A composite holographic lithography system and method

Abstract

The present application relates to a composite holographic lithography system and method, comprising: an illumination subsystem, a data processing subsystem, a composite light field output subsystem and a photosensitive material platform, the illumination subsystem comprises a light source, an object light illumination mechanism and a reference light illumination mechanism, the object light illumination mechanism comprises a plurality of object light illumination channels, and the reference light illumination mechanism comprises a plurality of reference light channels; the data processing subsystem is used for receiving three-dimensional image information or three-dimensional structure information, and converting the three-dimensional image information or the three-dimensional structure information into wave front information, and grouping the wave front information according to a viewing angle to form a plurality of sub-regions; encoding the sub-wave front information to form corresponding composite sub-light field information, and inputting the composite sub-light field information into the composite light field output subsystem; the composite light field output subsystem is used for receiving light of a plurality of object light channels of the illumination subsystem, receiving a plurality of composite sub-light field information of the processing subsystem, and transmitting the composite sub-light field to photosensitive material carried by the photosensitive material platform. Large-area, high-resolution diffraction structures and pattern output are realized.

Description

Technical Field

[0001] The present invention relates to the field of micro-machining technology, and in particular to a composite holographic lithography system and method. Background Art

[0002] Photolithography is an important technology for manufacturing micro-nanostructure devices. Large-scale arbitrary pattern photolithography systems such as DUV photolithography machines and EUV photolithography machines are expensive, with high costs and limited technology and applications. Holographic lithography can achieve the efficient preparation of micro-nanostructures with low cost, large area and high precision. It has a wide range of applications in many fields such as display, lighting, precision measurement, biosensing, etc., and has therefore attracted widespread attention. The simplest holographic lithography technology uses interference exposure between two or more parallel laser beams to produce patterns. This technology is simple and efficient to operate, but the micro-nanostructures that can be produced are single. Complex holographic lithography technology uses complex light fields or patterns generated by computer-generated holograms to expose photosensitive materials to produce the required patterns. After years of development, holographic lithography technology has continuously progressed from simple to complex, and its performance has been continuously improved. However, holographic lithography technology still has the following limitations, including: (1) limited processing freedom, and can only produce simple periodic structures. (2) The structures that can be processed are fixed and cannot be modulated in real time. (3) The area of ​​a single exposure is limited, and the resolution of the diffraction pattern is low. (4) Large-area exposure requires splicing, and the splicing system is complex and has limited accuracy. Summary of the Invention

[0003] In view of this, the purpose of the present invention is to overcome the shortcomings of the background art and provide a composite holographic lithography system and method, which can achieve large-area real-time modulation of the composite light field and accurate output and holographic lithography.

[0004] In order to solve the above technical problems, the first aspect of the present invention provides a solution: a composite holographic lithography system, including: an illumination subsystem, a data processing subsystem, a composite light field output subsystem and a photosensitive material platform, the illumination subsystem includes a light source, an object light illumination mechanism and a reference light illumination mechanism, the object light illumination mechanism includes a plurality of object light illumination channels, the reference light illumination mechanism includes a plurality of reference light channels, the object light illumination channel is used to illuminate the light emitted by the light source to the composite light field output subsystem, and the reference light channel is used to irradiate the light emitted by the light source to the photosensitive material carried by the photosensitive material platform; the data processing subsystem is used to receive three-dimensional image information or three-dimensional structure information, and to convert the three-dimensional image information or three-dimensional structure information into a three-dimensional image information or a three-dimensional structure information. The information is converted into wavefront information, and the wavefront information is grouped into multiple sub-areas according to the viewing angle, and one sub-area corresponds to one sub-wavefront information; the sub-wavefront information is encoded to form corresponding composite sub-light field information, and the composite sub-light field information is input into the composite light field output subsystem; the composite light field output subsystem is used to receive light from multiple object light channels of the illumination subsystem, receive multiple composite sub-light field information of the processing subsystem, transmit the composite sub-light field to the photosensitive material carried by the photosensitive material platform, and use the sub-wavefront diffracted by the composite sub-light field to expose multiple areas of the photosensitive material; the photosensitive material platform is used to place the photosensitive material, and the photosensitive material is used to receive the light from the composite sub-light field and the light transmitted by the reference light channel, and to record interference.

[0005] The reference light illumination channel of the reference light illumination mechanism corresponds one to one to the object light illumination channel of the object light illumination mechanism.

[0006] The data processing subsystem receives the three-dimensional pattern or structure information obtained by measurement or modeling and calculates and decomposes the wavefront information of the three-dimensional pattern or structure.

[0007] Among them, the composite holographic lithography system includes a precision motion subsystem and a motion control subsystem. The precision motion subsystem is used to carry the photosensitive material platform and drive the photosensitive material platform to move; the motion control subsystem is used to control the movement of the precision motion subsystem and to control the reflection of light from the reference light channel so that the light from the reference light channel can reach the photosensitive material at a specified angle.

[0008] Among them, the composite light field output subsystem includes a movable composite light field modulator and a multi-channel Fourier transform lens group. The movable composite light field modulator includes a movable first flat panel display and a movable second flat panel display. The first flat panel display and the second flat panel display are stacked. The first flat panel display and the movable second flat panel display are independently driven by a precision motion subsystem.

[0009] Among them, the Fourier transform lens group includes a lens or a lens group; the intrinsic aberration of the lens or lens group of each channel is less than a first preset value; the difference in residual aberration between each channel is less than a second preset value; the translation aberration between each channel is less than a third preset value, so that the light fields output by each channel can be spliced ​​in common phase. The sub-wavefronts of the composite light field diffraction of each channel can interfere in common phase. In the embodiment of the present application, the intrinsic aberration of the lens or lens group of each channel is small enough; the difference in residual aberration between each channel is small enough; and the translation aberration between each channel is small enough, so that the light field output by each channel can meet the common phase splicing condition. The sub-wavefronts of the composite light field diffraction of each channel meet the common phase interference condition.

