Preparation methods, systems, electronic equipment, and dielectrics for non-oriented silicon steel ultrathin strips

Abstract

This invention discloses a method, system, electronic equipment, and medium for preparing ultra-thin non-oriented silicon steel strip, relating to the field of strip rolling technology. The method includes performing multi-pass asynchronous cold rolling on non-oriented silicon steel strip until the strip reaches a target thickness, resulting in ultra-thin non-oriented silicon steel strip of the target thickness after rolling. During the multi-pass asynchronous cold rolling process, annealing is not required, and the speed ratio and pre-tension of each pass meet set conditions, satisfying either a first condition or a second condition. The first condition is that the entire rolling deformation zone of each pass is a rubbing zone; the second condition is that the forward slip zone disappears within the rolling deformation zone of each pass, and the deformation zone consists of a rubbing zone and a backward slip zone. The ultra-thin non-oriented silicon steel strip of the target thickness after rolling is degreased and then bright annealed in a continuous annealing furnace to obtain the ultra-thin non-oriented silicon steel strip. This invention can prepare ultra-thin non-oriented silicon steel strip with high magnetic induction, low iron loss, and high strength.

Description

Technical Field

[0001] This invention relates to the field of strip rolling technology, and in particular to a method, system, electronic device and medium for preparing ultra-thin non-oriented silicon steel strip. Background Technology

[0002] Emerging industries such as new energy vehicles and intelligent robots require non-oriented silicon steel with thinner thickness, higher magnetic induction intensity, lower iron loss at medium and high frequencies, and higher strength to adapt to the development of motors towards lightweight, miniaturized, efficient, and high-speed operation. Reducing the thickness of silicon steel strip is one of the most effective means to reduce iron loss of non-oriented silicon steel under medium and high frequency conditions. However, in existing non-oriented silicon steel manufacturing methods, when the silicon steel strip is thinned to a certain thickness (0.1 mm), to achieve high magnetic induction intensity, its grain size cannot be too small and must have an appropriate size. This reduces the number of grain layers in the thickness direction of the non-oriented silicon steel strip, and may even result in many monolayer crystals, leading to a decrease in the strength of the silicon steel strip. Therefore, a processing and manufacturing technology is needed to enable ultra-thin non-oriented silicon steel strips to possess high magnetic induction, low iron loss, and high strength. Summary of the Invention

[0003] The purpose of this invention is to provide a method, system, electronic device and medium for preparing non-oriented silicon steel ultrathin strips, which can prepare non-oriented silicon steel ultrathin strips with high magnetic induction, low iron loss and high strength.

[0004] To achieve the above objectives, the present invention provides the following solution:

[0005] A method for preparing an ultrathin non-oriented silicon steel strip, comprising:

[0006] Non-oriented silicon steel strip is subjected to multi-pass asynchronous cold rolling until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling. Annealing is not required during the multi-pass asynchronous cold rolling process, and the speed ratio and pre-tension of each pass meet set conditions to satisfy either the first condition or the second condition. The first condition is that the entire rolling deformation zone of each pass is a rubbing zone, and the second condition is that the forward sliding zone disappears in the rolling deformation zone of each pass, and the deformation zone consists of a rubbing zone and a backward sliding zone. The non-oriented silicon steel strip in the first pass of asynchronous cold rolling is an annealed non-oriented silicon steel strip, and the non-oriented silicon steel strip in the nth pass of asynchronous cold rolling is the non-oriented silicon steel strip obtained after the (n-1)th pass of asynchronous cold rolling, where n is a positive integer greater than 1.

[0007] The non-oriented silicon steel ultra-thin strip of the target thickness after rolling is degreased and then bright annealed in a continuous annealing furnace to obtain the non-oriented silicon steel ultra-thin strip.

[0008] Optionally, the step of performing multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a post-rolled target thickness ultra-thin non-oriented silicon steel strip specifically includes:

[0009] Based on the work hardening curve of the annealed non-oriented silicon steel strip and the reduction rate of each pass, the average planar deformation resistance of the non-oriented silicon steel strip in the deformation zone of each pass is determined; in the multi-pass asynchronous cold rolling process, the reduction rate of each pass is less than 15%, and the total reduction rate of all passes is between 80% and 98%.

