System and projection exposure apparatus

Abstract

A system (100A, 100B, 100C) for a projection exposure apparatus (1) includes a first component (102), a second component (104), and a decoupling device (200A, 200B, 200C). The decoupling device is designed to decouple the mechanical excitation of the second component (104) from that of the first component (102) in more than one degree of freedom. The decoupling device (200A, 200B, 200C) includes a first decoupling element (216, 218) with positive stiffness and a... A second decoupling element (220, 222, 224, 226, 238, 240) with negative stiffness, wherein the decoupling device (200A, 200B, 200C) includes a third component (202) arranged between the first component (102) and the second component (104), and wherein the decoupling device (200A, 200B, 200C) is designed to decouple the mechanical excitation of the second component (104) from that of the first component (102) in six degrees of freedom.

Description

[0001] Cross-references to related applications

[0002] The contents of priority claim DE 10 2021 201 203.5 are incorporated herein by reference in their entirety. Technical Field

[0003] The present invention relates to a system for a projection exposure apparatus and a projection exposure apparatus including such a system. Background Technology

[0004] Microlithography is used to fabricate microstructure components, such as integrated circuits. Microlithography processes are performed using lithography equipment with an illumination system and a projection system. An image of a mask (mask master), illuminated by the illumination system, is projected onto a substrate, such as a silicon wafer, via the projection system. This substrate is coated with a photosensitive layer (photoresist) and arranged in the image plane of the projection system to transfer the mask structure onto the photosensitive coating of the substrate.

[0005] Driven by the demand for smaller structures in integrated circuit manufacturing, EUV lithography equipment (far ultraviolet, EUV) is currently under development, which uses light with wavelengths ranging from 0.1 nm to 30 nm, particularly 13.5 nm. In the case of such EUV lithography equipment, due to the high absorption rate of most materials to light of this wavelength, reflective optical units, i.e., mirrors, must be used instead of the previously used refractive optical units, i.e., lens elements.

[0006] The need for high numerical apertures leads to larger optical units, which in turn result in larger projection systems that become sensitive to mechanical excitation. This necessitates flexible isolators. However, the larger mass requires stiffer springs to prevent the deflection caused by the weight from inducing high stress. These conflicting requirements make the design of classic spring systems extremely challenging. Summary of the Invention

[0007] In this context, the object of the present invention is to provide an improved system for projection exposure equipment.

[0008] Therefore, a system for a projection exposure apparatus is proposed. The system includes a first component, a second component, and a decoupling device designed to decouple the mechanical excitation of the second component from that of the first component in more than one degree of freedom. The decoupling device includes a first decoupling element with positive stiffness and a second decoupling element with negative stiffness. The decoupling device also includes a third component disposed between the first and second components, and is designed to decouple the mechanical excitation of the second component from that of the first component in six degrees of freedom.

[0009] Since the first decoupling element has positive stiffness and the second decoupling element has negative stiffness, zero stiffness can be achieved in the corresponding degrees of freedom. This also allows for lower decoupling frequencies, even with large masses.

[0010] Each component can be any part of the system. For example, the first component is the force frame of the projection exposure device, and the second component is the sensor frame of the projection exposure device. Therefore, the first component can also be referred to as the force frame. Therefore, the second component can also be referred to as the sensor frame.

[0011] However, one of the components can also be an optical element, etc. In principle, the system can include any component or frame. The system is preferably a projection system or a projection optics unit of a projection exposure device, or part of a projection system. However, the system can also be an illumination system or part of an illumination system. The system can be an optical system or can be referred to as an optical system.

[0012] The fact that the decoupling device is designed to “decouple” the second component from the first component specifically means that the decoupling device is designed to prevent motion, especially vibration, acting on the first component from being transmitted to the second component.

[0013] Preferably, a coordinate system having a first spatial direction (x-direction), a second spatial direction (y-direction), and a third spatial direction (z-direction) is assigned to the system. The first spatial direction can also be referred to as the depth direction. The second spatial direction can also be referred to as the width direction or the horizontal direction. The third spatial direction can also be referred to as the vertical direction.

[0014] Six degrees of freedom are assigned to the coordinate system, providing one linear or translational degree of freedom along or against each of the aforementioned spatial directions. This results in three translational degrees of freedom. Additionally, one rotational degree of freedom is provided about each spatial direction. This results in three rotational degrees of freedom. Therefore, a total of six degrees of freedom are provided.

[0015] The decoupling device is designed to allow the second component to be decoupled from the first component, not precisely in one degree of freedom, but in more than one degree of freedom, i.e., at least two degrees of freedom. For example, these two degrees of freedom could be translational and rotational. In the translational degree of freedom, for example, the first component translates relative to the second component through an external mechanical excitation. The mechanical excitation could be vibration acting on the first component. In the rotational degree of freedom, the first component, for example, tilts or rotates relative to the second component.

[0016] The fact that the first decoupling element has "positive" stiffness should be understood here to mean that the first decoupling element generates a force that counteracts the deformation or deflection when it deforms or deflects. For example, an elongated helical spring generates a force that counteracts the change in length.

[0017] Conversely, "negative" stiffness is understood to mean the property of the second decoupling element to generate a force acting in the direction of deformation or deflection when deformed or deflected. For example, a pre-tensioned compression spring has such negative stiffness. When such a pre-tensioned compression spring extends, it generates a force acting in the direction of the change in length. A pre-tensioned leaf spring or two magnetic elements with their north and south poles facing each other also have negative stiffness. In particular, negative and positive stiffness cancel each other out, thus the decoupling device has zero stiffness.

[0018] The decoupling device is designed to decouple the mechanical excitation of the second component from that of the first component in six degrees of freedom.

[0019] The decoupling device can also be designed to decouple the mechanical excitation of the second component from that of the first component in only three, four, or five degrees of freedom. However, the decoupling device is suitable for decoupling in at least two degrees of freedom.

[0020] According to another embodiment, the first decoupling element is a spring element, wherein the second decoupling element is a magnetic element or a pre-tensioned spring element.

[0021] The first decoupling element can be, for example, a helical spring, a leaf spring, or a group of leaf springs. In particular, the first decoupling element is a compression spring. The second decoupling element is, for example, a magnetic element in the form of a permanent magnet. Alternatively, the second decoupling element can also be a pre-tensioned helical spring, a disc spring, or a group of disc springs. Particularly preferred is a pre-tensioned helical spring. "Pre-tensioned" specifically means that the spring element is mounted with pre-tension. For example, in the case of a pre-tensioned compression spring, the spring is compressed.

