Display panel, preparation method thereof and display device

Abstract

The application relates to a display panel, a preparation method thereof and a display device. The display panel comprises a substrate, an isolation structure and a light-emitting structure. The isolation structure surrounds a plurality of isolated openings. The isolation structure comprises a first isolation part and a second isolation part. The first isolation part is located between the second isolation part and the substrate. The second isolation part has a first sub-region extending outward from the top surface of the first isolation part and a second sub-region. The first sub-region and the second sub-region are oppositely arranged in the first direction. In the first direction, the length of the projection of the first sub-region on the substrate is smaller than the length of the projection of the second sub-region on the substrate. The light-emitting structure is located in the isolated opening and comprises a light-emitting unit and a first electrode. In the same isolated opening, the first electrode is overlapped with the first isolation part on the side corresponding to the first sub-region in the first direction. The application can improve the poor overlap of the electrode (such as the cathode) in the isolated opening.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to a display panel, a preparation method thereof and a display device. BACKGROUND

[0002] In the preparation process of a conventional display panel, a fine mask (FMM) is usually used to realize the patterning of a light-emitting sub-pixel. The FMM technology is mature and has rich mass production experience. However, the FMM technology also has the problems of limited precision, high development cost and long development cycle.

[0003] The patterning of a sub-pixel through a photolithography process can effectively improve the resolution without being limited by the precision of the FMM. However, this technology is prone to the problem of poor overlap of an electrode (such as a cathode) in an isolation opening. SUMMARY

[0004] Therefore, it is necessary to provide a display panel and a preparation method thereof and a display device capable of improving the poor overlap of an electrode (such as a cathode) in an isolation opening.

[0005] A display panel comprises:

[0006] a substrate;

[0007] an isolation structure located on the substrate and surrounding a plurality of isolation openings, wherein the isolation structure comprises a first isolation portion and a second isolation portion, the first isolation portion is located between the second isolation portion and the substrate, the second isolation portion has a first sub-region extending outward from the top surface of the first isolation portion and a second sub-region, the first sub-region and the second sub-region are oppositely arranged in a first direction, and in the first direction, the length of the projection of the first sub-region on the substrate is less than the length of the projection of the second sub-region on the substrate;

[0008] a light-emitting structure located in the isolation opening and comprising a light-emitting unit and a first electrode, wherein the first electrode is located on the side of the light-emitting unit away from the substrate;

[0009] In the same isolation opening, the first electrode overlaps the first isolation portion on the side corresponding to the first sub-region in the first direction.

[0010] In one of the embodiments, the overlapping area of the projection of the light-emitting unit on the substrate and the projection of the first sub-region on the substrate is less than the overlapping area of the projection of the light-emitting unit on the substrate and the projection of the second sub-region on the substrate.

[0011] In one of the embodiments, in the first direction, the first sub-region has a length of a first length on the substrate, and the second sub-region has a length of a second length on the substrate, the second length being k times of the first length, 1 < k ≤ 5.

[0012] In one of the embodiments, in the same isolation opening, the first isolation portion is spaced apart from the light emitting unit.

[0013] Optionally, in the same isolation opening, the light emitting unit is spaced apart from the first isolation portion on both sides of the light emitting unit in the first direction.

[0014] Optionally, in the same isolation opening, in the first direction, the light emitting unit and the opening surrounded by the first isolation portion on the substrate are co-centered.

[0015] In one of the embodiments, the first isolation portion includes a support portion, the second isolation portion covers the surface of the support portion away from the substrate on the substrate, and the first electrode is connected to the sidewall of the support portion.

[0016] Optionally, the first isolation portion further includes a bonding portion between the support portion and the substrate, and the first electrode extends to the sidewall of the support portion via the bonding portion.

[0017] In one of the embodiments, the substrate includes a pixel definition layer and a second electrode, the pixel definition layer covers the second electrode, and the pixel definition layer has a pixel opening exposing the second electrode, the pixel opening is in communication with the isolation opening, and the isolation structure is on the pixel definition layer.

[0018] A display panel includes:

[0019] a substrate;

[0020] an isolation structure on the substrate, surrounding a plurality of isolation openings, and including a first isolation portion and a second isolation portion, the first isolation portion being between the second isolation portion and the substrate, the second isolation portion having a first sub-region and a second sub-region extending outward from the top surface of the first isolation portion, the first sub-region and the second sub-region being oppositely arranged in a first direction, and in the first direction, the first sub-region has a length smaller than the length of the second sub-region on the substrate;

[0021] a light emitting structure in the isolation opening, including a light emitting unit and a first electrode, the first electrode being on the side of the light emitting unit away from the substrate.

[0022] In the same isolation opening, the first electrode overlaps the first isolation portion on both sides of the first electrode in the first direction, and the overlapping area of the first electrode and the first isolation portion on the side corresponding to the first sub-region is greater than the overlapping area of the first electrode and the first isolation portion on the side corresponding to the second sub-region.

[0023] In one of the embodiments, the climbing height of the first electrode on the isolation structure on the side corresponding to the first sub-region is greater than the climbing height of the first electrode on the isolation structure on the side corresponding to the second sub-region.

[0024] In one of the embodiments, the climbing thickness of the first electrode on the isolation structure on the side corresponding to the first sub-region is greater than the climbing thickness of the first electrode on the isolation structure on the side corresponding to the second sub-region.

[0025] A preparation method of a display panel, comprising:

[0026] providing a substrate;

[0027] forming an isolation structure on the substrate, the isolation structure surrounds to form a plurality of isolation openings, and the isolation structure comprises a first isolation portion and a second isolation portion, the first isolation portion is located between the second isolation portion and the substrate, the second isolation portion has a first sub-region and a second sub-region extending outward from the top surface of the first isolation portion, the first sub-region and the second sub-region are oppositely arranged in a first direction, and in the first direction, the length of the first sub-region on the substrate is less than the length of the second sub-region on the substrate;

[0028] evaporating a light emitting material layer on the substrate with the isolation structure by a first evaporation source;

[0029] evaporating a first electrode material layer on the light emitting material layer by a second evaporation source;

[0030] performing a patterning process on the first electrode material layer and the evaporated light emitting material layer to form a first electrode and a light emitting unit.

[0031] In one of the embodiments, during the process of evaporating the light emitting material layer, the evaporation angle of the first evaporation source towards the first sub-region is greater than the evaporation angle of the first evaporation source towards the second sub-region, and the evaporation angle is the included angle between the evaporation direction and the direction parallel to the substrate.

[0032] In one of the embodiments, before the process of evaporating the light emitting material layer on the substrate with the isolation structure by the first evaporation source, the process comprises:

[0033] adjusting an evaporation angle of the first evaporation source.

[0034] In one of the embodiments, the adjusting the evaporation angle of the first evaporation source comprises:

[0035] adjusting a position of the angle limiting plate and / or the first evaporation source in a first direction so that the first evaporation source deviates from a center of an opening of the angle limiting plate and approaches an opening edge of the angle limiting plate facing the first sub-region.

[0036] In one of the embodiments, the adjusting the evaporation angle of the first evaporation source comprises:

[0037] tilting the first evaporation source to increase the evaporation angle of the first evaporation source tilted towards the first sub-region.

[0038] In one of the embodiments, the evaporating the first electrode material layer on the light emitting material layer by the second evaporation source comprises:

[0039] adjusting an evaporation angle of the second evaporation source.

[0040] In one of the embodiments, the adjusting the evaporation angle of the second evaporation source comprises:

[0041] tilting the second evaporation source to decrease the evaporation angle of the second evaporation source tilted towards the first sub-region.