[0010] For any given pass, the maximum permissible tension and the expected post-tension of the pass are determined based on the average planar deformation resistance of the non-oriented silicon steel strip within the deformation zone of that pass.

[0011] The critical pre-tension is calculated based on the expected post-tension of the pass, so that the entire rolling deformation zone of the pass is a rolling zone.

[0012] If the critical pre-tension of the rolling deformation zone of the specified pass being entirely a tumbling zone is less than the maximum permissible engineering tension of the specified pass, then the range of values ​​for the rate ratio of the specified pass satisfies the formula i ≥ i c2 Furthermore, the range of values ​​for the pretension in the aforementioned passes satisfies the formula σ. f ≥σ fc Where i represents the velocity ratio of the said track, i c2 σ represents the critical velocity ratio that makes the entire rolling deformation zone of the specified pass a rolling zone. f σ represents the pretension of the specified pass. fc This indicates the critical pretension that makes the entire rolling deformation zone of the aforementioned pass a rolling zone;

[0013] If the critical pre-tension of the rolling deformation zone of the specified pass being entirely a tumbling zone is greater than or equal to the maximum permissible engineering tension of the specified pass, then the range of the velocity ratio of the specified pass satisfies the formula i ≥ i c1 Furthermore, the range of values ​​for the pretension in the aforementioned passes satisfies the formula σ. f <σ max , where i c1 σ represents the critical velocity ratio that causes the forward slip zone to disappear within the rolling deformation zone of the specified pass, and the deformation zone to consist of a rolling zone and a backward slip zone. max This indicates the maximum permissible tension for the specified track.

[0014] The non-oriented silicon steel strip is subjected to multi-pass asynchronous cold rolling based on the expected back tension, the range of different speed ratios, and the range of front tension for each pass, until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling.

[0015] Optionally, the process for determining the critical rate ratio that makes the entire rolling deformation zone of the aforementioned pass a rolling zone is as follows:

[0016] According to the formula Calculate the critical speed ratio that makes the entire rolling deformation zone of the pass a rolling zone. Here, H represents the thickness of the non-oriented silicon steel strip before the pass, h represents the thickness of the non-oriented silicon steel strip after the pass, R1 represents the radius of the first work roll, R2 represents the radius of the second work roll, and ε represents the reduction rate of the non-oriented silicon steel strip in the pass.

[0017] Optionally, the process for determining the critical pre-tension that makes the entire rolling deformation zone of the pass a rolling zone based on the expected post-tension of the pass is as follows:

[0018] According to the formula Calculate the critical pre-tension that makes the entire rolling deformation zone of the stated pass a rolling zone, where σ b δ2 represents the expected back tension of the pass, K represents the average planar deformation resistance of the non-oriented silicon steel strip in the deformation zone of the pass.

[0019] Optionally, the process for determining the critical velocity ratio that makes the forward slip zone disappear in the rolling deformation zone of the aforementioned pass and the deformation zone consist of the rolling zone and the backward slip zone is as follows:

[0020] According to the formula Calculate the critical speed ratio that makes the forward slip zone disappear in the rolling deformation zone of the pass and the deformation zone consist of the rolling zone and the backward slip zone, where h2 represents the thickness of the non-oriented silicon steel strip at the neutral point of the fast roll in the deformation zone of the pass.

[0021] Optionally, when performing bright annealing in a continuous annealing furnace, the annealing temperature is 750℃~950℃ and the holding time is 30s~600s.

[0022] A system for fabricating non-oriented silicon steel ultrathin strips, comprising:

[0023] A multi-pass asynchronous cold rolling module is used to perform multi-pass asynchronous cold rolling on non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling. Annealing is not required during the multi-pass asynchronous cold rolling process, and the speed ratio and pre-tension of each pass meet set conditions to satisfy either a first condition or a second condition. The first condition is that the entire rolling deformation zone of each pass is a rubbing zone, and the second condition is that the forward sliding zone disappears in the rolling deformation zone of each pass, and the deformation zone consists of a rubbing zone and a backward sliding zone. The non-oriented silicon steel strip in the first pass of asynchronous cold rolling is an annealed non-oriented silicon steel strip, and the non-oriented silicon steel strip in the nth pass of asynchronous cold rolling is the non-oriented silicon steel strip obtained after the (n-1)th pass of asynchronous cold rolling, where n is a positive integer greater than 1.

