation distribution M; (4) Perform an inverse Fourier transform on the frequency domain wavefront modulation distribution M to obtain the intermediate wavefront modulation distribution m'; (5) Apply input surface constraints to the intermediate wavefront modulation distribution m', i.e., retain the phase of m', to obtain the wavefront modulation distribution m. In particular, the wavefront modulation distribution calculated after the previous iteration can be used as the wavefront modulation distribution for this iteration and participate in the forward propagation calculation.
[0110] Furthermore, such as Figure 10As shown, the wavefront shaping method in this embodiment can generate corresponding wavefront modulation distributions based on multiple scattering systems with different structures, and form multiple output pattern information on the output surface under the action of a spatial light modulator.
[0111] The wavefront shaping method in this embodiment improves the computational efficiency and degree of freedom of wavefront modulation by introducing point spread functions under different optical parameters and using them as the core function of the propagation model. This solves the problem that wavefront modulation cannot cope with multidimensional scattering information because it depends on fixed system parameters.
[0112] It should be understood that although the steps in the flowcharts of the embodiments described above are shown sequentially according to the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless explicitly stated herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some steps in the flowcharts of the embodiments described above may include multiple steps or multiple stages. These steps or stages are not necessarily completed at the same time, but can be executed at different times. The execution order of these steps or stages is not necessarily sequential, but can be performed alternately or in turn with other steps or at least some of the steps or stages of other steps.
[0113] Based on the same inventive concept, this application also provides a wavefront shaping apparatus for implementing the wavefront shaping method described above. The solution provided by this apparatus is similar to the implementation described in the above method; therefore, the specific limitations in one or more wavefront shaping apparatus embodiments provided below can be found in the limitations of the wavefront shaping method described above, and will not be repeated here.
[0114] In one embodiment, such as Figure 11 As shown, a wavefront shaping device 900 is provided, including: an optical parameter acquisition module 901, a scattering transfer function selection module 902, an output pattern calculation module 903, and a wavefront modulation distribution calculation module 904, wherein:
[0115] The optical parameter acquisition module 901 is used to acquire the optical parameters of the scattering system.
[0116] The scattering transfer function selection module 902 is used to determine the corresponding scattering transfer function from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures.
[0117] The output pattern calculation module 903 is used to perform output surface constraints on the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function, and obtain the output pattern information.
[0118] The wavefront modulation distribution calculation module 904 is used to process the output pattern information based on a determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0119] In one embodiment, the output pattern calculation module 903 includes a reference output pattern calculation unit and an output pattern information calculation unit, wherein:
[0120] The reference output pattern calculation unit is used to obtain the reference output pattern based on the reference wavefront modulation distribution and the determined scattering transfer function.
[0121] The output drawing information calculation unit is used to constrain the output surface of the reference output drawing according to the preset strength constraint conditions to obtain the output drawing information.
[0122] In one embodiment, the wavefront modulation distribution calculation module 904 includes a frequency domain scattering transfer function calculation unit, an intermediate wavefront modulation distribution calculation unit, and an input surface constraint unit, wherein:
[0123] The frequency domain scattering transfer function calculation unit is used to perform a Fourier transform on a given scattering transfer function to obtain the frequency domain scattering transfer function.
[0124] The intermediate wavefront modulation distribution calculation unit is used to obtain the intermediate wavefront modulation distribution based on the output pattern information and the frequency domain scattering transfer function.
[0125] The input surface constraint element is used to constrain the intermediate wavefront modulation distribution to obtain the wavefront modulation distribution.
[0126] In one embodiment, the input surface constraint unit is further used to perform input surface constraint on the intermediate wavefront modulation distribution according to a preset phase constraint condition to obtain the wavefront modulation distribution.
[0127] In one embodiment, the wavefront shaping device 900 further includes an iterative calculation module and an iterative recording module, wherein:
[0128] The iterative calculation module is used to update the reference wavefront modulation distribution using the wavefront modulation distribution and return the output surface constraint on the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function.
[0129] The iteration recording module is used to record the number of updates; if the number of updates reaches the preset number of iterations, the wavefront modulation distribution obtained in the last iteration will be used for wavefront shaping.
[0130] Each module in the aforementioned wavefront shaping device can be implemented entirely or partially through software, hardware, or a combination thereof. These modules can be embedded in the processor of a computer device in hardware form or independent of it, or stored in the memory of a computer device in software form, so that the processor can call and execute the operations corresponding to each module.
