A tail gas exhaust device suitable for a vertical TEOS device

By designing an exhaust gas emission device suitable for vertical TEOS equipment, utilizing a structure consisting of vacuum pipes, dry pumps, and cold trap filters, the problem of excessive particle size in the exhaust gas was solved, achieving efficient particle filtration and sealing, and improving the processing quality of wafers.

CN117899583BActive Publication Date: 2026-04-2848TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
Filing Date
2023-12-26
Publication Date
2026-04-28

AI Technical Summary

Technical Problem

The exhaust gas emission device in the vertical furnace TEOS process equipment has a problem with excessive particle size, which affects the uniformity and quality of wafer deposition.

Method used

A tail gas emission device was designed, comprising a vacuum pipeline, a dry pump, a T-connector, and a cold trap filter. The T-connector is connected to the exhaust port of the process chamber of the vertical TEOS equipment. The cold trap filter filters the particles in the tail gas. The filtered gas enters the dry pump through the vacuum pipeline and is discharged. The device is equipped with a removable blind plate for maintenance and cleaning. It uses double-layer filter elements and multiple control valves to ensure sealing and filtration effect.

Benefits of technology

It improves the sealing and particulate filtration of the exhaust gas emission device, reduces the number of particles on the wafer, and improves the processing quality and yield of the wafer.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The application discloses a tail gas exhaust device suitable for a vertical TEOS device, which comprises a vacuum pipeline, a dry pump, a tee pipe and a cold trap filter, a first port of the tee pipe is used for being connected with an exhaust port of a process cavity of the vertical TEOS device, a second port of the tee pipe is used for being connected with an input end of the cold trap filter, a third port of the tee pipe is provided with a detachable blind plate for pipeline maintenance or cleaning, and an output end of the cold trap filter is connected with the dry pump through the vacuum pipeline; under the driving of the dry pump, process tail gas in the vertical TEOS device flows into the cold trap filter through the tee pipe for filtration, filtered gas flows into the dry pump through the vacuum pipeline, and is finally discharged by the dry pump. The application has the advantages of compact structure, good sealing performance and strong particle filtering performance, and can ensure less particles on a wafer, thereby improving wafer processing quality.
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Description

Technical Field

[0001] This invention belongs to the field of semiconductor process equipment technology, and specifically relates to an exhaust gas emission device suitable for vertical TEOS equipment. Background Technology

[0002] The exhaust gas emission device of the vertical furnace TEOS process equipment is a critical component of the vertical furnace equipment, directly affecting the uniformity and particle size of wafer deposition. In the vertical furnace TEOS process, excessive particle size frequently occurs. Therefore, there is an urgent need to design an exhaust gas emission device to collect the particles generated during the process, thereby reducing the particle size of the wafers. Summary of the Invention

[0003] The technical problem to be solved by the present invention is to provide a tail gas emission device suitable for vertical TEOS equipment that is compact in structure, has good sealing performance and strong particulate filtration, in order to overcome the shortcomings of the prior art.

[0004] To solve the above-mentioned technical problems, the present invention adopts the following technical solution:

[0005] A tail gas emission device suitable for vertical TEOS equipment includes: a vacuum pipe, a dry pump, a T-connector, and a cold trap filter. The first port of the T-connector is used to connect to the exhaust port of the process chamber of the vertical TEOS equipment, the second port of the T-connector is used to connect to the input end of the cold trap filter, and the third port of the T-connector is provided with a removable blind plate for maintenance or cleaning of the pipe. The output end of the cold trap filter is connected to the dry pump through the vacuum pipe. Driven by the dry pump, the process tail gas in the vertical TEOS equipment flows into the cold trap filter through the T-connector for filtration. The filtered gas flows into the dry pump through the vacuum pipe and is finally discharged by the dry pump.

[0006] As a further improvement of the present invention, the cold trap filter includes: a cover plate, a filter element, and a housing. An inlet is provided at the bottom of the housing for connecting a T-connector. The cover plate is detachably disposed at the top of the housing. The filter element is stacked inside the housing for filtering the exhaust gas discharged from the vertical TEOS device. An outlet is provided on the upper side of the housing for connecting a vacuum pipe.

[0007] As a further improvement of the present invention, the filter element is composed of 126 filter discs stacked together, and the filter element adopts an inner and outer double-layer structure.

[0008] As a further improvement of the present invention, the top of the housing is also provided with a plurality of positioning pins, which pass through the cover plate and connect to the top of the filter sheet to fix the filter sheet inside the housing.