[0024] The annealing module is used to degrease the rolled non-oriented silicon steel ultra-thin strip of target thickness and then perform bright annealing in a continuous annealing furnace to obtain the non-oriented silicon steel ultra-thin strip.

[0025] An electronic device, comprising:

[0026] The electronic device includes a memory for storing a computer program and a processor for running the computer program to enable the electronic device to perform the above-described method for preparing non-oriented silicon steel ultrathin strips.

[0027] A computer-readable storage medium storing a computer program that, when executed by a processor, implements the above-described method for preparing non-oriented silicon steel ultrathin strips.

[0028] According to specific embodiments provided by the present invention, the present invention discloses the following technical effects:

[0029] This invention eliminates the need for intermediate annealing during asynchronous rolling, allowing annealed non-oriented silicon steel strips to be rolled thinner and achieving low iron loss. By controlling the speed ratio and front tension, the deformation zone is placed in the full rolling or rolling and back sliding zones, which can improve the favorable texture strength, thereby improving the magnetic induction and achieving high magnetic induction. Combined with annealing heat treatment, it improves the grain size distribution of the rolled piece and achieves high strength. Attached Figure Description

[0030] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0031] Figure 1 A flowchart illustrating a method for preparing an ultrathin non-oriented silicon steel strip according to an embodiment of the present invention;

[0032] Figure 2 This is a schematic diagram of an existing four-roll reversible asynchronous cold rolling mill. Detailed Implementation

[0033] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0034] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0035] This invention provides a method for preparing ultra-thin non-oriented silicon steel strip, comprising the following main steps: Step 1: using annealed ultra-thin non-oriented silicon steel strip with a smooth surface and no insulating coating as the substrate; Step 2: thinning the substrate to a target thickness (0.01 mm to 0.1 mm) through multiple passes of asynchronous cold rolling, without the need for annealing during the thinning process; Step 3: degreasing the ultra-thin non-oriented silicon steel strip of the target thickness after rolling, followed by continuous annealing. During the asynchronous rolling thinning process, the rolling parameters for each pass must meet corresponding conditions to improve the strength of favorable textures in the microstructure, and the annealing process improves the grain size distribution of the ultra-thin non-oriented silicon steel strip, enabling the ultra-thin non-oriented silicon steel strip to achieve a balance of high magnetic induction, low iron loss, and high strength. Figure 1 As shown, the specific steps are as follows:

[0036] Step 101: Perform multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling; no annealing is required during the multi-pass asynchronous cold rolling process, and the speed ratio and front tension of each pass meet the set conditions to satisfy either the first condition or the second condition; the first condition is to make the rolling deformation zone of each pass entirely a rubbing zone, and the second condition is to make the front sliding zone of each pass disappear and the deformation zone consists of a rubbing zone and a back sliding zone; the non-oriented silicon steel strip in the first pass of asynchronous cold rolling is an annealed non-oriented silicon steel strip, and the non-oriented silicon steel strip in the nth pass of asynchronous cold rolling is the non-oriented silicon steel strip obtained after the (n-1)th pass of asynchronous cold rolling, where n is a positive integer greater than 1.

[0037] Step 102: The non-oriented silicon steel ultra-thin strip of the target thickness after rolling is degreased and then bright annealed in a continuous annealing furnace to obtain the non-oriented silicon steel ultra-thin strip.

[0038] In practical applications, when performing multi-pass asynchronous cold rolling on non-oriented silicon steel strip, the upper and lower work rolls of the mill are driven independently, and the speed ratio is continuously adjustable between 1 and 1.5. The mill is a reversible mill. During the multi-pass rolling thinning process, the rolling direction changes once after each pass, and the fast roll of the previous pass becomes the slow roll of the next pass, and the slow roll of the previous pass becomes the fast roll of the next pass.

[0039] In practical applications, the process of performing multi-pass asynchronous cold rolling on non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a post-rolled target thickness ultra-thin non-oriented silicon steel strip specifically includes:

[0040] Based on the work hardening curve of the annealed non-oriented silicon steel strip and the reduction rate of each pass, the average planar deformation resistance of the non-oriented silicon steel strip in the deformation zone of each pass is determined, wherein the reduction rate of each pass is less than 15%, and the total reduction rate is 80-98%.