[0131] In one embodiment, a computer device is provided, which may be a terminal, and its internal structure diagram may be as follows: Figure 12 As shown, the computer device includes a processor, memory, communication interface, display screen, and input devices connected via a system bus. The processor provides computing and control capabilities. The memory includes non-volatile storage media and internal memory. The non-volatile storage media stores the operating system and computer programs. The internal memory provides an environment for the operation of the operating system and computer programs stored in the non-volatile storage media. The communication interface is used for wired or wireless communication with external terminals; wireless communication can be achieved through Wi-Fi, mobile cellular networks, NFC (Near Field Communication), or other technologies. When executed by the processor, the computer program implements a wavefront shaping method. The display screen can be an LCD screen or an e-ink display screen. The input devices can be a touch layer covering the display screen, buttons, a trackball, or a touchpad mounted on the computer device casing, or an external keyboard, touchpad, or mouse.
[0132] Those skilled in the art will understand that Figure 12 The structure shown is merely a block diagram of a portion of the structure related to the present application and does not constitute a limitation on the computer device to which the present application is applied. Specific computer devices may include more or fewer components than those shown in the figure, or combine certain components, or have different component arrangements.
[0133] In one embodiment, a computer device is provided, including a memory and a processor, wherein the memory stores a computer program, and the processor executes the computer program to perform the following steps:
[0134] Obtain the optical parameters of the scattering system;
[0135] The corresponding scattering transfer function is determined from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures;
[0136] Output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information;
[0137] The output pattern information is processed based on the determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0138] In one embodiment, the processor, when executing a computer program, also performs the following steps:
[0139] The reference output pattern is obtained based on the reference wavefront modulation distribution and the determined scattering transfer function;
[0140] The reference output pattern is constrained according to the preset strength constraint conditions to obtain the output pattern information.
[0141] In one embodiment, the processor, when executing a computer program, also performs the following steps:
[0142] Perform a Fourier transform on the given scattering transfer function to obtain the frequency domain scattering transfer function;
[0143] The intermediate wavefront modulation distribution is obtained based on the output pattern information and the frequency domain scattering transfer function.
[0144] By applying input surface constraints to the intermediate wavefront modulation distribution, the wavefront modulation distribution is obtained.
[0145] In one embodiment, the processor, when executing a computer program, also performs the following steps:
[0146] The reference output pattern is constrained on the output surface according to the preset phase constraint conditions to obtain the output pattern information.
[0147] In one embodiment, the processor, when executing a computer program, also performs the following steps:
[0148] The reference wavefront modulation distribution is updated using the wavefront modulation distribution, and the output surface constraint is returned on the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function.
[0149] Record the number of times it is updated;
[0150] If the number of updates reaches the preset number of iterations, the wavefront modulation distribution obtained in the last iteration will be used for wavefront shaping.
[0151] In one embodiment, a computer-readable storage medium is provided having a computer program stored thereon, the computer program performing the following steps when executed by a processor:
[0152] Obtain the optical parameters of the scattering system;
[0153] The corresponding scattering transfer function is determined from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures;
[0154] Output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information;
[0155] The output pattern information is processed based on the determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0156] In one embodiment, when the computer program is executed by a processor, it further performs the following steps:
[0157] The reference output pattern is obtained based on the reference wavefront modulation distribution and the determined scattering transfer function;
[0158] The reference output pattern is constrained according to the preset strength constraint conditions to obtain the output pattern information.
[0159] In one embodiment, when the computer program is executed by a processor, it further performs the following steps:
[0160] Perform a Fourier transform on the given scattering transfer function to obtain the frequency domain scattering transfer function;
[0161] The intermediate wavefront modulation distribution is obtained based on the output pattern information and the frequency domain scattering transfer function.
[0162] By applying input surface constraints to the intermediate wavefront modulation distribution, the wavefront modulation distribution is obtained.
[0163] In one embodiment, when the computer program is executed by a processor, it further performs the following steps:
[0164] The reference output pattern is constrained on the output surface according to the preset phase constraint conditions to obtain the output pattern information.
[0165] In one embodiment, when the computer program is executed by a processor, it further performs the following steps:
[0166] The reference wavefront modulation distribution is updated using the wavefront modulation distribution, and the output surface constraint is returned on the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function.
[0167] Record the number of times it is updated;
[0168] If the number of updates reaches the preset number of iterations, the wavefront modulation distribution obtained in the last iteration will be used for wavefront shaping.
[0169] In one embodiment, a computer program product is provided, including a computer program that, when executed by a processor, performs the following steps:
[0170] Obtain the optical parameters of the scattering system;
[0171] The corresponding scattering transfer function is determined from the propagation model based on optical parameters; the propagation model includes scattering transfer functions corresponding to scattering systems with different structures;
[0172] Output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information;
[0173] The output pattern information is processed based on the determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
[0174] In one embodiment, when the computer program is executed by a processor, it also performs the following steps:
[0175] The reference output pattern is obtained based on the reference wavefront modulation distribution and the determined scattering transfer function;
[0176] The reference output pattern is constrained according to the preset strength constraint conditions to obtain the output pattern information.
