Ultraviolet single-haplotyping projection exposure objective and photolithography machine

Abstract

The application discloses a kind of ultraviolet single rate projection exposure objective and photoetching machine, ultraviolet single rate projection exposure objective has the object side and the image side of opposite arrangement along the direction of optical axis, ultraviolet single rate projection exposure objective includes photoetching component and observation component, photoetching component includes the first lens component and the second lens component arranged from object side to image side;Observation component includes cemented prism and observation lens component, cemented prism has prism light entrance surface and prism light exit surface and observation light exit surface, cemented prism is located between the first lens component and the second lens component, so that prism light exit surface is opposite the light entrance surface of the second lens component, prism light entrance surface is opposite the light exit surface of the first lens component, the light entrance surface of observation lens component is opposite observation light exit surface setting, by the light reflected from the second lens component through the light splitting prism to observation lens component, it is monitored to photoetching machine while also being able to achieve small volume and low cost.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of optical lenses, in particular to a single-magnification projection exposure objective for ultraviolet and a photolithography machine. BACKGROUND

[0002] At present, photolithography machine monitoring systems usually adopt two monitoring methods, the first method is to set an observation system above the photolithography objective to observe the imaging of the workpiece, which usually leads to a large volume of the entire optical system, which is not conducive to the miniaturization of the equipment; the other method is to use a paraxial imaging observation system, which increases the cost and the volume of the entire equipment due to the need for a new lens. SUMMARY

[0003] The main purpose of the present application is to provide a single-magnification projection exposure objective for ultraviolet and a photolithography machine, which aims to solve the problem of large volume and high cost of the existing photolithography machine monitoring system.

[0004] To achieve the above purpose, the single-magnification projection exposure objective for ultraviolet provided by the present application has an object side and an image side arranged opposite along the optical axis direction, and the single-magnification projection exposure objective for ultraviolet comprises:

[0005] a photolithography assembly comprising a first lens assembly and a second lens assembly arranged in sequence from the object side to the image side; and

[0006] an observation assembly comprising a cemented prism and an observation lens assembly, the cemented prism having a prism light entrance surface and a prism light exit surface arranged opposite, and an observation light exit surface at the side end, the cemented prism being arranged between the first lens assembly and the second lens assembly, so that the prism light exit surface faces the light entrance surface of the second lens assembly, the prism light entrance surface faces the light exit surface of the first lens assembly, and the light entrance surface of the observation lens assembly faces the observation light exit surface.

[0007] Optionally, the first lens assembly comprises:

[0008] a leveling lens assembly for adjusting the incident light into parallel light; and

[0009] a condensing lens assembly for converging the light rays emitted by the leveling lens assembly;

[0010] wherein the light exit surface of the condensing lens assembly is arranged opposite to the prism light entrance surface.

[0011] Optionally, the leveling lens assembly comprises a first positive lens, a second positive lens, a third positive lens and a fourth negative lens arranged in sequence from the object side to the image side; and / or

[0012] The condensing lens assembly comprises a fifth positive lens, a sixth positive lens, a seventh negative lens, an eighth positive lens and a ninth negative lens arranged in sequence along a direction; wherein the light exit surface of the ninth negative lens is oppositely arranged with the prism light entrance surface.

[0013] Optionally, the first positive lens is made of flint glass, the refractive index of the first positive lens is Nd1, and the dispersion coefficient of the first positive lens is Vd1, wherein: 1.58 < Nd1 < 1.62, and / or 36.36 < Vd1 < 40.89; and / or,

[0014] The second positive lens is made of crown glass, the refractive index of the second positive lens is Nd2, and the dispersion coefficient of the second positive lens is Vd2, wherein: 1.48 < Nd2 < 1.52, and / or 63.28 < Vd2 < 70.44; and / or,

[0015] The third positive lens is made of crown glass, the refractive index of the third positive lens is Nd3, and the dispersion coefficient of the third positive lens is Vd3, wherein: 1.48 < Nd3 < 1.52, and / or 63.28 < Vd3 < 70.44; and / or,

[0016] The fourth negative lens is made of flint glass, the refractive index of the fourth negative lens is Nd4, and the dispersion coefficient of the fourth negative lens is Vd4, wherein: 1.58 < Nd4 < 1.62, and / or 36.36 < Vd4 < 40.89; and / or,

[0017] The fifth positive lens is made of crown glass, the refractive index of the fifth positive lens is Nd5, and the dispersion coefficient of the fifth positive lens is Vd5, wherein: 1.48 < Nd5 < 1.52, and / or 63.28 < Vd5 < 70.44; and / or,