[0041] For any given pass, the maximum permissible tension σ of that pass is determined based on the average planar deformation resistance of the non-oriented silicon steel strip within the deformation zone of that pass. max and the expected aftertension σ of the said pass b σ max The maximum permissible tension in engineering, measured in MPa, is set to prevent production accidents such as belt breakage. It is calculated using the formula... Calculated.

[0042] Based on the expected back tension of the aforementioned pass, the critical pre-tension σ that makes the entire rolling deformation zone of the aforementioned pass a tumbling zone is calculated. fc .

[0043] If the critical pre-tension of the rolling deformation zone of the specified pass being entirely a tumbling zone is less than the maximum permissible tension of the specified pass, then the range of values ​​for the rate ratio i of the specified pass satisfies the formula i ≥ i c2 And the pretension σ of the aforementioned pass f The range of values ​​for σ satisfies the formula. f ≥σ fc In this case, the first condition is met when the entire deformation zone of each rolling pass is a rubbing zone, where i represents the speed ratio of the passing pass, i.e., the ratio of the linear speeds of the fast and slow work rolls of the rolling mill. c2 σ represents the critical velocity ratio that makes the entire rolling deformation zone of the specified pass a rolling zone. f The preceding tension of the specified pass is expressed in MPa, σ. fc The critical pretension, expressed in MPa, is the tension that makes the entire rolling deformation zone of the specified pass a rolling zone.

[0044] If the critical pre-tension of the rolling deformation zone of the specified pass being entirely a tumbling zone is greater than or equal to the maximum permissible engineering tension of the specified pass, then the range of the velocity ratio of the specified pass satisfies the formula i ≥ i c1 Furthermore, the range of values ​​for the pretension in the aforementioned passes satisfies the formula σ. f <σ max In this case, the forward slip zone disappears within the rolling deformation zone and the deformation zone consists of the rolling zone and the backward slip zone, thus satisfying the second condition, where i c1 σ represents the critical velocity ratio that causes the forward slip zone to disappear within the rolling deformation zone of the specified pass, and the deformation zone to consist of a rolling zone and a backward slip zone. max This indicates the maximum permissible tension for the specified track.

[0045] The non-oriented silicon steel strip is subjected to multi-pass asynchronous cold rolling based on the expected back tension, the range of different speed ratios, and the range of front tension for each pass, until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling.

[0046] In practical applications, the process for determining the expected back tension is as follows:

[0047] According to the formula Calculate the expected back tension.

[0048] In practical applications, the process for determining the critical velocity ratio that ensures the entire rolling deformation zone of the specified pass is a rolling zone is as follows:

[0049] According to the formula Calculate the critical velocity ratio that makes the entire rolling deformation zone of the pass a rolling zone of tumbling, where H represents the thickness of the non-oriented silicon steel strip before rolling in the pass, in millimeters; h represents the thickness of the non-oriented silicon steel strip after rolling in the pass, in millimeters; R1 represents the radius of the first work roll (the radius of the fast roll of the mill), in millimeters; R2 represents the radius of the second work roll (the radius of the slow roll of the mill), in millimeters; ε represents the reduction rate of the non-oriented silicon steel strip in the pass; V1 is the linear velocity of the fast roll of the mill, in m / min; and V2 is the linear velocity of the slow roll of the mill, in m / min.

[0050] In practical applications, the process of determining the critical pre-tension that makes the entire rolling deformation zone of the pass a rolling zone based on the expected post-tension of the pass is as follows:

[0051] According to the formula Calculate the critical pre-tension that makes the entire rolling deformation zone of the stated pass a rolling zone, where σ b The expected back tension for the specified pass is expressed in MPa, and δ2 represents an intermediate variable. f is the coefficient of friction between the upper and lower surfaces of the workpiece and the work roll; l is the contact arc length of the deformation zone in this pass, which takes into account the elastic flattening of the roll during the calculation; K represents the average planar deformation resistance of the non-oriented silicon steel strip in the deformation zone of the pass, in MPa.

[0052] In practical applications, the process for determining the critical velocity ratio that makes the forward slip zone disappear in the rolling deformation zone of the specified pass and the deformation zone consist of the rolling zone and the backward slip zone is as follows:

[0053] According to the formula Calculate the critical speed ratio that makes the forward slip zone disappear in the rolling deformation zone of the pass and the deformation zone consist of the rolling zone and the backward slip zone, where h2 represents the thickness of the non-oriented silicon steel strip at the neutral point of the fast roll in the deformation zone of the pass, in millimeters.

