Method for sintering electrostatic chuck ceramic plate

Abstract

This invention discloses a method for sintering electrostatic chuck ceramic plates, belonging to the field of electrostatic chuck technology. The sintering method includes the following steps: Step 1: Manufacturing an electrostatic chuck ceramic plate blank for later use, and preparing a firing plate device for later use; Step 2: Spreading granules on the firing plate of the firing plate device, and placing the electrostatic chuck ceramic plate blank on the granules; Step 3: Placing the electrostatic chuck ceramic plate blank and the firing plate device together in a sintering furnace for sintering; Step 4: After the electrostatic chuck ceramic plate blank is sintered, it is removed from the firing plate device, and the granules adhering to the electrostatic chuck ceramic plate are ground clean using a grinding device, and the surface of the electrostatic chuck ceramic plate is ground smooth, thus completing the sintering of the electrostatic chuck ceramic plate. A granule limiting device is provided on the firing plate, and a granule leveling component is provided above the granule limiting device, which is rotatably connected to the firing plate.

Description

Technical Field

[0001] This invention relates to the field of electrostatic chuck technology, and in particular to a method for sintering ceramic plates for electrostatic chucks. Background Technology

[0002] During the sintering process of electrostatic chuck ceramic plates, the ceramic plate is generally placed directly on a firing plate, and then the firing plate and the ceramic plate are placed together into the sintering furnace for sintering. During sintering, the electrostatic chuck ceramic plate will shrink. Due to the presence of the firing plate, there is a reverse force on the electrostatic chuck ceramic plate, which prevents the shrinkage. Because the thickness of the electrostatic chuck ceramic plate is relatively thin, the shrinkage during sintering can easily cause the electrostatic chuck ceramic plate to break or crack, resulting in a substandard electrostatic chuck ceramic plate. Summary of the Invention

[0003] The technical problem to be solved by the present invention is to provide a method for sintering electrostatic chuck ceramic plates, which can avoid the occurrence of breakage or cracks in the electrostatic chuck ceramic plates during the sintering process.

[0004] To solve the above-mentioned technical problems, the technical solution of the present invention is as follows:

[0005] A method for sintering an electrostatic chuck ceramic plate, the sintering method comprising the following steps:

[0006] Step 1: Prepare the electrostatic chuck ceramic plate blank for later use, and prepare the firing plate device for later use.

[0007] Step 2: Spread granules on the firing plate of the firing plate device, and place the electrostatic chuck ceramic plate blank on the granules;

[0008] Step 3: Place the electrostatic chuck ceramic plate blank and the firing plate device together into the sintering furnace for sintering;

[0009] Step 4: After the electrostatic chuck ceramic plate blank is sintered, it is taken out from the firing plate device. The particles adhering to the electrostatic chuck ceramic plate are cleaned by grinding equipment, and the surface of the electrostatic chuck ceramic plate is ground smooth to complete the sintering of the electrostatic chuck ceramic plate.

[0010] Preferably, the material of the particulate matter is the same as the material of the electrostatic chuck ceramic plate.

[0011] Preferably, the material of the particulate matter is aluminum oxide.

[0012] Preferably, the firing plate is made of copper or corundum moray stone.

[0013] Preferably, the particulate matter is spherical in shape.

[0014] Preferably, the firing plate is provided with a particle limiting device, the particle limiting device is made of the same material as the firing plate, and a particle leveling component is provided above the particle limiting device, the particle leveling component being rotatably connected to the firing plate.

[0015] Preferably, the particulate matter limiting device includes a limiting member, which includes an outer ring and an inner ring, and a plurality of partition plates are provided between the outer ring and the inner ring.

[0016] Preferably, the firing plate is provided with a groove that mates with the outer ring, the inner ring, and the partition plate. The heights of the outer ring, the inner ring, and the partition plate are equal, and the heights of the outer ring, the inner ring, and the partition plate are equal to the depth of the groove.

[0017] Preferably, the outer outer wall of the outer ring is provided with a plurality of support plates, the support plates are connected to the outer ring through connecting plates, the firing plate is provided with a connecting plate groove that mates with the connecting plates, and the outer outer wall of the firing plate is provided with a support column for supporting the limiting member, the support column being rotatably connected to the firing plate.

