A system control device for a methanation reaction system

Abstract

This application discloses a system control device for a methanation reaction system. The device includes: a methanation reaction system, a distributed control system (DCS), and an advanced control system (ADAS). The DCS is used to collect real-time flow values ​​of the feed gas after passing through the main flow control valve and the slave flow control valve, the temperature value of the first gas after passing through the first reactor, and the temperature value of the second gas after passing through the second reactor, and to send the real-time flow values, the first gas temperature value, and the second gas temperature value to the ADAS. The ADAS is used to determine the valve opening degrees of the main flow control valve and the slave flow control valve based on the real-time flow values ​​of the feed gas, determine the valve opening degree of the distribution valve based on the second gas temperature value, and determine the valve opening degrees of the anti-surge valve and the guide vane valve based on the first gas temperature value. Applying the solution provided in this application embodiment enables precise control of the methanation reaction system, thereby ensuring that the quality of the finished gas meets process requirements.

Description

Technical Field

[0001] This application relates to the field of methanation reaction technology, and more specifically, to a system control device for a methanation reaction system. Background Technology

[0002] In the actual production process of the methanation reaction system, due to the instability of the quality of the gasification feedstock and the degree of reaction, as well as the frequent occurrence of abnormal faults in the process, various production parameters (gas flow rate, system temperature, etc.) are often in flux.

[0003] In known methanation reaction system control processes, process controls are often unable to adapt to changes in operating conditions, or are entirely manual. This leads to significant deviations in control results due to variations in actual operating conditions, making it impossible to guarantee the normal operation of the reaction system and resulting in the finished gas quality failing to meet process requirements. Therefore, how to accurately control the methanation reaction system to ensure that the finished gas quality meets process requirements has become an urgent technical problem to be solved. Summary of the Invention

[0004] This application provides a system control device for a methanation reaction system to precisely control the methanation reaction system, thereby ensuring that the quality of the finished gas meets process requirements. The specific technical solution is as follows.

[0005] This application provides a system control device for a methanation reaction system, the device comprising: a methanation reaction system, a distributed control system, and an advanced control system; the distributed control system is connected to both the methanation reaction system and the advanced control system.

[0006] The methanation reaction system includes at least: a flow control main valve, a flow control slave valve, a first reactor, a second reactor, a distribution valve, a circulating compressor, an anti-surge valve, and a guide vane valve; the inlets of the flow control main valve and the flow control slave valve are both connected to upstream units via gas pipelines; the outlets of the flow control main valve and the flow control slave valve are both connected to the inlet of the first reactor via gas pipelines; the outlets of the flow control main valve and the flow control slave valve are both connected to the inlet of the distribution valve via gas pipelines; and the outlet of the distribution valve and the outlet of the first reactor are both connected to the inlet of the second reactor via gas pipelines. The pipelines are connected; the outlet of the second reactor is connected to the inlet of the guide vane valve and the outlet of the anti-surge valve via a gas pipeline; the outlet of the guide vane valve is connected to the inlet of the circulating compressor via a gas pipeline, and the outlet of the circulating compressor is connected to the inlet of the anti-surge valve and the inlet of the first reactor via a gas pipeline; the valve size of the main flow control valve is larger than the valve size of the slave flow control valve; the valve size of the guide vane valve is larger than the valve size of the anti-surge valve; the upstream device is used to transport the raw material gas to the first reactor and the second reactor through the main flow control valve and the slave flow control valve;

[0007] The distributed control system is used to collect the real-time flow value of the raw gas after passing through the flow control main valve and the flow control slave valve, the first gas temperature value after passing through the first reactor, and the second gas temperature value after passing through the second reactor, and to send the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value to the advanced control system.

[0008] The advanced control system is used to acquire the real-time flow rate of the raw gas, the first gas temperature, and the second gas temperature, and to determine the valve opening of the flow control main valve and the flow control slave valve based on the real-time flow rate of the raw gas, to determine the valve opening of the distribution valve based on the second gas temperature, and to determine the valve opening of the anti-surge valve and the guide vane valve based on the first gas temperature.

