Microwave remote plasma source parameter optimization design method and related equipment
By introducing conductivity and electron density into the microwave remote plasma source to simulate the electric field distribution after plasma generation, the problem of insufficient electric field simulation in the existing technology is solved, and the rational evaluation of the electric field distribution and the optimization of design parameters are achieved.
Patent Information
- Application Number
- CN202411840017.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-13
- Publication Date
- 2025-01-21
- Estimated Expiration
- 2044-12-13
AI Technical Summary
The prior art lacks the electric field simulation after plasma generation in the simulation analysis and optimization of microwave remote plasma sources, resulting in the optimization of electric field structure depends on the researcher's personal experience, affecting the rationality evaluation of electric field distribution and design parameter optimization.
By introducing conductivity and electron density, multi-physics simulation software is used to simulate the electric field distribution of the microwave remote plasma source in the ignition state and working state. Based on the parametric modeling results, the rationality evaluation index of the electric field distribution is obtained to quickly determine the optimal design. parameter.
Realize the rational assessment of the electric field after the production of the ionic body, avoiding the optimization of the electric field structure depends on personal experience, and improves the optimization efficiency of the microwave remote plasma source design parameters.
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Figure CN119337534A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of microwave remote plasma sources, and in particular to a microwave remote plasma source parameter optimization design method and related equipment. Background Art
[0002] Due to the large amount of computational effort in electromagnetic field-plasma coupling simulation and difficulty in convergence in three-dimensional conditions, existing simulation analysis and optimization of microwave remote plasma sources often only focus on the simulation and optimization of the electric field before plasma generation. For microwave remote plasma sources, continuous discharge after plasma generation is the main working state. Therefore, it is extremely important to optimize structural parameters based on the electric field in the working state. However, the existing technology lacks electric field simulation after plasma generation, so that the structural optimization based on the electric field depends on the personal experience of researchers, which affects researchers' evaluation of the rationality of the electric field distribution, and further affects researchers' optimization of the design parameters of microwave remote plasma sources.
[0003] There is currently no effective technical solution to the above problems. Summary of the invention
[0004] The purpose of the present invention is to provide a microwave remote plasma source parameter optimization design method and related equipment, which solves the problem that the existing simulation analysis and optimization of microwave remote plasma sources lack electric field simulation after plasma generation, realizes the rationality of electric field distribution by parameterized evaluation indicators, and achieves the effect of quickly determining the optimal design parameters after parameter scanning.
[0005] In a first aspect, the present invention provides a method for optimizing the design of microwave remote plasma source parameters, comprising the following steps: S1. After parameterized modeling of the microwave remote plasma source, an electron density parameter set is determined according to the electron cutoff density, wherein the electron density parameter set includes the electron density of the microwave remote plasma source in an ignition state and the electron density of the microwave remote plasma source in a working state; the electron cutoff density is used as a critical condition for distinguishing the ignition state from the working state; S2. Inputting the material parameters of the working gas into the multi-physics field simulation software; the material parameters include relative magnetic permeability, electrical conductivity and relative dielectric constant; S3. Setting the physical field in the multi-physics field simulation software to an electromagnetic wave field solved in the frequency domain; S4. After configuring the frequency domain solver in the multi-physics field simulation software, based on the parametric modeling results, the electric field distribution of the microwave remote plasma source in the ignition state and in the working state is obtained by the multi-physics field simulation software; S5. After defining a plurality of pointers for extracting pointer data in the multi-physics field simulation software, a plurality of parameter combinations are obtained according to the electron density parameter set and the preset discharge tube thickness parameter set, and pointer data corresponding to each pointer is obtained for each parameter combination; S6. Determine the optimal discharge tube thickness according to all the pointer data.
[0006] The microwave remote plasma source parameter optimization design method of the present invention simulates the electric field after plasma generation by introducing conductivity and electron density, thereby avoiding the structural optimization of the electric field from relying on the personal experience of researchers, which is beneficial for researchers to evaluate the rationality of the electric field distribution, and then helps researchers optimize the design parameters of the microwave remote plasma source.
[0007] Further, the electron cutoff density is calculated according to the following formula: ; in, is the electron cutoff density, is the mass of the electron, is the dielectric constant of vacuum, is the charge of the electron, is the frequency of the electromagnetic wave applied to the plasma.
