Photoelectric comprehensive test platform with nanoscale regulation and control precision

Abstract

The invention provides a photoelectric comprehensive test platform with nanoscale regulation and control precision, and the platform comprises the following structures: a base station, a first guide rail is detachably clamped in the middle of the right side of the base station, the top of the first guide rail is slidably connected with a first sliding seat, and the top of the first sliding seat is fixedly provided with a deflection seat; the middle of the middle shaft is movably sleeved with a plurality of shaft rings in the axial direction, second guide rails are fixedly arranged on the outer sides of the shaft rings, telescopic rods are fixedly arranged at the bottoms of the second guide rails, and the middle shaft is matched with the shaft rings, so that a user can conveniently adjust the deflection positions of the second guide rails outside the shaft rings according to use requirements; the first sliding seat is matched with the first locking bolt to finish rough adjustment of the working position of the radio frequency probe, the second sliding seat is matched with the second locking bolt to finish rough adjustment of the working position of the second sliding seat on the second guide rail, and the three-coordinate high-precision sliding table or the double-coordinate high-precision sliding table is matched to perform fine adjustment on the working position of the radio frequency probe on the objective table to finish nanoscale regulation and control of the device.

Description

Technical Field

[0001] The present invention mainly relates to the field of optoelectronic testing, and in particular to an optoelectronic integrated testing platform with nanometer-level control accuracy. Background Art

[0002] The optoelectronic testing platform converts optical signals into electrical signals through the principle of photoelectric effect, contacts the sample under test through radio frequency probes, and then passes through the signal processing and analysis system to complete the testing and evaluation of key performance indicators such as the responsiveness, sensitivity, and spectral response of the optoelectronic devices of the sample under test.

[0003] The current optoelectronic testing platform needs to be adjusted on the base when placing equipment such as radio frequency probes. Generally, the existing assembly mode chooses to drill holes on the base and fix the required three-coordinate high-precision slide or dual-coordinate high-precision slide on the base. However, due to the limitation of the drilling position, there is a technical problem of inconvenient position adjustment during the inspection of the sample under test.

[0004] The inventor proposed an optoelectronic integrated testing platform with nanometer-level control accuracy. Two setting modes, coarse adjustment and fine adjustment, are selected to achieve the nanometer-level control accuracy of the radio frequency probe of the equipment. At the same time, the coordination of the shaft ring and the central axis is adopted to complete the surround design of the radio frequency probe on the object under test. Summary of the invention

[0005] 1. Problems to be solved by the invention: The present invention provides an optoelectronic integrated testing platform with nanometer-level control accuracy, which is used to solve the technical problem of inconvenient position adjustment of the existing equipment mentioned in the above background technology.

[0006] 2. Technical solution: To achieve the above object, the technical solution provided by the present invention is: an optoelectronic integrated test platform with nanometer-level control accuracy, comprising the following structure: A base, wherein a first guide rail is detachably connected to the middle portion of the right side of the base, a first slide seat is slidably connected to the top of the first guide rail, and a deflection seat is fixedly arranged on the top of the first slide seat.

[0007] A central axis, wherein a plurality of shaft rings are sleeved in the middle of the central axis in an axially movable manner, a second guide rail is fixedly disposed on the outer side of the shaft ring, and a telescopic rod is fixedly disposed on the bottom of the second guide rail.

[0008] Furthermore, the bottom of the central axis is interference fit with the middle of the base, and a loading platform is fixedly provided on the top of the central axis.

[0009] Furthermore, a first locking bolt is threadedly connected to the right side of the first sliding seat, and a left side of the first locking bolt abuts against a right side of the first guide rail.

[0010] Furthermore, a deflection locking bolt is movably connected to the top of the deflection seat, a guide rod is sleeved in the middle of the deflection locking bolt, a lifting slide is sleeved on the top of the guide rod, the outer side of the lifting slide is threadedly connected to the lifting locking bolt, one end of the lifting locking bolt is in contact with the outer side of the guide rod, a microscope is inserted at the front end of the lifting slide, and an adjustment locking bolt is threadedly connected to the front end of the lifting slide, and one end of the adjustment locking bolt is in contact with the outer side of the microscope shell.

