An adaptive light pattern generation method under a light manipulation scene

Abstract

The present application relates to a kind of self-adapting light pattern generation methods under light operation scene, comprising: S1, identify multiple targets to be operated under light operation scene, and the starting point position and end point position corresponding to each target;S2, based on preset multi-target path planning method, according to the starting point position and end point position of each target, the light pattern path corresponding to each target is planned, the light pattern path includes the light pattern position point of each target under each light step;S3, under the condition of same light step, if the distance of the light pattern position point of any two targets is less than critical distance, then the intersection part pattern of the light pattern of the two targets is obtained, and the intersection part pattern is corrected;S4, complete the correction processing of the light pattern of target under all light steps, obtain the final generated self-adapting light pattern.The present application solves the problem that the operation reliability of the object to be operated is significantly reduced due to the light pattern generated by the prior art being too close.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of micro-nano operation, and particularly relates to a self-adaptive light pattern generation method in a light operation scenario. BACKGROUND

[0002] Optoelectronic tweezing technology (OET), also known as photoconducting technology or photo-induced dielectrophoresis, is a micro-nano operation technology that uses a photoelectric field to act on an operation target. The technical principle is similar to that of dielectrophoresis, and has the advantages of dielectrophoresis while overcoming the disadvantage that dielectrophoresis is difficult to realize dynamic control. Compared with optical tweezing, the light intensity required for OET control is about five orders of magnitude smaller, which enables OET to control thermosensitive biological samples, and OET has the advantages of high throughput, flexibility and large operation force. Compared with dielectrophoresis technology, OET control does not require the preparation of complex physical microelectrodes, and the virtual electrodes required can be dynamically reconfigured in real time by incident light controlled by a computer. Therefore, OET is widely used in medical and engineering fields such as cell sorting, cell fusion and cell lysis. It can also be used for micro-nano processing operations such as capturing, screening and arranging micro particles of different properties.

[0003] With the development of computer vision and multi-target path planning technology and the application demand for high throughput of micro-nano control technology, the use of OET to realize automatic parallel control of multiple targets has attracted widespread attention. Path planning for multiple target objects is a key link for automatic parallel control, which can provide path information for each control target for subsequent light pattern generation.

[0004] At present, the commonly used target trajectory planning algorithm can still calculate sufficient safety distance between paths at the same time in a wide area scene with few obstacles and few control targets. However, when the number of obstacles or control targets increases, the controllable space area becomes smaller, which can make the calculated paths at the same time too close to each other. For OET control technology, too close distance can cause the controlled objects to be affected by adjacent light patterns and deviate from the original trajectory, resulting in a significant decrease in operation reliability.

[0005] The common solution to the above problem is to increase the safety distance between paths in the input of the path planning algorithm, which can lead to a smaller search space and an increase in solving time, which can result in too low efficiency of the path planning algorithm or even failure to converge within a limited cycle. Therefore, it is urgent to develop a self-adaptive light pattern generation method to realize effective convergence of the algorithm while ensuring operation success rate. SUMMARY

[0006] In view of the above problems, the present application aims to provide a self-adaptive light pattern generation method in a light operation scene, to solve the problem that the operation reliability of the object to be operated is significantly reduced due to the too close distance of the light pattern generated by the prior art.

[0007] To achieve the above-mentioned purpose, the present application adopts the following technical solutions:

[0008] In a first aspect, the present application provides a self-adaptive light pattern generation method in a light operation scene, the method comprising:

[0009] S1, identifying a plurality of objects to be operated in a light operation scene, and the starting point position and the end point position corresponding to each object;

[0010] S2, based on a preset multi-object path planning method, planning a light pattern path corresponding to each object according to the starting point position and the end point position of each object, wherein the light pattern path includes the light pattern position point of each object at each light step;

[0011] S3, under the condition of the same light step, if the distance between the light pattern position points of any two objects is less than a critical distance, the intersection part pattern of the light pattern of the two objects is obtained, and the intersection part pattern is corrected;

[0012] S4, completing the correction processing of the light pattern of the object at all light steps to obtain the finally generated self-adaptive light pattern.

[0013] In an implementation mode, in S1, the plurality of objects to be operated in the light operation scene and the starting point position and the end point position corresponding to each object are identified based on computer vision technology.

[0014] In an implementation mode, the preset multi-object path planning method includes a conflict-based search algorithm, an enhanced conflict search algorithm, or a safety interval path planning algorithm in a dynamic environment.

