Graph correction method

By dividing the initial map into first and second parts, and combining the crawler algorithm to identify cross-regional graphics and assign correction tasks, the problem of insufficient speed and accuracy of mask graphic correction in the existing technology is solved, and efficient graphic correction effect is achieved.

CN118838122BActive Publication Date: 2026-04-17SEMICON MFG INT (SHANGHAI) CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SEMICON MFG INT (SHANGHAI) CORP
Filing Date
2023-04-25
Publication Date
2026-04-17

AI Technical Summary

Technical Problem

Existing tile-based optical proximity correction methods improve running speed, but lack accuracy in mask pattern correction, and each pattern requires a complex and accurate computational model, resulting in excessive resource consumption.

Method used

By dividing the initial map into a first division and a second division, a web crawler algorithm is used to identify cross-region graphics, which are then placed in a single second block. Correction tasks are assigned to multiple clients for processing, and the first corrected map is updated using cross-region corrected map blocks to improve the accuracy of the correction.

Benefits of technology

While saving time, it significantly improves the accuracy of mask pattern correction, reduces correction problems caused by cross-region pattern allocation to multiple block areas, and reduces resource consumption.

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Abstract

A graphic correction method, comprising: performing first division on an initial layout to obtain a plurality of first block regions; performing correction on the initial layout based on the plurality of first block regions to obtain a first corrected layout, the first corrected layout comprising a plurality of first corrected graphics corresponding to block region graphics; obtaining a plurality of first special graphics from the plurality of block region graphics of the plurality of first block regions; determining a plurality of cross-region graphics in the initial layout according to the first special graphics, the cross-region graphics being located in at least two first block regions; performing second division on the initial layout to obtain a plurality of second block regions, one cross-region graphic being located in one second block region; obtaining a plurality of cross-region corrected layout blocks based on the plurality of second block regions, each cross-region corrected layout block comprising a cross-region corrected graphic corresponding to a cross-region graphic; and updating the first corrected layout based on the plurality of cross-region corrected layout blocks to obtain a target layout, the target layout improving the accuracy of layout correction while saving time.
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Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing technology, and in particular to a pattern correction method. Background Technology

[0002] Photolithography is a crucial technology in semiconductor manufacturing. It transfers patterns from a photomask to the surface of a silicon wafer, forming a semiconductor product that meets design requirements. The photolithography process includes an exposure step, a development step following exposure, and an etching step following development.

[0003] In semiconductor manufacturing, as design dimensions continue to shrink, the optical proximity effect (OPE) caused by the exposure system becomes increasingly pronounced. To address this, optical proximity correction (OPC) is employed to correct errors in the photolithography process. This involves pre-processing the photomask before photolithography to achieve pre-correction, ensuring that the amount of correction and compensation precisely compensates for the OPE caused by the exposure system. The photomask fabricated from the OPC-corrected wafer pattern, after photolithography, will produce the desired target pattern on the wafer.

[0004] As the feature size of integrated circuits continues to shrink, full-chip optical correction has become an indispensable step in chip mask manufacturing, and optical proximity correction has become a very time-consuming and resource-intensive task. Because optical proximity correction employs complex and precise computational models, the number of masks in each layer can reach billions, and each pattern needs correction, making it difficult to complete on a single machine. The tile-based optical proximity correction method divides the physical layout into several small tiles based on their location, and distributes the pattern correction tasks within each tile to multiple remote clients. These clients can work in parallel, thereby greatly improving the running speed.

[0005] However, existing tile-based optical proximity correction methods still need further improvement. Summary of the Invention

[0006] The technical problem solved by this invention is to provide a pattern correction method that improves the accuracy of mask pattern correction while increasing the running speed.

