Production and processing device for highly wear-resistant pot body and its processing technology

Abstract

The present invention discloses a production and processing device for a highly wear-resistant pot body and its processing technology, and the technology is as follows: S1: Form a film into the shape of the inner cavity of a pot; S2: Irradiate the surface of the film with UV light to make the surface of the film carry charges; S3: Charge carbon crystal powder and evenly spray it onto the surface of the film, and the carbon crystal powder is evenly adsorbed on the surface of the film; S4: Place the film carrying carbon crystals into the inner cavity of the pot blank; S5: Heat the pot blank to 350-550 °C for chelation, and the inner cavity of the pot blank and the carbon crystals on the film are chelated into one body, and the film is vaporized at high temperature; The present invention provides a production device and processing technology for a highly wear-resistant carbon crystal pot. Through the improvement of this technology, that is, through the process of adsorbing carbon crystal particles on the film surface of the formed film and then chelating with the pot blank, the laying uniformity of the carbon crystal particles in the pot is improved, and the production quality of the carbon crystal pot is also improved.

Description

Technical Field

[0001] The present invention relates to the technical field of cookware production equipment and processes, and particularly to a production and processing device for a highly wear-resistant cookware body and its processing technology. Background Art

[0002] A highly wear-resistant cookware body generally refers to cookware that can withstand more physical wear during use, such as scratching by metal tools or frequent cleaning, while maintaining its surface characteristics. To improve the wear resistance of the cookware body, some wear-resistant materials are combined with the cookware body to form a highly wear-resistant layer; a carbon crystal cookware body is one of them, and its process is to crystallize carbon with a hardness close to that of diamond, and through high-temperature treatment at about 430 °C, chelate these carbon crystals onto the surface of the cookware body, thereby providing better wear resistance and non-stick effect.

[0003] In the existing process, carbon crystals (hereinafter collectively referred to as "carbon crystals") are made into powder form, and the powdered carbon crystals are evenly covered on the inner cavity surface of the cookware body, and then a surface layer with extremely high hardness is formed in the inner cavity of the cookware body through high-temperature chelation, so that it has wear-resistant and non-stick characteristics.

[0004] During the manufacturing process of the carbon crystal cookware body, there are still the following disadvantages and deficiencies:

[0005] Carbon crystals are usually mixed with fluid materials to form suspensions and slurries, and then covered on the inner cavity surface of the cookware body; during covering, due to the difficult control of the fluidity of the mixed liquid, it is difficult to apply evenly on the inner cavity of the cookware body with an arc surface, so that the thickness of the carbon crystal layer on the inner cavity surface of the cookware body is uneven after chelation, affecting the use;

[0006] Secondly, the fluid materials mixed with carbon crystals are prone to generate harmful gases at high temperatures, which not only increases the cost of gas treatment but also is not conducive to environmental protection. Summary of the Invention

[0007] The present invention aims at the deficiencies in the prior art and provides a production and processing device for a highly wear-resistant cookware body and its processing technology.

[0008] To solve the above technical problems, the present invention is solved by the following technical solutions: The production and processing technology of a highly wear-resistant cookware body is as follows:

[0009] S1: Form a film into the shape of the inner cavity of the cookware.

[0010] S2: Irradiate the surface of the film with UV light to make the surface of the film carry an electric charge.

[0011] S3: Charge the carbon crystal powder and evenly spray it onto the surface of the film, and the carbon crystal powder is evenly adsorbed on the surface of the film.

[0012] S4: Put the film carrying carbon crystals into the inner cavity of the cookware blank.

[0013] S5: Heat the pot blank to 350 - 550 °C for chelation so that the inner cavity of the pot blank and the carbon crystals on the film are chelated into one body, and the film vaporizes at high temperature.

[0014] In the above solution, preferably, in step S1, the film is a PLA film with a film thickness of 0.1 mm - 1.5 mm.

[0015] In the above solution, preferably, in step S2, the UV light intensity is 280 - 400 nm, and the surface of the film is negatively charged after being irradiated by the UV light.

[0016] In the above solution, preferably, in step S3, a high-voltage electric field is used to impart a positive charge to the carbon crystal powder.

[0017] In the above solution, preferably, in step S1, the film is a PVA film with a film thickness of 0.1 mm - 1 mm.

[0018] In the above solution, preferably, the processing device for producing the high-wear-resistant pot body by the production and processing technology of the pot body includes a chelation seat, a film conveying mechanism, and a film forming seat that is lifted and arranged above the chelation seat;

[0019] The film conveying mechanism drives the film and places it above the chelation seat;

[0020] The chelation seat is provided with a cavity that matches the pot blank and a cutter for cutting the formed film;

[0021] The film forming seat is provided with a number of adsorption holes for adsorbing the cut film;

[0022] A processing unit is slidably arranged on one side of the film forming seat. The processing unit includes a UV tube for irradiating the film and a spraying tube for spraying carbon crystals on the irradiated film.