[0042] In one of the embodiments, the adjusting the evaporation angle of the second evaporation source comprises:

[0043] adjusting a position of the angle limiting plate and / or the second evaporation source in a first direction so that the second evaporation source deviates from a center of an opening of the angle limiting plate and approaches an opening edge of the angle limiting plate facing the first sub-region.

[0044] In one of the embodiments, the evaporating the first electrode material layer on the light emitting material layer by the second evaporation source comprises:

[0045] rotating the substrate on which the light emitting material layer is formed by 180° with a median line of the substrate as a rotation axis.

[0046] The display panel and the manufacturing method thereof form an isolation structure with asymmetric first sub-area and second sub-area. The length of the first sub-area in the first direction is less than the length of the second sub-area in the first direction. Therefore, when evaporating the first electrode, the first sub-area has less shielding effect, so that the first electrode can extend more under the first sub-area. Therefore, the first electrode in the isolation opening and the first isolation part corresponding to the side of the first sub-area 211 have more overlapping area, so as to effectively improve the problem of poor overlap of the first electrode (such as the cathode) in the isolation opening.

[0047] A manufacturing method of a display panel, comprising:

[0048] providing a substrate;

[0049] forming an isolation structure on the substrate, the isolation structure surrounds a plurality of isolation openings, and the isolation structure comprises a first isolation part and a second isolation part, the first isolation part is located between the second isolation part and the substrate, the second isolation part has a first sub-area and a second sub-area extending outward from the top surface of the first isolation part, and the first sub-area and the second sub-area are oppositely arranged in the first direction;

[0050] evaporating a light-emitting material layer on the substrate with the isolation structure by a first evaporation source, and during the evaporation of the light-emitting material layer, the evaporation angle of the first evaporation source towards the first sub-area is greater than the evaporation angle of the first evaporation source towards the second sub-area, and the evaporation angle is the included angle between the evaporation direction and the direction parallel to the substrate;

[0051] evaporating a first electrode material layer on the light-emitting material layer by a second evaporation source;

[0052] performing a patterning process on the first electrode material layer and the evaporated light-emitting material layer to form a first electrode and a light-emitting unit.

[0053] A display panel, comprising:

[0054] a substrate;

[0055] an isolation structure on the substrate, surrounding a plurality of isolation openings, and the isolation structure comprises a first isolation part and a second isolation part, the first isolation part is located between the second isolation part and the substrate, the second isolation part has a first sub-area and a second sub-area extending outward from the top surface of the first isolation part, and the first sub-area and the second sub-area are oppositely arranged in the first direction;

[0056] a light-emitting structure in the isolation opening, comprising a light-emitting unit and a first electrode, the first electrode is located on the side of the light-emitting unit away from the substrate;

[0057] In the same isolation opening, the first electrode overlaps the first isolation portion on the side corresponding to the first sub-region in the first direction, and the overlapping area of the orthographic projection of the light emitting unit on the substrate with the orthographic projection of the first sub-region on the substrate is less than the overlapping area of the orthographic projection of the light emitting unit on the substrate with the orthographic projection of the second sub-region on the substrate.

[0058] The asymmetric distribution of the light emitting unit under the first sub-region and the second sub-region can reduce the overlap of the light emitting unit and the first isolation portion on the side corresponding to the first sub-region, and increase the overlap area of the first electrode and the first isolation portion on the side corresponding to the first sub-region, thereby effectively improving the poor overlap problem of the first electrode (such as the cathode) in the isolation opening.

[0059] A display device includes the display panel as described above. BRIEF DESCRIPTION OF DRAWINGS

[0060] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0061] Figure 1 It is an embodiment of the preparation process schematic diagram of the display panel;

[0062] Figure 2 It is a partial cross-sectional schematic diagram of forming an isolation structure in the preparation process of the display panel in an embodiment;

[0063] Figure 3 It is a schematic diagram of the evaporation angle of the first evaporation source in an embodiment;

[0064] Figure 4 It is a partial cross-sectional schematic diagram of forming a light emitting material layer in the preparation process of the display panel in an embodiment;

[0065] Figure 5 It is a schematic diagram of the evaporation angle of the second evaporation source in an embodiment;

[0066] Figure 6a It is a partial cross-sectional schematic diagram of forming a first electrode material layer in the preparation process of the display panel in an embodiment;

[0067] Figure 6b It is a partial cross-sectional schematic diagram of forming a first electrode material layer in the preparation process of the display panel in another embodiment;

[0068] Figure 7aA partial cross-sectional schematic view of a display panel prepared in an embodiment;

[0069] Figure 7b A partial cross-sectional schematic view of a display panel prepared in another embodiment;

[0070] Figure 8 A schematic view of an evaporation angle of a first evaporation source in another embodiment;

[0071] Figure 9 A partial cross-sectional schematic view of a display panel prepared in another embodiment;

[0072] Figure 10 A partial cross-sectional schematic view of a display panel in yet another embodiment.

[0073] BRIEF DESCRIPTION OF DRAWINGS

[0074] 100 - substrate, 110 - substrate, 120 - second electrode, 130 - pixel definition layer, 200 - isolation structure, 200a - isolation opening, 210 - second isolation portion, 211 - first sub-region, 212 - second sub-region, 220 - first isolation portion, 221 - support portion, 222 - bonding portion, 300 - light emitting structure, 310 - light emitting unit, 3101 - light emitting material layer, 320 - first electrode, 3201 first electrode material layer, 400 - first evaporation source, 500 - second evaporation source. DETAILED DESCRIPTION

[0075] In order to facilitate the understanding of the present application, a more complete understanding of the present application can be had by reference to the following description and the accompanying drawings. The figures included in the application generally represent preferred embodiments of the application. However, the application can be realized in many different forms and should not be construed as limited to the embodiments set forth in this disclosure. Rather, these embodiments are provided so that this disclosure will be thorough and complete. It should be noted that where particular elements of the present application can be referred to as "preferred" or "particularly preferred", other elements not specifically described as preferred or particularly preferred are not to be excluded from the scope of the application.

[0076] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description of the application herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

[0077] It should be noted that when an element is referred to as being "on" another element, it can be directly on the other element or intervening elements can also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements can also be present. The terms "vertical", "horizontal", "left", "right", and the like as used herein are for the purpose of illustration only.

[0078] In the drawings, the size of layers and regions can be exaggerated for clarity. It will be understood that when a layer or element is referred to as being "on" another layer or substrate, it can be directly on the other layer or substrate, or intervening layers can also be present. Also, it will be understood that when a layer is referred to as being "between" two layers, it can be the only layer between the two layers, or one or more intervening layers can also be present. In addition, like reference numerals are used to denote like elements throughout the figures.

[0079] In the following embodiments, when a layer, region, or element is "connected" to another layer, region, or element, it can be construed that the layer, region, or element is connected not only directly but also through another constituent element disposed therebetween. For example, when a layer, region, element, etc. is described as being connected or electrically connected, the layer, region, element, etc. can be connected or electrically connected not only directly but also through another layer, region, element, etc. disposed therebetween.

[0080] Hereinafter, although terms such as "first", "second", etc. can be used to describe various components, the components are not necessarily limited to the above terms. The above terms are used only to distinguish one component from another component. It will also be understood that an expression used in the singular encompasses the plural, unless the context clearly dictates otherwise.