[0009] Optionally, the advanced control system includes: a master-slave valve flow control model, a reactor temperature control model, and a flow ratio control model;

[0010] The master-slave valve flow control model is used to determine the valve opening of the flow control master valve and the flow control slave valve based on the real-time flow value of the raw gas.

[0011] The reactor temperature control model is used to determine the valve opening of the distribution valve based on the second gas temperature value.

[0012] The flow ratio control model is used to determine the valve opening degree of the anti-surge valve and the guide vane valve based on the first gas temperature value.

[0013] Optionally, the master-slave valve flow control model is specifically used for:

[0014] When the real-time flow rate of the raw gas is greater than or equal to the upper limit of the preset range, the flow control slave valve is closed; when the difference between the current opening of the flow control slave valve and the preset lower limit of the slave valve opening is less than or equal to the preset first opening threshold, the flow control main valve is closed.

[0015] When the real-time flow rate of the raw gas is less than or equal to the lower limit of the preset range, the flow control slave valve is opened. When the difference between the current opening degree of the flow control slave valve and the preset upper limit of the slave valve opening degree is less than or equal to the preset second opening degree threshold, the flow control main valve is opened.

[0016] Optionally, the reactor temperature control model is specifically used for:

[0017] When the temperature of the second gas is greater than or equal to the upper limit of the preset temperature range, the distribution valve is closed.

[0018] When the temperature of the second gas is less than or equal to the lower limit of the preset temperature range, the distribution valve is opened wider.

[0019] Optionally, the flow ratio control model is specifically used for:

[0020] When the temperature of the first gas is greater than or equal to the upper limit of the preset temperature range, the anti-surge valve is closed; when the difference between the current opening of the anti-surge valve and the lower limit of the preset anti-surge valve opening is less than or equal to the preset third opening threshold, the guide vane valve is closed.

[0021] When the temperature of the first gas is less than or equal to the upper limit of the preset temperature range, the anti-surge valve is opened wider. When the difference between the current opening degree of the anti-surge valve and the preset upper limit of the anti-surge valve opening degree is less than or equal to the preset fourth opening degree threshold, the guide vane valve is opened wider.

[0022] Optionally, the advanced control system is further configured to send the valve opening of the flow control main valve and the flow control slave valve, the valve opening of the distribution valve, and the valve opening of the anti-surge valve and the guide vane valve to the distributed control system.

[0023] The distributed control system is further configured to receive the valve openings of the main flow control valve and the slave flow control valve, the valve opening of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve, and to control each valve accordingly based on the valve openings of the main flow control valve and the slave flow control valve, the valve opening of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve.

[0024] Optionally, the distributed control system and the advanced control system communicate with each other based on the real-time data interface OPC protocol.

[0025] In this embodiment, multiple relevant parameters can be collected through a distributed control system during the operation of the methanation reaction system. Specifically, the real-time flow rate of the raw gas after passing through the main flow control valve and the slave flow control valve, the temperature of the first gas after passing through the first reactor, and the temperature of the second gas after passing through the second reactor can be collected. It can be understood that during the operation of the methanation reaction system, the above parameters can reflect the gas flow and system temperature in the entire system. Therefore, in this embodiment, by collecting the above three parameters, the operating status of each device in the entire reaction system can be obtained. Furthermore, based on the advanced control system, the valve opening of the main flow control valve, the slave flow control valve, the distribution valve, the anti-surge valve, and the guide vane valve can be automatically determined according to the real-time flow rate of the raw gas, the first gas temperature, and the second gas temperature. In other words, the opening and closing degree of each valve can be automatically adjusted according to the acquired parameters, so that the corresponding parameters after adjustment are within the set range, thereby ensuring that the quality of the finished gas meets the process requirements. Attached Figure Description

[0026] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the accompanying drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are merely some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without any creative effort.

[0027] Figure 1 A schematic diagram of a system control device for a methanation reaction system provided in this application embodiment;

[0028] Figure 2 This is a schematic diagram of the structure of the methanation reaction system provided in the embodiments of this application;

[0029] Figure 3 This is another schematic diagram of a system control device for a methanation reaction system provided in an embodiment of this application. Detailed Implementation

[0030] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0031] It should be noted that the terms "comprising" and "having," and any variations thereof, in the embodiments and accompanying drawings of this application are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or device that includes a series of steps or units is not limited to the steps or units listed, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to these processes, methods, products, or devices.

