Coating device

Abstract

Provided is a coating device capable of shortening the beat time of a coating operation. Specifically, the coating device is provided with: a stage on which a substrate is placed; and a coating unit that forms a coating film on the substrate by discharging a coating liquid while moving relatively in one direction with respect to the substrate placed on the surface of the stage, the coating unit having: a coater that discharges the coating liquid; and a support unit that supports the applicator, the support unit having: a support column portion disposed on one side in the width direction perpendicular to the application direction; and a beam portion extending from the pillar portion so as to span the table, the coater being supported by the support unit in a cantilever beam structure by being attached to the beam portion.

Description

Technical Field

[0001] The present invention relates to a coating device for forming a coating film on a substrate by relatively moving a coating unit for ejecting a coating liquid and a substrate. Background Art

[0002] In flat panel displays such as liquid crystal displays and organic EL displays, a member (referred to as a coated substrate) is used in which a coating liquid such as a resist liquid is coated on a substrate made of glass. The coated substrate is formed by a coating device that uniformly coats the coating liquid. Figure 5 As shown, the coating device has a workbench 100 for mounting a substrate W and a coating unit 101 for spraying a coating liquid. While the coating liquid is sprayed from a coater 102 of the coating unit 101, the substrate W and the coating unit 101 are moved relative to each other in one direction, thereby forming a substrate W having a coating film of uniform thickness.

[0003] The coating unit 101 of the coating device includes a coater 102 for discharging a coating liquid and a support unit 103 for supporting the coater 102. The support unit 103 is formed in a door-shaped shape called a so-called gantry, and includes support columns 103a provided on both sides of the workbench 100 in the width direction perpendicular to the coating direction and a rod-shaped beam 103b spanning the two support columns 103a, and the coater 102 is mounted on the beam 103b. In addition, a driving device 104 is provided on the support column 103a, and the support unit 103 is formed as a whole to move relative to the workbench 100. That is, by providing the support columns 103a arranged on both sides, the coater 102 is supported by the support unit 103 with high rigidity, thereby suppressing the influence of vibration of the coater 102 caused by the movement of the coating unit 101, and forming a coating film with a uniform thickness.

[0004] In addition, in the coating device, a robot 105 is arranged on one side of the workbench 100 in the width direction, and the substrate W is carried to the workbench 100 by the robot 105. At this time, the coating unit 101 stops at a position where the coater 102 is arranged on the maintenance device 106 provided at the end of the workbench 100 in the coating direction. The carried-in substrate W is supported by the lifting pins 107, and the substrate W is placed and adsorbed and held on the workbench 100 as the lifting pins 107 descend. Then, the coating unit 101 moves and stops in a state where the coater 102 is located at the end of the substrate W in the coating direction. And, when the coating liquid is sprayed from the coater 102 and the coater 102 and the substrate W are connected by the coating liquid to form a liquid bead, the coating unit 101 is moved while maintaining the state of the liquid bead, thereby forming a coating film of uniform thickness on the substrate W. Then, the coating unit 101 moves to the other side, and the robot 105 enters while the substrate W on the workbench 100 is lifted by the lifting pins 107, thereby transferring the substrate W from the lifting pins 107 to the robot 105 and discharging the substrate W (for example, refer to the following patent document 1).

[0005] [Prior art literature]

[0006] [Patent Document]

[0007] Patent Document 1: Japanese Patent Application Publication No. 2010-093125 Summary of the invention

[0008] [Problems to be Solved by the Invention]

[0009] However, in the above-mentioned coating device, there is a problem that it is difficult to reduce the takt time of the coating operation. That is, in the above-mentioned coating device, when the coating operation starts, the coating unit 101 moves from the coating start position at one end of the coating direction to the coating end position at the other end to form a coating film on the substrate W. In order to reduce the takt time, after the coating film is formed on the substrate W, it is desired to immediately move the robot 105 in to discharge the substrate W, but during the movement of the coating unit 101 to the maintenance device 106, the robot 105 cannot enter the workbench 100 due to the presence of the support unit 103a. On the other hand, it is also considered that after forming the coating film, the coating unit 101 is directly passed, and during the waiting period at this position, the robot 105 is moved in to discharge the substrate W, but then the coating unit 101 needs to be moved to the maintenance device 106 for initialization. In short, the coating unit 101 needs to wait until it moves to the maintenance device 106, so there is a problem that the tact time cannot be shortened as a whole. In recent years, the substrate W is formed into a long strip shape in the coating direction, the waiting time becomes longer, and the influence on the tact time becomes larger.

