Drawing data generation method, drawing data generation apparatus, drawing data generation program, exposure system, and device manufacturing method

Abstract

In order to shorten the generation time of data representing a pattern generated by a spatial light modulator, a method for generating drawing data representing a drawing pattern formed by the spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, a computer executes the steps of: generating first drawing data indicating a first drawing pattern corresponding to a first pattern from design data indicating a design pattern in which a second pattern including a plurality of repeatedly arranged first patterns is repeatedly arranged and which corresponds to a predetermined exposure pattern; generating second drawing data indicating a second drawing pattern corresponding to the second pattern on the basis of the generated first drawing data and first information indicating the repeating form of the first pattern; and generating drawing data representing the drawing pattern on the basis of the generated second drawing data and second information representing the repetition form of the second pattern.

Description

Technical Field

[0001] The present invention relates to a method for generating drawing data, a drawing data generating device, a drawing data generating program, an exposure system and a device manufacturing method. Background Art

[0002] A so-called maskless exposure device has been proposed, which uses a spatial light modulator (SLM) having an array of multiple micro-mirrors with variable tilt angles to generate a variable pattern on the object plane of a projection optical system (for example, refer to Patent Document 1).

[0003] It is desired to shorten the time required to generate data representing a pattern to be generated by a spatial light modulator.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: U.S. Patent No. 6747783 Summary of the invention

[0007] According to the first disclosed form, in a method for generating drawing data, the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator. In the method for generating the drawing data, a computer executes: generating first drawing data representing a first drawing pattern corresponding to the first pattern from design data representing a design pattern, wherein the design pattern is a second pattern including a plurality of the first patterns repeatedly configured, corresponding to the prescribed exposure pattern; generating second drawing data representing a second drawing pattern corresponding to the second pattern based on the generated first drawing data and first information representing a repeated form of the first pattern; and generating the drawing data representing the drawing pattern based on the generated second drawing data and second information representing a repeated form of the second pattern.

[0008] According to the second disclosed form, in a method for generating drawing data, the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator. In the method for generating drawing data, a computer executes: acquiring first information representing a repetitive form of a first pattern repeatedly configured in a design pattern corresponding to the prescribed exposure pattern; accepting a designation of second drawing data used as first drawing data representing a first drawing pattern corresponding to the first pattern; and generating the drawing data of the drawing pattern using the designated second drawing data and the first information.

[0009] According to the third disclosed form, in a method for generating drawing data, the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator. In the method for generating the drawing data, a computer executes: generating design data representing a design pattern corresponding to the exposure pattern using a function defined by a user; and generating the drawing data of the drawing pattern by converting the design data.

[0010] According to the fourth disclosed form, in a method for generating drawing data, the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator. In the method for generating the drawing data, a computer performs the following steps: obtaining drawing data of each of a plurality of different drawing patterns that are pre-generated and have a size smaller than the drawing pattern; and configuring the drawing data of the plurality of different drawing patterns in accordance with a predetermined rule, thereby generating the drawing data of the drawing pattern.

[0011] According to the fifth disclosed form, a drawing data generating device generates drawing data, wherein the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator, and the drawing data generating device comprises: a first generating unit, which generates first drawing data representing a first drawing pattern corresponding to the first pattern from design data, wherein the design data repeatedly configures a second pattern including a plurality of the repeatedly configured first patterns, corresponding to the prescribed exposure pattern; a second generating unit, which generates second drawing data representing a second drawing pattern corresponding to the second pattern based on the generated first drawing data and first information representing a repeated form of the first pattern; and a third generating unit, which generates the above-mentioned drawing data representing the above-mentioned drawing pattern based on the generated second drawing data and second information representing a repeated form of the second pattern.

[0012] According to the sixth disclosed form, a drawing data generating device generates drawing data, wherein the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator, and the drawing data generating device comprises: an acquiring unit that acquires first information representing a repetitive form of a first pattern repeatedly configured in a design pattern corresponding to the prescribed exposure pattern; an accepting unit that accepts a designation of second drawing data used as first drawing data representing a first drawing pattern corresponding to the first pattern; and a generating unit that generates the drawing data of the drawing pattern using the designated second drawing data and the first information.

[0013] According to the seventh disclosed form, a drawing data generating device generates drawing data, wherein the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator, and the drawing data generating device comprises: a first generating unit which generates design data representing a design pattern corresponding to the exposure pattern using a function defined by a user; and a second generating unit which generates the drawing data of the drawing pattern by converting the design data.

[0014] According to the form disclosed in Article 8, a drawing data generating device generates drawing data, wherein the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator, and the drawing data generating device comprises: an acquisition unit, which acquires the drawing data of each of a plurality of different drawing patterns that are pre-generated and have a size smaller than the drawing pattern; and a generation unit, which configures the drawing data of the plurality of different drawing patterns in accordance with a predetermined rule, thereby generating the drawing data of the drawing pattern.

[0015] According to the 9th disclosed form, a drawing data generating program is a program for generating drawing data, wherein the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator, and the drawing data generating program causes a computer to execute: generating first drawing data representing a first drawing pattern corresponding to the first pattern from design data representing a design pattern, wherein the design pattern is a second pattern repeatedly configured with a plurality of the first patterns repeatedly configured, corresponding to the prescribed exposure pattern; generating second drawing data representing a second drawing pattern corresponding to the second pattern based on the generated first drawing data and first information representing a repeated form of the first pattern; and generating the drawing data representing the drawing pattern based on the generated second drawing data and second information representing a repeated form of the second pattern.

[0016] According to the tenth disclosed form, a drawing data generating program is a program for generating drawing data, wherein the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator, and the drawing data generating program causes a computer to execute: acquiring first information representing a repetitive form of a first pattern repeatedly configured in a design pattern corresponding to the prescribed exposure pattern; accepting a designation of second drawing data used as first drawing data representing a first drawing pattern corresponding to the first pattern; and generating the drawing data of the drawing pattern using the designated second drawing data and the first information.

[0017] According to the form disclosed in Article 11, a drawing data generating program is a program for generating drawing data, wherein the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator, and the drawing data generating program causes a computer to execute: generating design data representing a design pattern corresponding to the exposure pattern using a function defined by a user; and generating the drawing data of the drawing pattern by converting the design data.

[0018] According to the form disclosed in Article 12, a drawing data generating program is a program for generating drawing data, wherein the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator, and the drawing data generating program causes a computer to execute: obtaining drawing data of each of a plurality of different drawing patterns that are pre-generated and have a size smaller than the drawing pattern; and configuring the drawing data of the plurality of different drawing patterns in accordance with a predetermined rule, thereby generating the drawing data of the drawing pattern.

[0019] According to the form disclosed in Article 13, the exposure system comprises: the above-mentioned drawing data generating device; and an exposure device, which comprises a spatial light modulator, which causes the above-mentioned spatial light modulator to form the above-mentioned drawing pattern based on the above-mentioned drawing data generated by the above-mentioned drawing data generating device, and forms the above-mentioned prescribed exposure pattern on the substrate using the exposure light passing through the above-mentioned spatial light modulator.

[0020] According to the form disclosed in Article 14, the device manufacturing method includes: using the above-mentioned drawing data generating device to generate the above-mentioned drawing data of the above-mentioned drawing pattern; based on the above-mentioned drawing data, the above-mentioned spatial light modulator forms the above-mentioned drawing pattern, using the exposure light passing through the above-mentioned spatial light modulator to form the above-mentioned prescribed exposure pattern on the substrate; and processing the surface of the above-mentioned substrate using the above-mentioned prescribed exposure pattern formed on the above-mentioned substrate as a mask.

[0021] According to the 15th disclosed form, in a method for generating drawing data, the drawing data represents a drawing pattern formed by the spatial light modulator in order to form a prescribed exposure pattern on a substrate using exposure light passing through the spatial light modulator. In the method for generating the drawing data, a computer executes: displaying design data representing a design pattern corresponding to the prescribed exposure pattern; determining, from the design patterns, a second local design pattern that is identical to a first local design pattern in a designated area specified using an image of the displayed design data; generating local drawing data corresponding to the first local design pattern in the designated area; and setting the generated local drawing data to local drawing data corresponding to the determined second local design pattern.

[0022] In addition, the structure of the embodiment described later can be appropriately improved, and at least a part of it can be replaced by other structures. Moreover, the structural elements whose configuration is not particularly limited are not limited to the configuration disclosed in the embodiment, and can be configured at a position where their functions can be realized. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 This is a schematic diagram showing the exposure system according to the first embodiment.

[0024] Figure 2 This is a diagram showing an example of a spatial light modulator.

[0025] Figure 3 middle, Figure 3 (A) is a diagram showing an example of a hardware configuration of a data generating device. Figure 3 (B) is a functional block diagram of the data generating device.