[0011] Furthermore, the outer side of the collar is threadedly connected with a rotation locking bolt, and one end of the rotation locking bolt abuts against the outer side of the central shaft.

[0012] Furthermore, a second slide seat is slidably connected to the outer side of the second guide rail, a second locking bolt is threadedly connected to the right side of the second slide seat, and a left side of the second locking bolt abuts against the right side of the second guide rail.

[0013] A three-coordinate high-precision slide and / or a dual-coordinate high-precision slide is fixedly provided on the top of the second slide seat, a mounting frame is fixedly provided on the top of the three-coordinate high-precision slide, the mounting frame cooperates with the dual-coordinate high-precision slide, a radio frequency probe is fixedly provided on the bottom of the mounting frame, and the radio frequency probe extends to the top of the stage.

[0014] 3. Beneficial effects: Compared with the prior art, the technical solution provided by the present invention has the following beneficial effects: The present invention provides an optoelectronic integrated testing platform with nanometer-level control accuracy. The cooperation between the central axis and the shaft ring facilitates the user to adjust the deflection position of the second guide rail outside each shaft ring according to the use needs, and completes the coarse adjustment of the working position of the radio frequency probe. The second lifting slide and the second locking bolt cooperate to complete the coarse adjustment of the working position of the second lifting slide on the second guide rail, and cooperate with the three-coordinate high-precision slide or the dual-coordinate high-precision slide to fine-tune the working position of the radio frequency probe on the stage, thereby completing the nanometer-level control of the device.

[0015] The parts not involved in the device are the same as those in the prior art or can be implemented by using the prior art. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 A three-dimensional diagram of the structure of the present invention; Figure 2 A three-dimensional diagram of the machine structure of the present invention; Figure 3 For the present invention Figure 2 A magnified view of the structure at center A; Figure 4 is a three-dimensional diagram of the collar structure of the present invention; Figure 5 is a three-dimensional diagram of a second guide rail structure of the present invention; Figure 6 is a three-dimensional diagram of the central axis structure of the present invention; Figure 7 For the present invention Figure 6 A magnified view of the structure at B in the middle.

[0017] Reference numerals: Abutment-1; Central axis-2; stage-21; First guide rail-3; first slide seat-31; first locking bolt-32; Deflection seat-4; deflection locking bolt-41; guide rod-42; lifting slide-43; lifting locking bolt-44; microscope-45; adjustment locking bolt-46; Collar - 5; Rotary locking bolt - 51; Second guide rail-6; telescopic rod-61; second slide seat-62; second locking bolt-63; Three-coordinate high-precision slide-7; Dual-coordinate high-precision slide-8; Mounting frame-9; RF probe-91. DETAILED DESCRIPTION

[0018] To facilitate understanding of the present invention, the present invention will be described more comprehensively below with reference to the relevant drawings. Several embodiments of the present invention are shown in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thorough and comprehensive.

[0019] It should be noted that when an element is referred to as being "fixed on" another element, it may be directly on the other element or there may also be a central element; when an element is considered to be "connected to" another element, it may be directly connected to the other element or there may also be a central element; the terms "vertical", "horizontal", "left", "right" and similar expressions used in this article are for illustrative purposes only.

[0020] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by technicians in the technical field to which the present invention belongs; the terms used in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention; the term "and / or" used herein includes any and all combinations of one or more related listed items. Example

[0021] Reference Figure 1-7 , an optoelectronic integrated test platform with nanometer-level control accuracy, including the following structure: The base 1 has a first guide rail 3 detachably connected to the middle of the right side of the base 1 , a first slide seat 31 is slidably connected to the top of the first guide rail 3 , and a deflection seat 4 is fixedly arranged on the top of the first slide seat 31 .

