Fluorescent x-ray analysis device

Abstract

This invention provides a fluorescence X-ray analysis apparatus that, by ensuring that the back surface of a thin plate-shaped sample is uniform, avoids differences in measurement conditions due to measurement positions. The fluorescence X-ray analysis apparatus comprises: an X-ray source that irradiates the surface of a plate-shaped sample with a single X-ray; a detector that measures the intensity of the fluorescence X-rays; a sample stage on which the sample is placed; an analysis unit that performs analysis at multiple measurement positions on the sample surface; a background correction cover having an outer edge portion shaped along a portion of the outer edge of the sample stage, adjacent to the outer side of the sample stage, and having its surface disposed on approximately the same plane as the surface of the sample stage; and a moving mechanism that moves the sample stage to allow single X-ray irradiation at any measurement position on the sample surface, wherein the moving mechanism moves the background correction cover along with the sample stage, and when there is no sample stage on the back surface of the sample at the measurement position, the background correction cover is moved to the back surface of the sample at the measurement position.

Description

Technical Field

[0001] This invention relates to a fluorescence X-ray analysis device for measuring arbitrary measurement positions of thin plate-shaped samples. Background Technology

[0002] Fluorescence X-ray analysis apparatuses are known as devices for determining the elements contained in a sample or the concentration of those elements. In fluorescence X-ray analysis, the sample is placed on a sample stage, and the position of the sample stage is controlled so that a single X-ray irradiates the desired measurement location. The fluorescence X-ray analysis apparatus then analyzes the elements contained in the sample based on the intensity of the fluorescence X-rays generated when the sample is irradiated by a single X-ray.

[0003] Here, when the sample is a thin plate-shaped sample such as a silicon wafer, the primary X-rays irradiated through the sample, and the fluorescent X-rays or scattered rays generated by the sample stage, become background for the measured fluorescent X-ray intensity, which may affect the analytical results. Furthermore, the influence of background fluorescent X-rays or scattered rays differs between measurement locations where a sample stage is present and those where it is absent, leading to differences in measurement conditions depending on the measurement location.

[0004] For example, Patent Document 1 describes a multi-element simultaneous fluorescence X-ray analysis device that reduces the difference in measurement conditions caused by the measurement position even when a notch is formed on the sample stage, by performing background correction corresponding to the measurement position.

[0005] Existing technical documents

[0006] Patent documents

[0007] Patent Document 1: Japanese Patent Application Publication No. 2017-161276 Summary of the Invention

[0008] The technical problem that the invention aims to solve

[0009] In the aforementioned Patent Document 1, the background intensity corresponding to the measurement location is pre-measured, and the difference in measurement conditions caused by the measurement location is reduced by subtracting the corresponding background intensity from the measurement intensity at each measurement location during actual analysis. However, at each measurement location of the sample, the measurement intensity is inevitably affected depending on whether a sample stage is present on the back side.

[0010] Furthermore, although the diameter of semiconductor substrates such as silicon wafers is increasing, it is desirable to minimize the size of the sample stage, considering factors such as ensuring the movable range within the limited space of the device and cost. However, when the sample is larger than the sample stage on which it is placed, areas where the sample stage is present and areas where it is not present are created on the back side of the sample.

[0011] This disclosure was made in view of the above-mentioned problems, and its object is to provide a fluorescence X-ray analysis device that, by making the back side of the thin plate sample the same, does not produce differences in measurement conditions due to the measurement position.

[0012] Technical solutions to the problem

[0013] (1) A fluorescence X-ray analysis apparatus according to one aspect of the present disclosure is characterized by comprising: an X-ray source that irradiates the surface of a plate-shaped sample with X-rays once; a detector that measures the intensity of fluorescence X-rays generated from the sample irradiated by the once X-rays; a sample stage on which the sample is placed; an analysis unit that performs analysis based on the intensity of fluorescence X-rays measured by the detector at multiple measurement positions on the surface of the sample; at least one background correction cover having an outer edge portion of a shape along a portion of the outer edge of the sample stage, adjacent to the outer side of the sample stage, and having its surface disposed on the same plane as the surface of the sample stage; and a moving mechanism that moves the sample stage such that the once X-rays irradiate any measurement position on the surface of the sample, the moving mechanism causing the background correction cover to move with the movement of the sample stage, and when the sample stage is not present on the back side of the sample at the measurement position, moving the background correction cover to the back side of the sample at that measurement position.

[0014] (2) In the above-described manner of this disclosure, the background correction cover is characterized in that it is formed of the same material as the sample stage.

[0015] (3) In the above-described manner of this disclosure, the sample stage is characterized in that it has a protruding holding portion that abuts against a portion of the sample.

[0016] (4) In the above-described manner of this disclosure, the moving mechanism is characterized in that it has a triple sun axis driven by rotation, a sun arm fixed on the triple sun axis, a double planetary axis rotatably supported by the rotating end of the sun arm, a planetary arm fixed on the double planetary axis, and a sample axis rotatably supported by the rotating end of the planetary arm, the sample stage being fixed on the sample axis, and the background correction cover being fixed on the planetary arm.

[0017] (5) In the above-described manner of this disclosure, the moving mechanism is characterized by having: an XY stage that moves the sample stage to the position where the first X-ray irradiates the measurement position in an XY plane parallel to the surface of the sample stage and the background correction cover; and a rotating mechanism that rotates the background correction cover about the center of the sample stage.

[0018] (6) In the above-described manner of this disclosure, the distance from the center of the sample stage to the outer edge is less than the distance from the center of the sample to the outer edge, and the distance from the center of the sample stage to the end of the background correction cover is greater than the distance from the center of the sample to the outer edge.

[0019] (7) In the above-described manner of the present disclosure, the analysis unit is characterized by having a correction unit that performs correction by subtracting the background intensity from the measured intensity measured from the detector.

[0020] (8) In the above-described manner of this disclosure, the sample stage is circular in shape, and the outer edge portion of the shape of the background correction cover along a portion of the outer edge of the sample stage is arc-shaped along the outer edge of the circular sample stage.

[0021] (9) In the above-described manner of the present disclosure, the sample detection unit is characterized in that, when the sample is a circular shape with a notch, it detects the position of the notch of the sample disposed outside the outer edge of the sample stage.

[0022] The effects of the invention

[0023] This disclosure provides a fluorescence X-ray analysis device that ensures that the back side of the sample is in the same state, thus preventing differences in measurement conditions due to the measurement location. Attached Figure Description

[0024] Figure 1 This is a diagram illustrating an example of a fluorescence X-ray analysis apparatus.