[0026] Figure 4 middle, Figure 4 (A) is a diagram for explaining a target pattern, a design pattern, and a drawing pattern. Figure 4 (B) is a diagram for explaining stripe data and exposure patterns.

[0027] Figure 5 This is a flowchart (part 1) showing an example of processing executed by the data generating device.

[0028] Figure 6 This is a flowchart (part 2) showing an example of processing executed by the data generating device.

[0029] Figure 7 This is a diagram showing an example of a design pattern displayed on the display unit by the display control unit.

[0030] Figure 8 middle, Figure 8 (A) is a diagram for explaining the range of the main pattern. Figure 8 (B) shows an example of repeated pattern information of the main pattern. Figure 8 (C) and Figure 8 (D) shows an example of repeated configuration information of the main pattern.

[0031] Fig. 9 This is a diagram showing an example of a main pattern displayed in an enlarged manner on the display unit.

[0032] Fig.10 middle, Fig.10 (A)~ Fig.10 (L) is a diagram for explaining a sub-pattern.

[0033] Fig.11 This is a flowchart showing an example of sub-pattern processing.

[0034] Fig.12 It is an enlarged view showing a region where sub-patterns are arranged.

[0035] Fig.13 The figure shows the determined sub-patterns with hatching.

[0036] Fig.14 middle, Fig.14 (A) means Figure 6 FIG. 1 is a diagram showing an example of the repeated pattern information generated at the time when step S27 is completed. Fig.14 (B) is a diagram showing an example of repeated configuration information.

[0037] Fig.15 This is a diagram illustrating partitioning.

[0038] Fig.16 This is a diagram showing an example of a partition including a repeated pattern and a pattern other than a repeated pattern.

[0039] Fig.17 middle, Fig.17 (A) is a diagram showing the structure of an exposure system according to a second embodiment. Fig.17 (B) is a diagram showing a configuration of an exposure system according to a modified example of the second embodiment.

[0040] Fig.18 This is a diagram for explaining a super lens.

[0041] Fig.19 It is a diagram showing the structure of the exposure system according to the third embodiment.

[0042] Fig. 20 A diagram showing a small pattern. DETAILED DESCRIPTION

[0043] 《First Implementation Method》

[0044] based on Figures 1 to 16 The exposure system 500A according to the first embodiment will be described.

[0045] Figure 1 FIG. 5 is a schematic diagram showing an exposure system 500A according to the first embodiment. Figure 1 As shown, the exposure system 500A includes the exposure device 200 and the data generating device 100A.

[0046] (Exposure Device 200)

[0047] The exposure device 200 is an exposure device that uses a spatial light modulator (SLM) that modulates exposure light under the control of an exposure control unit 260 described later.

[0048] like Figure 1 As shown, the exposure device 200 includes an illumination system 210, a pattern generating device 220, a projection optical system 230, a stage device 240, an alignment detection system 250, and an exposure control unit 260. In the description of the exposure device 200, two directions orthogonal to each other in the horizontal plane are set as the X direction and the Y direction, and the vertical direction is set as the Z direction. In addition, the rotation (tilt) directions around the X axis, the Y axis, and the Z axis are set as the θx direction, the θy direction, and the θz direction, respectively.

[0049] The illumination system 210 includes a light source unit (not shown), an illumination optical system 211, and a reflector 212. As an example, the light source unit includes a solid-state laser light source (DFB semiconductor laser, fiber laser, etc.). The illumination optical system 211 includes a shaping optical system for changing illumination conditions, an optical integrator, a field aperture, and a relay lens system (all not shown).

[0050] The pattern generator 220 generates a pattern to be projected onto a photosensitive layer of a wafer W mounted on a stage 241 (described later) of the stage device 240 under the control of the exposure controller 260. The pattern generator 220 includes a spatial light modulator 221 and a drive unit 222.

[0051] Figure 2 2 is a diagram showing an example of the spatial light modulator 221. Figure 2 As shown, the spatial light modulator 221 is, for example, a DMD (Digital Mirror Device), which has a plurality of micromirror mechanisms M arranged in a matrix (two-dimensional, array) in an XY plane. Each of the micromirror mechanisms M has a micromirror M1 and a driving mechanism M2 disposed on the opposite side of the reflective surface of the micromirror M1. The driving mechanism M2 rotates the micromirror M1 around an axis extending in the X direction.

[0052] The driving unit 222 drives the driving mechanisms M2 of the plurality of micromirror mechanisms M according to the control signal from the exposure control unit 260 , and switches the micromirror M1 between an open state (open position) and a closed state (closed position).

[0053] When the illumination light IL from the illumination system 210 is incident on the micromirror M1 in the on state, the 0th-order diffracted light IL0 of the illumination light IL is incident on the projection optical system 230. On the other hand, when the illumination light IL from the illumination system 210 is incident on the micromirror M1 in the off state, the 0th-order diffracted light IL1 of the illumination light IL reaches the non-exposure optical path away from the projection optical system 230. The pattern generating device 220 gives the illumination light IL a pattern by setting each of the plurality of micromirrors M1 to either the on state or the off state.

[0054] In addition, the spatial light modulator 221 is not limited to the form of switching between the on state and the off state by tilting the micromirror, and may also be a form of generating a phase difference by tilting the micromirror or a form of generating a phase difference by moving the micromirror up and down. In addition, the spatial modulator 221 is not limited to DMD, and may be, for example, a magnetic optical spatial light modulator (MOSLM: MagnetoOptic Spatial Light Modulator) or the like. In addition, the spatial light modulator 221 is described as a reflective type that reflects the illumination light IL, but the spatial light modulator 221 may also be a transmissive type that transmits the illumination light IL, or may be a diffraction type that diffracts the illumination light IL. The spatial light modulator 221 only needs to be able to modulate the illumination light IL spatially and temporally.

[0055] The projection optical system 230 projects the image of the light modulation surface of the spatial light modulator 221 to the wafer W disposed on the stage 241 at a reduced projection magnification β (as an example, β=1 / 200, 1 / 400, 1 / 500, etc.). That is, an exposure pattern is formed on the wafer W using the energy beam passing through the pattern generator 220. In addition, the projection magnification of the projection optical system 230 can also be equal or magnified. The projection optical system includes a barrel 230s and a plurality of optical elements (not shown) disposed inside the barrel 230s in a predetermined positional relationship.

[0056] The stage device 240 includes a stage (substrate stage) 241 , a laser interferometer 242 , and a stage driving unit 243 .

[0057] The stage 241 holds the wafer W via a wafer holder (not shown) provided at the center of the upper surface. The stage 241 is movable in the X direction, the Y direction, and the Z direction by the stage driving unit 243 , and is rotatable around an axis extending in the Z direction.

[0058] The laser interferometer 242 irradiates the reflective surfaces of the end faces of the stage 241 in the X and Y directions with a length measuring beam, thereby constantly detecting the position of the stage 241 in the X, Y, and θz directions with a resolution of, for example, about 0.5 to 1 nm.

[0059] The stage driving section 243 drives the stage 241 according to a control signal from the exposure control section 260 .

[0060] The alignment detection system 250 is disposed on the side of the projection optical system 230. In the present embodiment, an imaging type alignment sensor is used as the alignment detection system 250. The detailed structure of the alignment detection system 250 is disclosed in, for example, US Pat. No. 5,637,129.

[0061] The alignment detection system 250 detects the tracks or the position detection marks formed on the wafer W. The detection results of the tracks or the position detection marks by the alignment detection system 250 are output to the exposure control unit 260 .

[0062] The exposure control unit 260 controls the pattern generating device 220 based on the stripe data generated by the data generating device 100A (details will be described later), and controls the actions of the lighting system 210, the stage device 240, etc., and projects the image of the pattern generated by the spatial light modulator 221 onto the wafer W held by the stage 241 via the projection optical system 230.

[0063] When the spatial light modulator 221 is illuminated by the illumination light IL from the illumination system 210, the illumination light IL reflected by the micromirror M1 of the spatial light modulator 221 in the turned-on state, that is, the illumination light IL given a pattern by the spatial light modulator 221, is incident on the projection optical system 230, and a reduced image (partial inverted image) of the pattern is formed in the projection area IA on the wafer W held on the stage 241.

[0064] In this embodiment, the exposure control unit 260 performs exposure in a step-and-scan manner. In addition, during the scanning exposure process, the exposure control unit 260 moves the stage 241 at an appropriate speed while synchronously scrolling the pattern generated by the spatial light modulator 221 (i.e., changing the shape of the pattern generated by the spatial light modulator 221).

[0065] As exposure device 200 having the above-described structure, an exposure device disclosed in U.S. Patent No. 8,089,616, U.S. Patent Publication No. 2020 / 00257205, or International Publication No. 2005 / 081034 can be used.

[0066] (Data Generating Device 100A)

[0067] Next, the data generating device 100A will be described. The data generating device 100A is, for example, a PC (Personal Computer) or a server. Figure 3 (A) shows an example of the hardware configuration of the data generating device 100A.

