Display device and method for manufacturing a display device

Abstract

A part region (71) of the hole transport layer (41) as the object layer is formed between the plurality of lower electrodes (3) and the partition wall (5) to have a first part (72) and a second part (73) in a manner of sandwiching at least one of the non-formed part of the object layer in the reverse taper portion (22) and the region in which the object layer is thinner than the plurality of lower electrodes (3).

Description

Technical Field

[0001] This invention relates to a display device and a method for manufacturing a display device. Background Technology

[0002] Crosstalk can be a problem in OLED (Organic Light Emitting Diode) and QLED (Quantum Dot Light Emitting Diode) display devices. Crosstalk refers to unintentional electrical interference between multiple sub-pixels. In these display devices, crosstalk can cause color mixing and reduced efficiency.

[0003] One possible cause of crosstalk is the electrical connection of multiple electrodes that are separately positioned in the carrier transport layer.

[0004] In Patent Document 1, crosstalk is suppressed by forming the side of the partition wall into an inverted cone shape, thereby thinning the layer containing organic matter on the side of the partition wall. Existing technical documents Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 2019-91724 Summary of the Invention The problem that the invention aims to solve

[0006] In the technology disclosed in Patent Document 1, electrodes need to be formed on the side of the partition wall, which is difficult to manufacture, resulting in the problem of difficulty in suppressing crosstalk. Solution for solving the problem

[0007] A display device according to one aspect of the present invention comprises: a plurality of lower electrodes disposed separately from each other; an insulating layer at least a portion thereof disposed below the plurality of lower electrodes; a partition wall disposed between the plurality of lower electrodes; an electroluminescent layer electrically connected to the plurality of lower electrodes and composed of a plurality of layers including the light-emitting layer; and an upper electrode disposed above the electroluminescent layer. In the insulating layer, a groove or hole, i.e., a gap, is formed below the plurality of lower electrodes. At least a portion of the inner wall of the insulating layer defining the gap has an inverted conical portion. At least one layer of the electroluminescent layer located below the light-emitting layer, i.e., an object layer, has a portion formed between the plurality of lower electrodes and the partition wall, and has at least a first portion and a second portion, the first portion and the second portion sandwiching at least one of a non-forming portion of the object layer in the inverted conical portion and a region of the object layer that is thinner than the plurality of lower electrodes.

[0008] A method for manufacturing a display device according to one aspect of the present invention includes: a first step of providing a first insulating film as part of an insulating layer, the insulating layer having grooves or holes, i.e., gaps, and forming a first inverted conical portion on at least a portion of the inner wall of the insulating layer defining the gaps; a second step of providing a second insulating film as part of the insulating layer, forming a positive conical portion on a portion of the inner wall of the insulating layer defining the gaps; a third step of forming a contact electrode along the positive conical portion; a fourth step of forming a first lower electrode electrically connected to the contact electrode and a second lower electrode adjacent to the first lower electrode above at least a portion of the gaps; a fifth step of forming at least one of an electroluminescent layer composed of a plurality of layers including a light-emitting layer, electrically connected to the first lower electrode and the second lower electrode, and forming at least one of the electroluminescent layers located below the light-emitting layer, i.e., an object layer, other than at least a portion of the first inverted conical portion; and a sixth step of forming a partition wall between the first lower electrode and the second lower electrode in a manner that fills the gaps. Invention Effects

[0009] According to one aspect of the present invention, crosstalk can be suppressed. Attached Figure Description

[0010] Figure 1 This is a cross-sectional view showing a schematic configuration of a display device according to the first embodiment of the present invention. Figure 2 A top view showing the schematic configuration of the insulating layer and upper electrode of the display device designed for the first embodiment of the present invention. Figure 3 This is a cross-sectional view showing a schematic configuration of a display device according to a second embodiment of the present invention. Figure 4 This is a cross-sectional view showing a schematic configuration of a display device according to a third embodiment of the present invention. Figure 5 This is a top view showing a schematic configuration of the insulating layer of the display device according to the third embodiment of the present invention. Figure 6 This is a cross-sectional view showing a schematic configuration of a display device according to the fourth embodiment of the present invention. Figure 7 This is a cross-sectional view showing a schematic configuration of a display device according to the fifth embodiment of the present invention. Figure 8 This is a cross-sectional view showing a schematic configuration of a display device according to the sixth embodiment of the present invention. Figure 9 This is a top view showing a schematic configuration of the insulating layer and transistors of the display device according to the sixth embodiment of the present invention. Figure 10 This is a cross-sectional view showing a schematic configuration of a display device according to the seventh embodiment of the present invention. Figure 11 This is a cross-sectional view of the first to third steps in the manufacturing method of the display device according to the eighth embodiment of the present invention. Figure 12 This is a cross-sectional view of the fourth to sixth steps in the manufacturing method of the display device according to the eighth embodiment of the present invention. Figure 13 This is a cross-sectional view of step 3.5 in the manufacturing method of the display device according to the ninth embodiment of the present invention. Detailed Implementation

[0011] The following description illustrates the manner in which the present invention is carried out. Furthermore, for ease of explanation, components having the same function as those previously described are sometimes marked with the same reference numerals, and their descriptions are not repeated.

