Gas mixing device and semiconductor process apparatus

By designing the flow channel structure and turbulence surface in the gas mixing device, the problem of insufficient gas mixing uniformity in semiconductor processes was solved, achieving uniform gas mixing in the mixing chamber and improving process quality.

CN117046332BActive Publication Date: 2026-05-12PIOTECH (SHENYANG) SEMICONDUCTOR EQUIPMENT CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
PIOTECH (SHENYANG) SEMICONDUCTOR EQUIPMENT CO LTD
Filing Date
2023-08-29
Publication Date
2026-05-12

AI Technical Summary

Technical Problem

In existing semiconductor processes, the uniformity of gas mixing within the process chamber is low, which affects the quality of process steps.

Method used

A gas mixing device is designed, including a first flow channel and a second flow channel. Both of them extend towards the center at the end that is connected to the gas mixing chamber. A pressurization section and a pressure stabilization section are set to control the gas flow rate and pressure. Multiple branch flow channels form countercurrent turbulence in the gas mixing chamber, and the step-shaped turbulence surface improves the mixing uniformity.

Benefits of technology

This achieves uniform mixing of gases within the mixing chamber, meeting the requirements of semiconductor processes.

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Abstract

Embodiments of the present application provide a gas mixing device and a semiconductor processing equipment, and relate to the field of semiconductors. The gas mixing device comprises a body, a gas mixing cavity is arranged in the body, and the body is further provided with a first flow channel, a second flow channel and a gas outlet flow channel which are in communication with the gas mixing cavity. The end of the first flow channel and the second flow channel in communication with the gas mixing cavity extends towards the center of the gas mixing cavity. The gas mixing device can make the mixing of multiple gases more uniform, thereby meeting the needs of semiconductor processes.
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Description

Technical Field

[0001] This invention relates to the field of semiconductor equipment, and more specifically, to a gas mixing device and semiconductor process equipment. Background Technology

[0002] In semiconductor product fabrication, it is typically necessary to introduce two or more mixed gases into the process chamber to complete the process steps. Currently, the uniformity of gas mixing introduced into the process chamber is relatively low, affecting the quality of the process steps. Summary of the Invention

[0003] The object of the present invention includes, for example, providing a gas mixing device and a semiconductor process setup that enables more uniform mixing of multiple gases, thereby meeting the requirements of semiconductor processes.

[0004] The embodiments of the present invention can be implemented as follows:

[0005] In a first aspect, the present invention provides a gas mixing device, including a body, wherein a gas mixing chamber is disposed within the body, and the body is further provided with a first flow channel, a second flow channel and an outlet flow channel communicating with the gas mixing chamber.

[0006] The ends of the first and second flow channels that communicate with the mixing chamber both extend toward the center of the mixing chamber.

[0007] In an optional embodiment, the first flow channel includes a first air intake section and a first pressurization section;

[0008] The flow area of ​​the first intake section is larger than the flow area of ​​the first pressurization section;

[0009] One end of the first air intake section is connected to the outside of the body, and the other end is connected to one end of the first pressurization section. The other end of the first pressurization section is connected to the mixing chamber and extends obliquely toward the center of the mixing chamber.

[0010] The second flow channel includes a second intake section and a second pressurization section;

[0011] The flow area of ​​the second intake section is larger than that of the second pressurization section;

[0012] One end of the second air intake section is connected to the outside of the main body, and the other end is connected to one end of the second pressurization section. The other end of the second pressurization section is connected to the mixing chamber and extends obliquely toward the center of the mixing chamber.

[0013] In an optional implementation, the first flow channel further includes a first voltage stabilizing section;

[0014] The flow area of ​​the first pressure stabilizing section is larger than the flow area of ​​the first air intake section, and one end of the first pressure stabilizing section is connected to the first air intake section, and the other end is connected to the first pressurizing section.

[0015] The first flow channel also includes a second voltage stabilizing section;

[0016] The flow area of ​​the second pressure stabilizing section is larger than that of the second air intake section, and one end of the second pressure stabilizing section is connected to the second air intake section, while the other end is connected to the second pressurizing section.

[0017] In an optional embodiment, the first pressurization section includes a plurality of branch channels A arranged in the same direction. One end of each of the plurality of branch channels A is connected to the first air intake section, and the other end of each of the plurality of branch channels A is connected to the mixing chamber. They all extend obliquely toward the center of the mixing chamber, and the total flow area of ​​the plurality of branch channels A is smaller than the flow area of ​​the first air intake section.