[0023] In the above solution, preferably, the film forming seat is connected to a lifting seat, and a driving motor for driving the film forming seat to rotate is arranged on the lifting seat.

[0024] In the above solution, preferably, the processing unit includes a processing seat and a driving push rod for driving the processing seat to slide, and the UV tube and the spraying tube are respectively arranged on both sides of the processing seat.

[0025] In the above solution, preferably, the film conveying mechanism includes a film roll arranged on one side of the chelation seat and a traction roll arranged on the other side of the chelation seat, and the traction roll is connected to a traction motor.

[0026] In the above solution, preferably, the cutter is an annular cutter.

[0027] The beneficial effects of the present invention are as follows: The present invention provides a production device and processing technology for a highly wear-resistant carbon crystal pot. By improving the process, that is, through the process of adsorbing carbon crystal particles on the film surface of the forming film and then chelating with the pot blank, the laying uniformity of carbon crystal particles in the pot is improved, and the production quality of the carbon crystal pot is also improved. At the same time, a production and processing device adapted to this process is provided, thereby improving the convenience and continuity of pot production and greatly reducing the gas pollution during the production of conventional carbon crystal pots. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the processing process flow of the present invention.

[0029] Figure 2 It is a schematic diagram of the processing device of the present invention. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0030] The present invention will be further described in detail below in conjunction with the drawings and specific embodiments:

[0031] Example 1: Refer to Figure 1 .

[0032] The production and processing technology of a highly wear-resistant pot body is as follows:

[0033] S1: The thin film is formed into the shape of the inner cavity of the pot, and after the thin film is formed, it is placed in the inner cavity of the pot and fitted thereto;

[0034] S2: The surface of the thin film is irradiated with UV light to make the surface of the thin film carry an electric charge, and the amount of electric charge carried on the surface of the thin film can be adjusted according to different light intensities and thin film thicknesses;

[0035] S3: Charge the carbon crystal powder so that the polarity of the electric charge of the carbon crystal powder is opposite to the polarity of the electric charge on the surface of the thin film, and evenly spray it onto the surface of the thin film. The carbon crystal powder is evenly adsorbed on the surface of the thin film by the attraction of the electric charge polarity;

[0036] S4: The formed thin film carrying carbon crystal is placed in the inner cavity of the pot blank;

[0037] S5: The pot blank is heated to 350 - 550 °C for chelation with the carbon crystal. The inner cavity of the pot blank and the carbon crystal on the thin film are chelated into one body, and the thin film is vaporized at high temperature to form a highly wear-resistant pot body.

[0038] In step S1, the thin film uses a PLA thin film, and the PLA thin film is a polylactic acid thin film. This material of thin film has biodegradability, and the gas generated after it is vaporized at high temperature in step S5 is carbon dioxide and harmless gas, thereby reducing air pollution during the processing. In this embodiment, the thickness range of the PLA thin film is set at 0.1 mm - 1.5 mm, and it can be adjusted adaptively according to the thickness of the carbon crystal layer and the particle size of the carbon crystal powder.

[0039] In step S2, the UV light is ultraviolet light. Under the irradiation of the UV light, free radical reactions on the surface of the PLA film can be initiated. These free radicals can react with oxygen in the air to generate oxygen-containing functional groups such as carbonyl (C=O) and carboxyl (-COOH), thereby making the film surface carry negative charges. In this embodiment, the UV light can be UV-A or UV-B, and its light intensity range is between 280 - 400 nm. After the film is irradiated by the UV light, the surface is endowed with negative charges.

[0040] In step S3, a high-voltage electric field is used to endow the carbon crystal powder with positive charges, that is, the carbon crystal powder carries positive charges after passing through the positive electrode, which is convenient for being attracted by the negative charges on the film surface and uniformly adsorbed on the film surface.

[0041] In step S5, the chelation temperature of the pot blank and the carbon crystal can be set at about 440 °C.

[0042] Embodiment 2: This embodiment improves the film material on the basis of Embodiment 1;

[0043] In step S1 of Embodiment 1, the film uses a PVA film, that is, a polyvinyl alcohol water-soluble film, which decomposes into water and carbon dioxide after being vaporized at high temperature in step S5, thereby reducing air pollution; the film thickness is 0.1 mm - 1 mm, and can be specifically adjusted adaptively according to the carbon crystal layer thickness and the particle size of the carbon crystal powder;

[0044] Free radical reactions on the surface of the PVA film can be initiated by UV irradiation. These free radicals can react with oxygen in the air to form oxygen-containing functional groups (such as -COOH), thereby making the film surface carry negative charges.