[0018] Preferably, the particulate leveling assembly includes a leveling plate, which is rotatably connected to the firing plate. The distance between the bottom of the leveling plate and the upper side wall of the firing plate is equal to the height of the outer ring, the inner ring, and the partition plate.

[0019] The above technical solution has the following beneficial effects:

[0020] Before sintering, spherical particles are spread between the electrostatic chuck ceramic plate and the firing plate to avoid direct contact between them. When the electrostatic chuck ceramic plate shrinks during sintering, the spherical particles move on the firing plate. The contact area between the spherical particles and the surface of the firing plate is small, and since the spherical particles are already sintered, they will only slide on the firing plate and will not stick to it. This will not exert a reverse force on the electrostatic chuck ceramic plate, thus avoiding breakage or cracks in the electrostatic chuck ceramic plate due to shrinkage during sintering.

[0021] By setting a particle limiting device, spherical particles can be separated when they are placed, avoiding the particles being too close together and affecting the sintering of the ceramic slab body during sintering. In addition, particles can be saved. Several rings of varying sizes can be set between the outer and inner rings to better separate the particles.

[0022] By setting a limiting component, when placing spherical particles, the limiting component is higher than the upper side wall of the firing plate under the support of the support column. After the spherical particles are placed, the ceramic plate blank is placed on it. Then the support column is rotated so that the limiting component enters the groove, and sintering can then be carried out.

[0023] By setting up a particle leveling component, after placing spherical particles, the leveling plate is rotated to level out any excess or overlapping spherical particles, so that there is only one layer of spherical particles. Attached Figure Description

[0024] Figure 1 This is a three-dimensional structural schematic diagram of the firing plate device of the present invention;

[0025] Figure 2 This is a three-dimensional structural diagram of the firing plate of the present invention;

[0026] Figure 3 This is a top view of the structure of the firing plate of the present invention. Detailed Implementation

[0027] The specific embodiments of the present invention will be further described below with reference to the accompanying drawings. It should be noted that these descriptions are for the purpose of aiding understanding the present invention, but do not constitute a limitation thereof. Furthermore, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0028] A method for sintering an electrostatic chuck ceramic plate, the sintering method comprising the following steps:

[0029] Step 1: Prepare the electrostatic chuck ceramic plate blank for later use, and prepare the firing plate device for later use.

[0030] Step 2: Spread granules on the firing plate 1 of the firing plate device. The firing plate 1 is made of metal copper plate or corundum moray stone, which can meet the temperature conditions during sintering. Place the electrostatic chuck ceramic plate blank on the granules.

[0031] The material of the particulate matter is the same as that of the electrostatic chuck ceramic plate. After sintering, the particulate matter that is bonded to the electrostatic chuck needs to be separated, and the surface of the electrostatic chuck ceramic plate needs to be polished smooth to make the material of the particulate matter the same as that of the electrostatic chuck ceramic plate. This is to avoid the particulate matter remaining on the electrostatic chuck ceramic plate from affecting it. The electrostatic chuck ceramic plate is often made of alumina sintering. Therefore, the material of the particulate matter is also alumina, depending on the sintering material of the electrostatic chuck ceramic plate.

[0032] The particles are spherical in shape. As the electrostatic chuck ceramic plate shrinks during sintering, the particles move on the firing plate 1 during the shrinkage process. Using spherical particles results in a small contact area with the surface of the firing plate 1 during shrinkage, making it easier to move and better preventing cracking. After sintering, it is convenient to remove the electrostatic chuck ceramic plate from the firing plate 1.

[0033] Step 3: Place the electrostatic chuck ceramic plate blank and the firing plate device together into the sintering furnace for sintering;

[0034] Step 4: After the electrostatic chuck ceramic plate blank is sintered, it is taken out from the firing plate device. The particles adhering to the electrostatic chuck ceramic plate are cleaned by grinding equipment, and the surface of the electrostatic chuck ceramic plate is ground smooth to complete the sintering of the electrostatic chuck ceramic plate.

