A surface processing method for tableware

Abstract

The present invention relates to a surface processing method for tableware, belonging to the technical field of tableware polishing. The method comprises the following steps: S1: Cleaning, removing stains and impurities remaining from the previous process on the hardware tableware to be polished with clean water; S2: Loading, fixing the tableware in the polishing area; S3: Adjusting, fitting the polishing head to the polishing position of the tableware so that the shape of the polishing head matches the tableware; S4: Polishing, reciprocatingly vibrating the fixed polishing head to polish the tableware; S5: Unloading, removing the polished tableware from the polishing area and cleaning and drying it. The present invention solves the problems in the prior art that when polishing different positions of tableware, the polishing efficiency is low and the polishing removal amount is uneven, which affects the grinding and polishing quality.

Description

Technical Field

[0001] The present invention belongs to the technical field of tableware polishing, and specifically relates to a surface processing method for tableware. Background Art

[0002] At present, with the improvement of people's living standards, people have higher and higher requirements for tableware. The surface of tableware is required to be flat, highly bright, and beautiful in appearance. Electrochemical surface treatments such as painting, electrophoresis, and electroplating are prohibited during the production process to avoid environmental pollution caused by electrochemical surface treatment.

[0003] Whether it is in social canteens or school canteens, the metal tableware used is stamped. When producing these tableware by traditional production processes, the steel plates need to be first cut into pieces and then stamped and then polished.

[0004] Polishing refers to a processing method that uses mechanical, chemical, or electrochemical actions to reduce the surface roughness of a workpiece to obtain a bright and flat surface. It is a finishing process that uses a polishing tool and abrasive particles or other polishing media to process the surface of the workpiece. When polishing the curved surface of a curved part, as the polishing disc or abrasive jet pipe moves, the curvature of the curved surface is constantly changing, resulting in uneven polishing removal amounts and causing changes in the polished curved surface curvature, affecting the polishing quality.

[0005] Different tableware has curved surfaces with different curvatures. There are multiple curved surfaces with different curvatures on common tableware. When the existing polishing equipment polishes different positions of the tableware, it is necessary to manually change the fixed position of the tableware and then polish other positions. The operation is relatively cumbersome, and it is impossible to control the polishing removal amount to be uniform during the polishing process, resulting in low tableware polishing efficiency and uneven polishing quality. Summary of the Invention

[0006] To solve the above problems existing in the prior art, the present invention provides a surface processing method for tableware, which solves the problems of low polishing efficiency and uneven polishing removal amounts when polishing different positions of tableware in the prior art, affecting the polishing quality.

[0007] The object of the present invention can be achieved through the following technical solutions: A surface processing method for tableware, comprising the following steps:

[0008] S1: Cleaning, removing stains and impurities remaining from the previous process on the hardware tableware to be polished with clean water;

[0009] S2: Loading, fixing the tableware in the polishing area;

[0010] S3: Adjustment. Fit the polishing head to the polishing position of the tableware so that the shape of the polishing head matches the tableware.

[0011] S4: Polishing. Reciprocally vibrate the fixed polishing head to polish the tableware.

[0012] S5: Unloading. Remove the polished tableware from the polishing area and clean and dry it.

[0013] The polishing head includes a base, a number of abutting rods and a number of polishing blocks. A cavity is formed at the bottom of the base, and a number of mounting grooves are formed on the bottom surface of the base. The mounting grooves communicate with the cavity. A number of the abutting rods are correspondingly and slidably fitted in the number of mounting grooves. A number of the polishing blocks are respectively embedded at the front ends of the number of abutting rods. An air inlet hole is formed on the top surface of the base, and the air inlet hole communicates with the cavity. A reciprocating driving mechanism is connected to the top surface of the base.