[0045] Embodiment 3: Refer to Figure 2 .

[0046] This embodiment is a production and processing device for a highly wear-resistant pot body formed based on the processing technology described in Embodiment 1. Specifically, it includes a chelation seat 1, a film conveying mechanism 2, and a film forming seat 3 that is lifted and arranged above the chelation seat 1.

[0047] A cavity 101 that matches the pot blank is arranged inside the chelation seat 1. The bottom of the pot blank fits with the cavity 101, so that the entire pot blank is placed inside the cavity 101 and kept horizontally fixed.

[0048] The film conveying mechanism 2 includes a film roll 201 arranged on the left side of the chelation seat 1 and a traction roll 202 arranged on the right side of the chelation seat 1. The traction roll 202 is connected to a traction motor. One end of the film on the film roll 201 horizontally extends above the chelation seat 1 and is connected to the traction roll 202. The traction roll 202 is driven to rotate by the traction motor to realize the traction and transmission of the film.

[0049] The film forming seat 3 is vertically and liftably arranged directly above the chelating seat 1, and its upper end face is lifted through the lifting seat 4. That is, the lifting seat 4 is connected with a lifting mechanism, which can adopt pneumatic or electric devices such as lifting push rods, and will not be elaborated here; a driving motor 304 for driving the film forming seat 3 to rotate is arranged on the lifting seat 4. That is, the electrode seat of the driving motor 304 is fixed on the lifting seat 4, and the output shaft end is connected to the film forming seat 3, so as to realize the rotation of the film forming seat 3.

[0050] The outer shape of the film forming seat 3 is adapted to the inner cavity of the pot blank. After the film forming seat 3 slides downward, its outer surface contacts the film above the chelating seat 1, and then the whole film is carried into the inner cavity of the pot blank in the chelating seat 1, so that the film is formed into a shape adapted to the inner cavity of the pot blank; at the same time, an annular cutter 102 is arranged on the outer edge of the upper end face of the chelating seat 1. After the film forming seat 3 fits with the inner cavity of the pot blank, the annular cutter 102 punches and cuts the film.

[0051] A plurality of adsorption holes 301 are evenly arranged around the circumference of the outer edge of the film forming seat 3. The adsorption holes 301 preferably adopt micro suction cups, which are connected to the air source. After the film is cut by the annular cutter 102, the adsorption holes 301 will adsorb the film on the film forming seat 3, and then the whole slides upward to reset.

[0052] A processing unit is slidably arranged on the right side of the film forming seat 3. The processing unit includes a UV tube 302 for irradiating the film and a spraying tube 303 for spraying carbon crystals on the irradiated film. Specifically, the processing unit includes a processing seat 305 and a driving push rod 306 for driving the processing seat 305 to slide. The UV tube 302 is arranged on the right side of the processing seat 305, and the spraying tube 303 is arranged on the left side of the processing seat 305.

[0053] After the film forming seat 3 carries the formed film and slides upward to reset, the driving push rod 306 drives the processing seat 305 to slide leftward, so that the processing seat 305 slides to Figure 2 below the film forming seat 3 as shown. Subsequently, the film forming seat 3 rotates under the drive of the driving motor 304. At the same time, the UV tube is started to irradiate the film on the forming seat. After the forming seat rotates a certain number of turns, the UV tube stops irradiating, and the spraying tube 303 is started. The rotation speed of the film forming seat 3 is increased, and the carbon crystal powder with positive charge is sprayed onto the surface of the film. The negative charge on the film surface adsorbs the positive charge of the carbon crystal powder. According to the adsorption force on the film surface, the excess carbon crystal powder is separated from the film surface due to centrifugal force when the forming seat rotates, so that the carbon crystal powder adsorbed on the film surface is uniform.

[0054] In this embodiment, the outer shape of the UV tube is arranged at an equal distance from the outer surface of the formed film, and preferably half is arranged, so that when the forming seat rotates, the UV light can uniformly irradiate the film surface.

[0055] In this embodiment, the spraying pipe 303 is connected to the electrode reaction pipe. When the carbon crystal powder passes through the electrode reaction pipe, it carries a positive charge and is then evenly ejected by the spraying pipe 303.