[0022] According to another embodiment, the second decoupling elements are arranged in pairs.

[0023] Specifically, whenever the second decoupling element is in the form of a magnetic element, they are arranged in pairs. Two magnetic elements are always combined together to form a pair. The magnetic elements of a pair are arranged such that their north or south poles face each other, thus repelling each other. Therefore, an air gap is provided between the magnetic elements of a pair.

[0024] The decoupling device includes a third component, which is arranged between the first and second components.

[0025] The third component can also be referred to as an intermediate component or intermediate frame. Preferably, the third component is operatively connected to the first component, and the second component is operatively connected to the third component.

[0026] According to another embodiment, the first decoupling element and the second decoupling element are arranged between the first component and the third component.

[0027] Preferably, the first decoupling elements in the form of spring elements are arranged such that they are oriented along a third spatial direction or the z-direction. For example, four first decoupling elements are provided, positioned at the corners of the third component. Here, the first decoupling elements are preferably positioned between the horizontally arranged arms of the third component and the first component.

[0028] If the second decoupling element is in the form of a magnetic element, it is arranged such that when viewed along the second spatial direction or the y-direction, the paired magnetic elements are mutually repelled. When viewed along the second spatial direction, the paired magnetic elements are positioned on either side of the third component. One magnetic element in each pair is securely connected to the first component. In the case where the second decoupling element is a pre-tensioned spring element, the spring element is coupled to the third component via a pressure rod. The pressure rod is connected to the third component on one side and to the corresponding pre-tensioned spring element on the other side via a flexure.

[0029] In the undeflected state of the first or third component, the second decoupling element is in equilibrium. That is, the second decoupling elements arranged on both sides of the third component generate forces that act only in the second spatial direction or the y-direction and cancel each other out, because the paired magnetic elements are arranged on both sides of the third component.

[0030] Once the second decoupling element is out of equilibrium, for example, when the first component deflects relative to the third component in a vibration-related manner, the second decoupling element applies a force to the third component that counteracts the force applied to the third component by the first decoupling element. The forces of the first and second decoupling elements cancel each other out, so it is possible for the third component to deflect without force relative to the first component, and vice versa.

[0031] According to another embodiment, the second component is suspended on the third component by a third decoupling element, which decouples the second component from the third component in the horizontal direction.

[0032] As mentioned earlier, the horizontal direction corresponds to the second spatial direction, or the y-direction. In this case, "suspension" specifically means that the decoupling element can only transmit tension, not any compressive force. For example, the third decoupling element transmits the weight of the second component to the third component.

[0033] According to another embodiment, the third decoupling element is a tension cable.

[0034] Tension cables can be arranged in a parallelogram pattern. For example, at least three tension cables can be provided. Four tension cables can also be provided. For example, the tension cables can be steel cables or plastic cables. Chains can also serve as tension cables.

[0035] According to another embodiment, the third decoupling element is a tie rod, wherein the third decoupling element has positive stiffness.

[0036] The third decoupling element is preferably connected to the second and third components respectively via a flexure.

[0037] According to another embodiment, the system further includes a fourth decoupling element, which is arranged between the second and third components and between the second and first components, respectively, wherein the fourth decoupling element has negative stiffness.

[0038] The tie rod transmits a small lateral force in the horizontal direction. A fourth decoupling element is provided to compensate for this lateral force. Due to the fact that the third decoupling element has positive stiffness and the fourth decoupling element has negative stiffness, zero stiffness occurs in the horizontal or y-direction. Therefore, the second component can also be fully decoupled from the first component in the horizontal direction.

[0039] According to another embodiment, the fourth decoupling element is a magnetic element.

[0040] Preferably, the magnetic elements are arranged in pairs within the pairs of magnetic elements. The magnetic elements in a pair are arranged such that their south or north poles face each other, thus causing the magnetic elements in each pair to repel each other. For example, when viewed along the z-direction, a pair of magnetic elements is arranged between the second and third components. When viewed along the z-direction, a second pair of magnetic elements is placed between the second and first components.

[0041] According to another embodiment, the system further includes a fourth component disposed between the first component and a fourth decoupling element disposed between the second component and the first component, wherein the fourth component is decoupled from the first component by a fifth decoupling element.

[0042] Therefore, the fifth decoupling element prevents the excitation of the first component from being applied to the fourth decoupling element assigned to the first component. For example, the fourth component may be plate-shaped. Preferably, four fifth decoupling elements are provided, which support the fourth component on the first component.

[0043] According to another embodiment, the fifth decoupling element is a spring element.

[0044] Preferably, the fifth decoupling element is a compression spring. Preferably, a particularly soft spring element is used for the fifth decoupling element.

[0045] According to another embodiment, a first decoupling element is designed to apply a first force to a third component when it deflects, the orientation of the first force being opposite to the deflection direction of the first decoupling element, wherein a second decoupling element is designed to apply a second force to the third component when it deflects, the second force being oriented along the deflection direction of the second decoupling element, and wherein the first force and the second force cancel each other out, such that the third component can deflect without force.

[0046] The third component can deflect relative to the first component because the first component moves and / or tilts relative to the third component, for example, due to vibration. As previously described, the second decoupling elements are initially in equilibrium, where they exert forces on the third component acting in the y-direction and oriented in opposite directions. These forces cancel each other out. Once the third component deflects, for example by rotating the first component relative to the third component, the second decoupling elements disengage from their equilibrium position and thus exert a tilted force on the third component, which can be decomposed into horizontal and vertical components. When the first component deflects, the first decoupling element also deforms and thus also exerts a force on the third component. The force of the first decoupling element always acts in the z-direction. These forces exerted by the first decoupling element are opposite to the vertical component of the force exerted by the second decoupling element. This vertical component and the force exerted by the first decoupling element cancel each other out. Furthermore, the horizontal component of the tilting force of the second decoupling element also cancels each other out. This provides the third component with no deflection capability.

[0047] In addition, a projection exposure device having at least one such system is proposed.

[0048] The projection exposure equipment can be either EUV lithography equipment or DUV lithography equipment. EUV stands for "Extreme Ultraviolet," which refers to working light with wavelengths between 0.1 nm and 30 nm. DUV stands for "Deep Ultraviolet," which refers to working light with wavelengths between 30 nm and 250 nm.