[0054] In practical applications, when performing bright annealing in a continuous annealing furnace, the annealing temperature is 750℃~950℃ and the holding time is 30s~600s.

[0055] This invention provides a more specific embodiment to describe the above method in detail:

[0056] use Figure 2 The four-roll reversible asynchronous cold rolling mill shown is used to prepare non-oriented silicon steel ultra-thin strips. Each of its work rolls is driven independently, and the speed ratio i is continuously adjustable within the range of 1 to 1.5. The radius of work roll 1 R1 and the radius of work roll 2 R2 are both 50 mm. The rolling process is lubricated with special rolling fluid for silicon steel, with a concentration of 3% to 5% and a friction coefficient f of 0.04 to 0.1.

[0057] Step 1: Using a non-oriented silicon steel strip with a thickness H = 0.5 mm and a width of 180 mm and a smooth surface without insulating coating as the rolling substrate, the work hardening curve of the rolling substrate is obtained through tensile testing. The average planar deformation resistance K of the substrate under different reduction rates can be calculated based on the work hardening curve using existing methods.

[0058] Step 2: Set the target thickness h of the rolled piece in this pass. The reduction rate of the pass must be less than 15%. Obtain the average planar deformation resistance K of the rolled piece in this pass through the work hardening curve (it will change in each pass. Just test the raw material to obtain the work hardening curve, and then substitute it into the calculation according to the reduction rate of each pass). Determine the maximum allowable tension σ of this pass from the average planar deformation resistance K and formula (1). max The expected back tension σ of the rolled piece in this pass is set according to formula (2). b .

[0059] Given the workpiece thickness H before rolling, thickness h after rolling, radius R1 of work roll 1, radius R2 of work roll 2, coefficient of friction f, average planar deformation resistance K of this pass, and back tension σ. b Substituting into formulas (3) and (4), the critical speed ratio i required for this rolling pass is calculated. c2 and critical pretension σ fc .

[0060] If the critical pretension σ of this pass fc <σ max If the speed ratio i ≥ i is selected for this course, then... c2 and the pretension σ f ≥σ fc If the critical pretension σ of this pass fc ≥σ max Then, i is calculated according to formula (5) for that pass. c1 And select the allotropic ratio i≥i c1 and the pretension σ f <σmax .

[0061] In the specific implementation process described below, the critical pre-tension σ of the pass is used. fc <σ max Let's take an example to illustrate.

[0062] The rolled piece is placed on the uncoiler, passes through the roll gap formed by the work roll 1 and the work roll 2 via the guide roller 1, and is then pulled out via the guide roller 2 and wound onto the winding machine. The winding machine and the uncoiler are rotated to initially tension the rolled piece.

[0063] Rolling reduction is achieved by applying rolling force to the work rolls through a pressing device, and the expected back tension σ is applied to the workpiece through an uncoiler. b The pre-tension σ is applied to the rolled piece by the winding machine. f ≥σ fc .

[0064] Start the drive motor to begin rolling, ensuring that the ratio of the linear speed V1 of work roll 1 to the linear speed V2 of work roll 2 is i = V1 / V2 ≥ i c2 The thickness of the rolled piece at the exit is monitored by a thickness gauge, and the pressing device is adjusted to make the thickness of the rolled piece after rolling reach the target value h.

[0065] When a roll of workpiece is about to be rolled out, reduce the speed of the drive motor until the machine stops. Use a thickness gauge to check if it is the final rolling pass. If it is not the final rolling pass, reverse the drive motor, change work roll 1 from a fast roll to a slow roll, and change work roll 2 from a slow roll to a fast roll. The uncoiler becomes a coiler to apply front tension, and the coiler becomes an uncoiler to apply back tension. The thickness of the workpiece after the previous rolling pass becomes the thickness before the next rolling pass. Repeat step 2 and adjust the corresponding rolling parameters to enter the next rolling pass.

[0066] Once the final rolling pass is completed, the uncoiler and coiler stop to unload the rolling tension, the pressing device unloads the rolling force, the work roll 1 is lifted, and the workpiece is wound up by the coiler, thus ending the rolling process.