[0014] As a preferred technical solution of the present invention, a number of sliding holes are formed on the top surface of the cavity corresponding to the positions of the abutting rods. The tail ends of the abutting rods are slidably connected in the sliding holes. Through holes are formed at the tail ends of the abutting rods, and the through holes communicate with the sliding holes. Air valves are arranged in the sliding holes, and the sliding holes communicate with the air inlet hole. Sliding blocks are slidably fitted in the through holes. A push rod is connected to the bottom surface of the sliding block. A limiting strip is connected to the push rod in an abutting and hinged manner. A number of limiting platforms are formed in the middle of the mounting grooves. The limiting strip is slidably arranged on the outer side wall in the middle of the abutting rod. Avoidance grooves are formed at the corresponding positions of the abutting rod and the limiting strip. The through holes are ventilated to push the limiting strip to be clamped with the limiting platform.

[0015] As a preferred technical solution of the present invention, in step S2, a fixing seat is arranged in the polishing area. A number of adsorption holes are formed at the top of the fixing seat, and a limiting block is arranged at the bottom surface of the fixing seat. The fixing seat adsorbs the tableware through the adsorption holes and fixes the position of the tableware through the limiting block.

[0016] As a preferred technical solution of the present invention, the reciprocating driving mechanism includes a driving motor, a crank, a connecting rod, a support rod, a sliding seat and a sliding rod. The output end of the driving motor is connected to the crank. The crank is rotatably connected to the support rod. The support rod is installed on the top surface of the sliding seat. The middle of the crank is connected to one end of the connecting rod. The other end of the connecting rod is connected to the sliding rod. The sliding rod is slidably connected to the bottom of the sliding seat. The sliding rod is connected to the top surface of the base.

[0017] As a preferred technical solution of the present invention, the polishing block is composed of a flexible layer and a polishing layer.

[0018] As a preferred technical solution of the present invention, in step S4, the included angle between the end face of the polishing head and the plane of the tableware is 10° to 30°.

[0019] As a preferred technical solution of the present invention, the front end of the abutting rod connected to the polishing block is provided with an inclined surface, and the polishing block is installed on the inclined surface.

[0020] As a preferred technical solution of the present invention, the inclination angle of the inclined surface is 10° to 30°.

[0021] As a preferred technical solution of the present invention, in step S5, drying is performed using an inert gas.

[0022] As a preferred technical solution of the present invention, in step S5, passivation treatment is performed on the tableware after drying is completed.

[0023] The beneficial effects of the present invention are as follows: By blowing air into the cavity through the air inlet hole, the abutting rod on the polishing head abuts against the tableware through the polishing block, enabling the abutting rod to adapt to the shape and depth changes of the tableware surface. Then, the air intake volume of the air inlet hole is cut off to keep the air pressure in the cavity stable. At this time, the polishing block can smoothly abut against the complex shape and uneven surface of the tableware. In this way, during the polishing process, it can ensure the consistency of the polishing removal amount of the tableware during polishing, guarantee the uniformity and efficiency of polishing, improve the quality and efficiency of polishing, and solve the problem in the prior art that the polishing efficiency is low and the polishing removal amount is uneven when polishing different positions of the tableware, which affects the polishing quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] For the convenience of those skilled in the art to understand, the present invention will be further described below with reference to the accompanying drawings.

[0025] Figure 1 It is a flowchart of the processing method of the present invention;

[0026] Figure 2 It is a schematic structural diagram of the polishing head of the present invention;

[0027] Figure 3 It is a schematic structural diagram of the reciprocating driving mechanism of the present invention;

[0028] Figure 4 It is a schematic structural diagram of the abutting rod of the present invention;

[0029] MAIN ELEMENT SYMBOL DESCRIPTION

[0030] In the figure: 1. Polishing head; 11. Base; 111. Cavity; 112. Installation groove; 113. Air inlet hole; 114. Slide hole; 12. Abutting rod; 121. Through hole; 13. Polishing block; 14. Air valve; 15. Slide block; 16. Limiting strip; 17. Limiting platform; 18. Push rod; 2. Reciprocating driving mechanism; 21. Driving motor; 22. Crank; 23. Connecting rod; 24. Support rod; 25. Slide seat; 26. Slide rod; 3. Fixed seat; 4. Tableware. Detailed implementation manners

[0031] To further elaborate on the technical means and effects adopted by the present invention to achieve the intended invention purpose, the following will, in conjunction with the accompanying drawings and preferred embodiments, elaborate in detail on the specific implementation manners, structures, features, and effects of the present invention as follows.

