一种使用气体测试流控部件Cv值的测试系统和测试方法
By developing a gas testing system and method, the problems of accuracy and equipment simplicity in Cv value testing of flow control components in the semiconductor industry have been solved. This has enabled high-precision measurement of small-sized flow control components and system simplification, allowing for the free discharge of gaseous media.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 星奇(上海)半导体有限公司
- Filing Date
- 2023-06-20
- Publication Date
- 2026-07-17
AI Technical Summary
In the semiconductor industry, existing technologies using liquid water to test the Cv value of flow control components produce inaccurate test data and require large equipment, resulting in large floor space and complex structures for the test system, which cannot meet the accuracy requirements of small-sized flow control components.
A gas testing system is adopted, including a gas source cylinder, test pipeline and thermometer. The Cv value of the gas is measured by the gas flow control component. The low temperature characteristics of the gas and the multi-functional branch pipe design improve the measurement accuracy and system simplicity.
It enables high-precision testing of small-sized flow control components. The system has a small footprint, simplifies equipment requirements, improves measurement accuracy, and allows for free discharge of gaseous media, making it simple and fast.
Smart Images
Figure CN116793652B_ABST