[0010] The reference light channel of the reference light illumination mechanism includes a relay lens or a relay lens group. The intrinsic aberration of the relay lens or relay lens group of each channel is sufficiently small; the difference in residual aberration between the relay lenses or relay lens groups of each channel is sufficiently small; and the translational aberration between the relay lenses or relay lens groups of each channel is sufficiently small, so that the reference light output through each channel can meet the common phase splicing condition. When the reference light or conjugate reference light or approximate reference light or approximate conjugate reference light is used for light reconstruction, the sub-wavefronts of the composite light field diffracted by each channel obtained by reconstruction meet the common phase interference condition.

[0011] The movable composite light field modulator includes a plurality of sub-display areas, and each sub-display area corresponds to a Fourier transform lens group of a channel.

[0012] The first flat panel display and the movable second flat panel display each include an amplitude modulation flat panel display and a phase modulation flat panel display. The display includes a refreshable display and a non-refreshable fixed pattern or fixed phase structure device.

[0013] The first flat panel display and the second flat panel display are stacked.

[0014] Among them, the composite holographic lithography system also includes a controller, which is connected to the lighting subsystem, the data processing subsystem, and the motion control subsystem, and coordinates and controls the lighting subsystem, the data processing subsystem, and the motion control subsystem to operate in a timed sequence.

[0015] The illumination subsystem also includes a beam expander collimator, a reflector, an aperture, and a scanning mirror assembly. The illumination light intensity of each channel is equal and the light energy is evenly distributed.

[0016] The motion control subsystem is connected to the precision motion subsystem, which independently drives the movable composite light field modulator, photosensitive material platform, and scanning mirror assembly. Under the management of the motion control subsystem, the photosensitive material platform, the movable composite light field modulator, and the scanning mirror can be precisely coordinated to minimize translational aberrations between the various channels.

[0017] The data processing subsystem includes software and / or hardware for numerical calculations.

[0018] Among them, the imaging lens group of each channel, including the Fourier transform lens group, the relay lens group, etc., is preferably assembled and calibrated using wafer-level packaging technology.

[0019] A second aspect of the present invention provides a composite holographic lithography method, which uses the composite holographic lithography system described above, comprising:

[0020] Obtaining wavefront information of a desired pattern structure;

[0021] Decompose the wavefront information into pure phase information, pure amplitude information, or amplitude and phase information

[0022] The wavefront information is grouped into multiple sub-regions according to the viewing angle, and each sub-region corresponds to a sub-wavefront;

[0023] Encoding the sub-wavefront information in each sub-region to form corresponding multiple composite sub-light fields;

[0024] Inputting the composite sub-light fields into the composite light field output subsystem in sequence;

[0025] Illuminating the composite light field output subsystem so that the sub-wavefronts of the composite sub-light fields diffracted by the composite light field output subsystem are spliced ​​in common phase;

[0026] The photosensitive material is sequentially exposed using the sub-wavefronts diffracted by the composite sub-light field, or the photosensitive material is sequentially exposed using the interference field formed by the coherence of the reference light and the sub-wavefronts diffracted by the composite sub-light field.

[0027] The types of required pattern structures include two-dimensional patterns and three-dimensional patterns.

[0028] The amplitude information includes amplitude information of wavefronts corresponding to the three primary colors.

[0029] The phase information includes one or more of primary phase information, secondary phase information and higher-order phase information.

[0030] Among them, multiple sub-areas are closely arranged, and the perspectives of each sub-area are spliced ​​with each other or partially overlapped.

[0031] The composite light field includes two or more layers of plane information; the plane information includes amplitude transmittance information, phase transmittance information, or fusion encoding information of the amplitude transmittance information and the phase transmittance information.

[0032] Beneficial effects:

[0033] (1) The composite holographic lithography system of the present application overcomes the area limitation of single exposure and the low resolution of diffraction patterns of the traditional holographic lithography technology, and realizes the output of large-area and high-resolution diffraction structures and patterns.

[0034] (2) The composite holographic lithography system of the present application solves the problem of complex and limited precision of the traditional holographic lithography technology, and realizes the coherent interference splicing of multi-channel complex light field, greatly improving the processing precision and processing capacity of holographic interference.

[0035] (3) The composite holographic lithography method of the present application overcomes the problem that the traditional holographic lithography technology has limited processing freedom and cannot be modulated in real time, and can only produce simple periodic structures, and realizes the parallel output of complex light field that can be modulated in real time.

[0036] (4) The composite holographic lithography method of the present application can realize the method of large-area composite light field accurate modulation output and holographic lithography. This method can realize real-time modulation output and accurate splicing of any pattern and structure. The resolution of the diffraction pattern is not limited by the area of single exposure. BRIEF DESCRIPTION OF DRAWINGS

[0037] Figure 1 is a schematic diagram of the composite holographic lithography system of the first embodiment of the present application;

[0038] Figure 2 is a schematic diagram of the composite holographic lithography system of the second embodiment of the present application;

[0039] Figure 3 is a schematic diagram of the composite holographic lithography system of the third embodiment of the present application;

[0040] Figure 4 is a schematic diagram of the composite holographic lithography system of the fourth embodiment of the present application;

[0041] Figure 5 is a flow chart of an embodiment of the composite holographic lithography method of the present application. DETAILED DESCRIPTION

[0042] The present application will be further described below in conjunction with the drawings and embodiments.

[0043] Embodiment 1

[0044] Referring to the drawings, Figure 1 , Figure 1It is a composite holographic lithography system in this embodiment.