[0007] To address the aforementioned problems, the present invention provides a graphic correction method, comprising: providing an initial layout, the initial layout including a plurality of design graphics; dividing the initial layout into a first division to obtain a plurality of first blocks, each first block including a plurality of block graphics; correcting the initial layout based on the plurality of first blocks to obtain a first corrected layout, the first corrected layout including a plurality of first corrected graphics corresponding to the block graphics; obtaining a plurality of first special graphics from the plurality of block graphics in the plurality of first blocks; determining a plurality of cross-region graphics in the initial layout based on the first special graphics, the cross-region graphics being located in at least two first blocks; dividing the initial layout into a second division to obtain a plurality of second blocks, one of the cross-region graphics being located in one second block; obtaining a plurality of cross-region corrected layouts based on the plurality of second blocks, each of the cross-region corrected layout blocks including a cross-region corrected graphic, the cross-region corrected graphic corresponding to the cross graphics; and updating the first corrected layout based on the plurality of cross-region corrected layout blocks to obtain a target layout.

[0008] Optionally, determining a plurality of cross-regional graphics in the initial layout based on the first special graphic includes: using a plurality of the first special graphics as seed graphics in the initial layout, and employing a web crawler algorithm to search for adjacent block graphics to obtain a plurality of cross-regional graphics.

[0009] Optionally, the method of using a crawler algorithm to search for adjacent block graphics includes: setting a search marker at the end of the seed graphic; when the search marker and the block graphics in the adjacent first block overlap, merging the seed graphic and the block graphics to form an initial cross-region graphic; replacing the seed graphic with the initial cross-region graphic to form an updated seed graphic; resetting the search marker at the end of the updated seed graphic until no block graphics in the adjacent first block that overlap with the search marker can be found, and then using the updated seed graphic as the cross-region graphic.

[0010] Optionally, the size of the search mark is twice the length of the map unit.

[0011] Optionally, the method for correcting the initial layout based on a plurality of first blocks includes: assigning correction tasks for a plurality of first blocks to a plurality of second clients, wherein one second client is used to correct one first block or to correct multiple first blocks respectively; obtaining a plurality of block correction layouts from the plurality of second clients, each block correction layout including a plurality of first correction graphics, the first correction graphics corresponding to the block graphics; and merging the plurality of block correction layouts according to the position of each first block in the initial layout to obtain the first correction layout.

[0012] Optionally, the method for the second client to correct the first block area further includes: obtaining a plurality of second special graphics from a plurality of block area graphics in the first block area; and correcting the plurality of second special graphics.

[0013] Optionally, obtaining several cross-regional correction maps based on several second blocks includes: distributing the correction tasks of several second blocks to several first clients, and then obtaining several cross-regional correction map blocks from several first clients.

[0014] Optionally, updating the first revised map based on a plurality of the cross-regional revised map blocks includes: replacing the first revised map at the corresponding position of a plurality of the second blocks in the initial map with a plurality of the cross-regional revised map blocks to update the first revised map.

[0015] Optionally, after obtaining the target layout, the method further includes: performing optical proximity effect correction on the target layout to obtain an optical proximity corrected layout.

[0016] Optionally, each of the first blocks includes a first boundary and a second boundary that are perpendicular to each other.

[0017] Accordingly, the technical solution of the present invention provides a computer device, including a memory and a processor, wherein the memory stores a computer program, and the processor executes the computer program to implement the steps of the above-described graphics correction method.

[0018] Accordingly, the technical solution of the present invention provides a computer-readable storage medium storing a computer program thereon, wherein when the computer program is executed by a processor, it implements the steps of the above-described graphics correction method.

[0019] Compared with the prior art, the technical solution of the present invention has the following advantages:

[0020] In the graphic correction method of this invention, an initial layout is corrected based on a first division to obtain a first corrected layout. Then, the initial layout is further divided into two parts: a cross-region graphic is placed within a second block; correction tasks within these second blocks are distributed to several first clients to obtain several cross-region corrected layout blocks; and these cross-region corrected layout blocks replace the corresponding positions of the first corrected layout to update the first corrected layout and obtain the target layout. When correcting the initial layout based on several first blocks, multiple clients can process each first block separately to save time. Furthermore, dividing the initial layout into two parts and placing each cross-region graphic within a second block avoids the correction problems caused by distributing cross-region graphics across multiple blocks, improving the accuracy of layout correction. Since the number of cross-region graphics is relatively small, correction based on several second blocks has a smaller impact on runtime, thus improving the overall accuracy of layout correction while saving time. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the layout structure of a graphic correction method;

[0022] Figures 2 to 4 This is a flowchart of the graphic correction method according to an embodiment of the present invention;

[0023] Figures 5 to 11 This is a schematic diagram of the layout structure of each step in the graphic correction method according to an embodiment of the present invention. Detailed Implementation

[0024] As described in the background section, existing optical proximity correction methods require further improvement. This will be explained in detail below.