[0032] This application discloses a system control device for a methanation reaction system to precisely control the methanation reaction system, thereby ensuring that the quality of the finished gas meets process requirements. The embodiments of this application are described in detail below.

[0033] Figure 1 This application provides a schematic diagram of the structure of a system control device for a methanation reaction system, as shown in the embodiment of the present application. Figure 1 As shown, the equipment includes: a methanation reaction system, a distributed control system, and an advanced control system; the distributed control system is connected to both the methanation reaction system and the advanced control system. The distributed control system and the advanced control system can be connected via wired or wireless means, which is also possible.

[0034] Among them, such as Figure 2The diagram illustrates a structural schematic of a methanation reaction system provided in this application embodiment. This methanation reaction system may include at least: a flow control main valve (valve A), a flow control slave valve (valve B), a first reactor, a second reactor, a distribution valve, a circulating compressor, an anti-surge valve, and a guide vane valve. The inlets of both the flow control main valve and the flow control slave valve are connected to upstream devices via gas pipelines. The outlets of both the flow control main valve and the flow control slave valve are connected to the inlet of the first reactor via gas pipelines. The outlets of both the flow control main valve and the flow control slave valve are connected to the inlet of the distribution valve via gas pipelines. The outlet of the distribution valve is connected to the first reactor... The outlet of reactor #1 is connected to the inlet of reactor #2 via a gas pipeline; the outlet of reactor #2 is connected to the inlet of the guide vane valve and the outlet of the anti-surge valve via a gas pipeline; the outlet of the guide vane valve is connected to the inlet of the circulating compressor via a gas pipeline, and the outlet of the circulating compressor is connected to the inlet of the anti-surge valve and the inlet of reactor #1 via a gas pipeline; the valve size of the main flow control valve is larger than that of the slave flow control valve; the valve size of the guide vane valve is larger than that of the anti-surge valve; the upstream device is used to transport the raw material gas to reactor #1 and reactor #2 via the main flow control valve and the slave flow control valve.

[0035] The distributed control system (DCS) is used to collect the real-time flow rate of the raw gas after passing through the main flow control valve and the slave flow control valve, the temperature of the first gas after passing through the first reactor, and the temperature of the second gas after passing through the second reactor, and then send the real-time flow rate of the raw gas, the temperature of the first gas and the temperature of the second gas to the advanced control system.

[0036] The Advanced Process Control (APC) system is used to acquire the real-time flow rate of the raw gas, the temperature of the first gas, and the temperature of the second gas. Based on the real-time flow rate of the raw gas, it determines the valve opening of the main flow control valve and the slave flow control valve. Based on the second gas temperature, it determines the valve opening of the distribution valve. Based on the first gas temperature, it determines the valve opening of the anti-surge valve and the guide vane valve.

[0037] like Figure 1 As shown, a flow meter can be installed after valves A and B to measure the flow rate of the raw gas after passing through valves A and B. A thermometer can be installed after reactor #1 and reactor #2 to measure the gas temperature after passing through reactor #1 and reactor #2, respectively.

[0038] It is understandable that the feed gas flow rate reflects the feed gas flow rate entering the system. Normally, to ensure normal system operation, the feed gas flow rate needs to be controlled within a certain range. The reactor is an exothermic reaction; the gas temperature after passing through reactors #1 and #2 characterizes the intensity of the gas reaction within the reactor. The greater the gas reaction intensity, the higher the gas temperature after passing through the reactor.

[0039] Figure 2 The control scheme for the system shown is as follows:

[0040] The flow rate of raw material gas entering the system is jointly controlled by valves A and B. Valve A, a large valve, is responsible for coarse adjustment and has a significant impact on the flow rate; it generally only activates when there are large changes in flow. Valve B, a small valve, is suitable for precise adjustment and is primarily used for regulation in daily production. Furthermore, valve B has a valve position control range; its control effectiveness decreases sharply beyond this range. In this system, valve B controls the flow rate, and its valve position adjustment range is set. Valve A acts as an auxiliary control valve to valve B; its valve position has a several times greater impact on the flow rate than valve B's, and therefore, valve A directly controls valve B's valve position range.