[0025] Figure 2 These are top and side views showing the circular substrate, i.e., the sample, positioned on the sample stage.

[0026] Figure 3 This is a diagram used to illustrate the moving mechanism of the first embodiment.

[0027] Figure 4A This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (0 mm, 0 degrees).

[0028] Figure 4B This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (75mm, 0 degrees).

[0029] Figure 4C This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (100mm, 0 degrees).

[0030] Figure 4DThis is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (150mm, 0 degrees).

[0031] Figure 5A This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (0 mm, 60 degrees).

[0032] Figure 5B This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (75mm, 60 degrees).

[0033] Figure 5C This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (100mm, 60 degrees).

[0034] Figure 5D This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (150mm, 60 degrees).

[0035] Figure 6A This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (0 mm, -60 degrees).

[0036] Figure 6B This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (75mm, -60 degrees).

[0037] Figure 6C This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (100mm, -60 degrees).

[0038] Figure 6D This is a diagram showing the positional relationship between the moving mechanism, the sample stage, and the background correction cover when the measurement position is (150mm, -60 degrees).

[0039] Figure 7 This is a diagram illustrating the moving mechanism of the second embodiment.

[0040] Figure 8 This is a diagram showing a modified example of the sample stage and background correction cover. Detailed Implementation

[0041] [First Implementation Method]

[0042] The following describes preferred embodiments (hereinafter referred to as embodiments) for implementing this disclosure. Figure 1 This is a diagram illustrating an example of a schematic representation of a fluorescence X-ray analysis apparatus 100. (See diagram for example.) Figure 1As shown, the fluorescence X-ray analysis device 100 includes an X-ray source 102, a sample stage 104, a background correction cover 108, a moving mechanism 110, a spectrometer 112, a detector 114, a goniometer 116, a counter 118, an information processing unit 120, and a sample detection unit.

[0043] X-ray source 102 causes sample 128 to generate fluorescent X-rays by irradiating its surface with primary X-rays 130. Here, a portion of the primary X-rays 130 passes through sample 128 and reaches the sample stage 104 or background correction cover 108 located on the back of sample 128, thereby generating fluorescent X-rays or scattered rays. These fluorescent X-rays or scattered rays then pass through sample 128 again and are measured as background along with the fluorescent X-rays generated by sample 128.

[0044] Furthermore, the X-ray source 102 irradiates a designated location within the sample chamber (not shown) where the sample stage 104 and the like are positioned using a single X-ray 130. The X-ray source 102 can also be a structure with a changeable irradiation position, but in the first embodiment, the position of the X-ray source 102 is fixed, and the X-ray source 102 can only irradiate the triple sun axis 206 (see reference 104) described later. Figure 2 The situation of a structure irradiated with X-ray 130 once at the position of (origin O, as will be described later) will be explained.

[0045] The sample stage 104 holds the sample 128 and moves it via the moving mechanism 110 so that the X-ray 130 can irradiate any measurement position on the surface of the sample 128 at a time. Specifically, for example, the sample stage 104 is circular and has a holding portion 106 that protrudes vertically from the surface of the sample stage 104, is parallel to the surface of the sample stage 104, and holds the sample 128 at intervals, for example, 10 mm. The holding portion 106 holds the sample 128 at at least three points. The sample stage 104 may also have a holding portion 106 that, when viewed from the top surface, has two or more straight lines, a circular shape, an arc shape, and, when viewed from the side, a protrusion, etc. Details of the sample stage 104 will be described later.

[0046] Background correction cover 108 may be disposed adjacent to the outside of sample stage 104 and has an outer edge portion shaped along a portion of the outer edge of sample stage 104. Specifically, for example, the outer edge portion of background correction cover 108 shaped along a portion of the outer edge of sample stage 104 is an arcuate portion along the outer edge of the circular sample stage 104. In this embodiment, two background correction covers 108 are provided. The two background correction covers 108 are respectively disposed by moving mechanism 110 so that the outer edge portion on the arcuate portion is along the outer edge of the circular sample stage 104. Although the moving mechanism 110 for moving the background correction cover 108 and sample stage 104 will be described here as a single mechanism, it may also be moved by a separate mechanism.

[0047] Furthermore, the surface of the sample stage 104 and the surface of the background correction cover 108 are disposed on approximately the same plane. As a result, the effects of fluorescent X-rays or scattered rays generated by the primary X-ray 130 passing through the sample 128 can be made approximately equal in the area where the sample 128 and the sample stage 104 overlap in a top view and in the area where the sample 128 and the background correction cover 108 overlap in a top view.

[0048] Here, "same plane" means that the influence of scattered rays from the surface of the sample stage 104 and the influence of scattered rays from the surface of the background correction cover 108 are at the same height to an equal degree in terms of their impact on the accuracy of fluorescence X-ray analysis. Therefore, if the difference in height between the surface of the sample stage 104 and the surface of the background correction cover 108 is a difference that does not affect the accuracy of fluorescence X-ray analysis, then the surface of the sample stage 104 and the surface of the background correction cover 108 can be considered to be on the same plane. Furthermore, in order to make the influence of the aforementioned fluorescence X-rays or scattered rays equal, the background correction cover 108 is preferably formed of the same material as the sample stage 104.

[0049] The moving mechanism 110 moves the irradiation position of the X-ray source 102 or the sample stage 104 so that X-rays can irradiate any measurement position on the surface of the sample 128 in a single measurement. Furthermore, the moving mechanism 110 moves the background correction cover 108 along with the sample stage 104. When there is no sample stage 104 on the back side of the sample 128 at the measurement position, the background correction cover 108 is moved to the back side of the sample 128 at that measurement position. Details of the moving mechanism 110 will be described later.

[0050] Spectrometer 112 disperses fluorescent X-rays. Specifically, for example, spectrometer 112 disperses only X-rays of a specific wavelength that satisfy the Bragg equation from multiple wavelengths of fluorescent X-rays generated from sample 128.

[0051] Detector 114 measures the intensity of the fluorescent X-rays after they have been dispersed by the spectroscopic element 112. Specifically, detector 114 is, for example, a scintillation counter. Detector 114 measures the intensity of the fluorescent X-rays and outputs a pulse signal with a peak value corresponding to the energy of the measured fluorescent X-rays.