[0068] like Figure 3 As shown in (A), the data generating device 100A includes a CPU (Central Processing Unit) 190, a ROM (Read Only Memory) 192, a RAM (Random Access Memory) 194, a storage unit (SSD (Solid State Drive) etc.) 196, a display unit 193, an input unit 195, a network interface 197, and a removable storage medium drive 199 etc. The display unit 193 includes a liquid crystal display etc., and the input unit 195 includes a keyboard, a mouse, a touch panel etc. The various components of the structure of the data generating device 100A are connected to a bus 198.

[0069] Figure 3 (B) is a functional block diagram of the data generating device 100A. Figure 3 As shown in (B), the data generating device 100A includes a data acquiring unit 101, a display control unit 102, a receiving unit 106, a repetition information storage unit 109, a first drawing data generating unit 103, a first drawing data storage unit 107, a second drawing data generating unit 104, a second drawing data storage unit 108 and a stripe data generating unit 105.

[0070] The data acquisition unit 101, the display control unit 102, the receiving unit 106, the first drawing data generating unit 103, the second drawing data generating unit 104, and the stripe data generating unit 105 are implemented by the CPU 190 executing a program (including a drawing data generating program) stored in the ROM 192 or the storage unit 196, or a program (including a drawing data generating program) read from the removable storage medium 191 by the removable storage medium driver 199. The repetition information storage unit 109, the first drawing data storage unit 107, and the second drawing data storage unit 108 are implemented, for example, by the storage unit 196. In addition, the functions of the data acquisition unit 101, the display control unit 102, the receiving unit 106, the first drawing data generating unit 103, the second drawing data generating unit 104, and the stripe data generating unit 105 can also be implemented by an integrated circuit such as an ASIC (Application Specific Integrated Circuit), an FPGA (Field Programmable Gate Array), or a GPU (Graphics Processing Unit).

[0071] The data acquisition unit 101 acquires target pattern data representing an exposure pattern (hereinafter referred to as a target pattern) to be formed on the wafer W, and design data representing a design pattern (also referred to as a polygonal mask) corresponding to the exposure pattern obtained by performing OPC (Optical Proximity Correction) on the target pattern data. The design data representing the design pattern is, for example, data in the OASIS or GDSII format.

[0072] The display control unit 102 performs processing such as displaying the design pattern indicated by the design data acquired by the data acquisition unit 101 on the display unit 193 .

[0073] The accepting unit 106 accepts a user operation on the design pattern displayed on the display unit 193. The accepting unit 106 generates repetition pattern information and repetition arrangement information (details will be described later) based on the operation accepted from the user, and stores them in the repetition information storage unit 109.

[0074] The first drawing data generating unit 103 and the second drawing data generating unit 104 generate drawing data representing a pattern (hereinafter referred to as a drawing pattern) to be generated by the spatial light modulator 221, using the design data, the repetition pattern information and the repetition arrangement information stored in the repetition information storing unit 109. Details of the drawing data generated by the first drawing data generating unit 103 and the second drawing data generating unit 104 will be described later.

[0075] The first drawing data storage unit 107 stores the drawing data generated by the first drawing data generation unit 103 , and the second drawing data storage unit 108 stores the drawing data generated by the second drawing data generation unit 104 .

[0076] Before describing the processing executed by the data generating device 100A, each pattern and data will be described. Figure 4 (A) is a diagram for explaining a target pattern, a design pattern, and a drawing pattern. Figure 4 (B) is a diagram for explaining stripe data and exposure patterns.

[0077] Figure 4 The target pattern shown on the left side of (A) is a pattern to be formed on the wafer W.

[0078] In an exposure device such as a scanning stepper or a stepper used in a photolithography process for manufacturing devices such as semiconductor elements (electronic devices or micro devices), there is a case where the line width of a pattern formed on a wafer W after exposure changes according to the pitch, or the position of the end of the pattern changes due to an optical proximity effect (OPE). Therefore, if the spatial light modulator 221 generates a pattern based on a drawing pattern generated by converting a target pattern, there is a case where a desired pattern cannot be formed on the wafer W.

[0079] Therefore, in order to correct the change of the pattern caused by the OPE characteristics, the line width of the target pattern is corrected in advance or an auxiliary pattern is added to offset the change caused by the OPE characteristics. The pattern obtained by performing OPC on the target pattern is the design pattern ( Figure 4 The center of (A). Figure 4 As shown in (A), the design pattern is slightly different from the target pattern. The design data representing the design pattern is data in vector format.

[0080] If the design data is converted into bitmap format (also called raster format), drawing data is obtained. Drawing data is a representation of Figure 4 The data of the drawing pattern shown on the right side of (A). Each pixel of the drawing pattern is represented by either white or black. Figure 4 In (A), for example, a white pixel corresponds to an on state of the mirror of the spatial light modulator 221, and a black pixel corresponds to a off state of the mirror.

[0081] The stripe data generating unit 105 generates stripe data used for controlling the pattern generating device 220 using the drawing data generated in this way. Figure 4 The left side of (B) shows data in which the drawing data is arranged at a desired position and a part thereof is extracted in accordance with the number of pixels of the spatial light modulator 221 .

[0082] Based on the fringe data, the spatial light modulator 221 generates a pattern, and the generated pattern is projected onto the wafer W, thereby Figure 4 As shown on the right side of (B), an exposure pattern substantially equal to the target pattern is formed (exposed) on the wafer W.

[0083] When converting design data to obtain drawing data, it may take a long time to generate drawing data due to imaging calculations, etc. Therefore, in the first embodiment, the time required to generate drawing data is shortened by the processing described below.

[0084] (Processing of Data Generating Device 100A)

[0085] Figure 5 and Figure 6 This is a flowchart showing an example of processing executed by the data generating device 100A.

[0086] For example, when the drawing data generating software is started by the user and the drawing data generating program is executed, the drawing data generating program starts. Figure 5 processing.

[0087] exist Figure 5 In the process, first, the data acquisition unit 101 acquires the target pattern data and the design data (step S11). For example, when the user specifies the file of the target pattern data and the design data, the data acquisition unit 101 reads the specified file and acquires the target pattern data and the design data.

[0088] When the data acquisition unit 101 acquires the target pattern data and the design data, the display control unit 102 displays the design pattern on the display unit 193 based on the design data (step S13 ).

[0089] Figure 7 FIG. 2 shows an example of a design pattern DP displayed on the display unit 193 by the display control unit 102. Figure 7 As shown, there are multiple regions in which the same pattern is repeatedly arranged in the design pattern DP. For example, the pattern MP1 is repeatedly arranged in the region MR1, and the pattern MP2 is repeatedly arranged in the region MR2. For convenience, the patterns MP1 and MP2 are referred to as main patterns MP1 and MP2. In addition, in the following description, there is a case where a pattern repeatedly arranged in the design pattern is referred to as a repeated pattern.

[0090] return Figure 5 The receiving unit 106 waits until the main pattern of repeated arrangement is specified (step S15 / No). The user can specify the main pattern MP1 by dragging the mouse to frame the main pattern MP1 with a rectangular frame on the screen displaying the design pattern DP. In this case, the rectangular frame can also be called a specified area.

[0091] When the main pattern is specified (step S15 / Yes), the receiving unit 106 generates repeated pattern information and repeated configuration information for the specified main pattern (step S17). The repeated pattern information is information for extracting a pattern repeatedly configured in the design pattern from the design pattern, and the repeated configuration information is information indicating the repeated form of the pattern (how the repeatedly configured pattern is configured).

[0092] The processing of step S17 will be described in detail. First, the receiving unit 106 refers to the patterns arranged around the designated main pattern MP1 to determine the accurate range of the main pattern MP1. Then, based on the accurate range of the main pattern MP1, the receiving unit 106 determines the information necessary to extract the main pattern MP1 from the design pattern.

[0093] Next, the receiving unit 106 searches for a pattern identical to the designated main pattern MP1 from the design pattern. For example, the receiving unit 106 determines whether the pattern arranged around the designated main pattern MP1 is identical to the designated main pattern MP1, and continues searching until a pattern identical to the designated main pattern MP1 is no longer determined. In the generation of the drawing data described later, the drawing data as raster data is pasted, so the search is performed under the condition that the repetition interval becomes an integer multiple of the pixel size. In the first embodiment, the search for the pattern identical to the designated main pattern MP1 is performed using a target pattern. This is because, as described above, in the design pattern after OPC, there is a situation where even the same pattern in the target pattern has a different shape. In addition, the design pattern may be used instead of the target pattern for the search. In this case, the data acquisition unit 101 may not acquire the target pattern in step S11.

[0094] The receiving unit 106 generates duplicate arrangement information based on the search result.