[0012] First Implementation Method Figure 1 This is a cross-sectional view showing the schematic configuration of the display device 101 according to the first embodiment of the present invention. Figure 2 This is a top view showing a schematic configuration of the insulating layer 2 and the upper electrode 6 of the display device 101 according to the first embodiment of the present invention. In this specification, the side closer to the substrate 1 is referred to as "bottom," and the side farther from the substrate 1 is referred to as "top." The "top" and "bottom" in this specification can also be said to correspond to the "top" and "bottom" in the cross-sectional views of each display device.

[0013] Figure 1 The display device 101 shown includes a substrate 1, an insulating layer 2, multiple lower electrodes 3, an electroluminescent layer 4, a partition wall 5, and an upper electrode 6.

[0014] Multiple lower electrodes 3 are arranged separately from each other. For example, the multiple lower electrodes 3 are arranged in an island shape or multiple lines. As an example of the material constituting the multiple lower electrodes 3, at least one of aluminum and ITO (Indium Tin Oxide) can be listed.

[0015] At least a portion of the insulating layer 2 is disposed below the plurality of lower electrodes 3. The insulating layer 2 may comprise, for example, a silicon oxide (SiOx) film or a silicon nitride (SiNx) film or a laminate thereof, or a film made of a coatingable organic material such as polyimide or acrylic acid.

[0016] A partition wall 5 is disposed between the plurality of lower electrodes 3. The partition wall 5 is configured to separate two adjacent lower electrodes 3 among the plurality of lower electrodes 3. As an example of the material constituting the partition wall 5, organic materials such as polyimide and acrylic acid can be cited.

[0017] The electroluminescent layer 4 is electrically connected to multiple lower electrodes 3. The electroluminescent layer 4 is composed of multiple layers including a light-emitting layer 42, such as a hole transport layer 41, a light-emitting layer 42, and an electron transport layer 43.

[0018] Hole transport layer 41 is a layer that transports holes from any corresponding lower electrode 3 among the plurality of lower electrodes 3 to the light-emitting layer 42. Electron transport layer 43 is a layer that transports electrons from the upper electrode 6 to the light-emitting layer 42. In the light-emitting layer 42, light is emitted by the current flowing between any corresponding lower electrode 3 among the plurality of lower electrodes 3 and the upper electrode 6. Examples of light-emitting layers 42 include OLEDs and QLEDs.

[0019] The upper electrode 6 is disposed above the electroluminescent layer 4. The upper electrode 6 is disposed above one of the multiple lower electrodes 3 in a manner that extends beyond the partition wall 5. Examples of materials constituting the upper electrode 6 include ITO and IZO (Indium Zinc Oxide).

[0020] The insulating layer 2 has grooves or holes, i.e., gaps 21, formed below the plurality of lower electrodes 3. At least a portion of the inner wall of the insulating layer 2 defining the gaps 21 has an inverted conical portion 22. An inverted conical portion refers to a portion of the wall surface defining the end of the component having the inverted conical portion, which is inclined in a manner that moves downward toward the inside of the component from above the corresponding display device. The angle formed between the upper surface of the substrate 1 and the inverted conical portion or its extension is an obtuse angle on the component side.

[0021] At least one layer of the electroluminescent layer 4 located below the light-emitting layer 42, namely the target layer, has the following configuration. In the display device 101, the target layer is the hole transport layer 41.

[0022] A portion 71 of the object layer is formed between the plurality of lower electrodes 3 and the partition wall 5. The object layer is not formed on at least a portion of the inverted conical portion 22. The object layer has a first portion 72 and a second portion 73, at least sandwiching the non-formed portion of the object layer in the inverted conical portion 22. Furthermore, the first portion 72 and the second portion 73 are located between paths leading from above one of the plurality of lower electrodes 3 adjacent to each other along various components (in the display device 101, the inner wall of the insulating layer 2 and the upper surface of the substrate 1) defining the gap 21 to above the other.

[0023] According to the above configuration, the inverted conical portion 22 can easily improve the insulation between the plurality of lower electrodes 3, and specifically, can easily improve the insulation between the first portion 72 and the second portion 73. Therefore, crosstalk caused by the plurality of lower electrodes 3 can be suppressed. According to the above configuration, it is not necessary to form a layer on the inverted conical portion 22, therefore, the manufacturing of the display device 101 is not difficult.