[0008] Furthermore, the conductivity is calculated according to the following formula: ; in, is the conductivity, is the electron density of the microwave remote plasma source in the working state, is the collision frequency, Expressed as an imaginary unit, is the charge of the electron, is the frequency of the electromagnetic wave applied to the plasma.
[0009] Furthermore, the specific steps in step S1 include: S11. The electron density of the microwave remote plasma source in the ignition state is set to 0; S12. Setting the electron density of the microwave remote plasma source in a working state to be greater than the electron cutoff density.
[0010] Further, in step S5, after five pointers are defined in the multi-physics field simulation software, the pointer data of each pointer is obtained according to the following formula: ; in, The pointer data for the first pointer, is the maximum value of the electric field norm of the microwave feeding medium of the microwave remote plasma source, is the average value of the electric field norm of the working gas of the microwave remote plasma source; ; in, The pointer data for the second pointer, is the average value of the electric field norm of the microwave feeding medium of the microwave remote plasma source; ; in, The pointer data for the third pointer. is the average value of the electric field norm of the discharge tube wall of the microwave remote plasma source; ; in, The pointer data of the fourth pointer; ; in, Pointer data for the fifth pointer; is the maximum value of the electric field norm of the discharge tube wall of the microwave remote plasma source.
[0011] Furthermore, the specific steps in step S6 include: S61. Determine the optional discharge tube thickness of the microwave remote plasma source in the ignition state according to the pointer data of the first pointer and the pointer data of the second pointer and use it as the first thickness set; S62. Determine the optional discharge tube thickness of the microwave remote plasma source in the working state according to the pointer data of the third pointer, the pointer data of the fourth pointer and the pointer data of the fifth pointer as the second thickness set; S63. Determine an optimal discharge tube thickness according to the first thickness set and the second thickness set.
[0012] The ignition state and the working state are considered separately, and the calculation of the parametric evaluation index of the rationality of the electric field distribution can quickly determine the corresponding optimal and suboptimal size parameter ranges after parameter scanning.
[0013] Furthermore, the specific steps in step S63 include: S631. Taking the minimum value of the discharge tube thicknesses that belong to both the first thickness set and the second thickness set as the optimal discharge tube thickness.
[0014] In a second aspect, the present invention provides a microwave remote plasma source parameter optimization design device, comprising: A first determination module is used to determine an electron density parameter set according to an electron cutoff density after parameterized modeling of the microwave remote plasma source, wherein the electron density parameter set includes an electron density of the microwave remote plasma source in an ignition state and an electron density of the microwave remote plasma source in a working state; the electron cutoff density serves as a critical condition for distinguishing the ignition state from the working state; An input module, used to input material parameters of the working gas into the multi-physics field simulation software; the material parameters include relative magnetic permeability, electrical conductivity and relative dielectric constant; A setting module, used to set the physical field in the multi-physics field simulation software to an electromagnetic wave field solved in the frequency domain; A first acquisition module is used to obtain the electric field distribution of the microwave remote plasma source in an ignition state and in a working state through the multi-physics field simulation software based on the parameterized modeling result after the frequency domain solver is configured in the multi-physics field simulation software; A second acquisition module is used to obtain a plurality of parameter combinations according to the electron density parameter set and the preset discharge tube thickness parameter set after defining a plurality of pointers for extracting pointer data in the multi-physics field simulation software, and to obtain pointer data corresponding to each of the pointers for each of the parameter combinations; The second determination module is used to determine the optimal discharge tube thickness according to all the pointer data.
[0015] The microwave remote plasma source parameter optimization design device provided by the present invention introduces conductivity and electron density to simulate the ignition state and the working state, avoids the structural optimization of the electric field from relying on the personal experience of researchers, and is conducive to the researchers' evaluation of the rationality of the electric field distribution.
[0016] In a third aspect, the present invention provides an electronic device comprising a processor and a memory, wherein the memory stores computer-readable instructions, and when the computer-readable instructions are executed by the processor, the steps in the microwave remote plasma source parameter optimization design method provided in the first aspect are executed.
