Photovoltaic silicon wafer drying device for photovoltaic cell

Abstract

The application belongs to the technical field of silicon wafer processing, and specifically relates to a photovoltaic silicon wafer drying device for photovoltaic cell wafers, which comprises a machine box, a control unit is arranged on one side of the top of the machine box, an adjusting unit is arranged on the side of the control unit close to the center line of the machine box, and a drying unit is arranged on one side in the machine box; the cooperation between the segmented columns and the connecting rods is that the split and combined seats at different positions slide under the guidance of the notched frame, the sliding distance of the split and combined seats linearly increases or decreases in unit time, the reserved vertical space of the silicon wafers to be cleaned between the adjacent holding plates is adjusted, the mobility of the silicon wafers to be cleaned in the cleaning liquid is increased, the flowability and the interaction disorder between the silicon wafers to be cleaned and the cleaning liquid are improved, and the impact force of the bubbles generated by the ultrasonic cavitation effect at the moment of expansion or shrinkage of the bubbles on the surface of the silicon wafers to be cleaned is strengthened to some extent, and then the cleaning effect on the silicon wafers to be cleaned is improved.

Description

Technical Field

[0001] This invention belongs to the field of silicon wafer processing technology, and specifically relates to a photovoltaic silicon wafer drying device for photovoltaic cells. Background Technology

[0002] Silicon wafer cleaning: a crucial step in photovoltaic cell production, even minute amounts of contamination can lead to device failure;

[0003] The purpose of cleaning is to remove surface contaminants and impurities, including organic and inorganic substances. Some of these impurities exist in an atomic or ionic state, while others exist on the silicon wafer surface in the form of thin films or particles.

[0004] Organic contaminants include photoresist, organic solvent residues, and synthetic waxes, as well as grease or fibers from human contact with devices, tools, and utensils; inorganic contaminants include heavy metals such as gold, copper, iron, and chromium, which seriously affect minority carrier lifetime and surface conductivity; particulate contaminants include silicon slag, dust, bacteria, microorganisms, and organic colloidal fibers; and there are two methods for removing contaminants: physical cleaning and chemical cleaning.

[0005] Drying purpose: To evaporate residual water stains on the silicon wafer surface, reducing the irreversible impact of moisture on subsequent photolithography, boron diffusion, alkaline polishing, positive etching, and thin film coating, thus reducing production costs; Drying methods: rotary drying, evaporative drying, IPA drying, etc.

[0006] However, there are several problems with cleaning and drying photovoltaic silicon wafers:

[0007] 1. For photovoltaic silicon wafers, the traditional physical cleaning method usually involves placing a certain amount of silicon wafers into a basket, and then moving the basket into an ultrasonic cleaner using a suspension device. This method utilizes the cavitation effect generated by ultrasonic waves during liquid vibration to cause the liquid around the silicon wafer to expand or contract rapidly, thereby peeling off organic or inorganic impurities adhering to the surface of the silicon wafer and achieving the effect of cleaning the silicon wafer surface. However, the above method has the problem of the invariance of the space between adjacent positions of the silicon wafers to be cleaned inside the basket. The fixed property of the reserved space between adjacent silicon wafers inside the basket limits the disorder of liquid flow and the ultrasonic cavitation effect to a certain extent, thus reducing the cleaning effect of ultrasonic waves on impurities on the surface of the silicon wafer.

[0008] In addition, before the silicon wafers in the basket are removed from the ultrasonic cleaner, they are usually rinsed by a spray device to further reduce the residual rate of impurities on the surface of the silicon wafers. However, due to the limited space between the silicon wafers inside the basket, during the high-pressure spraying process, impurity particles on the surface of the silicon wafers may scratch the surface of the silicon wafers in adjacent baskets, thereby damaging the integrity and usability of the silicon wafers.

[0009] 2. Traditional rotary drying methods typically use a rotating support to fix silicon wafers in their corresponding positions one by one. Then, the water stains on the surface of the silicon wafers are removed and dried by the slinging force generated by the rotation. However, after cleaning, there may still be some particulate impurities on the surface of the silicon wafers. Therefore, during the rotation process, the particulate impurities on the end face of the silicon wafers may scratch the surface of adjacent silicon wafers during the sputtering process. At the same time, the residual impurities may further affect the molding of the finished photovoltaic cells under the drying and curing process. Summary of the Invention

[0010] The purpose of this invention is to provide a photovoltaic silicon wafer drying device for photovoltaic cells, thereby achieving regional cleaning and drying of multiple photovoltaic silicon wafers and avoiding the problem of silicon wafer surface scratches caused by solid particulate sputtering during traditional integrated cleaning and drying processes.

[0011] To achieve the above objectives, the present invention adopts the following technical solution: a photovoltaic silicon wafer drying device for photovoltaic cells, comprising a chassis, the chassis being a rectangular frame structure, a control unit being provided on one side of the top of the chassis, an adjustment unit being provided on the side of the control unit near the center line of the chassis, a washing unit being provided on the side of the adjustment unit away from the control unit, spraying units being provided on both sides of the washing unit, and a drying unit being provided on one side inside the chassis.

[0012] The drying unit includes:

[0013] The corner gasket has an L-shaped cross-section and can be detachably installed on one side of the top end face of the chassis using bolts.

[0014] The straight plate has an L-shaped cross-section and is installed at one end of the vertical section of the corner pad by inserting a mounting bracket.

[0015] The water distribution channel is located in the middle of the horizontal section of the straight slab.

[0016] The base plate, at least one, is slidably snapped into place and installed in the middle of the end face of the straight plate near the corner gasket, and is directly opposite to the water distribution trough;

[0017] The plate is installed on the end face of the horizontal section of the straight plate near the corner pad by sliding snap-fit, and corresponds one-to-one with the base plate;

[0018] The upright plate is snapped onto the bottom plate at one end near the center line of the straight plate.

[0019] The vertical plate is snapped onto the end of the panel closest to the vertical plate.

[0020] The chain plates are respectively snapped and installed in the middle of the end face of the base plate and the plate away from the corner pad, and the chain plates are slidably snapped and installed with the horizontal section of the straight plate;

[0021] The screw is rotatably mounted on the end face of the straight plate away from the corner gasket via an ear seat, and is located on the side of the water distribution trough; the screw and the chain plate are threadedly mounted, and the threaded engagement direction between the chain plate and the screw at the corresponding positions of the base plate and the plate is opposite.

