Display substrate, preparation method thereof and display device

Abstract

The display substrate and the manufacturing method thereof and the display device are provided. The display substrate comprises a substrate, a first insulating layer, a transparent structure layer, a second insulating layer and a light emitting component. The first insulating layer is located on one side of the substrate. The first insulating layer has a first pattern part matched with the transparent structure layer. The transparent structure layer is located on the side of the first pattern part away from the substrate, so that the transparent structure layer forms a preset structure. The second insulating layer is located on the side of the transparent structure layer away from the substrate. The light emitting component is located on the side of the second insulating layer away from the substrate. The transparent structure layer is used for allowing at least part of the first light emitted by the light emitting component to pass through. The transparent structure layer is also used for making the first light generate reflected light towards the center of the transparent structure layer at the interface between the transparent structure layer and the first pattern part and pass through the transparent structure layer. The technical scheme of the present disclosure can reduce light loss, improve light extraction efficiency and improve light emitting efficiency.

Description

Technical Field

[0001] The present disclosure relates to the technical field of display devices, and in particular to a display substrate and a preparation method thereof, and a display device. Background Art

[0002] Organic Light-Emitting Diodes (OLEDs), with their advantages of high response, high contrast, and flexibility, have found widespread application in display applications such as mobile phones, tablets, and televisions. OLED displays, with their high brightness, full viewing angle, and fast response times, have become a highly competitive next-generation display technology.

[0003] In the related art, OLED display devices have the problem that part of the side light is partially reflected or fully reflected, resulting in the light being unable to be emitted from the display device, thereby reducing the light utilization rate and the luminous efficiency of the display device. Summary of the Invention

[0004] The embodiments of the present disclosure provide a display substrate and a method for manufacturing the same, and a display device to solve or alleviate one or more technical problems in the prior art.

[0005] As a first aspect of an embodiment of the present disclosure, an embodiment of the present disclosure provides a display substrate, comprising a base substrate, a first insulating layer, a transparent structure layer, a second insulating layer and a light-emitting component;

[0006] A first insulating layer is located on one side of the base substrate, and the first insulating layer has a first pattern portion adapted to the transparent structure layer;

[0007] a transparent structural layer, located on a side of the first pattern portion facing away from the base substrate, so that the transparent structural layer forms a preset structure;

[0008] a second insulating layer, located on a side of the transparent structure layer facing away from the base substrate; and

[0009] a light-emitting component, located on a side of the second insulating layer away from the base substrate;

[0010] Among them, the transparent structural layer is used to allow at least part of the first light emitted by the light-emitting component to pass through, and the transparent structural layer is also used to make the first light generate reflected light emitted toward the center of the transparent structural layer at the interface between the transparent structural layer and the first pattern part and pass through the transparent structural layer.

[0011] In some possible embodiments, the transparent structure layer includes a central area and an edge area surrounding the central area, the transparent structure layer includes a first recessed portion located in the edge area, the first recessed portion is recessed toward the direction close to the base substrate, the first recessed portion includes a first side wall layer and a second side wall layer, the first side wall layer and the second side wall layer are inclined relative to the plane where the base substrate is located and the inclination directions are opposite, the first side wall layer is away from the central area relative to the second side wall layer, the first light passes through the first side wall layer to generate reflected light toward the second side wall layer and passes through the transparent structure layer from the second side wall layer.

[0012] In some possible implementations, the first sidewall layer and the second sidewall layer are inclined at an angle of 45°-60° relative to the plane where the substrate is located.

[0013] In some possible implementations, the first recessed portion further includes a first bottom wall layer, two ends of the first bottom wall layer are connected to the first side wall layer and the second side wall layer, and the first bottom wall layer is arranged parallel to the plane where the base substrate is located.

[0014] In some possible embodiments, the transparent structure layer includes a central area and an edge area surrounding the central area, the transparent structure layer includes a second recessed portion located in the central area, the second recessed portion is recessed toward the direction close to the substrate, the second recessed portion includes a third sidewall layer arranged along the edge of the central area, and the first light passes through the third sidewall layer to generate reflected light emitted toward the center and passes through the transparent structure layer.

[0015] In some possible implementations, the inclination angle of the third sidewall layer relative to the plane where the substrate is located is 30°-35°.

[0016] In some possible implementations, the second recessed portion further includes a second bottom wall layer, an edge of the second bottom wall layer is connected to an edge of the third side wall layer, and the second bottom wall layer is arranged parallel to the plane where the base substrate is located.

[0017] In some possible implementations, the refractive index of the transparent structure layer is greater than the refractive index of the first insulating layer, and the refractive index of the transparent structure layer is greater than the refractive index of the second insulating layer.

[0018] In some possible implementations,

[0019] The refractive index of the first insulating layer, the refractive index of the second insulating layer, and the refractive index of the substrate are the same, and the refractive index of the first insulating layer is 1.4-1.5; and / or

[0020] The refractive index of the transparent structural layer is 1.5-1.7.

[0021] In some possible embodiments, the display substrate further includes a thin film transistor layer located between the second insulating layer and the light-emitting component, the light-emitting component includes a first electrode, a light-emitting layer, and a second electrode arranged in sequence in a direction away from the base substrate, and an orthographic projection of the transparent structure layer on the base substrate at least partially overlaps with the first electrode.

[0022] The transparent structure layer includes a transparent conductive material, and the transparent structure layer and the first electrode form a capacitor.

[0023] As a second aspect of the embodiments of the present disclosure, the embodiments of the present disclosure provide a method for preparing a display substrate, the method comprising:

[0024] forming a first insulating layer on one side of the base substrate, and forming a first pattern portion through a patterning process;

[0025] forming a transparent structure layer on a side of the first pattern portion facing away from the base substrate, so that the transparent structure layer forms a preset structure;

[0026] forming a second insulating layer on a side of the transparent structure layer facing away from the base substrate;

[0027] A light-emitting component is formed on the side of the second insulating layer away from the base substrate, and the transparent structural layer is used to allow at least part of the first light emitted by the light-emitting component to pass through. The transparent structural layer is also used to cause the first light to generate reflected light emitted toward the center of the transparent structural layer at the interface between the transparent structural layer and the first pattern portion and pass through the transparent structural layer.

[0028] As a third aspect of the embodiments of the present disclosure, the embodiments of the present disclosure provide a display device, comprising the display substrate of any one of the embodiments of the first aspect.

