Tableware surface processing method

Abstract

The invention relates to a tableware surface processing method, and belongs to the technical field of tableware polishing. Comprising the following steps that S1, cleaning is conducted, specifically, to-be-polished hardware tableware is subjected to cleaning through clean water, and residual stains and impurities in the previous procedure are removed; s2, feeding is conducted, specifically, tableware is fixed to a polishing area; s3, adjustment is conducted, specifically, a polishing head is attached to the polishing position of the tableware, and the shape of the polishing head is matched with that of the tableware; s4, polishing is conducted, specifically, the tableware is polished through reciprocating vibration of the fixed polishing head; s5, discharging is conducted, specifically, the polished tableware is taken down from the polishing area and cleaned and dried; the tableware polishing device solves the problem that in the prior art, when different positions of tableware are polished, the polishing efficiency is low, meanwhile, the polishing removal amount is not uniform, and the grinding and polishing quality is affected.

Description

Technical Field

[0001] The invention belongs to the technical field of tableware polishing, and in particular relates to a surface processing method for tableware. Background Art

[0002] At present, with the improvement of people's living standards, people's requirements for tableware are getting higher and higher. The surface of tableware is required to be flat, bright and beautiful in appearance. The production process must avoid surface electrochemical treatment such as painting, electrophoresis, and electroplating to avoid environmental pollution caused by electrochemical surface treatment.

[0003] Whether in social canteens or school canteens, metal tableware is stamped. When producing these tableware using traditional production processes, the steel plates need to be cut into blocks, then stamped and polished.

[0004] Polishing refers to a processing method that uses mechanical, chemical or electrochemical effects to reduce the surface roughness of a workpiece to obtain a bright and flat surface. It is a modification process of the workpiece surface using polishing tools and abrasive particles or other polishing media. When polishing the curved surface of a curved part, the curvature of the surface is constantly changing when the polishing disc or abrasive jet tube moves, resulting in uneven polishing removal and changes in the curvature of the polished surface, affecting the quality of grinding and polishing.

[0005] Different tableware has surfaces with different curvatures. Common tableware has multiple surfaces with different curvatures. When existing polishing equipment polishes different positions of tableware, it is necessary to manually change the fixed position of the tableware and then polish other positions. The operation is cumbersome and it is impossible to control the polishing removal amount to remain uniform during the polishing process, resulting in low tableware polishing efficiency and uneven polishing quality. Summary of the invention

[0006] In order to solve the above problems existing in the prior art, the present invention provides a surface processing method for tableware, which solves the problem in the prior art that when polishing different positions of the tableware, the polishing efficiency is low and the polishing removal amount is uneven, which affects the grinding and polishing quality.

[0007] The object of the present invention can be achieved by the following technical solution: A surface processing method of tableware comprises the following steps:

[0008] S1: Cleaning: Use clean water to remove the stains and impurities left over from the previous process from the hardware tableware to be polished;

[0009] S2: Loading, fixing the tableware in the polishing area;

[0010] S3: Adjust, fit the polishing head to the polishing position of the tableware so that the shape of the polishing head matches the tableware;

[0011] S4: polishing, the fixed polishing head is vibrated back and forth to polish the tableware;

[0012] S5: unloading, removing the polished tableware from the polishing area and washing and drying it;

[0013] The polishing head includes a base, a plurality of abutment rods and a plurality of polishing blocks. A cavity is provided at the bottom of the base, a plurality of mounting grooves are provided on the bottom surface of the base, the mounting grooves are communicated with the cavity, a plurality of abutment rods are correspondingly slidably fitted in the plurality of mounting grooves, a plurality of polishing blocks are correspondingly embedded in the front ends of the plurality of abutment rods, an air inlet is provided on the top surface of the base, the air inlet is communicated with the cavity, and a reciprocating drive mechanism is connected to the top surface of the base.