[0018] The second pressurization section includes multiple branch channels B arranged in the same direction. One end of each branch channel B is connected to the second air intake section, and the other end of each branch channel B is connected to the mixing chamber. All of them extend at an angle towards the center of the mixing chamber. The total flow area of ​​the multiple branch channels B is smaller than the flow area of ​​the second air intake section.

[0019] In an optional embodiment, the openings of the multiple branch channels A that communicate with the mixing chamber are inclined toward the center of the mixing chamber, and the angle between them and the depth direction of the mixing chamber is in the range of 30°-60°.

[0020] The openings of the multiple branch channels B that are connected to the mixing chamber are inclined toward the center of the mixing chamber, and the angle between them and the depth direction of the mixing chamber is in the range of 30°-60°.

[0021] In an optional embodiment, the mixing chamber is flat, and the first flow channel and the second flow channel are respectively connected to both sides of the mixing chamber along its length.

[0022] In an optional embodiment, the outlet air passage is located at the center of the body, and the mixing chamber has stepped turbulence surfaces on both sides near the outlet air passage. The turbulence surfaces can turbulent the gas in the mixing chamber to make the gas mixing more uniform.

[0023] In an optional implementation, the body includes a first body component, a second body component, and a third body component;

[0024] The mixing chamber is partially disposed in the second body component and partially disposed in the third body component. The first and second air intake sections are respectively recessed on one side of the first body component. The first and second pressure stabilizing sections are both disposed on the other side of the first body component and are correspondingly connected. The air outlet channel and part of the mixing chamber are disposed in the third body component. The first, second, and third body components are stacked sequentially.

[0025] In an optional embodiment, the cross-sections of the first intake section, the first pressure stabilizing section, and the first pressurizing section are all circular, and the diameter of the first pressure stabilizing section is larger than the diameter of the first intake section, and the diameter of the first intake section is larger than the diameter of the first pressurizing section.

[0026] The cross-sections of the second intake section, the second pressure stabilizing section, and the second pressurizing section are all circular, and the diameter of the second pressure stabilizing section is larger than the diameter of the second intake section, and the diameter of the second intake section is larger than the diameter of the second pressurizing section.

[0027] In a second aspect, the present invention provides a semiconductor process setup including the gas mixing device described in any of the foregoing embodiments.

[0028] The beneficial effects of the embodiments of the present invention include, for example:

[0029] This application extends both the first and second flow channels, which are connected to the mixing chamber, toward the center of the mixing chamber. This causes the two gases to collide and create turbulence after flowing into the mixing chamber, thus allowing the two gases to mix more evenly within the mixing chamber. Attached Figure Description

[0030] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0031] Figure 1 This is a cross-sectional view of the gas mixing device provided in an embodiment of the present invention.

[0032] Icons: 100 - Mixing device; 110 - Body; 111 - Mixing chamber; 113 - First flow channel; 115 - Second flow channel; 117 - Outlet flow channel; 119 - First inlet section; 121 - First pressurization section; 123 - First pressure stabilization section; 125 - Second inlet section; 127 - Second pressurization section; 129 - Second pressure stabilization section; 131 - Branch flow channel A; 133 - Branch flow channel B; 135 - Bumper surface; 137 - First body component; 139 - Second body component; 141 - Third body component. Detailed Implementation

[0033] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0034] Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0035] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0036] In the description of this invention, it should be noted that if terms such as "upper," "lower," "inner," or "outer" are used to indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship in which the product of this invention is usually placed, they are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this invention.

[0037] Furthermore, the terms "first" and "second" are used only to distinguish descriptions and should not be interpreted as indicating or implying relative importance.

[0038] It should be noted that, where there is no conflict, the features in the embodiments of the present invention can be combined with each other.

[0039] Please refer to Figure 1This embodiment provides a semiconductor process apparatus, which may be a coating apparatus. The semiconductor process apparatus includes an apparatus body 110 and a gas mixing device 100. The apparatus body 110 has a process chamber, and the gas mixing device 100 is connected to the process chamber to deliver a uniformly mixed process gas into the process chamber.

[0040] In this embodiment, the gas mixing device 100 includes a body 110, within which a gas mixing chamber 111 is disposed. The body 110 also includes a first flow channel 113, a second flow channel 115, and an outlet flow channel 117, all communicating with the gas mixing chamber 111. The ends of the first flow channel 113 and the second flow channel 115 that communicate with the gas mixing chamber 111 both extend towards the center of the gas mixing chamber 111. The first flow channel 113 and the second flow channel 115 are used to connect their different gas delivery pipes, and the outlet flow channel 117 is used to communicate with the reaction chamber.

