Method for fusing a fusing member using a glass frit and articles thereof

Abstract

The application relates to the technical field of fusing members, in particular to a method for fusing a fusing member by using a glass fusing material and a product thereof. The method can reduce bubbles in a fusing layer and easily cause problems such as opacity. The method for fusing a fusing member by using a glass fusing material comprises multiple inorganic components, and the multiple inorganic components form the glass fusing material in a preset proportion; the method comprises the following steps: forming the multiple inorganic components on the surface of the fusing member by evaporation to form a fusing layer; wherein the multiple inorganic components are independently evaporated as independent evaporation sources, and the evaporation conditions of the inorganic components are independently determined, so that the multiple inorganic components are evaporated on the surface of the fusing member in the preset proportion within the same time period; and the fusing member is stacked in a contact mode through the fusing layer, and is subjected to hot fusing by heating.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of fusing members, and particularly to a method for fusing fusing members by using glass fusing material and a product thereof. BACKGROUND

[0002] In the technical field of fusing members, and particularly in the field of fusing tempered glass, since there is surface compressive stress after chemical tempering of glass, a too high fusing temperature will destroy the surface compressive stress of the glass, thereby causing a sharp decrease in the strength of the glass.

[0003] Although the low-melting-point glass powder layer in the middle of the fused glass 10 (also referred to as a fusing layer 2) can be greatly protected from bubbles 100 and opacity and the like after fusing by silk-screening a low-melting-point glass powder slurry on the surface of the glass and then fusing at a low temperature (for example, a temperature less than 450°C), as shown in FIG. 1, the thickness of the glass slurry after silk-screening is large and the surface is rough, and the low-melting-point glass powder layer in the middle of the fused glass 10 (also referred to as a fusing layer 2) is prone to bubbles 100 and opacity and the like after fusing. Figure 1 SUMMARY

[0004] Therefore, it is necessary to provide a method for fusing fusing members by using glass fusing material and a product thereof to reduce bubbles in the fusing layer and to prevent opacity and the like.

[0005] In a first aspect, a method for fusing fusing members by using glass fusing material is provided, the glass fusing material comprising a plurality of inorganic components, and the plurality of inorganic components forming the glass fusing material in a preset proportion; the method comprising:

[0006] forming a fusing layer by vapor deposition of the plurality of inorganic components on the surface of the fusing member; wherein the plurality of inorganic components are independently vapor deposited as independent vapor deposition sources, and the vapor deposition conditions of each are independently determined to vapor deposit the plurality of inorganic components in the preset proportion on the surface of the fusing member in the same time period;

[0007] stacking the fusing members in contact with the fusing layer, and fusing by heating.

[0008] Optionally, the plurality of inorganic components are vapor deposited on the surface of the fusing member by electron beam heating.

[0009] Optionally, the power of the vapor deposition is different for different inorganic components.

[0010] and / or,

[0011] the current and / or rate of the vapor deposition is different for different inorganic components.

[0012] ​Optionally, the plurality of inorganic components include: sodium borate, silicon dioxide, zinc oxide and aluminum oxide.

[0013] The evaporation current of the sodium borate is 55mA-85mA, and the evaporation rate is 0.2nm / s-0.5nm / s.

[0014] The evaporation current of the silicon dioxide is 80mA-100mA, and the rate is 0.09nm / s-0.2nm / s.

[0015] The evaporation current of the zinc oxide is 85mA-105mA, and the rate is 0.04nm / s-0.08nm / s.

[0016] The evaporation current of the aluminum oxide is 100mA-130mA, and the rate is 0.005nm / s-0.02nm / s.

[0017] Optionally, the vacuum degree of the evaporation is 1.0E-5torr-6.0E-5torr, the temperature in the vacuum cavity is 50℃-100℃, and the evaporation time is 20min-60min.

[0018] Optionally, the temperature of the heat fusion is 400℃-500℃, and the time is 5min-10min.

[0019] Optionally, the heat fusion is carried out under pressure, and the pressure of the pressure is 0.05Mpa-0.1Mpa.