[0045] The composite holographic lithography system in this embodiment includes an illumination subsystem 1 , a data processing subsystem 2 , a composite light field output subsystem 3 , a photosensitive material platform 4 , a motion control subsystem 5 , a precision motion subsystem 6 and a controller 7 .

[0046] In an embodiment of the present application, the illumination subsystem 1 includes: a light source 11, a collimating beam expander 12, a reflector 13, a beam splitter 14, an object light illumination mechanism and a reference light illumination mechanism. The object light illumination mechanism includes a first channel beam splitter group 161, and the reference light illumination mechanism includes an aperture 15, a second channel beam splitter group 162, a scanning mirror group 17 and a multi-channel relay lens group 18.

[0047] In the embodiment of the present application, there are two reflectors 13, which are respectively a first reflector 131 and a second reflector 132 for easy distinction. The embodiment of the present application does not limit the number of reflectors 13. In the embodiment of the present application, the first channel beam splitter group 161 includes four channel beam splitters. For easy distinction, the four channel beam splitters are respectively a first channel beam splitter 1611, a second channel beam splitter 1612, a third channel beam splitter 1613 and a fourth channel beam splitter 1614, wherein the first channel beam splitter 1611, the second channel beam splitter 1612 and the third channel beam splitter 1613 are semi-transparent and semi-reflective beam splitters, and the fourth channel beam splitter 1614 is a reflector. The embodiment of the present application does not limit the number of channel beam splitters in the first channel beam splitter group. In other embodiments, the number of channel beam splitters can also be two, three, or more than five. In the embodiment of the present application, the second channel beam splitter group 162 includes four channel beam splitters. For the convenience of distinction, the four channel beam splitters are respectively the fifth channel beam splitter 1621, the sixth channel beam splitter 1622, the seventh channel beam splitter 1623 and the eighth channel beam splitter 1624. Among them, the fifth channel beam splitter 1621, the sixth channel beam splitter 1622 and the seventh channel beam splitter 1623 are semi-transparent and semi-reflective beam splitters, and the eighth channel beam splitter 1624 is a reflective mirror. The embodiment of the present application does not limit the number of channel beam splitters in the second channel beam splitter group. In other embodiments, the number of channel beam splitters can also be two, three, or more than five. In the embodiment of the present application,

[0048] The light source 11 emits a laser, which passes through the collimating beam expander 12 to form a wide laser beam. The wide laser beam passes through the first reflector 131 and the beam splitter 14 and is divided into an object beam and a reference beam. The reflected beam of the beam splitter 14 is the object beam, and the transmitted beam of the beam splitter 14 is the reference beam. After being reflected by the second reflector 132, the object beam illuminates the first channel beam splitter 1612 of the first channel beam splitter group 161. The first channel beam splitter 1612 reflects part of the beam to form an illumination channel. Similarly, the transmitted light of the first channel beam splitter 1612 is reflected in turn by the subsequent second channel beam splitter 1612, the third channel beam splitter 1613 and the fourth channel beam splitter 1614 to form multiple illumination channels. The fourth channel beam splitter 1614 of the last channel uses a reflector to reflect the beam to form an illumination channel. The beams in each illumination channel illuminate the channel corresponding to the composite light field output subsystem 3.

[0049] Among them, a wide laser beam refers to a laser that can reach the centimeter level after beam expansion and collimation, and the beam covers the aperture of at least one channel.

[0050] After passing through aperture 15, the reference beam is split into two beams by the fifth channel beam splitter 1621 of the second channel beam splitter assembly 162 on the reference light path. The reflected beam illuminates the scanning mirror assembly 17 and is reflected by the scanning mirror assembly 17 to form a reference light channel. The transmitted light from the fifth channel beam splitter 1622 is reflected by the subsequent sixth channel beam splitter 1622, seventh channel beam splitter 1623, and eighth channel beam splitter 1624 to form multiple reference light channels. The eighth channel beam splitter 1624 of the last channel uses a reflector to reflect the beam to form a reference light channel.

[0051] The reference beam from the reference light channel enters the multi-channel relay lens assembly 18, forming a multi-channel reference beam that illuminates the photosensitive material on the photosensitive material platform 4. The direction of the reference beam from each reference light channel can be independently and precisely controlled by the scanning lens assembly 17. The difference between the intrinsic aberration of the relay lens assembly 18 for each channel of the reference light illumination mechanism and the residual aberration between each channel is less than one-tenth of the wavelength; and the translational aberration between each channel is less than one-tenth of the wavelength of the light source, ensuring that the reference light output through each channel meets the common phase splicing condition.

[0052] The data processing subsystem 2 includes dedicated computing hardware (GPU) and corresponding software. The data processing subsystem 2 receives the three-dimensional pattern information obtained by modeling and calculates and decomposes the wavefront information of the three-dimensional pattern. The wavefront information includes amplitude information and primary phase information. The wavefront information is grouped into multiple sub-regions according to the viewing angle, and each sub-region corresponds to a sub-wavefront. The compressed light field encodes each sub-wavefront to form a corresponding plurality of composite sub-light field information. Each composite sub-light field information corresponds one-to-one to the object light illumination channel. The composite sub-light field information is input into the composite light field output subsystem 3. The composite sub-light field information consists of two layers of amplitude-modulated image information.

[0053] The composite light field output subsystem 3 includes an amplitude-modulated LCD display 31, an amplitude-modulated LCD display 32, and a multi-channel Fourier transform lens group 33. The difference between the residual aberration of the multi-channel Fourier transform lens group and the residual aberration between its channels is less than one-tenth of a wavelength. The precision motion subsystem 6 independently drives the LCD displays 31 and 32. The translational aberration between the multi-channel Fourier transform lens groups 33 is small enough so that the light field output through each channel can meet the common phase splicing condition. In the embodiment of the present application, the LCD displays 31 and 32 can also be replaced with LED displays or OLED displays. The embodiment of the present application does not limit the specific type of display.

