Cleaning equipment and cleaning control methods

Abstract

This disclosure provides a cleaning device and a cleaning control method for cleaning a pressure gauge installed on a reaction chamber. The pressure gauge has a first inner cavity communicating with the reaction chamber. The cleaning device includes a separation structure, a gas supply channel, and an exhaust channel, and is installed on the outer wall of the pressure gauge. The separation structure is used to separate the deposits on the cavity wall of the first inner cavity from the cavity wall by heating and / or oscillation. The gas supply channel communicates with the first inner cavity and is used to introduce cleaning gas into the first inner cavity. The exhaust channel communicates with the first inner cavity and is used to discharge the cleaning gas carrying the deposits from the first inner cavity. The cleaning device of this disclosure can save the high cost required for pressure gauge replacement or external maintenance, and can also achieve a good cleaning effect on the deposits attached to the cavity wall of the first inner cavity.

Description

Technical Field

[0001] This disclosure relates to the field of equipment cleaning technology, and in particular to a cleaning device and a cleaning control method. Background Technology

[0002] In semiconductor manufacturing processes, pressure gauges are typically used to monitor the gas pressure inside the reaction chamber. However, after long-term use, pressure gauges may become inaccurate. The only solutions to this problem are to replace the pressure gauges periodically or send them out for maintenance, which significantly increases the maintenance costs of the pressure gauges. Summary of the Invention

[0003] The following is an overview of the subject matter described in detail in this disclosure. This overview is not intended to limit the scope of the claims.

[0004] This disclosure provides a cleaning device and a cleaning control method.

[0005] A first aspect of this disclosure provides a cleaning apparatus for cleaning a pressure gauge disposed on a reaction chamber, the pressure gauge having a first inner cavity communicating with the reaction chamber, the cleaning apparatus comprising:

[0006] A separation structure is disposed on the outer wall of the pressure gauge, and the separation structure is used to separate the deposits on the cavity wall of the first inner cavity from the cavity wall by means of heating and / or oscillation;

[0007] A gas delivery channel, connected to the first inner cavity, is used to introduce cleaning gas into the first inner cavity;

[0008] An exhaust channel, connected to the first inner cavity, is used to discharge cleaning gas carrying the deposits out of the first inner cavity.

[0009] According to some embodiments of this disclosure, at least two separation structures are provided, and at least two separation structures are arranged sequentially along the axial direction of the pressure gauge.

[0010] According to some embodiments of this disclosure, each of the separation structures includes at least two heating parts and at least one oscillating part, wherein the heating parts and the oscillating parts are arranged sequentially at intervals.

[0011] According to some embodiments of this disclosure, the pressure gauge is a capacitive pressure gauge, which includes a housing and a deformable diaphragm and a fixed diaphragm disposed within the housing and spaced apart along the axial direction. The space formed by the deformable diaphragm surface near the reaction chamber and the housing constitutes the first inner cavity, and the space formed by the deformable diaphragm surface away from the reaction chamber and the fixed diaphragm and the housing constitutes the second inner cavity.

[0012] Both the first inner cavity and the second inner cavity are respectively provided with at least one of the separation structures.

[0013] According to some embodiments of this disclosure, the first inner cavity is provided with at least two of the separation structures. Along the direction away from the reaction chamber, the heating temperature of each of the separation structures provided with respect to the first inner cavity decreases sequentially, and / or the oscillation frequency of each of the separation structures provided with respect to the first inner cavity decreases sequentially.

[0014] According to some embodiments of this disclosure, the cleaning apparatus further includes:

[0015] A detection module, wherein the detection end of the detection module is connected to the exhaust channel, and is used to detect the concentration of deposits in the cleaning gas from the exhaust channel;

[0016] A control module is connected to the detection module, and the control module is used to adjust the working state of the separation structure according to the detection results of the detection module.

[0017] According to some embodiments of this disclosure, the pressure gauge is connected to the reaction chamber via a connecting channel, and the exhaust channel is connected to the connecting channel; or...

[0018] The reaction chamber forms at least a part of the exhaust channel, through which the cleaning gas carrying the deposits is discharged.

[0019] According to some embodiments of this disclosure, the cleaning device further includes an air extraction device, which is connected to the exhaust channel.

[0020] According to some embodiments of this disclosure, the reaction chamber includes a vacuum port, which is connected to a vacuum pump via a vacuum pipeline, and the vacuum pump constitutes the gas extraction device.

[0021] According to some embodiments of this disclosure, when the pressure gauge is connected to the reaction chamber via a connecting channel and the exhaust channel is connected to the connecting channel, a control valve is provided between the reaction chamber and the connecting channel.

[0022] According to some embodiments of this disclosure, the housing of the pressure gauge includes a cylindrical sidewall and an end wall that closes both ends of the cylindrical sidewall, and the end wall is provided with a plurality of air inlets;

[0023] The gas transmission channel includes a main gas transmission pipe and a plurality of branch gas transmission pipes connected to the main gas transmission pipe and corresponding to the gas transmission ports one by one. The branch gas transmission pipes are connected to the corresponding gas transmission ports.

[0024] A second aspect of this disclosure provides a cleaning control method for cleaning a pressure gauge disposed on a reaction chamber, the pressure gauge having a first inner cavity communicating with the reaction chamber, the cleaning control method comprising:

[0025] The separation structure disposed on the outer wall of the pressure gauge is controlled to operate so that the separation structure separates the deposits on the cavity wall of the first inner cavity from the cavity wall by means of heating and / or oscillation;

[0026] Cleaning gas is introduced into the first inner cavity;

[0027] The cleaning gas carrying the deposits in the first inner cavity is discharged from the first inner cavity.

[0028] According to some embodiments of this disclosure, at least two separation structures are provided, and at least two separation structures are arranged sequentially along the axial direction of the pressure gauge.

