Metal surface vacuum coating equipment and vacuum coating method

Abstract

The present invention discloses a metal surface vacuum coating device and a vacuum coating method, which relates to the field of vacuum coating technology, including an outer bin and a bin cover rotatably mounted on the outer bin via a rotating shaft, and also including a target material and a substrate; an inner bin is fixedly mounted inside the outer bin, and the inner bin is divided into two halves, one half of which is located in the outer bin and the other half is located in the bin cover; a gas injection disk is fixedly mounted at the bottom of the inner bin, and a plurality of gas injection holes are provided on the gas injection disk; a vacuum pump is fixedly mounted outside the outer bin, and the vacuum pump is connected to the inner bin via an air pipe. The advantage is that when the present invention is coating the substrate, it can not only effectively reduce the probability of poor coating quality caused by uneven heating of the target material, but also can concentrate the emission of ions sputtered from the target material, and locally coat the substrate, so that the coating uniformity is higher, the ion attachment strength is greater, the probability of coating shedding in the later stage is low, and the coating quality is higher.

Description

Technical Field

[0001] The invention relates to the technical field of vacuum coating, and in particular to a metal part surface vacuum coating device and a vacuum coating method. Background Art

[0002] Vacuum coating is a technology that uses a vacuum environment to deposit a thin film of material onto the surface of an object. It is usually used to improve the appearance, durability, corrosion resistance, conductivity and other properties of an object. It is widely used in electronics, optics, decoration and other fields. The coated film is more uniform and has stronger adhesion.

[0003] The vacuum coating equipment currently used has the problem of uneven coating, which is often caused by the uneven heating in the coating chamber, resulting in irregular movement of ions separated from the target material. Therefore, the publication number CN114318296B discloses a vacuum coating equipment, which includes a coating chassis, multiple evaporation boats, electrodes, positive electrical parts, negative electrical parts and connecting electrical parts. A vacuum coating chamber is provided in the coating chassis, the positive electrical parts and the negative electrical parts are installed outside the coating chassis, the electrodes are installed in the vacuum coating chamber, and multiple evaporation boats are installed in the vacuum coating chamber in a longitudinal arrangement, the positive end of the evaporation boat is electrically connected to the positive electrical part, and the negative end of the evaporation boat is electrically connected to the negative electrical part. The positive electrical component, the negative electrical component and the first end of the connecting electrical component are located on the same side, the positive electrical component, the negative electrical component and the second end of the connecting electrical component are located on the same side, the first end of the positive electrical component is used to connect to the positive pole of the power supply, the second end of the connecting electrical component is electrically connected to the second end of the negative electrical component, and the first end of the connecting electrical component is used to connect to the negative pole of the power supply.

[0004] The relative voltage values ​​at the positive and negative ends of each evaporation boat of the above-mentioned vacuum coating equipment are the same. When the structures of the evaporation boats are the same (that is, the resistance values ​​are equal), the heating power of each evaporation boat is equal, so that the evaporation efficiency of each evaporation boat is the same. In the up and down directions, the concentration of the reaction gas obtained by evaporation is roughly equal, avoiding uneven evaporation.

[0005] When the current vacuum coating equipment and the above-mentioned coating equipment are used, the ions separated from the target material wander in the coating chamber. The positive potential on the back of the substrate guides the negatively charged ions, causing the ions to move at high speed to the side close to the substrate, thereby being deposited on the surface of the substrate to form a coating. Since the ions are moved solely by the positive potential, and the ions are distributed non-uniformly in the vacuum chamber, the deposition of the ions on the substrate will also deviate, affecting the uniformity of the coating.

[0006] Therefore, a new type of metal surface vacuum coating equipment and vacuum coating method can be used to solve the shortcomings of the prior art. Summary of the invention

[0007] The purpose of the present invention is to solve the problem of uneven coating in the prior art and to propose a metal surface vacuum coating device and a vacuum coating method.

[0008] In order to achieve the above object, the present invention adopts the following technical solutions:

[0009] A metal surface vacuum coating device, comprising an outer chamber and a chamber cover rotatably mounted on the outer chamber via a rotating shaft, and also comprising a target material and a substrate;

[0010] An inner bin is fixedly installed inside the outer bin, and the inner bin is divided into two halves, one half of which is located in the outer bin and the other half is located in the bin cover. A gas injection plate is fixedly installed at the bottom of the inner bin, and a plurality of gas injection holes are opened on the gas injection plate. A vacuum pump is fixedly installed outside the outer bin, and the vacuum pump is connected to the inner bin through an air pipe.