[0014] As a preferred technical solution of the present invention, a plurality of sliding holes are provided on the top surface of the cavity at positions corresponding to the abutment rod, and the tail end of the abutment rod is slidably connected to the sliding hole, a through hole is provided at the tail end of the abutment rod, the through hole is communicated with the sliding hole, an air valve is provided in the sliding hole, the sliding hole is communicated with the air inlet hole, a slider is slidably fitted in the through hole, a push rod is connected to the bottom surface of the slider, the abutment hinge of the push rod is limited, a plurality of limit platforms are provided in the middle of the mounting groove, the limit bar is slidably arranged on the outer wall of the middle part of the abutment rod, avoidance grooves are provided at positions corresponding to the abutment rod and the limit bar, and the through hole ventilation pushes the limit bar to engage with the limit platform.

[0015] As a preferred technical solution of the present invention, in step S2, a fixed seat is provided in the polishing area, a plurality of adsorption holes are provided on the top of the fixed seat, a limiting block is provided on the bottom of the fixed seat, and the fixed seat adsorbs the tableware through the adsorption holes and fixes the position of the tableware through the limiting block.

[0016] As a preferred technical solution of the present invention, the reciprocating drive mechanism includes a driving motor, a crank, a connecting rod, a support rod, a slide seat and a slide rod, the output end of the driving motor is connected to the crank, the crank is rotatably connected to the support rod, the support rod is installed on the top surface of the slide seat, the middle part of the crank is connected to one end of the connecting rod, the other end of the connecting rod is connected to the slide rod, the slide rod is slidably connected to the bottom of the slide seat, and the slide rod is connected to the top surface of the base.

[0017] As a preferred technical solution of the present invention, the polishing block is composed of a flexible layer and a polishing layer.

[0018] As a preferred technical solution of the present invention, in step S4, the angle between the end surface of the polishing head and the plane of the tableware is 10° to 30°.

[0019] As a preferred technical solution of the present invention, the front end of the abutment rod connected to the polishing block is provided with an inclined surface, and the polishing block is mounted on the inclined surface.

[0020] As a preferred technical solution of the present invention, the inclination angle of the inclined surface is 10° to 30°.

[0021] As a preferred technical solution of the present invention, in step S5, inert gas is used for drying.

[0022] As a preferred technical solution of the present invention, in step S5, the dried tableware is subjected to a passivation treatment.

[0023] The beneficial effects of the present invention are as follows: air is blown into the cavity through the air inlet hole, so that the abutment rod on the polishing head abuts against the tableware through the polishing block, so that the abutment rod can adapt to the shape and depth changes of the surface of the tableware, and then the air intake of the air inlet hole is cut off to keep the air pressure in the cavity stable. At this time, the polishing block can smoothly abut against the complex shape and uneven surface of the tableware. In this way, during the polishing process, the consistency of the polishing removal amount of the tableware during the polishing process can be ensured, the uniformity and efficiency of the polishing are guaranteed, the quality of polishing and the efficiency of polishing are improved, and the problem of low polishing efficiency and uneven polishing removal amount affecting the grinding and polishing quality when polishing different positions of the tableware in the prior art is solved. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to facilitate understanding by those skilled in the art, the present invention is further described below with reference to the accompanying drawings.

[0025] Figure 1 It is a flow chart of the processing method of the present invention;

[0026] Figure 2 This is a schematic diagram of the polishing head structure of the present invention;

[0027] Figure 3 It is a schematic diagram of the structure of the reciprocating drive mechanism of the present invention;

[0028] Figure 4 It is a schematic diagram of the abutment rod structure of the present invention;

[0029] Main component symbols

[0030] In the figure: 1. polishing head; 11. base; 111. cavity; 112. mounting groove; 113. air inlet; 114. sliding hole; 12. abutment rod; 121. through hole; 13. polishing block; 14. air valve; 15. slider; 16. limit strip; 17. limit table; 18. push rod; 2. reciprocating drive mechanism; 21. drive motor; 22. crank; 23. connecting rod; 24. support rod; 25. slide seat; 26. slide rod; 3. fixed seat; 4. tableware. DETAILED DESCRIPTION

[0031] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined invention purpose, the specific implementation methods, structures, features and effects of the present invention are described in detail below in conjunction with the accompanying drawings and preferred embodiments.

