Hat and its plate making method and application

Abstract

The present invention discloses a hat and a pattern-making method thereof. A horizontal line of equal length is drawn around the front collar and divided into three equal parts. The structure is then mapped using a cutting, spreading, and inserting method. The looseness of the brim is adjusted by adjusting the angles of the three parts, thereby adjusting the brim size. During the sewing process, the brim deflects outward, allowing a certain amount of movement with the neck, making it more comfortable to wear. Unrestricted neck movement does not affect the warmth retention function. The method is easy to understand, simple to operate, and susceptible to technical popularization and promotion. The present invention discloses a hat made using the pattern-making method, which can be applied to down garments. This method addresses the problem of down jackets being stuck at the neck, providing windproof and warmth-retaining comfort.

Description

Technical Field

[0001] The invention belongs to the technical field of clothing pattern making, and relates to a hat, a pattern making method and an application thereof. Background Art

[0002] As one of the most common features of down jackets, hats protect the head, neck, and face from wind, cold, rain, and snow, providing warmth, windproofing, and comfort. Currently, one of the key issues affecting the comfort of down jackets on the market is the neck-blocking problem of hats. Therefore, the structural design of hats is particularly important in the production of down jackets.

[0003] When making hats using traditional methods, the bottom of the hat and the collar will be sewn together to produce darts. Figure 1 As shown in the shaded area in the figure, the neckline shifts inwards towards the neck, causing a neck pinching problem and causing neck discomfort when worn. Summary of the Invention

[0004] Purpose of the invention: The purpose of the present invention is to provide a hat and its plate making method and application, so as to solve the problem of neck pinching caused by the traditional production method causing the neckline to shift inward toward the neck.

[0005] Technical solution: A hat pattern making method of the present invention comprises the following steps:

[0006] S1. Set the neckline as point A1. Draw a horizontal line of equal length around the front neckline starting from point A1 and divide it into three equal parts. Set the first dividing point as a1.

[0007] S2. Extend 15 cm from the first bisection point a1 to b1, draw a perpendicular line b1c1 from b1 to A1b1, connect a1c1, and the angle ∠b1a1c1 is α; select point a2 on a1c1 so that a1a2 = A1a1, extend 15 cm from a2 to b2, draw a perpendicular line b2c2, connect a2c2, and the angle ∠b2a2c2 is β; select point a3 on a2c2 so that a2a3 = A1a1, extend 15 cm from a3 to b3, draw a perpendicular line b3c3, and the angle ∠b3a3c3 is γ;

[0008] S3. Take point C1 at a3c3, making a3C1 equal to 1 / 2 of the back collar circumference. Draw a perpendicular line from point C1 to a3c3, which is the symmetry line of the hat center. Align the structure diagram with the symmetry line of the hat center as the vertical line, and draw the hat center B1C1. Connect A1 and B1 with an arc to draw the hat bottom arc A1B1.

[0009] S4. Determine the point P where the collar and shoulder meet on the arc line A1B1 of the hat base. The hat height PQ is drawn vertically from point P. A line A1D parallel to PQ is drawn vertically from point A1 to determine the hat width.

[0010] S5. Divide the cap height into l1, l2, l3, and l4 from top to bottom; cut and expand at l3 and l4; the intersection of l2 and A1D is D1;

[0011] S6. Using point A1 as a base point, define the cap opening A1F1; connect F1 and D1 with an arc to define the cap opening arc; and connect D1 and B1 with an arc to define the cap center arc.

[0012] S7. Draw a straight line in the vertical direction with point B1 as the base point, take B1D2, make the length of B1D2 equal to the length of the arc B1D1 in the cap, and draw a perpendicular line at point D2 that intersects the symmetry line in the cap as point C2;

[0013] S8. Make the finished hat according to the hat sample drawing.

[0014] Furthermore, in S2, b3c3 is smaller than (b1c1+b2c2).

[0015] Furthermore, the b3c3 is 4 to 6 cm, and (b1c1+b2c2) is 5 to 7 cm.

[0016] Furthermore, the angles of α and β are 9 to 13°, and the angle of γ is 14 to 22°.

[0017] Furthermore, the hat pattern making method according to claim 1 is characterized in that the arc shapes of the hat brim arc line, the hat middle arc line and the hat bottom arc line are round and smooth in accordance with the design.

[0018] Furthermore, the specific step S6 includes:

[0019] S8.1: The cap center arc, cap opening arc, and cap bottom arc are raised in sequence to form a cap side net sample. The cap center line is raised in sequence and unfolded with the cap center symmetry line as the symmetry axis to form a cap center net sample.

[0020] S8.2: The cap side net sample and the cap middle net sample are added with seam allowance to form a rough sample;

[0021] S8.3: Using the hat side hair sample and hat middle hair sample, extract sample pieces from the fabric to make a finished hat.

[0022] Furthermore, during the extraction process of the clean sample in the cap of S8.1, a warping amount for rounding the arc is set at point C1 in the cap.