[0049] In the present context, “one” or “one” should not be construed as limited to a single element. Instead, multiple elements may be provided, such as two, three, or more. Any other numbers used herein should also not be construed as a limitation on the exact number of the elements. Rather, unless otherwise stated, upward and downward numerical deviations are possible.

[0050] The embodiments and features described for this system are applicable accordingly to the proposed projection exposure device, and vice versa.

[0051] Further possible implementations of the invention include combinations of features or embodiments not explicitly mentioned in the descriptions above or below with reference to exemplary embodiments. In such cases, those skilled in the art will also add individual aspects as improvements or supplements to the corresponding basic form of the invention. Attached Figure Description

[0052] Further advantageous configurations and aspects of the invention are the subject of the dependent claims and also the subject of exemplary embodiments of the invention described below. Hereinafter, the invention will be explained in detail based on preferred embodiments, with reference to the accompanying drawings.

[0053] Figure 1 A schematic meridional cross-sectional view of a projection exposure apparatus used for EUV projection lithography is shown;

[0054] Figure 2 It shows the method for using according to Figure 1 A schematic diagram of an embodiment of a projection exposure device system;

[0055] Figure 3 It shows that according to Figure 2 Another schematic diagram of the system;

[0056] Figure 4 The illustration shows the action based on Figure 1 The force on the intermediate components of the system;

[0057] Figure 5 It shows that according to Figure 1 Another schematic diagram of the system;

[0058] Figure 6 The illustration shows the action based on Figure 5 The force on the intermediate components of the system;

[0059] Figure 7 It shows the method for using according to Figure 1 A schematic diagram of another embodiment of the projection exposure device system;

[0060] Figure 8 It shows that according to Figure 7 Another schematic diagram of the system;

[0061] Figure 9 The illustration shows the action based on Figure 7 The force on the intermediate components of the system; and

[0062] Figure 10 It shows the method for using according to Figure 1 A schematic diagram of another embodiment of the projection exposure device system.

[0063] In the accompanying drawings, unless otherwise indicated, identical elements or elements having the same function are given the same reference numerals. It should also be noted that the illustrations in the drawings are not necessarily to scale. Detailed Implementation

[0064] Figure 1An embodiment of a projection exposure apparatus 1 (photolithography apparatus) is shown. One embodiment of the illumination system 2 of the projection exposure apparatus 1 includes an illumination optics unit 4, in addition to a light source or radiation source 3, for illuminating the object field 5 in the object plane 6. In an alternative embodiment, the light source 3 may also be provided as a module separate from the rest of the illumination system 2. In this case, the illumination system 2 does not include the light source 3.

[0065] The mask master 7, arranged in the object field 5, is exposed. The mask master 7 is held by the mask master support 8. The mask master support 8 can be moved by the mask master displacement driver 9, especially in the scanning direction.

[0066] For the purpose of explanation, Figure 1 A Cartesian coordinate system with x-direction x, y-direction y, and z-direction z is shown. The x-direction x extends perpendicularly to the plane shown in the figure. The y-direction y extends horizontally, and the z-direction z extends vertically. Figure 1 The scanning direction extends in the y-direction (y). The z-direction (z) extends perpendicular to the object plane (6).

[0067] The projection exposure apparatus 1 includes a projection optics unit 10. The projection optics unit 10 is used to image the object field 5 onto an image field 11 in an image plane 12. The image plane 12 extends parallel to the object plane 6. Alternatively, the angle between the object plane 6 and the image plane 12 may not be 0°.

[0068] The structure on the mask master 7 is imaged onto the photosensitive layer of the wafer 13, which is positioned within the image field 11 of the image plane 12. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be moved by a wafer displacement driver 15, particularly in the y-direction. The movement of the mask master 7 by the mask master displacement driver 9 and the movement of the wafer 13 by the wafer displacement driver 15 can be synchronized.

[0069] Light source 3 is an EUV radiation source. Light source 3 specifically emits EUV radiation 16, which is also referred to below as working radiation, illumination radiation, or illumination light. In particular, the working radiation 16 has a wavelength in the range of 5 nm to 30 nm. Light source 3 can be a plasma source, such as an LPP (laser-generated plasma) source or a DPP (dual-phase plasma) source. The light source can also be a synchrotron-based radiation source. Light source 3 can be an FEL (free-electron laser).

[0070] Illumination radiation 16 emitted from light source 3 is focused by light collector 17. Light collector 17 may be a light collector having one or more elliptical and / or hyperboloidal reflective surfaces. Illumination radiation 16 may be incident on at least one reflective surface of light collector 17 at grazing incidence (GI), that is, at an angle of incidence greater than 45°, or at normal incidence (NI), that is, at an angle of incidence less than 45°. Light collector 17 may be structured and / or coated, primarily to optimize its reflectivity to the radiation used, and secondarily to suppress intrusive light.

[0071] Downstream of the light collector 17, the illumination radiation 16 propagates through the intermediate focal point in the intermediate focal plane 18. The intermediate focal plane 18 can represent the spacing between the radiation source module with the light source 3 and the light collector 17 and the illumination optical unit 4.

[0072] The illumination optics unit 4 includes a deflector 19 and a first facet mirror 20 disposed downstream of it in the optical path. The deflector 19 may be a planar deflector, or alternatively, a reflector having a beam-affecting effect beyond pure deflection. Alternatively or additionally, the deflector 19 may be in the form of a spectral filter that separates the wavelength of the illumination radiation 16 used from intrusive light with wavelengths deviating from that wavelength. If the first facet mirror 20 is disposed in the plane of the illumination optics unit 4 that is optically conjugate to the object plane 6, which serves as the field plane, it is also referred to as a field facet mirror. The first facet mirror 20 includes a plurality of individual first facets 21, which may also be referred to as field facets. As an example, in Figure 1 Only some of these first facets 21 are shown in the image.

[0073] The first facet 21 can be implemented as a macro-facet, particularly a rectangular facet or a facet with an arcuate edge profile or a partially circular edge profile. The first facet 21 can be in the form of a planar facet, or alternatively, a facet with convex or concave curvature.

[0074] For example, as known from DE 10 2008 009 600 A1, the first facet 21 itself can also be composed of multiple individual mirrors, particularly multiple micromirrors. The first facet mirror 20 can especially be in the form of a microelectromechanical system (MEMS system). See DE 10 2008 009 600 A1 for details.

[0075] Between the light collector 17 and the deflector 19, the illumination radiation 16 propagates horizontally, that is, in the y-direction.

