Method for manufacturing an optical component and optical component

Abstract

The present invention includes: a film formation step (S103) of forming a thin film (13a) on an optical surface of an optical substrate (11) having a curved optical surface or on a non-removal film formed on the optical substrate (11); and a removal step (S104) of locally removing the thin film (13a) on the optical surface or the non-removal film to pattern the thin film, in the removal step (S104), the removal of the thin film (13a) is performed by irradiation of laser light, the laser light uses laser light belonging to a waveband in which a difference between a transmittance with respect to the optical substrate (11) or the non-removal film formed between the optical substrate (11) and the (13a) thin film and a transmittance with respect to the thin film (13a) is 1% or more, and the thin film (13a) is an oxidized metal film or a metal film having laser light absorbance.

Description

[0001] This application is a divisional application of the patent application for invention with application number 201980071954.2, the original application date of which is December 25, 2019, and the invention name of which is "Manufacturing method of optical member and optical member". TECHNICAL FIELD

[0002] The present invention relates to a manufacturing method of an optical member and an optical member. BACKGROUND

[0003] In recent years, as a spectacle lens, there is a lens in which a thin film (SnO2 film or Cr film, etc.) is patterned with a prescribed pattern on an optical surface of a lens base material. The patterning for obtaining the prescribed pattern is performed, for example, in such a manner that a resist pattern is formed on the optical surface by an inkjet recording method, and after a thin film is formed thereon, the resist pattern is removed and the thin film is partially peeled off (for example, refer to Patent Literature 1).

[0004] PRIOR ART DOCUMENTS

[0005] PATENT LITERATURE

[0006] Patent Literature 1: Japanese Patent Application Laid-Open No. 2018-180168

[0007] PROBLEMS TO BE SOLVED BY THE INVENTION

[0008] In a spectacle lens, since the optical surface is curved, when the thin film is patterned, it is necessary to form a resist pattern on the curved surface. When the resist pattern is formed by the inkjet recording method, the resist reaching the optical surface can deviate, and therefore it is not possible to accurately form the resist pattern on the optical surface, as a result of which it can not be possible to perform high-precision patterning. Furthermore, since it is necessary to perform the formation, removal, etc. of the resist pattern, it can lead to complication of the processing procedures for patterning. SUMMARY

[0009] An object of the present invention is to provide a technology by which, even in the case where a thin film on a curved optical surface of an optical member is patterned, it is possible to perform the patterning with high precision, and it is possible to suppress complication of the processing procedures for patterning.

[0010] MEANS FOR SOLVING THE PROBLEMS

[0011] The present invention has been made in order to achieve the above object.

[0012] A first aspect of the present invention is:

[0013] A manufacturing method of an optical member, comprising:

[0014] a film formation step of forming a thin film on the optical surface of the optical substrate having a curved optical surface, and

[0015] a removal step of partially removing the thin film on the optical surface to pattern the thin film,

[0016] In the removal step, the removal of the thin film is performed by irradiation of laser light.

[0017] A second aspect of the present application is the method of manufacturing an optical member according to the first aspect, wherein

[0018] In the removal step, the irradiation of the laser light is performed using a laser processing machine suitable for three-dimensional control of a focal point position of the laser light.

[0019] A third aspect of the present application is the method of manufacturing an optical member according to the first or second aspect, wherein

[0020] The laser light irradiated in the removal step is laser light of a wavelength belonging to a wavelength band in which a difference between a transmittance with respect to the optical substrate and a transmittance with respect to the thin film is 1% or more.

[0021] A fourth aspect of the present application is the method of manufacturing an optical member according to the third aspect, comprising:

[0022] a non-removal film formation step of forming a film of a material different from the thin film as a non-removal film between the optical substrate and the thin film,

[0023] The laser light irradiated in the removal step is laser light of a wavelength belonging to a wavelength band in which a difference between a transmittance with respect to the non-removal film and a transmittance with respect to the thin film is 1% or more in addition to a transmittance with respect to the optical substrate.

[0024] A fifth aspect of the present application is the method of manufacturing an optical member according to any one of the first to fourth aspects, wherein

[0025] The optical member is a spectacle lens.

[0026] A sixth aspect of the present application is the method of manufacturing an optical member according to any one of the first to fifth aspects, wherein

[0027] The thin film is an oxidized metal film or a metal film having absorbency.

[0028] A seventh aspect of the present application is the method of manufacturing an optical member according to any one of the first to sixth aspects, wherein

[0029] The pattern portion formed by the patterning in the removing process is configured to arrange a plurality of identical shape portions on the optical surface, and a size deviation of each of the identical shape portions is ±10% or less.

[0030] An eighth aspect of the present application is an optical member having:

[0031] An optical substrate having a curved optical surface;

[0032] A thin film formed on the optical surface of the optical substrate; and

[0033] A pattern portion formed by partially removing the thin film,

[0034] The pattern portion is configured to arrange a plurality of identical shape portions on the optical surface.

[0035] A ninth aspect of the present application is the optical member according to the eighth aspect, wherein

[0036] In the pattern portion, a size deviation of each of the identical shape portions is ±10% or less.

