Ultrasonic enhanced plasma electrochemical assisted liquid capsule polishing device and polishing method

Abstract

The application relates to the technical field of liquid capsule polishing and discloses an ultrasonic enhanced plasma electrochemical auxiliary liquid capsule polishing device and a polishing method. The polishing device comprises an upper base and a lower base which are arranged in a spaced manner, the lower base has the freedom of moving along the axis of the upper base, an annular liquid capsule is arranged between the upper base and the lower base, the upper opening of the annular liquid capsule is sleeved on the upper base, the lower opening of the annular liquid capsule is sleeved on the lower base, a liquid storage cavity is formed between the upper base, the lower base and the annular liquid capsule, a deionized water conduit is arranged on the upper base and communicates with the liquid storage cavity, an electrolyte conduit is arranged on the lower base and leads through the annular liquid capsule, and an ultrasonic vibrator is sleeved on the electrolyte conduit. The plasma electrochemical action is generated on the surface of a workpiece through discharging, under the action of ultrasonic waves, micro cavities or bubbles are formed on the surface of the workpiece, the surface of the workpiece is more prone to generating plasma, a high-integrity processing surface is realized, and the polishing device has the advantages of high machining precision, high efficiency, long tool service life and the like.

Description

Technical Field

[0001] This invention relates to the field of liquid bladder polishing technology, specifically to an ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device and polishing method. Background Technology

[0002] With the rapid development of aerospace, biomedicine, and defense industries, titanium alloys, nickel-based superalloys, and tungsten alloys have become the most widely used high-performance metallic materials in these fields. These materials are typical difficult-to-machine metallic materials in traditional machining, characterized by high hardness, poor thermal conductivity, high toughness, and active chemical properties. Currently, the design requirements for the safety, reliability, and service life of equipment in these fields are increasingly stringent, and the requirements for high-integrity surface processing of key components are becoming increasingly demanding. Traditional machining methods are gradually becoming insufficient to meet the high-precision manufacturing requirements of core components. To solve these problems, composite energy field-assisted machining methods, utilizing sound, light, electricity, and chemical energy, have been proposed. These methods, through a combination of physical and chemical energy fields, effectively lower the material removal threshold of metals, enabling high-quality and efficient removal of difficult-to-machine metallic materials. This is a mainstream method for further improving manufacturing precision using traditional machining methods.

[0003] Plasma is the fourth state of matter. Plasma can be generated in a liquid phase environment by discharging an electrolyte; therefore, plasma formed in this environment is also known as plasma electrochemical technology. Utilizing the high energy density of active substances, strong electric fields, high temperatures, strong ultraviolet radiation, and strong shock waves contained in liquid-phase discharge plasma, the surface properties of difficult-to-machine metal materials can be controlled. Existing plasma electrochemical polishing technology lacks mechanical action and, while it can be used for polishing complex curved surfaces, it cannot precisely control the generation position and intensity of the plasma, resulting in low processing accuracy and difficulty in achieving deterministic high-precision dimensional machining of parts. For example, invention patent application number "CN202310817643.4" describes a liquid-phase plasma polishing device for metal wires. This device controls the area of ​​the workpiece entering the electrolytic cell through a wire feeding system, and can only achieve surface polishing of specific areas of filamentous or long plate-shaped materials, failing to precisely control processing accuracy. Currently, there is no plasma electrochemical-assisted mechanical polishing equipment directly applicable to high-precision polishing of complex curved surface parts.