[0017] In a fourth aspect, the present invention provides a computer-readable storage medium having a computer program stored thereon, wherein when the computer program is executed by a processor, the steps in the microwave remote plasma source parameter optimization design method provided in the first aspect are executed.
[0018] It can be seen from the above that the microwave remote plasma source parameter optimization design method provided by the present invention is based on COMSOL numerical simulation technology, introduces conductivity and electron density to simulate the ignition state and working state, performs electric field simulation and parameter scanning on the microwave remote plasma source, and outputs the change relationship between the evaluation parameters and the thickness parameters, so as to quickly find the optimal design solution.
[0019] Other features and advantages of the present invention will be described in the following description, and partly become apparent from the description, or be understood by implementing the embodiments of the present invention. The purpose and other advantages of the present invention can be realized and obtained by the structures particularly pointed out in the written description and the drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 A flow chart of a microwave remote plasma source parameter optimization design method provided in an embodiment of the present invention.
[0021] Figure 2 It is a parameterized model of the microwave remote plasma source in an embodiment of the present invention.
[0022] Figure 3 The electric field distribution of the microwave remote plasma source with a discharge tube thickness of 10 mm in the ignition state in the embodiment of the present invention.
[0023] Figure 4 The electric field distribution of the microwave remote plasma source with a discharge tube thickness of 10 mm in the working state in the embodiment of the present invention.
[0024] Figure 5 These are experimental data of the microwave remote plasma source in the ignition state in the embodiment of the present invention.
[0025] Figure 6 These are experimental data of the microwave remote plasma source in the working state in the embodiment of the present invention.
[0026] Figure 7 A schematic structural diagram of a microwave remote plasma source parameter optimization design device provided in an embodiment of the present invention.
[0027] Figure 8 A schematic diagram of the structure of an electronic device provided by an embodiment of the present invention.
[0028] Description of labels: 100, rectangular waveguide; 200, microwave feed window; 300, resonant cavity; 310, discharge tube; 400, first determination module; 500, input module; 600, setting module; 700, first acquisition module; 800, second acquisition module; 900, second determination module; 13, electronic device; 1301, processor; 1302, memory; 1303, communication bus. DETAILED DESCRIPTION
[0029] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. The components of the embodiments of the present invention generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present invention provided in the drawings is not intended to limit the scope of the claimed invention, but merely represents the selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present invention.
[0030] It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in the subsequent drawings. At the same time, in the description of the present invention, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.
[0031] Reference Figure 1 and attached Figure 2 The present invention provides a method for optimizing the design of microwave remote plasma source parameters, comprising the following steps: S1. After parameterizing the microwave remote plasma source, an electron density parameter set is determined according to the electron cutoff density, wherein the electron density parameter set includes the electron density of the microwave remote plasma source in an ignition state and the electron density of the microwave remote plasma source in a working state; the electron cutoff density is used as a critical condition for distinguishing the ignition state from the working state; S2. Inputting material parameters of the working gas into the multi-physics simulation software; the material parameters include relative magnetic permeability, electrical conductivity and relative dielectric constant; S3. Setting the physical field in the multi-physics simulation software to an electromagnetic wave field solved in the frequency domain; S4. After configuring the frequency domain solver in the multi-physics field simulation software, based on the parametric modeling results, the electric field distribution of the microwave remote plasma source in the ignition state and in the working state is obtained through the multi-physics field simulation software; S5. After defining multiple pointers for extracting pointer data in the multi-physics field simulation software, a plurality of parameter combinations are obtained according to the electron density parameter set and the preset discharge tube thickness parameter set, and the pointer data corresponding to each pointer is obtained for each parameter combination; S6. Determine the optimal discharge tube thickness based on all pointer data.
[0032] In this embodiment, the microwave remote plasma source mainly includes three components: a rectangular waveguide 100, a microwave feed window 200 and a resonant chamber 300. The material of the discharge tube 310 in the resonant chamber 300 can be quartz, and is generally designed to be 198 mm long and 60 mm in outer diameter. Considering the processing and use requirements, the thickness of the discharge tube 310 is generally within the range of 2-15 mm. In actual application, microwaves are input from the rectangular waveguide 100, coupled to the ionized working gas in the resonant chamber 300 through the microwave feed window 200, thereby generating plasma. For example, the input electromagnetic wave is mode, the frequency is 2.45 GHz, the working gas can be argon, the gas pressure of the working gas is 6 torr, the gas pressure of the air in the rectangular waveguide 100 is 1 atm, and the microwave remote plasma source can achieve different working states by changing the material parameters of the working gas.