[0022] Preferably, a micro motor is mounted on the end face of the upright plate near the center line of the base plate via a mounting plate. The output end of the micro motor is mounted with a vertical rod that is rotatably mounted on the upright plate. An air plug is mounted in a through-type rotatable configuration at the middle position of the end of the upright plate away from the base plate. Gears that mesh with each other are fixedly mounted on the outer wall of the end of the air plug near the micro motor and the outer wall of the vertical rod. A locking ring coaxially distributed with the air plug is mounted on the end face of the upright plate away from the micro motor. An air inlet valve pipe is rotatably mounted on the end of the air plug away from the locking ring via an insertion method. An air guide pipe is mounted on the air inlet end of the air inlet valve pipe. A horizontal air pump fixedly connected to the base plate is mounted on the air inlet end of the air guide pipe. A bracket that is mounted on the upright plate is mounted on the outer wall of the end of the air plug near the air inlet valve pipe.

[0023] Preferably, a fitting plate is slidably installed at the middle position of the end face of the vertical plate away from the upright plate. An angle shovel, which is slidably snapped into the vertical plate, is fixedly installed at the end of the fitting plate away from the center line of the plate via a transition shaft. An L-shaped plate is symmetrically installed and snapped into the end face of the vertical plate near the upright plate. At least one nozzle is installed in an array on the vertical section of the L-shaped plate on one side, with the liquid outlet end of the nozzle facing the angle shovel. Three support columns are installed in an array on the vertical section of the L-shaped plate on the other side. A side guard plate, which is snapped into the vertical plate, is inserted at the end of the three support columns away from the nozzle. A wedge plate is snapped into the end of the three support columns near the nozzle, with the wedge plate facing the angle shovel. An air blowing plate is snapped into the end of the wedge plate away from the vertical plate, and a heat-conducting plate is snapped into the other end of the wedge plate away from the vertical plate.

[0024] Preferably, the vertical end face of the chassis is rotatably fitted with cabinet doors to isolate the internal space of the chassis from the external space. A processing chamber is set at the top of the chassis, and a protective plate is inserted and installed inside the processing chamber. The control unit, adjustment unit, washing unit and drying unit are respectively located in the processing chamber area on both sides of the protective plate. Casters are detachably installed at the four corners of the bottom of the chassis. An integrated electrical box is set at one end of the chassis, and a water tank is set at the other end of the chassis and snapped onto the outer wall of the processing chamber. A water pump that works with the water tank is set inside the chassis.

[0025] Preferably, the control unit includes:

[0026] The transverse beam is installed on the top end face of the chassis via a sliding snap-fit ​​connection;

[0027] Two electric telescopic rods are installed symmetrically and interlocked on the end face of the horizontal section of the crossbeam near the chassis.

[0028] A steel lining plate, one in number, is snapped onto the end of the electric telescopic pole near the housing;

[0029] The stepper motor is mounted on the steel liner plate at the middle position on the side of the steel liner plate away from the chassis via a mounting plate, and the output shaft of the stepper motor passes through the steel liner plate;

[0030] The middle support plate is fixedly installed at the output shaft end of the stepper motor and is rotatably fitted with the steel liner plate;

[0031] The notched bracket is detachably installed on the end face of the middle support plate away from the electric telescopic rod by bolts.

[0032] One end rod is installed between the vertical sections of the notch frame in a rotatable fit.

[0033] Segmented columns, at least one, are fixedly installed on the outer wall of the end bar in an even array;

[0034] The connecting rod is slidably installed on the outer wall of the segmented column.

[0035] Preferably, the adjustment unit includes:

[0036] The split-joint seat is snapped onto the end of the connecting rod furthest from the segment column.

[0037] The mouth brackets are installed in pairs, symmetrically, on the end face of the splitting seat away from the segment column;

[0038] A two-way lead screw is rotatably mounted at one end of two mortise and tenon joints;

[0039] The guide rod is rotatably fitted onto the other end of the two mortise holders;

[0040] The coupling plates are arranged in pairs and symmetrically between the coupling plates in one group. The coupling plates are installed in both a two-way screw thread engagement and a guide rod sliding engagement engagement.

[0041] The screw cap is fixedly installed at one end of the bidirectional lead screw.

[0042] Preferably, the washing unit includes:

[0043] The hangers are installed in pairs, and are slidably snapped together at the end of each of the split seats away from the connecting rod. The hangers are also installed in a through-type snap-fit ​​with the corresponding splicing plates.

[0044] Angle plates, two in a group, are symmetrically snapped onto the outer wall of the end of the hanger rod away from the split-joint seat;

[0045] The strip plate is snap-fitted onto the end of the hanger rod away from the splitting seat, and the same angle plate is snap-fitted together for installation.

[0046] The long-end buckles are plugged into both ends of the strip and are arranged in groups of four, symmetrically distributed in pairs.

[0047] The protective plates are arranged in pairs, symmetrically on the side of each strip away from the corner plate, and are installed by snap-fitting with the long end buckle;

[0048] The pivot pin is snap-fitted and installed on the end face of the retaining plate on one side near the center line of the splitting seat, and its distribution trajectory is arc-shaped;

[0049] The joint groove is opened on the end face of the other side of the retaining plate near the center line of the splitting seat, and there is a one-to-one correspondence between the shaft posts.

[0050] Preferably, the spray unit includes:

[0051] There are two side panels. One side panel is fixedly installed in the middle of one side inner wall of the processing chamber, and the other side panel is fixedly installed in the middle of one end face of the partition plate. The two side panels are set directly opposite each other.

[0052] The blow valves are sequentially snapped onto the end face of the side panel near the middle of the processing chamber.

[0053] The nozzles are evenly spaced at the end of the blow valve away from the side plate, and are arc-shaped.

[0054] The spoiler is snapped onto the top of one side of the side panel of the blow valve unit.

[0055] Preferably, the vertical distance between the upright plate and the vertical plate is greater than the vertical distance between the two oppositely distributed support plates, and the reserved vertical distance between the two support plates on the same side is less than the width of the water distribution channel.

[0056] Preferably, the outer wall of the segmented column is provided with a spiral groove, and the spiral groove is slidably engaged with the connecting rod. In addition, the pitch of the spiral grooves on the outer wall of the segmented column at different positions increases or decreases linearly, and the spiral grooves on the outer wall of the segmented column at one end have the opposite rotation direction to those at other positions. The cross-sectional shape of the corner shovel at the end away from the fitting plate is an isosceles right trapezoid, and one end of the corner shovel is wedge-shaped.

[0057] A method for integrated cleaning and drying of photovoltaic cells, using the aforementioned photovoltaic silicon wafer drying device for testing, includes the following specific steps:

[0058] S1: First, the steel lining plate is moved towards the bottom wall of the treatment chamber by the electric telescopic rod until the top of the protective plate is completely immersed in the cleaning liquid inside the treatment chamber. Then, by rotating the end rod, the segmented column and the connecting rod are moved to each other until the splitting seat moves the hanging rod to different positions.