[0029] The control mechanism, located on the outer wall of the pressure gauge, operates as follows:

[0030] Along the direction away from the reaction chamber, the heating temperature of the different separation structures is controlled to decrease sequentially, and / or the oscillation frequency of the different separation structures is controlled to decrease sequentially.

[0031] According to some embodiments of this disclosure, the control of the operation of the separation structure disposed on the outer wall of the pressure gauge includes:

[0032] The separation structure is controlled to operate at an initial heating power and an initial oscillation frequency;

[0033] After a preset time period, the concentration information of sediments in the discharged cleaning gas is obtained;

[0034] Based on the sediment concentration information, the initial heating power and initial oscillation frequency of the separation structure are adjusted.

[0035] According to some embodiments of this disclosure, adjusting the initial heating power and initial oscillation frequency of the separation structure based on the sediment concentration information includes:

[0036] Obtain preset configuration information, which is used to characterize the correspondence between sediment concentration and heating power and oscillation frequency;

[0037] Based on the sediment concentration information and the preset configuration information, the target heating power and the target oscillation frequency are determined;

[0038] Based on the target heating power and target heating frequency, the initial heating power and initial oscillation frequency of the separation structure are adjusted.

[0039] In the cleaning apparatus provided in this embodiment, the deposits on the wall of the first inner cavity are heated and vibrated through a separation structure, thereby causing the deposits to detach from the wall of the first inner cavity. The cleaning gas introduced into the first inner cavity through the gas supply channel can act as a carrier, carrying the detached deposits and inputting them into the exhaust channel, whereby the deposits are discharged from the first inner cavity, thus achieving the cleaning of the pressure gauge. The above cleaning process can be performed periodically without disassembling the pressure gauge or damaging its connection structure, saving the high costs required for pressure gauge replacement or external maintenance. In addition, the cleaning apparatus provided in this embodiment can achieve a good cleaning effect on the deposits attached to the wall of the first inner cavity, ensuring the cleanliness of the wall of the first inner cavity and avoiding the problem of long-term accumulation of deposits affecting the measurement accuracy of the pressure gauge.

[0040] After reading and understanding the accompanying diagrams and detailed descriptions, the other aspects can be understood. Attached Figure Description

[0041] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of these embodiments. In these drawings, similar reference numerals are used to denote similar elements. The drawings described below are some embodiments of the present disclosure, but not all embodiments. Other drawings will be readily available to those skilled in the art based on these drawings without inventive effort.

[0042] Figure 1 This is a perspective structural diagram of a cleaning apparatus according to an exemplary embodiment.

[0043] Figure 2 This is a perspective view of a cleaning device from another angle, according to an exemplary embodiment.

[0044] Figure 3 This is a cross-sectional view of a pressure gauge and a separation structure of a cleaning device according to an exemplary embodiment.

[0045] Figure 4 This is a flowchart illustrating a cleaning control method according to an exemplary embodiment.

[0046] Figure 5 This is a flowchart illustrating a cleaning control method according to another exemplary embodiment.

[0047] Figure 6 This is a flowchart illustrating a cleaning control method according to yet another exemplary embodiment.

[0048] Figure label:

[0049] 1. Reaction chamber; 2. Pressure gauge; 201. Deformable diaphragm; 202. First inner cavity; 203. Second inner cavity; 204. Outer shell; 205. Fixed diaphragm; 206. Third inner cavity; 3. Separation structure; 301. Heating unit; 302. Oscillating unit; 3021. Ultrasonic transducer; 3022. Vibrating ring; 4. Gas supply channel; 401. Main gas supply pipe; 402. Branch gas supply pipe; 5. Exhaust channel; 6. Detection module; 7. Control module; 8. Connection channel; 9. Vacuum pump; 10. Filter; 11. Vacuum port; 12. Vacuum pipeline; 13. Control valve. Detailed Implementation

[0050] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions in the disclosed embodiments will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. All other embodiments obtained by those skilled in the art based on the embodiments of this disclosure without creative effort are within the scope of protection of this disclosure. It should be noted that, unless otherwise specified, the embodiments and features in the embodiments of this disclosure can be arbitrarily combined with each other.

[0051] In semiconductor manufacturing processes, pressure gauges are typically used to monitor the gas pressure within the reaction chamber. However, after prolonged use, these pressure gauges can become inaccurate. To address this issue, the inventors of this application discovered that because the pressure gauge is connected to the reaction chamber, impurities such as polymers generated within the reaction chamber can enter the pressure gauge. Over time, these polymers accumulate and form deposits that adhere to the walls of the first inner cavity. For example, in capacitive pressure gauges, deposits can form on the diaphragm, and this also reduces the working space within the pressure gauge's inner cavity, thus affecting the measurement accuracy. Current technologies only address this problem by periodically replacing the pressure gauge or sending it for external maintenance, which significantly increases the maintenance costs.

[0052] Based on this, the present disclosure provides a cleaning device that can be used periodically without disassembling the pressure gauge or damaging its connection structure, saving the high costs required for pressure gauge replacement or external maintenance. In addition, the cleaning device provided in this embodiment can effectively clean the deposits attached to the cavity wall of the first inner cavity, ensuring the cleanliness of the cavity wall of the first inner cavity and avoiding the problem of long-term accumulation of deposits affecting the accuracy of pressure gauge measurement.