[0052] The spectrometer 112 and detector 114 maintain a fixed angular relationship while rotating via the goniometer 116. Specifically, the spectrometer 112 is rotated via the goniometer 116 to vary the incident angle θ of the fluorescent X-rays relative to the surface of the spectrometer 112 within a specified range. Furthermore, the incident angle θ is the angle between the direction of travel of the fluorescent X-rays generated from the sample 128 and the surface of the spectrometer 112. The fluorescent X-rays are diffracted by the spectrometer 112 and exit as fluorescent X-rays satisfying Bragg's law (i.e., fluorescent X-rays with an exit angle of θ). The detector 114 is moved via the goniometer 116 to the position where the fluorescent X-rays exiting from the spectrometer 112 at the exit angle θ are incident.

[0053] The counter 118 counts the pulse signals output from the detector 114 based on the peak value. Specifically, for example, the counter 118 counts the pulse signals output as the measured intensity of the detector 114 based on the peak value, and outputs them as X-ray intensity to the information processing unit 120.

[0054] The sample detection unit detects the orientation of the sample 128. Specifically, when the sample 128 has a notch 204 and is circular in shape larger than the sample stage 104, the sample detection unit 126 detects the position of the notch 204 of the sample 128 disposed on the sample stage 104. For example, the sample detection unit is a transmission-type sensor such as a beam sensor, and includes a light source 126 and a light-receiving part 127. The notch 204 is, for example, a groove provided on a portion of the outer periphery of a circular substrate. The light source 126 irradiates a beam of light such as a laser 132 along the outer edge of the sample 128 from above or below the sample stage 104, and the light is received by the light-receiving part 127 opposite the sample 128, thereby detecting the position of the notch 204 of the sample 128 disposed on the sample stage 104. Thus, the sample detection unit can detect the orientation of the sample 128 on the sample stage 104. Furthermore, in Figure 1 Although one example is described where the sample detection unit is positioned above or below the substrate, the sample detection unit can also be positioned on the side of the substrate. As long as the position of the notch 204 can be detected, it can be a sensor other than a beam sensor.

[0055] The information processing unit 120 controls the operation of each part of the fluorescence X-ray analysis apparatus 100 and performs analysis of the sample 128. Specifically, for example, the information processing unit 120 is a computer and controls the operation of the moving mechanism 110, the goniometer 116, and the sample detection unit. Furthermore, the information processing unit 120 includes an analysis unit 122, which acquires the fluorescence X-ray spectrum based on the output of the counter 118. Then, the analysis unit 122 analyzes the elements contained in the sample 128 based on the fluorescence X-ray spectrum. At this time, the analysis unit 122 uses known methods such as the calibration curve method or the basic parameter method to analyze the sample 128.

[0056] like Figure 1 As shown, the analysis unit 122 may also include a correction unit 124. The correction unit 124 performs correction by subtracting the background intensity from the measurement intensity measured by the detector 114. Specifically, for example, a blank sample that does not contain the element to be analyzed is first placed on the sample stage 104. Next, the blank sample is irradiated with a single X-ray 130, and the measurement intensity of the energy caused by the analytical element is measured. The correction unit 124 stores this measurement intensity. Next, an analytical sample containing the element to be analyzed is placed on the sample stage 104. Then, the analytical sample is irradiated with a single X-ray 130, and the measurement intensity of the energy caused by the analytical element is measured. The correction unit 124 performs correction by subtracting the pre-stored measurement intensity from this measurement intensity. Furthermore, the correction unit 124 may also perform background correction using other known methods.

[0057] According to this disclosure, as described below, when measuring any position of sample 128, a sample stage 104 or a background correction cover 108 can be disposed on the back of the measurement position. Therefore, if the background intensity of the measurement position at point 1 of the blank sample is stored, background correction can be performed at all measurement positions of the analytical sample.

[0058] also, Figure 1 The wavelength-dispersive fluorescence X-ray analysis apparatus 100 shown is a scanning type in which the spectrometer 112 and detector 114 rotate. However, it can also be a single-element analysis apparatus or a multi-element simultaneous analysis apparatus where the spectrometer 112 and detector 114 are fixed without using a goniometer 116. Furthermore, the fluorescence X-ray analysis apparatus 100 can also be an energy-dispersive type. When the fluorescence X-ray analysis apparatus 100 is an energy-dispersive type, the spectrometer 112 and goniometer 116 are not included, and a semiconductor detector such as an SDD (Silicon Drift Detector) is used in the detector 114.

[0059] Next, refer to Figure 2 and Figure 3Details of the moving mechanism 110, sample stage 104, background correction cover 108 and conveying arm 202 in the first embodiment will be described. Figure 2 These are top and side views showing the state in which a circular substrate, i.e., sample 128, is placed on the sample stage 104 by the conveyor arm 202. Figure 3 It means Figure 2 A detailed view of the section along line III-III (conveyor arm 202 and sample 128 are not shown). Furthermore, although the background correction cover 108 is not shown in the section along line III-III, Figure 3 In order to make it easier to understand the positional relationship with the sample stage 104, the background correction cover 108 is shown with a dashed line.

[0060] The moving mechanism 110 has a triple sun axis 206 that is driven by rotation, a sun arm 208 fixed on the triple sun axis 206, a double planetary axis 210 that is rotatably supported by the rotating end of the sun arm 208, a planetary arm 212 fixed on the double planetary axis 210, and a sample axis 214 that is rotatably supported by the rotating end of the planetary arm 212.

[0061] Specifically, the triple sun axis 206 is a triple axis comprising a first sun axis 302, a second sun axis 304, and a third sun axis 306, each independently driven to rotate by a drive motor (not shown). Hereinafter, the XY plane existing on the surface of the sample stage 104 (will be...) Figure 2 In the top view (where the right direction is designated as the X-axis and the top direction as the Y-axis), the position of the triple sun axis 206 is taken as the measurement position and the origin O. The sun arm 208 is a box-shaped arm fixed to the third sun axis 306. The double planetary axis 210 is a double axis having a first planetary axis 308 rotatably supported by the rotating end of the sun arm 208, and a second planetary axis 310 rotatably disposed opposite the first planetary axis 308. Hereinafter, in the XY plane, the position of the double planetary axis 210 is referred to as A.

[0062] The solar arm 208 houses a first sun gear 312, a first idler gear 314, a first planetary gear 316, a second sun gear 318, a second idler gear 320, and a second planetary gear 322. Specifically, the first sun gear 312 is fixed to the second sun shaft 304. The first planetary gear 316 is fixed to the first planetary shaft 308 and rotates in conjunction with the first idler gear 314 and the first sun gear 312. The second sun gear 318 is fixed to the first sun shaft 302. The second planetary gear 322 is fixed to the second planetary shaft 310 and rotates in conjunction with the second idler gear 320 and the second sun gear 318.

