A coating device and a coating method for monitoring a lens surface shape in real time

Abstract

The application provides a coating device and a coating method for real-time monitoring of a lens surface shape, wherein the coating device for real-time monitoring of a lens surface shape comprises a machine shell, a workpiece disc for placing a coating substrate is arranged in the machine shell, the workpiece disc is uniformly provided with the coating substrate and a coating accompanying piece, and the coating device further comprises a light transmission assembly, a light detection device, a bombardment assembly, a data acquisition and analysis device and a correction plate; the light transmission assembly comprises a laser emitter, a collimating lens, a beam splitter and a flat crystal. Thus, the optical uniformity and the surface flatness of the lens film layer after coating are monitored in real time by means of the interference light information generated on the coating accompanying piece during the coating process. Meanwhile, the target position of the correction plate is adjusted and the deposition rate of the bombardment assembly is adjusted according to the parameters of the optical uniformity and the surface flatness of the lens film layer obtained by the data acquisition and analysis device during the coating process, and the corresponding adjustment is made in time during the coating process, so that the surface of the lens film layer after coating is uniform and flat.

Description

Technical Field

[0001] This invention relates to the field of optical equipment technology, and in particular to a coating device and coating method for real-time monitoring of lens surface shape. Background Technology

[0002] By utilizing the principle of light wave interference to measure the optical properties of materials, instruments can be used to measure thickness, distance, and other parameters, as well as more precise parameters such as the optical uniformity, refractive index, and surface smoothness within the material.

[0003] Existing measuring equipment measures the lens separately after coating is completed. However, changes in the lens's optical uniformity and surface smoothness parameters during coating have a significant impact on the lens's precision. Current equipment cannot measure these parameters during the coating process. Furthermore, it cannot adjust the position of the correction plate or regulate the deposition rate of the bombardment assembly based on measured optical uniformity and surface smoothness parameters during coating. Therefore, it cannot make timely adjustments during coating to ensure a uniform and smooth lens coating surface.

[0004] Therefore, the aforementioned technical issues still need to be addressed. Summary of the Invention

[0005] The purpose of this invention is to provide a coating apparatus and method for real-time monitoring of lens surface shape, enabling real-time monitoring of the optical uniformity and surface flatness parameters of the coated lens layer by analyzing the interference light information generated on the substrate during the coating process. Simultaneously, based on the optical uniformity and surface flatness parameters of the lens layer obtained from the data acquisition and analysis equipment, the target position of the correction plate and the deposition rate of the bombardment assembly are adjusted during the coating process. This allows for timely adjustments during the coating process, resulting in a uniform and flat surface of the coated lens layer.

[0006] To address the aforementioned technical problems, the embodiments of the present invention provide the following technical solutions:

[0007] The first aspect of the present invention provides a coating device for real-time monitoring of lens surface shape, comprising a housing, a workpiece tray for placing coating substrates within the housing, the coating substrates being uniformly placed on the workpiece tray, and any one of the coating substrates being used as a co-coating substrate for monitoring, and further comprising:

[0008] The light-transmitting component is connected to the optical signal of the co-plated sheet;

[0009] A light detection device is mounted on a transparent window of the housing and is connected to the light transmission unit for light signals;

[0010] The bombardment assembly is housed within the casing.

[0011] The data acquisition and analysis equipment is located outside the housing and is simultaneously communicatively connected to both the optical detection equipment and the bombardment assembly.

[0012] A correction plate passes through and is connected to the housing;

[0013] The light-transmitting component includes:

[0014] The laser emitter is housed within the casing;

[0015] A collimating lens is disposed inside the housing and is connected to the optical signal of the laser emitter;

[0016] A beam splitter is disposed inside the housing and is connected to the collimating lens for optical signals.

[0017] The optical flat is disposed inside the housing and is connected to the optical signal of the beam splitter and the co-coated plate, respectively.

[0018] Furthermore, the optical signals between the collimating lens, the beam splitter, the flat crystal, and the co-plated sheet constitute the first optical signal path.