[0032] Please refer to Figures 1-4 , this embodiment provides a surface processing method for tableware, including the following steps:

[0033] S1: Cleaning. The hardware tableware 4 to be polished is cleaned with clean water to remove stains and impurities remaining from the previous process. Before polishing, if there is dust, grease, oxides, or other impurities on the surface of the workpiece, these substances will affect the polishing effect. Because during polishing, the impurities may cause uneven wear on the surface of the workpiece, resulting in an unsatisfactory polishing effect.

[0034] S2: Loading. The tableware 4 is fixed in the polishing area to ensure that the tableware 4 does not shake during polishing, which may affect the polishing effect.

[0035] S3: Adjusting. The polishing head 1 is fitted to the polishing position of the tableware 4 so that the shape of the polishing head 1 matches the tableware 4.

[0036] S4: Polishing. The fixed polishing head 1 vibrates reciprocally to polish the tableware 4.

[0037] S5: Unloading. The polished tableware 4 is removed from the polishing area and cleaned and dried. After drying, the tableware 4 can be packed.

[0038] In order to polish and grind the side walls of the grooves with different depths of the tableware 4, and at the same time ensure that the polishing and grinding effects can be kept consistent;

[0039] The polishing head 1 includes a base 11, a plurality of abutting rods 12 and a plurality of polishing blocks 13. A cavity 111 is formed at the bottom of the base 11, and a plurality of mounting grooves 112 are formed on the bottom surface of the base 11. The mounting grooves 112 communicate with the cavity 111. A plurality of abutting rods 12 are correspondingly and slidably arranged in the plurality of mounting grooves 112. A plurality of polishing blocks 13 are respectively embedded at the front ends of the plurality of abutting rods 12. An air inlet hole 113 is formed on the top surface of the base 11, and the air inlet hole 113 communicates with the cavity 111. A reciprocating driving mechanism 2 is connected to the top surface of the base 11. When the polishing head 1 polishes the tableware 4, first, air is blown into the cavity 111 through the air inlet hole 113, so that the abutting rods 12 on the polishing head 1 abut against the tableware 4 through the polishing blocks 13. However, since different positions on the tableware 4 have different depths, the designed abutting rods 12 of the polishing head 1 can, through sliding and flexibility, continuously inject air into the cavity 111, push the abutting rods 12 towards the surface of the tableware 4, and can also form a certain pressure to increase the contact force between the polishing blocks 13 and the surface of the tableware 4. Moreover, the abutting rods 12 can adapt to the shape and depth changes of the surface of the tableware 4. Then, the air intake of the air inlet hole 113 is cut off to keep the air pressure in the cavity 111 stable. At this time, the polishing blocks 13 can smoothly abut against the complex shape and uneven surface of the tableware 4. In this way, during the polishing process, it can be ensured that the amount of polishing removed from the tableware 4 during the polishing process is consistent, ensuring the uniformity and efficiency of polishing, improving the quality and efficiency of polishing, and solving the problem in the prior art that when polishing different positions of the tableware 4, the polishing efficiency is low and the amount of polishing removed is uneven, affecting the polishing quality.