[0054] Precision motion subsystem 6 includes two-dimensional translation stages 61, 62, and 63. Two-dimensional translation stage 61 is connected to photosensitive material platform 4 and drives the photosensitive material for two-dimensional precision movement. Two-dimensional translation stages 62 and 63 are connected to display screens 32 and 31, respectively, and drive LCD displays 32 and 31 for two-dimensional precision movement.

[0055] Motion control subsystem 5 coordinates and controls precision motion subsystem 6 and scanning mirror assembly 17 in the reference light path. Controller 7, through computer host software, coordinates and controls the illumination subsystem, the output of the data processing subsystem, the output of the composite light field output subsystem, and the motion control subsystem, enabling the wavefront information of the three-dimensional pattern to be recorded sequentially and in parallel on the photosensitive material.

[0056] Example 2:

[0057] See attached Figure 2 , Figure 2 It is a composite holographic lithography system in this embodiment.

[0058] The composite holographic lithography system in this embodiment includes an illumination subsystem 1 , a data processing subsystem 2 , a composite light field output subsystem 3 , a photosensitive material platform 4 , a motion control subsystem 5 , a precision motion subsystem 6 and a controller 7 .

[0059] The illumination subsystem 1 includes: a light source 11, a collimating beam expander 12, a reflector 13, a beam splitter 14, an object light illumination mechanism and a reference light illumination mechanism. The object light illumination mechanism includes a first channel beam splitter group 161, and the reference light illumination mechanism includes an aperture 15, a second channel beam splitter group 162, a scanning lens group 17 and a multi-channel relay lens group 18.

[0060] In the embodiment of the present application, there are two reflectors 13, which are respectively a first reflector 131 and a second reflector 132 for easy distinction. The embodiment of the present application does not limit the number of reflectors 13. In the embodiment of the present application, the first channel beam splitter group 161 includes four channel beam splitters. For easy distinction, the four channel beam splitters are respectively a first channel beam splitter 1611, a second channel beam splitter 1612, a third channel beam splitter 1613 and a fourth channel beam splitter 1614, wherein the first channel beam splitter 1611, the second channel beam splitter 1612 and the third channel beam splitter 1613 are semi-transparent and semi-reflective beam splitters, and the fourth channel beam splitter 1614 is a reflector. The embodiment of the present application does not limit the number of channel beam splitters in the first channel beam splitter group. In other embodiments, the number of channel beam splitters can also be two, three, or more than five. In the embodiment of the present application, the second channel beam splitter group 162 includes four channel beam splitters. For the convenience of distinction, the four channel beam splitters are respectively the fifth channel beam splitter 1621, the sixth channel beam splitter 1622, the seventh channel beam splitter 1623 and the eighth channel beam splitter 1624. Among them, the fifth channel beam splitter 1621, the sixth channel beam splitter 1622 and the seventh channel beam splitter 1623 are semi-transparent and semi-reflective beam splitters, and the eighth channel beam splitter 1624 is a reflective mirror. The embodiment of the present application does not limit the number of channel beam splitters in the second channel beam splitter group. In other embodiments, the number of channel beam splitters can also be two, three, or more than five. In the embodiment of the present application,

[0061] The light source 11 emits a laser, which forms a wide laser beam after passing through the collimating beam expander 12. The wide laser beam is divided into an object beam and a reference beam after passing through the first reflector 131 and the beam splitter 14. The reflected beam of the beam splitter 14 is the object beam, and the transmitted beam of the beam splitter 14 is the reference beam. After being reflected by the second reflector 132, the object beam illuminates the first channel beam splitter 1612 of the first channel beam splitter group 161. The first channel beam splitter 1612 reflects part of the beam to form an illumination channel. Similarly, the transmitted light of the first channel beam splitter 1612 is reflected in turn by the subsequent second channel beam splitter 1612, the third channel beam splitter 1613 and the fourth channel beam splitter 1614 to form multiple illumination channels. The fourth channel beam splitter 1614 of the last channel uses a reflector to reflect the beam to form an illumination channel. The beams in each illumination channel illuminate the corresponding channel of the composite light field output subsystem 3.

[0062] After passing through aperture 15, the reference beam is split into two beams by the fifth channel beam splitter 1621 of the second channel beam splitter assembly 162 on the reference light path. The reflected beam illuminates the scanning mirror assembly 17 and is reflected by the scanning mirror assembly 17 to form a reference light channel. The transmitted light from the fifth channel beam splitter 1622 is reflected by the subsequent sixth channel beam splitter 1622, seventh channel beam splitter 1623, and eighth channel beam splitter 1624 to form multiple reference light channels. The eighth channel beam splitter 1624 of the last channel uses a reflector to reflect the beam to form a reference light channel.

[0063] The reference beam from the reference light channel enters the multi-channel relay lens assembly 18, forming a multi-channel reference beam that illuminates the photosensitive material on the photosensitive material platform 4. The direction of the reference beam from each reference light channel can be independently and precisely controlled by the scanning lens assembly 17. The difference between the intrinsic aberration of the relay lens assembly 18 for each channel of the reference light illumination mechanism and the residual aberration between each channel is less than one-tenth of the wavelength; and the translational aberration between each channel is less than one-tenth of the wavelength of the light source, ensuring that the reference light output through each channel meets the common phase splicing condition.