[0059] S2: Then, the electric telescopic rod drives the protective plate to move away from the bottom wall of the processing chamber. During this process, the protective plate moves relative to the spray valve, and the spray valve sprays the protective plate and the silicon wafer end face for further supplementary spraying.

[0060] S2: Finally, the silicon wafer is positioned by adsorbing it with an air plug, and the air plug is driven to rotate by a gear. At the same time, the corner spatula is driven to move up and down by the interlocking plate. During this time, the rotating silicon wafer is constantly scraped relative to the corner spatula. In addition, IPA solution for accelerating drying, cooling and cleaning is sprayed onto the corner spatula and silicon wafer processing area through a nozzle to fully ensure the cleanliness of the silicon wafer end face. The silicon wafer end face is quickly dried by hot air through the combination of air blowing plate and heat conduction plate.

[0061] The present invention has the following beneficial effects:

[0062] 1. This invention controls the sliding of the split-and-joint seats at different positions under the guidance of the notch frame, by adjusting the reserved vertical space between adjacent holding plates, thereby increasing the mobility of the silicon wafers to be cleaned in the cleaning liquid, improving the fluidity and disorder of the interaction between the silicon wafers and the cleaning liquid, and to a certain extent strengthening the impact force between the expansion or contraction of bubbles generated by ultrasonic cavitation on the surface of the silicon wafers to be cleaned, thereby improving the cleaning effect on the silicon wafers to be cleaned.

[0063] 2. This invention controls the vertical distance between adjacent silicon wafers to be cleaned by rotating the end rod, which reduces the probability of impurities on the silicon wafer surface sputtering onto the end faces of adjacent silicon wafers to a certain extent, thereby reducing the probability of scratches on the end faces of adjacent silicon wafers. This helps to improve the integrity and usability of the silicon wafers, while reducing production and manufacturing costs. At the same time, it can improve the contact between the holding plate, hanging rod, strip plate and shaft column and the spraying equipment, which helps to improve the cleanliness of the spraying equipment itself, thereby indirectly improving the cleanliness of the silicon wafers after cleaning.

[0064] 3. The present invention fully ensures the positive unity and stability between the fluid and the washing unit by using the inclined spray valve and the arc-shaped spray nozzle. At the same time, the baffle plate improves the integrity of the spray valve on the washing unit components while reducing the sputtering area and ensuring the cleanliness of the silicon wafer surface.

[0065] 4. This invention uses a horizontal air pump to draw and exchange air, thereby controlling the air plug to adsorb and position the silicon wafer in real time. Subsequently, the corner scraper is controlled by a mating plate to perform a feeding motion. During this process, the air plug drives the silicon wafer to rotate under the control of gears. At this time, the corner scraper performing the feeding motion has relative motion with the rotating silicon wafer, thereby realizing the progressive scraping of impurities on the end face of the silicon wafer by the corner scraper. On the one hand, it helps to improve the cleanliness of the end face of the silicon wafer; on the other hand, the progressive motion can enhance the scraping ability of the corner scraper to remove impurities on the end face of the silicon wafer, while reducing the probability of corner scraper chipping and silicon wafer end face cracking.

[0066] 5. This invention dries silicon wafers through regionalized management. Specifically, it uses vertical plates and partitions to separate the interaction space between the corner scraper and the silicon wafer and the outside world, avoiding the impact of particulate impurities sputtering on the end faces of adjacent silicon wafers during the corner scraping and silicon wafer rotation process. At the same time, it uses IPA spraying combined with hot air drying to efficiently dry the silicon wafers. Specifically, it uses air blowing plates to blow IPA vapor towards the outer periphery of the silicon wafer, thereby generating Marangoni force on the silicon wafer and achieving spin drying. Attached Figure Description

[0067] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0068] Figure 2 This is an appendix to the present invention. Figure 1 Top view of the structure;

[0069] Figure 3 This is an appendix to the present invention. Figure 1 Front view of the central structure (some cabinet doors omitted);

[0070] Figure 4 This is a three-dimensional view of a partial structure of the control unit, adjustment unit, and washing unit of the present invention;

[0071] Figure 5 This is an appendix to the present invention. Figure 4 Left view of the middle structure;

[0072] Figure 6 This is a three-dimensional structural diagram of the adjustment unit and washing unit of the present invention;

[0073] Figure 7 This is an appendix to the present invention. Figure 6 Enlarged schematic diagram of a partial structure at point A in the middle;

[0074] Figure 8 This is a three-dimensional structural diagram of the spray unit of the present invention;

[0075] Figure 9 This is a three-dimensional structural diagram of the drying unit of the present invention;

[0076] Figure 10 This is a three-dimensional view of a partial structure of the drying unit of the present invention;

[0077] Figure 11 This is an appendix to the present invention. Figure 10 Front view of the middle structure (with added screw and chain plate);

[0078] Figure 12 This is a three-dimensional view of another part of the drying unit of the present invention;

[0079] Figure 13 This is an appendix to the present invention. Figure 12 Another perspective view of the structure.

[0080] The diagram shows: 1. Chassis; 2. Control unit; 3. Adjustment unit; 4. Washing unit; 5. Spraying unit; 6. Drying unit.

[0081] 11. Cabinet door; 12. Processing chamber; 13. Partition panel; 14. Casters; 15. Integrated electrical box; 16. Water tank; 17. Water pump;

[0082] 21. Crossbeam; 22. Electric telescopic pole; 23. Steel lining plate; 24. Stepper motor; 25. Central support plate; 26. Notch frame; 27. End pole; 28. Segmented column; 29. ​​Connecting pole;

[0083] 31. Split / Connector; 32. Connector Bracket; 33. Double-acting Lead Screw; 34. Guide Rod; 35. Connecting Plate; 36. Screw Cap;

[0084] 41. Hanger rod; 42. Angle plate; 43. Strip plate; 44. Long end buckle; 45. Holding plate; 46. Shaft column; 47. Joint groove;

[0085] 51. Side panel; 52. Jet valve; 53. Jet nozzle; 54. Spoiler;

[0086] 61. Corner gasket; 62. Straight plate; 63. Water distribution trough; 64. Base plate; 65. Sheet plate; 66. Vertical plate; 67. Vertical plate; 68. Chain plate; 69. Screw;

[0087] 641. Miniature motor; 642. Vertical rod; 643. Air plug; 644. Gear; 645. Starlock ring; 646. Inlet valve pipe; 647. Air guide pipe; 648. Horizontal air pump; 649. Bracket;

[0088] 661. Laminated panel; 662. Corner spade; 663. L-shaped panel; 664. Nozzle; 665. Support column; 666. Side guard plate; 667. Angled plate; 668. Air blowing plate; 669. Heat conducting plate. Detailed Implementation

[0089] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0090] It should be noted that the terms "vertical," "horizontal," "left," "right," and similar expressions used in this article are for illustrative purposes only and do not represent the only possible implementation.