[0024] Furthermore, the object layer may have a first portion 72 and a second portion 73, at least sandwiching a region in the inverted conical portion 22 where the object layer is thinner than the plurality of lower electrodes 3. That is, between the first portion 72 and the second portion 73, there may be a region in the inverted conical portion 22 where the object layer is thinner than the plurality of lower electrodes 3, or both may exist.

[0025] In the display device 101, at least a portion of the partition wall 5 located above the plurality of lower electrodes 3 is a conical portion 51. A conical portion refers to a portion of the wall surface defining the end of the component having the conical portion, inclined in such a way that it is displaced from below the corresponding display device toward the inner side of the component above. The angle formed between the upper surface of the substrate 1 and the conical portion or its extension line is an acute angle on the component side.

[0026] An example of a manufacturing method for the display device 101 is shown below. First, after forming an insulating layer 2 having an inverted conical portion 22 on a substrate 1, a plurality of lower electrodes 3 and an electroluminescent layer 4 are formed using a known process. Next, a partition wall 5 is formed. Next, an upper electrode 6 is formed. In a display device 101 manufactured using this method, a residue 81 exists in the gap 21. The residue 81 includes materials constituting the plurality of lower electrodes 3, materials constituting the hole transport layer 41, materials constituting the light-emitting layer 42, and materials constituting the electron transport layer 43. Furthermore, the residue 81, and the residues 82 and 83 described later, are so-called residual residues as the text suggests, and are not included in the target layer.

[0027] The first part 72 and the second part 73 are preferably discontinuous. Specifically, it is preferable that the first part 72 and the second part 73 are not interconnected via a portion of the object layer. This further suppresses crosstalk caused by the multiple lower electrodes 3.

[0028] A portion of the light-emitting layer 42 is located between the plurality of lower electrodes 3 and the partition wall 5. This portion of the light-emitting layer 42 includes areas prone to uneven film formation, such as the edges of the light-emitting layer 42 and areas within the light-emitting layer 42 that may exhibit distortion and / or thickness inhomogeneity. Therefore, the partition wall 5 can cover these areas of the light-emitting layer 42 that are prone to uneven film formation without allowing them to contribute to light emission, thus enabling a display device 101 with excellent performance.

[0029] Preferably, the insulating layer 2 contains fluorine. This improves the hydrophobicity of the insulating layer 2, thereby suppressing crosstalk between multiple lower electrodes 3 caused by the accidental adhesion of the material constituting the hole transport layer 41 to the insulating layer 2.

[0030] The materials constituting the first part 72 are the same as those constituting the second part 73. Thus, the first part 72 and the second part 73 can be formed together using known processes.

[0031] according to Figure 2 The insulating layer 2 is formed in the shape of stripes (multiple stripes), and an inverted conical portion 22 is formed at the end of the adjacent stripe side of each stripe. The upper electrode 6 is formed in a manner that spans multiple stripes, roughly along the short side direction of each stripe.

[0032] [Second Implementation] Figure 3 This is a cross-sectional view showing the schematic configuration of the display device 102 according to the second embodiment of the present invention.

[0033] The differences between the configuration of display device 102 and display device 101 are as follows.

[0034] In the display device 102, at least one of the multiple layers comprising the electroluminescent layer 4 is located between the partition wall 5 and the upper electrode 6. In the display device 102, the light-emitting layer 42 and the electron transport layer 43 are disposed over one of the multiple lower electrodes 3, extending beyond the partition wall 5. The display device 102 has a stacked structure consisting of the partition wall 5, the light-emitting layer 42, the electron transport layer 43, and the upper electrode 6, formed sequentially from bottom to top. This allows for the suppression of voltage drop in the upper electrode 6 in the direction of current flow, thereby suppressing IR drop (brightness unevenness).

[0035] An example of a manufacturing method for the display device 102 is shown below. First, after forming an insulating layer 2 having an inverted conical portion 22 on a substrate 1, a plurality of lower electrodes 3 and a hole transport layer 41 are formed using a known process. Next, a partition wall 5 is formed. Then, a light-emitting layer 42, an electron transport layer 43, and an upper electrode 6 are formed. In the display device 102 manufactured by this method, a residue 82 exists in the gap 21, and the residue 82 contains materials constituting the plurality of lower electrodes 3 and materials constituting the hole transport layer 41.

[0036] [Third Implementation Method] Figure 4 This is a cross-sectional view showing the schematic configuration of the display device 103 according to the third embodiment of the present invention. Figure 5 This is a top view showing the schematic configuration of the insulating layer 2 of the display device 103 according to the third embodiment of the present invention.