[0177] In one embodiment, when the computer program is executed by a processor, it also performs the following steps:
[0178] Perform a Fourier transform on the given scattering transfer function to obtain the frequency domain scattering transfer function;
[0179] The intermediate wavefront modulation distribution is obtained based on the output pattern information and the frequency domain scattering transfer function.
[0180] By applying input surface constraints to the intermediate wavefront modulation distribution, the wavefront modulation distribution is obtained.
[0181] In one embodiment, when the computer program is executed by a processor, it also performs the following steps:
[0182] The reference output pattern is constrained according to the preset phase constraint conditions to obtain the output pattern information.
[0183] In one embodiment, when the computer program is executed by a processor, it also performs the following steps:
[0184] The reference wavefront modulation distribution is updated using the wavefront modulation distribution, and the output surface constraint is returned on the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function.
[0185] Record the number of times it is updated;
[0186] If the number of updates reaches the preset number of iterations, the wavefront modulation distribution obtained in the last iteration will be used for wavefront shaping.
[0187] Those skilled in the art will understand that all or part of the processes in the methods of the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium, and when executed, it can include the processes of the embodiments of the above methods. Any references to memory, databases, or other media used in the embodiments provided in this application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory can include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can take many forms, such as Static Random Access Memory (SRAM) or Dynamic Random Access Memory (DRAM). The databases involved in the embodiments provided in this application may include at least one type of relational database and non-relational database. Non-relational databases may include, but are not limited to, blockchain-based distributed databases. The processors involved in the embodiments provided in this application may be general-purpose processors, central processing units, graphics processing units, digital signal processors, programmable logic devices, quantum computing-based data processing logic devices, etc., and are not limited to these.
[0188] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0189] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.
Claims
1. A wavefront shaping method, characterized in that, The method includes: Obtain the optical parameters of the scattering system; The propagation model is searched for a scattering transfer function that matches the optical parameters; the propagation model is pre-calibrated with scattering transfer functions that match the optical parameters of scattering systems with different structures; Output surface constraints are applied to the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information; The output pattern information is processed based on the determined scattering transfer function to obtain a wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
2. The wavefront shaping method according to claim 1, characterized in that, The step of constraining the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function to obtain output pattern information includes: A reference output pattern is obtained based on the reference wavefront modulation distribution and the determined scattering transfer function; The reference output pattern is constrained on the output surface according to the preset strength constraint conditions to obtain the output pattern information.
3. The wavefront shaping method according to claim 1, characterized in that, The process of processing the output pattern information based on the determined scattering transfer function to obtain the wavefront modulation distribution includes: Perform a Fourier transform on the determined scattering transfer function to obtain the frequency domain scattering transfer function; The intermediate wavefront modulation distribution is obtained based on the output pattern information and the frequency domain scattering transfer function. The intermediate wavefront modulation distribution is constrained by the input surface to obtain the wavefront modulation distribution.
4. The wavefront shaping method according to claim 3, characterized in that, The step of applying input surface constraints to the intermediate wavefront modulation distribution to obtain the wavefront modulation distribution includes: The intermediate wavefront modulation distribution is subjected to input surface constraints according to preset phase constraints to obtain the wavefront modulation distribution.
5. The wavefront shaping method according to claim 1, characterized in that, After processing the output pattern information based on the determined scattering transfer function to obtain the wavefront modulation distribution, the process further includes: The reference wavefront modulation distribution is updated using the wavefront modulation distribution, and the output surface constraint is returned on the reference output pattern obtained based on the reference wavefront modulation distribution and the determined scattering transfer function. Record the number of times it is updated; If the number of updates reaches the preset number of iterations, the wavefront modulation distribution obtained in the last iteration will be used for wavefront shaping.
6. The wavefront shaping method according to claim 1, characterized in that, The scattering transfer function includes at least one of the point spread function, optical transfer function, and transfer matrix of the scattering medium.
7. A wavefront shaping device, characterized in that, The device includes: Optical parameter acquisition module, used to acquire the optical parameters of the scattering system; The scattering transfer function selection module is used to search for a scattering transfer function that matches the optical parameters from the propagation model; the propagation model is pre-calibrated with scattering transfer functions that match the optical parameters of scattering systems with different structures; The output pattern calculation module is used to constrain the output surface of the reference output pattern obtained from the reference wavefront modulation distribution and the determined scattering transfer function, and obtain the output pattern information. The wavefront modulation distribution calculation module is used to process the output pattern information based on the determined scattering transfer function to obtain the wavefront modulation distribution; the wavefront modulation distribution is used for wavefront shaping.
8. A computer device comprising a memory and a processor, wherein the memory stores a computer program, characterized in that, When the processor executes the computer program, it implements the steps of the method according to any one of claims 1 to 6.
9. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by a processor, it implements the steps of the method according to any one of claims 1 to 6.
10. A computer program product, comprising a computer program, characterized in that, When the computer program is executed by a processor, it implements the steps of the method according to any one of claims 1 to 6.