[0040] Since the inside of the cavity 111 is filled with gas to make the abutting rod 12 extend different distances to abut against the tableware 4, but in the present invention, the polishing process is completed through reciprocating motion, and during the polishing of the tableware 4, the air pressure inside the cavity 111 remains unchanged. Therefore, during the polishing process, the abutting rod 12 will be reversely compressed against the gas inside the cavity 111 by the reaction force of the tableware 4 during the polishing process, resulting in the floating of the air pressure inside the cavity 111, affecting the abutting position of the abutting rod 12 at other positions, and thus causing a deviation in the abutting force of the abutting rod 12 during polishing, affecting the uniformity of polishing. Therefore, in order to ensure the polishing uniformity of the abutting rod 12 during the polishing process, in this embodiment, a plurality of sliding holes 114 are opened at the top surface of the cavity 111 corresponding to the position of the abutting rod 12. The tail end of the abutting rod 12 is slidably connected to the sliding hole 114. A through hole 121 is opened at the tail end of the abutting rod 12, and the through hole 121 communicates with the sliding hole 114. An air valve 14 is provided in the sliding hole 114, and the sliding hole 114 communicates with the air inlet hole 113. A slider 15 is slidably fitted in the through hole 121. The bottom surface of the slider 15 is connected with a push rod 18. The abutting end of the push rod 18 is hinged with a limiting strip 16. A plurality of limiting platforms 17 are opened in the middle of the installation groove 112. The limiting strip 16 is slidably arranged on the outer side wall of the middle part of the abutting rod 12. An avoidance groove is opened at the corresponding position of the abutting rod 12 and the limiting strip 16. The through hole 121 is ventilated to push the limiting strip 16 to be clamped with the limiting platform 17. After the position of the abutting rod 12 is determined, the air valve 14 is opened to let the gas blow into the through hole 121, thereby pushing the slider 15 to slide in the through hole 121, and letting the push rod 18 push the limiting strip 16 to expand to both sides. By opening the avoidance groove, the limiting strip 16 can be smoothly clamped with the limiting platform 17, thereby ensuring that the position of the abutting rod 12 can be kept fixed. In this way, during polishing, the position of the abutting rod 12 is restricted by the clamping of the limiting strip 16 and the limiting platform 17. In this way, during polishing, the position of the abutting rod 12 will not change due to being squeezed, thereby ensuring that the polishing block 13 can ensure the polishing uniformity during the polishing process, and avoiding the situation that the polishing uniformity is affected due to the deviation of the position of the abutting rod 12.

[0041] After the polishing is completed, if it is necessary to polish the next tableware 4 with different specifications, the through hole 121 can be adsorbed to reset the slider 15, so that the limiting strip 16 is separated from the limiting platform 17, and the abutting rod 12 can be re-adjusted in position, so as to adapt to tableware with different specifications and different curvatures, thereby improving the adaptability of the polishing head 1 and reducing the production cost.

[0042] In order to avoid the shaking of the tableware 4 during the polishing process, which may affect the polishing effect, in one embodiment, in step S2, a fixing seat 3 is provided in the polishing area. A plurality of through holes 121 are provided at the top of the fixing seat 3, and a limiting block is provided on the bottom surface of the fixing seat 3. The fixing seat 3 adsorbs the tableware 4 through the adsorption holes and fixes the position of the tableware 4 through the limiting block. During polishing, first fix the position of the tableware 4 through the limiting block, and then further adsorb the tableware through the adsorption holes, so as to ensure that the tableware 4 will not shake during the polishing process and affect the polishing quality.

[0043] In order to better polish the tableware, in one embodiment, the reciprocating driving mechanism 2 includes a driving motor 21, a crank 22, a connecting rod 23, a support rod 24, a sliding seat 25 and a sliding rod 26. The output end of the driving motor 21 is connected to the crank 22. The crank 22 is rotatably connected to the support rod 24. The support rod 24 is installed on the top surface of the sliding seat 25. The middle of the crank 22 is connected to one end of the connecting rod 23. The other end of the connecting rod 23 is connected to the sliding rod 26. The sliding rod 26 is slidably connected to the bottom of the sliding seat 25. The sliding rod 26 is connected to the top surface of the base 11. After the position of the abutting rod 12 is adjusted, the driving motor 21 drives the crank 22 to rotate. The crank 22 converts the rotational motion into the reciprocating sliding of the sliding rod 26, thereby driving the base 11 to reciprocate. Then, the support rod 24 and the sliding seat 25 are used to improve the stability of the overall mechanism, effectively reduce the possible jitter during operation, and improve the uniformity of the polishing process.

