A semiconductor production wastewater purification treatment device
Through the combination of sedimentation tank and purification tank, combined with the secondary processor, reciprocating stirring assembly and flipping module, multi-stage purification of semiconductor production wastewater is achieved, which solves the problem of incomplete wastewater treatment in the existing technology and improves the purification efficiency and environmental protection effect.
Patent Information
- Application Number
- CN202311035995.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-08-17
- Publication Date
- 2025-09-12
- Estimated Expiration
- 2043-08-17
AI Technical Summary
Existing semiconductor production wastewater treatment methods are unable to carry out effective multi-stage treatment, resulting in a large amount of residual impurities and harmful substances in the water body, and direct discharge will cause pollution.
A combination of sedimentation tank and purification tank is used, combined with a secondary processor, a reciprocating stirring component and a turning module, to achieve deep purification of wastewater through multi-stage treatment methods such as sedimentation, filtration, stirring and turning.
It realizes multi-stage treatment of wastewater, effectively removes impurities and harmful substances, reduces pollution risks, and improves purification efficiency and effects.
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Figure CN116903066B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of wastewater purification and treatment, in particular to a semiconductor production wastewater purification and treatment device. Background Art
[0002] With the continuous development of science and technology and the progress of society, the application of semiconductors is increasing. Semiconductors refer to materials with electrical conductivity between conductors and insulators at room temperature. Semiconductors are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high-power power conversion, and other fields. The core units of most electronic products, such as computers, mobile phones, and digital recorders, are closely related to semiconductors. Common semiconductor materials include silicon, germanium, and gallium arsenide. Silicon is the most influential semiconductor material in various applications. The semiconductor production process generates a certain amount of wastewater, which is usually purified to avoid waste of resources.
[0003] At present, the existing semiconductor production wastewater is only treated by simple sedimentation and cannot be effectively treated at multiple levels. As a result, the water body still contains a large amount of residual impurities and harmful substances, making the wastewater treatment incomplete. Direct discharge will also cause certain pollution, which is not conducive to environmental protection. Summary of the Invention
[0004] To achieve the above objectives, the present invention is implemented through the following technical solutions: A semiconductor production wastewater purification treatment device, comprising:
[0005] The top of the purification tank is fixed and connected to a delivery pipe, and a pump body is installed on the top of the sedimentation tank. The end of the delivery pipe away from the top of the purification tank is fixed and connected to the output end of the pump body. The wastewater generated by semiconductor production is first injected into the sedimentation tank for preliminary sedimentation. The pump body can be used as a power to suck out the wastewater that has been precipitated in the sedimentation tank and transported to the purification tank through the delivery pipe. At this time, it can be processed again through the secondary processor;
[0006] Also includes:
[0007] A secondary processor, which has an elastic shrinkage piece fixed to the top of the inner surface of the purification tank, and the bottom end of the elastic shrinkage piece is fixedly connected to a semicircular frame, and the central position of the bottom of the inner surface of the semicircular frame is rotatably connected to an impeller, and the outer surface of the semicircular frame is fixedly connected to a debris removal filter, and the outer surface of the semicircular frame is fixedly connected to a driven gear near the bottom position. When the delivery pipe transports the wastewater into the purification tank, the wastewater will first fall onto the impeller. Under the impact of the fluid, the impeller rotates, and the falling wastewater is evenly spread to avoid concentrated flow. The spreading of the wastewater can also be used to reduce the impact force of the fluid. At the same time, the spread wastewater falls into the semicircular frame, and the residual impurities can be filtered in time through the debris removal filter, and the particulate impurities are then subjected to secondary treatment, thereby achieving the effect of graded treatment.