[0076] In the optical path of the illumination optical unit 4, the second facet mirror 22 is arranged downstream of the first facet mirror 20. If the second facet mirror 22 is arranged in the pupil plane of the illumination optical unit 4, it is also called a pupil facet mirror. The second facet mirror 22 can also be arranged at a certain distance from the pupil plane of the illumination optical unit 4. In this case, the combination of the first facet mirror 20 and the second facet mirror 22 is also called a specular reflector. Specular reflectors are known from US2006 / 0132747 A1, EP 1 614 008 B1, and US 6,573,978.

[0077] The second facet 22 includes multiple second facets 23. In the case of a pupil facet 22, the second facets 23 are also referred to as pupil facets.

[0078] The second facet 23 can also be a macroscopic facet, which may have, for example, a circular, rectangular, or hexagonal perimeter, or alternatively, a facet composed of micromirrors. See also DE 10 2008 009 600A1 in this regard.

[0079] The second facet 23 may have a planar reflective surface, or alternatively a reflective surface with convex or concave curvature.

[0080] The illumination optics unit 4 thus forms a biplane system. This basic principle is also known as the fly-eye integrator.

[0081] It may be advantageous to arrange the second facet mirror 22 imprecisely in a plane that is optically conjugate to the pupil plane of the projection optics unit 10. In particular, the second facet mirror 22 may be arranged tilted relative to the pupil plane of the projection optics unit 10, for example as described in DE 10 2017 220 586 A1.

[0082] The second facet 22 is used to image the individual first facet 21 into the object field 5. The second facet 22 is the last beam-shaping mirror in the optical path upstream of the object field 5, or in fact the last mirror of the illumination radiation 16.

[0083] In another embodiment (not shown) of the illumination optics unit 4, a transmission optics unit may be arranged in the optical path between the second facet mirror 22 and the object field 5. This transmission optics unit is particularly helpful in imaging the first facet 21 into the object field 5. The transmission optics unit may include exactly one mirror, but alternatively, it may include two or more mirrors arranged sequentially in the optical path of the illumination optics unit 4. The transmission optics unit may in particular include one or two normal incident mirrors (NI mirrors) and / or one or two grazing incident mirrors (GI mirrors).

[0084] exist Figure 1In the illustrated embodiment, the illumination optical unit 4 has three mirrors downstream of the light collector 17, specifically a deflector 19, a first facet mirror 20, and a second facet mirror 22.

[0085] In another embodiment of the illumination optical unit 4, the deflector 19 is not required, so the illumination optical unit 4 can have two mirrors downstream of the light collector 17, specifically the first facet mirror 20 and the second facet mirror 22.

[0086] Imaging of the first plane 21 onto the object plane 6 via the second plane 23 or by using the second plane 23 and the transmission optical unit is usually only an approximate imaging.

[0087] The projection optical unit 10 includes a plurality of mirrors Mi, which are sequentially numbered according to their arrangement in the optical path of the projection exposure device 1.

[0088] exist Figure 1 In the example shown, the projection optics unit 10 includes six mirrors, M1 to M6. Alternatives with four, eight, ten, twelve, or any other number of mirrors Mi are also possible. The projection optics unit 10 is a double-shielded optics unit. The penultimate mirror M5 and the last mirror M6 each have a channel opening for illumination radiation 16. The projection optics unit 10 has an image-side numerical aperture greater than 0.5, which can also be greater than 0.6, for example, 0.7 or 0.75.

[0089] The reflective surface of mirror Mi can be implemented as a freeform surface without an axis of rotational symmetry. Alternatively, the reflective surface of mirror Mi can be designed as an aspherical surface that has exactly one axis of rotational symmetry of the reflective surface shape. Like the mirrors of illumination optics unit 4, mirror Mi can have a highly reflective coating for illumination radiation 16. These coatings can be designed as multilayer coatings, particularly with alternating layers of molybdenum and silicon.

[0090] The projection optical unit 10 has a large object-image offset in the y-direction between the y-coordinate of the center of the object field 5 and the y-coordinate of the center of the image field 11. This object-image offset in the y-direction can be approximately the same as the z-distance between the object plane 6 and the image plane 12.

[0091] The projection optical unit 10 can, in particular, have a modified form. Specifically, it has different imaging ratios βx and βy in the x and y directions. The two imaging ratios βx and βy of the projection optical unit 10 are preferably (βx, βy) = (+ / -0.25, + / -0.125). A positive imaging ratio β means imaging without image inversion. A negative sign for the imaging ratio β means that the image is inverted.

[0092] Therefore, the projection optical unit 10 results in a reduction in size in the x-direction, that is, in the direction perpendicular to the scanning direction, by a ratio of 4:1.

[0093] The projection optical unit 10 results in a reduction in size in the y-direction, that is, in the scanning direction, by a ratio of 8:1.

[0094] Other imaging scales are also possible. Imaging scales with the same sign and the same absolute value in the x-direction (x) and y-direction (y) are also possible, for example, with absolute values ​​of 0.125 or 0.25.

[0095] In the optical path between object field 5 and image field 11, the number of intermediate image planes in the x-direction (x) and y-direction (y) can be the same or different, depending on the embodiment of the projection optical unit 10. Examples of projection optical units with different numbers of such intermediate images in the x and y directions are known from US 2018 / 0074303A1.

[0096] In different cases, one of the second facets 23 is assigned to exactly one of the first facets 21 to form illumination channels for illuminating the object field 5. This produces illumination specifically according to the Kohler principle. By means of the first facet 21, the far field is decomposed into multiple object fields 5. The first facet 21 produces images with multiple intermediate focal points on the second facets 23 respectively assigned to them.

[0097] The first surface 21, through the allocated second surface 23, is imaged onto the master mask 7 in an overlapping manner under different conditions for illuminating the object field 5. The illumination of the object field 5 is particularly intended to be as uniform as possible, preferably with a uniformity error of less than 2%. Field uniformity can be achieved by overlapping different illumination channels.

[0098] The illumination of the entrance pupil of the projection optical unit 10 can be geometrically defined by the arrangement of the second facet 23. The intensity distribution in the entrance pupil of the projection optical unit 10 can be set by selecting the illumination channel, specifically by selecting a subset of the second facet 23 that guides the light. This intensity distribution is also referred to as illumination setting or illumination pupil filling.

[0099] By redistributing the illumination channels, the illumination uniformity of the illumination pupil of the illumination optical unit 4 can be achieved in a limited manner in a portion of the illumination area.

