Light-emitting substrate, manufacturing method thereof and display device

Abstract

Provided is a light-emitting substrate. The light-emitting substrate includes a driving circuit layer, a first light-emitting layer, a second light-emitting layer, and a third light-emitting layer. The driving circuit layer comprises a plurality of pixel circuits. The first light-emitting layer is located on one side of the driving circuit layer. The first light-emitting layer comprises a plurality of first light-emitting devices, and the plurality of first light-emitting devices are respectively coupled with the plurality of pixel circuits. The second light-emitting layer is located on one side of the first light-emitting layer away from the driving circuit layer. The second light-emitting layer comprises a plurality of second light-emitting devices, and the plurality of second light-emitting devices are respectively coupled with the plurality of pixel circuits. The third light-emitting layer is located on one side of the second light-emitting layer away from the driving circuit layer. The third light-emitting layer comprises a plurality of third light-emitting devices, and the plurality of third light-emitting devices are respectively coupled with the plurality of pixel circuits. The orthographic projection of the first light-emitting device on the driving circuit layer, the orthographic projection of the second light-emitting device on the driving circuit layer and the orthographic projection of the third light-emitting device on the driving circuit layer are not completely overlapped.

Description

Light-emitting substrate, manufacturing method thereof, and display device Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a light-emitting substrate and a manufacturing method thereof, and a display device. Background Art

[0002] A light emitting diode (LED) is a type of semiconductor diode. It is a photoelectric element that emits light by relying on the unidirectional conductivity of a semiconductor PN junction. LED is a lighting element that is widely used in the global market. It has the advantages of small size, high brightness, low power consumption, low heat generation, long service life, and environmental protection. It also comes in a variety of colors and is deeply loved by consumers.

[0003] With the development of LED technology, micro light-emitting diodes (Micro LED) and mini light-emitting diodes (Mini LED) have also gradually developed.

[0004] Summary of the Invention

[0005] In one aspect, a light-emitting substrate is provided. The light-emitting substrate includes a driving circuit layer, a first light-emitting layer, a second light-emitting layer, and a third light-emitting layer. The driving circuit layer includes multiple pixel circuits. The first light-emitting layer is located on one side of the driving circuit layer. The first light-emitting layer includes multiple first light-emitting devices, each of which is coupled to the multiple pixel circuits. The second light-emitting layer is located on a side of the first light-emitting layer away from the driving circuit layer. The second light-emitting layer includes multiple second light-emitting devices, each of which is coupled to the multiple pixel circuits. The third light-emitting layer is located on a side of the second light-emitting layer away from the driving circuit layer. The third light-emitting layer includes multiple third light-emitting devices, each of which is coupled to the multiple pixel circuits. The emission colors of the first light-emitting device, the second light-emitting device, and the third light-emitting device are different. The orthographic projections of the first light-emitting device, the second light-emitting device, and the third light-emitting device on the driving circuit layer do not completely overlap.

[0006] In some embodiments, the first light emitting layer includes a first auxiliary electrode, and the anode or cathode of the first light emitting device is coupled to the first auxiliary electrode.

[0007] In some embodiments, the second light emitting layer includes a second auxiliary electrode, and the anode or cathode of the second light emitting device is coupled to the second auxiliary electrode.

[0008] In some embodiments, the third light-emitting layer includes a third auxiliary electrode, and the anode or cathode of the third light-emitting device is coupled to the third auxiliary electrode.

[0009] In some embodiments, the light emitting substrate includes the first auxiliary electrode, the second auxiliary electrode, and the third auxiliary electrode, wherein the area of ​​the third auxiliary electrode is larger than that of the second auxiliary electrode, and the area of ​​the second auxiliary electrode is larger than that of the first auxiliary electrode.

[0010] In some embodiments, the light-emitting substrate includes the first auxiliary electrode, the second auxiliary electrode, and the third auxiliary electrode. The orthographic projection of the second auxiliary electrode on the driving circuit layer at least partially overlaps with the orthographic projection of the first auxiliary electrode on the driving circuit layer. And / or the orthographic projection of the third auxiliary electrode on the driving circuit layer at least partially overlaps with the orthographic projection of the second auxiliary electrode on the driving circuit layer.

[0011] In some embodiments, the first light-emitting layer includes 3N first conductive pillars, the second light-emitting layer includes 2N second conductive pillars, and the third light-emitting layer includes N third conductive pillars. The first, second, and third conductive pillars all extend in a direction perpendicular to the drive circuit layer. A portion of the N first conductive pillars constitutes N first conductive structures. Each first conductive structure is respectively connected to the drive circuit layer and the first light-emitting device. Another portion of the N first conductive pillars and a portion of the N second conductive pillars are connected in a one-to-one correspondence and collectively constitute N second conductive structures. Each second conductive structure is respectively connected to the drive circuit layer and the second light-emitting device. The remaining N first conductive pillars, another portion of the N second conductive pillars, and the N third conductive pillars are connected in a one-to-one correspondence and collectively constitute N third conductive structures. Each third conductive structure is respectively connected to the drive circuit layer and the third light-emitting device.

[0012] In some embodiments, the first light-emitting layer includes a first reflective film that covers a side surface of the first light-emitting device perpendicular to the driving circuit layer and a surface of the first light-emitting device close to the driving circuit layer.

[0013] In some embodiments, the second light-emitting layer includes a second reflective film that covers a side surface of the second light-emitting device perpendicular to the driving circuit layer and a surface of the second light-emitting device close to the driving circuit layer.

[0014] In some embodiments, the third light-emitting layer includes a third reflective film that covers a side surface of the third light-emitting device perpendicular to the driving circuit layer and a surface of the third light-emitting device close to the driving circuit layer.

[0015] In some embodiments, the light-emitting substrate includes a first reflective film, a second reflective film, and a third reflective film. The wavelength of the light emitted by the first light-emitting device is shorter than the wavelength of the light emitted by the second light-emitting device, and the wavelength of the light emitted by the second light-emitting device is shorter than the wavelength of the light emitted by the third light-emitting device. The thickness of the first reflective film is thinner than the thickness of the second reflective film, and the thickness of the second reflective film is thinner than the thickness of the third reflective film.

[0016] In some embodiments, the anode of the first light-emitting device is located on a side of the cathode of the first light-emitting device closer to the driving circuit layer. And / or, the anode of the second light-emitting device is located on a side of the cathode of the second light-emitting device closer to the driving circuit layer. The cathode of the third light-emitting device is located on a side of the anode of the third light-emitting device closer to the driving circuit layer.

[0017] In some embodiments, the orthographic projection of the first light-emitting device on the driving circuit layer overlaps with the orthographic projection of the second light-emitting device on the driving circuit layer.

[0018] In some embodiments, the orthographic projection of the second light-emitting device on the driving circuit layer overlaps with the orthographic projection of the third light-emitting device on the driving circuit layer.

[0019] In some embodiments, the orthographic projection of the third light-emitting device on the driving circuit layer overlaps with the orthographic projection of the first light-emitting device on the driving circuit layer.

[0020] In another aspect, a display device is provided. The display device includes a light-emitting substrate and a circuit board. The circuit board is coupled to a driving circuit layer of the light-emitting substrate. The light-emitting substrate is any of the light-emitting substrates described in the above embodiments.

[0021] In yet another aspect, a method for manufacturing a light-emitting substrate is provided. The method includes: forming a first light-emitting master layer on a first substrate, the first light-emitting master layer including a plurality of first light-emitting devices; forming a second light-emitting master layer on a second substrate, the second light-emitting master layer including a plurality of second light-emitting devices; and forming a third light-emitting master layer on a third substrate, the third light-emitting master layer including a plurality of third light-emitting devices.

[0022] A drive circuit mother layer is bonded to a side of the first light-emitting mother layer away from the first substrate. The drive circuit mother layer includes a plurality of pixel circuits, each of which is coupled to the plurality of first light-emitting devices. The first substrate is removed, and a second light-emitting mother layer is bonded to a side of the first light-emitting mother layer away from the drive circuit mother layer. The second light-emitting mother layer includes a plurality of second light-emitting devices, each of which is coupled to the plurality of pixel circuits. The second substrate is removed, and a third light-emitting mother layer is bonded to a side of the second light-emitting mother layer away from the first light-emitting mother layer. The third light-emitting mother layer includes a plurality of third light-emitting devices, each of which is coupled to the plurality of pixel circuits.

[0023] After removing the third substrate, the first light-emitting mother layer, the second light-emitting mother layer, the third light-emitting mother layer and the driving circuit mother layer are cut to obtain a light-emitting substrate.

[0024] In some embodiments, forming a first light-emitting mother layer on a first substrate includes: providing a first substrate. On the first substrate, a first semiconductor mother layer, a multi-quantum well mother layer, and a second semiconductor mother layer are sequentially formed in a direction away from the first substrate. The first semiconductor mother layer includes multiple independent first semiconductors, the multi-quantum well mother layer includes multiple independent multi-quantum well bodies, the second semiconductor mother layer includes multiple independent second semiconductors, and a second semiconductor thin film connecting the multiple second semiconductors. A first conductive mother layer is formed on a side of the second semiconductor mother layer away from the first substrate; the first conductive mother layer includes multiple independent first conductors. The connected first conductors, the first semiconductor, the multi-quantum well body, the second semiconductor, and the second semiconductor thin film constitute a first light-emitting device.

[0025] In some embodiments, after forming the first conductive mother layer, the method further includes forming a first reflective material layer covering the first conductive mother layer and the first substrate. The first reflective material layer is patterned to obtain a first reflective mother layer. The first reflective mother layer includes a plurality of mutually independent first reflective films, which cover a surface of the first conductor away from the first substrate, a side surface of the first conductor perpendicular to the first substrate, a side surface of the first semiconductor perpendicular to the first substrate, a side surface of the multi-quantum well body perpendicular to the first substrate, and a side surface of the second semiconductor perpendicular to the first substrate.

[0026] In some embodiments, after forming the second semiconductor mother layer, the method further includes forming a first auxiliary electrode material layer covering the second semiconductor thin film, patterning the first auxiliary electrode material layer to obtain a first auxiliary electrode pattern, wherein the orthographic projection of the first auxiliary electrode pattern on the first substrate is located within the orthographic projection of the second semiconductor thin film on the first substrate.

[0027] In some embodiments, after forming the plurality of spaced-apart first light-emitting devices, the method further includes: forming a first filling material layer covering the plurality of first light-emitting devices. A surface of the first filling material layer facing away from the first substrate is flat. A plurality of first channels are formed through the first filling material layer. A first conductive pillar is formed covering at least the inner wall of each first channel. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] To more clearly illustrate the technical solutions of the present disclosure, the following briefly introduces the drawings required for use in some embodiments of the present disclosure. Obviously, the drawings described below are only drawings of some embodiments of the present disclosure, and those skilled in the art can also derive other drawings based on these drawings. Furthermore, the drawings described below are schematic diagrams and are not intended to limit the actual dimensions of the products, actual processes of the methods, actual timing of signals, and the like involved in the embodiments of the present disclosure.

[0029] FIG1 is a structural diagram of a display device according to some embodiments of the present disclosure;

[0030] FIG2 is an internal connection diagram of a display device according to some embodiments of the present disclosure;

[0031] FIG3 is a structural diagram of a light-emitting substrate in some embodiments;

[0032] FIG4 is a top view of a light-emitting substrate according to some embodiments of the present disclosure;

[0033] FIG5 is a cross-sectional view taken along line AA' in FIG4;

[0034] FIG6 is an equivalent diagram of a pixel circuit in a light-emitting substrate provided in some embodiments of the present disclosure;

[0035] FIG7 is an enlarged view of the first light emitting device in FIG5 ;

[0036] FIG8 is an enlarged view of the second light emitting device in FIG5 ;

[0037] FIG9 is an enlarged view of the third light emitting device in FIG5 ;

[0038] FIG10 is another cross-sectional view taken along line AA' in FIG4;

[0039] FIG11 is a flow chart of a method for manufacturing a light-emitting substrate according to some embodiments of the present disclosure;

[0040] 12 to 15 are structural diagrams of the first light-emitting mother layer at different manufacturing stages in a method for manufacturing a light-emitting substrate according to some embodiments of the present disclosure;

[0041] 16 to 18 are structural diagrams of the second light-emitting mother layer at different manufacturing stages in the method for manufacturing a light-emitting substrate according to some embodiments of the present disclosure;

[0042] 19 to 24 are structural diagrams of the third light-emitting mother layer at different manufacturing stages in the method for manufacturing a light-emitting substrate according to some embodiments of the present disclosure;

[0043] FIG25 is a structural diagram of a light-emitting substrate after the driving circuit layer and the first light-emitting mother layer are bonded in a method for manufacturing the light-emitting substrate according to some embodiments of the present disclosure;

[0044] FIG26 is a structural diagram of FIG25 without the first substrate;

[0045] FIG27 is a structural diagram of a light-emitting substrate after the first light-emitting mother layer and the second light-emitting mother layer are bonded in a method for manufacturing the light-emitting mother substrate according to some embodiments of the present disclosure;

[0046] FIG28 is a structural diagram of FIG27 without the second substrate;

[0047] FIG29 is a structural diagram of a light-emitting substrate after the second light-emitting mother layer and the third light-emitting mother layer are bonded in a method for manufacturing the light-emitting mother layer according to some embodiments of the present disclosure;

[0048] FIG30 is a structural diagram of FIG29 without the third substrate;

[0049] FIG31 is a structural diagram of conductive bumps formed in a method for manufacturing a light-emitting substrate according to some embodiments of the present disclosure. DETAILED DESCRIPTION

[0050] The following will be combined with the accompanying drawings to clearly and completely describe the technical solutions in some embodiments of the present disclosure. Obviously, the embodiments described are only some embodiments of the present disclosure, not all embodiments. Based on the embodiments provided by the present disclosure, all other embodiments obtained by ordinary technicians in this field are within the scope of protection of the present disclosure.

[0051] Unless the context requires otherwise, throughout the specification and claims, the term "comprise" and its other forms, such as the third person singular form "comprises" and the present participle form "comprising", are to be interpreted as open and inclusive, that is, "including, but not limited to". In the description of the specification, the terms "one embodiment", "some embodiments", "exemplary embodiments", "example", "specific example" or "some examples" are intended to indicate that the particular features, structures, materials or characteristics associated with the embodiment or example are included in at least one embodiment or example of the present disclosure. The schematic representation of the above terms does not necessarily refer to the same embodiment or example. In addition, the particular features, structures, materials or characteristics may be included in any one or more embodiments or examples in any appropriate manner.

[0052] In the following, the terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of the technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the embodiments of the present disclosure, unless otherwise specified, "plurality" means two or more.