[0053] This disclosure provides an exemplary embodiment of a cleaning device for cleaning a pressure gauge 2 disposed on a reaction chamber 1. The pressure gauge 2 has a first inner cavity 202 communicating with the reaction chamber 1. During the operation of the reaction chamber, impurities within the reaction chamber can enter the first inner cavity 202, thereby contaminating the first inner cavity 202 and affecting the accuracy of the pressure gauge's detection. Figure 1 and Figure 2 As shown, the cleaning device includes a separation structure 3, a gas supply channel 4, and an exhaust channel 5. The separation structure 3 is disposed on the outer wall of the pressure gauge 2. The separation structure 3 is used to separate the deposits on the cavity wall of the first inner cavity 202 from the cavity wall by heating and / or oscillation. For example, heating can be used alone, oscillation can be used alone, or heating and oscillation can be used simultaneously. The gas supply channel 4 is connected to the first inner cavity 202 and is used to introduce cleaning gas into the first inner cavity 202. The exhaust channel 5 is connected to the first inner cavity 202 and is used to discharge the cleaning gas carrying the deposits from the first inner cavity 202.

[0054] In this embodiment, when the pressure gauge 2 on the reaction chamber 1 needs to be cleaned, the reaction chamber 1 can be shut down and the separation structure 3 activated. The separation structure 3 heats and vibrates the deposits on the cavity wall of the first inner cavity 202. For example, heating reduces the tightness of the deposits, making them loose and easy to separate from the cavity wall. Alternatively, vibration causes the loose deposits to fall from the cavity wall of the first inner cavity 202 and into the cleaning gas. The cleaning gas introduced into the first inner cavity 202 through the gas delivery channel 4 can act as a carrier to entrain the gas. The detached deposits are introduced into the exhaust channel 5 with the cleaning gas, and the deposits are discharged from the first inner cavity 202, thus achieving the purpose of cleaning the pressure gauge 2. The above cleaning process can be carried out periodically without disassembling the pressure gauge 2 or damaging the connection structure of the pressure gauge 2, saving the high cost required for replacing or sending the pressure gauge 2 for maintenance. In addition, the cleaning device provided in this embodiment can achieve a good cleaning effect on the deposits attached to the cavity wall of the first inner cavity 20, ensuring the cleanliness of the cavity wall and avoiding the problem of long-term accumulation of deposits affecting the measurement accuracy of the pressure gauge 2.

[0055] For example, the cleaning gas can be one or more of nitrogen and inert gases to ensure that after the cleaning gas is introduced into the first inner cavity 202, the deposits in the first inner cavity 202 will not react chemically with the cleaning gas and will not cause chemical corrosion to the inner wall of the pressure gauge 2.

[0056] For example, the heating temperature of the separation structure 3 is 70–110°C, and the oscillation frequency of the separation structure 3 is 65–130 Hz. By setting the heating temperature and oscillation frequency within the above range, it is possible to achieve the removal of deposits without damaging the internal components of the pressure gauge 2.

[0057] In one embodiment, such as Figure 1 and Figure 2 As shown, there are at least two separation structures 3, and the at least two separation structures 3 are arranged sequentially along the axial direction of the pressure gauge 2.

[0058] In this embodiment, by setting at least two sets of separation structures 3, the oscillation effect of the separation structure on the pressure gauge 2 can be improved, so that the internal components and shell of the pressure gauge 2 can maintain near-synchronous oscillation, avoiding the adverse effects of internal stress caused by uneven oscillation on the internal components and shell of the pressure gauge 2, thereby increasing the service life of the pressure gauge 2.

[0059] In one embodiment, such as Figure 2 As shown, each separation structure 3 includes at least two heating sections 301 and at least one oscillating section 302. The heating sections 301 and oscillating sections 302 are arranged alternately, that is, the heating sections 301 are disposed on both sides of the oscillating sections 302, or the oscillating sections 302 are disposed on both sides of the heating sections 301. While the heating sections 301 heat the deposits in their axial region, their heat also diffuses to a portion of the axial region of the pressure gauge 2, that is, to the axial region of the adjacent oscillating section 302. Thus, by the heat from the oscillating sections 302 disposed on both sides of the oscillating section 302, the heat is absorbed and distributed. The heat diffused outward from the heating section 301 heats the deposits in the area where the oscillation section 302 is located, thereby ensuring the heating effect on the deposits on the cavity wall of the first inner cavity 202 in the area where the separation structure 3 is located, and further ensuring the loosening effect of the deposits; similarly, the high-frequency sound waves of the oscillation section 302 diffuse axially towards the deposits in the area where the heating section 301 is located, and oscillate the deposits in the area, thereby ensuring the oscillation effect on the deposits on the cavity wall of the first inner cavity 202 in the area where the separation structure 3 is located, and further ensuring the detachment effect of the deposits.

[0060] For example, such as Figure 3 As shown, the oscillating part 302 can be sandwiched between two adjacent heating parts 301. Both ends of the oscillating part 302 can abut against the heating parts 301 on both sides respectively. With this arrangement, the high-frequency sound waves of the oscillating part 302 are transmitted to the heating parts 301 by solid sound conduction, and the heat generated by the heating parts 301 is transferred to the oscillating part 302 by solid heat conduction. This reduces the attenuation of sound waves and heat loss during the transmission process, thereby improving the effect of removing deposits in the first inner cavity 202 of the oscillating part 302.

[0061] In other embodiments, each separation structure 3 may also include multiple heating and oscillation groups arranged along the axial direction. Each heating and oscillation group includes a heating part 301 and an oscillation part 302. The heating part 301 may be disposed between the oscillation part 302 and the outer wall of the pressure gauge 2. The high-frequency sound waves generated by the oscillation part 302 are first transmitted to the heating part 301 and then further transmitted by the heating part 301 to the deposits on the cavity wall of the first inner cavity 202. This arrangement eliminates the space occupied by the oscillation part 302 along the axial direction of the pressure gauge 2. Therefore, the outer wall of the pressure gauge 2 can increase the number of separation structures 3 installed, which can further improve the cleaning rate of the deposits.