[0041] When the flow rate increases, valve B closes slightly, while valve A remains inactive. When valve B closes close to its lower limit, valve A actuates prematurely, closing by a certain threshold. This directly and significantly reduces the flow rate. Upon detecting this decrease, valve B stops closing and opens wider, maintaining its position within the upper and lower limits. Similarly, when the flow rate decreases, valve B opens wider, while valve A remains inactive. When valve B approaches its upper limit, valve A opens wider. After a substantial increase in flow rate, valve B adjusts its position, maintaining it within the appropriate range. This results in more stable flow control.

[0042] The No. 1 methanation synthesis reactor and the No. 2 methanation synthesis reactor are regarded as a whole. The reactor outlet temperature is controlled by the inlet flow control valve (distribution valve) of the No. 2 main reactor, the anti-surge valve of the circulating compressor, and the guide vane valve of the circulating compressor to maintain the stable reaction in the reactor.

[0043] The methanation synthesis reaction is exothermic. When the outlet temperature of reactor #2 increases, the inlet valve (distribution valve) of the main reactor #2 should be closed slightly, while simultaneously controlling the outlet temperature of reactor #1. Closing the inlet valve of reactor #2 will increase the flow rate of fresh feed gas into the main reactor #1, causing the outlet temperature of reactor #1 to increase. Therefore, it is necessary to adjust the guide vane valve and anti-surge valve of the circulating compressor to increase the amount of circulating gas entering reactor #1, thereby reducing the reaction intensity of reactor #1, lowering its outlet temperature, and balancing the overall system reaction temperature.

[0044] Similarly, when the outlet temperature of reactor #2 is low, the inlet valve of reactor #2 will be opened wider to increase the amount of fresh gas entering reactor #2, thereby increasing the reaction intensity and raising the outlet temperature of reactor #2. At the same time, opening the inlet valve of reactor #2 will reduce the amount of fresh gas entering reactor #1, causing its reaction temperature to drop. This necessitates reducing the amount of recirculated gas entering reactor #1, thus raising its reaction temperature and balancing the temperature of the entire system.

[0045] The circulating gas flow rate is jointly controlled by the circulating compressor guide vane valve and the anti-surge valve. Similar to an A / B valve jointly controlling the flow, the anti-surge valve primarily controls the flow, while the guide vane valve maintains the anti-surge valve at the appropriate position. This allows for precise adjustment of the circulating gas volume while meeting the anti-surge curve requirements. First, process engineers set the valve positions of the anti-surge valve and guide vane valve, as well as the upper and lower limits of the circulating gas volume. These limits must be met before adjustment can proceed. When the circulating gas volume needs to be increased, the anti-surge valve is depressed. When the anti-surge valve approaches its lower limit, the guide vane valve actuates prematurely, increasing the circulating compressor's throughput and stabilizing the circulating gas flow rate. When the circulating gas volume needs to be decreased, the anti-surge valve position is increased. When the anti-surge valve approaches its upper limit, the guide vane valve actuates prematurely, decreasing the circulating compressor's throughput and stabilizing the circulating gas flow rate.

[0046] In one implementation, such as Figure 3 As shown, the aforementioned advanced control system may include: a master-slave valve flow control model, a reactor temperature control model, and a flow ratio control model. Furthermore, the distributed control system and the advanced control system can communicate via the OPC real-time data interface protocol.

[0047] The distributed control system (DCS) collects production data from the methanation reaction system and sends it to the advanced control system (ADC) via OPC. Upon receiving the data, the ADC performs calculations based on a pre-set model and transmits the results back to the DCS via OPC. The DCS then transmits commands to the methanation reaction system for execution. The ADC requires a host computer built on top of the DCS. The ADC server connects to the OPC server via a Layer 3 switching network. The DCS exchanges data with the ADC using the OPC protocol, ensuring data and network security.