[0011] A fixing assembly is installed in the inner chamber, and the substrate is installed on the fixing assembly, which is used to lock the substrate and drive the substrate to rotate for angle adjustment, so as to ensure that each vertical surface of the substrate can be coated;

[0012] An ion guide assembly is installed in the inner chamber, and the target material is located inside the ion guide assembly. The ion guide assembly is used to directionally guide ions sputtered from the target material, and can also drive the target material to rotate to ensure uniform sputtering of the target material ions.

[0013] Preferably, the fixing assembly includes a connecting rod rotatably mounted on the bottom of the inner bin via a second one-way bearing, a bottom disc and a top disc are fixedly mounted on the connecting rod, and a plurality of clamping mechanisms cooperating with the substrate are mounted on the bottom disc and the top disc.

[0014] Preferably, the clamping mechanism includes a fixing frame fixedly mounted on the top disc and the bottom disc, an eccentric rotating shaft is rotatably mounted on the two fixing frames, a telescopic rod is fixedly mounted on the bottom of the two eccentric rotating shafts, a locking plate that cooperates with each other is fixedly mounted on the two telescopic rods, and an adjustment structure that cooperates with the connecting rod and the two eccentric rotating shafts is installed on the top of the inner warehouse.

[0015] Preferably, the adjustment structure comprises a first motor fixedly mounted on the top of the inner bin, a cam rod and a first one-way bearing are fixedly mounted on the driving end of the first motor, the first one-way bearing is fixedly connected to the connecting rod, a rotating disk is rotatably mounted on the connecting rod, an eccentric hole matching the connecting rod is formed on the rotating disk, and a circular hole matching the cam rod is formed at the center point of the rotating disk, the cam rod passes through the circular hole, and the cam rod is rotatably connected to the circular hole;

[0016] An annular limiting slide rail is fixedly installed at the bottom of the rotating disk, and a limiting roller matched with the limiting slide rail is rotatably installed on each eccentric rotating shaft located on the top circular disk.

[0017] Preferably, the ion guide assembly comprises a heating chamber fixedly mounted on the inner wall of the inner chamber, the target material is rotatably mounted on the heating chamber, half of the target material is located inside the heating chamber, and the other half is located outside the heating chamber, a second motor is fixedly mounted on the top of the heating chamber, and a driving end of the second motor is fixedly connected to the target material;

[0018] An ion guide chamber is fixedly installed outside the heating chamber, the ion guide chamber is elliptical, the target material is located at one center of the ellipse, an ion collecting mechanism is installed in the ion guide chamber, the ion collecting mechanism is located at the other center of the ellipse, and an ion emission port is opened at one end of the ion guide chamber away from the heating chamber;

[0019] A guide piece is fixedly installed on both sides of the ion emission port, and a swing mechanism matched with the two guide pieces is installed on the ion guide chamber.

[0020] Preferably, the ion collecting mechanism comprises an ion concentrating tube rotatably mounted inside the ion guide chamber, the ion concentrating tube is octagonal in shape, an electrode plate is fixedly mounted inside the ion concentrating tube, and a driving structure cooperating with the ion concentrating tube is mounted on the ion guide chamber.

[0021] Preferably, an insulating guide plate is fixedly installed outside the electrode plate, the insulating guide plate is U-shaped, and the opening direction of the insulating guide plate faces the emission port.

[0022] Preferably, the driving structure includes a fourth motor fixedly mounted on the top of the ion guide chamber, an incomplete gear fixedly mounted on the driving end of the fourth motor, a pillar fixedly mounted at the center point of the top of the ion concentrating tube, the pillar passes through and extends out of the ion concentrating tube, and a gear disk matching the incomplete gear is fixedly mounted on the pillar.

[0023] Preferably, the swing mechanism includes a third motor fixedly mounted on the top of the ion guide chamber, a swing frame is fixedly mounted on the driving end of the third motor, a connecting rod is rotatably mounted on each of the two guide plates, and the swing frame is provided with two limit grooves matching the corresponding connecting rods.

[0024] The present invention also provides a method for vacuum coating on the surface of a metal part, comprising the above-mentioned vacuum coating device for the surface of a metal part, and further comprising the following steps:

[0025] S1. First, open the bin cover, place the substrate on the fixing component inside the inner bin, fix the substrate by the fixing component, and then close the bin cover;

[0026] S2, then start the vacuum pump, extract the air in the inner chamber through the air pipe, so that the pressure in the inner chamber reaches the specified pressure, then stop the vacuum operation, and then heat the target material through the ion guide assembly, while heating, drive the target material to rotate, so that the target material is heated evenly, while heating, inject argon gas into the inner chamber through the gas injection plate;

[0027] S3. The injected argon atoms impact the target material to make the target ions fall off. The ions are scattered in the ion guide assembly. The ion guide assembly emits the ions in a concentrated manner and sprays them at high speed onto the substrate, thereby performing local coating on the substrate. After a certain period of time, the position of the substrate is changed by operating the fixed assembly, and it is ensured that the coating surface of the substrate is perpendicular to the moving direction of the sprayed ions, so as to perform coating operations on another part of the substrate.