[0062] For example, the oscillation unit 302 can be embedded in the middle of the heating unit 301 along the axial direction of the pressure gauge 2. The axial width of the heating unit 301 can be greater than the axial width of the oscillation unit 302. With this configuration, the heating unit 301 directly heats the area where the heating oscillation group is located. The high-frequency sound waves generated by the oscillation unit 302 are first transmitted to the heating unit 301, and then the heating unit 301 transmits the high-frequency sound waves to the pressure gauge. In this way, the heat from the heating unit 301 and the high-frequency sound waves from the oscillation unit 302 can be evenly transmitted to the pressure gauge 2, avoiding the problem of damage to the internal components of the pressure gauge 2 due to oscillation or uneven heating.

[0063] In one embodiment, the heating unit 301 may include a heating coil, and heat is supplied by powering the heating coil; such as Figure 2 The oscillation unit 302 may include an ultrasonic oscillation generator (not shown) and an ultrasonic transducer 3021. The end of the ultrasonic transducer 3021 may be connected to a vibrating ring 3022. The vibrating ring 3022 is sleeved on the outer wall of the pressure gauge 2, and the inner wall of the vibrating ring 3022 is in contact with the outer wall of the pressure gauge 2.

[0064] In this embodiment, the vibrating ring 3022 disposed at the end of the ultrasonic transducer 3021 transmits ultrasonic waves to the ultrasonic transducer 3021 with minimal ultrasonic loss. On the other hand, in the pressure gauge 2, the side wall of the first inner cavity 202 is cylindrical. Therefore, the vibrating ring 3022 sleeved on the outside of the pressure gauge 2 can oscillate the deposits attached to the side wall of the cylindrical first inner cavity 202 in various areas, thereby improving the oscillation effect of the oscillation part 302 and further improving the efficiency of deposit removal and cleaning.

[0065] In one embodiment, pressure gauge 2 is a capacitive pressure gauge, such as... Figure 3As shown, the pressure gauge 2 includes a housing 204 and a deformable diaphragm 201 and a fixed diaphragm 205 disposed within the housing 204 and spaced apart along the axial direction. The space formed by the deformable diaphragm 201 near the reaction chamber 1 and the housing 204 constitutes a first inner cavity 202. The space formed by the deformable diaphragm 201 away from the reaction chamber 1 and the fixed diaphragm 205 and the housing 204 constitutes a second inner cavity 203. At least one separation structure 3 is respectively provided for the first inner cavity 202 and the second inner cavity 203. The second inner cavity 203 can communicate with the exhaust channel 5.

[0066] In this embodiment, since most of the internal components of the pressure gauge 2 are located in the second inner cavity 203, a separation structure 3 is provided outside the second inner cavity 203 to achieve near-synchronous oscillation with the separation structure 3 provided outside the first inner cavity 202. On the one hand, this arrangement can protect the internal components in the second inner cavity 203. On the other hand, the heat energy and high-frequency sound waves generated by the separation structure 3 provided outside the second inner cavity 203 can also be transmitted to the adjacent first inner cavity 202, thereby improving the shedding efficiency of the deposits in the first inner cavity 202.

[0067] In one embodiment, the space formed by the fixed diaphragm 205 away from the reaction chamber 1 and the outer shell 204 constitutes a third inner cavity 206. The third inner cavity 206 may be provided with at least one separation structure 3. The separation structure 3 provides oscillation for one end of the pressure gauge 2, the separation structure 3 outside the first inner cavity 202 provides oscillation for the other end of the pressure gauge 2, and the separation structure outside the second inner cavity 203 provides oscillation for the middle part of the pressure gauge 2. This improves the near-synchronous oscillation effect of the pressure gauge 2 as a whole, thereby better protecting the internal components of the pressure gauge 2 and the outer shell 204, and preventing the internal stress caused by uneven oscillation from having an adverse effect on the internal components and outer shell of the pressure gauge 2.

[0068] In one embodiment, within the axial region where the deformable diaphragm 201 is located, a separation structure 3 is provided on the outer wall of the pressure gauge 2. This separation structure 3 cleans the deposits formed on the surface of the deformable diaphragm 201 when the polymer passes through it, thus preventing excessive accumulation of deposits on the deformable diaphragm 201, which could increase the hardness of the deformable diaphragm 201 and affect its pressure transmission effect.

[0069] In one embodiment, at least two separation structures 3 are provided in the first inner cavity 202. Along the direction away from the reaction chamber 1, the heating temperature of each separation structure 3 provided in the first inner cavity 202 can be decreased sequentially, and the oscillation frequency of each separation structure 3 provided in the first inner cavity 202 can be decreased sequentially.

[0070] In this embodiment, when the gas to be tested is injected into the first inner cavity 202 from the reaction chamber 1, the polymer carried by the gas to be tested will first come into contact with the cavity wall of the first inner cavity 202 near the pressure gauge 2 of the reaction chamber 1. That is to say, the total amount and thickness of the deposits on the cavity wall of the first inner cavity 202 near the reaction chamber 1 are relatively high. For example, along the direction away from the reaction chamber 1, the heating temperature of different separation structures 3 can be decreased in sequence, and the oscillation frequency of different separation structures 3 can be decreased in sequence. That is, by applying a higher heating temperature and oscillation frequency to the cavity wall of the first inner cavity 202 near the reaction chamber 1 through the separation structure 3, the shedding rate of the deposits on this part of the cavity wall can be accelerated, avoiding the problem of incomplete cleaning of the deposits in this area due to insufficient heating temperature or oscillation frequency. At the same time, it can also be achieved that within the same preset time, all separation structures 3 can simultaneously complete the cleaning of the deposits in the corresponding area on the cavity wall of the first inner cavity 202, thus achieving the purpose of improving the efficiency of deposit cleaning.

[0071] For example, the first inner cavity 202 may be provided with 2 to 5 separation structures, but is not limited thereto, in order to improve the efficiency of the removal of deposits on the cavity wall of the first inner cavity 202.