[0032] See also Figure 1-Figure 4 This embodiment provides a tableware surface processing method, comprising the following steps:

[0033] S1: cleaning, using clean water to clean the hardware tableware 4 to be polished from the stains and impurities remaining in the previous process. Before polishing, if there is dust, grease, oxide or other impurities on the surface of the workpiece, these substances will affect the polishing effect, because during polishing, the impurities may cause uneven wear on the surface of the workpiece, resulting in an unsatisfactory polishing effect;

[0034] S2: Loading, fixing the tableware 4 in the polishing area to ensure that the tableware 4 does not shake during polishing and affect the polishing effect;

[0035] S3: Adjusting the polishing head 1 to fit the polishing position of the tableware 4 so that the shape of the polishing head 1 matches the tableware 4;

[0036] S4: polishing, the fixed polishing head 1 is vibrated reciprocatingly to polish the tableware 4;

[0037] S5: unloading, removing the polished tableware 4 from the polishing area and washing and drying it. After drying, the tableware 4 can be packaged;

[0038] In order to polish and grind the side walls of the grooves of the tableware 4 with different depths, while ensuring that the polishing and grinding effects can be kept consistent;

[0039] The polishing head 1 includes a base 11, a plurality of abutting rods 12 and a plurality of polishing blocks 13. A cavity 111 is provided at the bottom of the base 11, a plurality of mounting grooves 112 are provided on the bottom surface of the base 11, the mounting grooves 112 are communicated with the cavity 111, a plurality of abutting rods 12 are correspondingly slidably fitted in the plurality of mounting grooves 112, a plurality of polishing blocks 13 are correspondingly embedded in the front ends of the plurality of abutting rods 12, an air inlet hole 113 is provided on the top surface of the base 11, the air inlet hole 113 is communicated with the cavity 111, a reciprocating driving mechanism 2 is connected to the top surface of the base 11, when the polishing head 1 polishes the tableware 4, air is first blown into the cavity 111 through the air inlet hole 113, so that the abutting rod 12 on the polishing head 1 abuts against the tableware 4 through the polishing block 13, and since different positions on the tableware 4 have different depths, the abutment designed by the polishing head 1 The rod 12 can slide and flexibly, and continuously inject airflow into the cavity 111, so as to push the abutting rod 12 toward the surface of the tableware 4, and form a certain pressure to increase the contact force between the polishing block 13 and the surface of the tableware 4. Moreover, the abutting rod 12 can adapt to the shape and depth changes of the surface of the tableware 4, and then cut off the air intake of the air inlet hole 113 to keep the air pressure in the cavity 111 stable. At this time, the polishing block 13 can smoothly abut against the complex shape and uneven surface of the tableware 4. In this way, during the polishing process, the consistency of the polishing removal amount of the tableware 4 during the polishing process can be ensured, the uniformity and efficiency of the polishing are guaranteed, the quality and efficiency of the polishing are improved, and the problem of low polishing efficiency and uneven polishing removal amount when polishing different positions of the tableware 4 in the prior art affecting the grinding and polishing quality is solved.