[0033] It should be noted that in step S4, the electric field distribution of the microwave remote plasma source in the ignition state and the working state is obtained respectively, so that researchers can determine whether the electric field distribution is reasonable and optimize the structural parameters on this basis, so as to achieve a quantitative evaluation of the rationality of the electric field distribution (step S5). Therefore, step S4 is the basis for executing step S5.
[0034] In the process of parametric modeling of microwave remote plasma source, the initial value of the discharge tube thickness can be set to 10 mm, and then the material parameters can be set, where the magnetic permeability , relative dielectric constant , the conductivity is calculated according to the following formula: ; in, is the conductivity, is the electron density of the microwave remote plasma source in working state, is the collision frequency, Expressed as an imaginary unit, is the charge of the electron, is the frequency of the electromagnetic wave applied to the plasma.
[0035] Specifically, ; in, is the gas particle density, is the average particle velocity, is the collision cross section (related to the ion radius).
[0036] In certain embodiments, the electron cutoff density is calculated according to the following formula: ; in, is the electron cutoff density, is the mass of the electron, is the dielectric constant of vacuum, is the charge of the electron, is the frequency of the electromagnetic wave applied to the plasma.
[0037] When the frequency of the electromagnetic wave applied to the plasma is the same as the cutoff frequency of the plasma, we have: ; in, is the plasma cutoff frequency.
[0038] Furthermore, the specific steps in step S1 include: S11. The electron density of the microwave remote plasma source in the ignition state is set to 0; S12. Set the electron density of the microwave remote plasma source in the working state to be greater than the electron cutoff density.
[0039] When the microwave remote plasma source is in the ignition state, , the propagation of electromagnetic waves in the resonant chamber 300 is similar to that in a vacuum. As the plasma is generated, the electron density gradually increases. When the electric field generated by the oscillating motion of electrons in the plasma shields the electric field of electromagnetic waves, the microwave remote plasma source enters a stable working state. Therefore, the electron cutoff density can be used as a critical condition for distinguishing the ignition state from the working state. This embodiment introduces conductivity and electron density to simulate the ignition state and the working state, performs electric field simulation and parameter scanning on the microwave remote plasma source, and outputs the relationship between the evaluation parameters and the thickness parameters, so as to avoid the structural optimization of the electric field from relying on the personal experience of the researchers, which is beneficial for the researchers to evaluate the rationality of the electric field distribution, and then helps the researchers to optimize the design parameters of the microwave remote plasma source, so as to quickly find the optimal design solution. Specifically, Take greater than to simulate the working state of microwave remote plasma source, for example or .
[0040] In the process of setting the physical field, the solution domain is the entire model domain, the constitutive relationship is set to relative magnetic permeability, and the surface in contact with the technical shell is set to an ideal metal conductor (that is, the electric field is perpendicular to the surface). The boundary condition of the microwave feed port at the bottom is set to a rectangular port, the input power is 3kW, and the mode is model.
[0041] In the process of configuring the frequency domain solver, the frequency is the real frequency of the microwave fed, that is, 2.45GHz, and the electron density is set to 0. The electric field distribution of the microwave remote plasma source with a discharge tube thickness of 10mm under ignition state can be obtained (refer to the attached Figure 3 ), and then set the electron density to be greater than the electron cutoff density, the electric field distribution of the microwave remote plasma source with a discharge tube thickness of 10 mm in the working state can be obtained (refer to the attached Figure 4 ).
[0042] In some embodiments, in step S5, after five pointers are defined in the multi-physics field simulation software, the pointer data of each pointer is obtained according to the following formula: ; in, The pointer data for the first pointer, is the maximum value of the electric field norm of the microwave feeding medium of the microwave remote plasma source, is the average value of the electric field norm of the working gas of the microwave remote plasma source; ; in, The pointer data for the second pointer, is the average value of the electric field norm of the microwave feeding medium of the microwave remote plasma source; ; in, The pointer data for the third pointer. is the average value of the electric field norm of the discharge tube wall of the microwave remote plasma source; ; in, The pointer data of the fourth pointer; ; in, Pointer data for the fifth pointer; It is the maximum value of the electric field norm of the discharge tube wall of the microwave remote plasma source.