[0004] Airbag polishing is a flexible mechanical polishing method commonly used for deterministic polishing of complex curved surfaces. It primarily achieves this by controlling the gas pressure within a flexible airbag to ensure close contact between the airbag and the various curved surfaces. The removal mechanism of airbag polishing involves shear stress exceeding the material's fracture limit, causing the material to tear from the substrate surface and form chips. However, because airbags cannot provide significant shear stress, it suffers from low processing efficiency, poor processing accuracy, and numerous surface defects when machining difficult-to-machine metals. For example, invention patents with application number "CN202211571007.X" and invention number "202310324980.X" propose solutions to improve low processing accuracy, but they still do not overcome the fundamental bottleneck of purely mechanical removal. Based on this, ultrasonic and electrochemical processes have been used to assist airbag polishing. For example, the invention patent with invention number "201610963123.4" describes an ultrasonic vibration-assisted electrochemical mechanical polishing method and device. However, this method only utilizes electrochemical corrosion, which makes it difficult to achieve controllable modification of the surface of the aforementioned difficult-to-machine metal materials, and thus cannot fundamentally achieve high-quality and efficient removal of difficult-to-machine metal materials. Secondly, the invention patent with invention number "2023117421204" describes a plasma electrochemical mechanical polishing liquid for processing titanium alloy surfaces and its application, and provides comparative experiments: it describes that pure electrochemical corrosion is difficult to effectively modify materials such as titanium alloys, and that plasma electrochemical action with higher energy density is required to effectively modify the surface of titanium alloys. In addition, ultrasonic vibration is used to assist in airbag polishing, which has no synergistic effect on electrochemistry itself.

[0005] In summary, the existing technologies have the following problems: First, plasma electrochemical polishing technology cannot precisely control the point and intensity of plasma action, resulting in low processing accuracy and poor processing efficiency; Second, as a purely mechanical removal processing method, airbag polishing technology also suffers from low processing accuracy, poor processing efficiency, and short tool life when polishing the surface of difficult-to-machine metal materials; Third, the disclosed electrochemical action has a weak ability to regulate the surface properties of difficult-to-machine metal materials, and cannot achieve precise and controllable modification of the material surface, thus failing to fundamentally solve the problems of low processing accuracy and poor processing efficiency; Fourth, the disclosed ultrasonic vibration has no amplifying effect on electrochemical action, is no significantly different from other ultrasonic-assisted methods, and also fails to fundamentally solve the problems of low processing accuracy and poor processing efficiency. Summary of the Invention

[0006] The purpose of this invention is to overcome the shortcomings of the prior art and provide an ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device to solve the shortcomings of the prior art.

[0007] The objective of this invention is achieved through the following technical solution: an ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device, comprising an upper base and a lower base spaced apart vertically, the lower base having a degree of freedom to move axially along the upper base, an annular liquid bladder being disposed between the upper base and the lower base, the upper opening of the annular liquid bladder being fitted onto the upper base, the lower opening of the annular liquid bladder being fitted onto the lower base, a liquid storage cavity being formed between the upper base, the lower base and the annular liquid bladder, a deionized water conduit passing through the upper base and communicating with the liquid storage cavity, an electrolyte conduit passing through the lower base and communicating with the annular liquid bladder, and an ultrasonic transducer being fitted onto the electrolyte conduit.

[0008] In some embodiments, the annular liquid bladder includes a water storage bladder, a support membrane, and a working liquid bladder arranged sequentially from the inside to the outside.

[0009] In some embodiments, the water storage bladder is made of a highly durable and highly elastic sealing rubber membrane, the working fluid bladder is made of a rubber sponge with a certain elastic modulus, and the support membrane is made of an insulating and sealing rubber membrane.

[0010] In some embodiments, the support membrane is disposed in close contact with the water storage bladder, and the elastic modulus of the support membrane is less than that of the water storage bladder.

[0011] In some embodiments, a liquid outlet gap is formed between the working fluid bladder and the support membrane, an inner cavity is provided inside the lower base, the electrolyte conduit is connected to the inner cavity, an annular flow guide gap is formed on the outer wall of the lower base, and the two ends of the annular flow guide gap are respectively connected to the liquid outlet gap and the inner cavity.

[0012] In some embodiments, the outer wall of the upper base is provided with a first annular mounting groove, the upper opening of the water storage bladder is installed in the first annular mounting groove, the lower opening of the water storage bladder is fixedly fitted on the lower base, the outer wall of the upper base is provided with a second annular mounting groove, the upper opening of the support membrane is installed in the second annular mounting groove, and the lower opening of the support membrane is fixedly fitted on the lower base.