[0029] The technical solution of the embodiment of the present disclosure can achieve the following beneficial effects: the display substrate of the embodiment of the present disclosure can reduce light loss, improve light extraction rate, improve light utilization rate, and improve the luminous efficiency of the display substrate.

[0030] The above summary is for illustrative purposes only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments and features described above, further aspects, embodiments and features of the present disclosure will be readily apparent by reference to the accompanying drawings and the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In the accompanying drawings, unless otherwise specified, the same reference numerals throughout the multiple drawings represent the same or similar components or elements. These drawings are not necessarily drawn to scale. It should be understood that these drawings only depict some embodiments according to the present disclosure and should not be regarded as limiting the scope of the present disclosure.

[0032] Figure 1A cross-sectional schematic diagram of a display substrate in related art;

[0033] Figure 2 is a schematic diagram of light entering the second refractive index film layer from the first refractive index film layer;

[0034] Figure 3 A schematic diagram of the proportion of light source modes of a display substrate according to an embodiment of the present disclosure;

[0035] Figure 4 is a schematic cross-sectional view showing a substrate in one embodiment of the present disclosure;

[0036] Figure 5 is a schematic cross-sectional view of a display substrate according to an embodiment of the present disclosure;

[0037] Figure 6 A schematic plan view of a display substrate in the related art;

[0038] Figure 7 is a schematic plan view of a display substrate according to an embodiment of the present disclosure;

[0039] Figure 8 A schematic diagram showing the dimensions of a pixel circuit area in an embodiment of the present disclosure and a pixel circuit area in a related art;

[0040] Figure 9 1 is a schematic flow chart of a method for preparing a display substrate according to an embodiment of the present disclosure;

[0041] Figure 10 This is a cross-sectional schematic diagram after forming the first pattern portion according to the embodiment of the present disclosure;

[0042] Figure 11 This is a cross-sectional schematic diagram after forming a transparent structural layer according to an embodiment of the present disclosure;

[0043] Figure 12 This is a cross-sectional schematic diagram after the second insulating layer is formed according to an embodiment of the present disclosure.

[0044] Description of reference numerals:

[0045] 10. Display substrate;

[0046] 1. Base substrate; 2. Transparent structural layer; 3. First insulating layer; 4. Second insulating layer; 5. Light-emitting component; 6. Thin film transistor layer; 7. Passivation layer; 8. Planarization layer;

[0047] 2a, central area; 2b, edge area; 21, first recessed portion; 22, second recessed portion;

[0048] 211, first side wall layer; 212, second side wall layer; 213, first bottom wall layer; 221, third side wall layer; 222, second bottom wall layer;

[0049] 31. First pattern portion; 51. First electrode; 61. Semiconductor layer; 62. Gate insulating layer; 63. Gate electrode; 64. First electrode; 65. Second electrode; 66. Interlayer insulating layer. DETAILED DESCRIPTION

[0050] Hereinafter, only certain exemplary embodiments are briefly described. As will be appreciated by those skilled in the art, the described embodiments may be modified in various ways without departing from the spirit or scope of the present disclosure. Therefore, the drawings and description are to be considered as illustrative in nature and not restrictive.

[0051] Figure 1 FIG. 1 is a cross-sectional schematic diagram of a display substrate in the related art. Figure 1 As shown, the display substrate 10 of the related art may include a base substrate 1, a transparent structure layer 2, a first insulating layer 3, and a light-emitting component 5. The transparent structure layer 2 is located on one side of the base substrate 1, the first insulating layer 3 is located on the side of the transparent structure layer 2 facing away from the base substrate 1, and the light-emitting component 5 is located on the side of the first insulating layer 3 facing away from the base substrate 1.

[0052] like Figure 1 As shown, the contact surface between the base substrate 1 and the transparent structure layer 2 is a flat surface. The transparent structure layer 2 is flatly arranged on one side of the base substrate 1. The refractive index of the transparent structure layer 2 is different from that of the base substrate 1. The flat surface can be understood as the contact surface between the base substrate 1 and the transparent structure layer 2 being a plane or a curved surface with a small curvature.

[0053] Figure 2 Schematic diagram of light entering the second refractive index film layer from the first refractive index film layer. Figure 2 The first refractive index film layer is located below the horizontal line, and the second refractive index film layer is located above the horizontal line, that is, Figure 2 High RI (High Refractive Index) indicates the first refractive index film layer, and Low RI (Low Refractive Index) indicates the second refractive index film layer. Figure 2 The arrow in the middle can indicate the direction of light. The refractive index of the first refractive index film layer is greater than that of the second refractive index film layer. Figure 2 As shown in the figure, A can represent that light is transmitted at the interface between the first refractive index film layer and the second refractive index film layer, with no light loss. B and C in the figure can represent that light is partially reflected and refracted at the interface between the first refractive index film layer and the second refractive index film layer, with partial light loss. D and E in the figure can represent that light is totally reflected at the interface between the first refractive index film layer and the second refractive index film layer, with no light transmission.

[0054] Figure 1In the related art shown, the light emitted by the light emitting component 5 has three light modes when passing through the interface between the transparent structure layer 2 and the base substrate 1. In the first light source mode (AirMode), the light emitted by the light emitting component 5 passes through the transparent structure layer 2 and is emitted from the interface between the base substrate 1. There is no light loss in the first light source mode, corresponding to Figure 2 As shown in A in the second light source mode (Substrate Mode), the light emitted by the light emitting component 5 is partially reflected at the interface between the transparent structure layer 2 and the base substrate 1, and part of the light in the second light source mode is lost, corresponding to Figure 2 As shown in B and C in the third light source mode (Wave Guide Mode), the light emitted by the light emitting component 5 is totally reflected at the interface between the transparent structure layer 2 and the base substrate 1. The light of the third light source mode cannot be emitted from the base substrate 1, corresponding to Figure 2 As shown in D and E.

[0055] Figure 3 FIG. 1 is a schematic diagram showing the proportion of light source modes of a display substrate according to an embodiment of the present disclosure. Figure 3 As shown in FIG. 1 , the first light source mode accounts for approximately 17%, the second light source mode accounts for approximately 28%, and the third light source mode accounts for approximately 55%. Therefore, in the related art, the second and third light source modes account for approximately 83%, which results in a large amount of light loss and reduces the luminous efficiency of the display substrate 10.