[0095] Figure 8 (A) is a diagram for explaining the range of the main pattern MP1. Figure 8 (B) shows an example of repeated pattern information of the main pattern MP1. Figure 8 (C) and Figure 8 (D) shows an example of the repetitive arrangement information of the main pattern MP1.

[0096] For example, let Figure 8 The coordinates of the upper left vertex C1 of the rectangle of the range of the main pattern MP1 shown in (A) are (x3, y3), the length of one side in the X direction is X3, and the length of one side in the Y direction is Y3.

[0097] In this case, the receiving unit 106 generates Figure 8 Repeating pattern information as shown in (B). Figure 8As shown in (B), the repeated pattern information is, for example, data in a comma-delimited format. In the first embodiment, the repeated pattern information includes a command for generating a depicted pattern, a name for uniquely identifying the repeated pattern, a level at which the repeated pattern exists, and information indicating the range of the repeated pattern. In addition, the repeated pattern information is not limited to data in a comma-delimited format, but may also be data in other formats (for example, data in a tab-delimited format, XML (Extensible Markup Language), JSON (JavaScript Object Notation), and other structured data). In addition, it may be in a binary format instead of a text format.

[0098] For example, Figure 8 In (B), the leftmost "SOURCE" is the conversion command from the design pattern to the drawing pattern. The second "MAIN_PATTERN_1" from the left is the name used to uniquely identify the main pattern MP1. The third value from the left indicates the level at which the repeated pattern exists. For example, "0" indicates that the repeated pattern is the main pattern. In addition, "1" indicates that the repeated pattern is a sub-pattern (details will be described later). The fourth to seventh values ​​from the left are information indicating the range of the repeated pattern. For example, the fourth and fifth values ​​from the left respectively indicate Figure 8 The sixth and seventh values ​​of the X-coordinate and Y-coordinate of the upper left vertex C1 of the rectangular range of the main pattern MP1 shown in (A) respectively represent the length of the rectangular range of the main pattern MP1 in the X direction and the length in the Y direction.

[0099] on the other hand, Figure 8 The repetitive arrangement information shown in (C) includes, for example, a method of arranging a repetitive pattern, a name of a pattern to be repetitively arranged, and information indicating details of the method of arranging a repetitive pattern.

[0100] Here, in Figure 8 In the example of (A), the number of repeated patterns (main patterns MP1) is 7 in the X direction and 7 in the Y direction, and they are arranged in an array. The X coordinate and Y coordinate of the start position SL1 of the region where the main pattern MP1 is repeatedly arranged are x4 and y4, respectively.

[0101] In this case, the repeated configuration information becomes, for example, Figure 8 “PASTE_ARRAY, MAIN_PATTERN_1, x4, y4, 7, 7” shown in (C).

[0102] exist Figure 8 In the repetition arrangement information of (C), the first "PASTE_ARRAY" from the left indicates that the repetition pattern specified by the second item from the left is arranged in an array.

[0103] The third to sixth values ​​from the left are information indicating the details of the arrangement method of the repeated pattern. The third and fourth values ​​from the left respectively indicate the X coordinate and Y coordinate indicating the arrangement start position of the repeated pattern, the fifth value indicates the number of rows (the number of patterns arranged along the Y direction), and the sixth value indicates the number of columns (the number of patterns arranged along the X direction).

[0104] In addition, the arrangement method of the repeated pattern is not limited to the array shape ("PASTE_ARRAY"), for example, the repeated pattern can also be arranged in a step shape. In this case, for example, Figure 8 In addition, the third and fourth values ​​from the left represent the X-coordinate and Y-coordinate of the configuration start position of the repeated pattern, respectively, the fifth value represents the order, the sixth value represents the number of repeated patterns configured in the first order, and the seventh value represents the decrease in the number of repeated patterns per order when it is a negative value, and represents the increase in the number of repeated patterns per order when it is a positive value.

[0105] The repetition pattern information and repetition arrangement information generated in this way are stored in the repetition information storage unit 109 .

[0106] return Figure 5 After step S17 is completed, the display control unit 102 enlarges the designated main pattern and displays it on the display unit 193 (step S19). Fig. 9 FIG. 2 shows an example of a main pattern MP1 displayed in an enlarged manner on the display unit 193. Fig. 9 As shown, in the main pattern MP1, there is also a region where the same pattern is repeatedly arranged. In the following description, the pattern repeatedly arranged in the main pattern is called a sub-pattern. In addition, not only the main pattern but also the sub-pattern is an example of a repeated pattern.

[0107] Fig.10 (A)~ Fig.10 (L) is a diagram for explaining a sub-pattern. Fig.10 (A) shows the main pattern MP1, Fig.10 (B)~ Fig.10 (L) shows a sub-pattern.

[0108] exist Fig.10 In the main pattern MP1 shown in (A), in the region SR1, Fig.10 The pattern SP1 shown in (B) is repeatedly arranged in the region SR2. Fig.10 The pattern SP2 shown in (C) is repeatedly arranged in the region SR3. Fig.10 Sub-pattern SP3 shown in (D).

[0109] In addition, in the region SR4, there are repeated configurations Fig.10 The sub-pattern SP4 shown in (E) is repeatedly configured in the region SR5. Fig.10 The sub-pattern SP5 shown in (F) is repeatedly configured in the region SR6. Fig.10 In addition, in the region SR7, there are repeatedly arranged Fig.10 The sub-pattern SP7 shown in (H) is repeatedly configured in the region SR8. Fig.10 The sub-pattern SP8 shown in (I) is repeatedly configured in the region SR9. Fig.10 The sub-pattern SP9 shown in (J) is repeated in the region SR10. Fig.10 The sub-pattern SP10 shown in (K) is repeatedly arranged in the region SR11. Fig.10 Sub-pattern SP11 shown in (L).

[0110] return Figure 5 After the main pattern is enlarged and displayed (step S19), the receiving unit 106 determines whether to execute the sub-pattern processing (step S21). For example, when the user presses the "sub-pattern designation" button displayed on the screen, the receiving unit 106 determines that the sub-pattern processing is to be executed (step S21 / Yes), and executes the sub-pattern processing (step S23). In the case of not executing the sub-pattern processing (step S21 / No), the process moves to step S27 described later.

[0111] Fig.11 is a flowchart showing an example of sub-pattern processing. Fig.11 In the process of, first, the receiving unit 106 waits until a sub-pattern is specified in the main pattern displayed in the enlarged manner (step S231 / No). When the sub-pattern is specified (step S231 / Yes), the receiving unit 106 generates repeated pattern information for the sub-pattern (step S232), and generates repeated arrangement information for the sub-pattern (step S233). In addition, the specified sub-pattern is an example of the first partial design pattern.

[0112] Here, in Fig.10 In the main pattern MP1 shown in (A), the sub-pattern SP4 of the region SR4 (refer to Fig.10 Taking the case where (E)) is specified as an example, the processing of step S232 and step S233 is explained.

[0113] Fig.12 is an enlarged view of region SR4. The user changes the display magnification, for example, to enlarge and display region SR4 on display unit 193, and Fig.12As shown in FIG. 1 , one of the sub-patterns SP4 repeatedly arranged in the region SR4 is framed by a rectangular frame FR2 by a drag operation of a mouse. Thus, the sub-pattern SP4 is designated. The rectangular frame FR2 may also be referred to as a designated region.

[0114] When the sub-pattern SP4 is designated, the receiving unit 106 refers to the patterns arranged around the designated sub-pattern SP4 to determine the accurate range of the sub-pattern SP4 and generates repeated pattern information for the sub-pattern SP4 similarly to the case of the main pattern MP1.

[0115] Next, the receiving unit 106 searches for a pattern identical to the designated sub-pattern SP4 around the designated sub-pattern SP4, and determines the sub-pattern SP4 that is repeatedly arranged. As in the case of the main pattern, the search is performed under the condition that the repetition interval is an integral multiple of the pixel size. In addition, in the first embodiment, when searching for a pattern identical to the designated sub-pattern SP4, as in the case of the main pattern, it is assumed that the determination of whether the pattern is identical is performed using the target pattern. In addition, as in the case of the main pattern, a design pattern may be used instead of the target pattern. In addition, the pattern identical to the designated sub-pattern SP4 is an example of a second partial design pattern.

[0116] Fig.13 The figure shows the determined sub-pattern SP4 with hatching. The repeatedly configured sub-pattern SP4 is determined in the region SR4-1 in the region SR4. In addition, since there is a blank area between the region SR4-1 and the region SR4-2 (due to the repetition interruption), the search process for the sub-pattern SP4 is not performed in the region SR4-2.

[0117] As a result of the search process, the repetition form of the sub-pattern SP4 in the region SR4 - 1 can be determined. Therefore, similarly to the case of the main pattern MP1 , the receiving unit 106 generates repetition arrangement information indicating the repetition form of the sub-pattern SP4 .

