A wet etching compensation etching device

Abstract

The present application belongs to the technical field of wet etching, and particularly relates to a wet etching compensation etching device, which comprises: an overflow box; a liquid collecting tank located below the overflow box; and a liquid inlet pipeline located between the overflow box and the liquid collecting tank and used for conveying a liquid medicine to the overflow box; wherein a liquid outlet end of the liquid inlet pipeline penetrates through a side wall outside the overflow box and extends into the overflow box, an open area for overflowing the liquid medicine out of the overflow box and contacting a surface to be etched is formed at an upper end of the overflow box, and the liquid collecting tank is used for collecting the liquid medicine overflowing out of the overflow box. The present application has the beneficial effects of effectively improving the thinning uniformity of the etching surface, reducing the consumption of the liquid medicine, and collecting and recycling the liquid medicine through the liquid collecting tank, thereby achieving good use effect.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of wet etching, in particular to a wet etching compensation etching device. BACKGROUND

[0002] In the production of invar material thinning in the FMM industry, the invar material is usually etched by a ferric chloride solution, and the existing wet etching methods mainly include spraying and soaking. However, the spraying liquid pressure is uneven, which can easily cause uneven etching. Although the soaking does not require pressure, the consumption of the liquid is large. Therefore, it is urgent to develop an etching device which can uniformly etch and has small liquid consumption. SUMMARY

[0003] In view of the problems in the prior art, the present application provides a wet etching compensation etching device to solve the above problems.

[0004] The technical scheme of the present application is as follows: a wet etching compensation etching device, comprising:

[0005] an overflow box;

[0006] a liquid collecting tank located below the overflow box;

[0007] a liquid inlet pipeline located between the overflow box and the liquid collecting tank for conveying liquid to the overflow box;

[0008] wherein the liquid outlet end of the liquid inlet pipeline penetrates through one side wall outside the overflow box and extends into the interior of the overflow box, an open area for the overflow of the liquid to contact the surface to be etched is provided at the upper end of the overflow box, and the liquid collecting tank is used to collect the overflow liquid from the overflow box.

[0009] Further, the liquid level of the liquid in the overflow box is 4-8mm higher than the open area.

[0010] Further, the liquid inlet pipeline comprises a main pipe and a plurality of branch liquid outlet pipes connected to the main pipe.

[0011] Further, a plurality of liquid inlet adjusting devices for adjusting the liquid level are fixedly installed on one side of the overflow box, and the liquid inlet adjusting device comprises:

[0012] a fixed column fixedly installed in the overflow box, and a containing cavity is formed in the fixed column;

[0013] a partition plate A;

[0014] a partition plate B, the partition plate A and the partition plate B are fixedly installed in the containing cavity to sequentially divide the containing cavity into a cavity A, a cavity B and a cavity C from top to bottom, and the partition plate A is located above the partition plate B.

[0015] The liquid inlet is arranged on the left upper edge of the chamber B.

[0016] The liquid outlet is arranged on the right lower edge of the chamber B.

[0017] The first adjusting mechanism is located in the chamber A.

[0018] The second adjusting mechanism is located in the chamber B, and the third adjusting mechanism is located in the chamber C.

[0019] The liquid inlet adjusting device corresponds to the shunt liquid outlet pipe one-to-one, and one end of the liquid inlet pipeline in the overflow box is connected to the liquid inlet through threads.

[0020] Further, the second adjusting mechanism comprises:

[0021] The first adjusting cylinder is open at both upper and lower ends.

[0022] A plurality of first through grooves are arranged on the outer side of the first adjusting cylinder in a ring array.

[0023] The second adjusting cylinder is rotationally connected in the first adjusting cylinder, the outer side wall of the second adjusting cylinder abuts against the inner side wall of the first adjusting cylinder, and the lower end of the second adjusting cylinder is open.

[0024] A plurality of second through grooves are arranged on the outer side of the second adjusting cylinder in a ring array.

[0025] The first plug is sleeved on the outer edge of the lower end of the first adjusting cylinder.