[0025] In order to obtain the desired target pattern on the wafer, the design layout needs to be retargeted before optical proximity correction is performed to overcome the effects of etching deviations in the etching process. The target pattern is obtained through the target retargeting, and the subsequent optical proximity correction is based on the target pattern.

[0026] Figure 1 This is a schematic diagram of the layout structure of a graphic correction method.

[0027] Please refer to Figure 1 In existing tile-based optical proximity correction methods, the target resetting process includes: obtaining a design layout; dividing the design layout into several blocks according to location, with each block containing several design graphics; assigning the graphic correction tasks of several design graphics in each block to remote clients; and after each remote client completes the calculation, returning the correction results to the host.

[0028] In the aforementioned target resetting process, the correction rules are related to the shape of the graphic. Taking a "U"-shaped graphic as the graphic to be corrected as an example, both the first graphic 101 and the second graphic 102 are "U"-shaped graphics. However, the first graphic 101 spans three different blocks T1, T2, and T3. When different remote clients are used to correct each block, only the first graphic 101 located in T1 will be corrected according to the "U" shape. This will lead to inaccurate correction results, making it impossible to obtain an accurate target graphic, and thus affecting the results of optical proximity effect correction.

[0029] To address the aforementioned problems, this invention provides a graphic correction method. Based on a first division, an initial layout is corrected to obtain a first corrected layout. Then, the initial layout is further divided into a second division, placing a cross-region graphic within a second block. Correction tasks within these second blocks are distributed to several first clients, resulting in several cross-region corrected layout blocks. These cross-region corrected layout blocks replace the corresponding positions of the first corrected layout, updating the first corrected layout to obtain the target layout. When correcting the initial layout based on several first blocks, multiple clients can process each first block separately, saving time. Furthermore, dividing the initial layout into a second division and placing each cross-region graphic within a second block avoids the correction problems caused by distributing cross-region graphics across multiple blocks, improving the accuracy of layout correction. Since the number of cross-region graphics is relatively small, correction based on several second blocks has a smaller impact on runtime, thus improving the overall accuracy of layout correction while saving time.

[0030] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0031] Figures 2 to 4 This is a flowchart of the graphic correction method according to an embodiment of the present invention.

[0032] Please refer to Figure 2 The graphic correction method includes the following steps:

[0033] Step S201: Provide an initial layout, which includes several design drawings;

[0034] Step S202: Divide the initial layout into several first blocks, each of which includes several block graphics;

[0035] Step S203: Based on several first blocks, the initial layout is modified to obtain a first modified layout, wherein the first modified layout includes several first modified graphics corresponding to the block graphics;

[0036] Step S204: Obtain a plurality of first special graphics from a plurality of block region graphics in a plurality of first block regions;

[0037] Step S205: Based on the first special graphic, determine a number of cross-regional graphics in the initial layout, wherein the cross-regional graphics are located in at least two of the first block regions;

[0038] Step S206: Divide the initial map into a second region to obtain a number of second regions, wherein a cross-regional graphic is located in one of the second regions;

[0039] Step S207: Based on several second blocks, obtain several cross-regional correction layouts, each of the cross-regional correction layout blocks including a cross-regional correction graphic, the cross-regional correction graphic corresponding to the cross-regional graphic;

[0040] Step S208: Update the first modified map based on several of the cross-regional modified map blocks to obtain the target map.

[0041] The steps of the graphic correction method are described in detail below with reference to the accompanying drawings.

[0042] Figures 5 to 11 This is a schematic diagram of the layout structure of each step in the graphic correction method according to an embodiment of the present invention.

[0043] Please continue to refer to this. Figure 2 and refer to Figure 5 An initial layout 30 is provided, which includes several design drawings 301.