[0013] In some embodiments, an outer baffle is fitted onto the upper base, the outer baffle is bolted to the upper base, and the upper opening of the working fluid bladder is pressed between the upper base and the outer baffle.

[0014] In some embodiments, an insulating baffle is provided between the upper base and the outer baffle, the bolt passes through the insulating baffle, a plasma generator cathode is provided between the insulating baffle and the upper base, an upper conductive slip ring is fitted on the deionized water conduit, the upper conductive slip ring is located above the upper base, and the plasma generator cathode is connected to the upper conductive slip ring.

[0015] In some embodiments, an adjusting bolt is provided inside the lower base, a lower conductive slip ring is fitted on the electrolyte conduit, the lower conductive slip ring is located below the lower base, the adjusting bolt is connected to an adjusting circuit, and the adjusting circuit and the ultrasonic transducer are both connected to the lower conductive slip ring.

[0016] A polishing method for ultrasonic cavitation-assisted plasma electrochemical liquid capsule polishing, utilizing the aforementioned polishing apparatus, comprises the following main steps:

[0017] S1. Before starting work, clamp the workpiece on the worktable, install the liquid bladder polishing head on the machine tool or robot, connect the liquid bladder polishing head to the negative terminal of the power supply, and connect the workpiece to the positive terminal of the power supply.

[0018] S2. Before starting work, open the deionized water channel and the electrolyte channel to fill the storage bladder and the working bladder with deionized water and electrolyte respectively.

[0019] S3. Before starting work, turn on the power supply and ultrasonic generator, and let the power parameters and ultrasonic parameters reach the set values ​​and stabilize.

[0020] S4. During operation, the liquid bladder polishing head rotates at a constant speed and gradually approaches the workpiece surface until it finally contacts it. When the contact interface reaches a certain contact pressure, the electrolyte gradually seeps out and conducts the liquid bladder polishing head and the workpiece, thereby generating an ultrasonic-enhanced plasma electrochemical effect.

[0021] S5. Under the action of ultrasonic enhanced plasma electrochemistry, the titanium alloy surface achieves material corrosion removal on the one hand, and generates a reaction film with lower mechanical strength and lower adhesion to the substrate on the other hand. The two combine to form a surface micro-roughness peak with unevenness.

[0022] S6. Under the mechanical force of the liquid bladder polishing head, the micro-roughness peaks on the titanium alloy surface are quickly removed, while the recessed areas are removed slowly, ultimately resulting in a super-smooth, low-damage workpiece surface.

[0023] The beneficial effects of this invention are:

[0024] (1) The electrolyte in the polishing head of the present invention requires a certain contact pressure to seep out, so the seepage point and seepage amount of the electrolyte can be controlled, thereby realizing the controllable action point and action intensity of plasma electrochemistry;

[0025] (2) The present invention uses a liquid bladder to transmit mechanical force, which avoids the problem of unstable and inaccurate mechanical force application caused by the high air compression ratio of traditional air bladders;

[0026] (3) The ultrasonic-enhanced plasma electrochemical composite effect proposed in this invention has a higher energy density and a stronger weakening effect on the surface reaction film of difficult-to-machine metal materials. It has the advantages of high processing accuracy, high efficiency and long tool life. Attached Figure Description

[0027] Figure 1 This is a schematic diagram of the internal structure of the ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device of the present invention;

[0028] Figure 2 This is a partial cross-sectional view of the ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device of the present invention;

[0029] Figure 3 This is a schematic diagram of the external structure of the ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device of the present invention;

[0030] Figure 4 This is a top view of the ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device of the present invention;

[0031] Figure 5 This is a diagram showing the working state of the ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device of the present invention.

