Extreme ultraviolet light generating device and method
Through orthogonal double pulse laser technology, the plasma density is optimized by using the angle and delay between pre-pulse laser and main pulse laser, the plasma self-absorption effect is solved, and the generation of a 13.5nm extreme ultraviolet light source with high spectral purity is achieved. .
Patent Information
- Application Number
- CN202411468175.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-21
- Publication Date
- 2024-12-06
AI Technical Summary
The prior art is difficult to obtain a strong and narrow spectral extreme ultraviolet light source with a wavelength of 13.5 nm at a fixed delay, and the plasma self-absorbing effect leads to a decrease in spectral purity.
The orthogonal double pulse laser technology is adopted to emit pre-pulse laser through the first laser and the second laser emit the main pulse laser. The optical axis angle of the two lasers is between 80° and 100°, and the relative delay of the laser is controlled by a digital delay. When the electron density of the plasma is optimized to reduce the self-absorbing effect.
Under fixed delay, an extreme ultraviolet light source with a wavelength of 13.5nm and a narrow spectrum was achieved, which significantly improved the spectral purity.
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Figure CN119087753A_ABST
Abstract
Description
Technical Field
[0001] The present invention belongs to the technical field of extreme ultraviolet light sources, and in particular relates to an extreme ultraviolet light generating device and method. Background Art
[0002] Extreme ultraviolet light sources are widely used in the fields of extreme ultraviolet lithography, mask detection, multilayer film lens reflectivity measurement, and material chemical composition analysis. Laser irradiation of Sn target to generate plasma is the mainstream technology for generating extreme ultraviolet light sources with a wavelength of 13.5nm. However, since the plasma generated by irradiating Sn target with a pulsed laser with a wavelength of 1064nm using Nd:YAG laser has a high electron density, resulting in a large optical thickness of the plasma, the plasma has a strong self-absorption effect on the extreme ultraviolet light source generated by itself, resulting in the weakening of the intensity and broadening of the spectrum of the 13.5nm extreme ultraviolet light radiated outward, which greatly reduces the spectral purity (SP) of the extreme ultraviolet light. The spectral purity is the ratio of the integral of the radiation intensity of the 13.5nm extreme ultraviolet light in the 2% band to the integral of the intensity of the extreme ultraviolet light corresponding to the full band.
[0003] At present, the co-linear double-pulse technology, which is composed of a low-energy pre-pulse laser to generate pre-plasma and then irradiate the pre-plasma with a main pulse laser, is an effective technology to reduce the self-absorption effect of plasma. However, in the co-linear double-pulse technology, it is difficult to obtain a UV light source with a strong light intensity of 13.5nm (within the 2% band) and a narrow spectrum at a fixed delay. Summary of the invention
[0004] In view of this, the present invention aims to provide an extreme ultraviolet light generating device and method, which is at least conducive to generating extreme ultraviolet light with higher spectral purity.
[0005] To achieve the above object, the technical solution created by the present invention is implemented as follows:
[0006] The invention provides an extreme ultraviolet light generating device, comprising: a first laser, the first laser is used to emit a pre-pulse laser; a second laser, the second laser is used to emit a main pulse laser; a solid metal target, the solid metal target is arranged in a vacuum chamber through a three-dimensional displacement stage; a first lens, the pre-pulse laser is focused on the surface of the solid metal target through the first lens to make the solid metal target generate pre-plasma; a second lens, the main pulse laser is focused in the pre-plasma through the second lens to generate extreme ultraviolet light; wherein the angle between the optical axis of the pre-pulse laser passing through the first lens and the optical axis of the main pulse laser passing through the second lens is in the range of 80° to 100°.
[0007] Furthermore, the extreme ultraviolet light generating device also includes a digital delay device, which is connected to the first laser and the second laser and is used to control the first laser and the second laser so that the pre-pulse laser emitted by the first laser and the main pulse laser emitted by the second laser have a preset relative delay.