[0010] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a coating device capable of shortening the tact time of a coating operation.

[0011] [Means for solving the problem]

[0012] In order to solve the above-mentioned problems, the coating device of the present invention comprises: a workbench on which a substrate is placed; and a coating unit, which sprays a coating liquid while moving relative to the substrate placed on the surface of the workbench in one direction, thereby forming a coating film on the substrate. The coating device is characterized in that the coating unit comprises: a coater that sprays a coating liquid; and a supporting unit that supports the coater, and the supporting unit comprises: a pillar portion that is arranged on one side in a width direction perpendicular to the coating direction; and a beam portion that extends from the pillar portion in a manner spanning the workbench, and the coater is supported on the supporting unit in a cantilever beam structure by being mounted on the beam portion.

[0013] According to the coating device, the coater that sprays the coating liquid is supported by a support portion of a support unit disposed on one side in the width direction in a cantilever beam structure, and therefore, after the coating film is formed, the action of discharging the substrate is immediately started, thereby shortening the cycle time of the coating action. That is, the coater is supported by a support portion disposed on one side in the width direction, and therefore, there is no support portion on the other side in the width direction. Therefore, by disposing a robot on the side opposite to the side where the support portion is disposed, there is no support portion that hinders the robot from entering, and after the coating film is formed on the substrate, the robot can enter and discharge the substrate regardless of the position of the coating unit. Therefore, compared with the prior art in which the robot needs to wait until the coating unit moves to the position of the maintenance device, the robot can enter at any time, thereby shortening the cycle time of the coating action.

[0014] Furthermore, the support portion may be configured such that a width dimension perpendicular to the coating direction is larger than a width dimension of the coater.

[0015] According to this structure, the rigidity of the support portion can be sufficiently improved. Therefore, even when the applicator is supported by a cantilever beam structure, the vibration of the applicator caused by insufficient rigidity in the vertical direction can be suppressed, and the coating unevenness caused by the vibration in the formed coating film can be suppressed.

[0016] Furthermore, the support unit may be mounted on a plurality of guide members for moving the support unit in the coating direction, and at least one of the guide members may be provided closer to the table than the support column.

[0017] According to this structure, since the support unit is mounted on a plurality of guide members, the rigidity becomes higher than when it is mounted on one guide member. In addition, at least one of the plurality of guide members is disposed closer to the worktable side than the region where the support pillar is disposed, so that the moment of the applicator with the coating direction as the central axis can be reduced, the vibration of the applicator displacing in the vertical direction can be suppressed, and the occurrence of uneven coating can be suppressed.

[0018] In addition, the support unit may be configured such that the support column is eccentrically disposed relative to the center between the guide members at both ends in the width direction in a manner such that the center of gravity of the support unit is closer to the center between the guide members at both ends in the width direction than the center of gravity of the support column.

[0019] According to this structure, compared with the case where the center of gravity of the support portion is located in the middle between the guide members, the reaction force generated in each guide member for supporting the support unit and the deviation of the reaction force can be reduced. The rigidity of the entire support unit can be improved, and the strength of the entire support unit with respect to the moment around the coating direction can also be improved.

[0020] Furthermore, the driving unit that moves the supporting unit in the coating direction may be formed of a linear motor having a magnetic attraction mechanism.

[0021] According to this configuration, the support unit is attracted toward the driving unit by the magnetic force of the magnetic attraction mechanism of the linear motor, so that the generation of vibrations that cause the applicator to be displaced in the vertical direction (direction away from the driving unit) can be suppressed.