[0032] In the figure, 101-upper base, 102-lower base, 103-second annular mounting groove, 104-first annular mounting groove, 105-deionized water conduit, 201-adjusting bolt, 202-adjusting line, 3-electrolyte conduit, 4-working liquid bladder, 5-supporting membrane, 6-water storage bladder, 7-external baffle, 8-insulating baffle, 9-plasma generator cathode, 10-upper conductive slip ring, 11-lower conductive slip ring, 12-liquid guiding slip ring, 13-ultrasonic vibrator, 14-bolt, 15-liquid outlet gap, 16-inner cavity, 17-annular flow guiding gap. Detailed Implementation

[0033] The technical solution of the present invention will be further described in detail below with reference to the accompanying drawings, but the scope of protection of the present invention is not limited to the following description.

[0034] like Figures 1 to 5As shown, the ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing device includes an upper base 101 and a lower base 102 spaced apart vertically. The lower base 102 has a degree of freedom to move along the axial direction of the upper base 101. An annular liquid bladder is disposed between the upper base 101 and the lower base 102. The upper opening of the annular liquid bladder is fitted onto the upper base 101, and the lower opening of the annular liquid bladder is fitted onto the lower base 102. The annular liquid bladder is elastic and can adapt to the shape of the workpiece surface to be processed. A liquid storage cavity is formed between the upper base 101, the lower base 102, and the annular liquid bladder. A passage is inserted through the upper base 101. An ionized water conduit 105 and a deionized water conduit 105 are connected to a liquid storage cavity. An electrolyte conduit 3 is installed on the lower base 102, and the electrolyte conduit 3 is connected to an annular liquid bladder. Based on air bladder polishing, a liquid bladder polishing method is proposed. This method utilizes ultrasonic vibration to enhance plasma electrochemical action and organically combines it with liquid bladder polishing technology to develop a novel ultrasonic-enhanced plasma electrochemical-assisted liquid bladder polishing technology and equipment. The processing principle of this technology is briefly described as follows: Under the synergistic effect of ultrasonic vibration and discharge, a gas film with internal cavitation phenomenon is formed on the surface of the workpiece, enabling the workpiece surface to... The plasma electrochemical action generates higher energy density, thereby promoting corrosion removal from the workpiece surface and forming a reaction film on the workpiece surface. Subsequently, under the mechanical action of the annular liquid bladder, micro-protrusions on the workpiece surface are preferentially removed, while depressions are removed with delay, ultimately achieving a processed surface with high integrity. Specifically, the deionized water conduit 105 is connected to the deionized water tank via a deionized water pump, and the electrolyte conduit 3 is connected to the electrolyte tank via an electrolyte water pump. The specific polishing process is as follows: First, the liquid bladder polishing device is installed on a machine tool or robot, and deionized water is injected into the storage cavity via the deionized water pump. Ionized water causes the annular liquid bladder to deform. Electrolyte is injected into the annular liquid bladder through an electrolyte pump. The machine tool or robot is started to drive the liquid bladder polishing device to rotate. Then, the ultrasonic transducer 13 is started and powered on. Under the motion control of the machine tool or robot, the annular liquid bladder contacts the area of ​​the workpiece to be polished and leaks electrolyte to conduct positive and negative electrodes, thus completing the polishing operation. The annular liquid bladder has the functions of flexible mechanical polishing and controlling the leakage area and flow rate of electrolyte. When the leaked charged electrolyte comes into contact with the charged workpiece, plasma will be generated on the surface of a specific area, performing plasma electrochemical polishing and modification.

[0035] In some embodiments, such as Figure 1As shown, the annular liquid bladder includes a water storage bladder 6, a support membrane 5, and a working bladder 4 arranged sequentially from the inside out. The main function of the water storage bladder 6 is to store deionized water. The shape of the annular liquid bladder is changed by controlling the pressure of the injected deionized water. Therefore, the water storage bladder 6 is made of a highly durable and highly elastic sealing rubber membrane. The working bladder 4 needs to contact the workpiece for polishing. Therefore, the working bladder 4 is made of rubber sponge with a certain elastic modulus. The support membrane 5 is made of an insulating and sealing rubber membrane. The support membrane 5 is set tightly against the water storage bladder 6. The elastic modulus of the support membrane 5 is less than that of the water storage bladder 6. In order to balance the pressure between the two sides and maintain the shape of the polishing working area, an insulating and sealing support membrane 5 with an elastic modulus slightly smaller than that of the water storage bladder 6 is added to the outside of the water storage bladder 6, which balances the water pressure and controls the shape of the polishing area.

