An ultrapure water system for semiconductor workshops

Abstract

The present invention discloses an ultrapure water system for a semiconductor workshop, comprising an air filter mechanism, one side of the air filter mechanism is connected to an oxygen injection mechanism, the bottom end of the oxygen injection mechanism is provided with a base frame, and the oxygen injection mechanism is provided with an oxygen dissolving mechanism; the oxygen injection mechanism comprises a first three-way pipe, and the oxygen injection mechanism is connected to the air filter mechanism through the first three-way pipe, the two output ends of the first three-way pipe are respectively provided with a first solenoid valve, and the two output ends of the first three-way pipe are respectively tightly connected to a sealed liquid storage tank, the same side inner wall of the two sealed liquid storage tanks is respectively provided with a drain port, and each drain port is respectively provided with a second solenoid valve, and the inner wall of the opposite side of the two sealed liquid storage tanks is respectively interspersed with a plurality of oxygen injection heads, and the plurality of oxygen injection heads are divided into two groups, and each group of oxygen injection heads is respectively connected to a ventilation main pipe. The ultrapure water system for a semiconductor workshop disclosed by the present invention has the effect of accurately controlling the oxygen content in ultrapure water during the treatment process of flowing water.

Description

Technical Field

[0001] The present invention relates to the technical field of ultrapure water treatment, in particular to an ultrapure water system for a semiconductor workshop. Background Art

[0002] The semiconductor chip manufacturing process has extremely strict requirements on water quality. The quality of pure water has a great impact on the performance, quality and yield of semiconductor chips.

[0003] Ultrapure water, also known as UP water, refers to water with a resistivity of 18 MΩ*cm (at 25°C). This water contains virtually no impurities other than water molecules, including bacteria, viruses, organic matter like chlorinated dioxins, and, of course, essential minerals and trace elements. It can be used in the preparation of ultrapure materials (such as semiconductor components and nano-fine ceramics) using distillation, deionization, reverse osmosis, or other appropriate supercritical fine technology.

[0004] Semiconductor chips also require a certain level of oxygen in ultrapure water, so its oxygen content must be controlled during the ultrapure water processing process. The typical control method uses a degassing membrane to remove oxygen from the water, but this control relies on retaining some oxygen to keep the oxygen content within a certain range. As a result, oxygen content control is not very precise. Summary of the Invention

[0005] The invention discloses an ultrapure water system for a semiconductor workshop, aiming to solve the technical problem that the control of the oxygen content in ultrapure water is not very precise.

[0006] In order to achieve the above object, the present invention adopts the following technical solutions:

[0007] An ultrapure water system for a semiconductor workshop comprises an air filter mechanism, one side of the air filter mechanism is connected to an oxygen injection mechanism, a bottom end of the oxygen injection mechanism is provided with a base frame, and an oxygen dissolving mechanism is provided on the oxygen injection mechanism;

[0008] The oxygen injection mechanism includes a first three-way pipe, and the oxygen injection mechanism is connected to the air filtering mechanism through the first three-way pipe. The two output ends of the first three-way pipe are respectively provided with a first solenoid valve, and the two output ends of the first three-way pipe are respectively tightly connected to the sealed liquid storage bins. The inner walls on the same side of the two sealed liquid storage bins are respectively provided with drain outlets, and each drain outlet is respectively provided with a second solenoid valve. The inner walls on the opposite sides of the two sealed liquid storage bins are respectively interspersed with multiple oxygen injection heads, and the multiple oxygen injection heads are divided into two groups, each group of oxygen injection heads is respectively connected to a ventilation main pipe, and the two ventilation main pipes are simultaneously connected to the oxygen injection machine through the second three-way pipe, and the two ventilation main pipes are respectively provided with a third solenoid valve, and the top inner wall of each sealed liquid storage bin is respectively fitted with an induction plate.

[0009] By providing an oxygen injection mechanism and an air filtering mechanism, the filtered water passes into the air filtering mechanism, and after the air inside the water is filtered out, it passes into the oxygen injection mechanism. During the process, the water is sequentially injected into the two sealed liquid storage tanks by switching the first solenoid valve. The water stops when the water surface contacts the induction plate, and the other sealed liquid storage tank is switched for use. Oxygen is injected into the two sealed liquid storage tanks by multiple oxygen injection heads through the oxygen injection machine. Since the space of the sealed liquid storage tank is fixed, the oxygen content in the ultrapure water can be accurately controlled by adjusting the oxygen injection amount of the oxygen injection machine. Therefore, the oxygen content in the ultrapure water can be accurately controlled during the treatment of flowing water.