[0035] refer to Figures 1-3 The firing plate device includes a firing plate 1, on which a particle limiting device is provided. The particle limiting device is made of the same material as the firing plate 1 so as to meet the temperature requirements during sintering, just like the firing plate 1. A particle leveling component is provided above the particle limiting device. The particle leveling component is rotatably connected to the firing plate 1. The particle limiting device is used to limit the position of the particles when spreading them, to prevent the particles from piling up randomly, and to reduce the time the particles are placed.

[0036] The particulate matter limiting device includes a limiting component, which includes an outer ring 2 and an inner ring 3. Several partition plates 4 are provided between the outer ring 2 and the inner ring 3. By setting the inner ring 3, the outer ring 2 and the partition plates 4, the upper surface of the firing plate 1 can be divided into different areas so that the particulate matter can be placed in different areas.

[0037] Since the ceramic plate of the electrostatic chuck is generally circular, both the inner ring 3 and the outer ring 2 can be circular. The inner ring 3 has a smaller diameter and the outer ring 2 has a larger diameter. The axes of the inner ring 3 and the outer ring 2 coincide. Depending on the size of the outer ring 2, rings of varying sizes can also be set between the inner ring 3 and the outer ring 2 to better divide the area. The divided area allows the particles to be placed more evenly, providing better support for the ceramic plate of the electrostatic chuck. On the other hand, it also allows for the placement of fewer particles, saving on the amount of particles used.

[0038] The firing plate 1 is provided with a groove 11 that mates with the outer ring 2, the inner ring 3, and the partition plate 4. The heights of the outer ring 2, the inner ring 3, and the partition plate 4 are equal, and the heights of the outer ring 2, the inner ring 3, and the partition plate 4 are equal to the depth of the groove 11.

[0039] When placing the particles, place them in the area formed by the outer ring 2, inner ring 3, and partition plate 4. After placement, rotate the flattening plate 9 to remove the overlapping particles, keeping the particles in a single layer to avoid unevenness of the electrostatic chuck ceramic plate caused by overlapping particles.

[0040] Three support plates 6 are provided on the outer side wall of the outer ring 2. The three support plates 6 are connected to the outer ring 2 through three connecting plates 7. The firing plate 1 is provided with a connecting plate groove 8 that cooperates with the connecting plate 7. By setting the connecting plate groove 8, when the outer ring 2 is embedded in the groove 11, the connecting plate 7 is also embedded in the connecting plate groove 8, so that the upper surface of the firing plate 1 remains flat. The outer side wall of the firing plate 1 is provided with a support column 5 for supporting the limiting component. The support column 5 is rotatably connected to the firing plate 1. When the outer ring 2, inner ring 3, and partition plate 4 extend out of the groove 11, they are supported by the support column 5. After the particles are placed, the support column 5 is removed, allowing the outer ring 2, inner ring 3, and partition plate 4 to enter the groove 11 for the next operation.

[0041] A rotating shaft is provided on the side wall of the support column 5, and a hole that mates with the rotating shaft is provided on the outer side wall of the bearing plate 1. When the support plate 6 needs to be supported, the end of the support column 5 is pressed against the support plate 6. When the outer ring 2, inner ring 3, and partition plate 4 need to be placed into the groove 11, the support column 5 is rotated to disengage the end of the support column 5 from the support plate 6.

[0042] In order to allow the outer ring 2, inner ring 3, and partition plate 4 to enter the groove 11 better, when the support column 5 supports the support plate 6, the bottom of the outer ring 2, inner ring 3, and partition plate 4 is not completely detached from the groove 11. After the particles are placed, the outer ring 2, inner ring 3, and partition plate 4 are manually embedded into the groove 11.

[0043] The particle leveling assembly includes a leveling plate 9, which is rotatably connected to the firing plate 1. The distance between the bottom of the leveling plate 9 and the upper side wall of the firing plate 1 is equal to the height of the outer ring 2, the inner ring 3, and the partition plate 4, so as to achieve the leveling of particles and keep the particles in a single layer.

[0044] One end of the flattened long plate 9 is connected to the upright rod 10. The side wall of the firing plate 1 is provided with a limiting cylinder 12 that cooperates with the upright rod 10. The upright rod 10 can rotate around the limiting cylinder 12 to achieve the requirement of scraping the particles.