[0037] A tenth aspect of the present application is the optical member according to the ninth aspect, wherein

[0038] In the pattern portion, a size deviation of the identical shape portion arranged near a center of the optical surface and the identical shape portion arranged near a periphery of the optical surface is ±10% or less.

[0039] An eleventh aspect of the present application is the optical member according to any one of the eighth to tenth aspects, wherein

[0040] The pattern portion is configured as a dot pattern.

[0041] The identical shape portion is configured as a dot in the dot pattern.

[0042] A twelfth aspect of the present application is the optical member according to any one of the eighth to eleventh aspects, wherein

[0043] The pattern portion has a laser processing trace on a base surface exposed by removing the thin film.

[0044] A thirteenth aspect of the present application is the optical member according to any one of the eighth to twelfth aspects, wherein

[0045] The optical member is a spectacle lens.

[0046] A fourteenth aspect of the present application is the optical member according to any one of the eighth to thirteenth aspects, wherein

[0047] The thin film is an absorbing metal oxide film or a metal film.

[0048] Inventive Effects

[0049] According to the present application, even if the thin film on the curved optical surface in the optical member is patterned, the patterning thereof can be performed with high precision, and the complication of the processing procedure for the patterning can be suppressed. BRIEF DESCRIPTION OF DRAWINGS

[0050] Figure 1 is a plan view showing a structure example of a spectacle lens according to an embodiment of the present application.

[0051] Figure 2 is a sectional view showing a structure example of a spectacle lens according to an embodiment of the present application.

[0052] Figure 3 is a flowchart showing one example of a step of a manufacturing method of a spectacle lens according to an embodiment of the present application.

[0053] Figure 4 is an explanatory diagram showing a relationship between a wavelength of laser light and a transmittance for each of structure components of a spectacle lens, (a) is a diagram showing the relationship for a first lens substrate having a refractive index of 1.50, (b) is a diagram showing the relationship for a second lens substrate having a refractive index of 1.60, and (c) is a diagram showing the relationship for a third lens substrate having a refractive index of 1.67.

[0054] Figure 5 is a partial enlarged view showing one specific example of a pattern portion in a spectacle lens according to an embodiment of the present application, (a) is a diagram showing a microscope observation result of the pattern portion according to the present embodiment, and (b) is a diagram showing a microscope observation result of a pattern portion obtained by an inkjet recording method as a comparative example.

[0055] Figure 6 is an explanatory diagram showing one specific example of a laser microscope-based observation result of a pattern portion in a spectacle lens according to an embodiment of the present application. DETAILED DESCRIPTION

[0056] Hereinafter, an embodiment of the present application will be described based on the drawings.

[0057] (1) Outline structure of spectacle lens

[0058] First, an outline structure of a spectacle lens exemplified in the present embodiment will be described.

[0059] Figure 1 is a plan view showing a structure example of a spectacle lens according to an embodiment of the present application.Figure 2 is a sectional view thereof.

[0060] (Overall Structure)

[0061] The spectacle lens 10 has an object side surface and an eye side surface as optical surfaces. The "object side surface" refers to a surface located on the object side when the wearer wears the spectacle lens 10-equipped spectacles. The "eye side surface" is the opposite, that is, refers to a surface located on the eye side when the wearer wears the spectacle lens 10-equipped spectacles. Generally, the object side surface is a convex surface and the eye side surface is a concave surface, that is, the spectacle lens 10 is a meniscus lens.

[0062] As shown in Figure 1 , in the spectacle lens 10 of the present embodiment, a plurality of minute dots 21 are arranged on at least one of the object side surface or the eye side surface in an isotropic and uniform manner, and a prescribed pattern is formed by the dots 21. Although an example in which the prescribed pattern is formed on the entire surface of the spectacle lens 10 is shown in the present embodiment, the prescribed pattern can also be formed partially. Further, the prescribed pattern can not be constituted by a plurality of minute dots 21, for example, can be constituted by characters or figures, etc.

[0063] The plurality of dots 21 constituting the prescribed pattern are each formed in the same shape (for example, a circular shape). That these dots 21 are "arranged in an isotropic and uniform manner" means that the intervals between adjacent dots 21 are arranged at a constant pitch P.

[0064] As shown in Figure 2 , the spectacle lens 10 having such a prescribed pattern is configured to have a lens base material 11 as an optical base material, a hard coat film (HC film) 12 formed on both surface sides (that is, each of the object side surface and the eye side surface), a patterned film 13 formed on the HC film 12 on one side surface (specifically, the object side surface), and an anti-reflection film (AR film) 14 formed on both surface sides. Here, although an example in which the patterned film 13 is arranged on one side of the object side surface is shown, it is not limited thereto, and can be arranged on at least one side. Further, in the spectacle lens 10, in addition to the HC film 12, the patterned film 13, and the AR film 14, other films can also be formed.