[0043] In practical applications, multiple parameter combinations are obtained according to the electron density parameter set and the preset discharge tube thickness parameter set. For example, the electron density parameter set is , the discharge tube thickness parameter set is , parameter combinations include but are not limited to: electron density is 0 and discharge tube thickness is 2, electron density is The thickness of the discharge tube is 2, the electron density is 0, and the thickness of the discharge tube is 14, the electron density is And the thickness of the discharge tube is 14. Finally, for each parameter combination, the pointer data corresponding to each pointer is calculated according to the above formula.
[0044] For a microwave remote plasma source, an ideal ignition state requires that the overall electric field strength inside the discharge tube is high and the area of the high field strength region is large, which is conducive to the excitation of the plasma. At the same time, it is also necessary to avoid excessive field strength in the microwave feeding medium that may damage the material (the microwave feeding medium is, for example, ceramics). The ideal working state requires that a high-intensity and uniformly distributed electric field be maintained on the wall of the discharge tube, which is conducive to ensuring the generation of continuous and uniform plasma. At the same time, in order to prevent the material from being damaged by the electric field effect after long-term operation, the electric field modulus extreme values in the discharge tube wall and the microwave feeding medium need to be minimized.
[0045] It should be noted that the pointer data essentially reflects the electric field modulus ratio between related electric field moduli.
[0046] Specifically, the specific steps in step S6 include: S61. Determine the optional discharge tube thickness of the microwave remote plasma source in the ignition state according to the pointer data of the first pointer and the pointer data of the second pointer and use it as the first thickness set; S62. Determine the optional discharge tube thickness of the microwave remote plasma source in the working state according to the pointer data of the third pointer, the pointer data of the fourth pointer and the pointer data of the fifth pointer as the second thickness set; S63. Determine the optimal discharge tube thickness according to the first thickness set and the second thickness set.
[0047] Taking the setting of the relevant parameters of the above embodiment as an example (the microwave feeding medium is ceramic and the working gas is argon), according to the ideal requirements of the ignition state, refer to the attached Figure 5 , comparing the pointer data of the first pointer with the pointer data of the second pointer, it can be seen that the electric field modulus of the microwave feeding medium (including the maximum value and the average value, i.e. and ) and the working gas electric field modulus (including the average value, i.e. ) changes are generally consistent. At the same time, the electric field modulus of the microwave feeding medium is generally higher than that of the working gas. The maximum value appears when the discharge tube thickness is 8mm, and the secondary value appears when the discharge tube thickness is 13mm. Therefore, these two values should be avoided when selecting the discharge tube thickness. When the discharge tube thickness is 5mm, 10mm and 15mm, three minimum values appear respectively, among which the overall minimum value is when the discharge tube thickness is 15mm.
[0048] According to the ideal requirements of working conditions, refer to the attached Figure 6, comparing the pointer data of the third pointer, the pointer data of the fourth pointer and the pointer data of the fifth pointer, it can be seen that the maximum value of the electric field norm of the discharge tube wall (i.e. ) and the maximum value of the electric field norm of the microwave feeding medium (i.e. ) generally shows a trend of first decreasing and then increasing with the increase of the thickness of the discharge tube. In contrast, the average value of the electric field norm of the discharge tube wall (i.e. ) and the average value of the electric field norm of the microwave feeding medium (i.e. ) has a relatively small change range. At this time, the pointer data of the third pointer, the pointer data of the fourth pointer and the pointer data of the fifth pointer increase with the increase of the thickness of the discharge tube, and reach a minimum value when the thickness of the discharge tube is 4-5mm, and then show an overall growth trend.
[0049] Furthermore, the specific steps in step S63 include: S631. Take the minimum value of the discharge tube thicknesses that belong to both the first thickness set and the second thickness set as the optimal discharge tube thickness.
[0050] Taking the ignition state and the working state into consideration, it can be determined that the optimal discharge tube thickness is 5mm.