[0026] The outer peripheral wall of the first plug abuts against the inner side wall of the chamber B, the lower end of the partition plate A is provided with a ring groove, and the upper end of the first adjusting cylinder is slidingly and sealingly connected in the ring groove.

[0027] Further, the first adjusting mechanism comprises:

[0028] The transmission shaft is located in the chamber A, the lower end of the transmission shaft penetrates through the partition plate A and extends into the chamber B, and the transmission shaft is fixedly connected with the second adjusting cylinder.

[0029] The first ring block is located in the chamber A and fixedly connected with the transmission shaft, the transmission shaft is coaxial with the first ring block, and a ring-shaped magnetic block is further embedded in the first ring block.

[0030] The second ring block is fixedly installed on the upper end of the chamber A, and an electromagnetic coil matched with the ring-shaped magnetic block is embedded in the second ring block.

[0031] The micro motor is fixedly installed on one side of the upper end of the partition plate A, and a driving gear is fixedly installed on the output shaft of the micro motor.

[0032] The transmission shaft upper end is fixedly installed with a driven gear matched with the driving gear, the thickness of the driving gear is greater than that of the driven gear, in the initial state, the first adjusting cylinder is spaced apart from the ring groove bottom, the first ring block abuts against the partition plate A, and the first plug block is blocked on the liquid inlet end of the liquid outlet.

[0033] Further, the third adjusting mechanism comprises:

[0034] The second plug block is slidably connected in the chamber C;

[0035] The telescopic rod is fixedly installed at the bottom of the chamber C, and the movable end of the telescopic rod is fixedly connected to the second plug block;

[0036] The spring is sleeved outside the telescopic rod, one end of the spring abuts against the bottom of the chamber C, and the other end of the spring abuts against the second plug block;

[0037] The fixed column is provided with a first connecting pipe outside, one end of the first connecting pipe penetrates the fixed column and extends into the chamber C and is located above the second plug block, the other end of the first connecting pipe penetrates the fixed column and the partition plate A and extends into the ring groove bottom, and the ring groove is filled with lubricating oil above the second plug block.

[0038] By adopting the above technical scheme, the adjusting cylinder can slowly move up and down through the spring, the second plug block and the lubricating oil, so that the impact of the adjusting cylinder on the internal structure of the adjusting device is prevented, and the service life is improved.

[0039] The application is further provided that the liquid inlet end of the liquid inlet pipeline is connected with a liquid inlet switch, and the liquid inlet switch comprises:

[0040] The liquid inlet cavity A is located in the liquid inlet switch;

[0041] The liquid inlet cavity B is located below the liquid inlet cavity A;

[0042] The connecting cavity is located between the liquid inlet cavity A and the liquid inlet cavity B and is used for connecting the liquid inlet cavity A and the liquid inlet cavity B, and the outer diameter of the connecting cavity is smaller than that of the liquid inlet cavity A and the liquid inlet cavity B;

[0043] The third plug block is slidably connected in the connecting cavity, and the upper end of the third plug block is provided with a flow guide hole;

[0044] The upper end of the liquid inlet switcher is provided with a through hole penetrating the liquid inlet cavity A, the connecting cavity, the liquid inlet cavity B and the lower end face of the liquid inlet switcher in sequence, the liquid inlet end of the liquid inlet pipeline is fixedly connected to the lower hole of the through hole, the upper hole of the through hole is fixedly connected with the second connecting pipe, the second connecting pipe is integrally formed with a Y-shaped shunt penetrating the liquid inlet switcher and communicating with the liquid inlet cavity A and the liquid inlet cavity B, the upper end and the lower end of the third plug are respectively sleeved with the block A and the block B, the block A and the block B are respectively located in the liquid inlet cavity A and the liquid inlet cavity B, the cavity wall of the liquid inlet cavity A and the liquid inlet cavity B is respectively provided with the liquid inlet A and the liquid inlet B for connecting two external liquid storage tanks, when the block A is located at the bottom of the liquid inlet cavity A, the liquid inlet A is blocked, the liquid inlet B is communicated with the Y-shaped shunt, the second connecting pipe, the flow guide hole and the liquid inlet pipeline to form a communication flow path, when the block B is located at the upper end of the liquid inlet cavity B, the liquid inlet A is opened and communicated with the Y-shaped shunt, the second connecting pipe, the flow guide hole and the liquid inlet pipeline to form a communication flow path, and the liquid inlet B is blocked.

