Glass cover plate and preparation method thereof, electronic device

Abstract

The application relates to the technical field of electronic equipment, in particular to a glass cover plate and a preparation method thereof and an electronic device, the glass cover plate comprises a glass substrate and an optical film layer, the refractive index of the optical film layer is 1.46-1.62; the optical film layer comprises atomically mixed first material and second material, the mass ratio of the two is (1-8):1, and the refractive index of the first material is >1.6, and the refractive index of the second material is <1.52. The glass cover plate is formed by atomically mixing the first material with a refractive index higher than that of the glass substrate and the second material with a refractive index lower than that of the glass substrate to form the optical film layer, the refractive index of the optical film layer is similar to that of the glass substrate, the optical transmittance and the light reflectance of the glass substrate are not affected, and the refractive index of the optical film layer does not change with the thickness change; when the optical film layer is formed on the glass substrate with an arc edge, the glass substrate does not have color difference in appearance due to the thickness change of the film layer; meanwhile, the appearance of the glass cover plate is not changed when the film layer falls off.

Description

[Technical Field]

[0001] This application relates to the field of electronic equipment technology, and in particular to a glass cover plate and its preparation method, and electronic equipment. [Background Technology]

[0002] The outermost layer of the glass display screen of electronic devices is usually a glass cover. If a protective film is not applied to the glass cover during use, scratches and other appearance defects will appear after a long period of use. These defects will disrupt the stress balance of the glass cover, resulting in a decrease in the impact resistance of the glass cover.

[0003] In existing technologies, sputtering is commonly used to deposit a high-hardness optical film layer on the outer surface of a glass substrate to improve the scratch resistance of the glass cover. During the sputtering process, the deposition rate is maximized and a uniformly thick optical film layer can be obtained when the normal of the coating surface of the glass cover is parallel to the incident direction of the coating particles. However, when sputtering on a 3D glass substrate with curved edges, the normal of the curved surface forms a certain angle α with the incident direction of the coating particles. The thickness of the optical film layer will vary with α by cosα, making it impossible to ensure that the color of the flat surface and the curved surface on the 3D glass substrate are consistent. [Summary of the Invention]

[0004] The purpose of this invention is to provide a glass cover plate and its preparation method. A first material with a refractive index higher than that of the glass substrate and a second material with a refractive index lower than that of the glass substrate are used. The first and second materials are mixed at the atomic level to form an optical film layer. The resulting optical film layer has a refractive index similar to that of the glass substrate, has no effect on the light transmittance and reflectivity of the glass substrate, and the refractive index of the optical film layer does not change with the thickness of the optical film layer. When the optical film layer is formed on a glass substrate with curved edges, there will be no color difference in the appearance of the glass substrate due to changes in the thickness of the optical film layer. Furthermore, the appearance of the glass cover plate will not change when the optical film layer peels off. To achieve the above objectives, this application adopts the following technical solution:

[0005] In a first aspect, this application provides a glass cover plate, the glass cover plate comprising a glass substrate and an optical film layer located on the surface of the glass substrate, the refractive index of the optical film layer being 1.46 to 1.62; the optical film layer comprising an atomically mixed first material and a second material, the mass ratio of the first material to the second material being (1 to 8):1, and the refractive index of the first material being >1.6 and the refractive index of the second material being <1.52.

[0006] An optical film is formed on the outer surface of a glass substrate to prevent scratches or breakage during use that could affect the aesthetics of the glass substrate. The aforementioned solution uses a first material with a refractive index greater than that of the glass substrate and a second material with a refractive index less than that of the glass substrate, formed by atomic-level mixing. The resulting optical film has a refractive index similar to that of the glass substrate, meaning that variations in the film's thickness do not affect its refractive index. This ensures that when the optical film is formed on glass substrates with curved edges, such as 2.5D or 3D glass substrates, the difference in thickness between the bent portion and the substrate during the coating process will not cause color differences in the glass cover. The optical film of this application, while providing scratch resistance, also improves the aesthetics of electronic devices using this glass cover.

[0007] In one feasible implementation, the first material includes at least one of Si3N4, Al2O3, AlN, ZrO2, Nb2O5, Ta2O5, TiO2, etc.

[0008] In the above scheme, the first material is a material with a refractive index greater than that of the glass substrate. The refractive index of the first material or the glass substrate refers to the ratio of the speed of light in a vacuum to the speed of light in the first material or the glass substrate. The higher the refractive index of the first material or the glass substrate, the stronger the ability of incident light to refract. Therefore, by mixing a first material with a high refractive index with a second material with a low refractive index, an optical film layer with a refractive index similar to that of the glass substrate can be obtained.

[0009] In one feasible implementation, the Vickers hardness of the first material is ≥1000HV.

[0010] When setting an optical film layer on the outside of a glass substrate, in addition to considering the refractive index of the optical film layer, it is also necessary to have a certain degree of hardness. If the hardness of the optical film layer is low, the film layer is easily scratched during the use of electronic devices, thereby reducing the service life of the optical film layer. Therefore, the above solution uses a high-hardness first material to prepare the optical film layer. The resulting optical film layer has high hardness, is not prone to scratches and other defects during use, and has a long service life.

[0011] In one feasible implementation, the second material includes at least one of SiO2, MgF2, LaF3, AlF3, etc.

[0012] In the above scheme, the second material is a material with a refractive index lower than that of the glass substrate. The refractive index of the second material or the glass substrate refers to the ratio of the speed of light in a vacuum to the speed of light in the second material or the glass substrate. The lower the refractive index of the second material or the glass substrate, the weaker the ability of incident light to refract. Therefore, by mixing a first material with a high refractive index with a second material with a low refractive index, an optical film layer with a refractive index similar to that of the glass substrate can be obtained.

[0013] In one feasible implementation, the thickness of the optical film is 500 nm to 5000 nm.

[0014] In the above scheme, the refractive index of the optical film does not change with the thickness; that is, regardless of the thickness of the optical film, the refractive index is close to that of the glass substrate. However, the thickness of the optical film still needs to be controlled during the coating process. If the thickness of the optical film is too high, the hardness is high, the scratch resistance is strong, and the production cost is increased; if the thickness of the optical film is too thin, the scratch resistance decreases and the service life is short. The thickness of the optical film within the above range has the characteristics of both high hardness and good aesthetics.

[0015] In one feasible implementation, a Mohs hardness tester is used, and the Mohs hardness of the optical film is ≥7 under a test force of 500g.

[0016] In the above scheme, Mohs hardness refers to the depth of the scratch obtained by scratching the surface of the tested optical film layer with a pyramidal diamond needle using a scratching method. This application uses a high-hardness first material to prepare the optical film layer, ensuring that the Mohs hardness of the optical film layer is within the above-mentioned range, thus giving the optical film layer better scratch resistance.

[0017] In one feasible implementation, the Vickers hardness of the optical film is ≥1000HV under a load of 18mN.

[0018] In the above scheme, Vickers hardness refers to the process of pressing a diamond pyramid indenter with an included angle of 136 degrees between its opposite faces into the surface of the optical film under a specified load F, holding it for a certain time, removing the load, measuring the diagonal length d of the indentation, calculating the surface area of ​​the indentation, and finally determining the average pressure on the surface area of ​​the indentation, which is the Vickers hardness value of the material. This application uses a high-hardness first material to prepare the optical film, ensuring that the Vickers hardness of the optical film is within the above-mentioned range, thus giving the optical film better compressive strength.

[0019] In one feasible implementation, the coefficient of friction of the optical film is 0.01 to 0.06.