[0118] return Fig.11 When the generation of the repeated pattern information and the repeated arrangement information for the specified sub-pattern is completed, the receiving unit 106 determines whether a pasting instruction has been received (step S234). The pasting instruction is an instruction to generate repeated arrangement information for a region different from the region where the repeated arrangement information was generated in step S233, when the sub-pattern specified in step S231 is repeatedly arranged in the region different from the region where the repeated arrangement information was generated in step S233.

[0119] For example, in Fig.13In the case where the user wants to generate repeated arrangement information of the sub-pattern SP4 for the region SR4-2, the user frames the pattern corresponding to the sub-pattern SP4 arranged in the region SR4-2 with a rectangular frame FR3. Alternatively, the user may determine the position of the frame FR3 by connecting the vertices of the figure inside the sub-pattern SP4 and the vertices of the figure inside the corresponding frame FR3. As a result, the receiving unit 106 determines that the pasting instruction has been accepted.

[0120] When the pasting instruction is accepted (step S234 / Yes), the accepting unit 106 generates the repeated arrangement information for the region SR4-2 (step S235). For example, the accepting unit 106 first determines whether the pattern framed by the frame FR3 is the same as the sub-pattern SP4 specified in step S231. And, when the pattern framed by the frame FR3 is the same as the sub-pattern SP4 specified in step S231, the accepting unit 106 searches for the same pattern as the sub-pattern SP4 in the same manner as in the process in the region SR4-1, and determines the sub-pattern SP4 repeatedly arranged around the sub-pattern SP4 framed by the frame FR3. Then, the accepting unit 106 determines the repeated form of the sub-pattern SP4 based on the determination result, and generates the repeated arrangement information of the sub-pattern SP4 in the region SR4-2. In addition, when the pattern framed by the frame FR3 is not the same as the sub-pattern SP4 specified in step S231, the process of step S235 is not performed, and the process is transferred to step S236.

[0121] After the processing of step S235 is completed or the paste instruction is not received (step S234 / No), the receiving unit 106 determines whether the end instruction of the sub-pattern processing is received (step S236). If the end instruction of the sub-pattern processing is not received (step S236 / No), the process returns to step S234. On the other hand, if the end instruction of the sub-pattern processing is received, the process transfers to step S234. Figure 5 Step S25.

[0122] The receiving unit 106 determines whether the sub-pattern processing is completed for all sub-patterns included in the main pattern (step S25). For example, the receiving unit 106 determines whether the sub-pattern processing is completed for all sub-patterns based on whether the user presses a "sub-pattern designation completion" button displayed on the screen.

[0123] If the sub-pattern processing has not been completed for all sub-patterns (step S25 / No), the process returns to step S23. Thus, the user can perform sub-pattern processing on the repeatedly arranged sub-patterns (SP1 to SP3, SP5 to SP11) other than the sub-pattern SP4, for example.

[0124] On the other hand, when the sub-pattern processing is completed for all sub-patterns (step S25 / Yes), the receiving unit 106 determines whether a drawing data generation instruction ( Figure 6 : Step S27) For example, when a "drawing data generation" button displayed on the screen is pressed, the receiving unit 106 determines that a drawing data generation instruction has been received.

[0125] When the drawing data generation instruction is not received (step S27 / No), the process returns to step S15. Thus, the user can perform the above-mentioned process on other main patterns (for example, main pattern MP2) that are repeatedly arranged.

[0126] On the other hand, when the drawing data generation instruction is received (step S27 / Yes), the first drawing data generating unit 103 generates drawing data representing a drawing pattern of a sub-pattern (hereinafter referred to as sub-pattern drawing data) based on the repeated pattern information (step S29 ).

[0127] Fig.14 (A) is a diagram showing an example of the repetitive pattern information generated at the time point when step S27 is completed. Fig.14 (B) is a diagram showing an example of repeated configuration information.

[0128] For example, the first drawing data generating unit 103 reads the repeated pattern information, and when the third value from the left indicating the level at which the repeated pattern exists is "1" (sub-pattern), extracts the design pattern of the sub-pattern from the design pattern DP based on the fourth to seventh values ​​from the left, and converts the extracted design pattern into a drawing pattern.

[0129] Next, the first drawing data generating unit 103 generates drawing data representing a drawing pattern of a main pattern (hereinafter referred to as drawing data of a main pattern) based on the generated drawing data of the sub-pattern and the repetition arrangement information of the sub-pattern (step S31 ).

[0130] Specifically, the first drawing data generating unit 103 pastes the drawing data of the sub-pattern generated in step S29 based on the repeated arrangement information of the sub-pattern to the area where the sub-patterns are repeatedly arranged, and converts the design data to generate the drawing data of the main pattern to the area where the repeated pattern is not arranged.

[0131] In other words, for example, for the region SR4 where the sub-pattern SP4 is repeatedly arranged, the drawing data of the generated sub-pattern SP4 is set to the drawing data corresponding to the pattern determined to be the same as the sub-pattern SP4. That is, for the pattern determined to be the same as the sub-pattern SP4, the drawing data of the generated sub-pattern SP4 is not converted to generate drawing data, but the drawing data of the pattern determined to be the same as the sub-pattern SP4 is used as the drawing data of the pattern.

[0132] Furthermore, the drawing data of the sub-pattern SP4 is allocated to the drawing data coordinates as a part of the drawing data of the main pattern based on the position of the sub-pattern SP4 specified in the design pattern, and the drawing data corresponding to the pattern determined to be the same as the sub-pattern SP4 is allocated to the drawing data coordinates as another part of the drawing data of the main pattern based on the position of the pattern determined to be the same as the sub-pattern SP4 in the design pattern.

[0133] When design data is converted to generate drawing data, it may take a long time to generate drawing data because of imaging calculations, etc. In the first embodiment, since the drawing data of the sub-patterns that have been generated are pasted to the area where the sub-patterns are repeatedly arranged, it is not necessary to perform imaging calculations, etc. Therefore, compared with the case where design data is converted to generate all the drawing data of the main pattern, the generation time of the drawing data of the main pattern can be shortened.

[0134] The drawing data of the main pattern generated by the first drawing data generating unit 103 is stored in the first drawing data storing unit 107 .

[0135] Next, the second drawing data generating unit 104 arranges the drawing data of the main pattern stored in the first drawing data storing unit 107 based on the repeated arrangement information of the main pattern, thereby generating a drawing data representing the entire pattern (see Figure 7 ) of the drawing pattern (hereinafter referred to as the drawing data of the entire pattern) (step S33).

[0136] In the generation of the drawing data of the entire pattern, Fig.15 As shown, the entire pattern is divided into partitions SC of a specified size, and drawing data is generated for each partition SC. At this time, the second drawing data generating unit 104 changes the method of generating drawing data when (1) the partition does not contain a repeated pattern, (2) all the patterns contained in the partition are repeated patterns, and (3) the partition contains repeated patterns and patterns other than repeated patterns. In the case of (1), the second drawing data generating unit 104 converts the design data as in the past to generate drawing data. In the case of (2), the second drawing data generating unit 104 generates drawing data by pasting the drawing data of the already generated repeated pattern (for example, the drawing data of the main pattern MP1) into the partition SC. As a result, since there is no need to perform imaging calculations, etc., the time required to generate drawing data can be shortened compared to the case where the design data is converted to generate drawing data.

[0137] Next, use Fig.16 The situation (3) is explained. Fig.16 is a diagram showing an example of a subarea SC1 including a repeated pattern and a pattern other than a repeated pattern. Fig.16In the figure, the repeating pattern is arranged in the region where the region R1 and the region R2 are combined. Here, if the drawing pattern of the repeating pattern is directly arranged in the regions R1 and R2, there is a possibility that it will not match the drawing pattern of the region R3 where a pattern other than the repeating pattern is arranged. Therefore, in the region R2 (region R2 adjacent to the region R3) which is the peripheral portion of the region where the region R1 and the region R2 where the repeating pattern is arranged are combined, the drawing pattern of the repeating pattern is adjusted to match the drawing pattern of the region R3. In this way, an exposure pattern that is closer to the target pattern can be formed on the wafer W. In addition, when generating the drawing data of the main pattern, the main pattern can be divided into partitions of a specified size, and drawing data can be generated for each partition. In addition, when generating the drawing data of the sub-pattern, the sub-pattern can be divided into partitions of a specified size, and drawing data can be generated for each partition.

[0138] The generated drawing data (bitmap file) of each section SC is stored in the second drawing data storage unit 108 .

[0139] After the processing of step S33 is completed, the stripe data generating unit 105 combines the drawing data of each subarea SC stored in the second drawing data storing unit 108 to generate stripe data (step S34). Figure 5 and Figure 6 By causing the spatial light modulator 221 to generate a pattern based on the fringe data and projecting the generated pattern onto the wafer W, an exposure pattern substantially the same as the target pattern can be formed on the wafer W.