[0020] Optionally, after the fusion, the thickness of the fusion layer is 1μm-4μm.

[0021] In a second aspect, an article prepared by the method of the first aspect is provided.

[0022] Optionally, the fusion member includes: a first member and a second member.

[0023] The materials of the first member and the second member are independently selected from one or more of glass, ceramic and metal.

[0024] Optionally, the first member and the second member are both transparent plates.

[0025] Optionally, the first member and the second member are both tempered glass plates.

[0026] The above-mentioned method of fusing a fusion member by using a glass fusing material and the article thereof have the following beneficial effects:

[0027] For different inorganic components, the evaporation conditions are related to the respective vapor pressure, chemical composition, and the preset proportion of each inorganic component in the glass frit, etc. Therefore, by independently evaporating a plurality of different inorganic components as independent evaporation sources, the evaporation conditions of each inorganic component are independently determined, so that the preset proportions of each component can be evaporated onto the surface of the fusing member for different inorganic components, so that after the formation of the fusing layer, the plurality of inorganic components can still be mixed into the glass frit in the preset proportions to retain the unique fusing performance of the glass frit.

[0028] Compared with the fusing layer prepared by silk printing and the like in the related art, the fusing layer formed by evaporation can have a smooth surface and a thickness that can be controlled to be in the nanometer to micrometer range, thereby solving the problems of bubbles and opacity in the fusing layer in the related art. BRIEF DESCRIPTION OF DRAWINGS

[0029] Figure 1 A cross-sectional structure schematic diagram of glass fusing provided by the related art;

[0030] Figure 2 A flowchart of a method for fusing a fusing member with a glass frit provided by an embodiment of the present application;

[0031] Figure 3 A schematic diagram of evaporation of a glass frit with a plurality of electron guns provided by an embodiment of the present application. DETAILED DESCRIPTION

[0032] To make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific embodiments of the present application are described in detail below. In the following description, a large number of specific details are set forth in order to fully understand the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0033] Unless otherwise required by the context, the term "comprising" is interpreted to mean "including, but not limited to" throughout the specification and claims. In the description of the specification, the terms "one embodiment", "some embodiments", "exemplary embodiment", "exemplarily" or "some examples" are intended to mean that the particular feature, structure, material or characteristic related to the embodiment or example is included in at least one embodiment or example of the present disclosure. The exemplary representation of the above terms does not necessarily mean the same embodiment or example. In addition, the specific features, structures, materials or characteristics described can be included in any one or more embodiments or examples in any appropriate manner.

[0034] Exemplary embodiments are described herein with reference to cross-sectional and / or plan view illustrations that are schematic illustrations of idealized embodiments. Variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and / or tolerances, are to be expected. Thus, embodiments should not be construed as limited to the particular shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, an etched region illustrated as a rectangle will, typically, have rounded or curved features. Thus, the regions illustrated in the figures are schematic and their shapes are not intended to illustrate the precise shape of a region that would be formed in a device and are not intended to limit the scope of the exemplary embodiments.

[0035] In the present document, "for example", "for instance", "such as", "like", "for example", "illustrate" and "for example" are used for descriptive purposes only and not intended to limit the scope of the present document. In the present document, A (such as B) means B is one non-limiting example of A, and A can be understood as not limited to B.

[0036] In the present document, "optionally", "optional" and "alternatively" mean that either of the two parallel solutions "yes" or "no" can be chosen. If there are multiple "optionally" in a technical solution, each "optionally" is independent of each other, unless otherwise specified.

[0037] In the present document, "optionally contains", "optionally includes" and the like mean "contains or does not contain". "Optional component X" means that component X exists or does not exist, or means that component X is contained or not contained.

[0038] In the present document, the terms "first", "second", and the like in "first aspect", "second aspect" and the like are only for the purpose of description and cannot be understood as indicating or implying relative importance or quantity, nor can it be understood as implicitly indicating the importance or quantity of the indicated technical features.

[0039] It should be noted that when an element is referred to as being "fixed" or "set" to another element, it can be directly on the other element or there can be an intervening element. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or there can be an intervening element. The terms "vertical", "horizontal", "up", "down", "left", "right" and similar expressions used herein are for illustrative purposes only and are not intended to be the only implementation.