[0036] In some embodiments, such as Figure 1 As shown, a liquid outlet gap 15 is formed between the working liquid bladder 4 and the support membrane 5. An inner cavity 16 is provided inside the lower base 102. The electrolyte conduit 3 is connected to the inner cavity 16. An annular flow guide gap 17 is formed on the outer wall of the lower base 102. The two ends of the annular flow guide gap 17 are connected to the liquid outlet gap 15 and the inner cavity 16, respectively. The electrolyte enters the inner cavity 16 through the electrolyte conduit 3, then enters the liquid outlet gap 15 through the annular flow guide gap 17, and finally seeps out from the working liquid bladder 4 to contact the workpiece surface.

[0037] In some embodiments, such as Figure 1 and Figure 2 As shown, the outer wall of the upper base 101 is provided with a first annular mounting groove 104. The upper opening of the water storage bladder 6 is installed in the first annular mounting groove 104, and the lower opening of the water storage bladder 6 is fixedly fitted on the lower base 102. The outer wall of the upper base 101 is provided with a second annular mounting groove 103. The upper opening of the support membrane 5 is installed in the second annular mounting groove 103, and the lower opening of the support membrane 5 is fixedly fitted on the lower base 102. An outer baffle 7 is fitted on the upper base 101. The outer baffle 7 is connected to the upper base 101 by bolts 13. The upper opening of the working liquid bladder 4 is pressed between the upper base 101 and the outer baffle 7, and the lower opening of the working liquid bladder 4 is fixedly fitted on the lower base 102. The upper part of the annular liquid bladder is designed to be detachable for easy installation, that is, the water storage bladder 6, the support membrane 5 and the working liquid bladder 4 are installed in sequence. Secondly, the top of the outer baffle 7 is provided with threads for installing the liquid bladder polishing device onto a machine tool or robot.

[0038] In some embodiments, such as Figures 1 to 3As shown, an insulating baffle 8 is provided between the upper base 101 and the outer baffle 7. Bolts 13 pass through the insulating baffle 8. A plasma generator cathode 9 is provided between the insulating baffle 8 and the upper base 101. An upper conductive slip ring 10 is fitted on the deionized water conduit 105. The upper conductive slip ring 10 is located above the upper base 101. The plasma generator cathode 9 is connected to the upper conductive slip ring 10. The insulating baffle 8 is mainly made of insulating material to prevent leakage of the plasma generator cathode 9 and avoid harm to the operator. First, install the water storage tank 6 and the support membrane 5, then install the plasma generator cathode 9, cover with the insulating baffle 8, install the working liquid tank 4, then cover with the outer baffle 7, tighten the bolts 13 to complete the installation, and finally connect the deionized water conduit 105 and the electrolyte conduit 3.

[0039] In some embodiments, such as Figure 1 and Figure 3 As shown, an adjusting bolt 201 is provided inside the lower base 102, and a lower conductive slip ring 11 is fitted on the electrolyte conduit 3. The lower conductive slip ring 11 is located below the lower base 102. The adjusting bolt 201 is connected to an adjusting line 202. The adjusting bolt is divided into a bolt part located in the guide groove of the lower base and a bolt part fixed together with the upper base. The lifting and lowering are controlled by the adjusting line 202 to achieve the purpose of lifting / lowering the upper base, thereby controlling the relative distance between the upper and lower bases, and thus adjusting the radius of curvature of the central annular bladder area. The adjusting line 202 is connected to the lower conductive slip ring 11, and the electrolyte conduit 3 is connected to a liquid guiding slip ring 12. By changing the position of the adjusting bolt 201, the distance between the upper base 101 and the lower base 102 is changed, the size of the liquid storage cavity is changed, and thus the radius of curvature of the annular liquid bladder is adjusted. Since there are various pipes and wires in the liquid bladder polishing device, in order to avoid the situation where the wires become entangled during operation and cause structural failure, an upper conductive slip ring 10, a lower conductive slip ring 11, and a liquid guiding slip ring 12 are set to regulate the wires. The adjusting bolt adopts a bolt and nut structure to form a lead screw and nut pair mechanism, which is existing technology and will not be described in detail.