[0041] In this embodiment, by extending the ends of the first flow channel 113 and the second flow channel 115 that are connected to the mixing chamber 111 towards the center of the mixing chamber 111, the two gases will collide and form turbulence after flowing into the mixing chamber 111, thereby allowing the two gases to mix more evenly in the mixing chamber 111.

[0042] Of course, in other embodiments of this application, the number of air intake channels can be set according to process requirements, and it can be two, three, four or even more. As long as it can achieve counterflow in the mixing chamber 111.

[0043] In this embodiment, the first flow channel 113 includes a first air intake section 119 and a first pressurization section 121. The flow area of ​​the first air intake section 119 is larger than that of the first pressurization section 121. One end of the first air intake section 119 is connected to the outside of the body 110, and the other end is connected to one end of the first pressurization section 121. The other end of the first pressurization section 121 is connected to the mixing chamber 111 and extends obliquely toward the center of the mixing chamber 111. The second flow channel 115 includes a second air intake section 125 and a second pressurization section 127. The flow area of ​​the second air intake section 125 is larger than that of the second pressurization section 127. One end of the second air intake section 125 is connected to the outside of the body 110, and the other end is connected to one end of the second pressurization section 127. The other end of the second pressurization section 127 is connected to the mixing chamber 111 and extends obliquely toward the center of the mixing chamber 111.

[0044] The flow area of ​​the first pressurization section 121 is set to be smaller than that of the first intake section 119, and the flow area of ​​the second pressurization section 127 is set to be smaller than that of the second intake section 125. This allows the two gases to accelerate their flow rate as they pass through the first pressurization section 121 and the second pressurization section 127, resulting in a more intense collision between the two gases in the mixing chamber 111. This leads to a more uniform mixing of the two gases. Furthermore, the collision of the two gases causes them to decelerate and depressurize in the mixing chamber 111, creating turbulence and further improving the uniformity of the mixture. Secondly, the ends of the first pressurization section 121 and the second pressurization section 127 that connect to the mixing chamber 111 are inclined towards the center of the mixing chamber 111. Compared to direct opposition, this allows the two gases to mix according to a preset ratio.

[0045] Please refer to Figure 1 In this embodiment, the first flow channel 113 further includes a first pressure-stabilizing section 123. The flow area of ​​the first pressure-stabilizing section 123 is larger than the flow area of ​​the first air intake section 119, and one end of the first pressure-stabilizing section 123 is connected to the first air intake section 119, while the other end is connected to the first pressurizing section 121. The first flow channel 113 also includes a second pressure-stabilizing section 129. The flow area of ​​the second pressure-stabilizing section 129 is larger than the flow area of ​​the second air intake section 125, and one end of the second pressure-stabilizing section 129 is connected to the second air intake section 125, while the other end is connected to the second pressurizing section 127.

[0046] This embodiment includes a first pressure-stabilizing section 123 and a second pressure-stabilizing section 129, which stabilize the pressure, allowing the gas flowing into the first pressurizing section 121 and the second pressurizing section 127 to flow at a relatively constant pressure and velocity, thereby achieving counterbalancing and ensuring the uniformity and accurate proportioning of the mixture. Furthermore, the first pressure-stabilizing section 123 and the second pressure-stabilizing section 129 can store a portion of the gas, preventing pressure fluctuations in the input gas source pressure from causing pressure fluctuations in the first pressurizing section 121 and the second pressurizing section 127.

[0047] In this embodiment, the first pressurization section 121 includes multiple branch channels A131 arranged in the same direction. One end of each branch channel A131 is connected to the first air intake section 119, and the other end of each branch channel A131 is connected to the mixing chamber 111. All branches A131 extend inclined towards the center of the mixing chamber 111, and the total flow area of ​​the multiple branch channels A131 is smaller than the flow area of ​​the first air intake section 119. The second pressurization section 127 includes multiple branch channels B133 arranged in the same direction. One end of each branch channel B133 is connected to the second air intake section 125, and the other end of each branch channel B133 is connected to the mixing chamber 111. All branches B133 extend inclined towards the center of the mixing chamber 111, and the total flow area of ​​the multiple branch channels B133 is smaller than the flow area of ​​the second air intake section 125.

[0048] In this embodiment, the first pressurization section 121 is configured as multiple parallel branch channels A131, and the second pressurization section 127 is configured as multiple parallel branch channels B133. In this way, multiple airflows will collide in the mixing chamber 111, thereby allowing the two gases to mix more evenly.