[0019] Furthermore, the optical signals between the co-plated sheet, the flat crystal, the beam splitter, and the optical detection device constitute a second optical signal path.

[0020] Furthermore, the bombardment component includes:

[0021] An ion source is disposed inside the housing and is communicatively connected to the data acquisition and analysis equipment;

[0022] The target holder is housed within the casing.

[0023] The target material is mounted on the target material holder and connected to the ion source via an ion beam.

[0024] Furthermore, the collimating lens, the beam splitter, and the flat crystal are aligned in a straight line.

[0025] Furthermore, the correction plate is displaced in the target direction according to the target position, and the end of the correction plate located inside the housing is located between the target material and the workpiece disk.

[0026] Furthermore, a door component is provided on the housing, and the workpiece tray is disposed on the door component;

[0027] During the coating process, the workpiece disk rotates inside the housing.

[0028] Furthermore, the correction plate is communicatively connected to the data acquisition and analysis device, and the data acquisition and analysis device is equipped with a control module for controlling the displacement of the correction plate.

[0029] A second aspect of the present invention provides a coating method for real-time monitoring of lens surface shape, comprising:

[0030] In the bombardment step, a vacuum environment is set up inside the machine housing, and the ion source bombards the target material. During the rotation of the workpiece disk, the target atoms generated during the target bombardment process are deposited on the coating substrate and the co-coating sheet located on the workpiece disk.

[0031] In the transmission step, the laser source emitter emits a laser and directs the laser light into the collimating lens. The collimating lens transforms the light from each point emitted by the laser source emitter into a parallel collimated beam. The beam passes through a beam splitter and a flat lens in sequence before being incident on the thin film surface of the substrate.

[0032] In the interference light receiving step, the light reflected between the surface of the film on the substrate and the flat plane interferes between the substrate and the flat plane to generate interference light. The photodetector receives the interference light, forms interference pattern information, and imports it.

[0033] In the data acquisition step, the data acquisition and analysis equipment analyzes the fringe shape and spacing information in the interference pattern information imported by the photodetector to obtain the defect information on the surface of the film of the substrate, thereby obtaining the surface shape data information of the substrate.

[0034] The adjustment steps involve adjusting the position of the correction plate during the coating process based on the obtained defect information to adjust the number of target atoms deposited on the workpiece disk, and adjusting the deposition rate of the coating by adjusting the rate of the ion source.

[0035] Furthermore, the coating materials on the target are SiO2 for depositing the SiO2 layer and Ta2O5 for depositing the Ta2O5 layer, respectively.

[0036] The SiO2 layer deposition process is as follows: An radio frequency ion source bombards the SiO2 target material, causing SiO2 atoms to deposit onto the substrate and co-deposited sheets on the workpiece disk. The vacuum pressure inside the machine housing is less than or equal to 2*10⁻⁴. 6 Tor, argon and oxygen pressure set to 28 Pa, SiO2 deposition rate is 2.7 nm / s, deposition temperature is set to 280℃, and deposition time is the ratio between film thickness and deposition rate;

[0037] The Ta2O5 layer deposition process is as follows: A radio frequency ion source is used to bombard the Ta2O5 target material, causing Ta2O5 target particles to deposit on the substrate and the co-deposited wafers on the workpiece disk. The vacuum pressure inside the housing is less than or equal to 2*10⁻⁴. 6Tor, after introducing argon and oxygen, the pressure was set to 30 Pa, the deposition rate of Ta2O5 was 3.5 nm / s, and the deposition time was the ratio between the film thickness and the deposition rate.

[0038] Compared to existing technologies, the coating apparatus for real-time monitoring of lens surface shape provided by the first aspect of this invention, during the bombardment process, the laser emitted by the laser emitter passes sequentially through a collimating lens, a beam splitter, and a flat crystal, generating interference light on the substrate. This interference light then passes through the flat crystal and is refracted by the beam splitter onto a photodetector. The photodetector transmits the acquired interference light information to a data acquisition and analysis device, which analyzes the interference light information. This allows for real-time monitoring of the optical uniformity and surface flatness parameters of the coated lens layer by analyzing the interference light information generated on the substrate during the coating process. Simultaneously, based on the optical uniformity and surface flatness parameters of the lens layer obtained by the data acquisition and analysis device, the target position of the correction plate and the deposition rate of the bombardment assembly are adjusted during the coating process. This enables timely adjustments during the coating process, ensuring a uniform and flat surface of the coated lens layer.