[0008] The reciprocating stirring assembly comprises a lifting column fixed to the top of the purification tank, and the output end of the lifting column is fixedly connected to a stirring plate, and an arc-shaped hole is opened on the outer surface of the stirring plate, and an auxiliary module is provided at the central position of the outer surface of the stirring plate, and a crescent block is fixedly connected to the edge of the outer surface of the stirring plate and close to the inner surface of the purification tank, and a ball is connected to the outer surface end of the crescent block and away from the side of the stirring plate for rolling. When the wastewater falls into the purification tank and the wastewater treatment agent is poured into the purification tank, the contraction and extension of the lifting column can be used to drive the stirring plate to move up and down reciprocatingly. At this time, part of the wastewater and treatment agent in the purification tank can pass through the arc-shaped hole, and combined with the stirring plate to stir the wastewater, the mixing of the wastewater and the treatment agent can be promoted, thereby helping to purify the wastewater. At the same time, when the stirring plate moves, the outer surface of the ball is in contact with the inner surface of the purification tank, so that the ball rolls, thereby making the stirring plate move smoothly as a whole, reducing the influence of external force or vibration.
[0009] Preferably, the bottom of the sedimentation tank is configured as a quadrangular pyramid, the output end of the pump body passes through the top of the sedimentation tank and extends to the interior, and the bottom of the pump body output end is close to the top of the quadrangular pyramid.
[0010] Preferably, the outer surface of the elastic shrinkage sheet is provided with a wavy surface, the elastic shrinkage sheet is evenly distributed on the top of the semicircular frame, and the impurity removal filter is evenly distributed on the outer surface of the semicircular frame.
[0011] Preferably, the arc-shaped holes are evenly distributed on the outer surface of the stirring plate, and a rolling groove adapted to the ball is provided at the end of the outer surface of the crescent block and away from the stirring plate, and the outer surface of the ball and away from the crescent block is in contact with the inner surface of the purification tank.
[0012] Preferably, the auxiliary module includes an elliptical tank, the outer surface of the elliptical tank is fixedly connected to the central position of the outer surface of the stirring plate, the inner central position of the elliptical tank is rotatably connected to a connecting shaft through a bracket, the outer surface of the connecting shaft is fixedly connected to a spiral blade, and the outer surface of the spiral blade is provided with a perforation. When the stirring plate moves up and down, part of the wastewater that needs to be purified in the purification tank enters from the port of the elliptical tank, and as the whole continues to move, the spiral blade is impacted by the wastewater, and combined with the connecting shaft that is rotatably connected to the inside of the elliptical tank through the bracket, the spiral blade rotates, and the wastewater in the elliptical tank will also pass through the perforation, further mixing the wastewater and promoting the fusion of the wastewater treatment agent and the wastewater.
[0013] Preferably, the top and bottom of the elliptical tank are both configured as bell mouths, and the perforations are evenly distributed on the outer surface of the spiral blades.
[0014] Preferably, an upper flip module is provided inside the purification tank and near the semicircular frame, and the upper flip module includes a first swing plate, the top of the first swing plate is hinged to the inner surface of the purification tank, the outer surface of the first swing plate is fixedly connected to the upper flip plate, the bottom end of the first swing plate is fixedly connected to the first cylindrical head, the outer surface of the first swing plate and the position close to the upper flip plate are fixedly connected to the U-shaped ejecting piece, and the outer surface of the first swing plate and the position close to the U-shaped ejecting piece are fixedly connected to the return bending spring. When the stirring plate moves upward, the first cylindrical head and the stirring plate are used to rotate, and the stirring plate moves upward continuously. The top of the U-shaped pusher pushes the driven tooth upward, and the elastic force provided by the elastic contraction piece is used to compress the elastic contraction piece, and then the impurity removal filter screen is driven to shake through the semicircular frame, so that impurities attached to the inner surface of the impurity removal filter screen fall off, and clogging is less likely to occur, thereby improving the impurity removal efficiency.
[0015] Preferably, the top end of the return spring is fixedly connected to the inner surface of the purification tank, the return spring is arranged in an arc shape, and the center of the return spring coincides with the top hinge point of the first swing plate.
[0016] Preferably, a lower flip module is provided inside the purification tank near the bottom, and the lower flip module includes a second swing plate, the bottom of the second swing plate is hinged to the inner surface of the purification tank, the outer surface of the second swing plate is fixedly connected to the lower flip plate, the top of the second swing plate is fixedly connected to the second cylindrical head, and the outer surface of the second swing plate and the position near the lower flip plate are fixedly connected to an elastic telescopic rod. When the stirring plate moves downward, the second cylindrical head is pressed downward by the stirring plate, and combined with the bottom of the second swing plate and the inner surface of the purification tank is hinged, at this time, after the second swing plate is pressed, it will drive the lower flip plate to rotate. At this time, the symmetrical lower flip plates on both sides will rotate together and drive the wastewater inside the purification tank near the bottom, so that the wastewater and wastewater treatment agent in the purification tank are not prone to local unevenness. At the same time, as the second swing plate rotates, a pressing force will be applied to the elastic telescopic rod, and the elastic force of the elastic telescopic rod can be used to make the elastic telescopic rod shrink, thereby facilitating the second swing plate to drive the lower flip plate to rotate, and it is not easy to get stuck.