[0018] The sixth positive lens is made of crown glass, the refractive index of the sixth positive lens is Nd6, and the dispersion coefficient of the sixth positive lens is Vd6, wherein: 1.48 < Nd6 < 1.52, and / or 63.28 < Vd6 < 70.44; and / or,

[0019] The seventh negative lens is made of flint glass, the refractive index of the seventh negative lens is Nd7, and the dispersion coefficient of the seventh negative lens is Vd7, wherein: 1.58 < Nd7 < 1.62, and / or 36.36 < Vd7 < 40.89; and / or,

[0020] The eighth positive lens is made of crown glass, the refractive index of the eighth positive lens is Nd8, and the dispersion coefficient of the eighth positive lens is Vd8, wherein: 1.48 < Nd8 < 1.52, and / or, 63.28 < Vd8 < 70.44; and / or,

[0021] The ninth negative lens is made of flint glass, the refractive index of the ninth negative lens is Nd9, and the dispersion coefficient of the ninth negative lens is Vd9, wherein: 1.58 < Nd9 < 1.62, and / or, 36.36 < Vd9 < 40.89.

[0022] Optionally, the condenser lens assembly further comprises a first diaphragm, which is arranged between the sixth positive lens and the seventh negative lens.

[0023] Optionally, the second lens assembly comprises, in sequence from the object side to the image side, a tenth positive lens, an eleventh positive lens, a twelfth positive lens, and a thirteenth negative lens.

[0024] The tenth positive lens is arranged opposite to the prism light exit surface.

[0025] Optionally, the tenth positive lens is made of crown glass, the refractive index of the tenth positive lens is Nd10, and the dispersion coefficient of the tenth positive lens is Vd10, wherein: 1.48 < Nd10 < 1.52, and / or, 63.28 < Vd10 < 70.44; and / or,

[0026] The eleventh positive lens is made of flint glass, the refractive index of the eleventh positive lens is Nd11, and the dispersion coefficient of the eleventh positive lens is Vd11, wherein: 1.58 < Nd11 < 1.62, and / or, 36.36 < Vd11 < 40.89; and / or,

[0027] The twelfth positive lens is made of crown glass, the refractive index of the twelfth positive lens is Nd12, and the dispersion coefficient of the twelfth positive lens is Vd12, wherein: 1.48 < Nd12 < 1.52, and / or, 63.28 < Vd12 < 70.44; and / or,

[0028] The thirteenth negative lens is made of flint glass, the refractive index of the thirteenth negative lens is Nd13, and the dispersion coefficient of the thirteenth negative lens is Vd13, wherein: 1.58 < Nd13 < 1.62, and / or, 36.36 < Vd13 < 40.89.

[0029] Optionally, the observation lens assembly comprises, in sequence away from the observation light exit surface, a fourteenth negative lens, a fifteenth positive lens, a sixteenth positive lens, a seventeenth positive lens, an eighteenth positive lens, and a nineteenth negative lens.

[0030] Optionally, the material of the fourteenth negative lens is flint glass, the refractive index of the fourteenth negative lens is Nd14, and the dispersion coefficient of the fourteenth negative lens is Vd14, wherein: 1.58 < Nd14 < 1.95, and / or, 17.94 < Vd14 < 40.89; and / or,

[0031] The material of the fifteenth positive lens is crown glass, the refractive index of the fifteenth positive lens is Nd15, and the dispersion coefficient of the fifteenth positive lens is Vd15, wherein: 1.48 < Nd15 < 1.62, and / or, 63.28 < Vd15 < 70.44; and / or,

[0032] The material of the sixteenth positive lens is crown glass, the refractive index of the sixteenth positive lens is Nd16, and the dispersion coefficient of the sixteenth positive lens is Vd16, wherein: 1.48 < Nd16 < 1.62, and / or, 63.28 < Vd16 < 70.44; and / or,

[0033] The material of the seventeenth positive lens is crown glass, the refractive index of the seventeenth positive lens is Nd17, and the dispersion coefficient of the seventeenth positive lens is Vd17, wherein: 1.48 < Nd17 < 1.62, and / or, 63.28 < Vd17 < 70.44; and / or,

[0034] The material of the eighteenth positive lens is crown glass, the refractive index of the eighteenth positive lens is Nd18, and the dispersion coefficient of the eighteenth positive lens is Vd18, wherein: 1.48 < Nd18 < 1.62, and / or, 63.28 < Vd18 < 70.44; and / or,

[0035] The material of the nineteenth negative lens is flint glass, the refractive index of the nineteenth negative lens is Nd19, and the dispersion coefficient of the nineteenth negative lens is Vd19, wherein: 1.58 < Nd19 < 1.95, and / or, 17.94 < Vd19 < 40.89.