[0020] The optical film layer is located on the side of the glass substrate away from other components of the electronic device. During use, the outer surface of the optical film layer comes into contact with the user's fingers. If the coefficient of friction of the optical film layer is too high, it can reduce the user's experience when frequently operating the electronic device; if the coefficient of friction is too low, the electronic device is more likely to receive erroneous operation commands from the user. The above solution controls the coefficient of friction of the optical film layer within this range, making the optical film layer both smooth and enabling the electronic device to receive correct commands.

[0021] In one feasible implementation, the optical film has a transmittance of >90% for visible light with wavelengths in the range of 380 nm to 780 nm.

[0022] In the above scheme, transmittance refers to the percentage of light passing through. The higher the transmittance, the clearer the display through the glass cover. The glass cover is installed on the electronic device, and the optical film layer is located on the side of the glass cover away from other components of the electronic device. When the display screen generates an image, the light carrying the image passes through the glass cover and is received by the user. If the transmittance of the optical film layer is too low, it will reduce the brightness of the electronic device and decrease the user's experience. When the transmittance of the optical film layer is within the above range, the displayed image observed by the user through the glass cover is clear.

[0023] In one feasible implementation, the optical film has a reflectivity of <6% for visible light with wavelengths in the range of 380 nm to 780 nm.

[0024] The reflectivity of an optical film refers to the degree to which it reflects light. The lower the reflectivity, the less light is reflected, resulting in a display screen that provides a paper-like viewing experience, improving the user's comfort. However, if the reflectivity is too high, it can negatively impact viewing in bright light. The optical film used in the above solution has a reflectivity within this range, ensuring a good viewing or reading experience for the user.

[0025] In one possible implementation, the glass cover further includes a protective layer disposed on the side of the optical film layer away from the glass substrate.

[0026] In the above solution, the side of the optical film away from the glass substrate is the user's touch surface. During user operation, fingerprints or dirt can easily be left on the optical film, affecting its light transmittance and aesthetics. Therefore, setting a protective layer on the side of the optical film away from the glass substrate not only improves the user experience but also further extends the lifespan of the optical film.

[0027] In one feasible implementation, the glass substrate includes one of a 2D glass substrate, a 2.5D glass substrate, and a 3D glass substrate.

[0028] In the above scheme, 2D glass cover is a flat glass cover; 2.5D glass cover is based on the fact that the entire glass is on the same plane, and a more obvious arc transition is formed around the glass cover through CNC machine tool processing technology; 3D glass refers to the glass edge being formed into a 3D curved surface by hot bending mold, thus presenting a rounded feeling in terms of visual and experiential aspects. 3D front cover includes single-curved 3D front cover, micro-double-curved 3D front cover and double-curved 3D front cover; single-curved 3D glass cover only has the left and right sides hot-bent into curved shape; double-curved 3D glass cover has all four sides hot-bent into curved shape; micro-double-curved 3D glass cover is based on double-curved 3D glass cover, which reduces the angle and depth of the top and bottom sides to form a micro-curved light and shadow effect on the top and bottom sides. The refractive index of the optical film used in this application is similar to that of the glass substrate. Therefore, the glass substrate will not have color differences due to changes in the thickness of the optical film. This ensures that the optical film will not change color when it is formed on 2D, 2.5D, or 3D glass substrates, thus guaranteeing the aesthetics of electronic devices using this glass cover.

[0029] In one feasible embodiment, the glass substrate is a 3D glass substrate, which includes a base portion, a side portion, and a bent portion connecting the base portion and the side portion;

[0030] The optical film is formed on the surfaces of the substrate, the bent portion, and the side portion, and the thickness of the optical film on the surface of the bent portion is different from the thickness of the optical film on the surface of the substrate.

[0031] In the above solution, using a 3D glass substrate as the base for the glass cover allows the electronic device to have a good appearance and avoids blocking the phone's signal. Furthermore, by using an optical film layer on the 3D glass substrate whose refractive index does not change with thickness, although the refractive index varies in thickness in the substrate, sides, and bending parts, it is similar to the refractive index of glass, thus avoiding any color difference in appearance.

[0032] In one feasible implementation, in the (L*,a*,b*) chromaticity system, the a* value of the reflected light that the optical film can reflect is -2 to 2, and the b* value is -2 to 2; and / or, the a* value of the transmitted light that the optical film can transmit is -2 to 2, and the b* value is -2 to 2.

[0033] In the above scheme, L* represents brightness, ranging from 0 to 1, indicating a color from dark (black) to light (white); a* represents red-green, with values ​​changing from positive to negative, indicating a color from red (positive) to green (negative), where a larger a value indicates a redder color and a smaller a value indicates a greener color; b* represents yellow-blue, with values ​​changing from positive to negative, indicating a color from yellow (positive) to blue (negative), where a larger b value indicates a yellower color and a smaller b value indicates a bluer color. The optical film layer provided by this scheme has a* and b* values ​​for transmitted and reflected light within this range, ensuring that the glass cover of electronic devices will not exhibit a rainbow effect.

[0034] A second aspect of this application provides a method for preparing a glass cover plate, the method comprising:

[0035] Pretreatment process for glass substrates;

[0036] An alloy target is sputtered onto a glass substrate in a vacuum environment, thereby forming a composite film on the surface of the glass substrate; wherein the alloy target contains atoms of two or more elements.

[0037] A gas is introduced into the composite film layer, and the gaseous atoms or gaseous ions formed by the gas excitation react with the composite film layer to obtain a glass cover plate with an optical film layer formed on its surface; wherein the refractive index of the optical film layer is 1.46 to 1.62.

[0038] A third aspect of this application provides an electronic device comprising a glass cover plate prepared by any of the methods described in the first aspect or the second aspect of the glass cover plate. [Attached Image Description]

[0039] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0040] Figure 1 This is a schematic diagram of the structure of a mobile phone provided in an embodiment of this application;

[0041] Figure 2 This is an exploded view of a mobile phone provided in an embodiment of this application;

[0042] Figure 3a , Figure 3b , Figure 3c , Figure 3d These are cross-sectional schematic diagrams of the 2D back cover, 2.5D back cover, 3D back cover, and 5D back cover of the mobile phone provided in the embodiments of this application.

[0043] Figure 4 This is an exploded view of another mobile phone provided in an embodiment of this application;

[0044] Figure 5a , Figure 5b , Figure 5c These are cross-sectional schematic diagrams of the 2D glass substrate, 2.5D glass substrate, and 3D glass substrate of the mobile phone provided in the embodiments of this application;

[0045] Figure 6 A flowchart illustrating the fabrication process of the glass cover plate provided in this embodiment.

[0046] Attached image labels:

[0047] 100-Mobile Phone;

[0048] 110 - Housing; 111 - Frame; 112 - Back cover; 1121 - Textured film; 113 - Motherboard; 114 - Battery; 115 - First middle frame; 116 - First groove; 117 - Second groove; 118 - Second middle frame;

[0049] 120 - Glass cover plate; 121 - Glass substrate; 121a - Base part; 121b - Side part; 121c - Bending part.

Detailed Implementation Methods

[0050] In the description of embodiments of the present invention, it should be understood that the terms "length," "thickness," "upper," "lower," "front," "rear," "left," "right," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing embodiments of the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on the embodiments of the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more features. In the description of embodiments of the present invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0051] In the description of the embodiments of the present invention, it should be noted that, unless otherwise explicitly specified and limited, the term "connection" should be interpreted broadly. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a connection that allows communication between the components; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components or an interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of the present invention according to the specific circumstances.