[0081] When an expression such as "at least one of... " is used, it is intended to mean one or more of the listed items, not a single item from among the listed items. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. As used in the application, the term "and / or" includes any and all combinations of one or more of the associated listed items. It will be further understood that the terms "comprises" and / or "comprising", or "includes" and / or "including" when used in this specification, specify the presence of stated features, integers, steps, operations, components, parts, or combinations thereof, but do not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

[0082] The electronic or electric devices and / or any other related devices or components (e.g., display devices including display panels and display panel drivers, where the display panel drivers further include drive controllers, gate drivers, gamma reference voltage generators, data drivers, and emission drivers) according to the embodiments of the present application concepts described herein can be implemented with any suitable hardware, firmware (e.g., application specific integrated circuits), software, or a combination of software, firmware, and hardware. For example, various components of these devices can be formed on one integrated circuit (IC) chip or on separate IC chips. In addition, various components of these devices can be implemented on flexible printed circuit films, tape carrier packages (TCPs), printed circuit boards (PCBs), or formed on one substrate. In addition, various components of these devices can be processes or threads running on one or more processors in one or more computing devices, executing computer program instructions at the one or more processors to perform various functions described herein and to interact with other system components to perform the various functions described herein. The computer program instructions are stored in memory, which can be implemented using standard memory devices such as random access memory (RAM) in computing devices. The computer program instructions can also be stored in other non-transitory computer-readable media such as, for example, CD-ROMs, flash drives, etc. Moreover, those skilled in the art will appreciate that the functions of various computing devices can be combined or integrated into a single computing device, or the functions of a particular computing device can be distributed across one or more other computing devices without departing from the spirit and scope of the exemplary embodiments of the present application concepts.

[0083] While the exemplary embodiments of the display panel and display devices including the display panel have been particularly described herein, many modifications and variations will be apparent to those skilled in the art. Accordingly, it is to be understood that the application can be implemented in a manner other than as specifically described herein without departing from the principles underlying the application. The application is therefore to be understood in all respects as limited only by the appended claims and equivalents thereof.

[0084] Among them, the patent applications PCT / CN2023 / 134518, 202310759370.2, 202310740412.8, 202310707209.0, 202311346196.5 disclose related technical solutions of isolation structures, the contents of which are incorporated by reference into the present application for reference.

[0085] In one embodiment, referring to Figure 1 , a preparation method of a display panel is provided, comprising the following steps:

[0086] Step S10, referring to Figure 2 , a substrate 100 is provided.

[0087] The substrate 100 can include a substrate 110 and a circuit layer (not shown) formed on the substrate 110, etc. The substrate 110 can be a rigid substrate or a flexible substrate. The circuit layer can include a plurality of wiring layers and a medium layer for isolating the wiring layers, etc., and pixel circuits, etc. can be formed in the circuit layer.

[0088] At step S20, please continue to refer to Figure 2 The isolation structure 200 is formed on the substrate 100, the isolation structure 200 surrounds a plurality of isolation openings 200a, and the isolation structure 200 includes a first isolation portion 220 and a second isolation portion 210. The first isolation portion 220 is located between the second isolation portion 210 and the substrate 100. The second isolation portion 210 has a first sub-region 211 and a second sub-region 212 extending outward from the top surface of the first isolation portion 220. The first sub-region 211 and the second sub-region 212 are oppositely arranged in the first direction. In the first direction, the length of the projection of the first sub-region 211 on the substrate 100 is less than the length of the projection of the second sub-region 212 on the substrate 100.

[0089] The isolation material layer can be formed on the substrate 100 first. Then, the isolation material layer can be patterned by wet etching to form the isolation structure 200.

[0090] Specifically, the isolation material layer can include a first sub-isolation material layer and a second sub-isolation material layer. After the first sub-isolation material layer and the second sub-isolation material layer are patterned, the isolation openings 200a can be formed, and the first isolation portion 220 and the second isolation portion 210 can be formed. It can be understood that the isolation openings 200a are formed by the first isolation portion 220 and the second isolation portion 210.

[0091] As an example, the first sub-isolation material layer can include a support material layer, and the first isolation portion 220 includes a support portion 221. At this time, after the isolation material layer is patterned, the support material layer can form the support portion 221.

[0092] As another example, the first sub-isolation material layer can include a support material layer and an adhesive material layer. The adhesive material layer is located between the support material layer and the substrate 100, thereby increasing the adhesion between the two. At this time, after the isolation material layer is patterned, the support material layer can form the support portion 221, and the adhesive material layer can form the adhesive portion 222. The first isolation portion 220 includes the support portion 221 and the adhesive portion 222, please refer to Figure 10 .

[0093] At the same time, the etching rate of the second sub-isolation material layer and the first sub-isolation material layer can be different during wet etching, so that the edge of the second isolation portion 210 can be beyond the top surface of the first isolation portion 220, thereby forming a roof structure.

[0094] The eaves structure of the first isolation part 220 may include a first sub-region 211 and a second sub-region 212 that are oppositely arranged in the first direction. In the first direction, the length of the orthographic projection of the first sub-region 211 on the substrate 100 may be MA1, and the length of the orthographic projection of the second sub-region 212 on the substrate 100 may be MA2. MA1 is less than MA2, so that the first sub-region 211 and the second sub-region 212 are arranged on both sides of the first isolation part 220 in an asymmetric manner.

[0095] As an example, MA2 may be set to k times of MA1, where 1 < k ≤ 5. The value of k can be set according to requirements.

[0096] Step S40, please refer to Figure 3 and Figure 4 , a light-emitting material layer 3101 is evaporated on the substrate 100 formed with the isolation structure 200 by the first evaporation source 400.

[0097] As an example, during the process of evaporating the light-emitting material layer 3101, the evaporation angle of the first evaporation source 400 facing the first sub-region 211 may be greater than the evaporation angle of the first evaporation source 400 facing the second sub-region 212. The evaporation angle is the angle between the evaporation direction and the direction parallel to the substrate.

[0098] The display panel may include sub-pixels of multiple different colors. The sub-pixels of multiple different colors are the sub-pixels that emit multiple different colors of light. During the preparation process of the display panel, after the preparation of the sub-pixels of one color is completed, the preparation of the sub-pixels of another color can be completed. The sub-pixels of different colors can be formed by the same preparation method.

[0099] The light-emitting material layer 3101 evaporated in this step may be the light-emitting material layer 3101 of the currently processed color. The first evaporation source 400 is the evaporation source of the light-emitting material layer 3101.

[0100] During the process of evaporating the light-emitting material layer 3101, the eaves structure (including the first sub-region 211 and the second sub-region 212) of the second isolation part 210 separates the light-emitting material layer 3101 in the isolation opening 200a from the light-emitting material layer 3101 above the second isolation part 210. At the same time, the first evaporation source 400 may have a certain evaporation angle, so that the light-emitting material layer 3101 can extend below the first sub-region 211 and the second sub-region 212.

[0101] Meanwhile, it can be understood that the evaporation angle of one evaporation source towards the first sub-area 211 is the evaporation angle of the evaporation source towards the first sub-area 211 in the isolation opening 200a when the evaporation source is opposite to the isolation opening 200a. The evaporation angle of one evaporation source towards the second sub-area 212 is the evaporation angle of the evaporation source towards the second sub-area 212 in the isolation opening 200a when the evaporation source is opposite to the isolation opening 200a.

[0102] The evaporation angle a1 of the first evaporation source 400 towards the first sub-area 211 is greater than the evaporation angle a2 of the first evaporation source 400 towards the second sub-area 212. The area of the light-emitting material layer 3101 falling in the first sub-area 211 is smaller than the area of the light-emitting material layer 3101 falling in the second sub-area 212.

[0103] Therefore, although the length MA1 of the first sub-area 211 is small, the extension length of the light-emitting material layer 3101 under the first sub-area 211 in the isolation opening 200a can also not be too long, so as to prevent the light-emitting material layer 3101 from extending too much in the direction of the first sub-area 211, even overlapping the first isolation part 220 corresponding to one side of the first sub-area 211, thereby affecting the available overlapping area of the first isolation part 220.

