Color filter substrate and its preparation method, and display panel

Abstract

This disclosure provides a color filter substrate, a method for fabricating the same, and a display device. The color filter substrate includes a substrate; a first black matrix located on the substrate; and a second black matrix partially overlapping the first black matrix, wherein at the overlap position of the first black matrix and the second black matrix, the second black matrix covers the first black matrix in a direction perpendicular to the substrate, and wherein the size of an opening defined by either the first black matrix or the second black matrix is ​​larger than the size of an opening jointly defined by the first black matrix and the second black matrix.

Description

Technical Field

[0001] This disclosure relates to the field of display technology, and in particular to a color filter substrate, a method for preparing a color filter substrate, and a display panel. Background Technology

[0002] The development of the display panel industry has driven its widespread application in electronic products such as computers, televisions, mobile phones, digital cameras, camcorders, mobile multimedia, and advertising displays. In this information age, display panels have become a core force in the electronics industry. To achieve a better user experience, the PPI (pixels per inch) of display panels is constantly increasing. Especially with the arrival of the metaverse era, ultra-high PPI products are becoming increasingly popular with consumers. Summary of the Invention

[0003] The embodiments of this disclosure provide a color filter substrate and a method for preparing the same, as well as a display panel.

[0004] According to one aspect of this disclosure, a color filter substrate is provided, which may include a substrate; a first black matrix located on the substrate; and a second black matrix that partially overlaps with the first black matrix, wherein, at the overlap position of the first black matrix and the second black matrix, the second black matrix covers the first black matrix in a direction perpendicular to the substrate, and wherein the size of an opening defined by either the first black matrix or the second black matrix is ​​larger than the size of an opening jointly defined by the first black matrix and the second black matrix.

[0005] In some embodiments of the color filter substrate disclosed herein, the orthographic projection of the first black matrix on the substrate and the orthographic projection of the second black matrix on the substrate together form a grid pattern.

[0006] In some embodiments of the color filter substrate disclosed herein, the first black matrix may include at least a plurality of first black matrix strips extending along a first direction, and the second black matrix may include at least a plurality of second black matrix strips extending along a second direction different from the first direction and intersecting with the plurality of first black matrix strips, wherein the overlapping position of the first black matrix and the second black matrix may include the intersection position of the plurality of first black matrix strips and the plurality of second black matrix strips.

[0007] In some embodiments of the color filter substrate disclosed herein, the interval between two adjacent first black matrix bars in the plurality of first black matrix bars may be smaller than the interval between two adjacent second black matrix bars in the plurality of second black matrix bars, and wherein the width of each first black matrix bar may be smaller than the width of each second black matrix bar.

[0008] In some embodiments of the color filter substrate disclosed herein, the thickness of the first black matrix may be greater than the thickness of the portion of the second black matrix that overlaps with the first black matrix, but less than the thickness of the portion of the second black matrix that does not overlap with the first black matrix.

[0009] In some embodiments of the color filter substrate disclosed herein, the first black matrix has a thickness of 0.9-1.1 μm; the second black matrix has a thickness of 0.5-0.6 μm at the overlapping position with the first black matrix; and the second black matrix has a thickness of 1.1-1.3 μm at the non-overlapping position with the first black matrix.

[0010] In some embodiments of the color filter substrate disclosed herein, the second black matrix may further include a plurality of third black matrix strips extending along the first direction and intersecting with the plurality of second black matrix strips, wherein the plurality of third black matrix strips may be distributed among the plurality of first black matrix strips such that there is at least one first black matrix strip between two adjacent third black matrix strips.

[0011] In some embodiments of the color filter substrate disclosed herein, the plurality of third black matrix strips and the plurality of first black matrix strips may be arranged alternately such that there is a first black matrix strip between two adjacent third black matrix strips.

[0012] In some embodiments of the color filter substrate disclosed herein, the distance between the first black matrix strip and the adjacent third black matrix strip may be less than the distance between two adjacent second black matrix strips, and the first black matrix strip and the third black matrix strip may have substantially the same width and their width is less than the width of the second black matrix strip.

[0013] In some embodiments of the color filter substrate disclosed herein, the first black matrix may further include a plurality of fourth black matrix strips extending along the second direction and intersecting with the plurality of first black matrix strips, wherein the plurality of fourth black matrix strips may be distributed among the plurality of second black matrix strips, such that there may be at least one second black matrix strip between two adjacent fourth black matrix strips.

[0014] In some embodiments of the color filter substrate disclosed herein, the plurality of fourth black matrix strips may be arranged alternately with the plurality of second black matrix strips such that there may be a second black matrix strip between two adjacent fourth black matrix strips.

[0015] In some embodiments of the color filter substrate disclosed herein, the fourth black matrix strip and the second black matrix strip may have substantially the same width and their width is greater than that of the first black matrix strip.

[0016] In some embodiments of the color filter substrate disclosed herein, the first black matrix may include a plurality of first black matrix strips extending along a first direction and a plurality of fourth black matrix strips extending along a second direction different from the first direction, and the second black matrix may include a plurality of third black matrix strips extending along the first direction, wherein the plurality of third black matrix strips and the plurality of first black matrix strips may be arranged alternately such that there is a first black matrix strip between two adjacent third black matrix strips.

[0017] In some embodiments of the color filter substrate disclosed herein, the thickness of the portion of the second black matrix that overlaps with the first black matrix may be less than the thickness of the portion of the second black matrix that does not overlap with the first black matrix.

[0018] In some embodiments of the color filter substrate disclosed herein, the color filter substrate may further include a color resist layer, which may include a first color resist, a second color resist, and a third color resist arranged alternately in the second direction.

[0019] In some embodiments of the color filter substrate disclosed herein, at the overlapping position of the second black matrix and the first black matrix, the second black matrix is ​​in direct contact with the first black matrix, and wherein, at the non-overlapping position of the first black matrix and the second black matrix, the second black matrix may be coplanar with the first black matrix.

[0020] In some embodiments of the color filter substrate disclosed herein, at least one of the first black matrix and the second black matrix may include a plurality of black matrix strips extending along the first direction, and the color resist layer may be located in an opening defined by the first black matrix and the second black matrix and at least partially overlap with the plurality of black matrix strips in a direction perpendicular to the substrate.

[0021] In some embodiments of the color filter substrate disclosed herein, an intermediate layer is provided between the first black matrix and the second black matrix at the overlapping location, wherein the intermediate layer may include the color resist layer.

[0022] In some embodiments of the color filter substrate disclosed herein, at least one of the first black matrix and the second black matrix may include a plurality of black matrix strips extending along the first direction, and the color resist layer may fill the opening defined by the first black matrix and at least partially overlap the plurality of black matrix strips in a direction perpendicular to the substrate.

[0023] In some embodiments of the color filter substrate disclosed herein, the overlap between adjacent color filters among the first, second, and third color filters may be 0, but a certain margin is allowed.

[0024] In some embodiments of the color filter substrate disclosed herein, the margin can be 0-±0.6μm.

[0025] In another aspect of this disclosure, a substrate is provided for use in preparing a color filter substrate according to one or more embodiments of this disclosure, the substrate including an overlap detection identifier configured to detect overlap deviations between one of the first, second, and third color resists and the plurality of black matrix bars, and between adjacent color resists among the first, second, and third color resists.

[0026] In some embodiments of the substrate disclosed herein, the overlap detection identifier may include: a first reference identifier adapted to detect the overlap deviation of the first color resist relative to the first black matrix; a first detection identifier adapted to compare its position with the position of the first reference identifier to determine the overlap deviation of the first color resist relative to the first black matrix; a second reference identifier adapted to detect the overlap deviation of the second color resist relative to the first color resist and the third color resist relative to the first color resist; a second detection identifier adapted to compare its position with the position of the second reference identifier to determine the overlap deviation of the second color resist relative to the first color resist; a third reference identifier adapted to detect the overlap deviation of the third color resist relative to the second color resist; and a third detection identifier adapted to compare its position with the positions of the second reference identifier and the third reference identifier to determine the overlap deviation of the third color resist relative to the first color resist and the second color resist.

[0027] In some embodiments of the substrate disclosed herein, the first reference identifier is formed of the same material as the first black matrix; the first detection identifier and the second reference identifier are formed of the same material as the first color resist; the second detection identifier and the third reference identifier are formed of the same material as the second color resist; and the third detection identifier is formed of the same material as the third color resist.

[0028] In some embodiments of the substrate disclosed herein, the first reference mark, the second reference mark, and the third reference mark are hollow rectangles, the first detection mark, the second detection mark, and the third detection mark are solid rectangles, and the first detection mark, the second detection mark, and the third detection mark are respectively located in the first reference mark, the second reference mark, and the third reference mark.

[0029] In another aspect of this disclosure, a display panel is provided, which may include: a color filter substrate, the color filter substrate may include a first substrate and a first black matrix located on the first substrate, the first black matrix including a plurality of first black matrix strips extending along a first direction; and an array substrate, the array substrate may include a second substrate and a second black matrix located on the second substrate, the second black matrix including a plurality of second black matrix strips extending along a second direction different from the first direction, the orthographic projection of the first black matrix on the first substrate and the orthographic projection of the second black matrix on the first substrate together form a grid pattern.

[0030] In some embodiments of the display panel disclosed herein, the array substrate may further include a plurality of thin-film transistors located on the side of the second black matrix away from the second substrate, wherein the orthographic projection of the active layer of the plurality of thin-film transistors on the second substrate may be located within the orthographic projection of the plurality of second black matrix strips on the second substrate, such that the plurality of second black matrix strips are multiplexed as a first light-shielding portion that blocks light incident on the active layer.

[0031] In some embodiments of the display panel disclosed herein, the color filter substrate may further include a color resist layer, which may be located in an opening defined by the first black matrix and at least partially overlap with the plurality of first black matrix strips in a direction perpendicular to the color filter substrate.

[0032] In some embodiments of the display panel disclosed herein, the color resist layer may include a first color resist, a second color resist, and a third color resist, wherein the overlap between adjacent color resists among the first color resist, the second color resist, and the third color resist is 0, but a certain margin is allowed.

[0033] In some embodiments of the display panel disclosed herein, the color filter substrate may further include a plurality of spacers configured to space the color filter substrate and the array substrate, and the array substrate further includes a plurality of bosses configured to be abutted against by one or more of the plurality of spacers, the orthographic projection of the plurality of bosses on the second substrate being located within the orthographic projection of the plurality of second black matrix strips on the second substrate.

[0034] In some embodiments of the display panel disclosed herein, each of the plurality of second black matrix bars includes at least one first segment having a first width in the first direction, at least one second segment having a second width in the first direction, and at least one third segment having a third width in the first direction, wherein the first width is greater than the second width, and the second width is greater than the third width.

[0035] In some embodiments of the display panel disclosed herein, the orthographic projection of the at least one first segment on the second substrate overlaps with the orthographic projection of the plurality of protrusions on the second substrate, and each first segment spans two adjacent color resists in the color resist layer along the second direction, wherein each second segment spans one color resist in the color resist layer along the second direction, the one color resist being one of the two adjacent color resists, and each first segment of one of the two adjacent second black matrix strips is aligned with two second segments of the other of the two adjacent second black matrix strips in the first direction, and wherein each third segment spans another color resist in the color resist layer along the second direction, the other color resist being different from the two adjacent color resists, and the third segment of one of the two adjacent second black matrix strips is aligned with the third segment of the other of the two adjacent second black matrix strips in the first direction.

[0036] In some embodiments of the display panel disclosed herein, each of the plurality of second black matrix bars further has a fourth segment located between adjacent second segments, the fourth segment having a fourth width along the first direction, the fourth width being substantially equal to 0 μm.

[0037] In some embodiments of the display panel disclosed herein, the array substrate further includes: a plurality of first electrodes located on the side of the plurality of thin-film transistors away from the second substrate, the plurality of first electrodes being electrically connected to the drain electrodes of the plurality of thin-film transistors respectively; a second electrode layer located on the side of the plurality of first electrodes away from the second substrate and electrically insulated from the plurality of first electrodes; and a plurality of second light-shielding portions electrically contacting the second electrode layer and extending along the first direction, wherein the orthographic projection of the plurality of second light-shielding portions on the second substrate overlaps with the orthographic projection of the plurality of first black matrix strips on the second substrate.

[0038] In some embodiments of the display panel disclosed herein, the second light-shielding portion is located on the side of the second electrode layer away from the second substrate or on the side of the second electrode layer closer to the second substrate.

[0039] In some embodiments of the display panel disclosed herein, at least one of the plurality of second light-shielding portions is disconnected at a location where it intersects with the plurality of first segments.

[0040] In another aspect of this disclosure, another display panel is provided, including a color filter substrate as described in one or more embodiments herein relating to a color filter substrate.