[0017] Preferably, two groups of the lower flip modules are provided, and the two groups of lower flip modules are symmetrically arranged along the central position of the purification tank, and the second swing plate and the lower flip plate are both arranged in an arc shape.
[0018] The present invention provides a semiconductor production wastewater purification and treatment device. It has the following beneficial effects:
[0019] 1. This semiconductor production wastewater purification and treatment device pours the wastewater treatment agent into the purification tank. At this time, the contraction and extension of the lifting column can drive the stirring plate to move up and down. At this time, some of the wastewater and treatment agent in the purification tank can pass through the arc-shaped hole. Combined with the stirring of the wastewater by the stirring plate, it can promote the mixing of the wastewater and treatment agent, thereby helping to purify the wastewater. At the same time, when the stirring plate moves, the balls roll, thereby making the stirring plate as a whole move smoothly, reducing the impact of external forces or vibrations.
[0020] 2. In the semiconductor production wastewater purification and treatment device, the wastewater will first fall onto the impeller. Under the impact of the fluid, the impeller will rotate, and then the falling wastewater will be evenly spread to avoid concentrated flow. The spreading of the wastewater can also be used to reduce the impact force of the fluid. At the same time, the spread wastewater falls into the semicircular frame, and the remaining impurities can be filtered in time through the impurity removal filter, and the particulate impurities can be treated for the second time to achieve graded treatment.
[0021] 3. In the semiconductor production wastewater purification and treatment device, when the stirring plate moves up and down reciprocatingly, part of the wastewater that needs to be purified in the purification tank enters from the port of the elliptical tank, causing the spiral blades to be impacted by the wastewater. At this time, the spiral blades rotate, and the wastewater in the elliptical tank will also pass through the perforations, further mixing the wastewater and promoting the fusion of the wastewater treatment agent and the wastewater.
[0022] 4. In the semiconductor production wastewater purification and treatment device, as the stirring plate continuously moves upward, the first swing plate is subjected to an upward pushing force. At this time, the first swing plate drives the upper flip plate to rotate upward. At this time, the rotating upper flip plate flips the wastewater in the purification tank. At the same time, the U-shaped ejector also rotates upward with the upper flip plate. At this time, the top of the U-shaped ejector pushes the driven tooth upward, and uses the elastic force provided by the elastic shrinkage plate to compress the elastic shrinkage plate, and then drives the impurity removal filter to shake through the semicircular frame, so that impurities attached to the inner surface of the impurity removal filter fall off, and thus clogging is less likely to occur.
[0023] 5. The semiconductor production wastewater purification and treatment device uses a stirring plate to move downward. At this time, when the second swing plate is pressed, it will drive the lower flip plate to rotate. At this time, the symmetrical lower flip plates on both sides will rotate together and drive the wastewater inside the purification tank and near the bottom, so that the wastewater and wastewater treatment agent in the purification tank are less likely to have local unevenness. At the same time, as the second swing plate rotates, it will apply pressing pressure to the elastic telescopic rod, causing the elastic telescopic rod to contract, thereby facilitating the second swing plate to drive the lower flip plate to rotate, and it is less likely to get stuck. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] Figure 1 This is a schematic diagram of the overall structure of the semiconductor production wastewater purification treatment device of the present invention;
[0025] Figure 2 This is a schematic cross-sectional view of a semiconductor production wastewater purification and treatment device according to the present invention;
[0026] Figure 3 This is a schematic diagram of the overall structure of the secondary processor of the present invention;
[0027] Figure 4 This is a schematic diagram of the overall structure of the reciprocating stirring assembly of the present invention;
[0028] Figure 5 For the present invention Figure 4 A partial enlarged view of the middle part;
[0029] Figure 6 This is a schematic cross-sectional structural diagram of the auxiliary module of the present invention;
[0030] Figure 7 This is a schematic diagram of the overall structure of the flip module of the present invention;
[0031] Figure 8 This is a schematic diagram of the overall structure of the lower flip module of the present invention.