[0140] In addition, Figure 5 and Figure 6 In the process of , when all main patterns do not include sub-patterns, the process of step S29 is not performed, and the design pattern of the range corresponding to the main pattern is extracted based on the repeated pattern information of the main pattern in step S31, and the extracted design pattern is converted into a drawing pattern to generate drawing data. In this case, the main pattern corresponds to the first partial design pattern, and the pattern identical to the main pattern corresponds to the second partial design pattern.

[0141] As described in detail above, according to the first embodiment, the data generating device 100A generates drawing data indicating a drawing pattern to be formed by the spatial light modulator 221 in order to form a predetermined exposure pattern on the wafer W using exposure light passing through the spatial light modulator 221. The data generating device 100A includes: a first drawing data generating unit 103 that generates drawing data indicating a drawing pattern of a sub-pattern from design data indicating a design pattern, and generates drawing data indicating a drawing pattern corresponding to a main pattern based on the generated drawing data of the sub-pattern and repetition arrangement information indicating a repetition form of the sub-pattern, wherein the design pattern is a main pattern including a plurality of repetitively arranged sub-patterns, which corresponds to the predetermined exposure pattern; and a second drawing data generating unit 104 that generates drawing data indicating a drawing pattern of the entire pattern based on the generated drawing data of the main pattern and repetition arrangement information indicating a repetition form of the main pattern.

[0142] For a main pattern in which the same sub-pattern is repeatedly arranged, part of the drawing data of the main pattern is generated by creating and pasting the drawing data of the sub-pattern, so that the time for generating the drawing data of the main pattern can be shortened compared with the case where the design data is converted to generate all the drawing data of the main pattern. In addition, for a main pattern repeatedly arranged in the entire pattern, part of the drawing data of the entire pattern is generated by pasting the generated drawing data of the main pattern, so that the time for generating the drawing data of the entire pattern can be shortened compared with the case where the design data is converted to generate the drawing data of the entire pattern.

[0143] In addition, in the first embodiment, the data generating device 100A includes: a display control unit 102 that displays the design pattern on the display unit 193; and a receiving unit 106 that receives the designation of a main pattern from the design pattern displayed on the display unit 193. The display control unit 102 enlarges the designated main pattern and displays it on the display unit 193, and the receiving unit 106 receives the designation of a sub-pattern from the main pattern that is enlarged and displayed on the display unit 193, and generates the repetitive pattern information and repetitive arrangement information necessary for generating the drawing pattern of the sub-pattern from the design data based on the designation. Thus, the user can specify the main pattern and the sub-pattern that are repeatedly arranged while viewing the design pattern displayed on the display unit 193. In addition, when the user specifies the main pattern and the sub-pattern that are repeatedly arranged, the repetitive pattern information and the repetitive arrangement information are automatically generated, so that the user's work burden can be reduced.

[0144] In addition, in the first embodiment, the receiving unit 106 generates repeated arrangement information for an area including a designated sub-pattern and where sub-patterns are repeatedly arranged. The receiving unit 106 searches and determines a pattern identical to the designated sub-pattern and generates the repeated arrangement information, so the user does not need to specify the repeatedly arranged sub-patterns one by one, which can reduce the user's workload and operation time.

[0145] In addition, in the first embodiment, the receiving unit 106 receives the designation of a second region (for example, region SR4-2) in which the sub-pattern is repeatedly arranged, which is different from the first region (for example, region SR4-1) in which the sub-pattern is repeatedly arranged, and generates the repeated arrangement information for the second region. Thus, even when the sub-pattern is repeatedly arranged in the second region different from the first region, the repeated arrangement information can be generated, and further, for the second region, drawing data can be generated by pasting the drawing pattern of the sub-pattern, so that the time for generating the drawing data can be shortened.

[0146] In addition, in the first embodiment, the data generating device 100A includes: a display control unit 102 that displays design data representing a design pattern corresponding to a prescribed exposure pattern on a display unit 193; a receiving unit 106 that determines a pattern identical to a sub-pattern in a designated area specified using an image of the displayed design data from the design pattern; and a first drawing data generating unit 103 that generates drawing data corresponding to the sub-pattern in the designated area, and sets the generated drawing data as drawing data corresponding to the determined pattern. The first drawing data generating unit 103 generates drawing data corresponding to the pattern determined to be identical to the sub-pattern by copying the drawing data corresponding to the sub-pattern, assigns the drawing data corresponding to the sub-pattern as a part of the drawing data to the drawing data coordinates based on the position of the sub-pattern in the design pattern, and assigns the drawing data corresponding to the pattern determined to be identical to the sub-pattern to the drawing data coordinates as another part of the drawing data based on the position of the determined pattern in the design pattern.

[0147] In addition, the receiving unit 106 determines a pattern identical to the main pattern in the designated area specified using the image of the displayed design data from the design pattern, and the data generating device 100A includes a second drawing data generating unit 104, which generates drawing data corresponding to the main pattern in the designated area, and sets the generated drawing data as drawing data corresponding to the determined pattern. Furthermore, the second drawing data generating unit 104 generates drawing data corresponding to the pattern determined to be identical to the main pattern by copying the drawing data corresponding to the main pattern, and assigns the drawing data corresponding to the main pattern as a part of the drawing data to the drawing data coordinates based on the position of the main pattern in the design pattern. Furthermore, the second drawing data generating unit 104 assigns the drawing data corresponding to the pattern determined to be identical to the main pattern to the drawing data coordinates as another part of the drawing data based on the position of the determined pattern in the design pattern.

[0148] Since the drawing data of the generated sub-pattern is assigned to the drawing data coordinates as the drawing data of the pattern determined to be the same as the sub-pattern, the time for generating the drawing data can be shortened compared with the case where the design data is converted to generate the drawing data of the drawing pattern including the repeatedly arranged sub-patterns. In addition, since the drawing data of the generated main pattern is assigned to the drawing data coordinates as the drawing data of the pattern determined to be the same as the main pattern, the time for generating the drawing data can be shortened compared with the case where the design data is converted to generate the drawing data of the drawing pattern.

[0149] Furthermore, in the above-mentioned first embodiment, a case where the user specifies the main pattern and the sub-patterns to be repeatedly arranged has been described, but the present invention is not limited to this.

[0150] For example, the designer who generates the target pattern knows where the repeated pattern exists in the target pattern. Therefore, the designer may generate the repeated pattern information and repeated configuration information based on the target pattern data. In this case, the data generating device 100A may obtain the repeated pattern information and repeated configuration information generated by the designer and perform Figure 6 Processing of steps S29 to S34.

[0151] In addition, for example, the data generating device 100A can also automatically generate repeated pattern information and repeated configuration information by utilizing the fact that the design data is a tree structure of cells. In this case, as long as cells with a large number of instances or cells designated as candidates by the designer (for example, cells that can be designated by the PROPERTY element of OASIS) are extracted as repeated patterns, for the location where the cell appears, it is confirmed whether it can be copied in units of cells (whether it matches the pixel boundary after conversion) and whether it overlaps with other patterns (for example, whether there is no additional wiring pattern), and repeated configuration information can be generated if there is no problem.

[0152] Furthermore, in the above-mentioned embodiment, instead of specifying the main pattern and the sub-pattern from the design pattern displayed on the screen, for example, a pattern stored in an external device and already having a drawing pattern generated therein may be specified as the main pattern or the sub-pattern. In this case, the receiving unit 106 only needs to search for an area where a pattern identical to the main pattern or the sub-pattern stored in the external device is repeatedly arranged. Alternatively, the user may instruct the receiving unit 106 to generate the repeated arrangement information by giving an instruction to paste the main pattern or the sub-pattern stored in the external device.

[0153] In the above embodiment, an example of data generation including three stages of sub-pattern, main pattern and whole pattern is shown, but exposure data may be generated in a greater number of stages. For example, the sub-pattern may further include a repeated pattern, and previously generated drawing data may be pasted to this portion.

[0154] <<Second Implementation Method>>

[0155] Next, the second embodiment will be described. In the first embodiment, the data generating device 100A acquires pre-generated design data, but in the second embodiment, the design data is generated using a function defined by the user, thereby generating drawing data.

[0156] Fig.17 (A) is a diagram showing a configuration of an exposure system 500B according to the second embodiment. The exposure system 500B includes a data generating device 100B and an exposure device 200. Since the configuration of the exposure device 200 is the same as that of the first embodiment, description thereof will be omitted.

[0157] The data generating device 100B according to the second embodiment includes a user-defined function storage unit 111 , a user-defined function execution unit 112 , a drawing data generating unit 113 , a drawing data storage unit 114 , and a stripe data generating unit 115 .

[0158] The user-defined function storage unit 111 stores functions defined by the user (hereinafter referred to as user-defined functions). A user-defined function is a function that generates a design pattern according to a specified input and output standard, and can be created by a user of the exposure system as a script file of a high-level script processing language such as Python. The form of the user-defined function is not limited to this, as long as it is an external program that operates according to a specified command or a dynamically linked shared library, and a means by which the behavior can be changed by the user without changing the data generation device. In addition, the user-defined function can also call other programs to generate a design pattern.