[0036] The present application also proposes a photolithography machine, comprising the above-mentioned ultraviolet single-magnification projection exposure objective lens, and the photolithography machine further comprises:

[0037] An image sensor, arranged opposite to the light exit surface of the observation lens assembly;

[0038] A photolithography light source, arranged to correspond to irradiation on a mask plate; and,

[0039] An observation light source, arranged to correspond to irradiation on a workpiece to be etched.

[0040] In the technical solution provided by the present invention, by setting the cemented beam splitter between the second lens assembly and the first lens assembly, the observation light reflected back by the second lens assembly is reflected and split by the cemented beam splitter surface of the cemented beam splitter, and finally enters the observation lens assembly for observation and monitoring. Only a small amount of modification is needed to the structure of the original lithography machine objective lens, so as to perform real-time monitoring of the lithographic workpiece without affecting the operation of the lithography machine objective lens. The device has low modification cost and small overall size. Attached Figure Description

[0041] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0042] Figure 1 A schematic diagram of the structure of an embodiment of the ultraviolet single-magnification projection exposure objective lens provided by the present invention;

[0043] Figure 2 for Figure 1 Field curvature and distortion diagram of the exposure system consisting of the first lens assembly and the second lens assembly;

[0044] Figure 3 for Figure 1 MTF curve of the exposure system consisting of the first lens assembly and the second lens assembly;

[0045] Figure 4 for Figure 1 The defocus MTF curve of the exposure system consisting of the first lens assembly and the second lens assembly in the image;

[0046] Figure 5 for Figure 1 The MTF curve of the imaging system consisting of the second lens assembly and the observation assembly.

[0047] Explanation of icon numbers:

[0048] Reference Name Reference Name 100 Ultraviolet single-hapex projection exposure objective 122 Eleventh positive lens 1 Lithographic assembly 123 Twelfth positive lens 11 First lens assembly 124 Thirteenth negative lens 111 Leveling lens assembly 2 Viewing assembly 1111 First positive lens 21 Cemented spectroscope prism 1112 Second positive lens 211 Prism light entrance face 1113 Third positive lens 212 Prism light exit face 1114 Fourth negative lens 213 Viewing light exit face 112 Condenser lens assembly 22 Viewing lens assembly 1121 Fifth positive lens 221 Fourteenth negative lens 1122 Sixth positive lens 222 Fifteenth positive lens 1123 Seventh negative lens 223 Sixteenth positive lens 1124 Eighth positive lens 224 Seventeenth positive lens 1125 Ninth negative lens 225 Eighteenth positive lens 1126 First diaphragm 226 Nineteenth negative lens 12 Second lens assembly 227 Second diaphragm 121 Tenth positive lens

[0049] The realization of the objective, functional features and advantages of the present invention will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0050] Clearly, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0051] It should be noted that if the directionality indication is involved in the embodiments of the present application, the directionality indication is only used to explain the relative position relationship, motion condition and the like between components in a certain posture, and if the certain posture changes, the directionality indication also changes accordingly.

[0052] In addition, if the description of "first", "second" and the like is involved in the embodiments of the present application, the description of "first", "second" and the like is only for the purpose of description, and cannot be understood as indicating or implying the relative importance of the indicated technical features or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first", "second" can explicitly or implicitly include at least one of the features. In addition, the technical solutions of each embodiment can be combined with each other, but it must be based on the fact that a person skilled in the art can realize it, and when the combination of technical solutions appears contradictory or unachievable, it should be considered that the combination of technical solutions does not exist, and is not within the protection scope required by the present application.

[0053] At present, the lithography machine monitoring system usually adopts two monitoring methods, the first kind is to set an observation system above the lithography objective lens to observe the workpiece imaging, this kind of way usually leads to the whole optical system volume is large, is not conducive to the miniaturization of equipment, at the same time, because the lithography wavelength is 365nm, and the observation wavelength is usually 650nm, because the wavelength change range is large, there is a large chromatic aberration, it is impossible to realize the high quality imaging observation effect, another way is to use the paraxial imaging observation system, because the paraxial observation needs to increase a new lens, it will increase the cost, at the same time, increase the volume of the whole equipment.

[0054] Therefore, the present application provides a kind of ultraviolet single magnification projection exposure objective and lithography machine, to solve the problem of large volume and high cost of existing lithography machine monitoring system, wherein Figure 1 the structure schematic diagram of an embodiment of the ultraviolet single magnification projection exposure objective provided by the present application, Figures 2-5 the simulation effect schematic diagram of an embodiment of the ultraviolet single magnification projection exposure objective provided by the present application.The ultraviolet single magnification projection exposure objective provided by the present application has the following indexes:

[0055] working wavelength: 365±10nm;

[0056] observation wavelength: 650±30nm;

[0057] Resolution: 2µm;

[0058] Magnification: -1x;

[0059] Exposure field of view: 12x12mm;

[0060] An exposure system consisting of the first lens assembly and the second lens assembly (with a photomask as the object side and the workpiece to be etched as the image side):

[0061] Object-image conjugate distance: 480mm;

[0062] Working distance of object: 135mm;

[0063] Image working distance: 30mm;

[0064] The exposure system employs a dual telecentric optical path, with the telecentricity between the object and image sides being less than ±0.1 degrees.