[0072] In an exemplary embodiment of this disclosure, such as Figure 1 and Figure 2 As shown, the cleaning device also includes a detection module 6 and a control module 7. The detection end of the detection module 6 is connected to the exhaust channel 5 and is used to detect the concentration of deposits in the cleaning gas of the exhaust channel 5. The control module 7 is connected to the detection module 6 and is used to adjust the working state of the separation structure 3 according to the detection results of the detection module 6.

[0073] For example, the connection between the control module 7 and the detection module 6 can be an electrical connection, a wireless connection, or the like.

[0074] In this embodiment, the detection module 6 detects the concentration of deposits in the exhaust channel 5 after a preset time. The control module 7 can set a preset concentration and compare the concentration of deposits with the preset concentration. If the concentration of deposits is too high, the heating power and oscillation frequency of the separation structure 3 can be increased to further improve the loosening and shedding rate of the deposits, thereby improving the cleaning efficiency of the deposits. When the concentration of deposits is lower than the preset concentration, the separation device can be kept in working state to continue heating and oscillating the pressure gauge 2. After a period of time, the control module 7 can control the separation structure 3 to stop running. This setting can remove the residual deposits that have not fallen off in the pressure gauge 2, thereby ensuring the removal effect of the deposits.

[0075] In one embodiment, such as Figure 1As shown, the pressure gauge 2 is connected to the reaction chamber 1 through the connecting channel 8, and the exhaust channel 5 is connected to the connecting channel 8. With this configuration, the connecting channel 8 is used as part of the exhaust channel 5. The cleaning gas carrying the deposits is injected into the exhaust channel 5 through this part of the connecting channel 8 and then discharged to the outside through the exhaust channel 5. The original pipeline is used to discharge the clean gas, which can effectively simplify the pipeline connection of the cleaning device and reduce the number of holes to be drilled in the pressure gauge 2, thereby reducing the processing steps and reducing the processing cost of the cleaning device.

[0076] In one embodiment, such as Figure 1 As shown, the reaction chamber 1 constitutes at least a part of the exhaust channel 5. The cleaning gas carrying the deposits is discharged through the reaction chamber 1. In this way, the flow rate of the cleaning gas can be further increased without adding an extra exhaust pipe, and the pipeline connection of the cleaning device can also be simplified. When a part of the exhaust channel 5 is composed of the reaction chamber 1, that is, a part of the cleaning gas is discharged from the reaction chamber 1, this setting can increase the input flow rate of the cleaning gas in the gas delivery channel 4. With the pipe diameter of the input channel and the first inner cavity 202 unchanged, the flow velocity of the cleaning gas in the gas delivery channel 4 and the first cavity is increased, so the removal and discharge of the deposits can be achieved more efficiently.

[0077] In an exemplary embodiment of this disclosure, such as Figure 1 and Figure 2 As shown, the cleaning device also includes an air extraction device 9, which is connected to the exhaust channel 5.

[0078] In this embodiment, the gas supply channel 4 provides part of the kinetic energy for the cleaning gas to clean the cleaning air, and the air extraction device 9 provides another part of the kinetic energy for the cleaning gas in the exhaust channel 5. This increases the flow rate of the cleaning gas in the first inner cavity 202, so that after the cleaning gas is input into the first inner cavity 202, the deposits that have not completely fallen off under the action of the oscillation part 302 can be loaded into the cleaning gas and discharged from the first inner cavity 202 through the exhaust channel 5, thereby improving the cleaning gas's ability to remove deposits in the pressure gauge 2.

[0079] In one embodiment, such as Figure 1 and Figure 2 As shown, a filter 10 can be detachably installed on the exhaust channel 5. The deposits in the first inner cavity 202 are discharged through the exhaust channel 5 and collected in the filter 10. After 4 to 5 cleaning cycles, the operator can remove the filter 10 and centrally process the deposits in the filter 10. This setting can avoid the deposits from clogging the exhaust device 9 and also avoid the problem of environmental pollution caused by the discharge of deposits. The centralized processing of deposits can be achieved by replacing the filter screen in the filter 10 to ensure the filtration effect of the filter 10 in subsequent cleaning cycles.

[0080] In one embodiment, such as Figure 1 and Figure 2 As shown, the filter 10 is installed on the exhaust channel 5 between the detection module 6 and the extraction device 9. This arrangement allows the detection module 6 to filter the deposits in the cleaning gas after detecting the concentration of the cleaning gas deposits in the exhaust channel 5.

[0081] In one embodiment, such as Figure 1 As shown, the reaction chamber 1 includes a vacuum port 11, which is connected to a vacuum pump via a vacuum pipe 12. The vacuum pump constitutes a gas extraction device 9.

[0082] In this embodiment, one end of the exhaust channel 5 is connected to the connection channel 8 between the pressure gauge 2 and the reaction chamber 1, and the other end is connected to the vacuum pipeline 12. The vacuum pump that was originally matched with the reaction chamber 1 is connected to the exhaust channel 5, avoiding the cost required for setting up an additional vacuum device. At the same time, it can also effectively save space occupancy, making the structure of the cleaning device more compact. In this embodiment, the filter 10 can be set on the vacuum pipeline 12 to ensure that the deposits are not sucked into the vacuum device 9.

[0083] In one embodiment, such as Figure 1 and Figure 2 As shown, when the pressure gauge 2 is connected to the reaction chamber 1 through the connecting channel 8 and the exhaust channel 5 is connected to the connecting channel 8, a control valve 13 is provided between the reaction chamber 1 and the connecting channel 8.