[0053] When describing some embodiments, the expressions "coupled" and "connected" and their derivatives may be used. The term "connected" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium. The term "coupled" indicates, for example, that two or more components are in direct physical or electrical contact. The term "coupled" or "communicatively coupled" may also refer to two or more components that are not in direct contact with each other, but still cooperate or interact with each other. The embodiments disclosed herein are not necessarily limited to the contents of this document.

[0054] “At least one of A, B and C” has the same meaning as “at least one of A, B or C” and both include the following combinations of A, B and C: A only, B only, C only, the combination of A and B, the combination of A and C, the combination of B and C, and the combination of A, B and C.

[0055] “A and / or B” includes the following three combinations: A only, B only, and a combination of A and B.

[0056] As used herein, the term "if" is optionally interpreted to mean "when" or "upon" or "in response to determining" or "in response to detecting," depending on the context. Similarly, the phrases "if it is determined that" or "if [stated condition or event] is detected" are optionally interpreted to mean "upon determining" or "in response to determining" or "upon detecting [stated condition or event]" or "in response to detecting [stated condition or event]," depending on the context.

[0057] The use of "adapted to" or "configured to" herein is intended to be open and inclusive language that does not exclude devices adapted or configured to perform additional tasks or steps.

[0058] Additionally, the use of “based on” is meant to be open and inclusive, as a process, step, calculation, or other action “based on” one or more stated conditions or values ​​may, in practice, be based on additional conditions or values ​​beyond those stated.

[0059] As used herein, "about," "substantially," or "approximately" includes the stated value and an average value that is within an acceptable range of deviation from the particular value as determined by one of ordinary skill in the art taking into account the measurements in question and the errors associated with the measurement of the particular quantity (i.e., the limitations of the measurement system).

[0060] As used herein, "parallel", "perpendicular", and "equal" include the situations described and situations similar to the situations described, and the range of the similar situations is within an acceptable deviation range, wherein the acceptable deviation range is as determined by a person of ordinary skill in the art taking into account the measurement in question and the errors associated with the measurement of the specific quantity (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallelism and approximate parallelism, wherein the acceptable deviation range of approximate parallelism can be, for example, a deviation within 5°; "perpendicular" includes absolute perpendicularity and approximate perpendicularity, wherein the acceptable deviation range of approximate perpendicularity can also be, for example, a deviation within 5°. "Equal" includes absolute equality and approximate equality, wherein the acceptable deviation range of approximate equality can be, for example, that the difference between the two equals is less than or equal to 5% of either one.

[0061] It will be understood that when a layer or element is referred to as being on another layer or substrate, it can be directly on the other layer or substrate, or intervening layers may be present therebetween.

[0062] Exemplary embodiments are described herein with reference to cross-sectional and / or plan views that are idealized exemplary drawings. In the drawings, the thickness of layers and the area of ​​regions are exaggerated for clarity. Therefore, variations in shape relative to the drawings due to, for example, manufacturing techniques and / or tolerances are contemplated. Therefore, the exemplary embodiments should not be construed as limited to the shapes of the regions shown herein, but rather include deviations in shape due to, for example, manufacturing. For example, an etched region shown as a rectangle will typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to illustrate the actual shape of regions of the device and are not intended to limit the scope of the exemplary embodiments.

[0063] FIG1 is a structural diagram of a display device provided in some embodiments of the present disclosure; FIG2 is an internal connection diagram of a display device provided in some embodiments of the present disclosure.

[0064] As shown in FIG1 , an embodiment of the present disclosure provides a display device 1. Display device 1 is a product capable of displaying images (including static images or dynamic images, where dynamic images may be videos). For example, display device 1 may be any of a display, a television, a billboard, a digital photo frame, a laser printer with a display function, a telephone, a mobile phone, a personal digital assistant (PDA), a digital camera, a camcorder, a viewfinder, a navigation system, a vehicle, a large-area wall, a home appliance, an information query device (such as a business query device for e-government, banks, hospitals, power departments, etc.), a monitor, and the like.

[0065] The display device 1 may include a light-emitting substrate 10 and a circuit board 20. The circuit board 20 may be located on the backlight side of the light-emitting substrate 10. The light-emitting substrate 10 is electrically connected to the circuit board 20 and is configured to display based on signals provided by the circuit board 20. The light-emitting substrate 10 may include a light-emitting layer 11 and a driving circuit layer 12 coupled to the light-emitting layer 11.

[0066] As shown in FIG. 2 , the circuit board 20 may include a timing control circuit 21 (also referred to as a timing controller, Timer Control Register, abbreviated as TCON) and a driver module (LED Driver Block) 22 .

[0067] The timing control circuit 21 can be configured to receive display signals, which include, for example, power signals, video image signals, communication signals (for example, signals corresponding to the IIC communication protocol), and mode control signals (for example, mode control signals corresponding to the test mode, or mode control signals corresponding to the normal display mode). Among them, the video image signal is, for example, a mobile industry processor interface (MIPI) signal or a low-voltage differential signal (LVDS) signal. The video image signal may include: image data and a timing control signal. The image data includes, for example, light-emitting data of multiple light-emitting units. The timing control signal includes, for example, a data enable signal (Data Enable, which can be abbreviated as DE), a line synchronization signal (Hsync, which can be abbreviated as HS), and a vertical synchronization signal (Vsync, which can be abbreviated as VS).

[0068] In some embodiments, the timing control circuit 21 may be further configured to provide a first control signal and image data to the driving module 22 in response to the display signal, wherein the first control signal is configured to control the working timing of the driving module 22 .

[0069] The driving module 22 is configured to convert the received image data into light-emitting data signals of multiple light-emitting devices E (to be described below) in the light-emitting layer 11, and output the light-emitting data signals to the light-emitting substrate 10 in sequence according to the working timing determined by the first control signal.

[0070] The driving circuit layer 12 may include a scanning control module 121 and a plurality of pixel circuits.

[0071] In some embodiments, the timing control circuit 21 may be further configured to provide a second control signal to the scan control module 121 of the driving circuit layer 12 in response to the display signal, wherein the second control signal is configured to control the working timing of the scan control module 121 .

[0072] The scanning control module 121 is configured to output scanning signals to multiple pixel circuits in time-sharing order according to the working sequence determined by the second control signal, so that the multiple pixel circuits write the above-mentioned light-emitting data signals in time-sharing order, thereby making the multiple light-emitting devices E corresponding to each pixel circuit emit light in turn.

[0073] It should be noted that the first control signal and the second control signal may be different control signals. In the case where a control signal includes both the operating timing of the first control signal and the operating timing of the second control signal, the first control signal and the second control signal may also be the same control signal, which is not limited here.

[0074] The light emitting device E in the light emitting layer 11 may be one of a mini light emitting diode (Mini Light Emitting Diodes, MiniLED), a micro light emitting diode (MicroLED), and a quantum dot light emitting diode (Quantum Dot Light Emitting Diodes, QLED).

[0075] FIG3 is a structural diagram of a light-emitting substrate in some embodiments.

[0076] The inventors of the present disclosure discovered that, as shown in Figure 3, in some solutions, light-emitting devices E of different colors are formed on separate silicon-based substrates and then transferred to the same layer of a light-emitting substrate using mass transfer technology. Because positional errors can occur when transferring light-emitting devices to the light-emitting substrate, the spacing between light-emitting devices E of different colors is designed to be larger to avoid overlap and lighting failure after transfer in actual products. As a result, the spacing between light-emitting devices E of different colors in the light-emitting substrate after mass transfer is larger, resulting in lower resolution for the display device.

[0077] Based on this, the embodiments of the present disclosure provide a light-emitting substrate to overcome the problem of large spacing between light-emitting devices E of different colors in the light-emitting substrate, thereby improving the resolution of the display device.

[0078] Figure 4 is a top view of the light-emitting substrate provided in some embodiments of the present disclosure; Figure 5 is a cross-sectional view formed along the A-A' line in Figure 4; Figure 6 is an equivalent diagram of the pixel circuit in the light-emitting substrate provided in some embodiments of the present disclosure; Figure 7 is an enlarged view of the first light-emitting device in Figure 5; Figure 8 is an enlarged view of the second light-emitting device in Figure 5; Figure 9 is an enlarged view of the third light-emitting device in Figure 5; Figure 10 is another cross-sectional view formed along the A-A' line in Figure 4.

[0079] The light emitting substrate 10 includes a light emitting layer 11 and a driving circuit layer 12. The light emitting layer 11 is located on one side of the driving circuit layer 12 and covers the surface of the driving circuit layer 12 on one side.

[0080] In some examples, an insulating layer 13 may be further included between the light emitting layer 11 and the driving circuit layer 12 , which is not limited here.

[0081] The light-emitting layer 11 may include multiple light-emitting devices E, and the driving circuit layer 12 may include multiple pixel circuits. The multiple pixel circuits may be arranged in an array on the plane where the driving circuit layer 12 resides. The multiple pixel circuits may be electrically connected to the multiple light-emitting devices E in a one-to-one correspondence to provide a corresponding light-emitting signal to each light-emitting device E. In this way, the brightness of each light-emitting device can be controlled.

[0082] The driver circuit layer 12 may further include a scan control module 121. The scan control module 121 may include a scan driver circuit (Gate Driver on Array, GOA). The scan driver circuit may be configured to sequentially output scan signals to the plurality of pixel circuits according to the operating timing determined by the second control signal, thereby controlling the plurality of pixel circuits to write light-emitting data signals in a time-sharing manner. Each pixel circuit S may transmit the written light-emitting data signal to the corresponding light-emitting device E, thereby causing the light-emitting device to emit light.

[0083] The pixel circuit may include at least two transistors (denoted by T) and at least one capacitor (denoted by C). For example, the pixel circuit S may have a structure such as "2T1C", "6T1C", "7T1C", "6T2C" or "7T2C".

[0084] Exemplarily, the pixel circuit is a 7T1C circuit. As shown in FIG6 , the pixel circuit S includes a first transistor T1 , a second transistor T2 , a third transistor T3 , a fourth transistor T4 , a fifth transistor T5 , a sixth transistor T6 , a seventh transistor T7 and a capacitor Cst.

[0085] The driving circuit layer 12 may further include a plurality of signal lines. For example, the plurality of signal lines may include a reset signal line L-Reset, an initial signal line L-Vinit, a scan signal line L-Gate, a data signal line L-Data, a first power signal line L-VDD, a second power line L-VSS, and a light emission control signal line L-EM.

[0086] A control electrode of the first transistor T1 is coupled to the reset signal line L-Reset, a first electrode of the first transistor T1 is coupled to the initial signal line L-Vinit, and a second electrode of the first transistor T1 is coupled to the first node N1.

[0087] A control electrode of the second transistor T2 is coupled to the scan signal line L-Gate, a first electrode of the second transistor T2 is coupled to the third node N3, and a second electrode of the second transistor T2 is coupled to the first node N1.

[0088] A control electrode of the third transistor T3 is coupled to the first node N1 , a first electrode of the third transistor T3 is coupled to the second node N2 , and a second electrode of the third transistor T3 is coupled to the third node N3 .

[0089] A control electrode of the fourth transistor T4 is coupled to the scan signal line L-Gate, a first electrode of the fourth transistor T4 is coupled to the data signal line L-Data, and a second electrode of the fourth transistor T4 is coupled to the second node N2.

[0090] A control electrode of the fifth transistor T5 is coupled to the light emitting control signal line L-EM, a first electrode of the fifth transistor T5 is coupled to the first power line L-VDD, and a second electrode of the fifth transistor T5 is coupled to the second node N2.

[0091] A control electrode of the sixth transistor T6 is coupled to the light emitting control signal line L-EM, a first electrode of the sixth transistor T6 is coupled to the third node N3, and a second electrode of the sixth transistor T6 is coupled to the fourth node N4.

[0092] A control electrode of the seventh transistor T7 is coupled to the reset signal line L-Reset, a first electrode of the seventh transistor T7 is coupled to the initial signal line L-Vinit, and a second electrode of the seventh transistor T7 is coupled to the fourth node N4.

[0093] A first plate of the capacitor Cst is coupled to the first power line L-VDD, and a second plate of the capacitor Cst is coupled to the first node N1.

[0094] 5 , the light-emitting layer 11 may be a stacked structure. It is understandable that the light-emitting layer 11 is a light-emitting stacked layer.

[0095] As shown in FIG5 , the light-emitting stack may include a first light-emitting layer L1, a second light-emitting layer L2, and a third light-emitting layer L3 stacked in sequence perpendicular to the driving circuit layer 12. The first light-emitting layer L1 may be the light-emitting layer closest to the driving circuit layer 12 in the light-emitting stack, and the second light-emitting layer L2 is located between the first light-emitting layer L1 and the third light-emitting layer L3.

[0096] The first light-emitting layer L1 may include a plurality of first light-emitting devices E1, the second light-emitting layer L2 may include a plurality of second light-emitting devices E2, and the third light-emitting layer L3 may include a plurality of third light-emitting devices E3. The first light-emitting devices E1, the second light-emitting devices E2, and the third light-emitting devices E3 emit different colors.

[0097] For example, the first light-emitting layer L1 may include multiple blue light-emitting devices, the second light-emitting layer L2 may include multiple green light-emitting devices, and the third light-emitting layer L3 may include multiple red light-emitting devices. Of course, the order of the colors of the first light-emitting layer L1, the second light-emitting layer L2, and the third light-emitting layer L3 may also be changed. For example, the first light-emitting layer L1 may include multiple green light-emitting devices, the second light-emitting layer L2 may include multiple red light-emitting devices, and the third light-emitting layer L3 may include multiple blue light-emitting devices. This disclosure is not limited to this.

[0098] It is understandable that a single blue light-emitting device can be used as a blue sub-pixel, a single green light-emitting device can be used as a green sub-pixel, and a single red light-emitting device can be used as a red sub-pixel. Adjacent blue sub-pixels, green sub-pixels, and red sub-pixels can be used as a pixel unit.

[0099] As shown in Figures 5 and 7, the first light-emitting layer L1 may include a first semiconductor pattern L1a, a multi-quantum well pattern L1b, and a second semiconductor pattern L1c stacked sequentially from the driving circuit layer 12. The area of ​​the first semiconductor pattern L1a may be substantially equal to the area of ​​the multi-quantum well pattern L1b, and the area of ​​the second semiconductor pattern L1c may be larger than that of the first semiconductor pattern L1a.

[0100] The first semiconductor pattern L1a may include a plurality of mutually independent first semiconductors E1a. Similarly, the multi-quantum well pattern L1b may include a plurality of mutually independent multi-quantum well bodies E1b. The number of first semiconductors E1a may be equal to the number of multi-quantum well bodies E1b, and the plurality of first semiconductors E1a may be in contact with the plurality of multi-quantum well bodies E1b in a one-to-one correspondence.