[0041] In another aspect of this disclosure, a method for preparing a color filter substrate according to one or more embodiments thereof is provided. The method may include: providing a substrate; forming a first black matrix on the substrate; and forming a second black matrix, wherein the second black matrix overlaps with the first black matrix, and at the overlap position of the first black matrix and the second black matrix, the second black matrix covers the first black matrix in a direction perpendicular to the substrate, and wherein the size of an opening defined by either the first black matrix or the second black matrix is ​​larger than the size of an opening jointly defined by the first black matrix and the second black matrix. In an embodiment of the method relating to the fabrication of a color filter substrate, at the overlapping position of the second black matrix and the first black matrix, the second black matrix is ​​in direct contact with the first black matrix, wherein at the non-overlapping position of the first black matrix and the second black matrix, the first black matrix and the second black matrix may be coplanar, wherein at least one of the first black matrix and the second black matrix may include a plurality of black matrix strips extending along the first direction, and wherein the method may further include forming a color resist layer on the first black matrix and the second black matrix such that the color resist layer is located in an opening jointly defined by the first black matrix and the second black matrix and at least partially overlaps with the plurality of black matrix strips in a direction perpendicular to the substrate.

[0042] In an embodiment involving a method for fabricating a color filter substrate, an intermediate layer is provided between the first black matrix and the second black matrix at the overlapping location, wherein the intermediate layer may include a color resist layer, wherein at least one of the first black matrix and the second black matrix may include a plurality of black matrix strips extending along the first direction, and wherein, between forming the first black matrix and forming the second black matrix, the method may further include: forming the color resist layer on the first black matrix such that the color resist layer fills the opening region defined by the first black matrix and at least partially overlaps the plurality of black matrix strips in a direction perpendicular to the substrate.

[0043] In an embodiment involving a method for fabricating a color filter substrate, the color resist layer may include a first color resist, a second color resist, and a third color group arranged alternately in a second direction. Forming the first black matrix on the substrate may include: forming the first black matrix and a first reference mark on the substrate. The first reference mark may be adapted to detect the overlap deviation of the first color resist relative to the first black matrix. Forming the color resist layer includes: forming the first color resist, a first detection mark, and a second reference mark. The first detection mark is adapted to compare its position with the position of the first reference mark to determine the overlap deviation of the first color resist relative to the first black matrix, and the second reference mark is adapted to... The method involves detecting the overlap deviation of the second color resist relative to the first color resist and the third color resist relative to the first color resist; forming the second color resist, a second detection mark, and a third reference mark, wherein the second detection mark is adapted to compare its position with the position of the second reference mark to determine the overlap deviation of the second color resist relative to the first color resist, and the third reference mark is adapted to detect the overlap deviation of the third color resist relative to the second color resist; and forming the third color resist and the third detection mark, wherein the third detection mark is adapted to compare its position with the positions of the second reference mark and the third reference mark to determine the overlap deviation of the third color resist relative to the first color resist and the second color resist.

[0044] In an embodiment involving a method for preparing a color filter substrate, the first reference mark may be formed of the same material as the first black matrix; the first detection mark and the second reference mark may be formed of the same material as the first color resist; the second detection mark and the third reference mark may be formed of the same material as the second color resist; and the third detection mark may be formed of the same material as the third color resist.

[0045] In an embodiment involving a method for preparing a color filter substrate, the first reference mark, the second reference mark, and the third reference mark may be hollow rectangles, the first detection mark, the second detection mark, and the third detection mark may be solid rectangles, and the first detection mark, the second detection mark, and the third detection mark may be located in the first reference mark, the second reference mark, and the third reference mark, respectively.

[0046] Further aspects and scope of adaptation become apparent from the description provided herein. It should be understood that various aspects of this application may be implemented individually or in combination with one or more other aspects. It should also be understood that the description and specific embodiments herein are for illustrative purposes and are not intended to limit the scope of this application. Attached Figure Description

[0047] The accompanying drawings described herein are for illustrative purposes only, and do not represent all possible implementations, and are not intended to limit the scope of this application, wherein:

[0048] Figure 1A A schematic top view of a black matrix in the related art is shown;

[0049] Figure 1B and Figure 1C Each is shown schematically Figure 1A Top view and cross-sectional view of the black matrix along lines AA' and BB';

[0050] Figure 2A This is a schematic diagram of the exposure and development process of the black matrix in a large aperture, low PPI display panel.

[0051] Figure 2B This is a schematic diagram of the exposure and development process of the black matrix in a small-aperture, high-PPI display panel.

[0052] Figure 2C The diagram schematically illustrates the BM residue within the opening of the black matrix in a small-aperture high-PPI display panel.

[0053] Figure 3 A schematic plan view of a color filter substrate in one or more embodiments of this disclosure is shown.

[0054] Figure 4A The diagram schematically illustrates a plan view of a first black matrix, a second black matrix, and a combined black matrix formed by the first black matrix and the second black matrix in an embodiment of this disclosure;

[0055] Figure 4B schematically shown Figure 4A A cross-sectional view of the combined black matrix along line CC' in the diagram;

[0056] Figure 5A A schematic plan view of a first black matrix, a second black matrix, and a combined black matrix formed by the first black matrix and the second black matrix of another color filter substrate according to one or more embodiments of the present disclosure is shown.

[0057] Figure 5B schematically shown Figure 12 Cross-sectional view of the combined black matrix in A along line DD';

[0058] Figure 5C schematically shown Figure 12 A cross-sectional view of the combined black matrix in A along line EE';

[0059] Figure 6AThe diagram schematically illustrates a plan view of a first black matrix, a second black matrix, and a combined black matrix BM formed by the first black matrix and the second black matrix in one or more embodiments of the present disclosure.

[0060] Figure 6B schematically shown Figure 6A A cross-sectional view of the combined black matrix along line FF' in the diagram;

[0061] Figure 6C schematically shown Figure 6A A cross-sectional view of the combined black matrix along line GG' in the diagram;

[0062] Figure 7A The diagram schematically illustrates a plan view of a first black matrix, a second black matrix, and a combined black matrix BM formed by the first black matrix and the second black matrix in one or more embodiments of the present disclosure.

[0063] Figure 7B schematically shown Figure 7A A cross-sectional view of the combined black matrix along line HH' in the diagram;

[0064] Figure 8A The arrangement of the color resist layer relative to the black matrix is ​​schematically shown in one or more embodiments of this disclosure;

[0065] Figure 8B schematically showing along Figure 8A Cross-sectional view of line II' in the middle;

[0066] Figure 9A and Figure 9B Electron micrographs of the angles between adjacent color resists are shown, with a large degree of overlap and with almost no overlap, respectively.

[0067] Figure 10A and 10B Cross-sectional views of color filter substrates are schematically shown for cases where there is a large degree of overlap between adjacent color filters and cases where there is virtually no overlap.

[0068] Figure 11A A schematic plan view of another color filter substrate in one or more embodiments of the present disclosure is shown, in which another arrangement of the color resist layer relative to the first black matrix BM1 and the second black matrix BM2 is shown.

[0069] Figure 11B Show along Figure 11A A cross-sectional view of line JJ' of the color filter substrate;

[0070] Figure 11C schematically shown Figure 11A A diagram illustrating the fabrication process of the color filter substrate;

[0071] Figure 12 The overlap detection identifier is illustrated schematically in one or more embodiments of this disclosure;

[0072] Figure 13A Alignment identifiers are schematically shown in one or more embodiments of this disclosure;

[0073] Figure 13B The distribution of alignment identifiers in one or more embodiments of this disclosure is illustrated schematically;

[0074] Figure 14A Alignment detection identifiers are schematically shown in one or more embodiments of this disclosure;

[0075] Figure 14B The distribution of alignment detection identifiers in one or more embodiments of this disclosure is illustrated schematically;

[0076] Figure 15 A block diagram schematically illustrating a display panel in one or more embodiments of the present disclosure;

[0077] Figure 16 Schematic illustration for use Figure 15 A cross-sectional view of an exemplary array substrate of the display panel shown;

[0078] Figure 17 A cross-sectional view of another display panel in one or more embodiments of the present disclosure is schematically shown;

[0079] Figure 18 schematically shown Figure 17 A top view of the arrangement of the first black matrix, the second black matrix, and the combined black matrix behind the box on the display panel shown;

[0080] Figure 19 schematically shown Figure 17 A top view of another arrangement of the first black matrix, the second black matrix, and the combined black matrix behind the box in the display panel shown;

[0081] Figure 20 A flowchart illustrating a method for preparing a color filter substrate according to a first or one embodiment of this disclosure is shown schematically;

[0082] Figure 21 The flowchart illustrating the formation of a color resist layer according to one or more embodiments of the present disclosure is shown schematically.

[0083] Figure 22 A cross-sectional view of an example array substrate of another display panel in one or more embodiments of the present disclosure is schematically shown;

[0084] Figure 23The illustration schematically shows a cross-sectional view of another exemplary array substrate of another display panel in one or more embodiments of the present disclosure;

[0085] Figure 24 A top view schematically illustrating an exemplary array substrate of another display panel in one or more embodiments of the present disclosure; and

[0086] Figure 25 The diagram illustrates the correspondence between the first segment S1, the second segment S2, and the third segment S3 and examples of various color resists in the color resist layer.

[0087] Throughout the various views of these accompanying drawings, corresponding reference numerals indicate the respective parts or features. Detailed Implementation

[0088] Various embodiments will now be described in detail with reference to the accompanying drawings, which are provided as exemplary examples of this disclosure to enable those skilled in the art to implement this disclosure.

[0089] It is important to note that the following figures and examples are not intended to limit the scope of this disclosure. Where specific elements of this disclosure can be partially or wholly implemented using known components (or methods or processes), only those portions of such known components (or methods or processes) necessary for understanding this disclosure will be described, and detailed descriptions of other portions of such known components will be omitted so as not to obscure this disclosure. Furthermore, various embodiments include, by way of illustration, present and future known equivalents to the components involved herein.

[0090] Unless otherwise expressly indicated by the context, the singular form of words used herein and in the appended claims includes the plural form, and vice versa. Thus, when referring to the singular, the plural form of the corresponding term is generally included. Similarly, the terms “comprising,” “including,” “containing,” and “having,” and their grammatical variations, are intended to be inclusive and indicate that additional elements may exist besides those listed. Where the term “example” is used herein, particularly when it follows a set of terms, the “example” is merely exemplary and illustrative and should not be considered exclusive or extensive.

[0091] As used herein, the term "on" does not refer to a specific geometric orientation of the final stack in the color filter substrate or display panel relative to the direction of gravity, but rather indicates the manner in which the stack is manufactured, and which, after manufacturing, can generally be placed in any geometric orientation, such as inverted. The terms "first," "second," "third," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or order of formation.

[0092] The black matrix (BM) is an essential component of a display panel. The black matrix separates pixels in different rows and columns using intersecting black matrix bars to prevent color mixing between pixels and to obscure components on the display panel that are not intended to be seen by the user, such as signal lines and spacers. Figure 1A A schematic top view of a black matrix in the related art is shown; Figure 1B and Figure 1C Each is shown schematically Figure 1A The top view and cross-sectional view of the black matrix along lines AA' and BB'. (See attached image.) Figure 1A As shown, the black matrix includes multiple horizontal BM 11s (whose extension direction can be consistent with the extension direction of the gate lines of the display panel, and therefore can also be called gate-to-BM) and multiple vertical BM 12s (whose extension direction can be consistent with the extension direction of the data lines of the display panel, and therefore can also be called data-to-BM). Figure 1B and Figure 1C As shown, the horizontal BM 11 and the vertical BM 12 have the same thickness. At the intersection of the horizontal BM 11 and the vertical BM 12, the horizontal BM 11 and the vertical BM 12 share the same thickness, that is, the thickness of the black matrix is ​​the same as the thickness of either the horizontal BM 11 or the vertical BM 12.

[0093] In the fabrication of such a black matrix, the pattern is typically integrally formed onto the substrate through processes such as coating, exposure, development, and baking. However, as the PPI of display panels increases, the aperture size of the black matrix pattern becomes smaller, resulting in a smaller development margin. A longer development time can cause the black matrix pattern to detach, while a shorter development time can result in BM residue within the apertures of the black matrix pattern.

[0094] It should be noted that the terms "horizontal" and "vertical" in this article are relative to the orientation of the display panel. When the display panel is rotated (e.g., rotated 90 degrees), "horizontal" and "vertical" can be interchanged, that is, "horizontal" can become "vertical" and "vertical" can become "horizontal".

[0095] Figure 2A This is a schematic diagram of the exposure and development process of the black matrix in a large aperture, low PPI display panel. Figure 2B This is a schematic diagram of the exposure and development process of the black matrix in a small-aperture, high-PPI display panel; and Figure 2C This schematically illustrates the BM residue within the opening of the black matrix in a small-aperture, high-PPI display panel. (Example:) Figure 2AAs shown, for display panels with large apertures and low PPI, the aperture size of the black matrix is ​​relatively large. During the development process, the BM material in the aperture is easily carried out of the aperture by the developing solution (e.g., Figure 2A (As shown by the straight arrow). Figure 2B As shown, for high PPI display panels with small apertures, the aperture size of the black matrix is ​​relatively small. During the development process, the BM material in the aperture is not easily carried out of the aperture by the developing solution, resulting in some BM material remaining in the aperture and forming BM residue (e.g., Figure 2C (As shown).

[0096] Taking a 1200 PPI display panel as an example, the pixel size of this display panel is approximately 7.1μm * 21.3μm, the width from the Data Point to the Microblading (BM) is approximately 3.0μm, the width from the Gate to the BM is approximately 7.2μm, and the BM aperture size is 4.1μm * 14.1μm. With this aperture size, BM residue is unavoidable. Typically, the number of BM residues on a single panel is greater than two, resulting in a half-pixel dark spot defect rate, for example, greater than 10%, which severely impacts product yield.