[0045] Further, the liquid inlet switcher further comprises an electric push rod fixedly installed on the upper end of the liquid inlet switching device, and the output end of the electric push rod penetrates the liquid inlet switcher and is fixedly connected to one side of the upper end of the third plug.

[0046] The beneficial effects of the present application are:

[0047] 1. The etching surface thinning uniformity can be effectively improved, the chemical solution consumption is small, the chemical solution can be collected and reused through the liquid collecting groove, and the use effect is good.

[0048] 2. The overflow chemical solution liquid level height can be accurately controlled, so that the chemical solution can fully contact the to-be-etched panel. BRIEF DESCRIPTION OF DRAWINGS

[0049] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description only some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained without creative labor.

[0050] Fig. 1 is a front view of the etching device of the specific embodiment of the present application;

[0051] Fig. 2 is an isometric view of the etching device of the specific embodiment of the present application;

[0052] Fig. 3 is a sectional view of the liquid inlet adjusting device of the specific embodiment of the present application;

[0053] Figure 4 is a cross-sectional view of the liquid inlet switch of the embodiment of the present application. DETAILED DESCRIPTION

[0054] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0055] In the description of the present application, it should be noted that the terms used herein are only for describing the specific embodiments, and are not intended to limit the exemplary embodiments according to the present application. For the convenience of description, the sizes of the various parts shown in the drawings are not drawn in accordance with the actual proportional relationship. The techniques, methods and devices known to those skilled in the relevant art can not be discussed in detail, but should be considered as part of the specification under appropriate circumstances. In all examples shown and discussed herein, any specific value should be interpreted as merely exemplary, and not as a limitation. Therefore, other examples of exemplary embodiments can have different values. It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further discussed in subsequent drawings.

[0056] Embodiment 1:

[0057] As shown in Figures 1 to 4, the present application discloses a wet etching compensation etching device, a wet etching compensation etching device, comprising:

[0058] overflow box 1;

[0059] sump 2, located below overflow box 1;

[0060] liquid inlet pipe 3, located between overflow box 1 and sump 2 for delivering liquid to overflow box 1;

[0061] Wherein, the sump 2 is arranged around the overflow box 1, the liquid outlet end of the liquid inlet pipe 3 penetrates through the outer side wall of the overflow box 1 and extends into the interior of the overflow box 1, the upper end of the overflow box 1 is provided with an open area for overflow of the liquid to contact the etching surface, and the sump 2 is used to collect the overflow liquid from the overflow box 1.

[0062] In addition, the overflow box can be fixed on the upper side of the sump by other means such as support, support column, etc., and the etching substrate can be fixed by a mechanical arm or a clamping tool so that the etching surface is located above the open part, and the etching surface is about 4-6mm away from the overflow box.

[0063] By adopting the technical scheme, the thinning uniformity of the etching surface can be effectively improved, the chemical solution consumption is small, the chemical solution can be collected and reused through the liquid collecting groove, and the use effect is good.

[0064] Embodiment 2:

[0065] The embodiment provides a wet etching compensation etching device, in addition to comprising the technical scheme of the above embodiment, further has the following technical features.

[0066] Further, the liquid level in the overflow box 1 is 4-8mm higher than the open area.

[0067] By adopting the technical scheme, the overflow chemical solution can uniformly contact the etching surface.

[0068] Embodiment 3:

[0069] The embodiment provides a wet etching compensation etching device, in addition to comprising the technical scheme of the above embodiment, further has the following technical features.

[0070] Further, the liquid inlet pipeline 3 comprises a main pipe and a plurality of shunt liquid outlet pipes connected to the main pipe.

[0071] By adopting the technical scheme, the etching chemical solution can be stably supplied.

[0072] Embodiment 4:

[0073] The embodiment provides a wet etching compensation etching device, in addition to comprising the technical scheme of the above embodiment, further has the following technical features.