[0056] Exemplarily, the refractive index of the transparent structure layer 2 is greater than the refractive index of the base substrate 1. For example, the refractive index of the transparent structure layer 2 is 1.7, and the refractive index of the base substrate 1 is 1.4. Figure 1 In the display substrate shown, the light-emitting component 5 emits light toward the base substrate 1. Due to the difference in refractive index between the transparent structural layer 2 and the base substrate 1, in the process of entering the base substrate 1 from the transparent structural layer 2, part of the side light with a large angle perpendicular to the base substrate 1 will be reflected back into the display substrate 10 through the transparent structural layer 2 and cannot be emitted, thereby causing light loss, which is not conducive to improving the brightness of the display substrate 10 and reduces the luminous efficiency of the display substrate 10.

[0057] like Figure 1 As shown, for example, side light emitted by the light emitting component 5 at an angle greater than 60° with the first direction Y is partially or fully reflected. Light emitted by the light emitting component 5 at an angle between 35° and 60° with the first direction Y is partially reflected, resulting in light loss, which is not conducive to improving the brightness of the display substrate 10 and reduces the luminous efficiency of the display substrate 10. The first direction Y is perpendicular to the light emitting substrate 10.

[0058] Figure 1The display substrate shown may further include a thin film transistor layer 6 located between the light emitting component 5 and the first insulating layer 3. The thin film transistor layer 6 includes a semiconductor layer 61, a gate insulating layer 62, a gate electrode 63, a first electrode 64, a second electrode 65 and an interlayer insulating layer 66.

[0059] For example, Figure 1 The display substrate shown also includes a passivation layer 7 (PVX layer) and a planarization layer 8 (Resin layer). The passivation layer 7 is located on the side of the first electrode 64 and the second electrode 65 facing away from the base substrate 1, and the planarization layer 8 is located on the side of the planarization layer 8 facing away from the base substrate 1. The light-emitting component 5 includes a first electrode 51, a light-emitting layer (not shown in the figure), and a second electrode (not shown in the figure) arranged in sequence along a direction away from the base substrate 1. The first electrode 51 is connected to the first electrode 64, and the orthographic projection of the first electrode 51 on the base substrate 1 at least partially overlaps with the orthographic projection of the transparent structure layer 2 on the base substrate 1. The transparent structure layer 2 includes a transparent conductive material, so that the transparent structure layer 2, the first electrode 51, and the insulating layer located between the transparent structure layer 2 and the first electrode 51, such as the first insulating layer 3 and the interlayer insulating layer, together form a capacitor C1 (Storage Capacitor). The capacitor C1 can provide a constant electrical signal to ensure that the gate signal of the thin film crystal optical layer 6 remains unchanged.

[0060] Figure 1 In the related art shown, to ensure the capacitance value of capacitor C1, a transparent structural layer 2 is formed on one side of the base substrate 1 using a transparent conductive material. The transparent structural layer 2 and the first electrode 51 of the light-emitting component 5 form capacitor C1, which can improve the aperture ratio. However, this results in the transparent structural layer 2 being formed in the light-emitting area corresponding to the light-emitting component 5. Due to the difference in refractive index between the transparent structural layer 2 and the base substrate 1, the light emitted by the light-emitting component 5 is partially or completely reflected, resulting in light loss on the display substrate 10 and reduced luminous efficiency.

[0061] In order to solve the problems of optical loss and low luminous efficiency of display substrates in related technologies, the present disclosure provides a display substrate. The technical solution of the display substrate is described below with reference to the accompanying drawings.

[0062] Figure 4 FIG. 1 is a schematic cross-sectional view of a display substrate in one embodiment of the present disclosure. Figure 4 As shown, the display substrate 10 of the embodiment of the present disclosure may include a base substrate 1 , a transparent structure layer 2 , a first insulating layer 3 , a second insulating layer 4 and a light-emitting component 5 .

[0063] For example, Figure 4As shown, a first insulating layer 3 is located on one side of a base substrate 1 and has a first pattern portion 31 that matches the transparent structure layer 2. The transparent structure layer 2 is located on the side of the first pattern portion 31 that faces away from the base substrate 1, so that the transparent structure layer 2 forms a predetermined structure. A second insulating layer 4 is located on the side of the transparent structure layer 2 that faces away from the base substrate 1. A light-emitting component 5 is located on the side of the second insulating layer 4 that faces away from the base substrate 1.

[0064] Among them, the transparent structural layer 2 is used to allow at least part of the first light L emitted by the light-emitting component 5 to pass through, and the transparent structural layer 2 is also used to make the first light L generate reflected light emitted toward the center of the transparent structural layer 2 at the interface S between the transparent structural layer 2 and the first pattern portion 31 and pass through the transparent structural layer 2.

[0065] For example, when the angle α between the first light ray L of the light-emitting component 5 and the first direction Y is 0-35°, the first light ray L can pass through the interface between the transparent structural layer 2 and the first pattern portion 31. When the angle α between the first light ray L of the light-emitting component 5 and the first direction Y is 35°-60° or when the angle α between the first light ray L and the first direction Y is greater than 60°, the first light ray L generates a reflected light ray at the interface S between the transparent structural layer 2 and the first pattern portion 31, which is emitted toward the center of the transparent structural layer 2 and passes through the transparent structural layer 2. This arrangement can guide and modulate the light that is totally reflected or partially reflected at the interface between the transparent structural layer 2 and the base substrate 1 in the related art to be emitted through the transparent structural layer 2, thereby reducing light loss, improving luminous efficiency, and increasing the display brightness of the display substrate 10.

[0066] The transparent structure layer 2 is located on the side of the first pattern portion 31 facing away from the base substrate 1. The orthographic projection of the transparent structure layer 2 on the base substrate 1 is located within the orthographic projection of the first pattern portion 31 on the base substrate 1. The transparent structure layer 2 contacts the surface of the first pattern portion 31 on the side facing away from the base substrate 1, forming a contact interface adapted to the first pattern portion 31. This allows the transparent structure layer 2 to form a preset structure, which is used to adjust a portion of the first light L emitted by the light-emitting component 5. The preset structure of the transparent structure layer 2 can destroy the total reflection and partial reflection conditions of light when it enters the base substrate from the transparent structure layer 2 in the related art, reducing light loss on the display substrate caused by total reflection and other factors, increasing the light emitted by the display substrate 10, improving the light extraction efficiency of the display substrate 10, and increasing the brightness of the display substrate 10.