[0065] (Lens Base Material)

[0066] The lens base material 11 is constituted by a general resin material used for optical lenses, and is shaped into a prescribed lens shape. That is, the lens base material 11 has optical surfaces for constituting the prescribed lens shape on the object side surface and the eye side surface, respectively. The prescribed lens shape can be any one of a single-focus lens, a multi-focus lens, a progressive power lens, etc. In the case of any of the lens shapes, at least one side (generally, both sides) of each of the optical surfaces in the lens base material 11 is curved.

[0067] The resin material constituting the lens substrate 11 uses, for example, a resin material having a refractive index (nD) of about 1.50 to 1.74. As such a resin material, for example, allyl diglycol carbonate, urethane-based resin, polycarbonate, thio-urethane-based resin, and cyclic sulfur resin. In addition, the lens substrate 11 can not be constituted by the above-described resin material, but can be constituted by other resin material capable of obtaining a desired refractive power, or can be constituted by inorganic glass.

[0068] (HC film)

[0069] The HC film 12 is constituted by, for example, a cured material containing a silicon compound, and is formed as a film having a thickness of about 3 μm to 4 μm. The HC film 12 has a refractive index (nD) close to that of the material of the above-described lens substrate 11, for example, about 1.49 to 1.74, and the film structure is selected in accordance with the material of the lens substrate 11. By the coating of such an HC film 12, improvement of the durability of the spectacle lens 10 is achieved.

[0070] (Patterned film)

[0071] The patterned film 13 is formed on the optical surface of the lens substrate 11 through the film 12, and is constituted by, for example, a film having a thickness of about several nm to several tens of nm. As a material constituting the patterned film 13, for example, a metal or metal oxide having the absorption laser property described later is used. That is, the patterned film 13 is a metal oxide film or metal film having an absorption property. As such a film, for example, a film including at least one metal or metal oxide selected from chromium (Cr), tantalum (Ta), niobium (Nb), titanium (Ti), zirconium (Zr), gold (Au), silver (Ag), tin (Sn), and aluminum (Al) is used, and a tin dioxide (Sn02) film or Cr film is preferable. In the following description, a case where the patterned film 13 is a Sn02 film or Cr film is mainly described as an example.

[0072] Further, the patterned film 13 has a pattern portion 20 formed by partially removing the film. The pattern portion 20 constitutes the above-described prescribed pattern. Specifically, the pattern portion 20 is constituted by a plurality of identical shape portions 21. The identical shape portion 21 is formed by partially removing the film, and corresponds to the above-described dot 21.

[0073] That is, in the present embodiment, the pattern portion 20 constitutes a dot pattern as a prescribed pattern, and the identical shape portion 21 constitutes the dot 21 of the dot pattern.

[0074] (AR film)

[0075] The AR film 14 has a multilayer structure in which films having different refractive indexes are stacked, and prevents reflection of light by interference. However, it is not necessarily a multilayer structure, and can be a single layer structure as long as the effect of preventing reflection of light is obtained.

[0076] In the case where the AR film 14 is a multilayer structure of a low refractive index layer and a high refractive index layer, the low refractive index film is composed of, for example, silicon dioxide (SiO2) having a refractive index of about 1.43 to 1.47. Further, the high refractive index film is composed of a material having a higher refractive index than the low refractive index film, for example, metal oxides such as niobium oxide (Nb2O5), tantalum oxide (Ta2O5), titanium oxide (TiO2), zirconium oxide (ZrO2), yttrium oxide (Y2O3), and aluminum oxide (Al2O3) are used in an appropriate ratio.

[0077] By the coating with such an AR film 14, improvement in visibility of an image transmitted through the spectacle lens 10 can be achieved.

[0078] (2) Manufacturing method of spectacle lens

[0079] Next, an example of the steps of manufacturing the spectacle lens 10 having the above-described structure, i.e., an example of the steps of the manufacturing method of the spectacle lens according to the present embodiment, will be described in detail.

[0080] Figure 3 is a flowchart showing an example of the steps of the manufacturing method according to the present embodiment.

[0081] (Summary of basic steps)

[0082] In manufacturing the spectacle lens 10, first, as a first step, a lens base material 11 as an optical base material is prepared (step 101, hereinafter, the "step" will be referred to as "S").

[0083] Then, after the lens base material 11 is prepared, as a second step, a step of forming the HC film 12 on both sides of the lens base material 11 is performed (S102). The formation of the HC film 12 can be performed by, for example, a dipping method using a solution in which a cured material containing a silicon compound is dissolved. The formed HC film 12 is not removed in the subsequent steps. Therefore, the film formation step of the HC film 12 corresponds to a "non-removal film formation step", i.e., a film of a material different from the patterned film 13 to be formed in the subsequent steps is formed as a non-removal film between the lens base material 11 and the patterned film 13.

[0084] After the formation of the HC film 12, as a third step, a step of forming a thin film 13a of a Sn02film or a Cr film on the optical surface of the lens base 11 through the HC film 12 as a patterned thin film 13 is performed (S103). Specifically, on the HC film 12, the thin film 13a of the Sn02film or the Cr film is formed on the convex side as the object side. Such formation of the thin film 13a can be performed by, for example, vacuum evaporation or sputtering. This step corresponds to a "film formation step", that is, the formation of the thin film 13a on the curved optical surface.