[0032] In the figure: 1. Sedimentation tank; 2. Purification tank; 3. Delivery pipe; 4. Pump body; 5. Secondary processor; 6. Reciprocating stirring assembly; 7. Upper flip module; 8. Lower flip module; 51. Elastic shrinkage plate; 52. Semicircular frame; 53. Impeller; 54. Debris removal filter; 55. Driven gear; 61. Lifting column; 62. Stirring plate; 63. Arc hole; 64. Auxiliary module; 65. Crescent block; 66. Ball; 641. Elliptical tank; 642. Connecting shaft; 643. Spiral blade; 644. Perforation; 71. First swing plate; 72. Upper flip plate; 73. First cylindrical head; 74. U-shaped ejector; 75. Return spring; 81. Second swing plate; 82. Lower flip plate; 83. Second cylindrical head; 84. Elastic telescopic rod. DETAILED DESCRIPTION
[0033] The present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments. The embodiments of the present invention are provided for purposes of illustration and description and are not intended to be exhaustive or to limit the invention to the disclosed forms. Many modifications and variations will be apparent to those skilled in the art. The embodiments are chosen and described to better illustrate the principles of the invention and its practical application, and to enable those skilled in the art to understand the invention and design various embodiments with various modifications suitable for specific applications.
[0034] The first embodiment, as Figure 1-Figure 3 As shown, the present invention provides a technical solution: a semiconductor production wastewater purification treatment device, comprising:
[0035] Sedimentation tank 1 and purification tank 2, the top of the purification tank 2 is fixed and connected with a delivery pipe 3, a pump body 4 is installed on the top of the sedimentation tank 1, and the end of the delivery pipe 3 away from the top of the purification tank 2 is fixed and connected with the output end of the pump body 4. Wastewater generated by semiconductor production is first injected into the sedimentation tank 1 for preliminary sedimentation, and the pump body 4 can be used as a power to suck out the wastewater that has been precipitated in the sedimentation tank 1, and the wastewater is transported to the purification tank 2 through the delivery pipe 3;
[0036] Also includes:
[0037] The secondary processor 5 has an elastic shrinkage piece 51 fixed to the top of the inner surface of the purification tank 2, and the bottom end of the elastic shrinkage piece 51 is fixedly connected to a semicircular frame 52. The central position of the bottom inner surface of the semicircular frame 52 is rotatably connected to an impeller 53. When the delivery pipe 3 transports the wastewater into the purification tank 2, the wastewater will first fall onto the impeller 53. Under the impact of the fluid, the impeller 53 rotates, thereby evenly spreading the falling wastewater to avoid concentrated flow. The spreading of the wastewater can also be used to reduce the impact force of the fluid. The outer surface of the semicircular frame 52 is fixedly connected to a debris removal filter 54. At the same time, the scattered wastewater falls into the semicircular frame 52 and can be filtered in time by the debris removal filter 54 for residual impurities, thereby further processing the particulate impurities, thereby achieving the effect of graded treatment. The outer surface of the semicircular frame 52 and near the bottom position are fixedly connected to a driven tooth 55;
[0038] The bottom of the sedimentation tank 1 is set to a quadrangular pyramid shape, which is convenient for gathering the debris precipitated in the wastewater. The output end of the pump body 4 passes through the top of the sedimentation tank 1 and extends to the inside. The bottom of the output end of the pump body 4 is close to the top of the quadrangular pyramid, which is convenient for sucking out the precipitated wastewater.
[0039] The outer surface of the elastic shrinkage piece 51 is provided with a wavy surface to facilitate the elastic extension and contraction of the elastic shrinkage piece 51 after being subjected to force. The elastic shrinkage piece 51 is evenly distributed on the top of the semicircular frame 52, and the impurity removal filter 54 is evenly distributed on the outer surface of the semicircular frame 52.