[0040] Since the cavity 111 is filled with gas to make the abutting rod 12 extend to different distances to abut against the tableware 4, but the present invention completes the polishing process by reciprocating motion, and the gas pressure in the cavity 111 remains unchanged during the polishing of the tableware 4, therefore, during the polishing process, the abutting rod 12 will be subjected to the reaction force of the tableware 4 and reversely compress the gas in the cavity 111, thereby causing the gas pressure in the cavity 111 to float, affecting the abutting position of the abutting rod 12 at other positions, thereby causing the abutting position of the abutting rod 12 at other positions to fluctuate during the polishing process. Therefore, in order to ensure the uniformity of polishing of the abutting rod 12 during the polishing process, in this embodiment, a plurality of sliding holes 114 are provided on the top surface of the cavity 111 at a position corresponding to the abutting rod 12, and the tail end of the abutting rod 12 is slidably connected in the sliding hole 114, and a through hole 121 is provided at the tail end of the abutting rod 12, and the through hole 121 is communicated with the sliding hole 114, and an air valve 14 is provided in the sliding hole 114, and the sliding hole 114 is communicated with the air inlet hole 113, and a slider 15 is slidably fitted in the through hole 121, and the slider 1 The bottom surface of the abutment rod 15 is connected with a push rod 18, and the abutment hinge of the push rod 18 is provided with a plurality of limit platforms 17 in the middle of the mounting groove 112. The limit strip 16 is slidably arranged on the outer wall in the middle of the abutment rod 12. The corresponding positions of the abutment rod 12 and the limit strip 16 are provided with avoidance grooves. The through hole 121 is ventilated to push the limit strip 16 to engage with the limit platform 17. When the position of the abutment rod 12 is determined, the air valve 14 is opened to allow the air to be blown into the through hole 121, thereby pushing the slider 15 to slide in the through hole 121, allowing the push rod 18 to push the limit strip 16 to expand to both sides, and the through hole 121 is opened. By opening an avoidance groove, the limit strip 16 can be smoothly engaged with the limit platform 17, thereby ensuring that the position of the abutment rod 12 can remain fixed. In this way, when polishing, the position of the abutment rod 12 is limited by the engagement of the limit strip 16 and the limit platform 17. In this way, when polishing, the position of the abutment rod 12 will not change due to squeezing, thereby ensuring that the polishing block 13 can ensure the uniformity of polishing during the polishing process, and avoiding the situation where the uniformity of polishing is affected due to the deviation of the position of the abutment rod 12.

[0041] After polishing is completed, if it is necessary to polish the next tableware 4 of different specifications, the through hole 121 can be adsorbed to reset the slider 15, so that the limit bar 16 can be separated from the limit platform 17, and the abutment rod 12 can be readjusted to adapt to tableware of different specifications and different curvatures, thereby improving the adaptability of the polishing head 1 and reducing production costs.

[0042] In order to prevent the tableware 4 from shaking during the polishing process and affecting the polishing effect, in one embodiment, in step S2, a fixing seat 3 is provided in the polishing area, a plurality of through holes 121 are provided on the top of the fixing seat 3, and a limiting block is provided on the bottom surface of the fixing seat 3. The fixing seat 3 absorbs the tableware 4 through the absorption holes and fixes the position of the tableware 4 through the limiting blocks. When polishing, the tableware 4 is first fixed by the limiting blocks, and then further absorbed by the absorption holes, thereby ensuring that the tableware 4 does not shake during the polishing process and affect the quality of polishing.

[0043] In order to better polish the tableware, in one embodiment, the reciprocating drive mechanism 2 includes a drive motor 21, a crank 22, a connecting rod 23, a support rod 24, a slide 25 and a slide 26. The output end of the drive motor 21 is connected to the crank 22, and the crank 22 is rotatably connected to the support rod 24. The support rod 24 is installed on the top surface of the slide 25. The middle part of the crank 22 is connected to one end of the connecting rod 23, and the other end of the connecting rod 23 is connected to the slide 26. The slide 26 is slidably connected to the bottom of the slide 25, and the slide 26 is connected to the top surface of the base 11. After the position adjustment of the abutment rod 12 is completed, the drive motor 21 drives the crank 22 to rotate, and the crank 22 converts the rotational motion into the reciprocating sliding of the slide 26, thereby driving the base 11 to slide back and forth, and then the support rod 24 and the slide 25 are used to improve the stability of the overall mechanism, effectively reduce the jitter that may occur during operation, and improve the uniformity of the polishing process.