[0040] A polishing method for ultrasonic cavitation-assisted plasma electrochemical liquid capsule polishing, utilizing the aforementioned polishing apparatus, comprises the following main steps:

[0041] S1. Before starting work, clamp the workpiece on the worktable, install the liquid bladder polishing head on the machine tool or robot, connect the liquid bladder polishing head to the negative terminal of the power supply, and connect the workpiece to the positive terminal of the power supply. The voltage is 250-350V, the frequency is 0-50000Hz, and the duty cycle is 0-100%.

[0042] S2. Before starting work, open the deionized water channel and the electrolyte channel to fill the storage bladder and the working bladder with deionized water and electrolyte respectively.

[0043] S3. Before starting work, turn on the power supply and ultrasonic generator, and let the power parameters and ultrasonic parameters reach the set values ​​and stabilize. The ultrasonic parameters are: frequency 20-60 kHz.

[0044] S4. During operation, the liquid bladder polishing head rotates at a constant speed and gradually approaches the workpiece surface until it finally contacts it. When the contact interface reaches a certain contact pressure, the electrolyte gradually seeps out and conducts the liquid bladder polishing head and the workpiece, thereby generating an ultrasonic-enhanced plasma electrochemical effect.

[0045] S5. Under the action of ultrasonic enhanced plasma electrochemistry, the titanium alloy surface achieves material corrosion removal on the one hand, and generates a reaction film with lower mechanical strength and lower adhesion to the substrate on the other hand.

[0046] S6. Under the mechanical force of the liquid bladder polishing head, the micro-roughness peaks on the titanium alloy surface are quickly removed, while the recessed areas are removed slowly, ultimately resulting in a super-smooth, low-damage workpiece surface.

[0047] In the description of this invention, it should be understood that the terms "coaxial," "bottom," "one end," "top," "middle," "other end," "upper," "side," "top," "inner," "front," "center," and "both ends," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention. Furthermore, those skilled in the art will understand that the beneficial effects to be achieved by this invention are merely to achieve better beneficial effects compared with the current embodiments in the prior art under specific conditions, rather than to directly achieve the best use effect in the industry.

[0048] The above description is merely a preferred embodiment of the present invention. It should be understood that the present invention is not limited to the forms disclosed herein and should not be construed as excluding other embodiments. It can be used in various other combinations, modifications, and environments, and can be altered within the scope of the concept described herein through the above teachings or related technologies or knowledge. Modifications and variations made by those skilled in the art that do not depart from the spirit and scope of the present invention should be within the protection scope of the appended claims.

Claims

1. An ultrasonic cavitation-assisted plasma electrochemical liquid capsule polishing device, characterized in that, The device includes an upper base (101) and a lower base (102) spaced apart vertically. The lower base (102) has the freedom to move along the axial direction of the upper base (101). An annular liquid bladder is provided between the upper base (101) and the lower base (102). The upper opening of the annular liquid bladder is fitted onto the upper base (101), and the lower opening of the annular liquid bladder is fitted onto the lower base (102). A liquid storage cavity is formed between the upper base (101), the lower base (102), and the annular liquid bladder. A deionized water conduit (105) is provided through the upper base (101) and communicates with the liquid storage cavity. An electrolyte conduit (3) is provided through the lower base (102) and communicates with the annular liquid bladder. The annular liquid bladder includes a water storage bladder (6), a support membrane (5), and a working liquid bladder (4) arranged sequentially from the inside to the outside. The support membrane (5) is disposed in close contact with the water storage bladder (6), and the elastic modulus of the support membrane (5) is less than that of the water storage bladder (6). A liquid outlet gap (15) is formed between the working liquid bladder (4) and the support membrane (5). An inner cavity (16) is provided inside the lower base (102). The electrolyte conduit (3) is connected to the inner cavity (16). An annular flow guide gap (17) is formed on the outer wall of the lower base (102). The two ends of the annular flow guide gap (17) are respectively connected to the liquid outlet gap (15) and the inner cavity (16).