[0104] Step S70, please refer to Figure 5 and Figure 6a (or Figure 6b ), the second evaporation source 500 evaporates the first electrode material layer 3201 on the light-emitting material layer 3101.

[0105] The second evaporation source 500 is the evaporation source of the first electrode material layer 3201.

[0106] During the evaporation of the first electrode material layer 3201, the eave structure of the second isolation part 210 (including the first sub-area 211 and the second sub-area 212) will cut off the first electrode material layer 3201 in the isolation opening 200a from the first electrode material layer 3201 above the second isolation part 210. At the same time, the second evaporation source 500 can have a certain evaporation angle, so that the first electrode material layer 3201 can extend under the first sub-area 211 and the second sub-area 212.

[0107] As an example, the evaporation angle of the second evaporation source 500 towards the first sub-area 211 can be set to be smaller than the evaporation angle of the second evaporation source 500 towards the second sub-area 212, so as to more conveniently perform one-side overlapping of the first electrode material layer 3201 and the first isolation part 220 corresponding to one side of the first sub-area 211. Of course, the first electrode material layer 3201 can also be overlapped with the first isolation part 220 on both sides thereof in the first direction.

[0108] Meanwhile, the length MA1 of the first sub-area 211 is small, and the shielding effect on the first electrode material layer 3201 is small, so that the first electrode material layer 3201 can extend more under the first sub-area 211 and can reliably lap with the first isolation portion 220. At this time, the first electrode material layer 3201 can have more lapping area with the first isolation portion 220 on the side corresponding to the first sub-area 21. In addition, the lapping thickness of the first electrode material layer 3201 on the side corresponding to the first sub-area 21 can also be thicker. When the first electrode material layer laps with the side wall of the first isolation portion 220, the climbing height of the isolation structure of the first electrode material layer 3201 on the side corresponding to the first sub-area 21 can also be larger.

[0109] It can be understood that the smaller the evaporation angle, the longer the extension under the eave structure. The evaporation angle of the second evaporation source 500 towards the first sub-area 211 is smaller than the evaporation angle of the first evaporation source 400 towards the first sub-area 211, so that the first electrode material layer 3201 can have more extension under the first sub-area 211.

[0110] Step S80, please refer to Figure 7a (or Figure 7b ) to the first electrode material layer 3201 and the evaporation light emitting material layer 3101 for patterned processing to form the first electrode 320 and the light emitting unit 310.

[0111] Before patterned processing, an encapsulation material layer can also be formed on the first electrode material layer 3201 by chemical vapor deposition (CVD) process and the like.

[0112] Then, a patterned photoresist is formed on the encapsulation material layer. The patterned photoresist covers the isolation opening 200a corresponding to the current processing color. As an example, the patterned photoresist can also extend from the isolation opening 200a to the upper part of the second isolation portion 210.

[0113] Then, the encapsulation material layer exposed by the patterned photoresist can be removed by dry etching, so as to form an encapsulation layer in the isolation opening 200a corresponding to the current processing color.

[0114] Then, the first electrode material layer 3201 and the light emitting material layer 3101 exposed by the patterned photoresist can be wet etched, and the first electrode material layer 3201 and the light emitting material layer 3101 in the isolation opening 200a corresponding to the current processing color are reserved.

[0115] The first electrode material layer 3201 reserved in the isolation opening 200a forms a first electrode 320, which is connected to the first isolation portion 220 on the side corresponding to the first sub-area 211 in the first direction. Specifically, for example, the first electrode 320 overlaps the side wall of the support portion 221 on the side corresponding to the first sub-area 211 in the first direction, or the first electrode 320 overlaps the side wall of the support portion 221 on the side corresponding to the first sub-area 211 in the first direction via an adhesive layer.

[0116] The light-emitting material layer 3101 reserved in the isolation opening 200a forms a light-emitting unit 310 of the current processing color.

[0117] When the first evaporation source 400 has a larger evaporation angle towards the first sub-area 211 than towards the second sub-area 212 during the evaporation of the light-emitting material layer 3101, the area of the light-emitting unit 310 under the first sub-area 211 is smaller than the area of the light-emitting unit 310 under the second sub-area 212. That is, the overlapping area of the orthographic projection of the light-emitting unit 310 on the substrate 100 and the orthographic projection of the first sub-area 211 on the substrate 100 is smaller than the overlapping area of the orthographic projection of the light-emitting unit 310 on the substrate 100 and the orthographic projection of the second sub-area 212 on the substrate 100.

[0118] In the present embodiment, the isolation structure 200 with asymmetric first and second sub-areas 211 and 212 is first formed. The length of the first sub-area 211 in the first direction is smaller than the length of the second sub-area 212 in the first direction. Therefore, when the first electrode material layer 3201 is evaporated, the first sub-area 211 has a smaller shielding effect, so that the first electrode material layer 3201 can extend more under the first sub-area 211. Therefore, the first electrode 320 in the isolation opening 200a and the first isolation portion 220 on the side corresponding to the first sub-area 211 have more overlapping area. Therefore, the present embodiment can effectively improve the problem of poor overlap of the first electrode 320 (such as the cathode) in the isolation opening 200a.

[0119] At the same time, in some examples, the first evaporation source 400 has a larger evaporation angle towards the first sub-area 211 than towards the second sub-area 212 during the evaporation of the light-emitting material layer 3101. Therefore, although the length MA1 of the first sub-area 211 is smaller, the extension length of the light-emitting material layer 3101 under the first sub-area 211 in the isolation opening 200a can also not be too long. Therefore, by matching the asymmetric first and second sub-areas 211 and 212 with the asymmetric evaporation angle of the first evaporation source 400, the first electrode 320 in the isolation opening 200a and the first isolation portion 220 on the side corresponding to the first sub-area 211 can have more overlapping area.

[0120] In one embodiment, step S40 further comprises, before evaporating the light emitting material layer 3101 on the substrate 100 with the isolation structure 200 by the first evaporation source 400, adjusting an evaporation angle of the first evaporation source 400.

[0121] Step S30, adjusting an evaporation angle of the first evaporation source 400.

[0122] The evaporation angle of the first evaporation source 400 is adjusted so that the evaporation angle of the first evaporation source 400 towards the first sub-area 211 is larger than the evaporation angle of the first evaporation source 400 towards the second sub-area 212.

[0123] As an example, step S30 can comprise:

[0124] Step S31, adjusting the position of the angle limiting plate and / or the first evaporation source 400 in the first direction so that the first evaporation source 400 deviates from the opening center of the angle limiting plate and approaches the opening edge of the angle limiting plate towards the first sub-area 211, please refer to Figure 3 and Figure 4 .

[0125] When the first evaporation source 400 deviates from the opening center of the angle limiting plate, the distance between the two opening edges of the angle limiting plate in the first direction and the first evaporation source 400 is the same, and the evaporation angle of the first evaporation source 400 towards the first sub-area 211 is the same as the evaporation angle of the first evaporation source 400 towards the second sub-area 212.

[0126] Adjusting the position of the angle limiting plate and / or the first evaporation source 400 in the first direction can change the relative position of the two, and thus make the first evaporation source 400 deviate from the opening center of the angle limiting plate.

[0127] The first evaporation source 400 approaches the opening edge of the angle limiting plate towards the first sub-area 211, so that the evaporation angle of the first evaporation source 400 towards the first sub-area 211 can be increased, and the evaporation angle of the first evaporation source 400 towards the second sub-area 212 can be decreased, so that the evaporation angle of the first evaporation source 400 towards the first sub-area 211 is larger than the evaporation angle of the first evaporation source 400 towards the second sub-area 212.