[0067] In the display substrate of the embodiment of the present disclosure, the transparent structure layer 2 is set to a preset structure that is compatible with the first pattern portion 31 of the first insulating layer 3. After the first pattern portion 31 is formed, the transparent structure layer 2 is deposited on the surface of the first pattern portion 31 on the side away from the base substrate 1. An interface S that is compatible with the surface of the first pattern portion 31 on the side away from the base substrate 1 is formed between the transparent structure layer 2 and the first pattern portion 31. The first light L emitted by the light-emitting component 5 can at least partially pass through the transparent structure layer 2 and be emitted from the base substrate 1. The first light L emitted by the light-emitting component 5 can also generate reflected light emitted toward the center of the transparent structure layer 2 through the interface between the first pattern portion 31 and the transparent structure layer 2 and pass through the transparent structure layer 2 to be emitted from the base substrate 1. The display substrate of the embodiment of the present disclosure can Figure 1 The first light that is totally reflected or partially reflected in the display substrate is extracted, thereby improving the light extraction efficiency of the light-emitting component 5, improving the light utilization rate, improving the display brightness of the display substrate, and enhancing product performance and competitiveness.

[0068] Exemplarily, the base substrate 1 may be a transparent substrate such as a glass substrate or a plastic substrate, or the base substrate 1 may be other flexible substrates or bendable substrates.

[0069] For example, the display substrate 10 of the disclosed embodiment is a bottom-emission display substrate. The base substrate 1 is located at the bottom of the display substrate 10, providing support and protection. Light emitted by the light-emitting component 5 is emitted from one side of the base substrate 1 to display images. The base substrate 1 is a transparent substrate made of materials such as glass and resin. The base substrate 1 can be square. When used in special-shaped displays, the base substrate 1 can also be circular or other shapes, which are not limited here.

[0070] Exemplarily, the number of the light-emitting components 5 is one or more, and the light-emitting components 5 are arranged in a one-to-one correspondence with the first pattern portion 31, that is, the light-emitting components 5 are arranged in correspondence with the transparent structural layer 2. The light-emitting components 5 can be organic light-emitting diodes (OLEDs). In other embodiments, the light-emitting components 5 can also be light-emitting diode chips (LEDs) or quantum dot light-emitting diodes (QLEDs) and other devices that can emit light. The light-emitting components 5 can be arranged in an array on the side of the second insulating layer 4 facing away from the base substrate.

[0071] Exemplarily, the light-emitting component 5 is an organic light-emitting diode. The light-emitting component 5 may include a first electrode 51, a light-emitting layer, and a second electrode stacked in sequence along a side facing away from the base substrate 1. The light-emitting layer emits light by applying an electrical signal between the first electrode and the second electrode.

[0072] like Figure 4As shown, in one embodiment, the transparent structural layer 2 includes a central region 2a and an edge region 2b surrounding the central region 2a. For example, the edge region 2b can be arranged around the central region 2a, for example, the central region 2a and the edge region 2b are arranged in a circular ring, with the edge region 2b located on the outer ring.

[0073] like Figure 4 As shown, the transparent structural layer 2 includes a first recessed portion 21, which is located in the edge region 2b. The first recessed portion 21 is recessed toward the base substrate 1. For example, the edge region 2b and the center region 2a are both rectangular, and the edge region 2b surrounds the side of the center region 2a. The first recessed portion 21 can be located in the edge region 2b on one side of the center region 2a. Alternatively, the first recessed portion 21 can be located in the edge regions 2b on two opposite sides of the center region 2a. Alternatively, the first recessed portion 21 can be located in all edge regions 2b on the periphery of the center region 2a, that is, the edge regions 2b are all recessed toward the base substrate 1.

[0074] like Figure 4 As shown, illustratively, the first recessed portion 21 includes a first sidewall layer 211 and a second sidewall layer 212. The first sidewall layer 211 and the second sidewall layer 212 are arranged obliquely relative to the plane of the base substrate 1, and the first sidewall layer 211 and the second sidewall layer 212 are inclined in opposite directions. The distance between the first sidewall layer 211 and the second sidewall layer 212 in a first direction gradually increases in a direction away from the base substrate 1, where the first direction is parallel to the plane of the base substrate 1. The first sidewall layer 211 is farther away from the central region 2a than the second sidewall layer 212. The angle of the first sidewall layer 211 relative to the first direction is greater than 90°, while the angle of the second sidewall layer 212 relative to the first direction is less than 90°.

[0075] In the display substrate of the embodiment of the present disclosure, the first light passes through the first sidewall layer 211 to generate a reflected light toward the second sidewall layer 212 and passes through the transparent structure layer 2 from the second sidewall layer 212. For example, the angle α between the first light and the normal line perpendicular to the base substrate 1 is greater than 35°. Figure 1 In the display substrate of the related art shown, the first light L is reflected or totally reflected at the interface S between the transparent structure layer 2 and the base substrate 1 . Figure 4 The first side wall layer 211 of the display substrate shown can modulate the received first light L to generate reflected light toward the second side wall layer 212, and transmit the reflected light from the second side wall layer 212 through the transparent structural layer 2, thereby reducing the loss of light caused by total reflection or partial reflection in the related technology, improving the light utilization rate, improving the luminous efficiency, and improving the display brightness of the light-emitting substrate.

[0076] For example, the first pattern portion 31 may include a first central region and a first edge region surrounding the first central region. The first pattern portion 31 may include a first concave portion adapted to the first recessed portion 21. The transparent structure layer 2 is formed by depositing a material on the concave surface of the first concave portion of the first pattern portion 31, and the first recessed portion 21 adapted to the first concave portion is formed.

[0077] like Figure 4 As shown, in one embodiment, the first sidewall layer 211 and the second sidewall layer 212 are inclined at an angle of 45° to 60° relative to the plane of the base substrate 1. Within this range, the first sidewall layer 211 and the second sidewall layer 212 are inclined at an angle of 45° to 60° relative to the plane of the base substrate 1. This ensures that after receiving the first light, the first sidewall layer 211 can generate reflected light toward the second sidewall layer 212 and emit from the second sidewall layer 212 through the transparent structure layer 2 and out of the base substrate 1.

[0078] For example, the inclination angles of the first sidewall layer 211 and the second sidewall layer 212 relative to the plane where the base substrate 1 is located can be 45°, 50°, 55°, or 60°. The inclination angles of the first sidewall layer 211 and the second sidewall layer 212 relative to the plane where the base substrate 1 is located can be equal, or the inclination angles of the first sidewall layer 211 and the second sidewall layer 212 relative to the plane where the base substrate 1 is located can be unequal. The inclination angles of the first sidewall layer 211 and the second sidewall layer 212 relative to the plane where the base substrate 1 is located can be set according to actual needs and are not limited here.