[0028] Compared with the prior art, the present invention has the following advantages:

[0029] 1. When the vacuum coating equipment is coating the substrate, a heating chamber is set to heat the target material, so that the target material is heated more evenly, and the second motor drives the target material to rotate, so that the ions on the target material fall off more evenly, thereby making the target material ions adhere more evenly and improving the uniformity of the substrate coating.

[0030] 2. When coating the substrate, the vacuum coating equipment guides the ions sputtered from the target material by setting up an ion guide chamber, collects the sputtered ions by using an ion concentrator, and then accelerates and emits the concentrated ions through the electrode plate. This can not only effectively improve the uniformity of ion distribution and the coating quality, but also increase the collision force between ions and the substrate, thereby improving the ion adhesion strength and reducing the probability of coating shedding.

[0031] 3. When coating the substrate, the vacuum coating equipment fixes the substrate by setting a fixing component, and drives the substrate to rotate to change the angle of the substrate, so that different vertical surfaces of the substrate can be coated. In addition, a rotatable guide plate is provided to change the direction of ion emission, which is used to coat different positions of the substrate. While changing the direction, the distance between the guide plate and the substrate increases. At this time, the distance between the two guide plates decreases, the ion emission speed is faster, and the ions are more concentrated, thereby improving the uniformity of the coating.

[0032] In summary, when the present invention is used for substrate coating, it can not only effectively reduce the probability of poor coating quality caused by uneven heating of the target material, but also concentrate the emission of ions sputtered from the target material to perform local coating on the substrate, so that the coating uniformity is higher, the ion attachment strength is greater, the probability of coating falling off in the later stage is low, and the coating quality is higher. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] The specific embodiments of the present invention are further described in detail below in conjunction with the accompanying drawings, wherein:

[0034] Figure 1 This is a schematic diagram of the structure of a metal surface vacuum coating device proposed by the present invention;

[0035] Figure 2 for Figure 1 Detailed schematic diagram of the structure after being rotated to a certain angle;

[0036] Figure 3 for Figure 1 Detailed diagram of the structure after the cover is opened;

[0037] Figure 4 for Figure 3 Detailed schematic diagram of the structure after being rotated to a certain angle;

[0038] Figure 5 for Figure 3 A detailed schematic diagram of the enlarged structure of the inner and outer chambers, vacuum pump, substrate, fixed assembly, and ion guide assembly;

[0039] Figure 6 for Figure 5 A schematic detailed view of the plan structure along one of the angles;

[0040] Figure 7 for Figure 6 Detailed schematic diagram of the three-dimensional structure along the AA section;

[0041] Figure 8 for Figure 7 A schematic detailed diagram of the enlarged structure of the fixed component;

[0042] Fig. 9 for Figure 8 Detailed schematic diagram of the structure after removing the substrate and rotating it at a certain angle;

[0043] Fig.10 for Fig. 9 Detailed schematic diagram of the exploded structure;

[0044] Fig.11 for Fig.10 Detailed schematic diagram of the structure after being rotated to a certain angle;

[0045] Fig.12 for Fig.10 A schematic structural detail diagram of the middle locking disk and its surrounding components;

[0046] Fig.13 for Figure 7 A schematic detailed diagram of the enlarged structure of the ion guide assembly;

[0047] Fig.14 for Fig.13A schematic detailed view of the plan structure along one of the angles;

[0048] Fig.15 for Fig.14 Detailed schematic diagram of the plan structure of the middle BB section;

[0049] Fig.16 for Fig.13 Detailed schematic diagram of the exploded structure;

[0050] Fig.17 for Fig.16 A detailed schematic diagram of the enlarged structure of the middle guide plate and the driving mechanism;

[0051] Fig.18 for Fig.16 The enlarged structural schematic detail diagram of the middle C part;

[0052] Fig.19 for Fig.18 Detailed schematic diagram of the structure of the central ion concentrator and its internal components.