[0063] Planetary arm 212 is a box-shaped arm fixed to the second planetary shaft 310. Inside planetary arm 212 are a third planetary gear 324, a third idler gear 326, and a sample gear 328. Specifically, the third planetary gear 324 is fixed to the first planetary shaft 308. The sample gear 328 is fixed to the sample shaft 214 and rotates in conjunction with the third idler gear 326 and the third planetary gear 324.

[0064] The sample shaft 214 is rotatably supported by the rotating end of the planetary arm 212. Hereinafter, the position of the sample shaft 214 in the XY plane will be referred to as B. Furthermore, the first idler wheel 314 and the second idler wheel 320 are respectively fixed to the first idler wheel shaft 315 and the second idler wheel shaft 321, which are rotatably supported by the sun arm 208. The third idler wheel 326 is fixed to the third idler wheel shaft 327, which is rotatably supported by the planetary arm 212. The sample stage 104 is fixed to the sample shaft 214, and the background correction cover 108 is fixed to the planetary arm 212.

[0065] The triple sun shaft 206 is rotatably supported on the bottom surface of the sample chamber by bearings 330, maintaining the airtightness of the sample chamber. Similarly, the first planetary shaft 308, the second planetary shaft 310, the first idler shaft 315, and the second idler shaft 321 are rotatably supported by bearings 331 to 334, maintaining the airtightness of the box-shaped sun arm 208. Likewise, the third idler shaft 327 and the sample shaft 214 are rotatably supported by bearings 335 to 337, maintaining the airtightness of the box-shaped planetary arm 212.

[0066] Furthermore, the sun arm 208, the double planetary axis 210, the planetary arm 212, the sample axis 214, and the sample stage 104, together with the sample 128 placed on the sample stage 104, are arranged in the sample chamber so that the center of the circular sample 128 is aligned with the center of the sample stage 104. The moving mechanism 110 is supported only by the triple sun axis 206, and the third sun axis 306 is rotatably supported by bearings 330. Moreover, in the triple sun axis 206 as a triple axis and the double planetary axis 210 as a double axis, each concentric axis is also rotatably supported by bearings (not shown) and kept airtight.

[0067] Furthermore, in the moving mechanism 110 of the first embodiment, the distance from the triple sun axis 206 to the double planetary axis 210 is set to be equal to the distance from the double planetary axis 210 to the sample axis 214. Additionally, the gear ratio between the first sun gear 312 and the first planetary gear 316 is set to 1:1. The gear ratio between the second sun gear 318 and the second planetary gear 322 is set to 2:1. The gear ratio between the third planetary gear 324 and the sample gear 328 is set to 1:1.

[0068] The sample stage 104 is circular and has six holding portions 106. Specifically, for example, the sample stage 104 is a circle with a radius of 100 mm, and has six holding portions 106 evenly arranged at 60-degree intervals near the outer edge of the circular sample stage 104. Each holding portion 106 is a protruding shape extending from the surface of the sample stage 104 in a vertical direction, and holds the sample 128 by abutting against the back of the sample 128 with its top. Furthermore, an electrostatic chuck may be provided in the center of the sample stage 104 to attract and hold the sample 128.

[0069] Background correction cover 108 may be disposed adjacent to the outer side of sample stage 104 and has an outer edge portion shaped along a portion of the outer edge of sample stage 104. Specifically, for example, background correction cover 108 is generally crescent-shaped and has an arcuate outer edge portion along a portion of the outer edge of the circular sample stage 104 (adjacent to the inner outer edge portion of sample stage 104) and an arcuate outer edge portion on the opposite side (outer outer edge portion). In this embodiment, background correction cover 108 includes background correction cover 108A and background correction cover 108B. Hereinafter, the central portion of the inner outer edge portion adjacent to sample stage 104 of background correction cover 108A will be referred to as C, and the central portion of the outer outer edge portion will be referred to as D.

[0070] Background correction cover 108A is fixed to planetary arm 212 with line segment BC rotated 45 degrees counterclockwise relative to line segment AB, centered at position B. Furthermore, line segment AB is the centerline of the planetary arm 212 along its length, and line segment BC is the line connecting the center C of the inner outer edge of background correction cover 108A to position B of the sample axis 214 (the centerline of background correction cover 108A). Background correction cover 108B is fixed to planetary arm 212 at a position symmetrical to background correction cover 108A, with line segment AB as the line of symmetry. That is, background correction cover 108B is fixed at a position where background correction cover 108A is rotated 90 degrees clockwise around position B. Furthermore, background correction cover 108A is fixed to planetary arm 212 such that the distance between the center C of the inner outer edge of background correction cover 108A and position B of the sample axis 214 is approximately equal to the radius of the sample stage 104. Furthermore, the distance between the central portion C of the inner outer edge of the background correction cover 108A and the central portion D of the outer outer edge is set to be greater than the difference between the radius of the sample 128 and the radius of the sample stage 104. In addition, the background correction cover 108A and the background correction cover 108B have the same shape.

[0071] According to the background correction cover 108, even if the distance from the center to the outer edge of the sample stage 104 is less than the distance from the center to the outer edge of the sample 128, as long as the difference is less than the length of line segment CD, the measurement can be performed under the same conditions on the back side of the sample 128. That is, by making the distance from the center B of the sample stage 104 to the end D of the background correction cover 108 greater than the distance from the center to the outer edge of the sample 128 (the radius of the sample 128), the back side of the sample 128 can be made to be the same. For example, if the radius of the sample stage 104 is 100 mm and the distance CD is 80 mm, then even if the sample 128 is larger than the sample stage 104, this disclosure can also be applied to circular samples 128 up to a radius of 180 mm.