[0067] Using this rolling method, non-oriented silicon steel strip raw material is rolled to the target thickness of 0.05mm through multiple asynchronous rolling passes, with a total reduction rate of 90%, and no annealing is required throughout the thinning process.

[0068] Step 3: Degrease the rolled non-oriented silicon steel ultra-thin strip to the target thickness, and then put it into a continuous annealing furnace for bright annealing in a dry atmosphere. The annealing temperature is 750℃~950℃ and the holding time is 30s~600s.

[0069] This invention provides a system for preparing non-oriented silicon steel ultrathin strips corresponding to the above method, comprising:

[0070] A multi-pass asynchronous cold rolling module is used to perform multi-pass asynchronous cold rolling on non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling. Annealing is not required during the multi-pass asynchronous cold rolling process, and the speed ratio and pre-tension of each pass meet set conditions to satisfy either a first condition or a second condition. The first condition is that the entire rolling deformation zone of each pass is a rubbing zone, and the second condition is that the forward sliding zone disappears in the rolling deformation zone of each pass, and the deformation zone consists of a rubbing zone and a backward sliding zone. The non-oriented silicon steel strip in the first pass of asynchronous cold rolling is an annealed non-oriented silicon steel strip, and the non-oriented silicon steel strip in the nth pass of asynchronous cold rolling is the non-oriented silicon steel strip obtained after the (n-1)th pass of asynchronous cold rolling, where n is a positive integer greater than 1.

[0071] The annealing module is used to degrease the rolled non-oriented silicon steel ultra-thin strip of target thickness and then perform bright annealing in a continuous annealing furnace to obtain the non-oriented silicon steel ultra-thin strip.

[0072] An electronic device, comprising:

[0073] A memory and a processor, the memory being used to store a computer program, the processor running the computer program to cause the electronic device to perform the method for preparing non-oriented silicon steel ultrathin strips according to the above embodiments.

[0074] A computer-readable storage medium storing a computer program that, when executed by a processor, implements the method for preparing non-oriented silicon steel ultrathin strips as described in the above embodiments.

[0075] The beneficial effects of this invention are:

[0076] 1. Optimization of rolling parameters (variable speed ratio and front tension) ensures that the rolling deformation zone is maintained in the state of rolling zone or back sliding zone and rolling zone, which can give full play to the role of asynchronous rolling in enhancing the beneficial texture strength of non-oriented silicon steel, significantly improve the strength of beneficial texture in non-oriented silicon steel, improve recrystallization annealing texture, and help improve the magnetic induction intensity of non-oriented silicon steel ultra-thin strip.

[0077] 2. Optimization of rolling parameters can minimize rolling force, fully utilize the strong thinning capability of asynchronous rolling, break through the minimum rollable thickness limit of synchronous rolling, and roll non-oriented silicon steel ultra-thin strips to even smaller thicknesses, further reducing iron loss at high frequencies.

[0078] 3. Asynchronous rolling has strong thinning capability. No annealing is required during the entire process of thinning to the target thickness. The shear bands in the post-rolling structure increase. During the subsequent recrystallization annealing process, the non-uniform nucleation points at the shear bands increase, resulting in smaller grains in the annealed structure. This improves the grain size distribution in the microstructure of non-oriented silicon steel ultra-thin strips and avoids the occurrence of monolayer crystals. It can improve the strength of non-oriented silicon steel ultra-thin strips while taking into account high magnetic induction and low iron loss.

[0079] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on its differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. For the systems disclosed in the embodiments, since they correspond to the methods disclosed in the embodiments, the descriptions are relatively simple; relevant parts can be referred to the method section.

[0080] This document uses specific examples to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of the present invention. Furthermore, those skilled in the art will recognize that, based on the ideas of the present invention, there will be changes in the specific implementation methods and application scope. Therefore, the content of this specification should not be construed as a limitation of the present invention.