[0100] Other aspects and details of the illumination of the object field 5 will be described below, especially the other aspects and details of the illumination of the entrance pupil of the projection optical unit 10.

[0101] The projection optical unit 10 may in particular have a concentric entrance pupil. This concentric entrance pupil may be accessible or inaccessible.

[0102] The entrance pupil of the projection optics unit 10 is often not precisely illuminated by the second facet mirror 22. When the projection optics unit 10, which images the center of the second facet mirror 22 onto the wafer 13, is imaged telecentrically, the aperture rays typically do not intersect at a single point. However, it is possible to find a surface region where the spacing between the aperture rays, defined in pairs, is minimized. This surface region represents the entrance pupil or a region in real space conjugate to it. In particular, this surface region has a finite curvature.

[0103] For tangential and sagittal beam paths, the projection optics unit 10 can have different entrance pupil orientations. In this case, the imaging element, particularly the optical components of the transmission optics unit, should be positioned between the second facet mirror 22 and the mask master 7. This optical element allows for consideration of the different orientations of the tangential and sagittal entrance pupils.

[0104] exist Figure 1 In the arrangement of the components of the illumination optical unit 4 shown, the second facet mirror 22 is arranged in the region conjugate with the entrance pupil of the projection optical unit 10. The first facet mirror 20 is arranged to be inclined relative to the object plane 6. The first facet mirror 20 is arranged to be inclined relative to the arrangement plane defined by the deflection mirror 19. The first facet mirror 20 is arranged to be inclined relative to the arrangement plane defined by the second facet mirror 22.

[0105] Figure 2 and Figure 3 Schematic diagrams of embodiments of a system 100A for a projection exposure apparatus 1 are shown. For example, as described above, the system 100A may be a projection optical unit 10, or a part of a projection optical unit 10. As previously mentioned, a coordinate system having a first spatial direction or x-direction x, a second spatial direction or y-direction y, and a third spatial direction or z-direction z is assigned to the system 100A.

[0106] System 100A includes a first component 102 and a second component 104. Components 102 and 104 can be any component of the projection optics unit 10. Hereinafter, it is assumed that the first component 102 is a force frame. The first component 102 is therefore referred to as the force frame in the following text. The second component 104 is a sensor frame, and is referred to as such in the following text. The sensor frame 104 can support a sensor system (not shown).

[0107] The force frame 102 has a generally U-shaped structure extending along the x-direction. However, the force frame 102 can have any desired geometry. The force frame 102 includes a base 106 and two wall portions 108, 110 disposed on the sides of the base 106. Arm portions 112, 114 project from each wall portion 108, 110, extending in the direction of their respective opposing wall portions 108, 110.

[0108] The sensor frame 104 is shown in a highly simplified form as a block or cubic component. However, the sensor frame 104 can have any desired geometry. The sensor frame 104 is arranged within a force frame 102. That is, the force frame 102 at least partially surrounds the sensor frame 104.

[0109] System 100A includes a decoupling device 200A adapted to prevent external mechanical excitation of force frame 102 from being transmitted to sensor frame 104. Decoupling device 200A thus decouples sensor frame 104 from force frame 102. Decoupling device 200A includes an intermediate component 202 connected in the force path between force frame 102 and sensor frame 104. Intermediate component 202 can be blocky or cubic. However, intermediate component 202 can have any desired geometry. In the present case, intermediate component 202 is an intermediate frame, and is referred to as such hereinafter.

[0110] The intermediate frame 202 is coupled to the sensor frame 104 via flexible third decoupling elements 204 and 206. The third decoupling elements 204 and 206 can be referred to as cables or tension cables. In this case, "flexible" means that the third decoupling elements 204 and 206 can only transmit tension in the opposite z-direction, such as the force caused by the gravity of the sensor frame 104. No force can be transmitted in other directions, x and y. For example, four third decoupling elements 204 and 206 can be provided, spaced apart from each other along the y-direction and along the x-direction. However, only three third decoupling elements 204 and 206 can also be provided.

[0111] The third decoupling elements 204 and 206 are connected to the intermediate frame 202 at connection points 208 and 210. Connection points 208 and 210 are spaced apart from each other along the y-direction. Furthermore, the third decoupling elements 204 and 206 are connected to the sensor frame 104 via connection points 211 and 214. Additional connection points (not shown) are provided, spaced apart from connection points 208 and 210 when viewed along the x-direction. The third decoupling elements 204 and 206 can be cables, particularly steel or plastic cables, which are hooked onto the intermediate frame 202 and the sensor frame 104.

[0112] The decoupling device 200A also includes first decoupling elements 216 and 218, which are arranged between the intermediate frame 202 and the force frame 102. The first decoupling elements 216 and 218 are spring elements, and may also be referred to as such. Preferably, four first decoupling elements 216 and 218 are provided, wherein, in the case that the intermediate frame 202 is square, the first decoupling elements 216 and 218 are installed at each corner of the intermediate frame 202. The first decoupling elements 216 and 218 are positioned between the arms 112 and 114 of the force frame 102 and the intermediate frame 202. The arms 112 and 114 thus bear the first decoupling elements 216 and 218. The first decoupling elements 216 and 218 are loaded with the weight of the intermediate frame 202 and the aforementioned weight of the sensor frame 104, the weight of which is transmitted to the intermediate frame 202 through third decoupling elements 204 and 206.

[0113] The first decoupling elements 216 and 218 are helical springs. However, the first decoupling elements 216 and 218 can also be disc springs or a group of disc springs. The first decoupling elements 216 and 218 can be pulled apart along the z-direction (z) and compressed in the opposite direction (z). The first decoupling elements 216 and 218 can be compression springs. However, the term "compression spring" does not preclude the first decoupling elements 216 and 218 from being pulled apart.

[0114] The decoupling device 200A has second decoupling elements 220, 222, 224, and 226. These second decoupling elements 220, 222, 224, and 226 are magnetic elements, and may also be referred to as such. These second decoupling elements 220, 222, 224, and 226 are permanent magnets. The second decoupling elements 220, 222, 224, and 226 are positioned on both sides of the intermediate frame 202 in the form of pairs of magnetic elements 228 and 230. When viewed along the y-direction, the intermediate frame 202 is positioned between the second decoupling elements 222 and 224. The second decoupling elements 220 and 222 here form the first pair of magnetic elements 228. The second decoupling elements 224 and 226 form the second pair of magnetic elements 230.