[0039] The coating method for real-time monitoring of lens surface shape provided in the second aspect of the present invention has the same or similar technical effects as the coating device for real-time monitoring of lens surface shape. Attached Figure Description

[0040] The above and other objects, features, and advantages of exemplary embodiments of the present invention will become readily apparent upon reading the following detailed description with reference to the accompanying drawings. In the drawings, several embodiments of the invention are illustrated by way of example and not limitation, with the same or corresponding reference numerals denoteing the same or corresponding parts, wherein:

[0041] Figure 1 A schematic cross-sectional view of a coating device for real-time monitoring of lens surface shape is shown.

[0042] Figure 2 A schematic diagram of a coating method for real-time monitoring of lens surface shape is shown.

[0043] Figure 3 The spectrum of the coated window plate of the coating device for real-time monitoring of lens surface shape is schematically shown;

[0044] Figure 4 The spectrum of a window plate coated by a conventional ion sputtering coating machine is schematically shown.

[0045] Figure 5 A schematic diagram of the surface shape of the coating window plate of the coating device for real-time monitoring of lens surface shape is shown.

[0046] Figure 6The diagram schematically illustrates the surface profile of a window plate deposited by a conventional ion sputtering coating machine.

[0047] Explanation of icon numbers:

[0048] 1. Housing; 11. Door components;

[0049] 2. Workpiece tray;

[0050] 3. Light transmission component; 31. Laser emitter; 32. Collimating lens; 33. Beam splitter; 34. Crystal flat;

[0051] 4. Photodetector;

[0052] 5. Data acquisition and analysis equipment;

[0053] 6. Bombardment assembly; 61. Ion source; 62. Target holder;

[0054] 7. Correction plate;

[0055] 8. Coated substrate;

[0056] 9. Accompanying plating sheet. Detailed Implementation

[0057] Exemplary embodiments of the present disclosure will now be described in more detail with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be implemented in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art. Unless otherwise specified, the techniques used in the embodiments are conventional means well known to those skilled in the art.

[0058] It should be noted that, unless otherwise stated, the technical or scientific terms used in this invention should be understood in their ordinary sense by those skilled in the art. In this document, relational terms such as “first” and “second” are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. The terms “connected,” “linked,” etc., should be interpreted broadly, for example, referring to a fixed connection, a detachable connection, or an integral connection; a mechanical connection or an electrical connection; a direct connection or an indirect connection via an intermediate medium. The terms “comprising,” “including,” or any other variations thereof are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase “comprising…” does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0059] This invention provides a coating device for real-time monitoring of lens surface shape, such as... Figure 1 As shown, the coating device for real-time monitoring of lens surface shape includes a housing 1, inside which is a workpiece tray 2 for placing coating substrates 8. Coating substrates 8 and any one of the coating substrates 8 as a co-coating substrate 9 for monitoring are evenly placed on the workpiece tray 2. It also includes a light transmission component 3, a light detection device 4, a bombardment component 6, a data acquisition and analysis device 5, and a correction plate 7. The light transmission component 3 is optically connected to the co-coating substrate 9. The light detection device 4 is located on a transparent window of the housing 1 and is optically connected to the light transmission unit. The bombardment component 6 is located inside the housing 1. The data acquisition and analysis device 5 is located outside the housing 1 and is communicatively connected to both the light detection device 4 and the bombardment component 6. The correction plate 7 passes through the housing 1 and is connected to the housing 1.