[0074] Further, a plurality of liquid inlet adjusting devices for adjusting the liquid level of the chemical solution are fixedly installed on one side in the overflow box 1, and the liquid inlet adjusting device comprises:

[0075] The fixed column 4 is fixedly installed in the overflow box 1, and the fixed column 4 is provided with a containing cavity;

[0076] The partition plate A5 and the partition plate B51 are fixedly installed in the containing cavity to sequentially divide the containing cavity from top to bottom into the chamber A6, the chamber B7 and the chamber C8, and the partition plate A5 is located above the partition plate B51.

[0077] The liquid inlet 9 is arranged on the left upper edge of the chamber B7; and the liquid outlet 101 is arranged on the right lower edge of the chamber B7.

[0078] The first adjustment mechanism is located in chamber A6; the second adjustment mechanism is located in chamber B7.

[0079] The third adjustment mechanism is located in chamber C8; the liquid inlet adjustment device corresponds one-to-one with the diversion outlet pipe, and one end of the liquid inlet pipe 3 located in the overflow box 1 is connected to the liquid inlet 9 by a thread.

[0080] By adopting the above technical solution, the flow rate of the etching solution can be precisely controlled by multiple liquid inlet regulating devices and diversion outlet pipes, and the liquid level of the overflow solution can be stably maintained, so that the overflow solution can uniformly contact the etching surface.

[0081] Example 5:

[0082] This embodiment provides a wet etching compensation etching apparatus, which, in addition to the technical solutions of the above embodiments, also has the following technical features.

[0083] Furthermore, the second regulatory body includes:

[0084] The first adjusting cylinder 10 is open at both the top and bottom ends;

[0085] Several first through slots are opened on the outside of the first regulating cylinder 10 and are distributed in a ring array;

[0086] The second adjusting cylinder 11 is rotatably connected inside the first adjusting cylinder 10. The outer side wall of the second adjusting cylinder 11 abuts against the inner side wall of the first adjusting cylinder 10. The lower end of the second adjusting cylinder 11 is open. Several second through slots are opened on the outer side of the second adjusting cylinder 11 and are arranged in a ring array.

[0087] The first stopper 12 is fitted onto the lower outer edge of the first adjusting cylinder 10;

[0088] The outer peripheral wall of the first plug 12 abuts against the inner side wall of the chamber B7, and the lower end of the partition plate A5 is provided with an annular groove. The upper end of the first adjusting cylinder 10 is slidably and sealingly connected to the annular groove.

[0089] By adopting the above technical solution, the first adjustment mechanism can drive the second adjustment cylinder to rise, and can drive the first adjustment cylinder and the first plug to rise synchronously. At this time, the second adjustment cylinder and the liquid outlet form a flow path. Then, the first adjustment mechanism drives the second adjustment cylinder to rotate, so that the first and second channels that are misaligned gradually come into contact, thereby accurately controlling the flow rate of the liquid.

[0090] Example 6:

[0091] The embodiment provides a wet etching compensation etching device.

[0092] Further, the first adjusting mechanism comprises:

[0093] The transmission shaft 13 is located in the chamber A6, the lower end of the transmission shaft 13 penetrates the partition plate A5 and extends into the chamber B7 and is fixedly connected with the second adjusting cylinder 11;

[0094] The first ring block 14 is located in the chamber A6 and is fixedly connected with the transmission shaft 13, the transmission shaft 13 is coaxial with the first ring block 14, and the first ring block 14 is further embedded with a ring-shaped magnetic block;

[0095] The second ring block 15 is fixedly installed at the upper end in the chamber A6, and the second ring block 15 is embedded with an electromagnetic coil matched with the ring-shaped magnetic block;

[0096] The micro motor 16 is fixedly installed on one side of the upper end of the partition plate A5, and the output shaft of the micro motor 16 is fixedly installed with a driving gear;

[0097] The upper end of the transmission shaft 13 is fixedly installed with a driven gear matched with the driving gear, the thickness of the driving gear is greater than that of the driven gear, in the initial state, the first adjusting cylinder 10 is spaced apart from the bottom of the ring groove, the first ring block 14 abuts against the partition plate A5, and the first plug block 12 is blocked on the liquid inlet end of the liquid outlet.