[0037] The differences between the configuration of display device 103 and display device 101 are as follows.

[0038] The discussion focuses on the first lower electrode 31, which is any one of the plurality of lower electrodes 3. The display device 103 includes a TFT (Thin Film Transistor) 9, a contact electrode 10, and a metal wiring 11. The TFT 9 is electrically connected to the first lower electrode 31 via the contact electrode 10. The contact electrode 10 is formed along the inverted conical portion 22 of the insulating layer 2.

[0039] Display device 101 is a passive matrix type, while display device 103 is an active matrix type. The active matrix type display device 103 includes a TFT 9 electrically connected to a first lower electrode 31, which is one of a plurality of lower electrodes 3. This reduces the load on the various components constituting the display device 103, thus enabling a display device 103 with a long lifespan.

[0040] In the display device 103, the contact electrode 10 can be formed, for example, by orthorhombic vapor deposition (sputtering).

[0041] according to Figure 5 The insulating layer 2 is formed in the shape of islands, and an inverted conical part 22 is formed at the end of each island.

[0042] [Fourth Implementation Method] Figure 6 This is a cross-sectional view showing the schematic configuration of the display device 104 according to the fourth embodiment of the present invention.

[0043] The differences between the configuration of display device 104 and display device 103 are as follows.

[0044] In display device 104, as shown in display device 102, at least one of the multiple layers comprising the electroluminescent layer 4 is located between the partition wall 5 and the upper electrode 6. This suppresses IR drop (brightness unevenness).

[0045] [Fifth Implementation Method] Figure 7 This is a cross-sectional view showing the schematic configuration of the display device 105 according to the fifth embodiment of the present invention.

[0046] The differences between the configuration of display device 105 and display device 104 are as follows.

[0047] In display device 105, at least one of the multiple layers comprising electroluminescent layer 4 is located between partition wall 5 and upper electrode 6, which is the same as in display device 104.

[0048] On the other hand, in display device 104, a light-emitting layer 42 is provided over the plurality of lower electrodes 3 in a manner that extends beyond the partition wall 5. However, in display device 105, the light-emitting layer 42 is not provided in a manner that extends beyond the partition wall 5. In display device 105, a portion of the light-emitting layer 42 is located between the plurality of lower electrodes 3 and the partition wall 5. Therefore, it is possible to cover the portion of the light-emitting layer 42 that is prone to uneven film formation with the partition wall 5 so that it does not contribute to light emission, thus enabling display device 105 to achieve good performance.

[0049] In the display device 105, residue 83 exists in the gap 21. Residue 83 includes materials constituting a plurality of lower electrodes 3, materials constituting a hole transport layer 41, and materials constituting a light-emitting layer 42.

[0050] [Sixth Implementation Method] Figure 8 This is a cross-sectional view showing the schematic configuration of the display device 106 according to the sixth embodiment of the present invention. Figure 9 This is a top view showing the schematic configuration of the insulating layer 2 and TFT 9 of the display device 106 according to the sixth embodiment of the present invention.

[0051] The differences between the configuration of display device 106 and display device 105 are as follows.

[0052] A portion of the inner wall of the insulating layer 2 defining the gap 21 has a positive tapered portion 23. Along the positive tapered portion 23, the first lower electrode 31 and the TFT9 are electrically connected via the contact electrode 10. As a result, the possibility of an interruption occurring in the contact electrode 10 formed in the insulating layer 2 can be reduced, thus reducing the possibility of poor electrical connection between the first lower electrode 31 and the TFT9.

[0053] according to Figure 9 The insulating layer 2 is formed in the shape of islands, and an inverted conical portion 22 is formed at the end of each island. However, in the TFT9 mounting portion at the end of each island and in its vicinity, an inverted conical portion 22 is not formed, but a regular conical portion 23 is formed instead.

[0054] [Seventh Implementation Method] Figure 10 This is a cross-sectional view showing the schematic configuration of the display device 107 according to the seventh embodiment of the present invention.

[0055] The differences between the configuration of display device 107 and display device 105 are as follows.

[0056] In the display device 107, the first lower electrode 31 and the TFT 9 are electrically connected on the outside of the gap 21 via a contact electrode 10 embedded in the insulating layer 2. This reduces the size of the upper end of the gap 21, thus enabling the display device 107 to achieve a high aperture ratio.

[0057] [Eighth Implementation Method] Figure 11 This is a cross-sectional view showing the first to third steps in the manufacturing method of the display device according to the eighth embodiment of the present invention. Figure 12 This is a cross-sectional view showing the fourth to sixth steps in the manufacturing method of the display device according to the eighth embodiment of the present invention.