[0008] Furthermore, the relative delay is preset to be in the range of 0ns to 200ns.
[0009] Furthermore, the vacuum chamber has a first incident window, a second incident window and an output window, the pre-pulse laser focused by the first lens enters the vacuum chamber through the first incident window, and the main pulse laser focused by the second lens enters the vacuum chamber through the second incident window; the extreme ultraviolet light generating device also includes a spectrum generating component, which is used to collect light output from the output window to generate a spectrum based on the light.
[0010] Furthermore, the main pulse laser is focused through a second lens into the pre-plasma at a first distance from the solid metal target, and the first distance is within a range of 90 μm to 110 μm.
[0011] Furthermore, the first laser and / or the second laser includes: a solid laser, a gas laser, a semiconductor laser or a dye laser.
[0012] Furthermore, the wavelength of the pre-pulse laser and / or the main pulse laser is: 266nm, 355nm, 532nm, 1064nm or 10.6μm.
[0013] Furthermore, the solid metal target material includes: a solid metal Sn target, a low-density solid target, a metal Sn rod target, a strip Sn target or a structured Sn target, wherein the low-density solid target includes a solid target doped with SnO2 or a foam target containing Sn.
[0014] Furthermore, the angle between the optical axis of the pre-pulse laser passing through the first lens and the optical axis of the main pulse laser passing through the second lens is 90°.
[0015] On the other hand, the present invention provides an extreme ultraviolet light generation method, comprising: providing any of the above extreme ultraviolet light generation devices, the extreme ultraviolet light generation device comprising: a first laser, a second laser, a solid metal target, a first lens and a second lens; using the first laser to emit a pre-pulse laser, the pre-pulse laser is focused on the surface of the solid metal target through the first lens, so that the solid metal target generates a pre-plasma; using the second laser to emit a main pulse laser, the main pulse laser is focused in the pre-plasma through the second lens, so as to generate extreme ultraviolet light; wherein the angle between the optical axis of the pre-pulse laser passing through the first lens and the optical axis of the main pulse laser passing through the second lens is in the range of 80° to 100°.
[0016] Compared with the prior art, the invention can achieve the following beneficial effects: the invention utilizes two lasers to realize orthogonal double-pulse laser technology, a pre-pulse laser irradiates a solid metal target to generate pre-plasma, the angle between the main pulse laser and the pre-pulse laser is in the range of 80° to 100°, and is focused in the pre-plasma, and the pre-plasma is heated to generate extreme ultraviolet light, thereby solving the problem of collinear double-pulse squeezing plasma, and optimizing the electron density of the plasma by changing the delay of the pre-pulse laser and the main pulse laser, so that when the electron density is reduced to a critical density, the main pulse laser energy is absorbed to the maximum, and an extreme ultraviolet light source with a wavelength of 13.5nm (2% bandwidth) can be generated under a fixed delay, which is strong in light intensity and narrow in spectrum, and is beneficial to improving the spectral purity of the generated extreme ultraviolet light. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] The drawings that constitute part of the present invention are used to provide a further understanding of the present invention. The exemplary embodiments and descriptions of the present invention are used to explain the present invention and do not constitute an improper limitation on the present invention. In the drawings:
[0018] Figure 1 A schematic diagram of the structure of an extreme ultraviolet light generating device according to an embodiment of the present invention;
[0019] Figure 2 It is a spectrum diagram produced by single pulse laser technology;
[0020] Figure 3 It is a spectrum diagram and radiation intensity curve generated by using the collinear double pulse technology;
[0021] Figure 4 The present invention provides a spectrum diagram and a radiation intensity curve generated by the extreme ultraviolet light generation method described in the embodiment of the present invention.