[0010] In a preferred embodiment, the dissolved oxygen mechanism includes an ultrasonic generator, which is fixed on the base frame at the same time. The ultrasonic generator is connected to multiple ultrasonic vibration heads and the multiple ultrasonic vibration heads are respectively fixed on the inner walls of the same side of the two sealed liquid storage tanks. The top inner wall of each of the sealed liquid storage tanks is respectively fitted with a heat conduction plate and the induction plate is located in the middle position of the heat conduction plate. The top outer wall of the heat conduction plate is fitted with a heat sink. The top of each of the sealed liquid storage tanks is respectively provided with a square hole, and the heat sink passes through the square hole. The top of the base frame is provided with multiple duct fans and the air outlets of the duct fans correspond to the positions of the heat sinks. The bottom inner wall of each sealed liquid storage tank is respectively provided with a heating plate.

[0011] By providing a dissolved oxygen mechanism, when the oxygen injection mechanism injects oxygen into the water, based on the principle that the density of hot water is less than that of cold water, the water in the sealed liquid storage tank forms an up and down cyclic displacement and synchronous oscillation, thereby effectively improving the dissolved oxygen efficiency during oxygen injection.

[0012] In a preferred embodiment, the air filtering mechanism includes a closed outer shell and a plurality of negative pressure suction devices are fixedly connected to the top inner wall of the closed outer shell, a degassing membrane group is arranged inside the closed outer shell, and the degassing membrane group is arranged in a vortex shape, the inner wall on one side of the degassing membrane group is tightly connected to a multi-way liquid injection tube and the multi-way liquid injection tube passes through the closed outer shell, the inner wall on the other side of the degassing membrane group is tightly connected to a multi-way liquid outlet tube and the multi-way liquid outlet tube is connected to the first three-way tube, the degassing membrane group includes a flexible support frame and the flexible support frame is wrapped with a degassing membrane, the wrapped degassing membrane is in a hollow state, a plurality of partition membranes are arranged with equal density between the degassing membranes, and the plurality of partition membranes are respectively provided with notches, and the plurality of notches are staggered up and down.

[0013] By providing an air filtering mechanism, since the degassing membrane group is arranged in a vortex shape, when water passes into the degassing membrane group, it is ensured that the water in the degassing membrane group can be evenly spread and filled in the degassing membrane group. When the air in the water is filtered out by the degassing membrane under the action of the negative pressure aspirator, this structure can ensure the synchronous air filtration of the flowing water, improve its filtration efficiency and complete filtration of the air, and further ensure the precise control of the oxygen content in the oxygen injection mechanism.

[0014] As can be seen from the above, the semiconductor workshop ultrapure water system provided by the present invention has the technical effect of accurately controlling the oxygen content in ultrapure water during the treatment process of flowing water. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 This is a schematic diagram of the three-dimensional structure of an ultrapure water system for a semiconductor workshop proposed by the present invention.

[0016] Figure 2 This is a schematic diagram of the internal structure of the air filtering structure proposed in the present invention.

[0017] Figure 3 This is a schematic diagram of the expanded structure of the air filtering mechanism proposed in the present invention.

[0018] Figure 4 This is a schematic diagram of the appearance and structure of the oxygen dissolving mechanism and oxygen injection mechanism proposed in the present invention.

[0019] Figure 5 This is a schematic diagram of the disassembled structure of the oxygen injection mechanism proposed in the present invention.

[0020] Figure 6 This is a cross-sectional view of the dissolved oxygen mechanism proposed in the present invention.

[0021] In the figure: 1. air filtering mechanism; 2. oxygen injection mechanism; 3. dissolved oxygen mechanism; 4. oxygen injection machine; 5. base frame; 101. closed outer shell; 102. multi-way liquid injection pipe; 103. negative pressure suction device; 104. degassing membrane group; 105. multi-way liquid outlet pipe; 106. flexible support frame; 107. degassing membrane; 108. partition membrane; 109. notch; 201. first three-way pipe; 202. first solenoid valve; 203. sealed liquid storage tank; 204. second solenoid valve; 205. drain outlet; 206. oxygen injection head; 207. ventilation main pipe; 208. third solenoid valve; 209. second three-way pipe; 210. induction plate; 301. square hole; 302. heat sink; 303. fan; 304. ultrasonic vibration head; 305. ultrasonic generator; 306. heat conduction plate; 307. heating plate. DETAILED DESCRIPTION

[0022] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0023] Reference Figure 1 、 Figure 4 and Figure 5 The present embodiment provides an ultrapure water system for a semiconductor workshop, comprising an air filter mechanism 1, one side of which is connected to an oxygen injection mechanism 2, a bottom end of which is provided with a base frame 5, and an oxygen dissolving mechanism 3 is provided on the oxygen injection mechanism 2.