[0044] In order to improve the polishing effect of the polishing block 13, in one embodiment, the polishing block 13 is composed of a flexible layer and a polishing layer. During the polishing process, when the polishing block 13 reciprocates, the flexible layer can adapt to the tiny bumps on the surface of the tableware 4, and when processing irregular or curved surfaces, it can maintain good contact to ensure that the polishing layer evenly touches the surface of the tableware 4, thereby ensuring its flexibility and grinding performance, and effectively improving the brightness and overall aesthetics of the object.

[0045] Since the present invention adopts a reciprocating method for polishing, it is necessary to allow the polishing block 13 to slide back and forth on the tableware 4 to complete the polishing process. Therefore, in order to improve the efficiency of polishing and ensure that the curved position of the tableware can be polished, in one embodiment, in step S4, the angle between the end face of the polishing head 1 and the plane of the tableware is 10° to 30°. By tilting the polishing head 1, the polishing block 13 can move back and forth along the horizontal position of the tableware during polishing to complete the polishing process, and the specific tilt angle can be determined according to the curvature of tableware 4 of different specifications.

[0046] In order to further improve the efficiency of polishing and ensure that the curved position of the tableware is polished, in one embodiment, the front end of the abutment rod 12 connected to the polishing block 13 is provided with an inclined surface, and the polishing block 13 is installed on the inclined surface. Since the polishing block 13 is usually made of flexible material, it can effectively adapt to the curved surface of the tableware and provide a better polishing effect. However, the design of the inclined surface can enable the polishing block 13 to better fit the curve of the tableware during operation, ensuring that uniform pressure is provided at different contact points, so that the polishing block 13 can conform to the curvature of the tableware and easily enter the concave and curvature The larger area ensures that the comprehensiveness of the polishing effect, thereby ensuring the polishing effect of the tableware 4.

[0047] In order to further improve the polishing effect of the polishing block 13, in one embodiment, the inclination angle of the inclined surface is 10°~30°. Since the polishing head 1 itself already has a certain inclination, in order to ensure that the polishing block 13 can fully contact the surface and any bending position of the tableware, increase the effective working area, and thus improve the polishing efficiency, the front end of the abutment rod 12 is also further tilted, and the inclination angle of the abutment rod 12 at different positions can be adjusted accordingly, so that the inclination angle of the abutment rod 12 in the horizontal position can be reduced, so that the angle between the polishing block 13 and the horizontal plane can be reduced as much as possible, so that the contact area between the polishing block 13 and the tableware 4 can be larger, and the inclination degree of the abutment rod 12 on the inclined surface of the tableware 4 can be increased, which can also reduce the angle between the polishing block 13 and the inclined surface on the tableware 4, so that the polishing block 13 can better fit these surfaces, thereby ensuring that the tableware 4 is fully polished without dead angles.

[0048] Some impurities such as metal particles, dust, and oil will remain on the polished tableware 4, so the tableware 4 needs to be cleaned to remove these residues to ensure that the surface of the tableware 4 is clean and hygienic. After the tableware 4 is cleaned, in order to prevent the tableware 4 from easily reacting with oxygen in the air after polishing to cause oxidation, in one embodiment, in step S5, inert gas is used for drying. Using inert gas (such as nitrogen, helium, etc.) for drying can quickly remove moisture in an oxygen-free environment and prevent the occurrence of oxidation reaction, thereby maintaining the smoothness and beauty of the surface of the tableware 4.

[0049] In order to extend the service life of the tableware 4 and reduce the replacement frequency and maintenance cost, in one embodiment, in step S5, the tableware 4 that has been dried is passivated. Passivation is a chemical treatment process that mainly improves the corrosion resistance of the metal material by forming a thin passivation film on the metal surface. The surface of the tableware 4 after passivation treatment is smoother, and dirt, grease and other substances are not easy to adhere, which is convenient for cleaning and maintenance. At the same time, it can further improve the smoothness and gloss of the surface, making the tableware 4 look more beautiful, and also improves its safety in contact with food.