[0097] Therefore, there is a need for a color filter substrate that can reduce or even eliminate BM residue, a method for preparing the color filter substrate, and a display panel.

[0098] In one or more embodiments of this disclosure, a color filter substrate is provided, including a substrate; a first black matrix located on the substrate; and a second black matrix partially overlapping the first black matrix. At the overlap position of the first and second black matrices, the second black matrix covers the first black matrix. The size of an opening defined by either the first or second black matrix is ​​larger than the size of an opening jointly defined by the first and second black matrices.

[0099] As used herein, “opening” is a broad term and should be given a meaning common and customary to those skilled in the art, and not limited to a particular or customary meaning. The term can refer to a closed region surrounded by black matrix strips on all sides, or it can include an open region defined by two black matrix strips extending in substantially the same or similar directions. In the latter case, the opening can correspond to the area between the two black matrix strips. Accordingly, “the size of the opening” can refer to the area of ​​the closed region when the opening is closed, or the area of ​​the area between the two black matrix strips when the opening is open.

[0100] In one or more embodiments of this disclosure, the orthographic projections of the first black matrix onto the substrate and the second black matrix onto the substrate can together form a grid pattern. The size of an opening defined by either the first black matrix or the second black matrix can be larger than the size of an opening in the grid pattern.

[0101] In embodiments of this disclosure, the black matrix of the color filter substrate can be formed by combining a first black matrix and a second black matrix with a larger aperture size, rather than being integrally formed. Thus, when fabricating the black matrix of the color filter substrate, the first black matrix and the second black matrix can be fabricated separately in two separate steps. Since the first black matrix and the second black matrix have larger aperture sizes than the resulting black matrix, it is less likely that BM residue will remain in the apertures during the fabrication of the first black matrix and the second black matrix. Therefore, no BM residue (located in the apertures of the resulting black matrix) will be present in the apertures. Figure 2B (The black dot inside the ellipse).

[0102] As used herein, the term "overlap" is a broad term and should be given the meaning common and customary to those skilled in the art, and not limited to a specific or customary meaning. Specifically, the term can refer to a situation where component A is directly stacked on component B without any intermediate layer between them, or to a situation where component A is indirectly stacked on component B with one or more intermediate layers between them. Similarly, the term "cover" is a broad term and should be given the meaning common and customary to those skilled in the art, and not limited to a specific or customary meaning. Specifically, the term can refer to a situation where component A directly contacts component B, or to a situation where component A indirectly contacts component B.

[0103] Figure 3 A schematic plan view of a color filter substrate according to one or more embodiments of this disclosure is shown. Figure 3 As shown, the color filter substrate includes a substrate 301; a first black matrix BM1 located on the substrate 301; and a second black matrix BM2 partially overlapping the first black matrix BM1. At the overlap position 302 of the first black matrix BM1 and the second black matrix BM2, the first black matrix BM1 covers the second black matrix BM2. The size of the opening defined by either the first black matrix BM1 or the second black matrix BM2 is larger than the size of the opening jointly defined by the first black matrix BM1 and the second black matrix BM2.

[0104] The various components of the color filter substrate provided in the embodiments of this disclosure will be described in detail below with reference to the accompanying drawings.

[0105] First black matrix BM1 and second black matrix BM2

[0106] Figure 4A The diagram schematically illustrates a plan view of a first black matrix BM1, a second black matrix BM2, and a combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2 in an embodiment of the present disclosure. Figure 4B schematically shown Figure 4A A cross-sectional view of the combined black matrix BM along line CC'.

[0107] like Figure 4A As shown, the first black matrix BM1 may include a plurality of first black matrix strips BM11 extending along a first direction (shown as longitudinal in the figures), and the second black matrix BM2 may include a plurality of second black matrix strips BM21 extending along a second direction (shown as transverse in the figures). The plurality of second black matrix strips BM21 intersect the plurality of first black matrix strips BM11. The overlap position 41 of the first black matrix BM1 and the second black matrix BM2 may include the intersection position of the plurality of first black matrix strips BM11 and the plurality of second black matrix strips BM21. In one or more embodiments of this disclosure, the second direction is perpendicular to the first direction.

[0108] like Figure 4B As shown, at the overlap position 302 between the first black matrix BM1 and the second black matrix BM2, the second black matrix BM2 can be directly superimposed on the first black matrix BM1. Furthermore, at the non-overlapping position 304 between the first black matrix BM1 and the second black matrix BM2, the second black matrix BM1 can be coplanar with the first black matrix BM2. The first black matrix BM1 and the second black matrix BM2 can form a combined black matrix BM. The thickness of this combined black matrix BM at the overlap position 302 is equal to the sum of the thicknesses of the first black matrix BM1 and the second black matrix BM2 at that position, while the thickness at the non-overlapping position is equal to the thickness of the corresponding one of the first black matrix BM1 and the second black matrix BM2.

[0109] In this embodiment, the openings defined by the first black matrix BM1 and the second black matrix BM2 are multiple interconnected channels, and therefore, the areas of these channels are generally large. When preparing the black matrix, a first black matrix BM1 comprising multiple vertically extending first black matrix strips BM11 can be prepared first, followed by a second black matrix BM2 comprising multiple horizontally extending second black matrix strips BM21. In other words, when preparing the black matrix of the color filter substrate, the vertical black matrix strips can be prepared first, followed by the horizontal black matrix strips, and vice versa. Whether it is the first black matrix BM1 or the second black matrix BM2, because their defined opening areas are large, the BM material in the openings is more easily carried out by the developing solution during development, thus eliminating BM residue in the openings of the final formed black matrix BM.

[0110] In one or more embodiments of this disclosure, the extension direction of a plurality of first black matrix bars BM11 of the first black matrix BM1 may be the same as the extension direction of the data signal lines of the display panel, so that the first black matrix BM1 can block the data signal lines; the extension direction of a plurality of second black matrix bars BM21 of the second black matrix BM2 may be the same as the extension direction of the gate signal lines of the display panel, so that the second black matrix BM2 can block the gate signal lines.

[0111] Continue to refer to Figure 4AThe spacing between two adjacent first black matrix strips BM11 can be smaller than the spacing between two adjacent second black matrix strips BM21. In this case, it is more beneficial to eliminate BM residue in the opening by first preparing the first black matrix strips BM11 with smaller spacing, with a flat bottom layer, and then preparing the second black matrix strips BM21 with larger spacing on the basis of the first black matrix strips BM11.

[0112] Continue to refer to Figure 4A The width of each first black matrix strip BM11 can be smaller than the width of each second black matrix strip BM21. In an example embodiment, the width of the second black matrix strip BM21 can be 2-3 times the width of the first black matrix strip BM11. In a further example embodiment, the width of the first black matrix strip BM11 can be less than 3.0 micrometers, and the width of the second black matrix strip BM21 can be greater than 6.0 micrometers. By reducing the width of the first black matrix strip BM11, a higher PPI can be achieved, while setting the width of the second black matrix strip BM21 to be greater than the width of the first black matrix strip BM11 facilitates the fabrication of subsequent spacers at the positions corresponding to the second black matrix strip BM21.

[0113] In one or more embodiments of this disclosure, the second black matrix BM2 may have a non-uniform thickness. For example... Figure 4B As shown, the thickness of the second black matrix BM2 at the overlapping portion with the first black matrix BM1 can be less than the thickness of the second black matrix BM2 at the non-overlapping portion with the first black matrix BM1. At the overlapping location, the thickness of the second black matrix BM2 being less than the thickness of the first black matrix BM1 takes into account the flowability of the adhesive in the black matrix, making the process easier to implement. In the example embodiment, the thickness of the second black matrix BM2 at the overlapping portion can be approximately 0.4-0.6 micrometers, particularly approximately 0.5 micrometers, and the thickness of the second black matrix BM2 at the non-overlapping portion can be approximately 1.1-1.3 micrometers, particularly approximately 1.2 micrometers, to meet the light-shielding requirements of the second black matrix BM2.

[0114] The inventors of this disclosure have discovered that reducing the thickness of the first black matrix BM1 can improve its developability, thereby reducing the incidence of BM residue. In one or more embodiments of this disclosure, the thickness of the first black matrix BM1 can be greater than the thickness of the portion of the second black matrix BM2 that overlaps with the first black matrix BM1, but can be less than the thickness of the portion of the second black matrix BM2 that does not overlap with the first black matrix BM1. That is, except for the overlapping portions (where the second black matrix BM2 is less likely to have a large thickness due to the fluidity of the adhesive), the thickness of the first black matrix BM1 can be less than the thickness of the second black matrix BM2.

[0115] However, the thickness of the first black matrix BM1 is also limited by its light-shielding rate. If the thickness is too thin, the light-shielding rate requirement of the black matrix may not be met. Typically, the light-shielding rate of the black matrix used on the display panel needs to be greater than 4.0 to meet the light-shielding requirements of the BM. Table 1 shows the relationship between the thickness of the black matrix, the BM residual occurrence rate, and the BM light-shielding rate.

[0116] Table 1

[0117] project normal S1 S2 S3 S4 BM thickness 50mj 1.1 1.0 0.9 0.8 BM residual incidence 3％ 2％ 1.5％ 0.8％ 0.6％ BM shading rate (specification > 4.0) 4.6 4.3 4.1 3.8 3.6

[0118] As can be seen from Table 1 above, when the thickness of the first black matrix BM1 is reduced to less than 1.0 micrometer, the shading rate of the first black matrix BM1 will be less than 4.0. Therefore, in the embodiments of this disclosure, the thickness of the first black matrix BM1 can be set to approximately 0.9-1.1 micrometers, and more specifically, approximately 1.0 micrometer. This can both reduce the occurrence rate of BM residue and ensure the shading rate of the first black matrix BM1.

[0119] Because the spacing between the multiple second black matrix strips BM21 of the second black matrix BM2 is relatively large, the occurrence rate of BM residue is low during the development of the second black matrix BM2, with almost no BM residue. Therefore, the second black matrix BM2 can have a larger thickness to ensure better light-blocking efficiency. For example, the thickness of the second black matrix BM2 in the non-overlapping portion can be at least 1.2 micrometers.

[0120] Figure 5A The diagram schematically illustrates a first black matrix BM1, a second black matrix BM2, and a combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2 of another color filter substrate in one or more embodiments of the present disclosure. Figure 5B schematically shown Figure 5A A cross-sectional view of the combined black matrix BM along line DD' in the diagram; and Figure 5C schematically shown Figure 5A A cross-sectional view of the combined black matrix BM along line EE'.

[0121] like Figure 5A As shown, the first black matrix BM1 may include a plurality of first black matrix strips BM11 extending along a first direction, while the second black matrix BM2 may include a plurality of second black matrix strips BM21 extending along a second direction and a plurality of third black matrix strips BM22 extending along the first direction and intersecting with the plurality of second black matrix strips BM21. In one or more embodiments of this disclosure, the plurality of third black matrix strips BM22 may be distributed among the plurality of first black matrix strips BM11, such that there is at least one first black matrix strip BM11 between two adjacent third black matrix strips BM22.

[0122] In some embodiments, the plurality of third black matrix bars BM22 and the plurality of first black matrix bars BM11 can be arranged alternately such that there can be only one first black matrix bar BM11 between two adjacent third black matrix bars BM22.

[0123] In one or more embodiments of this disclosure, such as Figure 5A As shown, the first black matrix BM1 and the second black matrix BM2 can together form a combined black matrix BM with multiple columns and multiple rows of black matrix bars. In the example embodiment, the first black matrix BM1 may include the 1st, 3rd, 5th, 7th... columns of the combined black matrix BM (i.e., odd-numbered columns of black matrix bars), and the second black matrix BM2 may include the 2nd, 4th, 6th... columns of the combined black matrix (i.e., even-numbered columns of black matrix bars) and all rows of black matrix bars.

[0124] Thus, when preparing the black matrix of the color filter substrate, a first black matrix BM1 can be prepared on the substrate first. Since the first black matrix BM1 consists only of odd-numbered columns of black matrix strips, the opening defined by the first black matrix BM1 is a wider channel, much larger than the opening of the combined black matrix BM. During pattern development of the first black matrix BM1, the BM material in the opening is more easily carried out by the developer. Then, a second black matrix BM2 can be prepared. Since the second black matrix BM2 consists of even-numbered columns of black matrix strips and all rows of black matrix strips, the opening defined by the second black matrix BM2 is also larger than the opening of the combined black matrix BM. During pattern development of the second black matrix BM2, it is also beneficial to eliminate BM residue. Therefore, the combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2 has no BM residue.

[0125] In an alternative embodiment, the first black matrix BM1 may include the 1st, 2nd, 4th, 5th, 7th, 8th... columns of the combined black matrix BM, and the second black matrix BM2 may include the 3rd, 6th, 9th... columns of the combined black matrix BM, as well as all rows of black matrix bars. Thus, the opening defined by each of the first black matrix BM1 and the second black matrix BM2 is larger than the opening of the combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2, therefore the combined black matrix BM does not contain any BM residue.