[0024] Among them, the oxygen injection mechanism 2 includes a first three-way pipe 201 and the oxygen injection mechanism 2 is connected to the air filtering mechanism 1 through the first three-way pipe 201, the two output ends of the first three-way pipe 201 are respectively provided with a first solenoid valve 202, and the two output ends of the first three-way pipe 201 are respectively tightly connected to the sealed liquid storage tank 203, the inner walls of the same side of the two sealed liquid storage tanks 203 are respectively provided with a drain port 205, and each drain port 205 is respectively provided with a second solenoid valve 204, the inner walls of the opposite sides of the two sealed liquid storage tanks 203 are respectively interspersed with a plurality of oxygen injection heads 206, and the plurality of oxygen injection heads 206 are divided into two groups, each group of oxygen injection heads 206 is respectively connected to a ventilation main pipe 207, the two ventilation main pipes 207 are simultaneously connected to the oxygen injection machine 4 through a second three-way pipe 209, and the two ventilation main pipes 207 are respectively provided with a third solenoid valve 208, and the top inner wall of each sealed liquid storage tank 203 is respectively attached to an induction plate 210.

[0025] Reference Figure 5 In a preferred embodiment, the dissolved oxygen mechanism 3 includes an ultrasonic generator 305, which is also fixed on the base frame 5. The ultrasonic generator 305 is also connected to multiple ultrasonic vibration heads 304, and the multiple ultrasonic vibration heads 304 are respectively fixed on the inner walls of the same side of the two sealed liquid storage tanks 203.

[0026] Reference Figure 6 In a preferred embodiment, the top inner wall of each sealed liquid storage tank 203 is respectively attached with a heat conducting plate 306 and the sensing plate 210 is located in the middle of the heat conducting plate 306 , and the top outer wall of the heat conducting plate 306 is attached with a heat sink 302 .

[0027] Reference Figure 4 and Figure 6 In a preferred embodiment, a square hole 301 is provided at the top of each sealed liquid storage tank 203 and a heat sink 302 passes through the square hole 301, a plurality of guide fans 303 are provided at the top of the base frame 5 and the air outlets of the guide fans 303 correspond to the positions of the heat sinks 302, and a heating plate 307 is provided on the inner wall of the bottom end of each sealed liquid storage tank 203.

[0028] Reference Figure 2 In a preferred embodiment, the air filtering mechanism 1 includes a closed outer shell 101 and a plurality of negative pressure suction devices 103 are fixedly connected to the top inner wall of the closed outer shell 101. A degassing membrane group 104 is arranged inside the closed outer shell 101, and the degassing membrane group 104 is arranged in a spiral shape.

[0029] Reference Figure 2In a preferred embodiment, the inner wall on one side of the degassing membrane group 104 is tightly connected to a multi-way liquid injection pipe 102, and the multi-way liquid injection pipe 102 passes through the closed outer shell 101, and the inner wall on the other side of the degassing membrane group 104 is tightly connected to a multi-way liquid outlet pipe 105, and the multi-way liquid outlet pipe 105 is connected to the first three-way pipe 201.

[0030] Reference Figure 3 In a preferred embodiment, the degassing membrane group 104 includes a flexible support frame 106 and the flexible support frame 106 is wrapped with a degassing membrane 107, and the wrapped degassing membrane 107 is hollow.

[0031] Reference Figure 3 In a preferred embodiment, a plurality of partition membranes 108 are arranged at equal density between the degassing membranes 107 and a plurality of partition membranes 108 are respectively provided with notches 109 , and the plurality of notches 109 are staggered in an up-and-down manner.

[0032] Working principle of the present invention:

[0033] After the filtered water enters the air filtering mechanism 1 and the air inside it is filtered out, it enters the oxygen injection mechanism 2. During the process, the water is sequentially injected into the two sealed liquid storage tanks 203 by switching the first solenoid valve 202. When the water surface contacts the induction plate 210, it stops and the other sealed liquid storage tank 203 is switched for use. Oxygen is injected into the two sealed liquid storage tanks 203 by multiple oxygen injection heads 206 through the oxygen injection machine 4. Since the space of the sealed liquid storage tanks 203 is fixed, the oxygen content in the ultrapure water can be accurately controlled by adjusting the oxygen injection amount of the oxygen injection machine 4. Thus, the oxygen content in the ultrapure water can be accurately controlled during the treatment of flowing water.

[0034] When the oxygen injection mechanism injects oxygen into the water, the ultrasonic generator 305 introduces ultrasonic waves into the water through the multiple ultrasonic vibrating heads 304, and oscillates under the action of the ultrasonic waves. Synchronously, the heat sink 302 and the heating plate 307 work synchronously. The water at the top contacts the heat sink 302 and dissipates heat through the guide fan 303. Correspondingly, the water at the bottom is heated by the heating plate 307. Based on the principle that the density of hot water is lower than that of cold water, the water in the sealed liquid storage tank 203 forms an up and down cyclic displacement and synchronous oscillation, thereby effectively improving the dissolved oxygen efficiency during oxygen injection.