2. The ultrasonic cavitation-assisted plasma electrochemical liquid capsule polishing device according to claim 1, characterized in that, The water storage bladder (6) is made of a highly durable and highly elastic sealing rubber membrane, the working bladder (4) is made of a rubber sponge with a certain elastic modulus, and the support membrane (5) is made of an insulating and sealing rubber membrane.

3. The ultrasonic cavitation-assisted plasma electrochemical liquid bladder polishing device according to claim 1, characterized in that, The outer wall of the upper base (101) is provided with a first annular mounting groove (104), the upper opening of the water storage bladder (6) is installed in the first annular mounting groove (104), the lower opening of the water storage bladder (6) is fixedly fitted on the lower base (102), the outer wall of the upper base (101) is provided with a second annular mounting groove (103), the upper opening of the support membrane (5) is installed in the second annular mounting groove (103), and the lower opening of the support membrane (5) is fixedly fitted on the lower base (102).

4. The ultrasonic cavitation-assisted plasma electrochemical liquid bladder polishing device according to claim 3, characterized in that, An external baffle (7) is fitted on the upper base (101). The external baffle (7) is connected to the upper base (101) by bolts (14). The upper opening of the working fluid bladder (4) is pressed between the upper base (101) and the external baffle (7).

5. The ultrasonic cavitation-assisted plasma electrochemical liquid bladder polishing device according to claim 4, characterized in that, An insulating baffle (8) is provided between the upper base (101) and the outer baffle (7). The bolt (14) passes through the insulating baffle (8). A plasma generator cathode (9) is provided between the insulating baffle (8) and the upper base (101). An upper conductive slip ring (10) is fitted on the deionized water conduit (105). The upper conductive slip ring (10) is located above the upper base (101). The plasma generator cathode (9) is connected to the upper conductive slip ring (10).

6. The ultrasonic cavitation-assisted plasma electrochemical liquid capsule polishing device according to claim 1, characterized in that, An adjusting bolt (201) is provided inside the lower base (102). A lower conductive slip ring (11) is fitted on the electrolyte conduit (3). The lower conductive slip ring (11) is located below the lower base (102). The adjusting bolt (201) is connected to an adjusting line (202). The adjusting line (202) and the ultrasonic transducer (13) are both connected to the lower conductive slip ring (11).

7. A polishing method for ultrasonic cavitation-assisted plasma electrochemical liquid capsule polishing, utilizing the polishing apparatus as described in claim 5, comprising the following main steps: S1. Before starting work, clamp the workpiece on the worktable, install the liquid bladder polishing head on the machine tool or robot, connect the liquid bladder polishing head to the negative terminal of the power supply, and connect the workpiece to the positive terminal of the power supply. S2. Before starting work, open the deionized water channel and the electrolyte channel to fill the storage bladder and the working bladder with deionized water and electrolyte respectively. S3. Before starting work, turn on the power supply and ultrasonic generator, and let the power parameters and ultrasonic parameters reach the set values ​​and stabilize. S4. During operation, the liquid bladder polishing head rotates at a constant speed and gradually approaches the workpiece surface until it finally contacts it. When the contact interface reaches a certain contact pressure, the electrolyte gradually seeps out and conducts the liquid bladder polishing head and the workpiece, thereby generating an ultrasonic-enhanced plasma electrochemical effect. S5. Under the action of ultrasonic enhanced plasma electrochemistry, the titanium alloy surface achieves material corrosion removal on the one hand, and generates a reaction film with lower mechanical strength and lower adhesion to the substrate on the other hand. The two combine to form a surface micro-roughness peak with unevenness. S6. Under the mechanical force of the liquid bladder polishing head, the micro-roughness peaks on the titanium alloy surface are quickly removed, while the recessed areas are removed slowly, ultimately resulting in a super-smooth, low-damage workpiece surface.

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