[0091] The specific implementation of the present invention will be described in detail below with reference to specific embodiments.

[0092] Reference Figure 1 , Figure 2 , Figure 4 and Figure 7 It is known that a photovoltaic silicon wafer drying device for photovoltaic cells includes a housing 1, which is a rectangular frame structure. A control unit 2 is provided on one side of the top of the housing 1. An adjustment unit 3 is provided on the side of the control unit 2 near the center line of the housing 1. A washing unit 4 is provided on the side of the adjustment unit 3 away from the control unit 2. Spraying units 5 are provided on both sides of the washing unit 4. A drying unit 6 is provided on one side inside the housing 1.

[0093] Reference Figure 1 , Figure 2 and Figure 3 It is known that the vertical end face of the chassis 1 is rotatably fitted with cabinet doors 11 to isolate the internal space of the chassis 1 from the external space. The top of the chassis 1 is provided with a processing chamber 12, and a partition plate 13 is inserted and installed inside the processing chamber 12. The control unit 2, the adjustment unit 3, the washing unit 4 and the drying unit 6 are respectively located in the processing chamber 12 area on both sides of the partition plate 13. Casters 14 are detachably installed at the four corners of the bottom of the chassis 1. An integrated electrical box 15 is provided at one end of the inside of the chassis 1, and a water tank 16 is installed at the other end of the inside of the chassis 1 and is snapped onto the outer wall of the processing chamber 12. A water pump 17 that cooperates with the water tank 16 is provided inside the chassis 1.

[0094] Chassis 1 and Processing Chamber 12: The main body of chassis 1 and processing chamber 12 is the ultrasonic cleaner body;

[0095] The processing chamber 12 is managed in a segmented manner by using partition 13, with one half of the area used for ultrasonic cleaning and the other half used by the drying unit 6 to dry the silicon wafers. This regionalized processing management helps to fully optimize the resource allocation and synergy between the control unit 2, the adjustment unit 3 and the washing unit 4. At the same time, it avoids interference between different units in adjacent areas and helps to achieve standardized management of silicon wafer cleaning and drying.

[0096] Casters 14: Facilitate the movement and transport of the main body of the equipment (including control unit 2, adjustment unit 3, washing unit 4, spraying unit 5 and drying unit 6) by operators, while improving the overall mobility and flexibility of the equipment and increasing the equipment movement options in special environments;

[0097] Integrated electrical box 15: can be used as a relay station for connecting control unit 2, regulating unit 3, washing unit 4, spraying unit 5 and drying unit 6 with computer equipment or communication equipment, etc., and can realize intelligent control of system voltage, current and power factor and other parameters, thereby improving the energy saving and operating efficiency of the power system.

[0098] Water tank 16 and water pump 17: When the water pump 17 is turned on and off, it can supply water to the inside of the water tank 16, and can also pump the wastewater inside the treatment chamber 12 through the external pipe to the outside, which helps to realize the circulation of clean water and indirectly ensures the long-term effectiveness of the washing unit 4.

[0099] Reference Figure 1 , Figure 4 and Figure 5 It is known that the control unit 2 includes: a transverse beam 21, which is slidably snapped onto the top end face of the chassis 1; two electric telescopic rods 22, which are symmetrically snapped onto the horizontal section of the transverse beam 21 near the side end face of the chassis 1; a steel liner plate 23, which is snapped onto the end of the electric telescopic rod 22 near the side end of the chassis 1; and a stepper motor 24, which is mounted on the steel liner plate 23 at the middle position on the side end face away from the chassis 1 via a mounting plate, and the output shaft of the stepper motor 24 passes through the steel liner plate 23.

[0100] The middle support plate 25 is fixedly installed at the output shaft end of the stepper motor 24 and is rotatably fitted with the steel liner plate 23; the notch frame 26 is detachably installed on the end face of the middle support plate 25 away from the electric telescopic rod 22 by bolts; there is one end rod 27, which is rotatably fitted between the vertical sections of the notch frame 26; there is at least one segmented column 28, which is fixedly installed on the outer wall of the end rod 27 in an array; the connecting rod 29 is slidably fitted on the outer wall of the segmented column 28.

[0101] Reference Figure 6 and Figure 7It is known that the adjustment unit 3 includes: a splitting and connecting seat 31, which is snapped onto the end of the connecting rod 29 away from the segment column 28; two mouthpiece brackets 32, which are symmetrically snapped onto the end face of the splitting and connecting seat 31 away from the segment column 28; a bidirectional lead screw 33, which is rotatably fitted onto one end of the two mouthpiece brackets 32; a guide rod 34, which is rotatably fitted onto the other end of the two mouthpiece brackets 32; a connecting plate 35, which is symmetrically arranged between the two mouthpiece brackets 32, and the connecting plate 35 is threadedly fitted onto the bidirectional lead screw 33 and slidably snapped onto the guide rod 34; and a swivel cap 36, which is fixedly installed onto one end of the bidirectional lead screw 33.

[0102] Reference Figure 4 , Figure 5 and Figure 6 It is known that the washing unit 4 includes: a hanging rod 41, two in a group, which is slidably snapped into place at the end of each of the separating and connecting seats 31 away from the connecting rod 29, and the hanging rod 41 is connected to the connecting plate 35 at the corresponding position in a through-type snap-fit ​​installation; a corner plate 42, two in a group, which is symmetrically snapped into place on the outer wall of the end of the hanging rod 41 away from the separating and connecting seat 31; a strip plate 43, which is snapped into place at the end of the hanging rod 41 away from the separating and connecting seat 31, and is snapped into place with the corner plate 42; and long end buckles 44, which are plugged into both ends of the strip plate 43, and are four in a group, symmetrically distributed in pairs;

[0103] The retaining plates 45 are arranged in pairs, symmetrically on the side of each strip 43 away from the corner plate 42, and are snap-fitted with the long end buckle 44; the shaft posts 46 are snap-fitted on the end face of one side of the retaining plate 45 near the center line of the split seat 31, and the distribution trajectory is arc-shaped; the connecting grooves 47 are opened on the end face of the other side of the retaining plate 45 near the center line of the split seat 31, and correspond one-to-one with the shaft posts 46;

[0104] The outer wall of the segmented column 28 is provided with a spiral groove, and the spiral groove is slidably engaged with the connecting rod 29. In addition, the pitch of the spiral grooves on the outer wall of the segmented column 28 at different positions increases or decreases linearly, and the spiral grooves on the outer wall of the segmented column 28 at one end have the opposite rotation direction to those at other positions.