[0040] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description herein is for describing particular embodiments only and is not intended to be limiting of the application.

[0041] In the description of the technology, the technical features described in an open way include both the closed technical solution consisting of the listed features and the open technical solution containing the listed features.

[0042] In the description, "at least one" means one or more, such as one, two, or more. "Multiple" or "several" means at least two, such as two, three, or more.

[0043] In the description, when referring to a numerical interval (i.e., a numerical range), the distribution of the optional values within the numerical interval is considered continuous and includes both numerical endpoints (i.e., the minimum and maximum values) of the numerical interval and every value between the two numerical endpoints, unless otherwise specified. When a numerical interval refers only to integers within the numerical interval, unless otherwise specified, the two endpoint integers and every integer between the two endpoints are equivalent to listing each integer directly. When multiple numerical ranges are provided to describe a feature or characteristic, the numerical ranges can be combined. In other words, unless otherwise indicated, numerical ranges disclosed herein are to be understood to include any and all sub-ranges subsumed therein. A "value" in a numerical interval can be any quantitative value, such as a number, a percentage, a ratio, etc. A "numerical interval" is intended to broadly include types of numerical intervals such as percentage intervals, ratio intervals, and value intervals.

[0044] In the description, when referring to a percentage content, unless otherwise specified, it refers to a mass percentage for solid-liquid mixing and solid-solid mixing, and a volume percentage for liquid-liquid mixing.

[0045] In the description, when referring to a percentage concentration, unless otherwise specified, it refers to a final concentration. The final concentration refers to the proportion of the added ingredient in the system after the ingredient is added.

[0046] In the description, when referring to multiple steps in a method flow, unless otherwise specified, the execution of these steps does not have strict order restrictions and can be executed in other orders than described. Furthermore, any step can include multiple sub-steps or stages, which do not necessarily have to be executed at the same time but can be executed at different times, and the execution order does not necessarily have to be sequential but can be performed in rotation or alternation or simultaneously with other steps or sub-steps or stages of other steps.

[0047] To solve the above technical problems, in a first aspect, some embodiments of the present application provide a method for fusing a fusing member using a glass fusing material, the glass fusing material comprising a plurality of inorganic components, the plurality of inorganic components constituting the glass fusing material in preset proportions. As shown in Figure 2 The method comprises the following steps:

[0048] S21), forming a plurality of inorganic components on the surface of the fusing member 101 by evaporation to form a fusing layer 2; wherein, for different inorganic components, the evaporation conditions are determined according to the chemical composition of each inorganic component and the preset proportion of each inorganic component in the glass fusing material, so that the plurality of inorganic components can be evaporated to the surface of the fusing member 101 in the preset proportions within the same time period;

[0049] S22), stacking the fusing member 101 in contact with the fusing layer 2, and performing thermal fusion by heating.

[0050] Evaporation refers to a process method in which a certain heating evaporation method is used to evaporate and vaporize the coating film material, and the particles of the coating film material fly to the surface of the substrate to condense into a film under vacuum conditions.

[0051] During evaporation, the saturation vapor pressure of different materials is different at a certain temperature. Saturation vapor pressure is the pressure exhibited by the vapor of a material in a vacuum chamber during the equilibrium process with a solid or liquid.

[0052] The glass fusing material is a composite material comprising a plurality of inorganic components. During evaporation, the vapor pressures of the plurality of inorganic components are different under the same vacuum degree due to the different chemical compositions of the plurality of inorganic components. At this time, if the film layer obtained by evaporation under the same evaporation conditions contains a changed component ratio, the characteristics of the glass fusing material change, which will greatly affect the fusing effect.

[0053] In the embodiments of the present application, for different inorganic components, the evaporation conditions are related to the respective vapor pressures, chemical compositions, and preset proportions in the glass fusing material. Therefore, by independently evaporating a plurality of different inorganic components as independent evaporation sources, the evaporation conditions of each component are independently determined, so that the preset proportions of different inorganic components can be evaporated to the surface of the fusing member, thereby enabling the plurality of inorganic components to still mix into the glass fusing material in the preset proportions after forming the fusing layer, thereby retaining the unique fusing performance of the glass fusing material.