[0101] Illustratively, in the contacting first semiconductor E1a and multi-quantum well body E1b, the orthographic projection of the first semiconductor E1a on the driving circuit layer 12 substantially overlaps with the orthographic projection of the multi-quantum well body E1b on the driving circuit layer 12. It is understandable that, in the contacting first semiconductor E1a and multi-quantum well body E1b, the area of ​​the first semiconductor E1a on the plane where the driving circuit layer 12 is located is substantially equal to the area of ​​the multi-quantum well body E1b on the plane where the driving circuit layer 12 is located.

[0102] The second semiconductor pattern L1c may include a plurality of independent second semiconductors E1c and a second semiconductor film CE1 connecting the plurality of second semiconductors E1c. The number of second semiconductors E1c may be equal to the number of multi-quantum well bodies E1b, and the plurality of second semiconductors E1c may contact the plurality of multi-quantum well bodies E1b in a one-to-one correspondence.

[0103] Illustratively, in the contacting second semiconductor E1c and multi-quantum well body E1b, the orthographic projection of the second semiconductor E1c on the driving circuit layer 12 substantially overlaps with the orthographic projection of the multi-quantum well body E1b on the driving circuit layer 12. It is understandable that, in the contacting second semiconductor E1c and multi-quantum well body E1b, the area of ​​the second semiconductor E1c on the plane where the driving circuit layer 12 is located is substantially equal to the area of ​​the multi-quantum well body E1b on the plane where the driving circuit layer 12 is located.

[0104] In this way, the two sides of a multi-quantum well body E1b are respectively in contact with a first semiconductor E1a and a second semiconductor E1c, and together they form a light-emitting structure of a first light-emitting device E1. Based on this, the second semiconductors E1c of multiple first light-emitting devices E1 in the first light-emitting layer L1 are all connected to a second semiconductor film CE1.

[0105] For example, taking the first light emitting device E1 as a blue light emitting device, the first semiconductor pattern L1a may include a P-type gallium nitride (GaN) semiconductor material, and the second semiconductor pattern L1c may include an N-type gallium nitride (GaN) semiconductor material.

[0106] 5 and 7 , the first light emitting layer L1 may further include a first conductive pattern L1 d. The first conductive pattern L1 d may be located between the first semiconductor pattern L1 a and the driving circuit layer 12.

[0107] The first conductive pattern L1d may include a plurality of mutually independent first conductive bodies AE1. The number of the first conductive bodies AE1 may be equal to the number of the first semiconductors E1a, and the plurality of first semiconductors E1a may be in contact with the plurality of first conductive bodies AE1 in a one-to-one correspondence.

[0108] For example, in the contacting first semiconductor E1a and first conductive body AE1, the orthographic projection of the first semiconductor E1a on the driving circuit layer 12 substantially overlaps with the orthographic projection of the first conductive body AE1 on the driving circuit layer 12. It is understood that in the contacting first semiconductor E1a and first conductive body AE1, the area of ​​the first semiconductor E1a is substantially equal to the area of ​​the first conductive body AE1.

[0109] Exemplarily, the first conductive pattern L1d may include a transparent conductive material, such as indium tin oxide (ITO), or other suitable transparent conductive material, which is not limited herein.

[0110] The first conductive body AE1 is in contact with the first semiconductor E1a and can serve as the anode of the first light-emitting device E1, providing an anode signal to the first semiconductor E1a. Simultaneously, the second semiconductor thin film CE1 is in contact with the second semiconductor E1c and can serve as the cathode of the first light-emitting device E1, providing a cathode signal to the second semiconductor E1a. Thus, the first conductive body AE1, the first semiconductor E1a, the multi-quantum well body E1b, the second semiconductor E1c, and the second semiconductor thin film CE1 together constitute the first light-emitting device E1, which can emit light based on the anode and cathode signals provided by the pixel circuit.

[0111] It has been described above that the second semiconductors E1c of the plurality of first light-emitting devices E1 in the first light-emitting layer L1 are all connected to one second semiconductor film CE1. It can be understood that the second semiconductors E1c of the plurality of first light-emitting devices E1 in the first light-emitting layer L1 may have a common cathode structure.

[0112] It should be noted that in some other embodiments, the first light emitting device E1 may be inverted so that the second semiconductor film CE1 is close to the driving circuit layer 12 and the first conductive layer AE1 is far away from the driving circuit layer 12, which is not limited here.

[0113] As shown in Figures 5 and 7, the first light emitting layer L1 may further include a first reflective layer L1e. The first reflective layer L1e may include a plurality of mutually independent first reflective films F1. The number of the first reflective films F1 may be equal to the number of the first semiconductors E1a.

[0114] The first reflective film F1 has the function of reflecting light. Exemplarily, the first reflective film F1 is a distributed Bragg reflector (DBR).

[0115] The first reflective film F1 may have a laminated structure. Exemplarily, the first reflective film F1 includes silicon dioxide (SiO2) sub-films and titanium oxide (TiO2) sub-films, with the SiO2 and TiO2 sub-films alternately stacked. The alternating period T may satisfy the requirement of 8 ≤ T ≤ 10. For example, the alternating period T may be 8, 9, 10, 11, or 12.

[0116] The thickness of a single SiO2 sub-film in the first reflective film F1 can be approximately equal to one-quarter the wavelength of light emitted by the first light-emitting device E1. For example, if the first light-emitting device E1 emits blue light with a wavelength of 440 nm, the thickness of a single SiO2 sub-film in the first reflective film F1 can be 110 nm.

[0117] Similarly, the thickness of a single titanium oxide TiO sub-film in the first reflective film F1 may be substantially equal to the thickness of a single silicon dioxide SiO 2 sub-film, which will not be further described here.

[0118] On this basis, taking the alternating period T of the first reflective film F1 equal to 10 as an example, the thickness of the first reflective film F1 can be 2200 nm.

[0119] It should be noted that the thickness of a single silicon dioxide (SiO2) sub-film in the first reflective film F1 may refer to the dimension of the silicon dioxide (SiO2) sub-film perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened. Similarly, the thickness of a single titanium oxide (TiO2) sub-film in the first reflective film F1 may refer to the dimension of the titanium oxide (TiO2) sub-film perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened. Similarly, the thickness of the first reflective film F1 may refer to the dimension of the first reflective film F1 perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened.

[0120] The first reflective film F1 can cover the surface of the first conductor AE1 close to the driving circuit layer 12. The first reflective film F1 can also cover the side surface of the first conductor AE1 perpendicular to the driving circuit layer 12, the side surface of the first semiconductor E1a perpendicular to the driving circuit layer 12, the side surface of the multi-quantum well body E1b perpendicular to the driving circuit layer 12, and the side surface of the second semiconductor E1c perpendicular to the driving circuit layer 12.

[0121] It can be understood that a first reflective film F1 and a second semiconductor film CE1 together form a receiving space, and the receiving space contains a first conductor AE1, a first semiconductor E1a, a multi-quantum well body E1b and a second semiconductor E1c.

[0122] In this way, the light emitted from the first light-emitting device E1 toward the driving circuit layer 12 and the light parallel to the driving circuit layer 12 will be reflected until all the light is emitted from the direction close to the second semiconductor film CE1, thereby improving the luminous efficiency of each first light-emitting device E1, thereby improving the luminous efficiency of the light-emitting substrate 10.

[0123] 5 , the first light emitting layer L1 may further include a first filling material L1f covering the first light emitting device E1 and the second semiconductor film CE1. The first filling material L1f may be an insulating material, for example, including at least one of silicon monoxide SiO and a high temperature resistant silane resin.

[0124] The surface of the first filling material L1f on the side close to the driving circuit layer 12 serves as the surface of the first light-emitting layer L1 close to the driving circuit layer 12, providing a flat surface for connection with the driving circuit layer 12. This facilitates the connection between the first light-emitting layer L1 and the driving circuit layer 12 and improves the connection performance between the first light-emitting layer L1 and the driving circuit layer 12.

[0125] 5 , the first light-emitting layer L1 may further include a plurality of mutually independent first conductive pillars L1g. The first conductive pillars L1g may be made of conductive materials, such as copper (Cu), aluminum (Lv), nickel (Ni), or other non-metallic materials with good conductivity.

[0126] Exemplarily, the number of the first conductive pillars L1g may be substantially equal to 6 times the number of the first light emitting devices E1.

[0127] The plurality of first conductive pillars L1g all extend in a direction perpendicular to the driving circuit layer 12. The extension lengths of the plurality of first conductive pillars L1g are not all equal. For example, one-third of the first conductive pillars L1g have a shorter extension length, while the remaining two-thirds of the first conductive pillars L1g have a longer extension length.

[0128] The first conductive pillar L1g having a shorter extension length may constitute a first conductive structure D1 , wherein the extension length of the first conductive structure D1 is smaller than the dimension of the first light emitting layer L1 in a direction perpendicular to the driving circuit layer 12 .

[0129] For example, a first light-emitting device E1 can be connected to the scan drive circuit layer 12 via two first conductive structures D1. For example, one first conductive structure D1 connects the anode of the first light-emitting device E1 (i.e., the first conductor AE1) to the scan drive circuit layer 12; the other first conductive structure D1 connects the cathode of the first light-emitting device E1 (i.e., the second semiconductor film CE1) to the scan drive circuit layer 12.

[0130] The first reflective film F1 may have a through hole formed therein, and the through hole is located between the first electrical conductor AE1 and the driving circuit layer 12. The first conductive structure D1 connected to the anode passes through the through hole and is connected to the anode of the first light emitting device E1.

[0131] Furthermore, the second semiconductor film CE1 has a first opening that avoids the larger two-thirds of the first conductive pillar L1g's extension length. The first opening penetrates the second semiconductor film CE1. Thus, through the first opening, the second semiconductor film CE1 can prevent interference between signals on the second semiconductor film CE1 and signals on the first conductive pillar L1g, thereby improving the reliability of the light-emitting substrate 10.

[0132] As shown in Figure 5, the anode of the first light-emitting device E1 is closer to the scanning drive circuit than the cathode of the first light-emitting device E1. Therefore, the first conductive structure D1 connected to the anode extends in a direction perpendicular to the drive circuit layer 12, which is smaller than the first conductive structure D1 connected to the cathode extends in a direction perpendicular to the drive circuit layer 12.

[0133] 5 , the first light emitting layer L1 may further include a first auxiliary electrode pattern L1h. The first auxiliary electrode pattern L1h may have a stacked structure. For example, the first auxiliary electrode pattern L1h may include a metal stacked structure of Ti / Al / Ti or a metal stacked structure of Ni / Au.

[0134] The first auxiliary electrode pattern L1h has good electrical conductivity and can be directly connected to the second semiconductor film CE1 to serve as an auxiliary electrode of the cathode of the first light emitting device E1, thereby improving the electrical conductivity of the cathode of the first light emitting device E1.

[0135] For example, the first auxiliary electrode pattern L1h may be located on a side of the second semiconductor film CE1 close to the driving circuit layer 12. The orthographic projection of the first auxiliary electrode pattern L1h on the driving circuit layer 12 is within the orthographic projection of the second semiconductor film CE1 on the driving circuit layer 12.

[0136] The cathode-connected first conductive structure D1 may be directly connected to the second semiconductor film CE1 instead of the first auxiliary electrode pattern L1h. Alternatively, the cathode-connected first conductive structure D1 may be directly connected to the first auxiliary electrode pattern L1h instead of the second semiconductor film CE1.

[0137] In some examples, the first auxiliary electrode pattern L1h may be a grid pattern. The grid-shaped first auxiliary electrode pattern L1h can reduce the voltage drop of the signal on the first auxiliary electrode pattern L1h, thereby improving the conductivity of the cathode of the first light-emitting device E1.

[0138] It should be noted that the above description uses the example of connecting the first auxiliary electrode pattern L1h to the second semiconductor thin film CE1 to reduce the cathode signal voltage drop at the cathode of the first light-emitting device E1. In other embodiments, the first auxiliary electrode pattern L1h may be connected to the first electrical conductor AE1 to reduce the anode signal voltage drop at the anode of the first light-emitting device E1. This is not a limitation in the presently disclosed embodiments.

[0139] As shown in Figure 5, the first light-emitting layer L1 may further include a first insulating layer L1i. The first insulating layer L1i may be located on the side of the second semiconductor thin film CE1 away from the driving circuit layer 12. The surface of the first insulating layer L1i near the driving circuit layer 12 provides a flat surface for the second semiconductor thin film CE1. The surface of the first insulating layer L1i away from the driving circuit layer 12 serves as the surface of the first light-emitting layer L1 near the second light-emitting layer L2, providing a flat surface for connection with the second light-emitting layer L2.

[0140] As shown in Figures 5 and 8, the second light-emitting layer L2 may include a first semiconductor pattern L2a, a multi-quantum well pattern L2b, and a second semiconductor pattern L2c stacked in order from away from the driving circuit layer 12. The area of ​​the first semiconductor pattern L2a and the area of ​​the multi-quantum well pattern L2b may be substantially equal, and the area of ​​the second semiconductor pattern L2c may be larger than that of the first semiconductor pattern L2a.

[0141] In addition, the area of ​​the first semiconductor pattern L2a in the second light-emitting layer L2 can be greater than, equal to, or smaller than the area of ​​the first semiconductor pattern L1a in the first light-emitting layer L1. Specifically, the relationship between the area of ​​the first semiconductor pattern L2a in the second light-emitting layer L2 and the area of ​​the first semiconductor pattern L1a in the first light-emitting layer L1 can depend on the color and luminous efficiency of the first light-emitting device E1 and the second light-emitting device E2, which is not limited in this disclosure.

[0142] The first semiconductor pattern L2a may include a plurality of mutually independent first semiconductors E2a. Similarly, the multi-quantum well pattern L2b may include a plurality of mutually independent multi-quantum well bodies E2b. The number of first semiconductors E2a may be equal to the number of multi-quantum well bodies E2b, and the plurality of first semiconductors E2a may be in contact with the plurality of multi-quantum well bodies E2b in a one-to-one correspondence.

[0143] Exemplarily, in the contacting first semiconductor E2a and multi-quantum well body E2b, the orthographic projection of the first semiconductor E2a on the driving circuit layer 12 substantially overlaps with the orthographic projection of the multi-quantum well body E2b on the driving circuit layer 12. It is understandable that, in the contacting first semiconductor E2a and multi-quantum well body E2b, the area of ​​the first semiconductor E2a on the plane where the driving circuit layer 12 is located is substantially equal to the area of ​​the multi-quantum well body E2b on the plane where the driving circuit layer 12 is located.