[0052] This application provides a glass cover plate, which can be applied to the front cover plate, rear cover plate, or other components of electronic devices that require improved scratch resistance, such as camera covers. It should be noted that the electronic devices to which the glass cover plate can be applied include, but are not limited to, mobile phones, tablets, wearable devices, in-vehicle devices, augmented reality (AR) / virtual reality (VR) devices, laptops, ultra-mobile personal computers (UMPCs), netbooks, personal digital assistants (PDAs), and other mobile terminals. Alternatively, it can also be professional shooting equipment such as digital cameras, SLR cameras / mirrorless cameras, action cameras, gimbal cameras, and drones. This application does not limit the specific type of electronic device; selection can be made according to actual needs. The electronic device provided by this invention takes a mobile phone 100 as an example. Figure 1 This is a schematic diagram of the structure of a mobile phone provided in an embodiment of this application, such as... Figure 1 As shown, the outer casing assembly of the mobile phone 100 includes a housing 110 and a glass cover 120, with the glass cover 120 mounted on the housing 110.

[0053] Specifically, the housing 110 includes a frame 111 and a back cover 112. The back cover 112 and the glass cover 120 are located on both sides of the frame 111, that is, the glass cover 120 and the back cover 112 are spaced apart. The frame 111 surrounds the outer periphery of the glass cover 120 and the outer periphery of the back cover 112, so that a receiving cavity is formed between the glass cover 120, the frame 111, and the back cover 112. The receiving cavity is used to house electronic components, such as a display screen, a motherboard 113, a battery 114, a processor, an external memory interface, an internal memory, a universal serial bus (USB) interface, a charging management module, a power management module, an antenna, a mobile communication module, a wireless communication module, an audio module, a speaker, a receiver, a microphone, a headphone jack, a sensor module, buttons, a motor, an indicator, a camera, etc. During disassembly and assembly, if the housing 110 is separated from the glass cover 120, the electronic components located in the receiving cavity can be observed.

[0054] In this application, the frame 111 and the back cover 112 are two parts of the housing 110, which are integrally formed or detachably connected.

[0055] Firstly, as an optional technical solution in this application, the frame 111 and the back cover 112 can be two detachable components. By assembling the frame 111 and the back cover 112 together, the casing 110 of the mobile phone 100 can be formed. Specifically, Figure 2 This is an exploded view of a mobile phone provided in an embodiment of this application, such as... Figure 2 As shown, the mobile phone 100 includes a glass cover 120, a back cover 112, and a first mid-frame 115. The outer periphery of the first mid-frame 115 (hereinafter referred to as the outer periphery of the first mid-frame) can serve as the frame 111 of the electronic device. That is, the outer periphery of the first mid-frame surrounds the outer periphery of the glass cover 120 and surrounds the outer periphery of the back cover 112. The back cover 112 and the glass cover 120 are located on both sides of the first mid-frame 115, respectively. It can be seen that the back cover 112 and the first mid-frame 115 can be two different parts. By assembling the back cover 112 and the first mid-frame 115 together, the housing 110 of the mobile phone 100 can be formed. The assembly method can be welding, or sliding snap-fit, or connection through the cooperation of positioning pins and positioning holes, etc. Other connection methods are also possible. The connection method of the two can be selected according to actual needs, and is not limited here.

[0056] Furthermore, the first middle frame 115 used in the hands-on solution can be set as a composite structure including a metal frame and a plastic frame. Specifically, the plastic frame can be continuously set along the outer periphery of the metal frame, that is, the entire outer periphery of the metal frame is set with a plastic frame. This setting is simple in structure and low in cost. Alternatively, the outer periphery of the metal frame can also be set with a plastic frame. Alternatively, the plastic frame and the metal frame can be set circumferentially, that is, the first middle frame 115 is mainly a metal frame, but a plastic frame is set at the signal break point. This setting can further improve the overall texture of the mobile phone 100 and improve the user experience.

[0057] Compared to using an all-plastic or all-metal material for the first mid-frame 115, the metal frame in the composite structure can reduce the thickness while maintaining overall structural strength, thus reducing the overall thickness of the phone 100. This is beneficial for meeting user needs and improving user experience. The plastic frame in the composite structure can prevent the all-metal frame from interfering with the signal transmission or reception of the phone 100. In practical applications, the metal frame is not a flat plate structure. Its specific structure can be set according to the arrangement of various electronic components in the housing cavity of the phone 100. For example, the metal frame includes multiple grooves for accommodating the battery 114 and the motherboard 113, such as the first groove 116 and the second groove 117. The battery 114 can be placed in the first groove 116, and the motherboard 113 can be placed in the second groove 117. The battery 114 and the motherboard 113 are electrically connected, so that the battery 114 can supply power to the motherboard 113. In addition to the first middle frame 115 of the composite structure of the metal frame and the plastic frame mentioned above, the first middle frame 115 can also be made of other materials, such as glass or ceramic. The material of the first middle frame 115 can be selected according to actual needs, and there is no limitation here.

[0058] Furthermore, Figure 3a , Figure 3b , Figure 3c , Figure 3d These are cross-sectional schematic diagrams of the 2D, 2.5D, 3D, and 5D back covers of the mobile phone provided in the embodiments of this application, as shown below. Figure 3a , Figure 3b , Figure 3c and Figure 3dAs shown, the back cover 112 used in the above solution can be a flat plate structure, i.e., a 2D structure. In this case, the first middle frame 115 is also a flat rectangular structure, and the edge of the back cover 112 covers the edge of the first middle frame 115. Alternatively, the back cover 112 can also be a 2.5D back cover. A 2.5D back cover refers to a back cover 112 with an edge that curves downwards. Since a 2.5D back cover has no protruding corners, it is not easily impacted by other objects, thereby reducing the probability of the housing 110 being damaged by impact, and also making the appearance of the housing 110 more visually appealing. The back cover 112 can also be a 3D back cover, which can also be called a stereoscopic plate, and its surface has a three-dimensional shape. The back cover 112 can also be a 5D back cover, i.e., the cover plate is a 5D cover plate. A 5D cover plate can adapt to protruding structures such as cameras, and of course, it can also be other protruding or recessed structures. The shape of the back cover 112 can be selected according to actual needs, and is not limited here.

[0059] The back cover 112 can be made of metal, glass, plastic, ceramic, or other composite materials. The material can be selected according to actual needs and is not limited here. Preferably, the back cover 112 used in this application is made of glass fiber composite material. Using glass fiber composite material to make the back cover 112 allows it to have both good mechanical strength and a thin profile. Specifically, the glass fiber composite material includes glass fiber woven fabric and organic resin covering the glass fiber woven fabric. Glass fiber is an inorganic non-metallic material with advantages such as good insulation, strong heat resistance, good corrosion resistance, and high mechanical strength. By coating a glass fiber substrate with organic resin to form a glass fiber composite material, the resulting back cover 112 can have advantages such as flame retardancy, impact resistance, corrosion resistance, high mechanical strength, and thinness.

[0060] Meanwhile, to improve the tactile feel and physical properties of the back cover 112 and enhance the user experience, a textured film 1121 can be provided on the outer surface of the back cover 112. The outer surface refers to the surface that directly contacts the user's fingers when touching the phone 100. The outer surface of the back cover 112, made of the aforementioned glass fiber composite material, is rough, thereby improving the bonding strength between the textured film 1121 and the back cover 112. Understandably, the cross-section of the rough surface of the back cover 112 can be a concave-convex structure, an arc-shaped wavy cross-section, or other cross-sectional structures, as long as the outer surface has a certain degree of roughness. The textured film 1121 has a textured pattern and color, allowing the user to observe and touch the color and textured pattern of the textured film 1121 on the outer surface of the cover. In some embodiments, the textured pattern can be frosted, dotted, diagonal, snowflake, or other textured effects, which are not limited here. Multiple textured films 1121 can be stacked on the outer surface of the back cover 112. The textured microstructure can be U-shaped, pyramidal, arc-shaped, or grooved, etc., and is not limited here. This textured film 1121 improves the visual aesthetics of the back cover 112, and also makes the back cover 112 drop-resistant, wear-resistant, and thinner. The combination of glass fiber composite material and textured film 1121 forms the cover of the electronic device; different combinations can give the back cover 112 different textures and a more dynamic and vibrant appearance.