Claims

1. A method for preparing an ultrathin strip of non-oriented silicon steel, characterized in that, include: Non-oriented silicon steel strip is subjected to multi-pass asynchronous cold rolling until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultra-thin strip with target thickness after rolling. In the multi-pass asynchronous cold rolling process, annealing is not required, and the speed ratio and front tension of each pass meet the set conditions to satisfy either the first condition or the second condition. The first condition is that the entire rolling deformation zone of each pass is a rubbing zone, and the second condition is that the front sliding zone disappears in the rolling deformation zone of each pass, and the deformation zone consists of a rubbing zone and a back sliding zone. The non-oriented silicon steel strip in the first pass of asynchronous cold rolling is an annealed non-oriented silicon steel strip, and the non-oriented silicon steel strip in the nth pass of asynchronous cold rolling is the non-oriented silicon steel strip obtained after the (n-1)th pass of asynchronous cold rolling, where n is a positive integer greater than 1. Multi-pass asynchronous cold rolling of non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness is obtained to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling, specifically including: Based on the work hardening curve of the annealed non-oriented silicon steel strip and the reduction rate of each pass, the average planar deformation resistance of the non-oriented silicon steel strip in the deformation zone of each pass is determined; in the multi-pass asynchronous cold rolling process, the reduction rate of each pass is less than 15%, and the total reduction rate of all passes is between 80% and 98%. For any given pass, the maximum permissible tension and the expected post-tension of the pass are determined based on the average planar deformation resistance of the non-oriented silicon steel strip within the deformation zone of that pass. The critical pretension is calculated based on the expected back tension of the pass, so that the entire rolling deformation zone of the pass is a rolling zone. If the critical pre-tension of the rolling deformation zone of the specified pass being entirely a rolling zone is less than the maximum permissible tension of the specified pass, then the range of values ​​for the rate ratio of the specified pass satisfies the formula... Furthermore, the range of values ​​for the pretension in the aforementioned passes satisfies the formula... ,in, i This indicates the velocity ratio of the aforementioned track. This represents the critical speed ratio that makes the entire rolling deformation zone of the stated pass a rolling zone. This indicates the pre-tension of the aforementioned pass. This indicates the critical pretension that makes the entire rolling deformation zone of the aforementioned pass a rolling zone. If the critical pre-tension of the rolling deformation zone of the specified pass being entirely a rolling zone is greater than or equal to the maximum permissible tension of the specified pass, then the range of values ​​for the rate ratio of the specified pass satisfies the formula... Furthermore, the range of values ​​for the pretension in the aforementioned passes satisfies the formula... ,in, This represents the critical velocity ratio that causes the forward slip zone to disappear within the rolling deformation zone of the specified pass, and the deformation zone to consist of a rolling zone and a backward slip zone. This indicates the maximum permissible tension for the specified track. The non-oriented silicon steel strip is subjected to multi-pass asynchronous cold rolling based on the expected back tension, the range of different speed ratios, and the range of front tension for each pass until the thickness of the non-oriented silicon steel strip reaches the target thickness, thus obtaining a non-oriented silicon steel ultra-thin strip with the target thickness after rolling. The non-oriented silicon steel ultra-thin strip of the target thickness after rolling is degreased and then bright annealed in a continuous annealing furnace to obtain the non-oriented silicon steel ultra-thin strip.

2. The method for preparing non-oriented silicon steel ultrathin strip according to claim 1, characterized in that, The process for determining the critical speed ratio that makes the entire rolling deformation zone of the aforementioned pass a rolling zone is as follows: According to the formula Calculate the critical rate ratio that makes the entire rolling deformation zone of the aforementioned pass a rolling tumbling zone, where, H This indicates the thickness of the non-oriented silicon steel strip before that rolling pass. h This indicates the thickness of the non-oriented silicon steel strip after that rolling pass. Indicates the radius of the first working roll. Indicates the radius of the second working roll. This indicates the reduction rate of the non-oriented silicon steel strip in that pass.

3. The method for preparing non-oriented silicon steel ultrathin strip according to claim 2, characterized in that, The process for determining the critical pre-tension that makes the entire rolling deformation zone of the pass a slugging zone based on the expected post-tension calculation of the pass is as follows: According to the formula Calculate the critical pre-tension that makes the entire rolling deformation zone of the aforementioned pass a rolling zone, wherein, This indicates the expected back tension of the stated pass. Indicates intermediate variables. K This represents the average planar deformation resistance of the non-oriented silicon steel strip within the deformation zone of that pass.

4. The method for preparing non-oriented silicon steel ultrathin strip according to claim 3, characterized in that, The process for determining the critical velocity ratio that makes the forward slip zone disappear in the rolling deformation zone of the aforementioned pass and the deformation zone consist of the rolling zone and the backward slip zone is as follows: According to the formula Calculate the critical velocity ratio that causes the forward slip zone to disappear within the rolling deformation zone of the aforementioned pass, and the deformation zone to consist of a rolling chuck zone and a backward slip zone. This indicates the thickness of the non-oriented silicon steel strip at the neutral point of the high-speed roll within the deformation zone of that pass.