[0040] The second embodiment, as Figure 4-Figure 6 As shown, the reciprocating stirring assembly 6 has a lifting column 61 fixed on the top of the purification tank 2. The lifting column 61 can be a columnar mechanism that can be retracted and extended. It is an existing technology. When the wastewater falls into the purification tank 2 and the wastewater treatment agent is poured into the purification tank 2, the lifting column 61 is retracted and extended. The output end of the lifting column 61 is fixedly connected to the stirring plate 62. The lifting column 61 can be used to drive the stirring plate 62 to move up and down. The outer surface of the stirring plate 62 is provided with an arc hole 63. At this time, part of the wastewater and treatment agent in the purification tank 2 can pass through the arc hole 63 and combine with the stirring plate 62. The stirring of the wastewater by the stirring plate 62 can promote the mixing of the wastewater and the treatment agent, thereby helping to purify the wastewater. An auxiliary module 64 is provided at the central position of the outer surface of the stirring plate 62. A crescent block 65 is fixedly connected to the edge of the outer surface of the stirring plate 62 and close to the inner surface of the purification tank 2. A ball 66 is rollingly connected to the end of the outer surface of the crescent block 65 and the side away from the stirring plate 62. At the same time, when the stirring plate 62 moves, the outer surface of the ball 66 is in contact with the inner surface of the purification tank 2, so that the ball 66 rolls, thereby making the stirring plate 62 move smoothly as a whole, reducing the influence of external force or vibration.
[0041] The arc-shaped holes 63 are evenly distributed on the outer surface of the stirring plate 62, so that the wastewater in the purification tank 2 can pass through quickly. The outer surface end of the crescent block 65 and the side away from the stirring plate 62 are provided with a rolling groove adapted to the ball 66, which facilitates the rolling of the ball 66. The outer surface of the ball 66 and the side away from the crescent block 65 are in contact with the inner surface of the purification tank 2, so that the ball 66 can roll with the crescent block 65, and rolling friction is adopted to reduce friction.
[0042] The auxiliary module 64 includes an elliptical tank 641, the outer surface of which is fixedly connected to the central position of the outer surface of the stirring plate 62. When the stirring plate 62 moves back and forth up and down, part of the wastewater that needs to be purified in the purification tank 2 enters from the port of the elliptical tank 641. The inner central position of the elliptical tank 641 is rotatably connected to a connecting shaft 642 through a bracket. The outer surface of the connecting shaft 642 is fixedly connected to a spiral blade 643, and as the whole continues to move, the spiral blade 643 is impacted by the wastewater, and combined with the connecting shaft 642, the interior of the elliptical tank 641 is rotatably connected through a bracket. At this time, the spiral blade 643 rotates, and a perforation 644 is provided on the outer surface of the spiral blade 643. The wastewater in the elliptical tank 641 will also pass through the perforation 644, further mixing the wastewater and promoting the fusion of the wastewater treatment agent and the wastewater.
[0043] The top and bottom of the elliptical tank 641 are both configured as bell mouths, which can increase the water intake of the elliptical tank 641 . The perforations 644 are evenly distributed on the outer surface of the spiral blades 643 , making it easier for wastewater to pass through the perforations 644 .
[0044] The third embodiment, as Figure 4-Figure 8 As shown, based on the second embodiment,
[0045] The top of the first swing plate 71 is hinged to the inner surface of the purification tank 2, and the outer surface of the first swing plate 71 is fixedly connected to the upper flip plate 72. The bottom end of the first swing plate 71 is fixedly connected to the first cylindrical head 73. When the stirring plate 62 moves upward, the first cylindrical head 73 and the stirring plate 62 are used, and as the stirring plate 62 moves upward, the top of the first swing plate 71 is hinged to the inner surface of the purification tank 2, so that the first swing plate 71 is subjected to an upward push. At this time, the first swing plate 71 drives the upper flip plate 72 to rotate upward. At this time, the rotating upper flip plate 72 The plate 72 flips the waste water in the purification tank 2. The outer surface of the first swing plate 71 and the position close to the upper flip plate 72 are fixedly connected to a U-shaped push piece 74. At the same time, the U-shaped push piece 74 will also rotate upward with the upper flip plate 72. At this time, the top of the U-shaped push piece 74 pushes the driven tooth 55 upward, and uses the elastic force provided by the elastic shrinkage piece 51 to compress the elastic shrinkage piece 51, and then drives the impurity removal filter 54 to shake through the semicircular frame 52, so that impurities attached to the inner surface of the impurity removal filter 54 fall off, and thus clogging is less likely to occur, so that the impurity removal efficiency is good. The outer surface of the first swing plate 71 and the position close to the U-shaped push piece 74 are fixedly connected to a reset spring 75 to provide elastic force.