[0060] The light transmission component 3 includes a laser emitter 31, a collimating lens 32, a beam splitter 33, and a flat lens 34. The laser emitter 31 is housed within the housing 1. The collimating lens 32 is housed within the housing 1 and is optically connected to the laser emitter 31. The beam splitter 33 is housed within the housing 1 and is optically connected to the collimating lens 32. The flat lens 34 is housed within the housing 1 and is optically connected to both the beam splitter 33 and the substrate 9.

[0061] In this embodiment, during the bombardment process, the laser emitted by the laser emitter 31 passes sequentially through the collimating lens 32, the beam splitter 33, and the flat crystal 34, generating interference light on the substrate 9. This interference light then passes through the flat crystal 34 and is refracted by the beam splitter 33 onto the photodetector 4. The photodetector 4 transmits the acquired interference light information to the data acquisition and analysis device 5. The data acquisition and analysis device 5 analyzes the interference light information, thereby enabling real-time monitoring of the optical uniformity and surface flatness parameters of the coated lens film by analyzing the interference light information generated on the substrate 9 during the coating process. Simultaneously, based on the optical uniformity and surface flatness parameters of the lens film obtained by the data acquisition and analysis device 5, the target position of the correction plate 7 and the deposition rate of the bombardment assembly 6 are adjusted during the coating process. This allows for timely adjustments during the coating process, ensuring a uniform and flat surface of the coated lens film.

[0062] In a specific embodiment, the optical signal between the collimating lens 32, the beam splitter 33, the flat crystal 34, and the coating plate 9 constitutes the first optical signal path.

[0063] In this embodiment, the laser emitted by the laser emitter 31 passes sequentially through the collimating lens 32, the beam splitter 33, and the flat crystal 34 along the first optical signal path before illuminating the substrate 9. Thus, the interference light information reflected from the substrate 9 contains the film layer information of the substrate 9.

[0064] In a specific embodiment, the optical signal between the plating sheet 9, the flat crystal 34, the beam splitter 33, and the photodetector 4 constitutes the second optical signal path.

[0065] In this embodiment, the interference light information generated after interference by the co-plated sheet 9 passes through the flat crystal 34 along the second optical signal path and is refracted by the beam splitter 33 to the photodetector 4. Thus, the interference light is received by the photodetector 4 to form interference pattern information and is imported.

[0066] More specifically, the interference light information generated after the interference of the substrate 9 passes through the flat crystal 34 along the second optical signal path and is refracted to the photodetector 4 by the beam splitter 33. The reference wave generated by the reflection of the reference surface of the flat crystal 34 and the plane wave generated by the reflection of the test surface of the substrate 9 interfere to generate interference light, which converges on the photodetector 4 to form an interference pattern. The photodetector 4 records the interference pattern. The photodetector 4 and the data acquisition and analysis device 5 are connected by communication. The data acquisition and analysis device 5 stores and processes the interference pattern recorded by the photodetector 4. The data acquisition and analysis device 5 is connected to the ion source 61 and can also be connected to the correction plate 7. Based on the defect information in the parameters of optical uniformity and surface flatness of the lens film obtained by the data acquisition and analysis device 5, the rate of the ion source 61 is adjusted in time to adjust the deposition rate of the coating and to adjust the target position of the correction plate 7.

[0067] The interference pattern contains information about the reference surface and the surface to be measured. By processing the interference pattern, the surface shapes of the reference surface and the surface to be measured can be determined using existing techniques.

[0068] In a specific embodiment, such as Figure 1 As shown, the bombardment assembly 6 includes an ion source 61, a target holder 62, and a target. The ion source 61 is housed within the casing 1 and is communicatively connected to the data acquisition and analysis device 5. The target holder 62 is housed within the casing 1. The target is mounted on the target holder 62 and is connected to the ion source 61 via an ion beam.

[0069] In this embodiment, the ion source 61 bombards the target material located on the target material holder 62 by emitting an ion beam, so that the target material atoms are deposited onto the coating substrate 8 and the co-coating sheet 9 on the workpiece disk 2.

[0070] In addition, based on the parameters of optical uniformity and surface flatness of the lens film obtained by the data acquisition and analysis device 5, the deposition rate of the ion source 61 is adjusted during the coating process to adjust the deposition rate of the film, thereby enabling timely adjustments during the coating process to ensure that the surface of the lens film after coating is uniform and flat.