[0022] The middle part of the middle shaft 2 is provided with a plurality of shaft rings 5 ​​which are movably sleeved along the axial direction. The outer side of the shaft ring 5 is fixedly provided with a second guide rail 6 . The bottom of the second guide rail 6 is fixedly provided with a telescopic rod 61 .

[0023] In this embodiment, the bottom of the central axis 2 is interference fit with the middle of the base 1 , and a loading platform 21 is fixedly disposed on the top of the central axis 2 .

[0024] The central axis 2 is assembled on the base 1, and the stage 21 is used for placing and processing the sample to be tested.

[0025] In this embodiment, the right side of the first sliding seat 31 is threadedly connected with the first locking bolt 32 , and the left side of the first locking bolt 32 abuts against the right side of the first guide rail 3 .

[0026] The first locking bolt 32 completes the working position adjustment of the first slide 31 on the first guide rail 3 .

[0027] In this embodiment, the top of the deflection seat 4 is movably connected with a deflection locking bolt 41, the middle part of the deflection locking bolt 41 is sleeved with a guide rod 42, the top of the guide rod 42 is sleeved with a lifting slide 43, the outer side of the lifting slide 43 is threadedly connected with a lifting locking bolt 44, one end of the lifting locking bolt 44 is in contact with the outer side of the guide rod 42, the front end of the lifting slide 43 is inserted with a microscope 45, the front end of the lifting slide 43 is threadedly connected with an adjustment locking bolt 46, one end of the adjustment locking bolt 46 is in contact with the outer shell of the microscope 45.

[0028] The deflection locking bolt 41 cooperates with the deflection seat 4 to complete the working position adjustment of the guide rod 42, the lifting slide 43 and the lifting locking bolt 44 cooperate to complete the working height adjustment of the microscope 45, and the adjusting locking bolt 46 completes the working position adjustment of the microscope 45 on the lifting slide 43 to avoid interference between the user and the microscope 45 when taking and placing samples on the stage 21.

[0029] In this embodiment, a rotation locking bolt 51 is threadedly connected to the outer side of the shaft ring 5 , and one end of the rotation locking bolt 51 abuts against the outer side of the central shaft 2 .

[0030] The rotating locking bolt 51 cooperates with the shaft ring 5 to complete the deflection position adjustment of the shaft ring 5 outside the central axis 2. In this embodiment, a second slide seat 62 is slidably connected to the outer side of the second guide rail 6 , a second locking bolt 63 is threadedly connected to the right side of the second slide seat 62 , and a left side of the second locking bolt 63 abuts against the right side of the second guide rail 6 .

[0031] A three-coordinate high-precision slide 7 and / or a dual-coordinate high-precision slide 8 is fixedly provided on the top of the second slide 62. A mounting frame 9 is fixedly provided on the top of the three-coordinate high-precision slide 7. The mounting frame 9 cooperates with the dual-coordinate high-precision slide 8. A radio frequency probe 91 is fixedly provided on the bottom of the mounting frame 9. The radio frequency probe 91 extends to the top of the stage 21.

[0032] The second slide 62 cooperates with the second locking bolt 63 to complete the coarse adjustment of the working position of the second slide 62 on the second guide rail 6, and cooperates with the three-coordinate high-precision slide 7 or the dual-coordinate high-precision slide 8 to fine-tune the working position of the RF probe 91 on the stage 21.

[0033] In this embodiment: The first locking bolt 32 completes the working position adjustment of the first slide 31 on the first guide rail 3, and completes the coarse adjustment of the working position of the microscope 45. The deflection locking bolt 41 cooperates with the deflection seat 4 to complete the working position adjustment of the guide rod 42. The lifting slide 43 and the lifting locking bolt 44 cooperate to complete the working height adjustment of the microscope 45. The adjusting locking bolt 46 completes the working position adjustment of the microscope 45 on the lifting slide 43, which makes it convenient for the microscope 45 to approach the sample to be measured on the stage 21 for observation.