[0159] The user-defined function execution unit 112 executes the user-defined function on each section SC to generate a design pattern in the section SC.

[0160] The drawing data generating unit 113 converts the design pattern generated by the user-defined function executing unit 112 into a drawing pattern for each sub-area SC, and generates drawing data for each sub-area SC. The generated drawing data is stored in the drawing data storing unit 114. The drawing data storing unit 114 stores the drawing data (bitmap file) for each sub-area SC.

[0161] The stripe data generating unit 115 generates stripe data by combining the drawing data stored in the drawing data storing unit 114 .

[0162] Generally, a target pattern is generated, the target pattern is converted into a design pattern, and the design pattern is converted into a drawing pattern, thereby generating drawing data. However, according to the second embodiment, a design pattern is generated at any time by a user-defined function, so there is no need to prepare target pattern data and design data in advance. As a result, the time taken to complete the generation of drawing data can be shortened.

[0163] (Variation Example)

[0164] Fig.17 (B) is a diagram showing a configuration of an exposure system 500B' according to a modification of the second embodiment. The exposure system 500B' includes a data generating device 100B' and an exposure device 200. The configuration of the exposure device 200 is the same as that of the first embodiment, and therefore description thereof will be omitted.

[0165] In the modification of the second embodiment, the data generating device 100B′ includes a data acquiring unit 121 , a user-defined function storing unit 122 , a user-defined function executing unit 123 , a drawing data generating unit 124 , a drawing data storing unit 125 , and a stripe data generating unit 126 .

[0166] The data acquisition unit 121 acquires design data. The user-defined function storage unit 122 stores a user-defined function. The user-defined function in the modification is a function for performing a predetermined process (for example, execution of OPC, readjustment of OPC, etc.) on the design pattern of each subarea SC extracted from the design data.

[0167] The user-defined function execution unit 123 extracts the design patterns corresponding to each partition SC from the design patterns acquired by the data acquisition unit 121 in sequence, executes the user-defined function on the extracted design patterns, thereby performing prescribed processing on the extracted design patterns (processing the design patterns), and outputs them to the drawing data generation unit 124 as the design patterns in the partition SC.

[0168] The drawing data generating unit 124 converts the design pattern input from the user-defined function executing unit 123 into a drawing pattern, generates drawing data for the section SC, and stores the data in the drawing data storing unit 125 .

[0169] The stripe data generating unit 126 generates stripe data by combining the drawing data for each section SC stored in the drawing data storing unit 125 .

[0170] According to the modification of the second embodiment, when generating drawing data, it is possible to perform predetermined processing on the design data using a user-defined function, and thus the degree of freedom in generating drawing data is improved.

[0171] 《Third Implementation Method》

[0172] The third embodiment will describe the case of generating drawing data used in the manufacture of a planar optical element called a metasurface, taking a meta lens as an example. Fig.18 As shown in FIG. 1 , a superlens is a lens having a structure in which a pattern finer than the wavelength of target light is arranged on a flat plate.

[0173] The drawing data of the drawing pattern used for manufacturing the metalens can be generated by converting the design data into drawing data after performing OPC on the target pattern data to obtain the design data. However, the larger the diameter of the metalens, the larger the file size of the design data representing the design pattern obtained by performing OPC on the target pattern. For example, it is considered that when the diameter is 1 mm, the file size of the design data is about tens of MB, and when the diameter is 180 mm, it becomes hundreds of GB. If the drawing data generation of the second embodiment is used, there is no need to create a huge file, but when generating drawing data from design data with such a large area file size, there is also the possibility that it will take weeks to months, for example.

[0174] Therefore, in the third embodiment, design data indicating a design pattern corresponding to the exposure pattern of the super surface is not generated, but drawing data of the drawing pattern is generated.

[0175] Fig.19 1 is a diagram showing a configuration of an exposure system 500C according to the third embodiment. The exposure system 500C includes a data generating device 100C and an exposure device 200. Since the configuration of the exposure device 200 is the same as that of the first embodiment, description thereof will be omitted.

[0176] The data generating device 100C according to the third embodiment includes a small pattern storage unit 131 , a user-defined function storage unit 132 , a user-defined function execution unit 133 , a drawing data generating unit 134 , a drawing data storage unit 135 , and a stripe data generating unit 136 .

[0177] The small pattern storage unit 131 is as follows Fig. 20 As shown in FIG. 1 , drawing data representing a plurality of drawing patterns (hereinafter referred to as small patterns SP) having a size smaller than the drawing pattern of the entire super lens is stored.

[0178] The user-defined function storage unit 132 stores functions defined by the user. In the third embodiment, the drawing data of each sub-area SC is generated by combining and pasting small patterns SP in each sub-area SC. Therefore, the user-defined function of the third embodiment is a function that outputs at least information that specifies the small pattern to be pasted in the sub-area SC for drawing data creation among the small patterns SP stored in the small pattern storage unit 131 and the position where the small pattern is pasted. In addition, the small pattern SP may be pasted according to other rules instead of the user-defined function.

[0179] The user-defined function execution unit 133 executes the user-defined function on each subsection SC, thereby pasting the small pattern SP on each subsection SC and generating drawing data for each subsection SC. The generated drawing data for each subsection SC is stored in the drawing data storage unit 135 .

[0180] The stripe data generating unit 136 generates stripe data by combining the drawing data of each section SC stored in the drawing data storing unit 135 .

[0181] As described above, according to the third embodiment, by combining and pasting the small patterns SP in each partition SC to generate the drawing data of each partition SC, it is possible to shorten the generation time of the drawing data representing the drawing pattern of the metasurface compared to the case where the design pattern is converted to generate the drawing pattern. In addition, the third embodiment is not only applicable to the generation of the drawing pattern of the metalens, but also to the generation of other drawing patterns. In addition, it is also possible to directly generate the stripe data without creating the drawing data of each partition SC. In this case, by omitting the data generation in the intermediate stage, the data generation time can be shortened.

[0182] In addition, the above-mentioned processing functions can be realized by a computer. In this case, a program is provided that describes the processing contents of the functions that the processing device should have. By executing the program using a computer, the above-mentioned processing functions are realized on the computer. The program that describes the processing contents can be recorded in advance on a computer-readable storage medium (except for a carrier wave).

[0183] When the program is circulated, it can be sold in the form of a removable storage medium such as a DVD (Digital Versatile Disc) or a CD-ROM (Compact Disc Read Only Memory) having the program recorded thereon. Alternatively, the program can be stored in advance in a storage device of a server computer and transferred from the server computer to other computers via a network.

[0184] The computer executing the program saves the program recorded in the removable storage medium or the program transmitted from the server computer to its own storage device, for example. Then, the computer reads the program from its own storage device and executes the processing in accordance with the program. In addition, the computer can also directly read the program from the removable storage medium and execute the processing in accordance with the program. In addition, the computer can also successively execute the processing in accordance with the received program each time the program is transmitted from the server computer.

[0185] In the above-mentioned embodiment, a process of deforming a pattern or adding a pattern within an existing layer is performed, but a process of adding a new layer with a different transmittance can also be performed. For example, it can include a process of improving imaging performance by adding a phase shifter to the periphery of the pattern. The transmittance of such a phase shifter is typically around 6%. In addition, the optical path length of the phase shifter portion is determined so that the phases of the light passing through the phase shifter portion and the light passing through the transmission portion (the reflection portion in the case of a reflective type) are reversed to each other. In addition, the transmittance given here is used for use in calculations, so it does not need to be consistent with the transmittance of the material that can be used in actual mask manufacturing, and an arbitrary value can be set.

[0186] At least a portion of the structural elements of each of the above-mentioned embodiments can be appropriately combined with at least another portion of the structural elements of each of the above-mentioned embodiments. It is also possible not to use a portion of the structural elements of each of the above-mentioned embodiments. In addition, as long as the law permits, all public gazettes and U.S. patents cited in the above-mentioned embodiments are cited as part of the records of this article.

[0187] The above-mentioned embodiment is a preferred example of the present invention, but the present invention is not limited thereto, and various modifications can be made without departing from the gist of the present invention.

[0188] Description of Reference Numerals

[0189] 100A, 100B, 100B′, 100C data generating device

[0190] 102 display control unit

[0191] 103 first drawing data generating unit

[0192] 104 second drawing data generating unit

[0193] 106 Reception Department

[0194] 112 User-defined function execution unit

[0195] 113, 124, 134 drawing data generating unit

[0196] 200 exposure device

[0197] 500A, 500B, 500B′, 500C exposure systems.