[0144] The second semiconductor pattern L2c may include a plurality of independent second semiconductors E2c and a second semiconductor film CE2 connecting the plurality of second semiconductors E2c. The number of second semiconductors E2c may be equal to the number of multi-quantum well bodies E2b, and the plurality of second semiconductors E2c may be in contact with the plurality of multi-quantum well bodies E2b in a one-to-one correspondence.

[0145] Illustratively, in the contacting second semiconductor E2c and multi-quantum well body E2b, the orthographic projection of the second semiconductor E2c on the driving circuit layer 12 substantially overlaps with the orthographic projection of the multi-quantum well body E2b on the driving circuit layer 12. It is understandable that, in the contacting second semiconductor E2c and multi-quantum well body E2b, the area of ​​the second semiconductor E2c on the plane where the driving circuit layer 12 is located is substantially equal to the area of ​​the multi-quantum well body E2b on the plane where the driving circuit layer 12 is located.

[0146] In this way, the two sides of a multi-quantum well body E2b are respectively in contact with a first semiconductor E2a and a second semiconductor E2c, and together they form a light-emitting structure of a second light-emitting device E2. Based on this, the second semiconductors E2c of the multiple second light-emitting devices E2 in the second light-emitting layer L2 are all connected to a second semiconductor film CE2.

[0147] For example, taking the second light emitting device E2 as a green light emitting device, the first semiconductor pattern L2a may include a P-type gallium nitride (GaN) semiconductor material, and the second semiconductor pattern L2c may include an N-type gallium nitride (GaN) semiconductor material.

[0148] 5 and 8 , the second light emitting layer L2 may further include a second conductive pattern L2 d. The second conductive pattern L2 d may be located between the second semiconductor pattern L2 a and the driving circuit layer 12.

[0149] The second conductive pattern L2d may include a plurality of mutually independent second conductive bodies AE2. The number of the second conductive bodies AE2 may be equal to the number of the first semiconductors E2a, and the plurality of first semiconductors E2a may be in contact with the plurality of second conductive bodies AE2 in a one-to-one correspondence.

[0150] Illustratively, in the contacting first semiconductor E2a and second conductive body AE2, the orthographic projection of the first semiconductor E2a on the driving circuit layer 12 substantially overlaps with the orthographic projection of the second conductive body AE2 on the driving circuit layer 12. It is understandable that in the contacting first semiconductor E2a and second conductive body AE2, the area of ​​the first semiconductor E2a is substantially equal to the area of ​​the first conductive body AE2.

[0151] Exemplarily, the second conductive pattern L2d may include a transparent conductive material, such as indium tin oxide (ITO), or other suitable transparent conductive materials, which are not limited herein.

[0152] The second conductive body AE2 is in contact with the first semiconductor E2a and can serve as the anode of the second light-emitting device E2, providing an anode signal to the first semiconductor E2a. Simultaneously, the second semiconductor thin film CE2 is in contact with the second semiconductor E2c and can serve as the cathode of the second light-emitting device E2, providing a cathode signal to the second semiconductor E2c. Thus, the second conductive body AE2, the first semiconductor E2a, the multi-quantum well body E2b, the second semiconductor E2c, and the second semiconductor thin film CE2 together constitute the second light-emitting device E2, which can emit light based on the anode and cathode signals provided by the pixel circuit.

[0153] It has been described above that the second semiconductors E2c of the multiple second light-emitting devices E2 in the second light-emitting layer L2 are all connected to one second semiconductor film CE2. It can be understood that the second semiconductors E2c of the multiple second light-emitting devices E2 in the second light-emitting layer L2 can have a common cathode structure.

[0154] It should be noted that in some other embodiments, the second light emitting device E2 may be inverted so that the second semiconductor film CE2 is close to the driving circuit layer 12 and the second conductive layer AE2 is far away from the driving circuit layer 12, which is not limited here.

[0155] As shown in Figures 5 and 8, the second light-emitting layer L2 may further include a second reflective layer L2e. The second reflective layer L2e may include a plurality of mutually independent second reflective films F2. The number of the second reflective films F2 may be equal to the number of the first semiconductors E2a.

[0156] The second reflective film F2 has the function of reflecting light. For example, the second reflective film F2 is a DBR.

[0157] The second reflective film F2 can have a laminated structure. Exemplarily, the second reflective film F2 includes silicon dioxide (SiO2) sub-films and titanium oxide (TiO2) sub-films, with the SiO2 and TiO2 sub-films alternately stacked. The alternating period T can satisfy the requirement of 8 ≤ T ≤ 10. For example, the alternating period T can be 8, 9, 10, 11, or 12.

[0158] The thickness of a single SiO2 sub-film in the second reflective film F2 can be approximately equal to one-quarter the wavelength of light emitted by the second light-emitting device E2. For example, if the second light-emitting device E2 emits green light with a wavelength of 540 nm, the thickness of a single SiO2 sub-film in the second reflective film F2 can be 135 nm.

[0159] Similarly, the thickness of a single titanium oxide TiO sub-film in the second reflective film F2 may be substantially equal to the thickness of a single silicon dioxide SiO 2 sub-film, which will not be further described here.

[0160] On this basis, taking the alternating period T of the second reflective film F2 equal to 10 as an example, the thickness of the third reflective film F3 can be 2700 nm.

[0161] It should be noted that the thickness of a single silicon dioxide (SiO2) sub-film in the second reflective film F2 may refer to the dimension of the silicon dioxide (SiO2) sub-film perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened. Similarly, the thickness of a single titanium oxide (TiO2) sub-film in the second reflective film F2 may refer to the dimension of the titanium oxide (TiO2) sub-film perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened. Similarly, the thickness of the second reflective film F2 may refer to the dimension of the second reflective film F2 perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened.

[0162] It can be understood that when the wavelength of the light emitted by the second light emitting device E2 is greater than the wavelength of the light emitted by the first light emitting device E1 , the thickness of the second reflective film F2 is greater than the thickness of the first reflective film F1 .

[0163] The second reflective film F2 can cover the surface of the second conductor AE2 close to the driving circuit layer 12. The second reflective film F2 can also cover the side surface of the second conductor AE2 perpendicular to the driving circuit layer 12, the side surface of the first semiconductor E2a perpendicular to the driving circuit layer 12, the side surface of the multi-quantum well body E2b perpendicular to the driving circuit layer 12, and the side surface of the second semiconductor E2c perpendicular to the driving circuit layer 12.

[0164] It can be understood that a second reflective film F2 and a second semiconductor film CE2 together form a receiving space, and the receiving space contains a second conductor AE2, a first semiconductor E2a, a multi-quantum well body E2b and a second semiconductor E2c.

[0165] In this way, the light emitted by the second light-emitting device E2 toward the driving circuit layer 12 and the light parallel to the driving circuit layer 12 will be reflected until all the light is emitted from the direction close to the second semiconductor film CE2, thereby improving the luminous efficiency of each second light-emitting device E2, thereby improving the luminous efficiency of the light-emitting substrate 10.

[0166] 5 , the second light-emitting layer L2 may further include a second filling material L2f covering the second light-emitting device E2 and the second semiconductor film CE2. The second filling material L2f may be an insulating material, and illustratively, may include at least one of silicon monoxide SiO and a high-temperature resistant silane resin.

[0167] The second filling material L2f has a surface on one side close to the driving circuit layer 12, serving as the surface of the second light-emitting layer L2 close to the first light-emitting layer L1, providing a flat surface for connection with the first light-emitting layer L1. This facilitates connection between the first light-emitting layer L1 and the second light-emitting layer L2, improving the connection performance between the first light-emitting layer L1 and the second light-emitting layer L2.

[0168] As shown in FIG5 , the second light-emitting layer L2 may further include a plurality of mutually independent second conductive pillars L2g. The second conductive pillars L2g may be made of a conductive material, which may include a suitable metal material such as copper (Cu), aluminum (Lv), nickel (Ni), or other non-metallic materials with good conductivity.

[0169] For example, the number of the second conductive pillars L2g may be approximately equal to 4 times the number of the second light emitting devices E2. It can be understood that the number of the second conductive pillars L2g is approximately equal to two-thirds of the number of the first conductive pillars L1g.

[0170] The plurality of second conductive pillars L2g all extend in a direction perpendicular to the driving circuit layer 12. The extension lengths of the plurality of second conductive pillars L2g are not all equal. For example, half of the second conductive pillars L2g have a shorter extension length, while the remaining half have a longer extension length. The second conductive pillars L2g with the shorter extension length are smaller than the dimension of the second light-emitting layer L2 in a direction perpendicular to the driving circuit layer 12.

[0171] The plurality of second conductive pillars L2g can be connected one-to-one with the two-thirds of the first conductive pillars L1g having a larger extension length. The second conductive pillars L2g having a smaller extension length and the first conductive pillars L1g connected thereto can together constitute a second conductive structure D2.

[0172] For example, a second light-emitting device E2 can be connected to the scan drive circuit layer 12 via two second conductive structures D2. For example, one second conductive structure D2 connects the anode of the second light-emitting device E2 (i.e., the second conductor AE2) to the scan drive circuit layer 12; and the other second conductive structure D2 connects the cathode of the second light-emitting device E2 (i.e., the second semiconductor film CE2) to the scan drive circuit layer 12.

[0173] The second reflective film F2 is provided with a through hole, and the second conductive structure D2 connected to the anode passes through the through hole and is connected to the anode of the second light emitting device E2.

[0174] Furthermore, the second semiconductor film CE2 has a second opening that avoids the second conductive pillar L2g, which has a larger extension length. The second opening penetrates the second semiconductor film CE2. Thus, the second semiconductor film CE2 can prevent interference between signals on the second semiconductor film CE2 and signals on the second conductive pillar L2g through the second opening, thereby improving the reliability of the light-emitting substrate 10.

[0175] As shown in Figure 5, the anode of the second light-emitting device E2 is closer to the scanning drive circuit than the cathode of the second light-emitting device E2. Therefore, the second conductive structure D2 connected to the anode extends in a direction perpendicular to the drive circuit layer 12, which is smaller than the second conductive structure D2 connected to the cathode extends in a direction perpendicular to the drive circuit layer 12.

[0176] In some examples, the second conductive structure D2 can be connected to the first conductive structure D1. For example, as shown in FIG5 , an auxiliary conductive pillar L1j is formed in the first light-emitting layer L1 to connect the second conductive structure D2 and the first conductive structure D1. For example, the orthographic projection of the auxiliary conductive pillar L1j on the driving circuit 12 is within the orthographic projection of the second semiconductor thin film CE1 on the driving circuit 12.

[0177] In this way, when the second conductive structure D2 transmits the cathode signal of the second light emitting device E2 and the first conductive structure D1 transmits the cathode signal of the first light emitting device E1, the second light emitting device E2 and the first light emitting device E1 share the cathode signal.

[0178] On the basis that the second light-emitting device E2 and the first light-emitting device E1 share the cathode signal, the driving circuit layer 12 can simultaneously transmit the cathode signals of the second light-emitting device E2 and the first light-emitting device E1 through a second power signal line L-VSS, thereby reducing the number of signal lines inside the driving circuit layer 12, optimizing the wiring space inside the driving circuit layer 12 and reducing the cost of the light-emitting substrate 10.

[0179] 5 , the second light emitting layer L2 may further include a second auxiliary electrode pattern L2h. The second auxiliary electrode pattern L2h may be a stacked structure, for example, a Ti / Al / Ti metal stacked structure or a Ni / Au metal stacked structure.

[0180] The second auxiliary electrode pattern L2h has good electrical conductivity and can be directly connected to the second semiconductor film CE2 to serve as an auxiliary electrode for the cathode of the second light emitting device E2, thereby improving the electrical conductivity of the cathode of the second light emitting device E2.

[0181] For example, the second auxiliary electrode pattern L2h may be located on a side of the second semiconductor film CE2 close to the driving circuit layer 12. The orthographic projection of the second auxiliary electrode pattern L2h on the driving circuit layer 12 is within the orthographic projection range of the second semiconductor film CE2 on the driving circuit layer 12.

[0182] In some examples, the orthographic projection of the first auxiliary electrode pattern L1h in the first light-emitting layer L1 on the driving circuit layer 12 may overlap with the orthographic projection of the second auxiliary electrode pattern L2h in the second light-emitting layer L2 on the driving circuit layer 12. The orthographic projection of the first auxiliary electrode pattern L1h on the driving circuit layer 12 may partially overlap with the orthographic projection of the second auxiliary electrode pattern L2h on the driving circuit layer 12. Alternatively, the orthographic projection of the first auxiliary electrode pattern L1h on the driving circuit layer 12 is within the range of the orthographic projection of the second auxiliary electrode pattern L2h on the driving circuit layer 12.

[0183] The cathode-connected second conductive structure D2 may be directly connected to the second semiconductor film CE2 instead of the second auxiliary electrode pattern L2h. Alternatively, the cathode-connected second conductive structure D2 may be directly connected to the second auxiliary electrode pattern L2h instead of the second semiconductor film CE2.

[0184] In some examples, the second auxiliary electrode pattern L2h may be a grid pattern. The grid-shaped second auxiliary electrode pattern L2h can reduce the voltage drop of the signal on the second auxiliary electrode pattern L2h, thereby improving the conductivity of the cathode of the second light-emitting device E2.

[0185] It should be noted that the above description uses the example of connecting the second auxiliary electrode pattern L2h to the second semiconductor thin film CE2 to reduce the cathode signal voltage drop at the cathode of the second light-emitting device E2. In other embodiments, the second auxiliary electrode pattern L2h may be connected to the second electrical conductor AE2 to reduce the anode signal voltage drop at the anode of the second light-emitting device E2. This is not a limitation in the presently disclosed embodiments.

[0186] As shown in Figure 5, the second light-emitting layer L2 may further include a second insulating layer L2i. The second insulating layer L2i may be located on the side of the second semiconductor thin film CE2 away from the driving circuit layer 12. The surface of the second insulating layer L2i near the driving circuit layer 12 provides a flat surface for the second semiconductor thin film CE2. The surface of the second insulating layer L2i away from the driving circuit layer 12 serves as the surface of the second light-emitting layer L2 near the third light-emitting layer L3, providing a flat surface for connection with the third light-emitting layer L3.

[0187] As shown in Figures 5 and 9, the third light-emitting layer L3 may include a second semiconductor pattern L3c, a multi-quantum well pattern L3b, and a first semiconductor pattern L3a stacked in sequence from away from the driving circuit layer 12. The area of ​​the first semiconductor pattern L3a may be substantially equal to the area of ​​the multi-quantum well pattern L3b, and the area of ​​the first semiconductor pattern L3a may be larger than the area of ​​the second semiconductor pattern L3c.