[0046] The top end of the return spring 75 is fixedly connected to the inner surface of the purification tank 2, so that the return spring 75 can be compressed when the first swing plate 71 rotates. The return spring 75 is arranged in an arc shape, and the center of the return spring 75 coincides with the top hinge point of the first swing plate 71, so that the return spring 75 will not be skewed when compressed.
[0047] A lower flip module 8 is provided inside the purification tank 2 and near the bottom. The lower flip module 8 includes a second swing plate 81. The bottom of the second swing plate 81 is hinged to the inner surface of the purification tank 2. The outer surface of the second swing plate 81 is fixedly connected to a lower flip plate 82. The top of the second swing plate 81 is fixedly connected to a second cylindrical head 83. When the stirring plate 62 moves downward, the second cylindrical head 83 is pressed downward by the stirring plate 62. Combined with the fact that the bottom of the second swing plate 81 is hinged to the inner surface of the purification tank 2, the second swing plate 81 is pressed, which drives the lower flip plate 82 to rotate. When the second swing plate 81 is in motion, the symmetrical lower flip plates 82 on both sides will rotate together and drive the wastewater inside the purification tank 2 and near the bottom, so that the wastewater and wastewater treatment agent in the purification tank 2 are not prone to local unevenness. The outer surface of the second swing plate 81 and the position near the lower flip plate 82 are fixedly connected to the elastic telescopic rod 84. At the same time, as the second swing plate 81 rotates, a pressing force is applied to the elastic telescopic rod 84, and the elastic force of the elastic telescopic rod 84 can be used to shrink the elastic telescopic rod 84, thereby facilitating the second swing plate 81 to drive the lower flip plate 82 to rotate, and it is not easy to get stuck.
[0048] There are two groups of lower flip modules 8, and the two groups of lower flip modules 8 are symmetrically arranged along the center of the purification tank 2, so that they can rotate together using the lower flip plate 82. The second swing plate 81 and the lower flip plate 82 on both sides are both arranged to be arc-shaped.
[0049] The elastic telescopic rod 84 is set to an arc shape, and the center of the elastic telescopic rod 84 coincides with the intersection point of the bottom of the second swing plate 81. When the elastic telescopic rod 84 is pressed, it elastically contracts. When the pressure disappears, the elastic force of the elastic telescopic rod 84 itself can be used to apply a reverse force to the second swing plate 81, and then the lower flip plate 82 can be pushed in the opposite direction through the second swing plate 81 to reset in time, making it convenient for subsequent pressing and rotation.
[0050] Obviously, the embodiments described are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field and related fields without making creative efforts should fall within the scope of protection of the present invention. Structures, devices, and operating methods not specifically described and explained in the present invention shall be implemented in accordance with conventional means in the field unless otherwise specified or limited.