[0064] The data processing subsystem 2 includes dedicated computing hardware FPGA and corresponding software. The data processing subsystem 2 receives the three-dimensional object information obtained by actual measurement and calculates and decomposes the wavefront information of the three-dimensional object. The wavefront information includes amplitude information, primary phase information, and secondary phase information. The wavefront information is grouped into multiple sub-areas according to the viewing angle, and each sub-area corresponds to a sub-wavefront. Each sub-wavefront is holographically encoded to form a corresponding multiple composite sub-light fields. Each composite sub-light field corresponds one-to-one to the object light illumination channel. The composite light field information is input into the composite light field output subsystem. The composite light field consists of a layer of amplitude-modulated image information and a layer of phase-modulated image information.

[0065] The composite light field output subsystem 3 includes an amplitude-modulated LCD screen 31, a phase-modulated LCD screen 34, and a multi-channel Fourier transform lens assembly 33. The residual aberration of the multi-channel Fourier transform lens assembly and the difference in residual aberration between its channels are less than one-tenth of a wavelength. The precision motion subsystem 6 independently drives the amplitude-modulated LCD screen 31 and the phase-modulated LCD screen 34. The translational aberrations between the multi-channel Fourier transform lens assembly are sufficiently small that the light fields output through each channel meet the common-phase splicing condition.

[0066] Precision motion subsystem 6 includes two-dimensional translation stages 61, 62, and 63. Two-dimensional translation stage 61 is connected to photosensitive material platform 4 and drives the photosensitive material for two-dimensional precision movement. Two-dimensional translation stages 62 and 63 are connected to display screens 33 and 31, respectively, and drive the displays for two-dimensional precision movement.

[0067] Motion control subsystem 5 coordinates and controls precision motion subsystem 6 and scanning mirror assembly 17 in the reference light path. Computer 6, through host computer software, coordinates and controls the illumination subsystem, the output of the data processing subsystem, the output of the composite light field output subsystem, and the motion control subsystem, enabling the wavefront information of the three-dimensional pattern to be recorded sequentially and in parallel on the photosensitive material.

[0068] Example 3:

[0069] See attached Figure 3 , Figure 3 It is a composite holographic lithography system in this embodiment.

[0070] The composite holographic lithography system in this embodiment includes an illumination subsystem 1 , a data processing subsystem 2 , a composite light field output subsystem 3 , a photosensitive material platform 4 , a motion control subsystem 5 , a precision motion subsystem 6 and a controller 7 .

[0071] The illumination subsystem 1 includes: a light source 11, a collimating beam expander 12, a reflector 13, a beam splitter 14, an object light illumination mechanism and a reference light illumination mechanism. The object light illumination mechanism includes a first channel beam splitter group 161, and the reference light illumination mechanism includes an aperture 15, a second channel beam splitter group 162, a scanning mirror group 17 and a multi-channel relay lens group 18.

[0072] In the embodiment of the present application, there are two reflectors 13, which are respectively a first reflector 131 and a second reflector 132 for easy distinction. The embodiment of the present application does not limit the number of reflectors 13. In the embodiment of the present application, the first channel beam splitter group 161 includes four channel beam splitters. For easy distinction, the four channel beam splitters are respectively a first channel beam splitter 1611, a second channel beam splitter 1612, a third channel beam splitter 1613 and a fourth channel beam splitter 1614, wherein the first channel beam splitter 1611, the second channel beam splitter 1612 and the third channel beam splitter 1613 are semi-transparent and semi-reflective beam splitters, and the fourth channel beam splitter 1614 is a reflector. The embodiment of the present application does not limit the number of channel beam splitters in the first channel beam splitter group. In other embodiments, the number of channel beam splitters can also be two, three, or more than five. In the embodiment of the present application, the second channel beam splitter group 162 includes four channel beam splitters. For the convenience of distinction, the four channel beam splitters are respectively the fifth channel beam splitter 1621, the sixth channel beam splitter 1622, the seventh channel beam splitter 1623 and the eighth channel beam splitter 1624. Among them, the fifth channel beam splitter 1621, the sixth channel beam splitter 1622 and the seventh channel beam splitter 1623 are semi-transparent and semi-reflective beam splitters, and the eighth channel beam splitter 1624 is a reflective mirror. The embodiment of the present application does not limit the number of channel beam splitters in the second channel beam splitter group. In other embodiments, the number of channel beam splitters can also be two, three, or more than five. In the embodiment of the present application,

[0073] The light source 11 emits a laser, which forms a wide laser beam after passing through the collimating beam expander 12. The wide laser beam is divided into an object beam and a reference beam after passing through the first reflector 131 and the beam splitter 14. The reflected beam of the beam splitter 14 is the object beam, and the transmitted beam of the beam splitter 14 is the reference beam. After being reflected by the second reflector 132, the object beam illuminates the first channel beam splitter 1612 of the first channel beam splitter group 161. The first channel beam splitter 1612 reflects part of the beam to form an illumination channel. Similarly, the transmitted light of the first channel beam splitter 1612 is reflected in turn by the subsequent second channel beam splitter 1612, the third channel beam splitter 1613 and the fourth channel beam splitter 1614 to form multiple illumination channels. The fourth channel beam splitter 1614 of the last channel uses a reflector to reflect the beam to form an illumination channel. The beams in each illumination channel illuminate the corresponding channel of the composite light field output subsystem 3.

[0074] After passing through aperture 15, the reference beam is split into two beams by the fifth channel beam splitter 1621 of the second channel beam splitter assembly 162 on the reference light path. The reflected beam illuminates the scanning mirror assembly 17 and is reflected by the scanning mirror assembly 17 to form a reference light channel. The transmitted light from the fifth channel beam splitter 1622 is reflected by the subsequent sixth channel beam splitter 1622, seventh channel beam splitter 1623, and eighth channel beam splitter 1624 to form multiple reference light channels. The eighth channel beam splitter 1624 of the last channel uses a reflector to reflect the beam to form a reference light channel.