[0058] The manufacturing method of the display device in this embodiment includes steps 1 to 6.

[0059] Step 1: On a substrate 1 having TFTs 9 and metal wiring 11, a first insulating film 24 is formed as part of an insulating layer 2 having grooves or holes, i.e., gaps 21. Here, at least a portion of the inner wall of the insulating layer 2 defining the gaps 21 is formed into an inverted conical portion 22. The inverted conical portion 22 formed in step 1 corresponds to the first inverted conical portion.

[0060] Step 2: A second insulating film 25 is provided as part of the insulating layer 2. Here, a conical portion 23 is formed on a portion of the inner wall of the insulating layer 2 that defines the gap 21.

[0061] In the second step, a negative photoresist 26 is applied from above the first insulating film 24 to fill the first insulating film 24. A photomask 12 is used to cover the top of the inverted conical portion 22, exposing the photoresist 26. Next, by development, a positive conical portion 23 is formed using the photoresist 26, completing the second insulating film 25. In the display device of this embodiment, the combination of the first insulating film 24 and the second insulating film 25 corresponds to the insulating layer 2.

[0062] Furthermore, in the insulating layer 2 formed in the second process, a step difference 231 is formed in the conical portion 23. This step difference 231 is preferably minimized or eliminated by increasing the thickness of the photoresist coating 26 or by exposing the photoresist 26 using halftone exposure. Alternatively, the conical portion 23 can also be formed using oblique exposure. For ease of explanation, it will be assumed that there is no step difference 231 in processes after the third process.

[0063] Furthermore, as photoresist 26, a positive photoresist can be used instead of a negative photoresist.

[0064] Step 3: Form a contact electrode 10 that is electrically connected to the TFT9 along the positive tapered portion 23.

[0065] Step 4: Forming a first lower electrode 31 electrically connected to the contact electrode 10, and a second lower electrode 32 adjacent to the first lower electrode 31 above at least a portion of the gap 21. The second lower electrode 32 is one of a plurality of lower electrodes 3. Steps 3 and 4 can be performed simultaneously.

[0066] Step 5: At least one of the electroluminescent layers 4, which is electrically connected to the first lower electrode 31 and the second lower electrode 32 and is composed of multiple layers including the light-emitting layer 42. Here, an object layer (here, a hole transport layer 41) is formed. This object layer is at least one layer of the light-emitting layers 4 located below the light-emitting layer 42, except for at least a portion of the inverted conical portion 22. Figure 12 In the example shown, in the fifth step, a light-emitting layer 42 is formed in addition to the hole transport layer 41. However, the specific layer of the electroluminescent layer 4 formed in the fifth step varies depending on the embodiments described above.

[0067] Step 6: A partition wall 5 is formed between the first lower electrode 31 and the second lower electrode 32 by filling the gap 21.

[0068] After step 6, the unformed portion of the electroluminescent layer 4 and the upper electrode 6 are formed sequentially, completing the display device of this embodiment. This display device has a configuration substantially the same as that of display device 106. According to the manufacturing method of this display device, a good yield can be achieved regarding the electrical connection between the TFT 9 and the first lower electrode 31.

[0069] In the fifth step, the target layer is preferably formed by solution coating. This reduces the manufacturing cost of the target layer, thereby reducing the manufacturing cost of the display device of this embodiment.

[0070] The fourth step may also include an electrode formation step, in which the first lower electrode 31 and the second lower electrode 32 are formed together above at least a portion of the gap 21 without using a photomask. Examples of methods for forming the first lower electrode 31 and the second lower electrode 32 together without using a photomask include vapor deposition and sputtering. During the electrode formation step, the first lower electrode 31 and the second lower electrode 32 may also be separated. Therefore, a patterning step is not required in the formation of the first lower electrode 31 and the second lower electrode 32.

[0071] Preferably, the first insulating film 24 contains fluorine. This improves the hydrophobicity of the insulating layer 2, thereby suppressing crosstalk between multiple lower electrodes 3 caused by the accidental adhesion of the material constituting the hole transport layer 41 to the insulating layer 2.

[0072] [Ninth Implementation Method] Figure 13This is a cross-sectional view showing the 3.5 step in the manufacturing method of the display device according to the ninth embodiment of the present invention.

[0073] The manufacturing method of the display device in this embodiment includes the first to sixth steps and the third and fifth steps described above. The third and fifth steps refer to the steps after the third step and before the fourth step.