[0015] In an implementation mode, the light step is a time step divided according to a preset time interval.

[0016] In an implementation mode, the light pattern at each light step includes a closed pattern or a semi-closed pattern.

[0017] The closed pattern includes a circular ring pattern, a triangular pattern, or a square pattern.

[0018] The light patterns of different objects at the same light step are the same pattern or different patterns.

[0019] In an implementation mode, the correction of the intersection part pattern includes:

[0020] The cross part pattern in the two-light pattern is deleted, and a rectangular mask is added in the center line of the two-light pattern.

[0021] The application also provides an adaptive light pattern generation device in a light operation scenario, comprising:

[0022] A recognition module is configured to recognize a plurality of targets to be operated in the light operation scenario, and a start position and an end position corresponding to each target.

[0023] A path planning module is configured to plan a light pattern path corresponding to each target based on a preset multi-target path planning method according to the start position and the end position of each target, wherein the light pattern path comprises a light pattern position point of each target at each light step.

[0024] A correction module is configured to, under the condition of the same light step, if the distance between the light pattern position points of any two targets is less than a critical distance, obtain a cross part pattern of the light pattern of the two targets, and correct the cross part pattern.

[0025] The application also provides a computer readable storage medium storing a computer program, wherein the computer program is executed by a processor to control a device in which the processor is located to implement the adaptive light pattern generation method in a light operation scenario according to the first aspect.

[0026] The technical scheme of the application can enable each annular light pattern to be adaptively reconstructed based on distance information between light patterns, prevent target control failure caused by the intersection between light patterns, greatly improve the success rate of high-throughput parallel control of multiple targets in a narrow area and the algorithm calculation efficiency, and help complete the multi-target parallel automated control task based on the OET. BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 FIG. 1 is a schematic diagram of an OET chip structure in an embodiment of the application;

[0028] Figure 2 FIG. 2 is a flowchart of a multi-target automated control process based on the OET technology in an embodiment of the application;

[0029] Figure 3 FIG. 3 is an experimental diagram of a single annular light pattern capturing a 10-μm-sized PS ball in an embodiment of the application;

[0030] Figure 4 FIG. 4 is an experimental diagram of control failure caused by the intersection between two annular light patterns in an embodiment of the application;

[0031] Figure 5The adaptive light pattern operation experiment diagram is redesigned for the application embodiment;

[0032] Figure 6 The adaptive light pattern design method process schematic diagram is for the application embodiment;

[0033] Figure 7 The adaptive light pattern design method process schematic diagram is for the application embodiment;

[0034] Figure 8 The adaptive light pattern design method process schematic diagram is for the application embodiment;

[0035] Figure 9 The adaptive light pattern design method process schematic diagram is for the application embodiment; DETAILED DESCRIPTION

[0036] In order to make the purpose, technical scheme and advantages of the embodiments of the present application clearer, the technical scheme of the embodiments of the present application will be described clearly and completely below with reference to the drawings of the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. Based on the described embodiments of the present application, all other embodiments obtained by those of ordinary skill in the art belong to the scope of protection of the present application.

[0037] In view of the defects and problems of the prior art, the present application provides an adaptive light pattern generation method in a light operation scene, the method comprising:

[0038] S1, identifying a plurality of to-be-operated targets in a light operation scene, and a start point position and an end point position corresponding to each target;

[0039] S2, based on a preset multi-target path planning method, planning a light pattern path corresponding to each target according to the start point position and the end point position of each target, the light pattern path comprising a light pattern position point of each target at each light step;

[0040] S3, under the condition of the same light step, if the distance between the light pattern position points of any two targets is less than a critical distance, obtaining a cross partial pattern of the light patterns of the two targets, and correcting the cross partial pattern;

[0041] S4, completing the correction processing of the light patterns of the targets at all light steps to obtain a finally generated adaptive light pattern.

[0042] The light pattern in the embodiments of the present application can be a closed pattern or a semi-closed pattern. The closed pattern can include a circular ring, a square or a triangle. In subsequent embodiments of the present application, a circular ring is taken as an example. It can be understood that other patterns are also applicable to the light pattern of the present application. Meanwhile, the light pattern of different targets in the present application can be the same or different.

[0043] The above method flow is described in a more detailed embodiment in combination with the drawings of the present application.

[0044] In order to more clearly illustrate the technical solutions, the optoelectronic tweezers technology is first explained.