[0022] Explanation of the accompanying drawings: 1. first laser; 2. first reflector; 3. first lens; 4. vacuum chamber; 5. three-dimensional translation stage; 6. solid metal target; 7. second laser; 8. second reflector; 9. third reflector; 10. second lens; 11. flat field spectrometer; 12. camera; 13. computer; 14. digital delay device. DETAILED DESCRIPTION
[0023] After analysis, it was found that in the co-linear double-pulse irradiation solid metal Sn target technology, the optical axis of the main pulse laser is co-linear with the optical axis of the pre-pulse laser, and the main pulse laser is focused on the pre-plasma. Since the main pulse laser and the pre-pulse laser act in the same direction, the main pulse laser has a squeezing effect on the pre-plasma, which increases the electron density of the plasma on both sides of the main pulse laser action position and makes the electron density gradient of the plasma at the main pulse laser action position steeper, resulting in the co-linear double-pulse technology being unable to produce an extreme ultraviolet light source with a strong light intensity and a narrow spectrum at 13.5nm (within the 2% band) under a fixed delay.
[0024] The embodiment of the present invention utilizes two lasers to emit mutually perpendicular lasers, and utilizes the two mutually perpendicular laser beams to irradiate a solid metal target to generate plasma, thereby generating extreme ultraviolet light, thereby solving the drawbacks of utilizing the colinear double-pulse technology to generate extreme ultraviolet light, and can generate an ultraviolet light source with a strong light intensity and a narrow spectrum at 13.5nm (within the 2% band) under a fixed delay, which is beneficial to improving the spectral purity of the extreme ultraviolet light.
[0025] In order to make the purpose, technical solution and advantages of the invention more clear, the invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the invention and do not constitute a limitation of the invention.
[0026] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.
[0027] In the description of the invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the invention, unless otherwise specified, the meaning of "multiple" is two or more.
[0028] In the description of the invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the invention can be understood according to specific circumstances.
[0029] The present invention will be described in detail below with reference to the accompanying drawings and in combination with embodiments.
[0030] refer to Figure 1 On the one hand, the invention provides an extreme ultraviolet light generating device, comprising: a first laser 1, the first laser 1 is used to emit a pre-pulse laser; a second laser 7, the second laser 7 is used to emit a main pulse laser; a solid metal target 6, the solid metal target 6 is arranged in a vacuum chamber 4 through a three-dimensional displacement stage 5; a first lens 3, the pre-pulse laser is focused on the surface of the solid metal target 6 through the first lens 3, so that the solid metal target 6 generates a pre-plasma; a second lens 10, the main pulse laser is focused in the pre-plasma through the second lens 10 to generate extreme ultraviolet light; wherein, the angle between the optical axis of the pre-pulse laser passing through the first lens 3 and the optical axis of the main pulse laser passing through the second lens 10 is in the range of 80° to 100°.
[0031] It should be noted that the pre-plasma is the plasma excited and generated by the pre-pulse laser emitted by the first laser 1 irradiating the surface of the solid metal target 6; since it is necessary to generate extreme ultraviolet light in a vacuum environment, the solid metal target 6 is arranged in a vacuum chamber 4; the three-dimensional displacement stage 5 is used to drive the solid metal target 6 to translate so that each surface of the solid metal target 6 can be irradiated by the laser; the first lens 3 focuses the pre-pulse laser emitted by the first laser 1 into a first light spot, and the second lens 10 focuses the main pulse laser emitted by the second laser 7 into a second light spot. The first light spot falls on the surface of the solid metal target 6 and is used to excite the solid metal target 6 to generate pre-plasma, and the second light spot falls in the pre-plasma. The main pulse laser interacts with the pre-plasma and reheats the pre-plasma, thereby generating extreme ultraviolet light with higher intensity and higher spectral purity.
[0032] In some embodiments of the present invention, the wavelength of the generated extreme ultraviolet light is 13.5 nm, so the corresponding solid metal target material 6 is a Sn target.
[0033] Furthermore, the angle between the optical axis of the pre-pulse laser passing through the first lens 3 and the optical axis of the main pulse laser passing through the second lens 10 is 90°.