[0023] Furthermore, the S8.2 specifically includes adding a 1 cm seam allowance to each edge of the hat side net sample and the hat middle net sample to form a rough sample.

[0024] Furthermore, a hat produced by the hat plate making method is provided.

[0025] Furthermore, the hat made by the plate making method is applied to down jackets.

[0026] Beneficial Effects: Compared with the prior art, the present invention has the following significant advantages: 1. The present invention uses the method of cutting and spreading to perform structural drawing, and increases the looseness of the cap opening by controlling the sizes of the α, β, and γ angles to adjust the size of the cap opening. During the sewing process, the cap opening deviates outward, allowing a certain amount of movement with the neck, solving the problem of neck entrapment, making the wearer more comfortable, and the neck movement is not restricted without affecting the warmth retention function;

[0027] 2. Through the adjustment of specific proportions, the looseness of the hat brim adjusted with the optimal ratio will produce the best amount of movement with the human neck, so that the neck movement is not restricted and the hat is more comfortable to wear. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 Schematic diagram of the traditional hat-making method and the finished product.

[0029] Figure 2 This is a sample schematic diagram of step S1.

[0030] Figure 3 This is a sample schematic diagram of step S2.

[0031] Figure 4 This is a sample diagram of steps S3-S5.

[0032] Figure 5 A sample diagram of steps S6-7

[0033] Figure 6 Schematic diagram of the extracted cap side and the net sample in the cap.

[0034] Figure 7 Schematic diagram of the prepared hair samples on the side of the cap and in the cap.

[0035] Figure 8 Schematic diagram of the prepared finished hat. DETAILED DESCRIPTION

[0036] The technical solution of the present invention will be further described below with reference to the accompanying drawings.

[0037] A hat pattern making method according to this embodiment includes the following steps:

[0038] like Figure 2 As shown, step S1, set the neckline as point A1, draw a horizontal line of equal length of the front neckline with point A1 as the starting point, and divide it into three equal parts, and set the first dividing point as a1.

[0039] like Figure 3As shown, step S2, extend the first equally divided point a1 by 15 cm to b1, draw a perpendicular line b1c1 from b1 to A1b1, connect a1c1, and the angle ∠b1a1c1 is α; select point a2 on a1c1 so that a1a2=A1a1, extend from a2 by 15 cm to b2, draw a perpendicular line b2c2, connect a2c2, and the angle ∠b2a2c2 is β; select point a3 on a2c2 so that a2a3=A1a1, extend from a3 by 15 cm to b3, draw a perpendicular line b3c3, and the angle ∠b3a3c3 is γ;

[0040] The purpose of the setting here is that the angle α can control the looseness 1 from the neck shoulder point to the collar point to the top of the hat, the angle β can control the looseness 2 of the top of the hat, and the angle γ can control the state of the entire hat. The larger the angle γ, the longer the hat opening and the more the hat is offset to the back; the smaller the angle γ, the shorter the hat opening and the more the hat is offset to the front. Among them, b3c3 is less than (b1c1+b2c2). As a preferred solution, the optimal value range of b3c3 is 4 to 6 cm, and the optimal value range of (b1c1+b2c2) is 5 to 7 cm. Moreover, when the angles of α and β are 9 to 13° and the angle of γ is 14 to 22°, the looseness of the hat opening will produce the optimal amount of movement with the human neck, so that the neck movement is not restricted and the hat is more comfortable to wear.

[0041] like Figure 4 As shown, step S3, take point C1 at a3c3, make a3C1 equal to 1 / 2 of the back collar circumference, draw a perpendicular line from point C1 to a3c3, and this line is the symmetry line of the hat center; align the structure diagram with the symmetry line of the hat center as the vertical line, formulate the hat center B1C1, and connect A1 and B1 with an arc to formulate the hat bottom arc A1B1.

[0042] Step S4: Determine the collar and shoulder coincident point P on the hat base arc line A1B1, and draw the hat height PQ in the vertical direction of the point P; draw a line A1D parallel to PQ in the vertical direction of the point A1 to determine the hat width.

[0043] Step S5: Divide the hat height into l1, l2, l3, and l4 from top to bottom; cut and expand at l3 and l4 to adjust the size of the hat brim and hat opening; the intersection of l2 and A1D is D1.

[0044] like Figure 5 As shown, step S6, taking the A1 point as the base point, formulate the cap opening A1F1, connect F1 and D1 with arcs to formulate the cap opening arc, and connect D1 and B1 with arcs to formulate the cap middle arc; wherein the arc shapes of the cap opening arc, the cap middle arc and the cap bottom arc should be round and smooth in accordance with the design.

[0045] Step S7: Draw a straight line in the vertical direction with point B1 as the base point, take B1D2, make the length of B1D2 equal to the length of the arc line B1D1 in the cap, and draw a perpendicular line at point D2 that intersects the symmetry line in the cap as point C2;

[0046] Step S8: making a finished hat according to the hat sample drawing, specifically comprising the following steps:

[0047] like Figure 6 As shown, step S8.1: The cap center arc line, the cap opening arc line, and the cap bottom arc line are sequentially extracted to form a cap side net sample. The cap center line is sequentially extracted and unfolded with the cap center symmetry line as the symmetry axis 4 to form a cap center net sample. In a specific embodiment, when extracting the cap center net sample, a warping amount 5 for arc smoothing is set at point C1. The extracted net samples include a left cap side net sample 6, a right cap side net sample 7, and a cap center net sample 8.

