An alkali metal vapor generating device
By creating an alkali metal vapor generator with micropores in a quartz glass plate, the problem of unstable alkali metal flow rate is solved by utilizing capillary effect and carrier gas pressure difference, thus achieving stable and efficient generation of alkali metal vapor.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-09-15
- Publication Date
- 2026-04-03
AI Technical Summary
In existing alkali metal vapor generation technologies, the alkali metal flow rate is unstable and cannot be precisely controlled, which easily leads to splashing and changes in the distribution of alkali metals.
An alkali metal vapor generator with an array of micropores on a quartz glass plate utilizes capillary effect to uniformly distribute alkali metal on the glass plate surface. A thin layer is formed by the pressure difference of the carrier gas to avoid splashing, and the alkali metal vapor is generated by mixing with the carrier gas.
It improves the stability and generation efficiency of alkali metal vapor flow rate, ensuring uniform distribution of alkali metal vapor and large evaporation specific surface area.
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Figure CN119651321B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of gas laser technology, and more particularly to an alkali metal vapor generating device. Background Technology
[0002] Alkali metal vapor lasers combine the advantages of both gas and solid-state lasers, making them a research hotspot in the field of high-power laser technology in recent years. The laser gain medium in alkali metal vapor lasers is alkali metal vapor, and one of the key technologies to be solved is how to generate alkali metal vapor more efficiently and stably. Typically, alkali metal vapor is generated by using a carrier gas, such as helium or methane, at a certain flow rate to blow onto the surface of a liquid alkali metal heated to a certain temperature. This mixes with the vapor produced by the evaporation of the alkali metal, and then the mixture is carried out of the evaporation device together, achieving the purpose of generating alkali metal vapor. The biggest problem with this technology is that to obtain sufficient carrier gas and alkali metal vapor flow rates, the amount of alkali metal and the flow rate of the carrier gas need to be increased. The alkali metal is very prone to splashing under the action of the carrier gas, causing frequent changes in the distribution of the alkali metal within the alkali metal vapor generator. This results in unstable and uncontrollable alkali metal vapor flow rates. Summary of the Invention
[0003] In view of the technical problem of unstable flow rate in existing alkali metal vapor generation technology, an alkali metal vapor generation device based on capillary effect is provided.
[0004] The technical means employed in this invention are as follows:
[0005] An alkali metal vapor generating device includes a quartz glass plate, an evaporator, and a temperature-controlled furnace;
[0006] The quartz glass plate has several micro-holes arranged in an array.
[0007] The evaporator includes a groove, and a quartz glass plate is welded and fixed at the opening of the groove. Carrier gas flow guide plates are respectively provided on both sides of the opening of the groove. The groove is provided with an alkali metal adding hole that connects the inside and outside of the groove. The inside of the groove and the quartz glass plate form a cavity for holding the alkali metal. The temperature-controlled furnace is used to heat and melt the alkali metal into a liquid state.
[0008] The temperature-controlled furnace is equipped with two evaporators, which are placed vertically with the quartz glass plates facing each other on the same side. The two evaporators are installed vertically and vertically through the carrier gas flow guide plates on both sides; the carrier gas flow guide plates of the two evaporators and the two quartz glass plates form a gas flow channel.
[0009] The temperature-controlled furnace is provided with an air inlet and an air outlet, which are respectively opposite to the inlet and outlet of the gas flow channel. The outlet of the gas flow channel is connected to the air outlet, and there is a distance between the inlet of the gas flow channel and the air inlet.
[0010] Furthermore, when carrier gas is introduced into the temperature-controlled furnace through the air inlet, the pressure inside the cavity is the same as the gas pressure at the air inlet and is greater than the pressure of the carrier gas in the gas flow channel. Liquid alkali metal can flow out through the micro-holes and form a layer of liquid alkali metal on the other side surface of the quartz glass plate. Heating by the temperature-controlled furnace can cause the liquid alkali metal in the gas flow channel to evaporate and mix with the carrier gas to produce alkali metal vapor.
[0011] Furthermore, the quartz glass plates mounted on the two evaporators are parallel to each other.
[0012] Furthermore, the sidewall of the groove serves as a welding station for welding and fixing the quartz glass plate.
[0013] Furthermore, the alkali metal addition hole of the upper evaporator is disposed on the bottom surface of the groove, and the alkali metal addition hole of the lower evaporator is disposed on the side wall of the groove.
[0014] Furthermore, the thickness of the quartz glass plate is 5-10mm, the micropores are circular through holes with a diameter of 0.3mm, and the spacing between the micropores is 0.2mm.
[0015] Furthermore, the carrier gas introduced into the temperature-controlled furnace is methane or helium.