[0126] In one or more embodiments of this disclosure, such as Figure 5B and 5CAs shown, at the intersection of the first black matrix BM1 and the second black matrix, the thickness of the combined black matrix can be equal to the sum of the thicknesses of the first black matrix BM1 and the second black matrix BM2. At the non-overlapping positions of the first black matrix BM1 and the second black matrix BM2, the thickness of the combined black matrix is ​​equal to the individual thicknesses of the first black matrix BM1 and the second black matrix BM2. At the non-overlapping positions of the first black matrix BM1 and the second black matrix BM2, the first black matrix BM1 and the second black matrix BM2 can be coplanar and have the same thickness. However, at the intersection of the first black matrix BM1 and the second black matrix, the thickness of the second black matrix BM2 is less than the thickness of the first black matrix BM1.

[0127] Figure 6A The diagram schematically illustrates a first black matrix BM1, a second black matrix BM2, and a combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2 in one or more embodiments of the present disclosure. Figure 6B schematically shown Figure 6A A cross-sectional view of the combined black matrix BM along line GG' in the diagram; Figure 6C schematically shown Figure 6A A cross-sectional view of the combined black matrix BM along line FF'.

[0128] In non-limiting embodiments, such as Figure 6A As shown, the first black matrix BM1 may include a plurality of first black matrix strips BM11 extending along a first direction and a plurality of third black matrix strips BM12 extending along a second direction and intersecting with the plurality of first black matrix strips BM11. The second black matrix BM2 may include a plurality of second black matrix strips BM21 extending along the second direction and a plurality of third black matrix strips BM22 extending along the first direction and intersecting with the plurality of second black matrix strips BM21. In one or more embodiments of this disclosure, the plurality of third black matrix strips BM22 may be distributed among the plurality of first black matrix strips BM11, such that there is at least one first black matrix strip BM11 between two adjacent third black matrix strips BM22; and the plurality of third black matrix strips BM12 may be distributed among the plurality of second black matrix strips BM21, such that there is at least one second black matrix strip BM21 between two adjacent third black matrix strips BM12.

[0129] In some embodiments, a plurality of third black matrix bars BM22 may be arranged alternately with a plurality of first black matrix bars BM11 such that there may be only one first black matrix bar BM11 between two adjacent third black matrix bars BM22, and a plurality of third black matrix bars BM12 may be arranged alternately with a plurality of second black matrix bars BM21 such that there may be only one second black matrix bar BM21 between two adjacent third black matrix bars BM12.

[0130] In one or more embodiments of this disclosure, the first black matrix BM1 and the second black matrix BM2 can together form a combined black matrix BM having multiple columns and multiple rows of black matrix bars. In an example embodiment, such as Figure 6A As shown, the first black matrix BM1 may include the 1st, 3rd, 5th, 7th... columns (i.e., odd-numbered columns) and the 1st, 3rd, 5th, 7th... rows (i.e., odd-numbered rows) of the combined black matrix BM. The second black matrix BM2 may include the 2nd, 4th, 6th... columns (i.e., even-numbered columns) and the 2nd, 4th, 6th... rows (i.e., even-numbered rows) of the combined black matrix BM. Thus, the opening defined by each of the first black matrix BM1 and the second black matrix BM2 is larger than the opening of the combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2, therefore the combined black matrix BM formed does not have BM residue.

[0131] like Figure 6B and 6C As shown, at the overlap position 302 of the first black matrix BM1 and the second black matrix BM2, the thickness of the combined black matrix BM can be equal to the sum of the thicknesses of the first black matrix BM1 and the second black matrix BM2. At the non-overlapping position of the first black matrix BM1 and the second black matrix BM2, the thickness of the combined black matrix BM is equal to the individual thicknesses of the first black matrix BM1 and the second black matrix BM2. At the non-overlapping position of the first black matrix BM1 and the second black matrix BM2, the first black matrix BM1 and the second black matrix BM2 can be coplanar and have the same thickness. However, at the overlap position 302 of the first black matrix BM1 and the second black matrix BM2, the thickness of the second black matrix BM2 is less than the thickness of the first black matrix BM1.

[0132] In an alternative embodiment, the first black matrix BM1 may include the black matrix bars in columns 1, 2, 4, 5, 7, 8… and rows 3, 6, 9 of the combined black matrix BM, and the second black matrix BM2 may include the black matrix bars in columns 3, 6, 9… and columns 1, 2, 4, 5, 7, 8 of the combined black matrix BM. Thus, the opening defined by each of the first black matrix BM1 and the second black matrix BM2 is larger than the opening of the combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2, therefore the combined black matrix does not contain any BM residue.

[0133] Figure 7A The diagram schematically illustrates a first black matrix BM1, a second black matrix BM2, and a combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2 in one or more embodiments of the present disclosure. Figure 7B schematically shown Figure 7A A cross-sectional view of the combined black matrix BM along line HH'.

[0134] In non-limiting embodiments, such as Figure 7A As shown, the first black matrix BM1 may include a plurality of first black matrix strips BM11 extending along a first direction and a plurality of fourth black matrix strips BM12 extending along a second direction and intersecting with the plurality of first black matrix strips BM11, while the second black matrix BM2 may include a plurality of third black matrix strips BM22 extending along the first direction. In one or more embodiments of this disclosure, the plurality of third black matrix strips BM22 may be distributed among the plurality of first black matrix strips BM11, such that there is at least one first black matrix strip BM11 between two adjacent third black matrix strips BM22.

[0135] In one or more embodiments, a plurality of third black matrix bars BM22 may be arranged alternately with a plurality of first black matrix bars BM11 such that there may be only one first black matrix bar BM11 between two adjacent third black matrix bars BM22.

[0136] In one or more embodiments of this disclosure, the first black matrix BM1 and the second black matrix BM2 can together form a combined black matrix BM having multiple columns and multiple rows of black matrix bars. In an example embodiment, such as Figure 7A As shown, the first black matrix BM1 may include the 1st, 3rd, 5th, 7th... columns of the combined black matrix BM (i.e., odd-numbered columns of black matrix) and all rows of black matrix. The second black matrix BM2 may include the 2nd, 4th, 6th... columns of the combined black matrix BM (i.e., even-numbered columns of black matrix). Thus, the opening defined by each of the first black matrix BM1 and the second black matrix BM2 is larger than the opening of the combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2, therefore the combined black matrix BM does not have BM residue.

[0137] like Figure 7B At the intersection of the first black matrix BM1 and the second black matrix BM2, the thickness of the combined black matrix BM can be equal to the sum of the thicknesses of the first black matrix BM1 and the second black matrix BM2. At the non-overlapping positions of the first black matrix BM1 and the second black matrix BM2, the thickness of the combined black matrix BM is equal to the individual thicknesses of the first black matrix BM1 and the second black matrix BM2. At the non-overlapping positions of the first black matrix BM1 and the second black matrix BM2, the first black matrix BM1 and the second black matrix BM2 can be coplanar and have the same thickness. At the intersection of the first black matrix BM1 and the second black matrix BM2, the thickness of the second black matrix BM2 can be less than the thickness of the first black matrix BM1.

[0138] In an alternative embodiment, the first black matrix BM1 may include the 1st, 4th, 7th... columns of the combined black matrix BM and all rows of black matrix bars, and the second black matrix BM2 may include the 2nd, 3rd, 5th, 6th, 8th, 9th... columns of the combined black matrix BM. Thus, the opening defined by each of the first black matrix BM1 and the second black matrix BM2 is larger than the opening of the combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2, therefore the combined black matrix BM does not contain any BM residue.

[0139] It is understood that in the embodiments of this disclosure, the arrangement of the first black matrix BM1 and the second black matrix BM2 is not limited to the embodiments described in detail above. As long as the size of the opening of either the first black matrix BM1 or the second black matrix BM2 is larger than the size of the opening of the combined black matrix formed, the purpose of this disclosure can be achieved.

[0140] In one or more embodiments described above, the first black matrix BM1 and the second black matrix BM2 are in direct contact at their overlap. However, in alternative embodiments, the first black matrix BM1 and the second black matrix BM2 may not be in direct contact. In other words, an intermediate layer, such as a color resist layer, may be disposed between the first black matrix BM1 and the second black matrix BM2, as described in detail below.

[0141] Arrangement of color resist layer

[0142] In one or more embodiments of this disclosure, the color filter substrate 300 may further include a color resist layer. This color resist layer may include a first color resist R, a second color resist G, and a third color resist B, which are sequentially and alternately arranged in a second direction and extend in a first direction. In an example embodiment, the first color resist may include a red filter layer, the second color resist may include a green filter layer, and the third color resist may include a blue filter layer.

[0143] In one or more embodiments of this disclosure, particularly regarding Figures 4A to 7B In the described embodiment, at least one of the first black matrix BM1 and the second black matrix BM2 includes a plurality of black matrix strips (vertical black matrix strips) extending along a first direction. In such an embodiment, the color resist layer may be located in an opening jointly defined by the first black matrix BM1 and the second black matrix BM2 and at least partially overlap with the plurality of black matrix strips in a direction perpendicular to the substrate.

[0144] Figure 8A The arrangement of the color resist layer relative to the black matrix is ​​schematically shown in one or more embodiments of this disclosure; Figure 8B schematically showing along Figure 8A A cross-sectional view of line I-I' in the diagram. (See also...) Figure 8A and 8BAs shown, the color resist layer 81 may include a first color resist R, a second color resist G, and a third color resist B, which may extend in a first direction and be alternately arranged in a second direction. The first color resist R, the second color resist G, and the third color resist B may fill the opening defined by the combined black matrix BM formed by the first black matrix BM1 and the second black matrix BM2, and the first color resist R, the second color resist G, and the third color resist B extend in the width direction onto the first black matrix strip BM11 located on both sides; that is, the first color resist R, the second color resist G, and the third color resist B overlap the first black matrix strip BM11. This configuration prevents light leakage near the first black matrix strip BM11.

[0145] In one or more embodiments of this disclosure, adjacent color resistors among the first color resistor R, the second color resistor G, and the third color resistor B (e.g., between R and G, between G and B, and between B and R) are arranged without spacing. In other words, the first color resistor R, the second color resistor G, and the third color resistor B can completely cover the first black matrix strip BM11 located between them.

[0146] To further prevent light leakage, adjacent color resistors R, G, and B can have a certain degree of overlap (which can be expressed as the width of the overlap). Specifically, there is a certain degree of overlap between the first color resistor R and the second color resistor G, between the second color resistor G and the third color resistor B, and between the third color resistor B and the first color resistor R.

[0147] However, for high PPI display panels, the size of the black matrix BM (especially the first black matrix strip BM11 of the first black matrix BM1) is usually relatively small. If the overlap between adjacent color resists is large, the sharp corners (also known as taper corners, caused by unevenness at the edges of adjacent color resists) at the junction of adjacent color resists are large, which can easily cause color shift, thus affecting the display effect of the display panel.

[0148] In one or more embodiments of this disclosure, the overlap between adjacent color resistors among the first color resistor R, the second color resistor G, and the third color resistor B can be set to 0, but a certain margin can be allowed. In the example embodiment, the margin is 0-±0.6μm. With this configuration, even if the overlap between adjacent color resistors in the actual product is not 0 due to limitations such as equipment accuracy and process conditions, the overlap deviation will not cause significant color shift within a predetermined range, thus not increasing the product defect rate.

[0149] Figure 9A and Figure 9B Electron micrographs of sharp corners are shown, one with a large degree of overlap and the other with almost no overlap, respectively. Figure 10A and 10BCross-sectional views of color filter substrates are schematically shown for cases where there is a large degree of overlap between adjacent color filters and cases where there is virtually no overlap.

[0150] like Figure 9A and 10A As shown, when there is a large degree of overlap between adjacent color resists (e.g., color resist B and color resist G), the Taper angle formed between these adjacent color resists is large, with the boundary of color resist B shifting towards one side of color resist G, and the boundary of color resist G shifting towards one side of color resist B. This color shift is easily observed when viewing the display panel from the side. Figure 9B and 10B As shown, when adjacent color resists (e.g., color resist B and color resist G) have virtually no overlap, the Taper angle formed between these adjacent color resists is small, and the boundaries of color resist B and color resist G are both located near the center line of the first black matrix bar BM11. When observing the display panel from the side, no color shift is observed.

[0151] In one or more embodiments of this disclosure, even if the overlap between adjacent color resistors is 0, this setup can still meet the light leakage risk requirements according to the light leakage risk assessment. The light leakage risk is assessed below when the overlap between adjacent color resistors is 0.

[0152] The risk of light leakage between adjacent color filters can be assessed by evaluating the light leakage margin. The light leakage margin used in this paper can be represented by the minimum overlap between each color filter and its adjacent black matrix strip to meet the light leakage risk requirements, which is expressed by the overlap width between each color filter and its adjacent black matrix strip.

[0153] Light leakage margin can be related to the following parameters:

[0154] a. Size margin δ of the black matrix strip (e.g., the first black matrix strip BM11) BM CD That is, the precision of the width of the black matrix strip. Since each longitudinally extending black matrix strip overlaps with two adjacent color resistors, the dimensional margin of the black matrix strip allocated to each color resistor can be δ. BM CD / 2. With a black matrix strip width of 3.0 μm, the dimensional margin of the black matrix strip can reach ±0.5 μm.