[0044] Please continue to refer to this. Figure 2 and refer to Figure 6 The initial layout 30 is divided into several first blocks, each of which includes several block graphics 302.

[0045] For ease of explanation, Figure 6 Only the six first blocks, T1 to T6, are shown.

[0046] Each of the first blocks includes a first boundary and a second boundary that are perpendicular to each other.

[0047] Please continue to refer to this. Figure 2 and Figure 6 The initial layout 30 is modified based on several first block areas to obtain a first modified layout (not shown in the figure). The first modified layout includes several first modified graphics corresponding to the block area graphics 302.

[0048] When making preliminary corrections to the initial layout 30 based on the first division, time can be effectively saved by using multiple clients for processing.

[0049] In this embodiment, the method for correcting the initial layout based on several first blocks includes the following steps:

[0050] Step S2031: The correction tasks of a plurality of first blocks are assigned to a plurality of second clients, and one second client is used to correct one first block or to correct a plurality of first blocks respectively;

[0051] Step S2032: Obtain several block area correction layouts from several second clients. Each block area correction layout includes several first correction graphics, and the first correction graphics correspond to the block area graphics.

[0052] Step S2033: Based on the position of each first block area in the initial layout, merge the revised layout of several blocks to obtain the first revised layout.

[0053] In this embodiment, the method for the second client to correct the first block area further includes: obtaining a plurality of second special graphics from a plurality of block area graphics 302 in the first block area; and correcting the plurality of second special graphics.

[0054] It should be noted that, since the correction rules are related to the shape of the graphic, the second special graphic refers to the graphic that needs to be corrected using special correction rules during the correction process.

[0055] In this embodiment, the "U" shape is used as an example of the second special shape. When the second client corrects the first block area, shape A located in T4 can be corrected relatively correctly. However, shape B, which spans T1, T2, and T3, is divided into three first blocks, so only shape B located in T1 is corrected according to the "U" shape rule. Subsequently, shape B, which spans T1, T2, and T3, is divided into two parts in the initial layout 30, placing a cross-region shape into a second block area.

[0056] Please continue to refer to this. Figure 2 and refer to Figure 7 Several first special graphics are obtained from several block area graphics of several first block areas.

[0057] In this embodiment, among the block area graphics of several first block areas, several first special graphics obtained have the same shape. In another embodiment, among the block area graphics of several first block areas, multiple sets of first special graphics can also be obtained, each set of first special graphics having the same shape, and each set of first special graphics is corrected using a correction rule corresponding to its shape.

[0058] It should be noted that, since the correction rules are related to the shape of the graphic, the first special graphic refers to the graphic that needs to be corrected using special correction rules during the correction process.

[0059] Specifically, in T4, we obtain graphic A, and in T1, we obtain a part of graphic B, namely graphic B0.

[0060] Please continue to refer to this. Figure 2 and Figure 7 Based on the first special graphic, several cross-regional graphics are determined in the initial layout, and the cross-regional graphics are located in at least two of the first block regions.

[0061] In this embodiment, determining several cross-regional graphics in the initial layout based on the first special graphic includes: using several of the first special graphics as seed graphics in the initial layout 30, and employing a web crawler algorithm to search for adjacent block graphics 302 to obtain several cross-regional graphics.

[0062] Specifically, graphic A and graphic B0 are used as seed graphics respectively.

[0063] In this embodiment, the method of using a web crawler algorithm to search adjacent block regions 302 is described in the following reference. Figure 4 .

[0064] Please refer to Figure 4 The method for searching adjacent block regions of the graphic 302 using a web crawler algorithm includes the following steps:

[0065] Step S2051: Set a search mark at the end of the seed graphic;

[0066] Step S2052: When the search mark and the block area graphic in the adjacent first block area have positional overlap, the seed graphic and the block area graphic are merged to form an initial cross-region graphic.

[0067] Step S2053: Replace the seed graphic with the initial cross-region graphic to form an updated seed graphic;

[0068] Step S2054: Reset the search mark at the end of the updated seed graphic until no block graphic in the adjacent first block region that overlaps with the search mark can be found, and then use the updated seed graphic as the cross-region graphic.

