A method for regulating plasma to prepare high-toughness twin diamond ring
By controlling plasma deposition using plasma chemical vapor deposition and rotating pulse method, the problem of insufficient strength and toughness of twinned diamond rings was solved, and twinned diamond rings with high strength and toughness were prepared, which are suitable for cutting tools and abrasives.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- NORTH CHINA UNIVERSITY OF TECHNOLOGY
- Filing Date
- 2024-03-18
- Publication Date
- 2026-06-02
AI Technical Summary
Existing technologies are insufficient for effectively preparing high-strength and high-toughness twinned diamond rings, which limits their application in cutting tools and abrasives.
High-strength and tough twinned diamond rings were prepared by combining plasma chemical vapor deposition with a rotating pulse method, and by controlling the plasma deflection direction and magnetic field strength, the plasma deposition on the substrate surface was controlled.
The prepared twinned diamond rings have high strength and toughness, making them suitable for practical applications such as the production of pure diamond grinding wheels, and improving deposition uniformity and efficiency.
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