[0016] Compared with the prior art, the present invention has the following advantages:
[0017] The alkali metal vapor generating device provided by the present invention, by processing a micro-pore structure on a quartz glass plate, and after introducing a carrier gas, causes the alkali metal to be evenly distributed in a thin layer on the surface of the quartz glass plate through capillary effect. Since the thin layer of alkali metal is in close contact with the glass surface, splashing will not occur even under high flow rate carrier gas conditions, thereby improving the stability of alkali metal vapor flow rate; in addition, it can also obtain a large evaporation specific surface area, thereby improving the generation efficiency of alkali metal vapor.
[0018] Based on the above reasons, this invention can be widely applied in the field of gas lasers. Attached Figure Description
[0019] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0020] Figure 1 This is a schematic diagram of the alkali metal vapor generating device of the present invention.
[0021] Figure 2 This is a schematic diagram of the internal structure of the alkali metal vapor generating device of the present invention.
[0022] Figure 3 (a) and (b) are schematic diagrams of the two evaporator structures described in this invention.
[0023] Figure 4 This is a schematic diagram of the internal structure of the temperature-controlled furnace described in this invention.
[0024] Figure 5 This is a schematic diagram of the quartz glass plate structure described in this invention.
[0025] In the diagram: 1. Quartz glass plate; 2. Evaporator; 3. Temperature-controlled furnace; 4. Groove; 5. Welding station; 6. Carrier gas flow guide plate; 7. Alkali metal addition hole; 8. Inlet; 9. Outlet; 10. Gas flow channel; 11. Micro-hole. Detailed Implementation
[0026] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit the present invention or its application or use. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0027] Example 1
[0028] like Figure 1-5 As shown, the present invention provides an alkali metal vapor generating device, including a quartz glass plate 1, an evaporator 2, and a temperature-controlled furnace 3;
[0029] The quartz glass plate 1 has a plurality of micro-holes 11 arranged in an array; when no carrier gas is introduced into the temperature-controlled furnace 3, the liquid alkali metal cannot flow out through the micro-holes 11.
[0030] The evaporator 2 includes a groove 4, and a quartz glass plate 1 that covers the opening of the groove 4 is welded and fixed to the opening of the groove 4. Carrier gas flow guide plates 6 are respectively provided on both sides of the opening of the groove 4. The groove 4 is provided with an alkali metal adding hole 7 that connects the inside and outside of the groove 4. The inside of the groove 4 and the quartz glass plate 1 form a cavity for holding the alkali metal. The temperature-controlled furnace 3 is used to heat and melt the alkali metal into a liquid state.
[0031] The temperature-controlled furnace 3 is equipped with two evaporators 2, which are placed vertically with the quartz glass plates 1 facing each other on the same side. The two evaporators 2 are installed vertically and vertically through the carrier gas flow guide plates 6 on both sides. The carrier gas flow guide plates 6 of the two evaporators 2 and the two quartz glass plates 1 form a gas flow channel 10.
[0032] The temperature-controlled furnace 3 is provided with an air inlet 8 and an air outlet 9, which are respectively opposite to the inlet and outlet of the gas flow channel 10. The outlet of the gas flow channel 10 is connected to the air outlet 9. The inlet of the gas flow channel 10 is spaced apart from the air inlet 8. This not only allows the carrier gas flowing in from the air inlet 8 to flow out from the air outlet 9 through the gas flow channel 10, but also allows the pressure in the groove 4 to be the same as the pressure in the air inlet 8 of the temperature-controlled furnace 3 through the alkali metal addition hole 7 on the groove 4. At the same time, due to Bernoulli's principle, the pressure in the groove 4 is slightly greater than the pressure of the carrier gas in the gas flow channel 10, which is conducive to the liquid alkali metal reaching the other surface of the quartz glass plate 1 through the micro-hole 11.
[0033] Furthermore, when carrier gas is introduced into the temperature-controlled furnace 3 through the air inlet 8, the pressure inside the cavity is the same as the gas pressure at the air inlet 8 and is greater than the pressure of the carrier gas in the gas flow channel 10. Liquid alkali metal can flow out through the micro-holes 11 and form a layer of liquid alkali metal on the other side surface of the quartz glass plate 1. Heating by the temperature-controlled furnace 3 can evaporate the liquid alkali metal in the gas flow channel 10 and mix with the carrier gas to produce alkali metal vapor.
[0034] Furthermore, the air inlet 9, the gas flow channel 10, and the air outlet 9 are coaxially arranged.
[0035] Furthermore, the quartz glass plates 1 mounted on the two evaporators 2 are parallel to each other.