[0069] Please refer to Figure 4 Please refer to Figure 8 A search marker 303 is set at the end of the seed graphic.

[0070] Specifically, the search mark 303 is set at the end of both graphic A and graphic B0.

[0071] In this embodiment, the size of the search marker 303 is twice the database unit length. The database unit length is the smallest resolution size in the layout processing.

[0072] Please continue to refer to this. Figure 4 Please refer to Figure 9 When the search mark 303 and the block area graphic 302 in the adjacent first block area overlap, the seed graphic and the block area graphic 302 are merged to form an initial cross-region graphic; the initial cross-region graphic replaces the seed graphic to form an updated seed graphic.

[0073] Specifically, if the search marker 303 at the end of graphic B0 overlaps with the adjacent block graphic 302 in the first block area, graphic B0 and the adjacent block graphic 302 are merged to form an initial cross-region graphic B1. This initial cross-region graphic B1 is then used as the new seed graphic to search for adjacent block graphics 302. If the search marker 303 at the end of graphic A does not overlap with the adjacent block graphic 302 in the first block area, then the search for adjacent block graphics 302 using graphic A as the seed graphic ends.

[0074] Please Figure 9 Based on this, continue to refer to Figure 10 The search mark 303 is reset at the end of the updated seed graphic until no block graphic 302 in the adjacent first block area that overlaps with the search mark 303 can be found. Then the updated seed graphic is used as the cross-region graphic 304.

[0075] Please continue to refer to this. Figure 4 and refer to Figure 11 The initial map is then divided into several second blocks T. 2-nd One of the cross-regional patterns 304 is located in a second block region T 2-nd middle.

[0076] Specifically, the initial layout is divided into a second division based on the position of each cross-region graphic 304 in the initial layout.

[0077] The second block T is located at the edge distance of the area where the cross-regional graphic 304 is located. 2-nd The size of the edge ranges from 1 to 2 times the optical diameter of the corresponding optical system.

[0078] In this embodiment, the distance from the edge of the region where the cross-regional graphic 304 is located to the corresponding second block region T 2-nd The edge dimensions range from 1 micrometer.

[0079] Please continue to refer to this. Figure 4 Based on several second blocks, several cross-regional correction layouts are obtained, each of the cross-regional correction layout blocks including a cross-regional correction graphic, the cross-regional correction graphic corresponding to the cross-regional graphic.

[0080] In this embodiment, the method for obtaining several cross-regional correction maps based on several second blocks includes: distributing the correction tasks of several second blocks to several first clients, and then obtaining several cross-regional correction map blocks from several first clients.

[0081] Please continue to refer to this. Figure 4 The first modified map is updated based on several cross-regional modified map blocks to obtain the target map.

[0082] In this embodiment, the method for updating the first corrected map based on a plurality of cross-regional corrected map blocks includes: replacing the first corrected map at the corresponding position of a plurality of second blocks in the initial map 30 with a plurality of cross-regional corrected map blocks to update the first corrected map and obtain the target map.

[0083] Therefore, based on the first division, the initial layout is corrected to obtain a first corrected layout. Then, by performing a second division on the initial layout, a cross-region graphic is placed within a second block. Correction tasks within several second blocks are distributed to several first clients, resulting in several cross-region corrected layout blocks. These cross-region corrected layout blocks replace the corresponding positions of the first corrected layout to update the first corrected layout and obtain the target layout. When correcting the initial layout based on several first blocks, multiple clients can process each first block separately to save time. Furthermore, performing a second division on the initial layout, placing each cross-region graphic within a second block, avoids the correction problems caused by distributing cross-region graphics across multiple blocks, improving the accuracy of layout correction. Simultaneously, since the number of cross-region graphics is relatively small, the impact of correction based on several second blocks on runtime is minimal, thus improving the overall accuracy of layout correction while saving time.

[0084] In this embodiment, after obtaining the target pattern, optical proximity correction is performed on the target pattern to obtain an optically proximity-corrected pattern. The optically proximity-corrected pattern is used as a mask pattern for mask fabrication.

[0085] Accordingly, embodiments of the present invention also disclose a computer device, including a memory and a processor, wherein the memory stores a computer program, and the processor executes the computer program to perform the above-described... Figures 2 to 4 The steps of the graphic correction method shown are as follows.