[0155] b. Margin δ of overlap between a single color resist and adjacent black matrix stripes RGB OL That is, the accuracy of the overlap width between a single color resist and the adjacent black matrix strip can reach ±0.8μm.

[0156] c. Size margin δ of individual color resist RGB CDThat is, the accuracy of the width of an individual color resistor can reach ±0.75μm. Since each color resistor coincides with the black matrix strips on the left and right sides, the dimensional margin of each color resistor allocated to each black matrix strip can be δ. RGB CD / 2.

[0157] d. Taper angular margin δ at the junction of adjacent color filters Taper The thickness of the color resist, the thickness of the black matrix strip, and the taper angle can be determined by the thickness of the color resist, the thickness of the black matrix strip, and the taper angle. When the thickness of the color resist is 2.7 μm, the thickness of the black matrix strip is 1.2 μm, and the taper angle at the junction of adjacent color resists is 70°, the taper angle margin is: (2.7-1.2) × Tan30° = 0.86 μm.

[0158] The light leakage margin can be calculated based on the above parameters:

[0159]

[0160] As can be seen from the above formula, the overlap between each color resistor and its adjacent black matrix strip only needs to be no less than 1.25 μm to meet the light leakage risk requirement. When adjacent color resistors are adjacent to each other (i.e., completely covering the adjacent black matrix strip) but do not overlap, the overlap between a single color resistor and its adjacent black matrix strip is 1.5 μm, which can meet the light leakage risk requirement.

[0161] Figure 11A A schematic plan view of another color filter substrate in one or more embodiments of the present disclosure is shown, in which another arrangement of the color resist layer relative to the first black matrix BM1 and the second black matrix BM2 is shown. Figure 11B Show along Figure 11A A cross-sectional view of line JJ' of the color filter substrate; Figure 11C schematically shown Figure 11A A diagram illustrating the fabrication process of the color filter substrate. (See diagram for example.) Figure 11A and 11B As shown, the color resist layer 81 can also be located between the first black matrix BM1 and the second black matrix BM2. In this embodiment, as... Figure 11C As shown, when preparing the color filter substrate, a first black matrix BM1 can be formed on the substrate 301 first, a color resist layer 81 can be formed on the first black matrix BM1, and then a second black matrix BM2 can be formed on the color resist layer 81.

[0162] The first black matrix BM1 and the second black matrix BM2 can have the above-mentioned... Figures 4A to 7BThe illustrated embodiment has any of the following arrangements. Since the first black matrix BM1 and the second black matrix BM2 are formed in two separate steps, and the openings of both the first black matrix BM1 and the second black matrix BM2 are relatively large, it is beneficial to eliminate BM residue. Furthermore, forming the first black matrix BM1 and the second black matrix BM2 on two separate layers also helps to prevent color bleeding between adjacent color resists.

[0163] It is understood that the arrangement order of the first black matrix BM1, the second black matrix BM2, and the color resist layer 81 is not limited to the embodiment shown in FIG11. In an alternative embodiment, the second black matrix BM2 may be formed on the substrate first, then the color resist layer 81 may be formed on the second black matrix BM2, and finally the first black matrix BM1 may be formed.

[0164] In one or more embodiments of this disclosure, the color filter substrate may further include a planarization layer on the color resist layer, a spacer layer on the planarization layer, and other desired components. These components are not described in detail herein, but details can be found in the relevant knowledge known to those skilled in the art.

[0165] In another aspect of this disclosure, a substrate for use in preparing the color filter substrate of one or more embodiments described herein is also provided. When preparing the color filter substrate of one or more embodiments described herein, at least one color filter substrate may be prepared on a substrate (also referred to as a reference layer). In the case of preparing a single color filter substrate on the substrate, excess portions outside the color filter substrate may be cut off after preparation to form the color filter substrate. In the case of preparing multiple color filter substrates on the substrate, the color filter substrates on the substrate may be separated to separate multiple individual color filter substrates. The substrate may include overlap detection markers. It is configured to detect the overlap deviation between one of the first color filter R, the second color filter G, and the third color filter B and the black matrix bar (in this embodiment, for example, the first black matrix bar BM11), and between adjacent color filters among the first color filter R, the second color filter G, and the third color filter B. In one or more embodiments, the overlap detection mark can be set in an area outside the area where the color filter substrate is located. Thus, after the color filter substrate is fabricated, the area occupied by the overlap detection mark on the substrate can be cut off, so that the resulting color filter substrate has no overlap detection mark.

[0166] During the fabrication of color resist layer 81, after each type of color resist is fabricated, it is usually necessary to check whether the position of the color resist meets the standard using a detection device. If it does not meet the standard, the parameters of the device need to be adjusted so that each color resist is formed in a precise position. The position of the color resist is usually detected by monitoring the deviation of the overlap between the first color resist R, the second color resist G, and the third color resist B and the black matrix BM (especially the black matrix strips in the same direction as the color resist extension) (i.e., between R and BM, between G and BM, and between B and BM). If the deviation of the overlap is within 0-±0.6μm, it can be considered acceptable. However, this method has some problems. For example, if the first color resist R is shifted 0.5μm to the right, and the adjacent second color resist G is shifted 0.5μm to the left, this monitoring method will conclude that it meets the standard. However, in reality, the relative positional offset between the first color resist R and the second color resist G is relatively large, which can easily cause color deviation.

[0167] In one or more embodiments of this disclosure, the overlap deviation between one of the first color filter R, the second color filter G, and the third color filter B and the black matrix bar, as well as between adjacent color filters among the first color filter R, the second color filter G, and the third color filter B, can be detected by an overlap detection identifier, so as to more accurately monitor the position of the first color filter R, the second color filter G, and the third color filter B, thereby reducing the occurrence of color shift phenomenon.

[0168] In one or more embodiments of this disclosure, the overlap detection identifier may include a first reference identifier adapted to detect the overlap deviation of the first color filter R relative to the first black matrix BM1; a first detection identifier adapted to compare its position with the position of the first reference identifier to determine the overlap deviation of the first color filter R relative to the first black matrix BM1; a second reference identifier adapted to detect the overlap deviation of the second color filter G relative to the first color filter R and the third color filter B relative to the first color filter R; a second detection identifier adapted to compare its position with the position of the second reference identifier to determine the overlap deviation of the second color filter G relative to the first color filter R; a third reference identifier adapted to detect the overlap deviation of the third color filter B relative to the second color filter G; and a third detection identifier adapted to compare its position with the positions of the second reference identifier and the third reference identifier to determine the overlap deviation of the third color filter B relative to the first color filter R and the second color filter G.

[0169] Figure 12 The overlap detection identifier is illustrated schematically in one or more embodiments of this disclosure. For example... Figure 12As shown, the overlap detection mark may include a first reference mark 121, which may be formed of the same material as the first black matrix BM1. Thus, when forming the first black matrix BM1, the first reference mark 121 can be formed together with the first black matrix BM1 on the substrate. The overlap detection mark may also include a first detection mark 122 and a second reference mark 123, which may be formed of the same material as the first color resist R. Thus, when forming the first color resist R, both the first detection mark 122 and the second reference mark 123 can be formed on the substrate. After forming the first color resist R, for example, the positional deviation between the first detection mark 122 and the first reference mark 121 can be detected by a detection device to determine the overlap deviation between the first color resist R and the first black matrix strip BM11. The overlap detection mark may also include a second detection mark 124 and a third reference mark 125, which may be formed of the same material as the second color resist G. Thus, when forming the second color resist G, both the second detection mark 124 and the third reference mark 125 can be formed on the substrate. After forming the second color resist G, for example, the positional deviation between the second detection mark 124 and the second reference mark 123 can be detected by a detection device to determine the overlap deviation between the second color resist G and the first color resist R. The overlap detection mark may also include a third detection mark 126, which can be formed of the same material as the third color resist B. Thus, when forming the third color resist B, the third detection mark 126 can be formed on the substrate. After forming the third color resist B, for example, the positional deviation between the third detection mark 126 and the second reference mark 123 and between the third detection mark 126 and the third reference mark 125 can be detected by a detection device to determine the overlap deviation between the third color resist B and the first color resist R and between the third color resist B and the second color resist G.

[0170] Continue to refer to Figure 12 The first reference marker 121, the second reference marker 123, and the third reference marker 125 are hollow rectangles, while the first detection marker 122, the second detection marker 124, and the third detection marker 126 are solid rectangles. Furthermore, the first detection marker 122, the second detection marker 124, and the third detection marker 126 are respectively located within the first reference marker 121, the second reference marker 123, and the third reference marker 125. This configuration allows for the determination of the overlap deviation between color resists and between the color resist and the black matrix by identifying the center positions of these overlap detection markers. This facilitates convenient and accurate detection of overlap deviations.

[0171] In one or more embodiments of this disclosure, when fabricating the various layers or components of the color filter substrate (including the first black matrix BM1, the second black matrix BM2, the color resist layer, the planarization layer, the spacer layer, etc.), corresponding alignment marks can be provided in the effective area of ​​the substrate to ensure accurate relative positioning between the various layers or components. These alignment marks can be formed on the substrate simultaneously with the fabrication of the first black matrix BM1. Figure 13A The illustration schematically shows alignment identifiers in one or more embodiments of this disclosure, and Figure 13B The distribution of alignment identifiers in one or more embodiments of this disclosure is illustrated schematically. Alignment identifier 131 can be made as... Figure 13A The pattern shape shown. However, those skilled in the art will understand that the pattern shape of the alignment mark 131 is not limited to... Figure 13A The patterns shown are conceived in various shapes by those skilled in the art. Typically, during the product technology development phase, such as... Figure 13B As shown, a large substrate 130 can be divided into multiple sub-sub-substrate regions (e.g., four regions A, B, C, and D), and each sub-substrate region is further divided into a mounting effective region 132 located at at least one edge of the sub-substrate region and a mounting ineffective region 133 outside the mounting effective region 132. Further as... Figure 13B As shown, multiple panel regions 134 can be designed on the effective mounting region 132 for fabricating a display panel thereon. Figure 13B (Small rectangular areas within the display area), such as the two-column panel area 134. Alignment markers can be set around the perimeter of the display area. For Figure 13B For the large substrate 130 shown, four sets of alignment marks can be provided around the panel region 134 in the effective mounting region 133, with six marks in each set, for a total of 24 marks. These alignment marks can be distributed, for example... Figure 13B The positions marked by the numbers 1, 2, 3...24 in the text.

[0172] It should be noted that, Figure 13B The distribution of the panel areas and alignment marks shown are those during the product's technical development phase. During mass production, the panel areas can be distributed across the entire large substrate area, while the alignment marks can be distributed in rows or columns around the perimeter of the panel areas.

[0173] After each layer is completed, alignment deviations between other layers can be detected using alignment detection markers other than the aforementioned overlap detection markers. For example, after the second black matrix BM2 is completed, the alignment offset between the second black matrix BM2 and the first black matrix BM1 can be monitored by testing the offset of the black matrix alignment detection markers. Figure 14AThe alignment detection identifier is schematically shown in one or more embodiments of this disclosure; and Figure 14B The distribution of alignment detection identifiers in one or more embodiments of this disclosure is illustrated schematically. For example... Figure 14A As shown, the alignment detection identifier 141 can have the same as Figure 12 The alignment detection mark shown has a similar shape. The alignment detection mark 141 may include a reference mark 1411 and a detection mark 1412 located within the reference mark 1411. However, those skilled in the art will understand that the pattern shape of the alignment detection mark 141 is not limited to... Figure 14A The pattern shown is shaped in various ways that those skilled in the art can imagine.

[0174] like Figure 14B As shown, these alignment detection marks 141 can also be distributed around the periphery of the panel area in the effective mounting area 132. For example, four sets of alignment detection marks 141, each with 26 marks, totaling 104, can be arranged around the periphery of the panel area 134. These alignment detection marks 141 can be distributed, for example... Figure 13B The positions marked by the numbers 1, 2, 3...104 in the text.

[0175] It should be noted that, Figure 14B The distribution of the panel area and the alignment detection marks shown are those during the product's technical development phase. During mass production, the panel area can be distributed across the entire large substrate area, while the alignment detection marks can be distributed in rows or columns around the perimeter of the panel area.

[0176] In the embodiments of this disclosure, similar to the control of the overlap between the color resists, the alignment deviation between the first black matrix BM1 and the second black matrix BM2 is also controlled with a margin of 0-±0.6μm. When the alignment deviation exceeds this margin range, the position of the second black matrix BM2 needs to be adjusted.

[0177] In another aspect of this disclosure, a display panel is also provided. The display panel may include at least one color filter substrate according to this disclosure, such as at least one color filter substrate according to one or more embodiments disclosed above and / or below in more detail. Therefore, alternative embodiments of this display panel may be referenced to embodiments of the color filter substrate.

