Optimization method and system of opc model, device and storage medium
By combining global and local search algorithms to optimize the nonlinear parameters of the OPC model, the problem of insufficient parameter optimization in the OPC model is solved, the accuracy and reliability of the model are improved, and the effect of optical proximity correction is optimized.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SEMICON MFG INT (SHANGHAI) CORP
- Filing Date
- 2023-06-26
- Publication Date
- 2026-06-30
AI Technical Summary
In the existing technology, the methods for obtaining OPC model parameters still need to be optimized, which leads to a decrease in the accuracy and reliability of the OPC model.
A global search algorithm is used to perform the first search process on the nonlinear parameter, generating multiple first candidate values. A smaller second search range is then set based on these candidate values. A local search algorithm is then used for the second search process. The global and local search algorithms are combined to avoid getting trapped in local optima.
It improves the accuracy and reliability of the OPC model, reduces the amount of computation and shortens the running time, and optimizes the effect of optical proximity correction.
Smart Images

Figure CN119200316B_ABST