[0053] In the figure: 1 outer chamber, 2 chamber cover, 3 vacuum pump, 4 sealing unit, 5 rotating shaft, 6 substrate, 7 fixed assembly, 8 ion guide assembly, 9 observation window, 10 inner chamber, 11 gas injection disk, 12 bottom disk, 13 top disk, 14 rotating disk, 15 first motor, 16 connecting rod, 17 locking disk, 18 first one-way bearing, 19 cam rod, 20 limiting slide rail, 21 second one-way bearing, 22 fixing frame, 23 telescopic rod, 24 eccentric rotating shaft, 25 limiting roller, 26 heating chamber, 27 ion guide chamber, 28 second motor, 29 guide plate, 30 target, 31 ion concentration tube, 32 third motor, 33 swing frame, 34 connecting rod, 35 limiting groove, 36 fourth motor, 37 incomplete gear, 38 toothed disc, 39 electrode plate, 40 insulating guide plate. DETAILED DESCRIPTION

[0054] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0055] Example 1: Reference Figure 1-Figure 5 , a metal surface vacuum coating device, comprising an outer chamber 1 and a chamber cover 2 rotatably mounted on the outer chamber 1 via a rotating shaft 5, and also comprising a target material 30 and a substrate 6;

[0056] An inner warehouse 10 is fixedly installed inside the outer warehouse 1. The inner warehouse 10 is divided into two halves, one half is located in the outer warehouse 1, and the other half is located in the warehouse cover 2. A gas injection disk 11 is fixedly installed at the bottom of the inner warehouse 10. A plurality of gas injection holes are opened on the gas injection disk 11. A vacuum pump 3 is fixedly installed outside the outer warehouse 1. The vacuum pump 3 is connected to the inner warehouse 10 through an air pipe.

[0057] Argon gas is injected into the gas injection holes on the gas injection plate 11 to move the argon gas from bottom to top. Argon gas atoms collide with the target material 30 to separate ions from the target material 30 .

[0058] A sealing unit 4 is installed between the outer bin 1 and the bin cover 2. The sealing unit 4 is an existing mechanical sealing component, which can ensure the airtightness between the outer bin 1 and the bin cover 2, and will not be elaborated here.

[0059] A transparent observation window 9 is provided on the bin cover 2 for observing the coating condition in the inner bin 10. A control system and a control panel are installed on the bin cover 2 for controlling the start and stop of the vacuum pump 3 and the gas injection operation for fully automatic coating.

[0060] Embodiment 2: This embodiment is different from the embodiment 1 in that: Figure 1 , Figure 5-Figure 12 A fixing assembly 7 is installed in the inner chamber 10, and a substrate 6 is installed on the fixing assembly 7, which is used to lock the substrate 6 and drive the substrate 6 to rotate for angle adjustment to ensure that each vertical surface of the substrate 6 can be coated.

[0061] The fixing assembly 7 includes a connecting rod 16 rotatably mounted on the bottom of the inner bin 10 via a second one-way bearing 21 , on which a bottom disc 12 and a top disc 13 are fixedly mounted, and on which a plurality of clamping mechanisms cooperating with the substrate 6 are mounted.

[0062] The connecting rod 16 is fixedly connected to the inner ring of the second one-way bearing 21, and the outer ring of the second one-way bearing 21 is fixedly connected to the bottom of the inner bin 10, so that the connecting rod 16 can only rotate in one direction around its central axis and cannot be reversed.

[0063] The clamping mechanism includes a fixing frame 22 fixedly mounted on the top disc 13 and the bottom disc 12, an eccentric shaft 24 is rotatably mounted on each of the two fixing frames 22, a telescopic rod 23 is fixedly mounted at the bottom of each of the two eccentric shafts 24, a locking plate 17 that cooperates with each other is fixedly mounted on each of the two telescopic rods 23, and an adjusting structure that cooperates with the connecting rod 16 and the two eccentric shafts 24 is installed on the top of the inner bin 10.

[0064] The substrate 6 is placed between the bottom disc 12 and the locking disc 17 corresponding to the top disc 13, and then the two locking discs 17 clamp the substrate 6 by adjusting the length of the telescopic rod 23 (the telescopic rod 23 has its own locking mechanism, which is a common adjustable telescopic component, and the specific structure is not described here).

[0065] The rotation of the eccentric shaft 24 around its central axis drives the telescopic rod 23 to rotate, thereby driving the locking plate 17 to rotate, and the locking plate 17 drives the substrate 6 to rotate, achieving an angle change of the substrate 6 for coating the surface of the substrate 6 at different positions.