[0085] After the formation of the thin film 13a, as a fourth step, a step of locally removing the thin film 13a to form the patterned portion 20 is performed (S104). This step corresponds to a "removal step", that is, the patterning of the thin film 13a is performed by locally removing the thin film 13a. The patterning of the thin film 13a performed by irradiation of laser in the present embodiment will be described later in detail. When the patterning of the thin film 13a is performed, the patterned thin film 13 having the patterned portion 20 is formed on the HC film 12 on the convex side.

[0086] Then, after the formation of the patterned thin film 13, as a fifth step, a cleaning step for removing residues, adherents (foreign matters), and the like generated at the time of patterning is performed (S105).

[0087] Then, as a sixth step, a step of forming the AR film 14 on the convex side as the object side and on the concave side as the eyeball side is performed (S106). In the case where the AR film 14 is a multilayer structure, a low-refractive-index layer and a high-refractive-index layer are alternately laminated from the lower layer side to form a film. This film formation can be performed using, for example, ion-assisted evaporation.

[0088] (Details of the removal step)

[0089] Here, the removal step (S104) performed as the fourth step will be described in detail.

[0090] As already described, the patterning for obtaining a prescribed pattern is known as a method of forming a resist pattern on an optical surface by an inkjet recording method and performing patterning using the resist pattern. However, since the optical surface of the spectacle lens 10 is curved, the resist pattern cannot be correctly formed on the optical surface in the process of forming the resist pattern by the inkjet recording method, and as a result, high-precision patterning can not be performed. Therefore, in the present embodiment, the patterning for obtaining a prescribed pattern (that is, the patterned portion 20) is performed by laser processing using irradiation of laser.

[0091] Specifically, in the removing step (S104) of the present embodiment, only the part of the thin film 13a to be removed is selectively irradiated with laser light when forming the pattern portion 20, and the thin film 13a is locally removed using the energy of the laser light.

[0092] (Three-dimensional control of the focal point position of the laser light)

[0093] The irradiation of the laser light at this time is performed using a laser processing machine suitable for three-dimensional control of the focal point position of the laser light.

[0094] As the laser processing machine, a laser oscillator that oscillates laser light, a laser optical system that converges and irradiates the laser light from the laser oscillator, and a base portion that fixes an irradiated object (the lens substrate after the thin film is formed in the present embodiment) to be irradiated with the laser light are used. A laser processing machine in which the laser oscillator and the laser optical system are integrated to form a laser head can also be used. In the laser processing machine thus configured, "three-dimensional control of the focal point position of the laser light" means that the focal point position of the laser light irradiated on the irradiated object can be changed not only in the XY direction along the plane of the base portion but also in the Z direction along the optical axis direction of the laser light, and the manner of the change can be controlled, by at least one of the movement of the relative position of the laser optical system and the base portion or the adjustment of the optical path by the laser optical system.

[0095] Specifically, the three-dimensional control of the focal point position of the laser light is performed in the following manner. First, pattern data regarding the pattern portion 20 to be formed and surface data regarding the pattern formation surface of the lens substrate 11 on which the pattern portion 20 is formed are acquired. Then, the focal point position of the laser light is made changeable in the XY direction according to the acquired pattern data, and is also made changeable in the Z direction according to the acquired surface data. Such three-dimensional control of the focal point position of the laser light can be performed using a control computer device connected to the laser processing machine.

[0096] If suitable for such three-dimensional control of the focal point position of the laser light, the patterning can be performed with high precision even in the case of patterning the thin film 13a on the curved optical surface. Moreover, since the patterning can be directly performed on the thin film 13a using laser light, the formation, removal, and the like of a resist pattern can be omitted.

[0097] (Wavelength of the laser light)

[0098] However, the laser light irradiated in the removing step (S104) is laser light for locally removing the thin film 13a, and it is preferable not to cause damage to the lens substrate 11 and the HC film 12 other than the thin film 13a due to the irradiation. Therefore, in the present embodiment, when the laser light is irradiated in the removing step (S104), laser light of the following wavelength is used.

[0099] Figure 4 This is an explanatory diagram showing the relationship between the wavelength of the laser and the transmittance of the structural components of the eyeglass lens. Figure 4 (a) For each of the following: using a lens substrate 11 with a refractive index of 1.50 (first lens substrate), specifically regarding the individual lens substrate 11 (see the black dashed line in the figure), lens substrate 11 + HC film 12 (see the gray solid line in the figure), lens substrate 11 + HC film 12 + AR film 14 (see the black dotted dashed line in the figure), and lens substrate 11 + thin film 13a (see the black solid line in the figure), a specific example of the change in transmittance when the wavelength of the laser is varied is shown. Furthermore, Figure 4 (b) With regard to the use of a lens substrate (second lens substrate) 11 with a refractive index of 1.60, specific examples of the change in transmittance when the wavelength of the laser is varied are shown for each of the following: individual lens substrate 11 (see the black dashed line in the figure), lens substrate 11 + HC film 12 (see the gray solid line in the figure), lens substrate 11 + HC film 12 + AR film 14 (see the black dotted dashed line in the figure), and lens substrate 11 + thin film 13a (see the black solid line in the figure). Furthermore, Figure 4 (c) With regard to the use of a lens substrate (third lens substrate) 11 with a refractive index of 1.67, a specific example of the change in transmittance when the wavelength of the laser is changed is shown for each of the individual lens substrate 11 (see the black dashed line in the figure), lens substrate 11 + HC film 12 (see the gray solid line in the figure), lens substrate 11 + HC film 12 + AR film 14 (see the black dotted dashed line in the figure), and lens substrate 11 + thin film 13a (see the black solid line in the figure).