Claims

1. A method for generating drawing data, wherein the drawing data represents a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, wherein: Executed by computer: First drawing data representing a first drawing pattern corresponding to the first pattern is generated from design data representing a design pattern, wherein: The design pattern repeatedly includes a second pattern including a plurality of the first patterns repeatedly arranged, corresponding to the prescribed exposure pattern; generating second drawing data indicating a second drawing pattern corresponding to the second pattern based on the generated first drawing data and first information indicating a repetitive form of the first pattern; as well as The drawing data indicating the drawing pattern is generated based on the generated second drawing data and the second information indicating the repetition form of the second pattern.

2. The method for generating drawing data according to claim 1, wherein: The second information includes at least one of information related to a region in which the second pattern is repeatedly arranged within the design pattern, the number of the second patterns repeatedly arranged in a first direction, and the number of the second patterns repeatedly arranged in a second direction intersecting the first direction. The first information includes at least one of information on a region in which the first pattern is repeatedly arranged within the second pattern, the number of the first patterns repeatedly arranged in the first direction, and the number of the first patterns repeatedly arranged in the second direction.

3. The method for generating drawing data according to claim 1, wherein: Executed by the computer: Displaying the design pattern on a display device; accepting a designation of the second pattern from among the design patterns displayed on the display device; enlarging the designated second pattern and displaying it on the display device; accepting a designation of the first pattern from the second pattern displayed in an enlarged manner on the display device; as well as Based on the designation, information necessary for generating the first drawing pattern from the design data, the first information, and the second information are generated.

4. The method for generating drawing data according to claim 3, wherein: Executed by the computer: The first information is generated for a first region including the designated first pattern and in which the first pattern is repeatedly arranged.

5. The method for generating drawing data according to claim 4, wherein: Executed by the computer: receiving a designation of a second area different from the first area and in which the second pattern is repeatedly arranged; and The first information is generated for the second area.

6. The method for generating drawing data according to claim 1, wherein: Executed by the computer: determining the first pattern from the design data, and generating the first information from the design data; and The second pattern is determined from the design data, and the second information is generated from the design data.

7. A method for generating drawing data, wherein the drawing data represents a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, wherein: Executed by computer: acquiring first information indicating a repetition form of a first pattern repeatedly arranged in a design pattern corresponding to the predetermined exposure pattern; receiving a designation of second drawing data to be used as first drawing data representing a first drawing pattern corresponding to the first pattern; and The drawing data of the drawing pattern is generated using the designated second drawing data and the first information.

8. A method for generating drawing data, wherein the drawing data represents a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, wherein: Executed by computer: generating design data representing a design pattern corresponding to the exposure pattern using a function defined by a user; and The drawing data of the drawing pattern is generated by converting the design data.

9. The method for generating drawing data according to claim 8, wherein: The generating of the design data includes executing the function defined by the user for each position in the substrate.

10. The method for generating drawing data according to claim 8, wherein: The generation of the design data includes executing the function defined by the user on a first design pattern generated in advance for each position in the substrate.

11. A method for generating drawing data, wherein the drawing data represents a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, wherein: Executed by computer: acquiring drawing data for each of a plurality of different drawing patterns that are generated in advance and are smaller in size than the drawing pattern; and The drawing data of the drawing pattern is generated by arranging the drawing data of the plurality of different drawing patterns in accordance with a predetermined rule.

12. The method for generating drawing data according to claim 11, wherein: The predefined rules are functions defined by the user.

13. A drawing data generating device for generating drawing data, the drawing data indicating a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, the drawing data generating device comprising: A first generating unit generates first drawing data representing a first drawing pattern corresponding to the first pattern from the design data, wherein: The design data repeatedly arranges a second pattern including a plurality of the first patterns arranged repeatedly, corresponding to the predetermined exposure pattern; a second generating unit for generating second drawing data indicating a second drawing pattern corresponding to the second pattern based on the generated first drawing data and first information indicating a repetition form of the first pattern; as well as A third generating unit generates the drawing data indicating the drawing pattern based on the generated second drawing data and second information indicating a repetition form of the second pattern.

14. A drawing data generating device for generating drawing data, the drawing data indicating a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, the drawing data generating device comprising: an acquisition unit that acquires first information indicating a repetition form of a first pattern repeatedly arranged in a design pattern corresponding to the predetermined exposure pattern; an accepting unit that accepts a designation of second drawing data to be used as first drawing data representing a first drawing pattern corresponding to the first pattern; and A generating unit generates the drawing data of the drawing pattern using the designated second drawing data and the first information.

15. A drawing data generating device for generating drawing data, the drawing data indicating a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, the drawing data generating device comprising: a first generating unit for generating design data representing a design pattern corresponding to the exposure pattern using a function defined by a user; and A second generating unit generates the drawing data of the drawing pattern by converting the design data.

16. A drawing data generating device for generating drawing data, the drawing data indicating a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, the drawing data generating device comprising: an acquisition unit that acquires drawing data of each of a plurality of different drawing patterns that are generated in advance and have a size smaller than the drawing pattern; and The generating unit generates the drawing data of the drawing pattern by arranging the drawing data of the plurality of different drawing patterns in accordance with a predetermined rule.

17. A drawing data generation program for generating drawing data, the drawing data representing a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, the drawing data generation program causing a computer to execute: First drawing data representing a first drawing pattern corresponding to the first pattern is generated from design data representing a design pattern, wherein: The design pattern repeatedly includes a second pattern including a plurality of the first patterns repeatedly arranged, corresponding to the prescribed exposure pattern; generating second drawing data indicating a second drawing pattern corresponding to the second pattern based on the generated first drawing data and first information indicating a repetitive form of the first pattern; as well as The drawing data indicating the drawing pattern is generated based on the generated second drawing data and the second information indicating the repetition form of the second pattern.

18. A drawing data generation program for generating drawing data, the drawing data representing a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, the drawing data generation program causing a computer to execute: acquiring first information indicating a repetition form of a first pattern repeatedly arranged in a design pattern corresponding to the predetermined exposure pattern; receiving a designation of second drawing data to be used as first drawing data representing a first drawing pattern corresponding to the first pattern; and The drawing data of the drawing pattern is generated using the designated second drawing data and the first information.

19. A drawing data generation program for generating drawing data, the drawing data representing a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, the drawing data generation program causing a computer to execute: generating design data representing a design pattern corresponding to the exposure pattern using a function defined by a user; and The drawing data of the drawing pattern is generated by converting the design data.

20. A drawing data generation program for generating drawing data, the drawing data representing a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, the drawing data generation program causing a computer to execute: acquiring drawing data for each of a plurality of different drawing patterns that are generated in advance and are smaller in size than the drawing pattern; and The drawing data of the drawing pattern is generated by arranging the drawing data of the plurality of different drawing patterns in accordance with a predetermined rule.

21. An exposure system comprising: The drawing data generating device according to any one of claims 13 to 16; and The exposure device includes a spatial light modulator, which forms the drawing pattern based on the drawing data generated by the drawing data generating device, and forms the predetermined exposure pattern on the substrate using exposure light passing through the spatial light modulator.

22. A device manufacturing method, comprising: generating the drawing data of the drawing pattern using a drawing data generating device according to any one of claims 13 to 16; causing the spatial light modulator to form the drawing pattern based on the drawing data, and forming the predetermined exposure pattern on the substrate using exposure light passing through the spatial light modulator; as well as The surface of the substrate is processed using the predetermined exposure pattern formed on the substrate as a mask.

23. A method for generating drawing data, wherein the drawing data represents a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern on a substrate using exposure light passing through the spatial light modulator, wherein: Executed by computer: displaying design data representing a design pattern corresponding to the prescribed exposure pattern; determining, from the design patterns, a second partial design pattern that is identical to a first partial design pattern within a designated area designated using the displayed image of the design data; generating partial drawing data corresponding to the first partial design pattern in the designated area; and The generated partial drawing data is set as partial drawing data corresponding to the determined second partial design pattern.

24. The method for generating drawing data according to claim 23, wherein: The partial drawing data corresponding to the second partial design pattern is generated by copying the partial drawing data corresponding to the first partial design pattern, The partial drawing data corresponding to the first partial design pattern is allocated to drawing data coordinates as a part of the drawing data based on the position of the first partial design pattern within the design pattern, The partial drawing data corresponding to the second partial design pattern is allocated to the drawing data coordinates as another part of the drawing data based on the position of the second partial design pattern within the design pattern.

25. The method for generating drawing data according to claim 23 or 24, wherein: The determination is performed using the displayed image of the design data.

26. The method for generating drawing data according to claim 23 or 24, wherein: The determination includes searching the design patterns for an area having the same pattern as the design pattern in the designated area.

27. The method for generating drawing data according to claim 23 or 24, wherein: The design pattern repeatedly includes a second pattern including a plurality of first patterns repeatedly arranged. The designated area is at least one of an area within the design pattern where the first pattern is located and an area within the design pattern where the second pattern is located.

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