[0036] Furthermore, the sidewall of the groove 4 serves as a welding station 5 for welding and fixing the quartz glass plate 1.
[0037] Further, as shown in the figure Figure 3As shown in (a) and (b), the alkali metal addition hole 7 of the upper evaporator 2 is disposed on the bottom surface of the groove 4, and the alkali metal addition hole 7 of the lower evaporator 2 is disposed on the side wall of the groove 4. The alkali metal addition holes 7 on the upper and lower evaporators 2 are in different positions, which can prevent alkali metal from flowing out through the alkali metal addition holes 7.
[0038] Furthermore, the thickness of the quartz glass plate 1 is 5-10mm, and the micro-holes 11 can be circular through holes, rectangular through holes, or through holes of other shapes.
[0039] Preferably, in this embodiment, the thickness of the quartz glass plate 1 is 5mm, the micro-holes 11 are circular through holes with a diameter of 0.3mm, the spacing between the micro-holes 11 is 0.2mm, and the micro-holes 11 are densely distributed, which allows the liquid alkali metal to cover the surface of the quartz glass plate 1.
[0040] Furthermore, the carrier gas introduced into the temperature-controlled furnace 3 is methane or helium.
[0041] When the alkali metal vapor generating device of the present invention is in operation, alkali metal is injected into the cavity formed by the groove 4 and the quartz glass plate 1. The two evaporators 2 are heated to a certain temperature by the temperature-controlled furnace 3 to completely liquefy the alkali metal. After the carrier gas is introduced into the temperature-controlled furnace 3, the liquefied alkali metal can reach the surface of the gas flow channel 10 formed by the micro-pores 11 on the quartz glass plate 1 through the capillary effect and evaporate. In the gas flow channel 10, it mixes with the inflowing carrier gas that has been heated to a certain temperature, and finally flows out of the temperature-controlled furnace 3 from the gas outlet 9, thereby realizing the generation of alkali metal vapor.
[0042] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.
Claims
1. An alkali metal vapor generating device, characterized in that, Includes quartz glass plates, evaporators, and temperature-controlled furnaces; The quartz glass plate has a plurality of micro-holes arranged in an array; the thickness of the quartz glass plate is 5-10mm, the micro-holes are circular through holes with a diameter of 0.3mm, and the spacing between the micro-holes is 0.2mm. The evaporator includes a groove, and a quartz glass plate is welded and fixed at the opening of the groove. Carrier gas flow guide plates are respectively provided on both sides of the opening of the groove. The groove is provided with an alkali metal adding hole that connects the inside and outside of the groove. The inside of the groove and the quartz glass plate form a cavity for holding the alkali metal. The temperature-controlled furnace is used to heat and melt the alkali metal into a liquid state. The temperature-controlled furnace is equipped with two evaporators, which are placed vertically and installed opposite each other on one side of the quartz glass plate. The two evaporators are installed vertically and oppositely through the carrier gas flow guide plates on both sides; the carrier gas flow guide plates of the two evaporators and the two quartz glass plates form a gas flow channel. The temperature-controlled furnace is provided with an air inlet and an air outlet, which are respectively opposite to the inlet and outlet of the gas flow channel. The outlet of the gas flow channel is connected to the air outlet, and there is a distance between the inlet of the gas flow channel and the air inlet.
2. The alkali metal vapor generating apparatus according to claim 1, characterized in that, When carrier gas is introduced into the temperature-controlled furnace through the air inlet, the pressure inside the cavity is the same as the gas pressure at the air inlet and is greater than the pressure of the carrier gas in the gas flow channel. Liquid alkali metal can flow out through the micro-holes and form a layer of liquid alkali metal on the other side of the quartz glass plate. Heating by the temperature-controlled furnace can cause the liquid alkali metal in the gas flow channel to evaporate and mix with the carrier gas to produce alkali metal vapor.
3. The alkali metal vapor generating apparatus according to claim 1, characterized in that, The quartz glass plates mounted on the two evaporators are parallel to each other.
4. The alkali metal vapor generating apparatus according to claim 1, characterized in that, The sidewall of the groove serves as a welding station for welding and fixing the quartz glass plate.
5. The alkali metal vapor generating apparatus according to claim 1, characterized in that, The alkali metal addition hole of the upper evaporator is disposed on the bottom surface of the groove, and the alkali metal addition hole of the lower evaporator is disposed on the side wall of the groove.
6. The alkali metal vapor generating apparatus according to claim 1, characterized in that, The carrier gas introduced into the temperature-controlled furnace is methane or helium.
Citation Information
Patent Citations
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CN101604931A
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CN103928823A