[0072] The conveyor arm 202 conveys the sample 128. Specifically, for example, the conveyor arm 202 conveys the sample 128 between a sample exchange system (not shown) and a sample chamber (not shown) on which the sample stage 104 is configured. When conveying the sample 128 onto the sample stage 104, the conveyor arm 202, with the sample 128 placed on it, causes the sample 128 to... Figure 2 The sample 128 is moved from right to left so that, when viewed from above, the center of the circular sample 128 is aligned with the center of the sample stage 104. At this time, the transport arm 202 moves on the upper side (Z-axis direction) of the surface of the circular sample stage 104. The transport arm 202 moves the sample 128 so that the center of the circular sample 128 is aligned with the center of the sample stage 104, and then holds the sample 128 in the holding portion 106 by moving it vertically downwards (-Z-axis direction). Furthermore, the transport arm 202 passes through the gap formed in the holding portion 106 (the space between the back surface of the sample 128 and the surface of the sample stage 104), from... Figure 2 The sample 128 is moved from left to right in the above sequence. The sample 128 is then transported from the sample exchange system to the sample stage 104. When the sample 128 is transported from the sample stage 104 to the sample exchange system, the reverse sequence is performed.

[0073] As described above, the transport arm 202, through the gap formed by the holding portion 106, can transport the sample 128 between the sample exchange system and the sample chamber without contacting the surface of the sample 128. Furthermore, the transport method is not limited to this and other methods can also be used. For example, the transport arm 202 can also transport the sample 128 between the sample exchange system and the sample chamber by adsorbing the surface of the sample 128. According to this structure, the holding portion 106 provided in the sample stage 104 can be omitted.

[0074] Next, the operation of the moving mechanism 110 will be explained. First, consider the case where the rotation of the drive motor (not shown) that drives the first sun axis 302 is fixed, the rotation of the second sun gear 318 relative to the coordinate system XY is fixed, and the drive motor that drives the third sun axis 306 is rotated. In this case, since the distance from the triple sun axis 206 to the double planetary axis 210 is set to be equal to the distance from the double planetary axis 210 to the sample axis 214, the center of the sample stage 104 can move from the X coordinate 2d to -2d on the X-axis (first principle). Furthermore, 2d is the sum of the distance OA from the triple sun axis 206 to the double planetary axis 210 and the distance AB from the double planetary axis 210 to the sample axis 214.

[0075] Next, consider the case where the first sun axis 302 and the third sun axis 306 rotate in the same direction and drive by the same angle, that is, the second sun gear 318 and the sun arm 208 rotate as a unit. In this case, while maintaining the angle between the sun arm 208 and the planetary arm 212, that is, while maintaining the revolution radius of the sample stage 104, the sample stage 104 revolves around the origin O (second principle). According to the first and second principles, the center of the sample stage 104 can be located at any position within a circle of radius 2d centered at the origin.

[0076] Next, consider the case where the rotation of the drive motor that drives the second sun axis 304 is fixed, the rotation of the first sun gear 312 relative to the coordinate system XY is fixed, and the sun arm 208 and planet arm 212 rotate as a unit based on the second principle. In this case, since the gear ratio between the first sun gear 312 and the first planet gear 316 is 1:1, the orientation of the first planet gear 316 and the third planet gear 324 in the coordinate system XY is maintained. Similarly, the orientation of the sample gear 328 and the sample stage 104, which are linked to the third planet gear 324 via the third idler gear 326, in the coordinate system XY is also maintained. This means that if the second sun axis 304 is fixed, the orientation of the sample stage 104 in the coordinate system XY can be maintained even if the sample stage 104 revolves around the origin based on the second principle. That is, regardless of where the sample stage 104 is located in the coordinate system XY, the orientation of the sample stage 104 can be arbitrarily determined while maintaining its position (third principle).

[0077] According to the first to third principles mentioned above, if the sample 128 has a radius of less than 2d, the sample 128 can be moved so that any measurement position on the sample is located at the irradiation position of a single X-ray 130.

[0078] Next, refer to Figures 4A to 6DThe positional relationships of the moving mechanism 110, sample stage 104, and background correction cover 108 at each measurement position are explained. Furthermore, in the following description, the measurement position (r mm, θ degrees) is a distance of r mm from the center of the sample 128, and indicates the position rotated clockwise by θ degrees when the right direction in the accompanying drawings is 0 degrees. That is, the position represented by (r mm, θ degrees) is relative to the center of the sample 128, which moves together with the sample stage 104. On the other hand, the origin O is an absolutely fixed position (i.e., a fixed position within the sample chamber (not shown) where the sample stage 104, etc., are arranged), which is the measurement position for one X-ray irradiation. Therefore, Figures 4A to 6D The positions O shown are all the same locations within the sample chamber. Furthermore, Figure 2 The state shown is such that the centerline OA of the solar arm 208 and the centerline AB of the planetary arm 212 along their length are located on the X-axis, the position of the triple solar axis 206 is at coordinates (-2d, 0) on the XY plane, and the initial state is the state in which the centerline CD of the background correction cover 108 is rotated 45 degrees counterclockwise from the X-axis. Furthermore, in the initial state, the sample 128 is positioned with the notch 204 located in the Y-axis direction.

[0079] Figures 4A to 4D This diagram illustrates the positional relationship between the moving mechanism 110, the sample stage 104, and the background correction cover 108 when θ is fixed at 0 degrees and r varies to 0 mm, 75 mm, 100 mm, and 150 mm. (See diagram for example.) Figure 4A As shown, when the measurement position is (0 mm, 0 degrees) (i.e., the center of sample 128), the moving mechanism 110 moves sample 128 so that the center of sample 128 is located at the origin O of the X-ray 130 that was irradiated once. Therefore, the moving mechanism 110 moves sample 128 so that the position B of sample axis 214 is aligned with the origin O. In this state, the centerline OA of solar arm 208 and the centerline AB of planetary arm 212 along its length are located on the Y-axis. Furthermore, background correction covers 108A and 108B are fixed to planetary arm 212 in the positional relationship described above. Therefore, background correction cover 108A is positioned at a position 45 degrees counterclockwise about line segment BC relative to line segment AB, centered at position B (lower right position of position B in the figure). Furthermore, background correction cover 108B is positioned at a position 90 degrees clockwise about position B, centered at position B (lower left position of position B in the figure). Figure 4A In the state shown, a sample stage 104 is present on the back side of the measurement position (0 mm, 0 degrees) of sample 128.