[0066] The adjustment structure includes a first motor 15 fixedly mounted on the top of the inner bin 10, a cam rod 19 and a first one-way bearing 18 fixedly mounted on the driving end of the first motor 15, the first one-way bearing 18 is fixedly connected to the connecting rod 16, a rotating disk 14 is rotatably mounted on the connecting rod 16, an eccentric hole matching the connecting rod 16 is provided on the rotating disk 14, and a circular hole matching the cam rod 19 is provided at the center point of the rotating disk 14, the cam rod 19 passes through the circular hole, and the cam rod 19 is rotatably connected to the circular hole;

[0067] An annular limiting slide rail 20 is fixedly mounted on the bottom of the rotating disk 14 , and a limiting roller 25 matching the limiting slide rail 20 is rotatably mounted on each eccentric rotating shaft 24 located on the top circular disk 13 .

[0068] The driving end of the first motor 15 rotates to drive the cam rod 19 fixedly connected thereto to rotate (the cam rod 19 rotates eccentrically around the connecting rod 16). The rotation of the cam rod 19 drives the limiting slide rail 20 fixedly connected thereto to rotate, and drives the eccentric rotating shaft 24 to rotate around its center axis through the limiting roller 25 (when the eccentric rotating shaft 24 rotates, the limiting roller 25 rolls in the limiting slide rail 20, which can reduce friction and make the eccentric rotating shaft 24 rotate more smoothly.).

[0069] The clamping mechanism on the bottom disc 12 is in opposite directions to the clamping mechanism on the top disc 13 . The locking discs 17 on the two clamping mechanisms are in opposite positions. Each locking disc 17 is provided with an anti-skid groove to increase friction and improve the stability of the substrate 6 .

[0070] The inner ring of the first one-way bearing 18 is fixedly connected to the connecting rod 16, and the outer ring of the first one-way bearing 18 is fixedly connected to the driving end of the first motor 15. The free rotation of the first one-way bearing 18 is opposite to the free rotation of the second one-way bearing 21. Therefore, the clockwise rotation of the first motor 15 (clockwise here is for the convenience of distinguishing the forward and reverse rotation of the driving end of the first motor 15) will drive the first one-way bearing 18 to rotate, thereby driving the connecting rod 16 to rotate, thereby driving the bottom disc 12 and the top disc 13 to rotate, realizing the transposition operation of the substrate 6. Since the position of the substrate 6 is changed, the angle of the substrate 6 changes. At this time, the driving end of the first motor 15 is rotated counterclockwise. At this time, the inner ring of the first one-way bearing 18 will be driven to rotate under the action of the first motor 15, while the outer ring will not rotate, so the connecting rod 16 will not rotate. When the first one-way bearing 18 rotates, there is friction between the inner and outer rings, so the connecting rod 16 may rotate counterclockwise, but the connecting rod 16 is prevented from rotating counterclockwise under the action of the second one-way bearing 21. Since the friction between the inner and outer rings of the second one-way bearing 21 is small, the connecting rod 16 may rotate by itself under the action of vibration. Therefore, the second one-way bearing 21 has a certain damping property, which can suppress the self-rotation of the connecting rod 16.

[0071] When the driving end of the first motor 15 rotates counterclockwise or clockwise, the cam rod 19 will rotate. However, when the first motor 15 rotates clockwise, the connecting rod 16 and the cam rod 19 rotate simultaneously. Therefore, the cam rod 19 drives the rotating disk 14 and the connecting rod 16 to rotate together. At this time, the limiting roller 25 will not be relatively displaced with the limiting slide rail 20, so the eccentric shaft 24 will not rotate.

[0072] When the driving end of the first motor 15 rotates counterclockwise, the connecting rod 16 does not rotate. The rotation of the cam rod 19 will drive the rotating disk 14 to rotate, and the connecting rod 16 does not rotate. Therefore, a relative displacement will occur between the limiting slide rail 20 and the limiting roller 25 on the rotating disk 14, which will drive the eccentric rotating shaft 24 to rotate, thereby changing the angle of the substrate 6. Since there will be pressure between the limiting slide rail 20 and the limiting roller 25, it will drive the connecting rod 16 to rotate. This is because the second one-way bearing 21 adopts a damping design to suppress the rotation of the connecting rod 16.

[0073] Since the connecting rod 16 rotates to change the position of the substrate 6, the angle of the substrate 6 will change. At this time, the angle of the substrate 6 is adjusted by reversing the driving end of the first motor 15 so that the coating surface of the substrate 6 is always perpendicular to the ion path (the rotation of the connecting rod 16 is also used to replace different substrates 6).

[0074] Embodiment 3: This embodiment is different from the technical solution of Embodiment 2 in that: Figure 3 , Figure 5 , Figure 13-Figure 19An ion guide assembly 8 is installed in the inner chamber 10, and the target material 30 is located inside the ion guide assembly 8. The ion guide assembly 8 is used to directionally guide the ions sputtered from the target material 30, and can also drive the target material 30 to rotate to ensure uniform ion sputtering of the target material 30.