[0075] The reference beam from the reference light channel enters the multi-channel relay lens assembly 18, forming a multi-channel reference beam that illuminates the photosensitive material on the photosensitive material platform 4. The direction of the reference beam from each reference light channel can be independently and precisely controlled by the scanning lens assembly 17. The difference between the intrinsic aberration of the relay lens assembly 18 for each channel of the reference light illumination mechanism and the residual aberration between each channel is less than one-tenth of the wavelength; and the translational aberration between each channel is less than one-tenth of the wavelength of the light source, ensuring that the reference light output through each channel meets the common phase splicing condition.

[0076] The data processing subsystem 2 includes dedicated computing hardware GPU, CPU and corresponding software. The data processing subsystem 2 receives the three-dimensional object information obtained by actual measurement and calculates and decomposes the wavefront information of the three-dimensional object. The wavefront information includes amplitude information, primary phase information and secondary phase information. The wavefront information is grouped into multiple sub-areas according to the viewing angle, and each sub-area corresponds to a sub-wavefront. Each sub-wavefront is holographically encoded to form a corresponding multiple composite sub-light fields. Each composite sub-light field corresponds one-to-one to the object light illumination channel. The composite light field information is input into the composite light field output subsystem. The composite light field consists of a layer of amplitude-modulated image information and a layer of phase-modulated image information.

[0077] The composite light field output subsystem 3 includes an amplitude-modulated LCD display screen 31, a reflective phase-modulated display screen 35, and a multi-channel Fourier transform lens group 33. The LCD display screen 31 and the reflective phase-modulated display screen 35 are located on opposite sides of the first channel beam splitter group 161. After the object light beam is reflected by the first channel beam splitter group 161, it illuminates the reflective phase-modulated display screen 35, and then its reflected light passes through the amplitude-modulated LCD display screen 31 and enters the multi-channel Fourier transform lens group. The difference between the residual aberration of the multi-channel Fourier transform lens group and the residual aberration between its channels is less than one tenth of a wavelength. The precision motion subsystem 6 independently drives the amplitude-modulated LCD screen 31 and the reflective phase-modulated display screen 35. The translational aberration between the multi-channel Fourier transform lens groups is small enough so that the light field output through each channel can meet the common phase splicing condition.

[0078] Precision motion subsystem 6 includes two-dimensional translation stages 61, 62, and 63. Two-dimensional translation stage 61 is connected to photosensitive material platform 4 and drives the photosensitive material for two-dimensional precision movement. Two-dimensional translation stages 62 and 63 are connected to display screens 35 and 31, respectively, and drive the displays for two-dimensional precision movement.

[0079] Motion control subsystem 5 coordinates and controls precision motion subsystem 6 and scanning mirror assembly 17 in the reference light path. Controller 7, through computer host software, coordinates and controls the illumination subsystem, the output of the data processing subsystem, the output of the composite light field output subsystem, and the motion control subsystem, enabling the wavefront information of the three-dimensional pattern to be recorded sequentially and in parallel on the photosensitive material.

[0080] Example 4:

[0081] See attached Figure 4 , Figure 4 It is a composite holographic lithography system in this embodiment.

[0082] The composite holographic lithography system in this embodiment includes an illumination subsystem 1 , a data processing subsystem 2 , a composite light field output subsystem 3 , a photosensitive material platform 4 , a motion control subsystem 5 , a precision motion subsystem 6 and a controller 7 .

[0083] The illumination subsystem 1 includes: a light source 11, a collimating beam expander 12, a reflector 13, a beam splitter 14, an object light illumination mechanism and a reference light illumination mechanism. The object light illumination mechanism includes a first channel beam splitter group 161, and the reference light illumination mechanism includes an aperture 15, a second channel beam splitter group 162, a scanning mirror group 17 and a multi-channel relay lens group 18.

[0084] In the embodiment of the present application, the reflector 13 is two, for the convenience of distinction, respectively, the first reflector 131 and the second reflector 132. The number of the reflector 13 is not limited in the embodiment of the present application. In the embodiment of the present application, the first channel beam splitter group 161 includes four channel beam splitters, for the convenience of distinction, the four channel beam splitters are respectively the first channel beam splitter 1611, the second channel beam splitter 1612, the third channel beam splitter 1613 and the fourth channel beam splitter 1614, wherein the first channel beam splitter 1611, the second channel beam splitter 1612 and the third channel beam splitter 1613 are half-transmission half-reflection beam splitters, and the fourth channel beam splitter 1614 is a reflector. The number of the channel beam splitters in the first channel beam splitter group is not limited in the embodiment of the present application, and in other embodiments, the number of the channel beam splitters can also be two, three or more than five. In the embodiment of the present application, the second channel beam splitter group 162 includes four channel beam splitters, for the convenience of distinction, the four channel beam splitters are respectively the fifth channel beam splitter 1621, the sixth channel beam splitter 1622, the seventh channel beam splitter 1623 and the eighth channel beam splitter 1624, wherein the fifth channel beam splitter 1621, the sixth channel beam splitter 1622 and the seventh channel beam splitter 1623 are half-transmission half-reflection beam splitters, and the eighth channel beam splitter 1624 is a reflector. The number of the channel beam splitters in the second channel beam splitter group is not limited in the embodiment of the present application, and in other embodiments, the number of the channel beam splitters can also be two, three or more than five. In the embodiment of the present application,

[0085] The light source 11 emits laser light, and the laser light forms a wide laser beam after passing through the collimating expander 12. The wide laser beam is divided into an object beam and a reference beam after passing through the first reflector 131 and the beam splitter 14. The reflected beam of the beam splitter 14 is the object beam, and the transmitted beam of the beam splitter 14 is the reference beam. The object beam illuminates the first channel beam splitter 1612 of the first channel beam splitter group 161 after being reflected by the second reflector 132. The first channel beam splitter 1612 reflects part of the beam to form an illumination channel. Similarly, the transmitted light of the first channel beam splitter 1612 is reflected by the subsequent second channel beam splitter 1612, the third channel beam splitter 1613 and the fourth channel beam splitter 1614 to form multiple illumination channels. The fourth channel beam splitter 1614 of the last channel uses a reflector to reflect the beam to form an illumination channel. The beams in each illumination channel illuminate the corresponding channel of the composite light field output subsystem 3.