[0034] In some embodiments of the invention, the extreme ultraviolet light generating device further includes: a first reflector 2, a second reflector 8 and a third reflector 9, all of which are coated reflectors, and the pre-pulse laser emitted by the first laser 1 is reflected by the first reflector 2 and then incident on the first lens 3, and the main pulse laser emitted by the second laser 7 is reflected by the second reflector 8 and then incident on the third reflector 9, and the main pulse laser is reflected by the third reflector 9 and then incident on the second lens 10. The first reflector 2, the second reflector 8 and the third reflector 9 are used to realize the optical path turning.
[0035] In some embodiments of the present invention, the incident angle of the pre-pulse laser emitted by the first laser 1 into the first reflector 2 can be 45°, and the incident angle of the main pulse laser into the second reflector 8 and the third reflector 9 can also be 45°.
[0036] Furthermore, the extreme ultraviolet light generating device further includes a digital delay device 14, which is connected to the first laser 1 and the second laser 7, and is used to control the first laser 1 and the second laser 7 so that the pre-pulse laser emitted by the first laser 1 and the main pulse laser emitted by the second laser 7 have a preset relative delay. The reason for making the pre-pulse laser and the main pulse laser have a preset relative delay is that it takes a certain amount of time to generate a certain amount of pre-plasma using the pre-pulse laser, so it is necessary to delay a certain amount of time after the pre-pulse laser is emitted before emitting the main pulse laser.
[0037] Furthermore, the relative delay is preset to be in the range of 0ns to 200ns.
[0038] In some embodiments of the present invention, the preset relative delay is 20ns. When the preset relative delay is less than 20ns, the plasma generated after the main pulse laser is focused on the pre-plasma through the second lens is less and the plasma opacity is high, which leads to weak extreme ultraviolet light radiation. When the preset relative delay is greater than 20ns, the density of the plasma decreases due to the expansion of the pre-plasma, thereby weakening the extreme ultraviolet radiation. Therefore, selecting the preset relative delay of 20ns is conducive to ensuring that the generated extreme ultraviolet radiation is strong.
[0039] Furthermore, the vacuum chamber 4 has a first incident window, a second incident window and an output window. The pre-pulse laser focused by the first lens 3 enters the vacuum chamber 4 through the first incident window, and the main pulse laser focused by the second lens 10 enters the vacuum chamber 4 through the second incident window. The extreme ultraviolet light generating device also includes a spectrum generating component, which is used to collect light output from the output window to generate a spectrum based on the light.
[0040] Furthermore, the spectrum generation component may include a flat-field spectrometer 11, a camera 12 and a computer 13 connected in sequence, wherein the flat-field spectrometer 11 is used to collect light output from the output window, the camera 12 is used to generate light information based on the light, and the computer 13 is used to receive the light information and output a spectrum based on the light information.
[0041] In some embodiments of the present invention, the camera 12 is an X-ray CCD area array camera.
[0042] Furthermore, the main pulse laser is focused into the pre-plasma at a first distance from the solid metal target 6 through the second lens 10 , and the first distance is within the range of 90 μm to 110 μm.
[0043] In some embodiments of the present invention, the first distance is 100 μm. When the first distance is less than 100 μm, the solid metal target 6 easily blocks the second light spot formed by the main pulse laser emitted by the second laser 7 through the second lens 10; when the distance is greater than 100 μm, the pre-plasma generated by the pre-pulse laser emitted by the first laser 1 and focused on the solid metal target 6 through the first lens 3 has a lower density, which will weaken the extreme ultraviolet radiation intensity. Therefore, the first distance is 100 μm, which is conducive to ensuring the generation of extreme ultraviolet light with higher radiation intensity.
[0044] Further, the first laser 1 and / or the second laser 7 includes: a solid laser, a gas laser, a semiconductor laser or a dye laser.