[0188] In addition, the area of ​​the first semiconductor pattern L3a in the third light-emitting layer L3 can be greater than, equal to, or smaller than the area of ​​the first semiconductor pattern L1a in the first light-emitting layer L1. Specifically, the relationship between the area of ​​the first semiconductor pattern L3a in the third light-emitting layer L3 and the area of ​​the first semiconductor pattern L1a in the first light-emitting layer L1 can depend on the color and luminous efficiency of the first light-emitting device E1 and the third light-emitting device E3, which is not limited in this disclosure.

[0189] The second semiconductor pattern L3c may include a plurality of mutually independent second semiconductors E3c. Similarly, the multi-quantum well pattern L3b may include a plurality of mutually independent multi-quantum well bodies E3b. The number of second semiconductors E3c may be equal to the number of multi-quantum well bodies E3b, and the plurality of second semiconductors E3c may be in contact with the plurality of multi-quantum well bodies E3b in a one-to-one correspondence.

[0190] Exemplarily, in the contacting second semiconductor E3c and multi-quantum well body E2b, the orthographic projection of the second semiconductor E3c on the driving circuit layer 12 substantially coincides with the orthographic projection of the multi-quantum well body E3b on the driving circuit layer 12. It is understandable that, in the contacting second semiconductor E3c and multi-quantum well body E2b, the area of ​​the second semiconductor E3c on the plane where the driving circuit layer 12 is located is substantially equal to the area of ​​the multi-quantum well body E3b on the plane where the driving circuit layer 12 is located.

[0191] The first semiconductor pattern L3a may include a plurality of independent first semiconductors E3a and a first semiconductor thin film AE3 connecting the plurality of first semiconductors E3a. The number of first semiconductors E3a may be equal to the number of multi-quantum well bodies E3b, and the plurality of first semiconductors E3c may be in contact with the plurality of multi-quantum well bodies E2b in a one-to-one correspondence.

[0192] Illustratively, in the contacting second semiconductor E3c and multi-quantum well body E3b, the orthographic projection of the second semiconductor E3c on the driving circuit layer 12 substantially coincides with the orthographic projection of the multi-quantum well body E3b on the driving circuit layer 12. It is understandable that, in the contacting second semiconductor E3c and multi-quantum well body E3b, the area of ​​the second semiconductor E3c on the plane where the driving circuit layer 12 is located is substantially equal to the area of ​​the multi-quantum well body E3b on the plane where the driving circuit layer 12 is located.

[0193] In this way, the two sides of a multi-quantum well body E3b are respectively in contact with a first semiconductor E3a and a second semiconductor E3c, and together they form a light-emitting structure of a third light-emitting device E3. Based on this, the first semiconductors E3a of the multiple third light-emitting devices E3 in the third light-emitting layer L3 are all connected to a first semiconductor thin film AE3. The first semiconductor thin film AE3 can be a structure that covers the entire drive circuit layer 12.

[0194] For example, taking the third light emitting device E3 as a red light emitting device, the first semiconductor pattern L3a may include a P-type gallium phosphide GaP semiconductor material, and the second semiconductor pattern L3c may include an N-type aluminum indium phosphide AlInP semiconductor material.

[0195] 5 and 9 , the third light emitting layer L3 may further include a third conductive pattern L3 d. The third conductive pattern L3 d may be located between the second semiconductor pattern L3 c and the driving circuit layer 12.

[0196] The third conductive pattern L3d may include a plurality of mutually independent third conductive bodies CE3. The number of the third conductive bodies CE3 may be equal to the number of the first semiconductors E3c, and the plurality of first semiconductors E3c may be in contact with the plurality of third conductive bodies CE3 in a one-to-one correspondence.

[0197] For example, in the contacting second semiconductor E3c and third electrical conductor CE3, the orthographic projection of the second semiconductor E3c on the driving circuit layer 12 substantially overlaps with the orthographic projection of the third electrical conductor CE3 on the driving circuit layer 12. It can be understood that in the contacting second semiconductor E3c and third electrical conductor CE3, the area of ​​the second semiconductor E3c is substantially equal to the area of ​​the third electrical conductor CE3.

[0198] Exemplarily, the third conductive pattern L3d may include a stacked structure, and the stacked structure may be a metal stacked structure of nickel Ni / gold Au, which is not limited here.

[0199] The third conductor CE3 is in contact with the second semiconductor E3c and can serve as the cathode of the third light-emitting device E3, providing a cathode signal to the second semiconductor E3c. Simultaneously, the first semiconductor thin film AE3 is in contact with the first semiconductor E3a and can serve as the anode of the third light-emitting device E3, providing an anode signal to the first semiconductor E3c. Thus, the third conductor CE3, the first semiconductor E3a, the multi-quantum well body E3b, the second semiconductor E3c, and the first semiconductor thin film AE3 collectively constitute the third light-emitting device E3, which can emit light based on the anode and cathode signals provided by the pixel circuit.

[0200] It has been described above that the first semiconductors E3a of the plurality of third light-emitting devices E3 in the third light-emitting layer L3 are all connected to a first semiconductor film AE3. It can be understood that the first semiconductors E3a of the plurality of third light-emitting devices E3 in the third light-emitting layer L3 can be a common anode structure.

[0201] It should be noted that in some other embodiments, the third light emitting device E3 may be inverted so that the first semiconductor film AE3 is close to the driving circuit layer 12 and the third conductive layer CE3 is far away from the driving circuit layer 12, which is not limited here.

[0202] As shown in Figures 5 and 9, the third light-emitting layer L3 may further include a third reflective layer L3e. The third reflective layer L3e may include a plurality of independent third reflective films F3. The number of the third reflective films F3 may be equal to the number of the second semiconductors E3c.

[0203] The third reflective film F3 has the function of reflecting light. Exemplarily, the third reflective film F3 is a DBR.

[0204] The third reflective film F3 may have a laminated structure. Exemplarily, the third reflective film F3 includes silicon dioxide (SiO2) sub-films and titanium oxide (TiO2) sub-films, with the SiO2 and TiO2 sub-films alternately stacked. The alternating period T may satisfy the requirement of 8 ≤ T ≤ 10. For example, the alternating period T may be 8, 9, 10, 11, or 12.

[0205] Exemplarily, the alternating period T of the first reflective film F1, the alternating period T of the second reflective film F2, and the alternating period T of the third reflective film F3 are all equal. For example, the alternating period T of the first reflective film F1, the alternating period T of the second reflective film F2, and the alternating period T of the third reflective film F3 are all equal to 10.

[0206] The thickness of a single SiO2 sub-film in the third reflective film F3 can be approximately equal to one-quarter the wavelength of light emitted by the third light-emitting device E3. For example, if the third light-emitting device E3 emits red light with a wavelength of 720 nm, the thickness of a single SiO2 sub-film in the third reflective film F3 can be 180 nm.

[0207] Similarly, the thickness of a single titanium oxide TiO sub-film in the third reflective film F3 may be substantially equal to the thickness of a single silicon dioxide SiO 2 sub-film, which will not be further described here.

[0208] On this basis, taking the alternating period T of the third reflective film F3 equal to 10 as an example, the thickness of the third reflective film F3 can be 3600 nm.

[0209] It should be noted that the thickness of a single silicon dioxide (SiO2) sub-film in the third reflective film F3 may refer to the dimension of the silicon dioxide (SiO2) sub-film perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened. Similarly, the thickness of a single titanium oxide (TiO2) sub-film in the third reflective film F3 may refer to the dimension of the titanium oxide (TiO2) sub-film perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened. Similarly, the thickness of the third reflective film F3 may refer to the dimension of the third reflective film F3 perpendicular to the driving circuit layer 12 after the driving circuit layer 12 is flattened.

[0210] It can be understood that when the wavelength of the light emitted by the third light emitting device E3 is greater than the wavelength of the light emitted by the second light emitting device E2, the thickness of the third reflective film F3 is greater than the thickness of the second reflective film F2.

[0211] The third reflective film F3 can cover the surface of the third conductor CE3 close to the driving circuit layer 12. The third reflective film F3 can also cover the side surface of the third conductor CE3 perpendicular to the driving circuit layer 12, the side surface of the second semiconductor E3c perpendicular to the driving circuit layer 12, the side surface of the multi-quantum well body E3b perpendicular to the driving circuit layer 12, and the side surface of the first semiconductor E3a perpendicular to the driving circuit layer 12.

[0212] It can be understood that a third reflective film F3 and the first semiconductor film AE3 together form a receiving space, and the receiving space accommodates a third conductor CE3, a first semiconductor E3a, a multi-quantum well body E3b and a second semiconductor E3c.

[0213] In this way, the light emitted by the third light-emitting device E3 toward the driving circuit layer 12 and the light parallel to the driving circuit layer 12 will be reflected until all the light is emitted from the direction close to the first semiconductor film AE3, thereby improving the luminous efficiency of each third light-emitting device E3, thereby improving the luminous efficiency of the light-emitting substrate 10.

[0214] As shown in FIG5 , the third light-emitting layer L3 may further include a third filling material L3f covering the third light-emitting device E3 and the first semiconductor film AE3. The third filling material L3f may be an insulating material. For example, the third filling material L3f may include at least one of silicon monoxide SiO and a high-temperature resistant silane resin.

[0215] The surface of the third filling material L3f on the side closest to the driving circuit layer 12 serves as the surface of the third light-emitting layer L3 on the side closest to the second light-emitting layer L2, providing a flat surface for connection with the second light-emitting layer L2. This facilitates connection between the second light-emitting layer L2 and the third light-emitting layer L3, and improves the connection performance between the second light-emitting layer L2 and the third light-emitting layer L3.

[0216] As shown in FIG5 , the third light-emitting layer L3 may further include a plurality of independent third conductive pillars L3g. The third conductive pillars L3g may be made of a conductive material, such as copper (Cu), aluminum (Lv), nickel (Ni), or other suitable metal materials, or other non-metallic materials with good conductivity.

[0217] For example, the number of the third conductive pillars L3g may be approximately equal to twice the number of the third light emitting devices E3. It can be understood that the number of the third conductive pillars L3g is approximately equal to half the number of the second conductive pillars L2g.

[0218] The third conductive pillars L3g extend in a direction perpendicular to the driving circuit layer 12 , and the extension length of the third conductive pillars L3g is smaller than the dimension of the third light emitting layer L3 in the direction perpendicular to the driving circuit layer 12 .

[0219] The plurality of third conductive pillars L3g can be connected one-to-one with one-half of the second conductive pillars L2g having a larger extension length, and the second conductive pillars L2g having a larger extension length can be connected one-to-one with one-third of the first conductive pillars L1g having a larger extension length. In this way, the interconnected second conductive pillars L2g having a larger extension length, the first conductive pillars L1g having a larger extension length, and the third conductive pillars L3g can collectively form a third conductive structure D3.

[0220] For example, a third light-emitting device E3 can be connected to the scan drive circuit layer 12 via two third conductive structures D3. For example, one third conductive structure D3 connects the anode of the third light-emitting device E3 (i.e., the first semiconductor thin film CE3) to the scan drive circuit layer 12; and the other third conductive structure D3 connects the cathode of the third light-emitting device E3 (i.e., the third conductor CE3) to the scan drive circuit layer 12.

[0221] The third reflective film F3 is provided with a through hole, and the third conductive structure D3 connected to the cathode passes through the through hole and is connected to the cathode of the third light-emitting device E3.

[0222] As shown in Figure 5, the cathode of the third light-emitting device E3 is closer to the scanning drive circuit than the anode of the third light-emitting device E3. Therefore, the extension dimension of the third conductive structure D3 connected to the cathode in the direction perpendicular to the drive circuit layer 12 is smaller than the extension dimension of the third conductive structure D3 connected to the anode in the direction perpendicular to the drive circuit layer 12.

[0223] As can be seen in FIG5 , the order of the stacked structures in the third light-emitting device E3 is opposite to the order of the stacked structures in the first light-emitting device E1 and the second light-emitting device E2. In other embodiments, the order of the stacked structures in the third light-emitting device E3 may also be the same as the order of the stacked structures in the first light-emitting device E1 and the second light-emitting device E2, and this disclosure is not limited thereto.

[0224] 5 , the third light emitting layer L3 may further include a third auxiliary electrode pattern L3h. The third auxiliary electrode pattern L3h may have a stacked structure. For example, the third auxiliary electrode pattern L3h may include a metal stacked structure of Ti / Al / Ti or a metal stacked structure of Ni / Au.

[0225] The third auxiliary electrode pattern L3h has good conductivity and can be directly connected to the first semiconductor film AE3 to serve as an auxiliary electrode of the anode of the third light emitting device E3, thereby improving the conductivity of the anode of the third light emitting device E3.

[0226] For example, the third auxiliary electrode pattern L3h may be located on a side of the first semiconductor film AE3 close to the driving circuit layer 12. The orthographic projection of the third auxiliary electrode pattern L3h on the driving circuit layer 12 is within the orthographic projection of the first semiconductor film AE3 on the driving circuit layer 12.

[0227] In some examples, the orthographic projection of the second auxiliary electrode pattern L2h in the second light-emitting layer L2 on the driving circuit layer 12 may overlap with the orthographic projection of the third auxiliary electrode pattern L3h in the third light-emitting layer L3 on the driving circuit layer 12. The orthographic projection of the second auxiliary electrode pattern L2h on the driving circuit layer 12 may partially overlap with the orthographic projection of the third auxiliary electrode pattern L3h on the driving circuit layer 12. Alternatively, the orthographic projection of the second auxiliary electrode pattern L2h on the driving circuit layer 12 is within the range of the orthographic projection of the third auxiliary electrode pattern L3h on the driving circuit layer 12.

[0228] The third conductive structure D3 connected to the anode may be directly connected to the first semiconductor film AE3 instead of the third auxiliary electrode pattern L3h. Alternatively, the third conductive structure D3 connected to the anode may be directly connected to the third auxiliary electrode pattern L3h instead of the first semiconductor film AE3.

[0229] In some examples, the third auxiliary electrode pattern L3h may be a grid pattern. The grid-shaped third auxiliary electrode pattern L3h can reduce the voltage drop of the signal on the third auxiliary electrode pattern L3h, thereby improving the conductivity of the anode of the third light-emitting device E3.

[0230] It should be noted that the above description uses the example of the third auxiliary electrode pattern L3h being connected to the first semiconductor thin film AE3 to reduce the anode signal voltage drop on the anode of the third light-emitting device E3. In other embodiments, the third auxiliary electrode pattern L3h may be connected to the third electrical conductor CE3 to reduce the cathode signal voltage drop on the cathode of the third light-emitting device E3. This is not a limitation in the presently disclosed embodiments.