[0128] It can be understood that during evaporation, the position of the evaporation source and the angle limiting plate can be fixed, and the substrate 100 can move in the first direction. When the first evaporation source 400 and the angle limiting plate are opposite to one isolation opening 200a, the first evaporation source 400 approaches the opening edge of the angle limiting plate towards the first sub-area 211 in the isolation opening 200a.

[0129] As another example, step S30 comprises:

[0130] Step S32, tilt the first evaporation source 400 to increase the evaporation angle of the first evaporation source 400 tilted towards the first sub-area 211.

[0131] The first evaporation source 400 can be rotated to tilt the first evaporation source 400, so that the evaporation angle of the first evaporation source 400 towards the first sub-area 211 can be increased, and the evaporation angle of the first evaporation source 400 towards the second sub-area 212 can be decreased, so that the evaporation angle of the first evaporation source 400 towards the first sub-area 211 is greater than the evaporation angle of the first evaporation source 400 towards the second sub-area 212.

[0132] Both the way of adjusting the position of the angle limiting plate and / or the first evaporation source 400 in the first direction and the way of tilting the first evaporation source 400 can effectively adjust the evaporation angle of the first evaporation source 400. Either one or both of them can be selected for effective adjustment according to requirements.

[0133] In an embodiment, by adjusting the evaporation angle of the first evaporation source 400 appropriately, the first isolation part 220 connected with the first electrode 320 and the light emitting unit 310 can be spaced apart in the same isolation opening 200a. At this time, the light emitting unit 310 and the first isolation part 220 can be made not to overlap, so as not to affect the overlap of the first electrode 320 and the first isolation part 220.

[0134] In an embodiment, by adjusting the evaporation angle of the first evaporation source 400 appropriately, the light emitting unit 310 and the first isolation part 220 located on both sides thereof in the first direction can also be spaced apart in the same isolation opening 200a.

[0135] In the same isolation opening 200a, the light emitting unit 310 can be centrally arranged between the first isolation parts 220 on both sides thereof in the first direction. Of course, the light emitting unit 310 can also be arranged not centrally.

[0136] As an example, the substrate 100 can further include a pixel definition layer 130 and a second electrode 120. The second electrode 120, the light emitting unit 310, and the first electrode 320 can form a sub-pixel. The second electrode 120 can be arranged as an anode, and the first electrode 320 can be arranged as a cathode. Alternatively, the first electrode 320 can be arranged as an anode, and the second electrode 120 can be arranged as a cathode.

[0137] The pixel definition layer 130 covers the second electrode 120, and the pixel definition layer 130 has a pixel opening exposing the second electrode 120 therein, the pixel opening being in communication with the isolation opening 200a, and the isolation structure 200 being located on the pixel definition layer 130.

[0138] When the light emitting unit 310 is connected with the first isolation part 220 on any one side thereof in the first direction, the current can flow from the second electrode 120 to the first isolation part 220 directly through the light emitting unit 310 when the light emitting sub-pixel is working, thereby possibly causing the crosstalk problem.

[0139] The present embodiment spaces the light emitting unit 310 from the first isolation part 220 on both sides thereof in the first direction, so that the current flows from the second electrode 120 to the first electrode 320 through the light emitting unit 310 and then is transmitted from the first electrode 320 to the first isolation part 220 when the light emitting sub-pixel is working, thereby preventing the crosstalk problem. Meanwhile, spacing the light emitting unit 310 from the first isolation part 220 on both sides thereof in the first direction also facilitates the light emitting area of the sub-pixel of each isolation opening 200a to be the preset area. The preset area can be set according to actual needs.

[0140] In one embodiment, before step S70, the method further comprises:

[0141] Step S50, adjusting the evaporation angle of the second evaporation source 500.

[0142] Through the adjustment of the evaporation angle of the first evaporation source 400, the evaporation angle of the second evaporation source 500 towards the first sub-area 211 can be further reduced, thereby further increasing the overlap area of the first electrode 320 and the first isolation part 220 on the side corresponding to the first sub-area 211 in each isolation opening 200a.

[0143] As an example, step S50 can comprise:

[0144] Step S51, tilting the second evaporation source 500 to reduce the evaporation angle of the second evaporation source 500 tilted towards the first sub-area 211, please refer to Figure 5 and Figure 6b .

[0145] For example, the evaporation angle of the second evaporation source 500 tilted towards the first sub-area 211 can be reduced from b1 to b2.

[0146] As another example, step S50 comprises:

[0147] Step S52, adjusting the position of the angle limiting plate and / or the second evaporation source 500 to offset the second evaporation source 500 from the opening center of the angle limiting plate and away from the opening edge of the angle limiting plate towards the first sub-area 211 in the first direction.

[0148] Similarly, the adjustment principle of the evaporation angle of the second evaporation source 500 is similar to that of the evaporation angle of the first evaporation source 400, which will not be described in detail here.

[0149] The evaporation angle of the second evaporation source 500 can be effectively adjusted by both adjusting the position of the angle limiting plate and / or the second evaporation source 500 in the first direction and by tilting the second evaporation source 500. Any one or a combination of these methods can be selected for effective adjustment as needed. It is understood that the adjustment range of the angle limiting plate and / or the second evaporation source 500 in the first direction is limited. When this is insufficient, a wider range of changes in the evaporation angle can be achieved by altering the tilt angle of the second evaporation source 500.

[0150] In one embodiment, prior to step S70, the method further includes:

[0151] In step S60, the substrate 100, on which the light-emitting material layer 3101 is formed, is rotated 180° with the vertical axis of the substrate 100 as the rotation axis.

[0152] At this point, in step S40, a light-emitting material layer 3101 is deposited on the substrate 100 where the isolation structure 200 is formed by evaporating the first evaporation source 400. (See reference...) Figure 8 as well as Figure 9 .

[0153] After step 60, when step S70 is performed, during which the first electrode material layer 3201 is deposited on the light-emitting material layer 3101 by the second evaporation source 500, please refer to... Figure 5 as well as Figure 6a (or Figure 6b The positions of the first sub-region 211 and the second sub-region 212 within the isolation opening 200a are interchanged, thereby changing the overlapping orientation of the first electrode 320 and the first isolation portion 220, so that the evaporation angle of the light-emitting material layer 3101 and the first electrode material layer 3201 can be matched more flexibly.

[0154] It should be understood that, although attached Figure 1 The steps in the flowchart are shown sequentially as indicated by the arrows, but these steps are not necessarily executed in the order indicated by the arrows. Unless otherwise expressly stated herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some of the steps in the accompanying drawings may include multiple steps or stages, which are not necessarily completed at the same time, but may be executed at different times, and the execution order of these steps or stages is not necessarily sequential, but may be performed alternately or in turn with other steps or at least some of the steps or stages of other steps.

[0155] In one embodiment, see Figure 7a (or Figure 7b The invention also provides a display panel, including a substrate 100, an isolation structure 200 and a light-emitting structure 300.

[0156] The isolation structure 200 is located on the substrate 100. The isolation structure 200 surrounds a plurality of isolation openings 200a.

[0157] Meanwhile, the isolation structure 200 includes a first isolation portion 220 and a second isolation portion 210. It can be understood that the first isolation portion 220 and the second isolation portion 210 jointly surround the isolation opening 200a. The material of the first isolation portion 220 is a conductive material. The material of the second isolation portion 210 can be a conductive material or an insulating material.