[0074] Step 3.5: A third insulating film 27, which is part of the insulating layer 2, is provided on the contact electrode 10. Here, the third insulating film 27 has an inverted conical portion 22 on a portion of the inner wall of the insulating layer 2 that defines the gap 21. The inverted conical portion 22 formed in step 3.5 corresponds to the second inverted conical portion.

[0075] In step 3.5, the inverted conical portion 22 can be formed by oblique exposure. In the display device of this embodiment, the combination of the first insulating film 24, the second insulating film 25, and the third insulating film 27 corresponds to the insulating layer 2.

[0076] The display device according to this embodiment is substantially the same as display device 107. According to the manufacturing method of this display device, a good yield can be achieved regarding the electrical connection between the TFT9 and the first lower electrode 31.

[0077] Preferably, the third insulating film 27 contains fluorine. This improves the hydrophobicity of the insulating layer 2, thereby suppressing crosstalk between multiple lower electrodes 3 caused by the accidental adhesion of the material constituting the hole transport layer 41 to the insulating layer 2.

[0078] [Additional Notes] One of the key features of each embodiment is that the object layer of each of the plurality of lower electrodes 3, and even each pixel of the display device, is intentionally disconnected by utilizing the shape of the insulating layer 2 (e.g., the inverted conical portion 22). This suppresses crosstalk, resulting in a display device with advantages such as high brightness, long lifespan, and high reliability.

[0079] In various embodiments, for example, when the insulating layer 2 contains fluorine, sometimes no residue is produced. The presence or absence of residue in each display device is not particularly limited.

[0080] Alternatively, an insulating film other than the insulating layer 2 may be present below multiple lower electrodes 3.

[0081] 〔Summarize〕 The display device according to the first aspect of the present invention comprises: a plurality of lower electrodes disposed separately from each other; an insulating layer at least a portion thereof disposed below the plurality of lower electrodes; a partition wall disposed between the plurality of lower electrodes; an electroluminescent layer electrically connected to the plurality of lower electrodes and composed of a plurality of layers including the light-emitting layer; and an upper electrode disposed above the electroluminescent layer. In the insulating layer, a groove or hole, i.e., a gap, is formed below the plurality of lower electrodes. At least a portion of the inner wall of the insulating layer defining the gap has an inverted conical portion. At least one layer of the electroluminescent layer located below the light-emitting layer, i.e., an object layer, has a portion formed between the plurality of lower electrodes and the partition wall, and has at least a first portion and a second portion. The first portion and the second portion sandwich at least one of a non-forming portion of the object layer in the inverted conical portion and a region of the object layer that is thinner than the plurality of lower electrodes.

[0082] Based on the above configuration, the inverted conical portion can easily improve the insulation between the multiple lower electrodes, and specifically, can easily improve the insulation between the first part and the second part. Therefore, crosstalk caused by the multiple lower electrodes can be suppressed.

[0083] Based on the first aspect described above, in the display device according to the second aspect of the present invention, at least a portion of the partition wall located above the plurality of lower electrodes is a positive cone shape.

[0084] Based on the first or second embodiment described above, the display device according to the third embodiment of the present invention includes a transistor (TFT9) electrically connected to a first lower electrode that is one of the plurality of lower electrodes.

[0085] Based on the above configuration, the load on the various components constituting the display device can be reduced, thus enabling a display device with a long lifespan.

[0086] Based on the third aspect described above, in the display device according to the fourth aspect of the present invention, a portion of the inner wall of the insulating layer defining the gap has a positive conical portion, and the first lower electrode and the transistor are electrically connected along the positive conical portion.

[0087] Based on the above configuration, the possibility of poor electrical connection between the first lower electrode and the transistor can be reduced.

[0088] Based on the third method 3 described above, the display device involved in the fifth method of the present invention connects the first lower electrode to the transistor through a contact electrode embedded in the insulating layer on the outside of the gap.

[0089] Based on the above configuration, since the size of the upper end of the gap can be reduced, a display device with a high aperture ratio can be realized.

[0090] Based on any one of the first to fifth methods described above, the sixth method of the present invention relates to a display device in which the first part and the second part are discontinuous.

[0091] Based on the above configuration, crosstalk between multiple lower electrodes can be further suppressed.

[0092] Based on any one of the first to sixth embodiments described above, in the display device according to the seventh embodiment of the present invention, at least one of the multiple layers comprising the electroluminescent layer is located between the partition wall and the upper electrode.

[0093] Based on the above configuration, the voltage drop at the upper electrode in the direction of the current flowing through the upper electrode can be suppressed, thus suppressing IR drop (brightness unevenness).

[0094] Based on any one of the first to seventh embodiments described above, in the display device according to the eighth embodiment of the present invention, a portion of the light-emitting layer is located between the plurality of lower electrodes and the partition wall.