[0065] An imaging system consisting of the second lens assembly and the observation assembly (with the workpiece to be etched as the object side and the image sensor as the image side):

[0066] Object-image conjugate distance: 380mm;

[0067] Working distance of object: 30mm;

[0068] Image working distance: 120mm.

[0069] Please see Figure 1 The ultraviolet single-magnification projection exposure objective 100 has an object side and an image side arranged opposite to each other along the optical axis. The ultraviolet single-magnification projection exposure objective 100 includes a lithography component 1 and an observation component 2. The lithography component 1 includes a first lens component 11 and a second lens component 12 arranged sequentially from the object side to the image side. The observation component 2 includes a cemented beam splitter 21 and an observation lens component 22. The cemented beam splitter 21 has a prism light-incident surface 211 and a prism light-excising surface 212 arranged opposite to each other, and an observation light-excising surface 213 located at the side end. The cemented beam splitter 21 is disposed between the first lens component 11 and the second lens component 12, such that the prism light-excising surface 212 faces the light-incident surface of the second lens component 12, the prism light-incident surface 211 faces the light-excising surface of the first lens component 11, and the light-incident surface of the observation lens component 22 faces the observation light-excising surface 213.

[0070] The technical scheme provided by the present application comprises the following steps: arranging the cemented light splitting prism 21 between the second lens assembly 12 and the first lens assembly 11, so that the observation light reflected back through the second lens assembly 12 is reflected and split by the cemented light splitting surface of the cemented light splitting prism 21, and finally enters the observation lens assembly 22 for observation and monitoring. Only a small amount of modification is needed for the structure of the original photolithography objective lens, and the work of the photolithography objective lens is not affected, and the workpiece can be monitored in real time. The device has low modification cost and small overall size.

[0071] Further, in the embodiment, the first lens assembly 11 comprises a leveling lens assembly 111 and a condensing lens assembly 112, the leveling lens assembly 111 is used to adjust the incident light into parallel light, and the condensing lens assembly 112 is used to converge the light emitted by the leveling lens assembly 111. The light emitting surface of the condensing lens assembly 112 is arranged opposite to the prism light emitting surface 211. It can be understood that the leveling lens assembly 111 is used to adjust the incident light into parallel light, and the specific structure form is not limited in the embodiment, and the condensing lens assembly 112 is used to converge the light emitted by the leveling lens assembly 111, and the specific structure form is not limited in the embodiment.

[0072] Further, in the embodiment, the leveling lens assembly 111 comprises a first positive lens 1111, a second positive lens 1112, a third positive lens 1113 and a fourth negative lens 1114 arranged in the order of the object side to the image side. The light is adjusted by a plurality of lenses of different specifications, which can improve the imaging quality.

[0073] In another embodiment, the condensing lens assembly 112 comprises a fifth positive lens 1121, a sixth positive lens 1122, a seventh negative lens 1123, an eighth positive lens 1124 and a ninth negative lens 1125 arranged in the order of the direction. The light emitting surface of the ninth negative lens 1125 is arranged opposite to the prism light emitting surface 211. The light is adjusted by a plurality of lenses of different specifications, which can improve the imaging quality.

[0074] It should be noted that the above two parallel technical features can be set separately or simultaneously. It can be understood that the effect of simultaneous setting is better.

[0075] Further, the condensing lens assembly 112 further comprises a first diaphragm 1126, which is arranged between the sixth positive lens 1122 and the seventh negative lens 1123. The first diaphragm 1126 can adjust the intensity of the exposure light.

[0076] In the embodiment, the second lens assembly 12 comprises, sequentially from the object side to the image side, a tenth positive lens 121, an eleventh positive lens 122, a twelfth positive lens 123, and a thirteenth negative lens 124; wherein the light injection surface of the tenth positive lens 121 is oppositely arranged with the prism light injection surface 212. By adjusting the light with multiple lenses of different specifications, the imaging quality can be improved.

[0077] In the embodiment, the observation lens assembly 22 comprises, sequentially away from the observation light injection surface 213, a fourteenth negative lens 221, a fifteenth lens, a sixteenth positive lens 223, a seventeenth positive lens 224, an eighteenth positive lens 225, and a nineteenth negative lens 226. By adjusting the light with multiple lenses of different specifications, the imaging quality can be improved, and the aberration and chromatic aberration can be reduced.