[0100] according to Figure 4 As can be seen from (a) to (c), in any case, there is a tendency for the transmittance to increase sharply from the ultraviolet region of the laser wavelength to the visible region. In the visible region (e.g., 380nm to 780nm) and a portion of the near-infrared wavelength region (e.g., 780nm to 1150nm), the difference in transmittance between the lens substrate 11 + film 13a and the lens substrate 11 alone or the lens substrate 11 + HC film 12 is large, but the difference decreases beyond this wavelength region.

[0101] When the laser transmittance is high, even when irradiated with laser, the laser energy is difficult for the irradiated component to absorb (i.e., the laser is easily transmitted), thus suppressing damage to the component. On the other hand, when the transmittance is low, the absorption rate of the irradiated laser energy becomes high, enabling efficient processing that utilizes the absorbed energy (e.g., localized removal of components). Therefore, if the transmittance of stacked components differs significantly, it is possible to process only one type of component using laser.

[0102] Based on this, in this embodiment, the laser used for irradiation in the removal process (S104) is a laser with a wavelength that falls within the band where the difference between the transmittance relative to the lens substrate 11 and the transmittance relative to the thin film 13a is 1% or more, preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more. Furthermore, a laser with a wavelength that, in addition to the transmittance relative to the lens substrate 11, also falls within the band where the difference between the transmittance relative to the HC film 12 (which is a non-removable film) and the transmittance relative to the thin film 13a is also 1% or more, preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more. Additionally, a laser with a wavelength that falls within the band where the difference between the transmittance relative to the AR film 14 (which is also a non-removable film) and the transmittance relative to the thin film 13a is also 1% or more, preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more. Furthermore, the transmittance of the lens substrate 11, HC film 12, and AR film 14 described here can include the transmittance of these superimposed layers.

[0103] For bands with a transmittance difference of 5% or more (i.e., more preferably a transmittance difference), in such Figure 4 In the specific examples shown in (a) to (c), the wavelength is, for example, 380 nm to 1150 nm. Furthermore, as a laser with a wavelength belonging to such a wavelength range, a laser with a wavelength of 1064 nm is used, for example, in the removal process (S104). If the laser has a wavelength of 1064 nm, the transmittance difference is 10% or more, and the transmittance relative to the lens substrate 11 and the HC film 12 is 90% or more, thus suppressing the influence of the laser on the lens substrate 11.

[0104] Thus, since the transmittance difference is at least 1%, it is possible to achieve the following: when irradiated with laser, although transmission occurs relative to the lens substrate 11, HC film 12, etc. (without causing damage), only the irradiated portion is removed due to the high absorption rate of the thin film 13. In other words, it is possible to directly pattern the thin film 13a using laser irradiation. Furthermore, if the transmittance difference is preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more, then direct patterning using laser irradiation can be accurately performed.

[0105] In addition, considering that the lens substrate 11, the HC film 12, the thin film 13a, and the like each have light transmissivity, the upper limit of the transmittance difference is about 50%.

[0106] (Specified pattern)

[0107] Here, regarding the pattern portion 20 formed by patterning in the removing step (S104), a specific example is described.

[0108] As described above, the pattern portion 20 is formed by laser processing, and the laser processing is also performed by a method in which three-dimensional control of the focal position of the laser is possible. Therefore, the pattern portion 20 is highly precisely patterned, and is formed with a precision described below.

[0109] Figure 5 is a partial enlarged view showing one specific example of the pattern portion of the spectacle lens of the present embodiment. In addition, in the legend, the pattern portion 20 is shown by a dot pattern in which a plurality of dots (identical shape portions) 21 are arranged, and a microscope observation result of the dot pattern arranged near the center of the optical surface of the spectacle lens 10 and a microscope observation result of the dot pattern arranged near the periphery of the same optical surface are shown side by side. Further, in Figure 5 An example of the dot pattern of the present embodiment obtained by laser processing is shown in (a) of Figure 5 An example of the dot pattern obtained by the inkjet recording method as a comparative example is shown in (b) of

[0110] As shown in (a) of Figure 5 The pattern portion 20 as the dot pattern of the present embodiment is configured to have dots (identical shape portions) 21 arranged on the optical surface, and the dimensional deviation of each dot 21 is ±10% or less, preferably 6% or less, and more preferably 2% or less.