[0045] In some embodiments of the present invention, the first laser 1 and the second laser 7 are both solid-state lasers, such as Nd:YAG lasers.
[0046] Furthermore, the wavelength of the pre-pulse laser and / or the main pulse laser is: 266nm, 355nm, 532nm, 1064nm or 10.6μm, etc.
[0047] Furthermore, the solid metal target material 6 includes: a solid metal Sn target, a low-density solid target, a metal Sn rod target, a strip Sn target or a structured Sn target, wherein the low-density solid target includes a solid target doped with SnO2 or a foam target containing Sn.
[0048] On the other hand, the present invention provides an extreme ultraviolet light generating method, comprising: providing any of the above extreme ultraviolet light generating devices, the extreme ultraviolet light generating device comprising: a first laser 1, a second laser 7, a solid metal target 6, a first lens 3 and a second lens 10; using the first laser 1 to emit a pre-pulse laser, the pre-pulse laser is focused on the surface of the solid metal target 6 through the first lens 3, so that the solid metal target 6 generates a pre-plasma; using the second laser 7 to emit a main pulse laser, the main pulse laser is focused in the pre-plasma through the second lens 10, so as to generate extreme ultraviolet light; wherein, the angle between the optical axis of the pre-pulse laser passing through the first lens 3 and the optical axis of the main pulse laser passing through the second lens 10 is in the range of 80° to 100°.
[0049] A specific embodiment of the method for generating extreme ultraviolet light provided by the present invention is described below, as follows:
[0050] Nd:YAG laser is used as the first laser 1. The laser with an output wavelength of 532nm, a pulse width of 8ns and a laser energy of 150mJ of the first laser 1 is used as the pre-pulse laser. The pre-pulse laser enters the first lens 3 after being reflected by a coated reflector with a reflection wavelength of 532nm and an incident angle of 45°. The focal length of the first lens 3 can be 400mm. The pre-pulse laser focused by the first lens 3 enters the vacuum chamber 4 through the first incident window, and finally forms a light beam with a spot diameter of 1mm focused on the surface of the solid metal target 6. The solid metal target 6 is excited to generate pre-plasma. The solid metal target 6 is a solid metal Sn target. The shape of the solid metal Sn target is: a rectangular parallelepiped with a width and height of 1.5mm and a length of 40mm. The solid metal Sn target is fixed on a precise three-dimensional displacement stage 5. The three-dimensional displacement stage 5 drives the solid metal Sn target to translate, thereby changing the action position of the pre-pulse laser, ensuring that the pre-pulse laser can act on multiple surfaces of the solid metal Sn target, which is beneficial to improving the irradiation efficiency.
[0051] Nd:YAG laser is used as the second laser 7. The laser with an output wavelength of 1064nm, a pulse width of 8ns and a laser energy of 200mJ is used as the main pulse laser. The main pulse laser enters the second lens 10 after being reflected by a coated reflector with a reflection wavelength of 1064nm and an incident angle of 45°. The focal length of the second lens 10 can be 400mm. The main pulse laser focused by the second lens 10 enters the vacuum chamber 4 through the second incident window. The focus of the main pulse laser focused by the second lens 10 is located at a position 100μm away from the solid metal target, and is focused in the pre-plasma to heat the pre-plasma to generate extreme ultraviolet light with a wavelength of 13.5nm. The extreme ultraviolet light passes through the flat field spectrometer 11, is received by the back-illuminated X-RayCCD camera, and the spectrum results are displayed on the computer 13.
[0052] It is necessary to use a digital delay device 14 to adjust the first laser 1 and the second laser 7, so as to change the preset relative delay of the pre-pulse laser and the main pulse laser to obtain extreme ultraviolet light.
[0053] The extreme ultraviolet light generation method provided by the present invention has the ability to weaken the plasma self-absorption effect. When the preset relative delay between the pre-pulse laser and the main pulse laser is 20ns, the spectral efficiency of the extreme ultraviolet light with an output wavelength of 13.5nm (within the 2% band) can reach 21.2%.