[0022] [Effects of the invention]

[0023] According to the coating device of the present invention, the tact time of the coating operation can be shortened. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a front view of the coating device which is one embodiment of this invention.

[0025] Figure 2 It is a side view of the above-mentioned coating device.

[0026] Figure 3 It is an enlarged view of the coating unit in the above coating device.

[0027] Figure 4The figures show the processing actions of the coating device, (a) is a figure showing the state before the substrate is moved onto the workbench, (b) is a figure showing the state where the robot enters and moves the substrate onto the workbench, (c) is a figure showing the state where the coater descends to the coating height during the coating action, (d) is a figure showing the state where the substrate is handed over to the robot after the coating film is formed, and (e) is a figure showing the state where the substrate has been moved out of the workbench.

[0028] Figure 5 This is a diagram showing a conventional coating device. DETAILED DESCRIPTION

[0029] Figure 1 , Figure 2 FIG. 1 is a diagram schematically showing the appearance of a coating device according to one embodiment of the present invention. Figure 1 is the main view, Figure 2 It is a side view.

[0030] The coating device 1 forms a coating film M of a liquid substance such as a chemical solution or a resist solution (hereinafter referred to as a coating liquid) on a substrate W, and includes a base 2, a workbench 21 for mounting the substrate W, and a coating unit 30 configured to be movable in a specific direction relative to the workbench 21. Then, when the substrate W is supplied to the workbench 21 by the robot 9, the coating liquid is sprayed onto the substrate W from the coating unit 30, and the coating unit 30 is moved in a state where the coating liquid is sprayed, thereby forming a coating film of uniform thickness on the substrate W.

[0031] In the following description, the direction in which the coating unit 30 moves (coating direction) is defined as the X-axis direction, the direction perpendicular to it in the horizontal plane (width direction) is defined as the Y-axis direction, and the direction perpendicular to both the X-axis and Y-axis directions is defined as the Z-axis direction.

[0032] The substrate W in this embodiment is a long strip-shaped substrate W with a width dimension of 50 mm to 100 mm and a coating direction dimension of 1500 mm to 1800 mm. In other words, the coating direction dimension is twice or more of the width dimension. The substrate W is made of, for example, glass or a film and has flexibility.

[0033] The base 2 is formed in a flat plate shape, and a workbench 21, a coating unit 30, and a maintenance device 8 (see FIG. Figure 2 That is, the workbench 21 and the maintenance device 8 are arranged in the X-axis direction, and the coating unit 30 is arranged at a position away from the workbench 21 in the Y-axis direction in a manner that can move in the X-axis direction. That is, the coating unit 30 is configured to be movable along the workbench 21 and the maintenance device 8.

[0034] The worktable 21 carries and holds the substrate W. The worktable 21 is formed in a rectangular parallelepiped shape, and a mounting surface 21a (the surface of the worktable 21) on which the substrate W is mounted is formed to be substantially flat. Specifically, it has a shape extending in the X-axis direction, and is formed so that when the substrate W is mounted on the mounting surface 21a, the long substrate W can be held in a flat posture along the mounting surface 21a.

[0035] The workbench 21 is provided with a substrate lifting mechanism for lifting the supplied substrate W. Specifically, a plurality of pin holes are formed on the mounting surface 21a of the workbench 21, and lifting pins 25 (see FIG. 25 ) capable of lifting in the Z-axis direction are embedded in the pin holes. Figure 4 That is, if the lifting pins 25 are in a state of protruding from the surface of the table 21 (see Figure 4 When the substrate W is loaded into the workbench (b), the front end of the lift pin 25 contacts the substrate W and can hold the substrate W. Then, the lift pin 25 is lowered from this state and accommodated in the pin hole, so that the substrate W can be placed on the placement surface 21a ( Figure 4 (c)).