[0111] Further, even if the dots 21 constituting the dot pattern arranged near the center of the optical surface of the spectacle lens 10 and the dots 21 constituting the dot pattern arranged near the periphery of the same optical surface have a dimensional deviation of ±10% or less, preferably 6% or less, and more preferably 2% or less, respectively.

[0112] The "dimensional deviation" here refers to at least one of, and preferably both of, (1) a deviation in the diameter dimension between points that are substantially circular in plan view, and (2) a deviation in the length-to-width dimension (aspect ratio) of a point 21. Specifically, with respect to the above (1), the dimensional deviation of the points 21 is, for example, 440 ± 44 μm or less, preferably 440 ± 26 μm or less, and more preferably 440 ± 8 μm or less, whether near the center of the optical surface or near the periphery. Also, with respect to the above (2), the deviation in the aspect ratio of the points 21 is, for example, 440 ± 44 μm or less, preferably 440 ± 26 μm or less, and more preferably 440 ± 8 μm or less.

[0113] On the other hand, in the point pattern obtained by the inkjet recording method shown in (b) of the above embodiment, the dimensional deviation of the points is on the order of more than ±10%, specifically more than 440 ± 44 μm. Also, particularly near the periphery of the optical surface, due to the time difference in the landing of the ink, there is a strong tendency for the deviation in the aspect ratio to become large due to the generation of point connections between points, satellite points (small points) that are spattered around the original points, and the like. Figure 5

[0114] That is, in the case where the optical surface is curved, problems such as a dimensional deviation on the order of more than ±10%, and a point shape being destroyed (deviation in the aspect ratio), occur in the inkjet recording method. In contrast, as described in the present embodiment, if three-dimensional control of the focal position is possible and laser light is irradiated to perform patterning, then the dimensional deviation of the pattern portion 20 that is formed can be controlled to be ±10% or less, preferably 6% or less, and more preferably 2% or less. In particular, with respect to the deviation in the aspect ratio of the above (2), a high degree of improvement is obtained compared to the case of the inkjet recording method. Therefore, even in the case where a point pattern composed of a plurality of points 21 disposed on a curved optical surface is formed, the point pattern can be formed with a very high degree of precision, and as a result, the quality stability of the lens member after patterning can be ensured.

[0115] In particular, in the case where the optical surface is curved, although there is a high probability that the maximum dimensional deviation will occur near the center and near the periphery of the optical surface, as described in the present embodiment, if three-dimensional control of the focal position is possible and laser light is irradiated to perform patterning, then the maximum dimensional deviation can be suppressed to be ±2% or less. Therefore, for example, even in the case where a point pattern is disposed on the entire surface of a curved optical surface, the point pattern can be formed with a very high degree of precision, and as a result, the quality stability of the spectacle lens 10 can be ensured.

[0116] Also, considering that the pattern portion 20 is formed by laser processing, the base surface that is exposed by the removal of the thin film 13a has laser processing traces that are observed with a laser microscope.

[0117] Figure 6 ​is a diagram showing one specific example of an observation result by a laser microscope regarding the pattern portion in the spectacle lens according to the present embodiment.

[0118] As shown in the legend, if the pattern portion 20 formed by laser processing is observed by a laser microscope, laser processing traces existing along the scanning track at the time of laser irradiation in the removal process (S104) can be seen on the base surface exposed by removing the thin film 13a. That is, if each point 21 constituting the pattern portion 20 has laser processing traces, it can be clearly confirmed that each point 21 is formed by locally removing the thin film 13a by irradiation of laser.

[0119] If it is such a pattern portion 20 (i.e., the points 21 formed by laser processing), even in the case of being formed by patterning the thin film 13a on the curved optical surface, it can be formed with very high precision. Therefore, each point 21 constitutes, for example, a dot pattern formed with very high precision, as a result of which it is possible to ensure the quality stability of the spectacle lens 10.

[0120] In addition, in the above description, although a specific numerical value is exemplified for the diameter of the point 21, it is not necessarily limited thereto.

[0121] The diameter DD of the point 21 that can be considered is, for example, 0.01 mm or more, more preferably 0.05 mm or more, further preferably 0.1 mm or more, and, for example, 5.0 mm or less, preferably 2.0 mm or less, more preferably 1.0 mm or less, further preferably 0.5 mm or less.

[0122] Further, the interval AD from the center of one point 21 to the center of another adjacent point 21 that can be considered is, for example, 0.1 mm or more, preferably 0.2 mm or more, more preferably 0.3 mm or more, and, for example, 5.0 mm or less, preferably 3.0 mm or less, more preferably 1.0 mm or less.

[0123] The value of the interval AD / diameter DD that can be considered is preferably greater than 1.0, more preferably 1.1 or more, further preferably 1.2 or more, and is preferably 2.0 or less, more preferably 1.8 or less, further preferably 1.5 or less.

[0124] In any case, the dimensional deviation in the present embodiment is suppressed to be 10% or less, preferably 6% or less, more preferably 2% or less.

[0125] (3) Effects of the Present Embodiment

[0126] According to the present embodiment, one or more of the effects shown below can be obtained.