[0061] Secondly, as another optional technical solution of this application, unlike the first aspect, the back cover 112 and the frame 111 of this solution are two integrally formed structural parts, that is, the connection between the back cover 112 and the frame 111 cannot be separated. Specifically, Figure 4 This is an exploded view of another mobile phone provided in an embodiment of this application, such as... Figure 4 As shown, the mobile phone 100 includes a glass cover 120, a housing 110, and a second mid-frame 118. The housing 110 includes a frame 111 and a back cover 112, which are two parts of the housing 110. The frame 111 and the back cover 112 are integrally connected, and the connection between the frame 111 and the back cover 112 is generally inseparable. The second mid-frame 118 is housed in a cavity between the glass cover 120, the frame 111, and the back cover 112. Therefore, during use, the edge of the glass cover 120 is directly connected to the edge of the frame 111 of the housing 110, and the mid-frame, used to position electronic components such as the motherboard 113 or battery 114, is located between the glass cover 120 and the back cover 112 of the housing 110. Except as specifically described above, the structure and material of the second mid-frame 118, or the material and texture film 1121 of the back cover 112, can be the same as in the first aspect, and will not be repeated here.

[0062] In some implementations, the glass cover 120 is disposed on the housing of the electronic device to protect the screen assembly. However, if a protective film is not applied to the glass cover 120 during use, scratches and other cosmetic defects may appear after prolonged use. These defects will disrupt the stress balance of the glass cover 120, leading to a decrease in its impact resistance.

[0063] In existing technologies, a high-hardness optical film layer is deposited on the outer surface of the glass substrate 121 to improve the scratch resistance of the glass cover 120. For example, a protective film formed by alternately stacking high-hardness, high- and low-refractive-index materials on the surface of the glass substrate 121 can obtain a glass cover 120 with strong scratch resistance. However, this solution cannot be used on 3D glass substrates, especially glass substrates 121 with a 3D bending angle greater than 60°. It is only suitable for use on 2D and 2.5D glass substrates. This is because during the sputtering process on 3D glass substrates, the deposition rate is the highest when the normal of the coating surface of the glass substrate 121 is parallel to the incident direction of the coating particles, and a uniform optical film layer can be obtained. However, when sputtering is performed on the edge, the normal of the curved surface forms a certain angle α with the incident direction of the coating particles. The thickness of the resulting optical film layer will vary with α by cosα, making it impossible to ensure that the color of the flat surface and the curved surface on the 3D glass substrate remains consistent. Meanwhile, this process has high requirements for the cleanliness of the production environment and the glass substrate 121, resulting in a low production yield. It is only suitable for use on small-sized covers such as mobile phone camera covers and watch covers, and the yield is low on large-area glass covers 120 such as mobile phones and tablets.

[0064] Alternatively, diamond-like carbon (DLC) coating technology can be used to deposit a DLC film with a Mohs hardness close to 10 on the surface of the glass substrate 121 through magnetic filtration or CVD technology, thereby obtaining an optical film layer with super scratch resistance. However, DLC films have a certain absorption of visible light, which limits the thickness of the optical film layer to below 50nm. In actual use, the optical film layer is easily punctured by harmful particles, and the improvement in scratch resistance of the glass substrate 121 after coating is not significant.

[0065] In view of this, this application provides a glass cover plate 120, which includes a glass substrate 121 and an optical film layer located on the surface of the glass substrate 121. The refractive index of the optical film layer is 1.46 to 1.62. The optical film layer includes an atomically mixed first material and a second material, with a mass ratio of the first material to the second material of (1 to 8):1. The refractive index of the first material is >1.6 and the refractive index of the second material is <1.52.

[0066] In the above scheme, the glass cover 120 uses a first material with a refractive index higher than that of the glass substrate 121 and a second material with a refractive index lower than that of the glass substrate 121. The first material and the second material are mixed at the atomic level to form an optical film layer. The refractive index of the resulting optical film layer is similar to that of the glass substrate 121, and it has no effect on the light transmittance and reflectivity of the glass substrate 121. Moreover, the refractive index of the optical film layer does not change with the thickness of the optical film layer. When the optical film layer is formed on the glass substrate 121 with curved edges, the glass substrate 121 will not have a color difference in appearance due to the change in the thickness of the optical film layer. At the same time, the appearance of the glass cover 120 will not change when the optical film layer falls off.

[0067] In some implementations... Figure 5a , Figure 5b , Figure 5c These are cross-sectional schematic diagrams of the 2D glass substrate, 2.5D glass substrate, and 3D glass substrate of the mobile phone provided in the embodiments of this application, as shown below. Figure 5a , Figure 5b and Figure 5c As shown, the glass substrate 121 used in this application includes one of three types: 2D glass substrate, 2.5D glass substrate, and 3D glass substrate. Specifically, a 2D glass substrate refers to a flat, plate-like structure. A 2.5D glass substrate refers to a glass substrate where the entire piece of glass is on the same plane, but a more pronounced curved transition is formed around the glass using CNC machining technology. A 3D glass substrate refers to a glass substrate where the edges are formed into a 3D curved surface using a hot bending mold, thus presenting a rounded feel in terms of visual appeal and user experience. 3D glass substrates include single-curved 3D glass substrates, micro-hyper-curved 3D glass substrates, and hyper-curved 3D glass substrates. A single-curved 3D glass substrate only has its left and right sides hot-bent into a curved shape, a hyper-curved 3D glass substrate has all four sides hot-bent into a curved shape, and a micro-hyper-curved 3D glass substrate is based on a hyper-curved 3D glass substrate but with reduced angles and depths on the top and bottom sides, creating a micro-curved light and shadow effect on the top and bottom sides. The structure of the glass substrate 121 can be selected according to actual needs and is not limited here.

[0068] It should be noted that the shape of the optical film layer in this application varies with the shape of the glass substrate 121, therefore the shape of the optical film layer is not limited.

[0069] Preferably, the glass substrate 121 used in this application is a 3D glass substrate. Using a 3D glass substrate as the base of the glass cover 120 can give the electronic device a good appearance and avoid shielding the mobile phone signal.

[0070] In some embodiments, the 3D glass substrate includes a base portion 121a, a side portion 121b, and a bent portion 121c connecting the base portion 121a and the side portion 121b. The side portion 121b and the bent portion 121c allow the glass cover 120 to have a certain curvature when viewed from the front. Compared with a flat display structure, the 3D glass cover 120 is more in line with the structure of the human eye. Electronic devices using the glass cover 120 have a wider viewing angle, which can improve the comfort of using electronic devices.

[0071] Furthermore, the optical film layer is formed on the outer surfaces of the substrate 121a, the bent portion 121c, and the side portion 121b, which can improve the scratch resistance of the 3D glass substrate. However, during the formation of the optical film layer on the glass substrate 121, the thickness of the optical film layer on the surface of the bent portion 121c during sputtering is different from the thickness of the optical film layer on the surface of the substrate 121a. Therefore, the material of the optical film layer in this application includes an atomically mixed first material and a second material, wherein the refractive index of the first material is >1.6 and the refractive index of the second material is <1.52. The first material includes at least one of Si3N4, Al2O3, AlN, ZrO2, Nb2O5, T2O5, TiO2, etc., and the second material includes at least one of SiO2, MgF2, LaF3, AlF3, etc. An optical film layer with a refractive index similar to that of the glass substrate 121 is formed by using one or more of the above-mentioned first material with a refractive index higher than that of the glass substrate 121 and a second material with a refractive index lower than that of the glass substrate 121.