[0036] In addition, a substrate holding unit is provided on the workbench 21, and the substrate W is held by the substrate holding unit. The substrate holding unit adsorbs and holds the substrate W. Specifically, the substrate holding unit has a suction groove and a suction hole formed on the loading surface 21a of the workbench 21, and the substrate W can be held on the loading surface 21a by generating suction force through the suction groove and the suction hole. That is, on the loading surface 21a of the workbench 21, the suction grooves formed with a predetermined depth are arranged at approximately equal intervals in the X-axis direction and the Y-axis direction, and are respectively arranged in a grid shape in a mutually intersecting manner. In addition, suction holes are provided at the intersection of the suction grooves, and the suction holes are connected to the vacuum pump by piping. Moreover, by operating the vacuum pump, suction force is generated in the suction hole, and suction force is generated on the entire loading surface 21a through the suction grooves.

[0037] The coating unit 30 forms a coating film M by spraying a coating liquid onto the substrate W. The coating unit 30 includes a coater 31 that sprays the coating liquid and a support unit 40 that supports the coater 31. The coating unit 30 is formed to move in the X-axis direction while the coater 31 is supported. That is, the coater 31 moves while spraying the coating liquid from the coater 31 in a state where the coater 31 faces the substrate W placed on the workbench 21, thereby forming a coating film M with a uniform thickness on the substrate W.

[0038] The coater 31 ejects a coating liquid to form a coating film M on the substrate W. The coater 31 is a columnar member having a shape extending in one direction, and is arranged to extend in the Y-axis direction (width direction) substantially perpendicular to the moving direction (X-axis direction) of the coating unit 30. In the coater 31, a slit nozzle 31a extending in the length direction is formed on the surface opposite to the workbench 21, and the coating liquid supplied to the coater 31 is ejected uniformly in the entire length direction from the slit nozzle 31a. Therefore, by moving the coating unit 30 in the X-axis direction while ejecting the coating liquid from the slit nozzle 31a, a coating film M of a certain thickness is formed on the substrate W throughout the length direction of the slit nozzle 31a (see Figure 2 ).

[0039] The support unit 40 is for supporting the applicator 31 while maintaining the posture of the applicator 31. The support unit 40 has a support column 41 and a beam 42 extending from the support column 41 in the horizontal direction.

[0040] The support column 41 is a columnar member extending in one direction, and is disposed at a position away from the workbench 21. Specifically, the support column 41 is disposed away from the workbench 21 in a width direction (Y-axis direction) orthogonal to the coating direction, and is disposed on the base 2 in a manner extending in a vertical direction. In the present embodiment, a flat plate-shaped base 43 is disposed on the base 2, and the support column 41 is uprightly disposed on the base 43.

[0041] The beam 42 is a rod-shaped member that supports the applicator 31. The beam 42 is supported by the support 41 in a posture extending in the Y-axis direction, and is formed to span the length of the table 21. That is, the beam 42 is supported by the support 41 through a cantilever beam structure. The applicator 31 is mounted on the beam 42, and the slit nozzle 31a of the applicator 31 is supported in a posture facing the mounting surface 21a of the table 21.

[0042] In addition, the beam 42 is configured to perform a lifting action while being supported by the support 41. Specifically, the support 41 is provided with a guide rail 44 extending in the Z-axis direction and a slider 45 sliding along the guide rail 44, and these sliders 45 are connected to the beam 42. Moreover, a ball screw mechanism driven by a servo motor is installed on the slider 45, and the slider moves in the Z-axis direction and can stop at any position by driving and controlling the servo motor. That is, the beam 42 performs a lifting action, and the coater 31 is supported so as to be able to contact or separate from the substrate W held on the workbench 21.

[0043] Furthermore, the support column 41 is formed with a width dimension S larger than the width dimension T of the applicator 31. Figure 3As shown, the width dimension S of the support portion 41 is formed to be at least twice the width dimension T of the applicator 31. Thus, even in a cantilever beam structure, the applicator 31 and the beam portion 42 can be supported with sufficient strength. The width dimension S of the support portion 41 is the maximum dimension value in the width direction of the support portion 41, and the width dimension T of the applicator 31 is the maximum dimension value in the length direction of the applicator 31 alone.