[0051] In the above embodiments, the ignition state where the electron density is 0 and the working state where the electron density exceeds the electron cutoff density are considered respectively, and the calculation of the parametric evaluation index of the rationality of the electric field distribution can quickly determine the corresponding optimal and suboptimal size parameter ranges after parameter scanning, thereby facilitating researchers to optimize the design parameters of the microwave remote plasma source.
[0052] Please refer to Figure 7 , Figure 7 A microwave remote plasma source parameter optimization design device in some embodiments of the present invention is integrated into a back-end control device in the form of a computer program, comprising: A first determination module 400 is used to determine an electron density parameter set according to the electron cutoff density after parameterized modeling of the microwave remote plasma source, wherein the electron density parameter set includes the electron density of the microwave remote plasma source in an ignition state and the electron density of the microwave remote plasma source in a working state; the electron cutoff density is used as a critical condition for distinguishing the ignition state from the working state; An input module 500 is used to input material parameters of the working gas into the multi-physics field simulation software; the material parameters include relative magnetic permeability, electrical conductivity and relative dielectric constant; A setting module 600 is used to set the physical field in the multi-physics field simulation software to an electromagnetic wave field solved in the frequency domain; The first acquisition module 700 is used to obtain the electric field distribution of the microwave remote plasma source in the ignition state and in the working state through the multi-physics field simulation software based on the parameterized modeling results after the frequency domain solver is configured in the multi-physics field simulation software; The second acquisition module 800 is used to obtain multiple parameter combinations according to the electron density parameter set and the preset discharge tube thickness parameter set after defining multiple pointers for extracting pointer data in the multi-physics field simulation software, and to obtain pointer data corresponding to each pointer for each parameter combination; The second determination module 900 is used to determine the optimal discharge tube thickness according to all pointer data.
[0053] In some embodiments, the first determination module 400, when used to determine the electron density parameter set according to the electron cutoff density, performs: S11. The electron density of the microwave remote plasma source in the ignition state is set to 0; S12. Set the electron density of the microwave remote plasma source in the working state to be greater than the electron cutoff density.
[0054] In some embodiments, the second determination module 900 is executed when determining the optimal discharge tube thickness according to all pointer data: S61. Determine the optional discharge tube thickness of the microwave remote plasma source in the ignition state according to the pointer data of the first pointer and the pointer data of the second pointer and use it as the first thickness set; S62. Determine the optional discharge tube thickness of the microwave remote plasma source in the working state according to the pointer data of the third pointer, the pointer data of the fourth pointer and the pointer data of the fifth pointer as the second thickness set; S63. Determine the optimal discharge tube thickness according to the first thickness set and the second thickness set.
[0055] In some embodiments, the second determination module 900 performs, when used to determine the optimal discharge tube thickness according to the first thickness set and the second thickness set: S631. Take the minimum value of the discharge tube thicknesses that belong to both the first thickness set and the second thickness set as the optimal discharge tube thickness.
[0056] Please refer to Figure 8 , Figure 8The present invention provides a structural schematic diagram of an electronic device provided by an embodiment of the present invention. The present invention provides an electronic device 13, including: a processor 1301 and a memory 1302. The processor 1301 and the memory 1302 are interconnected and communicate with each other through a communication bus 1303 and / or other forms of connection mechanisms (not shown). The memory 1302 stores computer-readable instructions executable by the processor 1301. When the electronic device is running, the processor 1301 executes the computer-readable instructions to execute the microwave remote plasma source parameter optimization design method in any optional implementation of the above embodiment to achieve the following functions: after parameterizing and modeling the microwave remote plasma source, an electron density parameter set is determined according to the electron cutoff density, and the electron density parameter set includes the electron density of the microwave remote plasma source in the ignition state and the microwave remote plasma source. The electron density of the ion source in the working state; the electron cutoff density is used as a critical condition for distinguishing the ignition state from the working state; the material parameters of the working gas are input into the multi-physics field simulation software; the material parameters include relative magnetic permeability, electrical conductivity and relative dielectric constant; the physical field in the multi-physics field simulation software is set as an electromagnetic wave field solved in the frequency domain; after configuring the frequency domain solver in the multi-physics field simulation software, based on the parameterized modeling results, the electric field distribution of the microwave remote plasma source in the ignition state and in the working state is obtained through the multi-physics field simulation software; after defining multiple pointers for extracting pointer data in the multi-physics field simulation software, a variety of parameter combinations are obtained according to the electron density parameter set and the preset discharge tube thickness parameter set, and the pointer data corresponding to each pointer is obtained for each parameter combination; the optimal discharge tube thickness is determined based on all pointer data.