[0075] The ion guide assembly 8 includes a heating chamber 26 fixedly mounted on the inner wall of the inner chamber 10, a target material 30 is rotatably mounted on the heating chamber 26, half of the target material 30 is located inside the heating chamber 26, and the other half is located outside the heating chamber 26, a second motor 28 is fixedly mounted on the top of the heating chamber 26, and a driving end of the second motor 28 is fixedly connected to the target material 30;

[0076] The heating chamber 26 heats half of the target 30, and then the target 30 rotates 180 degrees each time, so that the ions on the target 30 fall off evenly, the target 30 is heated evenly, and the ions are evenly distributed.

[0077] An ion guide chamber 27 is fixedly installed outside the heating chamber 26. The ion guide chamber 27 is elliptical. The target material 30 is located at one center of the ellipse. An ion collecting mechanism is installed in the ion guide chamber 27. The ion collecting mechanism is located at the other center of the ellipse. An ion emission port is provided at one end of the ion guide chamber 27 away from the heating chamber 26.

[0078] The ion guide chamber 27 adopts an elliptical design, with the target material 30 located at one of the centers and the ion collecting mechanism located at the other center. The ions on the target material 30 are knocked off and sputtered by the impact of argon atoms and will be sputtered onto the inner wall of the ion guide chamber 27. According to the characteristics of the ellipse itself, the ions sputtered onto the inner wall of the ion guide chamber 27 will be reflected and collected by the ion collecting mechanism at the other center of the ellipse.

[0079] The ion collecting mechanism includes an ion concentrating tube 31 rotatably mounted inside the ion guide chamber 27 . The ion concentrating tube 31 is octagonal in shape. An electrode plate 39 is fixedly mounted inside the ion concentrating tube 31 . A driving structure matching the ion concentrating tube 31 is mounted on the ion guide chamber 27 .

[0080] The sputtered ions will accumulate on the ion concentrating tube 31 after reflection, and then the electrode plate 39 will be energized to eject the accumulated ions on the ion concentrating tube 31 at high speed, thereby accelerating the ion emission speed and making the ions impact on the substrate 6 at a higher speed, thereby improving the ion adhesion strength.

[0081] An insulating guide plate 40 is fixedly installed on the outside of the electrode plate 39. The insulating guide plate 40 is U-shaped, and the opening direction of the insulating guide plate 40 is toward the emission port. The purpose of this part of the design is to insulate the electrode plate 39 to prevent the electrode plate 39 from ejecting ions from other parts of the ion concentration tube 31, ensuring that only ions on one side of the octagon are ejected each time.

[0082] The driving structure includes a fourth motor 36 fixedly mounted on the top of the ion guide chamber 27, an incomplete gear 37 fixedly mounted on the driving end of the fourth motor 36, a support pillar fixedly mounted at the top center point of the ion concentrating tube 31, the support pillar passes through and extends out of the ion concentrating tube 31, and a toothed disc 38 matching the incomplete gear 37 is fixedly mounted on the support pillar.

[0083] The driving end of the fourth motor 36 rotates to drive the incomplete gear 37 to rotate, thereby driving the toothed disc 38 to rotate. The toothed disc 38 drives the ion concentrating tube 31 to rotate through the support to change the angle of the ion concentrating tube 31. When the ion concentrating tube 31 rotates, the electrode plate 39 is powered off and ions will not be ejected.

[0084] The incomplete gear 37 is designed with one-eighth circle, which ensures that for every rotation of the driving end of the fourth motor 36, the ion concentrating tube 31 only rotates one-eighth of a circle, so that the ions on the ion concentrating tube 31 are facing the emission port. The support and the ion guide chamber 27 are connected by a damping rotation, which can prevent the ion concentrating tube 31 from continuing to rotate due to inertia after the incomplete gear 37 is separated from the toothed disk 38, thereby ensuring that the ion concentrating tube 31 is facing the emission port.

[0085] A guide piece 29 is fixedly installed on both sides of the ion emission port, and a swing mechanism that cooperates with the two guide pieces 29 is installed on the ion guide chamber 27; the swing mechanism includes a third motor 32 fixedly installed on the top of the ion guide chamber 27, and a swing frame 33 is fixedly installed on the driving end of the third motor 32. A connecting rod 34 is rotatably installed on the two guide pieces 29, and two limit grooves 35 that cooperate with the corresponding connecting rods 34 are provided on the swing frame 33.