[0045] The optoelectronic tweezers technology not only shows significant performance in cluster manipulation, but also can perform differential control on each individual target, and has unique advantages in automatic parallel manipulation of multiple target particles. Since the optoelectronic tweezers technology is different from the uniform operation form of acoustic field, magnetic field and the like, it has the flexibility feature, and the personalized operation of multiple targets can be realized at the same time (each target independently performs different manipulation modes) by using the optoelectronic tweezers technology, and the manipulation light pattern outside the safe distance does not interfere with the controlled object. Therefore, the optoelectronic tweezers technology is more suitable for high-throughput parallel operation of multiple targets. The spatial non-uniform electric field generated by light induction interacts with the particles suspended in the liquid medium, and induces repulsive force (negative DEP force) or attractive force (positive DEP force), which depends on the Clausius-Mossotti (CM) factor of the system. In the actual operation process, the corresponding operation scheme needs to be formulated according to the voltage frequency and the dielectric properties of the material. The related work of the present application is based on the case of repulsive force (negative DEP force).

[0046] The automatic manipulation of multiple targets based on the optoelectronic tweezers (OET) technology usually needs the following three processes: 1) target object identification and positioning: the accurate position information of each target object, obstacle and terminal point in the scene captured by the camera is obtained by using an image recognition algorithm. 2) multi-target path planning: the position information of each target object is input into a multi-target path planning algorithm as the starting point coordinates and the corresponding terminal point coordinate information to calculate the path of each target object from the starting point to the terminal point. 3) drawing light pattern and projection: according to the path result, the corresponding light pattern is drawn for each target object at the coordinate position of the target object at each time step (in this paper, the object subjected to negative dielectrophoresis force is taken as an example, and a circular ring light pattern is usually used to capture the corresponding target particles, as shown in FIG. 1B, of course, in other embodiments, a triangle or other pattern can be used), and after the corresponding light pattern is generated, the sequence light pattern is projected by a projector to realize the parallel automatic manipulation of multiple target objects. The flow chart of the automatic manipulation of multiple targets based on the optoelectronic tweezers (OET) technology is shown in FIG. 2. Figure 1 Figure 2 ​The flowchart in the black dashed box is the focus of the present application, namely the adaptive light pattern generation strategy part.

[0047] However, the diameter of the ring light pattern used to manipulate the target object in the actual operation process is usually between 5 to 10 times the diameter of the target object to be manipulated, and when the distance between the two paths is close at the same time, the controlled object will be affected (attracted or repelled) by the adjacent manipulation light pattern, thereby deviating from the original trajectory, resulting in operation failure. A common solution is to use the outer diameter of the ring light pattern as a safety distance in the path planning algorithm to keep a sufficient distance between each light pattern to prevent intersection, but increasing the algorithm safety distance will make the algorithm more difficult to converge, which is particularly evident in narrow space multi-target planning tasks. Therefore, a scheme for realizing high-throughput parallel operation of multiple targets based on the optical tweezers technology needs to be proposed.

[0048] The method provided in the present application can ensure that the manipulation process caused by the intersection of light patterns due to the too close distance between light patterns will not fail. The unique feature is that it considers the influence of the distance between different light patterns on the parallel manipulation of multiple targets. And when the distance between two adjacent light patterns is too small to cause the intersection of light patterns, the light pattern is redesigned. This innovative design not only improves the capture rate of the target under multi-target parallel manipulation, but also improves the space utilization in the limited space at the micro-nano scale, providing an effective light pattern design method for the parallel manipulation of multiple targets by optical tweezers.

[0049] In order to achieve the above purpose, the present application proposes an adaptive light pattern generation method. Specifically as follows:

[0050] The core of the adaptive pattern design method for the manipulation of multiple targets by optical tweezers is that when the distance between two target objects at the same time is less than the critical distance d c of the intersection of two patterns, the part of the light pattern is redesigned to achieve the effect that the new light pattern can stably capture the target object.

[0051] The original light pattern is a ring light pattern. As Figure 3 shown, the light pattern is used to capture the target object and perform related manipulation experiments in the case of negative dielectrophoresis force in the optical tweezers technology. The inner diameter and outer diameter are represented by r in and r out .

[0052] The two adjacent light patterns intersect. As Figure 4 shown, the too close distance between the light patterns (specifically shown as the left 1 and left 2 ring) causes the intersection between the two light patterns, which in turn causes the controlled target to lose manipulation. The light pattern that does not produce intersection ensures the stable manipulation of the controlled target.