[0071] To further enable the laser emitted by the laser emitter 31 to penetrate along the first optical signal path, in a specific embodiment, such as... Figure 1 As shown, the collimating lens 32, the beam splitter 33, and the planar crystal 34 are aligned in a straight line.

[0072] Laser emitter 31 emits laser light, with the laser source being in the visible light band. Collimating lens 32 transforms the light emitted from each point of laser emitter 31 into a parallel collimated beam. Beam splitter 33 is a transmissive and reflective mirror, allowing the incident laser light to pass through and reflecting the interference light generated on the substrate 9 into the photodetector 4. The upper and lower surfaces of the flat crystal 34 are not parallel to ensure that the reflection from the upper surface of the flat crystal 34 does not participate in the formation of interference fringes.

[0073] In a specific embodiment, such as Figure 1 As shown, the correction plate 7 is displaced in the target direction according to the target position, and the end of the correction plate 7 located inside the housing 1 is located between the target material and the workpiece disk 2.

[0074] In this embodiment, based on the parameters of optical uniformity and surface flatness of the lens film obtained by the data acquisition and analysis device 5, the target position of the correction plate 7 is adjusted during the coating process, so that timely adjustments can be made during the coating process to make the surface of the lens film uniform and flat after coating.

[0075] By adjusting the target position of the correction plate 7, the number of target material atoms deposited on the coating substrate 8 and the co-coating sheet 9 located on the workpiece 2 disk can be increased.

[0076] More specifically, based on the parameters of optical uniformity and surface flatness of the lens film obtained by the data acquisition and analysis device 5, the deposition rate of the coating can be adjusted by simultaneously adjusting the target position of the correction plate 7 and the rate of the ion source 61 during the coating process. This allows for timely adjustments during the coating process, resulting in a uniform and flat surface of the coated lens film.

[0077] In a specific embodiment, such as Figure 1 As shown, a door component 11 is provided on the housing 1, and the workpiece tray 2 is disposed on the door component 11. During the coating process, the workpiece tray 2 rotates inside the housing 1.

[0078] In this embodiment, the door 11 can be opened to facilitate placing the coating substrate 8 and the co-coating sheet 9 on the workpiece tray 2 before coating, and to remove the coating substrate 8 and the co-coating sheet 9 from the workpiece tray 2 after coating.

[0079] The workpiece disk 2 rotates inside the housing 1, which increases the uniformity of the deposition of target atoms onto the coating substrate 8 and the co-coating sheet 9 during the deposition process.

[0080] In a specific embodiment, such as Figure 1 As shown, the correction plate 7 is communicatively connected to the data acquisition and analysis device 5, and the data acquisition and analysis device 5 is equipped with a control module that controls the displacement of the correction plate 7.

[0081] In this embodiment, during the coating process, the control module located in the data acquisition and analysis device 5 adjusts the target position of the correction plate 7 through the control system, thereby enabling timely adjustments during the coating process to ensure that the surface of the coated lens layer is uniform and flat.

[0082] For example, the target position of the correction plate 7 can be adjusted, or it can be manually adjusted based on the parameters of optical uniformity and surface flatness of the lens coating obtained by the data acquisition and analysis device 5.

[0083] The control module and control system are based on existing technologies.

[0084] In this invention, under vacuum conditions, the coating substrate 8 is placed on the workpiece disk 2. During the coating process, the ion source 61 emits an ion beam to bombard the target material, and the target atoms are deposited on the coating substrate 8 to form an optical thin film. Based on the optical properties of the coating material, the coating curve and film thickness are designed; the longer the deposition time, the thicker the film. During the coating process, the deposition rate of the target atoms affects the uniformity and flatness of the film. By real-time monitoring of the surface shape and adjusting the rate of the ion source 61, the deposition rate of the coating can be adjusted, and the target position of the correction plate 7 can be adjusted, thereby improving the uniformity and flatness of the target atoms deposited on the coating substrate 8.