[0048] The master-slave valve flow control model is used to determine the valve opening of the flow control master valve and the flow control slave valve based on the real-time flow value of the raw gas; the reactor temperature control model is used to determine the valve opening of the distribution valve based on the temperature value of the second gas; and the flow ratio control model is used to determine the valve opening of the anti-surge valve and the guide vane valve based on the temperature value of the first gas.

[0049] The master-slave valve flow control model is specifically used as follows: when the real-time flow rate of the raw material gas is greater than or equal to the upper limit of the preset range, the flow control slave valve is closed; when the difference between the current opening of the flow control slave valve and the preset lower limit of the slave valve opening is less than or equal to the preset first opening threshold, the flow control master valve is closed; when the real-time flow rate of the raw material gas is less than or equal to the lower limit of the preset range, the flow control slave valve is opened; when the difference between the current opening of the flow control slave valve and the preset upper limit of the slave valve opening is less than or equal to the preset second opening threshold, the flow control master valve is opened.

[0050] The reactor temperature control model is specifically used to: close the distribution valve when the temperature of the second gas is greater than or equal to the upper limit of the preset temperature range; and open the distribution valve when the temperature of the second gas is less than or equal to the lower limit of the preset temperature range.

[0051] The flow ratio control model is specifically used for: closing the anti-surge valve when the first gas temperature is greater than or equal to the upper limit of the preset temperature range; closing the guide vane valve when the difference between the current opening of the anti-surge valve and the preset lower limit of the anti-surge valve opening is less than or equal to the preset third opening threshold; opening the anti-surge valve when the first gas temperature is less than or equal to the upper limit of the preset temperature range; and opening the guide vane valve when the difference between the current opening of the anti-surge valve and the preset upper limit of the anti-surge valve opening is less than or equal to the preset fourth opening threshold.

[0052] The advanced control system can also send the valve openings of the main flow control valve and the slave flow control valve, the valve opening of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve to the distributed control system. The distributed control system can receive the valve openings of the main flow control valve and the slave flow control valve, the valve opening of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve, and control each valve accordingly based on these valve openings.

[0053] In this embodiment, multiple relevant parameters can be collected through a distributed control system during the operation of the methanation reaction system. Specifically, the real-time flow rate of the raw gas after passing through the main flow control valve and the slave flow control valve, the temperature of the first gas after passing through the first reactor, and the temperature of the second gas after passing through the second reactor can be collected. It can be understood that during the operation of the methanation reaction system, the above parameters can reflect the gas flow and system temperature in the entire system. Therefore, in this embodiment, by collecting the above three parameters, the operating status of each device in the entire reaction system can be obtained. Furthermore, based on the advanced control system, the valve opening of the main flow control valve, the slave flow control valve, the distribution valve, the anti-surge valve, and the guide vane valve can be automatically determined according to the real-time flow rate of the raw gas, the first gas temperature, and the second gas temperature. In other words, the opening and closing degree of each valve can be automatically adjusted according to the acquired parameters, so that the corresponding parameters after adjustment are within the set range, thereby ensuring that the quality of the finished gas meets the process requirements.

[0054] Those skilled in the art will understand that the accompanying drawings are merely schematic diagrams of one embodiment, and the modules or processes shown in the drawings are not necessarily essential for implementing this application.

[0055] Those skilled in the art will understand that the modules in the apparatus of the embodiments can be distributed in the apparatus of the embodiments as described in the embodiments, or they can be located in one or more devices different from this embodiment with corresponding changes. The modules of the above embodiments can be combined into one module, or they can be further divided into multiple sub-modules.

[0056] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of this application.