[0098] By adopting the above technical scheme, when the electromagnetic coil is energized, the second adjusting mechanism can be broken through to drive the second adjusting cylinder and the first adjusting cylinder to rise through the transmission shaft by adsorbing the first ring block, and then the relative position of the two adjusting cylinders is accurately controlled by starting the micro motor, so that the structure is simple and the use effect is good.

[0099] Embodiment 7:

[0100] The embodiment provides a wet etching compensation etching device, in addition to comprising the technical scheme of the above embodiment, further has the following technical features.

[0101] Further, the third adjusting mechanism comprises:

[0102] The second plug block 17 is slidably connected in the chamber C8;

[0103] The telescopic rod 18 is fixedly installed at the bottom of the chamber C8, and the movable end of the telescopic rod 18 is fixedly connected with the second plug block 17;

[0104] A spring is sleeved outside the telescopic rod 18, one end of the spring abuts against the inner bottom of the chamber C8, and the other end abuts against the second plug 17.

[0105] The outer side of the fixed column 4 is provided with a first connecting pipe 19, one end of the first connecting pipe 19 penetrates the fixed column 4 and extends into the chamber C8 and is located above the second plug 17, and the other end of the first connecting pipe 19 penetrates the fixed column 4 and the partition plate A5 and extends into the bottom of the annular groove, and the annular groove and the upper side of the second plug 17 are filled with lubricating oil.

[0106] By adopting the above technical scheme, through the setting of the spring, the second plug and the lubricating oil, the adjusting cylinder can slowly move up and down, the internal structure of the adjusting device is prevented from being impacted between the adjusting cylinders, and the service life is improved.

[0107] Further, the liquid inlet end of the liquid inlet pipeline 3 is connected with a liquid inlet switch, and the liquid inlet switch comprises:

[0108] A liquid inlet cavity A20 is located in the liquid inlet switch;

[0109] A liquid inlet cavity B21 is located below the liquid inlet cavity A20;

[0110] A connecting cavity 23 is located between the liquid inlet cavity A20 and the liquid inlet cavity B21 and is used for connecting the liquid inlet cavity A20 and the liquid inlet cavity B21, and the outer diameter of the connecting cavity 23 is smaller than the outer diameters of the liquid inlet cavity A20 and the liquid inlet cavity B21;

[0111] A third plug 24 is slidably connected in the connecting cavity 23, and a flow guide hole is penetratingly formed in the upper end of the third plug 24;

[0112] The upper end of the liquid inlet switcher is provided with a through hole penetrating the liquid inlet cavity A20, the connecting cavity 23, the liquid inlet cavity B21 and the lower end surface of the liquid inlet switcher in sequence, the liquid inlet end of the liquid inlet pipeline 3 is fixedly connected to the lower hole of the through hole, the upper hole of the through hole is fixedly connected with the second connecting pipe 22, the second connecting pipe 22 is integrally formed with a Y-shaped shunt penetrating the liquid inlet switcher and communicating the liquid inlet cavity A20 and the liquid inlet cavity B21, the upper and lower ends of the third plug 24 are respectively sleeved with the block A and the block B, the block A and the block B are respectively located in the liquid inlet cavity A20 and the liquid inlet cavity B21, the cavity wall of the liquid inlet cavity A20 and the liquid inlet cavity B21 is respectively provided with the liquid inlet A and the liquid inlet B for respectively connecting two external liquid storage tanks, when the block A is located at the bottom of the liquid inlet cavity A20, the liquid inlet A is blocked, the liquid inlet B is communicated with the Y-shaped shunt, the second connecting pipe 22, the flow guide hole and the liquid inlet pipeline to form a communication flow path, when the block B is located at the upper end of the liquid inlet cavity B21, the liquid inlet A is opened and communicated with the Y-shaped shunt, the second connecting pipe 22, the flow guide hole and the liquid inlet pipeline to form a communication flow path, and the liquid inlet B is blocked.