[0044] In order to improve the polishing effect of the polishing block 13, in one embodiment, the polishing block 13 is composed of a flexible layer and a polishing layer. During the polishing process, when the polishing block 13 moves reciprocally, the flexible layer can adapt to the minute unevenness on the surface of the tableware 4, and when processing irregularly shaped or curved surfaces, it can maintain good contact to ensure that the polishing layer evenly touches the surface of the tableware 4, thereby ensuring its flexibility and grinding performance, and effectively enhancing the brightness and overall aesthetics of the article.

[0045] Since the present invention uses a reciprocating method for polishing, therefore, it is necessary to let the polishing block 13 slide back and forth on the tableware 4 to complete the polishing process. So, in order to improve the polishing efficiency and ensure that the curved positions of the tableware can be polished, in one embodiment, in step S4, the angle between the end face of the polishing head 1 and the plane of the tableware is 10° to 30°. By setting the polishing head 1 obliquely, the polishing block 13 can reciprocally move along the horizontal position of the tableware during polishing to complete the polishing process, and the specific inclination angle can be determined according to the curvature of different specifications of the tableware 4.

[0046] In order to further improve the polishing efficiency and ensure polishing of the bent positions of tableware, in one embodiment, the front end of the abutting rod 12 connected to the polishing block 13 is provided with an inclined surface, and the polishing block 13 is mounted on the inclined surface. Since the polishing block 13 is usually made of a flexible material, it can effectively adapt to the curved surface of the tableware and provide a better polishing effect. However, the design of the inclined surface enables the polishing block 13 to better conform to the curve of the tableware during operation, ensuring uniform pressure at different contact points, enabling the polishing block 13 to conform to the bending of the tableware, easily entering the concave and highly curved areas, ensuring the comprehensiveness of the polishing effect, and thus guaranteeing the polishing effect of the tableware 4.

[0047] In order to further improve the polishing effect of the polishing block 13, in one embodiment, the inclination angle of the inclined surface is 10° to 30°. Since the polishing head 1 itself already has a certain inclination, in order to ensure that the polishing block 13 can fully contact the surface and any bent positions of the tableware, increase the effective working area, and thus improve the polishing efficiency, the front end of the abutting rod 12 is further inclined, and the inclination angles of the abutting rods 12 at different positions can be adjusted accordingly. The inclination angle of the abutting rod 12 in the horizontal position can be reduced, so that the included angle between the polishing block 13 and the horizontal plane can be minimized, and the contact area between the polishing block 13 and the tableware 4 can be larger. And the inclination degree of the abutting rod 12 on the inclined surface of the tableware 4 can be increased, so that the included angle between the polishing block 13 and the inclined surface of the tableware 4 can also be reduced, so that the polishing block 13 can better conform to these surfaces, thus ensuring comprehensive polishing of the tableware 4 without dead corners.

[0048] Some impurities such as metal particles, dust, and oil stains will remain on the polished tableware 4. Therefore, it is necessary to clean the tableware 4 to remove these residues and ensure the cleanliness and hygiene of the surface of the tableware 4. After the tableware 4 is cleaned, in order to prevent the tableware 4 from easily reacting with oxygen in the air after polishing and causing oxidation, in one embodiment, in step S5, drying is performed using an inert gas. Using an inert gas (such as nitrogen, helium, etc.) for drying can quickly remove moisture in an oxygen-free environment and prevent the occurrence of oxidation reactions, thereby maintaining the smoothness and beauty of the surface of the tableware 4.

[0049] In order to extend the service life of the tableware 4, reduce the replacement frequency and maintenance cost, in one embodiment, in step S5, the dried tableware 4 is passivated. Passivation is a chemical treatment process, mainly by forming a thin passivation film on the metal surface to improve the corrosion resistance of the metal material. The surface of the passivated tableware 4 is smoother, and substances such as dirt and grease are not easily attached, facilitating cleaning and maintenance. At the same time, it can further improve the smoothness and gloss of the surface, making the tableware 4 look more beautiful, and also enhancing its food contact safety.

[0050] As described above, it is only the preferred embodiment of the present invention, and there is no limitation to the present invention in any form. Although the present invention has been disclosed as above with the preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can make some changes or modifications to equivalent embodiments by using the disclosed technical content within the scope of the technical solution of the present invention. However, as long as it does not depart from the content of the technical solution of the present invention, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention still fall within the scope of the technical solution of the present invention.