[0085] Example 1

[0086] This invention also provides a coating method for real-time monitoring of lens surface shape, such as... Figure 2 As shown, it includes the bombardment step, the transmission step, the interference light receiving step, the data acquisition step, and the adjustment step.

[0087] In the bombardment process, a vacuum environment is set up inside the machine housing, and the ion source bombards the target material. During the rotation of the workpiece disk, the target atoms generated during the bombardment process are deposited on the coating substrate and the co-coating sheet located on the workpiece disk.

[0088] In the transmission step, the laser source emitter emits a laser and directs the laser light into a collimating lens. The collimating lens transforms the light emitted from each point of the laser source emitter into a parallel collimated beam. The beam passes through a beam splitter and a flat lens in sequence before being incident on the thin film surface of the substrate.

[0089] In the interference light receiving step, the light reflected from the surface of the co-coated film and the flat plane interferes between the co-coated film and the flat plane to generate interference light. The photodetector receives the interference light, forms interference pattern information, and imports it.

[0090] In the data acquisition step, the data acquisition and analysis equipment analyzes the fringe shape and spacing information in the interference pattern information imported by the photodetector to obtain the defect information on the surface of the substrate film, thereby obtaining the surface shape data information of the substrate.

[0091] The adjustment steps involve adjusting the position of the correction plate during the coating process based on the obtained defect information to adjust the number of target atoms deposited on the workpiece disk, and adjusting the deposition rate of the coating by adjusting the rate of the ion source.

[0092] In this embodiment, after the bombardment and transmission steps, the interference light generated in the interference light receiving step is received by the photodetector to form interference pattern information, which is then imported. In the data acquisition step, the data acquisition and analysis device analyzes the fringe shape and spacing information in the interference pattern information imported by the photodetector to obtain defect information on the surface of the substrate film, thereby obtaining the surface shape data information of the coating substrate. In the adjustment step, the position of the correction plate and the ion source rate are adjusted according to the obtained defect information during the coating process. This enables real-time monitoring of the optical uniformity and surface flatness parameters of the lens film layer after coating by using the interference light information generated on the substrate. Furthermore, based on the optical uniformity and surface flatness parameters of the lens film layer obtained by the data acquisition and analysis device, the target position of the correction plate and the deposition rate of the bombardment component are adjusted during the coating process, allowing for timely adjustments during coating to ensure a uniform and flat surface of the lens film layer after coating.

[0093] Furthermore, depending on the actual work requirements, the bombardment step, transmission step, interference light reception step, data acquisition step, and adjustment step can be repeated to achieve the effect of adjusting optical uniformity and surface flatness.

[0094] In a specific embodiment, the coating materials on the target are SiO2 for depositing the SiO2 layer and Ta2O5 for depositing the Ta2O5 layer.

[0095] The SiO2 layer deposition process is as follows: An radio frequency ion source bombards the SiO2 target material, causing SiO2 atoms to deposit onto the substrate and co-deposited sheets on the workpiece disk. The vacuum pressure inside the machine housing is less than or equal to 2*10⁻⁴. 6 Tor, argon and oxygen pressure set to 28 Pa, SiO2 deposition rate set to 2.7 nm / s, deposition temperature set to 280℃, and deposition time set to the ratio between film thickness and deposition rate.

[0096] The Ta2O5 layer deposition process is as follows: A radio frequency ion source is used to bombard the Ta2O5 target material, causing Ta2O5 target particles to deposit on the substrate and the co-deposited wafers on the workpiece disk. The vacuum pressure inside the housing is less than or equal to 2*10⁻⁴. 6 Tor, after introducing argon and oxygen, the pressure was set to 30 Pa, the deposition rate of Ta2O5 was 3.5 nm / s, and the deposition time was the ratio between the film thickness and the deposition rate.