[0158] The first isolation portion 220 is located between the second isolation portion 210 and the substrate 100. The second isolation portion 210 has a first sub-region 211 and a second sub-region 212 extending outward from the top surface of the first isolation portion 220. The first sub-region 211 and the second sub-region 212 are oppositely arranged in the first direction. In the first direction, the length MA1 of the first sub-region 211 on the substrate 100 is less than the length MA2 of the second sub-region 212 on the substrate 100.

[0159] The light-emitting structure 300 is located in the isolation opening 200a. The light-emitting structure 300 includes a light-emitting unit 310 and a first electrode 320. The first electrode 320 is located on the side of the light-emitting unit 310 away from the substrate 100.

[0160] In the same isolation opening 200a, the first electrode 320 overlaps the first isolation portion 220 on the side corresponding to the first sub-region 211 in the first direction.

[0161] In this embodiment, in the isolation opening 200a, the asymmetric arrangement of the first sub-region 211 and the second sub-region 212 can make the first electrode 320 in the isolation opening 200a have more overlapping area with the first isolation portion 220 on the side corresponding to the first sub-region 211. Therefore, this embodiment can effectively improve the problem of poor overlap of the first electrode 320 (such as the cathode) in the isolation opening 200a.

[0162] In one embodiment, the overlapping area of the light-emitting unit 310 on the substrate 100 and the first sub-region 211 on the substrate 100 is less than the overlapping area of the light-emitting unit 310 on the substrate 100 and the second sub-region 212 on the substrate 100.

[0163] At this time, the asymmetric distribution of the light-emitting unit 310 under the first sub-region 211 and the second sub-region 212 can prevent the overlap of the light-emitting unit 310 and the first isolation portion 220 on the side corresponding to the first sub-region 211 from affecting the overlap of the first electrode 320 and the first isolation portion 220.

[0164] In one embodiment, in the first direction, the orthographic projection length of the first sub-area 211 on the substrate 100 is a first length, and the orthographic projection length of the second sub-area 212 on the substrate 100 is a second length, the second length being k times the first length, 1 < k ≤ 5.

[0165] In one embodiment, in the same isolation opening 200a, the first isolation portion 220 connected with the first electrode 320 is spaced apart from the light-emitting unit 310. At this time, the light-emitting unit 310 and the first isolation portion 220 are not overlapped, so as not to affect the overlap of the first electrode 320 and the first isolation portion 220.

[0166] In one embodiment, in the same isolation opening 200a, the light-emitting unit 310 and the first isolation portions 220 located on both sides thereof in the first direction are both spaced apart.

[0167] In the same isolation opening 200a, in the first direction, the orthographic projection of the light-emitting unit 310 on the substrate 100 and the orthographic projection of the opening surrounded by the first isolation portions on the substrate 100 can be concentric, that is, in the first direction, the light-emitting unit 310 can be centrally arranged between the first isolation portions 220 on both sides thereof. Of course, the light-emitting unit 310 can also be arranged non-centrally.

[0168] At this time, when the light-emitting sub-pixel is working, the current flows from the second electrode 120 to the first electrode 320 through the light-emitting unit 310, and then is transmitted to the first isolation portion 220 by the first electrode 320, without directly flowing from the second electrode 120 to the first isolation portion 220 through the light-emitting unit 310, so as to prevent the crosstalk problem. At the same time, the light-emitting unit 310 and the first isolation portions 220 located on both sides thereof in the first direction are both spaced apart, which is also convenient for making the light-emitting area of the sub-pixel of each isolation opening 200a be a preset area. The preset area can be set according to actual needs.

[0169] In one embodiment, the first isolation portion 220 includes a support portion 221. The orthographic projection of the second isolation portion 210 on the substrate 100 covers the orthographic projection of the surface of the support portion 221 away from the substrate 100 on the substrate 100, and the first electrode 320 is connected to the sidewall of the support portion 221.

[0170] As an example, referring to Figure 10 , the first isolation portion 220 can also include an adhesive portion 222. The adhesive portion 222 is located between the support portion 221 and the substrate 100, so as to increase the adhesion of the two.

[0171] At the same time, the first electrode 320 extends to the sidewall of the support portion 221 via the adhesive portion 222. At this time, the first electrode 320 also contacts the upper surface of the adhesive portion 222, so as to also increase the overlap reliability of the first electrode 320 and the first isolation portion 220.

[0172] In one embodiment, the substrate 100 can further include a pixel definition layer 130 and a second electrode 120. The second electrode 120, the light emitting unit 310 and the first electrode 320 can form a sub-pixel. The second electrode 120 can be configured as an anode, and the first electrode 320 can be configured as a cathode. Alternatively, the first electrode 320 can be configured as an anode, and the second electrode 120 can be configured as a cathode.

[0173] The pixel definition layer 130 covers the second electrode 120, and the pixel definition layer 130 has a pixel opening exposing the second electrode 120. The pixel opening is in communication with the isolation opening 200a, and the isolation structure 200 is located on the pixel definition layer 130.

[0174] Specifically, the orthographic projection of the pixel opening on the substrate 100 can be located within the orthographic projection of the isolation opening 200a on the substrate 100. When the first electrode 320 is spaced apart between the first isolation portion 220 and the light emitting unit 310 connected to the first electrode 320 in the same isolation opening 200a, the first electrode 320 can be insulated from the second electrode 120 by the pixel definition layer 130.

[0175] In one embodiment, a display panel is also provided, which includes the substrate 100, the isolation structure 200 and the light emitting structure 300.

[0176] The isolation structure 200 is located on the substrate 100. The isolation structure 200 surrounds a plurality of isolation openings 200a.

[0177] Meanwhile, the isolation structure 200 includes a first isolation portion 220 and a second isolation portion 210. It can be understood that the first isolation portion 220 and the second isolation portion 210 jointly surround the isolation opening 200a. The material of the first isolation portion 220 is a conductive material. The material of the second isolation portion 210 can be a conductive material or an insulating material.

[0178] The first isolation portion 220 is located between the second isolation portion 210 and the substrate 100. The second isolation portion 210 has a first sub-region 211 and a second sub-region 212 extending outward from the top surface of the first isolation portion 220. The first sub-region 211 and the second sub-region 212 are oppositely arranged in the first direction. In the first direction, the orthographic projection length MA1 of the first sub-region 211 on the substrate 100 is less than the orthographic projection length MA2 of the second sub-region 212 on the substrate 100.

[0179] The light emitting structure 300 is located in the isolation opening 200a. The light emitting structure 300 includes the light emitting unit 310 and the first electrode 320. The first electrode 320 is located on the side of the light emitting unit 310 away from the substrate 100.

[0180] In the same isolation opening 200a, the first electrode 320 overlaps the first isolation portion 220 on both sides thereof in the first direction. The overlapping area of the first electrode 320 with the first isolation portion 220 on the side corresponding to the first sub-region 211 is greater than the overlapping area of the first electrode 320 with the first isolation portion 220 on the side corresponding to the second sub-region 212.

[0181] In one embodiment, the ramp height of the first electrode 320 on the isolation structure 200 on the side corresponding to the first sub-region 211 is greater than the ramp height of the first electrode 320 on the isolation structure 200 on the side corresponding to the second sub-region 212.

[0182] In one embodiment, the ramp thickness of the first electrode 320 on the isolation structure 200 on the side corresponding to the first sub-region 211 is greater than the ramp thickness of the first electrode 320 on the isolation structure 200 on the side corresponding to the second sub-region 212.

[0183] In one embodiment, a method for manufacturing a display panel further includes the following steps.

[0184] In step S100, a substrate 100 is provided.