[0113] By adopting the above technical scheme, when one of the liquid storage tanks cannot normally supply liquid medicine, the overflow tank can be quickly switched with the other liquid storage tank through the liquid inlet switcher, and the structure is small and convenient to disassemble and maintain.

[0114] Embodiment 9:

[0115] The embodiment provides a wet etching compensation etching device, in addition to comprising the technical scheme of the above embodiment, further has the following technical features.

[0116] Further, the liquid inlet switcher further comprises an electric push rod fixedly installed on the upper end of the liquid inlet switching device, and the output end of the electric push rod penetrates the liquid inlet switcher and is fixedly connected to one side of the upper end of the third plug 24.

[0117] By adopting the above technical scheme, the switching and adjusting are rapid and simple to operate.

[0118] The above only describes the preferred embodiments of the present application and is not intended to limit the present application, and any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. An etching apparatus for compensating wet etching, characterized in that, include: Overflow box (1); The liquid collection tank (2) is located below the overflow box (1); The liquid inlet pipe (3) is located between the overflow box (1) and the liquid collection tank (2) and is used to deliver the medicine to the overflow box (1); Among them, the liquid outlet of the liquid inlet pipe (3) extends through the outer side wall of the overflow box (1) and into the interior of the overflow box (1). The upper end of the overflow box (1) is provided with an open area for the liquid to overflow and contact the surface to be etched. The liquid collection tank (2) is used to collect the liquid overflowing from the overflow box (1). The inlet pipe (3) includes a main pipe and several branch outlet pipes connected to the main pipe; Several liquid inlet regulating devices for adjusting the liquid level are fixedly installed on one side of the overflow box (1). The liquid inlet regulating devices include: A fixed column (4) is fixedly installed inside the overflow box (1), and a receiving cavity is provided inside the fixed column (4); Divider A (5); Divider B (51), Divider A (5) and Divider B (51) are fixedly installed in the receiving cavity to divide the receiving cavity into chamber A (6), chamber B (7) and chamber C (8) from top to bottom. Divider A (5) is located above Divider B (51); Liquid inlet (9) is opened on the upper left edge of chamber B (7); Liquid outlet (101) is opened on the lower right edge of chamber B (7); The first adjustment mechanism is located in chamber A(6); The second adjustment mechanism is located in chamber B(7); The third adjustment mechanism is located in chamber C(8); Among them, the liquid inlet regulating device corresponds one-to-one with the diversion outlet pipe, and one end of the liquid inlet pipe (3) located in the overflow box (1) is connected to the liquid inlet (9) by a thread; The second regulatory body includes: The first regulating cylinder (10) is open at both the top and bottom ends; a number of first through slots are opened on the outside of the first regulating cylinder (10) and are distributed in a ring array. The second adjusting cylinder (11) is rotatably connected inside the first adjusting cylinder (10). The outer side wall of the second adjusting cylinder (11) abuts against the inner side wall of the first adjusting cylinder (10). The lower end of the second adjusting cylinder (11) is open. Several second through slots are opened on the outside of the second regulating cylinder (11) and distributed in a ring array; The first stopper (12) is fitted onto the outer edge of the lower end of the first adjusting cylinder (10); Among them, the outer peripheral wall of the first plug (12) abuts against the inner side wall of the chamber B (7), the lower end of the partition plate A (5) is provided with an annular groove, and the upper end of the first adjusting cylinder (10) is slidably sealed in the annular groove; The first regulatory body includes: The drive shaft (13) is located in chamber A (6). The lower end of the drive shaft (13) passes through the partition plate A (5) and extends into chamber B (7) to be fixedly connected to the second adjusting cylinder (11). The first ring block (14) is located in the chamber A (6) and is fixedly connected to the drive shaft (13). The drive shaft (13) is coaxial with the first ring block (14). A ring magnetic block is also embedded in the first ring block (14). The second ring block (15) is fixedly installed at the upper end of the cavity A (6). An electromagnetic coil that cooperates with the ring magnetic block is embedded in the second ring block (15). A micro motor (16) is fixedly installed on one side of the upper end of the partition plate A (5), and a drive gear is fixedly installed on the output shaft of the micro motor (16); Among them, the upper end of the drive shaft (13) is fixedly installed with a driven gear that cooperates with the drive gear. The thickness of the drive gear is greater than the thickness of the driven gear. In the initial state, the distance between the first adjusting cylinder (10) and the bottom of the ring groove is set, the first ring block (14) abuts against the partition plate A (5), and the first plug block (12) is sealed on the inlet end of the liquid outlet. The third regulatory body includes: The second plug (17) is slidably connected to the chamber C (8); The telescopic rod (18) is fixedly installed at the bottom of the chamber C (8), and the movable end of the telescopic rod (18) is fixedly connected to the second plug (17); A spring is fitted on the outside of the telescopic rod (18), with one end of the spring abutting against the bottom of the chamber C (8) and the other end abutting against the second plug (17); The fixed column (4) is provided with a first connecting pipe (19) on the outside. One end of the first connecting pipe (19) passes through the fixed column (4) and extends into the chamber C (8) and is located above the second plug (17). The other end of the first connecting pipe (19) passes through the fixed column (4) and the partition plate A (5) and extends into the bottom of the annular groove. The annular groove and the top of the second plug (17) are filled with lubricating oil.