[0079] like Figure 4 As shown, in one embodiment, the first recessed portion 21 further includes a first bottom wall layer 213. The two ends of the first bottom wall layer 213 are connected to the first side wall layer 211 and the second side wall layer 212. The first bottom wall layer 213 is arranged parallel to the plane of the base substrate 1. The first bottom wall layer 213 can contact the surface of the base substrate 1 and is arranged flat on the base substrate 1.

[0080] For example, the length of the first bottom wall layer 213 can be equal to 0, so that the first side wall layer 211 and one end of the second side wall layer 212 are connected, and the cross-section of the first recessed portion 21 is tapered. When the length of the first bottom wall layer 213 is greater than 0, both ends of the first bottom wall layer 213 are connected to the first side wall layer 211 and the second side wall layer 212, and the cross-section of the first recessed portion 21 is trapezoidal.

[0081] It should be noted that the edge area 2b is provided with a first recessed portion 21, and the central area 2a can be a flat surface. The central area 2a can be used to receive light from the light-emitting component 5 and pass through the transparent structural layer 2. The orthographic projection area of ​​the central area 2a on the base substrate 1 is larger than the orthographic projection area of ​​the edge area 2b on the base substrate 1.

[0082] like Figure 4 As shown, the transparent structure layer 2 includes a central region 2a and an edge region 2b surrounding the central region 2a. The transparent structure layer 2 includes a second recessed portion 22 located in the central region 2a. The second recessed portion 22 is recessed toward the substrate 1. The second recessed portion 22 includes a third sidewall layer 221 disposed along the edge of the central region 2a. The first light passes through the third sidewall layer 221, generating a reflected light beam that is emitted toward the center and passes through the transparent structure layer 2.

[0083] like Figure 4 As shown, the second recessed portion 22 includes two third sidewall layers 221, which are arranged at an angle relative to the plane of the base substrate 1, and the two third sidewall layers 221 are inclined in opposite directions. The second recessed portion 22 is provided in the central region 2a, so that the reflected light emitted toward the center by the third sidewall layers 221 can pass through the transparent structural layer 2, thereby further adjusting the light to focus on the light-emitting area, thereby further improving the display brightness of the light-emitting substrate.

[0084] For example, the first pattern portion 31 may include a first central region and a first edge region surrounding the first central region. The first pattern portion 31 may further include a second concave portion adapted to the second concave portion 22. The transparent structure layer 2 is formed by depositing a material on the concave surface of the second concave portion of the first pattern portion 31, and the first concave portion 22 adapted to the second concave portion is formed.

[0085] like Figure 5 As shown, in one embodiment, the third sidewall layer 221 has an inclination angle of 30°-35° relative to the plane of the base substrate 1. The inclination angle of the third sidewall layer 221 relative to the plane of the base substrate 1 within this range ensures that after receiving the first light, the third sidewall layer 221 can generate reflected light that is emitted toward the center and passes through the transparent structural layer 2.

[0086] For example, the inclination angle of the third sidewall layer 221 relative to the plane of the base substrate 1 can be 30°, 31°, 32°, 33°, 34°, and 35°. The inclination angle of the third sidewall layer 221 relative to the plane of the base substrate 1 can be set according to actual needs and is not limited here.

[0087] like Figure 4 As shown, in one embodiment, the second recessed portion 22 further includes a second bottom wall layer 222 , the edge of the second bottom wall layer 222 is connected to the edge of the third side wall layer 221 , and the second bottom wall layer 222 is arranged parallel to the plane where the base substrate 1 is located.

[0088] For example, the length of the second bottom wall layer 222 can be equal to 0, so that one end of the two third side wall layers 221 are connected, and the cross-section of the second recessed portion 22 is tapered. When the length of the second bottom wall layer 222 is greater than 0, both ends of the second bottom wall layer 222 are connected to the two third side wall layers 221, and the cross-section of the second recessed portion 22 is trapezoidal.

[0089] In one embodiment, the refractive index of the transparent structure layer 2 is greater than the refractive index of the first insulating layer 3 , and the refractive index of the transparent structure layer 2 is greater than the refractive index of the second insulating layer 4 .

[0090] In one embodiment, the refractive index of the first insulating layer 3, the refractive index of the second insulating layer 4, and the refractive index of the base substrate 1 are the same, and the refractive index of the first insulating layer 3 is 1.4-1.5. Exemplarily, the first insulating layer 3 and the second insulating layer 4 can be made of the same material. For example, the first insulating layer 3 and the second insulating layer 3 can both be made of any one or more of silicon oxide, silicon nitride, and silicon oxynitride. The materials of the first insulating layer 3 and the second insulating layer 4 can be selected according to actual needs and are not limited here.

[0091] For example, the first insulating layer 3, the second insulating layer 4, and the base substrate 1 have the same refractive index, and the refractive index of the first insulating layer 3, the second insulating layer 4, and the base substrate 1 can be one of 1.40, 1.42, 1.45, 1.47, and 1.50. The specific values ​​of the refractive index of the first insulating layer 3, the second insulating layer 4, and the base substrate 1 can be set according to actual use requirements and are not limited here.

[0092] In one embodiment, the refractive index of the transparent structural layer 2 is 1.5-1.7. The refractive index of the transparent structural layer 2 can be one of 1.50, 1.55, 1.60, 1.65, and 1.70. The specific value of the refractive index of the transparent structural layer 2 can be set according to actual use requirements and is not limited here.

[0093] Figure 5 FIG is a schematic cross-sectional view of a display substrate according to an embodiment of the present disclosure. Figure 5 As shown, the display substrate 10 further includes a thin film transistor layer 6 located between the second insulating layer 4 and the light-emitting component 5. The light-emitting component 5 includes a first electrode 51, a light-emitting layer (not shown), and a second electrode (not shown) arranged in sequence in a direction away from the base substrate 1. The orthographic projection of the transparent structure layer 2 on the base substrate 1 at least partially overlaps with the first electrode 51. The transparent structure layer 2 includes a transparent conductive material and forms a capacitor C2 with the first electrode 51. The capacitor can provide a constant electrical signal to ensure that the gate signal of the thin film transistor layer 6 remains unchanged.