[0044] In addition, a driving unit 5 is provided on the base 43 on which the support column 41 is mounted. The driving unit 5 allows the support unit 40 to move in the X-axis direction. Specifically, two guide rails 51 (the guide components of the present invention) extending in the X-axis direction are provided on the base 2, and the base 43 is slidably mounted on the guide rails 51 via sliders 52. Moreover, a linear motor 55 is installed on the base 2. In the present embodiment, the support column 41 mounted on the base 43 and the coating unit 30 are moved in the X-axis direction along the guide rails 51 by driving and controlling the linear motor 55, and can stop at any position. In the present embodiment, the coater 31 can stop at the respective positions of the workbench 21 and the maintenance device 8, and the coater 31 can move on the workbench 21 in a posture opposite to the workbench 21.

[0045] In addition, in the present embodiment, the guide rail 51 is provided to have a dimension larger than the width dimension of the support column 41. Figure 3 In the example shown, the base 43 has an extension portion 43a extending toward the workbench 21, and one of the two guide rails 51 is provided directly below the extension portion 43a. Furthermore, the guide rails 51 are provided at both ends of the base 43 in the width direction, and the support column portion 41 is arranged at a position that is eccentric by a predetermined amount toward the outside (the side opposite to the applicator 31) from the central position of the two guide rails 51. That is, the support column portion 41 is eccentrically arranged in such a manner that the center of gravity position Gs of the entire support unit 40 is located closer to the center of the two guide rails 51 than the center of gravity position G2 of the support column portion 41. That is, the center of gravity position Gs of the support unit 40 exists in accordance with the center of gravity G1 of the beam portion 42 and the center of gravity G2 of the support column portion 41. Figure 3The position of Gs in the center of gravity Gs is located near the center of the two guide rails 51 compared to the center of gravity G2 of the support portion 41. Therefore, compared with the case where the two guide rails 51 are arranged directly below the support portion 41, the reaction force generated by each guide rail 51 for supporting the support unit 40 and the deviation of the reaction force can be reduced. Therefore, the rigidity of the support unit 40 as a whole can be improved, and the strength of the support unit 40 as a whole with respect to the moment around the coating direction (X-axis direction) can also be improved. Therefore, even if the structure in which the coater 31 is supported by a cantilever beam structure, the vibration of the coater 31 in the vertical direction (Z-axis direction) due to insufficient rigidity can be avoided, and the support can be firmly performed, and the vibration of the coater displaced in the vertical direction can be suppressed, and the occurrence of uneven coating can be suppressed.

[0046] In addition, in the present embodiment, as the linear motor 55 of the driving unit 5, a linear motor 55 having a magnetic attraction mechanism is used. That is, in a coreless linear motor, the mover is magnetically held between the upper and lower stators. Therefore, the mover is supported between the stators in a non-contact manner, thereby allowing the support portion 41 to shift in the Z direction due to a small gap, which becomes the main cause of the vibration of the applicator 31. In the present embodiment, by using a core-type linear motor 55 having a magnetic attraction mechanism, the vibration of the applicator 31 can be suppressed. Specifically, the movable part 55a of the linear motor 55 is mounted on the support portion 41, and the fixed part 55b is mounted on the base 43, whereby the movable part 55a and the fixed part 55b are magnetically attracted, and the driving force of the linear motor 55 is generated. Therefore, it is difficult to generate a displacement such that the support portion 41 leaves the base 43, and the positional relationship between the support portion 41 and the base 43 is kept constant almost without shaking. Thus, it is possible to avoid the support portion 41 from being slightly displaced in the Z direction, and thus it is possible to suppress the applicator 31 from vibrating in the vertical direction (Z-axis direction). In this way, even if the applicator 31 is supported by the cantilever beam structure, it is possible to avoid the applicator 31 from vibrating in the vertical direction (Z-axis direction) due to insufficient rigidity, shaking, etc., and it is possible to suppress uneven coating caused by the vibration of the applicator 31.