[0054] Compared with the fusing layer 2 prepared by silk printing and other methods in the related art, the fusing layer 2 formed by evaporation can have a smooth surface and a thickness that can be controlled to be in the nanometer to micrometer range, thereby solving the problems of bubbles and opacity in the fusing layer 2 in the related art.

[0055] In some embodiments, the surface roughness of the coated and tempered glass (i.e., the fusion layer 2) is very small, less than 10 nm, and the original haze and clarity of the glass can be maintained after fusion.

[0056] In some embodiments, the coated fusion layer is very thin (total thickness after fusion is less than 6 pm), which can ensure that the transmittance of the glass is not substantially affected.

[0057] In some examples, the thickness of the fusion layer after fusion is 1 pm to 4 pm.

[0058] In other embodiments, after the components of the glass fusion material are evaporated onto the surface of the tempered glass using a coating process, the heat fusion temperature of the glass is greatly reduced, so that the glass can be fused at a lower heat fusion temperature, ensuring that the strength of the glass is not substantially affected (e.g., its CS is greater than 500 MPa).

[0059] The above evaporation can be performed by electron beam heating or ion plating heating, which is not specifically limited herein, as long as the components can be evaporated onto the surface of the fusion member in a predetermined proportion without affecting the function of the glass fusion material.

[0060] In some embodiments, the plurality of inorganic components are evaporated onto the surface of the fusion member 101 by electron beam heating.

[0061] Electron beam heating evaporation is to bombard the coating material with accelerated electrons, and the kinetic energy of the electrons is converted into heat energy to heat and evaporate the coating material, and then deposited into a film.

[0062] The characteristic of electron beam heating evaporation is that it can obtain very high energy density, which can reach 10 9 W / cm 2 , and the heating temperature can reach 3000-6000 °C, which can evaporate refractory metals or compounds. Unlike traditional evaporation methods, electron beam heating evaporation can precisely melt the coating material in the crucible by using high-energy electrons and then deposit it on the substrate by using electromagnetic field, and electron beam heating evaporation can deposit high-purity and high-precision thin films.

[0063] In these embodiments, electron beam heating can be used for evaporation of compounds, and the evaporation precision is high, and glass fusion materials with accurate component content can be prepared.

[0064] In some embodiments, the power of evaporation is different for different inorganic components; and / or, the current and / or rate of evaporation is different for different inorganic components.

[0065] That is, the vapor pressure and other parameters of different inorganic components are different, and thus, by using different evaporation power and / or current, different inorganic components can be evaporated at different rates, so that multiple inorganic components can be evaporated at preset proportions on the surface of the fusion member 101 in the same time period.

[0066] The power of evaporation directly determines the current of evaporation, and further affects the evaporation rate.

[0067] In some embodiments, as shown in FIG. 1, the multiple inorganic components include sodium borate, silicon dioxide, zinc oxide, and aluminum oxide. Figure 3

[0068] The evaporation current of the sodium borate is 55 mA to 85 mA, and the evaporation rate is 0.2 nm / s to 0.5 nm / s.

[0069] The evaporation current of the silicon dioxide is 80 mA to 100 mA, and the evaporation rate is 0.09 nm / s to 0.2 nm / s.

[0070] The evaporation current of the zinc oxide is 85 mA to 105 mA, and the evaporation rate is 0.04 nm / s to 0.08 nm / s.

[0071] The evaporation current of the aluminum oxide is 100 mA to 130 mA, and the evaporation rate is 0.005 nm / s to 0.02 nm / s.

[0072] In these embodiments, by controlling the evaporation current and rate of different inorganic components, a glass fusion material with accurate component content can be prepared.

[0073] For example, in the above glass fusion material, the mass proportion of sodium borate is 48% to 60%, the mass proportion of silicon dioxide is 18% to 25%, the mass proportion of zinc oxide is 19% to 26%, and the mass proportion of aluminum oxide is 1% to 3%.