[0095] Based on the above configuration, since the portion of the light-emitting layer that is prone to uneven film formation can be covered by the partition wall and prevented from contributing to light emission, a display device with good performance can be achieved.

[0096] Based on any one of the first to eighth embodiments described above, in the display device according to the ninth embodiment of the present invention, the insulating layer contains fluorine.

[0097] Based on the above configuration, the hydrophobicity of the insulating layer can be improved, thereby suppressing crosstalk between multiple lower electrodes caused by the accidental adhesion of the material constituting the target layer to the insulating layer.

[0098] Based on any one of the first to ninth embodiments described above, in the display device according to the tenth embodiment of the present invention, the material constituting the first part is the same as the material constituting the second part.

[0099] Based on the above structure, the first part and the second part can be formed together using known processes.

[0100] The eleventh aspect of the present invention relates to a method for manufacturing a display device comprising: a first step of providing a first insulating film as part of an insulating layer, the insulating layer having grooves or holes, i.e., gaps, and forming a first inverted conical portion on at least a portion of the inner wall of the insulating layer defining the gaps; a second step of providing a second insulating film as part of the insulating layer, forming a positive conical portion on a portion of the inner wall of the insulating layer defining the gaps; a third step of forming a contact electrode along the positive conical portion; a fourth step of forming a first lower electrode electrically connected to the contact electrode and a second lower electrode adjacent to the first lower electrode above at least a portion of the gaps; a fifth step of forming at least one of an electroluminescent layer consisting of a plurality of layers including a light-emitting layer, electrically connected to the first lower electrode and the second lower electrode, and forming at least one of the electroluminescent layers located below the light-emitting layer, i.e., an object layer, other than at least a portion of the first inverted conical portion; and a sixth step of forming a partition wall between the first lower electrode and the second lower electrode in a manner that fills the gaps.

[0101] Based on the above configuration, a good yield can be achieved in terms of the electrical connection between the first lower electrode and other components.

[0102] Based on the eleventh aspect described above, in the manufacturing method of the display device according to the twelfth aspect of the present invention, after the third step, a third insulating film as part of the insulating layer is provided on the contact electrode.

[0103] Based on the twelfth aspect described above, in the manufacturing method of the display device according to the thirteenth aspect of the present invention, the third insulating film has a second inverted conical portion on a portion of the inner wall of the insulating layer that defines the gap.

[0104] Based on the above configuration, since the size of the upper end of the gap can be reduced, it is possible to manufacture a display device with a high aperture ratio.

[0105] Based on the twelfth or thirteenth method described above, in the manufacturing method of the display device according to the fourteenth method of the present invention, the third insulating film contains fluorine.

[0106] Based on the above configuration, the hydrophobicity of the insulating layer can be improved, thereby suppressing crosstalk between the first lower electrode and the second lower electrode caused by the accidental adhesion of the material constituting the object layer to the insulating layer.

[0107] Based on any one of the eleventh to fourteenth embodiments described above, in the manufacturing method of the display device according to the fifteenth embodiment of the present invention, the target layer is formed by solution coating in the fifth step.

[0108] Based on the above configuration, the manufacturing cost of the object layer can be reduced, thereby reducing the manufacturing cost of the display device.

[0109] Based on any one of the eleventh to fifteenth embodiments described above, in the manufacturing method of the display device according to the sixteenth embodiment of the present invention, the fourth step includes an electrode forming step, which forms the first lower electrode and the second lower electrode together above at least a portion of the gap without using a photomask, wherein the first lower electrode and the second lower electrode are disconnected during the electrode forming step.

[0110] Based on the above configuration, a patterning process is not required in the formation of the first lower electrode and the second lower electrode.

[0111] Based on any one of the eleventh to sixteenth embodiments described above, in the method for manufacturing a display device according to the seventeenth embodiment of the present invention, the first insulating film contains fluorine.

[0112] Based on the above configuration, the hydrophobicity of the insulating layer can be improved, thereby suppressing crosstalk between the first lower electrode and the second lower electrode caused by the accidental adhesion of the material constituting the object layer to the insulating layer.