[0035] In addition, since the degassing membrane group 104 is arranged in a vortex shape, when water enters the degassing membrane group 104, a longer liquid circulation length can be achieved in the limited space of the closed outer shell 101. The staggered arrangement of multiple slots 109 ensures that the water in the degassing membrane group 104 can be evenly spread and filled in the degassing membrane group 104. When the degassing membrane 107 is used to filter out the air in the water under the action of the negative pressure aspirator 103, this structure can ensure the synchronous air filtration of the flowing water, improve its filtration efficiency and complete filtration of the air, and further ensure the precise control of the oxygen content in the oxygen injection mechanism 2.

[0036] The above description is only a preferred specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any technician familiar with the technical field, within the technical scope disclosed by the present invention, who makes equivalent replacements or changes based on the technical solution and inventive concept of the present invention, should be covered by the scope of protection of the present invention.

Claims

1. A semiconductor workshop ultrapure water system, comprising a gas filtering mechanism (1), characterized in that: One side of the air filter mechanism (1) is connected to an oxygen injection mechanism (2), a bottom end of the oxygen injection mechanism (2) is provided with a base frame (5), an oxygen dissolving mechanism (3) is provided on the oxygen injection mechanism (2), the oxygen injection mechanism (2) comprises a first three-way pipe (201), and the oxygen injection mechanism (2) is connected to the air filter mechanism (1) via the first three-way pipe (201), two output ends of the first three-way pipe (201) are respectively provided with a first electromagnetic valve (202), and the two output ends of the first three-way pipe (201) are respectively tightly connected to a sealed liquid storage bin (203), and the inner walls of the same side of the two sealed liquid storage bins (203) are respectively provided with a drain port. (205), and each drain port (205) is respectively provided with a second solenoid valve (204), and the inner walls of the opposite sides of the two sealed liquid storage bins (203) are respectively interspersed with a plurality of oxygen injection heads (206), and the plurality of oxygen injection heads (206) are divided into two groups, and each group of oxygen injection heads (206) is respectively connected to a ventilation main pipe (207), and the two ventilation main pipes (207) are simultaneously connected to the oxygen injection machine (4) through a second three-way pipe (209), and the two ventilation main pipes (207) are respectively provided with a third solenoid valve (208), and the inner wall of the top end of each sealed liquid storage bin (203) is respectively attached with an induction plate (210); The air filtering mechanism (1) comprises a closed outer shell (101), wherein a plurality of negative pressure suction devices (103) are fixedly connected to the inner wall of the top end of the closed outer shell (101), and a degassing membrane group (104) is arranged inside the closed outer shell (101), and the degassing membrane group (104) is arranged in a vortex shape; The inner wall of one side of the degassing membrane group (104) is tightly connected to a multi-way liquid injection pipe (102), and the multi-way liquid injection pipe (102) passes through the closed outer shell (101); the inner wall of the other side of the degassing membrane group (104) is tightly connected to a multi-way liquid outlet pipe (105), and the multi-way liquid outlet pipe (105) is connected to the first three-way pipe (201); The degassing membrane group (104) includes a flexible support frame (106), and the flexible support frame (106) is wrapped with a degassing membrane (107), and the wrapped degassing membrane (107) is in a hollow state; A plurality of partition membranes (108) are arranged at equal density between the degassing membranes (107), and a notch (109) is respectively provided on the plurality of partition membranes (108), and the plurality of notches (109) are arranged in an upper and lower staggered manner.

2. A semiconductor workshop ultrapure water system according to claim 1, characterized in that: The dissolved oxygen mechanism (3) includes an ultrasonic generator (305), which is fixed on the base frame (5). The ultrasonic generator (305) is connected to a plurality of ultrasonic vibration heads (304), and the plurality of ultrasonic vibration heads (304) are respectively fixed on the inner walls of the same side of the two sealed liquid storage bins (203).

3. A semiconductor workshop ultrapure water system according to claim 2, characterized in that: The top inner wall of each sealed liquid storage bin (203) is respectively fitted with a heat conducting plate (306), and the sensing plate (210) is located in the middle of the heat conducting plate (306). The top outer wall of the heat conducting plate (306) is fitted with a heat sink (302).

4. A semiconductor workshop ultrapure water system according to claim 3, characterized in that: The top of each sealed liquid storage tank (203) is respectively provided with a square hole (301), and the heat sink (302) passes through the square hole (301); the top of the base frame (5) is provided with a plurality of guide fans (303), and the air outlets of the guide fans (303) correspond to the positions of the heat sink (302); and the inner wall of the bottom end of each sealed liquid storage tank (203) is respectively provided with a heating plate (307).

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