[0127] (a) In the present embodiment, in the removing step (S104), patterning is performed using a laser. Therefore, the thin film 13a on the curved optical surface can be patterned with high precision, and the quality stability of the manufactured spectacle lens 10 can be ensured. Further, since patterning can be directly performed on the thin film 13a using a laser, the formation, removal, and the like of a resist pattern can be omitted.

[0128] (b) In particular, as explained in the present embodiment, if the irradiation of the laser is performed using a laser processing machine capable of three-dimensional control of the focal position of the laser, the case where the thin film 13a on the curved optical surface is patterned is very suitable.

[0129] (c) In the present embodiment, as the laser irradiated in the removing step (S104), a laser having a wavelength belonging to a wavelength band where the difference between the transmittance with respect to the lens base material 11 and the transmittance with respect to the thin film 13a is 1% or more, preferably 3% or more, more preferably 5% or more, and further preferably 10% or more is used. In this way, by setting the difference in transmittance to be at least 1% or more, it is possible to achieve that, when the laser is irradiated, although the lens base material 11 transmits (does not cause damage), only the irradiated portion is removed due to the high absorption of the thin film 13a. That is, it is possible to achieve patterning directly on the thin film 13a using laser irradiation.

[0130] (d) Further, in the present embodiment, as the laser irradiated in the removing step (S104), a laser having a wavelength belonging to a wavelength band where the difference between the transmittance with respect to the HC film 12 and the transmittance with respect to the thin film 13a is 1% or more, preferably 3% or more, more preferably 5% or more, and further preferably 10% or more in addition to the transmittance with respect to the lens base material 11 is used. Thereby, even in the case where the HC film 12 is formed on the optical surface of the lens base material 11, it is possible to achieve patterning directly on the thin film 13a using laser irradiation.

[0131] (e) As explained in the present embodiment, in the case where the optical substrate is the lens base material 11 and the optical member is the spectacle lens 10, the spectacle lens 10 generally has a curved optical surface, and since high-precision patterning can be performed even in this case, the quality stability of the spectacle lens 10 can be ensured.

[0132] (f) As explained in the present embodiment, if the thin film 13a is a Sn02film or a Cr film, it is possible to achieve the patterning effect (to ensure visibility of a prescribed pattern, etc.) while ensuring optical transmittance of the optical member, and it is particularly preferable to apply to the case where it is applied to the spectacle lens 10. However, the thin film 13a is not limited to the Sn02film or the Cr film, and as long as it is an oxidized metal film or a metal film having an absorption, it is possible to apply the same even to other oxidized metal films or metal films, and the same effect can be obtained in this case as well.

[0133] (g) In the spectacle lens 10 obtained by the manufacturing method of the present embodiment, the dots 21 as the plurality of identical shape portions constituting the pattern portion 20 are formed with substantially the same shape and size with high precision. That is, even if the optical surface is curved, it is possible to perform patterning with high precision. Therefore, it is possible to ensure quality stability of the spectacle lens 10.

[0134] (h) In the spectacle lens 10 obtained by the manufacturing method of the present embodiment, the size deviation of each dot 21 constituting the pattern portion 20 of the pattern portion 20 is ±10% or less, preferably 6% or less, and more preferably 2% or less. In the case where the optical surface is curved, although a size deviation of about ±10% or more is likely to occur in, for example, an inkjet recording method, if it is possible to apply three-dimensional control of the focal position and irradiate laser light to perform patterning, it is possible to control the size deviation to be ±10% or less, preferably 6% or less, and more preferably 2% or less. Therefore, even if the pattern portion 20 is configured by a plurality of dots 21, it is possible to perform the patterning with high precision.

[0135] Especially in the case where the optical surface is curved, although it is likely that the maximum size deviation occurs near the center and near the periphery of the optical surface, by suppressing the maximum size deviation to be ±10% or less, preferably 6% or less, and more preferably 2% or less, it is possible to achieve high precision of patterning of the thin film 13a, and it is also very preferable in terms of ensuring quality stability of the spectacle lens 10.

[0136] (i) In the spectacle lens 10 obtained by the manufacturing method of the present embodiment, the pattern portion 20 constitutes a dot pattern. In the dot pattern, uniformity of each dot is also very important on the basis of achieving an effect (for example, a light transmittance suppression effect) as the dot pattern. Even in this case, as explained in the present embodiment, if the size deviation of each dot is ±10% or less, it is possible to reliably achieve the effect as the dot pattern.

[0137] (j) In the spectacle lens 10 obtained by the manufacturing method of the present embodiment, the pattern portion 20 has laser processing traces on the base surface exposed by removing the thin film 13a. If the pattern portion 20 has laser processing traces, it is known that the pattern portion 20 is formed by irradiation of laser and partial removal of the thin film 13a. If the pattern portion 20 is formed using laser, by virtue of three-dimensional control applicable to the focal position at the time of irradiation of laser, even in the case of patterning the thin film 13a on the curved optical surface, patterning can be performed with high precision. Therefore, it is very preferable in terms of ensuring quality stability of the spectacle lens 10.