[0053] The redesigned light pattern. For example... Figure 5 As shown, the distance between the two light patterns is less than the critical distance d at this time. c The optimized design of the light pattern enables the redesigned light pattern to maintain stable control over the target even at close range.

[0054] Compared with the prior art, the present invention has the following obvious and prominent substantive features and significant advantages:

[0055] (1) Distance detection mechanism between target objects: The distance detection module between target objects provides the coordinate information of the light pattern that needs to be redesigned for the adaptive light pattern. This module first obtains the coordinates of all target objects at the same time and calculates the distance between any two target objects and the critical distance d that intersects with the light pattern. c The comparison will determine whether to redesign the light pattern.

[0056] (2) Adaptive Light Pattern Design Module: The adaptive light pattern design module ensures that the distance between two target objects at the same moment is less than the critical distance d for light pattern intersection. c The pattern was then redesigned. This method removed the intersecting portions of the two light patterns and added a rectangular mask along the center line of the two light patterns to ensure effective manipulation of the target object. This method leverages the flexibility of light and has the following advantages: it solves the problem of manipulation failure caused by the intersection of light patterns while improving the space utilization efficiency of multi-target manipulation with photoelectric tweezers; at the same time, this design method allows for a lower collision radius in the multi-target path planning algorithm, thereby improving the computational efficiency of the path planning algorithm.

[0057] This application relates to an adaptive light pattern design method for multi-target manipulation with optoelectronic tweezers. First, it is necessary to determine the intersection of light patterns and their specific parameters. The manipulated target is a 10 μm diameter polystyrene (PS) microsphere, which is subjected to a negative DEP force under manipulation conditions and is repelled by light. Figure 6 (a) Simulates the case where two circular light patterns are at a critical distance without intersecting, where the critical distance d is... c =r in +r out T represents the thickness of the circular light pattern, the thickness of which is used to ensure a sufficiently large driving force on the manipulated object. Then, a simulation of the intersection of the two light patterns is performed, such as... Figure 6 As shown in (b), the distance d between the two light patterns is less than the critical distance dc at this time. c L s L is used to represent the size of the space within the circular light pattern used to manipulate the target object. When there is no intersection between the light patterns, L s =2r in As the intersection between the two light patterns becomes increasingly severe, Ls The value will continuously decrease, eventually leading to a loss of control over the target object. Without using adaptive light pattern design, the distance d between the two light patterns... <d c At that time, there was L s =dT.

[0058] The adaptive light pattern design method redesigns the light pattern at intersections, as follows: Figure 6 As shown in (c)(d) Figure 6 (c) describes the process of clearing all light patterns inside the inner diameter circle of each annular light pattern. This operation clears the part where the two light patterns intersect, preventing the intersecting light patterns from encroaching on the control space area of ​​the original light pattern (the arc-shaped dashed part represents the part where the two light patterns intersect). Figure 6 (d) illustrates the process of adding a rectangular mask light pattern at the center line of the two light patterns. This step ensures that the two light patterns have their own independent control areas, preventing two target objects from entering the same control area and causing control failure. This is the redesigned adaptive light pattern, in which case L... s =r in +0.5(dT), at this point the adaptive control space size is greater than the control space size when the original light pattern intersects.

[0059] Therefore, the process of redesigning the intersection portion in the embodiments of this application can be summarized as follows:

[0060] ① Identify the positions of the light patterns of the two targets in the current optical step;

[0061] ② Draw the midline of the line connecting the two targets;

[0062] ③ Retain the portion of the graphic extending outwards from the median line of both targets. That is, for target A, retain the portion of the original graphic of target A extending to the median line; for target B, retain the portion of the graphic of target B extending to the median line.

[0063] ④ Connect the midline to separate targets A and B.

[0064] Figure 7 This indicates the design of the original pattern and the adaptive light pattern. s Curve varying with d (with the inner diameter r of the light pattern) in Taking a light pattern with a diameter of 22 μm and a thickness T of 10 μm as an example, this figure shows that when the two light patterns are at the same distance d, the adaptive light pattern design method has a larger control space L than the original pattern design method. s This demonstrates the superiority of the adaptive light pattern design method.