[0078] Further, the observation lens assembly 22 further comprises a second diaphragm, which is arranged between the cemented prism 21 and the fourteenth negative lens 221. The second diaphragm can be used to adjust the intensity of the observation light.

[0079] Specifically, in the embodiment, the material of the fourteenth negative lens 221 is flint glass, the refractive index of the fourteenth negative lens 221 is Nd14, and the dispersion coefficient of the fourteenth negative lens 221 is Vd14, wherein: 1.58 < Nd14 < 1.95, and / or 17.94 < Vd14 < 40.89; and / or,

[0080] In another embodiment, the material of the fifteenth positive lens 222 is crown glass, the refractive index of the fifteenth positive lens 222 is Nd15, and the dispersion coefficient of the fifteenth positive lens 222 is Vd15, wherein: 1.48 < Nd15 < 1.62, and / or 63.28 < Vd15 < 70.44; and / or,

[0081] In another embodiment, the material of the sixteenth positive lens 223 is crown glass, the refractive index of the sixteenth positive lens 223 is Nd16, and the dispersion coefficient of the sixteenth positive lens 223 is Vd16, wherein: 1.48 < Nd16 < 1.62, and / or 63.28 < Vd16 < 70.44; and / or,

[0082] In another embodiment, the material of the seventeenth positive lens 224 is crown glass, the refractive index of the seventeenth positive lens 224 is Nd17, and the dispersion coefficient of the seventeenth positive lens 224 is Vd17, wherein: 1.48 < Nd17 < 1.62, and / or 63.28 < Vd17 < 70.44; and / or,

[0083] In another embodiment, the material of the eighteenth positive lens 225 is crown glass, the refractive index of the eighteenth positive lens 225 is Nd18, and the dispersion coefficient of the eighteenth positive lens 225 is Vd18, where: 1.48 < Nd18 < 1.62, and / or, 63.28 < Vd18 < 70.44; and / or,

[0084] In another embodiment, the material of the nineteenth negative lens 226 is flint glass, the refractive index of the nineteenth negative lens 226 is Nd19, and the dispersion coefficient of the nineteenth negative lens 226 is Vd19, where: 1.58 < Nd19 < 1.95, and / or, 17.94 < Vd19 < 40.89.

[0085] It should be noted that the above six parallel technical features can be set by one, two, three, four, five or all at the same time. It can be understood that the effect is better when they are set at the same time.

[0086] Specifically, in the embodiment, the material of the first positive lens 1111 is flint glass, the refractive index of the first positive lens 1111 is Nd1, and the dispersion coefficient of the first positive lens 1111 is Vd1, where: 1.58 < Nd1 < 1.62, and / or, 36.36 < Vd1 < 40.89;

[0087] In another embodiment, the material of the second positive lens 1112 is crown glass, the refractive index of the second positive lens 1112 is Nd2, and the dispersion coefficient of the second positive lens 1112 is Vd2, where: 1.48 < Nd2 < 1.52, and / or, 63.28 < Vd2 < 70.44;

[0088] In another embodiment, the material of the third positive lens 1113 is crown glass, the refractive index of the third positive lens 1113 is Nd3, and the dispersion coefficient of the third positive lens 1113 is Vd3, where: 1.48 < Nd3 < 1.52, and / or, 63.28 < Vd3 < 70.44;

[0089] In another embodiment, the material of the fourth negative lens 1114 is flint glass, the refractive index of the fourth negative lens 1114 is Nd4, and the dispersion coefficient of the fourth negative lens 1114 is Vd4, where: 1.58 < Nd4 < 1.62, and / or, 36.36 < Vd4 < 40.89;

[0090] In another embodiment, the fifth positive lens 1115 is made of crown glass, the refractive index of the fifth positive lens 1115 is Nd5, and the dispersion coefficient of the fifth positive lens 1115 is Vd5, where 1.48 < Nd5 < 1.52, and / or 63.28 < Vd5 < 70.44.

[0091] In another embodiment, the sixth positive lens 1121 is made of crown glass, the refractive index of the sixth positive lens 1121 is Nd6, and the dispersion coefficient of the sixth positive lens 1121 is Vd6, where 1.48 < Nd6 < 1.52, and / or 63.28 < Vd6 < 70.44.

[0092] In another embodiment, the seventh negative lens 1122 is made of flint glass, the refractive index of the seventh negative lens 1122 is Nd7, and the dispersion coefficient of the seventh negative lens 1122 is Vd7, where 1.58 < Nd7 < 1.62, and / or 36.36 < Vd7 < 40.89.