[0113] This invention is not limited to the embodiments described above, and various modifications can be made within the scope of the claims. Embodiments obtained by appropriately combining the technical means disclosed in different embodiments are also included within the technical scope of this invention. Furthermore, new technical features can be formed by combining the technical methods disclosed in each embodiment. Explanation of reference numerals in the attached figures

[0114] 1 substrate 2 Insulation layer 21 gap 22 Inverted conical sections (first inverted conical section, second inverted conical section) 23. Conical part 231 Step difference 24 First insulating film 25 Second insulating film 26 Photoresist 273 Insulating film 3. Multiple lower electrodes 31 First lower electrode 32 Second lower electrode 4 Electroluminescent layer 41 Hole transport layer 42. Emissive layer 43 Electron Transport Layer 5. Partition wall 51. Conical part 6. Upper electrode Area 71 72 Part 1 73 Part Two 81-83 residue 9TFT (Transistor) 10 Contact Electrode 11 Metal wiring 12 Photomasks Display devices 101-107

Claims

1. A display device, characterized in that, have: Multiple lower electrodes are arranged separately from each other; An insulating layer, at least a portion of which is disposed below the plurality of lower electrodes; A partition wall is disposed between the plurality of lower electrodes; An electroluminescent layer, electrically connected to the plurality of lower electrodes, is composed of a plurality of layers including the electroluminescent layer; and The upper electrode is disposed above the electroluminescent layer. In the insulating layer, a groove or hole, i.e., a gap, is formed below the plurality of lower electrodes. At least a portion of the inner wall of the insulating layer defining the gap has an inverted conical shape. At least one of the electroluminescent layers located below the light-emitting layer, namely the object layer, has a portion formed between the plurality of lower electrodes and the partition wall, and has at least a first portion and a second portion, which sandwich at least one of the non-forming portion of the object layer in the inverted cone portion and a region of the object layer whose thickness is thinner than that of the object layer located on the plurality of lower electrodes.

2. The display device as claimed in claim 1, characterized in that, At least a portion of the partition wall located above the plurality of lower electrodes is a conical portion.

3. The display device as described in claim 1 or 2, characterized in that, It includes a transistor that is electrically connected to a first lower electrode, which is one of the plurality of lower electrodes.

4. The display device as claimed in claim 3, characterized in that, A portion of the inner wall of the insulating layer defining the gap has a positive tapered portion. The first lower electrode and the transistor are electrically connected along the positive tapered portion.

5. The display device as claimed in claim 3, characterized in that, On the outside of the gap, the first lower electrode is electrically connected to the transistor via a contact electrode embedded in the insulating layer.

6. The display device as claimed in claim 1 or 2, characterized in that, The first part and the second part are discontinuous.

7. The display device as claimed in claim 1 or 2, characterized in that, At least one of the multiple layers comprising the electroluminescent layer is located between the partition wall and the upper electrode.

8. The display device as claimed in claim 1 or 2, characterized in that, A portion of the light-emitting layer is located between the plurality of lower electrodes and the partition wall.

9. The display device as claimed in claim 1 or 2, characterized in that, The insulating layer contains fluorine.

10. The display device as claimed in claim 1 or 2, characterized in that, The materials constituting the first part and the materials constituting the second part are the same.

11. A method for manufacturing a display device, characterized in that, Include: In the first step, a first insulating film is provided as part of an insulating layer, the insulating layer having grooves or holes, i.e., gaps, and a first inverted conical portion is formed on at least a portion of the inner wall of the insulating layer defining the gaps; In the second step, a second insulating film, which is part of the insulating layer, is provided, and a positive conical portion is formed on a portion of the inner wall of the insulating layer that defines the gap; The third step involves forming a contact electrode along the positive conical portion; The fourth step involves forming a first lower electrode that is electrically connected to the contact electrode, and a second lower electrode that is adjacent to the first lower electrode above and sandwiches at least a portion of the gap. The fifth step involves forming at least one of an electroluminescent layer composed of multiple layers including a light-emitting layer, electrically connected to the first lower electrode and the second lower electrode; and forming at least one object layer, located below the light-emitting layer, of the electroluminescent layer, outside at least a portion of the first inverted conical portion; and The sixth step involves forming a partition wall between the first lower electrode and the second lower electrode by filling the gap.

12. The method for manufacturing a display device as claimed in claim 11, characterized in that, After the third step, a third insulating film, which is part of the insulating layer, is provided on the contact electrode.

13. The method for manufacturing a display device as claimed in claim 12, characterized in that, The third insulating film has a second inverted conical portion on a portion of the inner wall of the insulating layer that defines the gap.

14. The method of manufacturing the display device as claimed in claim 12 or 13, characterized in that, The third insulating layer contains fluorine.

15. The method of manufacturing the display device according to any one of claims 11 to 13, characterized in that, In the fifth step, the object layer is formed by solution coating.

16. The method of manufacturing the display device according to any one of claims 11 to 13, characterized in that, The fourth step includes an electrode formation step, which forms the first lower electrode and the second lower electrode together above at least a portion of the gap without using a photomask. During the electrode forming process, the first lower electrode and the second lower electrode are disconnected.

17. The method of manufacturing the display device according to any one of claims 11 to 13, characterized in that, The first insulating film contains fluorine.

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