Claims
1. A semiconductor production wastewater purification treatment device, comprising: A sedimentation tank (1) and a purification tank (2), wherein the top of the purification tank (2) is fixed and connected to a delivery pipe (3), and a pump body (4) is installed on the top of the sedimentation tank (1), and an end of the delivery pipe (3) away from the top of the purification tank (2) is fixed to and connected to the output end of the pump body (4); It is characterized by further comprising: A secondary processor (5), the secondary processor (5) having an elastic shrinkage sheet (51) fixed to the top of the inner surface of the purification tank (2), and a semicircular frame (52) fixedly connected to the bottom end of the elastic shrinkage sheet (51), and an impeller (53) rotatably connected to the center of the bottom of the inner surface of the semicircular frame (52), and a debris removal filter (54) fixedly connected to the outer surface of the semicircular frame (52), and a driven tooth (55) fixedly connected to the outer surface of the semicircular frame (52) near the bottom; A reciprocating stirring assembly (6), the reciprocating stirring assembly (6) having a lifting column (61) fixed to the top of the purification tank (2), and a stirring plate (62) fixedly connected to the output end of the lifting column (61), an arc-shaped hole (63) being provided on the outer surface of the stirring plate (62), an auxiliary module (64) being provided at the central position of the outer surface of the stirring plate (62), a crescent block (65) being fixedly connected to the edge of the outer surface of the stirring plate (62) and close to the inner surface of the purification tank (2), and a ball (66) being rollingly connected to the end of the outer surface of the crescent block (65) and away from the stirring plate (62); The auxiliary module (64) comprises an elliptical tank (641), the outer surface of the elliptical tank (641) being fixedly connected to the central position of the outer surface of the stirring plate (62), the inner central position of the elliptical tank (641) being rotatably connected to a connecting shaft (642) via a bracket, the outer surface of the connecting shaft (642) being fixedly connected to a spiral blade (643), and the outer surface of the spiral blade (643) being provided with a perforation (644); An upper flip module (7) is provided inside the purification tank (2) and near the semicircular frame (52). The upper flip module (7) comprises a first swing plate (71). The top of the first swing plate (71) is hinged to the inner surface of the purification tank (2). The outer surface of the first swing plate (71) is fixedly connected to the upper flip plate (72). The bottom end of the first swing plate (71) is fixedly connected to a first cylindrical head (73). The outer surface of the first swing plate (71) and a position near the upper flip plate (72) are fixedly connected to a U-shaped ejector (74). The outer surface of the first swing plate (71) and a position near the U-shaped ejector (74) are fixedly connected to a return spring (75).
2. The semiconductor production wastewater purification treatment device according to claim 1, characterized in that: The bottom of the sedimentation tank (1) is configured as a quadrangular pyramid, the output end of the pump body (4) passes through the top of the sedimentation tank (1) and extends to the inside, and the bottom of the output end of the pump body (4) is close to the top of the quadrangular pyramid.
3. The semiconductor production wastewater purification treatment device according to claim 1, characterized in that: The outer surface of the elastic shrinkage sheet (51) is provided with a wavy curved surface, the elastic shrinkage sheet (51) is evenly distributed on the top of the semicircular frame (52), and the impurity removal filter (54) is evenly distributed on the outer surface of the semicircular frame (52).
4. The semiconductor production wastewater purification treatment device according to claim 1, characterized in that: The arc-shaped holes (63) are evenly distributed on the outer surface of the stirring plate (62). A rolling groove adapted to the ball (66) is provided at the outer surface end of the crescent block (65) and away from the stirring plate (62). The outer surface of the ball (66) and away from the crescent block (65) is in contact with the inner surface of the purification tank (2).
5. The semiconductor production wastewater purification treatment device according to claim 1, characterized in that: The top and bottom of the elliptical tank (641) are both configured as bell mouths, and the perforations (644) are evenly distributed on the outer surface of the spiral blade (643).
6. The semiconductor production wastewater purification treatment device according to claim 1, characterized in that: The top end of the return spring (75) is fixedly connected to the inner surface of the purification tank (2), and the return spring (75) is arranged in an arc shape, and the center of the return spring (75) coincides with the top hinge point of the first swing plate (71).
7. The semiconductor production wastewater purification treatment device according to claim 1, characterized in that: A lower flip module (8) is provided inside the purification tank (2) and near the bottom thereof. The lower flip module (8) comprises a second swing plate (81). The bottom of the second swing plate (81) is hinged to the inner surface of the purification tank (2). The outer surface of the second swing plate (81) is fixedly connected to a lower flip plate (82). The top end of the second swing plate (81) is fixedly connected to a second cylindrical head (83). An elastic telescopic rod (84) is fixedly connected to the outer surface of the second swing plate (81) and near the lower flip plate (82).
8. The semiconductor production wastewater purification treatment device according to claim 7, characterized in that: Two groups of the lower flip modules (8) are provided, and the two groups of lower flip modules (8) are symmetrically arranged along the central position of the purification tank (2), and the second swing plate (81) and the lower flip plate (82) are both arranged in an arc shape.
Citation Information
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