[0093] In another embodiment, the eighth positive lens 1123 is made of crown glass, the refractive index of the eighth positive lens 1123 is Nd8, and the dispersion coefficient of the eighth positive lens 1123 is Vd8, where 1.48 < Nd8 < 1.52, and / or 63.28 < Vd8 < 70.44.

[0094] In another embodiment, the ninth negative lens 1124 is made of flint glass, the refractive index of the ninth negative lens 1124 is Nd9, and the dispersion coefficient of the ninth negative lens 1124 is Vd9, where 1.58 < Nd9 < 1.62, and / or 36.36 < Vd9 < 40.89.

[0095] It should be noted that the above nine parallel technical features can be set by one, two, three, four, five, six, seven, eight or all at the same time. It can be understood that the effect is better when they are set at the same time.

[0096] In particular, in this embodiment, the tenth positive lens 121 is made of crown glass, the refractive index of the tenth positive lens 121 is Nd10, and the dispersion coefficient of the tenth positive lens 121 is Vd10, where 1.48 < Nd10 < 1.52, and / or 63.28 < Vd10 < 70.44.

[0097] In another embodiment, the material of the eleventh positive lens 122 is flint glass, the refractive index of the eleventh positive lens 122 is Nd11, and the dispersion coefficient of the eleventh positive lens 122 is Vd11, where: 1.58 < Nd11 < 1.62, and / or, 36.36 < Vd11 < 40.89;

[0098] In another embodiment, the material of the twelfth positive lens 123 is crown glass, the refractive index of the twelfth positive lens 123 is Nd12, and the dispersion coefficient of the twelfth positive lens 123 is Vd12, where: 1.48 < Nd12 < 1.52, and / or, 63.28 < Vd12 < 70.44;

[0099] In another embodiment, the material of the thirteenth negative lens 124 is flint glass, the refractive index of the thirteenth negative lens 124 is Nd13, and the dispersion coefficient of the thirteenth negative lens 124 is Vd13, where: 1.58 < Nd13 < 1.62, and / or, 36.3 < Vd13 < 40.89.

[0100] It should be noted that the above four parallel technical features can be set one by one, can be set two by two, can be set three by three, or can be set simultaneously. It can be understood that the effect of setting simultaneously is better.

[0101] The lens parameters of the exposure system composed of the first lens assembly 11 and the second lens assembly 12 are shown in the following table:

[0102] Table 1 Parameters of Each Lens of the Exposure System

[0103]

[0104]

[0105] The lens parameters of the imaging system composed of the second lens assembly 12 and the observation assembly 2 are shown in the following table:

[0106] Table 2 Parameters of Each Lens of the Imaging System

[0107] <00​​​​​​​​​​

[0110] Referring to Figure 4 , the off-focus MTF curve diagram of the exposure system composed of the first lens assembly 11 and the second lens assembly 12, when the off-focus is 10 um, the MTF is greater than 0.8. The system has good image quality;

[0111] Referring to Figure 5 , the MTF curve diagram of the imaging system composed of the second lens assembly 12 and the observation assembly 2.

[0112] In addition, the present application also provides a photolithography machine, the photolithography machine includes the ultraviolet single magnification projection exposure objective 100 in the above-mentioned scheme, it needs to be explained that the structure of the ultraviolet single magnification projection exposure objective 100 in the photolithography machine can refer to the embodiment of the ultraviolet single magnification projection exposure objective 100, here will not be repeated; Because the ultraviolet single magnification projection exposure objective 100 is used in the photolithography machine provided by the present application, therefore, the embodiment of the photolithography machine provided by the present application includes all the technical solutions of all the embodiments of the ultraviolet single magnification projection exposure objective 100, and the technical effects achieved are also completely same, here will not be repeated.

[0113] Further, in the embodiment, the photolithography machine further includes an image sensor, a photolithography light source and an observation light source, the image sensor is arranged opposite to the light emitting surface of the observation lens assembly; the photolithography light source is used to irradiate the mask plate; the observation light source is used to irradiate the workpiece to be etched. It can be understood that the mask plate is arranged on the object side, and the workpiece to be etched is arranged on the image side

[0114] It needs to be explained that the image sensor is a conventional setting in the field, and this embodiment will not be repeated.

[0115] Specifically, the photolithography light source is a UV-LED, which provides a photolithography wavelength of 365 nm, can realize the photolithography of two-dimensional optical micro-nano structure, and has the advantages of high resolution; the observation light source is a red light LED, which provides an observation wavelength of 650 nm, and the light is split to the image sensor through the cemented split prism, to realize clearer observation of the workpiece to be etched.