[0045] Before sintering, spherical particles are spread between the electrostatic chuck ceramic plate and the firing plate 1 to avoid direct contact between the electrostatic chuck ceramic plate and the firing plate 1. When the electrostatic chuck ceramic plate shrinks during sintering, it drives the spherical particles to move on the firing plate 1. The contact area between the spherical particles and the surface of the firing plate 1 is small, and the spherical particles are already sintered. They will only slide on the firing plate 1 and will not stick to the firing plate 1. They will not exert a reverse force on the electrostatic chuck ceramic plate, thus avoiding the breakage or cracks of the electrostatic chuck ceramic plate due to shrinkage during the sintering process.

[0046] By setting a particle limiting device, when placing spherical particles, the spherical particles can be separated, avoiding the particles being placed too close together and affecting the sintering of the ceramic slab body during sintering. In addition, it can save particles. Several rings of varying sizes can also be set between the outer ring 2 and the inner ring 3 to better separate the particles.

[0047] By setting a limiting component, when placing spherical particles, the limiting component is higher than the upper side wall of the firing plate 1 under the support of the support column 5. After the spherical particles are placed, the ceramic plate blank is placed on it, and then the support column 5 is rotated so that the limiting component enters the groove 11, and then sintering can be carried out.

[0048] By setting up a particle leveling component, after placing spherical particles, the leveling plate 9 is rotated to level out any excess or overlapping spherical particles, so that there is only one layer of spherical particles.

[0049] The embodiments of the present invention have been described in detail above with reference to the accompanying drawings, but the present invention is not limited to the described embodiments. For those skilled in the art, various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present invention, and these variations still fall within the protection scope of the present invention.

Claims

1. A method for sintering an electrostatic chuck ceramic plate, characterized in that, The sintering method includes the following steps: Step 1: Prepare the electrostatic chuck ceramic plate blank for later use, and prepare the firing plate device for later use. Step Two: Particles are laid on the firing plate of the firing plate device, and the electrostatic chuck ceramic plate blank is placed on the particles. The firing plate is equipped with a particle limiting device, which is made of the same material as the firing plate. A particle leveling assembly is located above the particle limiting device and is rotatably connected to the firing plate. The particle limiting device includes a limiting element, which comprises an outer ring and an inner ring. Several partition plates are provided between the outer ring and the inner ring. The firing plate is provided with grooves that mate with the outer ring, the inner ring, and the partition plate. The heights of the outer ring, the inner ring, and the partition plate are equal, and the depth of the grooves is equal to the heights of the outer ring, the inner ring, and the partition plate. Several support plates are provided on the outer side wall of the outer ring. The support plates are connected to the outer ring through connecting plates. The firing plate is provided with connecting plate grooves that mate with the connecting plates. Support columns for supporting limiting components are provided on the outer side wall of the firing plate. The support columns are rotatably connected to the firing plate. Step 3: Place the electrostatic chuck ceramic plate blank and the firing plate device together into the sintering furnace for sintering; Step 4: After the electrostatic chuck ceramic plate blank is sintered, it is taken out from the firing plate device. The particles adhering to the electrostatic chuck ceramic plate are cleaned by grinding equipment, and the surface of the electrostatic chuck ceramic plate is ground smooth to complete the sintering of the electrostatic chuck ceramic plate.

2. The electrostatic chuck ceramic plate sintering method according to claim 1, characterized in that: The material of the particulate matter is the same as the material of the electrostatic chuck ceramic plate.

3. The electrostatic chuck ceramic plate sintering method according to claim 2, characterized in that: The material of the particulate matter is aluminum oxide.

4. The electrostatic chuck ceramic plate sintering method according to claim 1, characterized in that: The firing plate is made of metallic copper plate or corundum mullite.

5. The electrostatic chuck ceramic plate sintering method according to claim 1, characterized in that: The particles are spherical in shape.

6. The apparatus for sintering ceramic plates in an electrostatic chuck according to claim 1, characterized in that: The particulate leveling assembly includes a leveling plate, which is rotatably connected to the firing plate. The distance between the bottom of the leveling plate and the upper side wall of the firing plate is equal to the height of the outer ring, the inner ring, and the partition plate.

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