[0049] In this embodiment, the openings of the multiple branch channels A131 connected to the mixing chamber 111 are inclined towards the center of the mixing chamber 111, and the angle between them and the depth direction of the mixing chamber 111 ranges from 30° to 60°. Similarly, the openings of the multiple branch channels B133 connected to the mixing chamber 111 are inclined towards the center of the mixing chamber 111, and the angle between them and the depth direction of the mixing chamber 111 ranges from 30° to 60°. Setting the angle between the outlet directions of branch channels A131 and B133 to 30°-60° allows the two gas streams to counteract each other in the central regions of the mixing chamber 111's depth and length, resulting in a more uniform mixing of the two gases.

[0050] Please refer to Figure 1 In this embodiment, the mixing chamber 111 is flat and thicker at both ends and thinner in the middle along its length. The first flow channel 113 and the second flow channel 115 are respectively connected to both sides of the mixing chamber 111 along its length. That is, the branch flow channel A131 and the branch flow channel B133 are arranged on both sides of the mixing chamber 111 along its length, and the openings are inclined upwards towards the center of the mixing chamber 111 along its length.

[0051] In this embodiment, the outlet air passage 117 is located at the center of the body 110, and the mixing chamber 111 is provided with stepped turbulence surfaces 135 on both sides near the outlet air passage 117. The turbulence surfaces 135 can turbulent the gas in the mixing chamber 111 to make the gas mixing more uniform.

[0052] The turbulence surface 135 allows the airflow to be further turbulent as it flows from the mixing chamber 111 toward the outlet airflow channel 117, thereby improving the uniformity of the air mixture.

[0053] In this embodiment, the stepped turbulence surface 135 causes the mixing chamber 111 to gradually shrink towards the top.

[0054] In this embodiment, the stepped turbulence surface 135 has multiple steps, such as three-step or four-step.

[0055] Please refer to Figure 1In this embodiment, the body 110 includes a first body component 137, a second body component 139, and a third body component 141. A mixing chamber 111 is partially disposed in the second body component 139 and partially disposed in the third body component 141. A first intake section 119 and a second intake section 125 are respectively recessed on one side of the first body component 137. A first pressure stabilizing section 123 and a second pressure stabilizing section 129 are both disposed on the other side of the first body component 137 and are correspondingly connected. An outlet air passage 117 and a portion of the mixing chamber 111 are disposed in the third body component 141. The first body component 137, the second body component 139, and the third body component 141 are stacked sequentially. This facilitates the formation of flow channels within the body 110.

[0056] In this embodiment, the cross-sections of the first intake section 119, the first pressure-stabilizing section 123, and the first pressurizing section 121 are all circular, and the diameter of the first pressure-stabilizing section 123 is larger than the diameter of the first intake section 119, and the diameter of the first intake section 119 is larger than the diameter of the first pressurizing section 121. The cross-sections of the second intake section 125, the second pressure-stabilizing section 129, and the second pressurizing section 127 are all circular, and the diameter of the second pressure-stabilizing section 129 is larger than the diameter of the second intake section 125, and the diameter of the second intake section 125 is larger than the diameter of the second pressurizing section 127.

[0057] In this embodiment, the first body component 137, the second body component 139, and the third body component 141 are provided with mutually cooperating positioning structures, thereby enabling assembly and positioning during installation. The positioning structures can be positioning posts and positioning grooves.

[0058] In summary, the beneficial effects of the gas mixing device 100 and the semiconductor process equipment provided in this embodiment include:

[0059] In this embodiment, by extending the ends of the first flow channel 113 and the second flow channel 115 that are connected to the mixing chamber 111 towards the center of the mixing chamber 111, the two gases will collide and form turbulence after flowing into the mixing chamber 111, thereby allowing the two gases to mix more evenly in the mixing chamber 111.