[0086] Since the position of the substrate 6 changes, it is necessary to change the angle of ion emission so that the ions are gradually ejected onto the substrate 6 in one direction. Directing the ions can avoid the ions from dispersing in the inner chamber 10, thereby improving the utilization rate of the ions and avoiding the ions from adhering to other substrates 6, thereby improving the uniformity of the coating on the substrate 6.

[0087] The driving end of the third motor 32 rotates to drive the swing frame 33 fixedly connected thereto to rotate, and drives the guide piece 29 to rotate through the connecting rod 34. Since the rotation center of the guide piece 29 is the connection position with the ion guide chamber 27, and the rotation center of the swing frame 33 is the axis of the third motor 32, if the connecting rod 34 is fixedly connected to the swing frame 33, the rotation of the swing frame 33 will drive the guide piece 29 to rotate around the connection point. However, since the position of the connecting rod 34 changes, the guide piece 29 will be deformed. At this time, a limit groove 35 is provided on the swing frame 33 for the movement of the connecting rod 34, which can avoid deformation of the guide piece 29 and only cause the guide piece 29 to deflect.

[0088] The rotating guide plate 29 can change the direction of ion emission, which is used to coat different positions of the substrate 6. While changing the direction, the distance between the guide plate 29 and the substrate 6 increases. At this time, the distance between the two guide plates 29 decreases, the ion emission speed is faster, and the ions are more concentrated, thereby improving the uniformity of the coating.

[0089] The specific operation steps of this device are as follows:

[0090] First, open the bin cover 2, place the substrate 6 on the fixing assembly 7 inside the inner bin 10, fix the substrate 6 by the fixing assembly 7, and then close the bin cover 2;

[0091] Then, the vacuum pump 3 is started to extract the air in the inner chamber 10 through the air pipe, so that the pressure in the inner chamber 10 reaches the specified pressure, and then the vacuum operation is stopped. Then, the target material 30 is heated by the ion guide assembly 8, and the target material 30 is driven to rotate while heating so that the target material 30 is heated evenly. While heating, argon gas is injected into the inner chamber 10 through the gas injection disk 11;

[0092] The injected argon atoms impact the target material 30 to cause ions of the target material 30 to fall off, and the ions are scattered in the ion guide component 8. The ion guide component 8 concentrates the emission of ions and sprays the ions at high speed onto the substrate 6, thereby performing local coating on the substrate 6. After a certain period of time, the position of the substrate 6 is changed by operating the fixing component 7, and it is ensured that the coating surface of the substrate 6 is perpendicular to the moving direction of the sprayed ions, thereby performing coating operations on another part of the substrate 6.

[0093] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A metal surface vacuum coating device, comprising an outer chamber (1) and a chamber cover (2) rotatably mounted on the outer chamber (1) via a rotating shaft (5), characterized in that: Also includes a target material (30) and a substrate (6); An inner bin (10) is fixedly installed inside the outer bin (1), the inner bin (10) is divided into two halves, one half is located inside the outer bin (1), and the other half is located inside the bin cover (2), a gas injection disk (11) is fixedly installed at the bottom of the inner bin (10), a plurality of gas injection holes are provided on the gas injection disk (11), a vacuum pump (3) is fixedly installed outside the outer bin (1), and the vacuum pump (3) is connected to the inner bin (10) via an air pipe; A fixing component (7) is installed in the inner chamber (10), and the substrate (6) is installed on the fixing component (7) for locking the substrate (6) and driving the substrate (6) to rotate for angle adjustment, thereby ensuring that each vertical surface of the substrate (6) can be coated; An ion guide assembly (8) is installed in the inner chamber (10), the target material (30) is located inside the ion guide assembly (8), and the ion guide assembly (8) is used to carry out direction-guided ions sputtered from the target material (30), and can also drive the target material (30) to rotate, thereby ensuring uniform ion sputtering of the target material (30); The ion guide assembly (8) comprises a heating chamber (26) fixedly mounted on the inner wall of the inner chamber (10); the target material (30) is rotatably mounted on the heating chamber (26); half of the target material (30) is located inside the heating chamber (26) and the other half is located outside the heating chamber (26); a second motor (28) is fixedly mounted on the top of the heating chamber (26); a driving end of the second motor (28) is fixedly connected to the target material (30); An ion guide chamber (27) is fixedly mounted outside the heating chamber (26), the ion guide chamber (27) is elliptical, the target material (30) is located at one of the centers of the ellipse, an ion collection mechanism is mounted inside the ion guide chamber (27), the ion collection mechanism is located at the other center of the ellipse, and an ion emission port is provided at one end of the ion guide chamber (27) away from the heating chamber (26); A guide piece (29) is fixedly mounted on both sides of the ion emission port, and a swing mechanism matched with the two guide pieces (29) is mounted on the ion guide chamber (27); The swing mechanism comprises a third motor (32) fixedly mounted on the top of the ion guide chamber (27); a swing frame (33) is fixedly mounted on the driving end of the third motor (32); a linkage rod (34) is rotatably mounted on each of the two guide plates (29); and the swing frame (33) is provided with two limit slots (35) that match the corresponding linkage rods (34); The ion collecting mechanism comprises an ion concentrating tube (31) rotatably mounted inside the ion guide chamber (27); the ion concentrating tube (31) is octagonal in shape; an electrode plate (39) is fixedly mounted inside the ion concentrating tube (31); and a driving structure matched with the ion concentrating tube (31) is mounted on the ion guide chamber (27); The driving structure comprises a fourth motor (36) fixedly mounted on the top of the ion guide chamber (27), an incomplete gear (37) fixedly mounted on the driving end of the fourth motor (36), a support pillar fixedly mounted at the top center point of the ion concentration tube (31), the support pillar passing through and extending out of the ion concentration tube (31), and a toothed disc (38) matching the incomplete gear (37) fixedly mounted on the support pillar.