[0048] like Figure 7 As shown, step S8.2: seam allowances 12 are added to the hat side net sample and the hat middle net sample to form a rough sample. In a specific embodiment, a 1 cm seam allowance 12 is added to each side of the hat side net sample and the hat middle net sample to form a rough sample. The rough sample includes a left hat side rough sample 9, a right hat side rough sample 10, and a hat middle rough sample 11.

[0049] like Figure 8 As shown, step S8.3: using the hat side hair sample and the hat middle hair sample to extract sample pieces from the fabric to make a finished hat.

[0050] Furthermore, a hat produced using the aforementioned hat pattern making method is provided, and the hat produced using the aforementioned pattern making method is applied to down clothing. The finished hat, produced using the pattern making method of the present invention, has a loose brim that allows for optimal neck mobility, unrestricting neck movement and making the hat more comfortable to wear. When applied to down clothing, the hat does not get stuck around the neck, providing warmth, wind protection, and enhanced comfort.

Claims

1. A method for making a hat pattern, characterized in that: The following steps are involved: S1. Set the neckline as point A1. Draw a horizontal line of equal length around the front neckline starting from point A1 and divide it into three equal parts. Set the first dividing point as a1. S2. Extend 15 cm from the first bisection point a1 to b1, draw a perpendicular line b1c1 from b1 to A1b1, connect a1c1, and the angle ∠b1a1c1 is α; select point a2 on a1c1 so that a1a2 = A1a1, extend 15 cm from a2 to b2, draw a perpendicular line b2c2, connect a2c2, and the angle ∠b2a2c2 is β; select point a3 on a2c2 so that a2a3 = A1a1, extend 15 cm from a3 to b3, draw a perpendicular line b3c3, and the angle ∠b3a3c3 is γ; S3. Take point C1 at a3c3, making a3C1 equal to 1 / 2 of the back collar circumference. Draw a perpendicular line from point C1 to a3c3, which is the symmetry line of the hat center. Align the structure diagram with the symmetry line of the hat center as the vertical line, and draw the hat center B1C1. Connect A1 and B1 with an arc to draw the hat bottom arc A1B1. S4. Determine the point P where the collar and shoulder meet on the arc line A1B1 of the hat base. The hat height PQ is drawn vertically from point P. A line A1D parallel to PQ is drawn vertically from point A1 to determine the hat width. S5. Divide the cap height into l1, l2, l3, and l4 from top to bottom; cut and expand at l3 and l4; the intersection of l2 and A1D is D1; S6. Using point A1 as a base point, define the cap opening A1F1; connect F1 and D1 with an arc to define the cap opening arc; and connect D1 and B1 with an arc to define the cap center arc. S7. Draw a straight line in the vertical direction with point B1 as the base point, take B1D2, make the length of B1D2 equal to the length of the arc B1D1 in the cap, and draw a perpendicular line at point D2 that intersects the symmetry line in the cap as point C2; S8. Make the finished hat according to the hat sample drawing.

2. The hat plate making method according to claim 1, characterized in that: In S2, b3c3 is smaller than the sum of b1c1 and b2c2.

3. The hat pattern making method according to claim 2, characterized in that: The b3c3 is 4 to 6 cm, and the sum of b1c1 and b2c2 is 5 to 7 cm.

4. The hat pattern making method according to claim 1, wherein: The angles of α and β are 9 to 13°, and the angle of γ is 14 to 22°.

5. The hat pattern making method according to claim 1, characterized in that: The hat pattern making method according to claim 1 is characterized in that the arc shapes of the hat brim arc line, the hat middle arc line and the hat bottom arc line are round and smooth and conform to the design.

6. The hat pattern making method according to claim 1, characterized in that: The specific steps of S8 include: S8.1: The cap center arc, cap opening arc, and cap bottom arc are raised in sequence to form a cap side net sample. The cap center line is raised in sequence and unfolded with the cap center symmetry line as the symmetry axis to form a cap center net sample. S8.2: The hat side net sample and the hat middle net sample are added with seam allowance to form a rough sample; S8.3: Using the hat side hair sample and hat middle hair sample, extract sample pieces from the fabric to make a finished hat.

7. The hat pattern making method according to claim 6, characterized in that: During the extraction of the clean sample in the cap of S8.1, a warping amount for smoothing the arc is set at point C1 in the cap.

8. The hat pattern making method according to claim 6, characterized in that: The S8.2 specifically includes adding a 1 cm seam allowance to each edge of the hat side net sample and the hat middle net sample to form a rough sample.

9. A hat produced by the hat pattern making method according to any one of claims 1 to 8.

10. A hat according to claim 9, characterized in that: Used in down jackets.

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