[0074] In some embodiments, as shown in FIG. 2, multiple electron guns 200 can be used to simultaneously evaporate multiple inorganic components, one electron gun 200 corresponding to one inorganic component. Figure 3 Multiple electron guns 200 are used to simultaneously bombard multiple crucibles, so that the formula of the glass fusion material is accurately controllable, and sufficient fusion strength is ensured.

[0075]

[0076] ​​For example, taking sodium borate, silicon dioxide, zinc oxide and aluminum oxide as the inorganic components, the sodium borate is evaporated by the electron gun 1, the silicon dioxide is evaporated by the electron gun 2, the zinc oxide is evaporated by the electron gun 3, and the aluminum oxide is evaporated by the electron gun 4.

[0077] In some embodiments, the vacuum degree of the evaporation is 1.0E-5 torr to 6.0E-5 torr, the temperature in the vacuum chamber is 50°C to 100°C, and the evaporation time is 20 min to 60 min.

[0078] In these embodiments, by controlling the vacuum degree of the evaporation, the temperature in the vacuum chamber and the evaporation time within the above ranges, the electron beam heating evaporation of the glass frit can be realized.

[0079] In some embodiments, the temperature of the thermal fusion is 400°C to 500°C, and the time is 5 min to 10 min.

[0080] In these embodiments, by controlling the temperature and time of the thermal fusion within the above ranges, the thermal fusion can be realized without greatly affecting the compressive stress of the glass surface.

[0081] In some embodiments, the thermal fusion is performed under the action of pressure, and the pressure is 0.05 MPa to 0.1 MPa.

[0082] For example, the stacked frits 101 can be placed in a mold, and the thermal fusion can be performed by using the mold for pressure.

[0083] The material of the mold can be graphite, ceramic, stainless steel, etc.

[0084] In a second aspect, some embodiments of the present application provide an article prepared by using the method of the first aspect.

[0085] The article can include the frits and the frit layer connecting the frits.

[0086] The frit layer has a small surface roughness, which can reduce the problems of bubbles and opacity, etc.

[0087] The frit layer has a small thickness, so that a high transmittance can be maintained.

[0088] In some embodiments, as shown in FIG. 1, the frits 101 include a first frit 101A and a second frit 101B. Figure 2

[0089] The materials of the first frit 101A and the second frit 101B are independently selected from one or more of glass, ceramic and metal.

[0090] ​In these embodiments, the above-mentioned fusion method can be used for fusion between glass and glass, and can also be used for fusion between glass and ceramic, metal.

[0091] In some embodiments, the first member 101A and the second member 101B are both transparent plates.

[0092] In these embodiments, bubble residue in the transparent plate can be reduced, and the transparent plate can maintain a high light transmittance.

[0093] In some embodiments, the first member 101A and the second member 101B are both tempered glass plates.

[0094] In these embodiments, fusion of two glass plates can be achieved, and problems such as bubbles and opacity can be reduced. In addition, during fusion, fusion can be performed at a low temperature, so that the surface compressive stress of the tempered glass can be greatly protected, and therefore, the fusion method is particularly suitable for fusion of tempered glass plates.

[0095] In order to objectively evaluate the technical effects of the embodiments of the present application, the present application will be described in detail by the following examples and comparative examples.

[0096] In the following examples and comparative examples, all raw materials can be purchased in commercial form, and in order to maintain the reliability of the experiments, the raw materials used in the following examples and comparative examples all have the same physical and chemical parameters or are prepared by the same treatment method.

[0097] Example 1

[0098] The glass fusion method in Example 1 is as follows:

[0099] Step 1), the components of the glass powder are placed in different crucibles according to the formula ratio, and then a plurality of components are coated at the same time in the same chamber by using a plurality of electron guns, the thickness of the coating layer is 500 nm, and the ratio of different components is realized by controlling the coating conditions.