[0080] like Figures 4B to 4DAs shown, when the measurement positions (position O) are (75mm, 0 degrees), (100mm, 0 degrees), and (150mm, 0 degrees), the moving mechanism 110 moves the sample 128 so that each measurement position of the sample 128 is located at the origin O of the X-ray 130 that was irradiated once. That is, the solar arm 208 from... Figure 4A The state shown rotates clockwise, and planetary arm 212 rotates from... Figure 4A The sample stage 104 is rotated counterclockwise as shown, thereby moving it to positions O and B at distances of 75mm, 100mm, and 150mm, respectively. Furthermore, as mentioned above, since position O is a fixed position within the sample chamber (not shown), Figures 4B to 4D The sample stage 104 shown is self- Figure 4A The sample stage 104 shown is moved to the left (in the -X-axis direction) as indicated in the attached figure. Furthermore, since the background correction covers 108A and 108B are fixed to the planetary arm 212 as described above, they are moved while maintaining their positional relationship with the planetary arm 212. Figure 4B and Figure 4C In the shown configuration, a sample stage 104 is present on the back surfaces of sample 128 at (75 mm, 0 degrees) and (100 mm, 0 degrees). On the other hand, in Figure 4D In the state shown, a background correction cover 108A is present on the back of the measurement position (150 mm, 0 degrees) of sample 128.

[0081] Figures 5A to 5D This diagram illustrates the positional relationship between the moving mechanism 110, the sample stage 104, and the background correction cover 108 when θ is fixed at 60 degrees and r varies to 0 mm, 75 mm, 100 mm, and 150 mm. (See diagram for example.) Figure 5A As shown, when the measurement position is (0 mm, 60 degrees) (i.e., the center of sample 128), the moving mechanism 110 moves sample 128 so that the center of sample 128 is located at the origin O of the X-ray 130 that was irradiated once. Therefore, the moving mechanism 110 moves sample 128 so that the position B of sample axis 214 is aligned with the origin O. In this state, the centerline OA of solar arm 208 and the centerline AB of planetary arm 212 along its length are located at a position rotated 60 degrees clockwise from the Y-axis around position O. Furthermore, the background correction cover 108A is positioned with line segment BC rotated 45 degrees counterclockwise relative to line segment AB around position B. The background correction cover 108B is positioned with the background correction cover 108A rotated 90 degrees around position B. Figure 5A In the state shown, a sample stage 104 is present on the back side of the measurement position (0 mm, 60 degrees) of sample 128.

[0082] like Figures 5B to 5DAs shown, when the measurement positions are (75mm, 60 degrees), (100mm, 60 degrees), and (150mm, 60 degrees), the moving mechanism 110 moves the sample 128 so that each measurement position of the sample 128 is located at the origin O of the X-ray 130 that was irradiated once. That is, the solar arm 208 from... Figure 5A The state shown rotates clockwise, and planetary arm 212 rotates from... Figure 5A The sample stage 104 is rotated counterclockwise as shown, thereby moving it to positions O and B at distances of 75mm, 100mm, and 150mm, respectively. Furthermore, as mentioned above, since position O is a fixed position within the sample chamber (not shown), Figures 5B to 5D The sample stage 104 shown is self- Figure 5A The sample stage 104 shown is moved to the upper left (in the -X and Y axes directions) as indicated in the attached figure. Furthermore, since the background correction covers 108A and 108B are fixed to the planetary arm 212 as described above, they are moved while maintaining their positional relationship with the planetary arm 212. Figure 5B and Figure 5C In the shown configuration, a sample stage 104 is present on the back side of sample 128 at (75 mm, 60 degrees) and (100 mm, 60 degrees). On the other hand, in Figure 5D In the state shown, a background correction cover 108A is present on the back of the measurement position (150 mm, 60 degrees) of sample 128.

[0083] Figures 6A to 6D This diagram illustrates the positional relationship between the moving mechanism 110, the sample stage 104, and the background correction cover 108 when θ is fixed at -60 degrees and r varies to 0 mm, 75 mm, 100 mm, and 150 mm. (See diagram for example.) Figure 6A As shown, when the measurement position is (0 mm, -60 degrees) (i.e., the center of sample 128), the moving mechanism 110 moves sample 128 so that the center of sample 128 is located at the origin O of the X-ray 130 that was irradiated once. Therefore, the moving mechanism 110 moves sample 128 so that the position B of sample axis 214 is aligned with the origin O. In this state, the centerline OA of solar arm 208 and the centerline AB of planetary arm 212 along its length are located at a position rotated 60 degrees counterclockwise from the Y-axis around position O. Furthermore, background correction cover 108A is positioned at a position where line segment BC is rotated 45 degrees counterclockwise relative to line segment AB around position B. Background correction cover 108B is positioned at a position where background correction cover 108A is rotated 90 degrees around position B. Figure 6A In the state shown, a sample stage 104 is present on the back side of the measurement position (0 mm, -60 degrees) of sample 128.

[0084] like Figures 6B to 6DAs shown, when the measurement positions are (75mm, -60 degrees), (100mm, -60 degrees), and (150mm, -60 degrees), the moving mechanism 110 moves the sample 128 so that each measurement position of the sample 128 is located at the origin O of the X-ray 130 that was irradiated once. That is, the solar arm 208 from... Figure 6A The state shown rotates counterclockwise, and planetary arm 212 rotates from... Figure 6A Rotating clockwise as shown, the sample stage 104 moves to positions O and B with distances of 75mm, 100mm, and 150mm respectively. Furthermore, as mentioned above, since position O is a fixed position within the sample chamber (not shown), Figures 6B to 6D The sample stage 104 shown is self- Figure 6A The sample stage 104 shown is moved to the lower left (in the -X and -Y directions) as indicated in the attached figure. Furthermore, since the background correction covers 108A and 108B are fixed to the planetary arm 212 as described above, they are moved while maintaining their positional relationship with the planetary arm 212. Figure 6B and Figure 6C In the shown configuration, a sample stage 104 is present on the back side of sample 128 at (75 mm, 60 degrees) and (100 mm, 60 degrees). On the other hand, in Figure 6D In the state shown, a background correction cover 108B is present on the back of the measurement position (150 mm, 60 degrees) of sample 128.

[0085] As described above, by fixing the two background correction covers 108 to the planetary arms 212, the background correction covers 108 can be positioned in a designated location with minimal movement of each arm.

[0086] As mentioned above, in Figures 4A to 6D The sample stage 104, background correction cover 108A, and background correction cover 108B are disposed on the back of the measurement position shown. Furthermore, even when... Figures 4A to 6D When a position other than the indicated measurement position is used as the measurement position, based on the first to third principles described above, moving the sample 128 allows any measurement position on the sample 128 to be located at the position of the triple sun axis 206 irradiated by the X-ray 130 once, and allows the sample stage 104 or the background correction cover 108 to be positioned on the back side of the measurement position. Therefore, by ensuring that the back side of the sample 128 is in the same state, differences in measurement conditions caused by the measurement position can be prevented.