[0084] In this embodiment, during use, the pipeline connection between the pressure gauge and the reaction chamber 1 is closed by the control valve 13, that is, the cleaning gas is discharged only through the exhaust channel 5. This setting can avoid the problem that when the cleaning gas carrying the deposits passes through the reaction chamber 1, the deposits adhere to the cavity wall of the reaction chamber 1, thereby causing pollution to the cavity wall of the reaction chamber 1.

[0085] In one embodiment, the housing of the pressure gauge 2 includes a cylindrical sidewall and an end wall that closes both ends of the cylindrical sidewall, and the end wall is provided with a plurality of air inlets; such as Figure 2 As shown, the gas transmission channel 4 includes a main gas transmission pipe 401 and multiple branch gas transmission pipes 402 connected to the main gas transmission pipe 401 and corresponding to the gas transmission ports. The branch gas transmission pipes 402 are connected to the corresponding gas transmission ports.

[0086] In this embodiment, all air inlets can be evenly distributed around the axis of the connecting channel 8. Multiple sets of air inlets can be provided, each set evenly distributed around the axis of the connecting channel 8. The radial distance between adjacent sets of air inlets can be the same or different. Deposits can form on the cylindrical sidewall and endwall of the pressure gauge 2. Since the exhaust channel 5 is connected to the connecting channel 8, the negative pressure is mainly formed at the connecting channel 8. Thus, the deposits separated by the separation structure are very easy to re-adhere to the endwall under negative pressure and are difficult to discharge. In this embodiment, the air supply branch pipe 402 is connected to the endwall, thereby blowing out the deposits adhering to the endwall, ensuring that the deposits can be completely discharged.

[0087] Another exemplary embodiment of this disclosure provides a cleaning control method for cleaning a pressure gauge 2 disposed on a reaction chamber 1. The pressure gauge 2 has a first inner cavity 202 communicating with the reaction chamber 1. Figure 4 The cleaning control method includes the following steps:

[0088] Step S100: Control the operation of the separation structure set on the outer wall of the pressure gauge so that the separation structure separates the deposits on the cavity wall of the first inner cavity of the pressure gauge from the cavity wall by means of heating and / or oscillation.

[0089] The separation structure 3 heats and vibrates the deposits on the wall of the first inner cavity 202. Heating reduces the tightness of the deposits, making them loose and easy to detach from the wall of the first inner cavity. Vibration can also cause the loose deposits to fall off the wall of the first inner cavity and into the cleaning gas.

[0090] In one embodiment, at least two separation structures 3 are provided, and the at least two separation structures 3 are arranged sequentially along the axial direction of the pressure gauge 2. Along the direction away from the reaction chamber 1, the heating temperature of different separation structures 3 is controlled to decrease sequentially, and the oscillation frequency of different separation structures 3 is controlled to decrease sequentially. By applying a higher heating temperature or a higher oscillation frequency to the cavity wall of the first inner cavity 202 near the reaction chamber 1 through the separation structures 3, the loosening or detachment rate of the sediment in that part is accelerated, avoiding the problem of incomplete cleaning of the sediment in that area due to insufficient heating temperature or oscillation frequency. At the same time, it can also be achieved that all separation structures 3 can simultaneously complete the cleaning of the sediment in the corresponding area on the cavity wall of the first inner cavity within the same preset time, thus achieving the purpose of improving the sediment cleaning efficiency.

[0091] For example, the heating part 301 may include a heating coil, and the oscillation part 302 may include an ultrasonic oscillation generator and an ultrasonic transducer 3021. The end of the ultrasonic transducer 3021 may be connected to a vibrating ring 3022. The heating part 301 heats the deposits in the pressure gauge 2, and the vibrating ring 3022 oscillates the deposits in the pressure gauge 2.

[0092] Step S200: Introduce cleaning gas into the first inner cavity.

[0093] For example, the cleaning gas can be one or more of nitrogen and inert gases to ensure that after the cleaning gas is introduced into the first inner cavity 202, the deposits in the first inner cavity 202 will not react chemically with the cleaning gas and will not cause chemical corrosion to the inner wall of the pressure gauge 2.

[0094] Step S300: Expel the cleaning gas carrying the deposits from the first inner cavity.

[0095] By cleaning the gas-loaded deposits, the detached deposits are carried away and introduced into the exhaust channel 5 with the cleaning gas, thereby removing the deposits in the pressure gauge 2.

[0096] In this embodiment, the deposits on the cavity wall of the first inner cavity 202 are heated and vibrated by the separation structure 3. Heating reduces the tightness of the deposits, making them loose. Furthermore, the loose deposits are detached from the cavity wall of the first inner cavity 202 by vibration and fall into the cleaning gas. The cleaning gas introduced into the first inner cavity 202 through the gas supply channel 4 acts as a carrier, carrying the detached deposits and feeding them into the exhaust channel 5, thus expelling the deposits from the first inner cavity 202. This achieves the purpose of cleaning the pressure gauge 2. The above cleaning process can be carried out periodically without disassembling the pressure gauge 2 or damaging its connection structure, saving the high costs required for replacing or sending the pressure gauge 2 for maintenance. In addition, it can achieve a good cleaning effect on the deposits attached to the inner wall of the cavity, ensuring the cleanliness of the cavity wall and avoiding the problem of long-term accumulation of deposits affecting the measurement accuracy of the pressure gauge 2.

[0097] In one embodiment, the heating temperature of the separation structure 3 is 70-110°C, and the oscillation frequency of the separation structure 3 is 65-130Hz.

[0098] In this embodiment, the heating temperature and oscillation frequency are set within the above-mentioned range, which can achieve the removal of deposits without damaging the internal components of the pressure gauge 2.

[0099] For example, the separation structure includes a first separation structure, a second separation structure, and a third separation structure, which are arranged sequentially in a direction away from the reaction chamber 1. The heating temperature of the first separation structure is 95-110°C and the oscillation frequency is 100-130Hz. The heating temperature of the second separation structure is 80-100°C and the oscillation frequency is 85-115Hz. The heating temperature of the third separation structure is 70-85°C and the oscillation frequency is 65-90Hz.

