A focusing calibration method and an exposure compensation method with an auto-focusing function

By determining the relationship between the AF mechanism and the change in the platform focal plane in a micro-optical device, and using cubic fitting and real-time surface scanning processing, accurate compensation of the focal plane was achieved, solving the problem of poor exposure effect caused by the focusing motion mechanism and improving the exposure quality.

CN117872683BActive Publication Date: 2026-03-17SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
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Patent Information

Application Number
CN202311666672.1
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-12-06
Publication Date
2026-03-17
Estimated Expiration
2043-12-06

AI Technical Summary

Technical Problem

In micro-optical equipment, the focusing motion mechanism may cause a difference between the theoretically compensated surface shape difference and the actual surface shape difference that needs to be compensated due to processing errors and motion errors, thus affecting the exposure effect.

Method used

By determining the relationship between the motion of the AF mechanism and the change in the focal plane of the platform, a cubic fitting method is used to fit the corresponding relationship. The surface pattern is scanned in real time and the scanned surface pattern data is processed to obtain the change in the focal plane at the compensation point. The compensation command is sent to the AF mechanism to achieve accurate compensation of the focal plane.

Benefits of technology

It eliminates the influence of processing and motion errors on the focal plane, ensuring the accuracy and consistency of exposure results and improving exposure quality.

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Abstract

The application discloses a focusing calibration method and an exposure compensation method with an automatic focusing function, determines the relationship between the movement amount of an AF mechanism and the change amount of a platform focal plane, and specifically comprises the following steps: arranging the AF mechanism below an exposure lens, moving a suction disc camera on the platform to be directly below the exposure lens, determining the optimal focal plane position Z of the platform through the suction disc camera m ; determining the relationship between the movement amount of the AF mechanism and the change amount of the platform focal plane, obtaining the relationship model between the focusing position of the AF mechanism and the change amount of the platform focal plane, thereby ensuring the accuracy of the focal plane compensation of the AF mechanism, eliminating the different influences of machining errors and movement errors and movement amounts on the focal plane, and preventing the phenomenon that the difference between the theoretical compensation surface and the actual compensation surface is different.
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