5. The method for preparing non-oriented silicon steel ultrathin strip according to claim 1, characterized in that, When performing bright annealing in a continuous annealing furnace, the annealing temperature is 750℃~950℃ and the holding time is 30s~600s.

6. A system for preparing non-oriented silicon steel ultrathin strips, characterized in that, include: A multi-pass asynchronous cold rolling module is used to perform multi-pass asynchronous cold rolling on non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling. Annealing is not required during the multi-pass asynchronous cold rolling process, and the speed ratio and pre-tension of each pass meet set conditions to satisfy either a first condition or a second condition. The first condition is that the entire rolling deformation zone of each pass is a rubbing zone, and the second condition is that the forward sliding zone disappears in the rolling deformation zone of each pass, and the deformation zone consists of a rubbing zone and a backward sliding zone. The non-oriented silicon steel strip in the first pass of asynchronous cold rolling is an annealed non-oriented silicon steel strip, and the non-oriented silicon steel strip in the nth pass of asynchronous cold rolling is the non-oriented silicon steel strip obtained after the (n-1)th pass of asynchronous cold rolling, where n is a positive integer greater than 1. Multi-pass asynchronous cold rolling of non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness is obtained to obtain a non-oriented silicon steel ultra-thin strip with the target thickness after rolling, specifically including: Based on the work hardening curve of the annealed non-oriented silicon steel strip and the reduction rate of each pass, the average planar deformation resistance of the non-oriented silicon steel strip in the deformation zone of each pass is determined; in the multi-pass asynchronous cold rolling process, the reduction rate of each pass is less than 15%, and the total reduction rate of all passes is between 80% and 98%. For any given pass, the maximum permissible tension and the expected post-tension of the pass are determined based on the average planar deformation resistance of the non-oriented silicon steel strip within the deformation zone of that pass. The critical pretension is calculated based on the expected back tension of the pass, so that the entire rolling deformation zone of the pass is a rolling zone. If the critical pre-tension of the rolling deformation zone of the specified pass being entirely a rolling zone is less than the maximum permissible tension of the specified pass, then the range of values ​​for the rate ratio of the specified pass satisfies the formula... Furthermore, the range of values ​​for the pretension in the aforementioned passes satisfies the formula... ,in, i This indicates the velocity ratio of the aforementioned track. This represents the critical speed ratio that makes the entire rolling deformation zone of the stated pass a rolling zone. This indicates the pre-tension of the aforementioned pass. This indicates the critical pretension that makes the entire rolling deformation zone of the aforementioned pass a rolling zone. If the critical pre-tension of the rolling deformation zone of the specified pass being entirely a rolling zone is greater than or equal to the maximum permissible tension of the specified pass, then the range of values ​​for the rate ratio of the specified pass satisfies the formula... Furthermore, the range of values ​​for the pretension in the aforementioned passes satisfies the formula... ,in, This represents the critical velocity ratio that causes the forward slip zone to disappear within the rolling deformation zone of the specified pass, and the deformation zone to consist of a rolling zone and a backward slip zone. This indicates the maximum permissible tension for the specified track. The non-oriented silicon steel strip is subjected to multi-pass asynchronous cold rolling based on the expected back tension, the range of different speed ratios, and the range of front tension for each pass until the thickness of the non-oriented silicon steel strip reaches the target thickness, thus obtaining a non-oriented silicon steel ultra-thin strip with the target thickness after rolling. The annealing module is used to degrease the rolled non-oriented silicon steel ultra-thin strip of target thickness and then perform bright annealing in a continuous annealing furnace to obtain the non-oriented silicon steel ultra-thin strip.

7. An electronic device, characterized in that, include: A memory and a processor, the memory being used to store a computer program, the processor running the computer program to cause the electronic device to perform the method for preparing non-oriented silicon steel ultrathin strips according to any one of claims 1 to 5.

8. A computer-readable storage medium, characterized in that, It stores a computer program that, when executed by a processor, implements the method for preparing non-oriented silicon steel ultrathin strips as described in any one of claims 1 to 5.

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