[0105] Reference Figure 2 and Figure 8It can be seen that the spray unit 5 includes: two side plates 51, one of which is fixedly installed in the middle of the inner wall of one side of the treatment chamber 12, and the other side plate 51 is fixedly installed in the middle of the end face of one side of the partition plate 13, with the two side plates 51 facing each other; a blow valve 52, which is sequentially snapped onto the end face of the side plate 51 near the middle of the treatment chamber 12; blow nozzles 53, which are evenly opened at the end of the blow valve 52 away from the side plate 51, and are arc-shaped; and a baffle plate 54, which is snapped onto the top of the side plate 51 of the blow valve 52.

[0106] Method for immersing the silicon wafer to be cleaned into the ultrasonic cleaning solution on one side of processing chamber 12:

[0107] First, under the control of the crossbeam 21, the electric telescopic rod 22 drives the steel liner 23 to move to the top of one side of the processing chamber 12;

[0108] Next, under the extension and retraction of the electric telescopic rod 22, the steel liner 23 drives the middle support plate 25 to move towards the bottom wall of the processing chamber 12;

[0109] Finally, the lifting rod 41 synchronously drives the holding plate 45 to move until the holding plate 45 (previously, the silicon wafer to be cleaned was placed in the middle of the opposite holding plate 45 by the operator) is completely immersed in the cleaning fluid (the ultrasonic cleaning fluid on one side of the processing chamber 12).

[0110] The overall steering adjustment scheme and process for adjustment unit 3 and washing unit 4:

[0111] When the stepper motor 24 rotates, the middle support plate 25, driven by the output shaft of the stepper motor 24 and guided by the steel liner plate 23, drives the notch frame 26 to rotate at any angle inside the processing chamber 12 (or outside; the specific implementation depends on the compatibility between the length of the processing chamber 12 and the length of the middle support plate 25; and when rotating outdoors, the compatibility between the vertical distance from the steel liner plate 23 to the bottom of the support plate 45 and the vertical distance between the horizontal section of the crossbeam 21 and the top of the chassis 1) is considered.

[0112] The adjustment process for the position of the adjacent connecting rod 29 (i.e., the adjustment process for the position of the adjacent split-joint seat 31 or the adjacent guard plate 45 at the corresponding position):

[0113] Taking the increasing spatial arrangement of adjacent connecting rods 29 as an example:

[0114] Under the guidance of the notch frame 26, the end rod 27 drives the segment column 28 to rotate. Specifically, the end rod 27 can be driven to rotate by an external motor. During this process, the connecting rod 29, under the guidance and limiting action of the spiral groove on the outer wall of the segment column 28, causes the split-and-joint seat 31 to drive the overall movement of the hanging rod 41 under the guidance of the horizontal section of the notch frame 26.

[0115] Furthermore, due to the unequal pitch of the spiral groove on the outer wall of the segment column 28 at different positions, the horizontal movement distance of the connecting rod 29 driven by the segment column 28 is unequal when the segment column 28 rotates at the same angle or number of turns, thereby completing the linear unequal distance adjustment of the position of the adjacent split-and-joint seat 31 (the connecting rod 29 is engaged with the split-and-joint seat 31).

[0116] The steps for decreasing the space between adjacent connecting rods 29 are as follows: simply reverse the end rod 27. The specific working principle is the opposite of the aforementioned steps for increasing the space between adjacent connecting rods 29.

[0117] The process of adjusting the vertical distance between the retaining plates 45 on both sides of the silicon wafer to be cleaned (or the process of adjusting the clamping of silicon wafers of different thicknesses by the retaining plates 45):

[0118] By manually rotating the screw cap 36 to a specified angle or number of turns, the bidirectional screw 33 rotates synchronously under the action of the screw cap 36. At this time, the two opposing clamping plates 35 move towards or away from each other to a specified position under the guidance of the helix of the bidirectional screw 33 and the guide rod 34 (the clamping frame 32 guides and supports the guide rod 34 and the bidirectional screw 33). At the same time, the lifting rod 41 moves towards or away from each other to a specified position under the control of the clamping plates 35 and the limiting guidance of the splitting seat 31. This changes the vertical distance between the two opposing strips 43, thereby changing the vertical distance between the holding plates 45 used to clamp the silicon wafer on both sides. This enables the clamping and limiting of silicon wafers of different thicknesses, which helps to enhance the practicality and scenario diversity of this equipment.

[0119] Shaft post 46 and joint groove 47: The insertion and engagement between shaft post 46 and joint groove 47 realizes the same position clamping and limiting of silicon wafers of different thicknesses (Note: The laying trajectory of several shaft posts 46 used to clamp the same silicon wafer is circular to fully ensure the contact integrity between shaft post 46 and circular silicon wafer).

[0120] A description of the functions of each component in washing unit 4:

[0121] Hanging rod 41: Increases the vertical distance between the control unit 2 and the adjustment unit 3 and the cleaning liquid inside the processing chamber 12. On the one hand, it reduces the impact of water vapor evaporation on the above units and ensures the long-term stable operation of the equipment; on the other hand, it helps to perform immersion ultrasonic cleaning on silicon wafers.

[0122] Angle plate 42: Enhances the connection stability between the hanger 41 and the strip 43, which helps to improve the service life of the hanger 41;

[0123] Long-end buckle 44: The length can be designed and adjusted by the user during implementation. On the one hand, it improves the stability of the movement of the guard plate 45; on the other hand, it further isolates the dry and wet interaction channels between the guard plate 45 and the strip plate 43, reducing maintenance costs and difficulties.

[0124] Specific operation process of sprinkler unit 5:

[0125] After ultrasonic cleaning and adjacent distance adjustment are completed, the electric telescopic rod 22 retracts. At this time, the silicon wafer inside the holding plate 45 moves away from the bottom wall of the processing chamber 12. During this process, the inclined blow valve 52 and the arc-shaped blow nozzle 53 fully ensure the positive unity and stability between the fluid and each component of the washing unit 4. At the same time, the baffle 54 is used to improve the integrity of the spraying of the components of the washing unit 4 by the blow valve 52 while reducing the sputtering area and ensuring the cleanliness of the silicon wafer surface.

[0126] Reference Figure 2 , Figure 9 and Figure 11 It can be seen that the drying unit 6 includes: a corner gasket 61 with an L-shaped cross-section, which is detachably installed on one side of the top end face of the casing 1 by bolts; a straight plate 62 with an L-shaped cross-section, which is installed on one end of the vertical section of the corner gasket 61 by a mounting bracket; a water distribution trough 63, which is opened in the middle of the horizontal section of the straight plate 62; a bottom plate 64, at least one of which is slidably snapped on and installed in the middle of the end face of the straight plate 62 near the corner gasket 61, and is directly opposite to the water distribution trough 63; and a sheet plate 65, which is slidably snapped on and installed in the end face of the horizontal section of the straight plate 62 near the corner gasket 61, and corresponds one-to-one with the bottom plate 64.