[0072] Specifically, if the refractive index of air is n0, the refractive index of the optical film is n1, and the refractive index of the glass substrate 121 is n3, and the refractive index n3 of the glass substrate 121 used in this application is 1.52, the reflectance R of the optical film should be less than or equal to 5.3%, and the transmittance should be ≥90.5%, according to the reflectance calculation formula:

[0073]

[0074] The required refractive index n1 of the optical film is approximately 1.56.

[0075] When the first material and the second material are mixed, according to the Lorentz-Lorentz dispersion theory formula for the refractive index of multi-material mixtures and the composition ratio, the refractive index n after the mixture of the first material and the second material is:

[0076]

[0077] Among them, a i =(n i +2) -1 , ρ i Let c be the density of the first material and the density of the second material. iThe percentage concentrations of the first material and the second material.

[0078] For example, in the preparation of Al2O3-SiO2 mixed films or Si3N4-SiO2 mixed films, if the percentage concentration of the high refractive index material Al2O3 or Si3N4 is c h The density is ρ h The percentage concentration of SiO2 is c l The density is ρ l It can be seen that the refractive index n of the Al2O3-SiO2 mixed film and the Si3N4-SiO2 mixed film is:

[0079]

[0080] Based on the percentage concentration of high refractive index materials Al2O3 or Si3N4 as c h As shown in the table below, different values ​​of result in different mixed refractive indices of the resulting optical films.

[0081]

[0082] As can be seen from the above example, by controlling the mass ratio of the first material to the second material, an optical film with a refractive index of approximately 1.56 can be obtained, which is similar to the refractive index of the glass substrate 121. The mass ratio of the first material to the second material used in this application is (1-8):1. Optionally, the mass ratio of the first material to the second material can be 1:1, 2:1, 3:1, 4:1, 5:1, 6:1, 7:1, 8:1, etc., or other values ​​within the range. It can be selected according to actual needs and is not limited here. If the mass ratio of the first material to the second material is too small, i.e., the mass proportion of the high-refractive-index first material is too small and the mass proportion of the low-refractive-index second material is too large, the refractive index of the prepared optical film will be less than the refractive index of the glass substrate 121; if the mass ratio of the first material to the second material is too large, i.e., the mass proportion of the high-refractive-index first material is too large and the mass proportion of the low-refractive-index second material is too small, the refractive index of the prepared optical film will be too large. If the refractive index of the optical film is too greater or too less than that of the glass substrate 121, it will affect the light transmission performance of the glass cover 120. Therefore, the mass ratio of the first material to the second material used in this application is within the above-mentioned range, and the refractive index of the prepared optical film is similar to that of the glass substrate 121. Consequently, changes in the thickness of the optical film will not affect its refractive index. This ensures that when the optical film is formed on a glass substrate 121 with curved edges, such as a 3D glass substrate, the glass cover 120 will not appear to have a color difference due to the difference in thickness between the bent portion 121c and the substrate portion 121a during the coating process. Thus, the refractive index of the optical film does not change with the thickness of the film. Although the thickness of the optical film differs at the substrate portion 121a, the side portion 121b, and the bent portion 121c, the refractive indices at these locations are all similar to those of the glass, and no color difference will occur.

[0083] Meanwhile, to improve the scratch resistance of the optical film, the Vickers hardness of the first material used in this application is ≥1000 HV. Optionally, the hardness of the first material can be 1000 HV, 1100 HV, 1200 HV, 1300 HV, 1400 HV, 1500 HV, 1600 HV, 1700 HV, etc., or other values ​​within the range, which can be selected according to actual needs and are not limited here. If the hardness of the first material is too low, the hardness of the prepared optical film will be reduced, and the film will be easily scratched during the use of electronic devices, thereby reducing the service life of the optical film. The hardness of the first material used in the optical film of this application is within the above-mentioned range. The optical film is aesthetically pleasing, has high hardness, is not prone to scratches or other defects during use, and has a long service life.

[0084] Optical films are prepared by using a first material with high hardness and a refractive index higher than that of the glass substrate 121 and a refractive index lower than that of the glass substrate 121. The optical films of this application can be fabricated using various deposition methods, such as vacuum deposition techniques, chemical vapor deposition (e.g., plasma-enhanced chemical vapor deposition, low-pressure chemical vapor deposition, atmospheric pressure chemical vapor deposition, and plasma-enhanced atmospheric pressure chemical vapor deposition), and physical vapor deposition (e.g., reactive or non-reactive sputtering or laser ablation, thermal or electron beam evaporation, or atomic layer deposition) to form the various film layers. Liquid-based methods, such as spraying, dip coating, spin coating, or slot coating (e.g., using sol-gel materials), can also be used. Preferably, the optical films of this application are formed by sputtering with a metal target. Figure 6 A flowchart illustrating the fabrication process of the glass cover plate provided in the embodiments of this application is shown below. Figure 6 As shown, it includes the following steps:

[0085] Step S10: The glass substrate 121 undergoes a pretreatment process;

[0086] Step S20: In a vacuum environment, an alloy target is sputtered onto a glass substrate 121 to form a composite film on the surface of the glass substrate 121; wherein the alloy target contains atoms of two or more elements.

[0087] In step S30, gas is introduced into the composite film layer, and the gaseous atoms or gaseous ions formed by gas excitation react with the composite film layer to obtain a glass cover plate 120 with an optical film layer formed on the surface, wherein the refractive index of the optical film layer is 1.46 to 1.62.

[0088] In step S10, the pretreatment process of the glass substrate 121 is the cleaning process. Specifically, the glass substrate 121 is placed in a deionized water immersion cleaning tank, and deionized water is added to the tank to immerse the glass substrate 121. At the same time, an ultrasonic generator in the deionized water immersion cleaning tank operates to emit ultrasonic waves for the first cleaning. Then, the glass substrate 121 is placed in a deionized water spray cleaning tank, where water nozzles spray deionized water to rinse the glass substrate 121 for the second cleaning. Finally, the glass substrate 121 is placed in a drying device to dry it. After cleaning, the glass substrate 121 has a clean surface and stronger adhesion to the optical film layer, which facilitates subsequent fabrication processes. Other cleaning methods can also be selected according to actual needs, and are not limited here.

[0089] In step S20, the sputtering equipment of this application adopts a vertical single-unit magnetron furnace, and the sputtering material is a pure metal target with uniform mixing and a purity greater than 99%. The pure metal target includes two metal atoms. The preparation method of the pure metal target can be casting or powder metallurgy. Specifically, casting involves melting a first metal and a second metal in a ratio of (1-8):1 to obtain an alloy solution, then pouring the alloy solution into a mold to form an ingot, and finally machining it into a target. The melting method can be vacuum induction melting, vacuum arc melting, or vacuum electron bombardment melting, etc. Powder metallurgy involves melting a first metal and a second metal in a certain composition ratio, pouring it into an ingot, then pulverizing it, isostatically pressing the resulting powder, and then sintering it at high temperature to finally form the target. Other methods can also be used to form the metal target; the choice can be made according to actual needs and is not limited further.