[0178] Figure 15 A block diagram schematically illustrating a display panel 150 according to one or more embodiments of the present disclosure is shown. Figure 15As shown, the display panel 150 may include a color filter substrate 151 and an array substrate 152. In one or more embodiments of this disclosure, the color filter substrate 151 may include any of the color filter substrates described in the foregoing detailed description. The array substrate 152 may have any arrangement in the related art, and this disclosure does not impose any particular limitation. Figure 16 Schematic illustration for use Figure 15 A cross-sectional view of an exemplary array substrate 152 of the display panel shown. Figure 16 As shown, the array substrate 152 may include a second substrate 1521, a first light-shielding portion LS located on the second substrate 1521, a buffer layer 1522 located on the first light-shielding portion LS, and a thin-film transistor located on the side of the buffer layer 1522 away from the second substrate 1521. The thin-film transistor may include an active layer 1523 and source / drain electrodes SD1 and SD2. In this embodiment, the orthographic projection of the active layer 1523 of the thin-film transistor on the second substrate 1521 lies within the orthographic projection of the first light-shielding portion LS on the second substrate 1521, so that the first light-shielding portion LS blocks light incident on the active layer 1623 and affects the effect of the active layer 1623. In this embodiment, the array substrate 152 may also include a gate insulating layer GI, a passivation layer PLN, an electrode ITO, and a plurality of bumps SPS. The plurality of bumps SPS are configured to be abutted against by one or more of a plurality of spacers located on the color filter substrate. The orthographic projection of multiple bosses SPS on the second substrate 1521 can be located within the orthographic projection of the first light-shielding part LS on the second substrate, so as to prevent light leakage at the bosses.

[0179] In some embodiments, each first light-shielding portion LS may correspond to an active layer 1623 of a thin-film transistor, and the area of ​​each first light-shielding portion LS may be at least larger than the area of ​​the corresponding active layer 1623 in order to block the active layer. For example, each first light-shielding portion LS may be a block capable of blocking the corresponding active layer. It is understood that each first light-shielding portion LS may also optionally block the active layers of thin-film transistors located in the same row; that is, each first light-shielding portion LS may be an elongated strip extending along the second direction.

[0180] In this embodiment of the display panel, the first black matrix BM1 and the second black matrix BM2 are both disposed on the color filter substrate 151, and the opening size of the first black matrix BM1 and the second black matrix BM2 is larger than the opening size defined by the first black matrix BM1 and the second black matrix BM2. Therefore, it is not easy for BM residue to exist in the first black matrix BM1 and the second black matrix BM2, so there is no BM residue in the opening of the combined black matrix formed.

[0181] Figure 17A cross-sectional view of another display panel 160 in one or more embodiments of the present disclosure is schematically shown; Figure 18 schematically shown Figure 17 The top view of the arrangement of the first black matrix BM1, the second black matrix BM2, and the combined black matrix behind the box in the display panel 160 shown.

[0182] like Figure 17 and 18 As shown, the display panel 160 may include a color filter substrate 161 and an array substrate 162. The color filter substrate 161 may include a first substrate 1611 and a first black matrix BM1 located on the first substrate 1611. The first black matrix BM1 may include a plurality of first black matrix strips BM11 extending along a first direction (e.g., a longitudinal direction, which may be the same as the extension direction of the data signal lines). The array substrate 162 may include a second substrate 1621 and a second black matrix BM2 located on the second substrate 1621. The second black matrix BM2 may include a plurality of second black matrix strips BM21 extending along a second direction different from the first direction (e.g., a lateral direction, which may be the same as the extension direction of the gate signal lines). In one or more embodiments of this disclosure, after the color filter substrate 161 and the array substrate 162 are aligned, the orthographic projections of the first black matrix BM1 and the second black matrix BM2 on the first substrate 1611 can jointly form a grid pattern, thereby forming a combined black matrix.

[0183] In one or more embodiments of this disclosure, the interval between two adjacent first black matrix bars BM11 in a plurality of first black matrix bars BM11 is smaller than the interval between two adjacent second black matrix bars BM21 in a plurality of second black matrix bars BM21, and the width of each first black matrix bar BM11 is smaller than the width of the second black matrix bar BM21.

[0184] exist Figure 17 In the illustrated embodiment and one or more other embodiments of this disclosure, the color filter substrate may further include a color resist layer 81 located in an opening of the first black matrix BM1 and at least partially overlapping with a plurality of first black matrix strips BM11 of the first black matrix BM1. The color resist layer 81 may include a first color resist R, a second color resist G, and a third color resist B; a planarization layer 1612 located on the color resist layer 81; and a plurality of spacers 1613 located on the planarization layer, the spacers 1613 being configured to space the color filter substrate 161 and the array substrate 162 apart for accommodating a liquid crystal layer. Figure 17In the illustrated embodiment and one or more other embodiments of this disclosure, the array substrate 162 may further include a plurality of thin-film transistors 1622 located on the side of the second black matrix BM2 away from the second substrate. The orthographic projection of the active layer 1623 of the thin-film transistor 1622 onto the second substrate 1621 may lie within the orthographic projection of the plurality of second black matrix strips BM21 onto the second substrate. With this configuration, the first black matrix BM1 can be used to separate pixels formed by the first color resist R, the second color resist G, and the third color resist B, while the plurality of second black matrix strips BM21 of the second black matrix BM2, in addition to blocking the spacers 1613 on the color filter substrate 161 to prevent light leakage from the spacers, can also be reused as a first light-shielding portion LS1 to block light incident on the active layer 1623 and affect the effect of the active layer 1623. In one or more embodiments of this disclosure, as Figure 17 As shown, the array substrate 162 may further include a plurality of bosses SPS located on the side of the plurality of thin-film transistors away from the second substrate, the plurality of bosses SPS being configured to be abutted against by one or more of the plurality of spacers. The orthographic projection of the plurality of bosses SPS on the second substrate lies within the orthographic projection of the plurality of second black matrix strips BM21 on the second substrate.

[0185] Figure 19 schematically shown Figure 17 The top view shows another arrangement of the first black matrix BM1, the second black matrix BM2, and the combined black matrix behind the box on the display panel. Figure 19 As shown, the width of the portion of the multiple second black matrix strips BM21 that overlaps with the projections of the multiple protrusions can be greater than the width of the remaining portions of the multiple second black matrix strips BM21. In this way, on the one hand, the second black matrix strips BM21 can block multiple protrusions and multiple spacers to prevent light leakage from the protrusions and spacers; on the other hand, setting the width of the remaining portions of the second black matrix strips BM21 to be relatively small can improve the overall aperture ratio of the display panel.

[0186] In one or more embodiments of this disclosure, the extension direction of a plurality of first black matrix bars BM11 in the first black matrix BM1 may be the same as the extension direction of a plurality of data signal lines of the display panel 160 (i.e., all extending along the first direction), and the orthographic projection of the plurality of first black matrix bars BM11 on the second substrate 1621 may overlap with the orthographic projection of the plurality of data signal lines on the second substrate 1621. The extension direction of a plurality of first black matrix bars BM21 (first light-shielding portion LS) in the second black matrix BM2 may be the same as the extension direction of a plurality of gate signal lines of the display panel 160 (i.e., all extending along the second direction), and the orthographic projection of the plurality of second black matrix bars BM21 on the second substrate 1621 may overlap with the orthographic projection of the plurality of gate signal lines on the second substrate 1621.

[0187] The following combination Figure 22-24 right Figure 17 An example structure of the array substrate 162 used in another display panel 160 in the illustrated embodiment will be described in detail.

[0188] Figure 22 A cross-sectional view of an example array substrate 162 of another display panel 160 in one or more embodiments of this disclosure is schematically shown. Figure 22 As shown, the example array substrate 162 of the display panel 160 may include a second substrate 1621; a plurality of first light-shielding portions LS1 extending along a second direction on the second substrate 1621, the plurality of first light-shielding portions LS1 may be reused as a plurality of second black matrix strips BM21, the plurality of second black matrix strips BM21 may be combined with a plurality of first black matrix strips BM11 on the color filter substrate 161 to form a combined black matrix; and a plurality of thin film transistors 1622 located on the side of the plurality of first light-shielding portions LS1 away from the second substrate 1621, each thin film transistor 1622 may include an active layer 1623, a gate G, a source electrode S, a drain electrode D and a gate insulating layer GI located between the gate G and the active layer 2623.

[0189] Continue to refer to Figure 22 The example array substrate 162 may further include a plurality of first electrodes 1628 located on the side of the plurality of thin-film transistors 1622 away from the second substrate 1621, the plurality of first electrodes 1628 being electrically connected to the drain electrodes D of the plurality of thin-film transistors 1623 respectively; a second electrode layer 1620 located on the side of the plurality of first electrodes 1628 away from the second substrate 1621 and electrically insulated from the plurality of first electrodes 1628; and a plurality of second light-shielding portions LS2 electrically contacting the second electrode layer 1620 and extending along the first direction. In this embodiment, the orthographic projection of the plurality of second light-shielding portions LS2 on the second substrate 1621 overlaps with the orthographic projection of the plurality of first black matrix strips BM11 on the color filter substrate 161 on the second substrate 1621, and therefore also overlaps with the orthographic projection of the plurality of data lines of the display panel on the second substrate 1621. In other words, the plurality of second light-shielding portions LS2, the plurality of first black matrix strips BM11, and the plurality of data lines may overlap in the thickness direction of the display panel 160.

[0190] In one or more embodiments, the first electrode 1628 may be a pixel electrode, and the second electrode 1620 may be a common electrode. In this embodiment, a plurality of second light-shielding portions LS2 may be located on the side of the second electrode 1620 near the second substrate 1621.

[0191] In one or more embodiments, the plurality of second light-shielding portions LS2 can be multiple common leads (Com leads) and can be located in the region between adjacent sub-pixels (adjacent color blocks) in the first direction. The plurality of second light-shielding portions LS2 can block light leakage from adjacent sub-pixels, preventing crosstalk between adjacent sub-pixels in the first direction. This can improve display performance and enhance user experience.

[0192] In one or more embodiments, at least one of the plurality of second light-shielding portions LS2 has a disconnected position (e.g., Figure 24 (241) The location of the break can correspond to the location where multiple bosses SPS or other support pillars are set, so as to make room for setting up SPS or other support pillars. In some embodiments, the material of the multiple second light-shielding parts LS2 includes light-shielding metal, such as molybdenum.

[0193] Continue to refer to Figure 22 The example array substrate 162 may further include a buffer layer 1624 located between a plurality of first light-shielding portions LS1 and the active layer 1623; a first interlayer insulating layer 1625 located between the gate electrode G and the source electrode S; a second interlayer insulating layer 1626 located between the source electrode S and the drain electrode D; a planarization layer 1627 located between the drain electrode D and a plurality of first electrodes; and a passivation layer 1629 located between a plurality of first electrodes 1628 and a second electrode layer 1620. The source electrode S contacts the active layer 1623 through a via penetrating the first interlayer insulating layer 1625 and the gate insulating layer GI, and the drain electrode D contacts the active layer 1623 through a via penetrating the second interlayer insulating layer 1626, the first interlayer insulating layer 1625, and the gate insulating layer GI. The first electrode 1628 contacts the drain electrode D through a via penetrating the planarization layer 1627.

[0194] Figure 23 The diagram schematically illustrates a cross-sectional view of another exemplary array substrate 162' of another display panel in one or more embodiments of the present disclosure. This other exemplary array substrate is related to... Figure 22 The array substrate 162 shown is basically the same, except for the position of the second light-shielding portion LS2 relative to the second electrode layer 1620. Figure 23 In the embodiment shown, the second light-shielding portion LS2 is located on the side of the second electrode layer 1620 away from the second substrate 1621.

[0195] Figure 24 A top view schematically illustrating an exemplary array substrate of another display panel according to one or more embodiments of the present disclosure is shown. For ease of illustration, in Figure 24 The top view shown only displays multiple second black matrix bars BM21 (multiple first light-shielding parts LS1) and multiple second light-shielding parts LS2. For example... Figure 24As shown, each second black matrix strip BM21 includes at least one first segment S1 having a first width d1, at least one second segment S2 having a second width d2, and at least one third segment S3 having a third width d3. Each second black matrix strip BM21 is formed by connecting the at least one first segment, the at least one second segment, and the at least one third segment to each other. In one or more embodiments, the first width d1 is greater than the second width d2, and the second width d2 is greater than the third width d3. In an example embodiment, the first width d1 is 14.76 ± 2.0 μm; the second width d2 is 11.23 ± 2.0 μm; and the third width d3 is 9.05 ± 2.0 μm.

[0196] In one or more embodiments of this disclosure, at least one first segment S1 may have its orthographic projection on the second substrate 1621 overlap with the orthographic projections of multiple bosses SPS on the second substrate 1621, so that the second black matrix strip BM21 may block the multiple bosses SPS to prevent light from leaking from the bosses SPS.

[0197] In one or more embodiments of this disclosure, by reasonably setting the correspondence between the first segment S1, the second segment S2 and the third segment S3 and each color resist in the color resist layer, the opening size of each pixel can be controlled, thereby improving the viewing comfort of the human eye.

[0198] Figure 25 The diagram schematically illustrates the correspondence between the first segment S1, the second segment S2, and the third segment S3 and the respective color resists in the color resist layer. As shown in FIG26, the orthographic projection of each first segment S1 on the second substrate 1621 can overlap with the orthographic projections of two adjacent color resists on the second substrate 1621. Specifically, each first segment S1 can have a length spanning two adjacent color resists in the second direction. In the example embodiment, the color resist layer can include a red color resist R, a blue color resist B, and a green color resist G arranged alternately in the second direction and extending in the first direction. In this case, each first segment S1 can overlap with the adjacent red color resist R and blue color resist B in the thickness direction of the display panel 160 (perpendicular to the first and second directions).