[0115] The second decoupling elements 220 and 226 are securely connected to the force frame 102. The second decoupling elements 222 and 224 are securely connected to the intermediate frame 202. Air gaps 232 and 234 are provided between the second decoupling elements 220 and 222 and the second decoupling elements 224 and 226, respectively. Each pair of decoupling elements 220, 222, 224, and 226 has a north pole (N) and a south pole (S). The second decoupling elements 220, 222, 224, and 226 are positioned such that when viewed along the y-direction, the north pole (N) and the south pole (S) are arranged side-by-side. The second decoupling elements 220, 222, 224, and 226 of each pair of magnetic elements 228 and 230 are arranged such that the south poles (S) face each other. Therefore, the second decoupling elements 220, 222, 224, and 226 of each pair of magnetic elements 228 and 230 repel each other.

[0116] The function of the decoupling device 200A is explained below. Figure 2 The system 100A is shown in its equilibrium position, where the force frame 102 is not deflected. In the equilibrium position, the south poles S of the second decoupling elements 220, 222, 224, and 226 are positioned opposite each other. Figure 3 The system 100A in a deflected state is shown. In the deflected state, the force frame 102 deflects, for example, through vibration, such as... Figure 3 As shown by the middle arrow 236. Because the force frame 102 is in Figure 3 The force frame 102 deflects in the z direction, so it moves downwards in the opposite z direction.

[0117] Due to its mass inertia, the intermediate frame 202 initially remains in its starting position, thus the force frame 102 moves away from the intermediate frame 202, and the first decoupling elements 216, 218 extend. The extension of the first decoupling elements 216, 218 causes each of the first decoupling elements 216, 218 to exert a force F216, F218 on the intermediate frame 202. The orientation of forces F216, F218 is opposite to the z-direction. Therefore, forces F216, F218 act against the deflection of the first decoupling elements 216, 218.

[0118] When the force frame 102 deflects, the second decoupling elements 220 and 226 assigned to the force frame 102 deflect relative to the second decoupling elements 222 and 224 assigned to the intermediate frame 202. This generates forces F222 and F224 acting on the intermediate frame 202, and the orientation of forces F222 and F224 is tilted relative to forces F216 and F218.

[0119] Figure 4The forces F216, F218, F222, and F224 acting on the intermediate frame 202 are shown in a very highly schematic form. As previously mentioned, the directions of forces F216 and F218 are opposite to the z-direction. The tilting forces F222 and F224 can be decomposed into horizontal components F222h and F224h and vertical components F222v and F224v, respectively. The horizontal components F222h and F224h act in the opposite direction in the y-direction. The horizontal components F222h and F224h are of the same magnitude but opposite in direction, therefore they cancel each other out. Therefore, the intermediate frame 202 is not subjected to any force in the horizontal direction or along the y-direction and opposite to it.

[0120] The vertical components F222v and F224v act along the z-direction, and are therefore opposite to forces F216 and F218. The vertical components F222v and F224v are equal to the forces F216 and F218. Therefore, the vertical components F222v and F224v and the forces F216 and F218 cancel each other out. Thus, the intermediate frame 202 is always unstressed. This unstressed degree of freedom produces a very low natural frequency.

[0121] When viewed along the z-direction, the first decoupling elements 216 and 218 exhibit positive stiffness. That is, the orientation of forces F216 and F218 is opposite to the deflection direction of the first decoupling elements 216 and 218, or opposite to the deflection direction of the intermediate frame 202 relative to the force frame 102, or vice versa. Conversely, the paired magnetic elements 228 and 230 exhibit negative stiffness in the z-direction.

[0122] In other words, forces F222 and F224, especially the vertical components F222v and F224v, are oriented along the deflection direction of the intermediate frame 202 relative to the force frame 102. This results in zero stiffness of the decoupling device 200A in the z-direction. In the horizontal or y-direction, a very low decoupling frequency can be achieved through the parallel arrangement of the third decoupling elements 204 and 206 in the form of cables.

[0123] Figure 5 Another view of system 100A is shown, in which, as indicated by arrow 236, force frame 102 is excited in this case by rotating or tilting relative to sensor frame 104. When force frame 102 rotates, first decoupling element 216 is compressed and first decoupling element 218 is stretched. In this way, first decoupling element 216 applies a force F216 acting in the z-direction to intermediate frame 202. First decoupling element 218 applies a force F218 acting against the z-direction to intermediate frame 202. The forces F216 and F218 are oriented opposite to each other.

[0124] The second decoupling element 222 applies a force F222 to the intermediate frame 202, and this force... Figure 5 The direction is tilted downwards and to the right. Accordingly, the second decoupling element 224 applies a force F224 to the intermediate frame 202, which is in Figure 5 It tilts upwards and to the left in the direction of the angle.

[0125] Figure 6 The forces F216, F218, F222, and F224 acting on the intermediate frame 202 are shown in a very highly schematic form. As previously mentioned, force F216 acts in the z-direction. Force F218 acts in the opposite direction of z, and is therefore also opposite to force F216. The tilting forces F222 and F224 can be decomposed into horizontal components F222h and F224h and vertical components F222v and F224v, respectively. The horizontal components F222h and F224h act in the opposite direction of y. The horizontal components F222h and F224h are of the same magnitude but opposite in direction, therefore they cancel each other out. Therefore, the intermediate frame 202 is not subjected to any force in the horizontal direction or along the y-direction and opposite to it.

[0126] The vertical component force F222v acts against the z-direction. The vertical component force F224v acts along the z-direction. The vertical component force F222v and force F216 cancel each other out. Therefore, the vertical component force F224v and force F218 also cancel each other out. Therefore, the intermediate frame 202 is not subjected to any force. Even when the force frame 102 rotates, this makes the stiffness of the decoupling device 200A zero.

[0127] Figure 7 and Figure 8 Schematic diagrams of another embodiment of system 100B for projection exposure apparatus 1 are shown. System 100B is substantially corresponding in design to optical system 100A. Therefore, the differences between systems 100A and 100B will be discussed below. The only difference between system 100B and system 100A is that system 100B has another embodiment of decoupling device 200B.

[0128] As previously described, the decoupling device 200B includes an intermediate frame 202, which is supported on the force frame 102 by first decoupling elements 216 and 218. Furthermore, the decoupling device 200B has second decoupling elements 238 and 240 in the form of spring elements, oriented perpendicular to the first decoupling elements 216 and 218. The second decoupling elements 238 and 240 are helical springs. However, the second decoupling elements 238 and 240 can also be disc springs or groups of disc springs. The second decoupling elements 238 and 240 are pre-tensioned compression springs. The second decoupling elements 238 and 240 can also be referred to as spring elements.