[0057] An embodiment of the present invention provides a computer-readable storage medium having a computer program stored thereon. When the computer program is executed by a processor, the microwave remote plasma source parameter optimization design method in any optional implementation of the above embodiment is executed to achieve the following functions: after parameterized modeling of the microwave remote plasma source, an electron density parameter set is determined according to the electron cutoff density, the electron density parameter set including the electron density of the microwave remote plasma source in the ignition state and the electron density of the microwave remote plasma source in the working state; the electron cutoff density is used as a critical condition for distinguishing the ignition state from the working state; the material parameters of the working gas are input into the multi-physics field simulation software The material parameters include relative magnetic permeability, electrical conductivity and relative dielectric constant. The physical field in the multi-physics simulation software is set as an electromagnetic wave field solved in the frequency domain. After configuring the frequency domain solver in the multi-physics simulation software, based on the parametric modeling results, the electric field distribution of the microwave remote plasma source in the ignition state and in the working state is obtained through the multi-physics simulation software. After defining multiple pointers for extracting pointer data in the multi-physics simulation software, multiple parameter combinations are obtained according to the electron density parameter set and the preset discharge tube thickness parameter set, and the pointer data corresponding to each pointer is obtained for each parameter combination. The optimal discharge tube thickness is determined according to all the pointer data.
[0058] Among them, the computer-readable storage medium can be implemented by any type of volatile or non-volatile storage device or a combination thereof, such as static random access memory (SRAM), electrically erasable programmable read-only memory (EEPROM), erasable programmable read-only memory (EPROM), programmable red-only memory (PROM), read-only memory (ROM), magnetic storage, flash memory, magnetic disk or optical disk.
[0059] In the embodiments provided by the present invention, it should be understood that the disclosed devices and methods can be implemented in other ways. The device embodiments described above are only schematic. For example, the division of the units is only a logical function division. There may be other division methods in actual implementation. For example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some communication interfaces, and the indirect coupling or communication connection of devices or units can be electrical, mechanical or other forms.
[0060] In addition, the units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.
[0061] Furthermore, the functional modules in the various embodiments of the present invention may be integrated together to form an independent part, or each module may exist independently, or two or more modules may be integrated to form an independent part.
[0062] In this document, relational terms such as first and second, etc. are used merely to distinguish one entity or operation from another entity or operation, but do not necessarily require or imply any such actual relationship or order between these entities or operations.
[0063] The above description is only an embodiment of the present invention and is not intended to limit the protection scope of the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.
Claims
1. A method for optimizing the design of microwave remote plasma source parameters, characterized in that: The following steps are involved: S1. After parameterized modeling of the microwave remote plasma source, an electron density parameter set is determined according to the electron cutoff density, wherein the electron density parameter set includes the electron density of the microwave remote plasma source in an ignition state and the electron density of the microwave remote plasma source in a working state; the electron cutoff density is used as a critical condition for distinguishing the ignition state from the working state; S2. Inputting the material parameters of the working gas into the multi-physics field simulation software; the material parameters include relative magnetic permeability, electrical conductivity and relative dielectric constant; S3. Setting the physical field in the multi-physics field simulation software to an electromagnetic wave field solved in the frequency domain; S4. After configuring the frequency domain solver in the multi-physics field simulation software, based on the parametric modeling results, the electric field distribution of the microwave remote plasma source in the ignition state and in the working state is obtained by the multi-physics field simulation software; S5. After defining a plurality of pointers for extracting pointer data in the multi-physics field simulation software, a plurality of parameter combinations are obtained according to the electron density parameter set and the preset discharge tube thickness parameter set, and pointer data corresponding to each pointer is obtained for each parameter combination; S6. Determine the optimal discharge tube thickness according to all the pointer data.