[0199] Continue to refer to Figure 25Each second segment S2, when projected onto the second substrate 1621, can overlap with the projected image of a color resist on the second substrate 1621, which is one of the two adjacent color resists mentioned above. In an example embodiment, two adjacent second segments S2 can overlap with adjacent red color resists R and blue color resists B, respectively, in the thickness direction of the display panel. Specifically, each second segment can have a length spanning one color resist in the second direction, and each first segment S1 of one of the two adjacent second black matrix bars BM21 is aligned with the two second segments S2 of the other of the two adjacent second black matrix bars BM21 in the first direction.

[0200] Continue to refer to Figure 25 Each third segment S3, when projected onto the second substrate 1621, can overlap with the projected image of a color resist on the second substrate 1621, which is different from the two adjacent color resists. In an example embodiment, each third segment S3 may overlap with the green color resist G in the thickness direction of the display panel. Specifically, each third segment may have a length spanning one color resist in the second direction, and the third segment S3 of one of two adjacent second black matrix bars 1621 is aligned with the third segment S3 of the other of the two adjacent second black matrix bars 6121.

[0201] Some embodiments of this disclosure configure each second black matrix bar BM21 to have a non-uniform width, which controls the opening size of each pixel, allowing RGB subpixels to have different light transmission brightness. Considering human eye comfort and sensitivity to RGB subpixels, by setting the widths of the first segment S1, the second segment S2, and the third segment S3 of the second black matrix bar BM21 described herein, the light transmission area of ​​the green subpixel can be maximized, and the light transmission areas of the blue and red subpixels can be approximately the same size but smaller than the light transmission area of ​​the green subpixel. This allows the human eye to obtain a better viewing effect and experience when there is no ambient light affecting near-eye display.

[0202] In one or more embodiments of this disclosure, at least one of the plurality of second black matrix strips BM21 further has a fourth segment S4, which is located between adjacent second segments S2 to space them apart. The fourth segment S4 has a fourth width d4, which is close to 0 μm; for example, the fourth width d4 is greater than 0 μm and less than 2 μm. In this embodiment, setting the fourth width d4 to be equal to 0 on the substrate facilitates static electricity discharge and thus facilitates fabrication.

[0203] In this embodiment, the overlap and overlap detection indicators between adjacent color resists in the first color resist R, the second color resist G, and the third color resist B can refer to the overlap and overlap detection indicators described in detail in one or more previous embodiments. As an example, adjacent color resist layers in the first color resist R, the second color resist G, and the third color resist B can be adjacent and their overlap can be 0, but a certain margin is allowed, for example, ±0.6 μm. As an alternative embodiment, adjacent color resists in the first color resist R, the second color resist G, and the third color resist B can have a certain spacing, as long as the spacing meets the light leakage risk requirements.

[0204] In another aspect of this disclosure, a method for preparing a color filter substrate is also provided. Specifically, this method can prepare at least one color filter substrate according to this disclosure, such as at least one color filter substrate according to one or more embodiments disclosed in more detail above. Therefore, for alternative embodiments of this method, reference may be made to the embodiments of the color filter substrate described above as appropriate. The method may include the following steps, which may be performed in a given order or in a different order. Furthermore, additional method steps not listed may be provided. Furthermore, two or more, or even all, of the method steps may be performed at least partially simultaneously. Furthermore, the method steps may be repeated two or more times.

[0205] In one or more embodiments of this disclosure, a method for preparing a color filter substrate may include: providing a substrate; forming a first black matrix BM1 on the substrate; and forming a second black matrix BM2, wherein the second black matrix BM2 overlaps with the first black matrix BM1, and at the overlap position of the first black matrix BM1 and the second black matrix BM2, the second black matrix BM2 covers the first black matrix BM1 in a direction perpendicular to the substrate, and wherein the size of an opening defined by either the first black matrix BM1 or the second black matrix BM2 is larger than the size of an opening jointly defined by the first black matrix BM1 and the second black matrix BM2.

[0206] Figure 20 A flowchart illustrating a method for fabricating a color filter substrate according to one or more embodiments of this disclosure is shown schematically. Figure 20 As shown, the method may include the following steps S1002, S1004, S1006 and S1008.

[0207] In step S1001, a substrate 301 is provided. The substrate 301 may include semiconductor materials such as monocrystalline silicon or polycrystalline silicon. In alternative embodiments, the substrate may also be made of other rigid or flexible materials such as glass or plastic.

[0208] In one or more embodiments of this disclosure, at least one color filter substrate can be fabricated on a substrate (also referred to as a reference layer). When a single color filter substrate is fabricated on the substrate, excess portions outside the color filter substrate can be cut off after fabrication to form the color filter substrate. When multiple color filter substrates are fabricated on the substrate, the color filter substrates on the substrate can be separated to obtain multiple individual color filter substrates.

[0209] In step S1004, a first black matrix BM1 is formed on the substrate 301. The first black matrix BM1 may have... Figure 4A , Figure 5A , Figure 6A and Figure 7A Any of the arrangements or other arrangements shown herein. In some embodiments, the first black matrix BM1 may include at least a plurality of first black matrix strips BM11 extending along a first direction. Figure 4A and Figure 5A In an alternative embodiment, the first black matrix BM1 may include a plurality of first black matrix strips BM11 extending along a first direction and a plurality of third black matrix strips BM12 extending along a second direction. Figure 6A and Figure 7A ).

[0210] The first black matrix BM1 can be formed through processes such as coating, exposure, development, and baking. In this embodiment, to obtain a high PPI product, the width of the first black matrix strip BM11 extending along the first direction is typically small, for example, less than 3.0 micrometers. However, the thinner the longitudinal black matrix strip, the easier it is to detach during development. To prevent the first black matrix strip BM11 from detaching, the dimensions of the mask corresponding to the first black matrix strip BM11 can be set with a certain deviation, for example, a deviation of 0.5 micrometers. Overexposure can be used to allow the adhesive to react fully, thereby preventing the adhesive from detaching at the location of the first black matrix strip BM11 and reducing BM residue between adjacent first black matrix strips BM11.

[0211] In some embodiments of this disclosure, as outlined above, alignment markers (as shown in Figure 13), alignment detection markers (as shown in Figure 14), and / or overlap detection markers (as shown in Figure 15) can be formed on the substrate simultaneously with the formation of the first black matrix BM1. Figure 12 The first reference mark 121 is shown in the black hollow rectangle on the left side of the image (the center). The alignment mark can be adapted to align the layers during the fabrication of the individual layers of the color filter substrate; the alignment detection mark can be adapted to detect the alignment deviation of the relative positions of the layers after the formation of each layer; and the overlap detection mark is adapted to detect the alignment deviation between at least one of the subsequently formed first, second, and third color resists and a black matrix strip having the same extension direction as the color resist.

[0212] In step 1006, a second black matrix BM2 is formed on the substrate 301. The second black matrix BM2 partially overlaps with the first black matrix BM1, and at the overlap position, the second black matrix BM2 covers the first black matrix BM1 in a direction perpendicular to the substrate. In embodiments of this disclosure, the second black matrix BM2 and the first black matrix BM1 together form a combined black matrix for a color filter substrate. At the overlap position of the first black matrix BM1 and the second black matrix BM2, the second black matrix BM2 can be directly stacked on the first black matrix BM1. At the non-overlapping position of the first black matrix BM1 and the second black matrix BM2, the first black matrix BM1 and the second black matrix BM2 are coplanar.

[0213] The second black matrix BM2 can have the following properties: Figure 4A , Figure 5A , Figure 6A and Figure 7A Any of the arrangements or other arrangements shown herein. In some embodiments, the second black matrix BM2 may include at least a plurality of second black matrix strips BM21 extending along the second direction. Figure 4A In an alternative embodiment, the second black matrix BM2 may include a plurality of second black matrix strips BM21 extending along a second direction and a plurality of third black matrix strips BM22 extending along a first direction. Figure 5A and Figure 6A In yet another alternative embodiment, the second black matrix BM2 may include a plurality of first black matrix strips BM11 extending along a first direction. Figure 7A ).

[0214] The second black matrix BM2 can be formed through processes such as coating, exposure, development, and baking. In this embodiment, the width of the second black matrix strip BM21 extending along the second direction is typically greater than the width of the first black matrix strip BM11. In an example embodiment, the width of the second black matrix strip BM21 is typically 2-3 times the width of the first black matrix strip BM11, generally greater than 6.0 micrometers. Because the width of the second black matrix strip BM21 is relatively wide, it is less likely to cause BM detachment during development; therefore, overexposure is unnecessary. In embodiments where the second black matrix BM2 has a first black matrix strip BM11 and a third black matrix strip BM22 extending along the first direction, to prevent the first black matrix strip BM11 and the third black matrix strip BM22 from detaching, the dimensions of the mask corresponding to the first and third black matrix strips BM22 can be set with a certain deviation, for example, a deviation of 0.5 micrometers. Overexposure can allow the adhesive to react fully, thereby preventing the adhesive at the positions of the first and third black matrix strips BM22 from detaching.

[0215] In step S1008, a color resist layer is formed on the first black matrix BM1 and the second black matrix BM2, such that the color resist layer is located in the opening defined by the combined black matrix (formed by the first black matrix BM1 and the second black matrix BM2), and at least partially overlaps with a plurality of black matrix strips of the combined black matrix BM extending in a first direction in a direction perpendicular to the substrate.

[0216] In some embodiments, the color resist layer may include a first color resist R, a second color resist G, and a third color resist B arranged alternately in sequence along a second direction. In some embodiments, adjacent color resists among the first color resist R, the second color resist G, and the third color resist B may cover a plurality of black matrix strips extending along the first direction.

[0217] Figure 21 The flowchart illustrating the formation of a color resist layer according to one or more embodiments of the present disclosure is shown schematically. Figure 21 As shown, forming a color resist layer may include at least steps S2002, S2004 and S2006.

[0218] In step S2002, a first color filter R, a first detection marker 122, and a second reference marker 123 are formed. The first detection marker 122 is adapted to compare its position with the position of the first reference marker 121 to determine the overlap deviation of the first color filter R relative to the first black matrix BM1, and the second reference marker 123 is adapted to detect the overlap deviation of the second color filter G relative to the first color filter R and the third color filter B relative to the first color filter R. In this embodiment, the first color filter R can be a red color filter, and the first detection marker 122 and the second reference marker 123 can also be red.

[0219] In step S2004, a second color filter G, a second detection mark 124, and a third reference mark 125 are formed. The second detection mark 124 is adapted to compare its position with the position of the second reference mark 123 to determine the overlap deviation of the second color filter G relative to the first color filter R, and the third reference mark 125 is adapted to detect the overlap deviation of the third color filter B relative to the second color filter G. In this embodiment, the second color filter G can be a green color filter, and the second detection mark 124 and the third reference mark 125 can be green.

[0220] In step S2006, the third color resist B and the third detection mark 126 are formed. The third detection mark 126 is adapted to align its position with the positions of the second reference mark 123 and the third reference mark 125 to determine the overlap deviation of the third color resist relative to the first color resist R and the second color resist G. In this embodiment, the third color resist B can be a blue color resist, and the third detection mark 126 can also be blue.

[0221] Further details regarding the color resist layer, the overlap of adjacent color resist layers, and the overlap detection markings can be found in one or more embodiments described above for the color filter substrate.

[0222] The flowchart depicted in this disclosure is merely an example. Many variations of the flowchart or the steps described therein may exist without departing from the spirit of the invention. For example, the steps may be performed in a different order, or steps may be added, deleted, or modified. These variations are all considered part of the claimed aspects.

[0223] The foregoing description of embodiments has been provided for illustrative and descriptive purposes. It is not intended to be exhaustive or limiting of the present application. Various elements or features of a particular embodiment are generally not limited to that particular embodiment; however, these elements and features are interchangeable and can be used in chosen embodiments where appropriate, even if not specifically shown or described. Changes are also possible in many ways. Such changes should not be considered as departing from the present application, and all such modifications are included within the scope of this application.

Claims

1. A color filter substrate, comprising: substrate; The first black matrix is ​​located on the substrate; as well as A second black matrix partially overlaps with the first black matrix, wherein at the overlap position, the second black matrix covers the first black matrix in a direction perpendicular to the substrate, and wherein the size of an opening defined by either the first black matrix or the second black matrix is ​​larger than the size of an opening jointly defined by the first black matrix and the second black matrix. The orthographic projections of the first black matrix onto the substrate and the second black matrix onto the substrate together form a grid pattern. Wherein, the first black matrix includes at least a plurality of first black matrix strips extending along a first direction, and the second black matrix includes at least a plurality of second black matrix strips extending along a second direction different from the first direction and intersecting with the plurality of first black matrix strips, wherein the overlapping positions of the first black matrix and the second black matrix include the intersection positions of the plurality of first black matrix strips and the plurality of second black matrix strips. The thickness of the first black matrix is ​​greater than the thickness of the portion of the second black matrix that overlaps with the first black matrix, but less than the thickness of the portion of the second black matrix that does not overlap with the first black matrix.