[0034] The cooperation between the central axis 2 and the shaft ring 5 makes it convenient for the user to adjust the deflection position of the second guide rail 6 outside each shaft ring 5 according to the use needs, so as to complete the coarse adjustment of the working position of the radio frequency probe 91. The second slide 62 and the second locking bolt 63 cooperate to complete the coarse adjustment of the working position of the second slide 62 on the second guide rail 6, and cooperate with the three-coordinate high-precision slide 7 or the dual-coordinate high-precision slide 8 to fine-tune the working position of the radio frequency probe 91 on the stage 21 to complete the nanometer-level regulation of this equipment.

[0035] The above-described embodiments only express a certain implementation mode of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the patent scope of the present invention. It should be pointed out that, for ordinary technicians in this field, several modifications and improvements can be made without departing from the concept of the present invention, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be based on the attached claims.

Claims

1. An optoelectronic integrated test platform with nanometer-level control accuracy, characterized by: Includes the following structure: A base (1), wherein a first guide rail (3) is detachably connected to the middle portion of the right side of the base (1), a first slide seat (31) is slidably connected to the top of the first guide rail (3), and a deflection seat (4) is fixedly provided on the top of the first slide seat (31); A central axis (2), wherein a plurality of shaft rings (5) are sleeved movably along the axial direction in the middle of the central axis (2), a second guide rail (6) is fixedly provided on the outer side of the shaft ring (5), and a telescopic rod (61) is fixedly provided on the bottom of the second guide rail (6).

2. The optoelectronic integrated test platform with nanometer-level control accuracy according to claim 1, characterized in that: The bottom of the central axis (2) is interference-fitted with the middle of the base (1), and a loading platform (21) is fixedly provided on the top of the central axis (2).

3. The optoelectronic integrated test platform with nanometer-level control accuracy according to claim 1, characterized in that: The right side of the first sliding seat (31) is threadedly connected to a first locking bolt (32), and the left side of the first locking bolt (32) abuts against the right side of the first guide rail (3).

4. The optoelectronic integrated test platform with nanometer-level control accuracy according to claim 1, characterized in that: The top of the deflection seat (4) is movably connected to a deflection locking bolt (41), the middle of the deflection locking bolt (41) is sleeved with a guide rod (42), the top of the guide rod (42) is sleeved with a lifting slide (43), the outer side of the lifting slide (43) is threadedly connected to a lifting locking bolt (44), one end of the lifting locking bolt (44) contacts the outer side of the guide rod (42), the front end of the lifting slide (43) is plugged with a microscope (45), the front end of the lifting slide (43) is threadedly connected to an adjustment locking bolt (46), one end of the adjustment locking bolt (46) contacts the outer side of the shell of the microscope (45).

5. The optoelectronic integrated test platform with nanometer-level control accuracy according to claim 1, characterized in that: The outer side of the shaft ring (5) is threadedly connected with a rotation locking bolt (51), and one end of the rotation locking bolt (51) abuts against the outer side of the central shaft (2).

6. The optoelectronic integrated test platform with nanometer-level control accuracy according to claim 1, characterized in that: The outer side of the second guide rail (6) is slidably connected to a second slide seat (62), the right side of the second slide seat (62) is threadedly connected to a second locking bolt (63), and the left side of the second locking bolt (63) abuts against the right side of the second guide rail (6); A three-coordinate high-precision slide (7) and / or a dual-coordinate high-precision slide (8) is fixedly provided on the top of the second slide seat (62); a mounting frame (9) is fixedly provided on the top of the three-coordinate high-precision slide (7); the mounting frame (9) cooperates with the dual-coordinate high-precision slide (8); a radio frequency probe (91) is fixedly provided on the bottom of the mounting frame (9); the radio frequency probe (91) extends to the top of the stage (21).

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