[0065] The above examples are illustrated by taking the circular ring pattern as an example. In addition to the circular ring light pattern, the design method of the median line segmentation completion summarized above can also be applied to triangular light groups and rectangular light groups. Moreover, different target light patterns can be the same or different. Specifically in Figure 8 In the accompanying drawings, a combined schematic diagram of triangular and circular ring light patterns is provided. The specific process can refer to the description of the circular ring part, and the principle can be analogized.

[0066] The following two examples are verified:

[0067] Example 1:

[0068] Simulation verification of two target encounters

[0069] (1) Simulation process:

[0070] Single simulation process: Set a map of 348*192 size, set ten target endpoints on the map, randomly set obstacles, and randomly set ten particles, each of which corresponds to a different target endpoint. After setting, input the map information into the simulation program to run two path planning algorithms using the adaptive light pattern generation strategy and not using the adaptive light pattern generation strategy to calculate the path.

[0071] Multiple simulations to obtain accurate results: When setting obstacles, make the number of obstacles small and the distance between obstacles far apart (the distance is 3 to 4 times the diameter of the light pattern), repeat the single simulation process ten times and record the number of path conflicts in each simulation; When setting obstacles, make the number of obstacles large and the distance between obstacles close (the distance is 1 to 2 times the diameter of the light pattern), repeat the single simulation process ten times and record the number of path conflicts in each simulation. With this step, explore whether to use the adaptive light pattern generation strategy to simulate the calculation of the path conflict number of the path of ten particles in the path planning process under different obstacle distributions in the map.

[0072] Finally, the data results are recorded in a table, as shown in Table 1.

[0073]

[0074] Table 1

[0075] (2) Simulation results:

[0076] As can be seen from Table 1, the number of path conflicts using the adaptive light pattern generation strategy for path planning is always less than that without using the adaptive light pattern generation strategy. Generally, the more the number of path conflicts, the more the number of times and time required for repeated operation of the path planning program, and the higher the probability of failure of the particles losing control, so using the adaptive light pattern generation strategy for path planning is always a better method. And as shown in Table 1, in the usual case where the path has a solution, when there are more obstacles in the map and the distance between the obstacles is close, the difference in the number of path conflicts between the two methods is larger on average, and the advantage of using the adaptive light pattern generation strategy for path planning will be further magnified. The simulation results can effectively reflect the advantages and beneficial effects of the present application in improving the success rate of high-throughput parallel control of multiple targets and the efficiency of the algorithm.

[0077] (3) Process example

[0078] When the distance between obstacles is close (2 times the target diameter), as shown in Figure 9 At time t1, the two target trajectories are closest, and if the adaptive light pattern generation strategy is not used, it will cause the light patterns between different targets to squeeze each other, eventually causing the targets to "fly off" and lose control. For this case, the safety distance of the algorithm needs to be appropriately increased to reduce efficiency.

[0079] For the case of using the adaptive light pattern generation strategy, the smooth progress of control can be ensured without increasing the safety distance of the algorithm.

[0080] Example 2:

[0081] Adaptive light pattern generation strategy for multiple targets meeting each other

[0082] For the case of multiple targets meeting each other, it can be abstracted as the superposition of several groups of two targets meeting (refer to Embodiment One) and several targets meeting each other. Therefore, this embodiment describes the strategy for the case of multiple targets meeting each other.

[0083] Assume that n targets in the operation space meet each other (light patterns superimposed) at a certain time, for convenience of description, abstract the light pattern into a line with thickness, then for a light pattern i, the outer circle radius R i of the light pattern can be calculated as follows:

[0084] R i = r i +T (1)

[0085] Where r i is the inner diameter of the outer circle of the light pattern, and T is the line width of the line of the light pattern.

[0086] After abstracting into a line, first, the coordinates (X FY F ), take X F for example, can be calculated by the following formula:

[0087]

[0088] Wherein, X i is the centroid horizontal coordinate of the i-th pattern.

[0089] Similarly, the vertical coordinate Y F of the focus F can be calculated.

[0090] For the case of n targets meeting each other, it is necessary to find n graphic intersection points farthest from the focus F, connect the n points with the focus, and then fill the outer circle, which is the adaptive light pattern generation strategy of the present application for the case of n targets meeting each other.

[0091] In summary, the present application proposes a multi-target high-throughput parallel light manipulation scheme based on adaptive light pattern generation strategy. This design method can make each circular light pattern adaptively reconstruct according to the distance information between light patterns, prevent the target manipulation failure problem caused by the intersection between light patterns, greatly improve the success rate of high-throughput parallel control of multiple targets in a narrow area and the algorithm calculation efficiency, and help to complete the multi-target parallel automatic manipulation task based on the optical tweezers. This innovative technology not only plays the flexibility of the optical tweezers technology "light" manipulation, but also provides an effective light pattern generation method for multi-target parallel automatic manipulation based on optical tweezers.