[0129] Compression bars 242 and 244 are disposed between the second decoupling elements 238 and 240 and the intermediate frame 202, each compression bar applying compressive force from the second decoupling elements 238 and 240 to the intermediate frame 202. Compression bar 242 is connected to the second decoupling element 238 via a flexure 246 and to the intermediate frame 202 via a flexure 248. Therefore, compression bar 244 is connected to the intermediate frame 202 via a flexure 250 and to the second decoupling element 240 via a flexure 252. In this context, "flexure" should be understood as a component region that allows relative movement between two rigid body regions through bending.

[0130] The function of the decoupling device 200B will be explained below. Figure 7 The system 100B is shown in its equilibrium position, where the force frame 102 is not deflected. In the equilibrium position, the compression bars 242 and 244 are arranged horizontally and thus extend along the y-direction. The second decoupling elements 238 and 240 apply compressive forces to the intermediate frame 202 through the compression bars 242 and 244. These compressive forces are of equal magnitude and opposite orientation, and therefore cancel each other out.

[0131] Figure 8 The system 100B in a deflected state is shown. In the deflected state, the force frame 102 deflects, for example, through vibration, such as... Figure 8 As shown by the middle arrow 236. Because the force frame 102 is in Figure 8 The force frame 102 deflects in the z direction, so it moves downwards in the opposite z direction.

[0132] Due to its mass inertia, the intermediate frame 202 initially remains in its starting position, thus the force frame 102 moves away from the intermediate frame 202, and the first decoupling elements 216, 218 extend. The extension of the first decoupling elements 216, 218 causes each of the first decoupling elements 216, 218 to exert a force F216, F218 on the intermediate frame 202. The orientation of forces F216, F218 is opposite to the z-direction. Therefore, forces F216, F218 act against the deflection of the first decoupling elements 216, 218.

[0133] When the force frame 102 deflects, the compression bars 242 and 244 deflect. This generates forces F238 and F240 acting on the intermediate frame 202, and the orientation of forces F238 and F240 is inclined relative to forces F216 and F218.

[0134] Figure 9The forces F216, F218, F238, and F240 acting on the intermediate frame 202 are shown in a very highly schematic form. As previously mentioned, forces F216 and F218 act against the z-direction. The tilting forces F238 and F240 can be decomposed into horizontal components F238h and F240h and vertical components F238v and F240v, respectively. The horizontal components F238h and F240h act against each other in the y-direction. The horizontal components F238h and F240h are of the same magnitude but act in opposite directions, therefore they cancel each other out. Therefore, the intermediate frame 202 is not subjected to any force in the horizontal direction or along the y-direction and opposite to it.

[0135] The vertical components F238v and F250v act along the z-direction, and are therefore opposite to forces F216 and F218. The vertical components F238v and F240v are equal to forces F216 and F218. Therefore, the vertical components F238v and F240v and forces F216 and F218 cancel each other out. Thus, the intermediate frame 202 is always unstressed. This unstressed degree of freedom produces a very low natural frequency.

[0136] When viewed along the z-direction, the first decoupling elements 216 and 218 have positive stiffness. That is, the orientation of forces F216 and F218 is opposite to the deflection direction of the first decoupling elements 216 and 218, or opposite to the deflection direction of the intermediate frame 202 relative to the force frame 102. On the other hand, the pre-tensioned second decoupling elements 238 and 240 have negative stiffness. That is, forces F238 and F240, especially the vertical components F238v and F240v, are oriented along the deflection direction of the intermediate frame 202 relative to the force frame 102. This results in zero stiffness of the decoupling device 200A in the z-direction. This also applies to the rotation of the force frame 102, such as... Figure 5 and Figure 6 As shown.

[0137] Figure 10 A schematic diagram of another embodiment of system 100C for projection exposure apparatus 1 is shown. System 100C is substantially corresponding in design to optical system 100A. Therefore, the differences between systems 100A and 100C will be discussed below.

[0138] System 100C includes a decoupling device 200C, which is essentially designed to correspond to the design of decoupling device 200A. Unlike System 100A, System 100C does not include third decoupling elements 204, 206 in the form of cables (the sensor frame 104 is suspended from the intermediate frame 202 via these third decoupling elements). Instead, the third decoupling elements 254, 256 are provided in the form of tie rods, coupled to the intermediate frame 202 via flexures 258, 260, and to the sensor frame 104 via flexures 262, 264. For example, four third decoupling elements 254, 256 may be provided. The third decoupling elements 254, 256 may also be referred to as tie rods.

[0139] Because small horizontal forces can be transmitted through the flexural elements 258, 260, 262, and 264, the mounting of the sensor frame 104 is additionally provided by the fourth decoupling elements 266, 268, 270, and 272. The fourth decoupling elements 266, 268, 270, and 272 are magnetic elements, and may also be referred to as such. The fourth decoupling element 266 is attached to the intermediate frame 202. The fourth decoupling element 268 is attached to the sensor frame 104. The fourth decoupling elements 266 and 268 form a pair of magnetic elements 274. The fourth decoupling elements 266 and 268 are positioned such that their south poles (S) or north poles (N) are opposite each other.

[0140] A fourth decoupling element 270 is attached to the intermediate frame 202. A fourth decoupling element 272 is mounted on a plate-like component 276, which is positioned between the force frame 102 and the intermediate frame 104. Component 276 is decoupled from the force frame 102 by very soft fifth decoupling elements 278 and 280. The fourth decoupling elements 270 and 272 form a pair of magnetic elements 282. The fourth decoupling elements 270 and 272 are positioned such that their south poles (S) or north poles (N) are opposite each other.

[0141] Parallelogram guidance can be achieved through the third decoupling elements 254 and 256. As described above, to achieve zero stiffness in the horizontal direction, this parallelogram guidance is combined with paired magnetic elements 274 and 282. The paired magnetic elements 274 and 282 prevent the intermediate frame 202 from being connected to the force frame 102. Otherwise, the operation of system 100C corresponds to the operation of system 100A.

[0142] Although the invention has been described with reference to exemplary embodiments, modifications may be made in various ways.