[0100] In an exemplary embodiment of this disclosure, such as Figure 5 As shown, step S100 includes the following steps:

[0101] Step S110: Control the separation structure to operate at the initial heating power and initial oscillation frequency.

[0102] For example, the initial heating power can be 2.0 to 3.0 kW, the corresponding initial heating temperature can be 70 to 100°C, and the initial oscillation frequency can be 65 to 95 Hz. By heating the deposits in the oscillation pressure gauge 2 with the initial heating power and initial oscillation frequency, when there are few deposits in the pressure gauge 2, the electrical energy consumed by the separation structure 3 can be saved while ensuring that the deposits are completely removed.

[0103] Step S120: After a preset time, obtain the sediment concentration information in the discharged cleaning gas.

[0104] For example, the preset duration can be 55–120 seconds, and the preset concentration can be set within the control module 7. The preset concentration is used for comparison with the sediment concentration, and the preset concentration can be 15–20 g / m³. 3 .

[0105] Step S130: Adjust the initial heating power and initial oscillation frequency of the separation structure based on the sediment concentration information.

[0106] For example, the adjustment of the initial heating power and initial oscillation frequency of the separation structure 3 includes positive feedback adjustment and negative feedback adjustment. When the sediment concentration is greater than the preset concentration, the initial heating power and initial oscillation frequency can be positively adjusted. Specifically, positive feedback adjustment can be achieved by increasing the heating power and oscillation frequency of the separation structure 3, thereby further improving the loosening rate and shedding rate of the sediment, and thus improving the cleaning efficiency of the sediment. When the sediment concentration is less than the preset concentration, the initial heating power and initial oscillation frequency can be negatively adjusted. Specifically, the separation structure 3 can be immediately shut down to stop the separation structure 3 from heating and oscillating the pressure gauge 2, or the separation structure 3 can be shut down after a delay. In this way, the residual sediment that has not detached in the pressure gauge 2 can be removed as much as possible before the separation structure 3 is shut down, thereby ensuring the cleaning effect.

[0107] In this embodiment, the initial heating power and initial oscillation frequency of the separation structure 3 are adjusted by detecting the concentration of deposits in the exhaust gas. When the deposits are not thoroughly cleaned, the heating power and oscillation frequency are increased to ensure the cleaning effect of the deposits. After the deposits are cleaned, the separation structure 3 can be shut down in time to reduce power consumption.

[0108] In an exemplary embodiment of this disclosure, such as Figure 6 As shown, step S130 includes the following steps:

[0109] Step S131: Obtain preset configuration information, which is used to characterize the correspondence between sediment concentration and heating power and oscillation frequency.

[0110] For example, the heating power can be 2.0 to 5.5 kW, and the oscillation frequency can be 65 to 130 Hz.

[0111] The correspondence can be shown in Table 1:

[0112]

[0113] Table 1. Correspondence between sediment concentration and heating power and oscillation frequency

[0114] Step S132: Based on sediment concentration information and preset configuration information, determine the target heating power and target oscillation frequency.

[0115] The target heating power and target oscillation frequency are shown in Table 1. When the sediment concentration is greater than 20 g / m³ 3 At this time, the heating power and oscillation frequency can be increased when the sediment concentration is 15-20 g / m³. 3 During this period, the heating power and oscillation frequency can be maintained at a low level when the sediment concentration is less than 15 g / m³. 3 When necessary, the separation structure can be shut down immediately or after a delay. When the separation structure is shut down with a delay, the heating power, oscillation frequency, and sediment concentration should be between 15 and 20 g / m³. 3 The heating power and oscillation frequency are the same during this period.

[0116] Step S133: Adjust the initial heating power and initial oscillation frequency of the separation structure based on the target heating power and target heating frequency.

[0117] For example, the initial heating power and initial oscillation frequency can be adjusted by changing the input voltage to the heating unit and the oscillation unit.

[0118] In this embodiment, the initial heating power and initial oscillation frequency of the separation structure are adjusted. When the sediment is not thoroughly cleaned, the heating power and oscillation frequency are increased to the target heating power and target oscillation frequency to improve the loosening efficiency and shedding rate of the sediment. When the sediment is thoroughly cleaned, the separation structure is shut down or shut down with a delay to reduce power consumption.

[0119] The various embodiments or implementation methods described in this specification are presented in a progressive manner. Each embodiment focuses on the differences from other embodiments, and the same or similar parts between the embodiments can be referred to each other.

[0120] In the description of this specification, references to the terms "embodiment," "exemplary embodiment," "some implementation," "illustrated implementation," "example," etc., refer to specific features, structures, materials, or characteristics described in connection with an implementation or example that are included in at least one implementation or example of this disclosure.

[0121] In this specification, the illustrative expressions of the terms used do not necessarily refer to the same implementation or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more implementations or examples.

[0122] In the description of this disclosure, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this disclosure.

[0123] It is understood that the terms "first," "second," etc., as used in this disclosure may be used to describe various structures, but these structures are not limited by these terms. These terms are only used to distinguish one structure from another.

[0124] In one or more accompanying drawings, the same elements are represented by similar reference numerals. For clarity, many parts in the drawings are not drawn to scale. Furthermore, certain well-known parts may not be shown. For simplicity, a structure obtained after several steps may be depicted in a single drawing. Many specific details of this disclosure, such as the structure, materials, dimensions, processing methods, and techniques of the devices, are described below to provide a clearer understanding of the disclosure. However, as those skilled in the art will understand, this disclosure may be implemented without adhering to these specific details.

[0125] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this disclosure, and are not intended to limit them. Although this disclosure has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this disclosure.