[0009] As a further improvement of the present invention, a transition pipe is provided between the three-way pipe and the cold trap filter, and two vacuum gauges with different ranges are provided on the side of the transition pipe. The vacuum gauges are used to detect the vacuum level in the exhaust gas emission device.

[0010] As a further improvement of the present invention, the side of the transition pipe is also provided with an exhaust pipe, which is used to regulate the air pressure in the exhaust gas emission device.

[0011] As a further improvement of the present invention, the output end of the exhaust pipe is provided with two branches in parallel, and the two branches are respectively provided with a first control valve and a second control valve to control the opening and closing of the branches.

[0012] As a further improvement of the present invention, the vacuum pipeline includes a main vacuum pipeline and a secondary vacuum pipeline. The input end of the main vacuum pipeline is connected to the output port of the cold trap filter, and the output end of the main vacuum pipeline is connected to the input end of the dry pump. The input end of the secondary vacuum pipeline is connected to the output port of the cold trap filter, and the output end of the secondary vacuum pipeline is connected to the main vacuum pipeline. The secondary vacuum pipeline is used for pre-vacuuming.

[0013] As a further improvement of the present invention, a fourth control valve is provided between the input end of the main vacuum pipe and the output port of the cold trap filter. When pre-vacuuming is performed, the fourth control valve is in the closed state. A third control valve is provided on the auxiliary vacuum pipe. When pre-vacuuming is performed, the third control valve is in the open state. The operating states of the third control valve are opposite to those of the fourth control valve.

[0014] As a further improvement of the present invention, the third control valve is a pneumatic angle valve, and the first control valve, the second control valve and the fourth control valve are all diaphragm valves.

[0015] Compared with the prior art, the advantages of the present invention are as follows:

[0016] The exhaust gas emission device of the present invention, applicable to vertical TEOS equipment, comprises a vacuum pipeline, a dry pump, a T-junction, and a cold trap filter as its main structure. The first port of the T-junction connects to the exhaust port of the process chamber of the vertical TEOS equipment, the second port connects to the input end of the cold trap filter, and the third port is equipped with a removable blind plate for maintenance or cleaning. This satisfies both the sealing requirements of the exhaust gas emission device and ensures smooth exhaust gas emission. By connecting the output end of the cold trap filter to the dry pump via a vacuum pipeline, the process exhaust gas from the vertical TEOS equipment first flows through the T-junction into the cold trap filter for filtration to remove particles. The filtered pure gas then flows through the vacuum pipeline into the dry pump and is finally discharged by the dry pump. The exhaust gas emission device of the present invention has advantages such as complete structure, good sealing, and strong particle filtration, ensuring a lower particle count on the wafers, improving the wafer yield, and thus improving the wafer processing quality. Attached Figure Description

[0017] Figure 1 This is a schematic diagram illustrating the structural principle of the exhaust gas emission device in a specific embodiment of the present invention.

[0018] Figure 2 This is a schematic diagram of the structure and principle of the cold trap filter in a specific embodiment of the present invention (outer shell omitted).

[0019] Figure 3 This is a top view schematic diagram of the filter element's structural principle in a specific embodiment of the present invention.

[0020] Legend: 1. Main vacuum pipe; 2. Dry pump; 3. Exhaust pipe; 4. First control valve; 5. Second control valve; 6. Auxiliary vacuum pipe; 7. Third control valve; 8. T-connector; 9. Transition pipe; 10. Vacuum gauge; 11. Cold trap filter; 111. Handle; 112. Cover plate; 113. Filter plate; 114. Inlet; 115. Positioning pin; 116. Housing; 12. Fourth control valve. Detailed Implementation

[0021] The present invention will be further described below with reference to the accompanying drawings and specific preferred embodiments, but this does not limit the scope of protection of the present invention.

[0022] Example

[0023] like Figure 1 and 2As shown, the exhaust gas emission device for vertical TEOS equipment of the present invention includes: a vacuum pipe, a dry pump 2, a three-way pipe 8, and a cold trap filter 11. The first port of the three-way pipe 8 is connected to the exhaust port of the process chamber of the vertical TEOS equipment, the second port of the three-way pipe 8 is connected to the input port of the cold trap filter 11, and the third port of the three-way pipe 8 is equipped with a removable blind plate for maintenance or cleaning of the pipe. The output port of the cold trap filter 11 is connected to the dry pump 2 through the vacuum pipe. Driven by the dry pump 2, the process exhaust gas in the vertical TEOS equipment flows into the cold trap filter 11 through the three-way pipe 8 for filtration. The filtered gas then flows into the dry pump 2 through the vacuum pipe and is finally discharged by the dry pump 2. In this embodiment, the three-way pipe 8 is a corrugated three-way pipe 8, and the port of the corrugated pipe is connected to the exhaust port of the vertical TEOS equipment.