[0087] Furthermore, although the above description describes an embodiment in which two background correction covers 108 are provided, there may also be only one background correction cover 108 as long as either the sample stage 104 or the background correction cover 108 is located on the back side of the measurement position.

[0088] [Second Implementation]

[0089] Next, the second embodiment will be described. Since the second embodiment differs from the first embodiment only in the structure of the moving mechanism 110, while the other structures are the same, the description will be omitted.

[0090] like Figure 7 As shown, the moving mechanism 110 of the second embodiment has a first XY stage 702 and a second XY stage 704. The first XY stage 702 is located in the XY plane parallel to the surfaces of the sample stage 104 and the background correction cover 108, and moves the sample stage 104 to the position where the first X-ray 130 irradiates the measurement position.

[0091] Specifically, the first XY stage 702 has two first X drive shafts 706, a first Y drive shaft 708, and a first lift 710. The two first X drive shafts 706 are each elongated in shape, with their length direction along the X-axis, and are fixed at the same height (the same position in the Z-axis direction) inside the sample chamber. Furthermore, the two first X drive shafts 706 have guide rails on opposite sides to guide the first Y drive shafts 708.

[0092] The first Y-drive shaft 708 has an elongated shape, with one end embedded in a guide rail of a first X-drive shaft 706 and the other end embedded in a guide rail of another first X-drive shaft 706. The first Y-drive shaft 708 is guided by the two first X-drive shafts 706 and moves in the X-axis direction by means of an actuator (not shown). In addition, the first Y-drive shaft 708 has a guide rail on its upper surface for guiding the first elevator 710.

[0093] The first lifting mechanism 710 is embedded in the guide rail of the first Y-drive shaft 708 and is guided by the first Y-drive shaft 708 to move in the Y-axis direction via an actuator (not shown). Furthermore, the first lifting mechanism 710 has a structure in which a sample stage 104 is disposed on its upper surface and can extend and retract in the Z-axis direction. Thus, the first lifting mechanism 710 allows the sample stage 104 to move arbitrarily in the Z-axis direction. In addition, the first lifting mechanism 710 has a structure that allows the sample stage 104 to rotate freely in the XY plane.

[0094] The second XY stage 704 has two second X drive shafts 712, a second Y drive shaft 714, and a second lift 716. The two second X drive shafts 712 are each elongated in shape, with their length direction along the X-axis, and are fixed at the same height (the same position in the Z-axis direction) inside the sample chamber. Furthermore, the two second X drive shafts 712 have guide rails on opposite sides to guide the second Y drive shaft 714.

[0095] The second Y-drive shaft 714 has an elongated shape, with one end embedded in the guide rail of a second X-drive shaft 712 and the other end embedded in the guide rail of another second X-drive shaft 712. The second Y-drive shaft 714 is guided by the two second X-drive shafts 712 by an actuator (not shown) and moves in the X-axis direction. In addition, the second Y-drive shaft 714 has a guide rail on its upper surface for guiding the second elevator 716.

[0096] The second lift 716 is embedded in the guide rail of the second Y-drive shaft 714 and is guided by the second Y-drive shaft 714 to move in the Y-axis direction via an actuator (not shown). Furthermore, the second lift 716 has a structure in which a background correction cover 108 is disposed on its upper surface and can extend and retract in the Z-axis direction. Thus, the second lift 716 allows the background correction cover 108 to move arbitrarily in the Z-axis direction. Furthermore, the second lift 716 has a structure that allows the background correction cover 108 to rotate freely in the XY plane.

[0097] Furthermore, the first XY stage 702 and the second XY stage 704 are configured not to interfere with each other's operation.

[0098] According to the structure of the moving mechanism 110 described above, the sample stage 104 and the background correction cover 108 can be positioned at any location within the drivable range of the first XY stage 702 and the second XY stage 704. Therefore, after the sample 128 is positioned on the sample stage 104 in the same manner as in the first embodiment, moving the sample 128 allows a single X-ray 130 to irradiate any measurement position of the sample 128. Furthermore, when the sample stage 104 is not present on the back side of the measurement position, the background correction cover 108 can be moved to the back side of the measurement position. Therefore, in the second embodiment, by ensuring that the state of the back side of the sample 128 is the same, differences in measurement conditions due to measurement positions can be prevented.

[0099] Furthermore, this disclosure is only required to provide a sample stage 104 or a background correction cover 108 on the back of the measurement position, and the moving mechanism 110 is not limited to the structure shown in the first and second embodiments, but can also be other structures.

[0100] For example, the moving mechanism 110 may also have a mechanism for rotating the sample stage 104. For example, the moving mechanism 110 has a mechanism for rotating the sample stage 104 at any angle, or every 90 degrees or 180 degrees, thereby allowing the use of a small first XY stage 702 with a narrow range of movement to measure the entire surface of the sample 128 without expanding the sample chamber.

[0101] Furthermore, the moving mechanism 110 may replace the second XY stage 704 with a rotating mechanism. Specifically, for example, the moving mechanism 110 may also have a first XY stage 702 as described above and a rotating mechanism that rotates the background correction cover 108 about the center of the first XY stage 702. When the sample stage 104 is circular and has a holding portion 106, the background correction cover 108 has the same shape as in the first embodiment. The background correction cover 108 is positioned on the back side of the measurement position by rotating around the sample stage 104 via the rotating mechanism. In this case, since the second XY stage 704, the first elevator 710, and the second elevator 716 are not used, the background correction cover 108 can be moved to the back side of the measurement position using only a simple rotating mechanism.

[0102] Furthermore, for example, the sample stage 104 is not limited to a circular shape, such as... Figure 8 As shown, it can be an octagonal shape, or a square, rectangle, or other polygonal shape. Furthermore, the background correction cover 108 is not limited to a crescent shape, such as... Figure 8 The image shown can also be a rectangle. Even if it is... Figure 8 As shown, the rectangular background correction cover 108 can be configured adjacent to one side of the octagonal sample stage 104, having an outer edge portion with a shape that extends along a portion of the outer edge of the sample stage 104. Therefore, the sample stage 104 or the background correction cover 108 can be configured on the back side of any measurement position of the sample 128.