[0092] In several embodiments provided by the present application, it should be understood that the disclosed method can be implemented in other ways. For example, the above-described device embodiments are only schematic, for example, the division of the above-mentioned units is only a logical function division, and actual implementation can have another division manner, for example, a plurality of units or components can be combined or integrated into another system, or some features can be ignored or not executed. In addition, the coupling or direct coupling or communication connection between the displayed or discussed each other can be indirect coupling or communication connection through some interface, device or unit, which can be electrical, mechanical or other forms.

[0093] The integrated unit in the form of software function unit can be stored in a computer readable storage medium. The software function unit is stored in a storage medium, and includes a plurality of instructions for enabling a computer device (which can be a personal computer, a server, or a network device, etc.) or a processor to execute part of steps of the method according to the embodiments of the present application. The storage medium includes a U disk, a mobile hard disk, a read-only memory (ROM), a random access memory (RAM), a magnetic disk or an optical disk, and various storage medium capable of storing program codes.

[0094] The above merely describes the preferred embodiments of the present application, and is not intended to limit the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A method for generating adaptive light patterns in a light-operated scenario, characterized in that, The method includes: S1 identifies multiple targets to be operated on in a light operation scenario, as well as the start and end positions of each target; S2, based on a preset multi-target path planning method, according to the starting position and ending position of each target, a light pattern path corresponding to each target is planned. The light pattern path includes the light pattern position points of each target in each light step. S3, under the condition of the same optical step, if the distance between the position points of the optical patterns of any two targets is less than the critical distance, then the intersection pattern of the optical patterns of the two targets is obtained, and the intersection pattern is corrected. Specifically, this includes: first, obtaining the coordinates of all targets at the same time with the same optical step, calculating the distance between any two targets, and comparing it with the critical distance at which the light pattern intersects to determine whether to make corrections; The correction includes: deleting the intersecting portions of the light patterns of the two targets and re-adding a rectangular mask along the center line of the two light patterns; S4 completes the correction processing of the target's light pattern under all light steps, and obtains the final generated adaptive light pattern.

2. The adaptive light pattern generation method in a light-operated scenario according to claim 1, characterized in that, In step S1, multiple targets to be operated on in the light operation scenario are identified based on computer vision technology, as well as the starting position and ending position of each target.

3. The adaptive light pattern generation method in a light-operated scenario according to claim 1, characterized in that, The preset multi-objective path planning method includes: a conflict-based search algorithm, an enhanced conflict search algorithm, or a safe interval path planning algorithm in a dynamic environment.

4. The adaptive light pattern generation method in a light-operated scenario according to claim 1, characterized in that, The optical step is a time step divided according to a preset time interval.

5. The adaptive light pattern generation method in a light-operated scenario according to claim 4, characterized in that, The light pattern under each light step - including closed or semi-closed patterns; The sealed pattern includes a circular pattern, a triangular pattern, or a square pattern; Different targets may have the same light pattern or different light patterns at the same light step.

6. An adaptive light pattern generation device for light manipulation scenarios, characterized in that, include: The recognition module is used to identify multiple targets to be operated on in a light operation scenario, as well as the start and end positions of each target. The path planning module is used to plan the light pattern path corresponding to each target based on a preset multi-target path planning method, according to the starting position and ending position of each target. The light pattern path includes the light pattern position points of each target in each light step. The correction module is used to obtain the intersection pattern of the light patterns of the two targets if the distance between the light pattern positions of any two targets is less than the critical distance under the same light step condition, and to correct the intersection pattern. After completing the correction processing of the light patterns of the targets under all light steps, the final generated adaptive light pattern is obtained. The correction module is used to obtain the coordinates of all targets at the same time of the same optical step, calculate the distance between any two targets, and compare it with the critical distance at which the optical pattern intersects to determine whether to make a correction. The correction includes: deleting the intersecting portions of the light patterns of the two targets and re-adding a rectangular mask along the center line of the two light patterns.

7. A computer-readable storage medium, characterized in that, The device contains a computer program that is executed by a processor to control the device where the processor is located to implement the adaptive light pattern generation method for light operation scenarios as described in any one of claims 1 to 5.

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