[0090] After the metal target material is prepared, it is placed in a vertical single-cell magnetar furnace and heated to a vacuum of 3.6E. -3 Pa, working pressure is 5.6E -1 -6.6E -1 Under the conditions, the vertical single-unit magnetron furnace is turned on, and the glass substrate 121 passes through the metal target. The electrons generated by the glow discharge excite the inert gas in the sputtering equipment to generate plasma. The plasma blasts out the first metal atoms and the second metal atoms of the metal target and deposits them on the glass substrate 121 to form a composite film.

[0091] In step S30, the gas excitation process is achieved through an ICP plasma ionizer. Specifically, after the working gas enters the ICP plasma ionizer, a high-frequency current generates a high-frequency electromagnetic field through the induction coil of the ICP plasma ionizer, causing the working gas to ionize and form gas plasma. At this time, the composite film layer on the glass substrate 121 reacts with the gas plasma to form an optical film layer. The gas used in this application is oxygen or nitrogen, etc.

[0092] It should be noted that during the reaction of the composite film with the gas plasma, the rotation speed of the glass substrate 121 is maintained between 50 r / min and 120 r / min. Optionally, the rotation speed can be 50 r / min, 60 r / min, 70 r / min, 80 r / min, 90 r / min, 100 r / min, 110 r / min, 120 r / min, or other values ​​within this range, and can be selected according to actual needs. No limitation is made here. If the rotation speed of the glass substrate 121 is too high or too low, the composite film cannot react fully with the gas, resulting in an incomplete reaction and the prepared optical film failing to meet the required specifications.

[0093] The optical film prepared by the above method has both scratch resistance and other excellent physical properties, such as high hardness, smoothness, and excellent light transmittance and refractive index.

[0094] In some embodiments, the thickness of the optical film is 500nm to 5000nm. Optionally, the specific thickness of the optical film can be 500nm, 1000nm, 1500nm, 2000nm, 2500nm, 3000nm, 3500nm, 4000nm, 4500nm, 5000nm, etc., or other values ​​within the range. The choice can be made according to actual needs and is not limited here. If the thickness of the optical film is too high, the hardness is high and the scratch resistance is strong, but it will also lead to a larger thickness of the glass cover 120, affecting the aesthetics of the electronic device. If the thickness of the optical film is too thin, the scratch resistance decreases and the service life is short. The optical film prepared in this application has a thickness within the above range, possessing both high hardness and good aesthetics.

[0095] In some embodiments, a Mohs hardness tester is used, and under a test force of 500g, the Mohs hardness of the optical film is ≥7. Mohs hardness is determined by scratching the surface of the tested optical film with a pyramidal diamond needle using a scratching method and measuring the depth of the scratch; the depth of the scratch is the Mohs hardness. This application uses a high-hardness first material to prepare the optical film, resulting in a Mohs hardness within the above-mentioned range, thus providing the optical film with better scratch resistance.

[0096] Using a Vickers indenter, the Vickers hardness of the optical film is ≥1100 HV under a load of 18 mN. Vickers hardness is determined by pressing a diamond pyramid indenter with a 136-degree angle between its faces into the surface of the optical film under a specified load F, holding it for a certain time, removing the load, measuring the diagonal length d of the indentation, calculating the surface area of ​​the indentation, and finally determining the average pressure on the indentation surface area, which is the Vickers hardness value of the material. This application uses a high-hardness material to prepare the optical film, and the Vickers hardness of the optical film is within the above-mentioned range, exhibiting good compressive strength. During the use of electronic equipment, when sharp or heavy objects compress the electronic equipment, the optical film can provide good protection.

[0097] In some embodiments, the coefficient of friction of the optical film is 0.01 to 0.06. Optionally, the coefficient of friction of the optical film can specifically be 0.01, 0.015, 0.02, 0.025, 0.03, 0.035, 0.04, 0.045, 0.05, 0.055, 0.06, etc., or other values ​​within the range, which can be selected according to actual needs and are not limited here. The optical film is disposed on the side of the glass substrate 121 away from other components of the electronic device. During the use of the electronic device, the outer surface of the optical film comes into contact with the user's fingers. If the coefficient of friction of the optical film is too high, it is easy to reduce the user's experience when frequently operating the electronic device; if the coefficient of friction is too low, the electronic device is easy to receive action commands from the user when making erroneous operations. The coefficient of friction of the optical film prepared in this application is controlled within this range, so that the optical film has both the characteristics of smoothness and the ability of the electronic device to receive correct commands.

[0098] In some embodiments, the transmittance of the optical film layer for visible light with wavelengths in the range of 380nm to 780nm is >90%. Specifically, the transmittance of the optical film layer can be 90%, 91%, 92%, 93%, 94%, 95%, 96%, etc., or other values ​​within the range, which can be selected according to actual needs and are not limited here. Transmittance refers to the percentage of light passing through; the higher the transmittance, the clearer the display on the glass cover 120. The glass cover 120 is mounted on the electronic device, and the optical film layer is disposed on the side of the glass cover 120 away from other components of the electronic device. When the display screen generates a displayed image, the light of the displayed image passes through the glass cover 120 and is received by the user. If the transmittance of the optical film layer is too low, it will cause a decrease in the brightness of the electronic device and reduce the user's experience. The transmittance of the optical film layer prepared in this application is within the above-mentioned range, and the displayed image observed by the user through the glass cover 120 is clear.

[0099] In some embodiments, the reflectivity of the optical film layer for visible light with wavelengths in the range of 380nm to 780nm is <6%. Specifically, the reflectivity of the optical film layer can be 6%, 4.2%, 3.5%, 3%, 2.5%, 2%, 1.5%, 1%, etc., or other values ​​within the range, which can be selected according to actual needs and are not limited here. The reflectivity of the optical film layer refers to the degree to which the optical film layer reflects light. The lower the reflectivity of the optical film layer, the less light is reflected, making the display screen of the electronic device closer to the experience of using paper, and the better the user experience. If the reflectivity of the optical film layer is too high, it will affect the viewing process of the electronic device when using it in a strong light environment. The reflectivity of the optical film layer prepared in this application is within this range, so users can have a good viewing or reading experience on the electronic device.

[0100] In some embodiments, the refractive index of the optical film layer is 1.46 to 1.62. Specifically, the refractive index of the optical film layer can be 1.46, 1.47, 1.49, 1.50, 1.52, 1.54, 1.56, 1.59, 1.62, etc., or other values ​​within this range, which can be selected according to actual needs and are not limited here. The optical film layer is formed on the side of the glass substrate 121 away from other components of the electronic device. During use, the user observes the content on the display screen through the glass cover 120. If the refractive index of the optical film layer is too high or too low, that is, if the refractive index of the optical film layer is not close to the refractive index of the glass substrate 121, it will affect the light transmittance and reflectivity of the glass substrate 121, reducing the user's user experience.

[0101] In some implementations, in the (L*,a*,b*) chromaticity system, the a* value of the reflected light that the optical film can reflect is -2 to 2, and the b* value is -2 to 2; and / or, the a* value of the transmitted light that the optical film can transmit is -2 to 2, and the b* value is -2 to 2. L* represents lightness, ranging from 0 to 2, indicating a color from dark (black) to light (white); a* represents red-green, with values ​​changing from positive to negative, indicating a color from red (positive) to green (negative), where a larger a value indicates a redder color, and a smaller a value indicates a greener color; b* represents yellow-blue, with values ​​changing from positive to negative, indicating a color from yellow (positive) to blue (negative), where a larger b value indicates a yellower color, and a smaller b value indicates a bluer color. Specifically, the a* and b* values ​​can be -2, -1.5, -1, -0.5, 0.5, 1, 1.5, 2, etc., or other values ​​within the range, and can be selected according to actual needs, without limitation here. If the a* and b* values ​​of the transmitted and reflected light of the optical film prepared are within this range, the glass cover 120 of the electronic device will not show defects such as rainbow edges.