Claims

1. A cleaning device for cleaning a pressure gauge disposed on a reaction chamber, the pressure gauge having a first inner cavity communicating with the reaction chamber, characterized in that, The cleaning device includes: A separation structure is disposed on the outer wall of the pressure gauge. The separation structure is used to separate the deposits on the cavity wall of the first inner cavity from the cavity wall by means of heating and oscillation. A gas delivery channel, connected to the first inner cavity, is used to introduce cleaning gas into the first inner cavity; An exhaust channel, connected to the first inner cavity, is used to discharge the cleaning gas carrying the deposits out of the first inner cavity; The first inner cavity is provided with at least two of the separation structures. Along the direction away from the reaction chamber, the heating temperature of each of the separation structures provided with respect to the first inner cavity decreases sequentially, and the oscillation frequency of each of the separation structures provided with respect to the first inner cavity decreases sequentially. The pressure gauge is a spring-loaded capacitive pressure gauge. The pressure gauge includes a housing and a deformable diaphragm and a fixed diaphragm disposed inside the housing and spaced apart along the axial direction. The space formed by the deformable diaphragm surface near the reaction chamber and the housing constitutes the first inner cavity. The space formed by the deformable diaphragm surface away from the reaction chamber and the fixed diaphragm and the housing constitutes the second inner cavity. The second inner cavity is provided with at least one of the separation structures.

2. The cleaning device according to claim 1, characterized in that, At least two of the separation structures are arranged sequentially along the axial direction of the pressure gauge.

3. The cleaning device according to claim 2, characterized in that, Each of the separation structures includes at least two heating elements and at least one oscillating element, with the heating elements and the oscillating elements arranged alternately.

4. The cleaning apparatus according to any one of claims 1-3, characterized in that, The cleaning device also includes: A detection module, wherein the detection end of the detection module is connected to the exhaust channel, and is used to detect the concentration of deposits in the cleaning gas from the exhaust channel; A control module is connected to the detection module, and the control module is used to adjust the working state of the separation structure according to the detection results of the detection module.

5. The cleaning apparatus according to any one of claims 1-3, characterized in that, The pressure gauge is connected to the reaction chamber via a connecting channel, and the exhaust channel is connected to the connecting channel; or... The reaction chamber forms at least a part of the exhaust channel, through which the cleaning gas carrying the deposits is discharged.

6. The cleaning apparatus according to claim 5, characterized in that, The cleaning device also includes an air extraction device, which is connected to the exhaust channel.

7. The cleaning apparatus according to claim 6, characterized in that, The reaction chamber includes a vacuum port, which is connected to a vacuum pump via a vacuum pipeline. The vacuum pump constitutes the gas extraction device.

8. The cleaning apparatus according to claim 5, characterized in that, When the pressure gauge is connected to the reaction chamber via a connecting channel, and the exhaust channel is connected to the connecting channel, a control valve is provided between the reaction chamber and the connecting channel.

9. The cleaning apparatus according to any one of claims 1-3, characterized in that, The pressure gauge housing includes a cylindrical sidewall and an end wall that closes both ends of the cylindrical sidewall, and the end wall is provided with a plurality of air inlets. The gas transmission channel includes a main gas transmission pipe and a plurality of branch gas transmission pipes connected to the main gas transmission pipe and corresponding to the gas transmission ports one by one. The branch gas transmission pipes are connected to the corresponding gas transmission ports.

10. A cleaning control method for cleaning a pressure gauge disposed on a reaction chamber, the pressure gauge having a first inner cavity communicating with the reaction chamber, characterized in that, The pressure gauge is a spring-loaded capacitive pressure gauge. The pressure gauge includes a housing and a deformable diaphragm and a fixed diaphragm disposed inside the housing and spaced apart along the axial direction. The space formed by the deformable diaphragm surface near the reaction chamber and the housing constitutes the first inner cavity. The space formed by the deformable diaphragm surface away from the reaction chamber and the fixed diaphragm and the housing constitutes the second inner cavity. The second inner cavity is provided with at least one separation structure; the cleaning control method includes: The separation structure installed on the outer wall of the pressure gauge is controlled to operate so that the separation structure separates the deposits on the cavity wall of the first inner cavity from the cavity wall by means of heating and oscillation; Cleaning gas is introduced into the first inner cavity; The cleaning gas carrying the deposits in the first inner cavity is discharged from the first inner cavity; The first inner cavity is provided with at least two of the separation structures, and the control of the separation structures disposed on the outer wall of the pressure gauge includes: Along the direction away from the reaction chamber, the heating temperature of the different separation structures is controlled to decrease sequentially, and the oscillation frequency of the different separation structures is controlled to decrease sequentially. The cleaning control method further includes: performing an oscillation treatment on the separation structure corresponding to the second inner cavity.

11. The cleaning control method according to claim 10, characterized in that, At least two of the separation structures are arranged sequentially along the axial direction of the pressure gauge.

12. The cleaning control method according to claim 11, characterized in that, The control mechanism, located on the outer wall of the pressure gauge, operates as follows: The separation structure is controlled to operate at an initial heating power and an initial oscillation frequency; After a preset time period, the concentration information of sediments in the discharged cleaning gas is obtained; Based on the sediment concentration information, the initial heating power and initial oscillation frequency of the separation structure are adjusted.

13. The cleaning control method according to claim 12, characterized in that, The step of adjusting the initial heating power and initial oscillation frequency of the separation structure based on the sediment concentration information includes: Obtain preset configuration information, which is used to characterize the correspondence between sediment concentration and heating power and oscillation frequency; Based on the sediment concentration information and the preset configuration information, the target heating power and the target oscillation frequency are determined; Based on the target heating power and target heating frequency, the initial heating power and initial oscillation frequency of the separation structure are adjusted.

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