[0127] A vertical plate 66 is snapped onto one end of the base plate 64 near the centerline of the straight plate 62; a vertical plate 67 is snapped onto one end of the plate 65 near the vertical plate 66; a chain plate 68 is snapped onto the middle of the end face of the base plate 64 and the plate 65 away from the corner gasket 61, and the chain plate 68 is slidably snapped onto the horizontal section of the straight plate 62; a screw 69 is rotatably mounted on the end face of the straight plate 62 away from the corner gasket 61 through an ear seat, and is located on the side of the water distribution trough 63; the screw 69 is threaded onto the chain plate 68, and the threaded engagement directions between the chain plate 68 and the screw 69 at corresponding positions on the base plate 64 and the plate 65 are opposite.

[0128] Reference Figure 10 and Figure 11It can be seen that a micro motor is installed on the end face of the upright plate 66 near the center line of the base plate 64 via a mounting plate. A vertical rod 642, which is rotatably mounted on the upright plate 66, is also installed at the output end of the micro motor. An air plug 643 is rotatably mounted through the middle of the end of the upright plate 66 away from the base plate 64. Gears 644 that mesh with each other are fixedly installed on the outer wall of the air plug 643 near the micro motor and on the outer wall of the vertical rod 642. The end face of the upright plate 66 away from the micro motor is secured with a mounting plate. A locking ring 645, coaxially distributed with the air plug 643, is installed in conjunction with it. An intake valve pipe 646 is rotatably installed at the axial position of the end of the air plug 643 away from the locking ring 645. An air guide pipe 647 is snapped into the air intake end of the air valve pipe 646. A horizontal air pump 648, fixedly connected to the base plate 64, is snapped into the air intake end of the air guide pipe 647. A bracket 649, which is snapped into the vertical plate 66, is installed on the outer wall of the end of the air plug 643 near the air intake valve pipe 646.

[0129] Reference Figure 12 and Figure 13 It can be seen that a fitting plate 661 is slidably installed at the middle position of the end face of the vertical plate 67 away from the vertical plate 66. An angle shovel 662, which is slidably snap-fitted onto the end of the fitting plate 661 away from the center line of the plate 65, is fixedly installed via a connecting shaft at the same end face as the vertical plate 67. An L-shaped single plate 663 is symmetrically installed and snap-fitted onto the end face of the vertical plate 67 near the vertical plate 66. At least one nozzle 664 is installed in an array on the vertical section of one side of the L-shaped single plate 663, with the liquid outlet end of the nozzle 664 facing the angle shovel 662. The other... The vertical section of the L-shaped single plate 663 on the side is fitted with three support columns 665 in an array. The three support columns 665 are connected together at the ends away from the nozzle 664 to a side guard plate 666 that is fitted together with the vertical plate 67. The three support columns 665 are connected together at the ends near the nozzle 664 to a wedge plate, with the wedge plate facing the corner shovel 662. An air blowing plate 668 is connected to one end of the wedge plate away from the vertical plate 67, and a heat conducting plate 669 is connected to the other end of the wedge plate away from the vertical plate 67.

[0130] The vertical distance between the upright plate 66 and the vertical plate 67 is greater than the vertical distance between the two oppositely distributed guard plates 45, and the reserved vertical distance between the two guard plates 45 on the same side is less than the width of the water trough 63; the cross-sectional shape of the corner shovel 662 away from the fitting plate 661 is an isosceles right trapezoid, and one end of the corner shovel 662 is wedge-shaped.

[0131] Preparatory steps for implementing drying unit 6:

[0132] First, the electric telescopic rod 22 retracts until the end of the guard plate 45 near the bottom wall of the treatment chamber 12 is separated from the top of the casing 1 (at this time, the adjustment unit 3 and the washing unit 4 are also separated from the casing 1).

[0133] Next, the transverse beam 21 drives the electric telescopic rod 22 to move to the other side of the processing chamber 12 until it is directly above the drying unit 6;

[0134] Finally, the electric telescopic rod 22 drives the steel liner 23 to move toward the bottom wall of the processing chamber 12 until the guard plate 45 contacts the straight plate 62 (and at this time, the silicon wafer is in the middle position between the bottom plate 64 and the wafer plate 65 at the corresponding position).

[0135] The process of air plug 643 adsorbing and positioning the silicon wafer on one side between the holding plate 45 and the corner spade 662 contacting the silicon wafer on the other side:

[0136] In a specific implementation, the screw 69 can be driven to rotate by an external motor. Subsequently, the chain plate 68 belonging to the base plate 64 and the plate 65 respectively, under the action of the screw, controls the base plate 64 and the plate 65 in the same group to move towards each other until the air plug 643 contacts the silicon wafer and the corner shovel 662 abuts against the silicon wafer.

[0137] Silicon wafer rotation process:

[0138] When the air plug 643 comes into contact with one end face of the silicon wafer, the air pump performs air extraction through the air guide pipe 647 and the air inlet valve pipe 646 (i.e., extracts the gas inside the suction cup to form a vacuum negative pressure) until the suction cup stably adsorbs the silicon wafer (by the contact between the locking ring 645 and one end of the air plug 643, the deformation of the air plug 643 during adsorption is uniform, and in actual operation, the deformation of the suction cup can be calculated and uniformly controlled).

[0139] Subsequently, under the control of the micro motor 641, the vertical rod 642 drives the outer wall gear 644 to rotate. At the same time, the air plug 643 (the rotational stability of the air plug 643 is improved by the bracket 649, while ensuring the smooth connection between the air intake valve pipe 646 and the air plug 643) rotates under the synchronous control of the outer wall gear 644 (at this time, the position of the air intake valve pipe 646 relative to the air plug 643 remains unchanged, that is, the rotation of the air plug 643 will not cause interference between it and the air intake valve pipe 646).

[0140] The corner spatula 662 removes impurities from the silicon wafer end face, and the air blowing plate 668 dries the silicon wafer:

[0141] As the silicon wafer rotates:

[0142] The corner shovel 662 (the cross-section of the corner shovel 662 is an isosceles trapezoid to increase the smoothness and stability of the interaction between the corner shovel 662 and the impurities on the end face of the silicon wafer) moves gradually (linearly increasing) from the outer end of the silicon wafer toward the axis under the dual action of the interlocking plate 661 and the guide of the vertical plate 67, until the working length of the corner shovel 662 with the end face of the silicon wafer is greater than the radius of the silicon wafer. Specifically, the interlocking plate 661 can be moved by an electric slider.