2. The microwave remote plasma source parameter optimization design method according to claim 1, characterized in that: The electron cutoff density is calculated according to the following formula: ; in, is the electron cutoff density, is the mass of the electron, is the dielectric constant of vacuum, is the charge of the electron, is the frequency of the electromagnetic wave applied to the plasma.
3. The microwave remote plasma source parameter optimization design method according to claim 1, characterized in that: The conductivity is calculated according to the following formula: ; in, is the conductivity, is the electron density of the microwave remote plasma source in the working state, is the collision frequency, Expressed as an imaginary unit, is the charge of the electron, is the frequency of the electromagnetic wave applied to the plasma.
4. The microwave remote plasma source parameter optimization design method according to claim 1, characterized in that: The specific steps in step S1 include: S11. The electron density of the microwave remote plasma source in the ignition state is set to 0; S12. Setting the electron density of the microwave remote plasma source in a working state to be greater than the electron cutoff density.
5. The microwave remote plasma source parameter optimization design method according to claim 1, characterized in that: In step S5, after five pointers are defined in the multi-physics field simulation software, the pointer data of each pointer is obtained according to the following formula: ; in, The pointer data for the first pointer, is the maximum value of the electric field norm of the microwave feeding medium of the microwave remote plasma source, is the average value of the electric field norm of the working gas of the microwave remote plasma source; ; in, The pointer data for the second pointer, is the average value of the electric field norm of the microwave feeding medium of the microwave remote plasma source; ; in, The pointer data for the third pointer. is the average value of the electric field norm of the discharge tube wall of the microwave remote plasma source; ; in, The pointer data of the fourth pointer; ; in, Pointer data for the fifth pointer; is the maximum value of the electric field norm of the discharge tube wall of the microwave remote plasma source.
6. The microwave remote plasma source parameter optimization design method according to claim 5, characterized in that: The specific steps in step S6 include: S61. Determine the optional discharge tube thickness of the microwave remote plasma source in the ignition state according to the pointer data of the first pointer and the pointer data of the second pointer and use it as the first thickness set; S62. Determine the optional discharge tube thickness of the microwave remote plasma source in the working state according to the pointer data of the third pointer, the pointer data of the fourth pointer and the pointer data of the fifth pointer as the second thickness set; S63. Determine an optimal discharge tube thickness according to the first thickness set and the second thickness set.
7. The microwave remote plasma source parameter optimization design method according to claim 6, characterized in that: The specific steps in step S63 include: S631. Taking the minimum value of the discharge tube thicknesses that belong to both the first thickness set and the second thickness set as the optimal discharge tube thickness.
8. A microwave remote plasma source parameter optimization design device, characterized in that: include: A first determination module is used to determine an electron density parameter set according to an electron cutoff density after parameterized modeling of the microwave remote plasma source, wherein the electron density parameter set includes an electron density of the microwave remote plasma source in an ignition state and an electron density of the microwave remote plasma source in a working state; the electron cutoff density serves as a critical condition for distinguishing the ignition state from the working state; An input module, used to input material parameters of the working gas into the multi-physics field simulation software; the material parameters include relative magnetic permeability, electrical conductivity and relative dielectric constant; A setting module, used to set the physical field in the multi-physics field simulation software to an electromagnetic wave field solved in the frequency domain; A first acquisition module is used to obtain the electric field distribution of the microwave remote plasma source in an ignition state and in a working state through the multi-physics field simulation software based on the parameterized modeling result after the frequency domain solver is configured in the multi-physics field simulation software; A second acquisition module is used to obtain a plurality of parameter combinations according to the electron density parameter set and the preset discharge tube thickness parameter set after defining a plurality of pointers for extracting pointer data in the multi-physics field simulation software, and to obtain pointer data corresponding to each of the pointers for each of the parameter combinations; The second determination module is used to determine the optimal discharge tube thickness according to all the pointer data.
9. An electronic device, characterized in that: The invention comprises a processor and a memory, wherein the memory stores computer-readable instructions. When the computer-readable instructions are executed by the processor, the steps in the microwave remote plasma source parameter optimization design method as claimed in any one of claims 1 to 7 are executed.
10. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps in the method for optimizing the parameters of a microwave remote plasma source as described in any one of claims 1 to 7 are executed.
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