[0143] Reference tag list

[0144] 1. Projection Exposure Equipment

[0145] 2 Lighting System

[0146] 3. Light source

[0147] 4 Illumination Optical Unit

[0148] 5. Field

[0149] 6. Object plane

[0150] 7. Mask Master

[0151] 8. Mask Master Support

[0152] 9. Mask Master Displacement Driver

[0153] 10 Projection Optical Units

[0154] 11 Image Field

[0155] 12 Image plane

[0156] 13 chips

[0157] 14. Chip scaffold

[0158] 15. Wafer displacement driver

[0159] 16. Lighting radiation

[0160] 17 light collector

[0161] 18. Intermediate focal plane

[0162] 19 Deflecting Mirror

[0163] 20 First Split Mirror

[0164] 21 First facet

[0165] 22 Second split mirror

[0166] 23 Second facet

[0167] 100A System

[0168] 100B System

[0169] 100C System

[0170] 102 components / force frame

[0171] 104 Components / Sensor Frame

[0172] 106 Base

[0173] 108 Wall section

[0174] 110 Wall section

[0175] 112 Arm

[0176] 114 Arm

[0177] 200A Decoupling Device

[0178] 200B Decoupling Device

[0179] 200C Decoupling Device

[0180] 202 Components / Intermediate Frame

[0181] 204 Decoupling Components

[0182] 206 Decoupling Components

[0183] 208 connection points

[0184] 210 Connection Point

[0185] 212 Connection Point

[0186] 214 Connection Points

[0187] 216 Decoupling Components

[0188] 218 Decoupling Components

[0189] 220 Decoupling Component

[0190] 222 Decoupling Components

[0191] 224 Decoupling Components

[0192] 226 Decoupling Components

[0193] 228 pairs of magnetic elements

[0194] 230 pairs of magnetic elements

[0195] 232 air gap

[0196] 234 Air gap

[0197] 236 arrows

[0198] 238 Decoupling Components

[0199] 240 Decoupling Components

[0200] 242 Compression bar

[0201] 244 Compression bar

[0202] 246 Flexural components

[0203] 248 Flexural components

[0204] 250 flexural component

[0205] 252 Flexural components

[0206] 254 Decoupling Components

[0207] 256 Decoupling Components

[0208] 258 Flexural components

[0209] 260 Flexural component

[0210] 262 Flexural components

[0211] 264 Flexural components

[0212] 266 Decoupling Components

[0213] 268 Decoupling Components

[0214] 270 Decoupling Components

[0215] 272 Decoupling Components

[0216] 274 Pairs of magnetic elements

[0217] 276 parts

[0218] 278 Decoupling Components

[0219] 280 Decoupling Components

[0220] 282 pairs of magnetic elements

[0221] F216 force

[0222] F218 force

[0223] F222 force

[0224] F222h Horizontal component force

[0225] F222v Vertical Component

[0226] F224 force

[0227] F224h Horizontal component force

[0228] F224v Vertical Component

[0229] F238 force

[0230] F238h Horizontal component force

[0231] F238v Vertical Component

[0232] F240 force

[0233] F240h Horizontal Component

[0234] F240v Vertical Component

[0235] M1 reflector

[0236] M2 reflector

[0237] M3 reflector

[0238] M4 reflector

[0239] M5 reflector

[0240] M6 reflector

[0241] N North Pole

[0242] S Antarctica

[0243] xx direction

[0244] yy direction

[0245] zz direction

Claims

1. A system (100A, 100B, 100C) for a projection exposure apparatus (1), comprising: First component (102), The second component (104), and Decoupling devices (200A, 200B, 200C) are designed to decouple the mechanical excitation of the second component (104) from that of the first component (102) in more than one degree of freedom. in, The decoupling devices (200A, 200B, 200C) include a first decoupling element (216, 218) with positive stiffness and a second decoupling element (220, 222, 224, 226, 238, 240) with negative stiffness. The decoupling devices (200A, 200B, 200C) include a third component (202) disposed between the first component (102) and the second component (104), and The decoupling devices (200A, 200B, 200C) are designed to decouple the mechanical excitation of the second component (104) from that of the first component (102) in six degrees of freedom.

2. The system according to claim 1, wherein, The first decoupling element (216, 218) is a spring element, and the second decoupling element (220, 222, 224, 226, 238, 240) is a magnetic element or a pre-tensioned spring element.

3. The system according to claim 2, wherein, The second decoupling elements (220, 222, 224, 226) are arranged in pairs.

4. The system according to any one of claims 1-3, wherein, The first decoupling element (216, 218) and the second decoupling element (220, 222, 224, 226, 238, 240) are arranged between the first component (102) and the third component (202).

5. The system according to any one of claims 1-3, wherein, The second component (104) is suspended on the third component (202) by a third decoupling element (204, 206, 254, 256), which decouples the second component (104) from the third component (202) in the horizontal direction (y).

6. The system according to claim 5, wherein, The third decoupling element (204, 206) is a tension cable.

7. The system according to claim 5, wherein, The third decoupling element (254, 256) is a tie rod, and wherein the third decoupling element (254, 256) has positive stiffness.

8. The system according to claim 7 further comprises a fourth decoupling element (266, 268, 270, 272), the fourth decoupling element being respectively arranged between the second component (104) and the third component (202) and between the second component (104) and the first component (102), wherein, The fourth decoupling element (266, 268, 270, 272) has negative stiffness.

9. The system according to claim 8, wherein, The fourth decoupling element (266, 268, 270, 272) is a magnetic element.

10. The system of claim 8, further comprising a fourth component (276) disposed between the first component (102) and the fourth decoupling element (270, 272), the fourth decoupling element being disposed between the second component (104) and the first component (102), wherein, The fourth component (276) is decoupled from the first component (102) by the fifth decoupling element (278, 280).

11. The system according to claim 10, wherein, The fifth decoupling element (278, 280) is a spring element.

12. The system according to any one of claims 1-3, wherein, The first decoupling element (216, 218) is designed to apply a first force (F216, F218) to the third component (202) when it deflects, the orientation of the first force being opposite to the deflection direction of the first decoupling element (216, 218), and wherein the second decoupling element (220, 222, 224, 226) is designed to apply a second force (F222, F224, F238, F240) to the third component (202) when it deflects, the second force being oriented along the deflection direction of the second decoupling element (220, 222, 224, 226), and wherein the first force (F216, F218) and the second force (F222, F224, F238, F240) cancel each other out, such that the third component (202) can deflect without force.

13. A projection exposure apparatus (1) comprising at least one system (100A, 100B, 100C) according to any one of claims 1-12.

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