[0050] The above description is only a preferred embodiment of the present invention and does not limit the present invention in any form. Although the present invention has been disclosed as a preferred embodiment as above, it is not used to limit the present invention. Any technical personnel in this field can make some changes or modify the technical contents disclosed above into equivalent embodiments without departing from the scope of the technical solution of the present invention. However, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the scope of the technical solution of the present invention.

Claims

1. A tableware surface processing method, characterized in that: The following steps are involved: S1: Cleaning: Use clean water to remove the stains and impurities left over from the previous process from the hardware tableware to be polished; S2: Loading, fixing the tableware in the polishing area; S3: Adjust, fit the polishing head to the polishing position of the tableware so that the shape of the polishing head matches the tableware; S4: polishing, the fixed polishing head is vibrated back and forth to polish the tableware; S5: unloading, removing the polished tableware from the polishing area and washing and drying it; The polishing head includes a base, a plurality of abutment rods and a plurality of polishing blocks. A cavity is provided at the bottom of the base, a plurality of mounting grooves are provided on the bottom surface of the base, the mounting grooves are communicated with the cavity, a plurality of abutment rods are correspondingly slidably fitted in the plurality of mounting grooves, a plurality of polishing blocks are correspondingly embedded in the front ends of the plurality of abutment rods, an air inlet is provided on the top surface of the base, the air inlet is communicated with the cavity, and a reciprocating drive mechanism is connected to the top surface of the base.

2. The tableware surface processing method according to claim 1, characterized in that: A plurality of sliding holes are provided on the top surface of the cavity at positions corresponding to the abutting rod, and the tail end of the abutting rod is slidably connected to the sliding hole, a through hole is provided at the tail end of the abutting rod, the through hole is communicated with the sliding hole, an air valve is provided in the sliding hole, the sliding hole is communicated with the air inlet hole, a slider is slidably fitted in the through hole, a push rod is connected to the bottom surface of the slider, the abutment hinge of the push rod is limited, a plurality of limit platforms are provided in the middle of the mounting groove, the limit bar is slidably arranged on the outer side wall of the middle part of the abutting rod, avoidance grooves are provided at positions corresponding to the abutting rod and the limit bar, and the through hole ventilation pushes the limit bar to engage with the limit platform.

3. The surface processing method of tableware according to claim 1, characterized in that: In step S2, a fixing seat is provided in the polishing area, a plurality of adsorption holes are provided on the top of the fixing seat, and a limiting block is provided on the bottom of the fixing seat. The fixing seat adsorbs the tableware through the adsorption holes and fixes the position of the tableware through the limiting block.

4. The tableware surface processing method according to claim 1, characterized in that: The reciprocating drive mechanism includes a driving motor, a crank, a connecting rod, a support rod, a slide seat and a slide rod. The output end of the driving motor is connected to the crank, the crank is rotatably connected to the support rod, the support rod is installed on the top surface of the slide seat, the middle part of the crank is connected to one end of the connecting rod, the other end of the connecting rod is connected to the slide rod, the slide rod is slidably connected to the bottom of the slide seat, and the slide rod is connected to the top surface of the base.

5. The tableware surface processing method according to claim 1, characterized in that: The polishing block consists of a flexible layer and a polishing layer.

6. The tableware surface processing method according to claim 1, characterized in that: In step S4, the angle between the end surface of the polishing head and the tableware plane is 10° to 30°.

7. The surface processing method of tableware according to claim 6, characterized in that: The front end of the abutment rod connected with the polishing block is provided with an inclined surface, and the polishing block is installed on the inclined surface.

8. The tableware surface processing method according to claim 7, characterized in that: The inclination angle of the inclined surface is 10° to 30°.

9. The tableware surface processing method according to claim 1, characterized in that: In step S5, drying is performed using an inert gas.

10. The tableware surface processing method according to claim 1, characterized in that: In step S5, the dried tableware is subjected to a passivation treatment.

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