[0103] Furthermore, the moving mechanism 110 may also move the irradiation position of the X-ray source 102 and the background correction cover 108 without moving the sample stage 104. Specifically, the moving mechanism 110 may also include: an irradiation position control unit that controls the irradiation position of the X-ray source so that a single X-ray irradiates any measurement position on the surface of the sample 128; and a rotation mechanism that rotates the background correction cover 108 about the center of the sample stage 104. For example, the irradiation position control unit moves the X-ray source 102 in the XY plane so that a single X-ray irradiates any measurement position on the sample 128. Another example is that the moving mechanism 110 can change the orientation of the X-ray source 102, i.e., the irradiation direction of a single X-ray, so that a single X-ray irradiates any measurement position on the sample 128. When there is no sample stage 104 on the back side of the sample 128 at the measurement position, the rotation mechanism moves the background correction cover 108 to the back side of that measurement position. For example, when the sample stage 104 and the background correction cover 108 have the same shape as in the first embodiment, the moving mechanism 110 rotates the background correction cover 108 around the sample stage 104. With this structure, the same effect as in the described embodiment can be achieved, and the component that moves the sample stage 104 can be omitted.

[0104] Furthermore, the sample stage 104 can be fixed in position, and the X-ray source 102 can irradiate any position of the sample 128 with a single X-ray 130. It also includes a structure with a robotic arm that can move the background correction cover 108 to any position. This robotic arm has four degrees of freedom, including, for example, three degrees of freedom to move the background correction cover 108 to any position in the XYZ space inside the sample chamber, and one degree of freedom to rotate the background correction cover 108 by any angle in the XY plane.

[0105] This disclosure is not limited to the above embodiments and various modifications are possible. The configuration of the fluorescence X-ray analysis apparatus 100 described above is an example and is not limited thereto. Structures that are substantially the same as those shown in the above embodiments, that perform the same function, or that achieve the same purpose may also be used instead.

[0106] Explanation of reference numerals in the attached figures

[0107] 100: Fluorescence X-ray Analysis Device

[0108] 102: X-ray source

[0109] 104: Sample Stage

[0110] 106: Maintaining Section

[0111] 108, 108A, 108B: Background Correction Cover

[0112] 110: Mobile Agency

[0113] 112: Spectrometer

[0114] 114: Detector

[0115] 116: Angle measuring instrument

[0116] 118: Counter

[0117] 120: Information Processing Department

[0118] 122: Analysis Department

[0119] 124: Correction Department

[0120] 126: Light source

[0121] 127: Light-receiving part

[0122] 128: Sample

[0123] 130: A single X-ray

[0124] 132: Laser

[0125] 202: Conveyor Arm

[0126] 204: Notch

[0127] 206: Triple Sun Axis

[0128] 208: Solar Arm

[0129] 210: Double Planetary Axis

[0130] 212: Planetary Arm

[0131] 214: Sample axis

[0132] 302: First Sun Axis

[0133] 304: Second Sun Axis

[0134] 306: Third Sun Axis

[0135] 308: First planetary axis

[0136] 310: Second planetary axis

[0137] 312: First Sun Gear

[0138] 314: First idler wheel

[0139] 315: First idler shaft

[0140] 316: First Planetary Gear

[0141] 318: Second Sun Gear

[0142] 320: Second idler gear

[0143] 321: Second idler shaft

[0144] 322: Second Planetary Gear

[0145] 324: Third Planetary Gear

[0146] 326: Third idler wheel

[0147] 327: Third idler shaft

[0148] 328: Sample Gear

[0149] 330~337: Bearings

[0150] 702: First XY Platform

[0151] 704: Second XY platform

[0152] 706: First X-drive shaft

[0153] 708: First Y-drive shaft

[0154] 710: First Elevator

[0155] 712: Second X-drive shaft

[0156] 714: Second Y-drive axis

[0157] 716: Second Elevator

Claims

1. A fluorescent X-ray analysis device characterized by comprising: Possessing: an X-ray source that irradiates a surface of a sample that is a plate shape with primary X-rays; a detector that measures intensity of fluorescent X-rays generated from the sample irradiated with the primary X-rays; a sample stage that holds the sample; an analysis section that performs analysis based on intensity of the fluorescent X-rays measured by the detector at a plurality of measurement positions on the surface of the sample; at least one background correction cover that has an outer edge portion in a shape of a portion of an outer edge of the sample stage, is adjacent to an outer side of the sample stage, and a surface is arranged on the same plane as a surface of the sample stage; and a moving mechanism that moves the sample stage so that the primary X-rays are irradiated to an arbitrary measurement position on the surface of the sample, the moving mechanism moves the background correction cover along with the movement of the sample stage, and moves the background correction cover to a back surface of the sample at the measurement position when the back surface of the sample at the measurement position is free from the sample stage.

2. The fluorescent X-ray analysis apparatus according to claim 1, wherein the background correction cover is formed of the same material as the sample stage.

3. The fluorescent X-ray analysis apparatus according to claim 1 or 2, wherein the sample stage has a protruding holding portion that abuts against a portion of the sample.

4. The fluorescent X-ray analysis apparatus according to claim 1 or 2, wherein the moving mechanism has a triple sun shaft that is rotationally driven, a sun arm that is fixed to the triple sun shaft, a double planetary shaft that is rotatably supported by a rotation end portion of the sun arm, a planetary arm that is fixed to the double planetary shaft, and a sample shaft that is rotatably supported by a rotation end portion of the planetary arm, the sample stage is fixed to the sample shaft, the background correction cover is fixed to the planetary arm.

5. The fluorescent X-ray analysis apparatus according to claim 1 or 2, wherein the moving mechanism has: an XY stage that moves the sample stage to a position where the primary X-rays are irradiated to the measurement position in an XY plane that is parallel to surfaces of the sample stage and the background correction cover; and a rotation mechanism that rotates the background correction cover about a center of the sample stage.

6. The fluorescent X-ray analysis apparatus according to claim 1 or 2, wherein a distance from a center to an outer edge of the sample stage is smaller than a distance from a center to an outer edge of the sample, a distance from the center of the sample stage to an end portion of the background correction cover is larger than the distance from the center to the outer edge of the sample.

7. The fluorescent X-ray analysis apparatus according to claim 1 or 2, wherein the analysis section has a correction section that performs correction by subtracting a background intensity from a measurement intensity measured by the detector.

8. The fluorescent X-ray analysis apparatus according to claim 1 or 2, wherein the sample stage is circular, the outer edge portion in the shape of the portion of the outer edge of the sample stage in the background correction cover is an arc shape along the outer edge of the sample stage that is circular.

9. The fluorescent X-ray analysis apparatus according to claim 1 or 2, wherein ​ A sample detection section detects the position of a notch of a sample arranged outside the outer edge of a sample stage when the sample is circular and has the notch.

Images