[0185] The substrate 100 can include a substrate 110 and a circuit layer (not shown) formed on the substrate 110, etc. The substrate 110 can be a rigid substrate or a flexible substrate. The circuit layer can include multiple wiring layers and a medium layer for isolating the wiring layers, etc., and pixel circuits, etc. can be formed in the circuit layer.

[0186] In step S200, an isolation structure 200 is formed on the substrate 100. The isolation structure 200 encloses multiple isolation openings 200a, and includes a first isolation portion 220 and a second isolation portion 210. The first isolation portion 220 is located between the second isolation portion 210 and the substrate 100. The second isolation portion 210 has a first sub-region 211 and a second sub-region 212 extending outward from the top surface of the first isolation portion 220. The first sub-region 211 and the second sub-region 212 are arranged opposite to each other in a first direction.

[0187] First, an isolation material layer can be formed on the substrate 100. Then, the isolation material layer can be patterned by wet etching to form the isolation structure 200.

[0188] Specifically, the isolation material layer can include a first sub-isolation material layer and a second sub-isolation material layer. After the first sub-isolation material layer and the second sub-isolation material layer are patterned, the isolation openings 200a, the first isolation portion 220 and the second isolation portion 210 can be formed. It can be understood that the isolation openings 200a are formed by the first isolation portion 220 and the second isolation portion 210.

[0189] As an example, the first sub-isolation material layer can include a support material layer, and the first isolation portion 220 includes a support portion 221. At this time, after the isolation material layer is patterned, the support material layer can form the support portion 221.

[0190] As another example, the first sub-isolation material layer can include a support material layer and an adhesive material layer. The adhesive material layer is located between the support material layer and the substrate 100, thereby increasing the adhesion between the two. At this time, after the isolation material layer is patterned, the support material layer can form the support portion 221, and the adhesive material layer can form the adhesive portion 222. The first isolation portion 220 includes the support portion 221 and the adhesive portion 222, please refer to Figure 10 .

[0191] At the same time, the etching rate of the second sub-isolation material layer and the first sub-isolation material layer can be different when wet etching, so that the edge of the second isolation portion 210 can be beyond the top surface of the first isolation portion 220, thereby forming a roof structure.

[0192] The roof structure of the first isolation portion 220 can include a first sub-region 211 and a second sub-region 212 arranged opposite in the first direction.

[0193] In step S300, the first evaporation source 400 is used to evaporate a light-emitting material layer 3101 on the substrate 100 with the isolation structure 200. During the evaporation of the light-emitting material layer 3101, the evaporation angle of the first evaporation source 400 towards the first sub-region 211 is greater than the evaporation angle of the first evaporation source 400 towards the second sub-region 212. The evaporation angle is the angle between the evaporation direction and the direction parallel to the substrate.

[0194] The evaporation angle a1 of the first evaporation source 400 towards the first sub-region 211 is greater than the evaporation angle a2 of the first evaporation source 400 towards the second sub-region 212. The area of the light-emitting material layer 3101 falling in the first sub-region 211 is smaller than the area of the light-emitting material layer 3101 falling in the second sub-region 212.

[0195] Therefore, the extension length of the light-emitting material layer 3101 in the isolation opening 200a under the first sub-region 211 is smaller, so that the light-emitting material layer 3101 extends less towards the first sub-region 211, thereby increasing the available overlap area of the first isolation portion 220 on the side corresponding to the first sub-region 211.

[0196] In step S400, a second evaporation source is used to evaporate a first electrode material layer on the light-emitting material layer.

[0197] The second evaporation source 500 is the evaporation source of the first electrode material layer 3201.

[0198] In the process of evaporating the first electrode material layer 3201, the roof structure (including the first sub-area 211 and the second sub-area 212) of the second isolation part 210 separates the first electrode material layer 3201 in the opening 200a from the first electrode material layer 3201 above the second isolation part 210. Meanwhile, the second evaporation source 500 can have a certain evaporation angle, so that the first electrode material layer 3201 can extend below the first sub-area 211 and the second sub-area 212.

[0199] As an example, the evaporation angle of the second evaporation source 500 towards the first sub-area 211 can be smaller than the evaporation angle of the second evaporation source 500 towards the second sub-area 212, so as to facilitate the single-sided lapping of the first electrode material layer 3201 and the first isolation part 220 corresponding to the side of the first sub-area 211.

[0200] In step S500, the first electrode material layer and the light-emitting material layer are patterned to form the first electrode and the light-emitting unit.

[0201] In the present embodiment, in the process of evaporating the light-emitting material layer 3101, the evaporation angle of the first evaporation source 400 towards the first sub-area 211 is larger than the evaporation angle of the first evaporation source 400 towards the second sub-area 212, so that the subsequently evaporated first electrode material layer 3201 and the first isolation part 220 corresponding to the side of the first sub-area 211 have more lapping area, thereby effectively improving the lapping problem of the first electrode 320 (such as the cathode) in the opening 200a.

[0202] In one embodiment, a display panel is also provided, which includes a substrate 100, an isolation structure 200, and a light-emitting structure 300.

[0203] The isolation structure 200 is located on the substrate 100 and surrounds a plurality of openings 200a. The isolation structure includes a first isolation part 220 and a second isolation part 210. The first isolation part 220 is located between the second isolation part 210 and the substrate 100. The second isolation part 210 has a first sub-area 211 and a second sub-area 212 extending outward from the top surface of the first isolation part 220. The first sub-area 211 and the second sub-area 212 are oppositely arranged in the first direction.

[0204] The light-emitting structure 300 is located in the opening 200a and includes a light-emitting unit 310 and a first electrode 320. The first electrode 320 is located on the side of the light-emitting unit 310 away from the substrate 100.

[0205] In the same isolation opening 200a, the first electrode 320 at least overlaps the first isolation portion 220 corresponding to one side of the first sub-area 211 in the first direction. Specifically, the first electrode 320 can be single-sidedly overlapped with the first isolation portion 220 corresponding to one side of the first sub-area 211 in the first direction, or the first electrode 320 can be overlapped with the first electrode 320 on both sides thereof in the first direction.

[0206] The overlapping area of the orthographic projection of the light-emitting unit 310 on the substrate 100 and the orthographic projection of the first sub-area 211 on the substrate 100 is less than the overlapping area of the orthographic projection of the light-emitting unit 310 on the substrate 100 and the orthographic projection of the second sub-area 212 on the substrate 100.

[0207] In the present embodiment, the asymmetric distribution of the light-emitting unit 310 under the first sub-area 211 and the second sub-area 212 can reduce the overlap of the light-emitting unit 310 and the first isolation portion 220 corresponding to one side of the first sub-area 211, and further increase the overlap area of the first electrode 320 and the first isolation portion 220 corresponding to one side of the first sub-area 211. Based on the same inventive concept, the present embodiment also provides a display device (not shown in the figure), which comprises the display panel in the above-described embodiments.

[0208] It can be understood that the display device in the present embodiment can be an OLED display device, a QLED display device, electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, a wearable device, an Internet of Things device, or any product or component having a display function, and the present disclosure is not limited thereto.

[0209] In the description of the present specification, the description referring to the terms "some embodiments", "other embodiments", "ideal embodiments", and the like means that the specific features, structures, materials, or characteristics described in conjunction with the embodiments or examples are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example.

[0210] Each of the technical features of the above-described embodiments can be combined arbitrarily, and in order to make the description concise, each of the technical features in the above-described embodiments is not described in all possible combinations, however, as long as the combination of the technical features does not exist contradictory, it should be considered as the scope of the present specification.

[0211] The above-described embodiments are merely illustrative of several embodiments of the present application, which are described in more detail and in a specific and detailed manner, but should not be construed as limiting the scope of the patent. It should be noted that for those skilled in the art, several modifications and improvements can be made without departing from the concept of the present application, and these are all within the scope of the present application. Therefore, the scope of protection of the patent of the present application should be subject to the appended claims.