[0116] The above only describes the preferred embodiments of the present application, and does not limit the patent scope of the present application, any equivalent structural transformation made according to the contents of the present application specification and drawings, or direct / indirect application in other related technical fields is included in the patent protection scope of the present application.

Claims

1. An ultraviolet single-fraction projection exposure objective, characterized in that The ultraviolet single-projection exposure objective has an object side and an image side oppositely arranged along the optical axis direction, and comprises: The photolithography assembly comprises a first lens assembly and a second lens assembly arranged in sequence from the object side to the image side; and The observation assembly comprises a cemented prism and an observation lens assembly, the cemented prism has a prism light entrance surface and a prism light exit surface oppositely arranged, and an observation light exit surface at a side end, the cemented prism is arranged between the first lens assembly and the second lens assembly, so that the prism light exit surface is opposite to the light entrance surface of the second lens assembly, the prism light entrance surface is opposite to the light exit surface of the first lens assembly, and the light entrance surface of the observation lens assembly is opposite to the observation light exit surface.

2. The ultraviolet single-fraction projection exposure objective according to claim 1, characterized in that The first lens assembly comprises: A leveling lens assembly for adjusting incident light into parallel light; and A condensing lens assembly for converging light rays emitted by the leveling lens assembly; The light exit surface of the condensing lens assembly is opposite to the prism light entrance surface.

3. The UV single-fraction projection exposure objective according to claim 2, characterized in that The leveling lens assembly comprises a first positive lens, a second positive lens, a third positive lens and a fourth negative lens arranged in sequence from the object side to the image side; and / or The condensing lens assembly comprises a fifth positive lens, a sixth positive lens, a seventh negative lens, an eighth positive lens and a ninth negative lens arranged in sequence from the object side to the image side; wherein the light exit surface of the ninth negative lens is opposite to the prism light entrance surface.

4. The UV single-fraction projection exposure objective according to claim 3, characterized in that The first positive lens is made of flint glass, the refractive index of the first positive lens is Nd1, and the dispersion coefficient of the first positive lens is Vd1, wherein: 1.58 < Nd1 < 1.62, and / or 36.36 < Vd1 < 40.89; and / or The second positive lens is made of crown glass, the refractive index of the second positive lens is Nd2, and the dispersion coefficient of the second positive lens is Vd2, wherein: 1.48 < Nd2 < 1.52, and / or 63.28 < Vd2 < 70.44; and / or The third positive lens is made of crown glass, the refractive index of the third positive lens is Nd3, and the dispersion coefficient of the third positive lens is Vd3, wherein: 1.48 < Nd3 < 1.52, and / or 63.28 < Vd3 < 70.44; and / or The fourth negative lens is made of flint glass, the refractive index of the fourth negative lens is Nd4, and the dispersion coefficient of the fourth negative lens is Vd4, wherein: 1.58 < Nd4 < 1.62, and / or 36.36 < Vd4 < 40.89; and / or The fifth positive lens is made of crown glass, the refractive index of the fifth positive lens is Nd5, and the dispersion coefficient of the fifth positive lens is Vd5, wherein: 1.48 < Nd5 < 1.52, and / or 63.28 < Vd5 < 70.44; and / or The sixth positive lens is made of crown glass, the refractive index of the sixth positive lens is Nd6, and the dispersion coefficient of the sixth positive lens is Vd6, wherein: 1.48 < Nd6 < 1.52, and / or 63.28 < Vd6 < 70.44; and / or The seventh negative lens is made of flint glass, the refractive index of the seventh negative lens is Nd7, and the dispersion coefficient of the seventh negative lens is Vd7, wherein: 1.58 < Nd7 < 1.62, and / or 36.36 < Vd7 < 40.89; and / or The eighth positive lens is made of crown glass, the refractive index of the eighth positive lens is Nd8, and the dispersion coefficient of the eighth positive lens is Vd8, wherein: 1.48 < Nd8 < 1.52, and / or 63.28 < Vd8 < 70.44; and / or The ninth negative lens is made of flint glass, the refractive index of the ninth negative lens is Nd9, and the dispersion coefficient of the ninth negative lens is Vd9, wherein: 1.58 < Nd9 < 1.62, and / or 36.36 < Vd9 < 40.

89. The material of the sixth positive lens is crown glass, the refractive index of the sixth positive lens is Nd6, and the dispersion coefficient of the sixth positive lens is Vd6, wherein: 1.48 < Nd6 < 1.52, and / or, 63.28 < Vd6 < 70.44; and / or, The material of the seventh negative lens is flint glass, the refractive index of the seventh negative lens is Nd7, and the dispersion coefficient of the seventh negative lens is Vd7, wherein: 1.58 < Nd7 < 1.62, and / or, 36.36 < Vd7 < 40.89; and / or, The material of the eighth positive lens is crown glass, the refractive index of the eighth positive lens is Nd8, and the dispersion coefficient of the eighth positive lens is Vd8, wherein: 1.48 < Nd8 < 1.52, and / or, 63.28 < Vd8 < 70.44; and / or, The material of the ninth negative lens is flint glass, the refractive index of the ninth negative lens is Nd9, and the dispersion coefficient of the ninth negative lens is Vd9, wherein: 1.58 < Nd9 < 1.62, and / or, 36.36 < Vd9 < 40.