[0060] The above are merely specific embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A gas mixing device, characterized in that, Includes a body (110), which has a mixing chamber (111) inside. The body (110) also has a first flow channel (113), a second flow channel (115) and an outlet flow channel (117) communicating with the mixing chamber (111). The ends of the first flow channel (113) and the second flow channel (115) that are connected to the mixing chamber (111) both extend toward the center of the mixing chamber (111); The first flow channel (113) includes a first air intake section (119), a first pressure stabilizing section (123) and a first pressurizing section (121) connected in sequence. The flow area of ​​the first air intake section (119) is larger than the flow area of ​​the first pressurizing section (121), and the flow area of ​​the first pressure stabilizing section (123) is larger than the flow area of ​​the first air intake section (119). The second flow channel (115) includes a second air intake section (125), a second pressure stabilizing section (129), and a second pressurizing section (127) connected in sequence. The flow area of ​​the second air intake section (125) is larger than that of the second pressurizing section (127), and the flow area of ​​the second pressure stabilizing section (129) is larger than that of the second air intake section (125). Wherein, one end of the first air intake section (119) is connected to the outside of the body (110), and the other end is connected to one end of the first pressurization section (121). The other end of the first pressurization section (121) is connected to the mixing chamber (111) and extends obliquely toward the center of the mixing chamber (111). One end of the second air intake section (125) is connected to the outside of the body (110), and the other end is connected to one end of the second pressurization section (127). The other end of the second pressurization section (127) is connected to the mixing chamber (111) and extends obliquely toward the center of the mixing chamber (111).

2. The gas mixing device according to claim 1, characterized in that, One end of the first pressure stabilizing section (123) is connected to the first air intake section (119), and the other end is connected to the first pressurizing section (121); One end of the second pressure stabilizing section (129) is connected to the second air intake section (125), and the other end is connected to the second pressurizing section (127).

3. The gas mixing device according to claim 1 or 2, characterized in that, The first pressurization section (121) includes a plurality of branch channels A (131) arranged in the same direction. One end of each of the plurality of branch channels A (131) is connected to the first air intake section (119), and the other end of each of the plurality of branch channels A (131) is connected to the mixing chamber (111). They all extend obliquely toward the center of the mixing chamber (111). The total flow area of ​​the plurality of branch channels A (131) is smaller than the flow area of ​​the first air intake section (119). The second pressurization section (127) includes a plurality of branch channels B (133) arranged in the same direction. One end of each of the plurality of branch channels B (133) is connected to the second air intake section (125), and the other end of each of the plurality of branch channels B (133) is connected to the mixing chamber (111). They all extend at an angle toward the center of the mixing chamber (111). The total flow area of ​​the plurality of branch channels B (133) is less than the flow area of ​​the second air intake section (125).

4. The gas mixing device according to claim 3, characterized in that, The openings of the multiple branch channels A (131) connected to the mixing chamber (111) are inclined toward the center of the mixing chamber (111), and the angle between them and the depth direction of the mixing chamber (111) is in the range of 30°-60°. The openings of the multiple branch channels B (133) that are connected to the mixing chamber (111) are inclined toward the center of the mixing chamber (111), and the angle between them and the depth direction of the mixing chamber (111) is in the range of 30°-60°.

5. The gas mixing device according to claim 1, characterized in that, The mixing chamber (111) is flat, and the first flow channel (113) and the second flow channel (115) are respectively connected to both sides of the mixing chamber (111) along its length.

6. The gas mixing device according to claim 1, characterized in that, The outlet air passage (117) is located at the center of the body (110). The mixing chamber (111) has stepped turbulence surfaces (135) on both sides near the outlet air passage (117). The turbulence surfaces (135) can turbulent the gas in the mixing chamber (111) to make the gas mixing more uniform.

7. The mixing device according to claim 2, characterized in that, The body (110) includes a first body component (137), a second body component (139) and a third body component (141). The mixing chamber (111) is partially disposed on the second body component (139) and partially disposed on the third body component (141). The first air intake section (119) and the second air intake section (125) are respectively recessed on one side of the first body component (137). The first pressure stabilizing section (123) and the second pressure stabilizing section (129) are both disposed on the other side of the first body component (137) and are connected accordingly. The air outlet channel (117) and part of the mixing chamber (111) are disposed on the third body component (141). The first body component (137), the second body component (139) and the third body component (141) are stacked sequentially.

8. The gas mixing device according to claim 7, characterized in that, The cross-sections of the first intake section (119), the first pressure stabilizing section (123), and the first pressurizing section (121) are all circular, and the diameter of the first pressure stabilizing section (123) is larger than the diameter of the first intake section (119), and the diameter of the first intake section (119) is larger than the diameter of the first pressurizing section (121). The cross-sections of the second intake section (125), the second pressure stabilizing section (129), and the second pressurizing section (127) are all circular, and the diameter of the second pressure stabilizing section (129) is larger than the diameter of the second intake section (125), and the diameter of the second intake section (125) is larger than the diameter of the second pressurizing section (127).

9. A semiconductor process apparatus, characterized in that, The mixing device includes any one of claims 1-8.