[0024] In this embodiment, the main structure of the exhaust gas emission device consists of a vacuum pipe, a dry pump 2, a three-way pipe 8, and a cold trap filter 11. The first port of the three-way pipe 8 is connected to the exhaust port of the process chamber of the vertical TEOS equipment, and the second port is connected to the input end of the cold trap filter 11. The third port of the three-way pipe 8 is equipped with a removable blind plate for maintenance or cleaning of the pipe, thus satisfying both the sealing requirements of the exhaust gas emission device and ensuring smooth exhaust gas emission. By connecting the output end of the cold trap filter 11 to the dry pump 2 through a vacuum pipe, the process exhaust gas from the vertical TEOS equipment first flows through the three-way pipe 8 into the cold trap filter 11 for filtration to remove particles. The filtered pure gas then flows through the vacuum pipe into the dry pump and is finally discharged by the dry pump. The exhaust gas emission device of this invention has advantages such as complete structure, good sealing, and strong particle filtration, ensuring a smaller number of particles on the wafer, improving the wafer yield, and thus improving the wafer processing quality.

[0025] like Figure 2 As shown, in this embodiment, the cold trap filter 11 includes: a cover plate 112, a filter element formed by stacking filter sheets 113, an inlet 114, and a housing 116. The inlet 114 is located at the bottom of the housing 116 and is used to connect to the T-connector 8. The cover plate 112 is detachably located at the top of the housing 116. Multiple filter sheets 113 are stacked sequentially inside the housing 116 to form a filter element for filtering the exhaust gas discharged from the vertical TEOS device. An outlet is provided on the upper side of the housing 116 for connecting to a vacuum pipe.

[0026] like Figure 2 and Figure 3 As shown, in this embodiment, the filter element is composed of 126 filter discs 113 stacked together, and the filter element adopts an inner and outer double-layer structure, which can effectively collect particles when process gas passes through, so as to improve the gas filtration effect.

[0027] In this embodiment, the top of the housing 116 is also provided with a plurality of positioning pins 115. The positioning pins 115 pass through the cover plate 112 and are connected to the top of the filter element 113 to fix the filter element 113 inside the housing 116, so as to ensure the stability of the filter element during the process of the dry pump 2 pumping away the process gas.

[0028] like Figure 1 As shown, in this embodiment, a transition pipe 9 is provided between the three-way pipe 8 and the cold trap filter 11. Two vacuum gauges 10 with different ranges are provided on the side of the transition pipe 9. The vacuum gauges 10 are used to detect the vacuum level in the exhaust gas emission device.

[0029] like Figure 1 As shown in this embodiment, the transition pipe 9 is also provided with an exhaust pipe 3 on its side. The exhaust pipe 3 is used to regulate the gas pressure inside the exhaust gas emission device. If the gas pressure inside the exhaust gas emission device is higher than normal pressure, protective gas can be discharged through the exhaust pipe 3 to restore the exhaust gas emission device to normal pressure.

[0030] like Figure 1 As shown, in this embodiment, two branches are connected in parallel at the output end of the exhaust pipe 3. A first control valve 4 and a second control valve 5 are respectively provided on the two branches to control the opening and closing of the branches and ensure the stable operation of the exhaust gas emission device.

[0031] like Figure 1 As shown, in this embodiment, the vacuum pipeline includes a main vacuum pipeline 1 and an auxiliary vacuum pipeline 6. The input end of the main vacuum pipeline 1 is connected to the output port of the cold trap filter 11 via a flange, and the output end of the main vacuum pipeline 1 is connected to the input end of the dry pump 2 via a flange. The input end of the auxiliary vacuum pipeline 6 is connected to the output port of the cold trap filter 11, and the output end of the auxiliary vacuum pipeline 6 is connected to the main vacuum pipeline 1. The auxiliary vacuum pipeline is used for pre-vacuuming.

[0032] In this embodiment, a fourth control valve 12 is provided between the input end of the main vacuum pipe 1 and the output port of the cold trap filter 11. During pre-vacuuming, the fourth control valve 12 is closed. A third control valve 7 is provided on the auxiliary vacuum pipe 6. During pre-vacuuming, the third control valve 7 is open. The operating states of the third control valve 7 and the fourth control valve 12 are opposite. Before the exhaust gas emission device operates, the third control valve 7 is opened to perform pre-vacuuming through the auxiliary vacuum pipe 6. When the vacuum level reaches a preset value, the third control valve 7 is closed, and the fourth control valve 12 is opened to perform vacuuming through the main vacuum pipe 1. During exhaust gas emission, exhaust is mainly carried out through the main vacuum pipe 1.