2. The color filter substrate according to claim 1, wherein, The interval between two adjacent first black matrix bars in the plurality of first black matrix bars is smaller than the interval between two adjacent second black matrix bars in the plurality of second black matrix bars, and wherein the width of each first black matrix bar is smaller than the width of each second black matrix bar.

3. The color filter substrate according to claim 1, wherein, The first black matrix has a thickness of 0.9-1.1 μm; the second black matrix has a thickness of 0.4-0.6 μm at the overlapping position with the first black matrix; and the second black matrix has a thickness of 1.1-1.3 μm at the non-overlapping position with the first black matrix.

4. The color filter substrate according to claim 1, wherein, The second black matrix further includes a plurality of third black matrix strips extending along the first direction and intersecting with the plurality of second black matrix strips, wherein the plurality of third black matrix strips are distributed among the plurality of first black matrix strips such that there is at least one first black matrix strip between two adjacent third black matrix strips.

5. The color filter substrate according to claim 4, wherein, The plurality of third black matrix bars are arranged alternately with the plurality of first black matrix bars such that there is a first black matrix bar between two adjacent third black matrix bars.

6. The color filter substrate according to claim 5, wherein, The distance between the first black matrix bar and its adjacent third black matrix bar is less than the distance between two adjacent second black matrix bars. The first black matrix bar and the third black matrix bar have substantially the same width, and their width is less than the width of the second black matrix bar.

7. The color filter substrate according to any one of claims 1 to 6, wherein, The first black matrix further includes a plurality of fourth black matrix strips extending along the second direction and intersecting with the plurality of first black matrix strips, wherein the plurality of fourth black matrix strips are distributed among the plurality of second black matrix strips such that there is at least one second black matrix strip between any two adjacent fourth black matrix strips.

8. The color filter substrate according to claim 7, wherein, The multiple fourth black matrix bars and the multiple second black matrix bars are arranged alternately such that there is a second black matrix bar between two adjacent fourth black matrix bars.

9. The color filter substrate according to claim 7, wherein, The fourth black matrix bar and the second black matrix bar have substantially the same width, and their width is greater than that of the first black matrix bar.

10. The color filter substrate according to claim 1, wherein the first black matrix comprises a plurality of first black matrix strips extending along a first direction and a plurality of fourth black matrix strips extending along a second direction different from the first direction, and the second black matrix comprises a plurality of third black matrix strips extending along the first direction, and wherein, The plurality of third black matrix bars are arranged alternately with the plurality of first black matrix bars such that there is a first black matrix bar between two adjacent third black matrix bars.

11. The color filter substrate according to claim 1, wherein, The thickness of the portion of the second black matrix that overlaps with the first black matrix is ​​less than the thickness of the portion of the second black matrix that does not overlap with the first black matrix.

12. The color filter substrate according to claim 1, further comprising a color resist layer, the color resist layer comprising a first color resist, a second color resist, and a third color resist arranged alternately in the second direction.

13. The color filter substrate according to claim 12, wherein, At the overlapping position of the second black matrix and the first black matrix, the second black matrix is ​​in direct contact with the first black matrix, and wherein, at the non-overlapping position of the first black matrix and the second black matrix, the second black matrix and the first black matrix are coplanar.

14. The color filter substrate according to claim 13, wherein, At least one of the first black matrix and the second black matrix includes a plurality of black matrix strips extending along the first direction, and the color resist layer is located in an opening defined by the first black matrix and the second black matrix and at least partially overlaps with the plurality of black matrix strips in a direction perpendicular to the substrate.

15. The color filter substrate according to claim 12, wherein, An intermediate layer is provided between the first black matrix and the second black matrix at the overlapping position, wherein the intermediate layer includes the color resist layer.

16. The color filter substrate according to claim 15, wherein, At least one of the first black matrix and the second black matrix includes a plurality of black matrix strips extending along the first direction, and the color resist layer fills the opening defined by the first black matrix and at least partially overlaps the plurality of black matrix strips in a direction perpendicular to the substrate.

17. The color filter substrate according to any one of claims 13 to 16, wherein, The overlap between adjacent color resistors among the first, second, and third color resistors is 0, but a certain margin is allowed.

18. The color filter substrate according to claim 17, wherein, The margin is 0-±0.6μm.

19. A substrate used in preparing a color filter substrate of claim 17 or 18, the substrate comprising an overlap detection mark configured to detect overlap deviations between one of the first, second, and third color resists and the plurality of black matrix bars, and between adjacent color resists among the first, second, and third color resists.

20. The substrate according to claim 19, wherein, The overlap detection identifier includes: A first reference marker is adapted to detect the overlap deviation of the first color resist relative to the first black matrix; A first detection marker is adapted to compare its position with the position of the first reference marker in order to determine the overlap deviation of the first color resist relative to the first black matrix; The second reference mark is adapted to detect the overlap deviation of the second color resist relative to the first color resist and the third color resist relative to the first color resist. A second detection mark is adapted to compare its position with the position of a second reference mark in order to determine the overlap deviation of the second color resist relative to the first color resist; A third reference marker, adapted to detect the overlap deviation of the third color resist relative to the second color resist; and A third detection mark is adapted to position itself relative to the second and third reference marks in order to determine the overlap deviation of the third color resist relative to the first and second color resists.

21. The substrate according to claim 20, wherein, The first reference mark is formed of the same material as the first black matrix; the first detection mark and the second reference mark are formed of the same material as the first color resist; the second detection mark and the third reference mark are formed of the same material as the second color resist; and the third detection mark is formed of the same material as the third color resist.

22. The substrate according to claim 20 or 21, wherein, The first reference mark, the second reference mark, and the third reference mark are hollow rectangles, and the first detection mark, the second detection mark, and the third detection mark are solid rectangles. The first detection mark, the second detection mark, and the third detection mark are respectively located within the first reference mark, the second reference mark, and the third reference mark.

23. A display panel, comprising: Color filter substrate, comprising: First substrate; and A first black matrix located on the first substrate, the first black matrix comprising a plurality of first black matrix strips extending along a first direction. Array substrate, comprising: Second substrate; and A second black matrix located on the second substrate, the second black matrix comprising a plurality of second black matrix strips extending along a second direction different from the first direction, the orthographic projection of the first black matrix on the first substrate and the orthographic projection of the second black matrix on the first substrate together forming a grid pattern. The array substrate further includes a plurality of thin-film transistors located on the side of the second black matrix away from the second substrate. The orthographic projection of the active layer of the plurality of thin-film transistors onto the second substrate lies within the orthographic projection of the plurality of second black matrix strips onto the second substrate, such that the plurality of second black matrix strips are multiplexed as a plurality of first light-shielding portions that block light incident on the active layer. Each of the plurality of second black matrix bars includes at least one first segment having a first width in the first direction, at least one second segment having a second width in the first direction, and at least one third segment having a third width in the first direction, wherein the first width is greater than the second width, and the second width is greater than the third width.

24. The display panel according to claim 23, wherein, The color filter substrate further includes a color resist layer, which is located in an opening defined by the first black matrix and at least partially overlaps with the plurality of first black matrix stripes in a direction perpendicular to the color filter substrate.

25. The display panel according to claim 24, wherein, The color resist layer includes a first color resist, a second color resist, and a third color resist. The overlap between adjacent color resists among the first color resist, the second color resist, and the third color resist is 0, but a certain margin is allowed.

26. The display panel according to claim 25, wherein, The color filter substrate further includes a plurality of spacers configured to separate the color filter substrate and the array substrate, and the array substrate further includes a plurality of bosses configured to be abutted against by one or more of the plurality of spacers, the orthographic projection of the plurality of bosses on the second substrate being located within the orthographic projection of the plurality of second black matrix bars on the second substrate.

27. The display panel according to claim 24, wherein, The orthographic projection of at least one first segment on the second substrate overlaps with the orthographic projection of the plurality of protrusions on the second substrate, and each first segment spans two adjacent color resists in the color resist layer along the second direction, wherein... Each second segment spans one color resist in the color resist layer along the second direction, said color resist being one of the two adjacent color resists, and each first segment of one of the two adjacent second black matrix strips is aligned with the two second segments of the other of the two adjacent second black matrix strips in the first direction, and wherein Each third segment crosses another color resist in the color resist layer along the second direction, the other color resist being different from the two adjacent color resists, and the third segment of one of the two adjacent second black matrix strips is aligned with the third segment of the other of the two adjacent second black matrix strips in the first direction.

28. The display panel according to claim 1 or 27, wherein, Each of the plurality of second black matrix bars also has a fourth segment located between adjacent second segments, the fourth segment having a fourth width along the first direction, the fourth width being substantially equal to 0 μm.

29. The display panel according to claim 26, wherein, The array substrate further includes: A plurality of first electrodes are located on the side of the plurality of thin-film transistors away from the second substrate, and the plurality of first electrodes are electrically connected to the drain electrodes of the plurality of thin-film transistors respectively; A second electrode layer located on the side of the plurality of first electrodes away from the second substrate and electrically insulated from the plurality of first electrodes, and A plurality of second light-shielding portions are electrically contacted with the second electrode layer and extend along the first direction, wherein the orthographic projection of the plurality of second light-shielding portions on the second substrate overlaps with the orthographic projection of the plurality of first black matrix strips on the second substrate.

30. The display panel according to claim 29, wherein, The second light-shielding portion is located on the side of the second electrode layer away from the second substrate or on the side of the second electrode layer closer to the second substrate.

31. The display panel according to claim 29 or 30, wherein, At least one of the plurality of second light-shielding portions is broken at the location where it intersects with the plurality of first segments.

32. A display panel comprising a color filter substrate according to any one of claims 1 to 18.

33. A method for preparing a color filter substrate according to any one of claims 1 to 18, comprising: Provide a base; The first black matrix is ​​formed on the substrate; as well as A second black matrix is ​​formed, wherein the second black matrix overlaps with the first black matrix, and at the overlap position of the first black matrix and the second black matrix, the second black matrix covers the first black matrix in a direction perpendicular to the substrate, and wherein the size of the opening defined by either the first black matrix or the second black matrix is ​​larger than the size of the opening jointly defined by the first black matrix and the second black matrix.

34. The method according to claim 33, wherein, The coverage includes the second black matrix being directly superimposed on the first black matrix at the overlapping position of the first black matrix and the second black matrix, wherein, at the non-overlapping position of the first black matrix and the second black matrix, the first black matrix and the second black matrix are coplanar, and wherein at least one of the first black matrix and the second black matrix includes a plurality of black matrix strips extending along the first direction. Furthermore, the method further includes forming a color resist layer on the first black matrix and the second black matrix, such that the color resist layer is located in an opening jointly defined by the first black matrix and the second black matrix and at least partially overlaps with the plurality of black matrix strips in a direction perpendicular to the substrate.

35. The method according to claim 33, wherein, The coverage includes an intermediate layer between the first black matrix and the second black matrix at the overlapping location, wherein the intermediate layer includes a color resist layer, and wherein at least one of the first black matrix and the second black matrix includes a plurality of black matrix strips extending along the first direction. Furthermore, between forming the first black matrix and forming the second black matrix, the method further includes: forming the color resist layer on the first black matrix such that the color resist layer fills the opening region defined by the first black matrix and at least partially overlaps the plurality of black matrix strips in a direction perpendicular to the substrate.

36. The method according to claim 34 or 35, wherein, The color resist layer comprises a first color resist, a second color resist, and a third color group arranged alternately in sequence in the second direction. The formation of the first black matrix on the substrate includes: A first black matrix and a first reference mark are formed on the substrate, wherein the first reference mark is adapted to detect the overlap deviation of the first color resist relative to the first black matrix. The formation of the color resist layer includes: A first color resist, a first detection mark, and a second reference mark are formed, wherein the first detection mark is adapted to compare its position with the position of the first reference mark in order to determine the overlap deviation of the first color resist relative to the first black matrix, and the second reference mark is adapted to detect the overlap deviation of the second color resist relative to the first color resist and the third color resist relative to the first color resist. A second color resist, a second detection mark, and a third reference mark are formed, wherein the second detection mark is adapted to compare its position with the position of the second reference mark to determine the overlap deviation of the second color resist relative to the first color resist, and the third reference mark is adapted to detect the overlap deviation of the third color resist relative to the second color resist; and The third color resist and the third detection mark are formed, wherein the third detection mark is adapted to position itself relative to the positions of the second reference mark and the third reference mark in order to determine the overlap deviation of the third color resist relative to the first color resist and the second color resist.

37. The method of claim 36, wherein, The first reference mark is formed of the same material as the first black matrix; the first detection mark and the second reference mark are formed of the same material as the first color resist; the second detection mark and the third reference mark are formed of the same material as the second color resist; and the third detection mark is formed of the same material as the third color resist.

38. The method according to claim 37, wherein, The first reference mark, the second reference mark, and the third reference mark are hollow rectangles, and the first detection mark, the second detection mark, and the third detection mark are solid rectangles. The first detection mark, the second detection mark, and the third detection mark are respectively located within the first reference mark, the second reference mark, and the third reference mark.

Images