[0231] As shown in FIG5 , the third light-emitting layer L3 may further include a third insulating layer L3i. The third insulating layer L3i may be located on a side of the first semiconductor thin film AE3 that is distal to the driving circuit layer 12. The surface of the third insulating layer L3i that is proximal to the driving circuit layer 12 provides a flat surface for the first semiconductor thin film AE3. The surface of the third insulating layer L3i that is distal to the driving circuit layer 12 serves as the surface of the third light-emitting layer L3 that is distal to the driving circuit layer 12, providing a flat surface for connection to other structures (e.g., an encapsulation layer).

[0232] As shown in FIG5 , a plurality of conductive bumps 14 may be further provided on a surface of the driving circuit layer 12 away from the light emitting stack 11 . The conductive bumps 14 may be electrically connected to the plurality of pixel circuits in the driving circuit layer 12 .

[0233] The conductive bumps 14 are used to electrically connect to the timing control circuit 21 and the driving module 22 on the circuit board, so that the driving circuit layer 12 receives the second control signal provided by the timing control circuit 21 and the light-emitting data signal provided by the driving module 22. This enables the scanning control module 121 to output a scanning signal based on the second control signal, control the multiple pixel circuits to enter the writing phase in a time-sharing manner, and enable the pixel circuits entering the writing phase to write the corresponding light-emitting data signal.

[0234] As shown in Figures 5 and 10, the orthographic projection of the first light-emitting device E1 on the driving circuit layer 12, the orthographic projection of the second light-emitting device E2 on the driving circuit layer 12, and the orthographic projection of the third light-emitting device E3 on the driving circuit layer 12 do not completely overlap with each other, which means that the three may not overlap with each other, or the three may partially overlap with each other.

[0235] As shown in FIG5 , the orthographic projection of the first light-emitting device E1 in the first light-emitting layer L1 on the driving circuit layer 12 , the orthographic projection of the second light-emitting device E2 in the second light-emitting layer L2 on the driving circuit layer 12 , and the orthographic projection of the third light-emitting device E3 in the third light-emitting layer L3 on the driving circuit layer 12 may not overlap with each other.

[0236] In this way, the light emitted by the first light emitting device E1 , the second light emitting device E2 and the third light emitting device E3 do not affect each other, which can improve the light emitting efficiency of the light emitting substrate 10 .

[0237] As shown in Figure 10, the orthographic projection of the first light-emitting device E1 in the first light-emitting layer L1 on the driving circuit layer 12, the orthographic projection of the second light-emitting device E2 in the second light-emitting layer L2 on the driving circuit layer 12, and the orthographic projection of the third light-emitting device E3 in the third light-emitting layer L3 on the driving circuit layer 12, at least two of the three may partially overlap with each other.

[0238] For example, the orthographic projection of the first light-emitting device E1 on the driving circuit layer 12 may partially overlap with the orthographic projection of the second light-emitting device E2 on the driving circuit layer 12; or, the orthographic projection of the third light-emitting device E3 on the driving circuit layer 12 may partially overlap with the orthographic projection of the second light-emitting device E2 on the driving circuit layer 12; or, the orthographic projection of the first light-emitting device E1 on the driving circuit layer 12 may partially overlap with the orthographic projection of the third light-emitting device E3 on the driving circuit layer 12; or, the orthographic projection of the second light-emitting device E2 on the driving circuit layer 12 partially overlaps with the orthographic projection of the first light-emitting device E1 on the driving circuit layer 12 and the orthographic projection of the third light-emitting device E3 on the driving circuit layer 12, respectively.

[0239] In this way, the arrangement density of the first light emitting device E1 , the second light emitting device E2 and the third light emitting device E3 on the light emitting substrate 10 can be increased, thereby improving the resolution of the display device.

[0240] FIG11 is a method for manufacturing a light-emitting substrate provided in some embodiments of the present disclosure.

[0241] The embodiment of the present disclosure further provides a method for manufacturing a light-emitting substrate. As shown in FIG11 , the method for manufacturing a light-emitting substrate may include steps S210 to S270.

[0242] Step S210: forming a first light-emitting mother layer on a first substrate. The first light-emitting mother layer includes a plurality of first light-emitting devices.

[0243] The first substrate may include a silicon substrate, or a sapphire substrate. For ease of understanding, the following description will be made using the example that the first substrate may include a silicon substrate.

[0244] 12, a second semiconductor material layer 340, a multi-quantum well material layer 330, and a first semiconductor material layer 320 are sequentially deposited on a silicon substrate 310. The first semiconductor material layer 320, the multi-quantum well material layer 330, and the second semiconductor material layer 340 are all integral layers.

[0245] In some examples, before forming the second semiconductor material layer 340 on the silicon substrate 310, a first buffer layer 305 may be deposited on the silicon substrate 310. When the first semiconductor material is an N-type semiconductor material, the first buffer layer 305 may be an N-type semiconductor buffer material.

[0246] As shown in Figure 13, the first semiconductor material layer 320 is patterned to form a first semiconductor mother layer 321. The first semiconductor mother layer 321 may include a plurality of mutually independent first semiconductors E1a.

[0247] The multi-quantum well material layer 330 is patterned to form a multi-quantum well mother layer 331. The multi-quantum well mother layer 331 may include multiple independent multi-quantum well bodies E1b. The orthographic projection of the multi-quantum well mother layer 331 on the silicon substrate may substantially overlap with the orthographic projection of the first semiconductor mother layer 321 on the silicon substrate.

[0248] A portion of the second semiconductor material layer 340 is patterned to form a second semiconductor mother layer 341. The second semiconductor mother layer 341 may include multiple independent second semiconductors E1c and a second semiconductor film CE1 connecting the multiple second semiconductors E1c. The second semiconductor film CE1 includes multiple first openings K1, which are used to provide space for subsequently formed first conductive pillars. The orthographic projection of the multi-quantum well mother layer 331 on the silicon substrate 310 may be located within the orthographic projection of the second semiconductor mother layer 341 on the silicon substrate 310.

[0249] As shown in FIG14 , a first conductive material layer is formed covering the first semiconductor mother layer 321 and the silicon substrate 310. The first conductive material layer is patterned to form a first conductive mother layer 351. The first conductive mother layer 351 may include a plurality of mutually independent first electrical conductors AE1. The orthographic projection of the first conductive mother layer 351 on the silicon substrate 310 may substantially overlap with the orthographic projection of the first semiconductor mother layer 321 on the silicon substrate 310.

[0250] A first auxiliary conductive material layer covering the second semiconductor film CE1 is formed. The first auxiliary conductive material layer may have a stacked structure, such as a metal stacked structure of Ti / Al / Ti.

[0251] The first auxiliary conductive material layer is patterned to form a first auxiliary electrode mother layer 361. The first auxiliary electrode mother layer 361 may include a plurality of first auxiliary electrode patterns L1h. The orthographic projection of the first auxiliary electrode mother layer 361 on the silicon substrate 310 is located within the orthographic projection of the second semiconductor film CE1 on the silicon substrate 310.

[0252] It should be noted that the first conductive mother layer 351 may be manufactured first and then the first auxiliary electrode mother layer 361 may be formed; or the first auxiliary electrode mother layer 361 may be manufactured first and then the first conductive mother layer 351 may be formed. This disclosure does not limit this.

[0253] A first reflective material layer is formed covering the first conductive mother layer 351 and the silicon substrate 310. The first reflective material layer may have a laminated structure. Exemplarily, the first reflective material layer includes silicon dioxide (SiO2) sub-films and titanium oxide (TiO2) sub-films, with the SiO2 and TiO2 sub-films alternately stacked. The alternating period T may satisfy the requirement of 8 ≤ T ≤ 10. For example, the alternating period T may be 8, 9, 10, 11, or 12.

[0254] The first reflective material layer is patterned to form a first reflective mother layer 371. The first reflective mother layer 371 may include a plurality of mutually independent first reflective films F1.

[0255] The first reflective film F1 can cover the surface of the first conductor AE1 away from the silicon substrate 310. The first reflective film F1 can also cover the side surface of the first conductor AE1 perpendicular to the silicon substrate 310, the side surface of the first semiconductor E1a perpendicular to the silicon substrate 310, the side surface of the multi-quantum well body E1b perpendicular to the silicon substrate 310, and the side surface of the second semiconductor E1c perpendicular to the silicon substrate 310.

[0256] The first reflective film F1 may also be etched to form a through hole. The through hole is located on a side of the first conductive body AE1 away from the silicon substrate 310 to avoid the first conductive pillar to be formed subsequently.

[0257] It should be noted that the first reflective mother layer 371 may be manufactured first and then the first auxiliary electrode mother layer 361 is formed; or the first auxiliary electrode mother layer 361 may be manufactured first and then the first reflective mother layer 371 is formed. This disclosure does not limit this.

[0258] As shown in FIG15 , after the first reflective mother layer 371 and the first auxiliary electrode mother layer 361 are formed, a filling material is deposited to form a first filling material layer 380 covering the silicon substrate 310, the first reflective mother layer 371, and the first auxiliary electrode mother layer 361. The filling material can be at least one of silicon monoxide (SiO) and a high-temperature resistant silane resin.

[0259] Afterwards, a chemical mechanical polishing (CMP) process may be performed on the surface of the first filling material layer 380 away from the silicon substrate 310 to obtain a first filling material layer 380 with a flat surface away from the silicon substrate 310 .

[0260] Multiple first channels are formed using an etching process. The etching process can be a dry etching process. Each first channel penetrates the first filling material layer 380. One-sixth of the first channels communicate with a through-hole defined in the first reflective mother layer 371; another one-sixth connects to the first auxiliary electrode mother layer 361; and the remaining two-thirds penetrate the first filling material layer 380 and the first buffer layer, communicating with the silicon substrate 310. The remaining two-thirds can pass through the first opening K1 defined in the second semiconductor film CE1.

[0261] The first channel can be formed by etching using a Bosch process. The Bosch process can prevent or reduce etching parallel to the extension direction of the silicon substrate 310, thereby reducing the opening size of the first channel, facilitating a reduction in the spacing between the first light-emitting devices in the first light-emitting mother layer, and increasing the arrangement density of the first light-emitting devices in the first light-emitting mother layer.

[0262] After forming the plurality of first channels, a conductive metal layer can be formed within the first channels, covering at least the inner walls of the first channels, to form first conductive pillars L1g. The conductive metal layer may only cover the inner walls of the first channels or may fill the first channels, without limitation. The conductive metal layer may include a metal with good conductivity, such as copper (Cu), nickel (Ni), or tungsten (W), without limitation.

[0263] The conductive metal layer can be formed using a damascene process. The damascene process eliminates the need for etching the metal layer. Since dry etching of metals (e.g., copper) is difficult, the damascene process can improve the production efficiency of the conductive metal layer.

[0264] In this way, among the multiple first conductive columns L1g in the first light-emitting layer, one-sixth of the first conductive columns L1g pass through the through holes opened on the first reflective mother layer 371 and are connected to the first conductor AE1; the other one-sixth of the first conductive columns L1g are connected to the first auxiliary electrode pattern L1h of the first auxiliary electrode mother layer 361.

[0265] In some examples, the first filling material layer 380 is further etched with an auxiliary channel. The first auxiliary channel connects to the first channel connected to the first auxiliary electrode pattern L1h, as well as a first channel that penetrates the first filling material layer 380 and the first buffer layer. Based on this, the second semiconductor film CE1 may not have a corresponding opening, and the first channel that penetrates the first filling material layer 380 and the first buffer layer may not be formed.

[0266] A conductive metal layer can be formed in the first channel to form a first conductive pillar, covering at least the inner wall of the first channel. At the same time, an auxiliary conductive pillar L1j can be formed to cover at least the inner wall of the auxiliary channel. The auxiliary conductive pillar L1j connects a first conductive pillar L1g connected to the first auxiliary electrode pattern L1h and a first conductive pillar L1g connected to the first channel that passes through the first filling material layer 380 and the first buffer layer 305.

[0267] In some embodiments, the steps for manufacturing the first auxiliary electrode mother layer 361 may be omitted. In this embodiment, the first conductive pillar L1g may be directly connected to the second semiconductor film CE1.

[0268] In some embodiments, the aforementioned steps for fabricating the first reflective mother layer 371 may be omitted. In this embodiment, the first filler material layer 380 may directly cover the surface of the first conductive body AE1 away from the silicon substrate 310, the side surface of the first conductive body AE1 perpendicular to the silicon substrate 310, the side surface of the first semiconductor E1c perpendicular to the silicon substrate 310, the side surface of the multi-quantum well body E1b perpendicular to the silicon substrate 310, and the side surface of the second semiconductor E1c perpendicular to the silicon substrate 310.

[0269] Step S220: forming a second light-emitting mother layer on the second substrate. The second light-emitting mother layer includes a plurality of second light-emitting devices.

[0270] The second substrate may include a silicon substrate, or a sapphire substrate. For ease of understanding, the following description will be made using the example of the second substrate including the silicon substrate 410.

[0271] 16, a second semiconductor material layer 440, a multi-quantum well material layer 430, and a first semiconductor material layer 420 are sequentially deposited on a silicon substrate 410. The first semiconductor material layer 420, the multi-quantum well material layer 430, and the second semiconductor material layer 440 are all integral layers.

[0272] In some examples, before forming the second semiconductor material layer 440 on the silicon substrate 410, a second buffer layer 405 may be deposited on the silicon substrate 410. When the first semiconductor material is an N-type semiconductor material, the second buffer layer 405 may be an N-type semiconductor buffer material.

[0273] As shown in Figure 17, the first semiconductor material layer 420 is patterned to form a first semiconductor mother layer 421. The first semiconductor mother layer 421 may include a plurality of mutually independent first semiconductors E2a.

[0274] The multi-quantum well material layer 430 is patterned to form a multi-quantum well mother layer 431. The multi-quantum well mother layer 431 may include multiple independent multi-quantum well bodies E2b. The orthographic projection of the multi-quantum well mother layer 431 on the silicon substrate may substantially overlap with the orthographic projection of the first semiconductor mother layer 421 on the silicon substrate.

[0275] A portion of the second semiconductor material layer 440 is patterned to form a second semiconductor mother layer 441. The second semiconductor mother layer 441 may include multiple independent second semiconductors E2c and a second semiconductor film CE2 connecting the multiple second semiconductors E2c. The second semiconductor film CE2 includes multiple second openings K2, which are used to provide space for subsequently formed second conductive pillars. The orthographic projection of the multi-quantum well mother layer 431 on the silicon substrate 410 may be located within the orthographic projection of the second semiconductor mother layer 441 on the silicon substrate 410.