[0102] The side of the optical film layer furthest from the glass substrate 121 is the user's touch surface. During use, fingerprints or dirt can easily accumulate on the optical film layer, affecting its light transmittance and aesthetics. Therefore, the glass cover 120 also includes a protective layer, which is located on the side of the optical film layer furthest from the glass substrate 121. This protective layer prevents fingerprints and dirt from adhering to the optical film layer, improving the user experience and further extending the lifespan of the optical film layer.

[0103] The following description is based on specific embodiments:

[0104] Example 1:

[0105] The 3D glass substrate is cleaned with deionized water and then placed in a vertical single-unit magnetron furnace.

[0106] Open the vertical single-unit magnetic control furnace, with a vacuum degree of 3.6E.-3 Pa, working pressure is 5.6E -1 -6.6E -1 Under the working conditions, silicon-aluminum alloy target material is sputtered onto a 3D glass substrate, so that a composite film layer is formed on the surface of the 3D glass substrate; wherein, the mass ratio of silicon oxide to aluminum oxide is 3:2;

[0107] Oxygen is introduced into a vertical single-unit magnetron furnace, and an ICP plasma ionizer excites the gaseous atoms or gaseous ions formed by the oxygen to react with a composite film layer on a glass substrate rotating at 85 r / min, resulting in a glass cover plate with an optical film layer with a thickness of 2500 nm on the surface.

[0108] After the cover plate with the hard film is deposited, it is placed in the electron gun evaporation furnace. The electron gun evaporation furnace is turned on, and the coating parameters are set as follows: coating current: 90mA, Ar flow rate: 220sccm, coating time: 3min, to obtain a 10-30nm thick perfluoropolyether anti-fouling film layer.

[0109] The optical film prepared in Example 1 has a Mohs hardness of 7 (600g force), a Vickers hardness of 1205HV, a coefficient of friction of 0.026, a light transmittance of 91.7%, a reflectivity of 8.1%, a refractive index of 1.51, an a* value of 0.01 and a b* value of 0.02 for reflected light, and an a* value of -0.01 and a b* value of 0.02 for transmissive light. Visually, there are no rainbow patterns on the 3D curved edge.

[0110] Example 2:

[0111] The 3D glass substrate is cleaned with deionized water and then placed in a vertical single-unit magnetron furnace.

[0112] Open the vertical single-unit magnetic control furnace, with a vacuum degree of 3.6E. -3 Pa, working pressure is 5.6E -1 -6.6E -1 Under the working conditions, silicon-aluminum alloy target material is sputtered onto a 3D glass substrate, so that a composite film layer is formed on the surface of the 3D glass substrate; wherein, the mass ratio of silicon oxide to aluminum oxide is 2:3;

[0113] Oxygen is introduced into a vertical single-unit magnetron furnace, and an ICP plasma ionizer excites the gaseous atoms or gaseous ions formed by the oxygen to react with a composite film layer on a glass substrate rotating at 85 r / min, resulting in a glass cover plate with an optical film layer with a thickness of 2500 nm on the surface.

[0114] After the cover plate with the hard film is deposited, it is placed in the electron gun evaporation furnace. The electron gun evaporation furnace is turned on, and the coating parameters are set as follows: coating current: 90mA, Ar flow rate: 220sccm, coating time: 3min, to obtain a 10-30nm thick perfluoropolyether anti-fouling film layer.

[0115] The optical film prepared in Example 2 has a Mohs hardness of 7 (1100g force), a Vickers hardness of 1380HV, a coefficient of friction of 0.026, a transmittance of 91.3%, a reflectance of 8.3%, a refractive index of 1.56, a* value of -0.01 and a b* value of -0.01 for reflected light, and a* value of 0.01 and a b* value of 0.1 for transmissive light. Visually, there is no rainbow pattern on the 3D curved edge.

[0116] Example 3:

[0117] The 3D glass substrate is cleaned with deionized water and then placed in a vertical single-unit magnetron furnace.

[0118] Open the vertical single-unit magnetic control furnace, with a vacuum degree of 3.6E. -3 Pa, working pressure is 5.6E -1 -6.6E -1 Under the working conditions, silicon-aluminum alloy target material is sputtered onto a 3D glass substrate, so that a composite film layer is formed on the surface of the 3D glass substrate; wherein, the mass ratio of silicon oxide to aluminum oxide is 1:4;

[0119] Oxygen is introduced into a vertical single-unit magnetron furnace, and an ICP plasma ionizer excites the gaseous atoms or gaseous ions formed by the oxygen to react with a composite film layer on a glass substrate rotating at 85 r / min, resulting in a glass cover plate with an optical film layer with a thickness of 2500 nm on the surface.

[0120] After the cover plate with the hard film is deposited, it is placed in the electron gun evaporation furnace. The electron gun evaporation furnace is turned on, and the coating parameters are set as follows: coating current: 90mA, Ar flow rate: 220sccm, coating time: 3min, to obtain a 10-30nm thick perfluoropolyether anti-fouling film layer.

[0121] The optical film prepared in Example 3 has a Mohs hardness of 7 (1500g force), a Vickers hardness of 1560HV, a coefficient of friction of 0.029, a transmittance of 90.7%, a reflectance of 9.1%, a refractive index of 1.62, an a* value of -0.2 and a b* value of -0.26 for reflected light, and an a* value of 0.1 and a b* value of 0.3 for transmissive light. Visually, there are no rainbow patterns on the 3D curved edge.

[0122] Example 4:

[0123] The 3D glass substrate is cleaned with deionized water and then placed in a vertical single-unit magnetron furnace.

[0124] Open the vertical single-unit magnetic control furnace, with a vacuum degree of 3.6E. -3 Pa, working pressure is 5.6E -1 -6.6E-1 Under the working conditions, silicon target material is sputtered onto a 3D glass substrate, and then reacted with nitrogen and oxygen ions through an ICP ionizer to form a composite film layer on the surface of the 3D glass substrate; wherein the mass ratio of silicon oxide to silicon nitride is 4:1.

[0125] Oxygen and nitrogen are introduced into a vertical single-unit magnetron furnace. An ICP plasma ionizer excites the gaseous atoms or gaseous ions formed by oxygen and nitrogen to react with a composite film layer on a glass substrate rotating at 85 r / min, resulting in a glass cover plate with an optical film layer with a thickness of 2500 nm on its surface.

[0126] After the cover plate with the hard film is deposited, it is placed in the electron gun evaporation furnace. The electron gun evaporation furnace is turned on, and the coating parameters are set as follows: coating current: 90mA, Ar flow rate: 220sccm, coating time: 3min, to obtain a 10-30nm thick perfluoropolyether anti-fouling film layer.

[0127] The optical film prepared in Example 4 has a Mohs hardness of 7 (600g force), a Vickers hardness of 1160HV, a coefficient of friction of 0.024, a transmittance of 91.8%, a reflectance of 8%, a refractive index of 1.51, an a* value of -0.01 and a b* value of 0.02 for reflected light, an a* value of 0.01 and a b* value of 0.00 for transmissive light, and no rainbow pattern is visible on the 3D curved edge.

[0128] Example 5:

[0129] The 3D glass substrate is cleaned with deionized water and then placed in a vertical single-unit magnetron furnace.

[0130] Open the vertical single-unit magnetic control furnace, with a vacuum degree of 3.6E. -3 Pa, working pressure is 5.6E -1 -6.6E -1 Under the operating conditions, silicon target material is sputtered onto a 3D glass substrate, and then reacted with nitrogen and oxygen ions through an ICP ionizer to form a composite film on the surface of the 3D glass substrate; wherein the mass ratio of silicon oxide to silicon nitride is 7:3.