[0047] In addition, a maintenance device 8 is arranged at a position separated from the workbench 21 in the X-axis direction. The maintenance device 8 cleans and initializes the applicator 31. That is, after a predetermined amount of coating liquid is ejected, the slit nozzle 31a of the applicator 31 is wiped by a wiping member, thereby forming a state in which the coating liquid in the applicator 31 is uniformly filled to the front end portion of the slit nozzle 31a in the longitudinal direction. Thus, the slit nozzle 31a is cleaned and initialized for forming the next coating film M.

[0048] Next, refer to Figure 2 and Figure 4 (a)~ Figure 4 (e) The processing operation of the coating device 1 is described.

[0049] First, the coater 31 is initialized and the substrate W is loaded. Figure 2 As shown, the coating unit 30 moves so that the coater 31 is located on the maintenance device 8, and the coater 31 is initialized at this position. That is, a predetermined amount of coating liquid is ejected from the slot nozzle 31a of the coater 31, and the excess coating liquid attached to the slot nozzle 31a is wiped by the wiping member, thereby forming a state in which the coating liquid fills the front end portion of the slot nozzle 31a.

[0050] Next, the substrate W is loaded onto the workbench 21. Specifically, Figure 4 As shown in (a), when the substrate W is placed on the robot 9 disposed on the side opposite to the support 41 of the coating device 1, the robot 9 waits with the lifting pins 25 provided on the workbench 21 raised. Then, the robot 9 enters the workbench 21 and descends, thereby transferring the substrate W from the robot 9 to the lifting pins 25 ( Figure 4 (b)). When the substrate W is delivered, the robot 9 retreats to its original position. Then, the lifting pins 25 are lowered, and the substrate W is placed on the placement surface 21a of the workbench 21, and the substrate W is positioned by a positioning member not shown. Then, the substrate W is held by adsorption in a state of being positioned on the workbench 21 by the substrate holding unit.

[0051] Specifically, the coating unit 30 moves so that the coater 31 is located at the coating start position of the substrate W, and the coater 31 is lowered to a height between the coater 31 and the substrate W to a height position suitable for forming the coating film M ( Figure 4 (c)), the coating liquid is ejected from the slit nozzle 31a, thereby forming a droplet B between the slit nozzle 31a and the substrate W. In this state, the coating unit 30 moves along the X-axis direction (coating direction), thereby forming a coating film M on the substrate W. Then, as Figure 2 As shown by the dotted line, when the coater 31 is located at the end portion of the substrate W, the liquid droplet B is removed, and then the coater 31 is raised, thereby completing the coating process.

[0052] Next, the substrate W is unloaded together with the initialization of the coater 31. Specifically, the coating unit 30 that has completed the coating process moves for initialization so that the coater 31 is located at the maintenance device 8. On the other hand, the coating unit 30 starts to move and performs the process of unloading the substrate W. Specifically, the lifting pins 25 are raised so that the substrate W is located at the unloading position. In this state, the robot 9 enters and rises from the bottom side of the substrate W, thereby delivering the substrate W from the lifting pins 25 to the robot 9 ( Figure 4 (d)).

[0053] At this time, in the coating device 1 of the present embodiment, the initialization of the coater 31 and the unloading of the substrate W can be performed simultaneously. That is, in the past, the coater 31 adopted a two-end support structure due to the influence on the coating accuracy, and therefore the entry of the robot 9 was affected by the position of the support column 41. Therefore, in a state where the coating process is completed and the coating unit 30 is located at the terminal end of the substrate W, the robot 9 cannot enter due to the presence of the support column 41, and needs to wait until the support column 41 leaves the workbench 21 in the X-axis direction. On the other hand, in the present embodiment, the coating unit 30 holds the coater 31 with a cantilever beam structure, and therefore, in the width direction, the robot 9 arranged on the side opposite to the support column 41 can enter the workbench 21 regardless of the position of the support column 41. Therefore, when the coating film M is formed on the substrate W, the robot 9 can be immediately entered ( Figure 4 (c)) to complete the discharge of the substrate W ( Figure 4 (e)).