2. The metal surface vacuum coating equipment according to claim 1, characterized in that: The fixing assembly (7) comprises a connecting rod (16) rotatably mounted on the bottom of the inner bin (10) via a second one-way bearing (21), a bottom disc (12) and a top disc (13) being fixedly mounted on the connecting rod (16), and a plurality of clamping mechanisms cooperating with the substrate (6) being mounted on both the bottom disc (12) and the top disc (13).

3. The metal surface vacuum coating equipment according to claim 2, characterized in that: The clamping mechanism comprises a fixing frame (22) fixedly mounted on the top disc (13) and the bottom disc (12); an eccentric shaft (24) is rotatably mounted on each of the two fixing frames (22); a telescopic rod (23) is fixedly mounted on the bottom of each of the two eccentric shafts (24); a locking plate (17) that cooperates with each other is fixedly mounted on each of the two telescopic rods (23); and an adjusting structure that cooperates with the connecting rod (16) and the two eccentric shafts (24) is mounted on the top of the inner bin (10).

4. The metal surface vacuum coating equipment according to claim 3, characterized in that: The adjustment structure comprises a first motor (15) fixedly mounted on the top of the inner bin (10); a cam rod (19) and a first one-way bearing (18) are fixedly mounted on the driving end of the first motor (15); the first one-way bearing (18) is fixedly connected to the connecting rod (16); a rotating disk (14) is rotatably mounted on the connecting rod (16); an eccentric hole matching the connecting rod (16) is formed on the rotating disk (14); a circular hole matching the cam rod (19) is formed at the center point of the rotating disk (14); the cam rod (19) passes through the circular hole; and the cam rod (19) is rotatably connected to the circular hole; An annular limiting slide rail (20) is fixedly mounted on the bottom of the rotating disk (14), and a limiting roller (25) matching the limiting slide rail (20) is rotatably mounted on each eccentric rotating shaft (24) located on the top circular disk (13).

5. The metal surface vacuum coating equipment according to claim 1, characterized in that: An insulating guide plate (40) is fixedly mounted on the outside of the electrode plate (39), the insulating guide plate (40) is in a U shape, and the opening direction of the insulating guide plate (40) faces the emission port.

6. A method for vacuum coating on the surface of a metal part, used in a vacuum coating device for the surface of a metal part as claimed in any one of claims 1 to 5, characterized in that: The following steps are involved: S1, firstly, opening the bin cover (2), placing the substrate (6) on the fixing component (7) inside the inner bin (10), fixing the substrate (6) by the fixing component (7), and then closing the bin cover (2); S2, then starting the vacuum pump (3) to extract the air in the inner chamber (10) through the air pipe so that the pressure in the inner chamber (10) reaches a specified pressure, then stopping the vacuum operation, and then heating the target material (30) through the ion guide assembly (8), while driving the target material (30) to rotate so that the target material (30) is heated evenly, and while heating, injecting argon gas into the inner chamber (10) through the gas injection plate (11); S3. The injected argon atoms impact the target material (30) to cause ions of the target material (30) to fall off. The ions are scattered in the ion guide component (8). The ion guide component (8) emits the ions in a concentrated manner and sprays the ions at high speed onto the substrate (6), thereby performing local coating on the substrate (6). After a certain period of time, the position of the substrate (6) is changed by operating the fixing component (7), and it is ensured that the coating surface of the substrate (6) is perpendicular to the moving direction of the sprayed ions, thereby performing a coating operation on another part of the substrate (6).

Images