Claims

1. A display panel, characterized in that, include: substrate; An isolation structure is located on the substrate and surrounds a plurality of isolation openings. The isolation structure includes a first isolation portion and a second isolation portion. The first isolation portion is located between the second isolation portion and the substrate. The second isolation portion has a first sub-region and a second sub-region extending outward from the top surface of the first isolation portion. The first sub-region and the second sub-region are arranged opposite to each other in a first direction. In the first direction, the orthographic projection length of the first sub-region on the substrate is smaller than the orthographic projection length of the second sub-region on the substrate. A light-emitting structure, located within the isolation opening, includes a light-emitting unit and a first electrode, wherein the first electrode is located on the side of the light-emitting unit away from the substrate; Within the same isolation opening, the first electrode overlaps with the first isolation portion on the side corresponding to the first sub-region in the first direction; The overlapping area of ​​the orthographic projection of the light-emitting unit on the substrate and the orthographic projection of the first sub-region on the substrate is smaller than the overlapping area of ​​the orthographic projection of the light-emitting unit on the substrate and the orthographic projection of the second sub-region on the substrate. The asymmetrical distribution of the light-emitting units in the first sub-region and the second sub-region prevents the overlap of the light-emitting units with the first isolation portion on the corresponding side of the first sub-region from affecting the overlap of the first electrode with the first isolation portion.

2. The display panel according to claim 1, characterized in that, In the first direction, the orthographic projection length of the first sub-region on the substrate is a first length, and the orthographic projection length of the second sub-region on the substrate is a second length, the second length being k times the first length. <k≤5。 3. The display panel according to claim 1, characterized in that, Within the same isolation opening, the first isolation portion and the light-emitting unit are spaced apart.

4. The display panel according to claim 1, characterized in that, The first isolation portion includes a support portion, the orthographic projection of the second isolation portion on the substrate covers the orthographic projection of the surface of the support portion away from the substrate on the substrate, and the first electrode is connected to the sidewall of the support portion.

5. The display panel according to claim 4, characterized in that, The first isolation portion further includes an adhesive portion located between the support portion and the substrate, and the first electrode extends to the sidewall of the support portion via the adhesive portion.

6. The display panel according to claim 1, characterized in that, The substrate includes a pixel definition layer and a second electrode. The pixel definition layer covers the second electrode and has a pixel opening that exposes the second electrode. The pixel opening communicates with the isolation opening, and the isolation structure is located on the pixel definition layer.

7. A display panel, characterized in that, include: substrate; An isolation structure is located on the substrate and surrounds a plurality of isolation openings. The isolation structure includes a first isolation portion and a second isolation portion. The first isolation portion is located between the second isolation portion and the substrate. The second isolation portion has a first sub-region and a second sub-region extending outward from the top surface of the first isolation portion. The first sub-region and the second sub-region are arranged opposite to each other in a first direction. In the first direction, the orthographic projection length of the first sub-region on the substrate is smaller than the orthographic projection length of the second sub-region on the substrate. A light-emitting structure, located within the isolation opening, includes a light-emitting unit and a first electrode, wherein the first electrode is located on the side of the light-emitting unit away from the substrate; Within the same isolation opening, the first electrode overlaps with the first isolation portions on both sides in the first direction, and the overlap area of ​​the first electrode with the first isolation portion on the side corresponding to the first sub-region is greater than the overlap area of ​​the first electrode with the first isolation portion on the side corresponding to the second sub-region. The overlapping area of ​​the orthographic projection of the light-emitting unit on the substrate and the orthographic projection of the first sub-region on the substrate is smaller than the overlapping area of ​​the orthographic projection of the light-emitting unit on the substrate and the orthographic projection of the second sub-region on the substrate. The asymmetrical distribution of the light-emitting units in the first sub-region and the second sub-region prevents the overlap of the light-emitting units with the first isolation portion on the corresponding side of the first sub-region from affecting the overlap of the first electrode with the first isolation portion.

8. The display panel according to claim 7, characterized in that, The ramp height of the first electrode on the isolation structure on the side corresponding to the first sub-region is greater than the ramp height of the first electrode on the isolation structure on the side corresponding to the second sub-region.

9. The display panel according to claim 7, characterized in that, The ramp thickness of the first electrode on the isolation structure on the side corresponding to the first sub-region is greater than the ramp thickness of the first electrode on the isolation structure on the side corresponding to the second sub-region.

10. A method for manufacturing a display panel, characterized in that, include: Provide substrate; An isolation structure is formed on the substrate, the isolation structure surrounds a plurality of isolation openings, and the isolation structure includes a first isolation portion and a second isolation portion. The first isolation portion is located between the second isolation portion and the substrate. The second isolation portion has a first sub-region and a second sub-region extending outward from the top surface of the first isolation portion. The first sub-region and the second sub-region are disposed opposite to each other in a first direction, and in the first direction, the orthographic projection length of the first sub-region on the substrate is smaller than the orthographic projection length of the second sub-region on the substrate. The first evaporation source is used to deposit a light-emitting material layer on the substrate having an isolation structure; The first electrode material layer is deposited onto the light-emitting material layer by a second evaporation source; The first electrode material layer and the vapor-deposited light-emitting material layer are patterned to form the first electrode and the light-emitting unit; During the deposition of the light-emitting material layer, the deposition angle of the first evaporation source toward the first sub-region is greater than the deposition angle of the first evaporation source toward the second sub-region, and the area of ​​the light-emitting material layer falling under the first sub-region is smaller than the area of ​​the light-emitting material layer falling under the second sub-region. The deposition angle is the angle between the deposition direction and the direction parallel to the substrate.

11. The method for manufacturing a display panel according to claim 10, characterized in that, The process of depositing a light-emitting material layer on the substrate with an isolation structure via the first evaporation source includes: Adjust the evaporation angle of the first evaporation source.

12. The method for manufacturing a display panel according to claim 11, characterized in that, The adjustment of the evaporation angle of the first evaporation source includes: Adjust the position of the angle limiting plate and / or the first evaporation source in the first direction so that the first evaporation source is offset from the opening center of the angle limiting plate and close to the opening edge of the angle limiting plate facing the first sub-region.

13. The method for manufacturing a display panel according to claim 11, characterized in that, The adjustment of the evaporation angle of the first evaporation source includes: The first evaporation source is tilted to increase the evaporation angle of the first evaporation source toward the first sub-region.

14. The method for manufacturing a display panel according to claim 10, characterized in that, The process of depositing the first electrode material layer onto the light-emitting material layer via the second evaporation source includes: Adjust the evaporation angle of the second evaporation source.

15. The method for manufacturing a display panel according to claim 14, characterized in that, The adjustment of the evaporation angle of the second evaporation source includes: The second evaporation source is tilted to reduce the evaporation angle of the second evaporation source toward the first sub-region.

16. The method for manufacturing a display panel according to claim 14, characterized in that, The adjustment of the evaporation angle of the second evaporation source includes: Adjust the position of the angle limiting plate and / or the second evaporation source so that, in a first direction, the second evaporation source is offset from the opening center of the angle limiting plate and away from the opening edge of the angle limiting plate facing the first sub-region.

17. The method for manufacturing a display panel according to claim 10, characterized in that, Before the second evaporation source deposits the first electrode material layer on the light-emitting material layer, the process further includes: The substrate on which the light-emitting material layer is formed is rotated 180° with the vertical axis of the substrate as the axis of rotation.

18. A display device, characterized in that, Includes the display panel as described in any one of claims 1-9.

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