[0143] During this process, IPA liquid is sprayed into the area where the corner shovel 662 and the silicon wafer are working through the nozzle 664. On the one hand, this reduces the heat generated by the relative movement between the corner shovel 662 and the silicon wafer, thus improving production safety; on the other hand, it performs a fluid self-cleaning operation on the corner shovel 662, improving the cleanliness of the corner shovel 662 itself.

[0144] At the same time, the heat emitted by the heat-conducting plate 669 (the length of the heat-conducting plate 669 is greater than the diameter of the silicon wafer, and the center line of the heat-conducting plate 669 is on the same horizontal plane as the axis of the silicon wafer) is blown towards the end face of the silicon wafer through the air blowing plate 668, so as to dry the silicon wafer by combining gas and heat and enhance the drying effect. In addition, the IPA vapor is blown towards the outer periphery of the silicon wafer through the air blowing plate 668, thereby generating Marangoni force on the silicon wafer and achieving spin drying.

[0145] The width of the water distribution trough 63 is greater than the reserved vertical distance between the two supporting plates 45 on the same side (see appendix). Figure 5 Width shown at point 1-a): To prevent the liquid sprayed from the nozzle 664 from splashing into the area of ​​the straight plate 62 when it interacts with the corner shovel 662, thus ensuring the cleanliness of the equipment itself;

[0146] Vertical plate 66 and vertical plate 67: These separate the interaction space between the corner shovel 662 and the silicon wafer and the outside world, and prevent the impact of particulate impurities sputtering on the end face of adjacent silicon wafers during the scraping process of the corner shovel 662 and the rotation of the silicon wafer, so as to achieve regional management.

[0147] It should be noted that after the scraping process on one side of the silicon wafer is completed, the electric telescopic rod 22 is retracted until the bottom of the retaining plate 45 is detached from the top of the chassis 1. Then, the stepper motor 24 causes the middle support plate 25 to rotate 180 degrees under the guidance of the steel liner plate 23. Finally, the electric telescopic rod 22 is extended to move the silicon wafer to the initial position (the processing principle on the other side of the silicon wafer is the same as described above, and will not be repeated).

[0148] The working principle of the photovoltaic silicon wafer drying device for photovoltaic cells provided by the present invention is as follows: First step: First, the steel liner 23 is moved towards the bottom wall of the processing chamber 12 by the electric telescopic rod 22 until the top of the protective plate 45 is completely immersed in the cleaning liquid inside the processing chamber 12. Then, by rotating the end rod 27, the segment column 28 and the connecting rod 29 are moved relative to each other until the split and connecting seat 31 drives the hanging rod 41 to move to different positions.

[0149] Step 2: Next, the electric telescopic rod 22 drives the holding plate 45 to move away from the bottom wall of the processing chamber 12. During this process, the holding plate 45 moves relative to the spray valve 52, and the spray nozzle 53 of the spray valve 52 performs further supplementary spraying processing on the holding plate 45 and the silicon wafer end face.

[0150] Step 3: Finally, the silicon wafer is positioned by the air plug 643 and driven to rotate by the gear 644. At the same time, the corner spatula 662 is driven to move up and down by the interlocking plate 661. During this time, the rotating silicon wafer is constantly scraped relative to the corner spatula 662. In addition, IPA solution for accelerating drying, cooling and cleaning is sprayed onto the corner spatula 662 and the silicon wafer processing area by the spray nozzle 664 to fully ensure the cleanliness of the silicon wafer end face. The silicon wafer end face is quickly dried by hot air by the combination of the air blowing plate 668 and the heat conducting plate 669.

[0151] The circuits and controls involved in this invention are all existing technologies and will not be described in detail here.

[0152] The above are merely embodiments of the present invention and do not limit the patent scope of the present invention. Any equivalent structural or procedural transformations made based on the content of the present invention specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of the present invention.

Claims

1. A photovoltaic silicon wafer drying device for photovoltaic cells, comprising a housing (1), wherein the housing (1) is a rectangular frame structure, characterized in that: A control unit (2) is provided on one side of the top of the chassis (1). An adjustment unit (3) is provided on the side of the control unit (2) near the center line of the chassis (1). A washing unit (4) is provided on the side of the adjustment unit (3) away from the control unit (2). Spraying units (5) are provided on both sides of the washing unit (4). A drying unit (6) is provided on one side inside the chassis (1). The drying unit (6) includes: An L-shaped corner gasket (61) is detachably mounted on one side of the top end face of the chassis (1) by bolts. The straight plate (62) has an L-shaped cross section and is installed at one end of the vertical section of the corner pad (61) by inserting it with a mounting bracket; The water distribution channel (63) is located in the middle of the horizontal section of the straight plate (62); The base plate (64) is at least one and is installed in a sliding snap-fit ​​manner on the middle position of the end face of the straight plate (62) near the corner gasket (61), and is set directly opposite to the water distribution trough (63); The plate (65) is slidably snapped into place on the end face of the horizontal section of the straight plate (62) near the corner pad (61), and corresponds one-to-one with the base plate (64); The upright plate (66) is snapped onto the bottom plate (64) at one end near the center line of the straight plate (62); The vertical plate (67) is snapped onto the end of the plate (65) near the vertical plate (66); Chain plate (68) is respectively snapped and installed at the middle position of the end face of the bottom plate (64) and the plate (65) away from the corner pad (61), and the chain plate (68) is slidably snapped and installed with the horizontal section of the straight plate (62); The screw (69) is mounted on the end face of the straight plate (62) away from the corner gasket (61) by means of the ear seat and is located on the side of the water distribution trough (63); the screw (69) is threadedly mounted with the chain plate (68), and the threaded engagement direction between the chain plate (68) and the screw (69) at the corresponding positions of the base plate (64) and the plate (65) is opposite; A fitting plate (661) is slidably installed on the middle position of the end face of the vertical plate (67) away from the vertical plate (66). An angle shovel (662) is fixedly installed on the end of the fitting plate (661) away from the center line of the plate (65) via a connecting shaft. An L-shaped single plate (663) is symmetrically installed and fitted on the end face of the vertical plate (67) near the vertical plate (66). A spray nozzle (664) is installed in an array on the vertical section of one side of the L-shaped single plate (663), with at least one nozzle (664) and the liquid outlet end of the spray nozzle (664) facing the angle shovel (662). The vertical section of the L-shaped single plate (663) is equipped with three support columns (665) in an array. The three support columns (665) are connected together at the ends away from the nozzle (664) to a side guard plate (666) that is also connected to the vertical plate (67). The three support columns (665) are connected together at the ends near the nozzle (664) to a wedge plate, which faces the corner shovel (662). An air blowing plate (668) is connected to one end of the wedge plate away from the vertical plate (67), and a heat-conducting plate (669) is connected to the other end of the wedge plate away from the vertical plate (67).