[0094] like Figure 5As shown, illustratively, the thin film transistor layer 6 of the embodiment of the present disclosure includes a semiconductor layer 61, a gate insulating layer 62, a gate electrode 63, a first electrode 64, a second electrode 65 and an interlayer insulating layer 66. The semiconductor layer 61 is located on the side of the first insulating layer 3 facing away from the substrate 1, the gate insulating layer 62 is located on the side of the semiconductor layer 61 facing away from the substrate 1, the gate electrode 63 is located on the side of the gate insulating layer 62 facing away from the substrate 1, the interlayer insulating layer 66 is located on the side of the gate electrode 63 facing away from the substrate, the first electrode 64 and the second electrode 65 are located on the side of the interlayer insulating layer 66 facing away from the substrate 1, and the first electrode 64 and the second electrode 65 are connected to the conductive region of the semiconductor layer 61.

[0095] like Figure 5 As shown, the display substrate of the embodiment of the present disclosure further includes a passivation layer 7 (PVX layer) and a planarization layer 8 (resin layer). The passivation layer 7 is located on the side of the first electrode 64 and the second electrode 65 facing away from the base substrate 1, and the planarization layer 8 is located on the side of the passivation layer 7 facing away from the base substrate 1. The first electrode 51 is connected to the first electrode 64. The orthographic projection of the first electrode 51 on the base substrate 1 at least partially overlaps with the orthographic projection of the transparent structure layer 2 on the base substrate 1. The transparent structure layer 2 includes a transparent conductive material, and the transparent structure layer 2 and the first electrode 51 form a capacitor C2.

[0096] Figure 6 FIG. 1 is a schematic plan view of a display substrate of the related art. For example, Figure 6 As shown, the display substrate 10 includes a light-emitting area 10a and a pixel circuit area 10b. The pixel circuit area 10b includes a thin film transistor layer 6 and a storage capacitor. The storage capacitor includes a capacitor C1. Figure 1 and Figure 6 The two electrode plates of the capacitor C1 of the display substrate shown are the first electrode 51 and the transparent structure layer 2 respectively. The capacitance value of the capacitor C1 is proportional to the facing area of ​​the first electrode 51 and the transparent structure layer 2, and the capacitance value of the capacitor C1 is inversely proportional to the average distance between the first electrode 51 and the transparent structure layer.

[0097] Figure 7 FIG is a schematic plan view of a display substrate according to an embodiment of the present disclosure. Figure 7 As shown, the display substrate includes a light-emitting area 10a and a pixel circuit area 10b. The pixel circuit area 10b includes a thin film transistor layer 6 and a storage capacitor. The storage capacitor includes a capacitor C2. Figure 8 and Figure 6 The two electrode plates of the capacitor C2 of the display substrate shown are the first electrode 51 and the transparent structure layer 2 respectively. The capacitance value of the capacitor C2 is proportional to the facing area of ​​the first electrode 51 and the transparent structure layer 2, and the capacitance value of the capacitor C2 is inversely proportional to the average distance between the first electrode 51 and the transparent structure layer.

[0098] Figure 8 Schematic diagram of the dimensions of the pixel circuit area of ​​the embodiment of the present disclosure and the pixel circuit area of ​​the related art. Figure 8 The left side of the middle is a schematic diagram of the pixel circuit area size of the related technology. Figure 8 The right side of the figure is a schematic diagram of the pixel circuit area size of the embodiment of the present disclosure. Figure 8 As shown, when the size of the thin film transistor layer 6 remains unchanged, the average distance between the first electrode 51 and the transparent structure layer of the embodiment of the present disclosure is reduced, and when the capacitor C2 remains unchanged, the size of the capacitor C2 can be reduced. Figure 7 The pixel circuit area shown is relative to Figure 6 The size of the pixel circuit area shown can be reduced. Therefore, the display substrate of the embodiment of the present disclosure can increase the size of the display area and improve the resolution of the display substrate.

[0099] The display substrate of the embodiment of the present disclosure is configured such that the transparent structure layer 2 is arranged so that its orthographic projection on the base substrate 1 at least partially overlaps with the first electrode 51. The material of the transparent structure layer 2 includes a transparent conductive material, and the transparent structure layer 2 forms a capacitor with the first electrode 51. On the one hand, the transparent structure layer 2 is configured to include a first recessed portion 21 and a second recessed portion 22. The first light passes through the first sidewall layer 211 of the first recessed portion 21 to generate reflected light toward the second sidewall layer 212 and passes through the transparent structure layer 2 from the second sidewall layer 212, thereby avoiding the transparent structure layer 2 in the related art causing partial light reflection or total reflection to reduce light utilization and luminous efficiency, thereby improving the luminous efficiency of the luminous substrate and improving the display brightness of the luminous substrate. On the other hand, the capacitor formed by the transparent structure layer 2 of transparent conductive material and the first electrode 51 is due to the first recessed portion 21 and the second recessed portion 22 formed by the transparent structure layer 2. The average distance between the first electrode 51 and the transparent structure layer 2 is relatively large. Figure 1 In the related art shown, the average distance between the first electrode 51 and the transparent structure layer 2 is reduced, so that the size of the capacitor formed by the first electrode 51 and the transparent structure layer 2 can be reduced, which is beneficial to improving the resolution of the display substrate.

[0100] For example, a color filter layer may be provided between the passivation layer 7 and the planarization layer 8. The light emitting component 5 emits white light, and the display substrate is a WOLED. The color filter layer 9 may include a red filter portion, a green filter portion, and a blue filter portion.

[0101] Figure 9 The present disclosure also provides a method for preparing a display substrate, the method comprising the following steps:

[0102] S10 : forming a first insulating layer 3 on one side of the base substrate 1 , and forming a first pattern portion 31 on the first insulating layer 3 through a patterning process.

[0103] S20 : ​​forming a transparent structure layer 2 on a side of the first pattern portion 31 away from the base substrate 1 , so that the transparent structure layer 2 forms a preset structure.

[0104] S30 : forming a second insulating layer 4 on the side of the transparent structure layer 2 facing away from the base substrate 1 .

[0105] S40: A light-emitting component 5 is formed on a side of the second insulating layer 4 facing away from the base substrate 1. The transparent structure layer 2 is configured to allow at least a portion of the first light emitted by the light-emitting component 5 to pass therethrough. The transparent structure layer 2 is also configured to cause the first light to generate reflected light at the interface between the transparent structure layer 2 and the first pattern portion 31, which is emitted toward the center of the transparent structure layer 2 and passes through the transparent structure layer 2.