[0131] Oxygen and nitrogen are introduced into a vertical single-unit magnetron furnace. An ICP plasma ionizer excites the gaseous atoms or gaseous ions formed by oxygen and nitrogen to react with a composite film layer on a glass substrate rotating at 85 r / min, resulting in a glass cover plate with an optical film layer with a thickness of 2500 nm on its surface.

[0132] After the cover plate with the hard film is deposited, it is placed in the electron gun evaporation furnace. The electron gun evaporation furnace is turned on, and the coating parameters are set as follows: coating current: 90mA, Ar flow rate: 220sccm, coating time: 3min, to obtain a 10-30nm thick perfluoropolyether anti-fouling film layer.

[0133] The optical film prepared in Example 5 has a Mohs hardness of 7 (1100g force), a Vickers hardness of 1280HV, a coefficient of friction of 0.026, a transmittance of 91.3%, a reflectance of 8.3%, a refractive index of 1.56, an a* value of -0.1 and a b* value of -0.25 for reflected light, and an a* value of -0.01 and a b* value of 0.28 for transmissive light. Visually, there is no rainbow pattern on the 3D curved edge.

[0134] Example 6:

[0135] The 3D glass substrate is cleaned with deionized water and then placed in a vertical single-unit magnetron furnace.

[0136] Open the vertical single-unit magnetic control furnace, with a vacuum degree of 3.6E. -3 Pa, working pressure is 5.6E -1 -6.6E -1 Under the working conditions, silicon target material is sputtered onto a 3D glass substrate, and then reacted with nitrogen and oxygen ions through an ICP ionizer to form a composite film layer on the surface of the 3D glass substrate; wherein the mass ratio of silicon oxide to silicon nitride is 3:2.

[0137] Oxygen and nitrogen are introduced into a vertical single-unit magnetron furnace. An ICP plasma ionizer excites the gaseous atoms or gaseous ions formed by oxygen and nitrogen to react with a composite film layer on a glass substrate rotating at 85 r / min, resulting in a glass cover plate with an optical film layer with a thickness of 2500 nm on its surface.

[0138] After the cover plate with the hard film is deposited, it is placed in the electron gun evaporation furnace. The electron gun evaporation furnace is turned on, and the coating parameters are set as follows: coating current: 90mA, Ar flow rate: 220sccm, coating time: 3min, to obtain a 10-30nm thick perfluoropolyether anti-fouling film layer.

[0139] The optical film prepared in Example 6 has a Mohs hardness of 7 (1500g force), a Vickers hardness of 1480HV, a coefficient of friction of 0.036, a transmittance of 90.8%, a reflectance of 9.0%, a refractive index of 1.61, an a* value of 0.01 and a b* value of -0.24 for reflected light, and an a* value of -0.03 and a b* value of 0.26 for transmissive light. Visually, there are no rainbow patterns on the 3D curved edge.

[0140] Comparative Example 1

[0141] The 3D glass substrate is cleaned using deionized water.

[0142] A first film layer and a second film layer are alternately stacked on the surface of a 3D glass substrate to form a composite film layer with a thickness of 2500 nm. The first film layer has a refractive index of 1.46 and a Mohs hardness of 870 HV, while the second film layer has a refractive index of 2.1 and a Mohs hardness of 1970 HV.

[0143] The optical film prepared in Comparative Example 1 has a Mohs hardness of 7 (1500g force), a Vickers hardness of 1428 HV, a coefficient of friction of 0.055, a transmittance of 94.48%, a reflectance of 4.2%, an a* value of 0.19 and a b* value of -0.86 for reflected light, and an a* value of -0.24 and a b* value of 0.87 for transmissive light. A rainbow-like pattern is visually observed on the 3D curved edge.

[0144]

[0145] As can be seen from Examples 1-6 and Comparative Example 1, the glass cover of this application uses a first material with a refractive index higher than that of the glass substrate and a second material with a refractive index lower than that of the glass substrate. When the mass ratio of the first material to the second material is in the range of (1-8):1, compared with the conventional stacking arrangement of optical films, the first material and the second material of this application form an optical film through atomic-level mixing. The resulting optical film has a refractive index of 1.46-1.62, which is similar to that of the glass substrate. It has no effect on the light transmittance and reflectivity of the glass substrate, and the refractive index of the optical film does not change with the thickness of the film. When the optical film is formed on a glass substrate with curved edges, the glass substrate will not have a color difference in appearance due to the change in the thickness of the film. At the same time, the appearance of the glass cover will not change when the film peels off.

[0146] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and not to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features. These modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A glass cover plate characterized by, The glass cover plate comprises a glass substrate and an optical film layer on the surface of the glass substrate, the refractive index of the optical film layer is 1.46-1.62; the optical film layer comprises a first material and a second material in atomic level mixing, the mass ratio of the first material to the second material is (1-8):1, the refractive index of the first material is >1.6, the refractive index of the second material is <1.52, the first material comprises at least one of Si3N4, Al2O3, AlN, ZrO2, Nb2O5, T2O5 and TiO2, and the second material comprises at least one of SiO2, MgF2, LaF3 and AlF3.

2. The glass cover sheet of claim 1, wherein, The Vickers hardness of the first material is ≥1000HV.

3. The glass cover plate of claim 1, wherein, It satisfies at least one of the following characteristics: (1) the thickness of the optical film layer is 500nm-5000nm; (2) using a Mohs hardness pen test, under the action of a test force of 500g, the Mohs hardness of the optical film layer is ≥7; (3) using a Vickers indentation tester, under the action of a load force of 18mN, the Vickers hardness of the optical film layer is ≥1100HV; (4) the friction coefficient of the optical film layer is 0.01-0.06; (5) the transmittance of the optical film layer to visible light with a wavelength of 380nm-780nm is >90%; (6) the reflectivity of the optical film layer to visible light with a wavelength of 380nm-780nm is <6%; (7) the glass cover plate further comprises a protective layer, the protective layer is arranged on the side of the optical film layer away from the glass substrate.

4. The glass cover plate of claim 1, wherein, The glass substrate comprises one of a 2D glass substrate, a 2.5D glass substrate and a 3D glass substrate.

5. The glass cover sheet according to claim 1, wherein, The glass substrate is a 3D glass substrate, the 3D glass substrate comprises a base portion, a side portion and a bending portion connecting the base portion and the side portion; The optical film layer is formed on the surface of the base portion, the bending portion and the side portion, and the thickness of the optical film layer on the surface of the bending portion is different from the thickness of the optical film layer on the surface of the base portion.

6. The glass cover sheet according to claim 1, wherein, In In the chromatic system, the optical film layer can reflect the reflected light rays of a value of -2 to 2, a value of -2 to 2; and / or, the optical film layer can transmit the transmitted light rays of a value of -2 to 2, a value of -2 to 2.

7. A method of making a glass cover plate, characterized by, The preparation method comprises: a pretreatment process is performed on the glass substrate; an alloy target material is sputtered on the glass substrate in a vacuum environment, so that a composite film layer is formed on the surface of the glass substrate; wherein the alloy target material comprises two or more element atoms; a gas is introduced into the composite film layer, the gas excites the formed gaseous atoms or gaseous ions to react with the composite film layer, to obtain a glass cover plate with an optical film layer on the surface; wherein the refractive index of the optical film layer is 1.46-1.

62.

8. An electronic device, comprising: The electronic device comprises the glass cover plate of any one of claims 1-6 or the glass cover plate prepared by the preparation method of claim 7.

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