Claims

1. A system control device for a methanation reaction system, characterized in that, The equipment includes: a methanation reaction system, a distributed control system, and an advanced control system; the distributed control system is connected to both the methanation reaction system and the advanced control system. The methanation reaction system includes at least: a flow control main valve, a flow control slave valve, a first reactor, a second reactor, a distribution valve, a circulating compressor, an anti-surge valve, and a guide vane valve; the inlets of the flow control main valve and the flow control slave valve are both connected to upstream units via gas pipelines; the outlets of the flow control main valve and the flow control slave valve are both connected to the inlet of the first reactor via gas pipelines; the outlets of the flow control main valve and the flow control slave valve are both connected to the inlet of the distribution valve via gas pipelines; and the outlet of the distribution valve and the outlet of the first reactor are both connected to the inlet of the second reactor via gas pipelines. The pipelines are connected; the outlet of the second reactor is connected to the inlet of the guide vane valve and the outlet of the anti-surge valve via a gas pipeline; the outlet of the guide vane valve is connected to the inlet of the circulating compressor via a gas pipeline, and the outlet of the circulating compressor is connected to the inlet of the anti-surge valve and the inlet of the first reactor via a gas pipeline; the valve size of the main flow control valve is larger than the valve size of the slave flow control valve; the valve size of the guide vane valve is larger than the valve size of the anti-surge valve; the upstream device is used to transport the raw material gas to the first reactor and the second reactor through the main flow control valve and the slave flow control valve; The distributed control system is used to collect the real-time flow value of the raw gas after passing through the flow control main valve and the flow control slave valve, the first gas temperature value after passing through the first reactor, and the second gas temperature value after passing through the second reactor, and to send the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value to the advanced control system. The advanced control system is used to acquire the real-time flow rate of the raw gas, the first gas temperature, and the second gas temperature, and to determine the valve opening of the flow control main valve and the flow control slave valve based on the real-time flow rate of the raw gas, to determine the valve opening of the distribution valve based on the second gas temperature, and to determine the valve opening of the anti-surge valve and the guide vane valve based on the first gas temperature.

2. The device according to claim 1, characterized in that, The advanced control system includes: a master-slave valve flow control model, a reactor temperature control model, and a flow ratio control model; The master-slave valve flow control model is used to determine the valve opening of the flow control master valve and the flow control slave valve based on the real-time flow value of the raw gas. The reactor temperature control model is used to determine the valve opening of the distribution valve based on the second gas temperature value. The flow ratio control model is used to determine the valve opening degree of the anti-surge valve and the guide vane valve based on the first gas temperature value.

3. The device according to claim 2, characterized in that, The master-slave valve flow control model is specifically used for: When the real-time flow rate of the raw gas is greater than or equal to the upper limit of the preset range, the flow control slave valve is closed; when the difference between the current opening of the flow control slave valve and the preset lower limit of the slave valve opening is less than or equal to the preset first opening threshold, the flow control main valve is closed. When the real-time flow rate of the raw gas is less than or equal to the lower limit of the preset range, the flow control slave valve is opened. When the difference between the current opening degree of the flow control slave valve and the preset upper limit of the slave valve opening degree is less than or equal to the preset second opening degree threshold, the flow control main valve is opened.

4. The device according to claim 2, characterized in that, The reactor temperature control model is specifically used for: When the temperature of the second gas is greater than or equal to the upper limit of the preset temperature range, the distribution valve is closed. When the temperature of the second gas is less than or equal to the lower limit of the preset temperature range, the distribution valve is opened wider.

5. The device according to claim 2, characterized in that, The flow ratio control model is specifically used for: When the temperature of the first gas is greater than or equal to the upper limit of the preset temperature range, the anti-surge valve is closed; when the difference between the current opening of the anti-surge valve and the lower limit of the preset anti-surge valve opening is less than or equal to the preset third opening threshold, the guide vane valve is closed. When the temperature of the first gas is less than or equal to the upper limit of the preset temperature range, the anti-surge valve is opened wider. When the difference between the current opening degree of the anti-surge valve and the preset upper limit of the anti-surge valve opening degree is less than or equal to the preset fourth opening degree threshold, the guide vane valve is opened wider.

6. The device according to any one of claims 1-5, characterized in that, The advanced control system is also used to send the valve opening of the flow control main valve and the flow control slave valve, the valve opening of the distribution valve, and the valve opening of the anti-surge valve and the guide vane valve to the distributed control system. The distributed control system is further configured to receive the valve openings of the main flow control valve and the slave flow control valve, the valve opening of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve, and to control each valve accordingly based on the valve openings of the main flow control valve and the slave flow control valve, the valve opening of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve.

7. The device according to any one of claims 1-5, characterized in that, The distributed control system and the advanced control system communicate with each other based on the real-time data interface OPC protocol.

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