[0086] Accordingly, embodiments of the present invention also disclose a computer-readable storage medium storing a computer program thereon, which, when executed by a processor, performs the above-described... Figures 2 to 4 The steps of the illustrated image correction method are shown. Preferably, the storage medium may include a computer-readable storage medium. Preferably, the storage medium may include ROM, RAM, a magnetic disk, or an optical disk, etc.

[0087] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A method of graphic correction, characterized by, include: Provide an initial layout, which includes several design drawings; The initial map is divided into several first blocks, each of which includes several block graphics. The initial layout is modified based on several first blocks to obtain a first modified layout, the first modified layout including several first modified graphics corresponding to the block graphics; Among the block area graphics of the first block area, obtain a number of first special graphics; Based on the first special graphic, several cross-regional graphics are determined in the initial layout, and the cross-regional graphics are located in at least two of the first block areas; The initial map is divided into several second blocks, and a cross-block graphic is located in one of the second blocks; Based on several second blocks, several cross-regional correction layouts are obtained, each of the cross-regional correction layout blocks including a cross-regional correction graphic, and the cross-regional correction graphic corresponds to the cross-regional graphic. The first modified map is updated based on several of the cross-regional modified map blocks to obtain the target map.

2. The graphic correction method as described in claim 1, characterized in that, The step of determining several cross-regional graphics in the initial layout based on the first special graphic includes: using several of the first special graphics as seed graphics in the initial layout, and employing a web crawler algorithm to search for adjacent block graphics to obtain several cross-regional graphics.

3. The graphic correction method of claim 2, wherein The method for searching adjacent block graphics using a crawler algorithm includes: setting a search marker at the end of the seed graphic; when the search marker and the block graphics in the adjacent first block overlap, merging the seed graphic and the block graphics to form an initial cross-region graphic; replacing the seed graphic with the initial cross-region graphic to form an updated seed graphic; resetting the search marker at the end of the updated seed graphic until no block graphics in the adjacent first block that overlap with the search marker can be found, and then using the updated seed graphic as the cross-region graphic.

4. The graphic correction method of claim 3, wherein The size of the search mark is twice the length of the map unit.

5. The graphic correction method of claim 1, wherein The method for correcting the initial layout based on several first blocks includes: assigning correction tasks for several first blocks to several second clients, whereby one second client is used to correct one first block or multiple first blocks respectively; obtaining several block correction layouts from the several second clients, each block correction layout including several first correction graphics, the first correction graphics corresponding to the block graphics; and merging the several block correction layouts according to the position of each first block in the initial layout to obtain the first corrected layout.

6. The graphic correction method of claim 5, wherein The method for the second client to correct the first block area further includes: obtaining a plurality of second special graphics from a plurality of block area graphics in the first block area; and correcting the plurality of second special graphics.

7. The graphic correction method of claim 1, wherein The step of obtaining several cross-regional correction maps based on several second blocks includes: distributing the correction tasks of several second blocks to several first clients, and then obtaining several cross-regional correction map blocks from several first clients.

8. The graphic correction method of claim 1, wherein, The step of updating the first revised map based on a plurality of cross-regional revised map blocks includes: replacing the first revised map at the corresponding position of a plurality of second blocks in the initial map with a plurality of cross-regional revised map blocks to update the first revised map.

9. The graphic correction method as described in claim 1, characterized in that, After obtaining the target layout, the method further includes: performing optical proximity effect correction on the target layout to obtain an optical proximity corrected layout.

10. The method of claim 1, wherein, Each of the first blocks includes a first boundary and a second boundary that are perpendicular to each other. 11.A computer device, comprising a memory and a processor, wherein the memory stores a computer program, and the computer device is configured to perform the method according to any one of claims 1-10. When the processor executes the computer program, it implements the steps of the graphics correction method according to any one of claims 1 to 10.

12. A computer readable storage medium having stored thereon a computer program, characterized in that, When the computer program is executed by a processor, it implements the steps of the graphic correction method according to any one of claims 1 to 10.

Citation Information

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