[0054] Figure 2 A single pulse laser with an output wavelength of 1064 nm and a laser energy of 200 mJ is used to irradiate a solid metal Sn target to generate an extreme ultraviolet light spectrum with a wavelength of 13.5 nm, and the spectrum purity is 8.1%.
[0055] Figure 3 The related properties of extreme ultraviolet light with a wavelength of 13.5 nm generated by irradiating the surface of a solid metal Sn target using a pre-pulse laser with a laser wavelength of 532 nm, a main pulse laser with a wavelength of 1064 nm, and a co-linear double pulse technology with an angle of 0° between the pre-pulse laser and the main pulse laser, where: Figure 3 (a) is the extreme ultraviolet spectrum corresponding to different preset relative delays. Figure 3 (b) is a curve diagram of spectral purity and radiation intensity at the peak under different preset relative delays. It can be seen that when the preset relative delay between the pre-pulse laser and the main pulse laser is 40ns, the spectral purity is about 11.2%, but the corresponding peak radiation intensity is weak.
[0056] Figure 4 This is a graph showing the properties of extreme ultraviolet light with a wavelength of 13.5 nm generated by irradiating a solid metal Sn target when a pre-pulse laser with a wavelength of 532 nm and a main pulse laser with a wavelength of 1064 nm are used, and the angle between the pre-pulse laser and the main pulse laser is 90°. Figure 4 (a) is the extreme ultraviolet light spectrum corresponding to different preset relative delays. Figure 4 (b) is a curve diagram of spectral purity and radiation intensity at the peak under different preset relative delays. It can be seen that when the preset relative delay is 20ns, the spectral purity is about 21.2%, and the corresponding peak radiation intensity is also the strongest.
[0057] In summary, compared with Figure 2 The spectral purity of the extreme ultraviolet light generated by the corresponding single pulse laser technology irradiating the solid metal Sn target, and compared with Figure 3 The corresponding spectral purity of the extreme ultraviolet light generated by irradiating the solid metal Sn target with the collinear double pulse technology, Figure 4The orthogonal double-pulse technology provided by the corresponding present invention can greatly improve the spectral purity of the generated extreme ultraviolet light, which is increased by 161.7% compared with the single-pulse laser technology and by 89.3% compared with the co-linear double-pulse technology.
[0058] The invention adopts a first laser 1 to output a pre-pulse laser, which is focused on the surface of a solid metal target 6 through a first reflector 2 and then through a first lens 3 to generate a pre-plasma. The solid metal target 6 is fixed on a precise three-dimensional displacement stage 5. The action position of the pre-pulse laser is changed by controlling the three-dimensional displacement stage 5 to ensure that all surfaces of the solid metal target 6 can be irradiated. A second laser 7 is used to output a main pulse laser, which passes through a second reflector 8 and a third reflector 9, and then through a second lens 10, and is finally focused in the pre-plasma. The optical axis of the main pulse laser passing through the second lens 10 is perpendicular to the optical axis of the pre-pulse laser passing through the first lens 3. The main pulse laser heats the pre-plasma, thereby generating extreme ultraviolet light with a wavelength of 13.5nm. The distance from the focused spot size of the main pulse laser to the surface of the solid metal target 6 is 100μm. The generated extreme ultraviolet light passes through a flat field spectrometer 11 and is finally collected by a camera 12, and the spectrum results are displayed on a computer 13. The electron density in the pre-plasma is optimized by adjusting the digital delay generator to change the preset relative delay between the pre-pulse laser and the main pulse laser.
[0059] It should be noted that the optical axis of the main pulse laser passing through the second lens 10 and the optical axis of the pre-pulse laser passing through the first lens 3 are perpendicular to each other, which means that the angle between the optical axis of the main pulse laser passing through the second lens 10 and the optical axis of the pre-pulse laser passing through the first lens 3 is in the range of 80° to 100°.