[0097] In this embodiment, the deposition process of the SiO2 and Ta2O5 layers can also be applied to the deposition of a window. The deposition conditions for this window are: an input center wavelength of 632.8 nm, a reflectivity R of less than 0.01%, a substrate for deposition of microcrystalline glass, and a thickness of 1 / 4 of the optical thickness for the Ta2O5 and SiO2 layers. The calculation formula is as follows:

[0098] λ0 is the center wavelength, n H / L The refractive indices of Ta₂O₅ and SiO₂ at the center wavelength are used to deposit these two materials alternately, resulting in the spectrum of a window with a reflectivity of 0.01% as shown in the figure. Figure 3 As shown, its surface shape diagram is as follows Figure 5 As shown. The window is a complete lens with the coating already applied to the substrate under the deposition conditions in this embodiment.

[0099] Comparative Example 1

[0100] A window with a reflectance of 0.01% was deposited on a standard ion sputtering coating machine (model BSV1030). The deposition conditions were: input center wavelength of 632.8 nm, reflectance R less than 0.01%, a microcrystalline glass substrate, and coating materials of low refractive index SiO2 and high refractive index Ta2O5. The thickness of the Ta2O5 and SiO2 layers was 1 / 4 of the optical thickness. The calculation formula is as follows:

[0101]

[0102] λ0 is the center wavelength, n H / L The refractive indices of Ta₂O₅ and SiO₂ at the center wavelength are used to deposit these two materials alternately, resulting in the spectrum of a window with a reflectivity of 0.01% as shown in the figure. Figure 4 As shown, its surface shape diagram is as follows Figure 6 As shown.

[0103] The SiO2 layer deposition process is as follows: An radio frequency ion source bombards the SiO2 target material, causing SiO2 atoms to deposit onto the substrate and co-deposited sheets on the workpiece disk. The vacuum pressure inside the machine housing is less than or equal to 2*10⁻⁴. 6 Tor, argon and oxygen pressure set to 28 Pa, SiO2 deposition rate set to 2.7 nm / s, deposition temperature set to 280℃, and deposition time set to the ratio between film thickness and deposition rate.

[0104] The Ta2O5 deposition process involves bombarding the Ta2O5 target material with an radio frequency ion source, causing Ta2O5 target particles to deposit on the substrate and co-deposited sheets of the workpiece disk. The vacuum pressure inside the machine housing is less than or equal to 2*10⁻⁻¹. 6Tor, after introducing argon and oxygen, the pressure was set to 30 Pa, the deposition rate of Ta2O5 was 3.5 nm / s, and the deposition time was the ratio between the film thickness and the deposition rate.

[0105] The reflectance of the 632.8nm lenses deposited in the embodiments of the present invention and Comparative Example 1 was measured using a spectrometer. The results are shown in Table 1.

[0106] Optical thin films Measured values Reflectivity design value Example 1 R<0.01％ R<0.01％ Comparative Example 1 R>2％ R<0.01％

[0107] Table 1

[0108] According to the test results in Table 1, the surface of the window plate deposited by the coating device for real-time monitoring of lens surface shape of the present invention is smooth and clean, with no excessive interference fringes. Figure 5 On windows deposited using a conventional ion sputtering coating machine, spots and Newton's rings appear, such as... Figure 6 As shown.

[0109] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A coating device for real-time monitoring of lens surface shape, comprising a housing, wherein a workpiece tray for placing coating substrates is disposed within the housing, the coating substrates are uniformly placed on the workpiece tray, and any one of the coating substrates is used as a co-coating substrate for monitoring, characterized in that, Also includes: The light-transmitting component is connected to the optical signal of the co-plated sheet; A light detection device is mounted on the transparent window of the housing and is connected to the light transmission unit for light signals; The bombardment assembly is housed within the casing. The data acquisition and analysis equipment is located outside the housing and is simultaneously communicatively connected to both the optical detection equipment and the bombardment assembly. A correction plate passes through and is connected to the housing; The light-transmitting component includes: The laser emitter is housed within the casing; A collimating lens is disposed inside the housing and is connected to the optical signal of the laser emitter; A beam splitter is disposed inside the housing and is connected to the collimating lens for optical signals. The optical flat is disposed inside the housing and is connected to the optical signal of the beam splitter and the co-coated plate, respectively. The optical signal between the collimating lens, the beam splitter, the flat crystal, and the co-plating sheet constitutes the first optical signal path; The optical signal between the plating sheet, the optical flat, the beam splitter, and the optical detection device constitutes the second optical signal path; The light reflected from the surface of the substrate film and the flat plane interferes between the substrate and the flat plane to produce interference light. The photodetector receives the interference light, forms interference pattern information, and imports it.