[0100] Specifically, the main components of the glass powder are: 52% by mass of sodium borate, 22% by mass of silicon dioxide, 24% by mass of zinc oxide, and 2% by mass of aluminum oxide; the vacuum coating conditions are as follows: the vacuum degree at the beginning of coating is 1.0E-5 torr, and the temperature in the vacuum chamber is 50°C. The coating conditions of sodium borate are: the evaporation rate is 0.2 nm / s, and the evaporation current is 55 mA; the coating conditions of silicon dioxide are: the evaporation rate is 0.09 nm / s, and the evaporation current is 80 mA; the coating conditions of zinc oxide are: the evaporation rate is 0.04 nm / s, and the evaporation current is 85 mA; the coating conditions of aluminum oxide are: the evaporation rate is 0.005 nm / s, and the evaporation current is 100 mA.

[0101] The two tempered glasses coated with glass powder are put into a hot bending machine for hot fusion, the fusion mold material is graphite, the hot fusion temperature is 450℃, the time is 5min, and the fusion pressure is 0.05Mpa.

[0102] Example 2

[0103] The glass fusion method in Example 2 is as follows:

[0104] Step 1), the components of the glass powder are respectively placed in different crucibles according to the formula ratio, then a plurality of components are coated at the same time in the same chamber by using multiple electron guns, the thickness of the coating layer is 1μm, and the ratio of different components is realized by controlling the coating conditions.

[0105] Specifically, the main components of the glass powder are: 48% of sodium borate by mass fraction, 25% of silicon dioxide by mass fraction, 26% of zinc oxide by mass fraction and 1% of aluminum oxide by mass fraction; the vacuum coating conditions are as follows: the vacuum degree at the beginning of coating is 6.0E-5torr, and the temperature is 70℃. Among them, the coating conditions of sodium borate are: the evaporation rate is 0.35nm / s, and the evaporation current is 70mA; the coating conditions of silicon dioxide are: the evaporation rate is 0.2nm / s, and the evaporation current is 100mA; the coating conditions of zinc oxide are: the evaporation rate is 0.08nm / s, and the evaporation current is 105mA; the coating conditions of aluminum oxide are: the evaporation rate is 0.005nm / s, and the evaporation current is 100mA.

[0106] The two tempered glasses coated with glass powder are put into a hot bending machine for hot fusion, the fusion mold material is graphite, the hot fusion temperature is 500℃, the time is 10min, and the fusion pressure is 0.1Mpa.

[0107] Example 3

[0108] Step 1), the components of the glass powder are respectively placed in different crucibles according to the formula ratio, then a plurality of components are coated at the same time in the same chamber by using multiple electron guns, the thickness of the coating layer is 2μm, and the ratio of different components is realized by controlling the coating conditions.

[0109] Specifically, the main components of the glass powder are: 60% by mass of sodium borate, 18% by mass of silicon dioxide, 19% by mass of zinc oxide and 3% by mass of aluminum oxide; the vacuum coating conditions are as follows: the vacuum degree at the beginning of coating is 5.0E-5 torr, and the temperature is 100°C. The coating conditions of sodium borate are: the evaporation rate is 0.5 nm / s, and the evaporation current is 85 mA; the coating conditions of silicon dioxide are: the evaporation rate is 0.16 nm / s, and the evaporation current is 90 mA; the coating conditions of zinc oxide are: the evaporation rate is 0.07 nm / s, and the evaporation current is 100 mA; the coating conditions of aluminum oxide are: the evaporation rate is 0.02 nm / s, and the evaporation current is 130 mA.

[0110] The two glass powders coated with glass powders are placed in a hot bending machine for hot fusion, the fusion mold material is graphite, the hot fusion temperature is 400°C, the time is 8 min, and the fusion pressure is 0.08 Mpa.

[0111] Comparative Example 1

[0112] Comparative Example 1 does not add glass fusion material, and the fusion temperature is relatively high.

[0113] Comparative Example 2

[0114] Comparative Example 2 is a glass fusion material that is pre-mixed and then coated using an electron gun. The glass fusion material that is coated is completely different from the pre-set ratio, resulting in a deterioration of the fusion layer after boiling.

[0115] Test Example

[0116] Under the same test conditions, the light transmittance and strength of the glass fusion pieces prepared in Examples 1-3 and Comparative Examples 1-2 are tested, and the specific test results are shown in Table 1.