[0276] As shown in FIG18 , a second conductive material layer is formed covering the first semiconductor mother layer 421 and the silicon substrate 410. The second conductive material layer is patterned to form a second conductive mother layer 451. The second conductive mother layer 451 may include a plurality of mutually independent second electrical conductors AE2. The orthographic projection of the second conductive mother layer 351 on the silicon substrate 410 may substantially overlap with the orthographic projection of the first semiconductor mother layer 421 on the silicon substrate 410.

[0277] A second auxiliary conductive material layer covering the second semiconductor film CE2 is formed. The second auxiliary conductive material layer may have a stacked structure, such as a metal stacked structure of Ti / Al / Ti.

[0278] The second auxiliary conductive material layer is patterned to form a second auxiliary electrode mother layer 461. The second auxiliary electrode mother layer 461 may include a plurality of second auxiliary electrode patterns L2h. The orthographic projection of the second auxiliary electrode mother layer 461 on the silicon substrate 410 is located within the orthographic projection of the second semiconductor film CE2 on the silicon substrate 410.

[0279] It should be noted that the second conductive mother layer 451 may be manufactured first and then the second auxiliary electrode mother layer 461 may be formed; or the second auxiliary electrode mother layer 461 may be manufactured first and then the second conductive mother layer 451 may be formed. This disclosure does not limit this.

[0280] A second reflective material layer is formed covering the second conductive mother layer 451 and the silicon substrate 410. The second reflective material layer may have a laminated structure. Exemplarily, the second reflective material layer includes silicon dioxide (SiO2) sub-films and titanium oxide (TiO2) sub-films, with the SiO2 and TiO2 sub-films alternately stacked. The alternating period T may satisfy the requirement of 8 ≤ T ≤ 10. For example, the alternating period T may be 8, 9, 10, 11, or 12.

[0281] The second reflective material layer is patterned to form a second reflective mother layer 471. The second reflective mother layer 471 may include a plurality of mutually independent second reflective films F2.

[0282] The second reflective film F2 can cover the surface of the second conductor AE2 away from the silicon substrate 410. The second reflective film F2 can also cover the side surface of the second conductor AE2 perpendicular to the silicon substrate 410, the side surface of the first semiconductor E2a perpendicular to the silicon substrate 410, the side surface of the multi-quantum well body E2b perpendicular to the silicon substrate 410, and the side surface of the second semiconductor E2c perpendicular to the silicon substrate 410.

[0283] The second reflective film F2 may also be etched to form a through hole. The through hole is located on the side of the second conductive body AE2 away from the silicon substrate 410 to avoid the second conductive pillar to be formed subsequently.

[0284] It should be noted that the second reflective mother layer 471 may be manufactured first and then the second auxiliary electrode mother layer 461 is formed; or the second auxiliary electrode mother layer 461 may be manufactured first and then the second reflective mother layer 471 is formed. This disclosure does not limit this.

[0285] As shown in FIG19 , after the second reflective mother layer 471 and the second auxiliary electrode mother layer 461 are formed, a filling material is deposited to form a second filling material layer 480 covering the silicon substrate 410, the second reflective mother layer 471, and the second auxiliary electrode mother layer 461. The filling material can be at least one of silicon monoxide (SiO) and a high-temperature resistant silane resin.

[0286] Afterwards, a CMP treatment may be performed on the surface of the second filling material layer 480 away from the silicon substrate 410 to obtain a second filling material layer 480 with a flat surface away from the silicon substrate 410 .

[0287] An etching process is used to form multiple second channels. The number of second channels can be two-thirds the number of first channels. The etching process can be a dry etching process. Each second channel penetrates the second filling material layer 480. A quarter of the second channels communicate with through-holes defined in the second reflective mother layer 471; another quarter of the first channels connect to the second auxiliary electrode mother layer 461; and the remaining half of the second channels penetrate the second filling material layer 480 and the second buffer layer 405, communicating with the silicon substrate 410. The remaining half of the second channels can pass through the second opening K2 defined in the second semiconductor film CE2.

[0288] The second channel can be formed by etching using a Bosch process. The Bosch process can prevent or reduce etching parallel to the extension direction of the silicon substrate 410, thereby reducing the opening size of the second channel, facilitating a reduction in the spacing between the second light-emitting devices in the second light-emitting mother layer, and increasing the arrangement density of the second light-emitting devices in the second light-emitting mother layer.

[0289] After forming the plurality of second channels, a conductive metal layer can be formed within the second channels, covering at least the inner walls of the second channels, to form second conductive pillars L2g. The conductive metal layer can cover only the inner walls of the second channels or fill the second channels, without limitation. The conductive metal layer can include a metal with good conductivity, such as copper (Cu), nickel (Ni), or tungsten (W), without limitation.

[0290] The conductive metal layer can be formed using a damascene process. The damascene process eliminates the need for etching the metal layer. Since dry etching of metals (e.g., copper) is difficult, the damascene process can improve the production efficiency of the conductive metal layer.

[0291] In this way, among the multiple second conductive columns L2g in the second light-emitting layer, one-quarter of the second conductive columns L2g are connected to the second conductor AE2 through the through holes opened on the second reflective mother layer 471; the other one-quarter of the first conductive columns L2g are connected to the second auxiliary electrode pattern L2h of the second auxiliary electrode mother layer 461.

[0292] In some embodiments, the steps for manufacturing the second auxiliary electrode mother layer 461 may be omitted. In this embodiment, the second conductive pillar L2g may be directly connected to the second semiconductor film CE2.

[0293] In some embodiments, the steps involved in fabricating the second reflective mother layer 471 can be omitted. In this embodiment, the second filler material layer 480 can directly cover the surface of the second conductive body AE2 away from the silicon substrate 410, the side surface of the second conductive body AE2 perpendicular to the silicon substrate 410, the side surface of the first semiconductor E2c perpendicular to the silicon substrate 410, the side surface of the multi-quantum well body E2b perpendicular to the silicon substrate 410, and the side surface of the second semiconductor E2c perpendicular to the silicon substrate 410.

[0294] Step S230: forming a third light-emitting mother layer on a third substrate, wherein the third light-emitting mother layer includes a plurality of third light-emitting devices.

[0295] 20 shows a second semiconductor material layer 540, a multi-quantum well material layer 530 and a first semiconductor material layer 520 deposited sequentially on a gallium arsenide substrate 501. The first semiconductor material layer 520, the multi-quantum well material layer 530 and the second semiconductor material layer 540 are all integral layers.

[0296] In some examples, before forming the first semiconductor material layer 520 on the gallium arsenide substrate 501, a third buffer layer 505 may be further deposited on the gallium arsenide substrate 501. The third buffer layer 505 may include a gallium arsenide buffer material.

[0297] Because gallium arsenide substrate 501 has poor mechanical properties and absorbs red light, patterning the first semiconductor material layer 520, multi-quantum well material layer 530, and second semiconductor material layer 540 on gallium arsenide substrate 501 can easily result in defects. Therefore, after forming the first semiconductor material layer 520, multi-quantum well material layer 530, and second semiconductor material layer 540 on gallium arsenide substrate 501, gallium arsenide substrate 501 and the third buffer layer 505, first semiconductor material layer 520, multi-quantum well material layer 530, and second semiconductor material layer 540 thereon are inverted and transferred to a third substrate 510, and the gallium arsenide substrate 501 is removed, as shown in FIG21. At this point, the second semiconductor material layer 540 can directly contact the third substrate 510.

[0298] Thereafter, the third buffer layer 505 may be removed on the third substrate 510 .

[0299] The third substrate may include a silicon substrate, or a sapphire substrate. For ease of understanding, the following description will be made using an example in which the third substrate includes a silicon substrate 510 .

[0300] As shown in Figure 22, the second semiconductor material layer 540 is patterned to form a second semiconductor mother layer 541. The second semiconductor mother layer 541 may include a plurality of mutually independent second semiconductors E3c.

[0301] The multi-quantum well material layer 530 is patterned to form a multi-quantum well mother layer 531. The multi-quantum well mother layer 531 may include a plurality of independent multi-quantum well bodies E3b. The orthographic projection of the multi-quantum well mother layer 531 on the silicon substrate 510 may substantially overlap with the orthographic projection of the second semiconductor mother layer 541 on the silicon substrate 510.

[0302] A portion of the first semiconductor material layer 520 is patterned to form a first semiconductor mother layer 521. The first semiconductor mother layer 521 may include multiple independent first semiconductors E3a and a first semiconductor thin film AE3 connecting the multiple first semiconductors E3a. The first semiconductor thin film AE3 may be a structure that covers the entire silicon substrate 510. The orthographic projection of the multi-quantum well mother layer 531 on the silicon substrate 510 may be located within the orthographic projection of the first semiconductor mother layer 521 on the silicon substrate 510.

[0303] As shown in FIG23 , a third conductive material layer is formed covering the second semiconductor mother layer 541 and the silicon substrate 510. The third conductive material layer is patterned to form a third conductive mother layer 551. The third conductive mother layer 551 may include a plurality of independent third electrical conductors CE3. The orthographic projection of the third conductive mother layer 551 on the silicon substrate 510 may substantially overlap with the orthographic projection of the second semiconductor mother layer 541 on the silicon substrate 510.

[0304] A third auxiliary conductive material layer is formed to cover the first semiconductor film AE3. The third auxiliary conductive material layer may be a stacked structure, such as a metal stacked structure of Ti / Al / Ti.

[0305] The third auxiliary conductive material layer is patterned to form a third auxiliary electrode mother layer 561. The second auxiliary electrode mother layer 561 may include a plurality of third auxiliary electrode patterns L3h. The orthographic projection of the third auxiliary electrode mother layer 561 on the silicon substrate 510 is located within the orthographic projection of the first semiconductor thin film AE3 on the silicon substrate 510.

[0306] It should be noted that the third conductive mother layer 551 may be manufactured first and then the third auxiliary electrode mother layer 561 may be formed; or the third auxiliary electrode mother layer 561 may be manufactured first and then the third conductive mother layer 551 may be formed. This disclosure does not limit this.

[0307] A third reflective material layer is formed covering the third conductive mother layer 551 and the silicon substrate 510. The third reflective material layer may have a laminated structure. Exemplarily, the third reflective material layer includes silicon dioxide (SiO2) sub-films and titanium oxide (TiO2) sub-films, with the SiO2 and TiO2 sub-films alternately stacked. The alternating period T may satisfy the requirement of 8 ≤ T ≤ 10. For example, the alternating period T may be 8, 9, 10, 11, or 12.

[0308] The third reflective material layer is patterned to form a third reflective mother layer 571. The third reflective mother layer 571 may include a plurality of independent third reflective films F3.

[0309] The third reflective film F3 can cover the surface of the third conductor CE3 away from the silicon substrate 510. The third reflective film F3 can also cover the side surface of the third conductor CE3 perpendicular to the silicon substrate 510, the side surface of the second semiconductor E3c perpendicular to the silicon substrate 510, the side surface of the multi-quantum well body E3b perpendicular to the silicon substrate 510, and the side surface of the first semiconductor E3a perpendicular to the silicon substrate 510.

[0310] The third reflective film F3 may also be etched to form a through hole. The through hole is located on a side of the third conductive body CE3 away from the silicon substrate 510 to avoid the second conductive pillar to be formed subsequently.

[0311] It should be noted that the third reflective mother layer 571 may be manufactured first and then the third auxiliary electrode mother layer 561 is formed; or the third auxiliary electrode mother layer 561 may be manufactured first and then the third reflective mother layer 571 is formed. This disclosure does not limit this.

[0312] As shown in FIG24 , after the third reflective mother layer 571 and the third auxiliary electrode mother layer 561 are formed, a filling material is deposited to form a third filling material layer 580 covering the silicon substrate 510, the third reflective mother layer 571, and the third auxiliary electrode mother layer 561. The filling material can be at least one of silicon monoxide (SiO) and a high-temperature resistant silane resin.

[0313] Afterwards, a CMP treatment may be performed on the surface of the third filling material layer 580 away from the silicon substrate 510 to obtain a third filling material layer 580 with a flat surface away from the silicon substrate 510 .

[0314] A plurality of third channels are formed using an etching process. The number of third channels can be one-third of the number of first channels, and understandably, the number of third channels can be one-half of the number of second channels. The etching process can be a dry etching process. Each third channel penetrates the third filling material layer 580. Half of the third channels are connected to through-holes defined in the third reflective mother layer 571; the other half are connected to the third auxiliary electrode mother layer 561.

[0315] The third channel can be formed by etching using a Bosch process. The Bosch process can prevent or reduce etching parallel to the extension direction of the silicon substrate 510, thereby reducing the opening size of the third channel, facilitating a reduction in the spacing between the third light-emitting devices in the third light-emitting mother layer, and increasing the arrangement density of the third light-emitting devices in the third light-emitting mother layer.

[0316] After forming the plurality of third channels, a conductive metal layer can be formed within the third channels, covering at least the inner walls of the third channels, to form third conductive pillars L3g. The conductive metal layer may only cover the inner walls of the third channels or may fill the third channels, without limitation. The conductive metal layer may include a metal with good conductivity, such as copper (Cu), nickel (Ni), or tungsten (W), without limitation.

[0317] The conductive metal layer can be formed using a damascene process. The damascene process eliminates the need for etching the metal layer. Since dry etching of metals (e.g., copper) is difficult, the damascene process can improve the production efficiency of the conductive metal layer.

[0318] In this way, among the multiple third conductive columns L3g in the third light-emitting layer, half of the third conductive columns L3g pass through the through holes opened on the third reflective mother layer 571 and are connected to the third conductor CE3; the other half of the third conductive columns L3g are connected to the third auxiliary electrode pattern L3h of the third auxiliary electrode mother layer 561.

[0319] In some embodiments, the steps for manufacturing the third auxiliary electrode mother layer 561 can be omitted. In this embodiment, the third conductive pillar L3g can be directly connected to the first semiconductor film AE3.

[0320] In some embodiments, the steps involved in fabricating the third reflective mother layer 571 can be omitted. In this embodiment, the third filler material layer 580 can directly cover the surface of the third conductive body CE3 away from the silicon substrate 510, the side surface of the third conductive body CE3 perpendicular to the silicon substrate 510, the side surface of the second semiconductor E3c perpendicular to the silicon substrate 510, the side surface of the multi-quantum well body E3b perpendicular to the silicon substrate 510, and the side surface of the first semiconductor E3a perpendicular to the silicon substrate 510.

[0321] It should be noted that step S210, step S220 and step S230 may be performed in a time-sharing manner or simultaneously, which is not limited here.