[0138] (4) Modified examples, etc.

[0139] Although the above describes the embodiments of the present application, the above disclosure is content indicative of exemplary embodiments of the present application. That is, the technical scope of the present application is not limited to the above exemplary embodiments, and various modifications can be made within the scope of the gist thereof.

[0140] In the above embodiment, the case where the patterned thin film 13 is formed on the HC film 12 is exemplified, but the present application is not limited thereto. That is, the patterned thin film 13 may, for example, be formed directly on the lens base material 11 without the HC film 12 interposed therebetween, or may be formed with other kinds of films interposed therebetween.

[0141] Further, in the above embodiment, although the case where the pattern portion 20 is a dot pattern composed of a plurality of dots (identical shape portions) 21 is exemplified and described, the present application is not limited thereto. That is, the pattern portion 20 may, for example, not be composed of dots 21, and may, for example, be composed of characters or figures, etc. Further, the pattern portion 20 can not be the entire surface of the optical surface of the spectacle lens 10, and can be formed partially. Further, minute dots can be gathered and composed into characters or figures, etc.

[0142] Explanation of reference numerals

[0143] 10: spectacle lens (optical member); 11: lens base material (optical base material); 12: HC film (non-removal film); 13: patterned thin film; 13a: thin film; 14: AR film; 20: pattern portion; 21: dot (identical shape portion).

Claims

1. A method for manufacturing an optical member, comprising: a film forming step of forming a thin film on an optical surface of an optical substrate having a curved optical surface, or on a non-removal film formed on the optical substrate; and, a removal step of locally removing the thin film on the optical surface or the non-removal film, to perform patterning of the thin film, in the removal step, the removal of the thin film is performed by irradiation of laser light, the laser light irradiated in the removal step belongs to a wavelength band of 380 nm to 1150 nm, and the laser light uses laser light belonging to a wavelength band in which a difference between a transmittance with respect to the optical substrate or the non-removal film formed between the optical substrate and the thin film and a transmittance with respect to the thin film is 1% or more, the thin film is an oxidized metal film or a metal film having laser light absorbance, the non-removal film is a hard coat film.

2. The method for manufacturing an optical member according to claim 1, wherein the thin film is formed on the non-removal film, the non-removal film is a film formed of a material different from the thin film.

3. The method for manufacturing an optical member according to claim 1, wherein a pattern portion formed by the patterning in the removal step is configured to have a plurality of identical shape portions, and a dimensional deviation of each of the identical shape portions is ±10% or less.

4. The method for manufacturing an optical member according to claim 3, wherein the pattern portion is configured to be a dot pattern, and the identical shape portions are configured to be dots in the dot pattern.

5. The method for manufacturing an optical member according to claim 1, 3 or 4, wherein the optical member is a spectacle lens.

6. The method for manufacturing an optical member according to claim 1, wherein in the removal step, the irradiation of the laser light is performed using a laser processing machine suitable for three-dimensional control of a focal point position of the laser light.

7. The method for manufacturing an optical member according to claim 1, wherein laser light having a wavelength belonging to a wavelength band in which a difference between a transmittance with respect to the optical substrate and a transmittance with respect to the thin film is 3% or more is used.

8. The method for manufacturing an optical member according to claim 1, wherein laser light having a wavelength belonging to a wavelength band in which a difference between a transmittance with respect to the optical substrate and a transmittance with respect to the thin film is 5% or more is used.

9. The method for manufacturing an optical member according to claim 1, wherein the thin film is a Sn02 film or a Cr film.

10. An optical member, comprising: a non-removal film formed on an optical surface of an optical substrate having a curved optical surface; and a thin film formed on the non-removal film, the thin film has a pattern portion locally removed by laser light irradiation, the non-removal film is a film formed of a material different from the thin film, laser light belonging to a wavelength band of 380 nm to 1150 nm has a transmittance with respect to the non-removal film formed between the optical substrate and the thin film that is 1% or more higher than a transmittance with respect to the thin film, the thin film is an oxidized metal film or a metal film having laser light absorbance, the non-removal film is a hard coat film.

11. The optical member according to claim 10, wherein the pattern portion is configured to include a plurality of identical shape portions, and a dimensional deviation of each of the identical shape portions is ±10% or less.

12. The optical member according to claim 11, wherein the pattern portion is configured to include a dot pattern, and the identical shape portions are configured to include dots in the dot pattern.

13. The optical member according to claim 10, wherein the optical member is a spectacle lens.

14. The optical member according to claim 10, wherein a transmittance of a laser light belonging to a wavelength band of 380 nm to 1150 nm with respect to the non-removed film formed between the optical substrate and the thin film is 3% or more higher than a transmittance with respect to the thin film.

15. The optical member according to claim 10, wherein a transmittance of a laser light belonging to a wavelength band of 380 nm to 1150 nm with respect to the non-removed film formed between the optical substrate and the thin film is 5% or more higher than a transmittance with respect to the thin film.

16. The optical member according to claim 10, wherein the thin film is a Sn02 film or a Cr film.

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