2. The coating device for real-time monitoring of lens surface shape according to claim 1, characterized in that, The bombardment component includes: An ion source is disposed inside the housing and is communicatively connected to the data acquisition and analysis equipment; The target holder is housed within the casing. The target material is mounted on the target material holder and connected to the ion source via an ion beam.

3. The coating device for real-time monitoring of lens surface shape according to claim 1, characterized in that, The collimating lens, the beam splitter, and the flat crystal are aligned in a straight line.

4. The coating device for real-time monitoring of lens surface shape according to claim 2, characterized in that, The correction plate is displaced in the target direction according to the target position, and the end of the correction plate located inside the housing is located between the target material and the workpiece disk.

5. The coating device for real-time monitoring of lens surface shape according to claim 1, characterized in that, The machine housing is provided with a door component, and the workpiece tray is disposed on the door component; During the coating process, the workpiece disk rotates inside the housing.

6. The coating device for real-time monitoring of lens surface shape according to claim 1, characterized in that, The correction plate is communicatively connected to the data acquisition and analysis device, and the data acquisition and analysis device is equipped with a control module for controlling the displacement of the correction plate.

7. A coating method using the coating apparatus for real-time monitoring of lens surface shape as described in claim 1, characterized in that, include: In the bombardment step, a vacuum environment is set up inside the machine housing, and the ion source bombards the target material. During the rotation of the workpiece disk, the target atoms generated during the target bombardment process are deposited on the coating substrate and the co-coating sheet located on the workpiece disk. In the transmission step, the laser source emitter emits a laser and directs the laser light into the collimating lens. The collimating lens transforms the light from each point emitted by the laser source emitter into a parallel collimated beam. The beam passes through a beam splitter and a flat lens in sequence before being incident on the thin film surface of the substrate. In the interference light receiving step, the light reflected between the surface of the film on the substrate and the flat plane interferes between the substrate and the flat plane to generate interference light. The photodetector receives the interference light, forms interference pattern information, and imports it. In the data acquisition step, the data acquisition and analysis equipment analyzes the fringe shape and spacing information in the interference pattern information imported by the photodetector to obtain the defect information on the surface of the film of the substrate, thereby obtaining the surface shape data information of the substrate. The adjustment steps involve adjusting the position of the correction plate during the coating process based on the obtained defect information to adjust the number of target atoms deposited on the workpiece disk, and adjusting the deposition rate of the coating by adjusting the rate of the ion source.

8. The coating method according to claim 7, characterized in that, The coating materials on the target are SiO2 for depositing the SiO2 layer and Ta2O5 for depositing the Ta2O5 layer, respectively. The SiO2 layer deposition process is as follows: An radio frequency ion source bombards the SiO2 target material, causing SiO2 atoms to deposit onto the substrate and co-deposited sheets on the workpiece disk. The vacuum pressure inside the machine housing is less than or equal to 2*10⁻⁴. 6 Tor, argon and oxygen pressure set to 28 Pa, SiO2 deposition rate is 2.7 nm / s, deposition temperature is set to 280℃, and deposition time is the ratio between film thickness and deposition rate; The Ta2O5 layer deposition process is as follows: A radio frequency ion source is used to bombard the Ta2O5 target material, causing Ta2O5 target particles to deposit on the substrate and the co-deposited wafers on the workpiece disk. The vacuum pressure inside the housing is less than or equal to 2*10⁻⁴. 6 Tor, after introducing argon and oxygen, the pressure was set to 30 Pa, the deposition rate of Ta2O5 was 3.5 nm / s, and the deposition time was the ratio between the film thickness and the deposition rate.

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