[0086] After passing through aperture 15, the reference beam is split into two beams by the fifth channel beam splitter 1621 of the second channel beam splitter assembly 162 on the reference light path. The reflected beam illuminates the scanning mirror assembly 17 and is reflected by the scanning mirror assembly 17 to form a reference light channel. The transmitted light from the fifth channel beam splitter 1622 is reflected by the subsequent sixth channel beam splitter 1622, seventh channel beam splitter 1623, and eighth channel beam splitter 1624 to form multiple reference light channels. The eighth channel beam splitter 1624 of the last channel uses a reflector to reflect the beam to form a reference light channel.

[0087] The reference beam from the reference light channel enters the multi-channel relay lens assembly 18, forming a multi-channel reference beam that illuminates the photosensitive material on the photosensitive material platform 4. The direction of the reference beam from each reference light channel can be independently and precisely controlled by the scanning lens assembly 17. The difference between the intrinsic aberration of the relay lens assembly 18 for each channel of the reference light illumination mechanism and the residual aberration between each channel is less than one-tenth of a wavelength; and the translational aberration between each channel is also less than one-tenth of a wavelength, ensuring that the reference light output through each channel meets the common phase splicing condition.

[0088] The data processing subsystem 2 includes dedicated computing hardware GPU, CPU and corresponding software. The data processing subsystem 2 receives the three-dimensional object information obtained by actual measurement and calculates and decomposes the wavefront information of the three-dimensional object. The wavefront information includes amplitude information, primary phase information and secondary phase information. The wavefront information is grouped into multiple sub-areas according to the viewing angle, and each sub-area corresponds to a sub-wavefront. Each sub-wavefront is holographically encoded to form a corresponding multiple composite sub-light fields. Each composite sub-light field corresponds one-to-one to the object light illumination channel. The composite light field information is input into the composite light field output subsystem. The composite light field consists of a layer of amplitude-modulated image information and a layer of phase-modulated image information.

[0089] The composite light field output subsystem 3 includes an amplitude-modulated LCD display 31, a reflective, non-refreshable fixed-phase structure device 36, and a multi-channel Fourier transform lens group 33. The LCD display 31 and the reflective, non-refreshable fixed-phase structure device 36 are located on opposite sides of the first channel beam splitter group 161. After being reflected by the first channel beam splitter group 161, the object light beam illuminates the reflective, non-refreshable fixed-phase structure device 36. The reflected light then passes through the amplitude-modulated LCD display 31 and enters the multi-channel Fourier transform lens group. The difference between the residual aberration of the multi-channel Fourier transform lens group and the residual aberration between its channels is less than one-tenth of a wavelength. The precision motion subsystem 6 independently drives the amplitude-modulated LCD screen 31 and the reflective, non-refreshable fixed-phase structure device 36. The translational aberration between the multi-channel Fourier transform lens groups is sufficiently small that the light fields output through each channel can meet the common-phase splicing condition.

[0090] Precision motion subsystem 6 includes two-dimensional translation stages 61, 62, and 63. Two-dimensional translation stage 61 is connected to photosensitive material platform 4 and drives the photosensitive material for two-dimensional precision movement. Two-dimensional translation stages 62 and 63 are connected to display screens 36 and 31, respectively, to drive the displays for two-dimensional precision movement.

[0091] Motion control subsystem 5 coordinates and controls precision motion subsystem 6 and scanning mirror assembly 17 in the reference light path. Controller 7, through computer host software, coordinates and controls the illumination subsystem, the output of the data processing subsystem, the output of the composite light field output subsystem, and the motion control subsystem, enabling the wavefront information of the three-dimensional pattern to be recorded sequentially and in parallel on the photosensitive material.

[0092] Example 5

[0093] The embodiment of the present invention provides a composite holographic lithography method, such as Figure 5 As shown, a composite holographic lithography method, using the composite holographic lithography system mentioned above, includes:

[0094] S10: Acquire wavefront information of the desired pattern structure.

[0095] The types of required pattern structures include two-dimensional patterns and three-dimensional patterns.

[0096] S20: Decompose the wavefront information into pure phase information or pure amplitude information or amplitude and phase information.

[0097] The amplitude information includes amplitude information of wavefronts corresponding to the three primary colors.

[0098] The phase information includes one or more of primary phase information, secondary phase information and higher-order phase information.

[0099] S30: Grouping the wavefront information according to the viewing angle to form a plurality of sub-regions, each sub-region corresponding to a sub-wavefront.

[0100] Among them, multiple sub-areas are closely arranged, and the perspectives of each sub-area are spliced ​​with each other or partially overlapped.

[0101] S40: Encode the sub-wavefront information in each sub-region respectively to form a corresponding plurality of composite sub-light fields.

[0102] The composite sub-light field includes two or more layers of planar information; the planar information includes amplitude transmittance information, phase transmittance information, or fused coding information of amplitude transmittance information and phase transmittance information.

[0103] S50: Inputting the composite sub-light fields into the composite light field output subsystem in sequence.

[0104] S60: illuminating the composite light field output subsystem so that the sub- wavefronts diffracted by the composite sub-light fields output by the composite light field output subsystem are co-phased spliced.