Claims

1. A tableware surface processing method, characterized in that: The following steps are involved: S1: Cleaning: Use clean water to remove the stains and impurities left over from the previous process from the hardware tableware to be polished; S2: Loading, fixing the tableware in the polishing area; S3: Adjust, fit the polishing head to the polishing position of the tableware so that the shape of the polishing head matches the tableware; S4: polishing, the fixed polishing head is vibrated back and forth to polish the tableware; S5: unloading, removing the polished tableware from the polishing area and washing and drying it; The polishing head comprises a base, a plurality of abutting rods and a plurality of polishing blocks, a cavity is formed at the bottom of the base, a plurality of mounting grooves are formed on the bottom surface of the base, the mounting grooves are communicated with the cavity, a plurality of the abutting rods are correspondingly slidably fitted in the plurality of mounting grooves, a plurality of the polishing blocks are correspondingly embedded in the front ends of the plurality of abutting rods, an air inlet is formed on the top surface of the base, the air inlet is communicated with the cavity, and a reciprocating drive mechanism is connected to the top surface of the base; Air is blown into the cavity through the air inlet, so that the abutment rod on the polishing head abuts against the tableware through the polishing block, allowing the abutment rod to adapt to the shape and depth changes of the tableware surface, and then the air intake of the air inlet is cut off to keep the air pressure in the cavity stable. At this time, the polishing block can smoothly abut against the complex shape and uneven surface of the tableware.

2. The surface processing method of tableware according to claim 1, characterized in that: A plurality of sliding holes are provided on the top surface of the cavity at positions corresponding to the abutting rod, and the tail end of the abutting rod is slidably connected to the sliding hole, a through hole is provided at the tail end of the abutting rod, the through hole is communicated with the sliding hole, an air valve is provided in the sliding hole, the sliding hole is communicated with the air inlet hole, a slider is slidably fitted in the through hole, a push rod is connected to the bottom surface of the slider, the abutment hinge of the push rod is limited, a plurality of limit platforms are provided in the middle of the mounting groove, the limit bar is slidably arranged on the outer side wall of the middle part of the abutting rod, avoidance grooves are provided at positions corresponding to the abutting rod and the limit bar, and the through hole ventilation pushes the limit bar to engage with the limit platform.

3. The surface processing method of tableware according to claim 1, characterized in that: In step S2, a fixing seat is provided in the polishing area, a plurality of adsorption holes are provided on the top of the fixing seat, and a limiting block is provided on the bottom of the fixing seat. The fixing seat adsorbs the tableware through the adsorption holes and fixes the position of the tableware through the limiting block.

4. The tableware surface processing method according to claim 1, characterized in that: The reciprocating drive mechanism includes a driving motor, a crank, a connecting rod, a support rod, a slide seat and a slide rod. The output end of the driving motor is connected to the crank, the crank is rotatably connected to the support rod, the support rod is installed on the top surface of the slide seat, the middle part of the crank is connected to one end of the connecting rod, the other end of the connecting rod is connected to the slide rod, the slide rod is slidably connected to the bottom of the slide seat, and the slide rod is connected to the top surface of the base.

5. The tableware surface processing method according to claim 1, characterized in that: The polishing block consists of a flexible layer and a polishing layer.

6. The tableware surface processing method according to claim 1, characterized in that: In step S4, the angle between the end surface of the polishing head and the tableware plane is 10° to 30°.

7. The tableware surface processing method according to claim 6, characterized in that: The front end of the abutment rod connected with the polishing block is provided with an inclined surface, and the polishing block is installed on the inclined surface.

8. The tableware surface processing method according to claim 7, characterized in that: The inclination angle of the inclined surface is 10°~30°.

9. The tableware surface processing method according to claim 1, characterized in that: In step S5, drying is performed using an inert gas.

10. The tableware surface processing method according to claim 1, characterized in that: In step S5, the dried tableware is subjected to a passivation treatment.

Images