[0322] Step S240: Bonding the driving circuit mother layer to the side of the first light emitting mother layer away from the first substrate. The driving circuit mother layer includes a plurality of pixel circuits and a common electrode, and the plurality of pixel circuits are respectively coupled to the plurality of first light emitting devices.

[0323] As shown in Figure 25, the driving circuit mother layer 600 exposes multiple conductive contacts. The number of conductive contacts can be equal to the number of first conductive pillars L1g in the first light-emitting mother layer. Half of the multiple conductive contacts are connected to the multiple pixel circuits within the driving circuit mother layer 600 in a one-to-one correspondence, and the other half of the conductive contacts can be connected to the second power signal line L-VSS within the driving circuit mother layer 600.

[0324] After CMP, the ends of multiple first conductive pillars L1g are exposed on the side of the first light-emitting mother layer away from the first substrate. The multiple conductive contacts exposed on the driving circuit mother layer 600 are aligned and bonded to the multiple first conductive pillars L1g exposed on the first light-emitting mother layer, thereby achieving a bonded connection between the multiple conductive contacts on the driving circuit mother layer 600 and the multiple first conductive pillars L1g on the first light-emitting mother layer.

[0325] The conductive contact and the first conductive pillar L1g may both include metal copper. The conductive contact and the first conductive pillar L1g may be bonded by thermocompression bonding, and the bonding depth may be within a range of 1 μm.

[0326] Step S250: remove the first substrate and bond a second light-emitting mother layer to a side of the first light-emitting mother layer away from the driving circuit mother layer. The second light-emitting mother layer includes a plurality of second light-emitting devices, each of which is coupled to a plurality of pixel circuits.

[0327] As shown in FIG. 26 , the first substrate 310 connected to the first light-emitting mother layer may be removed by using a laser lift-off (LLO) process.

[0328] After removing the first substrate, the first buffer layer 305 can be thinned using a CMP process to ensure that the ends of the first conductive pillars L1g with the longer two-thirds of their extension length are exposed, thereby improving the subsequent bonding reliability between this portion of the first conductive pillars L1g and the second conductive pillars L2g in the second light-emitting mother layer.

[0329] As shown in Figure 27, after CMP, the ends of multiple second conductive pillars L2g are exposed on the side of the second light-emitting master layer away from the second substrate. By aligning and bonding the ends of the multiple first conductive pillars L1g exposed in the first light-emitting master layer with the multiple second conductive pillars L2g exposed in the second light-emitting master layer, two-thirds of the first conductive pillars L1g in the first light-emitting master layer are bonded to the multiple second conductive pillars L2g in the second light-emitting master layer.

[0330] The second conductive pillar L2g and the first conductive pillar L1g may both include metal copper. The second conductive pillar L2g and the first conductive pillar L1g may be bonded by thermocompression bonding, and the bonding depth may be within 1 μm.

[0331] Step S260: remove the second substrate and bond a third light-emitting mother layer to a side of the second light-emitting mother layer away from the first light-emitting mother layer. The third light-emitting mother layer includes a plurality of third light-emitting devices, each of which is coupled to a plurality of pixel circuits.

[0332] As shown in FIG. 28 , the second substrate connected to the second light-emitting mother layer can be removed by using a laser lift-off (LLO) process.

[0333] After removing the second substrate, the second buffer layer 405 can be thinned using a CMP process to ensure that the end of the second conductive column L2g with the longer half of the extension length is exposed, thereby improving the subsequent bonding reliability between this part of the second conductive column L2g and the third conductive column L3g in the third light-emitting mother layer.

[0334] As shown in Figure 29, after CMP, the ends of multiple third conductive pillars L3g are exposed on the side of the third light-emitting master layer away from the third substrate. By aligning and bonding the ends of the multiple second conductive pillars L2g exposed in the second light-emitting master layer with the multiple third conductive pillars L3g exposed in the third light-emitting master layer, half of the second conductive pillars L2g in the second light-emitting master layer are bonded to the multiple third conductive pillars L3g in the third light-emitting master layer.

[0335] The third conductive pillar L3g and the second conductive pillar L2g may both include metal copper. The third conductive pillar L3g and the second conductive pillar L2g may be bonded by thermocompression bonding, and the bonding depth may be within 1 μm.

[0336] Step S270: After removing the third substrate, the first light-emitting mother layer, the second light-emitting mother layer, the third light-emitting mother layer and the driving circuit mother layer are cut to obtain a light-emitting substrate.

[0337] As shown in FIG30 , the third substrate connected to the third light-emitting mother layer can be removed by using a laser lift-off (LLO) process.

[0338] As shown in Figure 31, after removing the third substrate, a plurality of conductive bumps 14 can be formed on the side of the driver circuit layer away from the first light-emitting mother layer. These conductive bumps 14 can be electrically connected to the multiple pixel circuits in the driver circuit layer. These conductive bumps 14 are used to electrically connect to the timing control circuit and driver module on the circuit board, so that the driver circuit layer receives the second control signal provided by the timing control circuit and the light-emitting data signal provided by the driver module.

[0339] The number of the conductive bumps 14 is less than the number of the pixel circuits in the driving circuit layer.

[0340] Afterwards, the first light-emitting mother layer, the second light-emitting mother layer, the third light-emitting mother layer and the driving circuit mother layer are cut according to the size of the light-emitting substrate to obtain the light-emitting substrate as described above.

[0341] The above description is merely a specific embodiment of the present disclosure, but the scope of protection of the present disclosure is not limited thereto. Any changes or substitutions that a person skilled in the art can conceive within the technical scope disclosed in the present disclosure should be included within the scope of protection of the present disclosure. Therefore, the scope of protection of the present disclosure should be based on the scope of protection of the claims.

Claims

1. A light-emitting substrate, comprising: A driving circuit layer, including a plurality of pixel circuits; A first light-emitting layer, located on one side of the driving circuit layer; The first light-emitting layer includes a plurality of first light-emitting devices, and the plurality of first light-emitting devices are respectively coupled to the plurality of pixel circuits; A second light-emitting layer is located at a side of the first light-emitting layer away from the driving circuit layer; the second light-emitting layer includes a plurality of second light-emitting devices, and the plurality of second light-emitting devices are respectively coupled to the plurality of pixel circuits; A third light-emitting layer is located at a side of the second light-emitting layer away from the driving circuit layer; the third light-emitting layer includes a plurality of third light-emitting devices, and the plurality of third light-emitting devices are respectively coupled to the plurality of pixel circuits; The light emitting color of the first light emitting device, the light emitting color of the second light emitting device and the light emitting color of the third light emitting device are different from each other; The orthographic projection of the first light emitting device on the driving circuit layer, the orthographic projection of the second light emitting device on the driving circuit layer, and the orthographic projection of the third light emitting device on the driving circuit layer do not completely overlap with each other.

2. The light-emitting substrate according to claim 1, wherein: The first light-emitting layer includes a first auxiliary electrode, and the anode or cathode of the first light-emitting device is coupled to the first auxiliary electrode; and / or, The second light emitting layer includes a second auxiliary electrode, and the anode or cathode of the second light emitting device is coupled to the second auxiliary electrode; and / or, The third light emitting layer includes a third auxiliary electrode, and an anode or a cathode of the third light emitting device is coupled to the third auxiliary electrode.

3. The light-emitting substrate according to claim 2, wherein: The light emitting substrate comprises the first auxiliary electrode, the second auxiliary electrode and the third auxiliary electrode; An area of ​​the third auxiliary electrode is greater than an area of ​​the second auxiliary electrode, and an area of ​​the second auxiliary electrode is greater than an area of ​​the first auxiliary electrode.

4. The light-emitting substrate according to claim 2 or 3, wherein: The light emitting substrate comprises the first auxiliary electrode, the second auxiliary electrode and the third auxiliary electrode; The orthographic projection of the second auxiliary electrode on the driving circuit layer at least partially overlaps with the orthographic projection of the first auxiliary electrode on the driving circuit layer; and / or, The orthographic projection of the third auxiliary electrode on the driving circuit layer at least partially overlaps with the orthographic projection of the second auxiliary electrode on the driving circuit layer.

5. The light emitting substrate according to any one of claims 1 to 4, wherein The first light-emitting layer includes 3N first conductive pillars, the second light-emitting layer includes 2N second conductive pillars, the third light-emitting layer includes N third conductive pillars, and the first conductive pillars, the second conductive pillars and the third conductive pillars all extend in a direction perpendicular to the driving circuit layer; A portion of the N first conductive pillars constitute N first conductive structures, and each of the first conductive structures is respectively connected to the driving circuit layer and the first light-emitting device; Another portion of N first conductive pillars and another portion of N second conductive pillars are connected one by one and together constitute N second conductive structures, each of the second conductive structures is respectively connected to the driving circuit layer and the second light-emitting device; The remaining N first conductive pillars, another part of the N second conductive pillars and the N third conductive pillars are connected one by one and together constitute N third conductive structures, each of which is respectively connected to the driving circuit layer and the third light-emitting device.

6. The light emitting substrate according to any one of claims 1 to 5, wherein The first light-emitting layer includes a first reflective film, and the first reflective film covers the side surface of the first light-emitting device perpendicular to the driving circuit layer and the surface of the first light-emitting device close to the driving circuit layer; and / or, The second light-emitting layer includes a second reflective film, and the second reflective film covers the side surface of the second light-emitting device perpendicular to the driving circuit layer and the surface of the second light-emitting device close to the driving circuit layer; and / or, The third light emitting layer includes a third reflective film, and the third reflective film covers the side surface of the third light emitting device perpendicular to the driving circuit layer and the surface of the third light emitting device close to the driving circuit layer.

7. The light-emitting substrate according to claim 6, wherein: The light-emitting substrate includes a first reflective film, a second reflective film and a third reflective film; The wavelength of the light-emitting color of the first light-emitting device is shorter than the wavelength of the light-emitting color of the second light-emitting device, and the wavelength of the light-emitting color of the second light-emitting device is shorter than the wavelength of the light-emitting color of the third light-emitting device; The film thickness of the first reflective film is smaller than the film thickness of the second reflective film, and the film thickness of the second reflective film is smaller than the film thickness of the third reflective film.

8. The light-emitting substrate according to any one of claims 1 to 7, wherein The anode of the first light emitting device is located on a side of the cathode of the first light emitting device close to the driving circuit layer, and / or the anode of the second light emitting device is located on a side of the cathode of the second light emitting device close to the driving circuit layer; The cathode of the third light emitting device is located at a side of the anode of the third light emitting device close to the driving circuit layer.

9. The light-emitting substrate according to any one of claims 1 to 8, wherein The orthographic projection of the first light emitting device on the driving circuit layer overlaps with the orthographic projection of the second light emitting device on the driving circuit layer; and / or, The orthographic projection of the second light emitting device on the driving circuit layer overlaps with the orthographic projection of the third light emitting device on the driving circuit layer; and / or, The orthographic projection of the third light emitting device on the driving circuit layer overlaps with the orthographic projection of the first light emitting device on the driving circuit layer.

10. A display device, wherein: include: The light-emitting substrate according to any one of claims 1 to 9; A circuit board is coupled to the driving circuit layer of the light-emitting substrate.

11. A method for manufacturing a light-emitting substrate, wherein: include: Forming a first light-emitting mother layer on a first substrate, wherein the first light-emitting mother layer includes a plurality of first light-emitting devices; forming a second light-emitting mother layer on a second substrate, wherein the second light-emitting mother layer includes a plurality of second light-emitting devices; forming a third light-emitting mother layer on a third substrate, wherein the third light-emitting mother layer includes a plurality of third light-emitting devices; Bonding a driving circuit mother layer to a side of the first light-emitting mother layer away from the first substrate, wherein the driving circuit mother layer comprises a plurality of pixel circuits, and the plurality of pixel circuits are respectively coupled to the plurality of first light-emitting devices; Removing the first substrate, and bonding the second light-emitting mother layer to a side of the first light-emitting mother layer away from the driving circuit mother layer; The second light-emitting mother layer includes a plurality of second light-emitting devices, and the plurality of second light-emitting devices are respectively coupled to the plurality of pixel circuits; removing the second substrate, and bonding the third light-emitting mother layer to a side of the second light-emitting mother layer away from the first light-emitting mother layer; The third light-emitting mother layer includes a plurality of third light-emitting devices, and the plurality of third light-emitting devices are respectively coupled to the plurality of pixel circuits; After removing the third substrate, the first light-emitting mother layer, the second light-emitting mother layer, the third light-emitting mother layer and the driving circuit mother layer are cut to obtain a light-emitting substrate.

12. The method according to claim 11, wherein: The step of forming a first light-emitting mother layer on a first substrate comprises: providing a first substrate; On the first substrate, a first semiconductor mother layer, a multi-quantum well mother layer, and a second semiconductor mother layer are sequentially formed in a direction away from the first substrate; the first semiconductor mother layer includes a plurality of mutually independent first semiconductors, the multi-quantum well mother layer includes a plurality of mutually independent multi-quantum well bodies, the second semiconductor mother layer includes a plurality of mutually independent second semiconductors, and a second semiconductor thin film connecting the plurality of second semiconductors; A first conductive mother layer is formed on a side of the second semiconductor mother layer away from the first substrate; the first conductive mother layer includes a plurality of mutually independent first conductors; The first conductor, the first semiconductor, the multi-quantum well body, the second semiconductor and the second semiconductor thin film connected to each other constitute a first light-emitting device.

13. The method according to claim 12, wherein: After forming the first conductive mother layer, the method further includes: forming a first reflective material layer covering the first conductive mother layer and the first substrate; The first reflective material layer is patterned to obtain a first reflective mother layer; the first reflective mother layer includes a plurality of mutually independent first reflective films, wherein the first reflective films cover a surface of the first conductor away from the first substrate, a side surface of the first conductor perpendicular to the first substrate, a side surface of the first semiconductor perpendicular to the first substrate, a side surface of the multi-quantum well body perpendicular to the first substrate, and a side surface of the second semiconductor perpendicular to the first substrate.

14. The method according to claim 12 or 13, wherein: After forming the second semiconductor mother layer, the method further comprises: forming a first auxiliary electrode material layer covering the second semiconductor film; The first auxiliary electrode material layer is patterned to obtain a first auxiliary electrode pattern, wherein the orthographic projection of the first auxiliary electrode pattern on the first substrate is located within the orthographic projection range of the second semiconductor film on the first substrate.

15. The method according to any one of claims 12 to 14, wherein: After forming a plurality of first light emitting devices spaced apart from each other, the method further comprises: forming a first filling material layer covering the plurality of first light-emitting devices, wherein a surface of the first filling material layer on a side away from the first substrate is a plane; forming a plurality of first channels penetrating the first filling material layer; A first conductive column is formed to cover at least an inner wall of each of the first channels.

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