[0105] S70: sequentially exposing the photosensitive material by the interference field formed by the reference light and the sub-wavefronts diffracted by the composite sub-light fields.

Claims

1. A composite holographic lithography system, characterized in that: include: Illumination subsystem (1), data processing subsystem (2), composite light field output subsystem (3) and photosensitive material platform (4), The illumination subsystem (1) includes a light source (11), an object light illumination mechanism, and a reference light illumination mechanism. The object light illumination mechanism includes a plurality of object light illumination channels. The reference light illumination mechanism includes a plurality of reference light channels. The object light illumination channels are used to illuminate the light emitted by the light source to the composite light field output subsystem. The reference light channels are used to illuminate the light emitted by the light source to the photosensitive material carried by the photosensitive material platform (4). The data processing subsystem (2) is used to receive three-dimensional image information or three-dimensional structure information, convert the three-dimensional image information or three-dimensional structure information into wavefront information, and group the wavefront information into multiple sub-regions according to viewing angles, each sub-region corresponding to a sub-wavefront information; encode the sub-wavefront information to form corresponding composite sub-light field information, and input the composite sub-light field information into the composite light field output subsystem (3); The composite light field output subsystem (3) is used to receive light from the multiple object light channels of the illumination subsystem (1), receive multiple composite sub-light field information from the data processing subsystem (2), transmit the composite sub-light field to the photosensitive material carried by the photosensitive material platform (4), and use the sub-wavefront diffracted by the composite sub-light field to expose multiple areas of the photosensitive material; The photosensitive material platform (4) is used for placing the photosensitive material, and the photosensitive material is used for receiving the light of the composite sub-light field and the light transmitted by the reference light channel, and performing interference recording.

2. The composite holographic lithography system according to claim 1, characterized in that: include: A precision motion subsystem (6) for carrying the photosensitive material platform (4) and for driving the photosensitive material platform (4) to move; The motion control subsystem (5) is used to control the motion of the precision motion subsystem (6) and to control the reflection of the light of the reference light channel so that the light of the reference light channel can reach the photosensitive material at a specified angle.

3. The composite holographic lithography system according to claim 2, wherein: The composite light field output subsystem (3) comprises: A movable composite light field modulator, comprising a movable first plane display (31) and a movable second plane display (32, 34, 35), wherein the first plane display (31) and the second plane display (32, 34, 35) are stacked, and the first plane display (31) and the movable second plane display (32, 34, 35) are independently driven by the precision motion subsystem (6), and the display comprises a refreshable display, a non-refreshable fixed pattern or fixed phase structure device; A multi-channel Fourier transform lens group (33), wherein the Fourier transform lens group comprises a lens or a lens group; the intrinsic aberration of the lens or lens group of each channel is less than a first preset value; the difference in residual aberration between each channel is less than a second preset value; the translation aberration between each channel is less than a third preset value, so that the light fields output by each channel can be spliced ​​in common phase; and the sub-wavefronts diffracted by the composite light field of each channel can interfere in common phase.

4. The composite holographic lithography system according to claim 3, characterized in that: The movable composite light field modulator comprises a plurality of sub-display areas, and each sub-display area corresponds to a Fourier transform lens group (33) of a channel.

5. The composite holographic lithography system according to claim 3 or 4, characterized in that: The first flat panel display (31) and the movable second flat panel display (32, 34, 35) each include an amplitude modulation type flat panel display and a phase modulation type flat panel display; Optionally, the first flat panel display (31) and the second flat panel display (32, 34, 35) are stacked.

6. The composite holographic lithography system according to claim 1, wherein: Also includes: The controller is connected to the lighting subsystem, the data processing subsystem, and the motion control subsystem, and coordinates and controls the lighting subsystem, the data processing subsystem, and the motion control subsystem to run in a time sequence.

7. The composite holographic lithography system according to claim 2, characterized in that: The illumination subsystem further includes a beam expander collimator, a reflector, an aperture, and a scanning mirror assembly; The motion control subsystem is connected to the precision motion subsystem, and the precision motion subsystem independently drives the movable composite light field modulator, the photosensitive material platform (4) and the scanning mirror group.

8. A composite holographic lithography method, characterized in that: The composite holographic lithography system according to any one of claims 1 to 7 comprises: Obtaining wavefront information of a desired pattern structure; Decomposing the wavefront information into pure phase information or pure amplitude information or amplitude and phase information; Grouping the wavefront information into multiple sub-regions according to viewing angles, each sub-region corresponding to a sub-wavefront; Encoding the sub-wavefront information in each sub-region to form corresponding multiple composite sub-light fields; Inputting the composite sub-light fields into the composite light field output subsystem in sequence; Illuminating the composite light field output subsystem so that the sub-wavefronts of the composite sub-light fields diffracted by the composite light field output subsystem are spliced ​​in common phase; The photosensitive material is sequentially exposed using the sub-wavefronts diffracted by the composite sub-light field, or the photosensitive material is sequentially exposed using the interference field formed by the coherence of the reference light and the sub-wavefronts diffracted by the composite sub-light field.

9. The composite holographic lithography method according to claim 8, characterized in that: The types of the desired pattern structures include two-dimensional patterns and three-dimensional patterns; or / and, The amplitude information includes amplitude information of wavefronts corresponding to the three primary colors; or / and, The phase information includes one or more of primary phase information, secondary phase information and higher-order phase information.

10. The composite holographic lithography method according to claim 8 or 9, characterized in that: The multiple sub-areas are closely arranged, and the viewing angles of the sub-areas are spliced ​​together or partially overlapped; and / or, The composite sub-light field includes more than two layers of planar information; the planar information includes amplitude transmittance information, phase transmittance information, or fused coding information of amplitude transmittance information and phase transmittance information.

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