[0054] Thus, according to the coating device 1 in the above-mentioned embodiment, the coater 31 that ejects the coating liquid is supported by the support portion of the support unit 40 disposed on one side in the width direction in a cantilever beam structure, and therefore, after the coating film M is formed, the action of discharging the substrate W is immediately started, thereby shortening the cycle time of the coating action. That is, the coater 31 is supported by the support portion disposed on one side in the width direction, and therefore, there is no support portion on the other side in the width direction. Therefore, by disposing the robot 9 on the side opposite to the side where the support portion is disposed, there is no support portion that hinders the robot 9 from entering, and after the coating film M is formed on the substrate W, the robot 9 can enter and discharge the substrate W regardless of the position of the coating unit 30. Therefore, compared with the prior art in which the robot 9 needs to wait until the coating unit 30 moves to the position of the maintenance device 8, the robot 9 can enter at any time, thereby shortening the cycle time of the coating action.

[0055] Furthermore, in the above-mentioned embodiment, an example is described in which the support portion 41 is formed with a width dimension larger than the width dimension of the applicator 31. However, although the cost is increased, by using a material with high rigidity to form the support portion 41, it is possible to set the following structure: the width dimension of the support portion 41 is made smaller than the width dimension of the applicator 31.

[0056] In addition, in the above embodiment, an example of using two guide members (guide rails 51) for moving the support unit 40 is described, but as long as the rigidity can be ensured, one or more than three guide members may be used. In particular, when multiple guide members are used, as described above, the extension portion 43a is provided, and the guide rail is arranged closer to the worktable side than the area where the support portion 41 is provided, thereby reducing the moment of the coater 31 with the coating direction as the central axis.

[0057] In addition, in the above-mentioned embodiment, a core-type linear motor 55 with a magnetic attraction mechanism is described as an example of the linear motor 55, but as long as the influence of rigidity does not affect the uneven coating, a coreless type linear motor 55 can also be used, and other driving parts 5 such as a ball screw can be used instead of the linear motor 55.

[0058] Description of Reference Numerals

[0059] 1 Coating device

[0060] 9. Robot

[0061] 21 Workbench

[0062] 30 coating units

[0063] 31 Coater

[0064] 40 Support unit

[0065] 41 Pillar Department

[0066] 43 Extension

[0067] 51 Guide rail (guide component)

[0068] 55 Linear Motor

[0069] B Droplet

Claims

1. A coating device, comprising: a worktable on which a substrate is placed; and a coating unit that ejects a coating liquid while moving in one direction relative to the substrate placed on the surface of the table, thereby forming a coating film on the substrate, The coating device is characterized in that The coating unit has: a coater that ejects a coating liquid; and a supporting unit that supports the applicator, The support unit comprises: a support portion disposed on one side in a width direction perpendicular to the coating direction; and a beam portion extending from the support portion so as to span across the workbench, The applicator is mounted on the beam portion and is supported by the support unit in a cantilever beam structure.

2. The coating device according to claim 1, characterized in that: The support portion is formed to have a width dimension perpendicular to the coating direction that is larger than a width dimension of the coater.

3. The coating device according to claim 1 or 2, characterized in that: The support unit is mounted on a plurality of guide members for moving the support unit in a coating direction, and at least one of the guide members is provided closer to the stage than the support column.

4. The coating device according to claim 3, characterized in that: The support unit is provided so that the support column is eccentrically disposed with respect to the center between the guide members at both ends in the width direction so that the center of gravity of the support column is closer to the center between the guide members at both ends in the width direction than the center of gravity of the support column.

5. The coating device according to claim 1 or 2, characterized in that: The driving unit that moves the supporting unit in the coating direction is formed by a linear motor having a magnetic attraction mechanism.

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