2. The photovoltaic silicon wafer drying apparatus for photovoltaic cells according to claim 1, characterized in that: A micro motor is mounted on the end face of the upright plate (66) near the center line of the base plate (64) via a mounting plate. A vertical rod (642) that is rotatably mounted on the output end of the micro motor is also mounted on the upright plate (66). An air plug (643) is rotatably mounted through the middle of the end of the upright plate (66) away from the base plate (64). Gears (644) that mesh with each other are fixedly mounted on the outer wall of the air plug (643) near the micro motor and on the outer wall of the vertical rod (642). The end face of the upright plate (66) away from the micro motor is also mounted on the vertical rod. There is a star-locking ring (645) coaxially distributed with the same air plug (643). The air plug (643) is rotatably fitted with an intake valve pipe (646) at the axial position away from the star-locking ring (645) in a plug-in manner. The intake end of the intake valve pipe (646) is snapped with an air guide pipe (647). The intake end of the air guide pipe (647) is snapped with a horizontal air pump (648) fixedly connected to the base plate (64). The outer wall of the end of the air plug (643) near the intake valve pipe (646) is snapped with a bracket (649) that is snapped with the vertical plate (66).

3. The photovoltaic silicon wafer drying apparatus for photovoltaic cells according to claim 2, characterized in that: The vertical end face of the chassis (1) is fitted with a cabinet door (11) to isolate the internal space of the chassis (1) from the external space. The top of the chassis (1) is provided with a processing chamber (12). A partition plate (13) is inserted and installed inside the processing chamber (12). The control unit (2), adjustment unit (3) and washing unit (4) and drying unit (6) are respectively located in the processing chamber (12) area on both sides of the partition plate (13). Casters (14) can be detachably installed at the four corners of the bottom of the chassis (1). An integrated electrical box (15) is provided at one end of the inside of the chassis (1). A water tank (16) is installed at the other end of the inside of the chassis (1) and is snapped onto the outer wall of the processing chamber (12). A water pump (17) is provided inside the chassis (1) in conjunction with the water tank (16).

4. The photovoltaic silicon wafer drying apparatus for photovoltaic cells according to claim 3, characterized in that: The control unit (2) includes: The transverse partition beam (21) is slidably snapped together and installed on the top end face of the chassis (1); Two electric telescopic rods (22) are installed symmetrically and interlocked on the end face of the horizontal section of the crossbeam (21) near the chassis (1); A steel liner (23) is provided, and is snapped onto the end of the electric telescopic pole (22) near the housing (1); The stepper motor (24) is mounted on the steel liner (23) at the middle position on the side of the end face away from the chassis (1) via a mounting plate, and the output shaft of the stepper motor (24) passes through the steel liner (23). The middle support plate (25) is fixedly installed at the output shaft end of the stepper motor (24) and is rotatably fitted with the steel liner plate (23); The notched frame (26) is detachably installed on the end face of the middle support plate (25) away from the electric telescopic rod (22) by bolts; The end rod (27) is one in number and is rotatably fitted between the vertical sections of the notch frame (26); Segmented columns (28), at least one, are fixedly installed on the outer wall of the end rod (27) in an array; The connecting rod (29) is slidably installed on the outer wall of the segment column (28).

5. The photovoltaic silicon wafer drying apparatus for photovoltaic cells according to claim 4, characterized in that: The adjustment unit (3) includes: The split-joint seat (31) is snapped onto the end of the connecting rod (29) away from the segment column (28); The two brackets (32) are installed in a symmetrical manner on the end face of the splitting seat (31) away from the segment column (28); A two-way lead screw (33) is rotatably mounted at one end of two mortise brackets (32); The guide rod (34) is rotatably mounted on the other end of the two mouthpiece brackets (32); The coupling plates (35) are arranged in pairs and symmetrically between the set of coupling frames (32). The coupling plates (35) are threadedly installed with the bidirectional lead screw (33) and also slidably snapped into the guide rod (34). The screw cap (36) is fixedly installed at one end of the two-way lead screw (33).

6. The photovoltaic silicon wafer drying apparatus for photovoltaic cells according to claim 5, characterized in that: The washing unit (4) includes: The hanger (41) is installed in pairs and is slidably snapped into place at the end of each of the split seats (31) away from the connecting rod (29). The hanger (41) is also installed in a through-type snap-fit ​​with the corresponding splice plate (35). Angle plates (42) are installed in pairs and symmetrically on the outer wall of the end of the hanger (41) away from the splitting seat (31); The strip (43) is snapped onto the end of the hanger (41) away from the split seat (31) and is snapped onto the corner plate (42); The long-end buckle (44) is plugged into both ends of the strip (43), and four are arranged in a group, symmetrically distributed in pairs; The guard plate (45) is arranged in pairs, symmetrically on the side away from the corner plate (42) of each strip plate (43), and is installed by snap-fitting with the long end buckle (44); The shaft column (46) is snap-fitted and installed on the end face of the side of the holding plate (45) near the center line of the split seat (31), and the distribution trajectory is arc-shaped; The joint groove (47) is opened on the end face of the other side of the holding plate (45) near the center line of the split seat (31), and corresponds one-to-one with the shaft column (46).

7. The photovoltaic silicon wafer drying apparatus for photovoltaic cells according to claim 3, characterized in that: The spray unit (5) includes: There are two side panels (51). One side panel (51) is fixedly installed in the middle of the inner wall of one side of the processing chamber (12), and the other side panel (51) is fixedly installed in the middle of the end face of one side of the partition plate (13). The two side panels (51) are set opposite each other. The blow valve (52) is sequentially snapped onto the end face of the side plate (51) near the middle position of the treatment chamber (12); The nozzles (53) are evenly distributed at the end of the blow valve (52) away from the side plate (51) and are arc-shaped. The spoiler (54) is snapped onto the top of one side of the side plate (51) of the blow valve (52).

8. The photovoltaic silicon wafer drying apparatus for photovoltaic cells according to claim 6, characterized in that: The vertical distance between the upright plate (66) and the vertical plate (67) is greater than the vertical distance between the two oppositely distributed guard plates (45), and the reserved vertical distance between the two guard plates (45) on the same side is less than the width of the water distribution trough (63).

9. A photovoltaic silicon wafer drying apparatus for photovoltaic cells according to claim 4, characterized in that: The outer wall of the segmented column (28) is provided with a spiral groove, and the spiral groove is slidably engaged with the connecting rod (29). In addition, the pitch of the spiral grooves on the outer wall of the segmented column (28) at different positions increases or decreases linearly, and the spiral grooves on the outer wall of the segmented column (28) at one end have the opposite rotation direction to those on the other positions. The cross-sectional shape of the corner shovel (662) away from the interlocking plate (661) is an isosceles right trapezoid, and one end of the corner shovel (662) is wedge-shaped.

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