2. The wet etching compensation etching apparatus according to claim 1, characterized in that, The liquid level in the overflow box (1) is 4-8 mm higher than the open area.

3. The wet etching compensation etching apparatus according to claim 1, characterized in that, The inlet end of the inlet pipe (3) is connected to an inlet switch, which includes: Liquid inlet chamber A(20) is located inside the liquid inlet switcher; Liquid inlet chamber B(21) is located below liquid inlet chamber A(20); The connecting cavity (23) is located between the liquid inlet cavity A (20) and the liquid inlet cavity B (21) and is used to connect the liquid inlet cavity A (20) and the liquid inlet cavity B (21). The outer diameter of the connecting cavity (23) is smaller than the outer diameter of the liquid inlet cavity A (20) and the liquid inlet cavity B (21). The third plug (24) is slidably connected in the connecting cavity (23), and a guide hole is provided through the upper end of the third plug (24); Among them, the upper middle part of the liquid inlet switch is provided with a through hole that passes through the liquid inlet chamber A (20), the connecting chamber (23), the liquid inlet chamber B (21) and the lower end face of the liquid inlet switch in sequence. The liquid inlet end of the liquid inlet pipe (3) is fixedly connected to the lower opening of the through hole. The upper opening of the through hole is fixedly connected to the second connecting pipe (22). The end of the second connecting pipe (22) away from the through hole is integrally formed with a Y-shaped diverter pipe that passes through the liquid inlet switch and connects the liquid inlet chamber A (20) and the liquid inlet chamber B (21) respectively. The upper and lower ends of the third plug (24) are respectively fitted with a stop block A and a stop block B. The stop block A and the stop block B are respectively located in the liquid inlet chamber A (20) and the liquid inlet chamber B (21). The walls of the liquid inlet chamber A (20) and the liquid inlet chamber B (21) are respectively provided with a liquid inlet A and a liquid inlet B for connecting the two external liquid storage tanks respectively. When the stop block A When located at the bottom of the inlet chamber A (20), the inlet A is blocked, and the inlet B forms a connected flow path with the Y-shaped diverter pipe, the second connecting pipe (22), the guide hole and the inlet pipe. When the stop block B is located at the upper end of the inlet chamber B (21), the inlet A is opened and forms a connected flow path with the Y-shaped diverter pipe, the second connecting pipe (22), the guide hole and the inlet pipe, and the inlet B is blocked.

4. The wet etching compensation etching apparatus according to claim 3, characterized in that, The liquid inlet switcher also includes an electric push rod fixedly installed on the upper end of the liquid inlet switching device. The output end of the electric push rod passes through the liquid inlet switcher and extends into the liquid inlet chamber A (20), and is fixedly connected to one side of the upper end of the third plug (24).

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