[0117] Table 1

[0118]

[0119] As shown in Table 1, by controlling the current and rate of each component during evaporation according to the formula ratio of the glass powder, the composition and characteristics of the glass powder itself can be effectively preserved, thereby maintaining the bonding effect of the glass powder itself. Moreover, this method can maintain a small thickness of the fusion layer, a high glass transmittance, and a high surface compressive stress of the tempered glass. Comparative Example 1 does not use glass fusion material, and the fusion temperature is high, resulting in a decrease in the surface compressive stress of the tempered glass. Comparative Example 2 also uses evaporation to coat the glass powder, but the ratio of each component of the glass powder in Comparative Example 2 cannot be effectively controlled, resulting in a failure to maintain the inherent bonding properties of the glass powder and poor fusion effect.

[0120] Any combination of the technical features in the above-described embodiments can be made, and for the sake of brevity, not all possible combinations are described, however, it is to be understood that the application embraces all such possible combinations.

[0121] The above-described embodiments only express several implementation manners of the present application, and the description is relatively specific and detailed, but it should not be understood as a limitation on the patent scope of the application. It should be pointed out that for ordinary skilled persons in the art, some modifications and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the patent protection scope of the present application should be subject to the appended claims.

Claims

1. A method for welding components using glass welding material, characterized in that, The glass welding material comprises multiple inorganic components, which are arranged in a preset proportion to form the glass welding material; the welding component is tempered glass; the method includes: Multiple inorganic components are deposited on the surface of the welded component by vapor deposition to form a welded layer; wherein, the multiple inorganic components are each used as an independent vapor deposition source for independent vapor deposition, and the vapor deposition conditions of each are determined independently, so that the multiple inorganic components are deposited on the surface of the welded component in the preset proportion within the same time period, and the surface roughness of the welded layer is less than 10 nm. The fusion components are stacked in contact with each other through fusion layers and then thermally fused by heating, wherein the thermal fusion temperature is 400℃~500℃. The inorganic components include sodium borate, silicon dioxide, zinc oxide, and aluminum oxide, wherein the mass percentage of sodium borate is 48% to 60%, the mass percentage of silicon dioxide is 18% to 25%, the mass percentage of zinc oxide is 19% to 26%, and the mass percentage of aluminum oxide is 1% to 3%.

2. The method according to claim 1, characterized in that, Multiple inorganic components are vapor-deposited onto the surface of the welded component using electron beam heating.

3. The method according to claim 2, characterized in that, The evaporation power varies depending on the different inorganic components. And / or, The current and / or rate of the vapor deposition are different for different inorganic components.

4. The method according to claim 3, characterized in that, The sodium borate is deposited using a current of 55mA to 85mA and a deposition rate of 0.2nm / s to 0.5nm / s. The silicon dioxide deposition current is 80mA~100mA, and the deposition rate is 0.09nm / s~0.2nm / s; The zinc oxide is deposited using a vapor deposition current of 85 mA to 105 mA and a deposition rate of 0.04 nm / s to 0.08 nm / s. The vapor deposition current of the alumina is 100mA~130mA, and the deposition rate is 0.005nm / s~0.02nm / s.

5. The method according to any one of claims 2 to 4, characterized in that, The vacuum degree of the vapor deposition is 1.0E-5 Torr to 6.0E-5 Torr, the temperature inside the vacuum chamber is 50℃ to 100℃, and the vapor deposition time is 20min to 60min.

6. The method according to any one of claims 1 to 4, characterized in that, The heat fusion time is 5 min to 10 min.

7. The method according to claim 6, characterized in that, The heat fusion is performed under pressure, and the pressure is 0.05 MPa to 0.1 MPa.

8. The method according to any one of claims 1 to 4, characterized in that, After welding, the thickness of the welded layer is 1μm~4μm.

9. An article prepared by the method according to any one of claims 1 to 8.

10. The article of claim 9, characterized in that, The welding component includes: a first component and a second component.

11. The article of claim 10, characterized in that, Both the first component and the second component are transparent plates.

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