[0056] The processing process of processing a highly wear-resistant pot body using this processing device is as follows:

[0057] S1: Place the PLA film roll or PVA film roll at the position of the left film roll of the film conveying mechanism 2, and then horizontally extend one end of the film roll 201 to the right to connect it to the traction roll 202;

[0058] S2: Place the pot blank in the cavity 101, and then start the lifting seat 4 to lower the film forming seat 3. After the film forming seat 3 slides down and contacts the film, both are placed in the inner cavity of the pot blank, and the film is formed into the shape of the inner cavity of the pot blank;

[0059] S3: The outer edge of the film is cut off by the annular cutter, and at the same time, the cut film is adsorbed by the adsorption holes 301 of the film forming seat 3. The film forming seat 3 slides upward, driving the formed film to slide upward synchronously;

[0060] S4: After the film forming seat 3 is reset, drive the push rod 306 to slide to the left, place the processing seat 305 below the film forming seat 3, and then the film forming seat 3 rotates under the drive of the drive motor 304. At the same time, the UV tube is started to irradiate the film on the forming seat;

[0061] S5: After the forming seat rotates a certain number of turns, the UV tube stops irradiating, the spraying pipe 303 is started, the rotation speed of the film forming seat 3 is increased, and the carbon crystal powder with a positive charge is sprayed onto the film surface. The negative charge on the film surface adsorbs the positive charge of the carbon crystal powder. According to the adsorption force on the film surface, the excess carbon crystal powder is separated from the film surface due to centrifugal force during the rotation of the forming seat, so that the carbon crystal powder adsorbed on the film surface is uniform;

[0062] S6: Drive the push rod 306 to drive the processing seat 305 to reset, and then the film forming seat 3 slides downward, fitting the film carrying the carbon crystal particles to the inner cavity of the pot blank, and start the heating component in the chelating seat 1 to heat to 440 °C for chelation;

[0063] S7: The inner cavity of the pot blank and the carbon crystal on the film are chelated into one body, and the film is vaporized at high temperature. After cooling, the production of the carbon crystal wear-resistant cookware is completed.

[0064] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements on some of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the various embodiments of the present invention.

Claims

1. A processing device for producing a pot body using a production process for a high wear-resistant pot body, characterized in that: It comprises a chelating seat (1), a film conveying mechanism (2), and a film forming seat (3) which is lifted and arranged above the chelating seat (1); The film conveying mechanism (2) places the film transmission above the chelating seat (1); The chelating seat (1) is provided with a cavity (101) matching the pot blank and a cutter (102) for cutting the formed film; The film forming seat (3) is provided with a plurality of adsorption holes (301) for adsorbing the cut film; A processing unit is slidably provided on one side of the film forming seat (3), the processing unit comprising a UV tube (302) for irradiating the film and a spraying tube (303) for spraying carbon crystals on the film after irradiation; The film forming seat (3) is connected to a lifting seat (4), and the lifting seat (4) is provided with a driving motor (304) for driving the film forming seat (3) to rotate; The processing technology is as follows: S1: forming the film into the shape of the inner cavity of the pot; S2: Use UV light to irradiate the film surface to give the film surface an electric charge; S3: Charge the carbon crystal powder and spray it evenly on the surface of the film, so that the carbon crystal powder is evenly adsorbed on the surface of the film; S4: placing the film carrying carbon crystals into the inner cavity of the pot blank; S5: The pot blank is heated to 350-550°C for chelation, the inner cavity of the pot blank and the carbon crystals on the film are chelated into one, and the film is vaporized at high temperature.

2. The processing device according to claim 1, characterized in that: The processing unit comprises a processing seat (305) and a driving push rod (306) for driving the processing seat (305) to slide, and the UV tube (302) and the spray tube (303) are respectively arranged on both sides of the processing seat (305).

3. The processing device according to claim 2, characterized in that: The film conveying mechanism (2) comprises a film roll (201) arranged on one side of the chelating seat (1) and a traction roll (202) arranged on the other side of the chelating seat (1); the traction roll (202) is connected to a traction motor.

4. The processing device according to claim 3, characterized in that: The cutter (102) is an annular cutter.

5. The processing device according to claim 1, characterized in that: In step S1, the film is a PLA film with a thickness of 0.1 mm to 1.5 mm.

6. The processing device according to claim 1, characterized in that: In step S2, the UV light intensity is 280-400nm, and the surface of the film is negatively charged after being irradiated by the UV light.

7. The processing device according to claim 6, characterized in that: In step S3, a high voltage electric field is used to impart positive charges to the carbon crystal powder.

8. The processing device according to claim 1, characterized in that: In step S1, the film is a PVA film with a thickness of 0.1 mm to 1 mm.

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