[0106] The display substrate formed by the method for preparing a display substrate according to the embodiment of the present disclosure can have a first pattern portion 31 formed by a first insulating layer 3, and then a transparent structure layer 2 is formed on the side of the first pattern portion 31 facing away from the base substrate 1, so that the first light can generate reflected light emitted toward the center of the transparent structure layer 2 at the interface between the transparent structure layer 2 and the first pattern portion 31 and pass through the transparent structure layer 2, thereby facilitating improvement in light extraction rate, light extraction efficiency, and product performance and competitiveness.

[0107] The following is an embodiment of the present disclosure Figure 6 The preparation process of the display substrate shown further illustrates the technical solution of the embodiment of the present disclosure, taking the light-emitting component as an OLED device as an example. It can be understood that the "patterning process" in the present disclosure, when the patterned material is an inorganic material or a metal layer, the "patterning process" may include processes such as coating photoresist, mask exposure, development, etching, and stripping photoresist. When the patterned material is an organic material (such as photoresist or organic resin), the "patterning process" may include processes such as mask exposure and development. The evaporation, deposition, coating, and coating in the present disclosure are all mature preparation processes in the relevant technology.

[0108] In step S10: a first insulating layer 3 is formed on one side of the base substrate 1, and a first pattern portion 31 is formed by a patterning process. This step may include depositing a first insulating film on one side of the base substrate 1, patterning the first insulating film, and forming a first pattern portion 31. Exemplarily, the first insulating layer 3 is an inorganic material, such as a silicon dioxide material. A halftone mask is used to prepare the first pattern portion 31, and the first pattern portion 31 includes a central area and an edge area. The first pattern portion 31 includes a second concave portion located in the central area and a first concave portion located in the edge area. A photoresist material is deposited on the side of the first insulating layer 3 away from the base substrate 1, and the photoresist material at the corresponding positions of the first concave portion and the second concave portion of the first pattern portion 31 is removed by a patterning process, and the first insulating layer 3 is etched by a dry etching process (Dry Etch) to form the first concave portion and the second concave portion to form the first pattern portion 31. As shown Figure 10 As shown, Figure 10 This is a cross-sectional schematic diagram after the first pattern portion is formed according to an embodiment of the present disclosure.

[0109] In step S20, a transparent structure layer 2 is formed on the side of the first insulating layer 3 facing away from the base substrate 1, so that the transparent structure layer 2 forms a preset structure. This step may include forming a transparent conductive material film on the side of the first pattern portion 31 of the first insulating layer 3 facing away from the base substrate 1, so that the transparent structure layer 2 forms a preset structure. Figure 11 As shown, Figure 11 This is a cross-sectional schematic diagram after forming a transparent structural layer according to an embodiment of the present disclosure.

[0110] In step S30, a second insulating layer 4 is formed on the side of the transparent structure layer 2 facing away from the base substrate 1. This step may include depositing a second insulating film on the side of the transparent structure layer 2 facing away from the base substrate 1, patterning the second insulating film to form a second insulating layer 4, and the second insulating layer 4 covers the transparent structure layer 2 to protect the transparent structure layer 2. Figure 12 As shown, Figure 12 This is a cross-sectional schematic diagram after the second insulating layer is formed according to an embodiment of the present disclosure.

[0111] In step S40, a light-emitting component 5 is formed on the side of the second insulating layer 4 facing away from the substrate 1. This step may include: forming a thin film transistor layer 6 before forming the light-emitting component 5; forming a semiconductor thin film on the side of the first insulating layer 3 facing away from the substrate 1; forming a semiconductor layer 61 through a patterning process; depositing an insulating thin film material layer on the side of the semiconductor layer 61 facing away from the substrate 1; forming a gate insulating layer 62 (GI layer) through a patterning process; depositing a metal thin film on the side of the gate insulating layer 62 facing away from the substrate 1 and forming a gate 63 through a patterning process; depositing an insulating material thin film on the side of the gate 63 facing away from the substrate and forming an interlayer insulating layer 66 (ILD layer) through a patterning process; depositing a metal thin film on the side of the interlayer insulating layer 66 facing away from the substrate and forming a first electrode 64 and a second electrode 65 through a patterning process; the first electrode 64 and the second electrode 65 are connected to the conductive region of the semiconductor layer 61. An insulating thin film material layer is deposited on the side of the first electrode 64 and the second electrode 65 facing away from the substrate 1, and a passivation layer 7 is formed by a patterning process. An insulating thin film material layer is deposited on the side of the passivation layer 7 facing away from the substrate 1, and a planarization layer 8 is formed by a patterning process. A metal thin film material layer is deposited on the side of the planarization layer 8 facing away from the substrate 1, and a first electrode 51 is formed by a patterning process. A light-emitting layer is formed on the side of the first electrode 51 facing away from the substrate, and a second electrode is formed on the side of the light-emitting layer facing away from the substrate. The first electrode 51 is connected to the first electrode 64, and the orthographic projection of the first electrode 51 on the substrate 1 at least partially overlaps with the orthographic projection of the transparent structure layer 2 on the substrate 1. The transparent structure layer 2 includes a transparent conductive material, and the transparent structure layer 2 and the first electrode 51 form a capacitor C2, as shown in FIG. Figure 8 shown.

[0112] For example, the first insulating layer 3 and the second insulating layer 4 may be made of any one or more of silicon oxide (SiOx), silicon nitride (SiNx), and silicon oxynitride (SiON), and may be a single layer, a multilayer, or a composite layer. The first insulating layer 3 may be called a buffer layer, which is used to improve the water and oxygen resistance of the substrate. The material of the transparent structural layer 2 may be, for example, indium tin oxide (ITO), zinc tin oxide (ZTO), zinc oxide, indium zinc oxide (IZO), gallium indium zinc oxide (GIZO), etc.

[0113] An embodiment of the present disclosure provides a display device, comprising a display substrate according to any one of the embodiments of the first aspect.

[0114] For example, the display device provided in the embodiments of the present disclosure can be any product or component with display and touch functions, such as a smart phone, a wearable smart watch, smart glasses, a tablet computer, a television, a monitor, a laptop computer, a digital photo frame, a navigation system, a car display, an e-book, a biometric device such as a smart skin device, a soft robot, and a biomedical device.

[0115] Other components of the display substrate and the display device in the above embodiment may adopt various technical solutions known to those skilled in the art now and in the future, and will not be described in detail here.

[0116] In the description of this specification, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present disclosure.