[0033] In this embodiment, the third control valve 7 is a pneumatic angle valve, and the first control valve 4, the second control valve 5 and the fourth control valve 12 are all diaphragm valves, which have the characteristics of simple structure and precise control.

[0034] While the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the invention. Any person skilled in the art can make many possible variations and modifications to the technical solutions of the present invention, or modify them into equivalent embodiments, without departing from the spirit and technical essence of the invention. Therefore, any simple modifications, equivalent substitutions, equivalent changes, and modifications made to the above embodiments based on the technical essence of the present invention, without departing from the content of the present invention, shall still fall within the scope of protection of the present invention.

Claims

1. A tail gas emission device suitable for vertical TEOS equipment, characterized in that, include: The system includes a vacuum pipe, a dry pump (2), a three-way pipe (8), and a cold trap filter (11). The first port of the three-way pipe (8) is used to connect to the exhaust port of the process chamber of the vertical TEOS equipment, and the second port of the three-way pipe (8) is used to connect to the input end of the cold trap filter (11). A transition pipe (9) is provided between the three-way pipe (8) and the cold trap filter (11). A removable blind plate is provided at the third port of the three-way pipe (8) for maintenance or cleaning of the pipe. The output end of the cold trap filter (11) is connected to the dry pump (2) through the vacuum pipe. Driven by the dry pump (2), the process exhaust gas in the vertical TEOS equipment flows into the cold trap filter (11) through the three-way pipe (8) for filtration. The filtered gas flows into the dry pump (2) through the vacuum pipe and is finally discharged by the dry pump (2). The transition pipe (9) is also provided with an exhaust pipe (3) on its side, which is used to regulate the air pressure in the exhaust gas emission device; The exhaust pipe (3) has two branches connected in parallel at its output end. The two branches are equipped with a first control valve (4) and a second control valve (5) to control the opening and closing of the branches. The vacuum pipeline includes a main vacuum pipeline (1) and an auxiliary vacuum pipeline (6). The input end of the main vacuum pipeline (1) is connected to the output port of the cold trap filter (11), and the output end of the main vacuum pipeline (1) is connected to the input end of the dry pump (2). The input end of the auxiliary vacuum pipeline (6) is connected to the output port of the cold trap filter (11), and the output end of the auxiliary vacuum pipeline (6) is connected to the main vacuum pipeline (1). The auxiliary vacuum pipeline is used for pre-vacuuming. A fourth control valve (12) is provided between the input end of the main vacuum pipe (1) and the output port of the cold trap filter (11). When pre-vacuuming is performed, the fourth control valve (12) is in the closed state. A third control valve (7) is provided on the auxiliary vacuum pipe (6). When pre-vacuuming is performed, the third control valve (7) is in the open state. The operating state of the third control valve (7) is opposite to that of the fourth control valve (12).

2. The exhaust gas emission device for vertical TEOS equipment according to claim 1, characterized in that, The cold trap filter (11) includes: a cover plate (112), a filter element and a housing (116). The bottom of the housing (116) is provided with an inlet (114) for connecting a three-way pipe (8). The cover plate (112) is detachably provided on the top of the housing (116). The filter element is stacked inside the housing (116) for filtering the exhaust gas discharged from the vertical TEOS device. An outlet is provided on the upper side of the housing (116) for connecting a vacuum pipe.

3. The exhaust gas emission device for vertical TEOS equipment according to claim 2, characterized in that, The filter element is composed of 126 filter discs (113) stacked together, and the filter element adopts an inner and outer double-layer structure.

4. The exhaust gas emission device for vertical TEOS equipment according to claim 3, characterized in that, The top of the housing (116) is also provided with a plurality of positioning pins (115), which pass through the cover plate (112) and connect to the top of the filter (113) to fix the filter (113) inside the housing (116).

5. The exhaust gas emission device for vertical TEOS equipment according to claim 2, characterized in that, The transition pipe (9) is provided with two vacuum gauges (10) with different ranges on its side. The vacuum gauges (10) are used to detect the vacuum level in the exhaust gas emission device.

6. The exhaust gas emission device for vertical TEOS equipment according to claim 1, characterized in that, The third control valve (7) is a pneumatic angle valve, and the first control valve (4), the second control valve (5) and the fourth control valve (12) are all diaphragm valves.

Citation Information

Patent Citations

  • Coating machine's automatic evacuating device

    CN206799732U

  • Tail gas treatment device

    CN215841697U