[0060] It should be understood that the various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps described in the disclosure of the present invention can be performed in parallel, sequentially or in different orders, as long as the desired results of the technical solution disclosed in the present invention can be achieved, and this document does not limit this.
[0061] The above specific implementations do not constitute a limitation on the protection scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims
1. An extreme ultraviolet light generating device, It is characterized in that include: A first laser, wherein the first laser is used to emit a pre-pulse laser; A second laser, the second laser being used to emit a main pulse laser; A solid metal target material, wherein the solid metal target material is arranged in a vacuum chamber via a three-dimensional displacement stage; a first lens, wherein the pre-pulse laser is focused on the surface of the solid metal target through the first lens, so that the solid metal target generates pre-plasma; A second lens, through which the main pulse laser is focused in the pre-plasma to generate extreme ultraviolet light; Wherein, an angle between an optical axis of the pre-pulse laser passing through the first lens and an optical axis of the main pulse laser passing through the second lens is in a range of 80° to 100°.
2. The extreme ultraviolet light generating device according to claim 1, It is characterized in that The extreme ultraviolet light generating device also includes a digital delay device, which is connected to the first laser and the second laser and is used to control the first laser and the second laser so that the pre-pulse laser emitted by the first laser and the main pulse laser emitted by the second laser have a preset relative delay.
3. The extreme ultraviolet light generating device according to claim 2, It is characterized in that The preset relative delay is in the range of 0ns to 200ns.
4. The extreme ultraviolet light generating device according to claim 1, It is characterized in that The vacuum chamber has a first incident window, a second incident window and an output window, the pre-pulse laser focused by the first lens is incident into the vacuum chamber through the first incident window, and the main pulse laser focused by the second lens is incident into the vacuum chamber through the second incident window; The extreme ultraviolet light generating device further includes a spectrum generating component, which is used to collect the light output by the output window to generate a spectrum based on the light.
5. The extreme ultraviolet light generating device according to claim 1, It is characterized in that The main pulse laser is focused in the pre-plasma at a first distance from the solid metal target through the second lens, and the first distance is in the range of 90 μm to 110 μm.
6. The extreme ultraviolet light generating device according to claim 1, It is characterized in that The first laser and / or the second laser include: a solid laser, a gas laser, a semiconductor laser or a dye laser.
7. The device for generating extreme ultraviolet light according to claim 1, It is characterized in that The wavelength of the pre-pulse laser and / or the main pulse laser is: 266nm, 355nm, 532nm, 1064nm or 10.6μm.
8. The extreme ultraviolet light generating device according to claim 1, It is characterized in that The solid metal target material includes: a solid metal Sn target, a low-density solid target, a metal Sn rod target, a strip Sn target or a structured Sn target, wherein the low-density solid target includes doped SnO 2 A solid target or a foam target containing Sn.
9. The extreme ultraviolet light generating device according to claim 1, It is characterized in that The angle between the optical axis of the pre-pulse laser light passing through the first lens and the optical axis of the main pulse laser light passing through the second lens is 90°.
10. A method for generating extreme ultraviolet light, It is characterized in that Provided is an extreme ultraviolet light generating device according to any one of claims 1 to 9, the extreme ultraviolet light generating device comprising: a first laser, a second laser, a solid metal target, a first lens, and a second lens; Using the first laser to emit a pre-pulse laser, the pre-pulse laser is focused on the surface of the solid metal target through the first lens, so that the solid metal target generates pre-plasma; Using the second laser to emit a main pulse laser, the main pulse laser is focused in the pre-plasma through the second lens to generate extreme ultraviolet light; Wherein, an angle between an optical axis of the pre-pulse laser passing through the first lens and an optical axis of the main pulse laser passing through the second lens is in a range of 80° to 100°.