[0117] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features being referred to. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of such features. Throughout the present disclosure, "plurality" means two or more, unless otherwise specifically defined.

[0118] In this disclosure, unless otherwise expressly specified or limited, terms such as "mounted," "connected," "connect," and "fixed" should be understood broadly. For example, they may refer to fixed connections, detachable connections, or integration; mechanical connections, electrical connections, or communication; direct connections or indirect connections through an intermediate medium; and internal connections between two components or interactions between two components. Those skilled in the art will understand the specific meanings of these terms in this disclosure based on specific circumstances.

[0119] In the present disclosure, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0120] The disclosure above provides many different embodiments or examples for implementing different structures of the present disclosure. In order to simplify the present disclosure, the components and settings of specific examples are described above. Of course, these are merely examples and are not intended to limit the present disclosure. In addition, the present disclosure may repeat reference numbers and / or reference letters in different examples. Such repetition is for the purpose of simplicity and clarity and does not in itself indicate the relationship between the various embodiments and / or settings discussed.

[0121] The above are only specific embodiments of the present disclosure, but the scope of protection of the present disclosure is not limited thereto. Any person skilled in the art can easily conceive of various modifications or substitutions within the technical scope disclosed in this disclosure, and such modifications or substitutions should be included in the scope of protection of the present disclosure. Therefore, the scope of protection of the present disclosure should be based on the scope of protection of the claims.

Claims

1. A display substrate, characterized in that: It includes a base substrate, a first insulating layer, a transparent structural layer, a second insulating layer and a light-emitting component; The first insulating layer is located on one side of the base substrate, and the first insulating layer has a first pattern portion adapted to the transparent structure layer; The transparent structure layer is located on a side of the first pattern portion away from the base substrate, so that the transparent structure layer forms a preset structure; The second insulating layer is located on a side of the transparent structure layer away from the base substrate; as well as The light-emitting component is located on a side of the second insulating layer away from the base substrate; The transparent structural layer is configured to allow at least a portion of the first light emitted by the light-emitting component to pass therethrough, and the transparent structural layer is further configured to cause the first light to generate reflected light emitted toward the center of the transparent structural layer at an interface between the transparent structural layer and the first pattern portion and pass through the transparent structural layer. The transparent structure layer includes a central area and an edge area surrounding the central area, the transparent structure layer includes a first recessed portion located in the edge area, the first recessed portion is recessed toward the base substrate, the first recessed portion includes a first sidewall layer and a second sidewall layer, the first sidewall layer and the second sidewall layer are inclined relative to the plane of the base substrate and have opposite inclination directions, the first sidewall layer is farther away from the central area than the second sidewall layer, the first light passes through the first sidewall layer to generate reflected light toward the second sidewall layer, and then passes through the transparent structure layer from the second sidewall layer; The transparent structural layer includes a second recessed portion located in the central area, the second recessed portion is recessed in the direction close to the base substrate, the second recessed portion includes a third sidewall layer arranged along the edge of the central area, and the first light passes through the third sidewall layer to generate reflected light emitted toward the center and passes through the transparent structural layer.

2. The display substrate according to claim 1, wherein: The first sidewall layer and the second sidewall layer are inclined at an angle of 45° to 60° relative to the plane where the base substrate is located.

3. The display substrate according to claim 1, wherein The first recessed portion further includes a first bottom wall layer, two ends of the first bottom wall layer are connected to the first side wall layer and the second side wall layer, and the first bottom wall layer is arranged parallel to the plane where the base substrate is located.

4. The display substrate according to claim 1, wherein: The inclination angle of the third sidewall layer relative to the plane where the base substrate is located is 30°-35°.

5. The display substrate according to claim 1, wherein The second recessed portion further includes a second bottom wall layer, an edge of the second bottom wall layer is connected to an edge of the third side wall layer, and the second bottom wall layer is arranged parallel to the plane where the base substrate is located.

6. The display substrate according to claim 1, wherein: The refractive index of the transparent structure layer is greater than the refractive index of the first insulating layer, and the refractive index of the transparent structure layer is greater than the refractive index of the second insulating layer.

7. The display substrate according to claim 6, wherein: The refractive index of the first insulating layer, the refractive index of the second insulating layer, and the refractive index of the base substrate are the same, and the refractive index of the first insulating layer is 1.4-1.5; and / or The refractive index of the transparent structural layer is 1.5-1.

7.

8. The display substrate according to claim 1, wherein: The display substrate further includes a thin film transistor layer located between the second insulating layer and the light-emitting component, the light-emitting component including a first electrode, a light-emitting layer, and a second electrode sequentially arranged in a direction away from the base substrate, and the orthographic projection of the transparent structure layer on the base substrate at least partially overlaps with the first electrode. The transparent structure layer includes a transparent conductive material, and the transparent structure layer and the first electrode form a capacitor.

9. A method for preparing a display substrate, characterized in that: The method comprises: forming a first insulating layer on one side of the base substrate, and forming a first pattern portion through a patterning process; forming a transparent structure layer on a side of the first pattern portion facing away from the base substrate, so that the transparent structure layer forms a preset structure; forming a second insulating layer on a side of the transparent structure layer away from the base substrate; A light-emitting component is formed on a side of the second insulating layer facing away from the base substrate, the transparent structure layer is used to allow at least a portion of the first light emitted by the light-emitting component to pass through, and the transparent structure layer is further used to cause the first light to generate reflected light emitted toward the center of the transparent structure layer at an interface between the transparent structure layer and the first pattern portion and pass through the transparent structure layer; The transparent structure layer includes a central area and an edge area surrounding the central area, the transparent structure layer includes a first recessed portion located in the edge area, the first recessed portion is recessed toward the base substrate, the first recessed portion includes a first sidewall layer and a second sidewall layer, the first sidewall layer and the second sidewall layer are inclined relative to the plane of the base substrate and have opposite inclination directions, the first sidewall layer is farther away from the central area than the second sidewall layer, the first light passes through the first sidewall layer to generate reflected light toward the second sidewall layer, and then passes through the transparent structure layer from the second sidewall layer; The transparent structural layer includes a second recessed portion located in the central area, the second recessed portion is recessed in the direction close to the base substrate, the second recessed portion includes a third sidewall layer arranged along the edge of the central area, and the first light passes through the third sidewall layer to generate reflected light emitted toward the center and passes through the transparent structural layer.

10. A display device, characterized in that: The display substrate comprises the display substrate according to any one of claims 1 to 8.

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