89.

5. The ultraviolet single-fraction projection exposure objective according to claim 3, characterized in that The condenser lens assembly further comprises a first diaphragm, which is arranged between the sixth positive lens and the seventh negative lens.

6. The ultraviolet single-fraction projection exposure objective according to claim 1, characterized in that The second lens assembly comprises, in sequence from the object side to the image side, a tenth positive lens, an eleventh positive lens, a twelfth positive lens, and a thirteenth negative lens. The tenth positive lens is arranged opposite to the prism light exit surface.

7. The UV-halftone projection exposure objective according to claim 6, characterized in that The material of the tenth positive lens is crown glass, the refractive index of the tenth positive lens is Nd10, and the dispersion coefficient of the tenth positive lens is Vd10, wherein: 1.48 < Nd10 < 1.52, and / or, 63.28 < Vd10 < 70.44; and / or, The material of the eleventh positive lens is flint glass, the refractive index of the eleventh positive lens is Nd11, and the dispersion coefficient of the eleventh positive lens is Vd11, wherein: 1.58 < Nd11 < 1.62, and / or, 36.36 < Vd11 < 40.89; and / or, The material of the twelfth positive lens is crown glass, the refractive index of the twelfth positive lens is Nd12, and the dispersion coefficient of the twelfth positive lens is Vd12, wherein: 1.48 < Nd12 < 1.52, and / or, 63.28 < Vd12 < 70.44; and / or, The material of the thirteenth negative lens is flint glass, the refractive index of the thirteenth negative lens is Nd13, and the dispersion coefficient of the thirteenth negative lens is Vd13, wherein: 1.58 < Nd13 < 1.62, and / or, 36.36 < Vd13 < 40.

89.

8. The ultraviolet single-fraction projection exposure objective according to claim 1, characterized in that The observation lens assembly comprises, in sequence away from the observation light exit surface, a fourteenth negative lens, a fifteenth positive lens, a sixteenth positive lens, a seventeenth positive lens, an eighteenth positive lens, and a nineteenth negative lens.

9. The UV-halftone projection exposure objective according to claim 8, characterized in that The material of the fourteenth negative lens is flint glass, the refractive index of the fourteenth negative lens is Nd14, and the dispersion coefficient of the fourteenth negative lens is Vd14, wherein: 1.58 < Nd14 < 1.95, and / or, 17.94 < Vd14 < 40.89; and / or, The material of the fifteenth positive lens is crown glass, the refractive index of the fifteenth positive lens is Nd15, and the dispersion coefficient of the fifteenth positive lens is Vd15, wherein: 1.48 < Nd15 < 1.62, and / or, 63.28 < Vd15 < 70.44; and / or, The material of the sixteenth positive lens is crown glass, the refractive index of the sixteenth positive lens is Nd16, and the dispersion coefficient of the sixteenth positive lens is Vd16, wherein: 1.48 < Nd16 < 1.62, and / or, 63.28 < Vd16 < 70.44; and / or, The material of the seventeenth positive lens is crown glass, the refractive index of the seventeenth positive lens is Nd17, and the dispersion coefficient of the seventeenth positive lens is Vd17, wherein: 1.48 < Nd17 < 1.62, and / or, 63.28 < Vd17 < 70.44; and / or, The material of the eighteenth positive lens is crown glass, the refractive index of the eighteenth positive lens is Nd18, and the dispersion coefficient of the eighteenth positive lens is Vd18, wherein: 1.48 < Nd18 < 1.62, and / or, 63.28 < Vd18 < 70.44; and / or, The material of the nineteenth negative lens is flint glass, the refractive index of the nineteenth negative lens is Nd19, and the dispersion coefficient of the nineteenth negative lens is Vd19, wherein: 1.58 < Nd19 < 1.95, and / or, 17.94 < Vd19 < 40.

89.

10. A photolithography machine comprising the ultraviolet single-magnification projection exposure objective according to any one of claims 1 to 9, characterized in that The photoetching machine further comprises: An image sensor is arranged opposite to the light exit surface of the observation lens assembly; A photoetching light source is arranged to correspondingly irradiate the mask plate; and An observation light source is arranged to correspondingly irradiate the workpiece to be etched.

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